KR20150080451A - Paint and near infrared absorption filter - Google Patents
Paint and near infrared absorption filter Download PDFInfo
- Publication number
- KR20150080451A KR20150080451A KR1020147035974A KR20147035974A KR20150080451A KR 20150080451 A KR20150080451 A KR 20150080451A KR 1020147035974 A KR1020147035974 A KR 1020147035974A KR 20147035974 A KR20147035974 A KR 20147035974A KR 20150080451 A KR20150080451 A KR 20150080451A
- Authority
- KR
- South Korea
- Prior art keywords
- meth
- acrylate
- solvent
- acid
- infrared absorbing
- Prior art date
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- 239000003973 paint Substances 0.000 title claims abstract description 15
- 238000010521 absorption reaction Methods 0.000 title description 16
- 239000002904 solvent Substances 0.000 claims abstract description 29
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 claims abstract description 26
- 150000001875 compounds Chemical class 0.000 claims abstract description 25
- 229920005989 resin Polymers 0.000 claims abstract description 22
- 239000011347 resin Substances 0.000 claims abstract description 22
- 125000001424 substituent group Chemical group 0.000 claims abstract description 11
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims abstract description 8
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 7
- 150000001450 anions Chemical class 0.000 claims abstract description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 6
- 125000003277 amino group Chemical group 0.000 claims abstract description 4
- 125000005843 halogen group Chemical group 0.000 claims abstract description 4
- 238000000034 method Methods 0.000 claims description 9
- 125000004432 carbon atom Chemical group C* 0.000 claims description 5
- 230000007935 neutral effect Effects 0.000 claims description 2
- 230000000717 retained effect Effects 0.000 claims description 2
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 abstract 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 abstract 1
- -1 cyanine compound Chemical class 0.000 description 54
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 37
- 238000000576 coating method Methods 0.000 description 22
- 239000000463 material Substances 0.000 description 21
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- 230000000052 comparative effect Effects 0.000 description 10
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- 239000002253 acid Substances 0.000 description 8
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- 230000003287 optical effect Effects 0.000 description 7
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- 239000003431 cross linking reagent Substances 0.000 description 5
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- 239000002184 metal Substances 0.000 description 5
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- 238000002835 absorbance Methods 0.000 description 4
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- 229910010272 inorganic material Inorganic materials 0.000 description 4
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- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 3
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- 239000003999 initiator Substances 0.000 description 3
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- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- XMGQYMWWDOXHJM-JTQLQIEISA-N (+)-α-limonene Chemical compound CC(=C)[C@@H]1CCC(C)=CC1 XMGQYMWWDOXHJM-JTQLQIEISA-N 0.000 description 2
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- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 2
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- SYBYTAAJFKOIEJ-UHFFFAOYSA-N 3-Methylbutan-2-one Chemical compound CC(C)C(C)=O SYBYTAAJFKOIEJ-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical class CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
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- VVJKKWFAADXIJK-UHFFFAOYSA-N Allylamine Chemical compound NCC=C VVJKKWFAADXIJK-UHFFFAOYSA-N 0.000 description 2
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- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
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- HNEGQIOMVPPMNR-UHFFFAOYSA-N methylfumaric acid Natural products OC(=O)C(C)=CC(O)=O HNEGQIOMVPPMNR-UHFFFAOYSA-N 0.000 description 1
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- 229920001778 nylon Polymers 0.000 description 1
- UHGIMQLJWRAPLT-UHFFFAOYSA-N octadecyl dihydrogen phosphate Chemical compound CCCCCCCCCCCCCCCCCCOP(O)(O)=O UHGIMQLJWRAPLT-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000033116 oxidation-reduction process Effects 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- HVAMZGADVCBITI-UHFFFAOYSA-N pent-4-enoic acid Chemical compound OC(=O)CCC=C HVAMZGADVCBITI-UHFFFAOYSA-N 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Chemical compound [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- CMPQUABWPXYYSH-UHFFFAOYSA-N phenyl phosphate Chemical compound OP(O)(=O)OC1=CC=CC=C1 CMPQUABWPXYYSH-UHFFFAOYSA-N 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N phosphonic acid group Chemical group P(O)(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
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- 239000003504 photosensitizing agent Substances 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
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- 238000009832 plasma treatment Methods 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
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- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920001610 polycaprolactone Polymers 0.000 description 1
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- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
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- 229920001721 polyimide Polymers 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
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- 239000003505 polymerization initiator Substances 0.000 description 1
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- 229920000098 polyolefin Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 description 1
- 229910001950 potassium oxide Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
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- 125000006238 prop-1-en-1-yl group Chemical group [H]\C(*)=C(/[H])C([H])([H])[H] 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
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- 230000001681 protective effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
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- FZHCFNGSGGGXEH-UHFFFAOYSA-N ruthenocene Chemical compound [Ru+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 FZHCFNGSGGGXEH-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
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- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
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- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- 125000001889 triflyl group Chemical group FC(F)(F)S(*)(=O)=O 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/32—Radiation-absorbing paints
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B53/00—Quinone imides
- C09B53/02—Indamines; Indophenols
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D201/00—Coating compositions based on unspecified macromolecular compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/20—Diluents or solvents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/41—Organic pigments; Organic dyes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/29—Compounds containing one or more carbon-to-nitrogen double bonds
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Optical Filters (AREA)
- Paints Or Removers (AREA)
Abstract
적외선 흡수 색소(A), 수지(B) 및 용매(C)를 함유하고, 용매(C)성분으로서 디아세톤알코올을 필수성분으로 하는 도료, 및 상기 도료를 사용하여 형성되는 근적외선 흡수 필터. 적외선 흡수 색소(A)는 디임모늄 화합물, 특히 하기 일반식(I)로 표시되는 디임모늄 화합물인 것이 바람직하다.
(식 중, R11, R12, R13, R14, R15, R16, R17 및 R18은 수소원자 또는 치환기를 가져도 되는 C1~10의 알킬기를 나타내고, R19, R20, R21 및 R22는 수소원자, 할로겐원자, 치환기를 가져도 되는 C1~10의 알킬기 또는 치환기를 가져도 되는 아미노기를 나타내고, 상기 알킬기 중의 메틸렌기는 -O- 또는 -CH=CH-로 치환되어 있어도 되고, t는 1~4의 수를 나타내고, Anq -는 q가의 음이온을 나타낸다.) A near infrared ray absorbing filter formed by using a paint comprising an infrared absorbing dye (A), a resin (B) and a solvent (C) and containing diacetone alcohol as an essential component as a solvent (C) component. The infrared absorbing dye (A) is preferably a diimmonium compound, particularly a diimmonium compound represented by the following general formula (I).
(Wherein, R 11, R 12, R 13, R 14, R 15, R 16, R 17 and R 18 represents an alkyl group of C1 ~ 10 which may have a hydrogen atom or a substituent, R 19, R 20, R 21 and R 22 represent a hydrogen atom, a halogen atom, a C1-10 alkyl group which may have a substituent or an amino group which may have a substituent, and the methylene group in the alkyl group may be substituted with -O- or -CH = CH- , T represents a number of 1 to 4, and An q - represents an anion of q.
Description
본 발명은 적외선 흡수 색소, 수지 및 용매로서 디아세톤알코올을 함유하는 도료 및 상기 도료를 사용하여 형성되는 근적외선 흡수 필터에 관한 것이다. The present invention relates to an infrared absorbing dye, a resin, a paint containing diacetone alcohol as a solvent, and a near infrared absorbing filter formed using the paint.
근적외선 흡수 필터는 가시광선 영역의 투과율이 높아서 적외선을 효율적으로 차단할 수 있는 것으로, 플라즈마 디스플레이 패널, CRT, 형광표시관, 전계방사형 디스플레이 등의 디스플레이 패널; 카메라, 비디오카메라 등의 광학기기의 수광(受光)소자나 촬상소자에 사용되고 있는 포토 다이오드나 CCD, C-MOS; 광학 렌즈, 자동차용 유리, 건재(建材)용 유리, 태양전지 모듈 등의 열선 차단 필터; 비디오카메라 등의 광학기기의 수광소자나 촬상소자 등에 사용되고 있다. The near-infrared absorption filter has a high transmittance in the visible light region and can effectively block infrared rays. The near-infrared absorption filter can be applied to a display panel such as a plasma display panel, a CRT, a fluorescent display tube, A photodiode, a CCD, a C-MOS, etc. used in a light receiving element or an image pickup element of an optical apparatus such as a camera or a video camera; An optical lens, an automobile glass, a building material glass, a solar cell module, and the like; A light receiving element of an optical apparatus such as a video camera, an image pickup element, and the like.
특허문헌 1에는 용제로서 디아세톤알코올을 포함하는 포지티브형 감광성 수지조성물이 개시되어 있고, 특허문헌 2에는 착색제 및 용제를 포함하는 착색제 함유 경화성 조성물이 개시되어 있고, 용제로서 디아세톤알코올이 예시되어 있다. 특허문헌 3에는 용제로서 디아세톤알코올을 함유하는 포지티브형 감광성 수지조성물이 개시되어 있고, 특허문헌 4에는 산성염료와 알코올계 유기용제를 함유하는 잉크가 개시되어 있고, 특허문헌 5에는 디임모늄 화합물을 사용하여 얻어지는 근적외선 흡수 필터가 개시되어 있다.Patent Document 1 discloses a positive photosensitive resin composition containing a diacetone alcohol as a solvent. Patent Document 2 discloses a colorant-containing curable composition containing a colorant and a solvent, and diacetone alcohol is exemplified as a solvent . Patent Document 3 discloses a positive photosensitive resin composition containing diacetone alcohol as a solvent. Patent Document 4 discloses an ink containing an acidic dye and an alcohol-based organic solvent. Patent Document 5 discloses a diimonium compound A near infrared ray absorption filter is obtained.
그러나 상기 특허문헌 1~5에는, 용매로서 디아세톤알코올을 사용함으로써, 도료를 기판에 도포하여 얻어지는 필름의 내광성이 향상되는 것은 기재도 시사도 되어 있지 않다.However, the above Patent Documents 1 to 5 do not suggest that the light resistance of a film obtained by applying a paint to a substrate is improved by using diacetone alcohol as a solvent.
따라서, 본 발명의 목적은 내광성이 높은 근적외선 흡수 필터를 제공하는 것에 있다. Accordingly, an object of the present invention is to provide a near infrared absorbing filter having high light resistance.
본 발명자는 예의 검토를 거듭한 결과, 적외선 흡수 색소(A), 수지(B) 및 용매(C)를 함유하고, 용매(C)성분으로서 디아세톤알코올을 필수성분으로 하는 도료를 사용하여 형성되는 근적외선 흡수 필터가 내광성이 높은 것을 지견하여 본 발명에 도달했다. As a result of intensive studies, the inventors of the present invention have found that when a coating composition containing an infrared absorbing dye (A), a resin (B) and a solvent (C) and containing a diacetone alcohol as an essential component The near infrared absorption filter has a high light resistance.
본 발명은 적외선 흡수 색소(A), 수지(B) 및 용매(C)를 함유하고, 용매(C)성분으로서 디아세톤알코올을 필수성분으로 하는 도료를 제공하는 것이다. The present invention provides a coating material containing an infrared absorbing dye (A), a resin (B) and a solvent (C) and containing diacetone alcohol as an essential component as a solvent (C) component.
또, 본 발명은 상기 도료를 사용하여 형성되는 근적외선 흡수 필터를 제공하는 것이다.Further, the present invention provides a near infrared absorption filter formed using the above paint.
본 발명의 근적외선 흡수 필터는 내광성이 높은 점에서 뛰어난 것이다. The near-infrared absorption filter of the present invention is excellent in high light resistance.
이하, 본 발명의 도료 및 근적외선 흡수 필터에 대해서 바람직한 실시형태에 기초하여 설명한다. Hereinafter, the paint and the near infrared ray absorbing filter of the present invention will be described based on preferred embodiments.
본 발명의 도료에 있어서, 적외선 흡수 색소(A)로는 적외 영역에 특성 흡수를 가지고 종래 (근)적외선 흡수 색소로서 사용되고 있는 것을 사용할 수 있고, 예를 들면, 종래, 시아닌 화합물, 스쿠아릴륨 화합물, 포르피린 화합물, 금속 디티올 착체, 크롬, 코발트 금속착염 화합물, 안트라퀴논류, 프탈로시아닌 화합물, 나프탈로시아닌 화합물, 디임모늄 화합물, 무기산화물 입자 등을 들 수 있고, 그 중에서도 디임모늄 화합물이 적외선의 흡수능이 높아서 가시광 영역에서의 투명성이 높기 때문에 바람직하다. In the coating material of the present invention, the infrared absorbing dye (A) may be one which has been used as a conventional (near) infrared absorbing dye with a characteristic absorption in the infrared region. For example, a cyanine compound, a squarylium compound, There may be mentioned a porphyrin compound, a metal dithiol complex, chromium, a cobalt metal complex salt compound, an anthraquinone, a phthalocyanine compound, a naphthalocyanine compound, a diimmonium compound and an inorganic oxide particle. Among them, Is high and thus transparency in the visible light region is high.
상기 디임모늄 화합물 중에서도, 하기 일반식(I)로 표시되는 것이 내습열성이 뛰어나기 때문에 더욱 바람직하다. Among the above diimmonium compounds, those represented by the following general formula (I) are more preferred because they are excellent in moisture resistance and heat resistance.
(식 중, R11, R12, R13, R14, R15, R16, R17 및 R18은 각각 독립적으로, 수소원자 또는 치환기를 가져도 되는 탄소원자수 1~10의 알킬기를 나타내고, R19, R20, R21 및 R22는 각각 독립적으로, 수소원자, 할로겐원자, 치환기를 가져도 되는 탄소원자수 1~10의 알킬기 또는 치환기를 가져도 되는 아미노기를 나타내고, 상기 알킬기 중의 메틸렌기는 -O- 또는 -CH=CH-로 치환되어 있어도 되고, t는 1~4의 수를 나타내고, Anq -는 q가의 음이온을 나타내고, q는 1 또는 2를 나타내고, p는 전하를 중성으로 유지하는 계수를 나타낸다.) (Wherein R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 and R 18 each independently represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms which may have a substituent, R 19 , R 20 , R 21 and R 22 each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 10 carbon atoms which may have a substituent or an amino group which may have a substituent, O- or -CH = CH-, t represents a number of 1 to 4, An q - represents an anion of q, q represents 1 or 2, p represents a charge retained in a neutral state Coefficient.)
상기 일반식(I) 중, R11, R12, R13, R14, R15, R16, R17, R18, R19, R20, R21 및 R22로 나타내는 치환기를 가져도 되는 탄소원자수 1~10의 알킬기로는 메틸, 에틸, 프로필, 이소프로필, 부틸, 제2부틸, 제3부틸, 이소부틸, 아밀, 이소아밀, 제3아밀, 헥실, 시클로헥실, 시클로헥실메틸, 시클로헥실에틸, 헵틸, 이소헵틸, 제3헵틸, n-옥틸, 이소옥틸, 제3옥틸, 2-에틸헥실, 트리플루오르메틸, 트리클로로메틸, 트리브로모메틸, 1,2-디클로로에틸, 3,3,3-트리플루오르프로필, 프로프-1-엔-1-일 등을 들 수 있고, The substituent represented by R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 , R 18 , R 19 , R 20 , R 21 and R 22 in the general formula (I) Examples of the alkyl group having 1 to 10 carbon atoms include methyl, ethyl, propyl, isopropyl, butyl, sec. Butyl, tert.butyl, isobutyl, amyl, isoamyl, tertiary amyl, hexyl, cyclohexyl, cyclohexylmethyl, 3-heptyl, heptyl, isoheptyl, heptyl, n-octyl, isooctyl, tert-octyl, 3,3-trifluoropropyl, prop-1-en-1-yl and the like,
R19, R20, R21 및 R22로 나타내는 할로겐원자로는 플루오르원자, 염소원자, 브롬원자, 요오드원자 등을 들 수 있고, Examples of the halogen atom represented by R 19 , R 20 , R 21 and R 22 include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom,
R19, R20, R21 및 R22로 나타내는 치환기를 가져도 되는 아미노기로는 아미노, 에틸아미노, 디메틸아미노, 디에틸아미노, 부틸아미노, 시클로펜틸아미노, 2-에틸헥실아미노, 도데실아미노, 아닐리노, 클로로페닐아미노, 톨루이디노(toluidino), 아니시디노(anisidino), N-메틸-아닐리노, 디페닐아미노, 나프틸아미노, 2-피리딜아미노, 메톡시카르보닐아미노, 페녹시카르보닐아미노, 아세틸아미노, 벤조일아미노, 포르밀아미노, 피발로일아미노, 라우로일아미노, 카르바모일아미노, N,N-디메틸아미노카르보닐아미노, N,N-디에틸아미노카르보닐아미노, 모르폴리노카르보닐아미노, 메톡시카르보닐아미노, 에톡시카르보닐아미노, t-부톡시카르보닐아미노, n-옥타데실옥시카르보닐아미노, N-메틸-메톡시카르보닐아미노, 페녹시카르보닐아미노, 술파모일(sulfamoyl)아미노, N,N-디메틸아미노술포닐아미노, 메틸술포닐아미노, 부틸술포닐아미노, 페닐술포닐아미노 등을 들 수 있다. Examples of the amino group which may have a substituent represented by R 19 , R 20 , R 21 and R 22 include amino, ethylamino, dimethylamino, diethylamino, butylamino, cyclopentylamino, 2-ethylhexylamino, Anilino, chlorophenylamino, toluidino, anisidino, N-methyl-anilino, diphenylamino, naphthylamino, 2-pyridylamino, methoxycarbonylamino, phenoxycarbo N, N-diethylaminocarbonylamino, N, N-diethylaminocarbonylamino, morpholino, morpholino, morpholino, morpholino, morpholino, morpholino, Methoxycarbonylamino, ethoxycarbonylamino, t-butoxycarbonylamino, n-octadecyloxycarbonylamino, N-methyl-methoxycarbonylamino, phenoxycarbonyl Amino, sulfamoyl ami , There may be mentioned N, N- dimethylamino-sulfonyl, such as amino, methyl-sulfonyl-amino, amino-butylsulfonyl, phenylsulfonyl amino.
상기 일반식(I) 중의 pAnq -로 나타내는 q가의 음이온으로는 메탄술폰산 음이온, 도데실술폰산 음이온, 벤젠술폰산 음이온, 톨루엔술폰산 음이온, 트리플루오르메탄술폰산 음이온, 나프탈렌술폰산 음이온, 디페닐아민-4-술폰산 음이온, 2-아미노-4-메틸-5-클로로벤젠술폰산 음이온, 2-아미노-5-니트로벤젠술폰산 음이온, 일본국 공개특허공보 평10-235999호, 일본국 공개특허공보 평10-337959호, 일본국 공개특허공보 평11-102088호, 일본국 공개특허공보 2000-108510호, 일본국 공개특허공보 2000-168223호, 일본국 공개특허공보 2001-209969호, 일본국 공개특허공보 2001-322354호, 일본국 공개특허공보 2006-248180호, 일본국 공개특허공보 2006-297907호, 일본국 공개특허공보 평8-253705호, 일본국 공표특허공보 2004-503379호, 일본국 공개특허공보 2005-336150호, 국제공개공보 2006/28006호 등에 기재된 술폰산 음이온 등의 유기 술폰산 음이온 이외에, 염화물 이온, 브롬화물 이온, 요오드화물 이온, 플루오르화물 이온, 염소산 이온, 티오시안산 이온, 과염소산 이온, 헥사플루오르인산 이온, 헥사플루오르안티몬산 이온, 테트라플루오르붕산 이온, 옥틸인산 이온, 도데실인산 이온, 옥타데실인산 이온, 페닐인산 이온, 노닐페닐인산 이온, 2,2'-메틸렌비스(4,6-디-t-부틸페닐)포스폰산 이온, 테트라키스(펜타플루오르페닐)붕산 이온, 여기(勵起)상태에 있는 활성분자를 탈여기시키는(퀀칭(quenching)시키는) 기능을 가지는 퀀쳐(quencher) 음이온이나 시클로펜타디에닐환에 카르복실기나 포스폰산기, 술폰산기 등의 음이온성기를 가지는 페로센, 루테노센 등의 메탈로센 화합물 음이온 등을 들 수 있다. Examples of the anion of q-valence represented by pAn q - in the general formula (I) include a methanesulfonate anion, a dodecylsulfonate anion, a benzenesulfonate anion, a toluenesulfonate anion, a trifluoromethanesulfonate anion, a naphthalenesulfonate anion, Amino-4-methyl-5-chlorobenzenesulfonic acid anion, 2-amino-5-nitrobenzenesulfonic acid anion, JP-A-10-235999, JP-A-10-337959 Japanese Unexamined Patent Application Publication No. 11-102088, Japanese Unexamined Patent Application Publication No. 2000-108510, Japanese Unexamined Patent Publication No. 2000-168223, Japanese Unexamined Patent Publication No. 2001-209969, Japanese Unexamined Patent Application Publication No. 2001-322354 JP-A-2006-248180, JP-A-2006-297907, JP-A-8-253705, JP-A-2004-503379, JP- 336150, International Publication No. 2006/28006, etc. In addition to the organic sulfonic acid anion such as the described sulfonic acid anion described above, it is possible to use a chloride ion, a bromide ion, an iodide ion, a fluoride ion, a chlorate ion, a thiocyanate ion, a perchlorate ion, a hexafluorophosphate ion, a hexafluoroantimony acid ion, a tetrafluoroborate ion , Octyl phosphate ion, dodecyl phosphate ion, octadecyl phosphate ion, phenyl phosphate ion, nonylphenyl phosphate ion, 2,2'-methylenebis (4,6-di- Quincher anion having a function of de-exciting (quenching) an active molecule in an excited state or a cyclopentadienyl ring having a functional group such as a carboxyl group, a phosphonic acid group, a sulfonic acid group And an anion of a metallocene compound such as ferrocene or ruthenocene having an anionic group,
본 발명에 따른 상기 일반식(I)로 표시되는 디임모늄 화합물의 양이온의 구체예로는 하기 화합물 No.1~8을 들 수 있다. Specific examples of the cation of the diimonium compound represented by the general formula (I) according to the present invention include the following compounds Nos. 1 to 8.
상기 적외선 흡수 색소(A)는 단독 또는 복수종을 조합시켜서 사용할 수 있다. The infrared absorbing dye (A) may be used singly or in combination of plural species.
상기 적외선 흡수 색소(A)에 있어서, 상기 일반식(I)로 표시되는 화합물의 함유량은, 바람직하게는 50~100질량%, 보다 바람직하게는 70~100질량%이다. 상기 일반식(I)로 표시되는 화합물의 함유량이 50질량%보다 작으면, 용매에 대한 용해성이 저하되거나, 내열성이 저하되는 경우가 있다. In the infrared absorbing dye (A), the content of the compound represented by the general formula (I) is preferably 50 to 100% by mass, and more preferably 70 to 100% by mass. When the content of the compound represented by the general formula (I) is less than 50% by mass, the solubility in a solvent may be lowered or the heat resistance may be lowered.
상기 적외선 흡수 색소(A)는 도막의 최대 흡수 파장(λmax)이 700㎚ 이상인 것이 바람직하고, 780~850㎚가 더욱 바람직하다. 도막의 최대 흡수 파장(λmax)이 700㎚ 미만이면, 목적 파장의 광을 흡수하지 않기 때문에 바람직하지 않다. The infrared absorbing dye (A) preferably has a maximum absorption wavelength (? Max) of 700 nm or more, more preferably 780 to 850 nm. When the maximum absorption wavelength (max) of the coating film is less than 700 nm, it is not preferable because it does not absorb the light of the target wavelength.
본 발명의 도료에 있어서, 상기 적외선 흡수 색소(A)의 함유량은, 본 발명의 도료 중 바람직하게는 0.01~50질량%, 보다 바람직하게는 0.1~10질량%이다. 적외선 흡수 색소(A)의 함유량이 0.01질량%보다 작으면 본 발명의 도료를 사용하여 형성되는 근적외선 흡수 필터에 있어서 목적 파장을 흡수하지 않는 경우가 있고, 50질량%보다 크면 도료 중에서 적외선 흡수 색소(A)의 석출이 일어나는 경우가 있다. In the coating material of the present invention, the content of the infrared absorbing dye (A) is preferably 0.01 to 50 mass%, more preferably 0.1 to 10 mass%, in the coating material of the present invention. If the content of the infrared absorbing dye (A) is less than 0.01% by mass, the near-infrared absorbing filter formed by using the coating material of the present invention may not absorb the target wavelength. When the content is larger than 50% by mass, A) may occur in some cases.
본 발명의 도료에 있어서, 수지(B)로는 상기 적외선 흡수 색소(A)를 균일하게 분산할 수 있는 것이면 특별히 한정되지 않지만, 폴리에스테르계, 폴리아크릴계, 폴리아미드계, 폴리우레탄계, 폴리올레핀계, 폴리카보네이트계 등의 수지, 또한 이들의 수지를 유기 과산화물, 가교제, 광가교 개시제 등에 의해 가교한 수지를 적합하게 사용할 수 있다. 또한, 수지의 유리 전이 온도 및 상기 수지를 함유하는 도료를 기판에 도포함으로써 얻어지는 경화막(근적외선 흡수 필터)의 유리 전이 온도가, 이용하는 기기의 사용 보증 온도 이상인 것이 바람직하다. In the coating material of the present invention, the resin (B) is not particularly limited as long as it can uniformly disperse the infrared absorbing dye (A). Examples of the resin (B) include polyester resins, polyacrylic resins, polyamide resins, polyurethane resins, polyolefin resins, Based resin, a carbonate-based resin, or a resin obtained by crosslinking these resins with an organic peroxide, a crosslinking agent, a photo-crosslinking initiator, or the like. It is also preferable that the glass transition temperature of the resin and the glass transition temperature of the cured film (near-infrared absorption filter) obtained by applying the paint containing the resin to the substrate are not less than the use guaranteed temperature of the equipment to be used.
상기 수지(B) 중에서도, 폴리아크릴계 수지가 적외선 흡수 색소(A)와의 상용성면에서 바람직하고, 에틸렌성 불포화 결합을 가지는 중합성 화합물을 단독 또는 복수로 중합시킨 것이 더욱 바람직하다. Among the above-mentioned resins (B), the polyacrylic resin is preferred in terms of compatibility with the infrared absorbing dye (A), and more preferably a polymerizable compound having an ethylenic unsaturated bond singly or plurally.
상기 에틸렌성 불포화 결합을 가지는 중합성 화합물로는 특별히 한정되지 않고, 종래 공지인 것을 사용할 수 있는데, 예를 들면, 에틸렌, 프로필렌, 부틸렌, 이소부틸렌, 염화비닐, 염화비닐리덴, 플루오르화비닐리덴, 테트라플루오르에틸렌 등의 불포화 지방족 탄화수소; (메타)아크릴산, α-클로로아크릴산, 이타콘산, 말레산, 시트라콘산, 푸마르산, 하이믹산, 크로톤산, 이소크로톤산, 비닐아세트산, 알릴아세트산, 계피산, 소르빈산, 메사콘산(mesaconic acid), 숙신산모노[2-(메타)아크릴로일옥시에틸], 프탈산모노[2-(메타)아크릴로일옥시에틸], ω-카르복시폴리카프로락톤모노(메타)아크릴레이트 등의 양 말단에 카르복시기와 수산기를 가지는 폴리머의 모노(메타)아크릴레이트, 하이드록시에틸(메타)아크릴레이트·말레이트, 하이드록시프로필(메타)아크릴레이트·말레이트, 디시클로펜타디엔·말레이트 혹은 1개의 카르복실기와 2개 이상의 (메타)아크릴로일기를 가지는 다관능 (메타)아크릴레이트 등의 불포화 다염기산; (메타)아크릴산-2-하이드록시에틸, (메타)아크릴산-2-하이드록시프로필, (메타)아크릴산글리시딜, 하기 화합물 No.A1~No.A4, (메타)아크릴산메틸, (메타)아크릴산부틸, (메타)아크릴산이소부틸, (메타)아크릴산-t-부틸, (메타)아크릴산시클로헥실, (메타)아크릴산n-옥틸, (메타)아크릴산이소옥틸, (메타)아크릴산이소노닐, (메타)아크릴산스테아릴, (메타)아크릴산라우릴, (메타)아크릴산메톡시에틸, (메타)아크릴산디메틸아미노메틸, (메타)아크릴산디메틸아미노에틸, (메타)아크릴산아미노프로필, (메타)아크릴산디메틸아미노프로필, (메타)아크릴산에톡시에틸, (메타)아크릴산폴리(에톡시)에틸, (메타)아크릴산부톡시에톡시에틸, (메타)아크릴산에틸헥실, (메타)아크릴산페녹시에틸, (메타)아크릴산테트라하이드로푸릴, (메타)아크릴산비닐, (메타)아크릴산알릴, (메타)아크릴산벤질, 에틸렌글리콜디(메타)아크릴레이트, 디에틸렌글리콜디(메타)아크릴레이트, 트리에틸렌글리콜디(메타)아크릴레이트, 폴리에틸렌글리콜디(메타)아크릴레이트, 프로필렌글리콜디(메타)아크릴레이트, 1,4-부탄디올디(메타)아크릴레이트, 1,6-헥산디올디(메타)아크릴레이트, 트리메틸올에탄트리(메타)아크릴레이트, 트리메틸올프로판트리(메타)아크릴레이트, 디펜타에리스리톨펜타(메타)아크릴레이트, 디펜타에리스리톨헥사(메타)아크릴레이트, 펜타에리스리톨테트라(메타)아크릴레이트, 펜타에리스리톨트리(메타)아크릴레이트, 트리시클로데칸디메틸올디(메타)아크릴레이트, 트리[(메타)아크릴로일에틸]이소시아누레이트, 폴리에스테르(메타)아크릴레이트올리고머 등의 불포화 1염기산 및 다가 알코올 또는 다가 페놀의 에스테르; (메타)아크릴산아연, (메타)아크릴산마그네슘 등의 불포화 다염기산의 금속염; 말레산 무수물, 이타콘산 무수물, 시트라콘산 무수물, 메틸테트라하이드로무수프탈산, 테트라하이드로무수프탈산, 트리알킬테트라하이드로무수프탈산, 5-(2,5-디옥소테트라하이드로푸릴)-3-메틸-3-시클로헥센-1,2-디카르복실산 무수물, 트리알킬테트라하이드로무수프탈산-무수말레산 부가물, 도데세닐무수숙신산, 무수메틸하이믹산 등의 불포화 다염기산의 산무수물; (메타)아크릴아미드, 메틸렌비스-(메타)아크릴아미드, 디에틸렌트리아민트리스(메타)아크릴아미드, 크실릴렌비스(메타)아크릴아미드, α-클로로아크릴아미드, N-2-하이드록시에틸(메타)아크릴아미드 등의 불포화 1염기산 및 다가 아민의 아미드; 아크롤레인 등의 불포화 알데히드; (메타)아크릴로니트릴, α-클로로아크릴로니트릴, 시안화 비닐리덴, 시안화 알릴 등의 불포화 니트릴; 스티렌, 4-메틸스티렌, 4-에틸스티렌, 4-메톡시스티렌, 4-하이드록시스티렌, 4-클로로스티렌, 디비닐벤젠, 비닐톨루엔, 비닐안식향산, 비닐페놀, 비닐술폰산, 4-비닐벤젠술폰산, 비닐벤질메틸에테르, 비닐벤질글리시딜에테르 등의 불포화 방향족 화합물; 메틸비닐케톤 등의 불포화 케톤; 비닐아민, 알릴아민, N-비닐피롤리돈, 비닐피페리딘 등의 불포화 아민 화합물; 알릴알코올, 크로틸알코올 등의 비닐알코올; 비닐메틸에테르, 비닐에틸에테르, n-부틸비닐에테르, 이소부틸비닐에테르, 알릴글리시딜에테르 등의 비닐에테르; 말레이미드, N-페닐말레이미드, N-시클로헥실말레이미드 등의 불포화 이미드류; 인덴, 1-메틸인덴 등의 인덴류; 1,3-부타디엔, 이소프렌, 클로로프렌 등의 지방족 공역(共役) 디엔류; 폴리스티렌, 폴리메틸(메타)아크릴레이트, 폴리-n-부틸(메타)아크릴레이트, 폴리실록산 등의 중합체 분자쇄의 말단에 모노(메타)아크릴로일기를 가지는 매크로모노머류; 비닐클로이드, 비닐리덴클로이드, 디비닐숙신산, 디알릴프탈레이트, 트리알릴포스페이트, 트리알릴이소시아누레이트, 비닐티오에테르, 비닐이미다졸, 비닐옥사졸린, 비닐카르바졸, 비닐피롤리돈, 비닐피리딘, 수산기 함유 비닐모노머 및 폴리이소시아네이트 화합물의 비닐우레탄 화합물, 수산기 함유 비닐모노머 및 폴리에폭시 화합물의 비닐에폭시 화합물, 펜타에리스리톨트리아크릴레이트, 디펜타에리스리톨펜타아크릴레이트 등의 수산기 함유 다관능 아크릴레이트와 톨릴렌디이소시아네이트, 헥사메틸렌디이소시아네이트 등의 다관능 이소시아네이트의 반응물, 펜타에리스리톨트리아크릴레이트, 디펜타에리스리톨펜타아크릴레이트 등의 수산기 함유 다관능 아크릴레이트와 무수 숙신산, 무수 프탈산, 테트라하이드로 무수 프탈산 등의 2염기산 무수물의 반응물인 산가를 가지는 다관능 아크릴레이트; (메타)아크릴산-2-하이드록시에틸, (메타)아크릴산-2-하이드록시프로필, (메타)아크릴산글리시딜 등의 수산기를 가지는 아크릴레이트와 디이소시아네이트 화합물의 반응 생성물인 에틸렌성 불포화 모노이소시아네이트와, 다가 알코올 또는 다가 페놀을 반응시켜서 얻어지는 우레탄아크릴레이트; 아크릴폴리올과 디이소시아네이트 화합물을 반응시켜서 얻어지는 우레탄아크릴레이트; 페놀 및/또는 크레졸노볼락에폭시 수지, 비페닐 골격, 나프탈렌 골격을 가지는 노볼락에폭시 수지, 비스페놀A노볼락형 에폭시 화합물, 디시클로펜타디엔노볼락형 에폭시 화합물 등의 노볼락형 에폭시 화합물, 다관능 에폭시기를 가지는 폴리페닐메탄형 에폭시 수지, 비스페놀A형 에폭시 수지 등의 에폭시기에 불포화 1염기산을 작용시키고, 또한 다염기산 무수물을 작용시켜서 얻어진 에폭시아크릴레이트; 불포화 다염기산의 무수물과 다가 알코올 또는 다가 페놀의 에스테르를 들 수 있다. The polymerizable compound having an ethylenically unsaturated bond is not particularly limited, and conventionally known ones can be used. Examples thereof include ethylene, propylene, butylene, isobutylene, vinyl chloride, vinylidene chloride, vinyl fluoride Unsaturated aliphatic hydrocarbons such as diene, tetrafluoroethylene, and the like; (Meth) acrylic acid,? -Chloroacrylic acid, itaconic acid, maleic acid, citraconic acid, fumaric acid, hymeic acid, crotonic acid, isocrotonic acid, vinylacetic acid, allylacetic acid, cinnamic acid, sorbic acid, mesaconic acid, (Meth) acryloyloxyethyl], mono [2- (meth) acryloyloxyethyl] phthalate mono [2- (meth) acryloyloxyethyl], and omega -carboxylic polycaprolactone mono (Meth) acrylate maleate, hydroxypropyl (meth) acrylate maleate, dicyclopentadiene maleate or one carboxyl group and two or more (meth) Unsaturated polybasic acids such as polyfunctional (meth) acrylates having a methacryloyl group; (Meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, glycidyl Butyl (meth) acrylate, isobutyl (meth) acrylate, cyclohexyl (meth) acrylate, n-octyl (meth) acrylate, isooctyl (meth) acrylate, isononyl Stearyl acrylate, lauryl (meth) acrylate, methoxyethyl (meth) acrylate, dimethylaminomethyl (meth) acrylate, dimethylaminoethyl (meth) acrylate, aminopropyl (meth) acrylate, dimethylaminopropyl (Meth) acrylate, ethoxyethyl (meth) acrylate, poly (ethoxy) ethyl (meth) acrylate, butoxyethoxyethyl (meth) acrylate, ethylhexyl (Meth) acrylate, allyl (meth) acrylate, (Meth) acrylate, benzyl (meth) acrylate, ethyleneglycol di (meth) acrylate, diethyleneglycol di (meth) acrylate, triethyleneglycol di Acrylate, trimethylolethane tri (meth) acrylate, trimethylol propane tri (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,6- Pentaerythritol tetra (meth) acrylate, pentaerythritol tri (meth) acrylate, tricyclodecane dimethylol (meth) acrylate, dipentaerythritol hexa (meth) acrylate, pentaerythritol tetra Esters of unsaturated monobasic acids and polyhydric alcohols or polyhydric phenols such as (meth) acryloylethyl] isocyanurate and polyester (meth) acrylate oligomers; Metal salts of unsaturated polybasic acids such as zinc (meth) acrylate and magnesium (meth) acrylate; Maleic anhydride, itaconic anhydride, citraconic anhydride, methyltetrahydrophthalic anhydride, tetrahydrophthalic anhydride, trialkyltetrahydrophthalic anhydride, 5- (2,5-dioxotetrahydrofuryl) Acid anhydrides of unsaturated polybasic acids such as cyclohexene-1,2-dicarboxylic acid anhydride, trialkyltetrahydrophthalic anhydride-maleic anhydride adduct, dodecenyl ansuccinic acid, and anhydrous methyl hymeic acid; (Meth) acrylamide, methylenebis- (meth) acrylamide, diethylenetriamintris (meth) acrylamide, xylylenebis (meth) acrylamide, alpha -chloroacrylamide, N-2-hydroxyethyl Amides of unsaturated monobasic acids and polyamines such as methacrylamide; Unsaturated aldehydes such as acrolein; Unsaturated nitriles such as (meth) acrylonitrile,? -Chloroacrylonitrile, vinylidene cyanide, and allyl cyanide; Vinylbenzene sulfonic acid, vinylbenzenesulfonic acid, vinylbenzenesulfonic acid, vinylbenzenesulfonic acid, vinylbenzenesulfonic acid, vinylbenzenesulfonic acid, vinylbenzenesulfonic acid, and vinylbenzenesulfonic acid. Unsaturated aromatic compounds such as vinylbenzyl methyl ether and vinyl benzyl glycidyl ether; Unsaturated ketones such as methyl vinyl ketone; Unsaturated amine compounds such as vinylamine, allylamine, N-vinylpyrrolidone and vinylpiperidine; Vinyl alcohols such as allyl alcohol and crotyl alcohol; Vinyl ethers such as vinyl methyl ether, vinyl ethyl ether, n-butyl vinyl ether, isobutyl vinyl ether and allyl glycidyl ether; Unsaturated imides such as maleimide, N-phenylmaleimide and N-cyclohexylmaleimide; Indene such as indene and 1-methylindene; Aliphatic conjugated dienes such as 1,3-butadiene, isoprene and chloroprene; Macromonomers having a mono (meth) acryloyl group at the end of a polymer molecular chain such as polystyrene, polymethyl (meth) acrylate, poly-n-butyl (meth) acrylate and polysiloxane; Vinyl pyrrolidone, polyvinyl pyrrolidone, polyvinyl pyrrolidone, polyvinyl pyrrolidone, polyvinyl pyrrolidone, polyvinyl pyrrolidone, polyvinyl pyrrolidone, polyvinyl pyrrolidone, polyvinyl pyrrolidone, Containing vinyl monomers and vinyl epoxide compounds of polyepoxy compounds, pentaerythritol triacrylate, dipentaerythritol pentaacrylate, and other hydroxyl group-containing polyfunctional acrylates and vinylpyridinium compounds such as vinylpyridine, vinyl group-containing vinyl monomers and polyisocyanate compounds, A reaction product of a polyfunctional isocyanate such as tolylene diisocyanate and hexamethylene diisocyanate, a reaction product of a hydroxyl group-containing polyfunctional acrylate such as pentaerythritol triacrylate, dipentaerythritol pentaacrylate and the like such as 2, 3, 4, 5, base The multifunctional acrylate having an acid value of a reaction product of the anhydride; Ethylenically unsaturated monoisocyanate, which is the reaction product of an acrylate having a hydroxyl group such as (meth) acrylic acid-2-hydroxyethyl, (meth) acrylic acid-2-hydroxypropyl and (meth) , A polyhydric alcohol or a polyhydric phenol; Urethane acrylate obtained by reacting an acrylic polyol with a diisocyanate compound; Novolak type epoxy compounds such as phenol and / or cresol novolak epoxy resin, biphenyl skeleton, novolak epoxy resin having naphthalene skeleton, bisphenol A novolak type epoxy compound and dicyclopentadiene novolak type epoxy compound, polyfunctional An epoxy acrylate obtained by reacting an unsaturated monobasic acid with an epoxy group such as a polyphenylmethane type epoxy resin having an epoxy group or a bisphenol A type epoxy resin and by reacting a polybasic acid anhydride; Esters of polyhydric alcohols or polyhydric phenols with anhydrides of unsaturated polybasic acids.
이들의 중합성 화합물을, 단독 또는 2종 이상을 중합함으로써 폴리아크릴계 수지를 얻을 수 있다. The polyacrylic resin can be obtained by polymerizing these polymerizable compounds either singly or in combination.
상기 수지를 얻기 위해서 사용하는 유기 과산화물로는, 열이나 산화 환원계의 존재로 용이하게 퍼옥시라디칼을 발생하는 것이 좋고, 예를 들면 1,1-비스(t-부틸퍼옥시)-3,5,5-트리메틸시클로헥산, 2,5-디메틸헥산-2,5-디하이드록시퍼옥사이드, 디-t-부틸퍼옥사이드, t-부틸큐밀퍼옥사이드, 디큐밀퍼옥사이드, α,α'-비스(t-부틸퍼옥시)-p-디이소프로필벤젠, 2,5-디메틸-2,5-디(t-부틸퍼옥시)헥산, 2,5-디메틸-2,5-디(t-부틸퍼옥시)헥신-3, 벤조일퍼옥사이드, t-부틸퍼옥시벤젠, 2,5-디메틸-2,5-디(벤조일퍼옥시)헥산, t-부틸퍼옥시말레산, t-부틸퍼옥시이소프로필카보네이트 등을 들 수 있고, 과산화물로부터 발생한 라디칼에 의해 폴리머 주쇄(主鎖)의 수소 추출 반응으로 폴리머 주쇄에 라디칼이 발생하여 가교하는 가교 형태를 취하고, 폴리머 주쇄 전체가 가교 구조에 들어가서 균일하게 가교되는 것이다. As the organic peroxide to be used for obtaining the resin, it is preferred that the peroxy radical is easily generated by the presence of heat or an oxidation-reduction system. For example, 1,1-bis (t-butylperoxy) , 5-trimethylcyclohexane, 2,5-dimethylhexane-2,5-dihydroxyperoxide, di-t-butylperoxide, t-butylcumylperoxide, dicumylperoxide, butylperoxy) -p-diisopropylbenzene, 2,5-dimethyl-2,5-di (t-butylperoxy) hexane, 2,5- Butyl peroxybenzene, 2,5-dimethyl-2,5-di (benzoyl peroxy) hexane, t-butyl peroxymaleic acid, t-butyl peroxyisopropyl Carbon and the like, and a radical is generated in the polymer main chain by the hydrogen extraction reaction of the polymer main chain (main chain) due to radicals generated from the peroxide to take a crosslinked form, and the entire polymer main chain is added to the crosslinked structure It will be uniformly crosslinked.
상기 수지를 얻기 위해서 사용하는 가교제로는 다관능 에폭시 화합물, 다관능 이소시아네이트, 디산 무수물, 아세토페논, 벤조페논, 안트라퀴논, 트리아진, 아지리딘, 멜라민 화합물, 금속염, 금속 킬레이트 화합물 등; 다관능 아크릴레이트, 올레핀성 불포화 화합물, 공중합성 벤조페논 등의 자외선 가교제; 하이드록시케톤류, 벤질디메틸케탈류, 아미노케톤류, 아실포스핀옥사이드계, 벤조페논계, 트리클로로메틸기 함유 트리아진 유도체, 다관능 벤조페논, 아크릴화 벤조페논을 중합한 올리고머, 1-[4-(2-하이드록시에톡시)페닐]-2-하이드록시-2-메틸-1-프로판-1-온의 1급 수산기와 2-이소시아네이트에틸메타크릴레이트의 반응물을 중합한 올리고머, 2-하이드록시-2-메틸-[4-(1-메틸비닐)페닐]프로판올올리고머 등의 후첨가 광가교제 등을 들 수 있다. Examples of the crosslinking agent used for obtaining the resin include polyfunctional epoxy compounds, polyfunctional isocyanates, dianhydrides, acetophenone, benzophenone, anthraquinone, triazine, aziridine, melamine compounds, metal salts and metal chelate compounds; Ultraviolet crosslinking agents such as polyfunctional acrylates, olefinically unsaturated compounds, and benzophenones, which are copolymerizable; Oligomers obtained by polymerizing trifunctional benzophenone, acrylated benzophenone, 1- [4- (2-methoxyphenyl) -1,2,4-triazine, 2-hydroxy-2-methyl-1-propan-1-one and 2-isocyanate ethyl methacrylate, an oligomer obtained by polymerizing a reaction product of 2-hydroxy- And post-addition photo-crosslinking agents such as methyl- [4- (1-methylvinyl) phenyl] propanol oligomer and the like.
상기 수지를 얻기 위해서 사용하는 광가교 개시제로는 2-메틸-1[4-(메틸티오)페닐]-2-모르폴리노프로판-1-온이나 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)-부탄온-1 등의 α-아미노케톤계, 1-하이드록시-시클로헥실-페닐-케톤이나 2-하이드록시-2-메틸-1-페닐-프로피온-1-온 등의 α-하이드록시케톤계, 2,2-디메톡시-1,2-디페닐에탄-1-온 등의 벤질디메틸케탈계를 들 수 있다. Examples of the photo-crosslinking initiator used for obtaining the resin include 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane- 1-hydroxy-2-methyl-1-phenyl-propion-1-one, such as 1-hydroxy-cyclohexyl- , And benzyldimethylketal systems such as 2,2-dimethoxy-1,2-diphenylethane-1-one.
본 발명의 도료에 있어서, 상기 수지(B)의 함유량은 본 발명의 도료의 고형분 중, 30~99질량%, 특히 60~95질량%가 바람직하다. 상기 수지(B)의 함유량이 30질량%보다 작으면 기판에 도포 후의 근적외선 흡수 필터의 기판과의 밀착성이 저하되는 경우가 있고, 99질량%보다 크면 근적외선 흡수 필터의 강도가 저하되는 경우가 있다. In the coating material of the present invention, the content of the resin (B) is preferably from 30 to 99% by mass, more preferably from 60 to 95% by mass, based on the solid content of the coating material of the present invention. When the content of the resin (B) is less than 30 mass%, adhesion of the near infrared ray absorbing filter to the substrate after application may be lowered. On the other hand, when the content is more than 99 mass%, the strength of the near infrared ray absorbing filter may be lowered.
본 발명의 도료에 있어서, 용매(C)로는 디아세톤알코올을 필수성분으로 하고, 기타, 통상 필요에 따라서 상기의 각 성분(본 발명의 적외선 흡수 색소(A) 등)을 용해 또는 분산할 수 있는 용매와 혼합하여 사용할 수 있다. 그 밖의 용매로는 예를 들면, 메틸에틸케톤, 메틸아밀케톤, 디에틸케톤, 아세톤, 메틸이소프로필케톤, 메틸이소부틸케톤, 시클로헥사논, 2-헵타논 등의 케톤류; 에틸에테르, 디옥산, 테트라하이드로푸란, 1,2-디메톡시에탄, 1,2-디에톡시에탄, 디프로필렌글리콜디메틸에테르 등의 에테르계 용매; 아세트산메틸, 아세트산에틸, 아세트산-n-프로필, 아세트산이소프로필, 아세트산n-부틸, 아세트산시클로헥실, 락트산에틸, 숙신산디메틸, 텍사놀 등의 에스테르계 용매; 에틸렌글리콜모노메틸에테르, 에틸렌글리콜모노에틸에테르 등의 셀로솔브계 용매; 메탄올, 에탄올, 이소- 또는 n-프로판올, 이소- 또는 n-부탄올, 아밀알코올 등의 알코올계 용매; 에틸렌글리콜모노메틸아세테이트, 에틸렌글리콜모노에틸아세테이트, 프로필렌글리콜-1-모노메틸에테르-2-아세테이트(PGMEA), 디프로필렌글리콜모노메틸에테르아세테이트, 3-메톡시부틸아세테이트, 에톡시에틸프로피오네이트 등의 에테르에스테르계 용매; 벤젠, 톨루엔, 크실렌 등의 BTX계 용매; 헥산, 헵탄, 옥탄, 시클로헥산 등의 지방족 탄화수소계 용매; 테레핀유, D-리모넨, 피넨 등의 테르펜계 탄화수소유; 미네랄 스피릿, 스와졸 #310(코스모 마츠야마 세키유), 솔벳소 #100(에쿠손 가가쿠) 등의 파라핀계 용매; 사염화탄소, 클로로포름, 트리클로로에틸렌, 염화메틸렌, 1,2-디클로로에탄 등의 할로겐화 지방족 탄화수소계 용매; 클로로벤젠 등의 할로겐화 방향족 탄화수소계 용매; 카르비톨계 용매, 아닐린, 트리에틸아민, 피리딘, 아세트산, 아세토니트릴, 이황화탄소, N,N-디메틸포름아미드, N,N-디메틸아세트아미드, N-메틸피롤리돈, 디메틸술폭사이드, 물 등을 들 수 있고, 이들의 용매는 1종 또는 2종 이상의 혼합 용매로서 사용할 수 있다. 이들 중에서도 케톤류, 에테르에스테르계 용매 등, 특히 프로필렌글리콜-1-모노메틸에테르-2-아세테이트, 디메틸아세트아미드, 시클로헥사논 등이, 본 발명의 도료에 있어서 적외선 흡수 색소(A) 또는 수지(B)와 상용성이 좋으므로 바람직하다. In the coating material of the present invention, it is preferable that the solvent (C) contains diacetone alcohol as an essential component and other components which can dissolve or disperse the respective components (the infrared absorbing dye (A) etc. of the present invention) It can be used by mixing with a solvent. Examples of the other solvent include ketones such as methyl ethyl ketone, methyl amyl ketone, diethyl ketone, acetone, methyl isopropyl ketone, methyl isobutyl ketone, cyclohexanone and 2-heptanone; Ether solvents such as ethyl ether, dioxane, tetrahydrofuran, 1,2-dimethoxyethane, 1,2-diethoxyethane and dipropylene glycol dimethyl ether; Esters such as methyl acetate, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, cyclohexyl acetate, ethyl lactate, dimethyl succinate, and texanol; Cellosolve solvents such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether; Alcohol-based solvents such as methanol, ethanol, iso-or n-propanol, iso- or n-butanol, and amyl alcohol; Propylene glycol monomethyl ether-2-acetate (PGMEA), dipropylene glycol monomethyl ether acetate, 3-methoxybutyl acetate, ethoxyethyl propionate, etc. Ether-based solvent; BTX type solvents such as benzene, toluene and xylene; Aliphatic hydrocarbon solvents such as hexane, heptane, octane and cyclohexane; Terpene-based hydrocarbon oils such as terphenyl oil, D-limonene, and pinene; Paraffin type solvents such as mineral spirits, Swazol # 310 (Cosmo Matsuyama Sekiyu), Solvesso # 100 (Ekuson Kagaku); Halogenated aliphatic hydrocarbon solvents such as carbon tetrachloride, chloroform, trichlorethylene, methylene chloride, and 1,2-dichloroethane; Halogenated aromatic hydrocarbon solvents such as chlorobenzene; A solvent such as acetonitrile, carbon disulfide, N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone, dimethylsulfoxide, water, etc. These solvents may be used singly or as a mixed solvent of two or more kinds. Among them, ketones, ether ester solvents and the like, in particular, propylene glycol-1-monomethyl ether-2-acetate, dimethylacetamide, cyclohexanone and the like, ), Which is preferable.
본 발명의 도료에 있어서, 상기 용매(C)의 합계량에 대하여, 디아세톤알코올은 30~100질량%, 특히 50~95질량%인 것이 액(液)안정성이 좋으므로 바람직하다. In the coating material of the present invention, the diacetone alcohol is preferably 30 to 100% by mass, more preferably 50 to 95% by mass, based on the total amount of the solvent (C).
본 발명의 도료에 있어서 상기 용매(C)의 사용량은, 용매(C) 이외의 조성물의 농도가 5~30질량%가 되는 것이 바람직하고, 5질량%보다 작은 경우 막두께를 두껍게 하는 것이 곤란하여 원하는 파장광을 충분히 흡수할 수 없기 때문에 바람직하지 않고, 30질량%를 초과할 경우 조성물의 석출에 의한 조성물의 보존성이 저하되거나, 점도가 향상되어서 핸들링이 저하되기 때문에 바람직하지 않다. In the coating material of the present invention, the amount of the solvent (C) to be used is preferably 5 to 30 mass% in the composition other than the solvent (C), and it is difficult to increase the film thickness when it is less than 5 mass% It is not preferable because it can not absorb the desired wavelength light sufficiently. If it exceeds 30 mass%, the preservability of the composition due to precipitation of the composition deteriorates, or the viscosity is improved and the handling is lowered.
본 발명의 도료에는 또한 무기 화합물을 함유시킬 수 있다. 상기 무기 화합물로는 예를 들면, 산화니켈, 산화철, 산화이리듐, 산화티탄, 산화아연, 산화마그네슘, 산화칼슘, 산화칼륨, 실리카, 알루미나 등의 금속 산화물; 층상 점토광물, 밀로리 블루, 탄산칼슘, 탄산마그네슘, 코발트계, 망간계, 유리 분말, 마이카, 탈크, 카올린, 페로시안화물, 각종 금속 황산염, 황화물, 셀렌화물, 알루미늄실리케이트, 칼슘실리케이트, 수산화알루미늄, 백금, 금, 은, 구리 등을 들 수 있고, 이들 중에서도, 산화티탄, 실리카, 층상 점토광물, 은 등이 바람직하다. 본 발명의 도료에 있어서, 무기 화합물의 함유량은, 상기 아크릴 수지 100질량부에 대하여 바람직하게는 0.1~50질량부, 보다 바람직하게는 0.5~20질량부이며, 이들의 무기 화합물은 1종 또는 2종 이상을 사용할 수 있다. The coating material of the present invention may further contain an inorganic compound. Examples of the inorganic compound include metal oxides such as nickel oxide, iron oxide, iridium oxide, titanium oxide, zinc oxide, magnesium oxide, calcium oxide, potassium oxide, silica and alumina; The present invention relates to a method for producing a metal oxide fine particle comprising the steps of: forming a layered clay mineral, milky blue, calcium carbonate, magnesium carbonate, cobalt, manganese, glass powder, mica, talc, kaolin, ferrocyanide, , Platinum, gold, silver, copper and the like. Of these, titanium oxide, silica, layered clay mineral, silver and the like are preferable. In the coating material of the present invention, the content of the inorganic compound is preferably 0.1 to 50 parts by mass, more preferably 0.5 to 20 parts by mass based on 100 parts by mass of the acrylic resin, More than species can be used.
이들 무기 화합물은 예를 들면, 충전제, 반사 방지제, 도전제, 안정제, 난연제, 기계적 강도 향상제, 특수 파장흡수제, 발(撥) 잉크제 등으로 사용된다. These inorganic compounds are used, for example, as fillers, antireflective agents, conductive agents, stabilizers, flame retardants, mechanical strength improvers, special wavelength absorbing agents,
또, 본 발명의 도료에는 필요에 따라서, 본 발명의 적외선 흡수 색소 이외의 색소; p-아니솔, 하이드로퀴논, 피로카테콜, t-부틸카테콜, 페노티아진 등의 열중합 억제제; 열중합 개시제; 광중합 개시제; 가소제; 접착 촉진제; 충전제; 소포제; 레벨링제; 표면 조정제; 산화 방지제; 자외선 흡수제; 분산조제; 응집 방지제; 촉매; 효과 촉진제; 가교제; 증점제; 계면활성제; 실란 커플링제; 멜라민 등 관용의 첨가물을 첨가할 수 있다. The coating material of the present invention may contain, if necessary, a dye other than the infrared absorbing dye of the present invention; thermal polymerization inhibitors such as p-anisole, hydroquinone, pyrocatechol, t-butylcatechol and phenothiazine; A thermal polymerization initiator; A photopolymerization initiator; Plasticizers; Adhesion promoters; Fillers; Defoamer; Leveling agents; Surface modifiers; Antioxidants; Ultraviolet absorber; Dispersing aids; An anti-aggregation agent; catalyst; Effect promoters; A crosslinking agent; Thickener; Surfactants; Silane coupling agents; Additives such as melamine can be added.
본 발명의 도료에 있어서, 적외선 흡수 색소(A), 수지(B) 이외의 임의성분(단, 용매(C)는 제외함)의 함유량은 그 사용 목적에 따라 적절히 선택되고 특별히 제한되지 않지만, 바람직하게는 상기 수지(B) 100질량부에 대하여 합계로 50질량부 이하로 한다. In the coating material of the present invention, the content of an optional component other than the infrared absorbing dye (A) and the resin (B) (excluding the solvent (C)) is appropriately selected depending on the purpose of use and is not particularly limited, Is set to 50 parts by mass or less based on 100 parts by mass of the resin (B).
다음으로, 본 발명의 근적외선 흡수 필터에 대해서 설명한다. Next, the near infrared ray absorption filter of the present invention will be described.
본 발명의 근적외선 흡수 필터는 본 발명의 도료를 기판 위에 도포함으로써 얻어진다. The near-infrared absorbing filter of the present invention is obtained by applying the coating material of the present invention onto a substrate.
상기 기판은 특별히 한정되지 않지만, 그 바람직한 예로는 유리판, 폴리에틸렌테레프탈레이트판, 폴리카보네이트판, 폴리이미드판, 폴리아미드판, 폴리메타크릴산 메틸판, 폴리스티렌판, 폴리염화 비닐판, 폴리올레핀판, 시클로올레핀폴리머판, 폴리테트라플루오르에틸렌판, 트리아세틸셀룰로오스판, 노르보르넨(norbornene)판, 폴리비닐알코올판, 아세트산셀룰로오스판, 폴리아릴레이트판, 폴리술폰판, 폴리에테르술폰판, 실리콘웨이퍼, 반사판, 방해석판, 석영판, 유리판, 종이, 목재, 금속판 등을 들 수 있다. The substrate is not particularly limited, but preferable examples thereof include glass plates, polyethylene terephthalate plates, polycarbonate plates, polyimide plates, polyamide plates, polymethylmethacrylate plates, polystyrene plates, polyvinyl chloride plates, polyolefin plates, Polyvinyl alcohol plates, cellulose acetate plates, polyarylate plates, polysulfone plates, polyether sulfone plates, silicon wafers, reflector plates, nylon plates, An interference plate, a quartz plate, a glass plate, a paper, a wood plate, a metal plate, and the like.
상기 기판은 코로나 방전 처리, 화염처리, 플라즈마 처리, 글로우방전 처리, 조면화(粗面化) 처리, 약품처리 등의 종래 공지의 방법에 의한 표면처리나, 앵커 코트(anchor coat)제나 프라이머 등의 코팅을 실시해도 된다. The substrate may be subjected to a surface treatment by a conventionally known method such as a corona discharge treatment, a flame treatment, a plasma treatment, a glow discharge treatment, a roughening treatment or a chemical treatment, a surface treatment by an anchor coat agent, Coating may be performed.
상기 기판에 도포하는 방법으로는 공지의 방법을 사용할 수 있고, 예를 들면, 커튼 코팅법, 압출(押出) 코팅법, 롤 코팅법, 스핀 코팅법, 딥 코팅법, 바 코팅법, 스프레이 코팅법, 슬라이드 코팅법, 블레이드 코팅법, 그라비어 코팅법, 인쇄 코팅법 등을 사용할 수 있다. The substrate may be coated by a known method such as a curtain coating method, an extrusion coating method, a roll coating method, a spin coating method, a dip coating method, a bar coating method, a spray coating method , A slide coating method, a blade coating method, a gravure coating method, a printing coating method and the like.
본 발명의 근적외선 흡수 필터는 800~1100㎚의 (근)적외선 영역에서의 투과율이 10% 이하, 바람직하게는 8% 이하를 나타내는 것이다. The near-infrared absorption filter of the present invention has a transmittance of 10% or less, preferably 8% or less in the (near) infrared region of 800 to 1100 nm.
본 발명의 근적외선 흡수 필터는 플라즈마 디스플레이 패널, CRT, 형광표시관, 전계방사형 디스플레이 등의 디스플레이 패널; 카메라, 비디오카메라 등의 광학기기의 수광소자나 촬상소자에 사용되고 있는 포토 다이오드나 CCD, C-MOS; 광학 렌즈, 자동차용 유리, 건재용 유리, 태양전지 모듈 등의 열선 차단 필터; 비디오카메라 등의 광학기기의 수광소자나 촬상소자; 적외선 흡수 잉크·토너 용도; 적외선 흡수 재료는 적외 감광성의 감재용(感材用) 세이프라이트 필터, 적외 영역의 반도체 레이저광 등을 광원으로 하는 감광 재료, 광디스크용 기록 재료 등; 현금카드나 ID카드 등의 위조 방지 용도; 태양광선에 포함되는 적외선 흡수의 조광(調光) 재료; 식물육성 제어 등의 농업용 자재; 보호 안경 등의 시각 보호 의료재료 등 각종 용도로 사용할 수 있고, 그 용도에 특별히 제한은 없다. The near infrared ray absorbing filter of the present invention may be applied to a display panel such as a plasma display panel, a CRT, a fluorescent display tube, and an electric field radial display; A photodiode, a CCD, a C-MOS used in a light receiving element or an image pickup element of an optical device such as a camera or a video camera; A heat ray shielding filter such as an optical lens, an automobile glass, a building glass, and a solar cell module; A light receiving element or an image pickup element of an optical device such as a video camera; Infrared absorption ink / toner application; Examples of the infrared absorbing material include a photosensitizing material using an infrared sensitive safelight filter for a sensitive material, a semiconductor laser light in an infrared region as a light source, a recording material for an optical disk, and the like; Anti-counterfeiting applications such as cash cards and ID cards; Infrared absorbing dimming material included in sunlight; Agricultural materials such as plant growth control; And protective materials such as goggles, and there are no particular restrictions on its use.
실시예Example
이하, 실시예 등을 들어서 본 발명을 더욱 상세하게 설명하지만, 본 발명은 이들의 실시예 등에 한정되는 것이 아니다. Hereinafter, the present invention will be described in more detail by way of Examples and the like, but the present invention is not limited to these Examples and the like.
[실시예 1] 도료 No.1의 조제 [Example 1] Preparation of paint No. 1
(A)성분으로서 화합물 No.1의 비스(트리플루오르메탄술포닐)이미드염을 0.05g과, (C)성분으로서 디아세톤알코올 2.75g을 첨가하고, 교반하여 용해했다. 그 후, (B)성분으로서 SPC-2000(쇼와덴코우사 제품) 5g을 혼합하고, 불용물이 없어질 때까지 교반하여 도료 No.1을 얻었다. (Trifluoromethanesulfonyl) imide salt of Compound No. 1 as a component (A) and 2.75 g of diacetone alcohol as a component (C) were added and dissolved by stirring. Thereafter, 5 g of SPC-2000 (manufactured by Showa Denko K.K.) as a component (B) was mixed and stirred until the insoluble matter disappeared to obtain Paint No. 1. [
[실시예 2~6 및 비교예 1~2] 도료 No.2~No.6 및 비교 도료 No.1~No.2의 조정 Examples 2 to 6 and Comparative Examples 1 to 2 Coating of Paint No. 2 to No. 6 and Comparative Paint No. 1 to No. 2
실시예 1과 동일한 순서로, [표 1]에 나타내는 배합으로 각 성분을 혼합하여 도료 No.2~No.6 및 비교 도료 No.1~No.2를 얻었다. In the same procedure as in Example 1, the components shown in Table 1 were mixed to obtain Paint Nos. 2 to 6 and Comparative Pigments No. 1 to No. 2.
*1: SPC-1000: 쇼와덴코우사 제품* 1: SPC-1000: manufactured by Showa Denko Co.
*2: Z-250: 다이셀사이테크사 제품* 2: Z-250: manufactured by Daicel-Sytec Co.
*3: 스미펙스 LG: 스미토모 카가쿠사 제품* 3: Sumipex LG: Sumitomo Chemical Co., Ltd.
*4: DAA: 디아세톤알코올* 4: DAA: diacetone alcohol
*5: DMAc: 디메틸아세트아미드* 5: DMAc: Dimethylacetamide
[실시예 7~12 및 비교예 3~4] 근적외선 흡수 필터 No.1~No.6 및 비교 근적외선 흡수 필터 No.1~No.2의 제조 [Examples 7 to 12 and Comparative Examples 3 to 4] Production of near infrared ray absorbing filters No. 1 to No. 6 and comparative near infrared ray absorbing filters No. 1 to No. 2
토레이사 제품 PET필름인 루미라 U98 위에 실시예 1~6에서 얻어진 도료 No.1~No.6 및 비교예 1~2에서 얻어진 비교 도료 No.1~No.2의 2.5mL를 적하하고, #14 바코터(bar coater)를 이용하여 도포했다. 그 후, 100℃에서 15분간 건조하여, 근적외선 흡수 필터 No.1~No.6 및 비교 근적외선 흡수 필터 No.1~No.2를 제조했다. 2.5 mL of Comparative Pigment Nos. 1 to 2 obtained in Examples 1 to 6 and Comparative Examples 1 to 2 obtained in Examples 1 to 6 were dropped onto a PET film, 14 < / RTI > bar coater. Thereafter, it was dried at 100 DEG C for 15 minutes to prepare near infrared ray absorbing filters No. 1 to No. 6 and comparative near infrared ray absorbing filters No. 1 to No. 2.
[평가예 1~6 및 비교 평가예 1~2] 근적외선 흡수 필터 No.1~No.6 및 비교 근적외선 흡수 필터 No.1~No.2의 내광성 시험 [Evaluation Examples 1 to 6 and Comparative Evaluation Examples 1 and 2] The near infrared ray absorption filters No. 1 to No. 6 and the comparative near infrared ray absorption filters No. 1 to No. 2 were subjected to a light resistance test
실시예 1~6에서 얻어진 근적외선 흡수 필터 No.1~No.6 및 비교예 1~2에서 얻어진 비교 근적외선 흡수 필터 No.1~No.2에 대하여, 스가시켄키 제품 크세논 내광성 시험기 테이블 선(Table Sun)XT-1500L로 25시간 내광성 시험을 실시하고, 1000㎚에서의 흡광도 잔존율을 평가했다. 흡광도 잔존율은 시험 전의 흡광도에 대한 시험 후의 흡광도의 비율로서 산출했다. 평가 결과를 [표 2]에 나타낸다. Infrared absorbing filters No. 1 to No. 2 obtained in the near infrared ray absorbing filters No. 1 to No. 6 and Comparative Examples 1 and 2 obtained in Examples 1 to 6 were measured with a table line Xenon light resistance tester manufactured by Suga Shikeki Co., Sun) XT-1500L for 25 hours, and the absorbance remaining ratio at 1000 nm was evaluated. The absorbance remaining ratio was calculated as a ratio of the absorbance after the test to the absorbance before the test. The evaluation results are shown in [Table 2].
상기 [표 2]의 결과로부터, 본 발명의 근적외선 흡수 필터는 내광성이 높은 것이 명백하다. From the results of the above [Table 2], it is clear that the near-infrared absorbing filter of the present invention has high light resistance.
Claims (4)
상기 적외선 흡수 색소(A)가 디임모늄 화합물인 것을 특징으로 하는 도료. The method according to claim 1,
Wherein the infrared absorbing dye (A) is a diimmonium compound.
상기 디임모늄 화합물이 하기 일반식(I)로 표시되는 디임모늄 화합물인 것을 특징으로 하는 도료.
(식 중, R11, R12, R13, R14, R15, R16, R17 및 R18은 각각 독립적으로, 수소원자 또는 치환기를 가져도 되는 탄소원자수 1~10의 알킬기를 나타내고, R19, R20, R21 및 R22는 각각 독립적으로, 수소원자, 할로겐원자, 치환기를 가져도 되는 탄소원자수 1~10의 알킬기 또는 치환기를 가져도 되는 아미노기를 나타내고, 상기 알킬기 중의 메틸렌기는 -O- 또는 -CH=CH-로 치환되어 있어도 되고, t는 1~4의 수를 나타내고, Anq-는 q가의 음이온을 나타내고, q는 1 또는 2를 나타내고, p는 전하를 중성으로 유지하는 계수를 나타낸다.) 3. The method of claim 2,
Wherein the diimmonium compound is a diimmonium compound represented by the following general formula (I).
(Wherein R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 and R 18 each independently represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms which may have a substituent, R 19 , R 20 , R 21 and R 22 each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 10 carbon atoms which may have a substituent or an amino group which may have a substituent, O- or -CH = CH-, t represents a number of 1 to 4, An q- represents an anion of q, q represents 1 or 2, p represents a charge retained in a neutral state Coefficient.)
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JPH0751555B2 (en) * | 1992-04-15 | 1995-06-05 | キヤノン株式会社 | Diimonium salt compound |
JP3199139B2 (en) * | 1993-01-21 | 2001-08-13 | キヤノン株式会社 | Infrared absorbing compound and optical recording medium using the same |
JPH06256754A (en) * | 1993-03-04 | 1994-09-13 | Canon Inc | Infrared ray-absorbing compound and optical recording medium using the same |
JPH07133437A (en) * | 1993-11-09 | 1995-05-23 | Canon Inc | Infrared-absorbing compound and optical recording medium produced by using the compound |
JP3361176B2 (en) * | 1994-03-30 | 2003-01-07 | セントラル硝子株式会社 | UV and infrared absorbing transparent body |
EP1564260B1 (en) * | 2002-11-22 | 2013-03-13 | Japan Carlit Co., Ltd. | Coloring matter absorbing near-infrared ray and filter for cutting off near-infrared ray |
US7332257B2 (en) * | 2003-07-11 | 2008-02-19 | Asahi Glass Company, Limited | Composition for optical film, and optical film |
JP5004506B2 (en) * | 2005-06-24 | 2012-08-22 | 株式会社Adeka | Optical filter |
-
2013
- 2013-10-09 JP JP2014544403A patent/JP6301841B2/en active Active
- 2013-10-09 CN CN201380033258.5A patent/CN104379688B/en not_active Expired - Fee Related
- 2013-10-09 WO PCT/JP2013/077446 patent/WO2014069198A1/en active Application Filing
- 2013-10-09 KR KR1020147035974A patent/KR20150080451A/en not_active Application Discontinuation
- 2013-10-16 TW TW102137340A patent/TWI596173B/en active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102009974B1 (en) | 2018-10-31 | 2019-08-12 | (주)케미그라스 | Near infrared ray blocking lens |
Also Published As
Publication number | Publication date |
---|---|
CN104379688B (en) | 2018-05-25 |
TWI596173B (en) | 2017-08-21 |
CN104379688A (en) | 2015-02-25 |
TW201430080A (en) | 2014-08-01 |
WO2014069198A1 (en) | 2014-05-08 |
JP6301841B2 (en) | 2018-03-28 |
JPWO2014069198A1 (en) | 2016-09-08 |
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