KR970024069A - 반도체장치 및 그 제조방법(semiconductor device and method of manufacturing semiconductor device) - Google Patents
반도체장치 및 그 제조방법(semiconductor device and method of manufacturing semiconductor device) Download PDFInfo
- Publication number
- KR970024069A KR970024069A KR1019960014648A KR19960014648A KR970024069A KR 970024069 A KR970024069 A KR 970024069A KR 1019960014648 A KR1019960014648 A KR 1019960014648A KR 19960014648 A KR19960014648 A KR 19960014648A KR 970024069 A KR970024069 A KR 970024069A
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- KR
- South Korea
- Prior art keywords
- substrate
- semiconductor device
- semiconductor chip
- hole
- external electrodes
- Prior art date
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 30
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 9
- 239000000758 substrate Substances 0.000 claims abstract 21
- 238000007747 plating Methods 0.000 claims 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 2
- 238000009713 electroplating Methods 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- 239000011347 resin Substances 0.000 claims 2
- 229920005989 resin Polymers 0.000 claims 2
- 229910000679 solder Inorganic materials 0.000 claims 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- 239000000919 ceramic Substances 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 239000010931 gold Substances 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- 230000017525 heat dissipation Effects 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
Classifications
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- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1532—Connection portion the connection portion being formed on the die mounting surface of the substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/156—Material
- H01L2924/15786—Material with a principal constituent of the material being a non metallic, non metalloid inorganic material
- H01L2924/15787—Ceramics, e.g. crystalline carbides, nitrides or oxides
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/161—Cap
- H01L2924/1615—Shape
- H01L2924/16152—Cap comprising a cavity for hosting the device, e.g. U-shaped cap
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/161—Cap
- H01L2924/1615—Shape
- H01L2924/16195—Flat cap [not enclosing an internal cavity]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/35—Mechanical effects
- H01L2924/351—Thermal stress
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- Engineering & Computer Science (AREA)
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- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Wire Bonding (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Abstract
Description
Claims (11)
- 중앙부에 오목부를 갖는 기판, 상기 오목부에 탑재된 반도체칩, 상기 기판상에 마련되고 외부에 접속되는 여러개의 외부전극, 상기 오목부를 덮는 덮개 및 상기 반도체 칩과 상기 기판 사이에 마련되고 상기 반도체칩에서 발생하는 열을 상기 기판으로 방열시키는 방열수단을 구비하는 것을 특징으로 하는 반도체장치.
- 제1항에 있어서, 상기 방열수단은 베이스재료, 상기 베이스재료내에 마련된 관통구멍 및 상기 관통구멍의 내벽에 마련된 구리도금막을 갖는 써멀비어를 포함하는 것을 특징으로 하는 반도체장치.
- 제2항에 있어서, 상기 써멀비어는 상기 관통구멍 내를 충전된 수지를 또 포함하는 것을 특징으로 하는 반도체장치.
- 제1항에 있어서, 상기 오목부는 그 안에 마련된 적어도 2단과 상기 각단에 마련된 와이어본드핑거를 포함하고, 역방향 본드와 정방향 본드가 상기 와이어본드핑거와 상기 반도체칩 사이의 접속을 위해 상기 각 단마다 교대로 실행되는 것을 특징으로 하는 반도체장치.
- 제1항에 있어서, 상기 덮개의 면적이 300mm2이상일 때 상기 덮개가 세라믹으로 구성되는 것을 특징으로 하는 반도체장치.
- 제1항에 있어서, 상기 기판과 상기 외부전극 사이에 마련된 랜드를 또 포함하고, 상기 랜드는 상기 기판상에 마련되고 1㎛이상의 두께를 갖는 니켈층을 구비한 제1전해도금층과 상기 제1전해도금층상에 마련되고 0.5㎛미만의 두께를 갖는 금층을 구비한 제2전해도금층을 포함하는 것을 특징으로 하는 반도체장치.
- 제1항에 있어서, 상기 외부전극의 각각에 대해서 마련되고 상기 기판을 관통해서 연장되어 있는 기판측 관통구멍과 상기 기판측 관통구멍의 내벽에 마련된 도금층을 또 포함하고, 상기 기판측 관통구멍의 내벽의 표면의 오목볼록위치의 최대높이차가 20㎛이하이고, 상기 내벽상의 상기 도금층이 20㎛이상의 두께를 갖고 있는 것을 특징으로 하는 반도체장치.
- 제7항에 있어서, 상기 기판측 관통구멍내에 충전된 수지를 또 포함하는 것을 특징으로 하는 반도체장치.
- 제7항에 있어서, 상기 기판측 관통구멍내에 충전된 금속을 또 포함하는 것을 특징으로 하는 반도체장치.
- 제7항에 있어서, 상기 기판측 관통구멍의 내벽에 마련된 도금층의 적어도 상기 기판의 표면에서 외부로 노출되어 있는 끝면을 덮는 땜납레지스트를 또 포함하는 것을 특징으로 하는 반도체장치.
- 그안에 마련된 오목부를 갖는 기판, 상기 오목부내에 탑재된 반도체 칩, 상기 기판상에 마련되고 실장시에 외부에 접속되는 여러개의 외부전극, 상기 오목부를 덮는 덮개, 상기 반도체칩와 상기 기판 사이에 마련되고 상기 반도체 칩에서 발생하는 열을 상기 기판으로 방열시키는 방열수단 및 상기 오목부에 마련된 각단에 마련된 와이어본드핑거를 구비한 반도체장치의 제조방법으로서, 상기 반도체칩상에 어긋난 배치로 배열한 패드를 마련하는 공정, 상기 오목부의 단 1개에 마련된 상기 와이어본드핑거에서 상기 패드의 1열을 향해서 역방향 본드로 본딩을 실행하는 공정 및 상기 역방향 본드로 본딩을 실행하는 공정에 이어서 다른 열의 상기 패드에서 상기단의 다른 단에 마련된 상기 와이어본드핑거를 향해서 정방향 본드로 본딩을 실행하는 공정을 포함하는 것을 특징으로 하는 반도체장치의 제조방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP25767195A JP3292798B2 (ja) | 1995-10-04 | 1995-10-04 | 半導体装置 |
JP95-257671 | 1995-10-04 |
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KR970024069A true KR970024069A (ko) | 1997-05-30 |
KR100228595B1 KR100228595B1 (ko) | 1999-11-01 |
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KR1019960014648A KR100228595B1 (ko) | 1995-10-04 | 1996-05-06 | 반도체장치 및 그 제조방법 |
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US (1) | US5814883A (ko) |
JP (1) | JP3292798B2 (ko) |
KR (1) | KR100228595B1 (ko) |
TW (1) | TW302528B (ko) |
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- 1996-05-01 US US08/640,504 patent/US5814883A/en not_active Expired - Lifetime
- 1996-05-06 KR KR1019960014648A patent/KR100228595B1/ko not_active IP Right Cessation
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KR100551576B1 (ko) * | 1999-11-02 | 2006-02-13 | 마츠시타 덴끼 산교 가부시키가이샤 | 반도체 장치 및 그 제조방법 |
KR100702970B1 (ko) * | 2005-07-06 | 2007-04-03 | 삼성전자주식회사 | 이원 접속 방식을 가지는 반도체 패키지 및 그 제조 방법 |
Also Published As
Publication number | Publication date |
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JP3292798B2 (ja) | 2002-06-17 |
US5814883A (en) | 1998-09-29 |
JPH09102559A (ja) | 1997-04-15 |
KR100228595B1 (ko) | 1999-11-01 |
TW302528B (ko) | 1997-04-11 |
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