SG10201706631XA - Method for measuring the thickness of flat workpieces - Google Patents
Method for measuring the thickness of flat workpiecesInfo
- Publication number
- SG10201706631XA SG10201706631XA SG10201706631XA SG10201706631XA SG10201706631XA SG 10201706631X A SG10201706631X A SG 10201706631XA SG 10201706631X A SG10201706631X A SG 10201706631XA SG 10201706631X A SG10201706631X A SG 10201706631XA SG 10201706631X A SG10201706631X A SG 10201706631XA
- Authority
- SG
- Singapore
- Prior art keywords
- measuring
- thickness
- flat workpieces
- workpieces
- flat
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/02—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
- B24B49/04—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent involving measurement of the workpiece at the place of grinding during grinding operation
- B24B49/045—Specially adapted gauging instruments
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
- B24B37/013—Devices or means for detecting lapping completion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/08—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for double side lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/205—Lapping pads for working plane surfaces provided with a window for inspecting the surface of the work being lapped
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
- H01L22/26—Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/02—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
- B24B49/04—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent involving measurement of the workpiece at the place of grinding during grinding operation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Machine Tool Sensing Apparatuses (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102016116012.1A DE102016116012A1 (en) | 2016-08-29 | 2016-08-29 | Method for measuring the thickness of flat workpieces |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201706631XA true SG10201706631XA (en) | 2018-03-28 |
Family
ID=59631665
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10202101748RA SG10202101748RA (en) | 2016-08-29 | 2017-08-14 | Method for measuring the thickness of flat workpieces |
SG10201706631XA SG10201706631XA (en) | 2016-08-29 | 2017-08-14 | Method for measuring the thickness of flat workpieces |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10202101748RA SG10202101748RA (en) | 2016-08-29 | 2017-08-14 | Method for measuring the thickness of flat workpieces |
Country Status (8)
Country | Link |
---|---|
US (1) | US20180056478A1 (en) |
EP (1) | EP3290155B1 (en) |
JP (1) | JP6966253B2 (en) |
KR (1) | KR102494957B1 (en) |
CN (1) | CN107791145B (en) |
DE (1) | DE102016116012A1 (en) |
SG (2) | SG10202101748RA (en) |
TW (1) | TWI808941B (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101660900B1 (en) * | 2015-01-16 | 2016-10-10 | 주식회사 엘지실트론 | An apparatus of polishing a wafer and a method of polishing a wafer using the same |
JP7046358B2 (en) * | 2018-04-17 | 2022-04-04 | スピードファム株式会社 | Polishing equipment |
EP3597362B1 (en) * | 2018-07-16 | 2023-04-19 | Officina Meccanica Domaso SpA | Compression spring grinding machine |
TWI649534B (en) * | 2018-08-08 | 2019-02-01 | 友達晶材股份有限公司 | Thickness measuring device, calibration method thereof and calibration fixture |
CN109352431B (en) * | 2018-09-17 | 2020-04-21 | 上海理工大学 | Ultrasonic vibration grinding removal amount in-place detection device |
JP7435113B2 (en) * | 2020-03-23 | 2024-02-21 | 株式会社Sumco | Double-sided polishing device for workpieces |
JP7218830B1 (en) | 2022-04-14 | 2023-02-07 | 信越半導体株式会社 | Double-sided polishing device and double-sided polishing method |
CN114714151B (en) * | 2022-06-09 | 2022-09-16 | 成都飞机工业(集团)有限责任公司 | Method, device and equipment for planning measurement point positions of web and storage medium |
JP7296161B1 (en) * | 2022-06-27 | 2023-06-22 | 不二越機械工業株式会社 | Double-sided polishing machine |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57168109A (en) * | 1981-04-10 | 1982-10-16 | Shinetsu Eng Kk | Device for measuring thickness of work piece in lapping plate |
JPH1034529A (en) * | 1996-07-18 | 1998-02-10 | Speedfam Co Ltd | Automatic sizing device |
DE19913365C2 (en) * | 1999-03-24 | 2002-07-18 | Infineon Technologies Ag | Method and device for detecting the presence of a wafer in an automatic polishing device |
US6570662B1 (en) * | 1999-05-24 | 2003-05-27 | Luxtron Corporation | Optical techniques for measuring layer thicknesses and other surface characteristics of objects such as semiconductor wafers |
US6628397B1 (en) * | 1999-09-15 | 2003-09-30 | Kla-Tencor | Apparatus and methods for performing self-clearing optical measurements |
US6437868B1 (en) | 1999-10-28 | 2002-08-20 | Agere Systems Guardian Corp. | In-situ automated contactless thickness measurement for wafer thinning |
TW564200B (en) * | 2000-11-09 | 2003-12-01 | Fujikoshi Machinery Corp | Method of cleaning abrasive plates of abrasive machine and cleaning device |
JP3333778B2 (en) * | 2000-11-09 | 2002-10-15 | 不二越機械工業株式会社 | Polishing plate cleaning method and cleaning apparatus |
JP2002170800A (en) * | 2000-12-01 | 2002-06-14 | Nikon Corp | Polishing apparatus, method for manufacturing semiconductor device using the same and semiconductor device manufactured by this method |
KR101047933B1 (en) | 2002-11-27 | 2011-07-11 | 도요 고무 고교 가부시키가이샤 | Method of manufacturing a polishing pad and a semiconductor device |
JP4202841B2 (en) * | 2003-06-30 | 2008-12-24 | 株式会社Sumco | Surface polishing equipment |
JP2006224233A (en) * | 2005-02-17 | 2006-08-31 | Hoya Corp | Manufacturing method of glass substrate for mask blanks and manufacturing method of mask blanks |
JP2008227393A (en) * | 2007-03-15 | 2008-09-25 | Fujikoshi Mach Corp | Double-side polishing apparatus for wafer |
DE102007056627B4 (en) * | 2007-03-19 | 2023-12-21 | Lapmaster Wolters Gmbh | Method for grinding several semiconductor wafers simultaneously |
US8045142B2 (en) * | 2007-12-18 | 2011-10-25 | Ebara Corporation | Polishing end point detection method, polishing end point detection apparatus and polishing apparatus |
JP4654275B2 (en) * | 2008-07-31 | 2011-03-16 | 信越半導体株式会社 | Double-side polishing equipment |
SG192518A1 (en) | 2008-07-31 | 2013-08-30 | Shinetsu Handotai Kk | Wafer polishing method |
CN102171000A (en) | 2008-10-01 | 2011-08-31 | 彼特沃尔特斯有限公司 | Method for measuring the thickness of a discoidal workpiece |
DE102009024125B4 (en) * | 2009-06-06 | 2023-07-27 | Lapmaster Wolters Gmbh | Process for processing flat workpieces |
US20140120802A1 (en) * | 2012-10-31 | 2014-05-01 | Wayne O. Duescher | Abrasive platen wafer surface optical monitoring system |
JP5896884B2 (en) * | 2012-11-13 | 2016-03-30 | 信越半導体株式会社 | Double-side polishing method |
JP2014154874A (en) * | 2013-02-07 | 2014-08-25 | Toshiba Corp | Film thickness monitoring device, polishing device and film thickness monitoring method |
JP6003800B2 (en) * | 2013-05-16 | 2016-10-05 | 信越半導体株式会社 | Wafer double-side polishing method and double-side polishing system |
JP6146213B2 (en) * | 2013-08-30 | 2017-06-14 | 株式会社Sumco | Double-side polishing apparatus and double-side polishing method for work |
JP6255991B2 (en) * | 2013-12-26 | 2018-01-10 | 株式会社Sumco | Double-side polishing machine for workpieces |
KR101660900B1 (en) * | 2015-01-16 | 2016-10-10 | 주식회사 엘지실트론 | An apparatus of polishing a wafer and a method of polishing a wafer using the same |
-
2016
- 2016-08-29 DE DE102016116012.1A patent/DE102016116012A1/en not_active Ceased
-
2017
- 2017-06-19 TW TW106120364A patent/TWI808941B/en active
- 2017-08-02 JP JP2017149955A patent/JP6966253B2/en active Active
- 2017-08-04 CN CN201710658178.9A patent/CN107791145B/en active Active
- 2017-08-14 SG SG10202101748RA patent/SG10202101748RA/en unknown
- 2017-08-14 SG SG10201706631XA patent/SG10201706631XA/en unknown
- 2017-08-16 EP EP17186418.4A patent/EP3290155B1/en active Active
- 2017-08-28 KR KR1020170108535A patent/KR102494957B1/en active IP Right Grant
- 2017-08-28 US US15/687,674 patent/US20180056478A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
EP3290155A1 (en) | 2018-03-07 |
JP2018034298A (en) | 2018-03-08 |
KR20180025233A (en) | 2018-03-08 |
US20180056478A1 (en) | 2018-03-01 |
JP6966253B2 (en) | 2021-11-10 |
TW201809593A (en) | 2018-03-16 |
SG10202101748RA (en) | 2021-03-30 |
TWI808941B (en) | 2023-07-21 |
KR102494957B1 (en) | 2023-02-02 |
CN107791145B (en) | 2021-07-09 |
EP3290155B1 (en) | 2020-11-04 |
CN107791145A (en) | 2018-03-13 |
DE102016116012A1 (en) | 2018-03-01 |
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