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SG10201706631XA - Method for measuring the thickness of flat workpieces - Google Patents

Method for measuring the thickness of flat workpieces

Info

Publication number
SG10201706631XA
SG10201706631XA SG10201706631XA SG10201706631XA SG10201706631XA SG 10201706631X A SG10201706631X A SG 10201706631XA SG 10201706631X A SG10201706631X A SG 10201706631XA SG 10201706631X A SG10201706631X A SG 10201706631XA SG 10201706631X A SG10201706631X A SG 10201706631XA
Authority
SG
Singapore
Prior art keywords
measuring
thickness
flat workpieces
workpieces
flat
Prior art date
Application number
SG10201706631XA
Inventor
Dr Jörn Kanzow
Sascha Werth
Original Assignee
Lapmaster Wolters Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lapmaster Wolters Gmbh filed Critical Lapmaster Wolters Gmbh
Publication of SG10201706631XA publication Critical patent/SG10201706631XA/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/02Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
    • B24B49/04Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent involving measurement of the workpiece at the place of grinding during grinding operation
    • B24B49/045Specially adapted gauging instruments
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/005Control means for lapping machines or devices
    • B24B37/013Devices or means for detecting lapping completion
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/04Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/07Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
    • B24B37/08Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for double side lapping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/205Lapping pads for working plane surfaces provided with a window for inspecting the surface of the work being lapped
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/12Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10Measuring as part of the manufacturing process
    • H01L22/12Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • H01L22/26Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/02Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
    • B24B49/04Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent involving measurement of the workpiece at the place of grinding during grinding operation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Machine Tool Sensing Apparatuses (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
SG10201706631XA 2016-08-29 2017-08-14 Method for measuring the thickness of flat workpieces SG10201706631XA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102016116012.1A DE102016116012A1 (en) 2016-08-29 2016-08-29 Method for measuring the thickness of flat workpieces

Publications (1)

Publication Number Publication Date
SG10201706631XA true SG10201706631XA (en) 2018-03-28

Family

ID=59631665

Family Applications (2)

Application Number Title Priority Date Filing Date
SG10202101748RA SG10202101748RA (en) 2016-08-29 2017-08-14 Method for measuring the thickness of flat workpieces
SG10201706631XA SG10201706631XA (en) 2016-08-29 2017-08-14 Method for measuring the thickness of flat workpieces

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG10202101748RA SG10202101748RA (en) 2016-08-29 2017-08-14 Method for measuring the thickness of flat workpieces

Country Status (8)

Country Link
US (1) US20180056478A1 (en)
EP (1) EP3290155B1 (en)
JP (1) JP6966253B2 (en)
KR (1) KR102494957B1 (en)
CN (1) CN107791145B (en)
DE (1) DE102016116012A1 (en)
SG (2) SG10202101748RA (en)
TW (1) TWI808941B (en)

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* Cited by examiner, † Cited by third party
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KR101660900B1 (en) * 2015-01-16 2016-10-10 주식회사 엘지실트론 An apparatus of polishing a wafer and a method of polishing a wafer using the same
JP7046358B2 (en) * 2018-04-17 2022-04-04 スピードファム株式会社 Polishing equipment
EP3597362B1 (en) * 2018-07-16 2023-04-19 Officina Meccanica Domaso SpA Compression spring grinding machine
TWI649534B (en) * 2018-08-08 2019-02-01 友達晶材股份有限公司 Thickness measuring device, calibration method thereof and calibration fixture
CN109352431B (en) * 2018-09-17 2020-04-21 上海理工大学 Ultrasonic vibration grinding removal amount in-place detection device
JP7435113B2 (en) * 2020-03-23 2024-02-21 株式会社Sumco Double-sided polishing device for workpieces
JP7218830B1 (en) 2022-04-14 2023-02-07 信越半導体株式会社 Double-sided polishing device and double-sided polishing method
CN114714151B (en) * 2022-06-09 2022-09-16 成都飞机工业(集团)有限责任公司 Method, device and equipment for planning measurement point positions of web and storage medium
JP7296161B1 (en) * 2022-06-27 2023-06-22 不二越機械工業株式会社 Double-sided polishing machine

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JPS57168109A (en) * 1981-04-10 1982-10-16 Shinetsu Eng Kk Device for measuring thickness of work piece in lapping plate
JPH1034529A (en) * 1996-07-18 1998-02-10 Speedfam Co Ltd Automatic sizing device
DE19913365C2 (en) * 1999-03-24 2002-07-18 Infineon Technologies Ag Method and device for detecting the presence of a wafer in an automatic polishing device
US6570662B1 (en) * 1999-05-24 2003-05-27 Luxtron Corporation Optical techniques for measuring layer thicknesses and other surface characteristics of objects such as semiconductor wafers
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DE102007056627B4 (en) * 2007-03-19 2023-12-21 Lapmaster Wolters Gmbh Method for grinding several semiconductor wafers simultaneously
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JP6255991B2 (en) * 2013-12-26 2018-01-10 株式会社Sumco Double-side polishing machine for workpieces
KR101660900B1 (en) * 2015-01-16 2016-10-10 주식회사 엘지실트론 An apparatus of polishing a wafer and a method of polishing a wafer using the same

Also Published As

Publication number Publication date
EP3290155A1 (en) 2018-03-07
JP2018034298A (en) 2018-03-08
KR20180025233A (en) 2018-03-08
US20180056478A1 (en) 2018-03-01
JP6966253B2 (en) 2021-11-10
TW201809593A (en) 2018-03-16
SG10202101748RA (en) 2021-03-30
TWI808941B (en) 2023-07-21
KR102494957B1 (en) 2023-02-02
CN107791145B (en) 2021-07-09
EP3290155B1 (en) 2020-11-04
CN107791145A (en) 2018-03-13
DE102016116012A1 (en) 2018-03-01

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