KR20180001068A - Novel compound, photosensitive resin composition comprising the same and color filter - Google Patents
Novel compound, photosensitive resin composition comprising the same and color filter Download PDFInfo
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- KR20180001068A KR20180001068A KR1020160079656A KR20160079656A KR20180001068A KR 20180001068 A KR20180001068 A KR 20180001068A KR 1020160079656 A KR1020160079656 A KR 1020160079656A KR 20160079656 A KR20160079656 A KR 20160079656A KR 20180001068 A KR20180001068 A KR 20180001068A
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- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
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- LYXOWKPVTCPORE-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanone Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 LYXOWKPVTCPORE-UHFFFAOYSA-N 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- CLYVDMAATCIVBF-UHFFFAOYSA-N pigment red 224 Chemical compound C=12C3=CC=C(C(OC4=O)=O)C2=C4C=CC=1C1=CC=C2C(=O)OC(=O)C4=CC=C3C1=C42 CLYVDMAATCIVBF-UHFFFAOYSA-N 0.000 description 1
- 229920005593 poly(benzyl methacrylate) Polymers 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
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- 230000009257 reactivity Effects 0.000 description 1
- 239000001054 red pigment Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
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- 150000003459 sulfonic acid esters Chemical class 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
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- HWCKGOZZJDHMNC-UHFFFAOYSA-M tetraethylammonium bromide Chemical compound [Br-].CC[N+](CC)(CC)CC HWCKGOZZJDHMNC-UHFFFAOYSA-M 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
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- 229920001187 thermosetting polymer Polymers 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- GKASDNZWUGIAMG-UHFFFAOYSA-N triethyl orthoformate Chemical compound CCOC(OCC)OCC GKASDNZWUGIAMG-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
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- 239000008096 xylene Substances 0.000 description 1
- 239000001052 yellow pigment Substances 0.000 description 1
- RZLVQBNCHSJZPX-UHFFFAOYSA-L zinc sulfate heptahydrate Chemical compound O.O.O.O.O.O.O.[Zn+2].[O-]S([O-])(=O)=O RZLVQBNCHSJZPX-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F3/00—Compounds containing elements of Groups 2 or 12 of the Periodic Table
- C07F3/06—Zinc compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B57/00—Other synthetic dyes of known constitution
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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Abstract
Description
본 기재는 신규한 화합물, 이를 포함하는 감광성 수지 조성물 및 컬러필터에 관한 것이다.The present invention relates to a novel compound, a photosensitive resin composition containing the same, and a color filter.
디스플레이 장치 중의 하나인 액정디스플레이 장치는 경량화, 박형화, 저가, 저소비 전력 구동화 및 우수한 집적회로와의 접합성 등의 장점을 가지고 있어 노트북 컴퓨터, 모니터 및 TV 화상용으로 그 사용범위가 확대되고 있다. 이와 같은 액정디스플레이 장치는 블랙매트릭스, 컬러필터 및 ITO 화소전극이 형성된 하부 기판과, 액정층, 박막트랜지스터, 축전캐패시터층으로 구성된 능동회로부와 ITO 화소전극이 형성된 상부의 기판을 포함하여 구성된다. 컬러 필터는 화소 사이의 경계부를 차광하기 위해서 투명 기판 상에 정해진 패턴으로 형성된 블랙 매트릭스층 및 각각의 화소를 형성하기 위해 복수의 색(통상적으로, 적(R), 녹(G), 청(B)의 3원색)을 정해진 순서로 배열한 화소부가 차례로 적층된 구조를 취하고 있다. The liquid crystal display device, which is one of the display devices, has advantages such as lightness, thinness, low cost, low power consumption driving and bonding with an excellent integrated circuit, and its use range is expanding for notebook computers, monitors and TV images. Such a liquid crystal display device includes a lower substrate on which a black matrix, a color filter, and ITO pixel electrodes are formed, and an upper substrate on which an active circuit portion composed of a liquid crystal layer, a thin film transistor, and a capacitor layer and an ITO pixel electrode are formed. The color filter includes a black matrix layer formed in a predetermined pattern on a transparent substrate so as to shield the boundary between pixels and a plurality of colors (typically red (R), green (G), blue ) Are arrayed in a predetermined order, and the pixel portions are stacked in this order.
컬러 필터를 구현하는 방법 중의 하나인 안료분산법은 흑색 매트릭스가 제공된 투명한 기질 위에 착색제를 함유하는 감광성 수지 조성물을 코팅하고, 형성하고자 하는 형태의 패턴을 노광한 후, 비노광 부위를 용제로 제거하여 열경화시키는 일련의 과정을 반복함으로써 착색 박막이 형성되는 방법이다. In the pigment dispersion method, which is one of the methods of implementing a color filter, a photosensitive resin composition containing a colorant is coated on a transparent substrate provided with a black matrix, a pattern of a shape to be formed is exposed, And a coloring thin film is formed by repeating a series of processes of thermosetting.
안료분산법에 따른 컬러필터 제조에 사용되는 감광성 수지 조성물은 일반적으로 바인더 수지, 광중합 단량체, 광중합 개시제, 용매와 기타 첨가제 등으로 이루어진다. 상기의 특징을 가지는 안료분산법은 휴대폰, 노트북, 모니터, TV 등의 LCD를 제조하는 데 활발하게 응용되고 있다. The photosensitive resin composition used in the production of the color filter according to the pigment dispersion method generally comprises a binder resin, a photopolymerizable monomer, a photopolymerization initiator, a solvent and other additives. The pigment dispersion method having the above characteristics is actively applied to manufacture LCDs such as mobile phones, notebooks, monitors, and TVs.
그러나, 안료분산법은 안료 분말의 미세화 공정이 어렵고, 안료 분말을 분산시키더라도 분산상태가 분산액 내에서 안정해야 하기 때문에 다양한 첨가제가 필요하고, 분산 공정 또한 매우 까다로우며, 더욱이 안료분산액은 최적의 품질상태를 유지하기 위해 보관 및 운송조건이 어려운 단점이 있다. 또한, 안료형 감광성 수지 조성물로 제조된 컬러필터에서는 안료 입자 크기에서 비롯되는 휘도와 명암비의 한계가 존재한다.However, in the pigment dispersion method, it is difficult to finely disperse the pigment powder and various additives are required because the dispersion state must be stable in the dispersion even when the pigment powder is dispersed, and the dispersing process is also very difficult. Further, There are disadvantages in that storage and transportation conditions are difficult to maintain the quality condition. In addition, in a color filter made of a pigment type photosensitive resin composition, there is a limit of brightness and contrast ratio resulting from the pigment particle size.
이에 따라 안료를 대신해 안료와 유사한 내열성 및 내화학성을 갖는 염료 개발의 필요성이 대두되었다.Accordingly, there has been a need to develop dyes having heat resistance and chemical resistance similar to those of pigments instead of pigments.
일 구현예는 신규한 화합물을 제공하기 위한 것이다.One embodiment is to provide a novel compound.
다른 일 구현예는 상기 화합물을 포함하는 감광성 수지 조성물을 제공하기 위한 것이다.Another embodiment is to provide a photosensitive resin composition comprising the above compound.
또 다른 일 구현예는 상기 감광성 수지 조성물을 이용하여 제조된 컬러필터를 제공하기 위한 것이다.Another embodiment is to provide a color filter manufactured using the photosensitive resin composition.
본 발명의 일 구현예는 하기 화학식 1로 표시되는 화합물을 제공한다.An embodiment of the present invention provides a compound represented by the following formula (1).
[화학식 1][Chemical Formula 1]
상기 화학식 1에서,In Formula 1,
R1은 할로겐 원자, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고,R 1 is a halogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group or a substituted or unsubstituted C6 to C20 aryl group,
R2는 치환 또는 비치환된 C3 내지 C20 지환족 고리기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고, 단, 상기 아릴기는 할로겐 원자, 치환 또는 비치환된 C1 내지 C10 알킬기, 치환 또는 비치환된 C1 내지 C10 알콕시기 및 치환 또는 비치환된 C1 내지 C10 알킬티오기로 이루어진 군에서 선택된 적어도 하나의 치환기만을 치환기로 가지고,R 2 is a substituted or unsubstituted C 3 to C 20 alicyclic ring group or a substituted or unsubstituted C 6 to C 20 aryl group, provided that the aryl group is substituted with a halogen atom, a substituted or unsubstituted C1 to C10 alkyl group, A substituted or unsubstituted C1 to C10 alkoxy group and a substituted or unsubstituted C1 to C10 alkylthio group,
R3 내지 R5는 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고,R 3 to R 5 are each independently a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group or a substituted or unsubstituted C6 to C20 aryl group,
m 및 n은 각각 독립적으로 1 내지 5의 정수이고,m and n are each independently an integer of 1 to 5,
L은 하기 화학식 2로 표시되고,L is represented by the following formula (2)
[화학식 2](2)
상기 화학식 2에서,In Formula 2,
L1은 -O(C=O)- 또는 -S- 이고,L 1 is -O (C = O) - or -S-,
A는 치환 또는 비치화된 C1 내지 C20 알킬기, 치환 또는 비치환된 C3 내지 C20 지환족 고리기, 치환 또는 비치환된 C6 내지 C20 아릴기 또는 치환 또는 비치환된 C2 내지 C20 헤테로아릴기이다.A is a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 alicyclic ring group, a substituted or unsubstituted C6 to C20 aryl group, or a substituted or unsubstituted C2 to C20 heteroaryl group.
R1은 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기일 수 있다.R 1 may be a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aryl group.
상기 R2는 치환 또는 비치환된 아다만틸기 또는 치환 또는 비치환된 페닐기일 수 있다. 단, 상기 페닐기는 할로겐 원자, 치환 또는 비치환된 C1 내지 C10 알킬기, 치환 또는 비치환된 C1 내지 C10 알콕시기 및 치환 또는 비치환된 C1 내지 C10 알킬티오기로 이루어진 군에서 선택된 적어도 하나의 치환기만을 치환기로 가질 수 있다.R 2 may be a substituted or unsubstituted adamantyl group or a substituted or unsubstituted phenyl group. Provided that at least one substituent selected from the group consisting of a halogen atom, a substituted or unsubstituted C1 to C10 alkyl group, a substituted or unsubstituted C1 to C10 alkoxy group and a substituted or unsubstituted C1 to C10 alkylthio group is substituted with a substituent Lt; / RTI >
상기 R2는 '비치환된 아다만틸기' 또는 '할로겐 원자, 치환 또는 비치환된 C1 내지 C10 알킬기, 치환 또는 비치환된 C1 내지 C10 알콕시기 및 치환 또는 비치환된 C1 내지 C10 알킬티오기로 이루어진 군에서 선택된 적어도 하나의 치환기만을 치환기로 가지는 페닐기'일 수 있다.R 2 is an unsubstituted adamantyl group or a substituted or unsubstituted C 1 to C 10 alkylthio group, which may be substituted by a halogen atom, a substituted or unsubstituted C 1 to C 10 alkyl group, a substituted or unsubstituted C 1 to C 10 alkoxy group, May be a phenyl group having as a substituent only at least one substituent selected from the group ".
상기 R3 내지 R5는 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기일 수 있다.Each of R 3 to R 5 may independently be a substituted or unsubstituted C1 to C20 alkyl group.
상기 L은 하기 화학식 3 내지 화학식 7로 이루어진 군에서 선택된 어느 하나로 표시될 수 있다.The L may be represented by any one selected from the group consisting of the following formulas (3) to (7).
[화학식 3](3)
[화학식 4][Chemical Formula 4]
[화학식 5][Chemical Formula 5]
[화학식 6][Chemical Formula 6]
[화학식 7](7)
상기 화학식 3 내지 화학식 7에서,In the above Chemical Formulas 3 to 7,
R6은 치환 또는 비치환된 C1 내지 C10 알킬기, 치환 또는 비치환된 아미노기 또는 치환 또는 비치환된 아실기이고,R 6 is a substituted or unsubstituted C1 to C10 alkyl group, a substituted or unsubstituted amino group or a substituted or unsubstituted acyl group,
R7 내지 R9는 각각 독립적으로 히드록시기 또는 치환 또는 비치환된 C1 내지 C10 알킬기이고, 단 R7 및 R8 중 적어도 하나는 히드록시기이고,R 7 to R 9 are each independently a hydroxy group or a substituted or unsubstituted C1 to C10 alkyl group, provided that at least one of R 7 and R 8 is a hydroxy group,
R10은 치환 또는 비치환된 C1 내지 C10 알킬기이고,R 10 is a substituted or unsubstituted C1 to C10 alkyl group,
o 및 p는 각각 독립적으로 1 내지 3의 정수이고, 단 2 ≤ o + p ≤ 5 이고,o and p are each independently an integer of 1 to 3, provided that 2? o + p? 5,
q는 0 내지 4의 정수이다.q is an integer of 0 to 4;
상기 치환 또는 비치환된 아미노기는 하기 화학식 8로 표시될 수 있다.The substituted or unsubstituted amino group may be represented by the following general formula (8).
[화학식 8][Chemical Formula 8]
상기 화학식 8에서,In Formula 8,
Rx는 치환 또는 비치환된 C1 내지 C10 알킬기이고,R x is a substituted or unsubstituted C1 to C10 alkyl group,
z는 0 내지 5의 정수이다.and z is an integer of 0 to 5.
상기 치환 또는 비치환된 아실기는 하기 화학식 9로 표시될 수 있다.The substituted or unsubstituted acyl group may be represented by the following general formula (9).
[화학식 9][Chemical Formula 9]
상기 R6은 t-부틸기(tert-부틸기), 상기 화학식 8로 표시되는 치환기 또는 상기 화학식 9로 표시되는 치환기일 수 있다.The R 6 may be a t-butyl group (tert-butyl group), a substituent represented by the formula (8) or a substituent represented by the formula (9).
상기 R7 내지 R9는 각각 독립적으로 히드록시기 또는 t-부틸기(tert-부틸기)이고, 단 R7 및 R8 중 적어도 하나는 히드록시기일 수 있다.Each of R 7 to R 9 independently represents a hydroxyl group or a t-butyl group (at least one of R 7 and R 8 may be a hydroxy group).
R10은 치환 또는 비치환된 메틸기, 치환 또는 비치환된 에틸기, 치환 또는 비치환된 프로필기, 치환 또는 비치환된 부틸기 또는 치환 또는 비치환된 펜틸기일 수 있다.R 10 may be a substituted or unsubstituted methyl group, a substituted or unsubstituted ethyl group, a substituted or unsubstituted propyl group, a substituted or unsubstituted butyl group, or a substituted or unsubstituted pentyl group.
상기 화학식 1은 하기 화학식 10-1 또는 하기 화학식 10-2로 표시될 수 있다.The formula (1) may be represented by the following formula (10-1) or (10-2).
[화학식 10-1][Formula 10-1]
[화학식 10-2][Formula 10-2]
상기 화학식 10-1 및 화학식 10-2에서,In Formulas (10-1) and (10-2)
R1은 할로겐 원자, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고,R 1 is a halogen atom, a substituted or unsubstituted C1 to C20 alkoxy group or a substituted or unsubstituted C6 to C20 aryl group,
R2는 치환 또는 비치환된 C3 내지 C20 지환족 고리기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고, 단, 상기 아릴기는 할로겐 원자, 치환 또는 비치환된 C1 내지 C10 알킬기, 치환 또는 비치환된 C1 내지 C10 알콕시기 및 치환 또는 비치환된 C1 내지 C10 알킬티오기로 이루어진 군에서 선택된 적어도 하나의 치환기만을 치환기로 가지고,R 2 is a substituted or unsubstituted C 3 to C 20 alicyclic ring group or a substituted or unsubstituted C 6 to C 20 aryl group, provided that the aryl group is substituted with a halogen atom, a substituted or unsubstituted C1 to C10 alkyl group, A substituted or unsubstituted C1 to C10 alkoxy group and a substituted or unsubstituted C1 to C10 alkylthio group,
R3 내지 R5는 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기이고,R 3 to R 5 are each independently a substituted or unsubstituted C1 to C20 alkyl group,
L은 하기 화학식 2로 표시되고,L is represented by the following formula (2)
[화학식 2](2)
상기 화학식 2에서,In Formula 2,
L1은 -O(C=O)- 이고L 1 is -O (C = O) - and
A는 치환 또는 비치화된 C1 내지 C20 알킬기, 치환 또는 비치환된 C3 내지 C20 지환족 고리기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이다.A is a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 alicyclic ring group, or a substituted or unsubstituted C6 to C20 aryl group.
상기 화학식 1은 하기 화학식 1-1 내지 화학식 1-10으로 이루어진 군에서 선택된 어느 하나로 표시될 수 있다.The formula (1) may be represented by one of the following formulas (1-1) to (1-10).
[화학식 1-1][Formula 1-1]
[화학식 1-2][Formula 1-2]
[화학식 1-3][Formula 1-3]
[화학식 1-4][Formula 1-4]
[화학식 1-5][Formula 1-5]
[화학식 1-6][Chemical Formula 1-6]
[화학식 1-7][Chemical Formula 1-7]
[화학식 1-8][Chemical Formula 1-8]
[화학식 1-9][Chemical Formula 1-9]
[화학식 1-10][Chemical Formula 1-10]
상기 화학식 1로 표시되는 화합물은 염료일 수 있다.The compound represented by Formula 1 may be a dye.
상기 염료는 450nm 내지 600nm의 파장범위에서 최대 흡광도를 가질 수 있다.The dye may have a maximum absorbance in the wavelength range of 450 nm to 600 nm.
다른 일 구현예는 상기 화합물을 포함하는 감광성 수지 조성물을 제공한다.Another embodiment provides a photosensitive resin composition comprising the above compound.
상기 감광성 수지 조성물은 바인더 수지, 광중합성 단량체, 광중합 개시제 및 용매를 더 포함할 수 있다.The photosensitive resin composition may further comprise a binder resin, a photopolymerizable monomer, a photopolymerization initiator, and a solvent.
상기 감광성 수지 조성물은 안료를 더 포함할 수 있다.The photosensitive resin composition may further comprise a pigment.
상기 바인더 수지는 아크릴계 바인더 수지, 카도계 바인더 수지 또는 이들의 조합을 포함할 수 있다.The binder resin may include an acrylic binder resin, a cadmium binder resin, or a combination thereof.
상기 감광성 수지 조성물은 말론산; 3-아미노-1,2-프로판디올; 실란계 커플링제; 레벨링제; 불소계 계면활성제; 라디칼 중합 개시제; 또는 이들의 조합의 첨가제를 더 포함할 수 있다.The photosensitive resin composition may include malonic acid; 3-amino-1,2-propanediol; Silane coupling agents; Leveling agents; Fluorine surfactants; A radical polymerization initiator; Or a combination thereof.
또 다른 일 구현예는 상기 감광성 수지 조성물을 이용하여 제조된 컬러필터를 제공한다.Another embodiment provides a color filter manufactured using the photosensitive resin composition.
기타 본 발명의 측면들의 구체적인 사항은 이하의 상세한 설명에 포함되어 있다.Other aspects of the present invention are included in the following detailed description.
일 구현예에 따른 화합물을 포함하는 색특성이 우수하여, 이를 포함하는 감광성 수지 조성물을 이용하면 휘도, 내열성 및 공정성 등이 우수한 컬러필터를 제공할 수 있다. The color filter including the compound according to one embodiment is excellent, and when the photosensitive resin composition containing the compound is used, a color filter excellent in brightness, heat resistance, and processability can be provided.
이하, 본 발명의 구현예를 상세히 설명하기로 한다. 다만, 이는 예시로서 제시되는 것으로, 이에 의해 본 발명이 제한되지는 않으며 본 발명은 후술할 청구범위의 범주에 의해 정의될 뿐이다. Hereinafter, embodiments of the present invention will be described in detail. However, it should be understood that the present invention is not limited thereto, and the present invention is only defined by the scope of the following claims.
본 명세서에서 특별한 언급이 없는 한, "치환" 내지 "치환된"이란, 본 발명의 작용기 중의 하나 이상의 수소 원자가 할로겐 원자(F, Cl, Br 또는 I), 히드록시기, 니트로기, 시아노기, 아미노기(NH2, NH(R200) 또는 N(R201)(R202)이고, 여기서 R200, R201 및 R202는 동일하거나 서로 상이하며, 각각 독립적으로 C1 내지 C10 알킬기 또는 C6 내지 C20 아릴기임), 아미디노기, 하이드라진기, 하이드라존기, 카르복실기, 치환 또는 비치환된 알킬기, 치환 또는 비치환된 알케닐기, 치환 또는 비치환된 알키닐기, 치환 또는 비치환된 지환족 유기기, 치환 또는 비치환된 아릴기, 및 치환 또는 비치환된 헤테로고리기로 이루어진 군에서 선택되는 1종 이상의 치환기로 치환된 것을 의미한다.Means that at least one hydrogen atom of the functional group of the present invention is substituted with a halogen atom (F, Cl, Br or I), a hydroxyl group, a nitro group, a cyano group, an amino group NH 2, NH (R 200), or N (R 201) (R 202), wherein R 200, R 201 and R 202 are the same or different, each independently represent a C1 to C10 alkyl or C6 to C20 aryl group) Substituted or unsubstituted alkenyl groups, substituted or unsubstituted alkynyl groups, substituted or unsubstituted alicyclic groups, substituted or unsubstituted alkyl groups, substituted or unsubstituted alkynyl groups, substituted or unsubstituted alicyclic groups, substituted or unsubstituted alicyclic groups, A substituted aryl group, a substituted aryl group, and a substituted or unsubstituted heterocyclic group.
본 명세서에서 특별한 언급이 없는 한, "알킬기"란 C1 내지 C20 알킬기를 의미하고, 구체적으로는 C1 내지 C15 알킬기를 의미하고, "사이클로알킬기"란 C3 내지 C20 사이클로알킬기를 의미하고, 구체적으로는 C3 내지 C18 사이클로알킬기를 의미하고, "알콕시기"란 C1 내지 C20 알콕시기를 의미하고, 구체적으로는 C1 내지 C18 알콕시기를 의미하고, "아릴기"란 C6 내지 C20 아릴기를 의미하고, 구체적으로는 C6 내지 C18 아릴기를 의미하고, "알케닐기"란 C2 내지 C20 알케닐기를 의미하고, 구체적으로는 C2 내지 C18 알케닐기를 의미하고, "알킬렌기"란 C1 내지 C20 알킬렌기를 의미하고, 구체적으로는 C1 내지 C18 알킬렌기를 의미하고, "아릴렌기"란 C6 내지 C20 아릴렌기를 의미하고, 구체적으로는 C6 내지 C16 아릴렌기를 의미한다.Unless otherwise specified in the specification, "alkyl group" means C1 to C20 alkyl group, specifically C1 to C15 alkyl group, "cycloalkyl group" means C3 to C20 cycloalkyl group, specifically C3 Refers to a C1 to C20 alkoxy group, specifically, a C1 to C18 alkoxy group, and an "aryl group" means a C6 to C20 aryl group, specifically, a C6 to C20 aryl group, Refers to a C 2 to C 20 alkenyl group, specifically, a C 2 to C 18 alkenyl group, and the "alkylene group" refers to a C 1 to C 20 alkylene group, specifically, a C1 Refers to a C6 to C20 arylene group, and specifically refers to a C6 to C16 arylene group.
본 명세서에서 특별한 언급이 없는 한, "(메타)아크릴레이트"는 "아크릴레이트"와 "메타크릴레이트" 둘 다 가능함을 의미하며, "(메타)아크릴산"은 "아크릴산"과 "메타크릴산" 둘 다 가능함을 의미한다.(Meth) acrylate "refers to both" acrylic acid "and" methacrylic acid " It means both are possible.
본 명세서에서 별도의 정의가 없는 한, "조합"이란 혼합 또는 공중합을 의미한다. 또한 "공중합"이란 블록 공중합 내지 랜덤 공중합을 의미하고, "공중합체"란 블록 공중합체 내지 랜덤 공중합체를 의미한다.As used herein, unless otherwise defined, "combination" means mixing or copolymerization. "Copolymerization" means block copolymerization or random copolymerization, and "copolymer" means block copolymer or random copolymer.
본 명세서 내 화학식에서 별도의 정의가 없는 한, 화학 결합이 그려져야 하는 위치에 화학결합이 그려져 있지 않은 경우는 상기 위치에 수소 원자가 결합되어 있음을 의미한다.Unless otherwise defined in the chemical formulas in this specification, when no chemical bond is drawn at the position where the chemical bond should be drawn, it means that the hydrogen atom is bonded at the above position.
본 명세서에서 카도계 수지란, 하기 화학식 11-1 내지 화학식 11-11로 이루어진 군에서 선택된 하나 이상의 관능기가 수지 내 주골격(backbone)에 포함되는 수지를 의미한다.As used herein, the cadmium resin means a resin in which at least one functional group selected from the group consisting of the following formulas (11-1) to (11-11) is contained in the main backbone of the resin.
본 명세서에서 별도의 정의가 없는 한, "*"는 동일하거나 상이한 원자 또는 화학식과 연결되는 부분을 의미한다.Unless otherwise defined herein, "*" means the same or different atom or moiety connected to a formula.
일 구현예는 하기 화학식 1로 표시되는 화합물을 제공한다.An embodiment provides a compound represented by the following formula (1).
[화학식 1][Chemical Formula 1]
상기 화학식 1에서,In Formula 1,
R1은 할로겐 원자, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고,R 1 is a halogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group or a substituted or unsubstituted C6 to C20 aryl group,
R2는 치환 또는 비치환된 C3 내지 C20 지환족 고리기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고, 단, 상기 아릴기는 할로겐 원자, 치환 또는 비치환된 C1 내지 C10 알킬기, 치환 또는 비치환된 C1 내지 C10 알콕시기 및 치환 또는 비치환된 C1 내지 C10 알킬티오기로 이루어진 군에서 선택된 적어도 하나의 치환기만을 치환기로 가지고,R 2 is a substituted or unsubstituted C 3 to C 20 alicyclic ring group or a substituted or unsubstituted C 6 to C 20 aryl group, provided that the aryl group is substituted with a halogen atom, a substituted or unsubstituted C1 to C10 alkyl group, A substituted or unsubstituted C1 to C10 alkoxy group and a substituted or unsubstituted C1 to C10 alkylthio group,
R3 내지 R5는 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고,R 3 to R 5 are each independently a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group or a substituted or unsubstituted C6 to C20 aryl group,
m 및 n은 각각 독립적으로 1 내지 5의 정수이고,m and n are each independently an integer of 1 to 5,
L은 하기 화학식 2로 표시되고,L is represented by the following formula (2)
[화학식 2](2)
상기 화학식 2에서,In Formula 2,
L1은 -O(C=O)- 또는 -S- 이고L 1 is -O (C = O) - or -S-
A는 치환 또는 비치화된 C1 내지 C20 알킬기, 치환 또는 비치환된 C3 내지 C20 지환족 고리기, 치환 또는 비치환된 C6 내지 C20 아릴기 또는 치환 또는 비치환된 C2 내지 C20 헤테로아릴기이다.A is a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 alicyclic ring group, a substituted or unsubstituted C6 to C20 aryl group, or a substituted or unsubstituted C2 to C20 heteroaryl group.
일 구현예에 따른 화합물은 상기 화학식 1로 표시되어, 기존 염료 대비, 우수한 분광 특성과 높은 몰흡광계수를 가지며, 사이클로헥사논, PGMEA 등의 유기용매에 대한 용해도도 우수하다.The compound according to one embodiment has the excellent spectroscopic characteristics and high molar extinction coefficient as compared with conventional dyes represented by the formula (1), and has excellent solubility in organic solvents such as cyclohexanone and PGMEA.
예컨대, 상기 R1은 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기일 수 있다. 상기 R1이 할로겐 원자일 경우, 상기 R1이 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기인 경우보다, 내열성이 저하될 수 있다.For example, R 1 may be a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aryl group. When R 1 is a halogen atom, the heat resistance is lowered when R 1 is a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aryl group .
상기 R2는 치환 또는 비치환된 아다만틸기 또는 치환 또는 비치환된 페닐기일 수 있다. 단, 상기 페닐기는 할로겐 원자, 치환 또는 비치환된 C1 내지 C10 알킬기, 치환 또는 비치환된 C1 내지 C10 알콕시기 및 치환 또는 비치환된 C1 내지 C10 알킬티오기로 이루어진 군에서 선택된 적어도 하나의 치환기만을 치환기로 가질 수 있다.R 2 may be a substituted or unsubstituted adamantyl group or a substituted or unsubstituted phenyl group. Provided that at least one substituent selected from the group consisting of a halogen atom, a substituted or unsubstituted C1 to C10 alkyl group, a substituted or unsubstituted C1 to C10 alkoxy group and a substituted or unsubstituted C1 to C10 alkylthio group is substituted with a substituent Lt; / RTI >
예컨대, 상기 R2가 트리플루오로메틸기로 치환된 페닐기인 경우, 상기 R2가 할로겐 원자, 알킬기, 알콕시기, 알킬티오기 등으로 치환된 페닐기인 경우에 비해, 내열성이 저하되는 문제가 있다.For example, when R 2 is a phenyl group substituted with a trifluoromethyl group, there is a problem that heat resistance is lowered as compared with the case where R 2 is a phenyl group substituted with a halogen atom, an alkyl group, an alkoxy group, an alkylthio group, or the like.
예컨대, 상기 R2는 '비치환된 아다만틸기' 또는 '할로겐 원자, 치환 또는 비치환된 C1 내지 C10 알킬기, 치환 또는 비치환된 C1 내지 C10 알콕시기 및 치환 또는 비치환된 C1 내지 C10 알킬티오기로 이루어진 군에서 선택된 적어도 하나의 치환기만을 치환기로 가지는 페닐기'일 수 있다.For example, R 2 may be an unsubstituted adamantyl group or a substituted or unsubstituted C 1 to C 10 alkyl group, a substituted or unsubstituted C 1 to C 10 alkyl group, a substituted or unsubstituted C 1 to C 10 alkoxy group, Or a phenyl group having, as a substituent, at least one substituent selected from the group consisting of "
상기 R3 내지 R5는 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기일 수 있다.Each of R 3 to R 5 may independently be a substituted or unsubstituted C1 to C20 alkyl group.
상기 L은 하기 화학식 3 내지 화학식 7로 이루어진 군에서 선택된 어느 하나로 표시될 수 있다.The L may be represented by any one selected from the group consisting of the following formulas (3) to (7).
[화학식 3](3)
[화학식 4][Chemical Formula 4]
[화학식 5][Chemical Formula 5]
[화학식 6][Chemical Formula 6]
[화학식 7](7)
상기 화학식 3 내지 화학식 7에서,In the above Chemical Formulas 3 to 7,
R6은 치환 또는 비치환된 C1 내지 C10 알킬기, 치환 또는 비치환된 아미노기 또는 치환 또는 비치환된 아실기이고,R 6 is a substituted or unsubstituted C1 to C10 alkyl group, a substituted or unsubstituted amino group or a substituted or unsubstituted acyl group,
R7 내지 R9는 각각 독립적으로 히드록시기 또는 치환 또는 비치환된 C1 내지 C10 알킬기이고, 단 R7 및 R8 중 적어도 하나는 히드록시기이고,R 7 to R 9 are each independently a hydroxy group or a substituted or unsubstituted C1 to C10 alkyl group, provided that at least one of R 7 and R 8 is a hydroxy group,
R10은 치환 또는 비치환된 C1 내지 C10 알킬기이고,R 10 is a substituted or unsubstituted C1 to C10 alkyl group,
o 및 p는 각각 독립적으로 1 내지 3의 정수이고, 단 2 ≤ o + p ≤ 5 이고,o and p are each independently an integer of 1 to 3, provided that 2? o + p? 5,
q는 0 내지 4의 정수이다.q is an integer of 0 to 4;
예컨대, 상기 치환 또는 비치환된 아미노기는 하기 화학식 8로 표시될 수 있다. For example, the substituted or unsubstituted amino group may be represented by the following general formula (8).
[화학식 8][Chemical Formula 8]
상기 화학식 8에서,In Formula 8,
Rx는 치환 또는 비치환된 C1 내지 C10 알킬기이고,R x is a substituted or unsubstituted C1 to C10 alkyl group,
z는 0 내지 5의 정수이다.and z is an integer of 0 to 5.
예컨대, 상기 치환 또는 비치환된 아실기는 하기 화학식 9로 표시될 수 있다.For example, the substituted or unsubstituted acyl group may be represented by the following general formula (9).
[화학식 9][Chemical Formula 9]
예컨대, 상기 R6은 t-부틸기(tert-부틸기), 상기 화학식 8로 표시되는 치환기 또는 상기 화학식 9로 표시되는 치환기일 수 있다.For example, R 6 may be a t-butyl group (tert-butyl group), a substituent represented by the formula (8) or a substituent represented by the formula (9).
예컨대, 상기 R7 내지 R9는 각각 독립적으로 히드록시기 또는 t-부틸기(tert-부틸기)이되, 단 상기 R7 및 R8 중 적어도 하나는 히드록시기일 수 있다.For example, each of R 7 to R 9 independently represents a hydroxyl group or a t-butyl group (at least one of R 7 and R 8 may be a hydroxy group).
예컨대, R10은 치환 또는 비치환된 메틸기, 치환 또는 비치환된 에틸기, 치환 또는 비치환된 프로필기, 치환 또는 비치환된 부틸기 또는 치환 또는 비치환된 펜틸기일 수 있다.For example, R 10 may be a substituted or unsubstituted methyl group, a substituted or unsubstituted ethyl group, a substituted or unsubstituted propyl group, a substituted or unsubstituted butyl group, or a substituted or unsubstituted pentyl group.
상기 화학식 1에서, 상기 R1의 위치는 오르쏘(ortho), 메타(meta) 또는 파라(para)일 수 있다. 예컨대, 상기 R1의 위치는 오르쏘(ortho) 또는 파라(para), 예컨대, 오르쏘(ortho)일 수 있다. 상기 R1의 위치가 메타(meta), 파라(para), 오르쏘(ortho) 순으로 변경될수록, 휘도 및 내열성이 우수해질 수 있다. 즉, 상기 R1의 위치가 메타(meta)인 화합물보다는 상기 R1의 위치가 파라(para)인 화합물이 휘도 및 내열성이 더 우수할 수 있고, 상기 R1의 위치가 파라(para)인 화합물보다는 상기 R1의 위치가 오르쏘(ortho)인 화합물이 휘도 및 내열성이 더 우수할 수 있다.In Formula 1, the position of R 1 may be ortho, meta or para. For example, the position of R 1 may be ortho or para, such as ortho. As the position of R 1 is changed in the order of meta, para and ortho, luminance and heat resistance can be improved. That is a compound, the position of the R 1 metadata (meta) of the position of the R 1 p (para) of the compound, and the luminance and the heat resistance can be more excellent, the location is p (para) of the R 1, rather than compound A compound in which the position of R < 1 > is ortho may be more excellent in luminance and heat resistance.
예컨대, 상기 화학식 1로 표시되는 화합물은 하기 화학식 10-1로 표시되는 화합물 또는 하기 화학식 10-2로 표시되는 화합물일 수 있다.For example, the compound represented by Formula 1 may be a compound represented by Formula 10-1 or a compound represented by Formula 10-2.
[화학식 10-1][Formula 10-1]
[화학식 10-2][Formula 10-2]
상기 화학식 10-1 및 화학식 10-2에서,In Formulas (10-1) and (10-2)
R1은 할로겐 원자, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고,R 1 is a halogen atom, a substituted or unsubstituted C1 to C20 alkoxy group or a substituted or unsubstituted C6 to C20 aryl group,
R2는 치환 또는 비치환된 C3 내지 C20 지환족 고리기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고, 단, 상기 아릴기는 할로겐 원자, 치환 또는 비치환된 C1 내지 C10 알킬기, 치환 또는 비치환된 C1 내지 C10 알콕시기 및 치환 또는 비치환된 C1 내지 C10 알킬티오기로 이루어진 군에서 선택된 적어도 하나의 치환기만을 치환기로 가지고,R 2 is a substituted or unsubstituted C 3 to C 20 alicyclic ring group or a substituted or unsubstituted C 6 to C 20 aryl group, provided that the aryl group is substituted with a halogen atom, a substituted or unsubstituted C1 to C10 alkyl group, A substituted or unsubstituted C1 to C10 alkoxy group and a substituted or unsubstituted C1 to C10 alkylthio group,
R3 내지 R5는 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기이고,R 3 to R 5 are each independently a substituted or unsubstituted C1 to C20 alkyl group,
L은 하기 화학식 2로 표시되고,L is represented by the following formula (2)
[화학식 2](2)
상기 화학식 2에서,In Formula 2,
L1은 -O(C=O)- 이고L 1 is -O (C = O) - and
A는 치환 또는 비치화된 C1 내지 C20 알킬기, 치환 또는 비치환된 C3 내지 C20 지환족 고리기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이다.A is a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 alicyclic ring group, or a substituted or unsubstituted C6 to C20 aryl group.
상기 화학식 1로 표시되는 화합물은 하기 화학식 1-1로 표시되는 화합물 내지 화학식 1-10으로 표시되는 화합물로 이루어진 군에서 선택된 어느 하나로 표시될 수 있다.The compound represented by the formula (1) may be represented by any one selected from the group consisting of a compound represented by the following formula (1-1) to a compound represented by the following formula (1-10).
[화학식 1-1][Formula 1-1]
[화학식 1-2][Formula 1-2]
[화학식 1-3][Formula 1-3]
[화학식 1-4][Formula 1-4]
[화학식 1-5][Formula 1-5]
[화학식 1-6][Chemical Formula 1-6]
[화학식 1-7][Chemical Formula 1-7]
[화학식 1-8][Chemical Formula 1-8]
[화학식 1-9][Chemical Formula 1-9]
[화학식 1-10][Chemical Formula 1-10]
일 구현예에 따른 화합물은 상기 화학식 1로 표시됨으로써, 적은 양으로도 보다 선명한 색의 발현이 가능하여, 착색제로 사용 시 휘도나 명암비 등의 색특성이 우수한 디스플레이 소자의 제조가 가능하다. 예컨대, 상기 화합물은 착색제, 예컨대 염료, 예컨대 청색 또는 바이올렛 염료, 예컨대 300nm 내지 450nm의 파장범위에서 최대 흡광도를 가지는 염료일 수 있다.The compounds according to one embodiment are represented by the above formula (1), so that a clearer color can be expressed with a small amount, and a display device having excellent color characteristics such as luminance and contrast ratio can be manufactured when used as a colorant. For example, the compound may be a colorant, such as a dye, such as a blue or violet dye, for example a dye having a maximum absorbance in the wavelength range of 300 nm to 450 nm.
일반적으로, 염료는 컬러필터 내에 사용되는 구성성분 중 가장 고가의 구성성분이다. 그러므로, 원하는 효과, 예컨대 고휘도나 고명암비 등을 달성하기 위해서는 고가의 염료를 더 많이 사용해야 하기 때문에 생산 단가가 상승할 수 밖에 없었다. 그러나, 일 구현예에 따른 화합물을 컬러필터 내 염료로 사용하는 경우, 적은 양으로도 고휘도, 고명암비 등의 우수한 색특성을 달성할 수 있어 생산 단가의 절감이 가능하다.In general, dyes are the most expensive component of the components used in color filters. Therefore, in order to achieve a desired effect, for example, a high luminance and a high contrast ratio, it is necessary to use more expensive dye, so that the production cost has to be increased. However, when the compound according to one embodiment is used as a dye in a color filter, excellent color characteristics such as high luminance and high contrast ratio can be achieved even in a small amount, and production cost can be reduced.
다른 일 구현예에 따르면, 상기 일 구현예에 따른 화합물을 포함하는 감광성 수지 조성물을 제공한다.According to another embodiment, there is provided a photosensitive resin composition comprising the compound according to one embodiment.
예컨대, 상기 감광성 수지 조성물은 상기 일 구현예에 따른 화합물, 바인더 수지, 광중합성 단량체, 광중합 개시제 및 용매를 포함할 수 있다.For example, the photosensitive resin composition may include a compound according to one embodiment, a binder resin, a photopolymerizable monomer, a photopolymerization initiator, and a solvent.
예컨대, 상기 감광성 수지 조성물은 안료를 더 포함할 수도 있다.For example, the photosensitive resin composition may further comprise a pigment.
상기 일 구현예에 따른 화합물은 감광성 수지 조성물 내에서 착색제, 예컨대 염료, 예컨대 청색 또는 바이올렛 염료로서의 역할을 하여, 우수한 색특성을 발현할 수 있다.The compound according to one embodiment acts as a coloring agent such as a dye, for example, a blue or violet dye in the photosensitive resin composition, and can exhibit excellent color characteristics.
상기 안료는 황색 안료, 녹색 안료, 적색 안료, 청색 안료, 바이올렛 안료 또는 이들의 조합 등을 포함할 수 있으나 이에 한정되는 것은 아니다. 예컨대 상기 안료는 안료분산액의 형태로 상기 감광성 수지 조성물에 포함될 수 있다.The pigments may include, but are not limited to, yellow pigments, green pigments, red pigments, blue pigments, violet pigments, or combinations thereof. For example, the pigment may be included in the photosensitive resin composition in the form of a pigment dispersion.
상기 안료분산액은 고형분의 안료, 용제 및 상기 용제 내에 상기 안료를 균일하게 분산시키기 위한 분산제를 포함할 수 있다.The pigment dispersion may include a solid pigment, a solvent, and a dispersant for uniformly dispersing the pigment in the solvent.
상기 고형분의 안료는 안료분산액 총량에 대하여 1 중량% 내지 20 중량%, 예컨대 8 중량% 내지 20 중량%, 예컨대 15 중량% 내지 20 중량%, 예컨대 8 중량% 내지 15 중량%, 예컨대 10 중량% 내지 20 중량%, 예컨대 10 중량% 내지 15 중량%로 포함될 수 있다.The solid pigment may be present in the pigment dispersion in an amount ranging from 1% to 20%, such as 8% to 20%, such as 15% to 20%, such as 8% to 15% 20% by weight, such as 10% by weight to 15% by weight.
상기 분산제로는 비이온성 분산제, 음이온성 분산제, 양이온성 분산제 등을 사용할 수 있다. 상기 분산제의 구체적인 예로는, 폴리알킬렌글리콜 및 이의 에스테르, 폴리옥시알킬렌, 다가알코올 에스테르 알킬렌 옥사이드 부가물, 알코올알킬렌 옥사이드 부가물, 술폰산 에스테르, 술폰산 염, 카르복실산 에스테르, 카르복실산 염, 알킬아미드 알킬렌 옥사이드 부가물, 알킬 아민 등을 들 수 있으며, 이들을 단독으로 또는 둘 이상 혼합하여 사용할 수 있다.As the dispersing agent, a nonionic dispersing agent, an anionic dispersing agent, a cationic dispersing agent and the like can be used. Specific examples of the dispersing agent include polyalkylene glycols and esters thereof, polyoxyalkylene, polyhydric alcohol ester alkylene oxide adduct, alcohol alkylene oxide adduct, sulfonic acid ester, sulfonic acid salt, carboxylic acid ester, carboxylic acid Salts, alkylamide alkylene oxide adducts, and alkylamines. These may be used singly or in combination of two or more.
상기 분산제의 시판되는 제품을 예로 들면, BYK社의 DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165, DISPERBYK-166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182, DISPERBYK-2000, DISPERBYK-2001 등; EFKA 케미칼社의 EFKA-47, EFKA-47EA, EFKA-48, EFKA-49, EFKA-100, EFKA-400, EFKA-450 등; Zeneka社의 Solsperse 5000, Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000, Solsperse 20000, Solsperse24000GR, Solsperse 27000, Solsperse 28000 등; 또는 Ajinomoto社의 PB711, PB821 등이 있다.DISPERBYK-161, DISPERBYK-160, DISPERBYK-161, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-160 and DISPERBYK-160 of BYK Co., -166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182, DISPERBYK-2000, DISPERBYK-2001 and the like; EFKA-47, EFKA-47EA, EFKA-48, EFKA-49, EFKA-100, EFKA-400 and EFKA-450 of EFKA Chemical Co., Solsperse 5000, Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000, Solsperse 20000, Solsperse24000GR, Solsperse 27000, Solsperse 28000 from Zeneka; Or Ajinomoto's PB711 and PB821.
상기 분산제는 안료분산액 총량에 대하여 1 중량% 내지 20 중량%로 포함될 수 있다. 분산제가 상기 범위 내로 포함될 경우, 적절한 점도를 유지할 수 있어 감광성 수지 조성물의 분산성이 우수하며, 이로 인해 제품 적용 시 광학적, 물리적 및 화학적 품질을 유지할 수 있다.The dispersing agent may be contained in an amount of 1 to 20% by weight based on the total amount of the pigment dispersion. When the dispersing agent is contained within the above range, the dispersibility of the photosensitive resin composition can be maintained because an appropriate viscosity can be maintained, so that optical, physical and chemical quality can be maintained when the product is applied.
상기 안료분산액을 형성하는 용제로는 에틸렌글리콜 아세테이트, 에틸셀로솔브, 프로필렌글리콜 모노메틸에테르아세테이트, 에틸락테이트, 폴리에틸렌글리콜, 사이클로헥사논, 프로필렌글리콜 메틸에테르 등을 사용할 수 있다. As the solvent for forming the pigment dispersion, ethylene glycol acetate, ethyl cellosolve, propylene glycol monomethyl ether acetate, ethyl lactate, polyethylene glycol, cyclohexanone, propylene glycol methyl ether and the like can be used.
상기 안료분산액은 상기 감광성 수지 조성물 총량에 대하여 5 중량% 내지 30 중량%, 예컨대 10 중량% 내지 25 중량%로 포함될 수 있다. 상기 안료분산액이 상기 범위 내로 포함될 경우, 공정마진 확보에 유리하고, 색재현율 및 명암비가 우수해진다.The pigment dispersion may be contained in an amount of 5% by weight to 30% by weight, for example, 10% by weight to 25% by weight based on the total amount of the photosensitive resin composition. When the pigment dispersion is contained within the above range, it is advantageous in securing a process margin and excellent color reproduction ratio and contrast ratio.
상기 바인더 수지는 아크릴계 바인더 수지, 카도계 바인더 수지 또는 이들의 조합일 수 있다.The binder resin may be an acrylic binder resin, a carcass binder resin, or a combination thereof.
상기 아크릴계 바인더 수지는 제1 에틸렌성 불포화 단량체 및 이와 공중합 가능한 제2 에틸렌성 불포화 단량체의 공중합체로, 하나 이상의 아크릴계 반복단위를 포함하는 수지일 수 있다. The acrylic binder resin is a copolymer of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable with the first ethylenically unsaturated monomer, and may be a resin containing at least one acrylic repeating unit.
상기 제1 에틸렌성 불포화 단량체는 하나 이상의 카르복시기를 함유하는 에틸렌성 불포화 단량체이며, 이의 구체적인 예로는 아크릴산, 메타크릴산, 말레산, 이타콘산, 푸마르산 또는 이들의 조합을 들 수 있다.The first ethylenically unsaturated monomer is an ethylenically unsaturated monomer containing at least one carboxyl group, and specific examples thereof include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, or a combination thereof.
상기 제1 에틸렌성 불포화 단량체는 상기 아크릴계 바인더 수지 총량에 대하여 5 중량% 내지 50 중량%, 예컨대 10 중량% 내지 40 중량%로 포함될 수 있다.The first ethylenically unsaturated monomer may be included in an amount of 5% by weight to 50% by weight, for example, 10% by weight to 40% by weight based on the total amount of the acrylic binder resin.
상기 제2 에틸렌성 불포화 단량체는 스티렌, α-메틸스티렌, 비닐톨루엔, 비닐벤질메틸에테르 등의 방향족 비닐 화합물; 메틸(메타)아크릴레이트, 에틸(메타)아크릴레이트, 부틸(메타)아크릴레이트, 2-히드록시에틸(메타)아크릴레이트, 2-히드록시 부틸(메타)아크릴레이트, 벤질(메타)아크릴레이트, 사이클로헥실(메타)아크릴레이트, 페닐(메타)아크릴레이트 등의 불포화 카르복시산 에스테르 화합물; 2-아미노에틸(메타)아크릴레이트, 2-디메틸아미노에틸(메타)아크릴레이트 등의 불포화 카르복시산 아미노 알킬 에스테르 화합물; 초산비닐, 안식향산 비닐 등의 카르복시산 비닐 에스테르 화합물; 글리시딜(메타)아크릴레이트 등의 불포화 카르복시산 글리시딜 에스테르 화합물; (메타)아크릴로니트릴 등의 시안화 비닐 화합물; (메타)아크릴아미드 등의 불포화 아미드 화합물; 등을 들 수 있으며, 이들을 단독으로 또는 둘 이상 혼합하여 사용할 수 있다.The second ethylenically unsaturated monomer may be an aromatic vinyl compound such as styrene,? -Methylstyrene, vinyltoluene, or vinylbenzyl methyl ether; (Meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, benzyl (meth) acrylate, Unsaturated carboxylic acid ester compounds such as cyclohexyl (meth) acrylate and phenyl (meth) acrylate; Unsaturated carboxylic acid aminoalkyl ester compounds such as 2-aminoethyl (meth) acrylate and 2-dimethylaminoethyl (meth) acrylate; Carboxylic acid vinyl ester compounds such as vinyl acetate and vinyl benzoate; Unsaturated carboxylic acid glycidyl ester compounds such as glycidyl (meth) acrylate; A vinyl cyanide compound such as (meth) acrylonitrile; Unsaturated amide compounds such as (meth) acrylamide; These may be used singly or in combination of two or more.
상기 아크릴계 바인더 수지의 구체적인 예로는 폴리벤질메타크릴레이트 공중합체, (메타)아크릴산/벤질메타크릴레이트 공중합체, (메타)아크릴산/벤질메타크릴레이트/스티렌 공중합체, (메타)아크릴산/벤질메타크릴레이트/2-히드록시에틸메타크릴레이트 공중합체, (메타)아크릴산/벤질메타크릴레이트/스티렌/2-히드록시에틸메타크릴레이트 공중합체 등을 들 수 있으나, 이에 한정되는 것은 아니며, 이들을 단독 또는 2종 이상을 배합하여 사용할 수도 있다.Specific examples of the acrylic binder resin include polybenzyl methacrylate copolymer, (meth) acrylic acid / benzyl methacrylate copolymer, (meth) acrylic acid / benzyl methacrylate / styrene copolymer, (meth) acrylic acid / benzyl methacrylate (Meth) acrylic acid / benzyl methacrylate / styrene / 2-hydroxyethyl methacrylate copolymer, but are not limited thereto, and they may be used alone or in combination of two or more. Two or more kinds may be used in combination.
상기 아크릴계 바인더 수지의 중량평균 분자량은 3,000 g/mol 내지 150,000 g/mol, 예컨대 5,000 g/mol 내지 50,000 g/mol, 예컨대 20,000 g/mol 내지 30,000 g/mol 일 수 있다. 상기 아크릴계 바인더 수지의 중량평균 분자량이 상기 범위 내일 경우, 상기 감광성 수지 조성물의 물리적 및 화학적 물성이 우수하고 점도가 적절하며, 컬러필터 제조 시 기판과의 밀착성이 우수하다. The weight average molecular weight of the acrylic binder resin may be from 3,000 g / mol to 150,000 g / mol, such as from 5,000 g / mol to 50,000 g / mol, such as from 20,000 g / mol to 30,000 g / mol. When the weight average molecular weight of the acrylic binder resin is within the above range, the photosensitive resin composition is excellent in physical and chemical properties, has an appropriate viscosity, and is excellent in adhesion to a substrate during the production of a color filter.
상기 아크릴계 바인더 수지의 산가는 15 mgKOH/g 내지 60 mgKOH/g, 예컨대 20 mgKOH/g 내지 50 mgKOH/g 일 수 있다. 상기 아크릴계 바인더 수지의 산가가 상기 범위 내일 경우 픽셀 패턴의 해상도가 우수하다.The acid value of the acrylic binder resin may be from 15 mgKOH / g to 60 mgKOH / g, such as from 20 mgKOH / g to 50 mgKOH / g. When the acid value of the acrylic binder resin is within the above range, the resolution of the pixel pattern is excellent.
상기 카도계 바인더 수지는 하기 화학식 11로 표시되는 반복단위를 포함할 수 있다.The cadmium binder resin may include a repeating unit represented by the following formula (11).
[화학식 11](11)
상기 화학식 11에서,In Formula 11,
R11 및 R12는 각각 독립적으로 수소원자 또는 치환 또는 비치환된 (메타)아크릴로일옥시알킬기이고,R 11 and R 12 are each independently a hydrogen atom or a substituted or unsubstituted (meth) acryloyloxyalkyl group,
R13 및 R14는 각각 독립적으로 수소원자, 할로겐 원자 또는 치환 또는 비치환된 C1 내지 C20 알킬기이고, R 13 and R 14 are each independently a hydrogen atom, a halogen atom or a substituted or unsubstituted C1 to C20 alkyl group,
Z1은 단일결합, O, CO, SO2, CR15R16, SiR17R18(여기서, R15 내지 R18은 각각 독립적으로 수소원자 또는 치환 또는 비치환된 C1 내지 C20 알킬기임) 또는 하기 화학식 11-1 내지 화학식 11-11로 표시되는 연결기 중 어느 하나이고, Z 1 is a single bond, O, CO, SO 2 , CR 15 R 16 , SiR 17 R 18 (wherein R 15 to R 18 are each independently a hydrogen atom or a substituted or unsubstituted C 1 to C 20 alkyl group) Is any one of the linking groups represented by formulas (11-1) to (11-11)
[화학식 11-1][Formula 11-1]
[화학식 11-2][Formula 11-2]
[화학식 11-3][Formula 11-3]
[화학식 11-4][Formula 11-4]
[화학식 11-5][Formula 11-5]
(상기 화학식 11-5에서,(11-5)
Ra는 수소원자, 에틸기, C2H4Cl, C2H4OH, CH2CH=CH2 또는 페닐기이다.)R a is a hydrogen atom, an ethyl group, C 2 H 4 Cl, C 2 H 4 OH, CH 2 CH = CH 2 or a phenyl group.
[화학식 11-6][Formula 11-6]
[화학식 11-7][Formula 11-7]
[화학식 11-8][Formula 11-8]
[화학식 11-9][Formula 11-9]
[화학식 11-10][Chemical Formula 11-10]
[화학식 11-11][Formula 11-11]
Z2는 산이무수물 잔기이고,Z 2 is an acid anhydride residue,
m1 및 m2는 각각 독립적으로 0 내지 4의 정수이다.m1 and m2 are each independently an integer of 0 to 4;
상기 카도계 바인더 수지는 양 말단 중 적어도 하나에 하기 화학식 12로 표시되는 관능기를 포함할 수 있다.The cadmium-based binder resin may include a functional group represented by the following formula (12) in at least one of the two terminals.
[화학식 12][Chemical Formula 12]
상기 화학식 12에서,In Formula 12,
Z3은 하기 화학식 12-1 내지 화학식 12-7로 표시될 수 있다.Z 3 may be represented by the following formulas (12-1) to (12-7).
[화학식 12-1][Formula 12-1]
(상기 화학식 12-1에서, Rb 및 Rc는 각각 독립적으로, 수소원자, 치환 또는 비치환된 C1 내지 C20 알킬기, 에스테르기 또는 에테르기이다.)(Wherein R b and R c are each independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, an ester group or an ether group).
[화학식 12-2][Formula 12-2]
[화학식 12-3][Formula 12-3]
[화학식 12-4][Chemical Formula 12-4]
[화학식 12-5][Formula 12-5]
(상기 화학식 12-5에서, Rd는 O, S, NH, 치환 또는 비치환된 C1 내지 C20 알킬렌기, C1 내지 C20 알킬아민기 또는 C2 내지 C20 알케닐아민기이다.)(Wherein R d is O, S, NH, a substituted or unsubstituted C1 to C20 alkylene group, a C1 to C20 alkylamine group, or a C2 to C20 alkenylamine group).
[화학식 12-6][Chemical Formula 12-6]
[화학식 12-7][Chemical Formula 12-7]
상기 카도계 바인더 수지는 예컨대, 9,9-비스(4-옥시라닐메톡시페닐)플루오렌등의플루오렌함유화합물; 벤젠테트라카르복실산디무수물, 나프탈렌테트라카르복실산디무수물, 비페닐테트라카르복실산디무수물, 벤조페논테트라카르복실산디무수물, 피로멜리틱디무수물, 사이클로부탄테트라카르복실산디무수물, 페릴렌테트라카르복실산디무수물, 테트라히드로푸란테트라카르복실산디무수물, 테트라하이드로프탈산무수물등의무수물화합물; 에틸렌글리콜, 프로필렌글리콜, 폴리에틸렌글리콜등의글리콜화합물; 메탄올, 에탄올, 프로판올, n-부탄올, 사이클로헥산올, 벤질알코올등의알코올화합물; 프로필렌글리콜메틸에틸아세테이트, N-메틸피롤리돈등의용매류화합물; 트리페닐포스핀등의인화합물; 및테트라메틸암모늄클로라이드, 테트라에틸암모늄브로마이드, 벤질디에틸아민, 트리에틸아민, 트리부틸아민, 벤질트리에틸암모늄클로라이드 등의 아민 또는 암모늄염 화합물 중에서 둘 이상을 혼합하여 제조할 수 있다.Examples of the cationic binder resin include fluorene-containing compounds such as 9,9-bis (4-oxiranylmethoxyphenyl) fluorene; Benzene tetracarboxylic dianhydride, naphthalene tetracarboxylic dianhydride, biphenyl tetracarboxylic dianhydride, benzophenone tetracarboxylic dianhydride, pyromellitic dianhydride, cyclobutanetetracarboxylic dianhydride, perylenetetracarboxylic dianhydride , Tetrahydrofuran tetracarboxylic acid dianhydride, tetrahydrophthalic anhydride and the like; Glycol compounds such as ethylene glycol, propylene glycol, and polyethylene glycol; Alcohol compounds such as methanol, ethanol, propanol, n-butanol, cyclohexanol and benzyl alcohol; Propylene glycol methyl ethyl acetate, and N-methyl pyrrolidone; Phosphorus compounds such as triphenylphosphine; And an amine or an ammonium salt compound such as tetramethylammonium chloride, tetraethylammonium bromide, benzyldiethylamine, triethylamine, tributylamine, benzyltriethylammonium chloride, or the like.
카도계 바인더 수지의 경우, 현상성이 낮아, 상기 카도계 바인더 수지를 포함하는 감광성 수지 조성물을 이용하여 컬러필터 제조 시, 패턴의 현상성 제어에 어려움을 겪을 수 있다. 이 경우, 상기 카도계 바인더 수지와 함께, 전술한 아크릴계 바인더 수지를 함께 바인더 수지로 사용하여, 패턴의 현상성을 제어할 수 있다.In the case of the cadmium-based binder resin, the developability is low, and when the color filter is manufactured using the photosensitive resin composition containing the cadmium-based binder resin, it is difficult to control the developability of the pattern. In this case, the developability of the pattern can be controlled by using the above-mentioned acrylic binder resin together with the cadmium-based binder resin as a binder resin.
나아가, 상기 카도계 바인더 수지를 전술한 아크릴계 바인더 수지와 함께 사용할 경우, 밀착력이 우수하고, 고해상도 및 고휘도 특성을 가지는 감광성 수지 조성물을 얻을 수 있다.Furthermore, when the cationic binder resin is used together with the acrylic binder resin described above, a photosensitive resin composition having excellent adhesion and high resolution and high brightness characteristics can be obtained.
상기 카도계 바인더 수지의 중량평균분자량은 500 g/mol 내지 50,000 g/mol, 예컨대 3,000 g/mol 내지 30,000 g/mol 일 수 있다. 상기 카도계 바인더 수지의 중량평균분자량이 상기 범위 내일 경우 컬러필터 제조 시 잔사없이 패턴 형성이 잘 되며, 현상 시 막 두께의 손실이 없고, 양호한 패턴을 얻을 수 있다.The weight average molecular weight of the cationic binder resin may be from 500 g / mol to 50,000 g / mol, such as from 3,000 g / mol to 30,000 g / mol. When the weight average molecular weight of the cationic binder resin is within the above range, pattern formation is good without residue in the production of a color filter, no loss of film thickness during development, and good patterns can be obtained.
상기 카도계 바인더 수지는 100 mgKOH/g 내지 140 mgKOH/g의 산가를 가질 수 있다. The cadmium binder resin may have an acid value of from 100 mgKOH / g to 140 mgKOH / g.
상기 광중합성 단량체는 적어도 1개의 에틸렌성 불포화 이중결합을 가지는 (메타)아크릴산의 일관능 또는 다관능 에스테르가 사용될 수 있다.The photopolymerizable monomer may be a monofunctional or polyfunctional ester of (meth) acrylic acid having at least one ethylenically unsaturated double bond.
상기 광중합성 단량체는 상기 에틸렌성 불포화 이중결합을 가짐으로써, 패턴 형성 공정에서 노광시 충분한 중합을 일으킴으로써 내열성, 내광성 및 내화학성이 우수한 패턴을 형성할 수 있다.Since the photopolymerizable monomer has the ethylenically unsaturated double bond, sufficient polymerization is caused during exposure in the pattern formation step, whereby a pattern having excellent heat resistance, light resistance and chemical resistance can be formed.
상기 광중합성 단량체의 구체적인 예로는, 에틸렌 글리콜 디(메타)아크릴레이트, 디에틸렌 글리콜 디(메타)아크릴레이트, 트리에틸렌 글리콜 디(메타)아크릴레이트, 프로필렌 글리콜 디(메타)아크릴레이트, 네오펜틸 글리콜 디(메타)아크릴레이트, 1,4-부탄디올 디(메타)아크릴레이트, 1,6-헥산디올 디(메타)아크릴레이트, 비스페놀A 디(메타)아크릴레이트, 펜타에리트리톨 디(메타)아크릴레이트, 펜타에리트리톨 트리(메타)아크릴레이트, 펜타에리트리톨 테트라(메타)아크릴레이트, 펜타에리트리톨 헥사(메타)아크릴레이트, 디펜타에리트리톨 디(메타)아크릴레이트, 디펜타에리트리톨 트리(메타)아크릴레이트, 디펜타에리트리톨 펜타(메타)아크릴레이트, 디펜타에리트리톨 헥사(메타)아크릴레이트, 비스페놀A 에폭시(메타)아크릴레이트, 에틸렌 글리콜 모노메틸에테르 (메타)아크릴레이트, 트리메틸올 프로판 트리(메타)아크릴레이트, 트리스(메타)아크릴로일옥시에틸 포스페이트, 노볼락에폭시 (메타)아크릴레이트 등을 들 수 있다. Specific examples of the photopolymerizable monomer include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, neopentyl glycol Acrylate such as di (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, bisphenol A di (meth) acrylate, pentaerythritol di (Meth) acrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol hexa (meth) acrylate, dipentaerythritol di Acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, bisphenol A epoxy (meth) acrylate, ethylene glycol There may be mentioned furnace methyl ether (meth) acrylate, trimethylolpropane tri (meth) acrylate, tris (meth) acryloyloxyethyl phosphate, novolak epoxy (meth) acrylate, and the like.
상기 광중합성 단량체의 시판되는 제품을 예로 들면 다음과 같다. 상기 (메타)아크릴산의 일관능 에스테르의 예로는, 도아 고세이 가가꾸 고교(주)社의 아로닉스 M-101®, 동 M-111®, 동 M-114® 등; 니혼 가야꾸(주)社의 KAYARAD TC-110S®, 동 TC-120S® 등; 오사카 유끼 가가꾸 고교(주)社의 V-158®, V-2311® 등을 들 수 있다. 상기 (메타)아크릴산의 이관능 에스테르의 예로는, 도아 고세이 가가꾸 고교(주)社의 아로닉스 M-210®, 동 M-240®, 동 M-6200® 등; 니혼 가야꾸(주)社의 KAYARAD HDDA®, 동 HX-220®, 동 R-604® 등; 오사카 유끼 가가꾸 고교(주)社의 V-260®, V-312®, V-335 HP® 등을 들 수 있다. 상기 (메타)아크릴산의 삼관능 에스테르의 예로는, 도아 고세이 가가꾸 고교(주)社의 아로닉스 M-309®, 동 M-400®, 동 M-405®, 동 M-450®, 동 M-710®, 동 M-8030®, 동 M-8060® 등; 니혼 가야꾸(주)社의 KAYARAD TMPTA®, 동 DPCA-20®, 동-30®, 동-60®, 동-120® 등; 오사카 유끼 가야꾸 고교(주)社의 V-295®, 동-300®, 동-360®, 동-GPT®, 동-3PA®, 동-400® 등을 들 수 있다. 상기 제품을 단독 사용 또는 2종 이상 함께 사용할 수 있다.A commercially available product of the photopolymerizable monomer is exemplified as follows. The (meth) acrylic acid is one example of a polyfunctional ester, such as doah Gosei Kagaku Kogyo's (primary)社Aronix M-101 ®, the same M-111 ®, the same M-114 ®; KAYARAD TC-110S ® and TC-120S ® from Nihon Kayaku Co., Ltd.; Osaka yukki the like Kagaku Kogyo (main)社of V-158 ®, V-2311 ®. The (meth) transfer function of an example esters of acrylic acid are, doah Gosei Kagaku Kogyo (Note)社of Aronix M-210 ®, copper or the like M-240 ®, the same M-6200 ®; KAYARAD HDDA ® , HX-220 ® and R-604 ® from Nihon Kayaku Corporation; Osaka yukki the like Kagaku Kogyo Co., Ltd. of 社V-260 ®, V- 312 ®, V-335 HP ®. Examples of the tri-functional ester of (meth) acrylic acid, doah Gosei Kagaku Kogyo (Note)社of Aronix M-309 ®, the same M-400 ®, the same M-405 ®, the same M-450 ®, Dong M -710 ® , copper M-8030 ® , copper M-8060 ® and the like; Nippon Kayaku (Note)社of KAYARAD TMPTA ®, copper DPCA-20 ®, ® copper -30, -60 ® copper, copper ® -120 and the like; Osaka yukki Kayaku high (primary)社of V-295 ®, copper ® -300, -360 ® copper, copper -GPT ®, copper -3PA ®, and the like copper -400 ®. These products may be used alone or in combination of two or more.
상기 광중합성 단량체는 보다 우수한 현상성을 부여하기 위하여 산무수물로 처리하여 사용할 수도 있다.The photopolymerizable monomer may be treated with an acid anhydride to give better developing properties.
상기 광중합 개시제는 감광성 수지 조성물에 일반적으로 사용되는 개시제로서, 예를 들어 아세토페논계 화합물, 벤조페논계 화합물, 티오크산톤계 화합물, 벤조인계 화합물, 트리아진계 화합물, 옥심계 화합물 또는 이들의 조합을 사용할 수 있다. The photopolymerization initiator is an initiator generally used in a photosensitive resin composition, for example, an acetophenone compound, a benzophenone compound, a thioxanthone compound, a benzoin compound, a triazine compound, a oxime compound, Can be used.
상기 아세토페논계의 화합물의 예로는, 2,2'-디에톡시 아세토페논, 2,2'-디부톡시 아세토페논, 2-히드록시-2-메틸프로피오페논, p-t-부틸트리클로로 아세토페논, p-t-부틸디클로로 아세토페논, 4-클로로 아세토페논, 2,2'-디클로로-4-페녹시 아세토페논, 2-메틸-1-(4-(메틸티오)페닐)-2-모폴리노프로판-1-온, 2-벤질-2-디메틸아미노-1-(4-모폴리노페닐)-부탄-1-온 등을 들 수 있다.Examples of the acetophenone-based compound include 2,2'-diethoxyacetophenone, 2,2'-dibutoxyacetophenone, 2-hydroxy-2-methylpropiophenone, pt-butyltrichloroacetophenone, dichloro-4-phenoxyacetophenone, 2-methyl-1- (4- (methylthio) phenyl) -2-morpholinopropanone, p-butyldichloroacetophenone, 1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one.
상기 벤조페논계 화합물의 예로는, 벤조페논, 벤조일 안식향산, 벤조일 안식향산 메틸, 4-페닐 벤조페논, 히드록시 벤조페논, 아크릴화 벤조페논, 4,4'-비스(디메틸 아미노)벤조페논, 4,4'-비스(디에틸아미노)벤조페논, 4,4'-디메틸아미노벤조페논, 4,4'-디클로로벤조페논, 3,3'-디메틸-2-메톡시벤조페논 등을 들 수 있다.Examples of the benzophenone compound include benzophenone, benzoyl benzoic acid, methyl benzoyl benzoate, 4-phenylbenzophenone, hydroxybenzophenone, acrylated benzophenone, 4,4'-bis (dimethylamino) benzophenone, '-Bis (diethylamino) benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, and 3,3'-dimethyl-2-methoxybenzophenone.
상기 티오크산톤계 화합물의 예로는, 티오크산톤, 2-메틸티오크산톤, 이소프로필 티오크산톤, 2,4-디에틸 티오크산톤, 2,4-디이소프로필 티오크산톤, 2-클로로티오크산톤 등을 들 수 있다.Examples of the thioxanthone compound include thioxanthone, 2-methylthioxanthone, isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone, 2- Chlorothioxanthone and the like.
상기 벤조인계 화합물의 예로는, 벤조인, 벤조인 메틸 에테르, 벤조인 에틸 에테르, 벤조인 이소프로필 에테르, 벤조인 이소부틸 에테르, 벤질디메틸케탈 등을 들 수 있다.Examples of the benzoin compound include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, and benzyl dimethyl ketal.
상기 트리아진계 화합물의 예로는, 2,4,6-트리클로로-s-트리아진, 2-페닐 4,6-비스(트리클로로메틸)-s-트리아진, 2-(3', 4'-디메톡시스티릴)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(4'-메톡시나프틸)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(p-메톡시페닐)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(p-톨릴)-4,6-비스(트리클로로 메틸)-s-트리아진, 2-비페닐 4,6-비스(트리클로로 메틸)-s-트리아진, 비스(트리클로로메틸)-6-스티릴-s-트리아진, 2-(나프토-1-일)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(4-메톡시나프토-1-일)-4,6-비스(트리클로로메틸)-s-트리아진, 2-4-비스(트리클로로메틸)-6-피페로닐-s-트리아진, 2-4-비스(트리클로로메틸)-6-(4-메톡시스티릴)-s-트리아진 등을 들 수 있다.Examples of the triazine-based compound include 2,4,6-trichloro-s-triazine, 2-phenyl 4,6-bis (trichloromethyl) (Trichloromethyl) -s-triazine, 2- (4'-methoxynaphthyl) -4,6-bis (trichloromethyl) Bis (trichloromethyl) -s-triazine, 2- (p-tolyl) -4,6-bis (trichloromethyl) Bis (trichloromethyl) -s-triazine, bis (trichloromethyl) -6-styryl-s-triazine, 2- (naphtho- Bis (trichloromethyl) -s-triazine, 2- (4-methoxynaphtho-1-yl) (Trichloromethyl) -6- (4-methoxystyryl) -s-triazine, and the like.
상기 옥심계 화합물의 예로는, O-아실옥심계 화합물, 2-(o-벤조일옥심)-1-[4-(페닐티오)페닐]-1,2-옥탄디온, 1-(o-아세틸옥심)-1-[9-에틸-6-(2-메틸벤조일)-9H-카르바졸-3-일]에탄온, O-에톡시카르보닐-α-옥시아미노-1-페닐프로판-1-온 등을 사용할 수 있다. 상기 O-아실옥심계 화합물의 구체적인 예로는, 1,2-옥탄디온, 2-디메틸아미노-2-(4-메틸벤질)-1-(4-모르폴린-4-일-페닐)-부탄-1-온, 1-(4-페닐술파닐페닐)-부탄-1,2-디온2-옥심-O-벤조에이트, 1-(4-페닐술파닐페닐)-옥탄-1,2-디온2-옥심-O-벤조에이트, 1-(4-페닐술파닐페닐)-옥탄-1-온옥심-O-아세테이트 및 1-(4-페닐술파닐페닐)-부탄-1-온옥심-O-아세테이트 등을 들 수 있다. Examples of the oxime compounds include O-acyloxime compounds, 2- (o-benzoyloxime) -1- [4- (phenylthio) phenyl] -1,2-octanedione, 1- ) -1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl] ethanone, O-ethoxycarbonyl- Etc. may be used. Specific examples of the O-acyloxime-based compound include 1,2-octanedione, 2-dimethylamino-2- (4-methylbenzyl) -1- (4-morpholin- (4-phenylsulfanylphenyl) -butane-1,2-dione 2-oxime-O-benzoate, 1- -Oxime-O-benzoate, 1- (4-phenylsulfanylphenyl) -octane-1-one oxime-O-acetate and 1- (4-phenylsulfanylphenyl) Acetate and the like.
상기 광중합 개시제는 상기 화합물 이외에도 카바졸계 화합물, 디케톤류 화합물, 술포늄 보레이트계 화합물, 디아조계 화합물, 이미다졸계 화합물, 비이미다졸계 화합물 등을 사용할 수 있다.The photopolymerization initiator may be a carbazole compound, a diketone compound, a sulfonium borate compound, a diazo compound, an imidazole compound, or a nonimidazole compound in addition to the above compounds.
상기 광중합 개시제는 빛을 흡수하여 들뜬 상태가 된 후 그 에너지를 전달함으로써 화학반응을 일으키는 광 증감제와 함께 사용될 수도 있다.The photopolymerization initiator may be used in combination with a photosensitizer that generates a chemical reaction by absorbing light to be in an excited state and transferring its energy.
상기 광 증감제의 예로는, 테트라에틸렌글리콜 비스-3-머캡토 프로피오네이트, 펜타에리트리톨 테트라키스-3-머캡토 프로피오네이트, 디펜타에리트리톨 테트라키스-3-머캡토 프로피오네이트 등을 들 수 있다. Examples of the photosensitizer include tetraethylene glycol bis-3-mercaptopropionate, pentaerythritol tetrakis-3-mercaptopropionate, dipentaerythritol tetrakis-3-mercaptopropionate and the like .
상기 용매는 일 구현예에 따른 화합물, 안료, 바인더 수지, 광중합성 단량체 및 광중합 개시제와의 상용성을 가지되 반응하지 않는 물질들이 사용될 수 있다.The solvent may be a compound having compatibility with a compound, a pigment, a binder resin, a photopolymerizable monomer and a photopolymerization initiator, but not reacting with the compound according to one embodiment.
상기 용매의 예로는, 메탄올, 에탄올 등의 알코올류; 디클로로에틸 에테르, n-부틸 에테르, 디이소아밀 에테르, 메틸페닐 에테르, 테트라히드로퓨란 등의 에테르류; 에틸렌 글리콜 모노메틸에테르, 에틸렌 글리콜 모노에틸에테르 등의 글리콜 에테르류; 메틸 셀로솔브 아세테이트, 에틸 셀로솔브 아세테이트, 디에틸 셀로솔브 아세테이트 등의 셀로솔브 아세테이트류; 메틸에틸 카르비톨, 디에틸 카르비톨, 디에틸렌 글리콜 모노메틸에테르, 디에틸렌 글리콜 모노에틸에테르, 디에틸렌 글리콜 디메틸에테르, 디에틸렌 글리콜 메틸에틸에테르, 디에틸렌 글리콜 디에틸에테르 등의 카르비톨류; 프로필렌 글리콜 메틸에테르 아세테이트, 프로필렌 글리콜 프로필에테르 아세테이트 등의 프로필렌 글리콜 알킬에테르 아세테이트류; 톨루엔, 크실렌 등의 방향족 탄화수소류; 메틸에틸케톤, 사이클로헥사논, 4-히드록시-4-메틸-2-펜타논, 메틸-n-프로필케톤, 메틸-n-부틸케톤, 메틸-n-아밀케톤, 2-헵타논 등의 케톤류; 초산 에틸, 초산-n-부틸, 초산 이소부틸 등의 포화 지방족 모노카르복실산 알킬 에스테르류; 젖산 메틸, 젖산 에틸 등의 젖산 에스테르류; 옥시 초산 메틸, 옥시 초산 에틸, 옥시 초산 부틸 등의 옥시 초산 알킬 에스테르류; 메톡시 초산 메틸, 메톡시 초산 에틸, 메톡시 초산 부틸, 에톡시 초산 메틸, 에톡시 초산 에틸 등의 알콕시 초산 알킬 에스테르류; 3-옥시 프로피온산 메틸, 3-옥시 프로피온산 에틸 등의 3-옥시 프로피온산 알킬에스테르류; 3-메톡시 프로피온산 메틸, 3-메톡시 프로피온산 에틸, 3-에톡시 프로피온산 에틸, 3-에톡시 프로피온산 메틸 등의 3-알콕시 프로피온산 알킬 에스테르류; 2-옥시 프로피온산 메틸, 2-옥시 프로피온산 에틸, 2-옥시 프로피온산 프로필 등의 2-옥시 프로피온산 알킬 에스테르류; 2-메톡시 프로피온산 메틸, 2-메톡시 프로피온산 에틸, 2-에톡시 프로피온산 에틸, 2-에톡시 프로피온산 메틸 등의 2-알콕시 프로피온산 알킬 에스테르류; 2-옥시-2-메틸 프로피온산 메틸, 2-옥시-2-메틸 프로피온산 에틸 등의 2-옥시-2-메틸 프로피온산 에스테르류, 2-메톡시-2-메틸 프로피온산 메틸, 2-에톡시-2-메틸 프로피온산 에틸 등의 2-알콕시-2-메틸 프로피온산 알킬류의 모노옥시 모노카르복실산 알킬 에스테르류; 2-히드록시 프로피온산 에틸, 2-히드록시-2-메틸 프로피온산 에틸, 히드록시 초산 에틸, 2-히드록시-3-메틸 부탄산 메틸 등의 에스테르류; 피루빈산 에틸 등의 케톤산 에스테르류 등이 있으며, 또한, N-메틸포름아미드, N,N-디메틸포름아미드, N-메틸포름아닐라드, N-메틸아세트아미드, N,N-디메틸아세트아미드, N-메틸피롤리돈, 디메틸술폭시드, 벤질에틸에테르, 디헥실에테르, 아세틸아세톤, 이소포론, 카프론산, 카프릴산, 1-옥탄올, 1-노난올, 벤질알코올, 초산 벤질, 안식향산 에틸, 옥살산 디에틸, 말레인산 디에틸, γ-부티로락톤, 탄산 에틸렌, 탄산 프로필렌, 페닐 셀로솔브 아세테이트 등의 고비점 용매를 들 수 있다.Examples of the solvent include alcohols such as methanol and ethanol; Ethers such as dichloroethyl ether, n-butyl ether, diisobutyl ether, methylphenyl ether and tetrahydrofuran; Glycol ethers such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether; Cellosolve acetates such as methyl cellosolve acetate, ethyl cellosolve acetate and diethyl cellosolve acetate; Carbitols such as methylethylcarbitol, diethylcarbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether and diethylene glycol diethyl ether; Propylene glycol alkyl ether acetates such as propylene glycol methyl ether acetate and propylene glycol propyl ether acetate; Aromatic hydrocarbons such as toluene and xylene; Ketones such as methyl ethyl ketone, cyclohexanone, 4-hydroxy-4-methyl-2-pentanone, methyl-n-propyl ketone, methyl- ; Saturated aliphatic monocarboxylic acid alkyl esters such as ethyl acetate, n-butyl acetate and isobutyl acetate; Lactic acid esters such as methyl lactate and ethyl lactate; Oxyacetic acid alkyl esters such as methyl oxyacetate, ethyl oxyacetate and butyl oxyacetate; Alkoxyacetic acid alkyl esters such as methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, and ethyl ethoxyacetate; 3-oxypropionic acid alkyl esters such as methyl 3-oxypropionate and ethyl 3-oxypropionate; 3-alkoxypropionic acid alkyl esters such as methyl 3-methoxypropionate, ethyl 3-methoxypropionate, ethyl 3-ethoxypropionate and methyl 3-ethoxypropionate; 2-oxypropionic acid alkyl esters such as methyl 2-oxypropionate, ethyl 2-oxypropionate and propyl 2-oxypropionate; 2-alkoxypropionic acid alkyl esters such as methyl 2-methoxypropionate, ethyl 2-methoxypropionate, ethyl 2-ethoxypropionate and methyl 2-ethoxypropionate; 2-methylpropionic acid esters such as methyl 2-oxy-2-methylpropionate and ethyl 2-oxy-2-methylpropionate, methyl 2-methoxy- Monooximonocarboxylic acid alkyl esters of 2-alkoxy-2-methylpropionic acid alkyls such as ethyl methyl propionate; Esters such as ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, ethyl hydroxyacetate and methyl 2-hydroxy-3-methylbutanoate; Ketone acid esters such as ethyl pyruvate, and the like, and also include N-methylformamide, N, N-dimethylformamide, N-methylformanilide, N-methylacetamide, N, N-dimethylacetamide , N-methylpyrrolidone, dimethylsulfoxide, benzyl ethyl ether, dihexyl ether, acetylacetone, isophorone, caproic acid, caprylic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, And high boiling solvents such as ethyl acetate, diethyl oxalate, diethyl maleate,? -Butyrolactone, ethylene carbonate, propylene carbonate, and phenyl cellosolve acetate.
이들 중 좋게는 상용성 및 반응성을 고려하여, 에틸렌 글리콜 모노에틸에테르 등의 글리콜 에테르류; 에틸 셀로솔브 아세테이트 등의 에틸렌 글리콜 알킬에테르 아세테이트류; 2-히드록시 프로피온산 에틸 등의 에스테르류; 디에틸렌 글리콜 모노메틸에테르 등의 카르비톨류; 프로필렌 글리콜 모노메틸에테르 아세테이트, 프로필렌 글리콜 프로필에테르 아세테이트 등의 프로필렌 글리콜 알킬에테르 아세테이트류가 사용될 수 있다.Among them, glycol ethers such as ethylene glycol monoethyl ether and the like are preferably used in consideration of compatibility and reactivity; Ethylene glycol alkyl ether acetates such as ethyl cellosolve acetate; Esters such as ethyl 2-hydroxypropionate; Carbitols such as diethylene glycol monomethyl ether; Propylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate and propylene glycol propyl ether acetate can be used.
일 구현예에 따른 감광성 수지 조성물은 도포 시 얼룩이나 반점을 방지하고, 레벨링 성능을 개선하기 위해, 또한 미현상에 의한 잔사의 생성을 방지하기 위하여, 말론산; 3-아미노-1,2-프로판디올; 실란계 커플링제; 레벨링제; 불소계 계면활성제; 라디칼 중합 개시제; 또는 이들의 조합 등의 기타 첨가제를 더 포함할 수 있다.The photosensitive resin composition according to one embodiment may contain at least one selected from the group consisting of malonic acid, malonic acid, and malonic acid to prevent spots and spots upon application, improve leveling performance, 3-amino-1,2-propanediol; Silane coupling agents; Leveling agents; Fluorine surfactants; A radical polymerization initiator; Or a combination thereof, and the like.
상기 실란계 커플링제의 예로는, 트리메톡시실릴 벤조산, γ-메타크릴 옥시프로필 트리메톡시실란, 비닐 트리아세톡시실란, 비닐 트리메톡시실란, γ-이소 시아네이트 프로필 트리에톡시실란, γ-글리시독시 프로필 트리메톡시실란, β-(3,4-에폭시사이클로헥실)에틸트리메톡시실란 등을 들 수 있으며, 이들을 단독 또는 2종 이상 혼합하여 사용할 수 있다. Examples of the silane coupling agent include trimethoxysilylbenzoic acid,? -Methacryloxypropyltrimethoxysilane, vinyltriacetoxysilane, vinyltrimethoxysilane,? -Isocyanatopropyltriethoxysilane,? -Glycidoxypropyltrimethoxysilane, and? - (3,4-epoxycyclohexyl) ethyltrimethoxysilane. These may be used singly or in combination of two or more.
상기 불소계 계면활성제의 예로는, BM Chemie사의 BM-1000®, BM-1100® 등; 다이 닛폰 잉키 가가꾸 고교(주)사의 메카 팩 F 142D®, 동 F 172®, 동 F 173®, 동 F 183® 등; 스미토모 스리엠(주)사의 프로라드 FC-135®, 동 FC-170C®, 동 FC-430®, 동 FC-431® 등; 아사히 그라스(주)사의 사프론 S-112®, 동 S-113®, 동 S-131®, 동 S-141®, 동 S-145® 등; 도레이 실리콘(주)사의 SH-28PA®, 동-190®, 동-193®, SZ-6032®, SF-8428® 등의 시판품을 들 수 있다.Examples of the fluorine-based surfactant, BM Chemie Corporation BM-1000 ®, BM-1100 ® , and the like; Mecha Pack F 142D ® , Copper F 172 ® , Copper F 173 ® , Copper F 183 ® and the like manufactured by Dainippon Ink & Chemicals Incorporated; M. Sumitomo Co., Inc. Pro rod FC-135 ®, the same FC-170C ®, copper FC-430 ®, the same FC-431 ®, and the like; Asahi Grass Co., Inc. Saffron S-112 ®, the same S-113 ®, the same S-131 ®, the same S-141 ®, the same S-145 ®, and the like; Toray Silicone Co., Ltd.'s SH-28PA ®, ® -190 copper, may be a commercially available product such as copper -193 ®, SZ-6032 ®, SF-8428 ®.
상기 첨가제의 함량은 원하는 물성에 따라 용이하게 조절될 수 있다.The content of the additive can be easily adjusted according to desired properties.
상기 감광성 수지 조성물은 기판과의 밀착성 등을 개선하기 위해 에폭시 화합물을 더 포함할 수 있다.The photosensitive resin composition may further include an epoxy compound to improve adhesion with the substrate.
상기 에폭시 화합물의 예로는, 페놀 노볼락 에폭시 화합물, 테트라메틸 비페닐 에폭시 화합물, 비스페놀 A형 에폭시 화합물, 지환족 에폭시 화합물 또는 이들의 조합을 들 수 있다.Examples of the epoxy compound include a phenol novolak epoxy compound, a tetramethylbiphenyl epoxy compound, a bisphenol A type epoxy compound, an alicyclic epoxy compound, or a combination thereof.
또한 상기 감광성 수지 조성물은 물성을 저해하지 않는 범위 내에서 산화방지제, 안정제 등의 기타 첨가제가 일정량 첨가될 수도 있다.The photosensitive resin composition may contain a certain amount of other additives such as an antioxidant and a stabilizer within a range that does not impair the physical properties.
또 다른 일 구현예에 따르면, 상기 일 구현예에 따른 감광성 수지 조성물을 이용하여 제조된 컬러필터를 제공한다. According to another embodiment, there is provided a color filter manufactured using the photosensitive resin composition according to one embodiment.
상기 컬러필터 내 패턴 형성 공정은 다음과 같다.The pattern forming process in the color filter is as follows.
상기 감광성 수지 조성물을 지지 기판 상에 스핀 코팅, 슬릿 코팅, 잉크젯 프린팅 등으로 도포하는 공정; 상기 도포된 감광성 수지 조성물을 건조하여 감광성 수지 조성물 막을 형성하는 공정; 상기 감광성 수지 조성물 막을 노광하는 공정; 상기 노광된 감광성 수지 조성물 막을 알칼리 수용액으로 현상하여 감광성 수지막을 제조하는 공정; 및 상기 감광성 수지막을 가열 처리하는 공정을 포함한다. 상기 공정 상의 조건 등에 대하여는 당해 분야에서 널리 알려진 사항이므로, 본 명세서에서 자세한 설명은 생략하기로 한다. Applying the photosensitive resin composition on a support substrate by spin coating, slit coating, inkjet printing or the like; Drying the applied photosensitive resin composition to form a photosensitive resin composition film; Exposing the photosensitive resin composition film; Developing the exposed photosensitive resin composition film with an aqueous alkali solution to produce a photosensitive resin film; And a step of heat-treating the photosensitive resin film. The process conditions and the like are well known in the art, and therefore, detailed description thereof will be omitted herein.
이하, 실시예를 들어 본 발명에 대해서 더욱 상세하게 설명할 것이나, 하기의 실시예는 본 발명의 바람직한 실시예일 뿐 본 발명이 하기 실시예에 한정되는 것은 아니다.EXAMPLES Hereinafter, the present invention will be described in more detail with reference to Examples. However, the following Examples are only the preferred embodiments of the present invention, and the present invention is not limited to the following Examples.
(화합물의 합성)(Synthesis of Compound)
합성예Synthetic example 1-1: 화학식 2-1로 표시되는 화합물의 합성 1-1: Synthesis of Compound Represented by Formula 2-1
2-브로모-2-메톡시아세토페논(1 몰)을 DMF(다이메틸폼아마이드, 250ml)에 첨가하고 상온에서 교반하였다. 반응 용액에 프탈이미드칼륨(0.95 몰)을 첨가한 후 3시간 동안 교반하였다. 반응 완료 후 물 2500ml를 이용해 석출시킨 후 여과 및 건조하여 상기 화학식 2-1로 표시되는 화합물을 얻었다. (수율 : 78%)2-Bromo-2-methoxyacetophenone (1 mole) was added to DMF (dimethylformamide, 250 ml) and stirred at room temperature. Phthalimide potassium (0.95 mol) was added to the reaction solution, followed by stirring for 3 hours. After completion of the reaction, the reaction product was precipitated by using 2500 ml of water, followed by filtration and drying to obtain the compound represented by the above formula (2-1). (Yield: 78%).
합성예Synthetic example 1-2: 화학식 2-2로 표시되는 화합물의 합성 1-2: Synthesis of Compound Represented by Formula 2-2
[화학식 2-2][Formula 2-2]
2-Bromo-4′-methoxyacetophenone을 시작물질로 합성예 1-1과 동일한 방법으로 합성하여 상기 화학식 2-2로 표시되는 화합물을 얻었다. (수율 : 75.6 %)2-Bromo-4'-methoxyacetophenone was synthesized as a starting material in the same manner as in Synthesis Example 1-1 to obtain the compound represented by Formula 2-2. (Yield: 75.6%).
합성예Synthetic example 1-3: 화학식 2-3으로 표시되는 화합물의 합성 1-3: Synthesis of Compound Represented by Formula 2-3
[화학식 2-3][Formula 2-3]
2-Bromo-2'-chloroacetophenone을 시작물질로 합성예 1-1과 동일한 방법으로 합성하여 상기 화학식 2-3으로 표시되는 화합물을 얻었다. (수율 : 74.5 %)2-Bromo-2'-chloroacetophenone was synthesized as a starting material in the same manner as in Synthesis Example 1-1 to obtain the compound represented by Formula 2-3. (Yield: 74.5%).
합성예Synthetic example 1-4: 화학식 2-4로 표시되는 화합물의 합성 1-4: Synthesis of Compound Represented by Formula 2-4
[화학식 2-4][Chemical Formula 2-4]
2-Bromo-4'-chloroacetophenone을 시작물질로 합성예 1-1과 동일한 방법으로 합성하여 상기 화학식 2-4로 표시되는 화합물을 얻었다. (수율 : 78.4 %)2-Bromo-4'-chloroacetophenone was synthesized as a starting material in the same manner as in Synthesis Example 1-1 to obtain the compound represented by Formula 2-4. (Yield: 78.4%).
합성예Synthetic example 1-5: 화학식 2-5로 표시되는 화합물의 합성 1-5: Synthesis of Compound Represented by Formula 2-5
[화학식 2-5][Chemical Formula 2-5]
2-Bromo-4'-phenylacetophenone을 시작물질로 합성예 1-1과 동일한 방법으로 합성하여 상기 화학식 2-5로 표시되는 화합물을 얻었다. (수율 : 76.8 %)2-Bromo-4'-phenylacetophenone was synthesized as a starting material in the same manner as in Synthesis Example 1-1 to obtain the compound represented by Formula 2-5. (Yield: 76.8%)
합성예Synthetic example 1-6: 화학식 2-6으로 표시되는 화합물의 합성 1-6: Synthesis of Compound Represented by Formula 2-6
[화학식 2-6][Chemical Formula 2-6]
2-Bromoacetophenone을 시작물질로 합성예 1-1과 동일한 방법으로 합성하여 상기 화학식 2-6으로 표시되는 화합물을 얻었다. (수율 : 81.5 %)2-Bromoacetophenone was synthesized as a starting material in the same manner as in Synthesis Example 1-1 to obtain the compound represented by Formula 2-6. (Yield: 81.5%).
합성예Synthetic example 2: 화학식 3-1로 표시되는 화합물의 합성 2: Synthesis of Compound Represented by Formula 3-1
시아노아세트산(1.46 몰) 및 2,6-다이-tert-부틸-4-메틸싸이클로헥산올(1.33 몰)을 톨루엔(500ml)에 첨가하고 상온에서 교반하였다. 이 반응 용액에 피리딘(1.59 몰)을 첨가하고 교반하였다. 이 용액에 무수 아세트산(2.65 몰)을 넣고 6시간 동안 교반하여 반응을 완료하였다. 반응 용액을 10% 염산 수용액(500g)으로 2회 세정 후 염화나트륨 수용액(500g)으로 2회 세정하였다. 마그네슘 황산염으로 물을 제거한 후 여과 및 건조하여 상기 화학식 3-1로 표시되는 화합물을 얻었다. (수율 : 62.5%)Cyanoacetic acid (1.46 mol) and 2,6-di-tert-butyl-4-methylcyclohexanol (1.33 mol) were added to toluene (500 ml) and stirred at room temperature. Pyridine (1.59 mol) was added to this reaction solution and stirred. Acetic anhydride (2.65 mol) was added to this solution and stirred for 6 hours to complete the reaction. The reaction solution was washed twice with a 10% hydrochloric acid aqueous solution (500 g) and then twice with an aqueous sodium chloride solution (500 g). Water was removed with magnesium sulfate, followed by filtration and drying to obtain the compound represented by Formula 3-1. (Yield: 62.5%).
합성예Synthetic example 3-1: 화학식 4-1로 표시되는 화합물의 합성 3-1: Synthesis of Compound Represented by Formula 4-1
화학식 2-1로 표시되는 화합물(3.8 몰) 및 화학식 3-1로 표시되는 화합물(4.15 몰)을 메탄올(10ml) 과 물(10ml)의 혼합액에 첨가한 후 교반하였다. 반응 용액에 소듐 하이드록사이드 48% 수용액(8.36 몰)을 적하한 후 70℃로 승온하여 3시간 동안 교반하였다. TLC로 반응 모니터링 후 반응을 완료하였다. 상온으로 냉각 후 여과하고, 물과 헥세인으로 세정 후 건조하여 상기 화학식 4-1로 표시되는 화합물을 얻었다. (수율 : 69%)The compound represented by the formula (2-1) (3.8 mol) and the compound represented by the formula (3-1) (4.15 mol) were added to a mixture of methanol (10 ml) and water (10 ml) and stirred. A 48% aqueous solution of sodium hydroxide (8.36 mol) was added dropwise to the reaction solution, the temperature was raised to 70 캜 and the mixture was stirred for 3 hours. After the reaction was monitored by TLC, the reaction was completed. The solution was cooled to room temperature, filtered, washed with water and hexane, and dried to obtain the compound represented by Formula 4-1. (Yield: 69%).
합성예Synthetic example 3-2: 화학식 4-2로 표시되는 화합물의 합성 3-2: Synthesis of Compound Represented by Formula 4-2
[화학식 4-2][Formula 4-2]
화학식 2-2로 표시되는 화합물을 시작물질로 합성예 3-1과 동일한 방법으로 합성하여 상기 화학식 4-2로 표시되는 화합물을 얻었다. (수율 : 71.8 %)The compound represented by Formula 2-2 was synthesized as a starting material in the same manner as Synthesis Example 3-1 to obtain the compound represented by Formula 4-2. (Yield: 71.8%)
합성예Synthetic example 3-3: 화학식 4-3으로 표시되는 화합물의 합성 3-3: Synthesis of Compound Represented by Formula 4-3
[화학식 4-3][Formula 4-3]
화학식 2-3으로 표시되는 화합물을 시작물질로 합성예 3-1과 동일한 방법으로 합성하여 상기 화학식 4-3으로 표시되는 화합물을 얻었다. (수율 : 70.2 %)The compound represented by Formula 2-3 was synthesized as a starting material in the same manner as Synthesis Example 3-1 to give the compound represented by Formula 4-3. (Yield: 70.2%).
합성예Synthetic example 3-4: 화학식 4-4로 표시되는 화합물의 합성 3-4: Synthesis of Compound Represented by Formula 4-4
[화학식 4-4][Formula 4-4]
화학식 2-4로 표시되는 화합물을 시작물질로 합성예 3-1과 동일한 방법으로 합성하여 상기 화학식 4-4로 표시되는 화합물을 얻었다. (수율 : 69.2 %)The compound represented by Formula 2-4 was synthesized as a starting material in the same manner as Synthesis Example 3-1 to give the compound represented by Formula 4-4. (Yield: 69.2%).
합성예Synthetic example 3-5: 화학식 4-5로 표시되는 화합물의 합성 3-5: Synthesis of Compound Represented by Formula 4-5
[화학식 4-5][Formula 4-5]
화학식 2-5로 표시되는 화합물을 시작물질로 합성예 3-1과 동일한 방법으로 합성하여 상기 화학식 4-5로 표시되는 화합물을 얻었다. (수율 : 70.1 %)The compound represented by Formula 2-5 was synthesized as a starting material in the same manner as Synthesis Example 3-1 to obtain the compound represented by Formula 4-5. (Yield: 70.1%).
합성예Synthetic example 3-6: 화학식 4-6으로 표시되는 화합물의 합성 3-6: Synthesis of Compound Represented by Formula 4-6
[화학식 4-6][Formula 4-6]
화학식 2-6으로 표시되는 화합물을 시작물질로 합성예 3-1과 동일한 방법으로 합성하여 상기 화학식 4-6으로 표시되는 화합물을 얻었다. (수율 : 73.4 %)The compound represented by Formula 2-6 was synthesized as a starting material in the same manner as Synthesis Example 3-1 to give the compound represented by Formula 4-6. (Yield: 73.4%)
합성예Synthetic example 4-1: 화학식 5-1로 표시되는 화합물의 합성 4-1: Synthesis of Compound Represented by Formula 5-1
화학식 4-1로 표시되는 화합물(0.38 몰)을 아세트산(800g)에 첨가하고 상온에서 교반하였다. 이 반응 용액에 트라이에틸오쏘포메이트(0.23 몰)을 첨가하고 130℃로 승온하여 10시간 동안 교반하였다. 반응 완료 후 아세토나이트릴(100g)로 필터 후 아세토나이트릴(100g)을 첨가하여 교반하였다. 이 용액을 여과 후 아세토나이트릴(100g)로 세정하고 건조하여 상기 화학식 5-1로 표시되는 화합물을 얻었다. (수율 : 68.7%)The compound represented by the formula (4-1) (0.38 mol) was added to acetic acid (800 g) and stirred at room temperature. Triethyl orthoformate (0.23 mol) was added to the reaction solution, and the mixture was heated to 130 캜 and stirred for 10 hours. After completion of the reaction, the reaction mixture was filtered with acetonitrile (100 g), and then acetonitrile (100 g) was added and stirred. This solution was filtered, washed with acetonitrile (100 g) and dried to obtain the compound represented by the above formula (5-1). (Yield: 68.7%).
합성예Synthetic example 4-2: 화학식 5-2로 표시되는 화합물의 합성 4-2: Synthesis of Compound Represented by Formula 5-2
[화학식 5-2][Formula 5-2]
화학식 4-2로 표시되는 화합물을 시작물질로 합성예 4-1과 동일한 방법으로 합성하여 상기 화학식 5-2로 표시되는 화합물을 얻었다. (수율 : 70.4 %)The compound represented by Formula 4-2 was synthesized as a starting material in the same manner as in Synthesis Example 4-1 to obtain the compound represented by Formula 5-2. (Yield: 70.4%).
합성예Synthetic example 4-3: 화학식 5-3으로 표시되는 화합물의 합성 4-3: Synthesis of Compound Represented by Formula 5-3
[화학식 5-3][Formula 5-3]
화학식 4-3으로 표시되는 화합물을 시작물질로 합성예 4-1과 동일한 방법으로 합성하여 상기 화학식 5-3으로 표시되는 화합물을 얻었다. (수율 : 69.6 %)The compound represented by Formula 4-3 was synthesized as a starting material in the same manner as Synthesis Example 4-1 to obtain the compound represented by Formula 5-3. (Yield: 69.6%).
합성예Synthetic example 4-4: 화학식 5-4로 표시되는 화합물의 합성 4-4: Synthesis of Compound Represented by Formula 5-4
[화학식 5-4][Formula 5-4]
화학식 4-4로 표시되는 화합물을 시작물질로 합성예 4-1과 동일한 방법으로 합성하여 상기 화학식 5-4로 표시되는 화합물을 얻었다. (수율 : 71.9 %)The compound represented by Formula 4-4 was synthesized as a starting material in the same manner as Synthesis Example 4-1 to obtain the compound represented by Formula 5-4. (Yield: 71.9%).
합성예Synthetic example 4-5: 화학식 5-5로 표시되는 화합물의 합성 4-5: Synthesis of Compound Represented by Formula 5-5
[화학식 5-5][Formula 5-5]
화학식 4-5로 표시되는 화합물을 시작물질로 합성예 4-1과 동일한 방법으로 합성하여 상기 화학식 5-5로 표시되는 화합물을 얻었다. (수율 : 74.2 %)The compound represented by Formula 4-5 was synthesized as a starting material in the same manner as Synthesis Example 4-1 to give the compound represented by Formula 5-5. (Yield: 74.2%).
합성예Synthetic example 4-6: 화학식 5-6으로 표시되는 화합물의 합성 4-6: Synthesis of Compound Represented by Formula 5-6
[화학식 5-6][Formula 5-6]
화학식 4-6으로 표시되는 화합물을 시작물질로 합성예 4-1과 동일한 방법으로 합성하여 상기 화학식 5-6으로 표시되는 화합물을 얻었다. (수율 : 72.8 %)The compound represented by Formula 4-6 was synthesized as a starting material in the same manner as Synthesis Example 4-1 to obtain the compound represented by Formula 5-6. (Yield: 72.8%).
합성예Synthetic example 5-1: 화학식 6-1로 표시되는 화합물의 합성 5-1: Synthesis of Compound Represented by Formula 6-1
화학식 5-1로 표시되는 화합물을 톨루엔(17ml)에 첨가하고 교반하였다. 이 용액에 소듐하이드록사이드(40% 수용액, 0.036 mmol)를 적하하였다. 그 다음 TBAB(테트라뷰틸암모늄브로마이드 0.0012 mmol)을 상온에서 투입 후 30분 동안 교반하고, 아이스배스를 이용해 반응용액의 온도를 0℃로 낮추었다. 반응 용액에 1-아다만테인카보닐 클로라이드(0.072. mmol)를 첨가하였다. 아이스배스를 제거 후 상온까지 온도를 올리면서 2시간 동안 교반 후 반응을 완료하였다. 물 100ml 및 에틸아세테이트 100ml로 세정 및 건조하여 상기 화학식 6-1로 표시되는 화합물을 얻었다. (수율 : 72.5%)The compound of formula 5-1 was added to toluene (17 ml) and stirred. Sodium hydroxide (40% aqueous solution, 0.036 mmol) was added dropwise to the solution. Then, TBAB (0.0012 mmol of tetrabutylammonium bromide) was added thereto at room temperature, and the mixture was stirred for 30 minutes, and the temperature of the reaction solution was lowered to 0 ° C using an ice bath. To the reaction solution was added 1-adamantanecarbonyl chloride (0.072 mmol). After removing the ice bath, the reaction was completed after stirring for 2 hours while raising the temperature to room temperature. Washed with 100 ml of water and 100 ml of ethyl acetate, and dried to obtain the compound represented by the above formula (6-1). (Yield: 72.5%).
합성예Synthetic example 5-2: 화학식 6-2로 표시되는 화합물의 합성 5-2: Synthesis of Compound Represented by Formula 6-2
[화학식 6-2][Formula 6-2]
화학식 5-1로 표시되는 화합물과 4-methoxy-2-methylbenzoyl chloride를 시작물질로 합성예 5-1과 동일한 방법으로 합성하여 상기 화학식 6-2로 표시되는 화합물을 얻었다. (수율 : 74.2 %)The compound represented by Formula 5-1 and 4-methoxy-2-methylbenzoyl chloride were synthesized in the same manner as in Synthesis Example 5-1 to obtain the compound represented by Formula 6-2. (Yield: 74.2%).
합성예Synthetic example 5-3: 화학식 6-3으로 표시되는 화합물의 합성 5-3: Synthesis of Compound Represented by Formula 6-3
[화학식 6-3][Formula 6-3]
화학식 5-2로 표시되는 화합물과 1-아다만테인카보닐 클로라이드를 시작물질로 합성예 5-1과 동일한 방법으로 합성하여 상기 화학식 6-3으로 표시되는 화합물을 얻었다. (수율 : 74.5 %)The compound represented by the formula 5-2 and 1-adamantanecarbonyl chloride were synthesized in the same manner as in Synthesis Example 5-1 to obtain the compound represented by the above Formula 6-3. (Yield: 74.5%).
합성예Synthetic example 5-4: 화학식 6-4로 표시되는 화합물의 합성 5-4: Synthesis of Compound Represented by Formula 6-4
[화학식 6-4][Formula 6-4]
화학식 5-2로 표시되는 화합물과 4-methoxy-2-methylbenzoyl chloride를 시작물질로 합성예 5-1과 동일한 방법으로 합성하여 상기 화학식 6-4로 표시되는 화합물을 얻었다. (수율 : 78.2 %)The compound represented by Formula 5-2 and 4-methoxy-2-methylbenzoyl chloride were synthesized in the same manner as in Synthesis Example 5-1 to obtain the compound represented by Formula 6-4. (Yield: 78.2%).
합성예Synthetic example 5-5: 화학식 6-5로 표시되는 화합물의 합성 5-5: Synthesis of Compound Represented by Formula 6-5
[화학식 6-5][Formula 6-5]
화학식 5-4로 표시되는 화합물과 1-아다만테인카보닐 클로라이드를 시작물질로 합성예 5-1과 동일한 방법으로 합성하여 상기 화학식 6-5로 표시되는 화합물을 얻었다. (수율 : 72.6 %)The compound represented by Formula 5-4 and 1-adamantanecarbonyl chloride were synthesized in the same manner as in Synthesis Example 5-1 to obtain the compound represented by Formula 6-5. (Yield: 72.6%).
합성예Synthetic example 5-6: 화학식 6-6으로 표시되는 화합물의 합성 5-6: Synthesis of Compound Represented by Formula 6-6
[화학식 6-6][Formula 6-6]
화학식 5-5로 표시되는 화합물과 1-아다만테인카보닐 클로라이드를 시작물질로 합성예 5-1과 동일한 방법으로 합성하여 상기 화학식 6-6으로 표시되는 화합물을 얻었다. (수율 : 70.4 %)The compound represented by Formula 5-5 and 1-adamantanecarbonyl chloride were synthesized in the same manner as in Synthesis Example 5-1 to obtain the compound represented by Formula 6-6. (Yield: 70.4%).
합성예Synthetic example 5-7: 화학식 6-7로 표시되는 화합물의 합성 5-7: Synthesis of Compound Represented by Formula 6-7
[화학식 6-7][Formula 6-7]
화학식 5-5로 표시되는 화합물과 4-methoxy-2-methylbenzoyl chloride를 시작물질로 합성예 5-1과 동일한 방법으로 합성하여 상기 화학식 6-7로 표시되는 화합물을 얻었다. (수율 : 74.6 %)The compound represented by Formula 5-5 and 4-methoxy-2-methylbenzoyl chloride were synthesized in the same manner as in Synthesis Example 5-1 to obtain the compound represented by Formula 6-7. (Yield: 74.6%).
합성예Synthetic example 5-8: 화학식 6-8로 표시되는 화합물의 합성 5-8: Synthesis of Compound Represented by Formula 6-8
[화학식 6-8][Formula 6-8]
화학식 5-5로 표시되는 화합물과 2-Methoxybenzoyl chloride를 시작물질로 합성예 5-1과 동일한 방법으로 합성하여 상기 화학식 6-8로 표시되는 화합물을 얻었다. (수율 : 75.1 %)The compound represented by Formula 5-5 and 2-Methoxybenzoyl chloride were synthesized in the same manner as Synthesis Example 5-1 as a starting material to obtain the compound represented by Formula 6-8. (Yield: 75.1%).
합성예Synthetic example 5-9: 화학식 6-9로 표시되는 화합물의 합성 5-9: Synthesis of Compound Represented by Formula 6-9
[화학식 6-9][Formula 6-9]
화학식 5-5로 표시되는 화합물과 2-(Methylthio)benzoyl chloride를 시작물질로 합성예 5-1과 동일한 방법으로 합성하여 상기 화학식 6-9로 표시되는 화합물을 얻었다. (수율 : 72.3 %)The compound represented by Formula 5-5 and 2- (Methylthio) benzoyl chloride were synthesized in the same manner as in Synthesis Example 5-1 to obtain the compound represented by Formula 6-9. (Yield: 72.3%).
합성예Synthetic example 5-10: 화학식 6-10으로 표시되는 화합물의 합성 5-10: Synthesis of Compound Represented by Formula 6-10
[화학식 6-10][Chemical Formula 6-10]
화학식 5-6으로 표시되는 화합물과 4-methoxy-2-methylbenzoyl chloride를 시작물질로 합성예 5-1과 동일한 방법으로 합성하여 상기 화학식 6-10으로 표시되는 화합물을 얻었다. (수율 : 72.3 %)The compound represented by Formula 5-6 and 4-methoxy-2-methylbenzoyl chloride were synthesized in the same manner as in Synthesis Example 5-1 to obtain the compound represented by Formula 6-10. (Yield: 72.3%).
합성예Synthetic example 6-1: 화학식 7-1로 표시되는 화합물의 합성 6-1: Synthesis of Compound Represented by Formula 7-1
4-tert-뷰틸벤조익산(0.14몰) 및 소듐메톡사이드(30% 메탄올 용액, 0.14몰)를 물(60ml)/메탄올(90ml) 혼합액에 첨가하고 교반하였다. 이 용액에 아연설페이트 7수화물(0.06몰)을 첨가하였다. 상온에서 1시간 동안 교반하여 반응을 완료하였다. 반응 후 여과하여, 물 1000ml 메탄올 1000ml로 세정하고, 상기 화학식 7-1로 표시되는 화합물을 얻었다. (수율: 90.1%)4-tert-Butylbenzoic acid (0.14 mol) and sodium methoxide (30% methanol solution, 0.14 mol) were added to a mixed solution of water (60 ml) / methanol (90 ml) and stirred. To this solution was added zinc sulfate heptahydrate (0.06 mol). The reaction was completed by stirring at room temperature for 1 hour. After the reaction, the mixture was filtered and washed with 1000 ml of water and 1000 ml of methanol to obtain a compound represented by the above formula (7-1). (Yield: 90.1%).
합성예Synthetic example 6-2: 화학식 7-2로 표시되는 화합물의 합성 6-2: Synthesis of Compound Represented by Formula 7-2
[화학식 7-2][Formula 7-2]
2-(2,3-Dimethylphenylamino)benzoic acid를 시작물질로 합성예 6-1과 동일한 방법으로 합성하여 상기 화학식 7-2로 표시되는 화합물을 얻었다. (수율 : 93.3 %)2- (2,3-Dimethylphenylamino) benzoic acid was synthesized as a starting material in the same manner as in Synthesis Example 6-1 to give the compound represented by Formula 7-2. (Yield: 93.3%).
합성예Synthetic example 7-1: 화학식 1-1로 표시되는 화합물의 합성 7-1: Synthesis of Compound Represented by Formula 1-1
화학식 6-1로 표시되는 화합물(0.642 mmol) 및 화학식 7-1로 표시되는 화합물(0.835 mmol)을 에탄올 10ml에 첨가하고 상온에서 교반하였다. TCL로 반응을 확인하고 완료하였다. 반응 용액의 에탄올을 건조 후 메틸렌클로라이드 100ml와 물 100ml로 세정하고 건조하여 상기 화학식 1-1로 표시되는 화합물을 얻었다. (수율 : 81.7%, Maldi tof Mass: 1454.8)Compound (6-1) (0.642 mmol) and compound (7-1) (0.835 mmol) were added to ethanol (10 ml) and stirred at room temperature. The reaction was confirmed with TCL and completed. Ethanol in the reaction solution was dried, washed with 100 ml of methylene chloride and 100 ml of water, and dried to obtain the compound represented by Formula 1-1. (Yield: 81.7%, Maldi tof Mass: 1454.8)
합성예Synthetic example 7-2: 화학식 1-2로 표시되는 화합물의 합성 7-2: Synthesis of Compound Represented by Formula 1-2
[화학식 1-2][Formula 1-2]
Maldi tof Mass: 1426.7Maldi tof Mass: 1426.7
화학식 6-4로 표시되는 화합물과 화학식 7-1로 표시되는 화합물을 시작물질로 합성예 7-1과 동일한 방법으로 합성하여 상기 화학식 1-2로 표시되는 화합물을 얻었다. (수율 : 82.8%)The compound represented by formula (6-4) and the compound represented by formula (7-1) were synthesized in the same manner as in synthesis example 7-1 to give the compound represented by formula (1-2). (Yield: 82.8%)
합성예Synthetic example 7-3: 화학식 1-3으로 표시되는 화합물의 합성 7-3: Synthesis of Compound Represented by Formula 1-3
[화학식 1-3][Formula 1-3]
Maldi tof Mass: 1465.7Maldi tof Mass: 1465.7
화학식 6-5로 표시되는 화합물과 화학식 7-1로 표시되는 화합물을 시작물질로 합성예 7-1과 동일한 방법으로 합성하여 상기 화학식 1-3으로 표시되는 화합물을 얻었다. (수율 : 84.1%)The compound represented by the formula (6-5) and the compound represented by the formula (7-1) were synthesized in the same manner as in Synthesis Example 7-1, thereby obtaining the compound represented by the above Formula 1-3. (Yield: 84.1%).
합성예Synthetic example 7-4: 화학식 1-4로 표시되는 화합물의 합성 7-4: Synthesis of Compound Represented by Formula 1-4
[화학식 1-4][Formula 1-4]
Maldi tof Mass: 1547.9Maldi tof Mass: 1547.9
화학식 6-6으로 표시되는 화합물과 화학식 7-1로 표시되는 화합물을 시작물질로 합성예 7-1과 동일한 방법으로 합성하여 상기 화학식 1-4로 표시되는 화합물을 얻었다. (수율 : 87.2%)The compound represented by Formula 6-6 and the compound represented by Formula 7-1 were synthesized in the same manner as in Synthesis Example 7-1, to obtain the compound represented by Formula 1-4. (Yield: 87.2%).
합성예Synthetic example 7-5: 화학식 1-5로 표시되는 화합물의 합성 7-5: Synthesis of Compound Represented by Formula 1-5
[화학식 1-5][Formula 1-5]
Maldi tof Mass: 1491.7Maldi tof Mass: 1491.7
화학식 6-8로 표시되는 화합물과 화학식 7-1로 표시되는 화합물을 시작물질로 합성예 7-1과 동일한 방법으로 합성하여 상기 화학식 1-5로 표시되는 화합물을 얻었다. (수율 : 82.2%)The compound represented by the formula (6-8) and the compound represented by the formula (7-1) were synthesized in the same manner as in Synthesis Example 7-1 to obtain the compound represented by the above formula (1-5). (Yield: 82.2%).
합성예Synthetic example 7-6: 화학식 1- 7-6: 1- 6로To 6 표시되는 화합물의 합성 Synthesis of displayed compounds
[화학식 1-6][Chemical Formula 1-6]
Maldi tof Mass: 1522.67Maldi tof Mass: 1522.67
화학식 6-9로 표시되는 화합물과 화학식 7-1로 표시되는 화합물을 시작물질로 합성예 7-1과 동일한 방법으로 합성하여 상기 화학식 1-6으로 표시되는 화합물을 얻었다. (수율 : 81.8%)The compound represented by Formula 6-9 and the compound represented by Formula 7-1 were synthesized in the same manner as in Synthesis Example 7-1 as a starting material to obtain the compound represented by Formula 1-6. (Yield: 81.8%)
합성예Synthetic example 7-7: 화학식 1-7로 표시되는 화합물의 합성 7-7: Synthesis of a compound represented by the general formula 1-7
[화학식 1-7][Chemical Formula 1-7]
Maldi tof Mass: 1489.72Maldi tof Mass: 1489.72
화학식 6-2로 표시되는 화합물과 화학식 7-2로 표시되는 화합물을 시작물질로 합성예 7-1과 동일한 방법으로 합성하여 상기 화학식 1-7로 표시되는 화합물을 얻었다. (수율 : 85.8%)The compound represented by the formula (6-2) and the compound represented by the formula (7-2) were synthesized in the same manner as in Synthesis Example 7-1, thereby obtaining the compound represented by the above Formula 1-7. (Yield: 85.8%).
합성예Synthetic example 7-8: 화학식 1-8로 표시되는 화합물의 합성 7-8: Synthesis of Compound Represented by Formula 1-8
[화학식 1-8][Chemical Formula 1-8]
Maldi tof Mass: 1454.81Maldi tof Mass: 1454.81
화학식 6-3으로 표시되는 화합물과 화학식 7-1로 표시되는 화합물을 시작물질로 합성예 7-1과 동일한 방법으로 합성하여 상기 화학식 1-8로 표시되는 화합물을 얻었다. (수율 : 82.3%)The compound represented by the formula (6-3) and the compound represented by the formula (7-1) were synthesized in the same manner as in Synthesis Example 7-1 to give the compound represented by the above Formula 1-8. (Yield: 82.3%).
합성예Synthetic example 7-9: 화학식 1-9로 표시되는 화합물의 합성 7-9: Synthesis of a compound represented by the general formula 1-9
[화학식 1-9][Chemical Formula 1-9]
Maldi tof Mass: 1541.49Maldi tof Mass: 1541.49
화학식 6-7로 표시되는 화합물과 화학식 7-2로 표시되는 화합물을 시작물질로 합성예 7-1과 동일한 방법으로 합성하여 상기 화학식 1-9로 표시되는 화합물을얻었다. (수율 : 84.3%)The compound represented by Formula 6-7 and the compound represented by Formula 7-2 were synthesized in the same manner as in Synthesis Example 7-1 as a starting material to obtain the compound represented by Formula 1-9. (Yield: 84.3%).
합성예Synthetic example 7-10: 화학식 1-10으로 표시되는 화합물의 합성 7-10: Synthesis of Compound Represented by Formula 1-10
[화학식 1-10][Chemical Formula 1-10]
Maldi tof Mass: 1569.52Maldi tof Mass: 1569.52
화학식 6-8로 표시되는 화합물과 화학식 7-2로 표시되는 화합물을 시작물질로 합성예 7-1과 동일한 방법으로 합성하여 상기 화학식 1-10으로 표시되는 화합물을 얻었다. (수율 : 80.6%)The compound represented by Formula 6-8 and the compound represented by Formula 7-2 were synthesized in the same manner as in Synthesis Example 7-1 as a starting material to obtain the compound represented by Formula 1-10. (Yield: 80.6%).
비교 compare 합성예Synthetic example 1: 화학식 C-1로 표시되는 화합물의 합성 1: Synthesis of Compound Represented by Formula C-1
[화학식 C-1][Chemical formula C-1]
Maldi tof Mass: 1366.69Maldi tof Mass: 1366.69
화학식 6-10으로 표시되는 화합물과 화학식 7-1로 표시되는 화합물을 시작물질로 합성예 7-1과 동일한 방법으로 합성하여 상기 화학식 C-1으로 표시되는 화합물을 얻었다. (수율 : 78.6%)The compound represented by formula (6-10) and the compound represented by formula (7-1) were synthesized in the same manner as in synthesis example 7-1 to give the compound represented by formula (C-1). (Yield: 78.6%).
평가 1: 용해도 측정Evaluation 1: Measurement of solubility
합성예 7-1 내지 합성예 7-10 및 비교 합성예 1에서 합성한 화합물 0.5g에, 희석 용제(Anone)를 각각 첨가하고, 해당 용액을 믹스 로터(iuchi 주식회사, MIXROTAR VMR-5)로 25℃, 100 rpm로 1시간 동안 교반한 후, 각각의 화합물의 용해도 확인 결과를 하기 표 1에 나타내었다. (Anone은 cyclohexanone을 의미한다.)A diluting solvent (Anone) was added to 0.5 g of the compound synthesized in Synthesis Examples 7-1 to 7-10 and Comparative Synthesis Example 1, and the solution was added to 25 (25 g) of the solution by a mix rotor (MIXROTAR VMR-5, After stirring at 100 rpm for 1 hour, the solubility of each compound was determined. The results are shown in Table 1 below. (Anone means cyclohexanone.)
용해도 평가 기준Solubility evaluation criteria
희석용제 총량에 대해 화합물(용질)이 2.5 중량% 이상 용해: ○2.5% by weight or more of the compound (solute) dissolved in the total amount of the diluting solvent: ○
희석용제 총량에 대해 화합물(용질)이 2.5 중량% 미만 용해: Ⅹ Less than 2.5% by weight of compound (solute) dissolved in total diluent solvent Dissolution: X
상기 표 1로부터, 일 구현예에 따른 화합물인 합성예 7-1 내지 합성예 7-10의 화합물은 비교 합성예 1의 화합물보다 유기용매에 대한 용해도가 우수하여, 감광성 수지 조성물 등에 사용 시 우수한 색특성을 나타낼 수 있음을 확인할 수 있다.It can be seen from Table 1 that the compounds of Synthesis Examples 7-1 to 7-10 which are the compounds according to one embodiment are superior in solubility to the organic solvent in comparison with the compound of Comparative Synthesis Example 1, It can be confirmed that the characteristics can be expressed.
(감광성 수지 조성물의 합성)(Synthesis of photosensitive resin composition)
실시예Example 1 One
하기 언급된 구성성분들을 하기 표 2에 나타낸 조성으로 혼합하여 실시예 1에 따른 감광성 수지 조성물을 제조하였다.The photosensitive resin composition according to Example 1 was prepared by mixing the following components in the compositions shown in Table 2 below.
구체적으로, 용매에 광중합 개시제를 녹인 후 2 시간 동안 상온에서 교반한 다음, 여기에 바인더 수지 및 광중합성 화합물을 첨가하여 2시간 동안 상온에서 교반하였다. 이어서, 얻어진 상기 반응물에 착색제로서 상기 합성예 7-1에서 제조된 화합물(화학식 1-1로 표시되는 화합물)을 넣고 1 시간 동안 상온에서 교반하였다. 이어 상기 생성물을 3회 여과하여 불순물을 제거함으로써, 감광성 수지 조성물을 제조하였다.Specifically, a photopolymerization initiator was dissolved in a solvent, followed by stirring at room temperature for 2 hours. Then, a binder resin and a photopolymerizable compound were added thereto, followed by stirring at room temperature for 2 hours. Subsequently, the compound obtained in Synthesis Example 7-1 (compound represented by Formula 1-1) as a colorant was added to the obtained reaction product and stirred at room temperature for 1 hour. Then, the product was filtered three times to remove impurities, thereby preparing a photosensitive resin composition.
분자량(Mw)=22,000g/mol
(A): 메타크릴산
(B): 벤질메타크릴레이트(A) / (B) = 15/85 (w / w)
Molecular weight (Mw) = 22,000 g / mol
(A): methacrylic acid
(B): benzyl methacrylate
실시예Example 2 2
합성예 7-1의 화합물(화학식 1-1로 표시되는 화합물) 대신 합성예 7-2의 화합물(화학식 1-2로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.Except that the compound of Synthesis Example 7-2 (the compound represented by Formula 1-2) was used instead of the compound of Synthesis Example 7-1 (the compound represented by Formula 1-1) was used instead of the compound of Synthesis Example 7-1, To prepare a resin composition.
실시예Example 3 3
합성예 7-1의 화합물(화학식 1-1로 표시되는 화합물) 대신 합성예 7-3의 화합물(화학식 1-3으로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.Except that the compound of Synthesis Example 7-3 (the compound represented by Formula 1-3) was used in place of the compound of Synthesis Example 7-1 (the compound represented by Formula 1-1) To prepare a resin composition.
실시예Example 4 4
합성예 7-1의 화합물(화학식 1-1로 표시되는 화합물) 대신 합성예 7-4의 화합물(화학식 1-4로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.Except that the compound of Synthesis Example 7-4 (the compound represented by Formula 1-4) was used in place of the compound of Synthesis Example 7-1 (the compound represented by Formula 1-1) was used, To prepare a resin composition.
실시예 5Example 5
합성예 7-1의 화합물(화학식 1-1로 표시되는 화합물) 대신 합성예 7-5의 화합물(화학식 1-5로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.Except that the compound of Synthesis Example 7-5 (the compound represented by Formula (1-5)) was used in place of the compound of Synthesis Example 7-1 (the compound represented by Formula (1-1)), To prepare a resin composition.
실시예Example 6 6
합성예 7-1의 화합물(화학식 1-1로 표시되는 화합물) 대신 합성예 7-6의 화합물(화학식 1-6으로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.The procedure of Example 1 was repeated except that the compound of Synthesis Example 7-6 (the compound of Formula 1-6) was used in place of the compound of Synthesis Example 7-1 (the compound of Formula 1-1) To prepare a resin composition.
실시예Example 7 7
합성예 7-1의 화합물(화학식 1-1로 표시되는 화합물) 대신 합성예 7-7의 화합물(화학식 1-7로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.Except that the compound of Synthesis Example 7-7 (compound represented by Formula 1-7) was used in place of the compound of Synthesis Example 7-1 (the compound represented by Formula 1-1), the photosensitive To prepare a resin composition.
실시예Example 8 8
합성예 7-1의 화합물(화학식 1-1로 표시되는 화합물) 대신 합성예 7-8의 화합물(화학식 1-8로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.Except that the compound of Synthesis Example 7-8 (compound represented by Formula 1-8) was used in place of the compound of Synthesis Example 7-1 (the compound represented by Formula 1-1) was used instead of the compound of Synthesis Example 7-1 To prepare a resin composition.
실시예Example 9 9
합성예 7-1의 화합물(화학식 1-1로 표시되는 화합물) 대신 합성예 7-9의 화합물(화학식 1-9로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.Except that the compound of Synthesis Example 7-9 (the compound represented by Formula 1-9) was used in place of the compound of Synthesis Example 7-1 (the compound represented by Formula 1-1) was used, To prepare a resin composition.
실시예Example 10 10
합성예 7-1의 화합물(화학식 1-1로 표시되는 화합물) 대신 합성예 7-10의 화합물(화학식 1-10으로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.Except that the compound of Synthesis Example 7-10 (the compound represented by Formula 1-10) was used in place of the compound of Synthesis Example 7-1 (the compound represented by Formula 1-1) To prepare a resin composition.
비교예Comparative Example 1 One
합성예 7-1의 화합물(화학식 1-1로 표시되는 화합물) 대신 비교 합성예 1의 화합물(화학식 C-1로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.Except that the compound of Comparative Synthesis Example 1 (the compound represented by the formula C-1) was used instead of the compound of Synthesis Example 7-1 (the compound represented by the Formula 1-1), the photosensitive resin A composition was prepared.
평가 2: Evaluation 2: 색좌표Color coordinates , 휘도 및 명암비 측정, Brightness and contrast ratio
탈지 세척한 두께 1 mm의 유리 기판 상에 1 ㎛ 내지 3 ㎛의 두께로 상기 실시예 1 내지 실시예 10 및 비교예 1에서 제조한 감광성 수지 조성물을 도포하고, 90℃의 핫 플레이트 상에서 2분 동안 건조시켜 도막을 수득하였다. 계속해서 도막에 365nm의 주파장을 가진 고압수은램프를 사용하여 노광하여 수득하였다. 200℃의 열풍순환식 건조로 안에서 5분 동안 건조시켜 수득하였다. 화소층은 분광광도계(MCPD3000, Otsuka electronic社)를 이용하여 색좌표(x, y), 휘도(Y) 및 명암비를 측정하여, 하기 표 3에 기재하였다.The photosensitive resin composition prepared in Examples 1 to 10 and Comparative Example 1 was coated on a 1 mm thick glass substrate having a thickness of 1 mu m to 3 mu m and then dried on a hot plate at 90 DEG C for 2 minutes And dried to obtain a coating film. Subsequently, a coating film was obtained by exposure using a high-pressure mercury lamp having a dominant wavelength of 365 nm. And dried in a hot air circulating drying oven at 200 ° C for 5 minutes. The color layer (x, y), luminance (Y), and contrast ratio were measured using a spectrophotometer (MCPD3000, Otsuka electronic Co.)
상기 표 3으로부터, 일 구현예에 따른 화합물을 염료로 포함하는 실시예 1 내지 실시예 10의 감광성 수지 조성물이 상기 화합물을 포함하지 않은 비교예 1의 감광성 수지 조성물보다 우수한 색특성을 나타냄을 확인할 수 있다. From Table 3, it can be seen that the photosensitive resin compositions of Examples 1 to 10 containing the compound according to one embodiment as a dye exhibited color characteristics superior to those of the photosensitive resin composition of Comparative Example 1, have.
이상 본 발명의 바람직한 실시예에 대하여 설명하였지만, 본 발명은 이에 한정되는 것이 아니고, 특허청구범위와 발명의 상세한 설명 및 첨부한 도면의 범위 안에서 여러 가지로 변형하여 실시하는 것이 가능하고, 이 또한 본 발명의 범위에 속하는 것은 당연하다.While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments, but, on the contrary, And it goes without saying that the invention belongs to the scope of the invention.
Claims (18)
[화학식 1]
상기 화학식 1에서,
R1은 할로겐 원자, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고,
R2는 치환 또는 비치환된 C3 내지 C20 지환족 고리기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고, 단, 상기 아릴기는 할로겐 원자, 치환 또는 비치환된 C1 내지 C10 알킬기, 치환 또는 비치환된 C1 내지 C10 알콕시기 및 치환 또는 비치환된 C1 내지 C10 알킬티오기로 이루어진 군에서 선택된 적어도 하나의 치환기만을 치환기로 가지고,
R3 내지 R5는 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고,
m 및 n은 각각 독립적으로 1 내지 5의 정수이고,
L은 하기 화학식 2로 표시되고,
[화학식 2]
상기 화학식 2에서,
L1은 -O(C=O)- 또는 -S- 이고
A는 치환 또는 비치화된 C1 내지 C20 알킬기, 치환 또는 비치환된 C3 내지 C20 지환족 고리기, 치환 또는 비치환된 C6 내지 C20 아릴기 또는 치환 또는 비치환된 C2 내지 C20 헤테로아릴기이다.
A compound represented by the following formula (1):
[Chemical Formula 1]
In Formula 1,
R 1 is a halogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group or a substituted or unsubstituted C6 to C20 aryl group,
R 2 is a substituted or unsubstituted C 3 to C 20 alicyclic ring group or a substituted or unsubstituted C 6 to C 20 aryl group, provided that the aryl group is substituted with a halogen atom, a substituted or unsubstituted C1 to C10 alkyl group, A substituted or unsubstituted C1 to C10 alkoxy group and a substituted or unsubstituted C1 to C10 alkylthio group,
R 3 to R 5 are each independently a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group or a substituted or unsubstituted C6 to C20 aryl group,
m and n are each independently an integer of 1 to 5,
L is represented by the following formula (2)
(2)
In Formula 2,
L 1 is -O (C = O) - or -S-
A is a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 alicyclic ring group, a substituted or unsubstituted C6 to C20 aryl group, or a substituted or unsubstituted C2 to C20 heteroaryl group.
상기 R1은 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기인 화합물.
The method according to claim 1,
Wherein R < 1 > is a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aryl group.
상기 R2는 치환 또는 비치환된 아다만틸기 또는 치환 또는 비치환된 페닐기이고, 단, 상기 페닐기는 할로겐 원자, 치환 또는 비치환된 C1 내지 C10 알킬기, 치환 또는 비치환된 C1 내지 C10 알콕시기 및 치환 또는 비치환된 C1 내지 C10 알킬티오기로 이루어진 군에서 선택된 적어도 하나의 치환기만을 치환기로 가지는 화합물.
The method according to claim 1,
Wherein R 2 is a substituted or unsubstituted adamantyl group or a substituted or unsubstituted phenyl group, provided that the phenyl group is substituted with a halogen atom, a substituted or unsubstituted C1 to C10 alkyl group, a substituted or unsubstituted C1 to C10 alkoxy group, A substituted or unsubstituted C1 to C10 alkylthio group as a substituent.
상기 R2는 '비치환된 아다만틸기' 또는 '할로겐 원자, 치환 또는 비치환된 C1 내지 C10 알킬기, 치환 또는 비치환된 C1 내지 C10 알콕시기 및 치환 또는 비치환된 C1 내지 C10 알킬티오기로 이루어진 군에서 선택된 적어도 하나의 치환기만을 치환기로 가지는 페닐기'인 화합물.
The method of claim 3,
Wherein R 2 is an unsubstituted adamantyl group or a substituted or unsubstituted C 1 to C 10 alkylthio group which may be substituted by a halogen atom, a substituted or unsubstituted C 1 to C 10 alkyl group, a substituted or unsubstituted C 1 to C 10 alkoxy group, ≪ / RTI > is a phenyl group having as a substituent only at least one substituent selected from the group < RTI ID = 0.0 >
상기 R3 내지 R5는 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기인 화합물.
The method according to claim 1,
And R 3 to R 5 are each independently a substituted or unsubstituted C1 to C20 alkyl group.
상기 L은 하기 화학식 3 내지 화학식 7로 이루어진 군에서 선택된 어느 하나로 표시되는 화합물:
[화학식 3]
[화학식 4]
[화학식 5]
[화학식 6]
[화학식 7]
상기 화학식 3 내지 화학식 7에서,
R6은 치환 또는 비치환된 C1 내지 C10 알킬기, 치환 또는 비치환된 아미노기 또는 치환 또는 비치환된 아실기이고,
R7 내지 R9는 각각 독립적으로 히드록시기 또는 치환 또는 비치환된 C1 내지 C10 알킬기이고, 단 R7 및 R8 중 적어도 하나는 히드록시기이고,
R10은 치환 또는 비치환된 C1 내지 C10 알킬기이고,
o 및 p는 각각 독립적으로 1 내지 3의 정수이고, 단 2 ≤ o + p ≤ 5 이고,
q는 0 내지 4의 정수이다.
The method according to claim 1,
Wherein L is any one selected from the group consisting of the following formulas (3) to (7):
(3)
[Chemical Formula 4]
[Chemical Formula 5]
[Chemical Formula 6]
(7)
In the above Chemical Formulas 3 to 7,
R 6 is a substituted or unsubstituted C1 to C10 alkyl group, a substituted or unsubstituted amino group or a substituted or unsubstituted acyl group,
R 7 to R 9 are each independently a hydroxy group or a substituted or unsubstituted C1 to C10 alkyl group, provided that at least one of R 7 and R 8 is a hydroxy group,
R 10 is a substituted or unsubstituted C1 to C10 alkyl group,
o and p are each independently an integer of 1 to 3, provided that 2? o + p? 5,
q is an integer of 0 to 4;
상기 치환 또는 비치환된 아미노기는 하기 화학식 8로 표시되고, 상기 치환 또는 비치환된 아실기는 하기 화학식 9로 표시되는 화합물:
[화학식 8]
[화학식 9]
상기 화학식 8에서,
Rx는 치환 또는 비치환된 C1 내지 C10 알킬기이고,
z는 0 내지 5의 정수이다.
The method according to claim 6,
Wherein the substituted or unsubstituted amino group is represented by the following general formula (8), and the substituted or unsubstituted acyl group is represented by the following general formula (9):
[Chemical Formula 8]
[Chemical Formula 9]
In Formula 8,
R x is a substituted or unsubstituted C1 to C10 alkyl group,
and z is an integer of 0 to 5.
상기 R6은 t-부틸기(tert-부틸기), 하기 화학식 8로 표시되는 치환기 또는 하기 화학식 9로 표시되는 치환기이고,
상기 R7 내지 R9는 각각 독립적으로 히드록시기 또는 t-부틸기(tert-부틸기)이고, 단 R7 및 R8 중 적어도 하나는 히드록시기이고,
R10은 치환 또는 비치환된 메틸기, 치환 또는 비치환된 에틸기, 치환 또는 비치환된 프로필기, 치환 또는 비치환된 부틸기 또는 치환 또는 비치환된 펜틸기인 화합물:
[화학식 8]
[화학식 9]
상기 화학식 8에서,
Rx는 치환 또는 비치환된 C1 내지 C10 알킬기이고,
z는 0 내지 5의 정수이다.
The method according to claim 6,
R 6 is a t-butyl group (tert-butyl group), a substituent represented by the following formula (8) or a substituent represented by the following formula (9)
Each of R 7 to R 9 is independently a hydroxy group or a t-butyl group (at least one of R 7 and R 8 is a hydroxy group,
R 10 is a substituted or unsubstituted methyl group, a substituted or unsubstituted ethyl group, a substituted or unsubstituted propyl group, a substituted or unsubstituted butyl group or a substituted or unsubstituted pentyl group;
[Chemical Formula 8]
[Chemical Formula 9]
In Formula 8,
R x is a substituted or unsubstituted C1 to C10 alkyl group,
and z is an integer of 0 to 5.
상기 화학식 1은 하기 화학식 10-1 또는 하기 화학식 10-2로 표시되는 화합물:
[화학식 10-1]
[화학식 10-2]
상기 화학식 10-1 및 화학식 10-2에서,
R1은 할로겐 원자, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고,
R2는 치환 또는 비치환된 C3 내지 C20 지환족 고리기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고, 단, 상기 아릴기는 할로겐 원자, 치환 또는 비치환된 C1 내지 C10 알킬기, 치환 또는 비치환된 C1 내지 C10 알콕시기 및 치환 또는 비치환된 C1 내지 C10 알킬티오기로 이루어진 군에서 선택된 적어도 하나의 치환기만을 치환기로 가지고,
R3 내지 R5는 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기이고,
L은 하기 화학식 2로 표시되고,
[화학식 2]
상기 화학식 2에서,
L1은 -O(C=O)- 이고
A는 치환 또는 비치화된 C1 내지 C20 알킬기, 치환 또는 비치환된 C3 내지 C20 지환족 고리기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이다.
The method according to claim 1,
Wherein the compound represented by Formula 1 is represented by Formula 10-1 or 10-2:
[Formula 10-1]
[Formula 10-2]
In Formulas (10-1) and (10-2)
R 1 is a halogen atom, a substituted or unsubstituted C1 to C20 alkoxy group or a substituted or unsubstituted C6 to C20 aryl group,
R 2 is a substituted or unsubstituted C 3 to C 20 alicyclic ring group or a substituted or unsubstituted C 6 to C 20 aryl group, provided that the aryl group is substituted with a halogen atom, a substituted or unsubstituted C1 to C10 alkyl group, A substituted or unsubstituted C1 to C10 alkoxy group and a substituted or unsubstituted C1 to C10 alkylthio group,
R 3 to R 5 are each independently a substituted or unsubstituted C1 to C20 alkyl group,
L is represented by the following formula (2)
(2)
In Formula 2,
L 1 is -O (C = O) - and
A is a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 alicyclic ring group, or a substituted or unsubstituted C6 to C20 aryl group.
상기 화학식 1은 하기 화학식 1-1 내지 화학식 1-10으로 이루어진 군에서 선택된 어느 하나로 표시되는 화합물.
[화학식 1-1]
[화학식 1-2]
[화학식 1-3]
[화학식 1-4]
[화학식 1-5]
[화학식 1-6]
[화학식 1-7]
[화학식 1-8]
[화학식 1-9]
[화학식 1-10]
The method according to claim 1,
(1) is represented by any one of the following formulas (1-1) to (1-10).
[Formula 1-1]
[Formula 1-2]
[Formula 1-3]
[Formula 1-4]
[Formula 1-5]
[Chemical Formula 1-6]
[Chemical Formula 1-7]
[Chemical Formula 1-8]
[Chemical Formula 1-9]
[Chemical Formula 1-10]
상기 화학식 1로 표시되는 화합물은 염료인 화합물.
The method according to claim 1,
Wherein the compound represented by Formula 1 is a dye.
상기 염료는 450nm 내지 600nm의 파장범위에서 최대 흡광도를 가지는 화합물.
12. The method of claim 11,
Wherein the dye has a maximum absorbance in a wavelength range of 450 nm to 600 nm.
A photosensitive resin composition comprising the compound of any one of claims 1 to 12.
상기 감광성 수지 조성물은 바인더 수지, 광중합성 단량체, 광중합 개시제 및 용매를 더 포함하는 감광성 수지 조성물.
14. The method of claim 13,
Wherein the photosensitive resin composition further comprises a binder resin, a photopolymerizable monomer, a photopolymerization initiator, and a solvent.
상기 감광성 수지 조성물은 안료를 더 포함하는 감광성 수지 조성물.
15. The method of claim 14,
Wherein the photosensitive resin composition further comprises a pigment.
상기 바인더 수지는 아크릴계 바인더 수지, 카도계 바인더 수지 또는 이들의 조합을 포함하는 감광성 수지 조성물.
14. The method of claim 13,
Wherein the binder resin comprises an acrylic binder resin, a carcass binder resin or a combination thereof.
상기 감광성 수지 조성물은 말론산; 3-아미노-1,2-프로판디올; 실란계 커플링제; 레벨링제; 불소계 계면활성제; 라디칼 중합 개시제; 또는 이들의 조합의 첨가제를 더 포함하는 감광성 수지 조성물.
15. The method of claim 14,
The photosensitive resin composition may include malonic acid; 3-amino-1,2-propanediol; Silane coupling agents; Leveling agents; Fluorine surfactants; A radical polymerization initiator; Or a combination thereof. ≪ / RTI >
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KR20120034004A (en) * | 2010-09-30 | 2012-04-09 | 후지필름 가부시키가이샤 | Dipyrromethene metal complex compound, and colored composition, ink sheet for recording heat-sensitive transfer, color toner, inkjet recording ink and color filter containing the dipyrromethene metal complex compound |
JP2012077140A (en) * | 2010-09-30 | 2012-04-19 | Fujifilm Corp | Colored composition, colored curable composition, color filter, method for producing color filter, solid-state imaging device and liquid crystal display device |
JP5722269B2 (en) * | 2011-04-05 | 2015-05-20 | 富士フイルム株式会社 | Colored composition, colored cured film, color filter, method for producing color filter, liquid crystal display device, solid-state imaging device, and novel dipyrromethene-based metal complex compound or tautomer thereof |
JP5775482B2 (en) * | 2011-09-30 | 2015-09-09 | 富士フイルム株式会社 | Colored curable composition, color filter, method for producing color filter, and display device |
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KR20120034004A (en) * | 2010-09-30 | 2012-04-09 | 후지필름 가부시키가이샤 | Dipyrromethene metal complex compound, and colored composition, ink sheet for recording heat-sensitive transfer, color toner, inkjet recording ink and color filter containing the dipyrromethene metal complex compound |
JP2012077140A (en) * | 2010-09-30 | 2012-04-19 | Fujifilm Corp | Colored composition, colored curable composition, color filter, method for producing color filter, solid-state imaging device and liquid crystal display device |
JP5722269B2 (en) * | 2011-04-05 | 2015-05-20 | 富士フイルム株式会社 | Colored composition, colored cured film, color filter, method for producing color filter, liquid crystal display device, solid-state imaging device, and novel dipyrromethene-based metal complex compound or tautomer thereof |
JP5775482B2 (en) * | 2011-09-30 | 2015-09-09 | 富士フイルム株式会社 | Colored curable composition, color filter, method for producing color filter, and display device |
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