KR20080084218A - 나노 다공성 전극을 이용한 고감도 마이크로밸런스 및 그제조방법 - Google Patents
나노 다공성 전극을 이용한 고감도 마이크로밸런스 및 그제조방법 Download PDFInfo
- Publication number
- KR20080084218A KR20080084218A KR1020070025606A KR20070025606A KR20080084218A KR 20080084218 A KR20080084218 A KR 20080084218A KR 1020070025606 A KR1020070025606 A KR 1020070025606A KR 20070025606 A KR20070025606 A KR 20070025606A KR 20080084218 A KR20080084218 A KR 20080084218A
- Authority
- KR
- South Korea
- Prior art keywords
- electrode
- microbalance
- nano
- thin film
- high sensitivity
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 16
- 230000035945 sensitivity Effects 0.000 title claims abstract description 13
- 239000010409 thin film Substances 0.000 claims abstract description 34
- 229910052751 metal Inorganic materials 0.000 claims abstract description 29
- 239000002184 metal Substances 0.000 claims abstract description 29
- 239000002105 nanoparticle Substances 0.000 claims abstract description 16
- 239000007772 electrode material Substances 0.000 claims abstract description 15
- 238000000034 method Methods 0.000 claims description 29
- 238000007743 anodising Methods 0.000 claims description 28
- 230000008569 process Effects 0.000 claims description 17
- 239000011148 porous material Substances 0.000 claims description 16
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims description 12
- 239000010931 gold Substances 0.000 claims description 12
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 9
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 9
- 239000005486 organic electrolyte Substances 0.000 claims description 8
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 7
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 7
- 238000007736 thin film deposition technique Methods 0.000 claims description 7
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 6
- 239000003792 electrolyte Substances 0.000 claims description 6
- 238000004544 sputter deposition Methods 0.000 claims description 6
- 229910052737 gold Inorganic materials 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 3
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 claims description 3
- 235000015165 citric acid Nutrition 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- 235000006408 oxalic acid Nutrition 0.000 claims description 3
- 235000011007 phosphoric acid Nutrition 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- 229910052938 sodium sulfate Inorganic materials 0.000 claims description 3
- 235000011152 sodium sulphate Nutrition 0.000 claims description 3
- 239000000243 solution Substances 0.000 claims 3
- 239000000463 material Substances 0.000 abstract description 11
- 238000005259 measurement Methods 0.000 abstract description 5
- 238000004452 microanalysis Methods 0.000 abstract description 3
- 230000000694 effects Effects 0.000 abstract description 2
- 230000001747 exhibiting effect Effects 0.000 abstract description 2
- 230000008685 targeting Effects 0.000 abstract description 2
- 239000010936 titanium Substances 0.000 description 19
- 239000008151 electrolyte solution Substances 0.000 description 16
- 229910010413 TiO 2 Inorganic materials 0.000 description 13
- 239000013078 crystal Substances 0.000 description 9
- 239000000523 sample Substances 0.000 description 9
- 239000007864 aqueous solution Substances 0.000 description 7
- 238000003380 quartz crystal microbalance Methods 0.000 description 6
- 229910052719 titanium Inorganic materials 0.000 description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 3
- 229910017855 NH 4 F Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 239000010406 cathode material Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010494 dissociation reaction Methods 0.000 description 2
- 238000000635 electron micrograph Methods 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 1
- 101100396546 Neurospora crassa (strain ATCC 24698 / 74-OR23-1A / CBS 708.71 / DSM 1257 / FGSC 987) tif-6 gene Proteins 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 208000018459 dissociative disease Diseases 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- -1 fluorine ions Chemical class 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N31/00—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods
- G01N31/20—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods using microanalysis, e.g. drop reaction
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N9/00—Investigating density or specific gravity of materials; Analysing materials by determining density or specific gravity
- G01N9/24—Investigating density or specific gravity of materials; Analysing materials by determining density or specific gravity by observing the transmission of wave or particle radiation through the material
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2291/00—Indexing codes associated with group G01N29/00
- G01N2291/04—Wave modes and trajectories
- G01N2291/042—Wave modes
- G01N2291/0426—Bulk waves, e.g. quartz crystal microbalance, torsional waves
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Pathology (AREA)
- Immunology (AREA)
- Nanotechnology (AREA)
- General Health & Medical Sciences (AREA)
- Biochemistry (AREA)
- Manufacturing & Machinery (AREA)
- Molecular Biology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
Abstract
Description
Claims (13)
- 나노 크기의 기공으로 이루어진 다공성 표면을 가진 밸브 메탈 전극이 진동자에 박막으로 형성된 나노 다공성 전극을 이용한 고감도 마이크로밸런스.
- 제1항에 있어서,상기 나노 크기는 직경 10~300nm인 것을 특징으로 하는 나노 다공성 전극을 이용한 고감도 마이크로밸런스.
- 제1항에 있어서,상기 진동자의 표면에 전극물질이 구비되고, 이 전극물질 상에 상기 밸브 메탈 전극이 박막으로 형성된 것을 특징으로 하는 나노 다공성 전극을 이용한 고감도 마이크로밸런스.
- 제3항에 있어서,상기 전극물질은 금 또는 백금, 은, 구리, 알루미늄인 것을 특징으로 하는 나노 다공성 전극을 이용한 고감도 마이크로밸런스.
- 제1항에 있어서,상기 진동자의 표면에 상기 밸브 메탈 전극이 박막으로 직접 형성된 것을 특징으로 하는 나노 다공성 전극을 이용한 고감도 마이크로밸런스.
- 진동자에 밸브 메탈 전극을 박막으로 형성하는 제1공정; 및상기 밸브 메탈 박막 전극에 나노 크기의 기공으로 이루어진 다공성 표면을 형성하는 제2공정을 포함하여 이루어지는 나노 다공성 전극을 이용한 고감도 마이크로밸런스의 제조방법.
- 제6항에 있어서,상기 제1공정은 450~600℃의 온도에서 박막증착법에 의해 이루어지는 것을 특징으로 하는 나노 다공성 전극을 이용한 고감도 마이크로밸런스의 제조방법.
- 제7항에 있어서,상기 박막증착법은 직류 스퍼터링법인 것을 특징으로 하는 나노 다공성 전극 을 이용한 고감도 마이크로밸런스의 제조방법.
- 제6항에 있어서,상기 제2공정은 아노다이징에 의해 이루어지는 것을 특징으로 하는 나노 다공성 전극을 이용한 고감도 마이크로밸런스의 제조방법.
- 제9항에 있어서,상기 아노다이징은,황산, 오르토인산, 옥살산, 황산나트륨, 시트르산 수용액 또는 이들의 혼합액에 플루오르화물이 첨가된 수용액 전해질에서 이루어지는 것을 특징으로 하는 나노 다공성 전극을 이용한 고감도 마이크로밸런스의 제조방법.
- 제10항에 있어서,상기 아노다이징은,상기 수용액 전해질에서 10∼25V의 인가 전압으로 수행되는 것을 특징으로 하는 나노 다공성 전극을 이용한 고감도 마이크로밸런스의 제조방법.
- 제9항에 있어서,상기 아노다이징은,글리세롤에 플루오르화물이 첨가된 유기 전해질 용액에서 이루어지는 것을 특징으로 하는 나노 다공성 전극을 이용한 고감도 마이크로밸런스의 제조방법.
- 제12항에 있어서,상기 아노다이징은,상기 유기 전해질에서 10∼80V의 인가 전압으로 수행되는 것을 특징으로 하는 나노 다공성 전극을 이용한 고감도 마이크로밸런스의 제조방법.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020070025606A KR20080084218A (ko) | 2007-03-15 | 2007-03-15 | 나노 다공성 전극을 이용한 고감도 마이크로밸런스 및 그제조방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020070025606A KR20080084218A (ko) | 2007-03-15 | 2007-03-15 | 나노 다공성 전극을 이용한 고감도 마이크로밸런스 및 그제조방법 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20080084218A true KR20080084218A (ko) | 2008-09-19 |
Family
ID=40024607
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020070025606A KR20080084218A (ko) | 2007-03-15 | 2007-03-15 | 나노 다공성 전극을 이용한 고감도 마이크로밸런스 및 그제조방법 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR20080084218A (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101253772B1 (ko) * | 2010-11-16 | 2013-04-12 | 광운대학교 산학협력단 | 전극의 임피던스에 따라 약물의 주입량을 확인할 수 있는 약물주입장치 |
KR20230128835A (ko) | 2022-02-28 | 2023-09-05 | 이길호 | 미량 자동 측정장치 |
-
2007
- 2007-03-15 KR KR1020070025606A patent/KR20080084218A/ko active Search and Examination
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101253772B1 (ko) * | 2010-11-16 | 2013-04-12 | 광운대학교 산학협력단 | 전극의 임피던스에 따라 약물의 주입량을 확인할 수 있는 약물주입장치 |
KR20230128835A (ko) | 2022-02-28 | 2023-09-05 | 이길호 | 미량 자동 측정장치 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Zaraska et al. | Synthesis of nanoporous tin oxide layers by electrochemical anodization | |
Juodkazytė et al. | Iridium anodic oxidation to Ir (III) and Ir (IV) hydrous oxides | |
Juodkazis et al. | Anodic dissolution of palladium in sulfuric acid: An electrochemical quartz crystal microbalance study | |
El-Sayed et al. | Controlled growth and monitoring of tantalum oxide nanostructures | |
Ryshchenko et al. | Electrochemical synthesis of crystalline niobium oxide | |
KR100736252B1 (ko) | 비액정상에서의 메조포러스 금속전극의 제조방법 및 이의응용 | |
Pauporte et al. | Impedance spectroscopy study of anodic growth of thick zirconium oxide films in H 2 SO 4, Na 2 SO 4 and NaOH solutions | |
JP5814173B2 (ja) | 電気化学測定用カーボン電極およびその製造方法 | |
KR20080084218A (ko) | 나노 다공성 전극을 이용한 고감도 마이크로밸런스 및 그제조방법 | |
Li et al. | Influence of the microstructure of sputtered Ti films on the anodization toward TiO2 nanotube arrays | |
Manut et al. | Characterization of titanium dioxide (TiO 2) nanotubes for resistive-type humidity sensor | |
Tzvetkov et al. | An electrochemical and surface analytical study of the formation of nanoporous oxides on niobium | |
Babić et al. | The effect of alloying with antimony on the electrochemical properties of lead | |
Cojocaru et al. | Electrochemical investigation of the deposition/dissolution of selenium in choline chloride with urea or ethylene glycol ionic liquids | |
Wang et al. | Corrosion behavior of hafnium in anhydrous isopropanol and acetonitrile solutions containing bromide ions | |
AbduláAziz | Surfactant and polymer-free electrochemical micropatterning of carboxylated multi-walled carbon nanotubes on indium tin oxide electrodes | |
Nemes et al. | Porous anodic alumina films obtained by two step anodization | |
Chen et al. | The effect of anodizing voltage on the electrical properties of Al–Ti composite oxide film on aluminum | |
Mogoda | Electrochemical behaviour of zirconium and the anodic oxide film in aqueous solutions containing chloride ions | |
El-Egamy | Electrochemical behavior of antimony and antimony oxide films in acid solutions | |
Mihai et al. | Synthesis of copper nanowires using aqueous and ionic liquid electrolytes for electrochemical detection | |
Agapescu et al. | Characterization and corrosion behavior of BiTeSe thin films grown by electrodeposition from choline chloride-oxalic acid ionic liquid | |
Zhao et al. | Insights into the breakdown mechanism of anodic oxide film | |
Pawale et al. | Room Temperature Surface Oxidation by Alkalization of Binder Free CuO Nanostructured Electrode for Enhanced Supercapacitive Performance | |
Ngadiman et al. | Determination of the pH sensitivity level of anodized Ta 2 O 5 nanotubular using pH buffer solution: Towards engine oil deterioration sensor |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20070315 |
|
PA0201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20080529 Patent event code: PE09021S01D |
|
AMND | Amendment | ||
PG1501 | Laying open of application | ||
E601 | Decision to refuse application | ||
PE0601 | Decision on rejection of patent |
Patent event date: 20081127 Comment text: Decision to Refuse Application Patent event code: PE06012S01D Patent event date: 20080529 Comment text: Notification of reason for refusal Patent event code: PE06011S01I |
|
J201 | Request for trial against refusal decision | ||
PJ0201 | Trial against decision of rejection |
Patent event date: 20081230 Comment text: Request for Trial against Decision on Refusal Patent event code: PJ02012R01D Patent event date: 20081127 Comment text: Decision to Refuse Application Patent event code: PJ02011S01I Appeal kind category: Appeal against decision to decline refusal Decision date: 20110329 Appeal identifier: 2008101014089 Request date: 20081230 |
|
AMND | Amendment | ||
PB0901 | Examination by re-examination before a trial |
Comment text: Amendment to Specification, etc. Patent event date: 20090128 Patent event code: PB09011R02I Comment text: Request for Trial against Decision on Refusal Patent event date: 20081230 Patent event code: PB09011R01I Comment text: Amendment to Specification, etc. Patent event date: 20080729 Patent event code: PB09011R02I |
|
B601 | Maintenance of original decision after re-examination before a trial | ||
E801 | Decision on dismissal of amendment | ||
PB0601 | Maintenance of original decision after re-examination before a trial |
Comment text: Report of Result of Re-examination before a Trial Patent event code: PB06011S01D Patent event date: 20090226 |
|
PE0801 | Dismissal of amendment |
Patent event code: PE08012E01D Comment text: Decision on Dismissal of Amendment Patent event date: 20090226 Patent event code: PE08011R01I Comment text: Amendment to Specification, etc. Patent event date: 20090128 Patent event code: PE08011R01I Comment text: Amendment to Specification, etc. Patent event date: 20080729 |
|
J301 | Trial decision |
Free format text: TRIAL DECISION FOR APPEAL AGAINST DECISION TO DECLINE REFUSAL REQUESTED 20081230 Effective date: 20110329 |
|
PJ1301 | Trial decision |
Patent event code: PJ13011S01D Patent event date: 20110329 Comment text: Trial Decision on Objection to Decision on Refusal Appeal kind category: Appeal against decision to decline refusal Request date: 20081230 Decision date: 20110329 Appeal identifier: 2008101014089 |