KR20240112309A - CoFeB target material and manufacturing method thereof - Google Patents

Abstract

The present invention relates to the field of sputtering target material technology, and particularly to a CoFeB target material and a manufacturing method thereof, the manufacturing method comprising: (1) melting a raw material blank; (2) secondary feed stage; (3) stirring step; (4) melt casting step; (5) It includes a manufacturing step of the target material. The manufacturing method of the present invention involves sequentially melting the raw material blank, secondary feed, and stirring, followed by casting the melt to directly obtain a CoFeB ingot with a uniform structure and excellent performance, followed by processes such as slicing, machining, and welding. CoFeB target material is manufactured through, and the obtained CoFeB target material has advantages such as high density, uniform structure, and low oxygen content (≤100 wtppm), and can satisfy magnetron sputtering requirements, magnetic head, It can be widely used in the manufacturing field of magnetoresistive sensors, magnetoresistive elements (MRAM), etc. In addition, the manufacturing method of the present invention can effectively solve the problem of poor plasticity and easy cracking due to increased B content.

Description

CoFeB target material and manufacturing method thereof

This application claims priority of the Chinese patent application No. 202211610998.8, filed on December 14, 2022, titled “CoFeB target material and method for manufacturing the same,” the entire disclosure of which is incorporated into this patent application. .

The present invention relates to the field of sputtering target material technology, and particularly to CoFeB target material and its manufacturing method.

Magnetoresistive memory (MRAM) has advantages such as non-volatility and fast read/write speed, and is expected to be a mainstream memory that will replace DRAM in the future. The basic memory unit of MRAM is a magnetic tunnel junction (MTJ), which consists of a free layer, tunnel barrier, and fixed layer. Currently, MTJ thin film structures are commonly manufactured using physical vapor deposition, especially magnetron sputtering, and a strong magnetic field is installed on the back of the target material to increase argon gas ionization to continuously bombard the target material atoms to deposit a plating film. do. The raw material used is a soft magnetic material target material containing B, for example, an alloy composed of elements such as Co, Fe, Ni, and boron. Currently, the most used and most mature alloy element system is the CoFeB ternary alloy. Because CoFeB is a soft magnetic alloy, its magnetic field transmission ability has a significant impact on the sputtering performance of the target material. When the permeability is <2%, the deposition rate of the plating film of the target material is greatly reduced, and there are even cases where arc does not occur at the beginning of sputtering.

Because the boron content of CoFeB alloy is high, especially when the boron share exceeds 30 at%, coarse, hard and brittle borides are formed when manufactured by conventional melting and casting methods, so the ingot is subjected to a cooling process. Cracks occur very easily, so forming of the material can hardly be realized. Normally, the occurrence of cracks is prevented by reducing the cooling rate of the ingot, but due to the addition of element B, when the cooling rate is reduced, segregation of components within the structure becomes more severe, and segregation leads to uneven distribution of alloy components, structure, and magnetic properties. As a result, it is difficult to secure the sputtering performance of the target material.

Another method to prevent cracking of CoFeB alloy is to use powder metallurgy sintering method. This method can prevent cracking and segregation problems based on ensuring uniform structure and composition, but because the surface area of the powder is large, Because the gas is easy to be adsorbed, it is difficult to obtain low gaseous impurity element content, especially low oxygen element content, and the oxygen content is generally above 150 wtppm. Therefore, target materials manufactured by powder metallurgy methods easily generate defective reactions such as particles during the sputtering process.

The present invention provides a CoFeB target material and a method of manufacturing the same to solve problems such as easy cracking and high impurity content in the conventional method of manufacturing CoFeB alloy.

According to a first aspect of the present invention, the present invention provides a method for producing a CoFeB target material comprising the following steps:

(1) Raw material blank melting step: The raw material blank containing cobalt, iron, and boron is smelted until melted to obtain a melt; Here, the melting point of the raw material blank ≤ 1200°C;

(2) Secondary feed step: At T°C, boron-containing secondary feed powder is added to the melt obtained in step (1), and then heat-retaining treatment is performed to obtain an alloy melt; Here, the melting point of the raw material blank ≤ T°C < the melting point of the secondary feed powder;

(3) Stirring step: stirring the alloy melt obtained in step (2) until the secondary feed powder is uniformly distributed in the melt;

(4) Melt casting step: Casting the alloy melt after the treatment in step (3) to obtain a CoFeB ingot;

(5) Manufacturing step of target material: CoFeB target material is manufactured using the CoFeB ingot obtained in step (4).

Figure 1 is a diagram of the Co-Fe-B ternary phase, where the dotted line area is the phase area where (Co, Fe) ₂ B, which has an alloy component melting point ≤ 1200°C, precipitates first. When manufacturing a CoFeB ingot with a boron content exceeding 30 at% by a conventional smelting method, the phase composition of the ingot structure consists of the primary (Co, Fe)B phase precipitated first, (Co, Fe)B phase, and (Co , Fe) It is a eutectic structure composed of ₂ B phases (see Figure 1), and since both of these phases are hard and brittle, their plasticity is poor, and the ingot cracks very easily during the cooling process, making forming difficult. is high. The core idea of the present invention is to divide the ingot component with high boron content into two parts, a parent phase component with low boron content (i.e., raw material blank) and a secondary feed powder component, and the parent phase component is (Co, Fe) ₂ It is adjusted to the phase region where B precipitates first (indicated in the dotted box in Figure 1). Adjusting the mother phase component to the corresponding region has two advantages: 1. When the mother phase component is in the corresponding region, the melting point is ≤1200℃, and when the mother phase component is completely melted, the secondary feed powder with a high melting point is prevented from melting. can be secured; 2. When the parent phase component is in the corresponding region, the final formed eutectic structure contains an fcc-Fe phase or bcc-Fe phase with excellent plasticity, adjusting the stress strain behavior during the cooling process, thereby improving the plastic forming characteristics of the alloy. . At the same time, the present invention introduces a large amount of nucleation particles of the primary phase that precipitates first into the melt through a method of introducing secondary feed powder from the secondary feed, thereby generating nuclei of the primary phase that precipitates first. By increasing the number, it plays a role in controlling the shape, quantity, and distribution of the primary phase that precipitates first, changing the coarse, unevenly distributed primary phase that precipitates first into a fine, uniform, diffusely distributed primary phase that precipitates first. Adjust it with The manufacturing method of the present invention involves sequentially melting the raw material blank, secondary feed, and stirring, followed by casting the melt to directly obtain a CoFeB ingot with a uniform structure and excellent performance, followed by processes such as slicing, machining, and welding. The CoFeB target material is manufactured through, and the obtained CoFeB target material has advantages such as high density, uniform structure, and low oxygen content (≤100 wtppm), and can satisfy magnetron sputtering requirements. The manufacturing method of the present invention can effectively solve the problems of poor plasticity and easy cracking due to increased B content.

In one possible design, in step (2), the atomic ratio of Fe to B in the secondary feed powder is (1-2):1.

Optionally, the atomic ratio of Fe and B in the secondary feed powder may be 1:1 or 1:2. If the atomic ratio of Fe and B is limited to (1-2): 1, the secondary feed powder can be made to have a high melting point, and the secondary feed powder is dissolved in the melt and loses its role in increasing the nucleation point. It can be understood that it can be effectively prevented. For example, the melting point of FeB alloy is 1398°C, and the melting point of Fe ₂ B alloy is 1625°C.

In one possible design, in step (1), the content of boron in the raw material blank is 18 at% to 27.5 at%.

It can be understood that by limiting the content of boron in the raw material blank to 18 at% to 27.5 at% in step (1), the melting point of the raw material blank can be effectively secured at ≤1200°C.

In one possible design, the secondary feed powder includes one or both of an iron boron compound or a cobalt boron compound; In step (2), the secondary feed powder is manufactured using powder atomization technology.

The secondary feed powder contains an iron boron compound or a cobalt boron compound and can be selected depending on the final alloy composition. It can be understood that secondary feed powder manufactured using atomization milling technology is more uniform and finer, which is more advantageous for uniform distribution in the subsequent melt.

In one possible design, the atomization milling process is protected using an inert gas.

Optionally, the inert gas may be helium gas, neon gas, argon gas, krypton gas, or xenon gas, etc. Since the melting point of boride is high, it can be understood that it must be protected using an inert gas during the atomization milling process to prevent oxidation.

In one possible design, in step (2) above, 1200°C≤T°C≤1300. Preferably, T°C is 1250°C.

By controlling the T℃ between 1200℃ and 1300℃, it is possible to ensure that the secondary feed powder with a high melting point does not melt when the raw material blank is completely melted, thereby eliminating a large number of nucleation particles of the primary phase that precipitate first in the melt. It can be understood that it can be introduced.

In one possible design, in step (3), the agitation uses electromagnetic agitation; The temperature of the electromagnetic stirring is 1200°C to 1300°C, preferably 1250°C. Specifically, alternating current is used in the electromagnetic stirring process.

In order to ensure uniform distribution of the secondary feed powder in the melt, electromagnetic stirring technology is used to apply a shear force to the metal melt, thereby forming a shear flow in the metal melt to realize uniform distribution of nucleated particles. You can. At the same time, electromagnetic stirring can improve the temperature uniformity of the metal melt, reduce the temperature gradient of the ingot surface and core portion, and reduce macro segregation during the solidification process. Furthermore, by limiting the temperature of electromagnetic stirring to 1200°C to 1300°C, it is possible to ensure that the secondary feed powder with a high melting point does not melt when the raw material blank is completely melted.

In one possible design, step (4) is performed by injecting the alloy melt after the treatment in step (3) into a mold chamber to form a casting; Preferably, the mold is a graphite crucible.

It can be understood that when using a graphite crucible, it is possible to prevent stress cracks from occurring in the ingot due to excessive temperature difference between the surface and core of the ingot due to excessive cooling rate.

In one possible design, in step (5), based on obtaining the CoFeB ingot, obtain a CoFeB target blank through slicing and machining, and then determine whether a back plate should be welded as necessary. and; If the back plate needs to be welded, soldering is performed using In solder; The material of the back plate is selected from oxygen-free copper, copper alloy, aluminum or aluminum alloy.

According to a second aspect of the present invention, the present invention provides a CoFeB target material produced using the above production method; The permeability of the CoFeB target material is ≥9%; The CoFeB target material has an O content≤100 wtppm.

The CoFeB target material of the present invention has uniform microstructure distribution, high permeability, low gas impurity element content, and can satisfy the client's magnetron sputtering performance requirements.

In one possible design, the B content of the CoFeB target material is >20 at%; The CoFeB target material has Al content ≤ 22 wtppm, Cu content ≤ 11 wtppm, Si content ≤ 58 wtppm, C content ≤ 80 wtppm, O content ≤ 81 wtppm, and N content ≤ 45 wtppm.

The present invention provides a method for manufacturing a CoFeB target material, which involves sequentially melting the raw material blank, secondary feed, and stirring, followed by casting the melt to directly obtain a CoFeB ingot with a uniform structure and excellent performance, Afterwards, the CoFeB target material is manufactured through processes such as slicing, machining, and welding. The obtained CoFeB target material has advantages such as high density, uniform structure, and low oxygen content (≤100 wtppm), and is used in magnetrons. It can satisfy sputtering requirements and can be widely used in the manufacturing fields of magnetic heads, magnetoresistive sensors, and magnetoresistive elements (MRAM). In addition, the manufacturing method of the present invention can effectively solve the problem of poor plasticity and easy cracking due to increased B content, and can produce high boron (B≥30 at%) CoFeB target material with excellent performance. there is.

In order to more clearly explain the technical solution of the present invention or the prior art, the drawings necessary for description of the embodiments or the prior art will be briefly described below. The drawings described below are some embodiments of the present invention, and those skilled in the art It is obvious that other drawings can be obtained according to these drawings, provided that no creative labor is performed.
Figure 1 is a diagram of the Co-Fe-B ternary phase provided by the present invention.
Figure 2 is a process flow diagram of the method for manufacturing the CoFeB target material provided by the present invention.

In order to make the purpose, technical solution, and advantages of the present invention clearer, the following will clearly and completely explain the technical solution of the present invention by combining the drawings of the present invention, and the described embodiments are all implementations of the present invention. It is obvious that these are some embodiments rather than examples. Based on the embodiments of the present invention, all other embodiments obtained by a person skilled in the art without creative labor shall fall within the protection scope of the present invention.

In the following examples and comparative examples, in the test method for the impurity content of the target material, metal elements were detected using GDMS, and gas elements were detected using LECO.

Example 1:

This embodiment aims at producing a high boron alloy target material whose alloying ingredient is Co ₃₅ Fe ₃₅ B ₃₀ , and the flow chart of the manufacturing method is as shown in Figure 2 and includes the following steps:

Step (1) Melting the raw material blank: pickling the iron sheet and cobalt sheet, ultrasonic cleaning and blow-drying, weighing 142.1 g of cobalt sheet, 25.9 g of iron sheet, and 12 g of boron block, then placing them in a refractory crucible. Vacuum induction smelting is performed, and the CoFeB master alloy component (atomic ratio) according to the corresponding ratio is Co _60.8 Fe _11.7 B _27.5 , and its melting point is below 1200 ℃, and can be vacuum induced until completely melted at 1200 ℃. there is. After the raw material blank melted down, the melt temperature was controlled to about 1250°C.

Step (2) Preparation of secondary feed powder: Secondary feed powder was obtained through gas atomization milling according to the Fe:B atomic ratio = 2:1, and 120 g was weighed. Secondary feed: Under the premise that the raw material blank is completely melted and the melt temperature is stabilized at ≤1300°C, the secondary feed powder manufactured through the secondary feed system is added to the melt in step (1) and then subjected to thermal insulation treatment. was performed for 20 min to obtain an alloy melt.

Step (3) Electromagnetic stirring: The alloy melt obtained in step (2) was transferred to a thermal insulation furnace at 1250°C, and electromagnetic stirring was performed by supplying alternating current to the coil until the secondary feed powder was uniformly distributed in the melt.

Step (4) Melt casting: The alloy melt after the treatment in step (3) was injected into a graphite mold chamber to obtain a Co ₃₅ Fe ₃₅ B ₃₀ ingot with a uniform structure and no cracks.

Step (5) Preparation of target material: A CoFeB target blank was obtained through the method of slicing and machining, and sliced using wire cutting to obtain an initial CoFeB target blank, and then precision dimensional processing was performed. Finally, soldering was performed using In solder and an oxygen-free copper backplate to obtain a high boron CoFeB alloy target material that satisfies the sputtering requirements.

As shown in Table 1, the impurity contents (wt) of the target materials in Example 1 are as follows: Al - 22 ppm, Cu - 10 ppm, Si - 43 ppm, C - 80 ppm, O - 75 ppm, N - 30 ppm.

Example 2

This example aims at producing a high boron alloy target material whose alloying element is Co ₂₅ Fe ₄₀ B ₃₅ , and the production method includes the following steps:

Step (1) Melting the raw material blank: pickling the iron sheet and cobalt sheet, ultrasonic cleaning and blow-drying, weighing 179.7 g of cobalt sheet, 139.6 g of iron sheet, and 20.7 g of boron block, then placing them in a refractory crucible. Vacuum induction smelting is performed, and the CoFeB master alloy component (atomic ratio) according to the corresponding ratio is Co ₄₁ Fe _33.6 B _25.4 , and its melting point is below 1200 ℃, and can be vacuum induced until completely melted at 1200 ℃. there is. After the raw material blank melted down, the melt temperature was controlled to below 1250°C.

Step (2) Preparation of secondary feed powder: Secondary feed powder was obtained through gas atomization milling according to the Fe:B atomic ratio = 1:1, and 160 g was weighed. Secondary feed: Under the premise that the raw material blank is completely melted and the melt temperature is stabilized at ≤1300°C, the secondary feed powder manufactured through the secondary feed system is added to the melt in step (1) and then subjected to thermal insulation treatment. was performed for 30 min to obtain an alloy melt.

Step (3) Electromagnetic stirring: The alloy melt obtained in step (2) was transferred to a thermal insulation furnace at 1250°C, and electromagnetic stirring was performed by supplying alternating current to the coil until the secondary feed powder was uniformly distributed in the melt.

Step (4) Melt casting: The alloy melt after the treatment in step (3) was injected into the mold chamber to obtain a Co ₂₅ Fe ₄₀ B ₃₅ ingot with a uniform structure and no cracks.

Step (5) Preparation of target material: A CoFeB target blank was obtained through slicing and machining, and the initial CoFeB target blank was obtained by slicing using wire cutting, and then precision dimensional processing was performed. Finally, soldering was performed using In solder and an oxygen-free copper backplate to obtain a high boron CoFeB alloy target material that satisfies the sputtering requirements.

As shown in Table 1, the impurity contents (wt) of the target materials in Example 2 are as follows: Al - 18 ppm, Cu - 8 ppm, Si - 58 ppm, C - 77 ppm, O - 81 ppm, N - 45 ppm.

Example 3

This example aims at producing an alloy target material whose alloying element is Co ₂₀ Fe ₆₀ B ₂₀ , and the manufacturing method includes the following steps:

Step (1) Melting the raw material blank: pickling the iron sheet and cobalt sheet, ultrasonic cleaning and blow-drying, weighing 123.8 g of cobalt sheet, 303 g of iron sheet, and 18.2 g of boron block, then placing them in a refractory crucible. Vacuum induction smelting is performed, and the CoFeB master alloy component (atomic ratio) according to the corresponding ratio is Co ₂₃ Fe ₅₉ B ₁₈ , and its melting point is below 1200 ℃, and can be vacuum induced until completely melted at 1200 ℃. there is. After the raw material blank melted down, the melt temperature was controlled to below 1250°C.

Step (2) Preparation of secondary feed powder: Secondary feed powder was obtained through gas atomization milling according to the Fe:B atomic ratio = 2:1, and 55 g was weighed. Secondary feed: Under the premise that the raw material blank is completely melted and the melt temperature is stabilized at ≤1300°C, the secondary feed powder manufactured through the secondary feed system is added to the melt in step (1) and then subjected to thermal insulation treatment. was performed for 15 min to obtain an alloy melt.

Step (3) Electromagnetic stirring: The alloy melt obtained in step (2) was transferred to a thermal insulation furnace at 1250°C, and electromagnetic stirring was performed by supplying alternating current to the coil until the secondary feed powder was uniformly distributed in the melt.

Step (4) Melt casting: The alloy melt after the treatment in step (3) was injected into a graphite mold chamber to obtain a Co ₂₀ Fe ₆₀ B ₂₀ ingot with a uniform structure and no cracks.

Step (5) Preparation of target material: A CoFeB target blank was obtained through slicing and machining, and the initial CoFeB target blank was obtained by slicing using wire cutting, and then precision dimensional processing was performed. Finally, soldering was performed using In solder and an oxygen-free copper backplate to obtain a high boron CoFeB alloy target material that satisfies the sputtering requirements.

As shown in Table 3, the permeability of Example 3 was 9%, which satisfies the arc generation requirements of magnetron sputtering.

Comparative Example 1:

Co ₃₅ Fe ₃₅ B ₃₀ alloy components were directly milled by gas atomization, 300 g of powder with a particle size ≤ 200 μm was screened, and sintering treatment was performed at 1250 ° C. for 5 h to obtain a cobalt iron boron alloy target blank. , no cracks occurred in the target blank. As shown in Table 1, the impurity content (wt) of the target material obtained in Comparative Example 1 is as follows: Al - 50 ppm, Cu - 33 ppm, Si - 64 ppm, C - 140 ppm, O - 120 ppm, N - 80 ppm. As can be seen from this, the purity of the target material of Comparative Example 1 is lower than that of Example 1, and the gas element content is significantly increased. As a result, many particles are generated in the target material during the magnetron sputtering process, deteriorating thin film performance. I order it.

Comparative Example 2:

Cobalt, iron powder, and boron blocks are milled through mechanical grinding, blended with Co ₃₅ Fe ₃₅ B ₃₀ alloy components, 300 g of powder with a particle size ≤ 200 μm is screened, and sintering treatment is performed at 1100°C for 3 h. Thus, a cobalt iron boron alloy target blank was obtained, and no cracks occurred in the target blank. As shown in Table 1, the impurity content (wt) of the target material obtained in Comparative Example 2 is as follows: Al - 44 ppm, Cu - 35 ppm, Si - 78 ppm, C - 162 ppm, O - 134 ppm, N - 99 ppm.

Comparison table of impurity contents of target materials obtained in Examples and Comparative Examples Al Cu Si C O N Example 1 22 10 43 80 75 30 Example 2 18 8 58 77 81 45 Example 3 19 11 54 73 70 33 Comparative Example 1 50 33 64 140 120 80 Comparative Example 2 44 35 78 162 134 99

Unit: wtppm As shown in Table 1, through comparison of Examples 1 and 2 with Comparative Examples 1 and 2, manufacturing a CoFeB target material using the manufacturing method of the present invention has the following characteristics: the content of impurity elements, In particular, it is advantageous for controlling the content of gas elements such as oxygen and nitrogen, and it can effectively reduce the number of particles that appear during the sputtering process of the target material.

Comparative Example 3:

Co ₃₅ Fe ₃₅ B ₃₀ The raw materials are mixed with the target material ingredients: 142.1 g of cobalt sheet, 135.1 g of iron sheet, and 22.8 g of boron block are directly vacuum induction smelted, completely melted, and then cast into a graphite mold and taken out of the furnace. When cracks occurred in the target material, it was confirmed that molding was impossible.

Comparative Example 4:

Co ₂₅ Fe ₄₀ B ₃₅ The raw materials are mixed with the target material ingredients: 179.7 g of cobalt sheet, 273.3 g of iron sheet, and 47 g of boron block are directly vacuum induction smelted, completely melted, and then cast into a graphite mold and taken out of the furnace. When cracks occurred in the target material, it was confirmed that molding was impossible.

Comparison table of molding performance of target materials obtained in Examples and Comparative Examples molding performance Example 1 molded Example 2 molded Comparative Example 3 Cracks occur Comparative example 4 Cracks occur

As shown in Table 2, through comparison of Examples 1 and 2 with Comparative Examples 3 and 4, the manufacturing method of the present invention can realize molding manufacturing of high boron content CoFeB alloy and greatly improve the actual yield. It can be seen that this can be done and production efficiency can be improved.

Comparative Example 5:

Co ₂₀ Fe ₆₀ B ₂₀ The raw materials were mixed with the target material ingredients: 123.8 g of cobalt sheet, 353.1 g of iron sheet, and 23.1 g of boron block were directly vacuum induction smelted, completely melted, and then directly cast into a graphite mold, and placed in a furnace. No cracks were found in the target material when taken out, but the permeability was only 2%, and it was not easy for the target material to generate arc during magnetron sputtering.

Permeability of target materials obtained in Example 3 and Comparative Example 5 permeability Example 3 9% Comparative Example 5 2 %

As a result of comparing Example 3 and Comparative Example 5, as shown in Table 3, the method for manufacturing the CoFeB target material provided by the present invention can effectively improve the tissue uniformity and improve the magnetic properties of the target material. It can be seen that the manufactured target material has excellent magnetron sputtering performance.

Industrial applicability

The present invention provides a CoFeB target material and a manufacturing method thereof, the manufacturing method comprising: (1) melting a raw material blank; (2) secondary feed stage; (3) stirring step; (4) melt casting step; (5) It includes a manufacturing step of the target material. The manufacturing method of the present invention involves sequentially melting the raw material blank, secondary feed, and stirring, followed by casting the melt to directly obtain a CoFeB ingot with a uniform structure and excellent performance, followed by processes such as slicing, machining, and welding. CoFeB target material is manufactured through, and the obtained CoFeB target material has advantages such as high density, uniform structure, and low oxygen content (≤100 wtppm), and can satisfy magnetron sputtering requirements, magnetic head, It can be widely used in the manufacturing field of magnetoresistive sensors, magnetoresistive elements (MRAM), etc. In addition, the manufacturing method of the present invention can effectively solve the problems of poor plasticity and easy cracking due to increased B content, and has excellent economic value and application prospects.

Lastly, the above examples are only for illustrating the technical solution of the present invention and do not limit it; Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art may still modify the technical solutions described in the foregoing embodiments or replace some technical features equivalently; In addition, it will be understood that such modifications or substitutions do not depart from the spirit and scope of the technical solution of each embodiment of the present invention.

Claims (10)

(1) Raw material blank melting step: The raw material blank containing cobalt, iron, and boron is smelted until melted to obtain a melt; Here, the melting point of the raw material blank ≤ 1200°C;
(2) Secondary feed step: At T°C, boron-containing secondary feed powder is added to the melt obtained in step (1), and then heat preservation treatment is performed to obtain an alloy melt; Here, the melting point of the raw material blank ≤T°C < the melting point of the secondary feed powder;
(3) Stirring step: stirring the alloy melt obtained in step (2) until the secondary feed powder is uniformly distributed in the melt;
(4) Melt casting step: Casting the alloy melt after the treatment in step (3) to obtain a CoFeB ingot;
(5) Manufacturing step of target material: A method of manufacturing a CoFeB target material, comprising the step of manufacturing a CoFeB target material using the CoFeB ingot obtained in step (4). The manufacturing method according to claim 1, wherein in step (2), the atomic ratio of Fe to B in the secondary feed powder is (1-2):1. The method according to claim 1 or 2, wherein in step (2), the secondary feed powder contains one or both of an iron boron compound and a cobalt boron compound; A manufacturing method, characterized in that the secondary feed powder is manufactured using atomization milling technology. The manufacturing method according to claim 3, wherein the atomization milling process is protected using an inert gas. The manufacturing method according to claim 1, wherein in step (1), 1200℃≤T℃≤1300℃. The method according to claim 1, wherein in step (3), the stirring uses electromagnetic stirring; A manufacturing method characterized in that the temperature of the electromagnetic stirring is 1200°C to 1300°C. The method of claim 1, wherein in step (4), the alloy melt after the treatment in step (3) is injected into a mold chamber to form a casting; Preferably, the manufacturing method is characterized in that the mold uses a graphite crucible. The method of claim 1, wherein in step (5), based on obtaining the CoFeB ingot, a CoFeB target blank is obtained through slicing and machining, and then, if necessary, it is determined whether or not the back plate should be welded. ; If the back plate needs to be welded, soldering is performed using In solder; A manufacturing method, characterized in that the material of the back plate is selected from oxygen-free copper, copper alloy, aluminum, or aluminum alloy. A CoFeB target material manufactured using the manufacturing method of any one of claims 1 to 8,
The permeability of the CoFeB target material is ≥9%; The CoFeB target material is characterized in that the CoFeB target material has an O content≤100 wtppm. The method of claim 9, wherein the B content of the CoFeB target material is ≧20 at%; The CoFeB target material has Al content ≤ 22 wtppm, Cu content ≤ 11 wtppm, Si content ≤ 58 wtppm, C content ≤ 80 wtppm, O content ≤ 81 wtppm, and N content ≤ 45 wtppm.