KR20100010694A - Triple layered anistropic conductive film and manufacturing method thereof - Google Patents
Triple layered anistropic conductive film and manufacturing method thereof Download PDFInfo
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- B32B5/00—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
- B32B5/22—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed
- B32B5/24—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed one layer being a fibrous or filamentary layer
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- B32B5/00—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
- B32B5/02—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by structural features of a fibrous or filamentary layer
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- B32B5/00—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
- B32B5/18—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by features of a layer of foamed material
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- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
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- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
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- B32B2266/00—Composition of foam
- B32B2266/02—Organic
- B32B2266/0214—Materials belonging to B32B27/00
- B32B2266/0242—Acrylic resin
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- B32B2266/00—Composition of foam
- B32B2266/02—Organic
- B32B2266/0214—Materials belonging to B32B27/00
- B32B2266/0278—Polyurethane
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/30—Properties of the layers or laminate having particular thermal properties
- B32B2307/304—Insulating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
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Abstract
Description
본 발명은 3층 이방성 도전 필름 및 이의 제조방법에 관한 것으로, 상세하게는 1) 절연성 접착제 및 절연 처리된 도전볼을 포함하는 ACF 층, 및 2) 상기 ACF 층 양쪽 면에 각각 형성된, 절연성 접착제 및 나노 실리카를 포함하는 NCF 층으로 구성되는 3층 이방성 도전 필름 및 이의 제조방법에 관한 것이다.The present invention relates to a three-layer anisotropic conductive film and a method for manufacturing the same, in particular 1) an ACF layer comprising an insulating adhesive and an insulated conductive ball, and 2) an insulating adhesive formed on both sides of the ACF layer, and The present invention relates to a three-layer anisotropic conductive film composed of an NCF layer containing nano silica and a method of manufacturing the same.
전기·전자·정보통신의 기술이 발달함에 따라 보다 작고 다양한 기능을 구비한 전자 제품의 필요성이 크게 대두되고 있다. 이를 위해서는 복잡하고 다양한 부품을 작고 효율적으로 조립할 수 있는 제작기술이 필요한데, 이를 패키징 기술이라고 한다. 패키징 기술은 경·박·단·소화 되어가는 전자제품을 매우 작은 공간에서 경제적으로 생산할 수 있게 하고 더욱 효율적으로 오랫동안 사용할 수 있도록 하는 기술로서, 개념적으로 제시된 다기능·최첨단 장치를 실제 제품으로 구현하는 조립 제작기술이다. 즉, 보다 많은 기능을 보다 작은 공간에 보다 좋은 신뢰도를 유지하면서 보다 경제적으로 제품을 구현하는 것이다.As the technology of electric, electronic, and information communication develops, the necessity of electronic products with smaller and more diverse functions is increasing. This requires a manufacturing technology that can assemble complex and diverse parts small and efficiently. This is called packaging technology. Packaging technology is a technology that enables the economic production of light, thin, short, and fired electronic products in a very small space and allows for more efficient use for a long time. Production technology. In other words, more functions can be implemented more economically while maintaining better reliability in a smaller space.
최근 들어, 디스플레이 산업이 대형화 및 박형화되는 추세에 따라 전극 및 회로들 간의 피치는 점차 미세화되고 있으며, 이러한 미세 회로 단자들을 접속하기 위한 배선 기구 중의 하나로서 이방성 도전 필름(anistropic conductive film; ACF)은 매우 중요한 역할을 수행하고 있다.In recent years, as the display industry becomes larger and thinner, the pitch between electrodes and circuits is gradually becoming smaller, and as one of the wiring mechanisms for connecting these fine circuit terminals, an anisotropic conductive film (ACF) is very It plays an important role.
이방성 도전 필름은 피접속부재의 재질이 특수하거나 신호배선의 피치가 세밀하여 부재와 부재를 솔더링(soldering) 방식으로 부착할 수 없을 경우 사용하는 접속재료이다. 이러한 이방성 도전 필름은 대표적으로 LCD 모듈에서 LCD 패널, 인쇄회로기판(PCB), 드라이버 IC 회로 등을 패키징하는 접속재료로 사용된다. 보다 상세하게는, LCD 모듈에서 TFT(thin film transistor) 패턴들을 구동시키기 위해서는 다수 개의 드라이버 IC가 실장된다. 드라이버 IC를 LCD 패널에 실장하는 방식은 도전성 와이어를 통하여 LCD 패널 전극에 드라이버 IC를 접속하는 방식인 와이어 본딩 방식, 베이스 필름을 이용하여 LCD 패널 상의 전극에 드라이버 IC를 실장하는 방식인 TAB(tape automated bonding) 방식, 및 소정의 접착제를 사용하여 드라이버 IC를 LCD 패널 상에 직접 실장하는 방식인 COG(chip on glass) 방식 등으로 분류할 수 있다. 즉, 이방성 도전 필름은 COG 실장이나 COF(chip on film) 실장 등의 접속 재료로서 주목을 받고 있으며, 폴리이미드 기판에 설계된 배선 패턴과 액정 표시 장치의 유리기판상에 설계된 ITO(imdium tin oxide) 패턴 또는 전자부품의 리드 등을 전기적으로 접속하는 곳에 사용되고 있다.The anisotropic conductive film is a connection material used when the material of the member to be connected is special or the pitch of the signal wiring is minute so that the member and the member cannot be attached by soldering. The anisotropic conductive film is typically used as a connection material for packaging LCD panels, printed circuit boards (PCBs), driver IC circuits, etc. in LCD modules. More specifically, a plurality of driver ICs are mounted to drive thin film transistor (TFT) patterns in the LCD module. The driver IC is mounted on the LCD panel using a wire bonding method, which connects the driver IC to the LCD panel electrode through a conductive wire, and a TAB (tape automated) method of mounting the driver IC on an electrode on the LCD panel using a base film. and a chip on glass (COG) method in which a driver IC is directly mounted on an LCD panel using a bonding method and a predetermined adhesive. That is, the anisotropic conductive film has attracted attention as a connection material such as COG mounting or chip on film (COF) mounting, and an interconnection pattern designed on a polyimide substrate and an ITO pattern formed on a glass substrate of a liquid crystal display device or It is used to electrically connect the lead of an electronic component or the like.
최근 이러한 이방성 전도 접속에 요구되는 회로 기판 패키징에 있어서는, 회로 및 LCD 기술의 발전에 따라 접속 피치가 미세화되고 IC 범프가 미소화되면서 기판 위에 인쇄된 리드수가 증가하는 추세이고 동시에 접속 신뢰성의 향상이 요구되 고 있다. 이러한 기술적 요구에 따라 이방성 도전 접착필름 중에 함유되는 전도성 미립자의 입경을 작게 하며, 접속 신뢰성을 향상시키기 위해 전도성 미립자의 배합량을 증가시키려는 연구개발이 계속 진행되고 있다. 그러나 사용되는 전도성 미립자의 입경 감소 및 증가된 입자 밀도에 의하여 입자의 응집 또는 브리지가 발생하게 되고, 이로 인하여 접속의 불균일이나 패턴간의 단락이 빈번히 발생하는 문제점이 나타나게 된다.Recently, in the circuit board packaging required for such anisotropic conductive connection, the number of leads printed on the substrate increases as the connection pitch becomes finer and the IC bump becomes smaller according to the development of circuit and LCD technology. Being. In accordance with such technical requirements, research and development are continuing to reduce the particle size of the conductive fine particles contained in the anisotropic conductive adhesive film and to increase the amount of the conductive fine particles to improve the connection reliability. However, agglomeration or bridging of particles occurs due to reduced particle size and increased particle density of the conductive fine particles used, resulting in frequent nonuniformity of connection or short circuit between patterns.
이방성 도전 필름은 지난 10년간 일본의 히다찌 화성사(일본특허공개 5-21094, 5-226020, 7-3026666 등) 및 소니케미컬사(일본특허공개 7-211374, 9-199206, 9-115335 등) 등에 의해 많은 연구 및 상품화가 진행되어 왔다. 그러나, 상기와 같은 접속의 불균일이나 패턴간의 단락이 빈번히 발생하는 문제점을 아직까지 완전히 해결하지 못하고 있으며, 이에 따라 LCD 공정상에 있어서 많은 개선이 필요한 실정이다.Anisotropic conductive films have been manufactured by Hitachi Chemical Co., Ltd. (Japanese Patent Publication Nos. 5-21094, 5-226020, 7-3026666, etc.) and Sony Chemical Corporation (Japanese Patent Publications No. 7-211374, 9-199206, 9-115335, etc.) for the past 10 years. Many researches and commercializations have been conducted. However, the problem of frequent occurrence of non-uniformity of connection or short circuit between patterns has not been completely solved yet, and thus, many improvements in LCD processes are required.
따라서, 상기와 같은 문제점을 해결하고 기존의 이방성 도전 필름보다 접착성과 절연성을 향상시킨 이방성 도전 필름의 필요성이 요구되어 지고 있다.Therefore, there is a need for an anisotropic conductive film that solves the above problems and improves adhesiveness and insulation property compared to existing anisotropic conductive films.
본 발명자들은 접착성과 절연성을 향상시킨 이방성 도전 필름에 대해 연구하던 중, 나노 실리카를 충전제로서 NCF 층에 첨가하여 NCF 층을 제조하고, 이를 절연성 접착제 및 절연 처리된 도전볼을 포함하는 ACF 층 양쪽 면에 각각 형성시켜 3층 이방성 도전 필름을 제조하였고, 상기 이방성 도전 필름의 접착강도, 도통 신뢰성 및 절연 신뢰성이 우수하게 나타남을 확인하고, 본 발명을 완성하였다.While studying the anisotropic conductive film with improved adhesion and insulation, the present inventors added nano silica as a filler to the NCF layer to prepare an NCF layer, which was formed on both sides of the ACF layer including an insulating adhesive and an insulated conductive ball. The three-layer anisotropic conductive film was prepared by forming each, and it was confirmed that the adhesive strength, the conduction reliability, and the insulation reliability of the anisotropic conductive film were excellent, and completed the present invention.
본 발명은 접착성과 절연성이 우수한 3층 이방성 도전 필름 및 이의 제조방법을 제공하고자 한다.The present invention is to provide a three-layer anisotropic conductive film excellent in adhesion and insulation and a method of manufacturing the same.
본 발명은The present invention
1) 절연성 접착제 및 절연 처리된 도전볼을 포함하는 ACF 층, 및1) an ACF layer comprising an insulating adhesive and an insulated conductive ball, and
2) 상기 ACF 층 양쪽 면에 각각 형성된, 절연성 접착제 및 나노 실리카를 포함하는 NCF 층으로 구성되는, 3층 이방성 도전 필름을 제공한다.2) Provide a three-layer anisotropic conductive film consisting of an NCF layer containing an insulating adhesive and nano silica, respectively formed on both sides of the ACF layer.
또한, 본 발명은In addition, the present invention
1) 유기용매에 분산된 나노 실리카를 절연성 접착제에 혼합한 후, 이를 베이스 필름 위에 도포하고 건조하여 NCF 필름을 제조하는 단계,1) mixing the nano silica dispersed in the organic solvent to the insulating adhesive, and then applying it on the base film and dried to produce an NCF film,
2) 유기용매에 분산된 절연 처리된 도전볼을 절연성 접착제에 혼합한 후, 이를 베이스 필름 위에 도포하고 건조하여 ACF 필름을 제조하는 단계,2) mixing the insulated conductive balls dispersed in an organic solvent with an insulating adhesive, and then applying it on a base film and drying to prepare an ACF film,
3) 상기 2)단계에서 제조한 ACF 필름 양쪽 면에 상기 1)단계에서 제조한 NCF 필름을 라미네이트 공정을 통해 접착하는 단계를 포함하는, 3층 이방성 도전 필름의 제조방법을 제공한다.3) It provides a method of manufacturing a three-layer anisotropic conductive film comprising the step of adhering the NCF film prepared in step 1) to both sides of the ACF film prepared in step 2) through a lamination process.
이하, 본 발명에 대해 상세히 설명한다.Hereinafter, the present invention will be described in detail.
본 발명에 따른 3층 이방성 도전 필름의 ACF 층 및 NCF 층에서, 절연성 접착제는 열경화성 수지 및 열가소성 수지 중에서 선택된 1종 이상의 수지를 포함한다. 상기 열경화성 수지는 비스페놀 A형 에폭시 수지, 비스페놀 F형 에폭시 수지, 노블락형 에폭시 수지, 페놀 수지, 우레아 수지, 멜라민 수지, 불포화 폴리에스테르 수지, 레조시놀 수지 등을 포함하나, 이에 한정되지 않는다. 상기 열가소성 수지는 포화 폴리에스테르 수지, 비닐 수지, 아크릴 수지, 폴리올레핀 수지, 폴리비닐아세테이트(PVA) 수지, 폴리카보네이트 수지, 셀룰로오스 수지, 케톤 수지, 스티렌 수지 등을 포함하나, 이에 한정되지 않는다. 본 발명에서는 열경화성 수지를 사용하는 것이 바람직하다.In the ACF layer and the NCF layer of the three-layer anisotropic conductive film according to the present invention, the insulating adhesive includes at least one resin selected from thermosetting resins and thermoplastic resins. The thermosetting resins include, but are not limited to, bisphenol A type epoxy resins, bisphenol F type epoxy resins, noblock type epoxy resins, phenol resins, urea resins, melamine resins, unsaturated polyester resins, resorcinol resins, and the like. The thermoplastic resins include, but are not limited to, saturated polyester resins, vinyl resins, acrylic resins, polyolefin resins, polyvinyl acetate (PVA) resins, polycarbonate resins, cellulose resins, ketone resins, styrene resins, and the like. In this invention, it is preferable to use a thermosetting resin.
본 발명에 따른 3층 이방성 도전 필름의 ACF 층에서, 절연 처리된 도전볼은 수백 나노미터 크기의 입자로 된 유기 고분자 화합물을 도전입자 표면으로 유도하는 절연화 방법을 이용하여 도전입자 표면에 절연성을 부여한다. 상기 절연화 방법은 도전입자 표면 전체를 유기 절연화 막으로 박막 코팅 처리하는 것이 아니고 일정 비율의 부분만을 유기 고분자 게스트 입자로 균일하게 절연화 함으로써, 가열 압착 공정에서 전극과 접촉하게 되는 부분은 유기 고분자 게스트 입자가 밀려나면서 도전성을 지닐 수 있도록 하여 절연 특성과 도전 특성을 동시에 지니도록 한다. 상기 절연 처리된 도전볼에서 도전입자는 니켈, 금, 백금 및 동 등의 금속입자를 포함하고, 절연입자는 스티렌, 스티렌 가교 미립자, 아크릴, 아크릴 가교 미립자, 스티렌아크릴 공중합체 또는 스티렌아크릴 가교 미립자로 이루어진 군으로부터 선택된 1종 이상을 포함하며, 바람직하게는 스티렌, 아크릴 및 스티렌아크릴 공중합체로 이루어진 군으로부터 선택한 1종 이상을 포함한다. 상기 절연입자는 단량체 조성물, 사슬연장제, 중합개시제, 점도강하제 및 분산안정제 등을 혼합하여 현탁중합 반응시키거나 기계적·물리적 방법을 통해서 제조할 수 있다. 상기 절연 처리된 도전볼의 크기는 1~10㎛, 바람직하게는 2~5㎛ 이다. 상기 절연 처리된 도전볼의 함량은 ACF 층 100 중량부에 대해 1 내지 30 중량부, 바람직하게는 1 내지 10 중량부를 분산하는 것이 좋다. 만일 절연 처리된 도전볼의 함량이 30 중량부를 초과하면 접속 회로간의 절연 신뢰성이 확보되기 힘들어 이방 도전성을 나타내지 못하고, 1 중량부 미만이면 충분한 전기 도전성을 나타내지 못한다.In the ACF layer of the three-layered anisotropic conductive film according to the present invention, the insulated conductive ball has an insulating property on the surface of the conductive particle by using an insulating method of inducing an organic polymer compound of particles of several hundred nanometers in size to the surface of the conductive particle. Grant. In the insulating method, the entire surface of the conductive particles is not thin-film-coated with an organic insulating film, and only a portion of the conductive particles is uniformly insulated with the organic polymer guest particles, whereby the portion which comes into contact with the electrode in the heat compression process is an organic polymer. As the guest particles are pushed out to have conductivity, they have both insulating and conductive properties. In the insulated conductive ball, the conductive particles include metal particles such as nickel, gold, platinum, and copper, and the insulating particles are styrene, styrene crosslinked fine particles, acrylic, acrylic crosslinked fine particles, styreneacryl copolymer or styreneacryl crosslinked fine particles. At least one selected from the group consisting of, preferably at least one selected from the group consisting of styrene, acrylic and styrene acrylic copolymer. The insulating particles may be prepared through a suspension polymerization reaction by mixing a monomer composition, a chain extender, a polymerization initiator, a viscosity lowering agent, a dispersion stabilizer, or the like through mechanical or physical methods. The size of the insulating conductive ball is 1 ~ 10㎛, preferably 2 ~ 5㎛. The content of the insulated conductive balls may be dispersed in an amount of 1 to 30 parts by weight, preferably 1 to 10 parts by weight, based on 100 parts by weight of the ACF layer. If the content of the insulated conductive ball is more than 30 parts by weight, the insulation reliability between the connection circuits is difficult to be secured, and thus anisotropic conductivity is not exhibited.
본 발명에 따른 3층 이방성 도전 필름의 NCF 층에서, 나노 실리카는 충전제로 사용되며, 이방성 도전 필름의 접착성과 절연성을 향상시키는 역할을 한다. 나노 실리카의 입자 크기는 6~30㎚인 원형 실리카가 바람직하다. 나노 실리카의 함량은 NCF 층 100 중량부에 대해 0.1~30 중량부, 바람직하게는 0.5~5 중량부를 포함하는 것이 바람직하다. 본 발명에서는 시판품인 Fuso Chemical사의 제품을 사용하였다.In the NCF layer of the three-layer anisotropic conductive film according to the present invention, nano silica is used as a filler, and serves to improve the adhesion and insulation of the anisotropic conductive film. The particle size of the nano silica is preferably circular silica having 6 to 30 nm. The content of the nano silica is preferably 0.1 to 30 parts by weight, preferably 0.5 to 5 parts by weight based on 100 parts by weight of the NCF layer. In the present invention, a commercial product of Fuso Chemical Company was used.
본 발명에 따른 3층 이방성 도전 필름의 총 두께는 15~30㎛가 바람직하며, NCF 층 및 ACF 층의 두께는 각각 5~10㎛가 바람직하다.The total thickness of the three-layer anisotropic conductive film according to the present invention is preferably 15 to 30 µm, and the thickness of the NCF layer and ACF layer is preferably 5 to 10 µm, respectively.
본 발명에 따른 3층 이방성 도전 필름은 다음과 같은 방법으로 제조된다.The three-layer anisotropic conductive film according to the present invention is produced by the following method.
먼저, 열경화성 수지 및 열가소성 수지 중에서 선택된 1종 이상의 수지에 경화제를 가하여 절연성 접착제를 제조한다. 상기 수지는 절연성 접착제 100 중량부에 대해 80 내지 90 중량부를 포함하는 것이 바람직하다. 상기 경화제는, 상온에서는 불활성이며 가열 용융 후 활성화하여 열경화성 수지를 경화시키는 화합물을 사용할 수 있다. 이러한 경화제로는 이미다졸계 화합물, 아민계 화합물, 산무수물 화합물, 폴리아미드계 화합물 및 이소시아네이트계 화합물로 이루어진 군으로부터 선택된 1종 이상을 포함하나, 이에 한정되지 않으며, 본 발명에서는 상기 화합물을 마이크로 캡슐화한 시판 제품을 사용한다. 상기 경화제는 절연성 접착제 100 중량부에 대해 1 내지 10 중량부를 포함하는 것이 바람직하다. 상기 절연성 접착제는 수지, 경화제 외에 계면활성제, 커플링제 등의 첨가제를 더 포함할 수 있다.First, a curing agent is added to at least one resin selected from a thermosetting resin and a thermoplastic resin to prepare an insulating adhesive. It is preferable that the said resin contains 80-90 weight part with respect to 100 weight part of insulating adhesives. The said hardening | curing agent can use the compound which is inert at normal temperature, and activates after heat melting and hardening a thermosetting resin. Such curing agents include, but are not limited to, one or more selected from the group consisting of imidazole compounds, amine compounds, acid anhydride compounds, polyamide compounds, and isocyanate compounds, and in the present invention, microencapsulate the compound. Use a commercially available product. It is preferable that the said hardening | curing agent contains 1-10 weight part with respect to 100 weight part of insulating adhesives. The insulating adhesive may further include additives such as a surfactant and a coupling agent in addition to the resin and the curing agent.
그 다음 나노 실리카를 유기용매에 분산시킨 후, 이를 상기 제조한 절연성 접착제에 가하여 혼합한다. 상기 나노 실리카를 포함하는 혼합액을 베이스 필름 위에 도포하고 건조하여 NCF 필름을 제조한다. 그 다음 절연 처리된 도전볼을 유기용매에 분산시킨 후, 이를 상기 제조한 절연성 접착제에 가하여 혼합한다. 상기 절연 처리된 도전볼을 포함하는 혼합액을 베이스 필름 위에 도포하고 건조하여 ACF 필름을 제조한다. 상기 제조한 ACF 필름의 한쪽 면에 상기 제조한 NCF 필름을 라미네이트 공정을 통해 접착한 다음 ACF 필름의 다른쪽 면에 상기 제조한 NCF 필름을 라미네이트 공정을 통해 접착하여 3층 이방성 도전 필름을 제조한다.Then, after dispersing the nano silica in an organic solvent, it is added to the prepared insulating adhesive and mixed. The mixed solution containing the nano silica is applied onto a base film and dried to prepare an NCF film. Then, the insulating conductive ball is dispersed in an organic solvent and then mixed with the insulating adhesive prepared above. An ACF film is prepared by applying a mixed solution including the electrically conductive balls insulated and then drying the base film. The NCF film prepared above is attached to one side of the prepared ACF film through a lamination process, and then the NCF film prepared above is bonded to the other side of the ACF film through a lamination process to prepare a three-layer anisotropic conductive film.
상기 유기 용매는 이방성 도전 필름의 점도를 낮게 하여 필름 제조를 용이하 게 하는 것으로, 톨루엔, 자일렌, 에틸아세테이트, 벤젠, 아세톤, 메틸에틸케톤, 테트라히드로퓨란, 디메틸포름알데히드 및 시클로헥사논으로 이루어진 군으로부터 선택된 1종 이상을 포함하나, 이에 한정되지 않으며, 통상적으로 이방성 도전 필름의 제조에 사용되는 모든 유기 용매를 사용할 수 있다. 본 발명에서 유기 용매의 함량은 점도의 조절을 위하여 적절한 양으로 첨가되는 것이므로, 특별히 한정되지 않으며, 바람직하게는 5 내지 70 중량부가 되도록 조절하는 것이 좋다.The organic solvent is to lower the viscosity of the anisotropic conductive film to facilitate the film production, consisting of toluene, xylene, ethyl acetate, benzene, acetone, methyl ethyl ketone, tetrahydrofuran, dimethylformaldehyde and cyclohexanone One or more selected from the group include, but are not limited to, any organic solvent typically used in the production of an anisotropic conductive film can be used. Since the content of the organic solvent in the present invention is added in an appropriate amount for controlling the viscosity, it is not particularly limited, and preferably adjusted to 5 to 70 parts by weight.
본 발명에 따른 3층 이방성 도전 필름은 180~200℃에서 3~5Mpa의 압력으로 6~10초간 압착할 시 접착강도가 15N/㎝ 이상으로 우수하게 나타나며, 항온항습에서 1000시간 방치 후에도 접착강도가 10N/㎝ 이상을 유지하여 우수하게 나타난다. 또한, 본 발명에 따른 3층 이방성 도전 필름은 도통 신뢰성 및 절연 신뢰성이 우수하게 나타난다. 상기한 바와 같이, 본 발명에 따른 3층 이방성 도전 필름은 나노 실리카를 충전제로서 NCF 층에 첨가함으로써 접착강도를 우수하게 나타내고, NCF 층의 나노 실리카가 ACF 층의 절연 처리된 도전볼을 범프 위에 최대한 많이 올라갈 수 있게 함으로써, 도통 신뢰성 및 절연 신뢰성을 우수하게 나타낸다.When the three-layer anisotropic conductive film according to the present invention is pressed for 6 to 10 seconds at a pressure of 3 to 5Mpa at 180 to 200 ° C, the adhesive strength is excellent as 15N / cm or more, and the adhesive strength is maintained even after 1000 hours in constant temperature and humidity. It is excellent in keeping 10N / cm or more. In addition, the three-layer anisotropic conductive film according to the present invention is excellent in conduction reliability and insulation reliability. As described above, the three-layer anisotropic conductive film according to the present invention exhibits excellent adhesive strength by adding nano-silica as a filler to the NCF layer, and the nano-silica of the NCF layer maximizes the insulated conductive ball of the ACF layer on the bumps. By allowing it to go up a lot, it is excellent in conduction reliability and insulation reliability.
따라서, 본 발명에 따른 3층 이방성 도전 필름은 액정표시장치 기판 등에 접착제로 사용되어 회로 접속 시 가열가압에 의하여 가압방향으로만 도전성을 띠고, X축과 Y축 방향으로는 도전성을 띠지 않고 우수한 절연성을 갖는다.Therefore, the three-layer anisotropic conductive film according to the present invention is used as an adhesive for a liquid crystal display substrate or the like and is conductive only in the pressing direction due to heating pressure when the circuit is connected, and has excellent conductivity without being conductive in the X and Y axis directions. Has
이하, 본 발명의 이해를 돕기 위하여 바람직한 실시예를 제시한다. 그러나 하기의 실시예는 본 발명을 보다 쉽게 이해하기 위하여 제공되는 것일 뿐, 실시예에 의해 본 발명의 내용이 한정되는 것은 아니다.Hereinafter, preferred examples are provided to aid in understanding the present invention. However, the following examples are merely provided to more easily understand the present invention, and the contents of the present invention are not limited by the examples.
실시예Example 1 One : 3층 : 3rd Floor 이방성Anisotropy 도전 필름의 제조 Manufacture of conductive film
1. One. NCFNCF 필름의 제조 Manufacture of film
페녹시 수지 YP-50(동도화성, 東都化成) 40 중량부, 에폭시 수지 에비코트 630(다이셀화학공업) 40 중량부, 잠재성 경화제 HX3741(아사히 화성) 5 중량부를 혼합하고 1500 내지 2000 rpm으로 교반하였다. 교반 중 발생하는 기포를 제거한 후 절연성 접착제를 제조하였다. 충전제로 10㎚의 나노 실리카(일본 fuso chemicla사) 5 중량부를 톨루엔 100㎖에 가하여 분산시켰다. 상기 톨루엔에 분산된 나노 실리카를 상기 제조한 절연성 접착제에 가하여 1500 내지 2000 rpm으로 교반하면서 혼합하였다. 상기 나노 실리카를 포함하는 혼합액을 콤마 코팅기를 사용하여 폴리에스테르(PET) 필름에 도포하고 6분 동안 60~80℃의 3개의 존을 통과시켜 열풍건조시켰다. 이때 코팅기의 장력은 25N으로 설정하였고, 라인 속도는 2.0m/s로 하였다. 이렇게 하여 10㎛ 두께의 NCF 필름을 제조하였다.40 parts by weight of phenoxy resin YP-50 (Todo Chemical), 40 parts by weight of epoxy resin Ebicote 630 (DIESEL Chemical Co., Ltd.), 5 parts by weight of a latent curing agent HX3741 (Asahi Hwaseong), were mixed at 1500 to 2000 rpm. Stirred. After removing bubbles generated during stirring, an insulating adhesive was prepared. 5 parts by weight of 10 nm nano silica (fuso chemicla, Japan) was added to 100 ml of toluene and dispersed as a filler. Nano silica dispersed in the toluene was added to the prepared insulating adhesive and mixed with stirring at 1500 to 2000 rpm. The mixed solution containing the nano-silica was applied to a polyester (PET) film using a comma coater and hot air dried by passing through three zones of 60 ~ 80 ℃ for 6 minutes. At this time, the tension of the coating machine was set to 25N, the line speed was set to 2.0m / s. In this way, a 10 μm thick NCF film was prepared.
2. 2. ACFACF 필름의 제조 Manufacture of film
페녹시 수지 YP-50(동도화성, 東都化成) 40 중량부, 에폭시 수지 에비코트 630(다이셀화학공업) 40 중량부, 잠재성 경화제 HX3741(아사히 화성) 5 중량부를 혼합하고 1500 내지 2000 rpm으로 교반하였다. 교반 중 발생하는 기포를 제거한 후 절연성 접착제를 제조하였다. 하이브리다이저(hybridizer NHS-0)를 사용하여 스티렌 수지에 4㎛의 니켈-금 도금입자(AUL-704, 세끼스이사)를 코팅하여 절연 처리된 도전볼을 제조하였다. 이때 절연 처리된 도전볼의 크기는 4.5㎛ 이었다. 상기 절연 처리된 도전볼을 톨루엔 50㎖에 가하여 분산시켰다. 상기 톨루엔에 분산된 절연 처 리된 도전볼을 상기 제조한 절연성 접착제에 가하여 1500 내지 2000 rpm으로 교반하면서 혼합하였다. 상기 절연 처리된 도전볼을 포함하는 혼합액을 콤마 코팅기를 사용하여 폴리에스테르(PET) 필름에 도포하고 6분 동안 60~80℃의 3개의 존을 통과시켜 열풍건조시켰다. 이때 코팅기의 장력은 25N으로 설정하였고, 라인 속도는 2.0m/s로 하였다. 이렇게 하여 10㎛ 두께의 ACF 필름을 제조하였다.40 parts by weight of phenoxy resin YP-50 (Todo Chemical), 40 parts by weight of epoxy resin Ebicote 630 (DIESEL Chemical Co., Ltd.), 5 parts by weight of a latent curing agent HX3741 (Asahi Hwaseong), were mixed at 1500 to 2000 rpm. Stirred. After removing bubbles generated during stirring, an insulating adhesive was prepared. An insulated conductive ball was prepared by coating 4 μm of nickel-gold plated particles (AUL-704, Sekisui Co., Ltd.) on a styrene resin using a hybridizer NHS-0. At this time, the size of the insulating conductive ball was 4.5㎛. The insulating conductive ball was added to 50 ml of toluene and dispersed. The insulated conductive balls dispersed in the toluene were added to the prepared insulating adhesive and mixed with stirring at 1500 to 2000 rpm. The mixed solution containing the insulated conductive balls was applied to a polyester (PET) film using a comma coater, and dried by hot air drying through three zones of 60 to 80 ° C. for 6 minutes. At this time, the tension of the coating machine was set to 25N, the line speed was set to 2.0m / s. In this way, an ACF film having a thickness of 10 μm was prepared.
3. 3층 3. 3rd floor 이방성Anisotropy 도전 필름의 제조 Manufacture of conductive film
상기 2에서 제조한 ACF 필름의 한쪽 면에 상기 1에서 제조한 NCF 필름을 라미네이트 공정을 통해 접착하였다. 그 다음 ACF 필름의 다른쪽 면에 상기 1에서 제조한 NCF 필름을 라미네이트 공정을 통해 접착하였다. 이렇게 하여 30㎛ 두께의 3층 이방성 도전 필름을 제조하였다. 상기 제조한 3층 이방성 도전 필름에서 ACF 층의 분산도는 광학현미경과 프로그램을 통하여 촬영하였으며, 이때 표면 절연 처리된 도전볼의 입자 면적율은 50±5% 이었다.The NCF film prepared in 1 was adhered to one side of the ACF film prepared in 2 through a lamination process. The NCF film prepared in 1 above was then bonded to the other side of the ACF film through a lamination process. In this way, a three-layer anisotropic conductive film having a thickness of 30 µm was prepared. In the prepared three-layer anisotropic conductive film, the dispersion degree of the ACF layer was photographed through an optical microscope and a program, and the particle area ratio of the surface-treated conductive balls was 50 ± 5%.
비교예Comparative example 1 One : :
상기 실시예 1에서 NCF 필름 제조 시 나노 실리카를 첨가하지 않고 NCF 필름을 제조한 것을 제외하고는, 실시예 1과 동일하게 하여 3층 이방성 도전 필름을 제조하였다.In Example 1, a three-layer anisotropic conductive film was prepared in the same manner as in Example 1 except that the NCF film was prepared without adding nano silica when the NCF film was prepared.
실험예Experimental Example 1 One : 접착강도 평가 : Adhesion Strength Evaluation
본 발명에 따른 3층 이방성 도전 필름의 접착강도를 평가하기 위하여, 하기 와 같은 실험을 수행하였다.In order to evaluate the adhesive strength of the three-layer anisotropic conductive film according to the present invention, the following experiment was performed.
상기 실시예 1 및 비교예 1에서 제조한 3층 이방성 도전 필름을 연성인쇄회로기판(FPCB, 피치 200㎛)과 ITO 유리기판 사이에 가압착한 후, 본더(bonder; 부성사, 한국)를 이용하여 180℃에서 3Mpa의 압력으로 10초간 압착하여 시편을 제조하였다. 접착강도는 Tensilon(AND사, 일본)을 이용하여 90° 접착강도법으로 측정하였다. 인장속도는 50㎜/분으로 행하였다.After pressing the three-layer anisotropic conductive film prepared in Example 1 and Comparative Example 1 between the flexible printed circuit board (FPCB, pitch 200㎛) and the ITO glass substrate, using a bonder (Buseongsa, Korea) A specimen was prepared by pressing at 180 ° C. for 3 seconds at a pressure of 3 Mpa. Adhesive strength was measured by the 90 ° adhesive strength method using Tensilon (AND, Japan). The tensile speed was performed at 50 mm / minute.
또한, 항온항습에서 1000시간 방치 후의 접착강도를 평가하기 위하여, 상기 제조한 시편을 85℃, 85% RH의 조건에서 1000시간 방치 후 동일한 방식으로 접착강도를 측정하였다.In addition, in order to evaluate the adhesive strength after 1000 hours left in constant temperature and humidity, the prepared specimens were measured in the same manner after 1000 hours standing at 85 ℃, 85% RH conditions.
결과는 표 1에 나타내었다.The results are shown in Table 1.
표 1에 나타난 바와 같이, 본 발명에 따른 3층 이방성 도전 필름은 NCF 층에 나노 실리카를 첨가하지 않은 비교예 1에 비해 접착강도가 15N/㎝ 이상으로 우수하게 나타났으며, 항온항습에서 1000시간 방치 후의 접착강도도 10N/㎝ 이상을 유지하였다. 상기한 바와 같이, 본 발명에 따른 3층 이방성 도전 필름은 나노 실리카를 충전제로서 NCF 층에 첨가함으로써 접착강도를 우수하게 나타낸다고 판단된다.As shown in Table 1, the three-layer anisotropic conductive film according to the present invention showed an excellent adhesive strength of 15 N / ㎝ or more compared to Comparative Example 1 without the addition of nano silica to the NCF layer, 1000 hours in constant temperature and humidity The adhesive strength after standing was maintained at 10 N / cm or more. As mentioned above, it is judged that the three-layer anisotropic conductive film which concerns on this invention shows the outstanding adhesive strength by adding nano silica as a filler to a NCF layer.
실험예Experimental Example 2 2 : 도통 신뢰성 및 절연 신뢰성 평가 : Conductivity and Insulation Reliability Evaluation
접착강도 평가시 제조된 시편의 전극 사이에 멀티미터(Advantest사, 일본)를 수 mA로 인가하여 도통 신뢰성을 측정하였고, 고저항계(Advantest사, 일본)를 100V로 인가하여 절연 신뢰성을 측정하였다.When the adhesive strength was evaluated, the conduction reliability was measured by applying a multimeter (Advantest, Japan) at several mA between the electrodes of the prepared specimen, and the insulation reliability was measured by applying a high resistance meter (Advantest, Japan) at 100V.
결과는 표 2에 나타내었다.The results are shown in Table 2.
※ ◎ : 우수, ○ : 보통※ ◎: Excellent, ○: Normal
표 2에 나타난 바와 같이, 본 발명에 따른 3층 이방성 도전 필름은 NCF 층에 나노 실리카를 첨가하지 않은 비교예 1에 비해 도통 신뢰성 및 절연 신뢰성이 우수하게 나타났다. 상기한 바와 같이, 본 발명에 따른 3층 이방성 도전 필름은 NCF 층의 나노 실리카가 ACF 층의 절연 처리된 도전볼을 범프 위에 최대한 많이 올라갈 수 있게 함으로써, 도통 신뢰성 및 절연 신뢰성을 우수하게 나타낸다고 판단된다.As shown in Table 2, the three-layer anisotropic conductive film according to the present invention showed superior conduction reliability and insulation reliability compared to Comparative Example 1 in which nano silica was not added to the NCF layer. As described above, the three-layer anisotropic conductive film according to the present invention is judged to exhibit excellent conduction reliability and insulation reliability by allowing the nano-silica of the NCF layer to rise as much as possible on the bumps the conductive ball of the ACF layer. .
본 발명에 따른 3층 이방성 도전 필름은 나노 실리카를 충전제로서 NCF 층에 첨가함으로써 접착강도를 우수하게 나타내고, NCF 층의 나노 실리카가 ACF 층의 절연 처리된 도전볼을 범프 위에 최대한 많이 올라갈 수 있게 함으로써, 도통 신뢰성 및 절연 신뢰성을 우수하게 나타낸다. 따라서, 본 발명에 따른 3층 이방성 도전 필 름은 액정표시장치 기판 등에 접착제로 사용되어 회로 접속 시 가열가압에 의하여 가압방향으로만 도전성을 띠고, X축과 Y축 방향으로는 도전성을 띠지 않고 우수한 절연성을 갖는다.The three-layer anisotropic conductive film according to the present invention exhibits excellent adhesive strength by adding nano silica as a filler to the NCF layer, and allows the nano silica of the NCF layer to rise as much as possible on the bumps of the conductive balls of the ACF layer. It shows excellent conduction reliability and insulation reliability. Therefore, the three-layer anisotropic conductive film according to the present invention is used as an adhesive for a liquid crystal display substrate and the like, and is conductive only in the pressing direction by heating and pressing in a circuit connection, and excellent in the X and Y axis directions. It has insulation.
도 1은 본 발명에 따른 3층 이방성 도전 필름의 단면을 나타낸 도이다.1 is a view showing a cross section of a three-layer anisotropic conductive film according to the present invention.
도 2는 본 발명에 따른 3층 이방성 도전 필름을 연성인쇄회로기판(FPCB)과 ITO 유리기판 사이에 가압착한 다음 본딩 후의 단면을 나타낸 도이다.2 is a cross-sectional view of the three-layer anisotropic conductive film according to the present invention after the pressure bonding between the flexible printed circuit board (FPCB) and the ITO glass substrate and then bonded.
도 3은 본 발명에 따른 3층 이방성 도전 필름에서 ACF 필름 및 NCF 필름의 제조공정을 나타낸 도이다.3 is a view showing a manufacturing process of the ACF film and NCF film in the three-layer anisotropic conductive film according to the present invention.
도 4는 본 발명에 따른 3층 이방성 도전 필름의 제조 시 ACF 필름과 NCF 필름의 라미네이트 공정을 나타낸 도이다.4 is a view showing a lamination process of the ACF film and NCF film in the production of a three-layer anisotropic conductive film according to the present invention.
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US8896117B2 (en) | 2011-11-18 | 2014-11-25 | Cheil Industries, Inc. | Semiconductor device bonded by an anisotropic conductive film |
WO2015057012A1 (en) * | 2013-10-18 | 2015-04-23 | 삼성에스디아이 주식회사 | Anisotropic conductive film composition harmless to human body, anisotropic conductive film, and semiconductor device connected by film |
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US11417866B2 (en) | 2016-11-30 | 2022-08-16 | Lg Display Co., Ltd. | Anisotropic conductive film and display device including the same |
CN115772369A (en) * | 2022-11-28 | 2023-03-10 | 宁波连森电子材料有限公司 | Anisotropic conductive adhesive film with stably distributed conductive balls and preparation method thereof |
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US8896117B2 (en) | 2011-11-18 | 2014-11-25 | Cheil Industries, Inc. | Semiconductor device bonded by an anisotropic conductive film |
WO2015057012A1 (en) * | 2013-10-18 | 2015-04-23 | 삼성에스디아이 주식회사 | Anisotropic conductive film composition harmless to human body, anisotropic conductive film, and semiconductor device connected by film |
KR20150045140A (en) * | 2013-10-18 | 2015-04-28 | 제일모직주식회사 | A composition for use of an anisotropic conductive film causing no harmfulness to human body, an anisotropic conductive film, and a semiconductive device connected by the film |
CN105593945A (en) * | 2013-10-18 | 2016-05-18 | 三星Sdi株式会社 | Anisotropic conductive film composition harmless to human body, anisotropic conductive film, and semiconductor device connected by film |
US10043780B2 (en) | 2016-07-06 | 2018-08-07 | Samsung Electronics Co., Ltd. | Semiconductor package |
US10446525B2 (en) | 2016-07-06 | 2019-10-15 | Samsung Electronic Co., Ltd. | Semiconductor package |
US11417866B2 (en) | 2016-11-30 | 2022-08-16 | Lg Display Co., Ltd. | Anisotropic conductive film and display device including the same |
US11923330B2 (en) | 2021-01-05 | 2024-03-05 | Samsung Display Co., Ltd. | Adhesive member, display device, and manufacturing method of display device |
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