SG11201906510PA - Method and device for bonding chips - Google Patents
Method and device for bonding chipsInfo
- Publication number
- SG11201906510PA SG11201906510PA SG11201906510PA SG11201906510PA SG11201906510PA SG 11201906510P A SG11201906510P A SG 11201906510PA SG 11201906510P A SG11201906510P A SG 11201906510PA SG 11201906510P A SG11201906510P A SG 11201906510PA SG 11201906510P A SG11201906510P A SG 11201906510PA
- Authority
- SG
- Singapore
- Prior art keywords
- chips
- bonding chips
- bonding
- onto
- substrate
- Prior art date
Links
- 239000000758 substrate Substances 0.000 abstract 2
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/50—Multistep manufacturing processes of assemblies consisting of devices, each device being of a type provided for in group H01L27/00 or H01L29/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
- H01L24/75—Apparatus for connecting with bump connectors or layer connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/93—Batch processes
- H01L24/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L24/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/03—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/065—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
- H01L25/0652—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00 the devices being arranged next and on each other, i.e. mixed assemblies
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/03—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/065—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
- H01L25/0657—Stacked arrangements of devices
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K13/00—Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
- H05K13/04—Mounting of components, e.g. of leadless components
- H05K13/0404—Pick-and-place heads or apparatus, e.g. with jaws
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68318—Auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68354—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used to support diced chips prior to mounting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68368—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used in a transfer process involving at least two transfer steps, i.e. including an intermediate handle substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54426—Marks applied to semiconductor devices or parts for alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
- H01L2224/75—Apparatus for connecting with bump connectors or layer connectors
- H01L2224/7525—Means for applying energy, e.g. heating means
- H01L2224/753—Means for applying energy, e.g. heating means by means of pressure
- H01L2224/75301—Bonding head
- H01L2224/75314—Auxiliary members on the pressing surface
- H01L2224/75317—Removable auxiliary member
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
- H01L2224/75—Apparatus for connecting with bump connectors or layer connectors
- H01L2224/757—Means for aligning
- H01L2224/75702—Means for aligning in the upper part of the bonding apparatus, e.g. in the bonding head
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
- H01L2224/75—Apparatus for connecting with bump connectors or layer connectors
- H01L2224/758—Means for moving parts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
- H01L2224/75—Apparatus for connecting with bump connectors or layer connectors
- H01L2224/7598—Apparatus for connecting with bump connectors or layer connectors specially adapted for batch processes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/80001—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by connecting a bonding area directly to another bonding area, i.e. connectorless bonding, e.g. bumpless bonding
- H01L2224/80003—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by connecting a bonding area directly to another bonding area, i.e. connectorless bonding, e.g. bumpless bonding involving a temporary auxiliary member not forming part of the bonding apparatus
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/80001—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by connecting a bonding area directly to another bonding area, i.e. connectorless bonding, e.g. bumpless bonding
- H01L2224/80003—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by connecting a bonding area directly to another bonding area, i.e. connectorless bonding, e.g. bumpless bonding involving a temporary auxiliary member not forming part of the bonding apparatus
- H01L2224/80004—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by connecting a bonding area directly to another bonding area, i.e. connectorless bonding, e.g. bumpless bonding involving a temporary auxiliary member not forming part of the bonding apparatus being a removable or sacrificial coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/80001—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by connecting a bonding area directly to another bonding area, i.e. connectorless bonding, e.g. bumpless bonding
- H01L2224/80003—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by connecting a bonding area directly to another bonding area, i.e. connectorless bonding, e.g. bumpless bonding involving a temporary auxiliary member not forming part of the bonding apparatus
- H01L2224/80006—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by connecting a bonding area directly to another bonding area, i.e. connectorless bonding, e.g. bumpless bonding involving a temporary auxiliary member not forming part of the bonding apparatus being a temporary or sacrificial substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/80001—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by connecting a bonding area directly to another bonding area, i.e. connectorless bonding, e.g. bumpless bonding
- H01L2224/80009—Pre-treatment of the bonding area
- H01L2224/8001—Cleaning the bonding area, e.g. oxide removal step, desmearing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/80001—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by connecting a bonding area directly to another bonding area, i.e. connectorless bonding, e.g. bumpless bonding
- H01L2224/80009—Pre-treatment of the bonding area
- H01L2224/8001—Cleaning the bonding area, e.g. oxide removal step, desmearing
- H01L2224/80011—Chemical cleaning, e.g. etching, flux
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/80001—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by connecting a bonding area directly to another bonding area, i.e. connectorless bonding, e.g. bumpless bonding
- H01L2224/80009—Pre-treatment of the bonding area
- H01L2224/8001—Cleaning the bonding area, e.g. oxide removal step, desmearing
- H01L2224/80013—Plasma cleaning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/80001—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by connecting a bonding area directly to another bonding area, i.e. connectorless bonding, e.g. bumpless bonding
- H01L2224/8012—Aligning
- H01L2224/80143—Passive alignment, i.e. self alignment, e.g. using surface energy, chemical reactions, thermal equilibrium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/80001—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by connecting a bonding area directly to another bonding area, i.e. connectorless bonding, e.g. bumpless bonding
- H01L2224/808—Bonding techniques
- H01L2224/80894—Direct bonding, i.e. joining surfaces by means of intermolecular attracting interactions at their interfaces, e.g. covalent bonds, van der Waals forces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/80001—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by connecting a bonding area directly to another bonding area, i.e. connectorless bonding, e.g. bumpless bonding
- H01L2224/808—Bonding techniques
- H01L2224/80894—Direct bonding, i.e. joining surfaces by means of intermolecular attracting interactions at their interfaces, e.g. covalent bonds, van der Waals forces
- H01L2224/80895—Direct bonding, i.e. joining surfaces by means of intermolecular attracting interactions at their interfaces, e.g. covalent bonds, van der Waals forces between electrically conductive surfaces, e.g. copper-copper direct bonding, surface activated bonding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/80001—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by connecting a bonding area directly to another bonding area, i.e. connectorless bonding, e.g. bumpless bonding
- H01L2224/808—Bonding techniques
- H01L2224/80894—Direct bonding, i.e. joining surfaces by means of intermolecular attracting interactions at their interfaces, e.g. covalent bonds, van der Waals forces
- H01L2224/80896—Direct bonding, i.e. joining surfaces by means of intermolecular attracting interactions at their interfaces, e.g. covalent bonds, van der Waals forces between electrically insulating surfaces, e.g. oxide or nitride layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/93—Batch processes
- H01L2224/94—Batch processes at wafer-level, i.e. with connecting carried out on a wafer comprising a plurality of undiced individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/93—Batch processes
- H01L2224/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L2224/95001—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips involving a temporary auxiliary member not forming part of the bonding apparatus, e.g. removable or sacrificial coating, film or substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/93—Batch processes
- H01L2224/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L2224/9512—Aligning the plurality of semiconductor or solid-state bodies
- H01L2224/95136—Aligning the plurality of semiconductor or solid-state bodies involving guiding structures, e.g. shape matching, spacers or supporting members
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/93—Batch processes
- H01L2224/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L2224/9512—Aligning the plurality of semiconductor or solid-state bodies
- H01L2224/95143—Passive alignment, i.e. self alignment, e.g. using surface energy, chemical reactions, thermal equilibrium
- H01L2224/95146—Passive alignment, i.e. self alignment, e.g. using surface energy, chemical reactions, thermal equilibrium by surface tension
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/93—Batch processes
- H01L2224/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L2224/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Die Bonding (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Wire Bonding (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Dicing (AREA)
Abstract
Method and Device for Bonding Chips What is proposed is a method for bonding chips (7) onto a substrate (11’) or onto further chips, characterized in that the chips (7) are bonded onto the substrate (11’) or the further chips by means of a direct bond. Figure 1a.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/EP2017/054971 WO2018157937A1 (en) | 2017-03-02 | 2017-03-02 | Method and device for bonding chips |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201906510PA true SG11201906510PA (en) | 2019-08-27 |
Family
ID=58266571
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201906510PA SG11201906510PA (en) | 2017-03-02 | 2017-03-02 | Method and device for bonding chips |
Country Status (8)
Country | Link |
---|---|
US (3) | US11764198B2 (en) |
EP (1) | EP3590130A1 (en) |
JP (3) | JP7137571B2 (en) |
KR (3) | KR20190119031A (en) |
CN (4) | CN118737999A (en) |
SG (1) | SG11201906510PA (en) |
TW (4) | TWI842412B (en) |
WO (1) | WO2018157937A1 (en) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20190119031A (en) * | 2017-03-02 | 2019-10-21 | 에베 그룹 에. 탈너 게엠베하 | Method and device for bonding chips |
JP7235566B2 (en) * | 2019-04-01 | 2023-03-08 | 株式会社ディスコ | Laminated device chip manufacturing method |
TW202135276A (en) * | 2019-10-29 | 2021-09-16 | 日商東京威力科創股份有限公司 | Method of manufacturing chip-mounting substrate, and substrate processing method |
FR3105569B1 (en) * | 2019-12-19 | 2021-12-17 | Commissariat Energie Atomique | Method of bonding chips to a substrate by direct bonding |
US11817326B2 (en) * | 2020-03-10 | 2023-11-14 | Pyxis Cf Pte. Ltd. | Precision reconstruction for panel-level packaging |
KR20220065292A (en) | 2020-11-13 | 2022-05-20 | 삼성전자주식회사 | Semiconductor package and method of manufacturing the same |
CN114628304A (en) * | 2020-12-10 | 2022-06-14 | 武汉新芯集成电路制造有限公司 | Chip bonding method |
TWI765762B (en) * | 2020-12-25 | 2022-05-21 | 梭特科技股份有限公司 | Method for fixing chips with corner or side contact without impact force |
EP4420159A1 (en) * | 2021-10-19 | 2024-08-28 | EV Group E. Thallner GmbH | Method and device for the production and provision of electronic components |
US20230260955A1 (en) * | 2022-02-11 | 2023-08-17 | Applied Materials, Inc. | A procedure to enable die rework for hybrid bonding |
US20240170443A1 (en) * | 2022-11-18 | 2024-05-23 | Applied Materials, Inc. | Integrated process flows for hybrid bonding |
FR3144695A1 (en) * | 2022-12-28 | 2024-07-05 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Direct hybrid chip-to-wafer bonding process |
Family Cites Families (65)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3904587A1 (en) * | 1989-02-16 | 1990-08-23 | Arnold & Richter Kg | MOUNTING HEAD FOR HANDLING EQUIPMENT |
JP2876786B2 (en) * | 1990-12-21 | 1999-03-31 | 株式会社日立製作所 | High purity atmosphere bonding method and equipment |
US5799858A (en) * | 1995-09-16 | 1998-09-01 | Samsung Aerospace Industries, Ltd. | Die bonding device |
JP3206486B2 (en) * | 1997-04-08 | 2001-09-10 | 松下電器産業株式会社 | Bonding head in chip bonding equipment |
AT405775B (en) | 1998-01-13 | 1999-11-25 | Thallner Erich | Method and apparatus for bringing together wafer-type (slice-type, disk-shaped) semiconductor substrates in an aligned manner |
TW451372B (en) * | 1999-06-17 | 2001-08-21 | Shinkawa Kk | Die-holding mechanism, die-packing device and die-bonding device |
TWI283906B (en) * | 2001-12-21 | 2007-07-11 | Esec Trading Sa | Pick-up tool for mounting semiconductor chips |
JP4064808B2 (en) | 2001-12-25 | 2008-03-19 | 東芝松下ディスプレイテクノロジー株式会社 | Thermocompression bonding apparatus and thermocompression bonding method |
SG104293A1 (en) * | 2002-01-09 | 2004-06-21 | Micron Technology Inc | Elimination of rdl using tape base flip chip on flex for die stacking |
US7182118B2 (en) * | 2003-06-02 | 2007-02-27 | Asm Assembly Automation Ltd. | Pick and place assembly for transporting a film of material |
US7650688B2 (en) * | 2003-12-31 | 2010-01-26 | Chippac, Inc. | Bonding tool for mounting semiconductor chips |
WO2005097396A1 (en) * | 2004-04-08 | 2005-10-20 | Matsushita Electric Industrial Co., Ltd. | Joining method and device therefor |
US7257887B2 (en) * | 2004-06-14 | 2007-08-21 | David Lee | Die holding apparatus for bonding systems |
EP1815500A2 (en) | 2004-10-09 | 2007-08-08 | Applied Microengineering Limited | Equipment for wafer bonding |
JP4616793B2 (en) | 2006-05-17 | 2011-01-19 | 株式会社新川 | Multi-stage pressure collet |
FR2912839B1 (en) * | 2007-02-16 | 2009-05-15 | Soitec Silicon On Insulator | IMPROVING THE QUALITY OF COLD CLEANING INTERFACE BY COLD CLEANING AND HOT COLLAGE |
US7790507B2 (en) * | 2007-03-24 | 2010-09-07 | Texas Instruments Incorporated | Semiconductor die collet and method |
JP4341693B2 (en) | 2007-05-16 | 2009-10-07 | ウシオ電機株式会社 | LED element and manufacturing method thereof |
KR101335275B1 (en) | 2007-07-20 | 2013-11-29 | 삼성전자주식회사 | Apparatus for bonding semiconductor chip on substrate |
FR2935537B1 (en) * | 2008-08-28 | 2010-10-22 | Soitec Silicon On Insulator | MOLECULAR ADHESION INITIATION METHOD |
US20100248424A1 (en) * | 2009-03-27 | 2010-09-30 | Intellectual Business Machines Corporation | Self-Aligned Chip Stacking |
EP2299486B1 (en) * | 2009-09-18 | 2015-02-18 | EV Group E. Thallner GmbH | Method for bonding chips to wafers |
JP5644096B2 (en) | 2009-11-30 | 2014-12-24 | ソニー株式会社 | Method for manufacturing bonded substrate and method for manufacturing solid-state imaging device |
US8440541B2 (en) | 2010-02-25 | 2013-05-14 | Memc Electronic Materials, Inc. | Methods for reducing the width of the unbonded region in SOI structures |
KR20130007589A (en) | 2010-02-26 | 2013-01-18 | 엘리언스 포 서스터너블 에너지, 엘엘씨 | Hot wire chemical vapor deposition with carbide filaments |
JP2011192663A (en) * | 2010-03-11 | 2011-09-29 | Tokyo Electron Ltd | Mounting method and mounting device |
US8461017B2 (en) * | 2010-07-19 | 2013-06-11 | Soitec | Methods of forming bonded semiconductor structures using a temporary carrier having a weakened ion implant region for subsequent separation along the weakened region |
SG177817A1 (en) | 2010-07-19 | 2012-02-28 | Soitec Silicon On Insulator | Temporary semiconductor structure bonding methods and related bonded semiconductor structures |
FR2965398B1 (en) | 2010-09-23 | 2012-10-12 | Soitec Silicon On Insulator | MOLECULAR ADHESION COLLAGE PROCESS WITH OVERLAY TYPE RELOCATION REDUCTION |
KR102225764B1 (en) | 2011-01-25 | 2021-03-10 | 에베 그룹 에. 탈너 게엠베하 | Method for the permanent bonding of wafers |
SG193903A1 (en) | 2011-04-08 | 2013-11-29 | Ev Group E Thallner Gmbh | Method for permanent bonding of wafers |
EP2695183A1 (en) | 2011-04-08 | 2014-02-12 | Ev Group E. Thallner GmbH | Method for permanently bonding wafers |
SG193407A1 (en) | 2011-04-08 | 2013-10-30 | Ev Group E Thallner Gmbh | Method for permanent bonding of wafers |
JP5813432B2 (en) * | 2011-09-19 | 2015-11-17 | ファスフォードテクノロジ株式会社 | Die bonder and bonding method |
US8673733B2 (en) * | 2011-09-27 | 2014-03-18 | Soitec | Methods of transferring layers of material in 3D integration processes and related structures and devices |
CN102629604B (en) * | 2012-04-06 | 2014-09-03 | 天水华天科技股份有限公司 | Cantilever type IC (Integrated Circuit) chip stack package of BT (Bismaleimide Triazine) substrate and production method of cantilever type IC chip stack package |
US8969200B2 (en) * | 2012-04-12 | 2015-03-03 | The Research Foundation Of State University Of New York | Apparatus and method for integration of through substrate vias |
US9142532B2 (en) * | 2012-04-24 | 2015-09-22 | Bondtech Co., Ltd. | Chip-on-wafer bonding method and bonding device, and structure comprising chip and wafer |
JP2013243333A (en) | 2012-04-24 | 2013-12-05 | Tadatomo Suga | Chip-on wafer bonding method and bonding device and structure including chip and wafer |
JP2013251405A (en) * | 2012-05-31 | 2013-12-12 | Tadatomo Suga | Bonding method of substrate having metal region |
US9082808B2 (en) | 2012-06-05 | 2015-07-14 | Oracle International Corporation | Batch process for three-dimensional integration |
CN107195541B (en) | 2012-07-24 | 2020-07-24 | Ev 集团 E·索尔纳有限责任公司 | Method and apparatus for permanently bonding wafers |
JP5963374B2 (en) * | 2012-09-23 | 2016-08-03 | 国立大学法人東北大学 | Chip support substrate, chip support method, three-dimensional integrated circuit, assembly apparatus, and three-dimensional integrated circuit manufacturing method |
JP6096547B2 (en) * | 2013-03-21 | 2017-03-15 | 東京エレクトロン株式会社 | Plasma processing apparatus and shower plate |
CN109390221B (en) | 2013-05-29 | 2023-09-22 | Ev 集团 E·索尔纳有限责任公司 | Apparatus and method for bonding substrates |
CN105283950B (en) | 2013-06-17 | 2018-03-13 | Ev 集团 E·索尔纳有限责任公司 | Device and method for substrate alignment |
JP2015018897A (en) * | 2013-07-10 | 2015-01-29 | マイクロン テクノロジー, インク. | Semiconductor device manufacturing method |
US9040385B2 (en) | 2013-07-24 | 2015-05-26 | Taiwan Semiconductor Manufacturing Co., Ltd. | Mechanisms for cleaning substrate surface for hybrid bonding |
WO2015082020A1 (en) | 2013-12-06 | 2015-06-11 | Ev Group E. Thallner Gmbh | Device and method for aligning substrates |
EP2889900B1 (en) * | 2013-12-19 | 2019-11-06 | IMEC vzw | Method for aligning micro-electronic components using an alignment liquid and electrostatic alignment as well as corresponding assembly of aligned micro-electronic components |
FR3016474A1 (en) | 2014-01-14 | 2015-07-17 | Commissariat Energie Atomique | METHOD FOR PLACING AND BONDING CHIPS ON A RECEIVER SUBSTRATE |
US9751257B2 (en) * | 2014-06-17 | 2017-09-05 | GM Global Technology Operations LLC | Ultrasonic welder clamp |
KR102445060B1 (en) | 2014-10-17 | 2022-09-20 | 본드테크 가부시키가이샤 | Method for bonding substrates together, and substrate bonding device |
US9842823B2 (en) * | 2014-12-29 | 2017-12-12 | Taiwan Semiconductor Manufacturing Co., Ltd. | Chip-stacking apparatus having a transport device configured to transport a chip onto a substrate |
US10163709B2 (en) * | 2015-02-13 | 2018-12-25 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device and method |
KR101559699B1 (en) * | 2015-05-08 | 2015-10-13 | 빌트조명(주) | Method for manufacturing led package using plasma surface treatment |
CN105016632B (en) * | 2015-06-12 | 2018-10-26 | 哈尔滨工业大学深圳研究生院 | A kind of method that low-temperature surface activation Direct Bonding prepares quartz glass capillary |
FR3039700B1 (en) | 2015-07-31 | 2017-08-11 | Commissariat Energie Atomique | METHOD OF DIRECT COLLAGE WITH ULTRASOUND SELF ALIGNMENT |
CN105236350B (en) | 2015-10-21 | 2017-06-20 | 中国电子科技集团公司第四十九研究所 | A kind of wafer level Direct Bonding method of sapphire pressure sensitive chip |
US10497589B2 (en) * | 2016-01-29 | 2019-12-03 | Jenoptik Optical Systems Gmbh | Method and device for severing a microchip from a wafer and arranging the microchip on a substrate |
KR102494914B1 (en) | 2016-02-16 | 2023-02-01 | 에베 그룹 에. 탈너 게엠베하 | Method and apparatus for bonding substrates |
CN118098939A (en) | 2016-03-22 | 2024-05-28 | Ev 集团 E·索尔纳有限责任公司 | Apparatus and method for bonding substrates |
KR102347321B1 (en) | 2016-08-12 | 2022-01-04 | 에베 그룹 에. 탈너 게엠베하 | Method and sample holder for the controlled bonding of substrates |
KR20190119031A (en) * | 2017-03-02 | 2019-10-21 | 에베 그룹 에. 탈너 게엠베하 | Method and device for bonding chips |
JP6808815B2 (en) * | 2017-03-21 | 2021-01-06 | 富士フイルム株式会社 | Laminated device, laminate and manufacturing method of laminated device |
-
2017
- 2017-03-02 KR KR1020197020905A patent/KR20190119031A/en not_active IP Right Cessation
- 2017-03-02 CN CN202410800038.0A patent/CN118737999A/en active Pending
- 2017-03-02 CN CN201780085240.8A patent/CN110214369A/en active Pending
- 2017-03-02 WO PCT/EP2017/054971 patent/WO2018157937A1/en active Search and Examination
- 2017-03-02 KR KR1020237008314A patent/KR102624841B1/en active IP Right Grant
- 2017-03-02 KR KR1020247000769A patent/KR20240010753A/en not_active Application Discontinuation
- 2017-03-02 US US16/483,077 patent/US11764198B2/en active Active
- 2017-03-02 CN CN202410800034.2A patent/CN118737998A/en active Pending
- 2017-03-02 JP JP2019541070A patent/JP7137571B2/en active Active
- 2017-03-02 SG SG11201906510PA patent/SG11201906510PA/en unknown
- 2017-03-02 CN CN202410800033.8A patent/CN118737997A/en active Pending
- 2017-03-02 EP EP17710159.9A patent/EP3590130A1/en active Pending
-
2018
- 2018-02-14 TW TW112106984A patent/TWI842412B/en active
- 2018-02-14 TW TW109137666A patent/TWI797492B/en active
- 2018-02-14 TW TW112135491A patent/TW202401595A/en unknown
- 2018-02-14 TW TW107105628A patent/TWI713159B/en active
-
2021
- 2021-01-08 US US17/144,655 patent/US11990463B2/en active Active
-
2022
- 2022-09-02 JP JP2022139747A patent/JP7453299B2/en active Active
-
2024
- 2024-01-29 US US18/425,205 patent/US20240170474A1/en active Pending
- 2024-03-07 JP JP2024035054A patent/JP2024060010A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
TW202121610A (en) | 2021-06-01 |
TW202324548A (en) | 2023-06-16 |
CN110214369A (en) | 2019-09-06 |
EP3590130A1 (en) | 2020-01-08 |
JP2024060010A (en) | 2024-05-01 |
US20240170474A1 (en) | 2024-05-23 |
KR20190119031A (en) | 2019-10-21 |
JP2022169798A (en) | 2022-11-09 |
KR20240010753A (en) | 2024-01-24 |
TWI797492B (en) | 2023-04-01 |
US11764198B2 (en) | 2023-09-19 |
TWI842412B (en) | 2024-05-11 |
US20210134782A1 (en) | 2021-05-06 |
JP7453299B2 (en) | 2024-03-19 |
TWI713159B (en) | 2020-12-11 |
JP2020509578A (en) | 2020-03-26 |
TW202401595A (en) | 2024-01-01 |
KR102624841B1 (en) | 2024-01-15 |
US11990463B2 (en) | 2024-05-21 |
CN118737999A (en) | 2024-10-01 |
KR20230042124A (en) | 2023-03-27 |
US20200176437A1 (en) | 2020-06-04 |
WO2018157937A1 (en) | 2018-09-07 |
CN118737997A (en) | 2024-10-01 |
TW201842630A (en) | 2018-12-01 |
JP7137571B2 (en) | 2022-09-14 |
CN118737998A (en) | 2024-10-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
SG11201906510PA (en) | Method and device for bonding chips | |
EP3891788A4 (en) | Bonded unified semiconductor chips and fabrication and operation methods thereof | |
SG11201805655VA (en) | Method and device for bonding substrates | |
SG11201912375SA (en) | Film-like adhesive and method for producing semiconductor package using film-like adhesive | |
SG11201802510SA (en) | Laminate film for temporary bonding, methods for producing substrate workpiece and laminate substrate workpiece using the laminate film for temporary bonding, and method for producing semiconductor device using the same | |
MX2016013040A (en) | Selectively applied adhesive particulate on nonmetallic substrates. | |
EP3569329A4 (en) | Copper paste for pressureless bonding, bonded body and semiconductor device | |
SG11201806511XA (en) | Device and method for bonding substrates | |
TW201614783A (en) | Power module | |
SG11202100176VA (en) | Method for manufacturing semiconductor device, heat-curable resin composition, and dicing-die attach film | |
MY194177A (en) | Wafer processing method | |
EP4084050A4 (en) | Bonding method, bonded article, and bonding device | |
TW200507232A (en) | Bonding method and bonding device | |
WO2015156891A3 (en) | Method of providing a flexible semiconductor device and flexible semiconductor device thereof | |
SG10201805091VA (en) | Semiconductor package and method of manufacturing the same | |
MY179367A (en) | Adhesive film and semiconductor package using adhesive film | |
MY162038A (en) | Die bonding apparatus | |
MY188980A (en) | Method for die and clip attachment | |
SG11201705967TA (en) | Paste-like adhesive composition, semiconductor device, method for manufacturing semiconductor device, and method for bonding heatsink | |
WO2017034644A3 (en) | Method of providing an electronic device and electronic device thereof | |
SG11201910103WA (en) | Bonding apparatus and bonding method | |
EP3989284A4 (en) | Display device and self-assembly method for semiconductor light-emitting device | |
PH12019502541A1 (en) | Semiconductor device and method for producing same | |
WO2015107290A3 (en) | Process for placing and bonding chips on a receiving substrate using a pad, by means of a magnetic, electrostatic or electromagnetic force | |
SG155779A1 (en) | Apparatus and methods of forming wire bonds |