KR20140129495A - Resin composition for forming barrier rib of electronic paper - Google Patents

Abstract

The present invention relates to a resin composition for forming a barrier rib of an electronic paper, and more specifically, to a resin composition for forming a barrier rib of an electronic paper, which comprises urethane-based polyfunctional (meta)acrylate monomers. The composition of the present invention optimizes compatibility in the composition and can provide a barrier rib which has excellent insulation, thermal resistance, flatness, chemical resistance, and process convenience, thereby being used for manufacturing an electronic paper, a flexible display, an electrophoretic display (EPD), an organic light emitting diode (OLED) and the like.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a resin composition for forming electronic paper barrier ribs,

The present invention relates to a resin composition for forming electron barrier ribs, and more particularly, to a resin composition for forming barrier ribs having excellent insulating properties, heat resistance, flatness, chemical resistance, and processability including urethane-based polyfunctional (meth) acrylate monomers And to a resin composition for forming electronic paper barrier ribs.

Recently, electronic paper (electric paper, epaper) has been actively studied as a new display device having advantages of display elements and printing paper. Electronic paper is a type of reflective display that does not require a back light and has excellent viewing angle and resolution. In addition, electronic paper is thinner than conventional display devices, is advantageous in large area, consumes less power, has less manufacturing cost, and has a simple process, which is expected to have a large ripple effect.

On the other hand, the barrier rib formation technique is optimized for a flexible display manufacturing process such as an electric field driving display device, thereby restricting the operation region of the driving body in the display pixel after the panel manufacture, thereby preventing malfunction in driving the device, And the inner thickness of the pixel is determined by the formed partition wall thickness.

However, the conventional composition for forming barrier ribs often exhibits poor surface curability after pre-exposure or does not disappear after curing. In order to form thick barrier ribs, a high viscosity is required and the process is difficult. Problems have also arisen.

Accordingly, research has been continued to provide a composition having improved process convenience such that a thick barrier can be formed with a composition having a relatively low viscosity.

SUMMARY OF THE INVENTION In order to solve the above problems, the present invention has been made to solve the above-mentioned problems occurring in the prior art, and it is an object of the present invention to provide a method for forming an electronic paper partition wall, which is excellent in insulating property, heat resistance, flatness, chemical resistance, And to provide a composition.

It is another object of the present invention to provide an electronic paper barrier manufacturing method using the composition for forming an electronic paper barrier and an electronic paper including the cured body of the composition for forming an electronic paper barrier as a barrier rib.

In order to achieve the above object,

a) 10 to 75% by weight of an acrylic copolymer resin;

b) 10 to 75% by weight of a urethane-based polyfunctional (meth) acrylate monomer;

c) 0.1 to 20% by weight of a photoinitiator; And

d) from 10 to 75%

Wherein the resin composition for forming an electronic paper barrier rib comprises:

The present invention also provides a method of forming a barrier rib of an electronic paper, wherein the composition for forming an electronic paper barrier is used.

The present invention also provides an electronic paper substrate characterized in that the electronic paper contains a cured product of a composition for forming barrier ribs as a partition wall.

The resin composition and method for forming electronic paper barrier ribs according to the present invention reduce the coating thickness variation by lowering the viscosity compared to the conventional barrier rib composition and optimize the compatibility in the composition to provide insulating and thermosetting resins having a viscosity of 100 to 5,000 cps, (EPD), organic electroluminescent device (OLED) and the like, which can be used for electronic paper and flexible display, because it can provide barrier ribs having excellent heat resistance, flatness, chemical resistance and process convenience. Lt; / RTI >

BEST MODE FOR CARRYING OUT THE INVENTION The composition for forming an electronic paper barrier rib of the present invention comprises a) an acrylic copolymer resin; b) urethane-based polyfunctional (meth) acrylate monomers; c) photoinitiators; And d) a solvent, e) an acrylic monomer containing a hydroxyl group; f) Surfactants; And g) pigments.

Hereinafter, the components included in the composition for forming an electron barrier of the present invention will be described in detail.

a) Acrylic copolymer resin

In the resin composition for forming a barrier rib of the present invention, the acrylic copolymer resin serves to facilitate formation of a predetermined pattern that does not generate scum when developing. The acrylic copolymer resin is preferably used in an amount of 10 to 75% by weight, more preferably 20 to 60% by weight. When the content of the acrylic copolymer resin is less than 10%, the developability deteriorates and the pattern formation becomes difficult. When the content of the acrylic copolymer resin exceeds 75% by weight, the viscosity of the composition is lowered,

The acrylic copolymer preferably has a polystyrene reduced weight average molecular weight (Mw) of 2,000 to 20,000, more preferably 3,000 to 10,000. In the case of the film obtained with the Mw of less than 2,000, the developability, the residual film ratio and the like tend to decrease, the pattern shape and the heat resistance tends to be poor, and when Mw exceeds 20,000, the sensitivity tends to decrease or the pattern shape tends to fall. Such an acrylic copolymer may include: i) an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride, or a mixture thereof; Ii) an epoxy group-containing unsaturated compound; And iii) an olefinically unsaturated compound as a monomer, in the presence of a solvent and a polymerization initiator.

b) urethane-based polyfunctional (meth) acrylate monomers

The urethane-based polyfunctional (meth) acrylate monomer is preferably used in an amount of 10 to 75% by weight, more preferably 20 to 60% by weight. When the amount of the urethane-based polyfunctional (meth) acrylate monomer is less than 10% by weight, the viscosity of the urethane-based multi-functional (meth) acrylate monomer may be too low to form a thin film having a desired thickness. When the amount is more than 75% by weight, You can give a bunch.

The urethane-based multi-functional (meth) acrylate monomer is characterized by being a compound represented by the following formula (1)

[Chemical Formula 1]

Wherein R ₁ to R ₃ are each independently a compound of the following formula 2,

(2)

M is 0 or 1, n is an integer of 0 to 4, R ₄ is H or CH ₃ , and R ₁ to R ₃ are not the same It is possible.

Preferably, the urethane-based polyfunctional (meth) acrylate monomer is 1,3,5-tris (2-hydroxyethyl) isocyanurate triacrylate.

c) photoinitiator

In the resin composition for forming a barrier rib of the present invention, the photoinitiator may be used in an amount of 0.1 to 20% by weight, preferably 1 to 6% by weight. When the amount of the photoinitiator is less than 0.1% by weight, the photo-curing is slow or difficult. When the amount is more than 20% by weight, the curing margin tends to decrease and the storage stability tends to deteriorate.

Specific examples of the photoinitiator include 2,2'-diethoxyacetophenone, 2,2'-dibutoxyacetophenone, 2-hydroxy-2-methylpropriophenone, pt-butyltrichloroacetophenone, Dichloroacetophenone, benzophenone, 4-chloroacetophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, 2,2 ' 2-methyl-1- (4 (methylthio) phenyl) -2-morpholinopropane-1-one, 2-benzyl- -Morpholinophenyl) -butan-1-one; Benzophenone, benzoyl benzoic acid, methyl benzoyl benzoate, 4-phenyl benzophenone, hydroxybenzophenone, acrylated benzophenone, 4,4'-bis (dimethylamino) benzophenone, 4,4'- Benzophenone compounds such as phenone; Thioxanthone, 2-crothioxanthone, 2-methylthioxanthone, isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone, 2- Thioxanthone compounds such as thanthone; Benzoin compounds such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether and benzyl dimethyl ketal; 2,4,6-trichloro-s-triazine, 2-phenyl 4,6-bis (trichloromethyl) -s-triazine, 2- (3 ', 4'-dimethoxystyryl) (Trichloromethyl) -s-triazine, 2- (p-methoxyphenyl) -4,6-bis (trichloromethyl) 4,6-bis (trichloromethyl) -s-triazine, 2-phenyl 4,6-bis (trichloromethyl) Tri (trichloromethyl) -6-styryl s-triazine, 2- (naphtho l-yl) -4,6-bis (trichloromethyl) -s- tri Azine, 2- (4-methoxynaphtho 1-yl) -4,6-bis (trichloromethyl) -s-triazine, 2-4-trichloromethyl (piperonyl) And triazine-based compounds such as 2-4-trichloromethyl (4'-methoxystyryl) -6-triazine.

These photoinitiators may also be commercially available initiators. Examples thereof include TFE-triazine (2- [2- (furan-2-yl) vinyl] -4,6-bis (trichloromethyl ) -1,3,5-triazine), TME-triazine (2- [2- (5-methylfuran-2-yl) vinyl] -4,6-bis (trichloromethyl) Triazine), MP-triazine (2- (4-methoxyphenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine), Midorikaga TAZ-113 2- (3,4-dimethoxyphenyl) ethenyl] -4,6-bis (trichloromethyl) -1,3,5-triazine), TAZ- Dimethoxyphenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine), benzophenone, 4,4'-bisdiethylaminobenzophenone, methyl- Benzoyl-4'-methyldiphenylsulfide, 4-phenylbenzophenone, ethylmihiller ketone, 2-chlorothioxanthone, 2-methylthioxanthone, 2-isopropylthioxanthone, Ton, 2,4-diethylthioxanthone, 1-chloro-4-propoxythioxanthone, 2-methylthio Benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyldimethyl ketal, 1,1,1-trichlorobenzene, and the like. Benzoylbiphenyl, 4-benzoylbiphenyl ether, 1,4-benzoylbenzene, benzyl benzoyl benzoate, methyl benzoyl benzoate, methyl benzoyl benzoate, 2-benzoyl naphthalene, 2-chloroacridone, [4- (methylphenylthio) phenyl] phenylmethane), 2-ethyl anthraquinone, 2,2- -Tetrakis (3,4,5-trimethoxyphenyl) 1,2'-biimidazole, 2,2-bis (o-chlorophenyl) 4,5,4 ', 5'- , 2'-biimidazole, tris (4-dimethylaminophenyl) methane, ethyl 4- (dimethylamino) benzoate, 2- (dimethylamino) ethylbenzoate, butoxyethyl 4- Eight, Irgacure < (R) > 2959 (1- [4- (2- 1-propan-1-one, Irgacure (R) 184 (1-hydroxycyclohexyl phenyl ketone), Irgacure (R) 500 2-diphenylethan-1-one), Irgacure (registered trademark) 369 (2-benzyl-2 1-dimethylamino-1- (4-morpholinophenyl) butanone-1), Irgacure (R) 907 , Irgacure (registered trademark) 819 (bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide, Irgacure (registered trademark) 1800 (bis (2,6- dimethoxybenzoyl) -Cyclohexyl-phenyl-ketone), Irgacure (registered trademark) 1800 (bis (2,6-dimethoxybenzoyl) -2,4,4-trimethyl- pentylphosphine oxide, Methyl-1-phenyl-1-propan-1-one), Irgacure (registered trademark) OXE01 (1,2-octanedione, 1- [4- (phenylthio) phenyl] -2- (O-benzoyloxime), Darocu Irgacure 占 379, Darocur 占 1116, 1398, 1174 and 1020, CGI242 (R) 占 1173 (2-hydroxy- (2-methylbenzoyl) -9H-carbazol-3-yl] -1- (O-acetyloxime), Lucirin TPO (2,4 , 6-trimethylbenzoyldiphenylphosphine oxide), LucirinTPOL (2,4,6-trimethylbenzoyl phenyl ethoxyphosphine oxide), ESACUR ESACURE1001M (1- [4-benzoylphenylsulfanyl] N-1414 (carbazole-phenone-type) available from Asahi Denka Co., Ltd., , ADEKA OPTOMER (registered trademark) N-1717 (acridine type), ADEKA OPTOMER (registered trademark) N-1606 (triazine type) and the like. These may be used singly or in combination of two or more.

d) Solvent

In the resin composition for forming a barrier rib of the present invention, the solvent is used in a proportion of 10 to 75% by weight, preferably 20 to 60% by weight. If the content of the solvent is too small, the composition for forming the barrier ribs may not be uniformly mixed and the film surface may be uneven during coating. If the content is too large, a sufficient film thickness may not be formed.

The solvent is not particularly limited as long as it can dissolve the above-described materials, and includes alcohols such as methanol and ethanol; Ethers such as tetrahydrofuran; Glycol ethers such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether; Ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate; Diethylene glycol such as diethylene glycol monomethyl ether, diethylene glycol monoethyl ether and diethylene glycol dimethyl ether; Propylene glycol monoalkyl ethers such as propylene glycol methyl ether, propylene glycol ethyl ether, propylene glycol propyl ether and propylene glycol butyl ether; Propylene glycol alkyl ether acetates such as propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, propylene glycol propyl ether acetate and propylene glycol butyl ether acetate; Propylene glycol methyl ether propionate, propylene glycol ethyl ether propionate, propylene glycol propyl ether propionate, propylene glycol butyl ether propionate propylene glycol alkyl ether acetates; Aromatic hydrocarbons such as toluene and xylene; Ketones such as methyl ethyl ketone, cyclohexanone, and 4-hydroxy 4-methyl 2-pentanone; And an organic solvent such as methyl acetate, ethyl acetate, propyl acetate, butyl acetate, ethyl 2-hydroxypropionate, methyl 2-hydroxy 2-methylpropionate, ethyl 2-hydroxy 2-methylpropionate, methylhydroxyacetate, Hydroxypropionate, butyl 3-hydroxypropionate, butyl 3-hydroxypropionate, butyl 3-hydroxypropionate, butyl 3-hydroxypropionate, butyl 3-hydroxypropionate, Methyl methoxyacetate, methyl methoxyacetate, ethyl methoxyacetate, propyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, ethoxyacetate, butyl ethoxyacetate, methylpropoxyacetate , Propoxy ethyl acetate, propoxy propyl acetate, propyl propionate, methyl butoxy butyrate, ethyl butoxy propionate, butyl butoxy butyrate, methyl 2-methoxypropionate, 2-methoxypropyl Propyl methoxy propionate, propyl methoxy propionate, propyl methoxy propionate, propyl methoxy propionate, propyl propionate, ethyl propionate, propyl 2-ethoxypropionate, propyl 2-methoxypropionate, butyl 2-methoxypropionate, Butoxy propionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, propyl 3-methoxypropionate, butyl 3-methoxypropionate, Propyl propionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, propyl 3-ethoxypropionate, butyl 3-ethoxypropionate, methyl 3-propoxypropionate, ethyl 3-propoxypropionate, Esters such as butyl 3-propoxypropionate, methyl 3-butoxypropionate, ethyl 3-butoxypropionate, propyl 3-butoxypropionate and butyl 3-butoxypropionate have. It is preferable to use a compound selected from the group consisting of glycol ethers, ethylene glycol alkyl ether acetates, and diethylene glycol, which are easy to dissolve, react with each component, and form a coating film.

e) an acrylic monomer containing a hydroxyl group

The resin composition for forming a barrier rib of the present invention may further contain an acrylic monomer containing a hydroxyl group depending on the developability of the acrylic copolymer resin. The amount of the acrylic monomer to be used is preferably 0.1 to 10% by weight, more preferably 1 By weight to 8% by weight. The amount of the acrylic monomer containing the hydroxyl group is used depending on the developability of the acrylic copolymer resin. The lower the developability of the acrylic copolymer resin, the higher the acrylic monomer content of the hydroxyl group can be, and the developing property can be improved. If the developability of the acrylic copolymer resin is sufficiently excellent, the acrylic monomer containing the hydroxyl group may not be used. On the contrary, when the content of the acrylic monomer containing a hydroxyl group is more than 10% by weight, the surface hardening property of the barrier rib is not excellent or the adhesive property does not disappear after curing.

f) Surfactants

The resin composition for forming a barrier rib of the present invention may further contain, as a surfactant, a fluorine-based surfactant, a silicone-based surfactant, or a mixture thereof. The amount thereof is preferably 0.01 to 10% by weight, more preferably 0.1 To 6% by weight. If the content of the surfactant is less than 0.01% by weight, the effect of uniformity of coating may be insufficient. If the content of the surfactant is more than 10% by weight, the curing margin may not be secured. The surfactant used in the present invention may be used alone or in combination of two or more.

Examples of the fluorochemical surfactant used in the present invention include Fluorad FC-430, FC-431 (Sumitomo 3M), Surflon S-382 (Asahi Glass Co.), EFTOP PF-6320, PF-656, and PF-6520 (all available from OMNOVA, Inc.), trade names PF-636, PF- DSA-403, and DS-451 (both manufactured by Daikin Industries, Ltd.), trade name Megapack 171, trade name " Megafac 171 ", trade names: Fotan FT250, FT251 and DFX18 172, 173, 178K and 178A (all manufactured by Dainippon Ink and Chemicals, Inc.). Examples of the nonionic silicon surfactants include SI-10 series (manufactured by Takemoto Yushi Co., Ltd.), Megapac Painter 31 Examples of the silicone surfactant include DC190, Q2-5212, FF-400, Q4-3667, and FZ-2122 (all manufactured by Dow Corning Toray Co., Ltd.), and the like. The There.

g) Pigment

The resin composition for forming a barrier rib of the present invention may further contain a pigment for controlling the contrast of the composition for forming a barrier rib, and may be selected from the viewpoint of solubility and heat resistance, and the amount thereof is preferably 0.01 to 10% by weight .

Examples of the pigment include pigments such as pyrazole azo pigments, anilino azo pigments, aryl azo pigments, triphenylmethane pigments, anthraquinone pigments, anthraquinone pigments, anthrapyridone pigments, benzylidene pigments, oxolin pigments, pyrazolitriazo pig pigments, , Phenothiazine-based, pyrrole-pyrazole-zometine-based, xanthene-based, phthalocyanine-based, benzopyran-based, indigo-based and the like.

The resin composition for forming a barrier rib of the present invention comprising the above components may further contain a photosensitizer if necessary.

The photosensitizer has an appropriate sensitivity to the ultraviolet wavelength to be used and transfers energy to the photoinitiator through a photoinitiation reaction faster than the photoinitiator to help the photoinitiator reaction rate of the photoinitiator. The photosensitizer is preferably contained in the resin composition for forming a barrier rib of the present invention in an amount of 0.001 to 10% by weight. When the content of the photosensitizer is within the above range, the photosetting rate of the resin composition for forming a barrier rib is better. The photosensitizer may be selected from the group consisting of DETX, ITX, N-butyl acridone, and 2-ethylhexyl-dimethylaminobenzoate.

In the resin composition for forming a barrier rib of the present invention, a compatibilizing additive such as a thermal polymerization inhibitor and a defoaming agent may be further added to the above composition as required.

The composition for forming a barrier rib of the present invention has a viscosity of 100 to 5000 cps, more preferably 300 to 1000 cps. Within the above range, the composition for forming a barrier rib has insulation, heat resistance, flatness, chemical resistance, process convenience (EPD), an organic electroluminescent device (OLED), and the like, which can provide electronic paper and flexible display

The above-mentioned resin composition for forming a barrier rib of the present invention is applied onto a substrate (for example, a silicon substrate, a ceramic substrate, a metal layer, a polymer layer or the like) by a suitable method such as spin coating, roller coating, slit coating, - After coating with a thickness of 100 μm, the pattern is transferred by exposing with a mask of the desired shape. As the light source used for the exposure, for example, UV of 190 to 450 nm, preferably 200 to 400 nm is used, and electron beam irradiation is also possible. Then, in order to remove the pattern of the unexposed portion, it is developed with an alcohol such as isopropyl alcohol, a glycol or a basic aqueous solution, and the developed pattern is subjected to a thermal process at 100 to 250 ° C.

The resin composition for forming a barrier rib of the present invention can be applied not only to an electronic paper including barrier ribs but also to a flexible display, an organic electroluminescence device (OLED), an electrophoretic device (EPD) Are excellent in insulating property, heat resistance, flatness, chemical resistance, and process convenience.

Hereinafter, the present invention will be described in more detail with reference to the following examples. However, the scope of the present invention is not limited to the following examples.

Example 1

(a) 20% by weight of an acrylic copolymer resin;

(b) 38% by weight of 1,3,5-tris (2-hydroxyethyl) isocyanurate (1,3,5-Tris (2-hydroxyethyl) isocyanurate) triacrylate;

(c) 1% by weight of 2-hydroxy-3-phenoxy propyl acrylate;

(d) 0.5% by weight of photoinitiator;

(e) 40% by weight of propylene glycol monomethyl ether acetate; And

(f) 0.5% by weight of pigment was uniformly mixed in a dark room at room temperature for 6 hours or more to prepare a composition.

Example 2

The procedure of Example 1 was repeated except that 1 wt% of pentaerythritol triacrylate was used instead of 1 wt% of 2-hydroxy-3-phenoxypropyl acrylate in Example 1 Thereby preparing a resin composition for forming barrier ribs.

Comparative Example 1

Except that 38% by weight of dipentaerythritol hexaacrylate was used instead of 38% by weight of 1,3,5-tris (2-hydroxyethyl) isocyanurate triacrylate in Example 1 Was prepared in the same manner as in Example 1 to prepare a resin composition for forming barrier ribs.

Comparative Example 2

The procedure of Example 1 was repeated except that 1 weight% of trimethylolpropane triacrylate was used instead of 1 weight% of 2-hydroxy-3-phenoxypropyl acrylate in Comparative Example 1 Thereby preparing a resin composition for forming barrier ribs.

Test Example

For the formation of the barrier ribs, the resin composition for barrier rib formation prepared in Examples 1 and 2 and Comparative Examples 1 and 2 was applied on a glass substrate to a thickness of 20 μm, Lt; / RTI > The composition containing the organic solvent is subjected to a soft baking process at about 100 ° C to remove the organic solvent. After removing the solvent, the mask is raised, and ultraviolet rays having a wavelength of about 365 nm are irradiated to form an unexposed portion ) To remove the unexposed pattern portion using a TMAH solvent to form a composition for forming each barrier rib on the glass substrate. In some cases, a high temperature curing process of 150 DEG C or more is further performed to further cure the organic film.

The heat resistance and chemical resistance of the barrier rib pattern thus formed were evaluated in the following manner, and furthermore, the flatness and the insulating property of the thin film which was subjected to the entire exposure without the mask were evaluated in the following manner. Respectively.

A) Developability

When the residual film ratio of the pattern after the pattern development process (after development / thickness after development is 100% of the thickness after development) is 80% or more and the pattern is formed without scum is rated as O, the residual film ratio is 80 to 50% , The case where the residual film ratio was less than 50%, or the case where the pattern development after the development was not carried out properly was indicated by x.

B) Heat resistance

The formed thin film was collected and the weight loss was measured with a thermogravimetric analyzer (TGA) while maintaining the temperature at 230 DEG C for 30 minutes. A weight loss of less than 2% was denoted by o, a weight loss of at least 2% was denoted by?, A case of less than 5% was denoted by?, And a case of weight loss of at least 5% was denoted by x.

C) Chemical resistance

The resin composition for forming a barrier rib was cured to prepare a coating film having a thickness of 3 μm. The film was dipped in organic solvent n-methylpyrrolidone (NMP) at 70 ° C for 5 minutes, rinsed with ultrapure water ), And the rate of change of the film thickness before and after the NMP treatment was measured. In this case, the case where the rate of change of the film thickness is 0-10% is represented by?, The case of 10-30% is indicated by?, And the case of 30% or more is represented by x.

D) Flatness

After forming a thin film on a glass substrate using the resin composition for forming a barrier rib, the thickness of about 100 points was measured by a thickness measuring device such as an optical equipment. When the difference was less than 2%,?, Less than 3% And less than 5%.

ㅁ Insulation

Using the thin film of the resin composition for forming a barrier rib formed by the above process, a TFT element having an insulating film having a thickness of 1.0 μm and an area of 1 mm 2 was formed, and the insulating property was measured through a 1-V curve. The breakdown voltage was measured to be 1 MV / cm or more and the leakage current density (Leakage Current Dinsity) was measured to be less than 10-9 A / cm 2. The breakdown voltage was measured to be less than 1 MV / The leakage current density was measured and the case where the leakage current density was 10-9 A / cm 2 or more was indicated by x.

F) Viscosity

The viscosity of the resin composition for forming a barrier rib was measured at 30 캜 using a Ubbelohde viscometer manufactured by CANNON.

division Developability Heat resistance Chemical resistance Flatness Insulation Viscosity Example 1 ○ ○ ○ ○ ○ 382 cps Example 2 ○ ○ ○ ○ ○ 390 cps Comparative Example 1 × ○ ○ ○ ○ 324cps Comparative Example 2 × × × △ × 385 cps

As shown in Table 1, it was confirmed that the composition for forming a barrier rib according to the present invention had excellent developability, heat resistance, chemical resistance, flatness and insulation.

Claims (9)

a) 10 to 75% by weight of an acrylic copolymer resin;
b) 10 to 75% by weight of a urethane-based polyfunctional (meth) acrylate monomer;
c) 0.1 to 20% by weight of a photoinitiator; And
d) from 10 to 75%
Wherein the resin composition for forming the barrier ribs of the electronic paper is a resin composition. The method according to claim 1,
0.1 to 20% by weight of an acrylic monomer containing a hydroxyl group, 0.01 to 10% by weight of a surfactant or 0.01 to 10% by weight of a pigment. The method according to claim 1,
Wherein the acrylic copolymer resin has a polystyrene reduced weight average molecular weight (Mw) of 2,000 to 20,000. The method according to claim 1,
Wherein the urethane-based polyfunctional (meth) acrylate monomer is a compound represented by the following formula (1):
[Chemical Formula 1]

Wherein R ₁ to R ₃ are each independently a compound of the following formula 2,
(2)

M is 0 or 1, n is an integer of 0 to 4, R ₄ is H or CH ₃ , and R ₁ to R ₃ are not the same It is possible. 5. The method of claim 4,
Wherein the urethane-based polyfunctional (meth) acrylate monomer is 1,3,5-tris (2-hydroxyethyl) isocyanurate. Resin composition for forming paper barrier ribs. The method according to claim 1,
Wherein the viscosity of the resin composition is 100 to 5000 cps. A method for forming a barrier rib of an electronic paper, characterized by using the composition for forming an electronic paper barrier rib according to any one of claims 1 to 6. An electronic paper substrate characterized in that the electronic paper according to any one of claims 1 to 6 comprises a cured body of a composition for forming barrier ribs as a partition wall. 9. The method of claim 8,
Wherein the thickness of the partition wall is 10 to 100 mu m.