KR20170113137A - Optically transparent electrode laminate - Google Patents

Abstract

[PROBLEMS] To provide a light-permeable electrode laminate which suppresses change in resistance value by chloride ions and is excellent in reliability.
[MEANS FOR SOLVING PROBLEMS] A light-transmitting electrode laminate having a pressure-sensitive adhesive layer and a functional material on at least one side of a light-transmitting electrode having a mesh-shaped metal thin-line pattern on a support, The line width of the metal thin wire constituting the mesh-like metal thin wire pattern is 1.5 to 10 mu m, and the pressure-sensitive adhesive layer contains a benzotriazole compound having a specific structure.

Description

[0001] OPTICALLY TRANSPARENT ELECTRODE LAMINATE [0002]

The present invention relates to a light-permeable electrode laminate which suppresses a change in resistance value due to chloride ions and is excellent in reliability.

In electronic devices such as smart phones, personal digital assistants (PDAs), notebook PCs, tablet PCs, OA devices, medical devices, or car navigation systems, touch sensors are widely used as input means in these displays.

As the touch sensor, an optical system, an ultrasonic system, a resistance film system, a surface type capacitance system, a projection type capacitance system, and the like are known in accordance with a position detection method. In the display application, a resistive film type and a projection type electrostatic capacitance type touch sensor are preferably used. The resistive touch sensor has a structure in which two light transmissive electrodes having a light transmissive conductive layer on a support are arranged so that these light transmissive electrodes are opposed to each other through a dot spacer. The light transmitting conductive layers are brought into contact with each other by applying a force to one point of the touch sensor and the voltage applied to each of the light transmitting conductive layers is measured through the other of the light transmitting conductive layers to detect the position where the force is applied . On the other hand, in the projection-type capacitive touch sensor, two pieces of light-transmitting electrodes having two light-transmitting conductive layers or two pieces of light-transmitting electrodes having one light-transmitting conductive layer are used, The capacitance change between the light-permeable conductive layers when it is approached is detected, and the position where the finger is approached is detected. The latter touch sensor has excellent durability because there is no moving part. It is also widely used in smartphones and tablet PCs because it can detect multiple points simultaneously.

In the projection-type electrostatic capacitive touch sensor, a sensor section composed of a plurality of sensors obtained by patterning a light-transmitting conductive layer on a supporting member is disposed, thereby enabling simultaneous detection of multiple points and detection of a moving point. In order to take out a change in the capacitance detected by the sensor unit to the outside as an electric signal, the sensor unit is electrically connected between all the sensors of the light-transmitting electrode and the terminal unit composed of a plurality of terminals for taking out an electric signal to the outside A peripheral wiring section composed of a plurality of peripheral wirings is provided. Normally, the above-mentioned light-transmitting conductive layer is placed on the display, and the peripheral wiring portion or the terminal portion is located outside the display, that is, the so-called liquid edge portion. In the prior art, the light-transmitting conductive layer is generally formed of an ITO (indium tin oxide) conductive film, and the peripheral wiring portion and the terminal portion are formed of metals such as gold, silver, copper, nickel, . For example, in Patent Document 1, a transparent conductor such as ITO, IZO (indium zinc oxide), or ZnO (zinc oxide) is used as a material of the light transmitting conductive layer, A touch sensor member using a metal of a metal.

On the other hand, recently, a light-transmitting electrode having a mesh-like metal thin line pattern as a light-transmitting conductive layer is also disclosed. For example, Patent Document 2 discloses a method in which an ink containing fine silver particles is printed by forming a mesh-like metal thin line pattern and a peripheral wiring portion by printing, or a method in which a resin paint containing an electroless plating catalyst is printed, A method of forming a photoresist layer on a metal layer, forming a resist pattern, a subtractive method in which a metal layer is removed by etching, a method using a silver salt photosensitive material, and the like can be formed by various methods . A light-transmitting electrode laminate having a pressure-sensitive adhesive layer and a functional material on the pressure-sensitive adhesive layer is also known on the side of the light-transmitting electrode having a mesh-shaped metal thin line pattern. For example, in Patent Document 3, A laminate for a touch panel having a pressure-sensitive adhesive layer and a protective substrate on the pressure-sensitive adhesive layer is disclosed. The pressure-sensitive adhesive layer is generally used to closely contact the respective members such as a display device and a touch sensor.

However, in the mesh-like metal thin line pattern, for example, the metal is changed into metal chloride by the chloride ions included in human sweat, and the resistance value of the mesh-like metal thin line pattern fluctuates in some cases. If the resistance value of the mesh-like metal thin wire pattern fluctuates, the detection sensitivity of the touch sensor may be lowered or a mistaken sense may be generated, and the reliability of the touch sensor may significantly decrease. The chloride ion penetrates from the side of the pressure-sensitive adhesive layer to affect the mesh-like metal thin line pattern. In recent years, however, from the viewpoint of designability, the softening of the touch panel progresses, The chloride ion tends to act particularly on the mesh-like metal thin wire pattern, and improvement is demanded.

Patent Document 4 discloses a conductive film for a touch panel comprising a first electrode pattern containing silver, a tacky insulating layer, and a second electrode pattern in this order, and the tacky insulating layer is provided with a tacky insulating It is described that the use of a metal corrosion inhibitor such as a triazole compound, a tetrazole compound, and a benzotriazole compound together with a material suppresses the occurrence of malfunction of the touch panel. Patent Document 5 discloses that it is possible to inhibit migration of a metal by an unsubstituted benzotriazole or a benzotriazole compound having various substituents and to suppress a change in resistance value. In Patent Document 6, The present invention aims at suppressing migration of ions between metal wirings including metal wirings containing metal ions and improving the insulation reliability between metal wirings, , And a resin layer containing an insulating resin are prepared. However, in order to suppress the variation of the resistance value caused by the chloride ion, none of them is sufficient.

In the prior art, benzotriazole compounds are also known as ultraviolet absorbers, and these are described in, for example, Patent Document 7 and Patent Document 8. In the former, it is used for suppressing a change in resistance value due to ultraviolet absorption of a transparent metal thin film containing silver nano wires. Even in the latter case, by laminating a pressure sensitive adhesive sheet containing a benzotriazole compound to a silver nano wire film, Can be suppressed.

Patent Document 9 discloses an electromagnetic wave absorber having a reflection layer made of a thin wire mesh pattern of a conductive thin film and an FSS (Frequency Selective Surface) element made of a thin wire pattern of a conductive thin film. It is disclosed that a pressure sensitive adhesive layer in which a ultraviolet absorber such as a benzotriazole compound or a benzophenone compound is mixed is provided on the fine mesh pattern or fine line pattern for the purpose of suppressing aging degradation of the resin, Document 10 discloses a viscous material for an optical filter containing a benzotriazole compound having a long-chain alkyl group, which is preferable for adhesion to a metal mesh, wherein the viscous material is a benzophenone-based compound or benzotriazole A compound capable of absorbing ultraviolet light.

Patent Document 1: JP-A-2015-32183 Patent Document 2: JP-A-2015-133239 Patent Document 3: JP-A-2014-198811 Patent Document 4: JP-A-2014-29671 Patent Document 5: JP-A-2015-22397 Patent Document 6: JP-A-2014-75115 Patent Document 7: JP-A-2015-221878 Patent Document 8: JP-A-2015-229759 Patent Document 9: JP-A-2009-170887 Patent Document 10: JP-A-2011-168684

SUMMARY OF THE INVENTION An object of the present invention is to provide a light-permeable electrode laminate which is suppressed from changing its resistance value by chloride ions and which is excellent in reliability.

The above object of the present invention is achieved by the following invention.

(1) A light-transmitting electrode laminate having at least a pressure-sensitive adhesive layer and a functional material on a side of a light-transmitting electrode having a mesh-shaped metal thin-line pattern on a support and having a mesh-shaped metal thin- Wherein the line width of the metal thin wire composing the mesh-shaped metal thin line pattern is 1.5 to 10 占 퐉 and the pressure-sensitive adhesive layer contains the benzotriazole compound represented by the following general formula (1).

In the general formula (1), R ₁ to R ₄ each independently represent a hydrogen atom or a halogen atom, and R ₅ to R ₈ each independently represent a hydrogen atom, an alkyl group, an aralkyl group or an alkoxy group.

(2) The light-transmitting electrode laminate according to (1), wherein at least one of R ₅ to R ₈ of the benzotriazole compound represented by the general formula (1) is a substituent having 4 or more carbon atoms.

(3) The light-transmitting electrode laminate according to (1) or (2) above, wherein at least one of R ₅ to R ₈ of the benzotriazole compound represented by the general formula (1) .

(4) The light-transmittable sheet according to any one of (1) to (3), wherein the benzotriazole compound represented by the general formula (1) is contained in an amount of 0.75 to 7.5 mass% with respect to the total mass of the pressure- Electrode laminate.

(5) the light transmittance described in any one of (1) to (4) above, which is further added to the benzotriazole compound represented by the general formula (1) and further contains a benzotriazole compound represented by the following general formula Electrode laminate.

In the general formula (2), R ₉ to R ₁₃ each independently represent a hydrogen atom, an alkyl group, a hydroxy group, a carboxyl group, an amino group, an aminomethyl group or a nitro group.

(6) The process according to (5) above, wherein the mass ratio of the content of the benzotriazole compound represented by the general formula (1) to the content of the benzotriazole compound represented by the general formula (2) is 1.5 to 7.5 to 1, Sensitive adhesive layer.

According to the present invention, it is possible to provide a light-permeable electrode laminate in which change in resistance value by chloride ions is suppressed and which is excellent in reliability.

Fig. 1 is a schematic view of a light-transmitting electrode fabricated by the embodiment. Fig.

Hereinafter, the present invention will be described in detail. The pressure-sensitive adhesive layer of the light-transmitting electrode laminate of the present invention contains at least a benzotriazole compound represented by the following general formula (1).

In the general formula (1), R ₁ to R ₄ each independently represent a hydrogen atom or a halogen atom, and R ₅ to R ₈ each independently represent a hydrogen atom, an alkyl group, an aralkyl group or an alkoxy group. Examples of the halogen atom include a chlorine atom, a bromine atom and an iodine atom. Examples of the alkyl group include methyl, ethyl, propyl, isopropyl, butyl, sec- , a tert-pentyl group, a hexyl group, a heptyl group, a cyclohexylmethyl group, an octyl group, a tert-octyl group, a 2-ethylhexyl group, a nonyl group, a decyl group, a dodecyl group, a pentadecyl group and an octadecyl group Examples of the aralkyl group include a benzyl group, a phenethyl group and a 1-methyl-1-phenylethyl group. Examples of the alkoxy group include a methoxy group, an ethoxy group, a tert-butoxy group and an octyloxy group . The alkyl group, aralkyl group and alkoxy group of R ₅ to R ₈ may further have a substituent. As the substituent, R ₅ to R _{8 are preferably the} same or different substituents selected from the above-mentioned various substituents, a halogen atom, a hydroxy group, a mercapto group, a cyano group, a sulfo group, a carboxyl group, a carbonyl group, a sulfonamide group, an ureide group, a sulfamoyl group, A heterocyclic group (such as a pyridyl group, an imidazolyl group, a quinolinyl group, an isoindoline group, a benzotriazole group, a benzothiazolyl group, an oxazolyl group, etc.), and a combination thereof Can be illustrated. R ₅ to R ₈ may have an ester bond, ether bond, sulfide bond, amide bond, imide bond or urethane bond in the structure.

Of the benzotriazole compounds represented by the general formula (1), at least one of R ₅ to R ₈ is preferably a substituent having 4 or more carbon atoms, particularly preferably a substituent having 8 or more carbon atoms. Specific examples of the compound represented by the general formula (1) are described below, but the present invention is not limited thereto.

In the present invention, the pressure-sensitive adhesive layer may contain only one kind of the benzotriazole compound represented by the above-mentioned general formula (1), or may contain two or more kinds thereof.

A commercially available product can be used as the benzotriazole compound represented by the general formula (1). As commercially available products, commercially available products such as TINUVIN 99-2, TINUVIN 384-2, TINUVIN 900, TINUVIN 928, TINUVIN 1130, TINUVIN 234, TINUVIN 326, TINUVIN 329, TINUVIN 213 and TINUVIN 571 manufactured by BASF Japan Co., Sumisorb 200, Sumisorb 250, Sumisorb 300, Sumisorb 340, and Sumisorb 350 manufactured by Sumika Chemtex Co., Ltd., SEFORB 701, SEESORB 701, SEESORB 704, SEESORB 704, SEESORB 706, SEESORB 707, SEESORB 709, JF-77, JF-79, JF-80, JF-83, JF-832 and JAST-500. In addition, as the macromolecular benzotriazole compound represented by the above general formula (1), Vanaradine UVA-5080 manufactured by Shin-Nakamura Chemical Co., Ltd. can be exemplified.

The pressure-sensitive adhesive layer of the light-transmitting electrode laminate of the present invention preferably contains the benzotriazole compound represented by the general formula (1) in an amount of 0.75 to 7.5 mass% with respect to the total mass of the pressure-sensitive adhesive layer. As a result, the change in the resistance value due to the chloride ion is more effectively suppressed, and a light-permeable electrode laminate excellent in reliability can be obtained.

The pressure-sensitive adhesive layer of the light-transmitting electrode laminate of the present invention preferably contains a benzotriazole compound represented by the following general formula (2) as well as the benzotriazole compound represented by the general formula (1). As a result, the change in resistance value due to the chloride ion can be suppressed more effectively.

In the general formula (2), R ₉ to R ₁₃ each independently represent a hydrogen atom, an alkyl group, a hydroxy group, a carboxyl group, an amino group, an aminomethyl group or a nitro group. Examples of the alkyl group include a methyl group, an ethyl group, a propyl group, a butyl group, a sec-butyl group, an isobutyl group, a tert-butyl group, a pentyl group, a hexyl group, a cyclohexyl group, a heptyl group, Propyl group and the like. R ₉ to R ₁₃ may further have a substituent. As a substituent, R ₉ ~ R _13, as the various substituents, or a mercapto group, a cyano group, a sulfo group, a hydroxyalkyl group (hydroxymethyl group, hydroxyethyl group, etc.), an aralkyl group (benzyl group, phenethyl group, etc.), An alkoxy group (methoxy group, ethoxy group, etc.), an aryloxy group (phenoxy group, naphthoxy group, etc.), amide group, sulfonamide group, ureide group, urethane group, sulfamoyl group, carbamoyl group, , A naphthyl group and the like), an alkylthio group (methylthio group, hexylthio group and the like), arylthio group (phenylthio group, naphthylthio group and the like), a phosphoric acid amide group, an alkyloxycarbonyl group, For example.

Of the benzotriazole compounds represented by the general formula (2), it is preferable that R ₁₃ is a hydrogen atom or an aminomethyl group having a substituent from the viewpoint of effectively suppressing a change in resistance value due to a chloride ion. Specific examples of the compound represented by the general formula (2) are described below, but the present invention is not limited thereto.

As a benzotriazole compound represented by the above-mentioned general formula 2, a commercially available product can be used. Examples of commercially available products include BT-120, BT-LX, TT-LX, CBT-1 and 5M-BTA manufactured by JOHOKU CHEMICAL INDUSTRIES CO., LTD. And OA-386 manufactured by Daiwa Kasei Corporation.

In the present invention, the pressure-sensitive adhesive layer may contain only one type of the benzotriazole compound represented by the above-mentioned general formula (2), or may contain two or more kinds thereof. In the case of containing the benzotriazole compound represented by the general formula (2), the mass ratio of the content of the benzotriazole compound represented by the general formula (1) to the content of the benzotriazole compound represented by the general formula (2) To 7.5: 1 is particularly preferable from the viewpoint of suppressing a change in resistance value due to chloride ions.

Next, the pressure-sensitive adhesive layer of the light-transmitting electrode laminate of the present invention will be described. The pressure-sensitive adhesive layer preferably contains a resin in addition to the benzotriazole compound. The resin is not particularly limited, and examples thereof include known resins such as an acrylic resin, a urethane resin, and a silicone resin. The resin can be obtained by polymerizing a resin precursor with a polymerization initiator.

The resin precursor is not particularly limited, and monomers and oligomers of various resins can be used. Among them, the acrylic monomer is particularly preferable in that the resin obtainable by polymerization is excellent in transparency, and it is also easy to control the polymerization of the monomer to impart stickiness to the resin. Therefore, a preferred resin contained in the pressure-sensitive adhesive layer of the light-transmitting electrode laminate of the present invention is an acrylic resin. A single acrylic monomer may be used as the resin precursor, and two or more acrylic monomers may be used, and monomers and oligomers other than acrylic monomers and acrylic monomers may be used. Examples of the acrylic monomer include a (meth) acrylic acid alkyl ester and a (meth) acrylic acid alkoxyalkyl ester having a linear or branched alkyl group. The term " (meth) acrylic " means " acrylic " and / or " methacrylic "

Examples of the (meth) acrylic acid alkyl ester having a linear chain or branched alkyl group include, but not limited to, methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) Butyl (meth) acrylate, isopentyl (meth) acrylate, isobutyl (meth) acrylate, isobutyl (meth) acrylate, isobutyl Acrylate, heptyl (meth) acrylate, octyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, isooctyl (meth) acrylate, nonyl acrylate, isononyl (meth) acrylate, decyl (Meth) acrylate, isodecyl (meth) acrylate, undecyl (meth) acrylate, dodecyl (meth) acrylate, tridecyl (meth) acrylate, tetradecyl (meth) acrylate, pentadecyl (Meth) acrylic acid heptadecyl, (meth) (Meth) acrylic acid alkyl ester having a linear or branched alkyl group having 1 to 20 carbon atoms, such as octadecyl acrylate, isostearyl (meth) acrylate, nonadecyl (meth) acrylate and eicosyl . The alkyl (meth) acrylate having an alkyl group in the form of a linear chain or branched chain may be used in a mixture of two or more kinds.

Examples of the alkoxyalkyl (meth) acrylate esters include, but are not limited to, 2-methoxyethyl (meth) acrylate, 2-ethoxyethyl (meth) acrylate, methoxytriethylene glycol Methoxypropyl (meth) acrylate, 3-methoxypropyl (meth) acrylate, 3-ethoxypropyl (meth) acrylate, 4-methoxybutyl (meth) acrylate and 4-ethoxybutyl (meth) acrylate. The above-mentioned (meth) acrylic acid alkoxyalkyl esters may be used in a mixture of two or more.

Among the above acrylic monomers, it is preferable to use (meth) acrylic acid alkoxyalkyl ester as the acrylic monomer from the viewpoint of compatibility of the benzotriazole compound and the acrylic resin, specifically, in 100 parts by mass of the total amount of the resin precursor used for polymerization And (meth) acrylic acid alkoxyalkyl ester is preferably 30 to 90 parts by mass, more preferably 35 to 90 parts by mass, and particularly preferably 40 to 85 parts by mass.

Examples of the monomer other than the acrylic monomer include a polar group-containing monomer, a multifunctional monomer, and the like.

Examples of the polar group-containing monomer include, but are not limited to, monomers containing a carboxyl group such as (meth) acrylic acid, itaconic acid, maleic acid, fumaric acid, crotonic acid, isocrotonic acid, or anhydrides thereof (maleic anhydride, (Meth) acrylate such as 2-hydroxyethyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, (Meth) acrylamide, N, N-dimethyl (meth) acrylamide, N-methylol (meth) acrylamide, N-methoxymethyl Amide group-containing monomers such as N-butoxymethyl (meth) acrylamide and N- (2-hydroxyethyl) acrylamide, aminoethyl (meth) acrylate, dimethylaminoethyl (meth) acrylate, amino group-containing moiety such as -t-butylaminoethyl (Meth) acrylate, glycidyl group-containing monomers such as methyl (meth) acrylate and glycidyl (meth) acrylate, cyano group-containing monomers such as acrylonitrile and methacrylonitrile, N-vinyl-2-pyrrolidone Vinylpyrrolidone, N-vinylpyrrolidone, N-vinylimidazole, N-vinylpyrrolidone, N-vinylpyrrolidone, N-vinylpyrrolidone, Containing monomers having a sulfonic acid group such as sodium vinyl sulfonate; monomers containing a phosphoric acid group such as 2-hydroxyethyl acryloyl phosphate; amide groups such as cyclohexylmaleimide and isopropylmaleimide; Containing monomers, and isocyanate group-containing monomers such as 2-methacryloyloxyethyl isocyanate. These polar group-containing monomers may be used by mixing two or more kinds thereof.

Examples of the multifunctional monomer include, but are not limited to, di (meth) acrylic acid hexanediol, di (meth) acrylic acid butanediol, di (meth) acrylic acid (poly) ethylene glycol, di (meth) (Trimethylolpropane), tri (meth) acrylate, neopentyl glycol di (meth) acrylate, pentaerythritol di (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol hexa (Meth) acrylic acid tetramethylolmethane, aryl (meth) acrylate, vinyl (meth) acrylate, and the like. The multifunctional monomers may be used in a mixture of two or more.

Among the monomers other than the acrylic monomer, it is preferable to use a monomer containing a polar group from the viewpoint of effectively suppressing a change in resistance value due to chloride ion, and it is particularly preferable to use a monomer containing a hydroxy group.

In addition to the above monomers, known publicly-polymerized monomers such as cyclopentyl (meth) acrylate, cyclohexyl (meth) acrylate and alkyl (meth) acrylates having a cyclic alkyl group such as isobornyl (meth) acrylate can be used.

Examples of the oligomer used as the resin precursor include acrylic oligomers such as urethane acrylate, epoxy acrylate, polyester acrylate, isoprene acrylate and butadiene acrylate. The acrylic oligomer in the present invention means an oligomer having at least one acryl group.

The acrylic oligomer is commercially available and can be preferably used. As the urethane acrylate, Aronix M-1100, Aronix M-1200 manufactured by TOA Corporation, UA-1100 H and UA-160 TM manufactured by Shin Nakamura Chemical Industry Co., Ltd., EBECRYL210 and EBECRYL230 manufactured by Daicel Ornex Co., , EBECRYL 270, a beam set 505A-6 made by Arakawa Chemical Industries, Ltd., a beam set 550B, a beam set 575, and the like. Examples of the epoxy acrylate include UniDick V-5500, UniDick V-5502 manufactured by DIC Corporation, Epoxy ester 80MFA manufactured by Kyowa Chemical Industry Co., Ltd. and epoxy ester 3000MK. Examples of the polyester acrylate include Aronix M-7100, Aronix M-8100 manufactured by TOA Corporation, EBECRYL436, EBECRYL 450, and EBECRYL 810 manufactured by Daicel Ornex Co., Ltd., and the like. Examples of the isoprene acrylate include UC-102 and UC-203 manufactured by Kuraray Co., Ltd. As the butadiene acrylate, NISSO-PBTE-2000 manufactured by Nippon Soda Co., Ltd. and the like can be mentioned.

The polymerization initiator used in the polymerization of the resin precursor is not particularly limited and a known polymerization initiator can be exemplified. Herein, the polymerization initiator means a compound which initiates the polymerization reaction of the resin precursor by thermal or ionizing radiation. Examples of the polymerization initiator that initiates polymerization by heat include methyl ethyl ketone peroxide, benzoyl peroxide, dicumyl peroxide, tert-butyl hydroperoxide, cumene hydroperoxide, (2-ethylhexanoyl) Organic peroxides such as oxides, tert-butylbenzoyl peroxides and lauroyl peroxides, organic peroxides such as 2,2'-azobisisobutyronitrile, 2,2'-azobis-2,4-dimethylvaleronitrile, Azobis-2-methylbutyronitrile, and the like. Examples of the polymerization initiator that initiates the polymerization reaction by ionizing radiation include 2, 2-diethoxyacetophenone, 2-hydroxy-2- (2-hydroxy-2-propyl) ketone, 1- (2-methoxyphenyl) Methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane 1-one, 2-benzyl- (2-hydroxy-2-methyl-1- [4- (1-methylvinyl) phenyl] propanone}, 2-hydroxy- 2-methylpropionyl) benzyl] phenyl} -2-methylpropan-1-one, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin Benzoin compounds such as benzophenone, methyl benzoyl benzoate, 4-phenylbenzophenone, 4-benzoyl-4'-methyl-diphenyl sulfide, 3,3 ', 4,4'-tetra (t -Butylperoxycarbonyl) benzophenone, 2,4,6-trimethylbenzophenone, 4-benzoyl-N, N-dimethyl-N- [2- (1-oxo-2- propenyloxy) ethyl] Benzophenone compounds such as aminium bromide and (4-benzoylbenzyl) trimethylammonium chloride, 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4- Thioxanthone, 1-chloro-4-propanedioxanthone, 2- (3-dimethyl Amino-2-hydroxy) -3,4-dimethyl-9H-thioxanthone-9-one mesochloride, and the like. The term "ionizing radiation" means an electromagnetic wave or charged particle having an energy capable of initiating polymerization of a resin precursor, and examples thereof include ultraviolet rays, visible rays, gamma rays, X rays, electron rays and the like. Among them, Is preferable from the viewpoint of productivity.

The above polymerization initiators are commercially available, and all of them can be preferably used. Specific examples thereof include AIBN, ADVN, and AMBN manufactured by Otsuka Chemical Co., Ltd., such as IRGACURE 127, IRGACURE 184, IRGACURE 369, IRGACURE 500, IRGACURE 651, IRGACURE 819, IRGACURE 907, IRGACURE 2959 and IRGACURE 1173 from BASF Japan Co.,

The amount of the polymerization initiator used in the polymerization of the resin precursor is not particularly limited, but 0.05 to 5 parts by mass of the polymerization initiator is preferable from the viewpoint of the polymerization rate with respect to 100 parts by mass of the total amount of the resin precursor used in polymerization, and 0.1 to 3 parts by mass Particularly preferred.

As the polymerization method of the resin precursor, known polymerization methods such as a solution polymerization method, an emulsion polymerization method, a bulk polymerization method and an ionizing radiation polymerization method can be exemplified. When a polymerization initiator for initiating polymerization reaction by heat is used, Method, and when a polymerization initiator that initiates polymerization reaction by ionizing radiation is used, it may be selected in accordance with the characteristics of the polymerization initiator to be used, such as the ionizing radiation polymerization method.

The polymerization solvent used when the resin precursor is polymerized by the solution polymerization method is not particularly limited and a known organic solvent capable of dissolving the resin precursor and the polymerization initiator can be used. Specifically, examples thereof include ester solvents such as ethyl acetate and methyl acetate, ketone solvents such as acetone and 2-butanone, hydrocarbon solvents such as hexane and cyclohexane, and alcohol solvents such as ethanol and 2-propanol. have. As a polymerization solvent, two or more kinds of organic solvents may be mixed and used.

The pressure-sensitive adhesive layer of the light-transmitting electrode laminate of the present invention may contain, in addition to the resin and the benzotriazole compound, a crosslinking agent (for example, an isocyanate crosslinking agent or an epoxy crosslinking agent), a silane coupling agent A silane coupling agent having an epoxy group such as glycidoxypropyltrimethoxysilane and 3-glycidoxypropyltriethoxysilane, a silane coupling agent having a mercapto group such as 3-mercaptopropyltrimethoxysilane, 3 (E.g., a silane coupling agent having an acryl group such as acryloxypropyltrimethoxysilane), a tackifier (e.g., a rosin derivative resin, a polyterpene resin, a petroleum resin, an oil-soluble phenol resin and the like), an antioxidant (hindered phenol compound, phosphorous ester compound, thioether compound, etc.), ultraviolet absorber (triazine compound, benzophenone compound etc.), light stabilizer (hindered amine compound etc.) Claim, Se, and optionally containing a coloring agent (pigment or dye etc.), a chain transfer agent, a plasticizer, a softener, a surfactant, an antistatic agent such as known additives for resin of. Of the above resin additives, those containing a crosslinking agent are preferable from the viewpoint of adhesiveness of the pressure-sensitive adhesive layer, and those containing an isocyanate-based crosslinking agent are particularly preferable.

The isocyanate crosslinking agent is not particularly limited, and examples thereof include lower aliphatic polyisocyanates such as 1,2-ethylene diisocyanate, 1,4-butylene diisocyanate and 1,6-hexamethylene diisocyanate, cyclopentylene diisocyanate, Alicyclic polyisocyanates such as isocyanate, isophorone diisocyanate, hydrogenated tolylene diisocyanate and hydrogenated xylylene diisocyanate, alicyclic polyisocyanates such as 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, 4,4'- And aromatic polyisocyanates such as diisocyanate and xylylene diisocyanate, and the like. Further, trimethylolpropane / tolylene diisocyanate adduct (trade name: "Colonate L" manufactured by Japan Polyurethane Industry Co., Ltd.), trimethylolpropane / hexamethylene diisocyanate adduct (manufactured by Nippon Polyurethane Industry Co., &Quot; Colonate HL ") and the like can also be preferably used.

The pressure-sensitive adhesive layer of the light-transmitting electrode laminate of the present invention may be formed of a pressure-sensitive adhesive layer of two or more layers different in composition. For example, a pressure-sensitive adhesive layer A containing the benzotriazole compound is provided on the side of the light-transmitting electrode having a mesh-shaped metal thin line pattern, and a pressure-sensitive adhesive agent containing no benzotriazole compound A layer B may be provided to form one pressure-sensitive adhesive layer.

Although the thickness of the pressure-sensitive adhesive layer is not particularly limited, if it is too thin, it can not follow the irregularities on the surface of the light-transmitting electrode on the side having the mesh-like metal thin line pattern, and bubbles may enter the light- The transparency of the surface light transmitting electrode laminate may be impaired. Therefore, the thickness of the pressure-sensitive adhesive layer is preferably 5 to 300 占 퐉, more preferably 10 to 250 占 퐉. From the viewpoint of transparency of the light-transmitting electrode laminate, the total light transmittance of the pressure-sensitive adhesive layer is preferably 90% or more, and particularly preferably 95% or more. Similarly, from the viewpoint of transparency of the light-transmitting electrode laminate, the haze of the pressure-sensitive adhesive layer is preferably 0 to 3%, particularly preferably 0 to 2%.

The method of forming the pressure-sensitive adhesive layer of the light-transmitting electrode laminate of the present invention will be described. The method of forming the pressure-sensitive adhesive layer is not particularly limited, but a coating liquid for forming a pressure-sensitive adhesive layer in which the resin, the benzotriazole compound, and other additives which may contain a pressure-sensitive adhesive layer or the like is dissolved in a solvent is prepared, To form a pressure-sensitive adhesive layer is particularly preferable from the viewpoint of productivity. Therefore, in the present invention, polymerization of the resin by a solution polymerization method is preferable from the viewpoint of productivity because a polymerization solvent can be used as a solvent for a coating liquid for forming a pressure-sensitive adhesive layer as it is. As a polymerization initiator, Is used as the polymerization initiator.

In the present invention, a light-transmitting electrode having a mesh-shaped metal thin line pattern is formed on a support, and a coating liquid for forming a pressure-sensitive adhesive layer is applied and dried on the light-permeable electrode to form a pressure-sensitive adhesive layer, Alternatively, a functional material may be laminated. On the contrary, a coating liquid for forming a pressure-sensitive adhesive layer is coated on the functional material to form a pressure-sensitive adhesive layer, and a light-permeable electrode It may be laminated. Further, the coating liquid for forming a pressure-sensitive adhesive layer is applied and dried on a support subjected to the peeling process to form a pressure-sensitive adhesive layer, then the pressure-sensitive adhesive layer is peeled off from the support subjected to the exfoliating process, , And the functional material may be laminated on the pressure-sensitive adhesive layer. Among them, the method of peeling and laminating the adhesive layer after forming the pressure-sensitive adhesive layer on the support subjected to the peeling process, avoids the possibility of damaging the surface of the light-transmitting electrode or the functional material, It is particularly preferable from the viewpoint of productivity.

The support to be used for the peeled support is not particularly limited, and examples thereof include polyolefin resins such as polyethylene and polypropylene, vinyl chloride resins such as polyvinyl chloride and vinyl chloride copolymer, epoxy resins, polyarylate, polysulfone, Polyimide, polyphenylene sulfide, polyethylene naphthalate, polycarbonate, acrylic resin, cellophane, nylon, polystyrene-based resin, ABS resin, polyimide, fluorine resin, phenoxy resin, triacetylcellulose, polyethylene terephthalate, , Various metals, quartz glass, and alkali-free glass. As the peeling processing method, a method of treating the surface of a support with a known peeling agent such as a silicone system, a long chain alkyl system, a fluorine system, or molybdenum sulfide can be exemplified.

The method of applying the coating liquid for forming a pressure-sensitive adhesive layer on the exfoliated support is not particularly limited, and a bar coating method, a dip coating method, a spin coating method, a die coating method, a braid coating method, An aniline printing process, an inkjet printing process, a screen printing process, an offset printing process, a gravure offset printing process, a dispenser printing process, a pad printing process, a gravure printing process, And a method of printing using a known method such as a printing method. After the coating liquid for forming a pressure-sensitive adhesive layer is applied on the support having been subjected to the peeling process, the solvent is dried by a known drying method such as heating or natural drying to obtain a pressure-sensitive adhesive layer.

Next, the light-transmitting electrode of the light-transmitting electrode laminate of the present invention will be described. The light-transmitting electrode of the light-transmitting electrode laminate of the present invention has a mesh-like metal thin line pattern on a support, and the mesh-like metal thin line pattern is composed of a metal thin line. From the viewpoint of transparency of the light-transmitting electrode, it is particularly preferable that the support of the light-transmitting electrode has light transmittance. Examples of the support having optical transparency include polyolefin resins such as polyethylene and polypropylene, vinyl chloride resins such as polyvinyl chloride and vinyl chloride copolymer, epoxy resins, polyarylate, polysulfone, polyether sulfone, polyimide, fluorine Various resin films such as resin, phenoxy resin, triacetyl cellulose, polyethylene terephthalate, polyimide, polyphenylene sulfide, polyethylene naphthalate, polycarbonate, acrylic resin, cellophane, nylon, polystyrene resin and ABS resin, quartz glass , And alkali-free glass. From the viewpoint of transparency of the light-transmitting electrode laminate, the total light transmittance of the support is preferably 60% or more, and particularly preferably 70% or more. The support may have a known layer such as an inverse adhesive layer, a hard coat layer, an antireflection layer, an anti-glare layer, a conductive nonmetal layer made of ITO or the like.

The metal species contained in the metal thin wire composing the mesh-like metal thin wire pattern is not limited and examples thereof include alloys composed of known metals such as gold, silver, copper, aluminum, and nickel and known metals. It is preferable to contain silver or copper, and it is particularly preferable to contain silver. The proportion of the metal contained in the metal wire is preferably not less than 50% by mass, more preferably not less than 70% by mass, and particularly preferably not less than 80% by mass, based on the total solid content of the metal wire.

From the viewpoint of reliability of the light-transmitting electrode laminate, it is necessary that the line width of the thin metal wire constituting the mesh-shaped metal thin wire pattern on the support is 1.5 to 10 mu m, particularly preferably 3.0 to 8.0 mu m. When the line width is less than 1.5 占 퐉 or exceeds 10 占 퐉, the change of the resistance value of the mesh-like metal thin wire pattern can not be suppressed and the reliability of the light-transmitting electrode laminate deteriorates. From the viewpoint of reliability of the light-transmitting electrode laminate, it is preferable that the metal thin wire constituting the mesh-like fine metal wire pattern on the support has a metal amount of 0.5 to 10.5 g / m ² .

In the present invention, the metal amount of the metal thin wire constituting the mesh-shaped metal thin wire pattern on the support is measured by measuring the amount (g) of the metal present in the sample to be measured by fluorescent X- (M ² ) of only a portion where a thin metal wire exists in a surface having a mesh-shaped fine metal line pattern of the measurement sample.

When the light-transmitting electrode laminate of the present invention is used in a touch sensor, the mesh-like metal thin line pattern has a geometrical shape in which a plurality of unit lattices are arranged in a mesh-like shape, and the sensitivity, visibility (sensor shape is difficult to see) And the like. The shape of the unit lattice may be, for example, a square such as an equilateral triangle, an isosceles triangle, a right triangle, a square, a rectangle, a rhombus, a parallelogram, a trapezoid or the like, an octagonal shape such as a hexagon, an octagon, , And repeating of these shapes alone or a combination of two or more kinds of shapes can be exemplified. Among them, square or rhombus is preferable as the shape of unit lattice. Also, irregular geometric shapes, such as Voronoi diagrams, Erlenode diagrams, Penrose tile diagrams, and the like, are also one of the shapes of the mesh-like metal thin line patterns that are desirable.

When the light-transmitting electrode laminate of the present invention is used in a touch sensor, the mesh-like metal thin line pattern may be composed of a sensor portion composed of a plurality of sensors electrically insulated from each other. From the viewpoint of the visibility of the sensor portion, a dummy portion made of a mesh-shaped metal fine line pattern electrically insulated from the sensor portion may be provided between the sensor portions on the support. The sensor portion and the dummy portion may have a terminal portion made up of a plurality of terminals provided for taking out an electric signal to the outside or a peripheral wiring portion made up of a plurality of peripheral wirings electrically connecting the sensor portion and the terminal portion. The terminal portion and the peripheral wiring portion may be formed of a mesh-like metal thin wire pattern, and may be a beta pattern (a pattern painted with no gap).

There is no particular limitation on the method for forming the mesh-like fine metallic wire pattern on the support. For example, according to the method disclosed in Japanese Unexamined Patent Publication No. 2015-69877, a conductive metal ink or a conductive paste containing a metal and a binder, A silver halide photographic material having a silver halide emulsion layer on a support is used as a light-transmissive electrode precursor according to a method of forming a mesh-like fine metal line pattern by a method such as printing on a support, according to a method disclosed in JP-A 2007-59270 , A method of forming a mesh-like fine metal line pattern by a curing developing method, a method disclosed in JP-A-2004-221564, JP-A 2007-12314, and the like, a silver halide photosensitive material having a silver halide emulsion layer on a support Is used as a light-transmissive electrode precursor, and a meshed metal fine line pattern is formed by using a direct development method According to a method disclosed in JP-A-2003-77350, JP-A-2005-250169, JP-A-2007-188655, JP-A-2004-207001, etc., a physical developing core layer and a halogenated meta- , A method of forming a mesh-like fine metal wire pattern by using a so-called silver salt diffusion transfer method in which a soluble silver salt forming agent and a reducing agent are caused to act in an alkali solution, a method of forming a fine metal thin line pattern by using a silver salt- According to the method disclosed in the publication, a photosensitive resist material in which an underlayer and a photosensitive resist layer are laminated on a support is used as a light-transmitting electrode precursor, the photosensitive resist layer is exposed in an arbitrary pattern shape, , And after forming a resist image, a metal is localized on the ground layer which is not covered with the resist image by electroless plating ion, and then removing the resist image to form a mesh-like fine metal line pattern. According to the method disclosed in JP-A-2015-82178, a metal film and a resist film are provided on a support, A method of forming an opening by developing, and a method of forming a mesh-like fine metal line pattern by etching and removing a metal film in the opening portion.

Among the methods of forming a mesh-like fine metal line pattern on the support, it is preferable to use a method in which a silver halide photographic light-sensitive material is irradiated with light It is preferable to use a method of forming a mesh-like fine metal line pattern by using the transparent electrode precursor as a transparent electrode precursor, and a method of forming a mesh-like fine metal line pattern by applying electroless plating using a photosensitive resist material as a light-transmitting electrode precursor.

After the mesh-like fine metal line pattern is formed on the support, the surface of the metal fine line may be subjected to a known metal surface treatment. For example, it is possible to react a reducing substance, a water-soluble phosphorous acid compound, and a water-soluble halogen compound described in Japanese Patent Application Laid-Open No. 2008-34366, and a triazine compound having two or more mercapto groups Azine or a derivative thereof may be allowed to act, and the blackening treatment by the sulfidation reaction may be carried out as described in JP-A-2011-209626. In addition, in the case of forming a mesh-like fine metal line pattern by using the silver salt photosensitive material as a light-transmitting electrode precursor, from the viewpoint of improving the adhesion between the metal fine line constituting the mesh-like fine metal line pattern and the pressure- It may be treated with a treatment solution containing an enzyme such as a protease as described in the publication.

As the functional material of the light-transmitting electrode laminate of the present invention, the above-mentioned light-transmitting electrode, a film made of various resins such as chemically strengthened glass, glass such as soda glass, quartz glass, alkali-free glass, polyethylene terephthalate, A material having a known functional layer such as a hard coat layer, an antireflection layer, an antiglare layer, a polarizing layer, and a conductive nonmetal layer made of ITO or the like can be exemplified on at least one side of the glass or the film.

[Example]

Hereinafter, the present invention will be described in detail with reference to examples. However, the present invention is not limited to the following examples, and various modifications and alterations are possible without departing from the gist of the present invention.

≪ Fabrication of light-transmitting electrode (1)

As the support, a polyethylene terephthalate film having a thickness of 100 mu m was used. The total light transmittance of the support was 91.5%.

Subsequently, a foundation layer having the following composition was coated on a support and dried to prepare a physical development nucleus layer.

<Preparation of palladium sulfide sol>

A solution 5 g of palladium chloride

          Hydrochloric acid 40ml

          Distilled water 1000ml

B liquid 8.6 g of sodium sulfide

          Distilled water 1000ml

The solution A and the solution B were mixed while stirring, and after 30 minutes, a palladium sulfide sol was obtained through a column packed with an ion exchange resin.

&Lt; Lower layer composition / per 1 m ² >

Kuraray Poval PVA-217 12 mg

(Polyvinyl alcohol saponification degree of 88% by Kuraray Co., Ltd., degree of polymerization: 1700)

17.2 mg of hydran WLS-210 (solid content 6 mg)

(Average particle diameter of urethane resin emulsion made by DIC Co., Ltd., 0.05 탆)

Surfactant (S-1) 12 mg

Sodium Hydroxide 110mg

Glutaraldehyde 18 mg

0.4 mg of palladium sulfide sol

A photosensitive liquid resist containing a cresol novolac resin and a naphthoquinone diazide sulfonic acid ester was coated on the base layer thus obtained and dried to prepare a positive photosensitive resist layer having a dry film thickness of 1.5 占 퐉, A resist material was obtained.

With respect to the photosensitive resist material thus obtained, a negative-type transparent original having a fine mesh fine line pattern, a peripheral wiring sub-pattern, and a terminal portion pattern was brought into close contact with the surface of the photosensitive resist layer, Light (ultra-high pressure mercury lamp) was condensed and parallel light exposure was performed through a collimate lens. Thereafter, the developer was sprinkled on the photosensitive resist layer for 30 seconds by using a 1 mass% sodium carbonate aqueous solution having a liquid temperature of 30 占 폚 as a developing solution to develop the fine mesh fine line pattern, the peripheral wiring sub- Thereby obtaining a resist image in which the base layer was exposed.

Subsequently, the surface of the photosensitive resist material having the resist image was washed with deionized water, and deionized water was blown off by compressed air. Thereafter, an ammoniacal silver nitrate silver solution and a reducing agent solution having the following composition were sprayed with a twin- And then silver electroless silver plating was carried out to deposit silver on the base layer not covered with the resist image. Thereafter, it was washed with deionized water and naturally dried. Amounts of ammoniacal silver nitrate silver solution and reducing agent solution injected by twin head atomizer were 240 mL / min, respectively.

<Preparation of ammoniacal silver nitrate silver solution>

C solution 20 g of silver nitrate

          Deionized water 1000 g

D solution 28 mass% ammonia aqueous solution 100 g

          Monoethanolamine 5 g

          Deionized water 1000 g

Solution C and Solution D were mixed in a one-to-one mass ratio to obtain an ammoniacal silver nitrate solution.

<Preparation of reducing agent solution>

Hydrazine sulfate 10g

Monoethanolamine 5 g

Sodium hydroxide 10g

These were dissolved in 1000 g of deionized water to obtain a reducing agent solution.

Subsequently, a 5 mass% sodium hydroxide solution was sprayed on the surface of silver on which silver precipitated was sprayed for 60 seconds by a shower method to dissolve and remove the resist image. Furthermore, the black image was blackened by immersing the blackening treatment liquid of the following composition at 50 DEG C for 20 seconds to obtain the light-transmitting electrode 1 shown in the schematic diagram of Fig.

&Lt; Preparation of blackening treatment liquid &

Sodium sulfide · 9-hydrate 0.3 g

Sulfur 0.06g

10 mass% polyoxyethylene alkyl ether 0.01 g

These were dissolved in 1000 g of deionized water to obtain a blackening treatment solution.

In the light-transmitting electrode 1, the sensor section 11 is formed by a mesh-like metal thin line pattern having a line width of 5.0 mu m, a length of 300 mu m, and a narrower angle of 60 DEG, The peripheral wiring portion 12 and the terminal portion 13 are all in a beta pattern (full fill pattern). The line widths of the peripheral wirings constituting the peripheral wiring portion 12 are all 20 mu m, and the shortest distance between the adjacent peripheral wirings is 20 mu m. The broken line in Fig. 1 represents the outer edge 14 of the pressure-sensitive adhesive layer to be produced later, and the broken line does not exist on the light-transmitting electrode 1. [ As a result of measurement by fluorescent X-ray analysis, the amount of metal of the thin metal wire constituting the sensor unit 11 was 5.0 g / m ² .

&Lt; Fabrication of light-transmitting electrodes (2 to 5)

The surface of the photosensitive resist material having the resist image was changed in the same manner as the light transmitting electrode 1 except that the time for spraying the ammoniacal silver nitrate silver solution and the reducing agent solution with a twin- ~ 5). The metal amount of the thin metal wire constituting the sensor portion 11 of the light-transmitting electrodes 2 to 5 was measured by fluorescent X-ray analysis, and the results are shown in Table 1 described later.

&Lt; Fabrication of light-permeable electrodes (6 to 11)

Transparent electrodes 6 to 11 were obtained in the same manner as the light-transmitting electrode 1 except that the line width of the thin metal wire constituting the sensor unit 11 was changed. The line width of the thin metal wire constituting the sensor unit 11 is shown in Table 1 described later. As a result of the measurement by fluorescent X-ray analysis, the amount of metal of the thin metal wire constituting the sensor portion 11 was all 5.0 g / m ² .

&Lt; Fabrication of light-transmitting electrode 12 >

As the support, a polyethylene terephthalate film having a thickness of 100 mu m was used. The total light transmittance of the support was 91.5%.

Next, a physical developing nucleus layer of the following composition was applied on a support and dried to prepare a physical developing nucleus layer.

<Physical phenomenon Nuclear layer composition / per 1 m ² >

0.4 mg of the above palladium sulfide sol (paragraph [0094])

2% by mass aqueous solution of glyoxal 0.2 ml

Surfactant (S-1) 4 mg

Denacol EX-830 50mg

(Polyethylene glycol diglycidyl ether manufactured by Nagase ChemteX Corporation)

10 mass% SP-200 aqueous solution 0.5 mg

(Polyethyleneimine having an average molecular weight of 10,000)

Subsequently, an intermediate layer of the following composition, a silver halide emulsion layer, and a protective layer were sequentially coated on the physical phenomenon nucleus liquid layer from the side close to the support, and dried to obtain a silver salt photosensitive material. The halogenated metaphors shown below were prepared by a general double jet mixing method of photographic halogenated metaphors. The halogenated metaphors were prepared so that 95 mol% of silver chloride and 5 mol% of silver bromide had an average particle diameter of 0.15 μm. The thus obtained halogenated metaphors were sensitized by using sodium thiosulfate and chloroauric acid in accordance with a conventional method. The thus obtained silver halide metaphor includes 0.5 g of gelatin per 1 g of silver.

<Middle layer composition / per 1 m ² >

Gelatin 0.5 g

Surfactant (S-1) 5 mg

Dye 1 5 mg

&Lt; Halogenated metapeley layer composition / per 1 m ² >

Gelatin 0.5 g

3.0g of silver halide emulsion

1-phenyl-5-mercaptotetrazole 3 mg

20 mg of surfactant (S-1)

&Lt; Protective layer composition / per 1 m ² >

Gelatin 1 g

Amorphous silica matting agent (average particle size 3.5 탆) 10 mg

Surfactant (S-1) 10 mg

A positive type transparent original having a silver halide photosensitive material, a mesh fine line pattern, a peripheral wiring portion pattern and a terminal portion pattern was closely contacted and exposed through a resin filter which blocks light of 400 nm or less with a contact printer using a mercury lamp as a light source. Subsequently, the silver halide emulsion layer, the intermediate layer, and the protective layer were successively immersed in a diffusion transfer developer of the following composition at 20 캜 for 60 seconds, and then the silver halide emulsion layer, the intermediate layer and the protective layer were washed with hot water at 40 캜 and dried. In this way, the light-transmitting electrode 12 as shown in the schematic diagram of Fig. 1 was obtained. The obtained light-transmitting electrode 12 was the same as the light-transmitting electrode 1 except that the amount of metal of the thin metal wire constituting the sensor portion 11 was 1.0 g / m ² , as shown in Table 1 below.

&Lt; Composition of developer for diffusion transfer &

25 g of potassium hydroxide

Hydroquinone 18g

2 g of 1-phenyl-3-pyrazolidone

Potassium sulfite 80g

15 g of N-methylethanolamine

1.2 g of potassium bromide

Total amount of water 1000ml

pH = 12.2.

&Lt; Preparation of pressure-sensitive adhesive layer (1)

60 parts by mass of 2-methoxyethyl acrylate, 39 parts by mass of 2-ethylhexyl acrylate, 1 part by mass of 4-hydroxybutyl acrylate, and 2,2'-azobisisobutyronitrile 0.5 part by mass of AIBN manufactured by Otsuka Chemical Co., Ltd.) and 300 parts by mass of ethyl acetate as a polymerization solvent were charged into a separable flask and stirred for 1 hour while introducing nitrogen gas. Thereafter, the temperature was raised to 65 占 폚, and the mixture was stirred for 10 hours, and the resin precursor was polymerized by a solution polymerization method to obtain a resin solution having a solid content concentration of 25 mass%.

0.5 part by mass (in terms of solid content) of an isocyanate crosslinking agent (Coronate L, manufactured by Nippon Polyurethane Industry Co., Ltd.) was added to 100 parts by mass (in terms of solid content) of this resin solution, and these were homogeneously mixed to form a pressure- To obtain a coating solution (1). The pressure-sensitive adhesive layer-forming coating liquid (1) was applied onto a peeled surface of a polyethylene terephthalate film (MRF38, manufactured by Mitsubishi Resin Co., Ltd.) having a thickness of 38 탆 and peeled off and heated with hot air at 100 캜 for 3 minutes To prepare a pressure-sensitive adhesive layer 1 (thickness: 50 m). Thereafter, another polyethylene terephthalate film (MRF38, manufactured by Mitsubishi Resin Co., Ltd.) was peeled off the surface of the pressure-sensitive adhesive layer (1) for the purpose of protecting the surface of the pressure-sensitive adhesive layer (1).

&Lt; Preparation of pressure-sensitive adhesive layer (2 to 27)

The composition shown in Table 2 was applied to the pressure-sensitive adhesive layer-forming coating liquid (1) in such a manner that the contents of the compounds 1 and 2 (mass (mass) of the pressure-sensitive adhesive layer- %) Were mixed so as to have the values shown in Table 2, to obtain pressure-sensitive adhesive layers (2 to 27). As the compound of the general formula 1-14 in Table 2, Banana resin UVA-5080 manufactured by Shin Nakamura Chemical Industry Co., Ltd. was used. In addition, the compounds represented by the general formulas 3-1, 3-2, 3-3, 3-4, 3-5 and 3-6 in Table 2 are described later.

&Lt; Preparation of pressure-sensitive adhesive layer (28)

60 parts by mass of 2-methoxyethyl acrylate, 34 parts by mass of butyl acrylate, 3.5 parts by mass of N-vinyl-2-pyrrolidone, 1 part by mass of N- (2-hydroxyethyl) , 0.5 part by mass of acrylic acid, and 0.5 part by mass of 2,2'-azobis-2-methylbutyronitrile (AMBN manufactured by Otsuka Chemical Co., Ltd.) as a polymerization initiator, 300 parts by mass of ethyl acetate as a polymerization solvent was charged into a separable flask and stirred for 1 hour while introducing nitrogen gas. Thereafter, the temperature was raised to 65 占 폚, and the mixture was stirred for 10 hours, and the resin precursor was polymerized by a solution polymerization method to obtain a resin solution having a solid content concentration of 25 mass%.

0.5 part by mass (in terms of solid content) of an isocyanate-based crosslinking agent (Coronate L, manufactured by Nippon Polyurethane Industry Co., Ltd.) and 100 parts by mass of a silane coupling agent (3-glycidoxypropyltrimethoxysilane (Manufactured by Shin-Etsu Chemical Co., Ltd., KBM-403) was added thereto, and these were uniformly mixed to obtain a pressure-sensitive adhesive layer-forming liquid (2). The coating liquid 2 for forming a pressure-sensitive adhesive layer was applied on a peeled surface of a 38 탆 -thick polyethylene terephthalate film (MRF38, manufactured by Mitsubishi Resin Co., Ltd., exfoliated), heated for 3 minutes with hot air at 100 캜, To form a pressure-sensitive adhesive layer 28 (thickness: 50 m). Thereafter, a peeled-off surface of another polyethylene terephthalate film (MRF38, manufactured by Mitsubishi Resin Co., Ltd., peeling process) was bonded onto the pressure-sensitive adhesive layer 28 for the purpose of protecting the surface of the pressure-sensitive adhesive layer 28.

&Lt; Preparation of pressure-sensitive adhesive layers (29 to 31)

The compound shown in Table 2 was added to the pressure-sensitive adhesive layer-forming coating liquid (2) so that the content of the compound 1 and the compound 2 (mass (mass) of the pressure-sensitive adhesive layer- %) Were mixed so as to have the values shown in Table 2, the pressure-sensitive adhesive layers 29 to 31 were obtained in the same manner as the pressure-sensitive adhesive layer 28 was produced.

&Lt; Production of sample 1 >

The adhesive layer 1 was peeled off one of the polyethylene terephthalate films on the region surrounded by the outer rim 14 shown in Fig. 1 on the light-transmitting electrode 1, and then the other polyethylene terephthalate film The peeled pressure-sensitive adhesive layer 1 was exposed, and an alkali-free glass (Eagle 2000, manufactured by Corning Japan) was applied onto the pressure-sensitive adhesive layer 1 thereon. This procedure was repeated to produce 30 samples of Sample 1.

&Lt; Preparation of Samples 2 to 42 >

30 pieces of each of samples 2 to 42 were produced in the same manner as in the production of the sample 1 except that the light-transmitting electrode and the pressure-sensitive adhesive layer were changed as shown in Table 3. [

&Lt; Number of samples whose resistance value has changed &

For all the samples, the resistance value between the left and right terminals, which are conducting in design, was measured between all the terminals to obtain the initial resistance value. Subsequently, a portion (a terminal portion not covered with the pressure-sensitive adhesive layer) in which all the terminals of all the samples were exposed was temporarily sealed with a masking tape, and then the test piece was sealed in a salt water spray test apparatus manufactured by Suga Tester Co., And a neutral salt spray test was conducted for 72 hours. The sodium chloride concentration of the aqueous sodium chloride solution used in the test was 50 g / L and the water temperature at the time of the test was 35 ° C. After the test, the masking tape was peeled off from all the terminals of all the samples, and the resistance value after spraying the salt water between the left and right terminals that were conducting in design was measured between all the terminals, and the resistance value change rate Unit:%) was calculated.

Change in resistance value (%) = [(resistance value after salt spraying-initial resistance value) / initial resistance value] × 100

For all samples, the number of samples with a rate of change of resistance value exceeding ± 10% was counted even for one terminal (the number of samples whose resistance value was changed). The results are shown in Table 3.

From the results shown in Table 3, it was found that the present invention can provide a light-permeable electrode laminate having suppressed changes in resistance value by chloride ions and excellent in reliability.

11 sensor unit
12 peripheral wiring portion
13 terminal portion
14 Exterior

Claims (6)

A light-permeable electrode laminate having a pressure-sensitive adhesive layer and a functional material on at least one side of a light-transmitting electrode having a mesh-shaped metal thin-line pattern on a support, the light-permeable electrode having at least a functional material in this order, Wherein the line width of the metal thin wire constituting the pattern is 1.5 to 10 占 퐉 and the pressure-sensitive adhesive layer contains a benzotriazole compound represented by the following general formula (1).
(37)

In the general formula (1), R ₁ to R ₄ each independently represent a hydrogen atom or a halogen atom, and R ₅ to R ₈ each independently represent a hydrogen atom, an alkyl group, an aralkyl group or an alkoxy group.
The light-transmitting electrode laminate according to claim 1, wherein at least one of R ₅ to R ₈ of the benzotriazole compound represented by the general formula (1) is a substituent having 4 or more carbon atoms.
The light-transmitting electrode laminate according to claim 1 or 2, wherein at least one of R ₅ to R ₈ of the benzotriazole compound represented by the general formula (1) is a substituent having 8 or more carbon atoms.
The light-transmitting electrode laminate according to any one of claims 1 to 3, wherein the benzotriazole compound represented by the general formula (1) is contained in an amount of 0.75 to 7.5 mass% with respect to the total mass of the pressure-sensitive adhesive layer.
The light-transmitting electrode laminate according to any one of claims 1 to 4, further comprising a benzotriazole compound represented by the general formula (1) and further containing a benzotriazole compound represented by the following general formula (2).
(38)

In the general formula (2), R ₉ to R ₁₃ each independently represent a hydrogen atom, an alkyl group, a hydroxy group, a carboxyl group, an amino group, an aminomethyl group or a nitro group.
[6] The composition according to claim 5, wherein the mass ratio of the content of the benzotriazole compound represented by the general formula (1) to the content of the benzotriazole compound represented by the general formula (2) is 1: 1.5 to 7.5: Electrode laminate.

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