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SG10201604835TA - Semiconductor device inspection device and semiconductor device inspection method - Google Patents

Semiconductor device inspection device and semiconductor device inspection method

Info

Publication number
SG10201604835TA
SG10201604835TA SG10201604835TA SG10201604835TA SG10201604835TA SG 10201604835T A SG10201604835T A SG 10201604835TA SG 10201604835T A SG10201604835T A SG 10201604835TA SG 10201604835T A SG10201604835T A SG 10201604835TA SG 10201604835T A SG10201604835T A SG 10201604835TA
Authority
SG
Singapore
Prior art keywords
semiconductor device
device inspection
inspection method
inspection
semiconductor
Prior art date
Application number
SG10201604835TA
Inventor
Tomonori Nakamura
Mitsunori Nishizawa
Original Assignee
Hamamatsu Photonics Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hamamatsu Photonics Kk filed Critical Hamamatsu Photonics Kk
Publication of SG10201604835TA publication Critical patent/SG10201604835TA/en

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26Testing of individual semiconductor devices
    • G01R31/265Contactless testing
    • G01R31/2656Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501Semiconductor wafers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R23/00Arrangements for measuring frequencies; Arrangements for analysing frequency spectra
    • G01R23/16Spectrum analysis; Fourier analysis
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/302Contactless testing
    • G01R31/308Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation
    • G01R31/311Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation of integrated circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10Measuring as part of the manufacturing process
    • H01L22/12Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00Features of devices classified in G01N21/00
    • G01N2201/12Circuits of general importance; Signal processing

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Electromagnetism (AREA)
  • Toxicology (AREA)
  • Manufacturing & Machinery (AREA)
  • General Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Mathematical Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Pathology (AREA)
  • Immunology (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Power Engineering (AREA)
  • Tests Of Electronic Circuits (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Measuring Leads Or Probes (AREA)
SG10201604835TA 2013-02-01 2014-01-30 Semiconductor device inspection device and semiconductor device inspection method SG10201604835TA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013018683 2013-02-01

Publications (1)

Publication Number Publication Date
SG10201604835TA true SG10201604835TA (en) 2016-07-28

Family

ID=51262384

Family Applications (3)

Application Number Title Priority Date Filing Date
SG11201505836WA SG11201505836WA (en) 2013-02-01 2014-01-30 Semiconductor device inspection device and semiconductor device inspection method
SG10201604835TA SG10201604835TA (en) 2013-02-01 2014-01-30 Semiconductor device inspection device and semiconductor device inspection method
SG11201505833XA SG11201505833XA (en) 2013-02-01 2014-01-30 Semiconductor device inspection device and semiconductor device inspection method

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG11201505836WA SG11201505836WA (en) 2013-02-01 2014-01-30 Semiconductor device inspection device and semiconductor device inspection method

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG11201505833XA SG11201505833XA (en) 2013-02-01 2014-01-30 Semiconductor device inspection device and semiconductor device inspection method

Country Status (5)

Country Link
US (4) US9618563B2 (en)
JP (3) JP5744353B2 (en)
KR (5) KR101679527B1 (en)
SG (3) SG11201505836WA (en)
WO (2) WO2014119676A1 (en)

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US9618563B2 (en) 2013-02-01 2017-04-11 Hamamatsu Photonics K.K. Semiconductor device inspection device and semiconductor device inspection method
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JP6714485B2 (en) 2016-09-28 2020-06-24 浜松ホトニクス株式会社 Semiconductor device inspection method and semiconductor device inspection apparatus
JP2018072290A (en) * 2016-11-04 2018-05-10 ルネサスエレクトロニクス株式会社 Fault location specification device and fault location specification method
US11719746B2 (en) * 2018-06-28 2023-08-08 Hitachi High-Tech Corporation Semiconductor inspection device
US11011435B2 (en) * 2018-11-20 2021-05-18 Asm Technology Singapore Pte Ltd Apparatus and method inspecting bonded semiconductor dice
JP7164488B2 (en) * 2019-05-31 2022-11-01 浜松ホトニクス株式会社 Semiconductor device inspection method and semiconductor device inspection apparatus
EP3979301A4 (en) * 2019-05-31 2023-06-28 Hamamatsu Photonics K.K. Semiconductor device examination method and semiconductor device examination device
US11133864B1 (en) * 2020-04-24 2021-09-28 Ciena Corporation Measurement of crosstalk
KR102425048B1 (en) * 2020-12-24 2022-07-27 큐알티 주식회사 Inspection apparatus of beam for testing of semiconductor, and method of inspection for beam
US20240255556A1 (en) * 2021-05-21 2024-08-01 Hitachi High-Tech Corporation Sample Inspection Apparatus
KR102586199B1 (en) * 2021-10-21 2023-10-06 큐알티 주식회사 Test method of power semiconductor device, and test system for the same
KR102418633B1 (en) * 2021-12-22 2022-07-07 큐알티 주식회사 A semiconductor device radiation test method, and a semiconductor device radiation test system
KR102518783B1 (en) * 2022-06-23 2023-04-06 큐알티 주식회사 Beam controller capable of adaptive deformation, a test apparatus for semiconductor device using the same, and a test method for semiconductor device using the same

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Also Published As

Publication number Publication date
KR101923846B1 (en) 2018-11-29
JPWO2014119675A1 (en) 2017-01-26
SG11201505833XA (en) 2015-08-28
JP5744353B2 (en) 2015-07-08
KR20170104637A (en) 2017-09-15
JP6389797B2 (en) 2018-09-12
WO2014119675A1 (en) 2014-08-07
US10191104B2 (en) 2019-01-29
US20170176521A1 (en) 2017-06-22
SG11201505836WA (en) 2015-09-29
KR20170069292A (en) 2017-06-20
JPWO2014119676A1 (en) 2017-01-26
US20160334459A1 (en) 2016-11-17
US10101383B2 (en) 2018-10-16
JP5745707B2 (en) 2015-07-08
US9562944B2 (en) 2017-02-07
KR101764560B1 (en) 2017-08-02
KR20160135845A (en) 2016-11-28
KR101679527B1 (en) 2016-11-24
US20150369755A1 (en) 2015-12-24
US9618563B2 (en) 2017-04-11
KR20150112954A (en) 2015-10-07
KR20150103686A (en) 2015-09-11
JP2015145883A (en) 2015-08-13
WO2014119676A1 (en) 2014-08-07
KR101777031B1 (en) 2017-09-08
US20150377959A1 (en) 2015-12-31

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