KR20190038515A - Substrate processing apparatus, apparatus management controller, program and method of manufacturing semiconductor device - Google Patents

Abstract

The present invention provides a configuration capable of promoting time reduction in abnormal interpretation investigation. Provided is a substrate processing apparatus which comprises: an operating unit to transmit device data generated while executing a recipe including a plurality of steps to a memory unit; and a data matching control unit to compare a plurality of the device data stored in the memory unit. The data matching control unit includes: a selection unit to select a recipe executed in a condition identical to a recipe with abnormalities from the memory unit; an acquisition unit to acquire the device data from the recipe with the abnormalities and the recipe selected by the selection unit; and a calculation unit to calculate the difference of the acquired device data. The data matching control unit searches in the memory unit, reads a plurality of recipes executed in the condition identical to the searched recipe with the abnormalities, acquires the device data from the read recipes, and calculates a matching rate based on the difference of the device data acquired from the plurality of recipes and the device data between the recipes with the abnormalities.

Description

TECHNICAL FIELD [0001] The present invention relates to a substrate processing apparatus, a device management controller, a program, and a manufacturing method of a semiconductor device. BACKGROUND OF THE INVENTION 1. Field of the Invention [0001]

The present invention relates to a substrate processing apparatus, a device management controller, a program, and a manufacturing method of a semiconductor device.

In the field of semiconductor manufacturing, information of a device such as a substrate processing apparatus is accumulated in a server in order to improve a device operation rate or a production efficiency. The accumulated information can be used when analyzing the trouble of the apparatus or monitoring the status of the apparatus. As used herein, the term " trouble " refers to an abnormal situation such as an abnormal situation when a film is formed or a device stop due to a failure of the apparatus.

When the method of specifying the cause of the conventional trouble is applied to a device in which a large amount of data is held at the time of substrate processing, the efficiency is low, a considerable time is required to identify the cause of the trouble, and a large amount of data is used. Therefore, the method of specifying the cause of the conventional trouble can be changed according to the ability of the repair source to analyze the trouble. In addition, due to reasons such as omission of important data, when the conventional trouble is analyzed, the cause of the trouble can not be specified in some cases. Therefore, various studies have been made in order to improve the operation rate of the apparatus by specifying the cause of the abnormality quickly when analyzing the trouble.

For example, Patent Document 1 describes a method of collectively comparing files used in a substrate processing apparatus connected to a management apparatus, and correcting the difference when a difference is extracted as a result of comparing files. Also, in Patent Document 2, it is described to compare files among conventional recipes, for example, to compare files of process recipe A and process recipe B. The advantage of comparing these files is that they can easily extract different data between files. By analyzing the trouble using the function of comparing files, it is expected that the efficiency of specifying the cause of abnormality is improved.

1. International Publication No. WO2014 / 189045 2. Japanese Patent No. 4587753

An object of the present invention is to provide a technique capable of shortening the time for analyzing an abnormality.

According to an aspect of the present invention, there is provided an apparatus comprising: an operation unit for transmitting device data generated during execution of a recipe including a plurality of steps to a storage unit; And a data matching control unit for collating a plurality of the device data stored in the storage unit, wherein the data matching control unit stores a recipe executed under the same conditions as the recipe in which an abnormal phenomenon occurs, A selection unit for selecting from among the plurality of selection units; An acquisition unit for acquiring the device data from each of the recipe where the abnormal phenomenon occurs and the recipe selected by the selection unit; And a calculation unit for calculating a difference between the acquired device data and the data matching control unit searches the storage unit and reads a plurality of recipes executed under the same conditions as the recipe in which the abnormal phenomenon occurred And acquiring the device data from the read plurality of recipes and calculating a matching rate based on a difference between the device data acquired from the plurality of recipes and the recipe in which the abnormal phenomenon occurs, A technique including a processing apparatus is provided.

INDUSTRIAL APPLICABILITY According to the present invention, it is possible to shorten the time for analyzing an abnormality of an apparatus in which an abnormality occurs and to reduce the apparatus stoppage time.

1 is a perspective view showing a substrate processing apparatus suitably used in an embodiment of the present invention;
2 is a side cross-sectional view showing a substrate processing apparatus preferably used in an embodiment of the present invention.
3 is a functional block diagram of a control system preferably used in an embodiment of the present invention;
4 is a diagram showing a functional configuration of a main controller preferably used in an embodiment of the present invention.
5 is a view showing a configuration of a substrate processing system preferably used in an embodiment of the present invention.
6 is a diagram for explaining a functional configuration of a device management controller preferably used in an embodiment of the present invention.
FIG. 7A is a diagram illustrating a functional configuration of a device status monitoring control unit according to an embodiment of the present invention, and FIG. 7B is a functional configuration diagram of a data matching control unit according to an embodiment of the present invention. FIG.
FIG. 8 is a diagram for explaining device data acquired by the device status monitoring control unit according to an embodiment of the present invention; FIG.
9 is a diagram for explaining device data to be subjected to file comparison according to an embodiment of the present invention.
10 is a diagram showing an example of a processing flow executed by the data matching control unit according to an embodiment of the present invention;
11 is a diagram illustrating an example of a matching rate according to an embodiment of the present invention.
12 is a diagram illustrating an example of a method of calculating a threshold value used for calculation of a matching rate according to an embodiment of the present invention;
FIG. 13 is an exemplary illustration of matching rates of device data according to an embodiment of the present invention in a low order; FIG.
14 is a diagram for explaining a file comparison function according to another embodiment of the present invention;
15 is a view exemplarily showing a performance evaluation waveform (waveform) table according to another embodiment of the present invention;
FIG. 16 exemplarily shows a contrast history screen according to an embodiment of the present invention; FIG.
FIG. 17 exemplarily shows a data detail display screen according to an embodiment of the present invention; FIG.
18 illustrates an example of raw waveform data according to an embodiment of the present invention.
19 exemplarily shows a result of a recipe comparison according to an embodiment of the present invention;

<Overview of substrate processing apparatus>

DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, an embodiment of the present invention will be described with reference to the accompanying drawings. First, with reference to Figs. 1 and 2, a description will be given of a substrate processing apparatus 1 (hereinafter simply referred to as " apparatus ") in which the present invention is embodied.

The substrate processing apparatus 1 includes a housing 2. An opening 4 (front maintenance opening) is provided in the lower portion of the front wall 3 of the housing 2 so as to be able to be maintained. The opening 4 is opened and closed by the front maintenance door 5.

The pod loading and unloading port 6 is provided in the front wall 3 of the housing 2 so as to communicate with the inside and the outside of the housing 2. The pod loading and unloading opening 6 is opened and closed by the front shutter 7, A load port 8 is provided on the forward front side of the exit port 6 and the load port 8 is configured to align the pod 9 placed thereon.

The pod 9 is an enclosed substrate transfer container and is carried on the load port 8 by the in-process transfer device (not shown) and is taken out from the load port 8.

A rotary pod shelf 11 is provided at an upper portion of the housing 2 at a substantially central portion in the longitudinal direction and the rotary pod shelf 11 is configured to store a plurality of pods 9. [

The rotary pod rack 11 includes a vertically deployed pillar 12 which is intermittently rotated and a plurality of stages of shelf plates 13 radially supported on the pillar 12 at angular positions at the bottom of the floor, (13) is configured to store the plurality of pods (9) in a mounted state.

A pod opener 14 is provided below the rotary pod shelf 11 and the pod opener 14 includes a configuration capable of placing the pod 9 and opening and closing the lid of the pod 9 do.

A pod carrying mechanism 15 is provided between the load port 8 and the rotary pod rack 11 and the pod opener 14. The pod carrying mechanism 15 holds the pod 9 and holds it The pod 9 is constructed so as to be able to move forward and backward in the horizontal direction and to carry the pod 9 between the load port 8, the rotary pod rack 11 and the pod opener 14.

A sub-light body 16 is provided at the lower portion in the front and rear direction in the housing 2 at the substantially central portion over the rear end. A pair of wafer loading / unloading openings 19 for loading / unloading wafers 18 (hereinafter also referred to as substrates) into / from the sub-housings 16 are provided in the front wall 17 of the sub housing body 16, And a pod opener 14 is provided to the upper and lower wafer loading / unloading openings 19, respectively.

The pod opener 14 includes a mounting table 21 for mounting the pod 9 and an opening and closing mechanism 22 for opening and closing the lid of the pod 9. [ The pod opener 14 is configured to open and close the lid of the pod 9 placed on the table 21 by opening and closing the opening and closing mechanism 22 to open and close the wafer entrance of the pod 9. [

The sub housing 16 constitutes a transfer chamber 23 airtight in a space (a pod transfer space) where the pod conveying mechanism 15 and the rotary pod rack 11 are disposed. A wafer transfer mechanism 24 (a substrate transfer mechanism) is provided on the front side of the transfer chamber 23 and the substrate transfer mechanism 24 transfers the required number of substrates 18 (five in the figure) And the wafer mount plate 25 is rotatable in the horizontal direction and movable up and down so that the wafer mount plate 25 can be linearly moved in the horizontal direction. The substrate 18 is loaded and unloaded with respect to the substrate 18.

The rear portion of the transfer chamber 23 is provided with a standby portion 27 for receiving and waiting the boat 26. A vertically extending process is provided above the standby portion 27, (28). The processing chamber 28 is formed with a processing chamber 29 therein. The lower end of the processing chamber 29 is formed into a nose portion, and the nose portion is opened and closed by a nose shutter 31.

A boat elevator 32 as a lifting mechanism for lifting and lowering the boat 26 is provided between the right end of the housing 2 and the right end of the standby portion 27 of the sub- A seal cap 34 as a lid is horizontally mounted on an arm 33 connected to a platform of the boat elevator 32. The seal cap 34 vertically supports the boat 26 And the chamber 26 can be hermetically closed in a state in which the boat 26 is charged into the processing chamber 29.

The boat 26 is configured to hold a plurality of (for example, about 50 to about 125) substrates 18 in a multistage manner in a horizontal posture in alignment with the center thereof.

A clean unit 35 is disposed at a position opposite to the boat elevator 32 side and the clean unit 35 is provided with a cleaned atmosphere or a supply fan and dustproof so as to supply clean air 36, Filter. A notch aligning device (not shown), which is a substrate aligning device for aligning the position of the substrate 18 in the circumferential direction, is provided between the substrate transfer mechanism 24 and the clean unit 35.

The clean air 36 discharged from the clean unit 35 is sucked by a notch matching device (not shown) and a substrate transfer mechanism 24 and a duct not shown after being circulated in the boat 26, And is configured to be exhausted to the outside or to be discharged into the transfer chamber 23 by the clean unit 35.

Next, the operation of the substrate processing apparatus 1 will be described.

When the pod 9 is supplied to the load port 8, the pod loading and unloading port 6 is opened by the front shutter 7. [ The pod 9 on the load port 8 is carried into the inside of the housing 2 by the pod carrying device 15 through the pod carrying-in and-out port 6 and the designated shelf plate 13 ). The pod 9 is temporarily stored in the rotary pod rack 11 and then transported from the shelf plate 13 to one of the pod openers 14 by the pod carrying device 15, Or is transferred to the mounting table 21 directly from the load port 8. [

At this time, the wafer loading / unloading port 19 is closed by the opening / closing mechanism 22, and the transfer chamber 23 is filled with the clean air 36. The oxygen concentration in the imidation chamber 23 is lower than the oxygen concentration in the interior of the housing 2 because nitrogen gas is filled in the imidation chamber 23 as the clean air 36. [

The end face of the pod 9 placed on the mount table 21 is positioned such that the end face of the pod 9 placed on the mount stand 21 faces the edge of the opening of the wafer loading / unloading port 19 in the front wall 17 of the sub- And the lid is removed (removed) by the opening / closing mechanism 22, so that the wafer entrance is opened.

When the pod 9 is opened by the pod opener 14, the substrate 18 is taken out of the pod 9 by the substrate transfer mechanism 24 and transferred to a notch registration device (not shown) After aligning the substrate 18 in the notch aligning device, the substrate transfer mechanism 24 brings the substrate 18 into the standby portion 27 at the back of the transfer chamber 23 and charges the boat 26.

A substrate transfer mechanism 24 that is capable of transferring the substrate 18 to the boat 26 is returned to the pod 9 and the next substrate 18 is loaded into the boat 26.

(Lower or upper) pod opener 14 during the loading operation of the substrate 18 to the boat 26 by the substrate transferring mechanism 24 in one (top or bottom) pod opener 14, Another pod 9 from the shelf 11 is transported and transferred by the pod carrying device 15 and the opening operation of the pod 9 by the other pod opener 14 proceeds simultaneously.

When the predetermined number of substrates 18 are loaded on the boat 26, the nogh portion of the processing furnace 28 closed by the nogh shutter 31 is opened by the noghut shutter 31. Subsequently, the boat 26 is raised by the boat elevator 32 and loaded (loaded) into the processing chamber 29.

After the loading, the seal cap 34 closes the nostril portion hermetically. Further, in the present embodiment, it includes a purge process (pre-purge process) in which the atmosphere inside the process chamber 29 is replaced with an inert gas after loading.

And is evacuated by a gas exhaust mechanism (not shown) so that the processing chamber 29 becomes a desired pressure (vacuum degree). In addition, the processing chamber 29 is heated to a predetermined temperature by a heater driving unit (not shown) so as to have a desired temperature distribution.

A process gas controlled at a predetermined flow rate is supplied by a gas supply mechanism (not shown), and a process gas is supplied to the surface of the substrate 18 in contact with the surface of the substrate 18 A predetermined process is performed. Further, the process gas after the reaction is exhausted from the process chamber 29 by the gas exhaust mechanism.

When a predetermined processing time elapses, an inert gas is supplied from an inert gas supply source (not shown) by the gas supply mechanism to replace the processing chamber 29 with an inert gas, and the pressure of the processing chamber 29 is returned to normal pressure After-purge process). Then, the boat 26 is lowered by the boat elevator 32 via the seal cap 34.

The substrate 18 and the pod 9 are discharged to the outside of the housing 2 in the reverse order of the above description with respect to the removal of the substrate 18 after the processing. The untreated substrate 18 is also loaded on the boat 26 and the processing of the substrate 18 is repeated.

<Functional Configuration of Control System 200>

Next, referring to Fig. 3, the functional configuration of the control system 200 centering on the main controller 201, which is an operating unit, will be described. In this specification, the main controller 201 may also be referred to as the operating unit 201. [ 3, the control system 200 includes a main controller 201, a transfer system controller 211 as a transfer control unit, a process system controller 212 as a process control unit, and a device management controller 215 as a data monitoring unit do. The device management controller 215 functions as a data collection controller and collects device data inside and outside the device 1 to monitor the integrity of the device data in the device 1. [ In this embodiment, the control system 200 is accommodated in the device 1.

Refers to data (hereinafter also referred to as control parameters) relating to substrate processing such as the processing temperature at which the apparatus 1 processes the substrate 18, the processing pressure and the flow rate of the processing gas, Data on the quality of the manufactured product substrate such as the thickness of the film and the accumulated value of the thickness and data on the components of the device 1 such as quartz reaction tube, heater, valve and mass flow controller (for example, Means actual data generated by operating the respective component parts when the substrate processing apparatus 1 processes the substrate 18,

The data collected during execution of the recipe may also be referred to as process data. The device data also includes process data such as raw waveform data, which is data collected at specific intervals (for example, 1 second) from the start to the end of the recipe, and statistical data of each step in the recipe. The statistical data includes data such as a maximum value, a minimum value, and an average value. The device data may include event data (e.g., data indicative of a maintenance history) indicative of various device events when the recipe is not being executed (e.g., idle when the device 1 is idle).

The main controller 201 is electrically connected to the transport system controller 211 and the process system controller 212 via a LAN line such as 100BASE-T. Therefore, the main controller 201 can send and receive device data or download and upload files between the transport system controller 211 and the process system controller 212.

The operating unit 201 is provided with a port, which is a mounting portion in which a recording medium (e.g., a USB key) as an external storage device is inserted or removed. An OS corresponding to the port is installed in the operation unit 201. Further, the upper computer is connected to the operation unit 201 via a communication network, for example. Thus, even when the substrate processing apparatus 1 is installed in a clean room, the upper computer can be placed in an office or the like outside the clean room.

The device management controller 215 is connected to the operating unit 201 via a LAN line, and is configured to collect device data from the operating unit 201, quantify the operating state of the device, and display it on the screen. The device management controller 215 will be described later in detail.

The transport system controller 211 mainly includes a rotary pod shelf 11, a boat elevator 32, a pod carrier device 15, a substrate transfer mechanism 24, a boat 26 and a rotation mechanism (not shown) And is connected to the substrate transport system 211A. The conveyance system controller 211 controls the conveying operation of the rotary pod rack 11, the boat elevator 32, the pod conveyor 15, the board transfer mechanism 24, the boat 26 and the rotating mechanism Respectively. The transport system controller 211 is configured to control the transport operation of the boat elevator 32, the pod carrier device 15 and the substrate transfer mechanism 24 via the motion controller 211a.

The process system controller 212 includes a temperature controller 212a, a pressure controller 212b, a gas flow controller 212c, and a sequencer 212d. The temperature controller 212a, the pressure controller 212b, the gas flow controller 212c, and the sequencer 212d are sub-controllers. The temperature controller 212a, the pressure controller 212b, the gas flow controller 212c and the sequencer 212d are electrically connected to the process system controller 212 and communicate with the process system controller 212, And download and upload files. On the other hand, the process system controller 212 and the sub controller are shown separately, but the process system controller 212 and the sub controller may be integrally formed.

To the temperature controller 212a, a heating mechanism 212A mainly including a heater and a temperature sensor is connected. The temperature controller 212a is configured to adjust the temperature in the processing furnace 28 by controlling the temperature of the heater in the processing furnace 28. [ The temperature controller 212a is also configured to perform switching (on / off) control of a thyristor (not shown) and to control electric power to be supplied to a heater wire (not shown).

The pressure controller 212b is connected to a gas exhaust mechanism 212B mainly composed of a pressure sensor, an APC valve as a pressure valve, and a vacuum pump (not shown). The pressure controller 212b controls the opening degree of the APC valve and the switching (on / off) of the vacuum pump so that the pressure in the processing chamber 29 becomes a desired pressure at a desired timing based on the pressure value detected by the pressure sensor .

The gas flow controller 212c is constituted by an MFC. The sequencer 212d is configured to control the supply of the gas to the process gas supply pipe or the purge gas supply pipe, or to stop the supply of the gas by opening and closing the valve 212D. The process system controller 212 is also configured to control the MFC 212c and the valve 212D such that the flow rate of the gas supplied into the process chamber 29 is a desired flow rate at a desired timing.

The main controller 201, the carrier system controller 211, the process system controller 212 and the device management controller 215 according to the present embodiment can be implemented not only by a dedicated system but also by a normal computer system . For example, each controller that executes a predetermined process can be configured by installing the program using a recording medium (for example, a USB key) in which a program for executing the above-described processing is stored in a general-purpose computer.

And there are many ways to supply these programs. It is possible to supply not only a method of supplying via a predetermined recording medium as described above but also a method of supplying via a configuration such as a communication line, a communication network and a communication system. In this case, for example, the program may be posted on a bulletin board of a communication network, and the program may be superimposed on a carrier wave via a network. A predetermined process can be executed by activating the program thus provided and executing it in the same manner as another application program under the control of the OS.

&Lt; Configuration of main controller 201 >

Next, the configuration of the main controller 201 will be described with reference to Fig.

The main controller 201 includes an operation display section 227 including a main controller control section 220, a hard disk (HDD) 222 as a main controller storage section, a display section for displaying various information, and an input section for accepting various instructions from the operator, And a transmission / reception module 228 which is a main controller communication unit for communicating with the inside / outside of the apparatus 1. [ In addition, the operator may include not only the device operator but also the device manager, the device engineer, the maintenance personnel, and the operator. The main controller control unit 220 is configured as a computer having a clock function (not shown) including a CPU 224 (central processing unit) as a processing unit and a memory 226 as a temporary storage unit such as RAM and ROM.

The hard disk 222 stores, for example, a recipe file such as a recipe in which processing conditions and processing order of the substrate are defined, a control program file for executing a recipe file, a parameter file for defining parameters for executing a recipe, And various file files including various screen files and various icon files (not shown) including an input screen for inputting process parameters as well as parameter files for error processing.

The operation screen of the operation display section 227 also displays an operation instruction to the substrate conveyance system 211A or the substrate processing systems (the heating mechanism 212A, the gas exhaust mechanism 212B, and the gas supply system 212C) It is also possible to provide each operation button, which is an input unit to be input.

The operation display section 227 is configured to display an operation screen for operating the apparatus 1. [ The operation display section 227 displays, on the operation screen, information based on the apparatus data generated in the substrate processing apparatus 100 via the operation screen. The operation screen of the operation display section 227 is, for example, a touch panel using a liquid crystal. The operation display section 227 receives the input data (input instruction) of the operator via the operation screen and transmits the input data to the main controller 201. [ The operation display section 227 also displays an instruction for executing a recipe stored in the memory 226 (RAM) or the like or an arbitrary substrate processing recipe (hereinafter also referred to as a process recipe) among a plurality of recipes stored in the main controller storage section 222 Control command) and transmits it to the main controller control unit 220.

Further, in this embodiment, the device management controller 215 executes various programs and the like at the time of starting, reads each screen file and data table stored in advance, and reads the device data, And each screen shown in the figure is displayed on the operation display section 227.

A configuration such as a switching hub (not shown) is connected to the main controller communication unit 228 so that the main controller 201 performs transmission and reception of data with an external computer or another controller in the apparatus 1 via the network .

Further, the main controller 201 transmits device data of the status of the device 1 to an external upper computer, for example, a host computer via a network (not shown). The substrate processing operation of the apparatus 1 is controlled by the control system 200 based on each recipe file, each parameter file, and the like stored in the main controller storage unit 222. [

<Substrate processing method>

Next, a substrate processing method including a predetermined processing step performed using the apparatus 1 according to the present embodiment will be described. Here, the predetermined processing step is a case in which a substrate processing step (a film forming step in this case), which is one step of the manufacturing process of the semiconductor device, is performed.

When performing the substrate processing process, a substrate process recipe (process recipe) corresponding to the substrate process to be performed is stored in a memory such as a RAM in the process system controller 212, for example. If necessary, the main controller 201 gives an operation instruction to the process system controller 212 and the transfer system controller 211. The substrate processing process carried out in this way includes at least a carrying-in process, a film forming process and a carrying-out process.

<Lee Jae Jeong>

The main controller 201 issues an instruction to drive the substrate transfer mechanism 24 to the transfer system controller 211. [ The substrate transfer mechanism 24 starts the transfer processing of the substrate 18 from the pod 9 on the transfer stage 21 to the boat 26 in accordance with the instruction from the transfer system controller 211. [ This transfer process is performed until the loading (wafer charge) of all the predetermined substrates 18 to the boat 26 is completed.

<Transportation Process>

When the predetermined number of boards 18 are loaded on the boat 26, the boat 26 is raised by the boat elevator 32 operating in accordance with an instruction from the conveyance system controller 211, (Boat load) in the process chamber 29. [ When the boat 26 is fully charged, the seal cap 34 of the boat elevator 32 airtightly closes the lower end of the manifold of the treatment furnace 28.

<Film forming step>

Next, the inner atmosphere of the processing chamber 29 is vacuum-evacuated by a vacuum evacuating apparatus so as to have a predetermined film forming pressure (vacuum degree) in accordance with an instruction from the pressure control unit 212b. The inside of the treatment chamber 29 is heated by the heater to a predetermined temperature in accordance with an instruction from the temperature control unit 212a. Subsequently, the rotation of the boat 26 and the substrate 18 by the rotating mechanism is started in accordance with an instruction from the transport system controller 211. A predetermined gas (process gas) is supplied to a plurality of substrates 18 held in the boat 26 while being maintained at a predetermined pressure and a predetermined temperature to perform predetermined processing Processing is performed. Further, the temperature may be lowered from the treatment temperature (predetermined temperature) before the next carry-out process.

<Exporting process>

The rotation of the boat 26 and the substrate 18 by the rotating mechanism is stopped in accordance with an instruction from the transfer system controller 211 and the rotation of the boat 18 is stopped, The lower end of the manifold is opened by lowering the seal cap 34 by the elevator 32 and the boat 26 carrying the processed substrate 18 is taken out to the outside of the processing furnace 28 )do.

<Recovery process>

The boat 26 holding the processed substrate 18 is cooled very effectively by the clean air 36 ejected through the clean unit 35. [ When cooled to, for example, 150 ° C or lower, the processed substrate 18 is removed from the boat 26 and transferred to the pod 9, and then the new unprocessed substrate 18 is transferred to the boat 26 ) Is performed.

&Lt; Configuration of Substrate Processing System >

5 is a diagram showing a configuration of a substrate processing system used in this embodiment. In this substrate processing system, the master device 1-M and the repeating devices 1-1 to 1-6 are connected via a network. In the example of Fig. 5, although six repeating devices 1-1 to 1-6 are shown, the number of repeating devices is not limited to six. Further, the master device 1-M and the repeating devices 1-1 to 1-6 are configured as a substrate processing apparatus, that is, the apparatus 1, respectively. In this specification, the master device 1-M and the repeating devices 1-1 to 1-6 are also referred to as devices 1, respectively, and the master device 1-M and the repeating devices 1-1 to 1- -6) are collectively referred to as device 1.

The master device 1-M is a device 1 including standard device data. The master device 1-M includes the same hardware configuration as the substrate processing apparatus 1 and also includes a device management controller 215. [ The master device 1-M is, for example, the first device of the device 1 whose device data is appropriately adjusted. In the present specification, the term " starter " is the first device (1) delivered to the customer's factory, and the " repeater device &quot; is a device (1) delivered to the second or later customer factory, for example after the starter. The repeaters 1-1 to 1-6 receive copies of various information included in the master device 1-M from the master device 1-M via the network, 1-6, respectively.

As described above, in the present embodiment, the device management controller 215 is installed in each device 1. [ Each of the repeating devices 1-1 to 1-6 is connected to the master device 1-M and the device management controllers 215 installed in each of the repeating devices 1-1 to 1-6 via a network. And can share various kinds of information of the master device 1-M. Concretely, each of the repeaters 1-1 to 1-6 compares and collates a file such as the device data of the master device 1-M with a file of the master device 1-M Tool matching). In addition, since the network is used, it is not necessary to use a recording medium for copying the device data, and the merit that the repairer of the device maker can easily perform the file editing operation without having to move to the front of the device 1 installed in the clean room .

<Functional Configuration of Device Management Controller 215>

The device management controller 215, which is a health check controller that checks the health status of the device 1 shown in Fig. 6, stores information related to various health states of the device 1, for example, , Quantification of information such as the amount of change of the device data with time from the time of shipment or setting up of the device 1, the deterioration state of the components constituting the device 1, and the occurrence of the trouble information of the device 1, 1) is able to continue to operate normally. Here, the " set up time " is the time when the device 1 is firstly started (powered on) after it is delivered into the customer's factory.

6, the device management controller 215 includes a data matching control unit 215c, a device status monitoring control unit 215e, a communication unit 215g for transmitting and receiving device data to and from the main controller 201, And a storage unit 215h for storing data. Specifically, the device management controller 215 has a device state monitoring control unit 215e for monitoring the integrity of the device data that can be obtained from the operating state of the components constituting the device, And a data matching control unit 215c. The device management controller 215 obtains information on the evaluation of the operating state of the device 1 based on the device state monitoring result data acquired from the device state monitoring and controlling section 215e and the validity determination result data determined by the data matching control section 215c .

Then, the device management controller 215 monitors the health state based on the numerical value obtained by quantifying the information obtained by evaluating the operation state of the device 1, and when the health state is worse, for example, by outputting an alarm sound or displaying an alarm, . The device management controller 215 is also configured to be able to operate a function useful for stable operation of the device 1, such as data registration and device status monitoring, on the operation display unit 227 of the device 1.

The device management controller 215 has a memory (not shown) for storing, for example, a CPU (not shown) and an operation program of the device management controller 215 as a hardware configuration. The CPU operates in accordance with the above operation program. In this embodiment, the device management controller 215 includes a device status monitoring control unit 215e for storing device data generated during execution of a recipe for processing a substrate by executing the above-described operation program in the storage unit 215h, And a data matching control unit 215c configured to check the device data acquired before the occurrence of the abnormality and after the occurrence of the abnormality based on the data indicating that the abnormality has occurred.

The storage unit 215h stores unsteady analysis information which will be described later, used in the data matching control unit 215c described later, or device data acquired from the master device 1-M, which will be described later, used in the device status monitoring and controlling unit 215e Standard data) is stored. Various programs, such as a data matching program, a device state monitoring program, and a waveform verification program, which will be described later, are stored in at least the storage unit 215h. Alternatively, the main controller storage unit 222 or the temporary storage unit 226 may be used instead of the storage unit 215h. The device management controller 215 (and / or the data matching control unit 215c, the device status monitoring control unit 215e, and the communication unit 215g) respectively execute the screen display program to display the device data in the screen display data And controls so that screen display data is created and displayed on the operation display section 227. [

<Data Matching Control Unit 215c>

The data matching control unit 215c performs a copy or comparison between the file of the device 1 received from the main controller 201 and the file of the master device 1-M by executing the data matching program Execute the tool matching function. Further, in this embodiment, the data matching control unit 215c is configured to compare the process recipe before the occurrence of an abnormality with that after the occurrence of an abnormality by using the tool matching function. Thereby, the data matching control unit 215c compares the waveform data of the device data before and after the occurrence of the abnormality, and displays the waveform data on the operation display unit 227 in the order of greatest difference.

7B, the data matching control unit 215c includes a selection unit 321 for selecting, from the storage unit 215h, a recipe executed under the same conditions as the recipe in which an abnormality has occurred, a recipe in which an abnormality has occurred, An acquisition unit 322 that acquires device data from each of the recipes selected by the recipe selection unit 321, and an operation unit 323 that calculates the difference between the acquired device data. In this embodiment, the data matching control unit 215c is configured to collate the device data acquired before the occurrence of the abnormality and after the occurrence of the abnormality based on the data indicating that an abnormality has occurred.

7B, the calculation unit 323 includes a calculation unit 324 for calculating the ratio of the device data to the device data while calculating the absolute value of the data difference between the device data, A comparison unit 325 for comparing the values to determine whether the device data are consistent with each other, and a calculation unit 326 for calculating the standard deviation from the absolute value.

&Lt; Device status monitoring control unit 215e >

The device status monitoring and controlling unit 215e includes a device status monitoring program and executes a device status monitoring function. The device status monitoring and controlling unit 215e receives the device data of the device 1 from the main controller 201 and updates and accumulates the device data stored in the storage unit 215h, ) Of the apparatus 1 based on the standard data that the apparatus 1 should target, such as the standard data acquired from the apparatus 1, that is, the waveform of the elapsed time of the reaction chamber temperature, the upper limit value and the lower limit value. That is, the device data of the device 1 is compared with standard data.

In this embodiment, a device management controller 215 is provided separately from the main controller 201 having a substrate processing function and an upper reporting function. However, the present embodiment is not limited to such a configuration. (Device condition monitoring data) relating to the monitoring of the device status, data (evaluation item waveform data) for evaluating the device performance, data regarding abnormal analysis (abnormal analysis data), and the like It is needless to say that various data such as data (obstacle information data) relating to alarm monitoring may be generated.

<Device status monitoring function>

Next, the device status monitoring function of the present embodiment, that is, the device status monitoring program executed by the device status monitoring and controlling unit 215e will be described with reference to FIG. 7A. The device status monitoring program is stored in the memory (e.g., the storage unit 215h) of the device management controller 215, and realizes the device status monitoring control unit 215e.

7A, the device state monitoring and controlling unit 215e includes a setting unit 311, a band generating unit 312, an FDC (Fault Detection and Classification) monitoring unit 313, a coefficient display unit 314, 315).

The setting unit 311 instructs the band generation unit 312, the FDC monitoring unit 313, and the diagnosis unit 315 to set the designated band management in accordance with an input from the operation display unit 227, do.

The band generating unit 312 generates a band based on the standard data set by the setting unit 311 and the designation value of the upper limit and the designation value of the lower limit. In this embodiment, " band " refers to a range determined so as to allow margin for the waveform by the standard data (here, the device data of the master device 1-M). Specifically, the band refers to a range determined by specifying an upper limit value or a lower limit value, or an upper limit value and a lower limit value, based on the value of each data point constituting the standard data.

The FDC monitoring unit 313 includes a comparing unit 313a for comparing the band generated by the band generating unit 312 with device data generated every second from the device 1, a counting unit for counting the number of times the device data deviates from the band And a determination unit 313c that determines that the device data is abnormal if the device data deviates from the band by more than a predetermined number of times. When the FDC monitoring unit 313 detects an abnormality, for example, the FDC monitoring unit 313 is configured to display the fact that the abnormality has been detected on the operation display unit 227. [ In this manner, the FDC monitoring unit 313 monitors the device data by comparing the device data received from the main controller 201 with the generated bands with respect to master data serving as a criterion for the determination of the device data. Further, the band generating unit 312 may be included in the FDC monitoring unit 313,

The coefficient display unit 314 is configured to display, on the operation display unit 227, the number of excluded points for each batch processing for the excluded points counted by the FDC monitoring unit 313. [ In this embodiment, data points that deviate from the band by comparing the band and the device data are referred to as excluded points.

The diagnosis unit 315 diagnoses the statistical quantity data among the device data constituted from the number of exclusion points using the abnormal diagnosis rule. The diagnosis unit 315 is configured to display, for example, on the operation display unit 227 that an abnormality has been detected.

The device data collected by the device status monitoring and controlling section 215e is stored in the storage section 215h, but is not limited thereto. For example, the device data may be stored in the main controller storage unit 222. [

The device status monitoring and controlling section 215e stores the device data from the start to the end of the process recipe in the storage section 215h at specific intervals by executing the above-described device status monitoring program as shown in Fig. 8, The statistical amount data is configured to calculate the statistical amount (e.g., the maximum value of the device data, the minimum value of the device data, and the device data average value) of the interval at the end of the step, and store them in the storage unit 215h. The device status monitoring control unit 215e is configured to store event data including maintenance information while the process recipe is not executed. In addition, the apparatus status monitoring and controlling section 215e is configured to store, as raw waveform data, apparatus data including a heating waveform and a decompression waveform as well as a heating temperature waveform of a supply pipe or an exhaust pipe in the storage section 215h. Cold spots, for example, are generated based on the temperature waveform and the possibility of the deposition of by-products can be confirmed.

As shown in Fig. 9, the data interpretation in the event of an abnormality in a recently used apparatus 1 having a large amount (more than 500 kinds) of device data takes considerable time. Also, because of the large amount of data, it takes time to identify the cause of the abnormality by missing important device data by the skill of the repairer performing the data interpretation. In addition, it is difficult to confirm the change with time only by comparing the raw waveform data with an eye, and it is difficult to identify the cause of the abnormality because slowly changed data also appears as a difference. As a result, the downtime is increased and the operation rate of the apparatus is lowered.

<Analysis support processing>

Next, the processing flow of the analysis support using the data matching function (tool matching function) executed by the data matching control unit 215c will be described with reference mainly to Fig.

&Lt; Data reception step (S110) >

First, the data matching control unit 215c drives the waveform verification program when it receives the abnormal analysis information from the operation unit 201 via the communication unit 215g. The data matching control unit 215c includes a selecting unit 321 for selecting a recipe executed under the same conditions as the recipe in which an abnormality has occurred, an obtaining unit 322 for obtaining device data from each of the recipe in which an abnormality has occurred, And an operation unit 323 for calculating the difference between the acquired device data.

In the present embodiment, the abnormal analysis information includes at least information specifying abnormality, and recipe specifying information specifying a recipe executed by the apparatus 1 in which an abnormality has occurred. The data matching control unit 215c may be configured to receive abnormal analysis information via the communication unit 215g by inputting a condition on the operation display unit 227 by an operator. Further, the abnormal analysis information may be configured to be set by inputting a condition by an operator on the operation display unit 227, at least one of the group consisting of a threshold value, a step, a group and an item to be described later.

&Lt; File selection process (S120) >

The data matching control unit 215c acquires the recipe specifying information based on the received abnormal analysis information. The data matching control unit 215c searches for the presence or absence of a recipe having the same condition as the recipe specifying information obtained by referring to the production history information among the apparatus data in the storage unit 215h. The search by the data matching control unit 215c is performed, for example, while moving a plurality of recipes recorded in the production history information from the recipe where the abnormality occurs to the past recipe. When the data matching control unit 215c detects a recipe whose conditions match in the production history information, the data matching control unit 215c acquires the start time and the end time of the recipe specified by the recipe specifying information, respectively. The data matching control unit 215c also acquires step information from the start time to the end time of the step constituting the recipe. In this manner, the data matching control unit 215c selects the recipe executed under the same condition as the recipe in which the abnormality has occurred.

&Lt; Data acquisition step (S130) >

The data matching control unit 215c reads, from the storage unit 215h, the device data related to the recipe specifying information that has occurred during the start time to the end time of the step, based on the acquired step information. More specifically, the data matching control unit 215c acquires the device data defined in Fig. 9 stored in the storage unit 215h from the storage unit 215h for each of the recipe in which the abnormality has occurred and the recipe detected in the search, . The acquisition of data for each step is repeated until the recipe ends.

The recent recipe has a large number of steps, for example, the number of steps may exceed 100 pieces. In this case, the combination of the item type and the step of the apparatus data shown in Fig. 9 is 500 x 100 = 50000, so it is difficult to find out which waveform is bad. Therefore, it is preferable to set in advance which step of data is to be acquired in accordance with the abnormality by inputting the condition by the operator on the operation display section 227. [ Similarly, Group and items may be set in advance.

&Lt; Data matching step (S140) >

Next, the data matching control unit 215c compares the acquired device data for each of the recipe where the abnormality has occurred and the recipe having the same condition as the recipe detected by the search. Specifically, the data matching control unit 215c calculates the absolute value of the data difference of the device data every unit time while adjusting the start time of the recipe based on the data time information associated with the abnormal analysis information, and sets the absolute value to a preset threshold value For each unit time to determine whether or not the device data are consistent, and to calculate the rate (matching rate) at which the device data coincides in a predetermined period in the step. In the present embodiment, the term " matching rate " refers to a ratio of a period in which a standard deviation? In this embodiment, the specific period is a period for collecting the device data. However, since the time from the start to the end of the step may differ even in a recipe having the same condition, it is preferable that the step time be set to a predetermined period in the step.

11, the waveform data (for example, temperature) is read every unit time (5 seconds in the example of Fig. 11) in two waveform data (for example, the recipe in which an abnormality has occurred and the device data read in each of the recipes executed before) (NG) when the absolute value of the difference is equal to or greater than the threshold value (e.g., 30) and the solid line (OK) when the absolute value of the difference is less than the threshold value, The ratio of the number of solid lines (OK), that is, the number of matches determined to be equal to each other (the difference is less than the threshold value) with the denominator as the denominator is set as the matching rate. When the recipe in which an abnormality occurs in FIG. 11 is compared with the line A and the recipe executed before the recipe is taken as line B, the matching rate at a predetermined period (here, 00:00:00 to 00:50:00) becomes 90% .

The threshold value 30 is configured to be set according to the condition input by the operator on the operation display unit 227. [ FIG. 11 shows only a part of the recipe for illustration of the calculation of the matching rate.

In this embodiment, the data matching control unit 215c is configured to include a calculation unit 326 that calculates an absolute value of a data difference between device data within a predetermined period, and calculates a standard deviation from the absolute value. Specifically, the calculating unit 326 calculates the absolute value of the data difference of the device data every unit time (e.g., 0.1 second or 1 second), and calculates the ratio of the device data coincident in units of steps and the data difference To calculate the standard deviation of the absolute value of the absolute value.

The calculating unit 326 is also configured to update the threshold value using the calculated standard deviation. The calculating unit 323 is also configured to compare the absolute value of the data difference of the device data with the calculated threshold value to determine whether the device data matches.

The threshold value in Fig. 11 is a fixed value by manual input. However, the number of types of process data is large, and a threshold value suitable for each type can be set in advance and the threshold value can be automatically calculated. Further, for example, the operator on the operation display section 227 can set whether to automatically calculate the threshold value or not by the condition input.

The waveform data on the line A and line B in Fig. 12 are the same as those in Fig. For example, as shown in Fig. 12, the standard deviation? (10.25) is found from the absolute value of the data difference (differential data) of the waveform data of the comparison object, and 3? And a waveform data matching rate is found by considering excess data as mismatch (NG). Thus, since the threshold value is automatically set, it is possible to omit the trouble of manually inputting the threshold value. However, this method can be used for waveform data in which waveform differences intersect, but is not suitable for waveform data along a parallel line. Therefore, it is preferable to use a threshold value by automatic calculation in which a threshold value is automatically set, and to switch to a threshold value by manual input when adjustment is necessary. The threshold value may be 2? (20.5) or may be set so as to change the value of this threshold value in accordance with a step. For example, the threshold value may be set to 3σ in the temperature increasing step with a large temperature fluctuation, and the threshold value may be set to 2σ in the film forming step in which the temperature fluctuation is relatively stable.

When comparing the entire recipe, it is necessary to consider the delay of the step. For example, when a delay occurs in the temperature rising step and the start of the subsequent steps is delayed, a misjudgment is made by comparing the defected waveforms. In the present embodiment, since the comparison is made to perform the comparison on a step-by-step basis, it is possible to check (match) irrespective of whether the end condition of the step is satisfied or not.

In addition, the data matching step (S140) may be configured to match the recipes executed at the time of occurrence of abnormality with the recipes before and after the device data of all (all) types and all items. Further, if the type or the item can be specified in response to the abnormality, specific device data extracted for a specific category or a specific item may be collated. For example, the specific device data is selected from the group consisting of temperature data, pressure data, gas flow rate data, heater power data, concentration data, and valve data.

&Lt; Data display step (S150) >

The data matching control unit 215c is configured to display, on the operation display unit 227, the device data of all types and all items in order from the calculated matching rate to the device data having a small matching rate. For example, ten data with a poor matching rate (i.e., ten data in order of low matching rate) are displayed in Fig. 13 with respect to the recipe executed at the time of occurrence of the abnormality and the recipe executed before the recipe. However, the device data may be displayed on the operation display unit 227 in order from the device data having a small matching rate for each group, item, or step, instead of this form. In the present embodiment, " group " is a data type such as temperature, pressure and gas flow rate, and " item " is, for example, temperature actual value of U zone, actual measured value of CU zone, The actual temperature value of the CL zone and the actual temperature value of the L zone. The " gas flow rate " is, for example, the channel number of the MFC. Further, the data matching control unit 215c may be displayed separately according to the matching rate. The data matching control unit 215c may display the matching rate in red for device data including a matching rate of less than 80% and display the matching rate in blue for device data including a matching rate of 80% or more. In this embodiment, ten pieces of device data are displayed in order of bad matching rate, but the number is not limited to this.

In this manner, the data matching control unit 215c is configured to display on the operation display unit 227 in the order of the calculated device data having the smallest matching rate, in other words, the device data having a large data difference. As a result, it is possible to determine which device data of a certain step causes the trouble to occur, which contributes to the reduction of the trouble analysis time and the reduction of the analysis mistake due to the non-uniformity of the repair source.

19, the result of the data matching step (S140) may be displayed on the operation display section 227 as a data detail check screen. This data detail confirmation screen is configured so that the matching rate of the total recipe (TOTAL) is displayed on the upper side. This is the average of the matching rates calculated for each category and every item. The matching rate of the entire recipe is preferably 80% or more.

In addition, the matching rate is displayed in category units under the matching rate of the whole recipe (TOTAL). Alternatively, as shown in Fig. 19, a data detail confirmation screen may be displayed for each category. 19 may be displayed as a data detail confirmation screen when a recipe is selected on the history reference screen described later.

As shown in FIG. 19, it is possible to predict which type (such as temperature and pressure) is the cause of abnormality in the data detail confirmation screen. Also, in this embodiment, each item (item) with a matching rate of less than 50% is configured to be displayed in a different color.

The results of collating the two recipes of the recipe executed at the time of occurrence of the abnormality and the recipe executed before the occurrence of the abnormality through the data display step (S150) in the present embodiment are shown, but the present embodiment is not limited to this form. For example, a recipe executed at the time of occurrence of an abnormality and a plurality of recipes may be collated to display the result of calculating the matching rate in a time series. For example, the matching rate of the entire recipe (TOTAL), the matching rate of the entire specific step, and the matching rate of the specific device data may be collectively displayed. Thus, the change history of the matching rate can be confirmed until an abnormality occurs.

According to the present embodiment described above, the recipe having the same condition as the recipe in which the abnormality has occurred in the file selecting step (S120) is present in the storage unit 215h. However, The following description will be given.

The data matching control unit 215c searches the storage unit 215h of the device management controller 215 of the master device 1-M to detect a recipe having the same condition and a file associated with the recipe file Are all received from the master device 1-M and stored in the storage 215h of the device 1 in which the abnormality has occurred. Since they are the same after the next step, they are omitted. If there is no recipe having the same condition even if the storage unit 215h in the master apparatus is searched, the storage unit 215h of the apparatus management controller 215 of the other apparatus 1 is searched. As a result, if a recipe of the same condition is not searched, there is a clear erroneous setting, and the parameter setting becomes abnormal.

According to the present embodiment, there is one or a plurality of effects described below.

(a) The data matching controller 215c according to the present embodiment refers to the abnormal analysis information and extracts the device data before and after the occurrence of the abnormality, and displays the device data in the descending order of the matching rate As shown in FIG. Thus, it is possible to efficiently analyze data even when a low maintenance worker performs a large amount of time-consuming abnormal analysis, and it is possible to reduce the downtime at the time of an abnormal occurrence.

(b) The data matching control unit 215c according to the present embodiment is configured to extract the device data before and after the occurrence of an abnormality by referring to the abnormal analysis information, and to display the device data on the screen in order of greatest difference. As a result, it is possible to reduce the burden on the repair source that performs the abnormal analysis, and it is possible to shorten the time required for the repair source to analyze the factors.

(c) The data matching control unit 215c according to the present embodiment is configured to extract device data before and after occurrence of an abnormality, and to display the device data on the screen in order of greatest difference. This makes it possible to shorten the time required for specifying the abnormality factor even if the repair source has an artificial mistake (for example, a mistake in inputting a set value of the apparatus data). In particular, even when there is an erroneous setting, which is one of the factors causing abnormal film deposition, the time required for factor specification can be shortened.

(d) The data matching controller 215c according to this embodiment is configured to display a result of matching device data in a time series from the time of execution of a recipe in which an abnormality occurs, on the screen. As a result, changes in the device data over time can be confirmed by observing the change history of the matching rate up to the occurrence of the abnormality, and it is possible to shorten the time required for the repair source to analyze the abnormality factor.

<Other Embodiments>

Next, a file (data) matching function (tool matching function) at the time of device set-up by the data matching control unit 215c will be described with reference to FIG. 14 to FIG. In the present embodiment, only the file comparison object is a file held by each of the repeaters 1-1 to 1-6 and the master device 1-M, and the flow shown in FIG. 10 is referred to as a data matching controller 215c) are the same.

In this embodiment, each of the data matching control units 215c of the repeating apparatuses 1-1 to 1-6 directly communicates with the data matching control unit 215c of the master apparatus 1-M, ) Will be described. In the present embodiment, the data matching control unit 215c executes the program for realizing the tool matching function, so that the repeating units 1-1 to 1-6 Can be compared with a file already used and performing in the master device 1-M.

14, the name of the master device 1-M as initial information in the repeater devices 1-1 to 1-6, for example, the main controller storage 222 of the repeater device 1-2, So that an IP address (Internet Protocol Address) can be set. The name and the IP address of the master device 1-M are set by an operator from the operation display part 227 of the repeating device 1-2, As shown in FIG. The reason for using the two pieces of information of the IP address and the name in the connection with the master device 1-M is that after the communication connection by the IP address is established with the master device 1-M, Structure. This makes it possible to prevent erroneous connection due to the misconfiguration of the IP address, and the worker can perform the matching (data matching) operation without being conscious of the master device 1-M.

14, the data matching control unit 215c of the apparatus 1 including the repeating apparatus 1-2 receives the recipe file from the main controller storage unit 222 of the master apparatus 1-M, Or stores the parameter file in the main controller storage unit 222 of the apparatus 1 and verifies (matches) the parameter file. In this embodiment, a comparison between the recipe file of the master device 1-M and the recipe file of the device 1 is performed. The recipe file received from the master apparatus 1-M may be stored in the storage unit 215h of the apparatus 1 instead of storing the recipe file in the main controller storage unit 222, and file matching may be performed.

15 is a table that defines a performance evaluation waveform. The master device 1-M is registered in advance, and a maximum of 20 waveforms can be registered. This is because the user acquires the optimal parameter during the operation of the device 1 after the initialization of the device 1, that is, the master device 1-M, and manages it as know-how. In order to match the performance of the device 1 and the master device 1-M at the time of set-up (granularity) work, waveform data of a target of matching (matching) related to performance is defined as shown in Fig. Specific waveform data such as a temperature rise waveform up to 1200 DEG C or a decompression waveform up to 2Pa is targeted, and temperature waveform data of pipe heating (not defined in FIG. 15) that is not related to performance is not a matching target. By using the table shown in Fig. 15, the set-up operation can be efficiently performed.

Fig. 16 shows an example of a history reference screen displayed when a button for referring to a history of data matching (tool matching) is pressed (pushed) in a menu screen (not shown). FIG. 17 shows a data registration detail confirmation screen displayed when the temperature Temp is selected.

As shown in FIG. 17, information of the number of steps of 80% or more and less than 80% of all the steps (20, for example) of the process recipe is displayed, and each item (U, C, CL, L) is displayed. Also, 84% of the matching rate described below shows the matching rate of the device data with respect to the temperature (Temp) throughout the recipe. That is, an average value in the entire recipe of the matching rate calculated for each item in steps.

In the case of 80% or more and less than 80%, the discrimination indication is made, and it is easy to see which item degrades the matching rate at which step. When a button (Trace) for displaying the raw waveform data is pressed, the raw waveform data shown in Fig. 18 is displayed.

18 shows the raw waveform data of each item (U, CU, C, CL, L) of the process file of the master device 1-M and the items U, CU, C, CL , L) is displayed from a preset step.

In this way, comparison of raw waveform data is possible for items with poor matching rates.

According to the present embodiment, there is one or a plurality of effects described below.

(a) The data matching control unit 215c according to the present embodiment calculates a matching rate in units of steps of a process recipe and calculates a matching rate by matching each item (temperature, gas, etc.) So that the device data can be easily extracted. As a result, only the information on the performance of the apparatus can be displayed, so that the downtime during set-up can be reduced.

(b) The data matching control unit 215c according to the present embodiment calculates the matching rate in step units of the process recipe and calculates matching rates for each item (temperature, gas, etc.) So that the device data can be easily extracted. As a result, it is possible to reduce the burden on the operator who performs the set-up operation and shorten the time required for the operator to perform the set-up operation.

The substrate processing apparatus 1 in the embodiment of the present invention is applicable not only to a semiconductor manufacturing apparatus for manufacturing a semiconductor but also to an apparatus for processing a glass substrate such as an LCD apparatus. Needless to say, the present invention is also applicable to various substrate processing apparatuses such as an exposure apparatus, a lithographic apparatus, a coating apparatus, and a processing apparatus using plasma.

1: substrate processing device 215: device management controller
215c: Data matching control unit 215e: Device state monitoring control unit
215h: storage unit 227: operation display unit

Claims (13)

An operation unit for transmitting device data generated during execution of a recipe including a plurality of steps to a storage unit; And a data matching control unit for collating a plurality of the device data stored in the storage unit,
Wherein the data matching control unit comprises: a selection unit for selecting, from the storage unit, a recipe executed under the same condition as the recipe in which an abnormal phenomenon occurs; An acquisition unit for acquiring the device data from each of the recipe where the abnormal phenomenon occurs and the recipe selected by the selection unit; And an operation unit for calculating a difference between the acquired device data,
The data matching control section searches the storage section, reads a plurality of recipes executed under the same conditions as the recipe in which the abnormal phenomenon occurred, obtains the device data from the read plurality of recipes, To calculate a matching rate based on a difference between the device data obtained from the recipe of the recipe of the recipe and the recipe where the abnormal phenomenon occurs. The method according to claim 1,
The data matching control unit collates the device data obtained before and after the occurrence of the abnormal phenomenon with the device data acquired based on the data indicating that the abnormal phenomenon has occurred and displays the result on the display device displaying the result of the verification Respectively,
Wherein the display device is configured to display the device data in an order in which the matching rate between the recipe where the abnormal phenomenon occurs and the recipe selected by the selection section is in a bad order. The method according to claim 1,
The operation unit,
A calculation unit for calculating a ratio at which the device data is matched while calculating an absolute value of a data difference of the device data every unit time within a predetermined period; And
A comparison unit for comparing the absolute value with a preset threshold value to determine whether the device data is consistent;
Wherein the substrate processing apparatus further comprises: The method of claim 3,
Further comprising a calculation unit that calculates a standard deviation using the absolute value of the data difference of the device data within the predetermined period,
Wherein the calculating unit calculates a threshold value using the standard deviation,
And the arithmetic unit compares the absolute value with the calculated threshold value to determine whether the device data matches. The method according to claim 1,
Wherein the arithmetic unit calculates the absolute value of the data difference of the device data for each unit time and calculates the standard deviation of the absolute value of the data difference of the device data, . The method according to claim 1,
The data matching controller calculates the absolute value of the data difference of the device data every unit time while adjusting the start time of the recipe based on the data time information related to the data abnormal analysis related information, And compares the unit data with each unit time to determine whether or not the apparatus data matches, and compares the ratio of the apparatus data within a predetermined period. The method according to claim 1,
And a display device for displaying the result of the calculation,
Wherein the display device is configured to display a matching rate with a recipe where the abnormal phenomenon occurs for each batch in which the recipe is executed. The method according to claim 1,
Wherein the data matching control unit is configured to calculate a matching rate with a recipe where the abnormal phenomenon occurs with respect to specific device data among the device data. 9. The method of claim 8,
Wherein the specific device data is selected from a group consisting of temperature data, pressure data, gas flow rate data, heater power data, concentration data, and valve data. The method according to claim 1,
Wherein when the recipe is executed under the same condition as that of the recipe in which the abnormal phenomenon occurred, the data matching control unit determines that the recipe is executed before and after the occurrence of the abnormal phenomenon And compares the device data acquired from the subsequent recipe. A device state monitoring control unit for storing device data generated during execution of a recipe including a plurality of steps in a storage unit; And
An acquiring unit for acquiring the device data from each of the recipes selected from the recipe in which the abnormal phenomenon occurs and the recipe selected in the selecting unit; And a plurality of recipes executed under the same conditions as those of the recipes in which the abnormal phenomenon occurred are read out from the plurality of recipes read by the obtaining unit, A data matching control unit configured to acquire the apparatus data and calculate a matching rate based on a difference between the device data acquired from the plurality of recipes and the recipe in which the abnormal phenomenon occurs, by the arithmetic unit;
The device management controller comprising: A device state monitoring control unit for storing device data generated during execution of a recipe including a plurality of steps in a storage unit; And a data matching controller for collating a plurality of the device data stored in the storage unit,
A step of receiving data indicating that an abnormal phenomenon has occurred in the apparatus;
Selecting from the storage unit a plurality of recipes executed under the same conditions as the recipes in which the abnormal phenomenon occurred;
A step of acquiring the device data from each of the recipe where the abnormal phenomenon occurs and the selected recipe; And
Calculating a difference between the acquired device data;
As a program recorded on a recording medium,
Further comprising the step of calculating a matching rate based on the difference of the device data between the device data acquired from the plurality of recipes and the recipe where the abnormal phenomenon occurs, &Lt; / RTI &gt; There is provided a method of manufacturing a semiconductor device including a substrate processing step of processing a substrate by executing a recipe including a plurality of steps,
Storing the device data generated during execution of the recipe in a storage unit in the substrate processing step; And a step of verifying each of the plurality of device data stored in the storage unit,
A step of receiving data indicating that an abnormality has occurred in the device in the step of collating; Selecting from the storage unit a plurality of recipes executed under the same conditions as the recipe in which the abnormal phenomenon occurred; Acquiring the device data from each of the recipe where the abnormal phenomenon occurs and the selected recipe; And a step of calculating a difference between the acquired device data,
And calculating a matching rate based on a difference between the device data acquired from the plurality of recipes and the recipe in which the abnormal phenomenon occurs, in the step of calculating the difference of the device data, &Lt; / RTI &gt;

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