KR20140038242A

KR20140038242A - Display device having minimizded bezel

Info

Publication number: KR20140038242A
Application number: KR1020120104734A
Authority: KR
Inventors: 정보영; 안정은
Original assignee: 엘지디스플레이 주식회사
Priority date: 2012-09-20
Filing date: 2012-09-20
Publication date: 2014-03-28
Also published as: KR102007662B1

Abstract

The present invention is to provide a display device having a minimized bezel, which is capable of preventing a touch signal from being delayed. The touch device comprises first and second substrates including a display part and an outer part; a touch sensor formed in the display part; and a sensor wire for transmitting a touch signal sensed by the touch sensor formed in the outer part of the first substrate, wherein the sensor wire includes two layers which are electrically connected to each other and between which an insulating layer is interposed.

Description

Display element with minimized bezel {DISPLAY DEVICE HAVING MINIMIZDED BEZEL}

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a display element, and in particular, by forming a plurality of layers of the transmission wiring of the touch wiring of the touch sensor formed in the display area, the display can reduce the width of the transmission wiring and minimize the signal delay of the transmission wiring. It relates to an element.

Typically, the display device is provided with a separate input device to input a signal through the input device and display the desired information through the display device correspondingly. However, with the development of mobile electronic devices such as portable widths and tablet PCs, the application of a touch panel that recognizes an input by touching a screen of a display element with a human hand or a separate input means for convenience of portability or simplification of input. It is becoming.

Types of the touch panel include an add-on method attached to an outer surface of the display device, an on-cell method for depositing a touch panel on an upper surface of the display device.

In the add-on type touch panel, since the touch panel is formed in an external form, an adhesive layer is required between the touch panel and the display device, so that a separate attachment process is required and the thickness of the entire display device is increased due to the touch panel. There was a problem. In addition, the number of processes increases due to the attachment process between the touch panel and the display device, thereby increasing the process time and cost. Meanwhile, the on-cell touch panel has an advantage of being integrated with the display device. However, since touch electrodes are formed on the upper substrate of the display device, defects such as foreign substances and scratches are generated due to exposure of the touch electrodes. In addition, since the upper substrate of the display device is integrally formed, there is a limit in reducing the thickness. In addition, since the light incident from the outside is reflected on the touch panel, there is a disadvantage that the visibility of the user is lowered.

In order to solve the problems of the add-on and on-cell touch panels, in-cell touch panels have recently been proposed. The in-cell touch panel is to place the touch sensor inside the display element, it is possible to reduce the thickness of the entire display device compared to the on-cell method, and the light input from the outside is reflected by the touch panel It becomes possible to prevent the fall of visibility by.

However, such an in-cell touch panel has the following problems.

In the in-cell touch panel, a touch electrode is formed on the display unit inside the display element, and a wire for transmitting the touch signal must be disposed on the outer portion formed outside the display unit.

By the way, the area of the outer part of the display element is limited. Therefore, in order to form a plurality of wirings in a limited area, the width of the wiring must be reduced. In this case, there is a problem that signal delay occurs due to the resistance of the wiring. When the width of the wiring is increased to overcome this signal delay, the area of the outer portion is increased. In particular, in recent years, miniaturization of the bezel including the outer part has been developed to miniaturize the electric equipment and to enhance the appearance, and the increase in the wiring width makes this development impossible.

SUMMARY OF THE INVENTION The present invention has been made in view of the above, and forms a plurality of signal paths by forming a plurality of layers of wires for transmitting a touch signal, thereby preventing signal delay and minimizing the area of the outer area where the wires are arranged to narrow the bezel. It is an object to provide a display device having a.

In order to achieve the above object, the display device according to the present invention comprises a first substrate and a second substrate consisting of a display portion and the outer portion; A touch sensor formed on the display unit; The sensor wiring is formed on the outer side of the first substrate and transmits the touch signal sensed by the touch sensor, and the sensor wiring includes a plurality of layers electrically connected with an insulating layer therebetween.

The touch sensor includes a plurality of sensor electrodes extending in a predetermined direction in a band shape on a display portion of the first substrate, and driving electrodes formed on an outer surface of the second substrate and extending in a vertical direction with the sensor electrode in a band shape. The sensor electrode and the driving electrode are made of a transparent conductive material.

The sensor wiring may include a first sensor wiring formed on a first substrate; And a second sensor wiring formed on the protective layer and electrically connected to the first sensor wiring through a contact hole formed in the protective layer, wherein the widths of the first sensor wiring and the second sensor wiring are the same. .

In the present invention, the touch wiring is formed in a plurality of layers to form a plurality of signal movement paths, thereby preventing signal delay due to resistance.

In addition, in the present invention, since the width of the touch wiring can be reduced, the width of the outer portion where the touch wiring is disposed can be minimized and thus the bezel can be minimized.

1 is a schematic plan view schematically showing the structure of a display device according to the present invention;
2 is a cross-sectional view illustrating a structure of a display device according to an exemplary embodiment of the present invention.
3 is a view illustrating a structure of a display device in which touch wiring is formed of a single layer.
4A is a view illustrating a touch wiring formed of a single layer.
Figure 4b is a view showing a touch wiring of the present invention composed of a plurality of layers.
5A-5E illustrate a method of manufacturing a display device according to the present invention.
6 is a cross-sectional view illustrating a structure of a display device according to another exemplary embodiment of the present invention.

Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

The present invention provides an in-cell touch panel in which a touch sensor is embedded in the display element. In particular, the driving electrode and the sensor electrode are not all formed inside the display element, but the driving electrode is formed on the upper substrate of the display element and the sensor electrode is formed on the thin film transistor substrate.

In the general in-cell touch panel, both the driving electrode and the sensor electrode are formed inside the display element. In the touch panel of the present invention, only the sensor electrode is formed inside the display element. It can be said to be a kind of hybrid structure that takes advantage of cellular.

In particular, in the present invention, by reducing the width of the sensor wiring formed in the outer portion it is possible to minimize the bezel by minimizing the area of the outer portion. To this end, in the present invention, by forming the sensor wiring in a plurality of layers, the wiring width can be minimized and the resistance value can be prevented from increasing. At this time, in the present invention, since the upper layer of the plurality of wirings is formed by the same process as the electrode formation of the display element, the process is not complicated by forming the plurality of sensor wirings.

1 is a view schematically showing the structure of a display device according to the present invention. The display device of the present invention can be applied to various display devices such as a liquid crystal display device, an organic light emitting display device, an electrophoretic display device, and a plasma display device. However, in the following description, a liquid crystal display device is used for convenience of description. Explain. Therefore, the present invention is not limited to the liquid crystal display device but may be applied to various flat panel display devices or other display devices.

As shown in FIG. 1, the display device 1 of the present invention includes a liquid crystal layer between the first substrate 10 and the second substrate 30, the first substrate 10, and the second substrate 30. Not shown).

Since the area of the first substrate 10 is larger than that of the second substrate 30, when the first substrate 10 and the second substrate 30 are bonded to each other, a portion of the first substrate 10 may be partially formed. The second substrate 30 is exposed to the outside without overlapping. The region where the first substrate 10 and the second substrate 30 are bonded to each other is a display unit D in which an actual image is realized, and an area of the first substrate 10 exposed to the outside is an outer portion P.

In the drawing, the outer portion P is formed on both sides and the lower side of the display element 1 with a predetermined width, but may be formed only on one side and the lower side. The configuration of the display unit D and the outer portion P may be variously designed according to the size or model of the display device to be manufactured.

Although not shown in the drawing, a plurality of gate lines and data lines are arranged in the horizontal and vertical directions on the first substrate 10 of the display unit D to define a plurality of pixel regions, and each pixel region is a thin film as a switching element. The transistor is placed. In addition, a common electrode and a pixel electrode are formed in each pixel region, and an image signal is applied through the thin film transistor to form an electric field between the common electrode and the pixel electrode. The arrangement of liquid crystal molecules of the liquid crystal layer is changed by the electric field. An image is displayed by adjusting the transmittance of light passing through the liquid crystal layer.

In addition, the display unit D is formed such that the driving electrode 38 and the sensor electrode 28 are disposed in the vertical direction and the horizontal direction to cross each other. At this time, although not shown in the drawing, the driving electrode 38 is formed on the outer surface of the upper substrate, that is, the surface to which the polarizing plate (not shown) is attached, and the sensor electrode 28 is formed on the inner surface of the lower substrate. The driving electrode 38 and the sensor electrode 28 are electrically insulated from each other.

The driving electrodes 38 and the sensor electrodes 28 are arranged in plural in the vertical direction and the horizontal direction, respectively. That is, the sensor electrode 28 is arranged in parallel with the extending direction of the gate line formed in the display unit D, and the driving electrode 38 is arranged in parallel with the extending direction of the data line. At this time, the driving electrode 38 and the line width are larger than the line width in the vertical direction of the pixel region of the display element and the line width of the sensor electrode 28 is smaller than the line width in the horizontal direction of the pixel region.

In general, the area actually touched by a human hand is much larger than the size of the pixel area. Accordingly, since the area detected by the touch corresponds to the plurality of pixel areas, the touch electrode 38 and the sensor electrode 28 for detecting the touch need not be formed to have a size corresponding to the pixel area. If the size is formed to correspond to the information display area, desired information can be input.

Although both the driving electrode 38 and the sensor electrode 28 may be formed to have a width corresponding to the size of the actual touch area, the area where the real human hand is touched is the driving electrode 38, and thus the driving electrode 38. Is formed to extend in the longitudinal direction to include a plurality of pixel regions, and the sensor electrode 28 is formed in a band shape having a width much smaller than the width of the pixel region to be arranged along the rows of pixels.

At this time, if only one sensor electrode 28 is formed in the area that is actually touched, all the touches can be detected. Therefore, the sensor electrode 28 is not formed one by one along every pixel row but one by one of the plurality of pixel rows.

The driving electrode 38 and the sensor electrode 28 form a touch sensor. The driving electrode 38 and the sensor electrode 28 are formed of a transparent metal oxide such as indium tin oxide (ITO) or antimony tin oxide (ATO) to prevent the aperture ratio of the display device from being lowered. Since a constant current flows through the driving electrode 38 and the sensor electrode 28, when the user touches the screen with a finger or the like, the amount of current is changed by the capacitance flowing in the human body. Detects touch by detecting it.

At this time, since the driving electrode 38 and the sensor electrode 28 are arranged in the longitudinal direction and the horizontal direction, that is, the x, y-direction, the change of the current between the driving electrode 38 and the sensor electrode 28 is detected. Thus, the coordinates of the touched area can be generated.

A plurality of sensor wirings 56 are formed at the outer portions P of both sides of the display portion D. When the sensor wiring 56 is connected to the sensor electrode 28 of the display unit D and makes a touch, the sensor wiring 56 detects corresponding coordinates. In the drawing, the sensor wiring 56 is formed on the outer portion P of both sides of the display portion D, but may be formed only on the outer portion P of one side of the display portion D.

In addition, the driving element 50 and the sensor element 54 are disposed at the outer portion P under the display portion D. The driving device 50 implements an image by applying an image signal to the inside of the display unit D, and is electrically connected to the data line inside the display unit D through the connection line 52. In addition, although not shown in the drawing, the driving device 50 is also electrically connected to the gate line inside the display unit D. The sensor element 54 is electrically connected to the sensor wiring 56 to detect the touch area based on the current change input through the sensor wiring 56.

In this case, the driving device 50 and the sensor device 54 may be formed separately, but may be formed of one integrated device. That is, the sensor element 54 is integrated into the driving element 50 so that not only the connection wiring 52 but also the sensor wiring 56 is connected to the driving element 50 so as to not only realize an image but also touch the image by the driving element 50. Detection can be performed.

FIG. 2 is a cross-sectional view taken along line II ′ of FIG. 1, and a display device according to an exemplary embodiment of the present invention will be described in detail with reference to this. FIG.

As shown in FIG. 2, the display device includes a display part and an outer part, and a sensor electrode 28 and a thin film transistor are formed on the display part D of the first substrate 10. The thin film transistor includes a gate electrode 11 formed on the first substrate 10, a gate insulating layer 22 formed over the entire first substrate 10 on which the gate electrode 11 is formed, and the gate insulating layer ( A semiconductor layer 12 formed on the semiconductor layer 12 and a source electrode 14 and a drain electrode 15 formed on the semiconductor layer 12.

The passivation layer 24 is formed over the entire first substrate 10 on the thin film transistor. On the passivation layer 24, a band-shaped common electrode 26 and a pixel electrode 27 having a predetermined width are disposed in parallel to each other so that the surface of the first substrate 10 and the transverse electric field are common electrode 26 and the pixel. It is formed between the electrodes 27. In this case, the pixel electrode 27 is electrically connected to the drain electrode 15 of the thin film transistor through the first contact hole 25 formed in the protective layer 24 so that an image signal from the outside is transferred to the pixel electrode through the thin film transistor. Is applied to (27).

The first sensor wiring 56a is formed at the outer portion P of the first substrate 10. The sensor wiring 56a may be formed of the same metal as the gate electrode 11 of the thin film transistor, or may be formed of the same material as the sensor electrode 28. A gate insulating layer 22 and a protective layer 24 are formed on the first sensor wiring 56a, and a second contact hole 58 is formed in the gate insulating layer 22 and the protective layer 24. The first sensor wiring 56a is exposed to the outside. The second sensor wiring 56b is formed on the upper portion of the protective layer 24, the inner wall of the second contact hole 58, and the exposed first sensor wiring 56a. The second sensor wiring 56b is electrically connected to the first sensor wiring 56a to form one sensor wiring 56.

The width of the second sensor wiring 56b is preferably formed to be the same as the width a1 of the first sensor wiring 56a, but the width of the first sensor wiring 56a and the width of the second sensor wiring 56a are not limited thereto. You can also vary the width. In this case, the first sensor wiring 56a and the second sensor wiring 56b form one moving path to transfer the touch sensed by the sensor electrode 28 to the sensor element. The second sensor wiring 58b may be formed of a metal having good conductivity, but similarly to the common electrode 26 and the pixel electrode 27 formed on the display unit D, the second sensor wiring 58b may be formed by the same process. It will be preferred for the convenience of the process.

The black matrix 34 and the color filter layer 36 are formed on the display portion D inside the second substrate 30. The black matrix 34 is made of Cr or CrOx and prevents light from being deteriorated by blocking light from being transmitted to an image non-display area, such as a gate line, a data line formation region, and a thin film transistor formation region of a display device. . The color filter layer 36 includes R, G, and B color filter layers to implement an actual image.

Although not shown in the drawings, an overcoat layer may be formed on the color filter layer 36 to protect the color filter layer 36 and to flatten the surface thereof.

The driving electrode 38 is formed on the display portion D outside the second substrate 30. The driving electrode 38 is formed of a transparent metal oxide such as ITO or ATO, and a plurality of driving electrodes 38 are formed in a band shape on an outer surface of the second substrate 30. In addition, a black matrix 36 is formed on the inner surface of the outer portion P of the second substrate 30 to block light from being transmitted to the area.

Although not shown in the drawings, an optical clear adhesive is applied on the outside of the second substrate 30, that is, on the driving electrode 38, and a protective glass or a protective film is attached thereto. In addition, an Ag dot is formed between the first substrate 10 and the second substrate 30 to supply a constant current to the drive electrode 38 through the silver dot.

As described above, in the present invention, the sensor wiring 56 formed at the outer portion of the display element is formed of the double layers 56a and 56b to form two signal movement paths. The reason for forming the layers 56a and 56b is as follows.

3 is a diagram illustrating a display device having a structure in which the sensor wiring 56 is formed in one layer. At this time, the other structure is the same as the structure shown in FIG. 2 and only the structure of the sensor wiring 56 is different.

As shown in FIG. 3, the sensor wiring 56 is formed on the outer portion P of the first substrate 10, and the gate insulating layer 22 and the protective layer 24 are formed thereon. Unlike the structure of FIG. 2, the structure of FIG. 3 does not have a separate sensor wiring on the protective layer 24. That is, in the structure of FIG. 2, the sensor wiring 58 is formed as a double layer, and a signal is transmitted through a double passage. In the structure of FIG. .

Accordingly, in order for the touch signal in the display device having the structure of FIG. 3 to have a transmission speed equivalent to that of the display device having the structure shown in FIG. 2, the width a2 of the sensor wiring 56 is illustrated in FIG. 2. The width of the structure (a1) must be greater (ie a2> a2) to increase the area of signal transmission and reduce the resistance.

4A and 4B are enlarged views of region A of FIG. 1, FIG. 4A is a plan view showing the structure of the sensor wiring 56 having the structure shown in FIG. 3, and FIG. 4B is a display device according to the present invention shown in FIG. 2. It is a top view which shows the structure of the sensor wiring.

Although the thin wires 56 vary depending on the size, resolution, and the like of the display elements, the following describes a specific model, for example, a small display element of 4.7 inches.

In the case of the 4.7-inch model in which the sensor wiring 56 is formed of a single layer, since 22 sensor electrodes are formed in the display portion D, 22 sensor wirings 56 connected to the sensor electrodes are also formed in the outer portion P. do. At this time, the width a2 of the sensor wiring 56 is 18 μm and the interval d2 is about 6 μm, and the pitch between the sensor wirings 56 is 24 μm. At this time, the resistance of each sensor wiring 56 is about 338 Ω. Therefore, 22 sensor wires 56 may be disposed when the area of the outer portion P is at least 500 μm or more.

As such, when the sensor wiring 56 is formed of a single layer, the width L2 of the outer portion P should be at least 500 μm, which makes it difficult to implement a narrow bezel. When the width of the sensor wiring 56 of the single layer is reduced, the area of the outer portion P may be reduced to form a narrower bezel, but in this case, the resistance may increase rapidly at 338 Ω so that the touch signal may be reduced. Since the image cannot be displayed quickly due to information input due to delay, there is a limit to reducing the width of the sensor wiring 56.

On the other hand, as shown in Figure 4b, when forming the sensor wiring 56 in a double layer as in the present invention, since the signal path is formed in a double, the sensor wiring 56 can be reduced in width . In the present invention, in the case of 4.7 inches, 22 sensor wirings 56 connected to the sensor electrodes are formed at the outer portion P, and the width a1 of the sensor wiring 56 is 7 μm and the interval d1 is As about 5 micrometers, the pitch between the sensor wirings 56 will be 12 micrometers. At this time, the resistance of each sensor wiring 56 is about 429 Ω.

As such, as the sensor wiring 56 is formed by the double wiring, the width of the sensor wiring 56 decreases from 18 μm to 7 μm and the interval decreases from 6 μm to 5 μm, so that the pitch is 24 μm to 12 μm. To 1/2. Accordingly, in the present invention, the width L1 of the outer portion P can be formed to a size of about 250 L µm, compared to the case where the sensor wiring 56 is formed in one layer, thereby reducing the bezel by about half. You can do it. In this structure, since a part of the sensor wiring 56 (that is, the second sensor wiring 56b) uses a transparent metal oxide having high resistance, the resistance is increased compared to the structure in which the sensor wiring 56 is formed in one layer. However, the actual resistance increases from 338Ω to 429Ω, so that the delay of the signal is negligible, so that the delay of the touch signal can be ignored.

The second sensor wiring 56b may be formed of a metal having good conductivity according to the required characteristics of the display device. Of course, in this case, it is possible to prevent the delay of the touch signal while minimizing the width of the bezel, thereby ensuring the beauty and high performance of the aesthetics of the electronic device.

In the display device configured as described above, as the user touches the screen, a change in current occurs between the driving electrode 38 and the sensor electrode 28 in the corresponding region, and a signal for the change is transmitted to the first sensor wiring ( Input to the touch device or the driving device through the 56a) and the second sensor wiring 56b to detect the x, y coordinates of the touch area.

5A-5E illustrate a method of manufacturing a display device according to the present invention.

First, as shown in FIG. 5A, the first substrate 10 is prepared from a transparent material such as glass or plastic, including the display portion D and the outer portion P, and then the entirety of the first substrate 10. Metals such as Cr, Mo, Ta, Cu, Ti, Al, or Al alloys are stacked by sputtering, and then etched by wet etching to form the gate electrode 11 on the display portion D, and the outer portion P ) To form a first sensor wiring 56a. Subsequently, a transparent conductive material such as ITO or ATO is laminated on the first substrate 10 by sputtering and then etched to form a sensor electrode 28.

In this case, the sensor electrode 28 may be formed, and then the gate electrode 11 and the first sensor wiring 56a may be formed. In addition, the first sensor wiring 56a may be formed of a transparent conductive material such as ITO or ATO by the same process as that of the sensor electrode 28, and the sensor electrode 28 may be formed of the metal by the same process as the gate electrode 11. It may be formed as.

Subsequently, as illustrated in FIG. 5B, the gate insulating layer 22 is formed by stacking SiO ₂ or SiN x over the entire first substrate 10, and then amorphous silicon is deposited thereon by a chemical vapor deposition (CVD) method. The semiconductor layer 12 is formed by laminating and etching. At this time, the crystalline silicon may be laminated or the amorphous silicon may be made into crystalline silicon through a crystallization process. Subsequently, metals such as Cr, Mo, Ta, Cu, Ti, Al, or Al alloys are laminated and etched through the sputtering method over the entire first substrate 10 to form a source electrode 14 and a top layer on the semiconductor layer 12. The drain electrode 15 is formed.

Thereafter, as illustrated in FIG. 5C, an organic material such as photoacryl is laminated on the entire first substrate 10 to form a protective layer 24, and then a portion of the protective layer 24 is etched. The first contact hole 25 is formed in the display portion D, and the second contact hole 58 is formed in the outer portion P. In this case, the first contact hole 25 is formed only in the protective layer 24, but the second contact hole 58 is formed by etching the protective layer 24 and the gate insulating layer 22. Formed in layer 22.

The drain electrode 15 of the thin film transistor is exposed to the outside through the first contact hole 25, and the first sensor wiring 56a is exposed to the outside through the second contact hole 58.

Thereafter, as illustrated in FIG. 5D, a transparent conductive material such as ITO or ATO is laminated and etched through the sputtering method over the entire first substrate 10 to be etched on the protective layer 24 of the display unit D. At least one pair of common electrode 26 and the pixel electrode 27 arranged in parallel with each other, and the second sensor wiring (on the protective layer 24 of the outer portion P and inside the second contact hole 58). 56b).

In this case, the pixel electrode 27 is electrically connected to the drain electrode 15 of the thin film transistor through the first contact hole 25 so that an image signal is applied to the pixel electrode 27 through the thin film transistor, and the second sensor wiring is performed. 56b is electrically connected to the first sensor wiring 56a through the second contact hole 58 so that a touch signal is transmitted through the first sensor wiring 56a and the second sensor wiring 56b.

Although not shown in the drawing, an alignment layer is formed on the display unit D on which the common electrode 26 and the pixel electrode 27 are formed, and the alignment direction is determined by rubbing or the like.

Thereafter, as shown in FIG. 5E, after preparing the second substrate 30 made of a transparent material such as glass, a metal such as Cr or CrOx is laminated and etched on the inner surface of the second substrate 30. The black matrix 34 is formed in the image non-display area, and the color filter layer 36 is formed thereon. In addition, ITO or ATO is laminated and etched on the outer surface of the second substrate 30 to form a plurality of drive electrodes 38 having a band width of a predetermined width. Although not shown in the figure, a transparent adhesive layer is applied to the outer surface of the second substrate 30 on which the driving electrode 38 is formed, and then a glass or a protective film is attached to protect the driving electrode 38.

Thereafter, after the sealing material is applied to the outer region of the first substrate 10 or the second substrate 30 and aligned, the pressure is applied to bond the first substrate 10 and the second substrate 30 to each other. The display device is completed by forming the liquid crystal layer 40 between the first substrate 10 and the second substrate 30.

6 is a cross-sectional view illustrating a structure of a display device according to another exemplary embodiment of the present invention.

Since the display element of this embodiment has a similar structure of the display element shown in Fig. 2, the description of the same structure will be omitted or simplified and only the other structure will be described in detail.

As shown in Fig. 6, in this embodiment, the sensor wiring is composed of three layers of the first sensor wiring 156a, the second sensor wiring 156b, and the third sensor wiring 156c. In this case, the first sensor wiring 156a is formed on the first substrate 110, the second sensor wiring 156b is formed on the gate insulating layer 122, and the third sensor wiring 156c is formed on the protective layer 124. The first sensor wiring 156a, the second sensor wiring 156b, and the third sensor wiring 156c are electrically connected by the contact hole 158.

As described above, in this embodiment, since the sensor wiring is formed in three layers to form three passages through which the touch signal is transmitted, the resistance can be reduced as compared with the display device having the structure shown in FIG. It can be reduced to further reduce the area of the outer portion (D).

The first sensor wiring 156a may be formed of the same metal as the gate electrode 111 or may be formed of the same transparent conductive material as the sensor electrode 128. In addition, although the second sensor wiring 156b and the third sensor wiring 156c may be made of metal, it is preferable to form the transparent sensor material such as ITO or ATO.

In this embodiment, the common electrode 126 is formed on the gate insulating layer 122, and the pixel electrode 127 is formed on the protective layer 124. Therefore, the second sensor wiring 156b is formed by the same process as the common electrode 126, and the third sensor wiring 156c is formed by the same process as the pixel electrode 127.

Of course, in this embodiment, both the common electrode 126 and the pixel electrode 127 may be formed on the passivation layer 124. In this case, the third sensor wiring 156c may be formed by the same process as the common electrode 126 and the pixel electrode 127, but the second sensor wiring 156b may be formed by a separate process.

In addition, in the present invention, the common electrode 126 may be formed on the passivation layer 124, and the pixel electrode 127 may be formed on the gate insulating layer 122. In this case, the second sensor wiring 156b may be formed by the same process as the pixel electrode 127, and the third sensor wiring 156c may be formed by the same process as the common electrode 126.

As described above, in the present invention, the sensor wiring may be formed in a double layer or in three layers. Such sensor wiring may be formed in multiple layers of four or more layers as necessary.

As described above, in the present invention, by forming two signal paths by forming a plurality of layers of sensor wiring formed on the outer portion, it is possible to prevent a delay of the touch signal through the sensor wiring and to reduce the width of the sensor wiring. By minimizing the bezel area, the aesthetics can be made beautiful.

On the other hand, in the detailed description, the structure of the liquid crystal display device is disclosed as the structure of the present invention, but the present invention is not limited to this structure. That is, the present invention may be applied to various display devices such as an organic light emitting display device, an electrophoretic display device, a plasma display device, as well as a liquid crystal display device. In addition, even if applied to the liquid crystal display device may be applied not only to the In Plane Switching (IPS) mode liquid crystal display device shown in the drawing but also to twisted nematic (TN) mode or vertical alignment (VA) mode.

In addition, the present invention is not limited to the touch panel of a specific structure but may be applied to the touch panel of various structures.

In other words, the present invention relates to a structure in which the touch wiring formed in the outer portion is formed in a double layer, and may be applied to display devices having any structure that may include the structure.

D: Display part P: Outer part
10,30 substrate 28 sensor electrode
38: driving electrodes 56a, 56b: sensor wiring

Claims

A first substrate and a second substrate formed of a display portion and an outer portion;
A touch sensor formed on the display unit;
It is formed on the outer periphery of the first substrate consists of a sensor wiring for transmitting the touch signal sensed by the touch sensor,
And the sensor wiring is formed of a double layer electrically connected with an insulating layer interposed therebetween.

The display device according to claim 1,
A liquid crystal layer formed between the first substrate and the second substrate;
A plurality of pixel regions defined by gate lines and data lines formed on the first substrate;
A thin film transistor formed in each pixel region, the thin film transistor comprising a gate electrode, a semiconductor layer formed on the gate layer, a source electrode and a drain electrode formed on the semiconductor layer;
A protective layer formed on the first substrate to cover the thin film transistor;
And a common electrode and a pixel electrode for applying an electric field to the liquid crystal layer.

The method of claim 1, wherein the touch sensor,
A plurality of sensor electrodes extending in a predetermined direction in a band shape on the display unit of the first substrate; And
And a driving electrode formed on an outer surface of the second substrate and extending in a direction perpendicular to the sensor electrode in a band shape.

The display device of claim 1, wherein the sensor electrode and the driving electrode are made of a transparent conductive material.

The method of claim 2, wherein the sensor wiring,
A first sensor wiring formed on the first substrate; And
And a second sensor wiring formed on the protective layer and electrically connected to the first sensor wiring through a contact hole formed in the protective layer.

The display device of claim 5, wherein the widths of the first sensor wiring and the second sensor wiring are the same.

The display device of claim 5, wherein the first sensor wiring is made of the same material as the gate electrode.

The display device of claim 5, wherein the first sensor wiring is made of the same material as the sensor electrode.

The display device of claim 5, wherein the second sensor wiring is made of the same material as the pixel electrode.

The display device of claim 5, wherein the sensor wiring further comprises a third sensor wiring formed on the gate insulating layer and electrically connected to the first sensor wiring and the second sensor wiring.

The display device of claim 1, wherein the display unit is an organic light emitting display unit, an electrophoretic display unit, or a plasma display unit.