KR890003982A - 다이아몬드, 도우프된 다이아몬드, 다이아몬드-큐빅 질화붕소 복합필름의 제조 방법 - Google Patents
다이아몬드, 도우프된 다이아몬드, 다이아몬드-큐빅 질화붕소 복합필름의 제조 방법 Download PDFInfo
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- KR890003982A KR890003982A KR1019880010481A KR880010481A KR890003982A KR 890003982 A KR890003982 A KR 890003982A KR 1019880010481 A KR1019880010481 A KR 1019880010481A KR 880010481 A KR880010481 A KR 880010481A KR 890003982 A KR890003982 A KR 890003982A
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- hydrogen
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/04—Diamond
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- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
- Carbon And Carbon Compounds (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
도면은 전공 챔버, 및 발명을 수행하기에 적합하고 본 발명 장치의 바람직한 실시양태에 포함시키기에 적합한 관련 장치의 수직 단면도이다.
Claims (19)
- 기질을 진공중에 지지시키고; 탄소원을 증발시켜 탄소원 및 기질사이의 영역(zone)에 탄소증기를 생성하고; 수소함유 기체를 상기 영역으로 도입시키고; 상기영역에 전기장을 생성시키고 전자를 상기 영역으로 편향시켜 탄소증기 및 수소함유 기체를 이온화 시키고 이온화된 탄소증기 및 수소함유 기체를 반응시켜 다이아몬드 전구체를 형성시킨후 언급된 기질상에 침착deposit)시키고 다이아몬드 함유 필름을 형성함을 특징으로 하여, 다이아몬드 함유 필름을 기질상에 침착시키는 방법.
- 제1항에 있어서, 탄소원이 그라파이트인 방법.
- 제2항에 있어서, 그라파이트가 전자빔(beam)에 의해 증발되는 방법.
- 제1항에 있어서, 수소함유 기체가 수소, 메탄, 에탄 및 기타 탄화수소 기체중에서 선택되는 방법.
- 제4항에 있어서, 수소함유 기체가 수소 및 탄화수소 기체의 혼합물 또는 수소 및 아르곤의 혼합물 또는 수소, 아르곤 및 탄화수소 기체의 혼합물인 방법.
- 제1항에 있어서, 기질이 스테인레스스틸, 몰리브덴, 유리, 석영, 실리콘 및 알루미늄중에서 선택되는 방법.
- 제1항에 있어서, 기질의 온도가 약 600 내지 1000℃로 유지시키는 방법.
- 제1항에 있어서, 수소 함유 기체의 분압이 약 2×10-4내지 20×10-3torr인 방법.
- 제8항에 있어서, 수소 함유 기체가 수소인 방법.
- 제1항에 있어서, 언급된 영역으로 편향되는 전자가 가열된 필라멘트에 의해 생성되는 방법.
- 제10항에 있어서, 필라멘트가 텅스텐, 탄탈룸, 몰리브덴 또는 탄소인 방법.
- 제1항에 있어서, 전자가 양극쪽으로 향하도록 촉진함으로써 전자를 언급된 영역으로 편향시키는 방법.
- 제10항에 있어서, 필라멘트에 의해 생성된 전자가 언급된 영역을 통해 양극쪽으로 향하도록 촉진되는 방법.
- 제13항에 있어서, 양극의 전위가 약 80 volt인 방법.
- 제1항에 있어서, 필름이 알루미늄, 리튬 또는 붕소와 같은 p 및 n형 도우프제(dopant)로 도우프된 방법.
- 제1항에 있어서, 다이아몬드 큐빅 질화붕소를 함유하는 필름이 침착되는 방법.
- 제15항에 있어서, 붕소 함유 기체를 언급된 영역으로 도입시켜 붕소 도우프된 다이아몬드를 함유하는 필름을 제공하는 방법.
- 제15항에 있어서, 트리메틸 알루미늄과 같은 금속 유기 화합물 증기를 언급된 영역으로 도입시켜 알루미늄 도우프된 다이아몬드를 함유하는 필름을 제공하는 방법.
- 제1항에 있어서, 수소 함유 기체가 CH4, 질소 및 수소를 함유하며 붕산/산화붕소를 탄소와 함께 공-증발 시킴으로서 큐빅 질화붕소 도우프된 다이아몬드를 함유하는 필름을 형성시키는 방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US087,141 | 1987-08-19 | ||
US07/087,141 US4816291A (en) | 1987-08-19 | 1987-08-19 | Process for making diamond, doped diamond, diamond-cubic boron nitride composite films |
Publications (1)
Publication Number | Publication Date |
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KR890003982A true KR890003982A (ko) | 1989-04-19 |
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Application Number | Title | Priority Date | Filing Date |
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KR1019880010481A KR890003982A (ko) | 1987-08-19 | 1988-08-18 | 다이아몬드, 도우프된 다이아몬드, 다이아몬드-큐빅 질화붕소 복합필름의 제조 방법 |
Country Status (8)
Country | Link |
---|---|
US (1) | US4816291A (ko) |
EP (1) | EP0304201A1 (ko) |
JP (1) | JPS6472993A (ko) |
KR (1) | KR890003982A (ko) |
BR (1) | BR8804197A (ko) |
CA (1) | CA1329791C (ko) |
IL (1) | IL87406A0 (ko) |
ZA (1) | ZA885917B (ko) |
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US4655893A (en) * | 1983-02-07 | 1987-04-07 | Battelle Development Corporation | Cubic boron nitride preparation utilizing a boron and nitrogen bearing gas |
US4412899A (en) * | 1983-02-07 | 1983-11-01 | Applied Coatings International, Inc. | Cubic boron nitride preparation utilizing nitrogen gas |
US4495044A (en) * | 1983-05-17 | 1985-01-22 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Diamondlike flakes |
US4656052A (en) * | 1984-02-13 | 1987-04-07 | Kyocera Corporation | Process for production of high-hardness boron nitride film |
CA1232228A (en) * | 1984-03-13 | 1988-02-02 | Tatsuro Miyasato | Coating film and method and apparatus for producing the same |
JPS60221566A (ja) * | 1984-04-18 | 1985-11-06 | Agency Of Ind Science & Technol | 薄膜形成装置 |
JPS61183458A (ja) * | 1985-02-08 | 1986-08-16 | Citizen Watch Co Ltd | 黒色イオンプレ−テイング膜 |
-
1987
- 1987-08-19 US US07/087,141 patent/US4816291A/en not_active Expired - Lifetime
-
1988
- 1988-08-05 EP EP88307269A patent/EP0304201A1/en not_active Withdrawn
- 1988-08-10 IL IL87406A patent/IL87406A0/xx unknown
- 1988-08-11 ZA ZA885917A patent/ZA885917B/xx unknown
- 1988-08-18 CA CA000575141A patent/CA1329791C/en not_active Expired - Fee Related
- 1988-08-18 KR KR1019880010481A patent/KR890003982A/ko not_active Application Discontinuation
- 1988-08-18 BR BR8804197A patent/BR8804197A/pt unknown
- 1988-08-19 JP JP63204901A patent/JPS6472993A/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20030064942A (ko) * | 2002-01-29 | 2003-08-06 | 오승준 | 스크래치 방지막을 가지는 조리 기구 및 그 제조방법 |
US8852406B2 (en) | 2012-05-03 | 2014-10-07 | Korea Institute Of Science And Technology | Method for synthesis of cubic boron nitride |
Also Published As
Publication number | Publication date |
---|---|
JPS6472993A (en) | 1989-03-17 |
IL87406A0 (en) | 1989-01-31 |
CA1329791C (en) | 1994-05-24 |
US4816291A (en) | 1989-03-28 |
EP0304201A1 (en) | 1989-02-22 |
ZA885917B (en) | 1989-04-26 |
BR8804197A (pt) | 1989-03-14 |
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