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SG11201800897PA - Polishing apparatus - Google Patents

Polishing apparatus

Info

Publication number
SG11201800897PA
SG11201800897PA SG11201800897PA SG11201800897PA SG11201800897PA SG 11201800897P A SG11201800897P A SG 11201800897PA SG 11201800897P A SG11201800897P A SG 11201800897PA SG 11201800897P A SG11201800897P A SG 11201800897PA SG 11201800897P A SG11201800897P A SG 11201800897PA
Authority
SG
Singapore
Prior art keywords
polishing apparatus
polishing
Prior art date
Application number
SG11201800897PA
Inventor
Michito Sato
Junichi Ueno
Kaoru Ishii
Yosuke Kanai
Yuya Nakanishi
Original Assignee
Shin Etsu Handotai Co Ltd
Fujikoshi Machinery Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Handotai Co Ltd, Fujikoshi Machinery Corp filed Critical Shin Etsu Handotai Co Ltd
Publication of SG11201800897PA publication Critical patent/SG11201800897PA/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/04Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/07Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
    • B24B37/10Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping
    • B24B37/105Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping the workpieces or work carriers being actively moved by a drive, e.g. in a combined rotary and translatory movement
    • B24B37/107Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping the workpieces or work carriers being actively moved by a drive, e.g. in a combined rotary and translatory movement in a rotary movement only, about an axis being stationary during lapping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/04Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/07Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
    • B24B37/10Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/12Lapping plates for working plane surfaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/34Accessories
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B24B57/02Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/10Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
SG11201800897PA 2015-08-21 2016-08-03 Polishing apparatus SG11201800897PA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015163908A JP6389449B2 (en) 2015-08-21 2015-08-21 Polishing equipment
PCT/JP2016/003575 WO2017033409A1 (en) 2015-08-21 2016-08-03 Polishing apparatus

Publications (1)

Publication Number Publication Date
SG11201800897PA true SG11201800897PA (en) 2018-03-28

Family

ID=58099645

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201800897PA SG11201800897PA (en) 2015-08-21 2016-08-03 Polishing apparatus

Country Status (8)

Country Link
US (1) US10850365B2 (en)
JP (1) JP6389449B2 (en)
KR (1) KR102550998B1 (en)
CN (1) CN107921605A (en)
DE (1) DE112016003354T5 (en)
SG (1) SG11201800897PA (en)
TW (1) TWI715606B (en)
WO (1) WO2017033409A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7019184B2 (en) * 2018-07-17 2022-02-15 スピードファム株式会社 Processing liquid switching device
US11244834B2 (en) * 2018-07-31 2022-02-08 Taiwan Semiconductor Manufacturing Co., Ltd. Slurry recycling for chemical mechanical polishing system
KR102308092B1 (en) * 2020-03-06 2021-10-05 넥센타이어 주식회사 Apparatus for measuring abrasion of tire

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3500591A (en) * 1966-11-21 1970-03-17 Owens Illinois Inc Glass grinding method and apparatus
GB1261131A (en) * 1969-06-06 1972-01-19 Burmah Oil Trading Ltd Improvements in or relating to lapping machines
US4869779A (en) * 1987-07-27 1989-09-26 Acheson Robert E Hydroplane polishing device and method
JP3502124B2 (en) * 1993-07-20 2004-03-02 スピードファム株式会社 Flat polishing machine with polishing liquid scattering prevention mechanism
JP2606156B2 (en) * 1994-10-14 1997-04-30 栗田工業株式会社 Method for collecting abrasive particles
US5658185A (en) * 1995-10-25 1997-08-19 International Business Machines Corporation Chemical-mechanical polishing apparatus with slurry removal system and method
US5664990A (en) * 1996-07-29 1997-09-09 Integrated Process Equipment Corp. Slurry recycling in CMP apparatus
US5791970A (en) * 1997-04-07 1998-08-11 Yueh; William Slurry recycling system for chemical-mechanical polishing apparatus
JPH10324865A (en) 1997-05-23 1998-12-08 Yamaha Corp Production of abrasive and polishing method
KR100540367B1 (en) * 1997-12-26 2006-01-10 가부시키가이샤 에바라 세이사꾸쇼 Polishing device and polishing method
JPH11254298A (en) * 1998-03-06 1999-09-21 Speedfam Co Ltd Slurry circulation supplying type surface polishing device
JPH11277434A (en) 1998-03-30 1999-10-12 Speedfam Co Ltd Slurry recycle system for cmp device and method therefor
JPH11320406A (en) * 1998-05-06 1999-11-24 Speedfam-Ipec Co Ltd Method and device for treating drainage and exhaust gas from polishing device
TW504776B (en) * 1999-09-09 2002-10-01 Mimasu Semiconductor Ind Co Wafer rotary holding apparatus and wafer surface treatment apparatus with waste liquid recovery mechanism
JP4657412B2 (en) 1999-12-10 2011-03-23 エルエスアイ コーポレーション Apparatus and method for polishing a semiconductor wafer
US6705930B2 (en) * 2000-01-28 2004-03-16 Lam Research Corporation System and method for polishing and planarizing semiconductor wafers using reduced surface area polishing pads and variable partial pad-wafer overlapping techniques
US6558238B1 (en) * 2000-09-19 2003-05-06 Agere Systems Inc. Apparatus and method for reclamation of used polishing slurry
JP3852758B2 (en) * 2002-03-01 2006-12-06 インターナショナル・ビジネス・マシーンズ・コーポレーション Slurry recovery apparatus and method
US7584760B2 (en) * 2002-09-13 2009-09-08 Dainippon Screen Mfg. Co., Ltd. Substrate processing apparatus
JP3889744B2 (en) * 2003-12-05 2007-03-07 株式会社東芝 Polishing head and polishing apparatus
JP2007088398A (en) * 2004-12-14 2007-04-05 Realize Advanced Technology Ltd Cleaning device, cleaning system using the cleaning device, and method of cleaning substrate to be cleaned
JP5263657B2 (en) * 2008-04-09 2013-08-14 株式会社ニコン Polishing equipment
EP2372749B1 (en) * 2010-03-31 2021-09-29 Levitronix GmbH Treatment device for treating a surface of a body
US9339914B2 (en) 2012-09-10 2016-05-17 Applied Materials, Inc. Substrate polishing and fluid recycling system
CN204094614U (en) * 2014-09-24 2015-01-14 江苏中科晶元信息材料有限公司 The mounting structure of annular shield cylinder in a kind of wafer grinding machine
JP6792363B2 (en) * 2016-07-22 2020-11-25 株式会社ディスコ Grinding device

Also Published As

Publication number Publication date
CN107921605A (en) 2018-04-17
TWI715606B (en) 2021-01-11
WO2017033409A1 (en) 2017-03-02
KR20180042250A (en) 2018-04-25
JP2017039193A (en) 2017-02-23
DE112016003354T5 (en) 2018-04-05
TW201713461A (en) 2017-04-16
US10850365B2 (en) 2020-12-01
KR102550998B1 (en) 2023-07-04
JP6389449B2 (en) 2018-09-12
US20180222008A1 (en) 2018-08-09

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