KR20160108336A - Method for producing cyclobutane tetracarboxylic acid derivative - Google Patents
Method for producing cyclobutane tetracarboxylic acid derivative Download PDFInfo
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- KR20160108336A KR20160108336A KR1020167018452A KR20167018452A KR20160108336A KR 20160108336 A KR20160108336 A KR 20160108336A KR 1020167018452 A KR1020167018452 A KR 1020167018452A KR 20167018452 A KR20167018452 A KR 20167018452A KR 20160108336 A KR20160108336 A KR 20160108336A
- Authority
- KR
- South Korea
- Prior art keywords
- group
- maleic anhydride
- reaction
- solvent
- electron
- Prior art date
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- 238000004519 manufacturing process Methods 0.000 title description 20
- DKXPPORBGHZJHX-UHFFFAOYSA-N cyclobutane-1,1,2,2-tetracarboxylic acid Chemical class OC(=O)C1(C(O)=O)CCC1(C(O)=O)C(O)=O DKXPPORBGHZJHX-UHFFFAOYSA-N 0.000 title 1
- -1 maleic anhydride compound Chemical class 0.000 claims abstract description 51
- 238000006243 chemical reaction Methods 0.000 claims abstract description 41
- 239000002904 solvent Substances 0.000 claims abstract description 31
- 238000000034 method Methods 0.000 claims abstract description 21
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 11
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 10
- 239000000126 substance Substances 0.000 claims abstract description 8
- CURBACXRQKTCKZ-UHFFFAOYSA-N cyclobutane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1C(C(O)=O)C(C(O)=O)C1C(O)=O CURBACXRQKTCKZ-UHFFFAOYSA-N 0.000 claims abstract description 7
- 238000011907 photodimerization Methods 0.000 claims abstract description 5
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 30
- 125000006575 electron-withdrawing group Chemical group 0.000 claims description 17
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical group O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 claims description 14
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical group CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 claims description 13
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical group C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 claims description 11
- 239000012965 benzophenone Substances 0.000 claims description 11
- 150000004650 carbonic acid diesters Chemical class 0.000 claims description 11
- IEJIGPNLZYLLBP-UHFFFAOYSA-N dimethyl carbonate Chemical group COC(=O)OC IEJIGPNLZYLLBP-UHFFFAOYSA-N 0.000 claims description 10
- TZIHFWKZFHZASV-UHFFFAOYSA-N methyl formate Chemical compound COC=O TZIHFWKZFHZASV-UHFFFAOYSA-N 0.000 claims description 10
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 claims description 9
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Chemical group CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 claims description 9
- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 claims description 8
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropyl acetate Chemical compound CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 claims description 8
- YKYONYBAUNKHLG-UHFFFAOYSA-N propyl acetate Chemical compound CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 claims description 6
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Chemical group CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 claims description 5
- 150000004056 anthraquinones Chemical group 0.000 claims description 5
- WBJINCZRORDGAQ-UHFFFAOYSA-N formic acid ethyl ester Natural products CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 claims description 5
- OIFBSDVPJOWBCH-UHFFFAOYSA-N Diethyl carbonate Chemical compound CCOC(=O)OCC OIFBSDVPJOWBCH-UHFFFAOYSA-N 0.000 claims description 4
- RJUFJBKOKNCXHH-UHFFFAOYSA-N Methyl propionate Chemical compound CCC(=O)OC RJUFJBKOKNCXHH-UHFFFAOYSA-N 0.000 claims description 4
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 claims description 4
- HUMNYLRZRPPJDN-KWCOIAHCSA-N benzaldehyde Chemical group O=[11CH]C1=CC=CC=C1 HUMNYLRZRPPJDN-KWCOIAHCSA-N 0.000 claims description 4
- 125000001246 bromo group Chemical group Br* 0.000 claims description 4
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 4
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 4
- 125000001153 fluoro group Chemical group F* 0.000 claims description 4
- 229940017219 methyl propionate Drugs 0.000 claims description 4
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 4
- MCSINKKTEDDPNK-UHFFFAOYSA-N propyl propionate Chemical compound CCCOC(=O)CC MCSINKKTEDDPNK-UHFFFAOYSA-N 0.000 claims description 4
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims description 4
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 claims description 3
- 125000002346 iodo group Chemical group I* 0.000 claims description 3
- 150000008064 anhydrides Chemical class 0.000 abstract description 10
- 229920001721 polyimide Polymers 0.000 abstract description 10
- 239000004642 Polyimide Substances 0.000 abstract description 8
- 239000002994 raw material Substances 0.000 abstract description 5
- FPQJOHLTKDVQAX-UHFFFAOYSA-N cyclobutane-1,1,2,3-tetracarboxylic acid Chemical compound OC(=O)C1CC(C(O)=O)(C(O)=O)C1C(O)=O FPQJOHLTKDVQAX-UHFFFAOYSA-N 0.000 abstract 1
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 description 33
- 238000005481 NMR spectroscopy Methods 0.000 description 12
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 11
- 229910052753 mercury Inorganic materials 0.000 description 11
- 239000000203 mixture Substances 0.000 description 11
- IAZDPXIOMUYVGZ-WFGJKAKNSA-N Dimethyl sulfoxide Chemical compound [2H]C([2H])([2H])S(=O)C([2H])([2H])[2H] IAZDPXIOMUYVGZ-WFGJKAKNSA-N 0.000 description 10
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 9
- 239000013078 crystal Substances 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- 239000000706 filtrate Substances 0.000 description 8
- 238000004817 gas chromatography Methods 0.000 description 7
- 239000003960 organic solvent Substances 0.000 description 7
- CDVFNBYSWJAEPJ-UHFFFAOYSA-N 3-butylfuran-2,5-dione Chemical compound CCCCC1=CC(=O)OC1=O CDVFNBYSWJAEPJ-UHFFFAOYSA-N 0.000 description 6
- LTFYGVVALJIFTQ-UHFFFAOYSA-N 3-hexylfuran-2,5-dione Chemical compound CCCCCCC1=CC(=O)OC1=O LTFYGVVALJIFTQ-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 5
- 239000005297 pyrex Substances 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- JTXMVXSTHSMVQF-UHFFFAOYSA-N 2-acetyloxyethyl acetate Chemical compound CC(=O)OCCOC(C)=O JTXMVXSTHSMVQF-UHFFFAOYSA-N 0.000 description 4
- UMNVUZRZKPVECS-UHFFFAOYSA-N 2-propanoyloxyethyl propanoate Chemical compound CCC(=O)OCCOC(=O)CC UMNVUZRZKPVECS-UHFFFAOYSA-N 0.000 description 4
- OKISUZLXOYGIFP-UHFFFAOYSA-N 4,4'-dichlorobenzophenone Chemical compound C1=CC(Cl)=CC=C1C(=O)C1=CC=C(Cl)C=C1 OKISUZLXOYGIFP-UHFFFAOYSA-N 0.000 description 4
- NMJJFJNHVMGPGM-UHFFFAOYSA-N butyl formate Chemical compound CCCCOC=O NMJJFJNHVMGPGM-UHFFFAOYSA-N 0.000 description 4
- 239000006227 byproduct Substances 0.000 description 4
- 239000007810 chemical reaction solvent Substances 0.000 description 4
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 4
- 229940018557 citraconic acid Drugs 0.000 description 4
- GJRQTCIYDGXPES-UHFFFAOYSA-N isobutyl acetate Chemical compound CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 4
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 4
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 4
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical class O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- VWJSSJFLXRMYNV-UHFFFAOYSA-N 1-(3,4-difluorophenyl)ethanone Chemical compound CC(=O)C1=CC=C(F)C(F)=C1 VWJSSJFLXRMYNV-UHFFFAOYSA-N 0.000 description 3
- ZWUSBSHBFFPRNE-UHFFFAOYSA-N 3,4-dichlorobenzaldehyde Chemical compound ClC1=CC=C(C=O)C=C1Cl ZWUSBSHBFFPRNE-UHFFFAOYSA-N 0.000 description 3
- LSQARZALBDFYQZ-UHFFFAOYSA-N 4,4'-difluorobenzophenone Chemical compound C1=CC(F)=CC=C1C(=O)C1=CC=C(F)C=C1 LSQARZALBDFYQZ-UHFFFAOYSA-N 0.000 description 3
- BXRFQSNOROATLV-UHFFFAOYSA-N 4-nitrobenzaldehyde Chemical compound [O-][N+](=O)C1=CC=C(C=O)C=C1 BXRFQSNOROATLV-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 239000012043 crude product Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- BUZYGTVTZYSBCU-UHFFFAOYSA-N 1-(4-chlorophenyl)ethanone Chemical compound CC(=O)C1=CC=C(Cl)C=C1 BUZYGTVTZYSBCU-UHFFFAOYSA-N 0.000 description 2
- ZDPAWHACYDRYIW-UHFFFAOYSA-N 1-(4-fluorophenyl)ethanone Chemical compound CC(=O)C1=CC=C(F)C=C1 ZDPAWHACYDRYIW-UHFFFAOYSA-N 0.000 description 2
- LLMLNAVBOAMOEE-UHFFFAOYSA-N 2,3-dichlorobenzaldehyde Chemical compound ClC1=CC=CC(C=O)=C1Cl LLMLNAVBOAMOEE-UHFFFAOYSA-N 0.000 description 2
- WQNHWIYLCRZRLR-UHFFFAOYSA-N 2-(3-hydroxy-2,5-dioxooxolan-3-yl)acetic acid Chemical compound OC(=O)CC1(O)CC(=O)OC1=O WQNHWIYLCRZRLR-UHFFFAOYSA-N 0.000 description 2
- IKCQWKJZLSDDSS-UHFFFAOYSA-N 2-formyloxyethyl formate Chemical compound O=COCCOC=O IKCQWKJZLSDDSS-UHFFFAOYSA-N 0.000 description 2
- AXGOOCLYBPQWNG-UHFFFAOYSA-N 3-ethylfuran-2,5-dione Chemical compound CCC1=CC(=O)OC1=O AXGOOCLYBPQWNG-UHFFFAOYSA-N 0.000 description 2
- WPRFLCSVHAERPY-UHFFFAOYSA-N 3-octylfuran-2,5-dione Chemical compound CCCCCCCCC1=CC(=O)OC1=O WPRFLCSVHAERPY-UHFFFAOYSA-N 0.000 description 2
- QSWLSAYLEATCSH-UHFFFAOYSA-N 3-propan-2-ylfuran-2,5-dione Chemical compound CC(C)C1=CC(=O)OC1=O QSWLSAYLEATCSH-UHFFFAOYSA-N 0.000 description 2
- UOQXIWFBQSVDPP-UHFFFAOYSA-N 4-fluorobenzaldehyde Chemical compound FC1=CC=C(C=O)C=C1 UOQXIWFBQSVDPP-UHFFFAOYSA-N 0.000 description 2
- 0 C[C@@](C([C@@]1(C)*(O2)=O)C2=O)([C@]1C(O1)=O)C1=O Chemical compound C[C@@](C([C@@]1(C)*(O2)=O)C2=O)([C@]1C(O1)=O)C1=O 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- KFNNIILCVOLYIR-UHFFFAOYSA-N Propyl formate Chemical compound CCCOC=O KFNNIILCVOLYIR-UHFFFAOYSA-N 0.000 description 2
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 150000003935 benzaldehydes Chemical class 0.000 description 2
- 150000008366 benzophenones Chemical class 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- BTMVHUNTONAYDX-UHFFFAOYSA-N butyl propionate Chemical compound CCCCOC(=O)CC BTMVHUNTONAYDX-UHFFFAOYSA-N 0.000 description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 2
- 239000012295 chemical reaction liquid Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000012776 electronic material Substances 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 229920005575 poly(amic acid) Polymers 0.000 description 2
- 239000009719 polyimide resin Substances 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 150000000000 tetracarboxylic acids Chemical class 0.000 description 2
- HRPHZUAPQWJPCZ-UHFFFAOYSA-N (2-chloro-5-nitrophenyl)-phenylmethanone Chemical compound [O-][N+](=O)C1=CC=C(Cl)C(C(=O)C=2C=CC=CC=2)=C1 HRPHZUAPQWJPCZ-UHFFFAOYSA-N 0.000 description 1
- VMHYWKBKHMYRNF-UHFFFAOYSA-N (2-chlorophenyl)-phenylmethanone Chemical compound ClC1=CC=CC=C1C(=O)C1=CC=CC=C1 VMHYWKBKHMYRNF-UHFFFAOYSA-N 0.000 description 1
- DWFDQVMFSLLMPE-UHFFFAOYSA-N (2-fluorophenyl)-phenylmethanone Chemical compound FC1=CC=CC=C1C(=O)C1=CC=CC=C1 DWFDQVMFSLLMPE-UHFFFAOYSA-N 0.000 description 1
- UJHSIDUUJPTLDY-UHFFFAOYSA-N (2-nitrophenyl)-phenylmethanone Chemical compound [O-][N+](=O)C1=CC=CC=C1C(=O)C1=CC=CC=C1 UJHSIDUUJPTLDY-UHFFFAOYSA-N 0.000 description 1
- NCIYZALOQBXNLW-UHFFFAOYSA-N (3-fluorophenyl)-phenylmethanone Chemical compound FC1=CC=CC(C(=O)C=2C=CC=CC=2)=C1 NCIYZALOQBXNLW-UHFFFAOYSA-N 0.000 description 1
- ZEGCOKXUTZGBGN-UHFFFAOYSA-N (3-nitrophenyl)-(4-nitrophenyl)methanone Chemical compound C1=CC([N+](=O)[O-])=CC=C1C(=O)C1=CC=CC([N+]([O-])=O)=C1 ZEGCOKXUTZGBGN-UHFFFAOYSA-N 0.000 description 1
- OGTSHGYHILFRHD-UHFFFAOYSA-N (4-fluorophenyl)-phenylmethanone Chemical compound C1=CC(F)=CC=C1C(=O)C1=CC=CC=C1 OGTSHGYHILFRHD-UHFFFAOYSA-N 0.000 description 1
- ZYMCBJWUWHHVRX-UHFFFAOYSA-N (4-nitrophenyl)-phenylmethanone Chemical compound C1=CC([N+](=O)[O-])=CC=C1C(=O)C1=CC=CC=C1 ZYMCBJWUWHHVRX-UHFFFAOYSA-N 0.000 description 1
- JLVGDLCYDLJCML-UHFFFAOYSA-N (5-benzoyl-2,4-dinitrophenyl)-phenylmethanone Chemical compound [O-][N+](=O)C1=CC([N+]([O-])=O)=C(C(=O)C=2C=CC=CC=2)C=C1C(=O)C1=CC=CC=C1 JLVGDLCYDLJCML-UHFFFAOYSA-N 0.000 description 1
- SBHHKGFHJWTZJN-UHFFFAOYSA-N 1,3-dimethylcyclobutane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1(C)C(C(O)=O)C(C)(C(O)=O)C1C(O)=O SBHHKGFHJWTZJN-UHFFFAOYSA-N 0.000 description 1
- QEWHNJPLPZOEKU-UHFFFAOYSA-N 1-(2,4-difluorophenyl)ethanone Chemical compound CC(=O)C1=CC=C(F)C=C1F QEWHNJPLPZOEKU-UHFFFAOYSA-N 0.000 description 1
- ZDOYHCIRUPHUHN-UHFFFAOYSA-N 1-(2-chlorophenyl)ethanone Chemical compound CC(=O)C1=CC=CC=C1Cl ZDOYHCIRUPHUHN-UHFFFAOYSA-N 0.000 description 1
- QMATYTFXDIWACW-UHFFFAOYSA-N 1-(2-fluorophenyl)ethanone Chemical compound CC(=O)C1=CC=CC=C1F QMATYTFXDIWACW-UHFFFAOYSA-N 0.000 description 1
- SUGXZLKUDLDTKX-UHFFFAOYSA-N 1-(2-nitrophenyl)ethanone Chemical compound CC(=O)C1=CC=CC=C1[N+]([O-])=O SUGXZLKUDLDTKX-UHFFFAOYSA-N 0.000 description 1
- WBPAOUHWPONFEQ-UHFFFAOYSA-N 1-(3,4-dichlorophenyl)ethanone Chemical compound CC(=O)C1=CC=C(Cl)C(Cl)=C1 WBPAOUHWPONFEQ-UHFFFAOYSA-N 0.000 description 1
- UUWJBXKHMMQDED-UHFFFAOYSA-N 1-(3-chlorophenyl)ethanone Chemical compound CC(=O)C1=CC=CC(Cl)=C1 UUWJBXKHMMQDED-UHFFFAOYSA-N 0.000 description 1
- HCEKGPAHZCYRBZ-UHFFFAOYSA-N 1-(3-fluorophenyl)ethanone Chemical compound CC(=O)C1=CC=CC(F)=C1 HCEKGPAHZCYRBZ-UHFFFAOYSA-N 0.000 description 1
- YFVOFFKNHQTQQE-UHFFFAOYSA-N 1-(4-bromo-3-nitrophenyl)ethanone Chemical compound CC(=O)C1=CC=C(Br)C([N+]([O-])=O)=C1 YFVOFFKNHQTQQE-UHFFFAOYSA-N 0.000 description 1
- YEVPHFIFGUWSMG-UHFFFAOYSA-N 1-(4-chloro-3-nitrophenyl)ethanone Chemical compound CC(=O)C1=CC=C(Cl)C([N+]([O-])=O)=C1 YEVPHFIFGUWSMG-UHFFFAOYSA-N 0.000 description 1
- PTCNZDJJIOLIKQ-UHFFFAOYSA-N 1-(4-fluoro-3-nitrophenyl)ethanone Chemical compound CC(=O)C1=CC=C(F)C([N+]([O-])=O)=C1 PTCNZDJJIOLIKQ-UHFFFAOYSA-N 0.000 description 1
- CERJZAHSUZVMCH-UHFFFAOYSA-N 2,2-dichloro-1-phenylethanone Chemical compound ClC(Cl)C(=O)C1=CC=CC=C1 CERJZAHSUZVMCH-UHFFFAOYSA-N 0.000 description 1
- YSFBEAASFUWWHU-UHFFFAOYSA-N 2,4-dichlorobenzaldehyde Chemical compound ClC1=CC=C(C=O)C(Cl)=C1 YSFBEAASFUWWHU-UHFFFAOYSA-N 0.000 description 1
- WCGPCBACLBHDCI-UHFFFAOYSA-N 2,4-difluorobenzaldehyde Chemical compound FC1=CC=C(C=O)C(F)=C1 WCGPCBACLBHDCI-UHFFFAOYSA-N 0.000 description 1
- UZSGWJQJDLCCFN-UHFFFAOYSA-N 2-acetylbenzonitrile Chemical compound CC(=O)C1=CC=CC=C1C#N UZSGWJQJDLCCFN-UHFFFAOYSA-N 0.000 description 1
- XPBIJHFBORWDCM-UHFFFAOYSA-N 2-benzoylbenzonitrile Chemical compound C=1C=CC=C(C#N)C=1C(=O)C1=CC=CC=C1 XPBIJHFBORWDCM-UHFFFAOYSA-N 0.000 description 1
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 1
- VFVHWCKUHAEDMY-UHFFFAOYSA-N 2-chloro-5-nitrobenzaldehyde Chemical compound [O-][N+](=O)C1=CC=C(Cl)C(C=O)=C1 VFVHWCKUHAEDMY-UHFFFAOYSA-N 0.000 description 1
- FPYUJUBAXZAQNL-UHFFFAOYSA-N 2-chlorobenzaldehyde Chemical compound ClC1=CC=CC=C1C=O FPYUJUBAXZAQNL-UHFFFAOYSA-N 0.000 description 1
- VVXFDFQEIRGULC-UHFFFAOYSA-N 2-fluoro-5-nitrobenzaldehyde Chemical compound [O-][N+](=O)C1=CC=C(F)C(C=O)=C1 VVXFDFQEIRGULC-UHFFFAOYSA-N 0.000 description 1
- ZWDVQMVZZYIAHO-UHFFFAOYSA-N 2-fluorobenzaldehyde Chemical compound FC1=CC=CC=C1C=O ZWDVQMVZZYIAHO-UHFFFAOYSA-N 0.000 description 1
- QVTPWONEVZJCCS-UHFFFAOYSA-N 2-formylbenzonitrile Chemical compound O=CC1=CC=CC=C1C#N QVTPWONEVZJCCS-UHFFFAOYSA-N 0.000 description 1
- 125000006040 2-hexenyl group Chemical group 0.000 description 1
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 1
- JPHKMYXKNKLNDF-UHFFFAOYSA-N 3,4-difluorobenzaldehyde Chemical compound FC1=CC=C(C=O)C=C1F JPHKMYXKNKLNDF-UHFFFAOYSA-N 0.000 description 1
- RADIDKNUUPJDHQ-UHFFFAOYSA-N 3-(2-methylhexyl)furan-2,5-dione Chemical compound CC(C/C=1/C(=O)OC(\C=1)=O)CCCC RADIDKNUUPJDHQ-UHFFFAOYSA-N 0.000 description 1
- SBCFGFDAZCTSRH-UHFFFAOYSA-N 3-acetylbenzonitrile Chemical compound CC(=O)C1=CC=CC(C#N)=C1 SBCFGFDAZCTSRH-UHFFFAOYSA-N 0.000 description 1
- 125000000474 3-butynyl group Chemical group [H]C#CC([H])([H])C([H])([H])* 0.000 description 1
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- YTTBWPNLXVAWND-UHFFFAOYSA-N 3-dodec-3-enylfuran-2,5-dione Chemical compound C(CC=CCCCCCCCC)/C=1/C(=O)OC(\C=1)=O YTTBWPNLXVAWND-UHFFFAOYSA-N 0.000 description 1
- PIKNVEVCWAAOMJ-UHFFFAOYSA-N 3-fluorobenzaldehyde Chemical compound FC1=CC=CC(C=O)=C1 PIKNVEVCWAAOMJ-UHFFFAOYSA-N 0.000 description 1
- DNPAAZQVYCSJAB-UHFFFAOYSA-N 3-hex-2-enylfuran-2,5-dione Chemical compound C(C=CCCC)/C=1/C(=O)OC(\C=1)=O DNPAAZQVYCSJAB-UHFFFAOYSA-N 0.000 description 1
- OMIHCBSQSYMFDP-UHFFFAOYSA-N 3-hydroxy-5-methoxy-3-methoxycarbonyl-5-oxopentanoic acid Chemical compound COC(=O)CC(O)(CC(O)=O)C(=O)OC OMIHCBSQSYMFDP-UHFFFAOYSA-N 0.000 description 1
- BSJUTKXCEOHRAV-UHFFFAOYSA-N 3-nonylfuran-2,5-dione Chemical compound CCCCCCCCCC1=CC(=O)OC1=O BSJUTKXCEOHRAV-UHFFFAOYSA-N 0.000 description 1
- QJDWGGQFMAZCDR-UHFFFAOYSA-N 3-pentylfuran-2,5-dione Chemical compound CCCCCC1=CC(=O)OC1=O QJDWGGQFMAZCDR-UHFFFAOYSA-N 0.000 description 1
- WLUSGOBAJPTJAP-UHFFFAOYSA-N 3-tert-butylfuran-2,5-dione Chemical compound CC(C)(C)C1=CC(=O)OC1=O WLUSGOBAJPTJAP-UHFFFAOYSA-N 0.000 description 1
- NLPHXWGWBKZSJC-UHFFFAOYSA-N 4-acetylbenzonitrile Chemical compound CC(=O)C1=CC=C(C#N)C=C1 NLPHXWGWBKZSJC-UHFFFAOYSA-N 0.000 description 1
- YSZWJJANSNFQMM-UHFFFAOYSA-N 4-benzoylbenzonitrile Chemical compound C=1C=C(C#N)C=CC=1C(=O)C1=CC=CC=C1 YSZWJJANSNFQMM-UHFFFAOYSA-N 0.000 description 1
- MZPNQUMLOFWSEK-UHFFFAOYSA-N 4-chloro-2-nitrobenzaldehyde Chemical compound [O-][N+](=O)C1=CC(Cl)=CC=C1C=O MZPNQUMLOFWSEK-UHFFFAOYSA-N 0.000 description 1
- HETBKLHJEWXWBM-UHFFFAOYSA-N 4-chloro-3-nitrobenzaldehyde Chemical compound [O-][N+](=O)C1=CC(C=O)=CC=C1Cl HETBKLHJEWXWBM-UHFFFAOYSA-N 0.000 description 1
- AVPYQKSLYISFPO-UHFFFAOYSA-N 4-chlorobenzaldehyde Chemical compound ClC1=CC=C(C=O)C=C1 AVPYQKSLYISFPO-UHFFFAOYSA-N 0.000 description 1
- WZWIQYMTQZCSKI-UHFFFAOYSA-N 4-cyanobenzaldehyde Chemical compound O=CC1=CC=C(C#N)C=C1 WZWIQYMTQZCSKI-UHFFFAOYSA-N 0.000 description 1
- 125000003119 4-methyl-3-pentenyl group Chemical group [H]\C(=C(/C([H])([H])[H])C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000006058 4-methyl-4-pentenyl group Chemical group 0.000 description 1
- SWGPIDCNYAYXMJ-UHFFFAOYSA-N 5-chloro-2-nitrobenzaldehyde Chemical compound [O-][N+](=O)C1=CC=C(Cl)C=C1C=O SWGPIDCNYAYXMJ-UHFFFAOYSA-N 0.000 description 1
- MRABAEUHTLLEML-UHFFFAOYSA-N Butyl lactate Chemical compound CCCCOC(=O)C(C)O MRABAEUHTLLEML-UHFFFAOYSA-N 0.000 description 1
- ACOTYAFHPFEOCG-UHFFFAOYSA-N C=CCCC1=CC(=O)OC1=O Chemical compound C=CCCC1=CC(=O)OC1=O ACOTYAFHPFEOCG-UHFFFAOYSA-N 0.000 description 1
- LGUDDCJWYWKXMY-UHFFFAOYSA-N CC(=O)c1ccc(Cl)c(c1Cl)[N+]([O-])=O Chemical compound CC(=O)c1ccc(Cl)c(c1Cl)[N+]([O-])=O LGUDDCJWYWKXMY-UHFFFAOYSA-N 0.000 description 1
- WVOLTBSCXRRQFR-SJORKVTESA-N Cannabidiolic acid Natural products OC1=C(C(O)=O)C(CCCCC)=CC(O)=C1[C@@H]1[C@@H](C(C)=C)CCC(C)=C1 WVOLTBSCXRRQFR-SJORKVTESA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 102100021202 Desmocollin-1 Human genes 0.000 description 1
- 101000968043 Homo sapiens Desmocollin-1 Proteins 0.000 description 1
- 101000880960 Homo sapiens Desmocollin-3 Proteins 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 150000008062 acetophenones Chemical class 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 150000004984 aromatic diamines Chemical class 0.000 description 1
- BSDKBWGNIJMCID-UHFFFAOYSA-N bis(3-nitrophenyl)methanone Chemical compound [O-][N+](=O)C1=CC=CC(C(=O)C=2C=C(C=CC=2)[N+]([O-])=O)=C1 BSDKBWGNIJMCID-UHFFFAOYSA-N 0.000 description 1
- LFABNOYDEODDFX-UHFFFAOYSA-N bis(4-bromophenyl)methanone Chemical compound C1=CC(Br)=CC=C1C(=O)C1=CC=C(Br)C=C1 LFABNOYDEODDFX-UHFFFAOYSA-N 0.000 description 1
- IRFCWUHTGYXRNR-UHFFFAOYSA-N bis(4-nitrophenyl)methanone Chemical compound C1=CC([N+](=O)[O-])=CC=C1C(=O)C1=CC=C([N+]([O-])=O)C=C1 IRFCWUHTGYXRNR-UHFFFAOYSA-N 0.000 description 1
- POOXOHISLGOAEF-UHFFFAOYSA-N bis[3-(trifluoromethyl)phenyl]methanone Chemical compound FC(F)(F)C1=CC=CC(C(=O)C=2C=C(C=CC=2)C(F)(F)F)=C1 POOXOHISLGOAEF-UHFFFAOYSA-N 0.000 description 1
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 1
- 239000001191 butyl (2R)-2-hydroxypropanoate Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 125000006159 dianhydride group Chemical group 0.000 description 1
- 150000005690 diesters Chemical group 0.000 description 1
- 238000006471 dimerization reaction Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 125000005394 methallyl group Chemical group 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 238000006552 photochemical reaction Methods 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- WYVAMUWZEOHJOQ-UHFFFAOYSA-N propionic anhydride Chemical compound CCC(=O)OC(=O)CC WYVAMUWZEOHJOQ-UHFFFAOYSA-N 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- 125000004417 unsaturated alkyl group Chemical group 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D493/00—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system
- C07D493/02—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system in which the condensed system contains two hetero rings
- C07D493/04—Ortho-condensed systems
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1003—Preparatory processes
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1003—Preparatory processes
- C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1003—Preparatory processes
- C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
- C08G73/101—Preparatory processes from tetracarboxylic acids or derivatives and diamines containing chain terminating or branching agents
- C08G73/1014—Preparatory processes from tetracarboxylic acids or derivatives and diamines containing chain terminating or branching agents in the form of (mono)anhydrid
-
- H01L51/0034—
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
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- Chemical & Material Sciences (AREA)
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- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
폴리이미드 등의 원료로서 유용한, 1,2,3,4-시클로부탄테트라카르복실산-1,2 : 3,4-2 무수물 유도체의 효율적 제조 방법의 제공. 하기 식 (1) 로 나타내는 무수 말레산 화합물을, 탄산디에스테르 용매 중에서 광 2 량화 반응시키는 것에 의한, 식 (2) 로 나타내는 1,2,3,4-시클로부탄테트라카르복실산-1,2 : 3,4-2 무수물 유도체의 제조 방법.
[화학식 1]
(식 중, R 은 탄소수 1 ∼ 20 의 알킬기를 나타낸다.)A process for efficiently producing a 1,2,3,4-cyclobutane tetracarboxylic acid-1,2: 3,4-2 anhydride derivative useful as a raw material for polyimide and the like. A 1,2,4,4-cyclobutanetetracarboxylic acid-1,2-dicarboxylic acid represented by the formula (2) by subjecting a maleic anhydride compound represented by the following formula (1) to a photo-dimerization reaction in a carbonate diester solvent : Preparation of 3,4-2 anhydride derivatives.
[Chemical Formula 1]
(In the formula, R represents an alkyl group having 1 to 20 carbon atoms.)
Description
본 발명은, 광학 재료용의 폴리아믹산, 폴리이미드 등의 원료 모노머가 될 수 있는 지환식 테트라카르복실산 2 무수물의 제조법에 관한 것이다.The present invention relates to a process for producing an alicyclic tetracarboxylic acid dianhydride which can be a raw material monomer such as polyamic acid or polyimide for an optical material.
일반적으로, 폴리이미드 수지는, 그 특징인, 높은 기계적 강도, 내열성, 절연성, 내용제성 등에 의해, 액정 표시 소자나 반도체에 있어서의 보호 재료, 절연 재료 등의 전자 재료로서 널리 사용되고 있다. 또한, 최근에는 광 도파로용 재료 등의 광 통신용 재료로서의 용도도 기대되고 있다.In general, polyimide resins are widely used as electronic materials such as protective materials and insulating materials in liquid crystal display elements and semiconductors due to their high mechanical strength, heat resistance, insulating properties, solvent resistance and the like. Further, in recent years, the use of such materials as optical communication materials for optical waveguides is also expected.
최근, 이 분야의 발전은 눈부시고, 그에 대응하여, 사용되는 재료에 대해서도 점점 더 고도의 특성이 요구되게 되어 있다. 즉, 단순히 내열성, 내용제성이 우수할 뿐만 아니라, 용도에 따른 성능을 다수 겸비하는 것이 기대되고 있다.In recent years, developments in this field have been noticeable and, correspondingly, increasingly sophisticated characteristics are required for the materials used. That is, it is expected not only to have excellent heat resistance and solvent resistance, but also to have a number of performances depending on the application.
그러나, 특히, 전체 방향족 폴리이미드 수지에 있어서는, 진한 호박색을 나타내어 착색되기 때문에, 높은 투명성이 요구되는 용도에 있어서, 문제를 가지고 있다.However, in particular, in all-aromatic polyimide resins, since they exhibit a deep amber color and are colored, they have a problem in applications requiring high transparency.
한편, 투명성을 실현하는 하나의 방법으로는, 지환식 테트라카르복실산 2 무수물과 방향족 디아민의 중축합 반응에 의해 폴리이미드 전구체를 형성하고, 당해 전구체를 이미드화하여 폴리이미드를 제조하면, 비교적 착색이 적고, 고투명성의 폴리이미드가 얻어지는 것은 알려져 있다 (특허문헌 1 및 2 참조).On the other hand, as one method of realizing transparency, when a polyimide precursor is formed by a polycondensation reaction of an alicyclic tetracarboxylic acid dianhydride and an aromatic diamine, and the polyimide is imidized by imidizing the precursor, And polyimide having high transparency can be obtained (see Patent Documents 1 and 2).
종래, 알킬시클로부탄산 2 무수물의 합성에 있어서는, 하기의 스킴으로 나타내는 바와 같이, 시트라콘산 무수물 (MMA 라고 약기한다) 의 광 2 량화 반응에 의해, 1,3-디메틸시클로부탄-1,2,3,4-테트라카르복실산-1,2 : 3,4-2 무수물 (1,3-DM-CBDA 라고 약기한다) 과 1,2-디메틸시클로부탄-1,2,3,4-테트라카르복실산-1,2 : 3,4-2 무수물 (1,2-DM-CBDA 라고 약기한다) 의 혼합물이 얻어진다 (특허문헌 3 참조).Conventionally, in the synthesis of alkylcyclocubic acid dianhydrides, as shown by the following scheme, by optical dimerization reaction of citraconic anhydride (abbreviated as MMA), 1,3-dimethylcyclobutane-1,2 , 3,4-tetracarboxylic acid-1,2: 3,4-2 anhydride (abbreviated as 1,3-DM-CBDA) and 1,2-dimethylcyclobutane-1,2,3,4-tetra A mixture of carboxylic acid-1,2: 3,4-2 anhydride (abbreviated as 1,2-DM-CBDA) is obtained (see Patent Document 3).
[화학식 1][Chemical Formula 1]
한편, 1,3-DMCBDA 와 1,2-DMCBDA 를 대비한 경우, 대칭성이 높은 구조를 갖는 전자의 1,3-DMCBDA 가, 후자의 1,2-DMCBDA 보다 분자량이 높은 폴리이미드를 제조할 수 있어, 보다 유용성이 높은 것이 알려져 있다.On the other hand, when 1,3-DMCBDA and 1,2-DMCBDA are compared to each other, 1,3-DMCBDA having an electron with a high symmetry structure can produce polyimide having a higher molecular weight than the latter 1,2-DMCBDA And is known to have a higher usability.
그러나, 특허문헌 3 에는, 1,3-DMCBDA 와 1,2-DMCBDA 의 혼합물이 얻어지는 것은 기재되어 있지만, 유용성이 높은 이성체인, 전자의 1,3-DMCBDA 를 선택적으로, 또한 고수율로 제조하는 것에 대한 기재는 없다.However, Patent Document 3 discloses that a mixture of 1,3-DMCBDA and 1,2-DMCBDA is obtained. However, 1,3-DMCBDA, which is an isomer having high availability, is selectively and highly produced There is no description about thing.
본 발명의 목적은, 하기 식 (1) 로 나타내는 무수 말레산 화합물을 광 2 량화 반응시켜, 고광 반응 효율로, 또한 고수율로, 대칭성이 높은 구조를 갖는 이성체인, 1,3-디알킬-1,2,3,4-시클로부탄테트라카르복실산-1,2 : 3,4-2 무수물 (이하, 1,3-DACBDA 라고도 한다) 유도체를 제조할 수 있는 방법을 제공하는 것에 있다.An object of the present invention is to provide a process for producing a 1,3-dialkyl-substituted maleic anhydride, which is an isomer having a structure with high symmetry at high light reaction efficiency and high yield by subjecting a maleic anhydride compound represented by the following formula (1) 1,2,3,4-cyclobutane tetracarboxylic acid-1,2: 3,4-2 anhydride (hereinafter, also referred to as 1,3-DACBDA) derivatives.
본 발명자들은, 상기의 과제를 해결하기 위해서 예의 연구를 진행시킨 결과, 특정한 용매를 사용한 경우, 대칭성이 높은 구조를 갖는 이성체인, 1,3-DACBDA 유도체의 선택성이 향상되고, 고수율로 제조할 수 있는 것을 알아냈다.DISCLOSURE OF THE INVENTION The inventors of the present invention have conducted intensive studies in order to solve the above problems. As a result, it has been found that when a specific solvent is used, the selectivity of the 1,3-DACBDA derivative, which is an isomer having a highly symmetrical structure, I found out I could.
본 발명은, 이러한 신규의 지견에 기초하는 것으로서, 하기의 요지를 갖는다.The present invention is based on this new knowledge, and has the following points.
1. 하기 식 (1) 로 나타내는 무수 말레산 화합물을, 탄산디에스테르 용매 중에서 광 2 량화 반응시키는 것을 특징으로 하는, 식 (2) 로 나타내는 1,2,3,4-시클로부탄테트라카르복실산-1,2 : 3,4-2 무수물 유도체의 제조 방법.1. A process for producing a 1,2,3,4-cyclobutanetetracarboxylic acid represented by the formula (2), which comprises subjecting a maleic anhydride represented by the following formula (1) to a photo-dimerization reaction in a carbonate diester solvent -1,2: Process for producing 3,4-2 anhydride derivative.
[화학식 2](2)
(식 중, R 은 탄소수 1 ∼ 20 의 알킬기를 나타낸다.)(In the formula, R represents an alkyl group having 1 to 20 carbon atoms.)
2. R 이 탄소수 1 ∼ 4 의 알킬기인, 상기 1 에 기재된 제조 방법.2. The method according to the above 1, wherein R is an alkyl group having 1 to 4 carbon atoms.
3. 탄산디에스테르가, 탄산의 탄소수 1 ∼ 4 의 알킬의 디에스테르인, 상기 1 또는 2 에 기재된 제조 방법.3. The production method according to the above 1 or 2, wherein the carbonic acid diester is a diester of alkyl having 1 to 4 carbon atoms in carbonic acid.
4. 탄산디에스테르가, 탄산디메틸 또는 탄산디에틸인, 상기 1 ∼ 3 중 어느 하나에 기재된 제조 방법.4. The production process according to any one of the above-mentioned 1 to 3, wherein the carbonic acid diester is dimethyl carbonate or diethyl carbonate.
5. 용매가, 포름산메틸, 포름산에틸, 아세트산메틸, 아세트산에틸, 아세트산 n-프로필, 아세트산 i-프로필, 프로피온산메틸, 프로피온산에틸, 프로피온산 n-프로필, 프로피온산 i-프로필, 에틸렌글리콜디포르메이트, 또는 에틸렌글리콜디아세테이트인 탄산디에스테르 이외의 용매를 함유하는, 상기 4 에 기재된 제조 방법.Wherein the solvent is at least one selected from the group consisting of methyl formate, ethyl formate, methyl acetate, ethyl acetate, n-propyl acetate, i-propyl acetate, methyl propionate, ethyl propionate, n- propyl propionate, The production process according to the above 4, wherein the solvent contains a solvent other than carbonic acid diester which is ethylene glycol diacetate.
6. 반응에 사용하는 전체 용매의 사용량이, 무수 말레산 화합물에 대하여 3 ∼ 300 질량 배인, 상기 1 ∼ 5 중 어느 하나에 기재된 제조 방법.6. The production method according to any one of 1 to 5 above, wherein the total amount of the solvent used in the reaction is 3 to 300 times the amount of the maleic anhydride compound.
7. 반응에 사용하는 전체 용매의 사용량이, 무수 말레산 화합물에 대하여 3 ∼ 10 질량 배인, 상기 1 ∼ 5 중 어느 하나에 기재된 제조 방법.7. The production method according to any one of 1 to 5 above, wherein the amount of the total solvent used in the reaction is 3 to 10 mass times the amount of the maleic anhydride compound.
8. 증감제를 사용하는, 상기 1 ∼ 7 중 어느 하나에 기재된 제조 방법.8. The production method according to any one of the above-mentioned 1 to 7, wherein a sensitizer is used.
9. 증감제가, 벤조페논, 벤즈알데하이드, 전자 구인성기가 치환한 벤조페논, 전자 구인성기가 치환한 아세토페논, 전자 구인성기가 치환한 벤즈알데하이드 또는 안트라퀴논인, 상기 8 에 기재된 제조 방법.9. The production method according to the above 8, wherein the sensitizer is benzophenone, benzaldehyde, benzophenone substituted with electron-withdrawing group, acetophenone substituted with electron-withdrawing group, benzaldehyde substituted with electron-withdrawing group, or anthraquinone.
10. 상기 전자 구인성기가, 플루오로기, 클로로기, 브로모기, 요오드기, 니트로기, 시아노기, 및 트리플루오로메틸기로 이루어지는 군에서 선택되는 적어도 1 종인, 상기 9 에 기재된 제조 방법.10. The production method according to the above 9, wherein the electron-attractive group is at least one selected from the group consisting of a fluoro group, a chloro group, a bromo group, an iodo group, a nitro group, a cyano group and a trifluoromethyl group.
11. 전자 구인성기의 수가 1 ∼ 5 인, 상기 9 또는 10 에 기재된 제조 방법.11. The production method according to the above 9 or 10, wherein the number of electron-attracting groups is 1 to 5.
12. 증감제의 사용량이, 무수 말레산 화합물에 대하여 0.1 ∼ 20 몰% 인, 상기 8 ∼ 11 중 어느 하나에 기재된 제조 방법.12. The production method according to any one of 8 to 11 above, wherein the amount of the sensitizer used is 0.1 to 20 mol% based on the maleic anhydride compound.
13. 반응 온도가, 0 ∼ 20 ℃ 인, 상기 1 ∼ 12 중 어느 하나에 기재된 제조 방법.13. The production method according to any one of 1 to 12 above, wherein the reaction temperature is 0 to 20 占 폚.
본 발명의 제조 방법에 의하면, 무수 말레산 화합물의 광 2 량화 반응에 의한 1,2,3,4-시클로부탄테트라카르복실산-1,2 : 3,4-2 무수물 유도체의 제조에 있어서, 1,3-디알킬시클로부탄-1,2,3,4-테트라카르복실산-1,2 : 3,4-2 무수물의 선택성을 향상시킬 수 있다.According to the production process of the present invention, in the production of the 1,2,3,4-cyclobutane tetracarboxylic acid-1,2: 3,4-2 anhydride derivative by the photo-dimerization reaction of the maleic anhydride compound, The selectivity of 1,3-dialkylcyclobutane-1,2,3,4-tetracarboxylic acid-1,2: 3,4-2 anhydride can be improved.
이하, 본 발명에 대하여 더욱 상세하게 설명한다.Hereinafter, the present invention will be described in more detail.
식 (1) 로 나타내는 무수 말레산 화합물의 광 2 량화 반응에 의한 식 (2) 로 나타내는 1,2,3,4-시클로부탄테트라카르복실산-1,2 : 3,4-2 무수물 유도체의 제조 방법은, 하기의 반응 스킴으로 나타낸다.The 1,2,3,4-cyclobutane tetracarboxylic acid-1,2: 3,4-2 anhydride derivative represented by the formula (2) by the photo-dimerization reaction of the maleic anhydride compound represented by the formula (1) The production method is shown by the following reaction scheme.
[화학식 3](3)
식 중, R 은, 탄소수가 1 ∼ 20, 보다 바람직하게는 1 ∼ 12, 특히 바람직하게는 1 ∼ 6 인 알킬기를 나타낸다.In the formulas, R represents an alkyl group having 1 to 20 carbon atoms, more preferably 1 to 12 carbon atoms, and particularly preferably 1 to 6 carbon atoms.
탄소수 1 ∼ 20 의 알킬기로는, 직사슬 혹은 분기형의 포화 알킬기, 또는 직사슬형 또는 분기형의 불포화 알킬기의 어느 것이어도 된다.As the alkyl group having 1 to 20 carbon atoms, a linear or branched saturated alkyl group or a linear or branched unsaturated alkyl group may be used.
그 구체예로는, 메틸, 에틸, n-프로필, i-프로필, n-부틸, i-부틸, s-부틸, t-부틸, n-펜틸, 1-메틸-n-부틸, 2-메틸-n-부틸, 3-메틸-n-부틸, 1,1-디메틸-n-프로필, n-헥실, 1-메틸-n-펜틸, 2-메틸-n-펜틸, 1,1-디메틸-n-부틸, 1-에틸-n-부틸, 1,1,2-트리메틸-n-프로필, n-헵틸, n-옥틸, n-노닐, n-데실, n-도데실, n-에이코실 등의 포화 알킬기, 1-메틸비닐, 2-알릴, 1-에틸비닐, 2-메틸알릴, 2-부테닐, 2-메틸-2-부테닐, 3-메틸-2-부테닐, 3-메틸-3-부테닐, 2-헥세닐, 4-메틸-3-펜테닐, 4-메틸-4-펜테닐, 2,3-디메틸-2-부테닐, 1-에틸-2-펜테닐, 3-도데세닐, 프로파르길, 3-부티닐, 3-메틸-2-프로피닐, 9-데시닐 등의 불포화 알킬기를 들 수 있다.Specific examples thereof include a methyl group, an ethyl group, a n-propyl group, an i-propyl group, an i-butyl group, an i- n-butyl, 3-methyl-n-butyl, 1,1-dimethyl-n- Butyl, 1-ethyl-n-butyl, 1,1,2-trimethyl-n-propyl, n-heptyl, n-octyl, n-nonyl, Alkyl group, 1-methylvinyl, 2-allyl, 1-ethylvinyl, 2-methylallyl, 2-butenyl, Butenyl, 2-hexenyl, 4-methyl-3-pentenyl, 4-methyl-4-pentenyl, , Propargyl, 3-butynyl, 3-methyl-2-propynyl, 9-decynyl and the like.
또한, n 은 노르말을, i 는 이소를, s 는 세컨더리를, t 는 터셔리를, 각각 나타낸다.In addition, n represents normal, i represents iso, s represents secondary, and t represents tertiary.
식 (1) 로 나타내는 무수 말레산 화합물의 일례로는, 무수 시트라콘산, 2-에틸 무수 말레산, 2-이소프로필 무수 말레산, 2-n-부틸 무수 말레산, 2-t-부틸 무수 말레산, 2-n-펜틸말레산 무수물, 2-n-헥실말레산 무수물, 2-n-헵틸말레산 무수물, 2-n-옥틸말레산 무수물, 2-n-노닐말레산 무수물, 2-n-데실말레산 무수물, 2-n-도데실말레산 무수물, 2-n-에이코실말레산 무수물, 2-(1-메틸비닐)말레산 무수물, 2-(2-알릴)말레산 무수물, 2-(1-에틸비닐)말레산 무수물, 2-(2-메틸알릴)말레산 무수물, 2-(2-부테닐)말레산 무수물, 2-(2-헥세닐)말레산 무수물, 2-(1-에틸-2-펜테닐)말레산 무수물, 2-(3-도데세닐)말레산 무수물, 2-프로파르길말레산 무수물, 2-(3-부티닐)말레산 무수물, 2-(3-메틸-2-프로피닐)말레산 무수물, 2-(9-데시닐)말레산 무수물 등을 들 수 있다.Examples of the maleic anhydride compound represented by the formula (1) include anhydrides such as citraconic anhydride, 2-ethyl maleic anhydride, 2-isopropyl maleic anhydride, 2-n-butyl maleic anhydride, 2-n-hexyl maleic anhydride, 2-n-hexyl maleic anhydride, 2-n-hexyl maleic anhydride, 2- maleic anhydride, 2- (2-allyl) maleic anhydride, 2-n-octyl maleic anhydride, 2- Maleic anhydride, 2- (2-hexenyl) maleic anhydride, 2- (2-methylhexyl) maleic anhydride, 2- Maleic anhydride, 2- (3-butenyl) maleic anhydride, 2- (3-dodecenyl) maleic anhydride, 2- 3-methyl-2-propynyl) maleic anhydride, and 2- (9-decynyl) maleic anhydride.
광 반응이 효율적으로 진행되는 점에서, 이들 중에서는 무수 시트라콘산, 2-에틸 무수 말레산, 2-이소프로필 무수 말레산, 2-n-부틸 무수 말레산, 2-t-부틸 무수 말레산, 2-n-펜틸말레산 무수물, 2-n-헥실말레산 무수물, 2-n-헵틸말레산 무수물, 2-n-옥틸말레산 무수물, 2-n-노닐말레산 무수물, 2-n-데실말레산 무수물, 또는 2-n-도데실말레산 무수물 등이 바람직하고, 무수 시트라콘산, 2-에틸 무수 말레산, 2-이소프로필 무수 말레산, 2-n-부틸 무수 말레산, 2-t-부틸 무수 말레산, 2-n-펜틸말레산 무수물, 또는 2-n-헥실말레산 무수물 등이 보다 바람직하다.Among these, from the viewpoint that the photoreaction proceeds efficiently, it is preferable to use an acid anhydride such as citraconic anhydride, 2-ethylmaleic anhydride, 2-isopropylmaleic anhydride, 2-n-butylmaleic anhydride, 2-n-hexyl maleic anhydride, 2-n-octyl maleic anhydride, 2-n-nonyl maleic anhydride, 2-n-hexyl maleic anhydride, 2-n-butyl maleic anhydride, 2-n-butyl maleic anhydride, 2-n-butyl maleic anhydride, 2-n-butyl maleic anhydride, t-butyl maleic anhydride, 2-n-pentyl maleic anhydride, or 2-n-hexyl maleic anhydride.
본 광 반응에서 중요한 역할을 하고 있는 것이 반응 용매인데, 반응 용매는, 탄산디에스테르이다. 탄산디에스테르로는, 그 중에서도, 탄산의 탄소수가 바람직하게는 1 ∼ 4, 보다 바람직하게는 1 ∼ 3, 특히 바람직하게는 1 또는 2 인 알킬디에스테르가 바람직하다. 구체적으로는, 탄산디메틸 또는 탄산디에틸이 바람직하고, 탄산디메틸이 특히 바람직하다.The reaction solvent plays an important role in the photoreaction, and the reaction solvent is a carbonic acid diester. The carbonic acid diester is preferably an alkyl diester in which the carbon number of carbonic acid is preferably 1 to 4, more preferably 1 to 3, and particularly preferably 1 or 2. Specifically, dimethyl carbonate or diethyl carbonate is preferable, and dimethyl carbonate is particularly preferable.
본 발명에서는, 탄산디에스테르와, 탄산디에스테르 이외의 부용매를 병용할 수도 있다. 그러한 용매로는, 포름산메틸, 포름산에틸, 포름산 n-프로필, 포름산 i-프로필, 포름산 n-부틸, 포름산 i-부틸, 아세트산메틸, 아세트산에틸, 아세트산 n-프로필, 아세트산 i-프로필, 아세트산 n-부틸, 아세트산 i-부틸, 프로피온산메틸, 프로피온산에틸, 프로피온산 n-프로필, 프로피온산 i-프로필, 프로피온산 n-부틸, 프로피온산 i-부틸, 에틸렌글리콜디포르메이트, 에틸렌글리콜디아세테이트, 에틸렌글리콜디프로피오네이트 등을 들 수 있다.In the present invention, a carbonic acid diester and a minor solvent other than carbonic acid diester may be used in combination. Examples of the solvent include methyl formate, ethyl formate, n-propyl formate, i-propyl formate, n-butyl formate, i-butyl formate, methyl acetate, ethyl acetate, n- Butyl propionate, i-butyl propionate, ethylene glycol diformate, ethylene glycol diacetate, ethylene glycol dipropionate, ethyleneglycol dipropionate, ethyleneglycol dipropionate And the like.
이들 중에서, 보다 바람직한 용매는, 포름산메틸, 포름산에틸, 아세트산메틸, 아세트산에틸, 아세트산 n-프로필, 아세트산 i-프로필, 프로피온산메틸, 프로피온산에틸, 프로피온산 n-프로필, 프로피온산 i-프로필, 에틸렌글리콜디포르메이트, 에틸렌글리콜디아세테이트 등이고, 가장 바람직한 용매는, 아세트산에틸이다.Of these, more preferred solvents are methyl formate, ethyl formate, methyl acetate, ethyl acetate, n-propyl acetate, i-propyl acetate, methyl propionate, ethyl propionate, n- propyl propionate, Mate, ethylene glycol diacetate and the like, and the most preferable solvent is ethyl acetate.
탄산디에스테르를 용매로서 사용하는, DACBDA 유도체의 제조 방법의 우수한 특징은, 원료인 무수 말레산 화합물의 용해도가 높음에도 불구하고, 생성된 CBDA 화합물의 용해도가 낮고, 결정으로서 석출되기 때문에, DACBDA 화합물로부터의 무수 말레산 화합물에 대한 역반응이나 올리고머 생성 등의 부반응을 억제할 수 있는 것이다.An excellent feature of the method for producing a DACBDA derivative using a carbonic acid diester as a solvent is that the solubility of the resulting CBDA compound is low and precipitates as crystals even though the solubility of the maleic anhydride compound as a raw material is high, It is possible to suppress side reactions such as reverse reaction or oligomer formation from the maleic anhydride compound.
용매의 사용량은, 무수 말레산 화합물에 대하여 3 ∼ 300 질량 배, 보다 바람직하게는 3 ∼ 250 질량 배이다.The amount of the solvent to be used is 3 to 300 mass times, more preferably 3 to 250 mass times, relative to the maleic anhydride compound.
또한, 반응 용매의 사용량은 반응을 빠르게 하고자 하는 경우나, 생성물의 수량을 많게 하고자 하는 경우에는 적은 것이 바람직하고, 예를 들어, 무수 말레산 화합물의 농도가 진해지면, 반응이 빨라져, 얻어지는 생성물의 수량이 많아진다. 따라서, 반응을 빠르게 하고자 하는 경우나, 생성물의 수량을 많게 하고자 하는 경우에는, 용매의 사용량은 무수 말레산 화합물에 대하여 3 ∼ 10 질량 배가 바람직하다.The amount of the reaction solvent to be used is preferably small when the reaction is intended to be accelerated or when the amount of the product is to be increased. For example, when the concentration of the maleic anhydride compound is increased, the reaction is accelerated, The quantity increases. Therefore, when the reaction is intended to be accelerated or when the amount of the product is to be increased, the amount of the solvent to be used is preferably 3 to 10 mass times the amount of the maleic anhydride compound.
본 광 반응에서는, 광의 파장이 200 ∼ 400 ㎚, 보다 바람직하게는 250 ∼ 350 ㎚, 특히 바람직하게는 280 ∼ 330 ㎚ 이다. 광원으로는, 저압 수은등, 중압 수은등, 고압 수은등, 초고압 수은등, 크세논 램프, 무전극 램프, 발광 다이오드 등이, 특이적으로 고수율로 CBDA 유도체 화합물을 부여하는 점에서 바람직하다. 그 중에서도, 고압 수은등, 초고압 수은등, 또는 발광 다이오드가 바람직하다.In the present light reaction, the wavelength of the light is 200 to 400 nm, more preferably 250 to 350 nm, and particularly preferably 280 to 330 nm. As the light source, a low pressure mercury lamp, a medium pressure mercury lamp, a high pressure mercury lamp, an ultra high pressure mercury lamp, a xenon lamp, an electrodeless lamp, a light emitting diode and the like are preferable in terms of giving a CBDA derivative compound specifically. Among them, high-pressure mercury lamps, ultra-high-pressure mercury lamps, or light-emitting diodes are preferable.
또한, 광 화학 반응 장치로서, 광원 냉각관을 석영 유리로부터 파이렉스 (등록상표) 유리로 바꿈으로써, 광원 냉각관에 대한 착색 폴리머 부착이나 불순물이 감소하고, CBDA 유도체 화합물의 수율 개선을 볼 수 있기 때문에 바람직하다.Further, by changing the light source cooling pipe from quartz glass to Pyrex (registered trademark) glass as a photochemical reaction device, adhesion of colored polymer to the light source cooling pipe and impurities are reduced, and the yield of the CBDA derivative compound can be improved desirable.
반응 온도는, 고온이 되면 중합물이 부생하고, 또한 저온이 되면 무수 말레산 화합물의 용해도가 저하하여 생산 효율이 감소하는 점에서, -20 ∼ 80 ℃ 에서 실시하는 것이 바람직하고, 더욱 바람직하게는 -10 ∼ 50 ℃ 이다. 특히, 0 ∼ 20 ℃ 의 온도 범위에서는, 부생물의 생성이 대폭 억제되어, 높은 선택률 및 수율로 CBDA 유도체 화합물이 얻어진다.The reaction temperature is preferably -20 to 80 占 폚, more preferably -20 to 80 占 폚, from the viewpoints of the byproducts of the polymerisation at a high temperature and the lowering of the solubility of the maleic anhydride compound at a low temperature, 10 to 50 ° C. Particularly, in the temperature range of 0 to 20 占 폚, generation of by-products is largely suppressed, and CBDA derivative compounds are obtained with high selectivity and yield.
반응 시간은, 무수 말레산 화합물의 양, 광원의 종류, 조사량 등에 따라서도 바뀌지만, 미반응의 무수 말레산 화합물이 0 ∼ 40 %, 바람직하게는 0 ∼ 10 % 에 이를 때까지의 시간 동안 실시할 수 있다.The reaction time varies depending on the amount of the maleic anhydride compound, the kind of the light source, the amount of irradiation, etc., but is carried out for a period of time until the unreacted maleic anhydride compound reaches 0 to 40%, preferably 0 to 10% can do.
반응 시간은, 구체적으로는, 광원으로서 고압 수은등 또는 발광 다이오드를 이용하고, 반응 용매로서 탄산디메틸 또는 아세트산에틸을 이용하고, 증감제로서 4,4'-디플루오로벤조페논 또는 4,4'-디클로로벤조페논을 이용하여, 0 ∼ 20 ℃ 의 반응 온도 범위의 조건하에서는, 통상적으로, 1 ∼ 200 시간, 바람직하게는 1 ∼ 100 시간, 더욱 바람직하게는, 1 ∼ 60 시간이다.Specifically, the reaction time is determined by using a high-pressure mercury lamp or a light-emitting diode as a light source, using dimethyl carbonate or ethyl acetate as a reaction solvent, and using 4,4'-difluorobenzophenone or 4,4'- Dichlorobenzophenone is used for 1 to 200 hours, preferably 1 to 100 hours, and more preferably 1 to 60 hours under the condition of the reaction temperature range of 0 to 20 ° C.
또한, 전화율은 가스 크로마토그래피 등으로 반응액을 분석함으로써, 구할 수 있다.The conversion can be obtained by analyzing the reaction solution by gas chromatography or the like.
반응 시간이 길어져, 무수 말레산 화합물의 전화율이 높아지고, CBDA 유도체 화합물의 석출량이 많아지면, 생성된 CBDA 유도체 화합물이, 광원 냉각관의 외벽 (반응액측) 에 부착되기 시작하고, 분해 반응의 병발에 의한 결정의 착색화, 광 효율 (단위 전력 x 시간 당의 수율) 의 저하가 보인다. 따라서, 무수 말레산 화합물의 전화율을 높이기 위해서, 1 배치로 장시간 가하는 것은, 실용상, 생산 효율의 저하를 수반하여 바람직하지 않다.When the conversion time of the maleic anhydride compound becomes high and the precipitation amount of the CBDA derivative compound increases, the resulting CBDA derivative compound starts to adhere to the outer wall (reaction liquid side) of the light source cooling tube, And the light efficiency (yield per unit electric power x hour) is lowered. Therefore, in order to increase the conversion rate of the maleic anhydride compound, it is not preferable to add a long period of time in one batch, accompanied with a decrease in production efficiency in practical use.
또한, 반응은 배치식 또는 유통식으로 실시하는 것이 가능하지만, 배치식이 바람직하게 사용된다.In addition, although the reaction can be carried out batchwise or flow-through, the batch-type is preferably used.
또한, 반응시의 압력은, 상압이어도 되고 가압이어도 되고, 어느 것이어도 상관없다. 바람직하게는, 상압이다.The pressure at the time of the reaction may be either normal pressure or pressurized pressure. Preferably, it is normal pressure.
또한, 본 발명의 제조 방법은, 증감제를 첨가하여 실시할 수도 있다. 증감제로는, 벤조페논, 벤즈알데하이드, 안트라퀴논, 전자 구인성기가 치환한 벤조페논, 전자 구인성기가 치환한 아세토페논, 전자 구인성기가 치환한 벤즈알데하이드 등을 들 수 있다.The production method of the present invention may also be carried out by adding a sensitizer. Examples of the sensitizer include benzophenone, benzaldehyde, anthraquinone, benzophenone substituted with an electron-withdrawing group, acetophenone substituted with an electron-withdrawing group, and benzaldehyde substituted with an electron-withdrawing group.
전자 구인성기로는, 플루오로기, 클로로기, 브로모기, 요오드기, 니트로기, 시아노기, 및 트리플루오로메틸기로 이루어지는 군에서 선택되는 적어도 1 종을 들 수 있고, 플루오로기, 클로로기, 브로모기, 시아노기, 및 트리플루오로메틸기 등이 바람직하다. 특히 바람직한 전자 구인성기로는, 플루오로기 또는 클로로기이다.Examples of the electron-withdrawing group include at least one member selected from the group consisting of a fluoro group, a chloro group, a bromo group, an iodo group, a nitro group, a cyano group, and a trifluoromethyl group, , A bromo group, a cyano group, and a trifluoromethyl group are preferable. Particularly preferred electron-attracting groups are a fluoro group or a chloro group.
전자 구인성기의 수로는, 1 ∼ 10 개이지만, 1 ∼ 5 개가 바람직하고, 본 발명의 효과의 점에서, 1 ∼ 3 개가 바람직하다.The number of electron-withdrawing groups is 1 to 10, preferably 1 to 5, and preferably 1 to 3 in view of the effects of the present invention.
전자 구인성기의 치환 위치로는, 카르보닐기에 대하여 오르토 위치, 메타 위치, 파라 위치를 들 수 있지만, 오르토 위치 또는 파라 위치가 바람직하다.The substitution position of the electron-withdrawing group may be an ortho, meta, or para position with respect to the carbonyl group, but is preferably an ortho or para position.
전자 구인성기의 수가 2 이상인 경우에는, 전자 구인성기는 동일해도 되고, 각각 상이한 것이어도 된다. 또한, 오르토 위치에 치환한 2 개의 전자 구인성기가 하나가 되어 카르보닐기를 형성하는 경우 (안트라퀴논) 여도 된다.When the number of electron-withdrawing groups is two or more, the electron-withdrawing groups may be the same or different from each other. In addition, the case where two electron-attracting groups substituted at the ortho position become one to form a carbonyl group (anthraquinone).
벤조페논 및 전자 구인성기가 치환한 벤조페논의 구체예로는, 벤조페논, 2-플루오로벤조페논, 3-플루오로벤조페논, 4-플루오로벤조페논, 2-클로로벤조페논, 3-클로로벤조페논, 4-클로로벤조페논, 2-시아노벤조페논, 3-시아노벤조페논, 4-시아노벤조페논, 2-니트로벤조페논, 3-니트로벤조페논, 4-니트로벤조페논, 2,4'-디클로로벤조페논, 4,4'-디플루오로벤조페논, 4,4'-디클로로벤조페논, 4,4'-디브로모벤조페논, 3,3'-비스(트리플루오로메틸)벤조페논, 3,4'-디니트로벤조페논, 3,3'-디니트로벤조페논, 4,4'-디니트로벤조페논, 2-클로로-5-니트로벤조페논, 1,3-비스(4-플루오로벤조일)벤젠, 1,3-비스(4-클로로벤조일)벤젠, 2,6-디벤조일벤조니트릴, 1,3-디벤조일-4,6-디니트로벤젠, 안트라퀴논 등을 들 수 있다.Specific examples of benzophenone substituted with benzophenone and electron-attracting group include benzophenone, 2-fluorobenzophenone, 3-fluorobenzophenone, 4-fluorobenzophenone, 2-chlorobenzophenone, 3- 2-nitrobenzophenone, 2-nitrobenzophenone, 4-nitrobenzophenone, 2-cyanobenzophenone, 4-cyanobenzophenone, 4'-dichlorobenzophenone, 4,4'-difluorobenzophenone, 4,4'-dichlorobenzophenone, 4,4'-dibromobenzophenone, 3,3'-bis (trifluoromethyl) Benzophenone, 3,4'-dinitrobenzophenone, 3,3'-dinitrobenzophenone, 4,4'-dinitrobenzophenone, 2-chloro-5-nitrobenzophenone, 1,3-bis Benzene, 1,3-dibenzoyl-4,6-dinitrobenzene, anthraquinone, and the like can be used. have.
이들 중에서는, 4,4'-디플루오로벤조페논, 또는 4,4'-디클로로벤조페논 등이 바람직하다.Of these, 4,4'-difluorobenzophenone, 4,4'-dichlorobenzophenone and the like are preferable.
아세토페논 및 전자 구인성기가 치환한 아세토페논의 구체예로는, 아세토페논, 2'-플루오로아세토페논, 3'-플루오로아세토페논, 4'-플루오로아세토페논, 2'-클로로아세토페논, 3'-클로로아세토페논, 4'-클로로아세토페논, 2'-시아노아세토페논, 3'-시아노아세토페논, 4'-시아노아세토페논, 2'-니트로아세토페논, 3'-니트로아세토페논, 4'-니트로아세토페논, 2',4'-디플루오로아세토페논, 3',4'-디플루오로아세토페논, 2',4'-디클로로아세토페논, 3',4'-디클로로아세토페논, 4'-클로로-3'-니트로아세토페논, 4'-브로모-3'-니트로아세토페논, 4'-플루오로-3'-니트로아세토페논 등을 들 수 있다.Specific examples of acetophenone substituted with acetophenone and electron-withdrawing group include acetophenone, 2'-fluoroacetophenone, 3'-fluoroacetophenone, 4'-fluoroacetophenone, 2'-chloroacetophenone , 3'-chloroacetophenone, 4'-chloroacetophenone, 2'-cyanoacetophenone, 3'-cyanoacetophenone, 4'-cyanoacetophenone, 2'-nitroacetophenone, 3'-nitro 2 ', 4'-dichloroacetophenone, 3'4'-difluoroacetophenone, 3'4'-difluoroacetophenone, 2'4'-dichloroacetophenone, Dichloroacetophenone, 4'-chloro-3'-nitroacetophenone, 4'-bromo-3'-nitroacetophenone, and 4'-fluoro-3'-nitroacetophenone.
이들 중에서는, 4'-플루오로아세토페논, 4'-클로로아세토페논, 2',4'-디플루오로아세토페논, 3',4'-디플루오로아세토페논, 2',4'-디클로로아세토페논, 또는 3',4'-디클로로아세토페논 등이 바람직하다.Among these, 4'-fluoroacetophenone, 4'-chloroacetophenone, 2 ', 4'-difluoroacetophenone, 3', 4'-difluoroacetophenone, 2 ', 4'- Acetophenone, or 3 ', 4'-dichloroacetophenone are preferable.
벤즈알데하이드 및 전자 구인성기가 치환한 벤즈알데하이드로는, 벤즈알데하이드, 2-플루오로벤즈알데하이드, 3-플루오로벤즈알데하이드, 4-플루오로벤즈알데하이드, 2-클로로벤즈알데하이드, 3-클로로벤즈알데하이드, 4-클로로벤즈알데하이드, 2-시아노벤즈알데하이드, 3-시아노벤즈알데하이드, 4-시아노벤즈알데하이드, 2-니트로벤즈알데하이드, 3-니트로벤즈알데하이드, 4-니트로벤즈알데하이드, 2,4-디플루오로벤즈알데하이드, 3,4-디플루오로벤즈알데하이드, 2,4-디클로로벤즈알데하이드, 3,4-디클로로벤즈알데하이드, 2-클로로-5-니트로벤즈알데하이드, 4-클로로-2-니트로벤즈알데하이드, 4-클로로-3-니트로벤즈알데하이드, 5-클로로-2-니트로벤즈알데하이드, 2-플루오로-5-니트로벤즈알데하이드, 4-플루오로-3-니트로벤즈알데하이드, 5-플루오로-2-니트로벤즈알데하이드 등을 들 수 있다.Examples of the benzaldehyde and the benzaldehyde substituted by the electron-withdrawing group include benzaldehyde, 2-fluorobenzaldehyde, 3-fluorobenzaldehyde, 4-fluorobenzaldehyde, 2- chlorobenzaldehyde, 3- 4-nitrobenzaldehyde, 4-nitrobenzaldehyde, 4-nitrobenzaldehyde, 4-nitrobenzaldehyde, 2-cyanobenzaldehyde, 4-cyanobenzaldehyde, Dichlorobenzaldehyde, 3,4-dichlorobenzaldehyde, 2-chloro-5-nitrobenzaldehyde, 4-chloro-2-nitrobenzaldehyde, 3,4-dichlorobenzaldehyde, 3,4-dichlorobenzaldehyde, , 4-chloro-3-nitrobenzaldehyde, 5-chloro-2-nitrobenzaldehyde, 2-fluoro-5-nitrobenzaldehyde, Nitro There may be mentioned's aldehyde and the like.
이들 중에서는, 4-플루오로벤즈알데하이드, 4-클로로벤즈알데하이드, 2,4-디플루오로벤즈알데하이드, 3,4-디플루오로벤즈알데하이드, 2,4-디클로로벤즈알데하이드, 또는 3,4-디클로로벤즈알데하이드 등이 바람직하다.Among them, 4-fluorobenzaldehyde, 4-chlorobenzaldehyde, 2,4-difluorobenzaldehyde, 3,4-difluorobenzaldehyde, 2,4-dichlorobenzaldehyde, Dichlorobenzaldehyde and the like are preferable.
사용하는 증감제의 양은, 광 반응 속도가 가속하는 양이면 되고, 특별히 한정되지 않지만, 바람직하게는, 무수 말레산 화합물에 대하여 0.1 ∼ 20 몰%, 보다 바람직하게는 0.1 ∼ 5 몰% 이다.The amount of the sensitizer to be used is not particularly limited, but is preferably from 0.1 to 20 mol%, more preferably from 0.1 to 5 mol%, based on the maleic anhydride compound, as long as the photoreaction rate accelerates.
증감제는, 상기의 벤조페논 유도체, 아세토페논 유도체, 또는 벤즈알데하이드 유도체를 각각 단독으로, 혹은, 이들의 1 종 이상을 공존시켜 사용해도 되지만, 반응 후의 처리의 용이함으로부터는, 단독으로의 사용이 바람직하다.The benzophenone derivative, the acetophenone derivative or the benzaldehyde derivative may be used alone or in combination of at least one of the benzophenone derivatives and the benzaldehyde derivatives described above. However, from the viewpoint of ease of treatment after the reaction, desirable.
목적 화합물은, 광 반응 후, 반응액 중의 석출물을 여과하고, 여과 채취물을 유기 용매에서 세정한 후, 감압 건조시킴으로써 얻어진다.The objective compound is obtained by filtering the precipitate in the reaction solution after the photoreaction, washing the filtrate in an organic solvent, and drying under reduced pressure.
여과 채취물의 세정에 사용하는 유기 용매의 양은, 반응조 내에 잔존한 석출물을 여과기에 이송할 수 있는 양이면 되는데, 유기 용매의 양이 많은 경우에는 목적물이 여과액으로 이행하게 되어 회수율이 저하한다. 이 때문에, 여과 채취물의 세정에 사용하는 유기 용매의 양은, 반응에 사용한 무수 말레산 화합물에 대하여, 0.5 ∼ 10 중량 배가 바람직하고, 보다 바람직하게는 1 ∼ 2 중량 배이다.The amount of the organic solvent used for washing the filtrate should be such an amount as to allow the precipitate remaining in the reaction vessel to be transferred to the filter. If the amount of the organic solvent is large, the desired product is converted into the filtrate. Therefore, the amount of the organic solvent used for washing the filtrate is preferably from 0.5 to 10 times by weight, and more preferably from 1 to 2 times by weight, based on the maleic anhydride compound used in the reaction.
여과 채취물의 세정에 사용하는 유기 용매로는, 특별히 한정되지 않지만, 생성물의 용해도가 높은 용매의 사용은, 목적 화합물이 여과액으로 이행하게 되어 회수율이 저하하기 때문에 바람직하지 않다. 이 때문에, 여과 채취물의 세정에 사용하는 유기 용매로는, 광 2 량화 반응에 사용하는 반응 용매인, 포름산메틸, 포름산에틸, 포름산 n-프로필, 포름산 i-프로필, 포름산 n-부틸, 포름산 i-부틸, 아세트산메틸, 아세트산에틸, 아세트산 n-프로필, 아세트산 i-프로필, 아세트산 n-부틸, 아세트산 i-부틸, 프로피온산메틸, 프로피온산에틸, 프로피온산 n-프로필, 프로피온산 i-프로필, 프로피온산 n-부틸, 프로피온산 i-부틸, 에틸렌글리콜디포르메이트, 에틸렌글리콜디아세테이트, 에틸렌글리콜디프로피오네이트, 탄산디메틸, 탄산디에틸 등이나 생성물을 용해시키지 않고, 생성물과 반응하지 않는 용매, 예를 들어, 톨루엔, 헥산, 헵탄, 아세토니트릴, 아세톤, 클로로포름, 무수 아세트산이나 이들의 혼합 용매 등을 들 수 있다. 그 중에서도 아세트산에틸, 탄산디메틸, 무수 아세트산 등이 바람직하고, 보다 바람직하게는 아세트산에틸 또는 탄산디메틸이다.The organic solvent used for cleaning the filtrate is not particularly limited, but the use of a solvent having a high solubility of the product is not preferable because the objective compound is converted into the filtrate and the recovery rate is lowered. Therefore, examples of the organic solvent used for washing the filtrate include organic solvents such as methyl formate, ethyl formate, n-propyl formate, i-propyl formate, n-butyl formate, i- Butyl acetate, i-propyl acetate, n-butyl acetate, i-butyl acetate, methyl propionate, ethyl propionate, n-propyl propionate, i-propyl propionate, n-butyl propionate, such as i-butyl, ethylene glycol diformate, ethylene glycol diacetate, ethylene glycol dipropionate, dimethyl carbonate, diethyl carbonate, etc., or a solvent that does not react with the product and does not react with the product such as toluene, , Heptane, acetonitrile, acetone, chloroform, acetic anhydride, mixed solvents thereof and the like. Among these, ethyl acetate, dimethyl carbonate, acetic anhydride and the like are preferable, and ethyl acetate or dimethyl carbonate is more preferable.
실시예Example
이하에 실시예를 들어, 본 발명을 구체적으로 설명하지만, 본 발명은 이들에 한정되는 것은 아니다.Hereinafter, the present invention will be specifically described by way of examples, but the present invention is not limited thereto.
또한, 실시예에서 사용한 분석법은 이하와 같다.The analytical methods used in the examples are as follows.
<GC 분석 조건><GC analysis conditions>
장치 : GC-2010 Plus (SHIMADZU 사 제조),Apparatus: GC-2010 Plus (manufactured by SHIMADZU),
칼럼 : DB-1 (지엘 사이언스사 제조) 0.25 ㎜ × 30 m, 막 두께 0.25 um,Column: DB-1 (manufactured by GEI Science Co., Ltd.) 0.25 mm 占 30 m, film thickness 0.25 占 퐉,
캐리어 가스 : He, 검출기 : FID, 시료 주입량 : 1 um, 주입구 온도 : 160 ℃, 검출기 온도 : 220 ℃, 칼럼 온도 : 70 ℃ (20 min) - 40 ℃/min - 220 ℃ (15 min), 스플릿비 : 1 : 50, 내부 표준 물질 : 락트산부틸.Carrier gas: He, detector: FID, sample injection amount: 1 um, inlet temperature: 160 占 폚, detector temperature: 220 占 폚, column temperature: 70 占 폚 (20 min) - 40 占 min -1 220 占 폚 Ratio: 1: 50, internal standard substance: butyl lactate.
<1H NMR 분석 조건>< 1 H NMR analysis conditions>
장치 : 푸리에 변감형 초전도 핵자기 공명 장치 (FT-NMR) INOVA-400 (Varian 사 제조) 400 ㎒,Apparatus: Fourier transform type superconducting nuclear magnetic resonance apparatus (FT-NMR) INOVA-400 (manufactured by Varian) 400 MHz,
용매 : DMSO-d6, 내표준 물질 : 테트라메틸실란 (TMS).Solvent: DMSO-d6, internal standard: tetramethylsilane (TMS).
<융점 분석 조건><Melting Point Analysis Conditions>
장치 : DSC1 (메틀러·톨레도사 제조),Apparatus: DSC1 (manufactured by METTLER TOLEDO Co., Ltd.),
온도 : 35 ℃ - 5 ℃/min - 400 ℃, 팬 : Au (밀폐).Temperature: 35 ℃ - 5 ℃ / min - 400 ℃, Fan: Au (sealed).
비교예 1Comparative Example 1
[화학식 4][Chemical Formula 4]
질소 분위기하, 30 ㎖ 파이렉스 (등록상표) 유리제 시험관에, 시트라콘산 무수물 (CA) 0.10 g (0.89 m㏖), 및 아세트산메틸 20 g (270 m㏖, 시트라콘산 무수물 (CA) 에 대하여 200 wt 배) 을 주입하고, 마그네틱 스터러로 교반시켜 용해시켰다. 그 후, 5 - 10 ℃ 에서 교반하면서, 100 W 고압 수은등을 4 시간 조사하였다. 조사 후에 반응액을 가스 크로마토그래피로 정량 분석한 결과, 시트라콘산 무수물 (CA) 의 잔존율은 29.9 % 였다. 또한, 반응기 중의 반응액을 2 g 채취하고, 이배퍼레이터로 70 - 80 Torr 에서 용매 증류 제거하였다. 얻어진 미정제물은, 1H NMR 해석에 의해, 1,3-DM-CBDA 와 1,2-DM-CBDA 를 포함하는 혼합물 (1,3-DM-CBDA : 1,2-DM-CBDA = 42.6 : 57.4) 인 것을 확인하였다.(270 mmol) of citric acid anhydride (CA) and 200 g of methyl acetic anhydride (CA) were placed in a 30 mL Pyrex (registered trademark) glass test tube in a nitrogen atmosphere, wt.), and the mixture was stirred with a magnetic stirrer to dissolve. Thereafter, while stirring at 5 - 10 캜, a 100 W high pressure mercury lamp was irradiated for 4 hours. After the irradiation, the reaction solution was quantitatively analyzed by gas chromatography. As a result, the residual ratio of citraconic anhydride (CA) was 29.9%. Further, 2 g of the reaction solution in the reactor was collected, and the solvent was distilled off at 70-80 Torr with this distributor. The obtained crude product was analyzed by 1 H NMR analysis to find that a mixture containing 1,3-DM-CBDA and 1,2-DM-CBDA (1,3-DM-CBDA: 1,2-DM-CBDA = 42.6: 57.4).
1H NMR (DMSO-d6, δ ppm) (1,3-DM-CBDA) : 1.38 (s, 6H), 3.89 (s, 2H). 1 H NMR (DMSO-d6, δ ppm) (1,3-DM-CBDA): 1.38 (s, 6H), 3.89 (s, 2H).
1H NMR (DMSO-d6, δ ppm) (1,2-DM-CBDA) : 1.37 (s, 6H), 3.72 (s, 2H). 1 H NMR (DMSO-d6, δ ppm) (1,2-DM-CBDA): 1.37 (s, 6H), 3.72 (s, 2H).
실시예 1Example 1
[화학식 5][Chemical Formula 5]
질소 분위기하, 30 ㎖ 파이렉스 (등록상표) 유리제 시험관에, 시트라콘산 무수물 (CA) 0.10 g (0.89 m㏖), 및 탄산디메틸 20 g (222 m㏖, 시트라콘산 무수물 (CA) 에 대하여 200 wt 배) 을 주입하고, 마그네틱 스터러로 교반시켜 용해시켰다. 그 후, 15 - 20 ℃ 에서 교반하면서, 100 W 고압 수은등을 4 시간 조사하였다. 조사 후에 반응액을 가스 크로마토그래피로 정량 분석한 결과, 시트라콘산 무수물 (CA) 의 잔존율은 26.2 % 였다. 또한, 반응기 중의 반응액을 2 g 채취하고, 이배퍼레이터로 70 - 80 Torr 에서 용매 증류 제거하였다. 얻어진 미정제물은, 1H NMR 해석에 의해, 1,3-DM-CBDA 와 1,2-DM-CBDA 를 포함하는 혼합물 (1,3-DM-CBDA : 1,2-DM-CBDA = 48.3 : 51.7) 인 것을 확인하였다.(0.89 mmol) of citraconic anhydride (CA) and 20 g (222 mmol, dimethyl carbonate) of citric acid anhydride (CA) were placed in a 30 mL Pyrex (registered trademark) wt.), and the mixture was stirred with a magnetic stirrer to dissolve. Thereafter, while stirring at 15 - 20 캜, a 100 W high pressure mercury lamp was irradiated for 4 hours. After the irradiation, the reaction solution was quantitatively analyzed by gas chromatography. As a result, the residual ratio of citraconic anhydride (CA) was 26.2%. Further, 2 g of the reaction solution in the reactor was collected, and the solvent was distilled off at 70-80 Torr with this distributor. The obtained crude product was analyzed by 1 H NMR analysis to find that a mixture containing 1,3-DM-CBDA and 1,2-DM-CBDA (1,3-DM-CBDA: 1,2-DM-CBDA = 48.3: 51.7).
비교예 2 ∼ 28, 및 실시예 2Comparative Examples 2 to 28 and Example 2
일련의 조작은 비교예 1 과 동일하게, 각 용매를 시트라콘산 무수물 (CA) 에 대하여 200 wt 배 첨가하여 실시하고, 비교예 1 과 동일한 방법으로, 시트라콘산 무수물 (CA) 의 잔존율, 및 1,3-DM-CBDA 와 1,2-DM-CBDA 의 생성비 (1,3-DM-CBDA : 1,2-DM-CBDA) 를 산출하였다.A series of operations were carried out in the same manner as in Comparative Example 1, except that each solvent was added to the citraconic anhydride (CA) in an amount of 200 wt times. In the same manner as in Comparative Example 1, the residual ratio of the citraconic anhydride (CA) And the production ratio of 1,3-DM-CBDA and 1,2-DM-CBDA (1,3-DM-CBDA: 1,2-DM-CBDA) were calculated.
용매, 온도, 부생물량 및 결과를 이하의 표에 나타낸다. 또한, 여기서 얻어진 반응액의 시트라콘산 무수물의 잔존율, 및 1,3-DM-CBDA 와 1,2-DM-CBDA 의 생성비를 산출하고, 비교예 1 및 실시예 1 에서 얻어진 결과와 함께 표에 나타낸다. 또한, 표 중의 반응 속도는, 사용한 시트라콘산의 몰수와, 4 시간 반응시킨 시점에서의 시트라콘산의 잔존율로부터 계산하였다.The solvent, temperature, by-product amount and results are shown in the following table. The residual ratio of citraconic anhydride and the ratio of 1,3-DM-CBDA to 1,2-DM-CBDA in the obtained reaction solution were calculated, and the results were compared with those obtained in Comparative Example 1 and Example 1 Are shown in the table. The reaction rate in the table was calculated from the number of moles of citraconic acid used and the residual ratio of citraconic acid at the time of reaction for 4 hours.
실시예 3Example 3
[화학식 6][Chemical Formula 6]
질소 분위기하, 300 ㎖ 파이렉스 (등록상표) 유리제 5 구 플라스크에, 시트라콘산 무수물 (CA) 35.0 g (312 m㏖), 및 탄산디메틸 152 g (1682 m㏖, 시트라콘산 무수물 (CA) 에 대하여 4.33 wt 배) 을 주입하고, 마그네틱 스터러로 교반시켜 용해시켰다. 그 후, 10 - 15 ℃ 에서 교반하면서, 100 W 고압 수은등을 48 시간 조사하였다. 반응액은 가스 크로마토그래피 분석에 의해, 원료 잔존율이 23.7 % 인 것을 확인하였다. 이어서, 석출된 백색 결정을 10 - 15 ℃ 에서 여과에 의해 취출하고, 이 결정을 아세트산에틸 43.8 g (497 m㏖, 시트라콘산 무수물 (CA) 에 대하여 1.25 wt 배) 으로 2 회 세정하였다. 이것을 감압 건조시킴으로써, 백색 결정 8.1 g (수율 23.1 %) 을 얻었다. 이 결정은, 1H NMR 해석에 의해, 1,3-DM-CBDA 와 1,2-DM-CBDA 를 포함하는 혼합물 (1,3-DM-CBDA : 1,2-DM-CBDA = 90.3 : 9.7) 인 것을 확인하였다. 또한, 얻어진 결정, 여과액, 세정액을 각각 1H NMR 해석 및 가스 크로마토그래피로 정량 분석하고, 주입량에 대한 매스 밸런스는 88.9 % 였다.35.0 g (312 mmol) of citraconic anhydride (CA) and 152 g (1682 mmol, dimethylcitrate (CA)) were added to a 300 ml Pyrex (registered trademark) glass five- 4.33 wt. Times), and the mixture was stirred with a magnetic stirrer to dissolve. Thereafter, while stirring at 10 - 15 캜, a 100 W high pressure mercury lamp was irradiated for 48 hours. It was confirmed by gas chromatography analysis that the residual ratio of the raw material was 23.7%. Then, the precipitated white crystals were taken out by filtration at 10-15 캜, and the crystals were washed twice with 43.8 g (497 mmol, 1.25 wt times with respect to citraconic anhydride (CA)) of ethyl acetate. This was dried under reduced pressure to obtain 8.1 g (yield: 23.1%) of white crystals. This crystal was identified by 1 H NMR analysis as a mixture containing 1,3-DM-CBDA and 1,2-DM-CBDA (1,3-DM-CBDA: 1,2-DM-CBDA = 90.3: 9.7 ). The resulting crystals, filtrate and washing liquid were quantitatively analyzed by 1 H NMR analysis and gas chromatography, respectively, and the mass balance with respect to the amount of injection was 88.9%.
실시예 4Example 4
[화학식 7](7)
질소 분위기하, 30 ㎖ 파이렉스 (등록상표) 유리제 시험관에, 시트라콘산 무수물 (CA) 0.10 g (0.89 m㏖), 벤조페논 (BP) 0.020 g (0.11 m㏖, 시트라콘산 무수물 (CA) 에 대하여 20 질량%), 및 탄산디메틸 20 g (222 m㏖, 시트라콘산 무수물 (CA) 에 대하여 200 질량 배) 을 주입하고, 마그네틱 스터러로 교반시켜 용해시켰다. 그 후, 10 - 15 ℃ 에서 교반하면서, 100 W 고압 수은등을 4 시간 조사하였다. 조사 후에 반응액을 가스 크로마토그래피로 정량 분석한 결과, 시트라콘산 무수물 (CA) 의 잔존율은 3.9 % 였다. 또한, 반응기 중의 반응액을 2 g 채취하고, 이배퍼레이터로 70 - 80 Torr 에서 용매 증류 제거하였다. 얻어진 미정제물은, 1H NMR 해석에 의해 1,3-DM-CBDA 와 1,2-DM-CBDA 를 포함하는 혼합물 (1,3-DM-CBDA : 1,2-DM-CBDA = 48.3 : 51.7) 인 것을 확인하였다.(CA) (0.10 g, 0.89 mmol) and benzophenone (BP) (0.020 g, 0.11 mmol, in the presence of citraconic anhydride (CA)) were placed in a 30 ml Pyrex (registered trademark) 20 mass%), and 20 g of dimethyl carbonate (222 mmol, 200 mass times of citraconic anhydride (CA)) were charged and dissolved by stirring with a magnetic stirrer. Thereafter, while stirring at 10 - 15 캜, a 100 W high-pressure mercury lamp was irradiated for 4 hours. After the irradiation, the reaction solution was quantitatively analyzed by gas chromatography. As a result, the residual ratio of citraconic anhydride (CA) was 3.9%. Further, 2 g of the reaction solution in the reactor was collected, and the solvent was distilled off at 70-80 Torr with this distributor. The obtained crude product was analyzed by 1 H NMR analysis to find that a mixture containing 1,3-DM-CBDA and 1,2-DM-CBDA (1,3-DM-CBDA: 1,2-DM-CBDA = 48.3: 51.7 ).
실시예 5Example 5
일련의 조작은 실시예 4 와 동일하게, 증감제로서 4,4'-디클로로벤조페논 (DClBP) 을 첨가하여 실시하고, 비교예 1 과 동일한 방법으로, 시트라콘산 무수물 (CA) 의 잔존율, 및 1,3-DM-CBDA 와 1,2-DM-CBDA 의 생성비 (1,3-DM-CBDA : 1,2-DM-CBDA) 를 산출하였다.A series of operations were carried out in the same manner as in Example 4, except that 4,4'-dichlorobenzophenone (DClBP) was added as a sensitizer. In the same manner as in Comparative Example 1, the residual ratio of citraconic anhydride (CA) And the production ratio of 1,3-DM-CBDA and 1,2-DM-CBDA (1,3-DM-CBDA: 1,2-DM-CBDA) were calculated.
용매, 온도, 증감제, 부생물량 및 결과를 이하의 표에 나타낸다. 또한, 여기서 얻어진 반응액의 시트라콘산 무수물의 잔존율, 및 1,3-DM-CBDA 와 1,2-DM-CBDA 의 생성비를 산출하고, 실시예 4 에서 얻어진 결과와 함께 표에 나타낸다. 또한, 표 중의 반응 속도는, 사용한 시트라콘산의 몰수와, 4 시간 반응시킨 시점에서의 시트라콘산의 잔존율로부터 계산하였다.The solvent, temperature, sensitizer, by-product and results are shown in the following table. The residual ratio of citraconic anhydride and the ratio of 1,3-DM-CBDA to 1,2-DM-CBDA in the obtained reaction liquid were calculated, and are shown in the table together with the results obtained in Example 4. The reaction rate in the table was calculated from the number of moles of citraconic acid used and the residual ratio of citraconic acid at the time of reaction for 4 hours.
참고예 1Reference Example 1
[화학식 8][Chemical Formula 8]
질소 기류하 중, 200 ㎖ 의 4 구 플라스크에, 실시예 3 과 동일한 방법으로 얻어진, 1,3-DM-CBDA 와 1,2-DM-CBDA 를 포함하는 혼합물 (1,3-DM-CBDA : 1,2-DM-CBDA = 85 : 15) 18.3 g, 및 무수 아세트산 92 g 을 주입하고, 마그네틱 스터러로 교반하, 25 ℃ 에서 현탁시켰다. 그 후, 4 시간 가열 환류 (130 ℃) 시켰다. 그 후, 내온을 25 ℃ 이하까지 냉각시키고, 1 시간 25 ℃ 이하에서 교반시켰다. 그 후, 석출된 백색 결정을 여과하고, 그 결정을 아세트산에틸 18 g 으로 2 회 세정한 후, 얻어진 백색 결정을 감압 건조시킴으로써, 고순도의 1,3-DM-CBDA 14.4 g (수율 92 %) 을 얻었다. 이 결정은, 1H NMR 해석에 의해, 1,3-DM-CBDA 와 1,2-DM-CBDA 의 비율이 1,3-DM-CBDA : 1,2-DM-CBDA = 99.5 : 0.5 인 것을 확인하였다.A mixture (1,3-DM-CBDA: 1,2-DM-CBDA) containing 1,3-DM-CBDA and 1,2-DM-CBDA obtained in the same manner as in Example 3 was placed in a 200- 1,2-DM-CBDA = 85: 15) and 92 g of acetic anhydride, and suspended at 25 DEG C under stirring with a magnetic stirrer. Thereafter, the mixture was heated under reflux (130 캜) for 4 hours. Thereafter, the inner temperature was cooled to 25 DEG C or lower and stirred at 25 DEG C or lower for 1 hour. Thereafter, the precipitated white crystals were filtered, and the crystals were washed twice with 18 g of ethyl acetate, and the resulting white crystals were dried under reduced pressure to obtain 14.4 g (yield 92%) of high purity 1,3-DM-CBDA . This determination was made by 1 H NMR analysis that the ratio of 1,3-DM-CBDA and 1,2-DM-CBDA was 1,3-DM-CBDA: 1,2-DM-CBDA = 99.5: 0.5 Respectively.
1H NMR (DMSO-d6, δ ppm) (1,3-DM-CBDA) : 1.38 (s, 6H), 3.89 (s, 2H). 1 H NMR (DMSO-d6, δ ppm) (1,3-DM-CBDA): 1.38 (s, 6H), 3.89 (s, 2H).
1H NMR (DMSO-d6, δ ppm) (1,2-DM-CBDA) : 1.37 (s, 6H), 3.72 (s, 2H). 1 H NMR (DMSO-d6, δ ppm) (1,2-DM-CBDA): 1.37 (s, 6H), 3.72 (s, 2H).
mp. (1,3-DM-CBDA) : 316 - 317 ℃mp. (1,3-DM-CBDA): 316 - 317 [deg.] C
산업상 이용가능성Industrial availability
본 발명에서 얻어지는 시클로부탄테트라카르복실산 유도체는, 폴리아믹산, 폴리이미드 등의 원료로서 유용한 화합물로, 그 폴리이미드 등은 액정 표시 소자나 반도체에 있어서의 보호 재료, 절연 재료 등의 전자 재료에 사용되는 수지 조성물로서 산업상, 널리 이용되고 있다.The cyclobutane tetracarboxylic acid derivative obtained in the present invention is useful as a raw material for polyamic acid, polyimide and the like. The polyimide and the like are used for electronic materials such as protective materials and insulating materials in liquid crystal display devices and semiconductors Which is widely used in the industry.
또한, 2014년 1월 17일에 출원된 일본 특허 출원 2014-007186호의 명세서, 특허 청구의 범위, 및 요약서의 전체 내용을 여기에 인용하고, 본 발명의 명세서의 개시로서 받아들이는 것이다.Further, the entire contents of the specification, claims, and abstract of Japanese Patent Application No. 2014-007186 filed on January 17, 2014 are incorporated herein by reference and the disclosure of the specification of the present invention is hereby incorporated herein by reference.
Claims (13)
[화학식 1]
(식 중, R 은 탄소수 1 ∼ 20 의 알킬기를 나타낸다.)A process for producing a 1,2,3,4-cyclobutane tetracarboxylic acid-1 represented by the formula (2), which comprises subjecting a maleic anhydride compound represented by the following formula (1) to a photo-dimerization reaction in a carbonate diester solvent , 2: A process for producing a 3,4-2-anhydride derivative.
[Chemical Formula 1]
(In the formula, R represents an alkyl group having 1 to 20 carbon atoms.)
R 이 탄소수 1 ∼ 4 의 알킬기인, 제조 방법.The method according to claim 1,
And R is an alkyl group having 1 to 4 carbon atoms.
탄산디에스테르가, 탄산의 탄소수 1 ∼ 4 의 알킬디에스테르인, 제조 방법.3. The method according to claim 1 or 2,
Wherein the carbonic acid diester is an alkyl diester of carbonic acid having 1 to 4 carbon atoms.
탄산디에스테르가, 탄산디메틸 또는 탄산디에틸인, 제조 방법.4. The method according to any one of claims 1 to 3,
Wherein the carbonic acid diester is dimethyl carbonate or diethyl carbonate.
용매가, 포름산메틸, 포름산에틸, 아세트산메틸, 아세트산에틸, 아세트산 n-프로필, 아세트산 i-프로필, 프로피온산메틸, 프로피온산에틸, 프로피온산 n-프로필, 프로피온산 i-프로필, 에틸렌글리콜디포르메이트, 또는 에틸렌글리콜디아세테이트인 탄산디에스테르 이외의 부용매를 함유하는, 제조 방법.5. The method of claim 4,
Wherein the solvent is selected from the group consisting of methyl formate, ethyl formate, methyl acetate, ethyl acetate, n-propyl acetate, i-propyl acetate, methyl propionate, ethyl propionate, n-propyl propionate, And a minor solvent other than carbonic acid diester which is diacetate.
반응에 사용하는 전체 용매의 사용량이, 무수 말레산 화합물에 대하여 3 ∼ 300 질량 배인, 제조 방법.6. The method according to any one of claims 1 to 5,
Wherein the total amount of the solvent used in the reaction is 3 to 300 times the amount of the maleic anhydride compound.
반응에 사용하는 전체 용매의 사용량이, 무수 말레산 화합물에 대하여 3 ∼ 10 질량 배인, 제조 방법.6. The method according to any one of claims 1 to 5,
Wherein the amount of the total solvent used in the reaction is 3 to 10 mass times the amount of the maleic anhydride compound.
추가로 증감제를 사용하는, 제조 방법.8. The method according to any one of claims 1 to 7,
Further comprising a sensitizer.
증감제가, 벤조페논, 벤즈알데하이드, 전자 구인성기가 치환한 벤조페논, 전자 구인성기가 치환한 아세토페논, 전자 구인성기가 치환한 벤즈알데하이드 또는 안트라퀴논인, 제조 방법.9. The method of claim 8,
Wherein the sensitizer is benzophenone, benzaldehyde, benzophenone substituted with electron-withdrawing group, acetophenone substituted with electron-withdrawing group, benzaldehyde substituted with electron-withdrawing group, or anthraquinone.
상기 전자 구인성기가, 플루오로기, 클로로기, 브로모기, 요오드기, 니트로기, 시아노기, 및 트리플루오로메틸기로 이루어지는 군에서 선택되는 적어도 1 종인, 제조 방법.10. The method of claim 9,
Wherein the electron-attractive group is at least one selected from the group consisting of a fluoro group, a chloro group, a bromo group, an iodo group, a nitro group, a cyano group, and a trifluoromethyl group.
전자 구인성기의 수가 1 ∼ 5 인, 제조 방법.11. The method according to claim 9 or 10,
Wherein the number of electron-withdrawing groups is 1 to 5;
증감제의 사용량이, 무수 말레산 화합물에 대하여 0.1 ∼ 20 몰% 인, 제조 방법.The method according to any one of claims 8 to 11,
Wherein the amount of the sensitizer used is 0.1 to 20 mol% based on the maleic anhydride compound.
반응 온도가, 0 ∼ 20 ℃ 인, 제조 방법.13. The method according to any one of claims 1 to 12,
Wherein the reaction temperature is 0 to 20 占 폚.
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JPS58208322A (en) | 1982-05-31 | 1983-12-05 | Japan Synthetic Rubber Co Ltd | Polyimide compound |
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