KR20150080910A - Organic electronic device - Google Patents

Abstract

The present application relates to an organic electronic device and a use thereof. The present application provides the organic electronic device of a structure capable of preventing damage by minimizing stress which a glass substrate receives even though the organic electronic device applying the glass substrate is variously bent.

Description

[0001] ORGANIC ELECTRONIC DEVICE [0002]

The present application relates to organic electronic devices and uses thereof.

An organic electronic device (OED) is an apparatus including at least one organic layer, and examples thereof include an organic light emitting device (OLED), an organic solar cell, an organic photoconductor (OPC) . Various methods for flexibly manufacturing an organic electronic device have been proposed (for example, Patent Document 1). As a method for manufacturing a flexible organic electronic device, a device in which a so-called thin glass is applied as a substrate is known. Flexible organic electronic devices are highly likely to be mounted on a curved structure due to their characteristics, and thus it is required to minimize the stress applied to the glass substrate in the bending state to prevent breakage of the glass substrate.

Korean Patent Publication No. 2013-0042922

The present application provides organic electronic devices and uses thereof. The present application provides an organic electronic device having a structure capable of minimizing stress on the glass substrate and preventing its breakage even when the organic electronic device using the glass substrate is bended in various forms It is for one purpose.

The organic electronic device of the present application comprises a glass substrate; An element region formed on an upper portion of the glass substrate, and a lower region formed on a lower portion of the glass substrate. The device region may include a first electrode layer, an organic layer, and a second electrode layer sequentially formed on the glass substrate side.

The organic electronic device of the present application is formed such that its central axis is located on the glass substrate or, when the glass substrate is bent, the glass substrate can be located in a compressive stress region.

The term neutral axis in this application is an imaginary axis, which means the axis along which the compressive stress zone and the tension stress zone are divided, when bending the organic electronic device. The above contents will be described in detail with reference to Figs. 1 and 2. Fig. Generally, when the organic electronic device is bended, a stress due to a compressive force due to the bending occurs in a predetermined region of the organic electronic device, and a stress due to a tensile force due to the bending occurs in another region. Such a region is divided around the center axis which is a virtual axis formed according to the structure of the organic electronic device. For example, Figure 1 shows the areas that occur when a multilayer organic electronic device is bent in a convex shape, and Figure 2 shows the areas that occur when the organic electronic device is bent in a concave shape. As shown in FIG. 1, when the organic electronic device is bent in a convex shape, a tension is generated in the upper portion of the center axis, a compression is generated in the lower portion of the organic electronic device, A compression is generated at the upper portion of the center axis, and a tension is generated at the lower portion of the center axis.

The glass substrate is vulnerable to tension in comparison with the compression. Therefore, in order to minimize the stress applied to the glass substrate during bending to prevent breakage, the organic electronic device according to the present application is characterized in that the center axis is located on the glass substrate, or when the glass substrate is bent So as to be positioned in the compressive stress region.

The central axis is a virtual axis defined according to the layer structure of the organic electronic device as described above, and is located at a predetermined height with respect to the lower surface of the element region of the organic electronic device. In this case, the predetermined height may be z, which is obtained according to Equation (1) below.

[Equation 1]

In the Formula 1 to 4 z is the distance from the central axis in the lower surface of the element region of the organic electronic device, E _s is Young's modulus of the element region (Young? Modulus), E _b is the Young's modulus of the glass substrate, E _f is the Young's modulus of the lower region.

D _s is the thickness of the device region, d _b is the thickness of the glass substrate, d _f is the thickness of the lower region, and h is the thickness of the entire organic electronic device.

E _s , E _b and E _f in Eq. (1) can be obtained according to the following expressions (2) to (4).

[Equation 2]

[Equation 3]

[Equation 4]

In Equations 2 to 4, v _s is the poisson ratio of the device region, v _b is the Poisson's ratio of the glass substrate, and v _f is the Poisson's ratio of the lower region.

The Poisson's ratio in the above formula can mean the ratio between the transverse strain and the longitudinal strain when the material is stretched in the direction according to the action of the tensile force.

The Young's modulus and Poisson's ratio in the formulas 1 to 4 are inherent characteristics of the material, and the numerical values can be easily obtained when the kind of the material is determined. For example, the Young's modulus of glass is about 50 GPa to 90 GPa, the Young's modulus of steel is about 190 GPa to 220 GPa, the Young's modulus of PET (poly (ethylene terephthalate)) is about 2 GPa to 2.7 GPa, ) Is about 2.5 GPa, the Young's modulus of PP (polypropylene) is about 1.5 GPa to 2 GPa, and the Young's modulus of PS (polystyrene) is about 3 GPa to 3.5 GPa.

As can be seen from Equation (1), the position of the central axis is determined according to the Young's modulus of the material of each layer of the organic electronic device and the thickness of the layer, and accordingly, The position of the central axis can be adjusted so that the glass substrate is located in the glass substrate or, when the glass substrate is bent, the glass substrate is located in the compressive stress region.

Particularly, for the above structure, a lower region existing under the glass substrate is essential, and the thickness and material of the elements present in the region need to be adjusted.

In the case where the central axis exists in a region other than the inside of the glass substrate, the kind of the region is not particularly limited as long as the glass substrate can be present in the compressive stress region at the time of bending, Or may be located inside the lower region.

As can be seen in Figures 1 and 2, since the center axis is a region where both compressive and tensile forces are hardly generated at the time of bending, it may be advantageous for the central axis to be present inside the glass substrate.

Specifically, when the glass electronic device is bent in a convex shape as shown in Fig. 1, the central axis may be present inside the glass substrate, or may be required to be located in the device region, and even if it exists inside the glass substrate It may be required to be located close to the device region.

When the organic electronic device is bent in a concave shape as shown in Fig. 1, the central axis may be located inside the glass substrate or may be located in the lower region, and even if it exists inside the glass substrate It may be required to be located close to the lower region.

The convex shape and the concave shape in the above description refer to a shape in which the device region of the organic electronic device is assumed to be positioned above the lower region.

The manner of adjusting the position of the central axis as described above is not particularly limited. In general, the material to be used for the production of the organic electronic device is known, and the physical properties such as the Young's modulus of the material are known. Therefore, a material having a proper Young's modulus is selected in consideration of the position of the central axis of the organic electronic device, Adjustment of the position of the central axis may be possible by adjusting the thickness of the layer.

The kind of the glass substrate that can be used in the present application is not particularly limited. The present application may be used as any substrate as long as it is known in the art that it can be used in the implementation of flexible devices. For example, as the glass substrate, a substrate made of soda lime glass, barium / strontium-containing glass, lead glass, aluminosilicate glass, borosilicate glass, barium borosilicate glass or quartz can be used.

Considering the appropriate light extraction efficiency and the like, if necessary, the substrate may have a refractive index within the range of about 1.5 to 2.0, or about 1.5 to 1.9, or about 1.8. As used herein, the term refractive index is the refractive index measured for light at a wavelength of about 550 nm or about 633 nm. Glass substrates having various indices of refraction are known in the art, and appropriate types of these known substrates can be selected and used.

The thickness of the glass substrate is not particularly limited as long as it can bend, and for example, an appropriate thickness within a range of about 50 mu m to 200 mu m can be selected.

An element region exists on the top of the glass substrate. The device region may include at least a first electrode layer, an organic layer, and a second electrode layer that are sequentially stacked from the glass substrate side.

The first and second electrode layers may be conventional hole injecting or electron injecting electrode layers used in the fabrication of organic electronic devices.

The electrode layer capable of injecting holes can be formed using, for example, a material having a relatively high work function, and can be formed using a transparent material when necessary. For example, the hole-injecting electrode layer may comprise a metal, an alloy, an electrically conductive compound or a mixture of two or more thereof having a work function of about 4.0 eV or more. As such a material, metal such as gold, CuI, indium tin oxide (ITO), indium zinc oxide (IZO), zinc tin oxide (ZTO), zinc oxide doped with aluminum or indium, magnesium indium oxide, nickel tungsten oxide, Metal oxides such as ZnO, SnO ₂ or In ₂ O ₃ , metal serrides such as gallium nitride and zinc selenide, and metal sulfides such as zinc sulfide. The transparent positive hole injecting electrode layer can also be formed using a metal thin film of Au, Ag or Cu and a laminate of a transparent material of high refractive index such as ZnS, TiO ₂ or ITO.

The hole injecting electrode layer may be formed by any means such as vapor deposition, sputtering, chemical vapor deposition or electrochemical means. In addition, the electrode layer formed according to need may be patterned through a process using known photolithography, shadow mask, or the like.

The electron injecting transparent electrode layer can be formed using, for example, a transparent material having a relatively small work function. For example, a material suitable for forming the hole injecting electrode layer can be formed using a suitable material But is not limited thereto. The electron injecting electrode layer can also be formed using, for example, a vapor deposition method or a sputtering method, and can be appropriately patterned when necessary.

The thickness of the electrode layer may be formed to have a thickness of, for example, about 90 nm to 200 nm, 90 nm to 180 nm, or about 90 nm to 150 nm.

An organic layer is present on the first electrode layer. The term organic material layer in this application includes only an organic material or a layer containing at least about 55%, at least 60%, at least 65%, at least 70%, at least 75%, at least 80%, or at least 85% . ≪ / RTI > The organic layer may include at least a light emitting unit. For example, if the first electrode layer is transparent and the second electrode layer is a reflective electrode layer, the bottom emission type device in which light generated in the light emitting unit of the organic layer is emitted to the substrate side through the optical functional layer can be realized.

In one example, the organic electronic device may be an organic light emitting diode (OLED). In the case of the organic light emitting element, the element region may have a structure in which, for example, an organic material layer including at least a light emitting unit is interposed between the hole injection electrode layer and the electron injection electrode layer. For example, if the first electrode layer is a hole injection electrode layer, the second electrode layer is an electron injection electrode layer, and conversely, if the first electrode layer is an electron injection electrode layer, the second electrode layer may be a hole injecting electrode layer.

The organic material layer present between the electron and hole injecting electrode layers may include at least one light emitting unit. The organic material layer may include a plurality of light emitting units of two or more layers. When two or more light emitting units are included, the light emitting units may have a structure in which they are divided by an intermediate electrode layer having charge generating characteristics, a charge generating layer (CGL) or the like.

The light emitting unit can be formed, for example, using various fluorescent or phosphorescent organic materials known in the art. Fluorescent or phosphorescent organic materials having various luminescent center wavelengths are known in the art, and a suitable kind of such known materials can be selected to form the light emitting unit. Examples of materials for the light emitting unit include tris (4-methyl-8-quinolinolate) aluminum (III) (Alg3), 4-MAlq3 or Gaq3 (C ₂₆ H ₂₆ N ₂ O ₂ S), DSA-amine, TBSA, BTP, PAP-NPA, Spiro-FPA, Ph ₃ Si (PhTDAOXD), PPCP Cyclopenadiene derivatives such as 3,4,5-pentaphenyl-1,3-cyclopentadiene, DPVBi (4,4'-bis (2,2'-diphenylyinyl) -1,1'- biphenyl) Ribenzene or a derivative thereof or DCJTB (4- (Dicyanomethylene) -2-tert-butyl-6- (1,1,7,7, -tetramethyljulolidyl-9-enyl) -4H-pyran), DDP, AAAP, NPAMLI; Or Firpic, m-Firpic, N- Firpic, bon 2 Ir (acac), (C 6) 2 Ir (acac), bt 2 Ir (acac), dp 2 Ir (acac), bzq 2 Ir (acac), bo _{2 Ir (acac), F 2} Ir (bpy), F 2 Ir (acac), op 2 Ir (acac), ppy 2 Ir (acac), tpy 2 Ir (acac), FIrppy (fac-tris [2- ( ( ₂ , 4'-difluorophenyl) pyridine-C'2, N] iridium (III) or Btp ₂ Ir (acac) C3 ') iridium (acetylacetonate)), and the like, but the present invention is not limited thereto. The light emitting unit may include the above material as a host and may also include perylene, distyrylbiphenyl, DPT, quinacridone, rubrene, BTX, ABTX or DCJTB And a host-dopant system including the dopant as a dopant.

The light emitting unit may also be formed by appropriately employing a kind that exhibits light emission characteristics among electron-accepting organic compounds or electron-donating organic compounds described below.

The organic material layer may be formed in various structures, including various other functional layers known in the art, as long as the organic material layer includes a light emitting unit. Examples of the layer that can be included in the organic material layer include an electron injecting layer, a hole blocking layer, an electron transporting layer, a hole transporting layer, and a hole injecting layer.

The electron injection layer or the electron transport layer can be formed using, for example, an electron accepting organic compound. As the electron-accepting organic compound in the above, any known compound can be used without any particular limitation. Examples of such organic compounds include polycyclic compounds or derivatives thereof such as p-terphenyl or quaterphenyl, naphthalene, tetracene, pyrene, coronene, ), Polycyclic hydrocarbon compounds or derivatives thereof such as chrysene, anthracene, diphenylanthracene, naphthacene or phenanthrene, phenanthroline, Heterocyclic compounds or derivatives thereof such as bathophenanthroline, phenanthridine, acridine, quinoline, quinoxaline, or phenazine may be exemplified. It is also possible to use at least one of fluoroceine, perylene, phthaloperylene, naphthaloperylene, perynone, phthaloferrinone, naphthoferrinone, diphenylbutadiene ( diphenylbutadiene, tetraphenylbutadiene, oxadiazole, aldazine, bisbenzoxazoline, bisstyryl, pyrazine, cyclopentadiene, and the like. Oxine, aminoquinoline, imine, diphenylethylene, vinyl anthracene, diaminocarbazole, pyrane, thiopyrane, polymethine, Quinacridone or rubrene or derivatives thereof, Japanese Patent Application Laid-Open No. 1988-295695, Japanese Patent Application Laid-Open No. 1996-22557, Japanese Patent Application Laid-Open No. 1996-81472, Japanese Patent Application Laid-Open No. 1993-009470 or Japanese Patent Application Laid- For example, tris (8-quinolinolato) aluminum, a metal chelated oxanoid compound, bis (8-quinolinolato) aluminum, Bis (benzo (f) -8-quinolinolato] zinc}, bis (2-methyl-8-quinolinolato) aluminum, Tris (8-quinolinolato) indium], tris (5-methyl-8-quinolinolato) aluminum, 8- quinolinolato lithium, tris (5- Quinolinolato) gallium, bis (5-chloro-8-quinolinolato) calcium and the like, metal complexes having at least one of 8-quinolinolato or a derivative thereof as an arbiter, Japanese Patent Laid- Oxadiazole compounds disclosed in Japanese Patent Application Laid-Open Nos. 1995-179394, 1995-278124, and 1995-228579, Stilbene derivatives, distyrylarylene derivatives, and the like disclosed in Japanese Patent Application Laid-Open (kokai) No. 1994-132080 Styryl derivatives disclosed in JP-A-1994-88072 and the like, diolefin derivatives disclosed in JP-A-1994-100857 and JP-A-1994-207170, and the like; Fluorescent brightening agents such as benzooxazole compounds, benzothiazole compounds or benzoimidazole compounds; Bis (4-methylstyryl) benzene, distyrylbenzene, 1,4-bis (2-methylstyryl) benzene, Bis (2-methylstyryl) benzene, 1,4-bis (3-ethylstyryl) benzene, Methylstyryl) -2-ethylbenzene, and the like; Bis (4-methylstyryl) pyrazine, 2,5-bis (4-methylstyryl) pyrazine, 2,5- Bis [2- (4-biphenyl) vinyl] pyrazine such as bis (4-methoxystyryl) pyrazine, 2,5-bis [2- Distyrylpyrazine compounds, 1,4-phenylenedimethylidene, 4,4'-phenylenedimethylidyne, 2,5-xylenedimethylidyne, 2,6-naphthylenedimethylidyne, 1,4-biphenylene dimethyl (9,10-anthracenediyldimethylidine) or 4,4 '- (2,2-di-t-butylphenylvinyl) biphenyl , Dimethylidine compounds such as 4,4 '- (2,2-diphenylvinyl) biphenyl and derivatives thereof, silane disclosed in Japanese Patent Application Laid-Open No. 1994-49079 or Japanese Patent Application Laid-Open No. 1994-293778 Silanamine derivatives, Japanese Patent Application Laid-Open No. 1994-279322 or Japanese Patent Laid-Open Publication No. 1994-279323 Oxadiazole derivatives disclosed in Japanese Patent Laid-Open Publication No. 1994-109264, Japanese Patent Laid-Open Publication No. 1994-206865 and the like, an anthracene compound disclosed in Japanese Patent Oxynate derivatives disclosed in JP-A-1994-145146 and the like, tetraphenylbutadiene compounds disclosed in JP-A-1992-96990 and the like, organic trifunctional compounds disclosed in JP-A-1991-296595, Coumarin derivatives disclosed in JP-A-1990-191694 and the like, perylene derivatives disclosed in JP-A-1990-196885 and the like, naphthalene derivatives disclosed in JP-A-1990-255789, Phthaloperynone derivatives disclosed in JP-A No. 1990-289676 or JP-A No. 1990-88689 or a derivative of phthaloperynone derivatives disclosed in JP-A No. 1990-25029 Styrylamine derivatives disclosed in, for example, Japanese Patent Laid-open Publication No. 2 (1990) can also be used as electron-accepting organic compounds contained in the low refractive layer. In addition, the electron injection layer may be formed using a material such as LiF or CsF.

The hole blocking layer is a layer capable of preventing the injected holes from entering the electron injecting electrode layer through the light emitting unit to improve the lifetime and efficiency of the device. If necessary, the hole blocking layer can be formed by using a known material, It can be formed at an appropriate portion between the entering electrode layers.

The hole injecting layer or the hole transporting layer may include, for example, an electron donating organic compound. Examples of the electron donating organic compound include N, N ', N'-tetraphenyl-4,4'-diaminophenyl, N, N'- N, N ', N'-tetra-p-tolyl-4,4'-diaminobiphenyl, Phenyl, N, N'-di (4-methoxyphenyl) -4,4'-diaminobiphenyl, N, N'- (N, N ', N'-tetraphenyl-4,4'-diaminodiphenyl ether, 4,4'-bis (diphenylamino) quadriphenyl] 4-N, N-diphenylaminostilbene, N-phenylcarbazole, 1,1-bis (4-methoxy- Bis (4-dimethylamino-2-methylphenyl) phenylmethanesulfonate, 1,1-bis (4-di- N, N, N-tri (p-tolyl) amine, 4- (di-p- tolylamino) -4 ' N ', N'-tetraphenyl-4,4'-diaminobis N-phenylcarbazole, 4,4'-bis [N- (1-naphthyl) -N-phenylamino] biphenyl, Phenylamino] biphenyl, 4,4'-bis [N- (3-acenaphthenyl) -N (2-naphthyl) Phenylamino] biphenyl, 1,5-bis [N- (1-naphthyl) -N-phenylamino] naphthalene, 4,4'- Bis [N- (2-phenanthryl) -biphenylphenylamino] biphenyl, 4,4'-bis [N- N-phenylamino] biphenyl, 4,4'-bis [N- (2-pyrenyl) - N-phenylamino] biphenyl, 4,4'-bis [N- (1-choronenyl) - N-phenylamino] biphenyl), 2,6-bis (di-p-tolylamino) naphthalene, 2,6-bis (1-naphthyl) amino] naphthalene, 2,6-bis [N- (1-naphthyl) Bis [N, N-di (2-naphthyl) amino] terphenyl, 4,4'-bis { Bis [N, N-di- (2-naphthyl) amino] fluorene or 4,4'-bis (N, N-di-p-tolylamino) terphenyl and bis (N-1-naphthyl) (N-2-naphthyl) amine and the like are exemplified. It is not.

The hole injecting layer or the hole transporting layer may be formed by dispersing an organic compound in a polymer or by using a polymer derived from the organic compound. Also, π conjugated polymers such as polyparaphenylenevinylene and derivatives thereof, σ conjugated polymers of hole-transporting non-conjugated polymers such as poly (N-vinylcarbazole) or polysilane may be used.

The hole injection layer may be formed by using a metal phthalocyanine such as copper phthalocyanine, a nonmetal phthalocyanine, a carbon film and an electrically conductive polymer such as polyaniline, or by reacting the arylamine compound with an Lewis acid using the arylamine compound as an oxidizing agent You may.

Illustratively, the organic light emitting device includes (1) a hole injection electrode layer / organic light emitting unit / electron injection electrode layer in the form of a sequentially formed one; (2) a form of a hole injection electrode layer / a hole injection layer / an organic light emitting unit / an electron injection electrode layer; (3) a form of a hole injection electrode layer / an organic light emitting unit / an electron injection layer / an electron injection electrode layer; (4) a form of a hole injection electrode layer / a hole injection layer / an organic light emitting unit / an electron injection layer / an electron injection electrode layer; (5) a form of a hole injection electrode layer / organic semiconductor layer / organic light emitting unit / electron injection electrode layer; (6) a form of a hole injection electrode layer / an organic semiconductor layer / an electron barrier layer / an organic light emitting unit / an electron injection electrode layer; (7) Forms of hole injecting electrode layer / organic semiconductor layer / organic light emitting unit / adhesion improving layer / electron injecting electrode layer; (8) Forms of hole injecting electrode layer / hole injecting layer / hole transporting layer / organic light emitting unit / electron injecting layer / electron injecting electrode layer; (9) Forms of hole injection electrode layer / insulating layer / organic light emitting unit / insulating layer / electron injecting electrode layer; (10) the form of the hole injection electrode layer / the inorganic semiconductor layer / the insulating layer / the organic light emitting unit / the insulating layer / the electron injecting electrode layer; (11) Forms of hole injecting electrode layer / organic semiconductor layer / insulating layer / organic light emitting unit / insulating layer / electron injecting electrode layer; (12) Form of hole injection electrode layer / Insulating layer / Hole injection layer / Hole transport layer / Organic light emitting unit / Insulating layer / Electron injection electrode layer or (13) Hole injection electrode layer / Insulating layer / Hole injection layer / Hole transport layer / / Electron injection layer / electron injection electrode layer. In some cases, at least two light emitting units may be disposed between the hole injection electrode layer and the electron injection electrode layer, such as an intermediate electrode layer or a charge generation layer (CGL) But it is not limited to this.

In this field, various materials for forming a hole or electron injection electrode layer and an organic material layer, for example, a light emitting unit, an electron injection or transport layer, a hole injection or transport layer, and a forming method thereof are known. May be applied.

In addition to the above configuration, the element region may further include another configuration when necessary. Other configurations that may be included in the device region include a light scattering layer to improve light extraction efficiency, a barrier layer to protect organic material from external elements, a protective layer to seal the organic electronic device, or a flexible circuit substrate FPCB), and the like, but the present invention is not limited thereto.

In order to form a central axis at a proper position, the device region can be adjusted to have a thickness within a range of about 50 mu m to 200 mu m.

In the organic electronic device, a lower region exists on the lower surface of the glass substrate, that is, the surface opposite to the surface on which the device region is formed. This sub-region must be present to adjust the position of the central axis. As the element that can come into the lower region, a known light extracting film, a barrier film, a protective film, a pressure-sensitive adhesive layer or an adhesive layer can be exemplified. For example, in order to improve the light extraction efficiency of the organic electronic device, a light extracting film having a haze of a predetermined range or having a lens shape is attached to the lower part of the glass substrate through a pressure sensitive adhesive layer or an adhesive layer, A reinforcing film or the like may be attached to the lower portion of the glass substrate through a pressure-sensitive adhesive layer or an adhesive layer, all of which can form the lower region.

In order to form a central axis at a proper position, the lower region may be adjusted within a range of about 50 mu m to 300 mu m in thickness.

The present application also relates to the use of the above-described organic electronic devices, for example, organic light emitting devices. The organic light emitting device may be a backlight of a liquid crystal display (LCD), an illumination device, a light source such as various sensors, a printer, a copying machine, a vehicle instrument light source, a traffic light, a display, A light source, a display, a decoration, or various lights. In one example, the present application relates to a lighting device comprising the organic light-emitting device. In the case where the organic light emitting device is applied to the illumination device or other use, the other components constituting the device or the like and the constitution method of the device are not particularly limited. As long as the organic light emitting device is used, Any of the materials or methods may be employed.

In this application, it is possible to provide an organic electronic device having a structure capable of minimizing stress on the glass substrate and preventing its breakage even when the organic electronic device using the glass substrate is bended in various forms have.

Figs. 1 and 2 are schematic diagrams for explaining the stress acting on the center axis of the organic electronic device and the center axis thereof when bending.

Hereinafter, the present application will be described in more detail by way of examples according to the present application and comparative examples not complying with the present application, but the scope of the present application is not limited by the following examples.

Example  One.

An organic electronic device was prepared in the following manner. An indium tin oxide (ITO) layer, which is a hole injecting electrode layer, is formed on a thin glass substrate having a thickness of about 100 mu m by a sputtering method and NPB (N, N'-Bis (naphthalen- -N, N'-bis (phenyl) benzidine), a first light emitting unit having an emission wavelength in a range of about 380 to 500 nm, an electron transporting layer, an n-type semiconductor layer, an NPB layer, A hole-transporting layer containing a second light-emitting unit, BAlq (bis (2-methyl-8-quinolinolato-N1, C6) - (1,1'-biphenyl-4-olato) aluminum) , An electron transporting layer, an electron injection layer made of LiF, and an aluminum (Al) reflective electrode layer were sequentially formed. Thereafter, a metal film was attached and sealed on the reflective electrode layer using an adhesive, and a flexible circuit board (FPCB) was attached to form an equal potential. Then, a light extracting film having a thickness of about 60 탆 was attached to a surface of the glass substrate opposite to the surface on which the ITO layer was formed, with an adhesive layer having a thickness of about 25 탆 and the center axis thereof was present inside the glass substrate. The device was configured.

Comparative Example  One.

An organic electronic device was constructed in the same manner as in Example 1, except that the light extracting film and the pressure-sensitive adhesive layer were not formed on the side of the glass substrate opposite to the side where the ITO layer was formed.

The results of the bending tests performed on the organic electronic devices of Example 1 and Comparative Example 1 are summarized in Table 1 below.

Bendable radius Example 1 20 mm Comparative Example 1 50 mm

In Table 1, the bendable radius indicates the degree of curvature of the organic electronic device when the organic electronic device is bent, and the smaller the value, the more bendable the bendable radius.

Claims (12)

A glass substrate; An element region including a first electrode layer, an organic material layer and a second electrode layer sequentially formed on the glass substrate; And a lower region formed at a lower portion of the glass substrate, wherein a center axis is located inside the glass substrate, or a central axis is formed so that the glass substrate can be positioned in a compressive stress region at the time of bending Electronic device. The organic electronic device according to claim 1, wherein the central axis is formed so as to be located inside the glass substrate or inside the element region. The organic electronic device according to claim 1, wherein the central axis is formed so as to be located inside or below the glass substrate. The organic electronic device according to claim 1, wherein the organic electronic device is bent so as to have a convex shape, and the central axis is positioned in the interior of the glass substrate or the device region. The organic electronic device according to claim 1, wherein the organic electronic device is bent in a concave shape, and the central axis is positioned in an inner or lower region of the glass substrate. The organic electronic device according to claim 1, wherein the glass substrate has a thickness in a range of 50 mu m to 200 mu m. The organic electronic device according to claim 1, wherein the organic layer includes a light emitting unit. 2. The organic electronic device according to claim 1, wherein the device region has a thickness in a range of 50 to 200 mu m. The organic electronic device according to claim 1, wherein the lower region comprises a light extracting film, a barrier film, a protective film, a pressure-sensitive adhesive layer or an adhesive layer. The organic electronic device according to claim 1, wherein the lower region is in a thickness of 50 mu m to 300 mu m. A light source for a display comprising the organic electronic device of claim 1. A lighting fixture comprising the organic electronic device of claim 1.

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