KR20080031803A - Process for producing an optical film - Google Patents
Process for producing an optical film Download PDFInfo
- Publication number
- KR20080031803A KR20080031803A KR1020070099805A KR20070099805A KR20080031803A KR 20080031803 A KR20080031803 A KR 20080031803A KR 1020070099805 A KR1020070099805 A KR 1020070099805A KR 20070099805 A KR20070099805 A KR 20070099805A KR 20080031803 A KR20080031803 A KR 20080031803A
- Authority
- KR
- South Korea
- Prior art keywords
- resin
- film
- optical film
- inert gas
- extruder
- Prior art date
Links
- 239000012788 optical film Substances 0.000 title claims abstract description 57
- 238000000034 method Methods 0.000 title description 51
- 230000008569 process Effects 0.000 title description 6
- 229920005989 resin Polymers 0.000 claims abstract description 70
- 239000011347 resin Substances 0.000 claims abstract description 70
- 239000008188 pellet Substances 0.000 claims abstract description 36
- 125000004122 cyclic group Chemical group 0.000 claims abstract description 33
- 229920005672 polyolefin resin Polymers 0.000 claims abstract description 33
- 150000001875 compounds Chemical class 0.000 claims abstract description 28
- 239000011261 inert gas Substances 0.000 claims abstract description 22
- 238000004519 manufacturing process Methods 0.000 claims abstract description 22
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 21
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 19
- 239000001301 oxygen Substances 0.000 claims abstract description 19
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 19
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims description 10
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- 125000000962 organic group Chemical group 0.000 claims description 4
- 125000005843 halogen group Chemical group 0.000 claims description 3
- 125000003367 polycyclic group Chemical group 0.000 claims description 3
- 125000002950 monocyclic group Chemical group 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 239000010408 film Substances 0.000 abstract description 76
- 230000003287 optical effect Effects 0.000 abstract description 16
- 230000032258 transport Effects 0.000 abstract description 9
- 239000000155 melt Substances 0.000 abstract description 4
- 230000002349 favourable effect Effects 0.000 abstract 1
- 239000000178 monomer Substances 0.000 description 68
- 229920001577 copolymer Polymers 0.000 description 34
- -1 polyphenylene Polymers 0.000 description 27
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 18
- 239000003054 catalyst Substances 0.000 description 17
- 230000007547 defect Effects 0.000 description 17
- 238000007142 ring opening reaction Methods 0.000 description 16
- 229910052751 metal Inorganic materials 0.000 description 15
- 239000002184 metal Substances 0.000 description 15
- ZSWFCLXCOIISFI-UHFFFAOYSA-N cyclopentadiene Chemical compound C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 14
- 238000005984 hydrogenation reaction Methods 0.000 description 12
- 239000004973 liquid crystal related substance Substances 0.000 description 11
- 239000002904 solvent Substances 0.000 description 11
- 238000002834 transmittance Methods 0.000 description 11
- 238000001125 extrusion Methods 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 8
- 230000006835 compression Effects 0.000 description 8
- 238000007906 compression Methods 0.000 description 8
- 238000001816 cooling Methods 0.000 description 8
- 239000000499 gel Substances 0.000 description 8
- 230000009477 glass transition Effects 0.000 description 8
- 150000002430 hydrocarbons Chemical group 0.000 description 8
- 239000003963 antioxidant agent Substances 0.000 description 7
- 238000000465 moulding Methods 0.000 description 7
- 238000012545 processing Methods 0.000 description 7
- 229920006395 saturated elastomer Polymers 0.000 description 7
- 229920002554 vinyl polymer Polymers 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- 239000000654 additive Substances 0.000 description 6
- 239000000853 adhesive Substances 0.000 description 6
- 230000003078 antioxidant effect Effects 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 238000006116 polymerization reaction Methods 0.000 description 6
- 238000007151 ring opening polymerisation reaction Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 5
- 229920005603 alternating copolymer Polymers 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 238000002844 melting Methods 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- 150000003682 vanadium compounds Chemical class 0.000 description 5
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 4
- ZGEGCLOFRBLKSE-UHFFFAOYSA-N 1-Heptene Chemical compound CCCCCC=C ZGEGCLOFRBLKSE-UHFFFAOYSA-N 0.000 description 4
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 4
- 238000005727 Friedel-Crafts reaction Methods 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- OTTZHAVKAVGASB-UHFFFAOYSA-N hept-2-ene Chemical compound CCCCC=CC OTTZHAVKAVGASB-UHFFFAOYSA-N 0.000 description 4
- 238000005649 metathesis reaction Methods 0.000 description 4
- 239000003607 modifier Substances 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 230000010287 polarization Effects 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 239000004071 soot Substances 0.000 description 4
- JRZJOMJEPLMPRA-UHFFFAOYSA-N 1-nonene Chemical compound CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 3
- VSAWBBYYMBQKIK-UHFFFAOYSA-N 4-[[3,5-bis[(3,5-ditert-butyl-4-hydroxyphenyl)methyl]-2,4,6-trimethylphenyl]methyl]-2,6-ditert-butylphenol Chemical compound CC1=C(CC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)C(C)=C(CC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)C(C)=C1CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 VSAWBBYYMBQKIK-UHFFFAOYSA-N 0.000 description 3
- 241000251468 Actinopterygii Species 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 239000002841 Lewis acid Substances 0.000 description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 description 3
- 238000012644 addition polymerization Methods 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 150000001925 cycloalkenes Chemical class 0.000 description 3
- 150000002019 disulfides Chemical class 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 150000007517 lewis acids Chemical class 0.000 description 3
- XMGQYMWWDOXHJM-UHFFFAOYSA-N limonene Chemical compound CC(=C)C1CCC(C)=CC1 XMGQYMWWDOXHJM-UHFFFAOYSA-N 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- SSDSCDGVMJFTEQ-UHFFFAOYSA-N octadecyl 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 SSDSCDGVMJFTEQ-UHFFFAOYSA-N 0.000 description 3
- 150000002989 phenols Chemical class 0.000 description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 description 3
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 3
- 238000007493 shaping process Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XMGQYMWWDOXHJM-JTQLQIEISA-N (+)-α-limonene Chemical compound CC(=C)[C@@H]1CCC(C)=CC1 XMGQYMWWDOXHJM-JTQLQIEISA-N 0.000 description 2
- PMBXCGGQNSVESQ-UHFFFAOYSA-N 1-Hexanethiol Chemical compound CCCCCCS PMBXCGGQNSVESQ-UHFFFAOYSA-N 0.000 description 2
- AFFLGGQVNFXPEV-UHFFFAOYSA-N 1-decene Chemical compound CCCCCCCCC=C AFFLGGQVNFXPEV-UHFFFAOYSA-N 0.000 description 2
- UAJRSHJHFRVGMG-UHFFFAOYSA-N 1-ethenyl-4-methoxybenzene Chemical compound COC1=CC=C(C=C)C=C1 UAJRSHJHFRVGMG-UHFFFAOYSA-N 0.000 description 2
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical compound CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 2
- CWIYBOJLSWJGKV-UHFFFAOYSA-N 5-methyl-1,3-dihydrobenzimidazole-2-thione Chemical compound CC1=CC=C2NC(S)=NC2=C1 CWIYBOJLSWJGKV-UHFFFAOYSA-N 0.000 description 2
- QVRBGKYLLCLCHL-UHFFFAOYSA-N 5-methylcyclopenta-1,3-diene Chemical compound CC1C=CC=C1 QVRBGKYLLCLCHL-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- QQONPFPTGQHPMA-UHFFFAOYSA-N Propene Chemical compound CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- JWQKMEKSFPNAIB-UHFFFAOYSA-N Silvestrene Natural products CC(=C)C1CCC=C(C)C1 JWQKMEKSFPNAIB-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 150000001299 aldehydes Chemical class 0.000 description 2
- 150000001335 aliphatic alkanes Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 150000001721 carbon Chemical group 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000002788 crimping Methods 0.000 description 2
- RWGFKTVRMDUZSP-UHFFFAOYSA-N cumene Chemical compound CC(C)C1=CC=CC=C1 RWGFKTVRMDUZSP-UHFFFAOYSA-N 0.000 description 2
- DMEGYFMYUHOHGS-UHFFFAOYSA-N cycloheptane Chemical compound C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 2
- QRUYYSPCOGSZGQ-UHFFFAOYSA-L cyclopentane;dichlorozirconium Chemical compound Cl[Zr]Cl.[CH]1[CH][CH][CH][CH]1.[CH]1[CH][CH][CH][CH]1 QRUYYSPCOGSZGQ-UHFFFAOYSA-L 0.000 description 2
- LPIQUOYDBNQMRZ-UHFFFAOYSA-N cyclopentene Chemical compound C1CC=CC1 LPIQUOYDBNQMRZ-UHFFFAOYSA-N 0.000 description 2
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 2
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- BEFDCLMNVWHSGT-UHFFFAOYSA-N ethenylcyclopentane Chemical compound C=CC1CCCC1 BEFDCLMNVWHSGT-UHFFFAOYSA-N 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 230000020169 heat generation Effects 0.000 description 2
- 239000002638 heterogeneous catalyst Substances 0.000 description 2
- 239000002815 homogeneous catalyst Substances 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 239000012948 isocyanate Substances 0.000 description 2
- 150000002513 isocyanates Chemical class 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000005461 lubrication Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 2
- YWAKXRMUMFPDSH-UHFFFAOYSA-N pentene Chemical compound CCCC=C YWAKXRMUMFPDSH-UHFFFAOYSA-N 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 239000002685 polymerization catalyst Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- VIHDTGHDWPVSMM-UHFFFAOYSA-N ruthenium;triphenylphosphane Chemical compound [Ru].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 VIHDTGHDWPVSMM-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 150000003568 thioethers Chemical class 0.000 description 2
- CWERGRDVMFNCDR-UHFFFAOYSA-N thioglycolic acid Chemical compound OC(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-N 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 150000003609 titanium compounds Chemical class 0.000 description 2
- VOITXYVAKOUIBA-UHFFFAOYSA-N triethylaluminium Chemical compound CC[Al](CC)CC VOITXYVAKOUIBA-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 2
- 150000003755 zirconium compounds Chemical class 0.000 description 2
- OJOWICOBYCXEKR-KRXBUXKQSA-N (5e)-5-ethylidenebicyclo[2.2.1]hept-2-ene Chemical compound C1C2C(=C/C)/CC1C=C2 OJOWICOBYCXEKR-KRXBUXKQSA-N 0.000 description 1
- SHWZFQPXYGHRKT-FDGPNNRMSA-N (z)-4-hydroxypent-3-en-2-one;nickel Chemical compound [Ni].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O SHWZFQPXYGHRKT-FDGPNNRMSA-N 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- RGASRBUYZODJTG-UHFFFAOYSA-N 1,1-bis(2,4-ditert-butylphenyl)-2,2-bis(hydroxymethyl)propane-1,3-diol dihydroxyphosphanyl dihydrogen phosphite Chemical compound OP(O)OP(O)O.C(C)(C)(C)C1=C(C=CC(=C1)C(C)(C)C)C(O)(C(CO)(CO)CO)C1=C(C=C(C=C1)C(C)(C)C)C(C)(C)C RGASRBUYZODJTG-UHFFFAOYSA-N 0.000 description 1
- FIDRAVVQGKNYQK-UHFFFAOYSA-N 1,2,3,4-tetrahydrotriazine Chemical compound C1NNNC=C1 FIDRAVVQGKNYQK-UHFFFAOYSA-N 0.000 description 1
- ZZOCRFAYVJWKBF-UHFFFAOYSA-N 1,3,5-trichloro-2-[(2,4,6-trichlorophenyl)disulfanyl]benzene Chemical compound ClC1=CC(Cl)=CC(Cl)=C1SSC1=C(Cl)C=C(Cl)C=C1Cl ZZOCRFAYVJWKBF-UHFFFAOYSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- OIRIHBWXSGNQBG-UHFFFAOYSA-N 1,3-dimethyl-2h-benzimidazole-2-thiol Chemical compound C1=CC=C2N(C)C(S)N(C)C2=C1 OIRIHBWXSGNQBG-UHFFFAOYSA-N 0.000 description 1
- QGKFQPPIXYPVIE-UHFFFAOYSA-N 1,4-dichloro-2-[(2,5-dichlorophenyl)disulfanyl]benzene Chemical compound ClC1=CC=C(Cl)C(SSC=2C(=CC=C(Cl)C=2)Cl)=C1 QGKFQPPIXYPVIE-UHFFFAOYSA-N 0.000 description 1
- SGRHVVLXEBNBDV-UHFFFAOYSA-N 1,6-dibromohexane Chemical compound BrCCCCCCBr SGRHVVLXEBNBDV-UHFFFAOYSA-N 0.000 description 1
- LZSSZWLFLJRXOW-UHFFFAOYSA-N 1-[2-[(1-acetylnaphthalen-2-yl)disulfanyl]naphthalen-1-yl]ethanone Chemical compound C1=CC2=CC=CC=C2C(C(=O)C)=C1SSC1=CC=C(C=CC=C2)C2=C1C(C)=O LZSSZWLFLJRXOW-UHFFFAOYSA-N 0.000 description 1
- KIRIOGATKMSJIW-UHFFFAOYSA-N 1-[4-[(4-acetylphenyl)disulfanyl]phenyl]ethanone Chemical compound C1=CC(C(=O)C)=CC=C1SSC1=CC=C(C(C)=O)C=C1 KIRIOGATKMSJIW-UHFFFAOYSA-N 0.000 description 1
- MNDIARAMWBIKFW-UHFFFAOYSA-N 1-bromohexane Chemical compound CCCCCCBr MNDIARAMWBIKFW-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical class CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- IQCDDWQDDMUOCQ-UHFFFAOYSA-N 1-chloro-2-[(2-chlorophenyl)disulfanyl]benzene Chemical compound ClC1=CC=CC=C1SSC1=CC=CC=C1Cl IQCDDWQDDMUOCQ-UHFFFAOYSA-N 0.000 description 1
- RHCFCHADDXGWJE-UHFFFAOYSA-N 1-chloro-3-methylbuta-1,3-diene Chemical compound CC(=C)C=CCl RHCFCHADDXGWJE-UHFFFAOYSA-N 0.000 description 1
- ZIXXRXGPBFMPFD-UHFFFAOYSA-N 1-chloro-4-[(4-chlorophenyl)disulfanyl]benzene Chemical compound C1=CC(Cl)=CC=C1SSC1=CC=C(Cl)C=C1 ZIXXRXGPBFMPFD-UHFFFAOYSA-N 0.000 description 1
- VFWCMGCRMGJXDK-UHFFFAOYSA-N 1-chlorobutane Chemical compound CCCCCl VFWCMGCRMGJXDK-UHFFFAOYSA-N 0.000 description 1
- NVZWEEGUWXZOKI-UHFFFAOYSA-N 1-ethenyl-2-methylbenzene Chemical compound CC1=CC=CC=C1C=C NVZWEEGUWXZOKI-UHFFFAOYSA-N 0.000 description 1
- JZHGRUMIRATHIU-UHFFFAOYSA-N 1-ethenyl-3-methylbenzene Chemical compound CC1=CC=CC(C=C)=C1 JZHGRUMIRATHIU-UHFFFAOYSA-N 0.000 description 1
- SDRZFSPCVYEJTP-UHFFFAOYSA-N 1-ethenylcyclohexene Chemical compound C=CC1=CCCCC1 SDRZFSPCVYEJTP-UHFFFAOYSA-N 0.000 description 1
- ISSYTHPTTMFJKL-UHFFFAOYSA-N 1-ethenylcyclopentene Chemical compound C=CC1=CCCC1 ISSYTHPTTMFJKL-UHFFFAOYSA-N 0.000 description 1
- WXOHRQAMBKXWME-UHFFFAOYSA-N 1-methyl-2-methylsulfanylbenzimidazole Chemical compound C1=CC=C2N(C)C(SC)=NC2=C1 WXOHRQAMBKXWME-UHFFFAOYSA-N 0.000 description 1
- WOUXRHNTGOLKPF-UHFFFAOYSA-N 1-methyl-3-prop-1-en-2-ylcyclohexane Chemical compound CC1CCCC(C(C)=C)C1 WOUXRHNTGOLKPF-UHFFFAOYSA-N 0.000 description 1
- NZOUVKQMNUZMHI-UHFFFAOYSA-N 1-methyl-4-prop-1-en-2-ylcyclopentene Chemical compound CC(=C)C1CC=C(C)C1 NZOUVKQMNUZMHI-UHFFFAOYSA-N 0.000 description 1
- NXCKJENHTITELM-UHFFFAOYSA-N 1-nitro-2-[(2-nitrophenyl)disulfanyl]benzene Chemical compound [O-][N+](=O)C1=CC=CC=C1SSC1=CC=CC=C1[N+]([O-])=O NXCKJENHTITELM-UHFFFAOYSA-N 0.000 description 1
- IGGDKDTUCAWDAN-UHFFFAOYSA-N 1-vinylnaphthalene Chemical compound C1=CC=C2C(C=C)=CC=CC2=C1 IGGDKDTUCAWDAN-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- KGRVJHAUYBGFFP-UHFFFAOYSA-N 2,2'-Methylenebis(4-methyl-6-tert-butylphenol) Chemical compound CC(C)(C)C1=CC(C)=CC(CC=2C(=C(C=C(C)C=2)C(C)(C)C)O)=C1O KGRVJHAUYBGFFP-UHFFFAOYSA-N 0.000 description 1
- QXRJQSYBWURKHH-UHFFFAOYSA-N 2,2,3,3-tetrafluorobicyclo[2.2.1]hept-5-ene Chemical compound C1C2C=CC1C(F)(F)C2(F)F QXRJQSYBWURKHH-UHFFFAOYSA-N 0.000 description 1
- DCSRANNUZMQMBI-UHFFFAOYSA-N 2,2,3,3-tetrakis(trifluoromethyl)bicyclo[2.2.1]hept-5-ene Chemical compound C1C2C=CC1C(C(F)(F)F)(C(F)(F)F)C2(C(F)(F)F)C(F)(F)F DCSRANNUZMQMBI-UHFFFAOYSA-N 0.000 description 1
- YAJYJWXEWKRTPO-UHFFFAOYSA-N 2,3,3,4,4,5-hexamethylhexane-2-thiol Chemical compound CC(C)C(C)(C)C(C)(C)C(C)(C)S YAJYJWXEWKRTPO-UHFFFAOYSA-N 0.000 description 1
- JZEKVGIWHZEUSP-UHFFFAOYSA-N 2,3,3-trifluoro-2-(1,1,2,2,3,3,3-heptafluoropropoxy)bicyclo[2.2.1]hept-5-ene Chemical compound C1C2C=CC1C(OC(F)(F)C(F)(F)C(F)(F)F)(F)C2(F)F JZEKVGIWHZEUSP-UHFFFAOYSA-N 0.000 description 1
- VYZIEGKTECJOGF-UHFFFAOYSA-N 2,3,3-trifluoro-2-(trifluoromethoxy)bicyclo[2.2.1]hept-5-ene Chemical compound C1C2C=CC1C(OC(F)(F)F)(F)C2(F)F VYZIEGKTECJOGF-UHFFFAOYSA-N 0.000 description 1
- UOYKBJNWNACIRX-UHFFFAOYSA-N 2,3,3-trifluorobicyclo[2.2.1]hept-5-ene Chemical compound C1C2C=CC1C(F)C2(F)F UOYKBJNWNACIRX-UHFFFAOYSA-N 0.000 description 1
- BBZVRBFORXMYKR-UHFFFAOYSA-N 2,3,3-tris(fluoromethyl)bicyclo[2.2.1]hept-5-ene Chemical compound C1C2C=CC1C(CF)C2(CF)CF BBZVRBFORXMYKR-UHFFFAOYSA-N 0.000 description 1
- ZGNJHKOQQSEQRR-UHFFFAOYSA-N 2,3-bis(trifluoromethyl)bicyclo[2.2.1]hept-5-ene Chemical compound C1C2C=CC1C(C(F)(F)F)C2C(F)(F)F ZGNJHKOQQSEQRR-UHFFFAOYSA-N 0.000 description 1
- TYKYYCGDCBEYCR-UHFFFAOYSA-N 2,3-dichloro-2,3-bis(trifluoromethyl)bicyclo[2.2.1]hept-5-ene Chemical compound C1C2C=CC1C(C(F)(F)F)(Cl)C2(Cl)C(F)(F)F TYKYYCGDCBEYCR-UHFFFAOYSA-N 0.000 description 1
- PQHHGTDOGKMDGU-UHFFFAOYSA-N 2,3-difluoro-2,3-bis(trifluoromethyl)bicyclo[2.2.1]hept-5-ene Chemical compound C1C2C=CC1C(C(F)(F)F)(F)C2(F)C(F)(F)F PQHHGTDOGKMDGU-UHFFFAOYSA-N 0.000 description 1
- DKFVTFNJIYIYNV-UHFFFAOYSA-N 2,3-difluorobicyclo[2.2.1]hept-5-ene Chemical compound C1C2C(F)C(F)C1C=C2 DKFVTFNJIYIYNV-UHFFFAOYSA-N 0.000 description 1
- ZXDDPOHVAMWLBH-UHFFFAOYSA-N 2,4-Dihydroxybenzophenone Chemical compound OC1=CC(O)=CC=C1C(=O)C1=CC=CC=C1 ZXDDPOHVAMWLBH-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- CMXJXFPEZDHKPW-UHFFFAOYSA-N 2-[(1-cyanonaphthalen-2-yl)disulfanyl]naphthalene-1-carbonitrile Chemical compound C1=CC2=CC=CC=C2C(C#N)=C1SSC1=CC=C(C=CC=C2)C2=C1C#N CMXJXFPEZDHKPW-UHFFFAOYSA-N 0.000 description 1
- FZFMOEQAUCLKLC-UHFFFAOYSA-N 2-[(2-ethoxycarbonylphenyl)disulfanyl]benzoic acid Chemical compound CCOC(=O)C1=CC=CC=C1SSC1=CC=CC=C1C(O)=O FZFMOEQAUCLKLC-UHFFFAOYSA-N 0.000 description 1
- QSRJVOOOWGXUDY-UHFFFAOYSA-N 2-[2-[2-[3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propanoyloxy]ethoxy]ethoxy]ethyl 3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C)=CC(CCC(=O)OCCOCCOCCOC(=O)CCC=2C=C(C(O)=C(C)C=2)C(C)(C)C)=C1 QSRJVOOOWGXUDY-UHFFFAOYSA-N 0.000 description 1
- GCXFFKSSLAVMIW-UHFFFAOYSA-N 2-chloro-1-[(2-chloronaphthalen-1-yl)disulfanyl]naphthalene Chemical compound C1=CC=C2C(SSC3=C4C=CC=CC4=CC=C3Cl)=C(Cl)C=CC2=C1 GCXFFKSSLAVMIW-UHFFFAOYSA-N 0.000 description 1
- CBQAACXHLISDSO-UHFFFAOYSA-N 2-ethylcyclopenta-1,3-diene Chemical compound CCC1=CCC=C1 CBQAACXHLISDSO-UHFFFAOYSA-N 0.000 description 1
- GAODDBNJCKQQDY-UHFFFAOYSA-N 2-methyl-4,6-bis(octylsulfanylmethyl)phenol Chemical compound CCCCCCCCSCC1=CC(C)=C(O)C(CSCCCCCCCC)=C1 GAODDBNJCKQQDY-UHFFFAOYSA-N 0.000 description 1
- AHQZRFBZJSCKAV-UHFFFAOYSA-N 2-methylcyclopenta-1,3-diene Chemical compound CC1=CCC=C1 AHQZRFBZJSCKAV-UHFFFAOYSA-N 0.000 description 1
- AQZWEFBJYQSQEH-UHFFFAOYSA-N 2-methyloxaluminane Chemical compound C[Al]1CCCCO1 AQZWEFBJYQSQEH-UHFFFAOYSA-N 0.000 description 1
- OCKJFOHZLXIAAT-UHFFFAOYSA-N 2-methylsulfanyl-1h-benzimidazole Chemical compound C1=CC=C2NC(SC)=NC2=C1 OCKJFOHZLXIAAT-UHFFFAOYSA-N 0.000 description 1
- MSBVBOUOMVTWKE-UHFFFAOYSA-N 2-naphthalen-2-ylnaphthalene Chemical group C1=CC=CC2=CC(C3=CC4=CC=CC=C4C=C3)=CC=C21 MSBVBOUOMVTWKE-UHFFFAOYSA-N 0.000 description 1
- IKEHOXWJQXIQAG-UHFFFAOYSA-N 2-tert-butyl-4-methylphenol Chemical compound CC1=CC=C(O)C(C(C)(C)C)=C1 IKEHOXWJQXIQAG-UHFFFAOYSA-N 0.000 description 1
- KXYAVSFOJVUIHT-UHFFFAOYSA-N 2-vinylnaphthalene Chemical compound C1=CC=CC2=CC(C=C)=CC=C21 KXYAVSFOJVUIHT-UHFFFAOYSA-N 0.000 description 1
- SWAOPJBBOBPJCO-UHFFFAOYSA-N 3,3-difluoro-2,2-bis(trifluoromethyl)bicyclo[2.2.1]hept-5-ene Chemical compound C1C2C=CC1C(C(F)(F)F)(C(F)(F)F)C2(F)F SWAOPJBBOBPJCO-UHFFFAOYSA-N 0.000 description 1
- BMCXXUMPWCKNTH-UHFFFAOYSA-N 3-chloro-2,2,3-trifluorobicyclo[2.2.1]hept-5-ene Chemical compound C1C2C=CC1C(F)(F)C2(F)Cl BMCXXUMPWCKNTH-UHFFFAOYSA-N 0.000 description 1
- BQEUZNRCEKKGJF-UHFFFAOYSA-N 3-fluoro-3-(1,1,2,2,2-pentafluoroethyl)-2,2-bis(trifluoromethyl)bicyclo[2.2.1]hept-5-ene Chemical compound C1C2C=CC1C(C(F)(F)C(F)(F)F)(F)C2(C(F)(F)F)C(F)(F)F BQEUZNRCEKKGJF-UHFFFAOYSA-N 0.000 description 1
- CDNHLXOFELOEOL-UHFFFAOYSA-N 3-methyl-1h-benzimidazole-2-thione Chemical compound C1=CC=C2N(C)C(S)=NC2=C1 CDNHLXOFELOEOL-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- BBDKZWKEPDTENS-UHFFFAOYSA-N 4-Vinylcyclohexene Chemical compound C=CC1CCC=CC1 BBDKZWKEPDTENS-UHFFFAOYSA-N 0.000 description 1
- QHGRZHKKJGYARF-UHFFFAOYSA-N 4-[(4-carbamoylphenyl)disulfanyl]benzamide Chemical compound C1=CC(C(=O)N)=CC=C1SSC1=CC=C(C(N)=O)C=C1 QHGRZHKKJGYARF-UHFFFAOYSA-N 0.000 description 1
- SBAMFAXGFRIYFD-UHFFFAOYSA-N 4-ethenylcyclopentene Chemical compound C=CC1CC=CC1 SBAMFAXGFRIYFD-UHFFFAOYSA-N 0.000 description 1
- UDQCDDZBBZNIFA-UHFFFAOYSA-N 4-methyl-1,3-dihydrobenzimidazole-2-thione Chemical compound CC1=CC=CC2=C1NC(=S)N2 UDQCDDZBBZNIFA-UHFFFAOYSA-N 0.000 description 1
- CQDXMEWDEWRRIS-UHFFFAOYSA-N 4-prop-1-en-2-ylcyclohexene Chemical compound CC(=C)C1CCC=CC1 CQDXMEWDEWRRIS-UHFFFAOYSA-N 0.000 description 1
- SJQUAKKVMGAVKS-UHFFFAOYSA-N 5,5-bis(trifluoromethyl)bicyclo[2.2.1]hept-2-ene Chemical compound C1C2C(C(F)(F)F)(C(F)(F)F)CC1C=C2 SJQUAKKVMGAVKS-UHFFFAOYSA-N 0.000 description 1
- UWQSIGZFGLPCHM-UHFFFAOYSA-N 5,5-difluorobicyclo[2.2.1]hept-2-ene Chemical compound C1C2C(F)(F)CC1C=C2 UWQSIGZFGLPCHM-UHFFFAOYSA-N 0.000 description 1
- CKUXMYYDAQIJRQ-UHFFFAOYSA-N 5,6-dimethyl-1,3-dihydrobenzimidazole-2-thione Chemical compound C1=C(C)C(C)=CC2=C1NC(=S)N2 CKUXMYYDAQIJRQ-UHFFFAOYSA-N 0.000 description 1
- RWRMFNVEDYUTDQ-UHFFFAOYSA-N 5-(1,1,2,2,2-pentafluoroethyl)bicyclo[2.2.1]hept-2-ene Chemical compound C1C2C(C(F)(F)C(F)(F)F)CC1C=C2 RWRMFNVEDYUTDQ-UHFFFAOYSA-N 0.000 description 1
- FEYUUIYEFBYGPR-UHFFFAOYSA-N 5-(fluoromethyl)bicyclo[2.2.1]hept-2-ene Chemical compound C1C2C(CF)CC1C=C2 FEYUUIYEFBYGPR-UHFFFAOYSA-N 0.000 description 1
- PBNBTJLQHASCPE-UHFFFAOYSA-N 5-(trifluoromethyl)bicyclo[2.2.1]hept-2-ene Chemical compound C1C2C(C(F)(F)F)CC1C=C2 PBNBTJLQHASCPE-UHFFFAOYSA-N 0.000 description 1
- QHJIJNGGGLNBNJ-UHFFFAOYSA-N 5-ethylbicyclo[2.2.1]hept-2-ene Chemical compound C1C2C(CC)CC1C=C2 QHJIJNGGGLNBNJ-UHFFFAOYSA-N 0.000 description 1
- LFBHYIUTPVORTR-UHFFFAOYSA-N 5-fluorobicyclo[2.2.1]hept-2-ene Chemical compound C1C2C(F)CC1C=C2 LFBHYIUTPVORTR-UHFFFAOYSA-N 0.000 description 1
- OXGPYKJRQDQTQU-UHFFFAOYSA-N 5-methyl-5-(trifluoromethyl)bicyclo[2.2.1]hept-2-ene Chemical compound C1C2C(C)(C(F)(F)F)CC1C=C2 OXGPYKJRQDQTQU-UHFFFAOYSA-N 0.000 description 1
- PCBPVYHMZBWMAZ-UHFFFAOYSA-N 5-methylbicyclo[2.2.1]hept-2-ene Chemical compound C1C2C(C)CC1C=C2 PCBPVYHMZBWMAZ-UHFFFAOYSA-N 0.000 description 1
- PGNNHYNYFLXKDZ-UHFFFAOYSA-N 5-phenylbicyclo[2.2.1]hept-2-ene Chemical compound C1=CC2CC1CC2C1=CC=CC=C1 PGNNHYNYFLXKDZ-UHFFFAOYSA-N 0.000 description 1
- ZVVFVKJZNVSANF-UHFFFAOYSA-N 6-[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxy]hexyl 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CCC(=O)OCCCCCCOC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=C1 ZVVFVKJZNVSANF-UHFFFAOYSA-N 0.000 description 1
- FWTCMFUMDIZFFI-UHFFFAOYSA-N 9,10-bis(trifluoromethyl)tetracyclo[6.2.1.13,6.02,7]dodec-4-ene Chemical compound C1C(C23)C=CC1C3C1CC2C(C(F)(F)F)C1C(F)(F)F FWTCMFUMDIZFFI-UHFFFAOYSA-N 0.000 description 1
- HRAIKBXICFKQRO-UHFFFAOYSA-N 9,10-difluoro-9,10-bis(trifluoromethyl)tetracyclo[6.2.1.13,6.02,7]dodec-4-ene Chemical compound C1C(C23)C=CC1C3C1CC2C(C(F)(F)F)(F)C1(F)C(F)(F)F HRAIKBXICFKQRO-UHFFFAOYSA-N 0.000 description 1
- ZVVAFZLIJXQMPY-UHFFFAOYSA-N 9,10-difluorotetracyclo[6.2.1.13,6.02,7]dodec-4-ene Chemical compound C1C(C23)C=CC1C3C1CC2C(F)C1F ZVVAFZLIJXQMPY-UHFFFAOYSA-N 0.000 description 1
- NVQCIGFOMGXANF-UHFFFAOYSA-N 9,9,10,10-tetrafluorotetracyclo[6.2.1.13,6.02,7]dodec-4-ene Chemical compound C1C(C23)C=CC1C3C1CC2C(F)(F)C1(F)F NVQCIGFOMGXANF-UHFFFAOYSA-N 0.000 description 1
- BVNDRMIWLRTDFY-UHFFFAOYSA-N 9,9,10,10-tetrakis(trifluoromethyl)tetracyclo[6.2.1.13,6.02,7]dodec-4-ene Chemical compound C1C(C23)C=CC1C3C1CC2C(C(F)(F)F)(C(F)(F)F)C1(C(F)(F)F)C(F)(F)F BVNDRMIWLRTDFY-UHFFFAOYSA-N 0.000 description 1
- NDXHBYZNTBRKEW-UHFFFAOYSA-N 9,9,10-trifluoro-10-(trifluoromethoxy)tetracyclo[6.2.1.13,6.02,7]dodec-4-ene Chemical compound C1C(C23)C=CC1C3C1CC2C(OC(F)(F)F)(F)C1(F)F NDXHBYZNTBRKEW-UHFFFAOYSA-N 0.000 description 1
- AOQLYECUIIBGFT-UHFFFAOYSA-N 9,9,10-trifluoro-10-(trifluoromethyl)tetracyclo[6.2.1.13,6.02,7]dodec-4-ene Chemical compound FC(F)(F)C1(F)C2CC(C3C4CC(C=C4)C23)C1(F)F AOQLYECUIIBGFT-UHFFFAOYSA-N 0.000 description 1
- LBRVDIUBNUGRCI-UHFFFAOYSA-N 9,9,10-trifluorotetracyclo[6.2.1.13,6.02,7]dodec-4-ene Chemical compound C1C(C23)C=CC1C3C1CC2C(F)C1(F)F LBRVDIUBNUGRCI-UHFFFAOYSA-N 0.000 description 1
- XZBBPGCWLQFDBR-UHFFFAOYSA-N 9,9,10-tris(trifluoromethyl)tetracyclo[6.2.1.13,6.02,7]dodec-4-ene Chemical compound C1C(C23)C=CC1C3C1CC2C(C(F)(F)F)C1(C(F)(F)F)C(F)(F)F XZBBPGCWLQFDBR-UHFFFAOYSA-N 0.000 description 1
- YKMKGZWSYWUCPS-UHFFFAOYSA-N 9,9-difluoro-10,10-bis(trifluoromethyl)tetracyclo[6.2.1.13,6.02,7]dodec-4-ene Chemical compound C1C(C23)C=CC1C3C1CC2C(C(F)(F)F)(C(F)(F)F)C1(F)F YKMKGZWSYWUCPS-UHFFFAOYSA-N 0.000 description 1
- PBIDTCFSVFIAOT-UHFFFAOYSA-N 9,9-difluorotetracyclo[6.2.1.13,6.02,7]dodec-4-ene Chemical compound C1C(C23)C=CC1C3C1CC2CC1(F)F PBIDTCFSVFIAOT-UHFFFAOYSA-N 0.000 description 1
- GSCPQFDGDIPECG-UHFFFAOYSA-N 9-(1,1,2,2,2-pentafluoroethyl)tetracyclo[6.2.1.13,6.02,7]dodec-4-ene Chemical compound C1C(C23)C=CC1C3C1CC2CC1C(F)(F)C(F)(F)F GSCPQFDGDIPECG-UHFFFAOYSA-N 0.000 description 1
- LYNAXHUAVQITQG-UHFFFAOYSA-N 9-(trifluoromethyl)tetracyclo[6.2.1.13,6.02,7]dodec-4-ene Chemical compound C1C(C23)C=CC1C3C1CC2CC1C(F)(F)F LYNAXHUAVQITQG-UHFFFAOYSA-N 0.000 description 1
- CSRQAJIMYJHHHQ-UHFFFAOYSA-N 9-ethylidenetetracyclo[6.2.1.13,6.02,7]dodec-4-ene Chemical compound C1C(C23)C=CC1C3C1CC2CC1=CC CSRQAJIMYJHHHQ-UHFFFAOYSA-N 0.000 description 1
- KDUJSXYOLBPKQW-UHFFFAOYSA-N 9-methyl-9-(trifluoromethyl)tetracyclo[6.2.1.13,6.02,7]dodec-4-ene Chemical compound C1C(C23)C=CC1C3C1CC2CC1(C)C(F)(F)F KDUJSXYOLBPKQW-UHFFFAOYSA-N 0.000 description 1
- LUZRCAIWLRPMQK-UHFFFAOYSA-N 9-phenyltetracyclo[6.2.1.13,6.02,7]dodec-4-ene Chemical compound C1C(C23)C=CC1C3C1CC2CC1C1=CC=CC=C1 LUZRCAIWLRPMQK-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 239000007848 Bronsted acid Substances 0.000 description 1
- WTNDCLHZOUWMMW-UHFFFAOYSA-N C(C)(C)OC1=CC=C(C=C1)C1=CCCCCC1 Chemical compound C(C)(C)OC1=CC=C(C=C1)C1=CCCCCC1 WTNDCLHZOUWMMW-UHFFFAOYSA-N 0.000 description 1
- SPQXCRJWEGUPLE-UHFFFAOYSA-N C(C)[C-]1OCCCC1 Chemical compound C(C)[C-]1OCCCC1 SPQXCRJWEGUPLE-UHFFFAOYSA-N 0.000 description 1
- GPKBWHIDABESCF-UHFFFAOYSA-N C1C(C23)C=CC1C3C1CC2CC1(C(F)(F)F)C(F)(F)F Chemical compound C1C(C23)C=CC1C3C1CC2CC1(C(F)(F)F)C(F)(F)F GPKBWHIDABESCF-UHFFFAOYSA-N 0.000 description 1
- PEMJSEWVUKBDMC-UHFFFAOYSA-N C1C(C23)C=CC1C3C1CC2CC1CF Chemical compound C1C(C23)C=CC1C3C1CC2CC1CF PEMJSEWVUKBDMC-UHFFFAOYSA-N 0.000 description 1
- SVUVSYOINDDSQU-UHFFFAOYSA-N C1C(C23)C=CC1C3C1CC2CC1F Chemical compound C1C(C23)C=CC1C3C1CC2CC1F SVUVSYOINDDSQU-UHFFFAOYSA-N 0.000 description 1
- 229910019912 CrN Inorganic materials 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- GHKOFFNLGXMVNJ-UHFFFAOYSA-N Didodecyl thiobispropanoate Chemical compound CCCCCCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCCCCCC GHKOFFNLGXMVNJ-UHFFFAOYSA-N 0.000 description 1
- BWGNESOTFCXPMA-UHFFFAOYSA-N Dihydrogen disulfide Chemical compound SS BWGNESOTFCXPMA-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- AQCJNHXIXWDJRR-UHFFFAOYSA-N FC(COC(=O)C1C2C3C4C=CC(C3C(C1)C2)C4)(F)F Chemical compound FC(COC(=O)C1C2C3C4C=CC(C3C(C1)C2)C4)(F)F AQCJNHXIXWDJRR-UHFFFAOYSA-N 0.000 description 1
- JAWOMMZQIRFXLO-UHFFFAOYSA-N FC(F)(F)C(F)(F)C1(F)C2CC(C3C4CC(C=C4)C23)C1(C(F)(F)F)C(F)(F)F Chemical compound FC(F)(F)C(F)(F)C1(F)C2CC(C3C4CC(C=C4)C23)C1(C(F)(F)F)C(F)(F)F JAWOMMZQIRFXLO-UHFFFAOYSA-N 0.000 description 1
- JDOMETNUXXJBLU-UHFFFAOYSA-N FC(F)(F)C1(Cl)C2CC(C3C4CC(C=C4)C23)C1(Cl)C(F)(F)F Chemical compound FC(F)(F)C1(Cl)C2CC(C3C4CC(C=C4)C23)C1(Cl)C(F)(F)F JDOMETNUXXJBLU-UHFFFAOYSA-N 0.000 description 1
- IUFDKXHBISYTIF-UHFFFAOYSA-N FC(F)C1CC2CC1C1C3CC(C=C3)C21 Chemical compound FC(F)C1CC2CC1C1C3CC(C=C3)C21 IUFDKXHBISYTIF-UHFFFAOYSA-N 0.000 description 1
- ZWXLBSDRKQKBAO-UHFFFAOYSA-N FC1(C2C3C4C=CC(C3C(C1(OC(CC(F)(F)F)(F)F)F)C2)C4)F Chemical compound FC1(C2C3C4C=CC(C3C(C1(OC(CC(F)(F)F)(F)F)F)C2)C4)F ZWXLBSDRKQKBAO-UHFFFAOYSA-N 0.000 description 1
- OQZICMQVZIZREZ-UHFFFAOYSA-N FC1(F)C2CC(C3C4CC(C=C4)C23)C1(F)Cl Chemical compound FC1(F)C2CC(C3C4CC(C=C4)C23)C1(F)Cl OQZICMQVZIZREZ-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- RJUFJBKOKNCXHH-UHFFFAOYSA-N Methyl propionate Chemical compound CCC(=O)OC RJUFJBKOKNCXHH-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- FDBMBOYIVUGUSL-UHFFFAOYSA-N OP(O)OP(O)O.C(C)(C)(C)C1=C(C(=CC(=C1)C)C(C)(C)C)C(O)(C(CO)(CO)CO)C1=C(C=C(C=C1C(C)(C)C)C)C(C)(C)C Chemical compound OP(O)OP(O)O.C(C)(C)(C)C1=C(C(=CC(=C1)C)C(C)(C)C)C(O)(C(CO)(CO)CO)C1=C(C=C(C=C1C(C)(C)C)C)C(C)(C)C FDBMBOYIVUGUSL-UHFFFAOYSA-N 0.000 description 1
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical group ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- JKIJEFPNVSHHEI-UHFFFAOYSA-N Phenol, 2,4-bis(1,1-dimethylethyl)-, phosphite (3:1) Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC=C1OP(OC=1C(=CC(=CC=1)C(C)(C)C)C(C)(C)C)OC1=CC=C(C(C)(C)C)C=C1C(C)(C)C JKIJEFPNVSHHEI-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 229920000265 Polyparaphenylene Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910010037 TiAlN Inorganic materials 0.000 description 1
- 229910034327 TiC Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- HPFVBGJFAYZEBE-XNBTXCQYSA-N [(8r,9s,10r,13s,14s)-10,13-dimethyl-3-oxo-1,2,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl] 3-cyclopentylpropanoate Chemical compound C([C@H]1[C@H]2[C@@H]([C@]3(CCC(=O)C=C3CC2)C)CC[C@@]11C)CC1OC(=O)CCC1CCCC1 HPFVBGJFAYZEBE-XNBTXCQYSA-N 0.000 description 1
- CGRTZESQZZGAAU-UHFFFAOYSA-N [2-[3-[1-[3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propanoyloxy]-2-methylpropan-2-yl]-2,4,8,10-tetraoxaspiro[5.5]undecan-9-yl]-2-methylpropyl] 3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C)=CC(CCC(=O)OCC(C)(C)C2OCC3(CO2)COC(OC3)C(C)(C)COC(=O)CCC=2C=C(C(O)=C(C)C=2)C(C)(C)C)=C1 CGRTZESQZZGAAU-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 150000001502 aryl halides Chemical class 0.000 description 1
- UARDXIXWKAZPPS-UHFFFAOYSA-N benzotriazol-1-yl benzyl carbonate Chemical compound N1=NC2=CC=CC=C2N1OC(=O)OCC1=CC=CC=C1 UARDXIXWKAZPPS-UHFFFAOYSA-N 0.000 description 1
- 150000001565 benzotriazoles Chemical class 0.000 description 1
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical class C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 1
- BMAXQTDMWYDIJX-UHFFFAOYSA-N bicyclo[2.2.1]hept-2-ene-5-carbonitrile Chemical compound C1C2C(C#N)CC1C=C2 BMAXQTDMWYDIJX-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- CKRDQRDXINCBIC-UHFFFAOYSA-N but-1-enylcycloheptane Chemical compound C(=CCC)C1CCCCCC1 CKRDQRDXINCBIC-UHFFFAOYSA-N 0.000 description 1
- JVOCWUZGKVURAV-UHFFFAOYSA-N butyl 4-methyltetracyclo[6.2.1.13,6.02,7]dodec-9-ene-4-carboxylate Chemical compound C1C(C23)C=CC1C3C1CC2CC1(C)C(=O)OCCCC JVOCWUZGKVURAV-UHFFFAOYSA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- AJVSSYFQWYBQMV-UHFFFAOYSA-N butyl tetracyclo[6.2.1.13,6.02,7]dodec-9-ene-4-carboxylate Chemical compound C1C(C23)C=CC1C3C1CC2CC1C(=O)OCCCC AJVSSYFQWYBQMV-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 150000001924 cycloalkanes Chemical class 0.000 description 1
- CFBGXYDUODCMNS-UHFFFAOYSA-N cyclobutene Chemical compound C1CC=C1 CFBGXYDUODCMNS-UHFFFAOYSA-N 0.000 description 1
- ZXIJMRYMVAMXQP-UHFFFAOYSA-N cycloheptene Chemical compound C1CCC=CCC1 ZXIJMRYMVAMXQP-UHFFFAOYSA-N 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- WJTCGQSWYFHTAC-UHFFFAOYSA-N cyclooctane Chemical compound C1CCCCCCC1 WJTCGQSWYFHTAC-UHFFFAOYSA-N 0.000 description 1
- 239000004914 cyclooctane Substances 0.000 description 1
- URYYVOIYTNXXBN-UPHRSURJSA-N cyclooctene Chemical compound C1CCC\C=C/CC1 URYYVOIYTNXXBN-UPHRSURJSA-N 0.000 description 1
- 239000004913 cyclooctene Substances 0.000 description 1
- MKNXBRLZBFVUPV-UHFFFAOYSA-L cyclopenta-1,3-diene;dichlorotitanium Chemical compound Cl[Ti]Cl.C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 MKNXBRLZBFVUPV-UHFFFAOYSA-L 0.000 description 1
- DIOQZVSQGTUSAI-NJFSPNSNSA-N decane Chemical compound CCCCCCCCC[14CH3] DIOQZVSQGTUSAI-NJFSPNSNSA-N 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- WIWBLJMBLGWSIN-UHFFFAOYSA-L dichlorotris(triphenylphosphine)ruthenium(ii) Chemical compound [Cl-].[Cl-].[Ru+2].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 WIWBLJMBLGWSIN-UHFFFAOYSA-L 0.000 description 1
- YNLAOSYQHBDIKW-UHFFFAOYSA-M diethylaluminium chloride Chemical compound CC[Al](Cl)CC YNLAOSYQHBDIKW-UHFFFAOYSA-M 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- PWWSSIYVTQUJQQ-UHFFFAOYSA-N distearyl thiodipropionate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCCCCCCCCCCCC PWWSSIYVTQUJQQ-UHFFFAOYSA-N 0.000 description 1
- 229930004069 diterpene Natural products 0.000 description 1
- 150000004141 diterpene derivatives Chemical class 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- PTOQCUYVGKZAFS-UHFFFAOYSA-N ethenylcycloheptane Chemical compound C=CC1CCCCCC1 PTOQCUYVGKZAFS-UHFFFAOYSA-N 0.000 description 1
- LDLDYFCCDKENPD-UHFFFAOYSA-N ethenylcyclohexane Chemical compound C=CC1CCCCC1 LDLDYFCCDKENPD-UHFFFAOYSA-N 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- HSYKJCVXJHCKEB-UHFFFAOYSA-N ethyl 4-methyltetracyclo[6.2.1.13,6.02,7]dodec-9-ene-4-carboxylate Chemical compound C1C(C23)C=CC1C3C1CC2CC1(C)C(=O)OCC HSYKJCVXJHCKEB-UHFFFAOYSA-N 0.000 description 1
- CGXYLLNYPIBZSE-UHFFFAOYSA-N ethyl tetracyclo[6.2.1.13,6.02,7]dodec-9-ene-4-carboxylate Chemical compound C1C(C23)C=CC1C3C1CC2CC1C(=O)OCC CGXYLLNYPIBZSE-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910001849 group 12 element Inorganic materials 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 125000001841 imino group Chemical group [H]N=* 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 229940087305 limonene Drugs 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- UMCSHTKHXAMMQM-UHFFFAOYSA-N methyl 4-methyltetracyclo[6.2.1.13,6.02,7]dodec-9-ene-4-carboxylate Chemical compound C1C(C23)C=CC1C3C1CC2CC1(C)C(=O)OC UMCSHTKHXAMMQM-UHFFFAOYSA-N 0.000 description 1
- AEBDJCUTXUYLDC-UHFFFAOYSA-N methyl 5-methylbicyclo[2.2.1]hept-2-ene-5-carboxylate Chemical compound C1C2C(C(=O)OC)(C)CC1C=C2 AEBDJCUTXUYLDC-UHFFFAOYSA-N 0.000 description 1
- ZDFOSSPNFAQIOM-UHFFFAOYSA-N methyl 8-tetracyclo-[4.4.0.12,5.17,10]dodecene-3-carboxylate Chemical compound C1C(C23)C=CC1C3C1CC2CC1C(=O)OC ZDFOSSPNFAQIOM-UHFFFAOYSA-N 0.000 description 1
- RMAZRAQKPTXZNL-UHFFFAOYSA-N methyl bicyclo[2.2.1]hept-2-ene-5-carboxylate Chemical compound C1C2C(C(=O)OC)CC1C=C2 RMAZRAQKPTXZNL-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 229940017219 methyl propionate Drugs 0.000 description 1
- NFWSQSCIDYBUOU-UHFFFAOYSA-N methylcyclopentadiene Chemical compound CC1=CC=CC1 NFWSQSCIDYBUOU-UHFFFAOYSA-N 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- DIOQZVSQGTUSAI-UHFFFAOYSA-N n-butylhexane Natural products CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 1
- UIEKYBOPAVTZKW-UHFFFAOYSA-L naphthalene-2-carboxylate;nickel(2+) Chemical compound [Ni+2].C1=CC=CC2=CC(C(=O)[O-])=CC=C21.C1=CC=CC2=CC(C(=O)[O-])=CC=C21 UIEKYBOPAVTZKW-UHFFFAOYSA-L 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- ZCYXXKJEDCHMGH-UHFFFAOYSA-N nonane Chemical compound CCCC[CH]CCCC ZCYXXKJEDCHMGH-UHFFFAOYSA-N 0.000 description 1
- UMRZSTCPUPJPOJ-KNVOCYPGSA-N norbornane Chemical compound C1C[C@H]2CC[C@@H]1C2 UMRZSTCPUPJPOJ-KNVOCYPGSA-N 0.000 description 1
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 1
- BKIMMITUMNQMOS-UHFFFAOYSA-N normal nonane Natural products CCCCCCCCC BKIMMITUMNQMOS-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 125000005375 organosiloxane group Chemical group 0.000 description 1
- KZAUOCCYDRDERY-UHFFFAOYSA-N oxamyl Chemical compound CNC(=O)ON=C(SC)C(=O)N(C)C KZAUOCCYDRDERY-UHFFFAOYSA-N 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical class C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- DXGLGDHPHMLXJC-UHFFFAOYSA-N oxybenzone Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1 DXGLGDHPHMLXJC-UHFFFAOYSA-N 0.000 description 1
- HDBWAWNLGGMZRQ-UHFFFAOYSA-N p-Vinylbiphenyl Chemical compound C1=CC(C=C)=CC=C1C1=CC=CC=C1 HDBWAWNLGGMZRQ-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- LGOPTUPXVVNJFH-UHFFFAOYSA-N pentadecanethioic s-acid Chemical compound CCCCCCCCCCCCCCC(O)=S LGOPTUPXVVNJFH-UHFFFAOYSA-N 0.000 description 1
- RGSFGYAAUTVSQA-UHFFFAOYSA-N pentamethylene Natural products C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000636 poly(norbornene) polymer Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920001195 polyisoprene Polymers 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- RELYPKCGIXTXRN-UHFFFAOYSA-N prop-1-en-2-ylcyclopentane Chemical compound CC(=C)C1CCCC1 RELYPKCGIXTXRN-UHFFFAOYSA-N 0.000 description 1
- MDRSNFPBVFZYPI-UHFFFAOYSA-N propan-2-yl 4-methyltetracyclo[6.2.1.13,6.02,7]dodec-9-ene-4-carboxylate Chemical compound C1C(C23)C=CC1C3C1CC2CC1(C)C(=O)OC(C)C MDRSNFPBVFZYPI-UHFFFAOYSA-N 0.000 description 1
- RPUOIWGUZZSFBB-UHFFFAOYSA-N propan-2-yl tetracyclo[6.2.1.13,6.02,7]dodec-9-ene-4-carboxylate Chemical compound C1C(C23)C=CC1C3C1CC2CC1C(=O)OC(C)C RPUOIWGUZZSFBB-UHFFFAOYSA-N 0.000 description 1
- XPWCPKAPHLQSKF-UHFFFAOYSA-N propyl 4-methyltetracyclo[6.2.1.13,6.02,7]dodec-9-ene-4-carboxylate Chemical compound C1C(C23)C=CC1C3C1CC2CC1(C)C(=O)OCCC XPWCPKAPHLQSKF-UHFFFAOYSA-N 0.000 description 1
- IYJVDXMMWSPICZ-UHFFFAOYSA-N propyl tetracyclo[6.2.1.13,6.02,7]dodec-9-ene-4-carboxylate Chemical compound C1C(C23)C=CC1C3C1CC2CC1C(=O)OCCC IYJVDXMMWSPICZ-UHFFFAOYSA-N 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- SVOOVMQUISJERI-UHFFFAOYSA-K rhodium(3+);triacetate Chemical compound [Rh+3].CC([O-])=O.CC([O-])=O.CC([O-])=O SVOOVMQUISJERI-UHFFFAOYSA-K 0.000 description 1
- QBERHIJABFXGRZ-UHFFFAOYSA-M rhodium;triphenylphosphane;chloride Chemical compound [Cl-].[Rh].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 QBERHIJABFXGRZ-UHFFFAOYSA-M 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 239000011949 solid catalyst Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- 229950011008 tetrachloroethylene Drugs 0.000 description 1
- 229920002725 thermoplastic elastomer Polymers 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 125000000101 thioether group Chemical group 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- 230000036962 time dependent Effects 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- YONPGGFAJWQGJC-UHFFFAOYSA-K titanium(iii) chloride Chemical compound Cl[Ti](Cl)Cl YONPGGFAJWQGJC-UHFFFAOYSA-K 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- MZHULIWXRDLGRR-UHFFFAOYSA-N tridecyl 3-(3-oxo-3-tridecoxypropyl)sulfanylpropanoate Chemical compound CCCCCCCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCCCCCCC MZHULIWXRDLGRR-UHFFFAOYSA-N 0.000 description 1
- WGKLOLBTFWFKOD-UHFFFAOYSA-N tris(2-nonylphenyl) phosphite Chemical compound CCCCCCCCCC1=CC=CC=C1OP(OC=1C(=CC=CC=1)CCCCCCCCC)OC1=CC=CC=C1CCCCCCCCC WGKLOLBTFWFKOD-UHFFFAOYSA-N 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical group [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 238000004260 weight control Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C48/00—Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
- B29C48/03—Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor characterised by the shape of the extruded material at extrusion
- B29C48/07—Flat, e.g. panels
- B29C48/08—Flat, e.g. panels flexible, e.g. films
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29B—PREPARATION OR PRETREATMENT OF THE MATERIAL TO BE SHAPED; MAKING GRANULES OR PREFORMS; RECOVERY OF PLASTICS OR OTHER CONSTITUENTS OF WASTE MATERIAL CONTAINING PLASTICS
- B29B13/00—Conditioning or physical treatment of the material to be shaped
- B29B13/06—Conditioning or physical treatment of the material to be shaped by drying
- B29B13/065—Conditioning or physical treatment of the material to be shaped by drying of powder or pellets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2045/00—Use of polymers of unsaturated cyclic compounds having no unsaturated aliphatic groups in a side-chain, e.g. coumarone-indene resins or derivatives thereof, as moulding material
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Health & Medical Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Ophthalmology & Optometry (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polarising Elements (AREA)
- Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
- Extrusion Moulding Of Plastics Or The Like (AREA)
Abstract
Description
본 발명은 광학 불균일이 없는 광학 필름의 제조 방법에 관한 것이다.The present invention relates to a method for producing an optical film without optical nonuniformity.
광학 필름은 투명성 등의 광학 특성이 우수한 것이 요구되는 동시에, 필름이 균질하고 광학 불균일이 적은 것이 중요하다. 제막에 이용하는 수지가 열화되어 있으면, 수지 중에 겔이 발생하고, 얻어진 필름의 표면에 점상 결함 등이 발생하여 광학 불균일의 원인이 된다. 그 때문에, 수지의 열화를 방지하는 방법으로서, 특정한 가스 투과량·이물질량의 용기를 이용하는 방법이나, 산소 검지제 및/또는 수분 검지제를 밀봉 용기 중에 공존시키는 방법 등의 수지의 보존 방법이 제안되었다(하기 특허 문헌 1 및 2 참조). 그러나, 최근, 액정 패널의 대형화 등에 따라 폭 1 m 이상의 광폭 필름을 양호한 수율로 제조하는 것이 요구되고 있고, 이러한 광폭의 광학 필름을 제막했을 때에 광범위에 걸쳐 광학 불균일이 발생하지 않기 위한 방법으로서 종래의 방법은 불충분하였다.The optical film is required to be excellent in optical properties such as transparency, and at the same time, it is important that the film is homogeneous and the optical nonuniformity is small. When resin used for film forming deteriorates, a gel will generate | occur | produce in resin, a point defect etc. will generate | occur | produce on the surface of the obtained film, and it will become a cause of optical nonuniformity. Therefore, as a method of preventing the deterioration of the resin, a method of preserving the resin such as a method of using a container having a specific gas permeation amount and foreign matter amount or a method of coexisting an oxygen detector and / or a water detector in a sealed container has been proposed. (See Patent Documents 1 and 2 below). However, in recent years, it is required to manufacture a wide film having a width of 1 m or more with a good yield due to the enlargement of a liquid crystal panel, and the like, as a method for preventing optical unevenness over a wide range when forming such a wide optical film. The method was insufficient.
[특허 문헌 1] 일본 특허 공개 (평)7-206998호 공보[Patent Document 1] Japanese Patent Application Laid-Open No. 7-206998
[특허 문헌 2] 일본 특허 공개 제2001-192458호 공보[Patent Document 2] Japanese Patent Application Laid-Open No. 2001-192458
본 발명은 광범위에 걸쳐 광학 불균일이 발생하지 않는 광학 필름의 제조 방법을 제공하는 것을 과제로 한다.This invention makes it a subject to provide the manufacturing method of the optical film which optical nonuniformity does not produce over a wide range.
본 발명은 수지 펠릿을, 산소 농도 10 ppm 이하의 불활성 가스를 매체로 하여 압출기에 수송하고, 상기 펠릿을 용융 압출 성형하는 것을 특징으로 하는, 광학 필름의 제조 방법에 관한 것이다.The present invention relates to a method for producing an optical film, wherein the resin pellets are transported to an extruder using an inert gas having an oxygen concentration of 10 ppm or less as a medium, and the pellets are melt-extruded.
본 발명에서는 콘테이너에 봉입된 수지 펠릿을 건조기에 수송하고, 상기 건조기로부터, 산소 농도 10 ppm 이하의 불활성 가스를 매체로 하여 압출기에 수송하는 것이 바람직하다. 이 경우, 콘테이너에 봉입된 수지 펠릿을, 산소 농도 10 ppm 이하의 불활성 가스를 매체로 하여 건조기에 수송하는 것이 바람직하다.In this invention, it is preferable to transport the resin pellet enclosed in the container to a drier, and to transport it to the extruder using the inert gas of 10 ppm or less of oxygen concentration as a medium from the drier. In this case, it is preferable to transport the resin pellets enclosed in the container to a drier using an inert gas having an oxygen concentration of 10 ppm or less as a medium.
본 발명에 있어서, 불활성 가스는 질소인 것이 바람직하다. In the present invention, the inert gas is preferably nitrogen.
본 발명에 있어서, 수지 펠릿은 하기 화학식 1로 표시되는 화합물 유래의 구조 단위를 갖는 환상 올레핀계 수지의 펠릿인 것이 바람직하다.In this invention, it is preferable that a resin pellet is a pellet of cyclic olefin resin which has a structural unit derived from the compound represented by following formula (1).
(화학식 1 중, R1 내지 R4는 수소 원자, 할로겐 원자, 탄소수 1 내지 30의 탄화수소기, 또는 그 밖의 1가의 유기기이고, 각각 동일 또는 상이할 수 있으며, 또한, R1 내지 R4 중 임의의 2개가 서로 결합되어 단환 또는 다환 구조를 형성할 수 있고, m은 0 또는 양의 정수이고, p는 0 또는 양의 정수임)(In formula 1, R <1> -R <4> is a hydrogen atom, a halogen atom, a C1-C30 hydrocarbon group, or other monovalent organic group, respectively, may be same or different, Moreover, R <1> -R <4> Any two may be bonded to each other to form a monocyclic or polycyclic structure, m is 0 or a positive integer, and p is 0 or a positive integer)
본 발명은 상기 광학 필름을 추가로 연신하여 이루어지는 광학 필름의 제조 방법일 수도 있다. This invention may be the manufacturing method of the optical film formed by extending | stretching the said optical film further.
본 발명에 따르면, 광폭의 필름이더라도 광학 불균일이 없는 광학 필름의 제조 방법을 제공할 수 있다. 또한, 광학 필름이 연신을 실시한 필름인 경우에는 위상차나 광축이 안정된, 광학적으로 불균일이 없는 필름으로서 바람직하게 사용할 수 있다. 본 발명에 따른 광학 필름은 광학적인 불균일이 적고, 필름의 수율이 양호하고, 또한 연신 필름에 있어서는 헤이즈값이 작아 투명성이 우수하며, 이를 이용한 대화면의 액정 디스플레이 등은 전체 면에 있어서 변형이나 불균일이 없는 높은 성능을 달성할 수 있다. According to this invention, even if it is a wide film, the manufacturing method of the optical film without optical nonuniformity can be provided. Moreover, when an optical film is a film which extended | stretched, it can use suitably as a film which is optically nonuniform in which retardation and an optical axis are stable. The optical film according to the present invention has a small optical nonuniformity, a good yield of the film, a small haze value in the stretched film, and excellent transparency, and a large liquid crystal display using the same has no deformation or nonuniformity in the whole surface. Can achieve high performance.
<<광학 필름>><< optical film >>
<수지><Resin>
본 발명에 이용되는 수지로서는 필름 형상에서의 광선 투과율이 70% 이상, 바람직하게는 85% 이상의 것이 바람직하게 이용된다. 구체적으로는, 투명 에폭시 수지, 폴리에스테르 수지, 폴리카보네이트 수지, 폴리에테르술폰 수지, 폴리아릴레 이트 수지, 환상 올레핀계 수지, 폴리페닐렌에테르계 수지, 유기 실록산계 수지 등의 높은 투명성을 갖는 동시에 우수한 내열성을 갖는 수지를 바람직한 것으로서 들 수 있다. 이들 중에서는 투명성 및 내열성이 우수하고, 또한 흡습(수)성이 낮아서 얻어지는 특정 부재가 흡습(수) 변형되기 어려운 것이 된다는 점에서, 환상 올레핀계 수지, 폴리페닐렌계 수지 및 유기 실록산계 수지가 바람직하고, 특히 바람직하게는 상기 화학식 1로 표시되는 화합물 유래의 구조 단위를 갖는 환상 올레핀계 수지를 들 수 있다. As resin used for this invention, the light transmittance in film form is 70% or more, Preferably it is 85% or more. Specifically, it has high transparency such as a transparent epoxy resin, a polyester resin, a polycarbonate resin, a polyether sulfone resin, a polyarylate resin, a cyclic olefin resin, a polyphenylene ether resin, an organic siloxane resin, and is excellent. Resin which has heat resistance is mentioned as a preferable thing. Among these, cyclic olefin resins, polyphenylene resins, and organosiloxane resins are preferable in that the specific member obtained because of excellent transparency and heat resistance and low moisture absorption (water) is less likely to be absorbed (water). Especially preferably, cyclic olefin resin which has a structural unit derived from the compound represented by the said General formula (1) is mentioned.
본 발명의 광학 필름에 이용되는 환상 올레핀계 수지로서는 다음과 같은 (공)중합체를 들 수 있다. As cyclic olefin resin used for the optical film of this invention, the following (co) polymer is mentioned.
(1) 상기 화학식 1로 표시되는 특정 단량체의 개환 중합체.(1) The ring-opening polymer of the specific monomer represented by the said Formula (1).
(2) 상기 화학식 1로 표시되는 특정 단량체와 공중합성 단량체의 개환 공중합체. (2) The ring-opening copolymer of the specific monomer and copolymerizable monomer represented by the said Formula (1).
(3) 상기 (1) 또는 (2)의 개환 (공)중합체의 수소 첨가 (공)중합체.(3) Hydrogenated (co) polymer of the ring-opening (co) polymer of (1) or (2).
(4) 상기 (1) 또는 (2)의 개환 (공)중합체를 프리델 크래프츠 반응에 의해 환화한 후, 수소 첨가한 (공)중합체. (4) A hydrogenated (co) polymer after cyclizing the ring-opening (co) polymer of (1) or (2) by a Friedel Crafts reaction.
(5) 상기 화학식 1로 표시되는 특정 단량체와 불포화 2중 결합 함유 화합물의 포화 공중합체. (5) A saturated copolymer of a specific monomer represented by the formula (1) and an unsaturated double bond-containing compound.
(6) 상기 화학식 1로 표시되는 특정 단량체, 비닐계 환상 탄화수소계 단량체 및 시클로펜타디엔계 단량체에서 선택되는 1종 이상의 단량체의 부가형 (공)중합체 및 그의 수소 첨가 (공)중합체. (6) An addition type (co) polymer of at least one monomer selected from a specific monomer represented by the formula (1), a vinyl cyclic hydrocarbon monomer and a cyclopentadiene monomer and a hydrogenated (co) polymer thereof.
(7) 상기 화학식 1로 표시되는 특정 단량체와 아크릴레이트의 교대 공중합체.(7) The alternating copolymer of the specific monomer and acrylate represented by the said Formula (1).
<특정 단량체><Specific monomer>
상기 특정 단량체의 구체예로서는 다음과 같은 화합물을 들 수 있지만, 본 발명은 이들 구체예에 한정되는 것은 아니다. Although the following compounds are mentioned as a specific example of the said specific monomer, This invention is not limited to these specific examples.
비시클로[2.2.1]헵트-2-엔, Bicyclo [2.2.1] hept-2-ene,
트리시클로[4.3.0.12,5]-8-데센, Tricyclo [4.3.0.1 2,5 ] -8-decene,
트리시클로[4.4.0.12,5]-3-운데센, Tricyclo [4.4.0.1 2,5 ] -3-undecene,
테트라시클로[4.4.0.12,5.17,10]-3-도데센, Tetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
펜타시클로[6.5.1.13,6.02,7.09,13]-4-펜타데센, Pentacyclo [6.5.1.1 3,6 2,7 .0 9,13 ] -4- pentadecene ,
5-메틸비시클로[2.2.1]헵트-2-엔, 5-methylbicyclo [2.2.1] hept-2-ene,
5-에틸비시클로[2.2.1]헵트-2-엔, 5-ethylbicyclo [2.2.1] hept-2-ene,
5-메톡시카르보닐비시클로[2.2.1]헵트-2-엔, 5-methoxycarbonylbicyclo [2.2.1] hept-2-ene,
5-메틸-5-메톡시카르보닐비시클로[2.2.1]헵트-2-엔,5-methyl-5-methoxycarbonylbicyclo [2.2.1] hept-2-ene,
5-시아노비시클로[2.2.1]헵트-2-엔, 5-cyanobicyclo [2.2.1] hept-2-ene,
8-메톡시카르보닐테트라시클로[4.4.0.12,5.17,10]-3-도데센, 8-methoxycarbonyltetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8-에톡시카르보닐테트라시클로[4.4.0.12,5.17,10]-3-도데센,8-ethoxycarbonyltetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8-n-프로폭시카르보닐테트라시클로[4.4.0.12,5.17,10]-3-도데센, 8-n-propoxycarbonyltetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8-이소프로폭시카르보닐테트라시클로[4.4.0.12,5.17,10]-3-도데센, 8-isopropoxycarbonyltetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8-n-부톡시카르보닐테트라시클로[4.4.0.12,5.17,10]-3-도데센, 8-n-butoxycarbonyltetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8-메틸-8-메톡시카르보닐테트라시클로[4.4.0.12,5.17,10]-3-도데센, 8-methyl-8-methoxycarbonyltetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8-메틸-8-에톡시카르보닐테트라시클로[4.4.0.12,5.17,10]-3-도데센, 8-methyl-8-ethoxycarbonyltetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8-메틸-8-n-프로폭시카르보닐테트라시클로[4.4.0.12,5.17,10]-3-도데센, 8-methyl-8-n-propoxycarbonyltetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8-메틸-8-이소프로폭시카르보닐테트라시클로[4.4.0.12,5.17,10]-3-도데센, 8-methyl-8-isopropoxycarbonyltetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8-메틸-8-n-부톡시카르보닐테트라시클로[4.4.0.12,5.17,10]-3-도데센, 8-methyl-8-n-butoxycarbonyltetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
5-에틸리덴비시클로[2.2.1]헵트-2-엔, 5-ethylidenebicyclo [2.2.1] hept-2-ene,
8-에틸리덴테트라시클로[4.4.0.12,5.17,10]-3-도데센,8-ethylidenetetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
5-페닐비시클로[2.2.1]헵트-2-엔, 5-phenylbicyclo [2.2.1] hept-2-ene,
8-페닐테트라시클로[4.4.0.12,5.17,10]-3-도데센,8-phenyl-tetracyclo [4.4.0.1 2,5 .1 7,10] -3- dodecene,
5-플루오로비시클로[2.2.1]헵트-2-엔, 5-fluorobicyclo [2.2.1] hept-2-ene,
5-플루오로메틸비시클로[2.2.1]헵트-2-엔, 5-fluoromethylbicyclo [2.2.1] hept-2-ene,
5-트리플루오로메틸비시클로[2.2.1]헵트-2-엔, 5-trifluoromethylbicyclo [2.2.1] hept-2-ene,
5-펜타플루오로에틸비시클로[2.2.1]헵트-2-엔, 5-pentafluoroethylbicyclo [2.2.1] hept-2-ene,
5,5-디플루오로비시클로[2.2.1]헵트-2-엔, 5,5-difluorobicyclo [2.2.1] hept-2-ene,
5,6-디플루오로비시클로[2.2.1]헵트-2-엔, 5,6-difluorobicyclo [2.2.1] hept-2-ene,
5,5-비스(트리플루오로메틸)비시클로[2.2.1]헵트-2-엔, 5,5-bis (trifluoromethyl) bicyclo [2.2.1] hept-2-ene,
5,6-비스(트리플루오로메틸)비시클로[2.2.1]헵트-2-엔, 5,6-bis (trifluoromethyl) bicyclo [2.2.1] hept-2-ene,
5-메틸-5-트리플루오로메틸비시클로[2.2.1]헵트-2-엔, 5-methyl-5-trifluoromethylbicyclo [2.2.1] hept-2-ene,
5,5,6-트리플루오로비시클로[2.2.1]헵트-2-엔, 5,5,6-trifluorobicyclo [2.2.1] hept-2-ene,
5,5,6-트리스(플루오로메틸)비시클로[2.2.1]헵트-2-엔, 5,5,6-tris (fluoromethyl) bicyclo [2.2.1] hept-2-ene,
5,5,6,6-테트라플루오로비시클로[2.2.1]헵트-2-엔, 5,5,6,6-tetrafluorobicyclo [2.2.1] hept-2-ene,
5,5,6,6-테트라키스(트리플루오로메틸)비시클로[2.2.1]헵트-2-엔, 5,5,6,6-tetrakis (trifluoromethyl) bicyclo [2.2.1] hept-2-ene,
5,5-디플루오로-6,6-비스(트리플루오로메틸)비시클로[2.2.1]헵트-2-엔, 5,5-difluoro-6,6-bis (trifluoromethyl) bicyclo [2.2.1] hept-2-ene,
5,6-디플루오로-5,6-비스(트리플루오로메틸)비시클로[2.2.1]헵트-2-엔, 5,6-difluoro-5,6-bis (trifluoromethyl) bicyclo [2.2.1] hept-2-ene,
5,5,6-트리플루오로-5-트리플루오로메틸비시클로[2.2.1]헵트-2-엔, 5,5,6-trifluoro-5-trifluoromethylbicyclo [2.2.1] hept-2-ene,
5-플루오로-5-펜타플루오로에틸-6,6-비스(트리플루오로메틸)비시클로[2.2.1]헵트-2-엔, 5-fluoro-5-pentafluoroethyl-6,6-bis (trifluoromethyl) bicyclo [2.2.1] hept-2-ene,
5,6-디플루오로-5-헵타플루오로-이소-프로필-6-트리플루오로메틸비시클로[2.2.1]헵트-2-엔, 5,6-difluoro-5-heptafluoro-iso-propyl-6-trifluoromethylbicyclo [2.2.1] hept-2-ene,
5-클로로-5,6,6-트리플루오로비시클로[2.2.1]헵트-2-엔, 5-chloro-5,6,6-trifluorobicyclo [2.2.1] hept-2-ene,
5,6-디클로로-5,6-비스(트리플루오로메틸)비시클로[2.2.1]헵트-2-엔, 5,6-dichloro-5,6-bis (trifluoromethyl) bicyclo [2.2.1] hept-2-ene,
5,5,6-트리플루오로-6-트리플루오로메톡시비시클로[2.2.1]헵트-2-엔, 5,5,6-trifluoro-6-trifluoromethoxybicyclo [2.2.1] hept-2-ene,
5,5,6-트리플루오로-6-헵타플루오로프로폭시비시클로[2.2.1]헵트-2-엔, 5,5,6-trifluoro-6-heptafluoropropoxybicyclo [2.2.1] hept-2-ene,
8-플루오로테트라시클로[4.4.0.12,5.17,10]-3-도데센, 8-fluorotetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8-플루오로메틸테트라시클로[4.4.0.12,5.17,10]-3-도데센,8-fluoromethyltetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8-디플루오로메틸테트라시클로[4.4.0.12,5.17,10]-3-도데센,8-difluoromethyltetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8-트리플루오로메틸테트라시클로[4.4.0.12,5.17,10]-3-도데센,8-trifluoromethyltetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8-펜타플루오로에틸테트라시클로[4.4.0.12,5.17,10]-3-도데센, 8-pentafluoroethyltetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8,8-디플루오로테트라시클로[4.4.0.12,5.17,10]-3-도데센,8,8-difluorotetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8,9-디플루오로테트라시클로[4.4.0.12,5.17,10]-3-도데센,8,9-difluorotetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8,8-비스(트리플루오로메틸)테트라시클로[4.4.0.12,5.17,10]-3-도데센, 8,8-bis (trifluoromethyl) tetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8,9-비스(트리플루오로메틸)테트라시클로[4.4.0.12,5.17,10]-3-도데센, 8,9-bis (trifluoromethyl) tetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8-메틸-8-트리플루오로메틸테트라시클로[4.4.0.12,5.17,10]-3-도데센, 8-methyl-8-trifluoromethyltetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8,8,9-트리플루오로테트라시클로[4.4.0.12,5.17,10]-3-도데센,8,8,9-trifluorotetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8,8,9-트리스(트리플루오로메틸)테트라시클로[4.4.0.12,5.17,10]-3-도데센, 8,8,9-tris (trifluoromethyl) tetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8,8,9,9-테트라플루오로테트라시클로[4.4.0.12,5.17,10]-3-도데센, 8,8,9,9-tetrafluorotetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8,8,9,9-테트라키스(트리플루오로메틸)테트라시클로[4.4.0.12,5.17,10]-3-도데센, 8,8,9,9-tetrakis (trifluoromethyl) tetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8,8-디플루오로-9,9-비스(트리플루오로메틸)테트라시클로[4.4.0.12,5.17,10]-3-도데센, 8,8-difluoro-9,9-bis (trifluoromethyl) tetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8,9-디플루오로-8,9-비스(트리플루오로메틸)테트라시클로[4.4.0.12,5.17,10]-3-도데센, 8,9-difluoro-8,9-bis (trifluoromethyl) tetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8,8,9-트리플루오로-9-트리플루오로메틸테트라시클로[4.4.0.12,5.17,10]-3-도데센, 8,8,9-trifluoro-9-trifluoromethyltetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8,8,9-트리플루오로-9-트리플루오로메톡시테트라시클로[4.4.0.12,5.17,10]-3-도데센, 8,8,9-trifluoro-9-trifluoromethoxytetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8,8,9-트리플루오로-9-펜타플루오로프로폭시테트라시클로[4.4.0.12,5.17,10]-3-도데센, 8,8,9-trifluoro-9-pentafluoropropoxytetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8-플루오로-8-펜타플루오로에틸-9,9-비스(트리플루오로메틸)테트라시클로[4.4.0.12,5.17,10]-3-도데센, 8-fluoro-8-pentafluoroethyl-9,9-bis (trifluoromethyl) tetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8,9-디플루오로-8-헵타플루오로이소-프로필-9-트리플루오로메틸테트라시클로[4.4.0.12,5.17,10]-3-도데센, 8,9-difluoro-8-heptafluoroiso-propyl-9-trifluoromethyltetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8-클로로-8,9,9-트리플루오로테트라시클로[4.4.0.12,5.17,10]-3-도데센, 8-chloro-8,9,9-trifluorotetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8,9-디클로로-8,9-비스(트리플루오로메틸)테트라시클로[4.4.0.12,5.17,10]-3- 도데센, 8,9-dichloro-8,9-bis (trifluoromethyl) tetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8-(2,2,2-트리플루오로에톡시카르보닐)테트라시클로[4.4.0.12,5.17,10]-3-도데센, 8- (2,2,2-trifluoroethoxycarbonyl) tetracyclo [4.4.0.1 2,5 .1 7,10 ] -3-dodecene,
8-메틸-8-(2,2,2-트리플루오로에톡시카르보닐)테트라시클로[4.4.0.12,5.17,10]-3-도데센 등을 들 수 있다. (Ethoxycarbonyl 2,2,2-trifluoroethyl) 8-methyl-8 and the like can be mentioned tetracyclo [4.4.0.1 2,5 .1 7,10] -3- dodecene.
이들은 1종 단독으로 또는 2종 이상을 병용할 수 있다. These can be used individually by 1 type or in combination of 2 or more types.
특정 단량체 중 바람직한 것은 상기 화학식 1 중, R1 및 R3이 수소 원자 또는 탄소수 1 내지 10, 더욱 바람직하게는 1 내지 4, 특히 바람직하게는 1 내지 2의 탄화수소기이고, R2 및 R4가 수소 원자 또는 1가의 유기기이며, R2 및 R4 중 하나 이상은 수소 원자 및 탄화수소기 이외의 극성을 갖는 극성기를 나타내고, m은 0 내지 3의 정수, p는 0 내지 3의 정수이고, 보다 바람직하게는 m+p=0 내지 4, 더욱 바람직하게는 0 내지 2, 특히 바람직하게는 m=1, p=0인 것이다. m=1, p=0인 특정 단량체는, 얻어지는 환상 올레핀계 수지의 유리 전이 온도가 높으면서 기계적 강도도 우수해지는 점에서 바람직하다. Among the specific monomers, R 1 and R 3 in Formula 1 are hydrogen atoms or hydrocarbon groups having 1 to 10 carbon atoms, more preferably 1 to 4, particularly preferably 1 to 2 carbon atoms, and R 2 and R 4 are A hydrogen atom or a monovalent organic group, at least one of R 2 and R 4 represents a polar group having a polarity other than a hydrogen atom and a hydrocarbon group, m is an integer of 0 to 3, p is an integer of 0 to 3, and Preferably m + p = 0-4, More preferably, it is 0-2, Especially preferably, m = 1, p = 0. The specific monomer of m = 1 and p = 0 is preferable at the point which is excellent in mechanical strength, while the glass transition temperature of cyclic olefin resin obtained is high.
상기 특정 단량체의 극성기로서는 카르복실기, 수산기, 알콕시카르보닐기, 알릴옥시카르보닐기, 아미노기, 아미드기, 시아노기 등을 들 수 있고, 이들 극성기는 메틸렌기 등의 연결기를 통해 결합될 수 있다. 또한, 카르보닐기, 에테르기, 실릴에테르기, 티오에테르기, 이미노기 등 극성을 갖는 2가의 유기기가 연결기가 되어 결합되어 있는 탄화수소기 등도 극성기로서 들 수 있다. 이들 중에서는 카르복실기, 수산기, 알콕시카르보닐기 또는 알릴옥시카르보닐기가 바람직하고, 특히 알콕시카르보닐기 또는 알릴옥시카르보닐기가 바람직하다. As a polar group of the said specific monomer, a carboxyl group, a hydroxyl group, an alkoxycarbonyl group, an allyloxycarbonyl group, an amino group, an amide group, a cyano group, etc. are mentioned, These polar groups can be couple | bonded through coupling groups, such as a methylene group. Moreover, the hydrocarbon group etc. which the bivalent organic group which has polarity, such as a carbonyl group, an ether group, a silyl ether group, a thioether group, and an imino group, couple | bond and couple | bond are mentioned as a polar group. In these, a carboxyl group, a hydroxyl group, an alkoxycarbonyl group, or an allyloxycarbonyl group is preferable, and an alkoxycarbonyl group or allyloxycarbonyl group is especially preferable.
또한, R2 및 R4 중 하나 이상이 화학식 -(CH2)nCOOR로 표시되는 극성기인 단량체는, 얻어지는 환상 올레핀계 수지가 높은 유리 전이 온도와 낮은 흡습성, 각종 재료와의 우수한 밀착성을 갖게 되는 점에서 바람직하다. 상기 특정 극성기에 따른 화학식에 있어서, R은 탄소 원자수 1 내지 12, 더욱 바람직하게는 1 내지 4, 특히 바람직하게는 1 내지 2의 탄화수소기, 바람직하게는 알킬기이다. 또한, n은 통상적으로 0 내지 5이지만, n의 값이 작은 것일수록 얻어지는 환상 올레핀계 수지의 유리 전이 온도가 높아지기 때문에 바람직하고, 또한 n이 0인 특정 단량체는 그의 합성이 용이한 점에서 바람직하다. In addition, R 2 and R one or more of the 4, the formula - is (CH 2) n polar group of monomers represented by COOR is, has excellent adhesion to the resulting cycloolefin resin has a high glass transition temperature and low moisture absorption, a variety of materials It is preferable at the point. In the formula according to the specific polar group, R is a hydrocarbon group having 1 to 12 carbon atoms, more preferably 1 to 4, particularly preferably 1 to 2 carbon atoms, preferably an alkyl group. In addition, n is usually 0 to 5, but a smaller value of n is preferable because the glass transition temperature of the cyclic olefin resin obtained is higher, and a specific monomer having n of 0 is preferable in that its synthesis is easy. .
또한, 상기 화학식 1에 있어서, R1 또는 R3이 알킬기인 것이 바람직하고, 탄소수 1 내지 4의 알킬기, 더욱 바람직하게는 1 내지 2의 알킬기, 특히 메틸기인 것이 바람직하고, 특히 이 알킬기가 상기 화학식 -(CH2)nCOOR로 표시되는 특정 극성기가 결합된 탄소 원자와 동일한 탄소 원자에 결합되어 있는 것이, 얻어지는 환상 올레핀계 수지의 흡습성을 낮게 할 수 있는 점에서 바람직하다. In the above formula (1), R 1 or R 3 is preferably an alkyl group, preferably an alkyl group having 1 to 4 carbon atoms, more preferably an alkyl group having 1 to 2, in particular a methyl group, and in particular, the alkyl group is It is preferable that the specific polar group represented by-(CH 2 ) n COOR is bonded to the same carbon atom as the carbon atom to which it is bonded, in that the hygroscopicity of the obtained cyclic olefin resin can be lowered.
<공중합성 단량체><Copolymerizable monomer>
공중합성 단량체의 구체예로서는, 시클로부텐, 시클로펜텐, 시클로헵텐, 시 클로옥텐, 디시클로펜타디엔 등의 시클로올레핀을 들 수 있다. Specific examples of the copolymerizable monomers include cycloolefins such as cyclobutene, cyclopentene, cycloheptene, cyclooctene and dicyclopentadiene.
시클로올레핀의 탄소수로서는 4 내지 20이 바람직하고, 더욱 바람직하게는 5 내지 12이다. 이들은 1종 단독으로 또는 2종 이상을 병용할 수 있다. As carbon number of cycloolefin, 4-20 are preferable, More preferably, it is 5-12. These can be used individually by 1 type or in combination of 2 or more types.
특정 단량체/공중합성 단량체의 바람직한 사용 범위는 중량비로 100/0 내지 50/50이고, 더욱 바람직하게는 100/0 내지 60/40이다. The preferred use range of the specific monomer / copolymerizable monomer is 100/0 to 50/50 by weight, more preferably 100/0 to 60/40.
<개환 중합 촉매><Opening polymerization catalyst>
본 발명에 있어서, (1) 특정 단량체의 개환 중합체, 및 (2) 특정 단량체와 공중합성 단량체의 개환 공중합체를 얻기 위한 개환 중합 반응은 복분해 촉매의 존재하에 행해진다. In this invention, the ring-opening polymerization reaction for obtaining (1) the ring-opening polymer of a specific monomer, and (2) the ring-opening copolymer of a specific monomer and a copolymerizable monomer is performed in presence of a metathesis catalyst.
이 복분해 촉매는 (a) W, Mo 및 Re의 화합물에서 선택된 1종 이상과, (b) 데밍의 주기율표 IA족 원소(예를 들면 Li, Na, K 등), IIA족 원소(예를 들면, Mg, Ca 등), IIB족 원소(예를 들면, Zn, Cd, Hg 등), IIIA족 원소(예를 들면, B, Al 등), IVA족 원소(예를 들면, Si, Sn, Pb 등), 또는 IVB족 원소(예를 들면, Ti, Zr 등)의 화합물이며, 하나 이상의 상기 원소-탄소 결합 또는 상기 원소-수소 결합을 갖는 것에서 선택된 1종 이상과의 조합을 포함하는 촉매이다. 또한, 이 경우, 촉매 활성을 높이기 위해 후술하는 (c) 첨가제가 첨가된 것일 수도 있다. This metathesis catalyst comprises (a) at least one member selected from compounds of W, Mo, and Re, (b) Deming periodic table of Group IA elements (e.g. Li, Na, K, etc.), Group IIA elements (e.g., Mg, Ca, etc.), Group IIB elements (e.g., Zn, Cd, Hg, etc.), Group IIIA elements (e.g., B, Al, etc.), Group IVA elements (e.g., Si, Sn, Pb, etc.) Or a compound of a group IVB element (e.g., Ti, Zr, etc.), and a catalyst comprising a combination with one or more selected from those having one or more of the above element-carbon bonds or the above element-hydrogen bonds. In this case, in order to increase the catalytic activity, the (c) additive described later may be added.
(a) 성분으로서 적당한 W, Mo 또는 Re의 화합물의 대표예로서는, WCl6, MoCl6, ReOCl3 등의 일본 특허 공개 (평)1-132626호 공보 제8 페이지 좌측 하란 제6행 내지 제8 페이지 우측 상란 제17행에 기재된 화합물을 들 수 있다.As a representative example of a compound of W, Mo, or Re suitable as the component (a), Japanese Patent Laid-Open No. 1-32626 such as WCl 6 , MoCl 6 , ReOCl 3, etc. The compound described in the 17th line of upper right column is mentioned.
(b) 성분의 구체예로서는, n-C4H9Li, (C2H5)3Al, (C2H5)2AlCl, (C2H5)1.5AlCl1.5, (C2H5)AlCl2, 메틸알룸옥산, LiH 등 일본 특허 공개 (평)1-132626호 공보 제8 페이지 우측 상란 제18행 내지 제8 페이지 우측 하란 제3행에 기재된 화합물을 들 수 있다. Specific examples of the component (b) include nC 4 H 9 Li, (C 2 H 5 ) 3 Al, (C 2 H 5 ) 2 AlCl, (C 2 H 5 ) 1.5 AlCl 1.5 , (C 2 H 5 ) AlCl 2 And the compound described in Japanese Patent Laid-Open Publication No. Hei 1 32626, page 8, upper right column 18th to page 8, lower right column 3, such as methylalumoxane and LiH.
첨가제인 (c) 성분의 대표예로서는 알코올류, 알데히드류, 케톤류, 아민류 등을 바람직하게 이용할 수 있지만, 또한 일본 특허 공개 (평)1-132626호 공보 제8 페이지 우측 하란 제16행 내지 제9 페이지 좌측 상란 제17행에 개시된 화합물을 사용할 수 있다. As representative examples of the component (c), which is an additive, alcohols, aldehydes, ketones, amines, and the like can be preferably used. The left top column can use the compounds disclosed in line 17.
복분해 촉매의 사용량으로서는 상기 (a) 성분과 특정 단량체의 몰비로 "(a) 성분:특정 단량체"가 통상 1:500 내지 1:50,000이 되는 범위, 바람직하게는 1:1,000 내지 1:10,000이 되는 범위가 된다.As the usage-amount of a metathesis catalyst, the "(a) component: specific monomer" is a range which is usually 1: 500-1: 50,000 in the molar ratio of the said (a) component and a specific monomer, Preferably it becomes 1: 1,000-1: 10,000. Range.
(a) 성분과 (b) 성분의 비율은 금속 원자비로 (a):(b)가 1:1 내지 1:50, 바람직하게는 1:2 내지 1:30의 범위가 된다.The ratio of the component (a) and the component (b) is in the range of 1: 1 to 1:50, preferably 1: 2 to 1:30, in terms of metal atomic ratio.
(a) 성분과 (c) 성분의 비율은 몰비로 (c):(a)가 0.005:1 내지 15:1, 바람직하게는 0.05:1 내지 7:1의 범위가 된다.The ratio of the component (a) and the component (c) is in the molar ratio of (c) :( a) in the range of 0.005: 1 to 15: 1, preferably 0.05: 1 to 7: 1.
<중합 반응용 용매><Solvent for Polymerization Reaction>
개환 중합 반응에서 사용되는 용매(분자량 조절제 용액을 구성하는 용매, 특정 단량체 및/또는 복분해 촉매의 용매)로서는, 예를 들면 펜탄, 헥산, 헵탄, 옥탄, 노난, 데칸 등의 알칸류, 시클로헥산, 시클로헵탄, 시클로옥탄, 데칼린, 노르 보르난 등의 시클로알칸류, 벤젠, 톨루엔, 크실렌, 에틸벤젠, 쿠멘 등의 방향족 탄화수소, 클로로부탄, 브로모헥산, 염화메틸렌, 디클로로에탄, 헥사메틸렌디브로마이드, 클로로벤젠, 클로로포름, 테트라클로로에틸렌 등의, 할로겐화 알칸, 할로겐화 아릴 등의 화합물, 아세트산에틸, 아세트산 n-부틸, 아세트산 이소-부틸, 프로피온산메틸, 디메톡시에탄 등의 포화 카르복실산 에스테르류, 디부틸에테르, 테트라히드로푸란, 디메톡시에탄 등의 에테르류 등을 들 수 있고, 이들은 단독으로 또는 혼합하여 사용할 수 있다. 이들 중 방향족 탄화수소가 바람직하다. As a solvent (solvent constituting a molecular weight regulator solution, a solvent of a specific monomer and / or metathesis catalyst) used in the ring-opening polymerization reaction, for example, alkanes such as pentane, hexane, heptane, octane, nonane, decane, cyclohexane, Cycloalkanes such as cycloheptane, cyclooctane, decalin, norbornane, aromatic hydrocarbons such as benzene, toluene, xylene, ethylbenzene, cumene, chlorobutane, bromohexane, methylene chloride, dichloroethane, hexamethylenedibromide, Compounds such as halogenated alkanes and aryl halides such as chlorobenzene, chloroform and tetrachloroethylene; saturated carboxylic acid esters such as ethyl acetate, n-butyl acetate, iso-butyl acetate, methyl propionate and dimethoxyethane, and dibutyl Ethers such as ether, tetrahydrofuran, dimethoxyethane and the like, and the like can be used alone or in combination. Of these, aromatic hydrocarbons are preferred.
용매의 사용량으로서는 "용매:특정 단량체(중량비)"가 통상 1:1 내지 10:1이 되는 양이며, 바람직하게는 1:1 내지 5:1이 되는 양이다.As a usage-amount of a solvent, "a solvent: specific monomer (weight ratio)" is the quantity which is usually 1: 1-10: 1, Preferably it is the quantity which becomes 1: 1-5: 1.
<분자량 조절제><Molecular weight regulator>
얻어지는 개환 (공)중합체의 분자량 조절은 중합 온도, 촉매의 종류, 용매의 종류에 의해서도 행할 수 있지만, 본 발명에서는 분자량 조절제를 반응계에 공존시킴으로써 조절한다. Although molecular weight control of the ring-opening (co) polymer obtained can be performed also by polymerization temperature, the kind of catalyst, and the kind of solvent, in this invention, it adjusts by coexisting a molecular weight modifier in a reaction system.
여기서, 바람직한 분자량 조절제로서는, 예를 들면 에틸렌, 프로펜, 1-부텐, 1-펜텐, 1-헥센, 1-헵텐, 1-옥텐, 1-노넨, 1-데센 등의 α-올레핀류 및 스티렌을 들 수 있고, 이들 중에서 1-부텐, 1-헥센이 특히 바람직하다. Here, as a preferable molecular weight modifier, alpha olefins and styrene, such as ethylene, a propene, 1-butene, 1-pentene, 1-hexene, 1-heptene, 1-octene, 1-nonene, 1-decene, etc. Among these, 1-butene and 1-hexene are especially preferable.
이들 분자량 조절제는 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. These molecular weight modifiers can be used individually or in mixture of 2 or more types.
분자량 조절제의 사용량으로서는 개환 중합 반응에 제공되는 특정 단량체 1몰에 대하여 0.005 내지 0.6몰, 바람직하게는 0.02 내지 0.5몰이 된다.As a usage-amount of a molecular weight modifier, it becomes 0.005 to 0.6 mol, Preferably it is 0.02 to 0.5 mol with respect to 1 mol of specific monomers provided for a ring-opening polymerization reaction.
(2) 개환 공중합체를 얻기 위해서는, 개환 중합 공정에 있어서 특정 단량체 와 공중합성 단량체를 개환 공중합시킬 수 있지만, 추가로 폴리부타디엔, 폴리이소프렌 등의 공액 디엔 화합물, 스티렌-부타디엔 공중합체, 에틸렌-비공액 디엔 공중합체, 폴리노르보르넨 등의 주쇄에 탄소-탄소간 2중 결합을 2개 이상 포함하는 불포화 탄화수소계 중합체 등의 존재하에 특정 단량체를 개환 중합시킬 수도 있다.(2) In order to obtain a ring-opening copolymer, although a specific monomer and a copolymerizable monomer can be ring-opened copolymerized in a ring-opening polymerization process, conjugated diene compounds, such as polybutadiene and polyisoprene, styrene-butadiene copolymer, and ethylene-non-porous A specific monomer may also be ring-opened polymerized in the presence of an unsaturated hydrocarbon-based polymer including two or more carbon-carbon double bonds in a main chain such as a liquid diene copolymer or polynorbornene.
이상과 같이 하여 얻어지는 개환 (공)중합체는 그대로 사용할 수 있지만, 이것을 추가로 수소 첨가하여 얻어진 (3) 수소 첨가 (공)중합체는 내충격성이 큰 수지의 원료로서 유용하다. Although the ring-opening (co) polymer obtained as mentioned above can be used as it is, the (3) hydrogenated (co) polymer obtained by further hydrogenating this is useful as a raw material of resin with high impact resistance.
<수소 첨가 촉매><Hydrogenated Catalyst>
수소 첨가 반응은 통상적인 방법, 즉 개환 중합체의 용액에 수소 첨가 촉매를 첨가하고, 여기에 상압 내지 300 기압, 바람직하게는 3 내지 200 기압의 수소 가스를 0 내지 200 ℃, 바람직하게는 20 내지 180 ℃에서 작용시킴으로써 행해진다. The hydrogenation reaction is a conventional method, i.e., a hydrogenation catalyst is added to a solution of a ring-opening polymer, and hydrogen gas at atmospheric pressure to 300 atmospheres, preferably 3 to 200 atmospheres, is 0 to 200 캜, preferably 20 to 180 It is carried out by acting at 占 폚.
수소 첨가 촉매로서는 통상적인 올레핀성 화합물의 수소 첨가 반응에 이용되는 것을 사용할 수 있다. 이 수소 첨가 촉매로서는 불균일계 촉매 및 균일계 촉매를 들 수 있다. As a hydrogenation catalyst, what is used for the hydrogenation reaction of a normal olefinic compound can be used. As this hydrogenation catalyst, a heterogeneous catalyst and a homogeneous catalyst are mentioned.
불균일계 촉매로서는 팔라듐, 백금, 니켈, 로듐, 루테늄 등의 귀금속 촉매 물질을 카본, 실리카, 알루미나, 티타니아 등의 담체에 담지시킨 고체 촉매를 들 수 있다. 또한, 균일계 촉매로서는 나프텐산니켈/트리에틸알루미늄, 니켈아세틸아세토네이트/트리에틸알루미늄, 옥텐산코발트/n-부틸리튬, 티타노센디클로라이드/디에틸알루미늄모노클로라이드, 아세트산로듐, 클로로트리스(트리페닐포스핀)로듐, 디클로로트리스(트리페닐포스핀)루테늄, 클로로히드로카르보닐트리스(트리페닐포스핀)루테늄, 디클로로카르보닐트리스(트리페닐포스핀)루테늄 등을 들 수 있다. 촉매의 형태는 분말 또는 입상일 수 있다.As a heterogeneous catalyst, the solid catalyst which supported noble metal catalyst substances, such as palladium, platinum, nickel, rhodium, ruthenium, on support | carriers, such as carbon, a silica, alumina, titania, is mentioned. As the homogeneous catalyst, nickel naphthenate / triethylaluminum, nickelacetylacetonate / triethylaluminum, cobalt octate / n-butyllithium, titanocenedichloride / diethylaluminum monochloride, rhodium acetate, chlorotris (triphenyl Phosphine) rhodium, dichlorotris (triphenylphosphine) ruthenium, chlorohydrocarbonyltris (triphenylphosphine) ruthenium, dichlorocarbonyltris (triphenylphosphine) ruthenium and the like. The form of the catalyst may be powder or granular.
이들 수소 첨가 촉매는 개환 (공)중합체:수소 첨가 촉매(중량비)가 1:1×10-6 내지 1:2가 되는 비율로 사용된다. These hydrogenated catalysts are used in a ratio such that the ring-opening (co) polymer: hydrogenated catalyst (weight ratio) is 1: 1 × 10 −6 to 1: 2.
이와 같이, 수소 첨가함으로써 얻어지는 수소 첨가 (공)중합체는 우수한 열 안정성을 갖게 되어, 성형 가공시나 제품으로서의 사용시의 가열에 의해서도 그의 특성이 열화되지 않는다. 여기서, 수소 첨가율은 통상 50% 이상, 바람직하게 70% 이상, 더욱 바람직하게는 90% 이상이고, 특히 바람직하게는 99% 이상이다. As described above, the hydrogenated (co) polymer obtained by hydrogenation has excellent thermal stability, and its properties are not deteriorated even by heating during molding and use as a product. Here, hydrogenation rate is 50% or more normally, Preferably it is 70% or more, More preferably, it is 90% or more, Especially preferably, it is 99% or more.
또한, 수소 첨가 (공)중합체의 수소 첨가율은 500 MHz, 1H-NMR로 측정한 값이 50% 이상, 바람직하게는 90% 이상, 더욱 바람직하게는 98% 이상, 가장 바람직하게는 99% 이상이다. 수소 첨가율이 높을수록 열이나 빛에 대한 안정성이 우수해져서, 본 발명의 파장판으로서 사용한 경우에 장기에 걸쳐 안정한 특성을 얻을 수 있다.Further, the hydrogenation rate of the hydrogenated (co) polymer is 50% or more, preferably 90% or more, more preferably 98% or more, most preferably 99% or more, as measured by 500 MHz and 1 H-NMR. to be. The higher the hydrogenation rate, the better the stability against heat and light, and when used as the wavelength plate of the present invention, stable characteristics can be obtained over a long period of time.
한편, 본 발명의 환상 올레핀계 수지로서 사용되는 수소 첨가 (공)중합체는 상기 수소 첨가 (공)중합체 중에 포함되는 겔 함유량이 5 중량% 이하인 것이 바람직하고, 또한 1 중량% 이하인 것이 특히 바람직하다. On the other hand, as for the hydrogenated (co) polymer used as cyclic olefin resin of this invention, it is preferable that the gel content contained in the said hydrogenated (co) polymer is 5 weight% or less, and it is especially preferable that it is 1 weight% or less.
또한, 본 발명의 환상 올레핀계 수지로서, (4) 상기 (1) 또는 (2)의 개환 (공)중합체를 프리델 크래프츠 반응에 의해 환화한 후, 수소 첨가한 (공)중합체도 사용할 수 있다.In addition, as the cyclic olefin resin of the present invention, (4) hydrogenated (co) polymer after cyclizing the ring-opening (co) polymer of (1) or (2) by the Friedel Crafts reaction can also be used. .
<프리델 크래프츠 반응에 의한 환화>Cyclization by Friedel Crafts Reaction
(1) 또는 (2)의 개환 (공)중합체를 프리델 크래프츠 반응에 의해 환화하는 방법은 특별히 한정되는 것은 아니지만, 일본 특허 공개 (소)50-154399호 공보에 기재된 산성 화합물을 이용한 공지된 방법을 채용할 수 있다. 산성 화합물로서는, 구체적으로는 AlCl3, BF3, FeCl3, Al2O3, HCl, CH2ClCOOH, 제올라이트, 활성 백토 등의 루이스산, 브뢴스테드산이 이용된다. Although the method of cyclizing the ring-opening (co) polymer of (1) or (2) by Friedel Crafts reaction is not particularly limited, it is a known method using an acidic compound described in Japanese Patent Application Laid-open No. 50-154399. Can be adopted. Specific examples of the acidic compound include Lewis acids such as AlCl 3 , BF 3 , FeCl 3 , Al 2 O 3 , HCl, CH 2 ClCOOH, zeolite and activated clay, and Bronsted acid.
환화된 개환 (공)중합체는 (1) 또는 (2)의 개환 (공)중합체와 마찬가지로 수소 첨가할 수 있다. The cyclized ring-opening (co) polymer can be hydrogenated similarly to the ring-opening (co) polymer of (1) or (2).
또한, 본 발명의 환상 올레핀계 수지로서 (5) 상기 특정 단량체와 불포화 2중 결합 함유 화합물의 포화 공중합체도 사용할 수 있다. Moreover, as cyclic olefin resin of this invention, the saturated copolymer of the said specific monomer and unsaturated double bond containing compound can also be used.
<불포화 2중 결합 함유 화합물><Unsaturated double bond containing compound>
불포화 2중 결합 함유 화합물로서는, 예를 들면 에틸렌, 프로필렌, 부텐 등, 바람직하게는 탄소수 2 내지 12, 더욱 바람직하게는 탄소수 2 내지 8의 올레핀계 화합물을 들 수 있다. As the unsaturated double bond-containing compound, for example, ethylene, propylene, butene, etc., preferably an olefin compound having 2 to 12 carbon atoms, more preferably 2 to 8 carbon atoms.
특정 단량체/불포화 2중 결합 함유 화합물의 바람직한 사용 범위는 중량비로 90/10 내지 40/60이고, 더욱 바람직하게는 85/15 내지 50/50이다. The preferred use range of the specific monomer / unsaturated double bond containing compound is 90/10 to 40/60 by weight, more preferably 85/15 to 50/50.
본 발명에 있어서, (5) 특정 단량체와 불포화 2중 결합 함유 화합물의 포화 공중합체를 얻기 위해서는 통상적인 부가 중합법을 사용할 수 있다. In the present invention, in order to obtain a saturated copolymer of the specific monomer and the unsaturated double bond-containing compound, a conventional addition polymerization method can be used.
<부가 중합 촉매><Addition polymerization catalyst>
상기 (5) 포화 공중합체를 합성하기 위한 촉매로서는, 티탄 화합물, 지르코늄 화합물 및 바나듐 화합물에서 선택된 1종 이상과, 조 촉매로서의 유기 알루미늄 화합물이 이용된다. As a catalyst for synthesizing the saturated copolymer (5), at least one selected from a titanium compound, a zirconium compound and a vanadium compound, and an organoaluminum compound as a crude catalyst are used.
여기서, 티탄 화합물로서는 사염화티탄, 삼염화티탄 등을, 또한 지르코늄 화합물로서는 비스(시클로펜타디에닐)지르코늄클로라이드, 비스(시클로펜타디에닐)지르코늄디클로라이드 등을 들 수 있다. Here, titanium tetrachloride, titanium trichloride, etc. are mentioned as a titanium compound, bis (cyclopentadienyl) zirconium chloride, bis (cyclopentadienyl) zirconium dichloride, etc. are mentioned as a zirconium compound.
또한, 바나듐 화합물로서는 화학식 VO(OR)aXb, 또는 V(OR)cXd[단, R은 탄화수소기, X는 할로겐 원자이며, 0≤a≤3, 0≤b≤3, 2≤(a+b)≤3, 0≤c≤4, 0≤d≤4, 3≤(c+d)≤4임]로 표시되는 바나듐 화합물, 또는 이들의 전자 공여 부가물이 이용된다. As the vanadium compound, the formula VO (OR) a X b or V (OR) c X d [where R is a hydrocarbon group and X is a halogen atom and 0 ≦ a ≦ 3, 0 ≦ b ≦ 3, 2 ≦ vanadium compounds represented by (a + b) ≤ 3, 0 ≤ c ≤ 4, 0 ≤ d ≤ 4, and 3 ≤ (c + d) ≤ 4], or their electron donating adducts.
상기 전자 공여체로서는 알코올, 페놀류, 케톤, 알데히드, 카르복실산, 유기산 또는 무기산의 에스테르, 에테르, 산 아미드, 산 무수물, 알콕시실란 등의 산소 함유 전자 공여체, 암모니아, 아민, 니트릴, 이소시아네이트 등의 질소 함유 전자 공여체 등을 들 수 있다. Examples of the electron donor include oxygen-containing electron donors such as alcohols, phenols, ketones, aldehydes, carboxylic acids, esters of organic or inorganic acids, ethers, acid amides, acid anhydrides, and alkoxysilanes, and nitrogen-containing electrons such as ammonia, amines, nitriles, and isocyanates. Electron donors and the like.
또한, 조 촉매로서의 유기 알루미늄 화합물로서는 1개 이상의 알루미늄-탄소 결합 또는 알루미늄-수소 결합을 갖는 것에서 선택된 1종 이상이 이용된다. As the organoaluminum compound as the crude catalyst, at least one selected from those having at least one aluminum-carbon bond or aluminum-hydrogen bond is used.
상기에 있어서, 예를 들면 바나듐 화합물을 이용하는 경우에서의 바나듐 화합물과 유기 알루미늄 화합물의 비율은 바나듐 원자에 대한 알루미늄 원자의 비(Al/V)가 2 이상이고, 바람직하게는 2 내지 50, 특히 바람직하게는 3 내지 20의 범위이다. In the above, for example, the ratio of the vanadium compound to the organoaluminum compound in the case of using a vanadium compound is 2 or more, preferably 2 to 50, particularly preferably 2 to 50, particularly preferably a ratio of aluminum atoms to vanadium atoms. Preferably in the range of 3 to 20.
부가 중합에 사용되는 중합 반응용 용매는 개환 중합 반응에 이용되는 용매와 동일한 것을 사용할 수 있다. 또한, 얻어지는 (5) 포화 공중합체의 분자량 조절은 통상 수소를 이용하여 행해진다. As the solvent for the polymerization reaction used for the addition polymerization, the same solvent as that used for the ring-opening polymerization reaction can be used. In addition, molecular weight adjustment of the obtained (5) saturated copolymer is normally performed using hydrogen.
또한, 본 발명의 환상 올레핀계 수지로서, (6) 상기 특정 단량체, 및 비닐계 환상 탄화수소계 단량체 또는 시클로펜타디엔계 단량체에서 선택되는 1종 이상의 단량체의 부가형 공중합체 및 그의 수소 첨가 공중합체도 사용할 수 있다. In addition, as the cyclic olefin resin of the present invention, (6) an addition type copolymer of one or more monomers selected from the above-described specific monomers and vinyl cyclic hydrocarbon monomers or cyclopentadiene monomers and hydrogenated copolymers thereof may also be used. Can be.
<비닐계 환상 탄화수소계 단량체><Vinyl cyclic hydrocarbon monomer>
비닐계 환상 탄화수소계 단량체로서는, 예를 들면 4-비닐시클로펜텐, 2-메틸-4-이소프로페닐시클로펜텐 등의 비닐시클로펜텐계 단량체, 4-비닐시클로펜탄, 4-이소프로페닐시클로펜탄 등의 비닐시클로펜탄계 단량체 등의 비닐화 5원환 탄화수소계 단량체, 4-비닐시클로헥센, 4-이소프로페닐시클로헥센, 1-메틸-4-이소프로페닐시클로헥센, 2-메틸-4-비닐시클로헥센, 2-메틸-4-이소프로페닐시클로헥센 등의 비닐시클로헥센계 단량체, 4-비닐시클로헥산, 2-메틸-4-이소프로페닐시클로헥산 등의 비닐시클로헥산계 단량체, 스티렌, α-메틸스티렌, 2-메틸스티렌, 3-메틸스티렌, 4-메틸스티렌, 1-비닐나프탈렌, 2-비닐나프탈렌, 4-페닐스티렌, p-메톡시스티렌 등의 스티렌계 단량체, d-테르펜, 1-테르펜, 디테르펜, d-리모넨, 1-리모넨, 디펜텐 등의 테르펜계 단량체, 4-비닐시클로헵텐, 4-이소프로페닐시클로헵텐 등의 비닐시클로헵텐계 단량체, 4-비닐시클로헵탄, 4-이소프로페닐시클로헵탄 등의 비닐시 클로헵탄계 단량체 등을 들 수 있다. 바람직하게는 스티렌, α-메틸스티렌이다. 이들은 1종 단독으로 또는 2종 이상을 병용할 수 있다. Examples of the vinyl cyclic hydrocarbon monomers include vinylcyclopentene monomers such as 4-vinylcyclopentene and 2-methyl-4-isopropenylcyclopentene, 4-vinylcyclopentane, 4-isopropenylcyclopentane, and the like. Vinylated 5-membered ring hydrocarbon monomers such as vinylcyclopentane monomers, 4-vinylcyclohexene, 4-isopropenylcyclohexene, 1-methyl-4-isopropenylcyclohexene, and 2-methyl-4-vinylcyclohexene Vinylcyclohexane monomers such as vinylcyclohexene monomers such as 2-methyl-4-isopropenylcyclohexene, 4-vinylcyclohexane, and 2-methyl-4-isopropenylcyclohexane, styrene, and α-methyl Styrene-based monomers such as styrene, 2-methylstyrene, 3-methylstyrene, 4-methylstyrene, 1-vinylnaphthalene, 2-vinylnaphthalene, 4-phenylstyrene, p-methoxystyrene, d-terpene, 1-terpene , Terpene monomers such as diterpene, d-limonene, 1-limonene, dipentene, and 4-vinyl As there may be mentioned heptene, 4-isopropoxy-phenyl cycloheptene, etc. of the vinyl monomer cycloheptyl butene, 4-vinyl-cycloheptane, 4-cycloheptane isopropenyl vinyl chloride during heptane-based monomers and the like. Preferably they are styrene and (alpha) -methylstyrene. These can be used individually by 1 type or in combination of 2 or more types.
<시클로펜타디엔계 단량체> <Cyclopentadiene monomers>
본 발명의 (6) 부가형 공중합체의 단량체에 사용되는 시클로펜타디엔계 단량체로서는, 예를 들면 시클로펜타디엔, 1-메틸시클로펜타디엔, 2-메틸시클로펜타디엔, 2-에틸시클로펜타디엔, 5-메틸시클로펜타디엔, 5,5-메틸시클로펜타디엔 등을 들 수 있다. 바람직하게는 시클로펜타디엔이다. 이들은 1종 단독으로 또는 2종 이상을 병용할 수 있다. As a cyclopentadiene type monomer used for the monomer of the (6) addition type copolymer of this invention, for example, cyclopentadiene, 1-methylcyclopentadiene, 2-methylcyclopentadiene, 2-ethylcyclopentadiene, 5 -Methylcyclopentadiene, 5,5-methylcyclopentadiene, etc. are mentioned. Preferably cyclopentadiene. These can be used individually by 1 type or in combination of 2 or more types.
상기 특정 단량체, 비닐계 환상 탄화수소계 단량체 및 시클로펜타디엔계 단량체에서 선택되는 1종 이상의 단량체의 부가형 (공)중합체는 상기 (5) 특정 단량체와 불포화 2중 결합 함유 화합물의 포화 공중합체와 동일한 부가 중합법으로 얻을 수 있다. The addition type (co) polymer of at least one monomer selected from the above specific monomers, vinyl cyclic hydrocarbon monomers and cyclopentadiene monomers is the same as the saturated copolymer of the above (5) specific monomers and unsaturated double bond-containing compounds. It can be obtained by a polymerization method.
또한, 상기 부가형 (공)중합체의 수소 첨가 (공)중합체는 상기 (3) 개환 (공)중합체의 수소 첨가 (공)중합체와 동일한 수소 첨가법으로 얻을 수 있다. In addition, the hydrogenation (co) polymer of the said addition type (co) polymer can be obtained by the same hydrogenation method as the hydrogenation (co) polymer of said (3) ring-opening (co) polymer.
또한, 본 발명의 환상 올레핀계 수지로서 (7) 상기 특정 단량체와 아크릴레이트의 교대 공중합체도 사용할 수 있다. Moreover, the alternating copolymer of (7) the said specific monomer and acrylate can also be used as cyclic olefin resin of this invention.
<아크릴레이트><Acrylate>
본 발명의 (7) 상기 특정 단량체와 아크릴레이트의 교대 공중합체의 제조에 이용되는 아크릴레이트로서는, 예를 들면 메틸아크릴레이트, 2-에틸헥실아크릴레이트, 시클로헥실아크릴레이트 등의 탄소 원자수 1 내지 20의 직쇄상, 분지상 또는 환상 알킬아크릴레이트, 글리시딜아크릴레이트, 2-테트라히드로푸르푸릴아크릴레이트 등의 탄소 원자수 2 내지 20의 복소환기 함유 아크릴레이트, 벤질아크릴레이트 등의 탄소 원자수 6 내지 20의 방향족환기 함유 아크릴레이트, 이소보로닐아크릴레이트, 디시클로펜타닐아크릴레이트 등의 탄소수 7 내지 30의 다환 구조를 갖는 아크릴레이트를 들 수 있다. As an acrylate used for manufacture of the alternating copolymer of the said specific monomer and acrylate of (7) of this invention, For example, C1-C1, such as methyl acrylate, 2-ethylhexyl acrylate, cyclohexyl acrylate, etc. Carbon atoms such as heterocyclic group-containing acrylates and benzyl acrylates having 2 to 20 carbon atoms such as 20 linear, branched or cyclic alkyl acrylates, glycidyl acrylates and 2-tetrahydrofurfuryl acrylates The acrylate which has a C7-C30 polycyclic structure, such as 6-20 aromatic ring group containing acrylate, isoboroyl acrylate, and dicyclopentanyl acrylate, is mentioned.
본 발명에 있어서, (7) 상기 특정 단량체와 아크릴레이트의 교대 공중합체를 얻기 위해서는, 루이스산 존재하에 상기 특정 단량체와 아크릴레이트의 합계를 100몰로 했을 때, 통상 상기 특정 단량체가 30 내지 70몰, 아크릴레이트가 70 내지 30몰의 비율로, 바람직하게는 상기 특정 단량체가 40 내지 60몰, 아크릴레이트가 60 내지 40몰 비율로, 특히 바람직하게는 상기 특정 단량체가 45 내지 55몰, 아크릴레이트가 55 내지 45몰의 비율로 라디칼 중합한다. In the present invention, (7) In order to obtain an alternating copolymer of the specific monomer and the acrylate, when the total of the specific monomer and the acrylate is 100 mol in the presence of Lewis acid, the specific monomer is usually 30 to 70 mol, The acrylate is in a ratio of 70 to 30 moles, preferably the specific monomer is 40 to 60 moles, the acrylate is in a ratio of 60 to 40 moles, particularly preferably the particular monomer is 45 to 55 moles and the acrylate is 55 Radical polymerization at a rate of from 45 to 45 moles.
(7) 상기 특정 단량체와 아크릴레이트의 교대 공중합체를 얻기 위해 사용하는 루이스산의 양은 아크릴레이트 100몰에 대하여 0.001 내지 1몰이 되는 양이다. 또한, 공지된 자유 라디칼을 발생하는 유기 과산화물 또는 아조비스계 라디칼 중합 개시제를 사용할 수 있고, 중합 반응 온도는 통상 -20 ℃ 내지 80 ℃, 바람직하게는 5 ℃ 내지 60 ℃이다. 또한, 중합 반응용 용매에는 개환 중합 반응에 이용되는 용매와 동일한 것을 사용할 수 있다.(7) The amount of Lewis acid used to obtain an alternating copolymer of the specific monomer and acrylate is an amount of 0.001 to 1 mol based on 100 mol of acrylate. In addition, a known organic peroxide or azobis radical polymerization initiator that generates a free radical can be used, and the polymerization reaction temperature is usually -20 ° C to 80 ° C, preferably 5 ° C to 60 ° C. As the solvent for the polymerization reaction, the same solvent as that used for the ring-opening polymerization reaction can be used.
한편, 본 발명에서 말하는 "교대 공중합체"란 상기 특정 단량체에서 유래되는 구조 단위가 인접하지 않는, 즉, 상기 특정 단량체에서 유래되는 구조 단위의 이웃은 반드시 아크릴레이트에서 유래되는 구조 단위인 구조를 갖는 공중합체를 의 미하며, 아크릴레이트 유래의 구조 단위끼리가 인접하여 존재하는 구조를 부정하는 것은 아니다.On the other hand, "alternative copolymer" as used in the present invention means that the structural units derived from the specific monomer are not adjacent to each other, that is, the neighbors of the structural units derived from the specific monomer have a structure that is necessarily a structural unit derived from acrylate. It means a copolymer and does not negate the structure in which structural units derived from an acrylate exist adjacent to each other.
본 발명에서 사용되는 환상 올레핀계 수지의 바람직한 분자량은 고유 점도[η]inh로 0.2 내지 5 dl/g, 더욱 바람직하게는 0.3 내지 3 dl/g, 특히 바람직하게는 0.4 내지 1.5 dl/g이고, 테트라히드로푸란에 용해시켜 겔 투과 크로마토그래피(GPC)로 측정한 폴리스티렌 환산의 수 평균 분자량(Mn)은 8,000 내지 100,000, 더욱 바람직하게는 10,000 내지 80,000, 특히 바람직하게는 12,000 내지 50,000이고, 중량 평균 분자량(Mw)은 20,000 내지 300,000, 더욱 바람직하게는 30,000 내지 250,000, 특히 바람직하게는 40,000 내지 200,000의 범위의 것이 바람직하다. 또한, 분자량 분포(Mn/Mw)는 바람직하게는 2.0 내지 4.0, 더욱 바람직하게는 2.5 내지 3.7이고, 더욱 바람직하게는 2.8 내지 3.5이다. The preferred molecular weight of the cyclic olefin resin used in the present invention is 0.2 to 5 dl / g, more preferably 0.3 to 3 dl / g, particularly preferably 0.4 to 1.5 dl / g in intrinsic viscosity [η] inh , The number average molecular weight (Mn) in terms of polystyrene dissolved in tetrahydrofuran and measured by gel permeation chromatography (GPC) is 8,000 to 100,000, more preferably 10,000 to 80,000, particularly preferably 12,000 to 50,000, and the weight average molecular weight (Mw) is preferably in the range of 20,000 to 300,000, more preferably 30,000 to 250,000, particularly preferably 40,000 to 200,000. Moreover, molecular weight distribution (Mn / Mw) becomes like this. Preferably it is 2.0-4.0, More preferably, it is 2.5-3.7, More preferably, it is 2.8-3.5.
고유 점도[η]inh, 수 평균 분자량 및 중량 평균 분자량이 상기 범위에 있음으로써, 환상 올레핀계 수지의 내열성, 내수성, 내약품성, 기계적 특성과, 본 발명의 광학 필름으로서의 성형 가공성이 양호해진다.When the intrinsic viscosity [η] inh , the number average molecular weight and the weight average molecular weight are in the above ranges, the heat resistance, water resistance, chemical resistance, mechanical properties of the cyclic olefin resin, and molding processability as the optical film of the present invention are improved.
본 발명에 사용되는 환상 올레핀계 수지의 유리 전이 온도(Tg)는 통상 110 ℃ 이상, 바람직하게는 110 내지 350 ℃, 더욱 바람직하게는 120 내지 250 ℃, 특히 바람직하게는 120 내지 200 ℃이다. Tg가 110 ℃ 미만인 경우에는 고온 조건하에서의 사용, 또는 코팅, 인쇄 등의 2차 가공에 의해 변형되기 때문에 바람직하지 않다. 한편, Tg가 350 ℃를 초과하면, 성형 가공이 곤란해지고, 또한 성형 가공시 의 가열 온도를 높게 할 필요가 생기기 때문에, 열에 의해 수지가 열화될 가능성이 높아진다.The glass transition temperature (Tg) of cyclic olefin resin used for this invention is 110 degreeC or more normally, Preferably it is 110-350 degreeC, More preferably, it is 120-250 degreeC, Especially preferably, it is 120-200 degreeC. When Tg is less than 110 degreeC, since it deforms by use under high temperature conditions or secondary processing, such as coating and printing, it is unpreferable. On the other hand, when Tg exceeds 350 degreeC, since a shaping | molding process becomes difficult and it is necessary to raise the heating temperature at the time of shaping | molding process, the possibility of resin deterioration by heat increases.
이상의 환상 올레핀계 수지에는 본 발명의 효과를 손상시키지 않는 범위에서, 예를 들면 일본 특허 공개 (평)9-221577호 공보, 일본 특허 공개 (평)10-287732호 공보에 기재되어 있는, 특정 탄화수소계 수지, 또는 공지된 열가소성 수지, 열가소성 엘라스토머, 고무질 중합체, 유기 미립자, 무기 미립자 등을 배합할 수 있다. In the above cyclic olefin resin, the specific hydrocarbon described in Unexamined-Japanese-Patent No. 9-221577 and Unexamined-Japanese-Patent No. 10-287732 in the range which does not impair the effect of this invention, for example. Or a known thermoplastic resin, thermoplastic elastomer, rubbery polymer, organic fine particles, inorganic fine particles, or the like.
또한, 본 발명에 이용하는 환상 올레핀계 수지에는 본 발명의 효과를 손상시키지 않는 범위에서, 내열열화성이나 내광성의 개량을 위해 공지된 산화 방지제나 자외선 흡수제 등의 첨가제를 첨가할 수 있다. 예를 들면, 하기 페놀계 화합물, 티올계 화합물, 술피드계 화합물, 디술피드계 화합물, 인계 화합물로 이루어지는 군에서 선택되는 1종 이상의 화합물을, 본 발명의 환상 올레핀계 수지 100 중량부에 대하여 0.01 내지 10 중량부 첨가함으로써, 내열열화성을 향상시킬 수 있다. Moreover, additives, such as well-known antioxidant and ultraviolet absorber, can be added to the cyclic olefin resin used for this invention in order to improve heat resistance and light resistance, in the range which does not impair the effect of this invention. For example, one or more compounds selected from the group consisting of the following phenolic compounds, thiol compounds, sulfide compounds, disulfide compounds, and phosphorus compounds are 0.01 to 100 parts by weight of the cyclic olefin resin of the present invention. By adding 10 parts by weight, heat deterioration resistance can be improved.
페놀계 화합물: Phenolic Compounds:
페놀계 화합물로서는, 트리에틸렌글리콜-비스[3-(3-t-부틸-5-메틸-4-히드록시페닐)프로피오네이트], 1,6-헥산디올-비스[3-(3,5-디-t-부틸-4-히드록시페닐)프로피오네이트], 2,4-비스-(n-옥틸티오)-6-(4-히드록시-3,5-디-t-부틸아닐리노)-3,5-트리아진, 펜타에리트리틸-테트라키스[3-(3,5-디-t-부틸-4-히드록시페닐)프로피오네이트], 2,2-티오-디에틸렌비스[3-(3,5-디-t-부틸-4-히드록시페닐)프로피오네이트], 옥타데실-3-(3,5-디-t-부틸-4-히드록시페닐)프로피오네이트], N,N-헥사메틸 렌비스(3,5-디-t-부틸-4-히드록시-히드로신남아미드), 1,3,5-트리메틸-2,4,6-트리스(3,5-디-t-부틸-4-히드록시벤질)벤젠, 트리스-(3,5-디-t-부틸-4-히드록시벤질)-이소시아누레이트, 3,9-비스[2-[3-(3-t-부틸-4-히드록시-5-메틸페닐)프로피오닐옥시]-1,1-디메틸에틸]-2,4,8,10-테트라옥사스피로[5.5]운데칸 등을 들 수 있다. 바람직하게는, 옥타데실-3-(3,5-디-t-부틸-4-히드록시페닐)프로피오네이트], 1,3,5-트리메틸-2,4,6-트리스(3,5-디-t-부틸-4-히드록시벤질)벤젠, 펜타에리트리틸-테트라키스[3-(3,5-디-t-부틸-4-히드록시페닐)프로피오네이트]를 들 수 있고, 특히 바람직하게는 옥타데실-3-(3,5-디-t-부틸-4-히드록시페닐)프로피오네이트] 등을 들 수 있다. Examples of the phenol-based compound include triethylene glycol-bis [3- (3-t-butyl-5-methyl-4-hydroxyphenyl) propionate] and 1,6-hexanediol-bis [3- (3,5 -Di-t-butyl-4-hydroxyphenyl) propionate], 2,4-bis- (n-octylthio) -6- (4-hydroxy-3,5-di-t-butylanilino ) -3,5-triazine, pentaerythryl-tetrakis [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate], 2,2-thio-diethylenebis [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate], octadecyl-3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate ], N, N-hexamethylenebis (3,5-di-t-butyl-4-hydroxy-hydrocinnamamide), 1,3,5-trimethyl-2,4,6-tris (3,5 -Di-t-butyl-4-hydroxybenzyl) benzene, tris- (3,5-di-t-butyl-4-hydroxybenzyl) -isocyanurate, 3,9-bis [2- [3 -(3-t-butyl-4-hydroxy-5-methylphenyl) propionyloxy] -1,1-dimethylethyl] -2,4,8,10-tetraoxaspiro [5.5] undecane and the like. There All. Preferably, octadecyl-3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate], 1,3,5-trimethyl-2,4,6-tris (3,5 -Di-t-butyl-4-hydroxybenzyl) benzene, pentaerythryl-tetrakis [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate] , Particularly preferably octadecyl-3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate].
티올계 화합물: Thiol Compounds:
티올계 화합물로서는 t-도데실머캅탄, 헥실머캅탄 등의 알킬머캅탄, 2-머캅토벤즈이미다졸, 2-머캅토-6-메틸벤즈이미다졸, 1-메틸-2-(메틸머캅토)벤즈이미다졸, 2-머캅토-1-메틸벤즈이미다졸, 2-머캅토-4-메틸벤즈이미다졸, 2-머캅토-5-메틸벤즈이미다졸, 2-머캅토-5,6-디메틸벤즈이미다졸, 2-(메틸머캅토)벤즈이미다졸, 1-메틸-2-(메틸머캅토)벤즈이미다졸, 2-머캅토-1,3-디메틸벤즈이미다졸, 머캅토아세트산 등을 들 수 있다. Examples of the thiol-based compound include alkyl mercaptans such as t-dodecyl mercaptan and hexyl mercaptan, 2-mercaptobenzimidazole, 2-mercapto-6-methylbenzimidazole, and 1-methyl-2- (methylmercapto). Benzimidazole, 2-mercapto-1-methylbenzimidazole, 2-mercapto-4-methylbenzimidazole, 2-mercapto-5-methylbenzimidazole, 2-mercapto-5,6-dimethyl Benzimidazole, 2- (methylmercapto) benzimidazole, 1-methyl-2- (methylmercapto) benzimidazole, 2-mercapto-1,3-dimethylbenzimidazole, mercaptoacetic acid and the like Can be.
술피드계 화합물: Sulfide compounds:
술피드계 화합물로서는 2,2-티오-디에틸렌비스[3-(3,5-디-t-부틸-4-히드록시페닐)프로피오네이트], 2,2-티오비스(4-메틸-6-t-부틸페놀), 2,4-비스(n-옥틸티오메틸)-6-메틸페놀, 디라우릴 3,3'-티오디프로피오네이트, 디미리스틸 3,3'-티오디 프로피오네이트, 디스테아릴 3,3'-티오디프로피오네이트, 펜타에리트리틸테트라키스(3-라우릴티오프로피오네이트), 디트리데실 3,3'-티오디프로피오네이트 등을 들 수 있다. Examples of the sulfide compound include 2,2-thio-diethylenebis [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate] and 2,2-thiobis (4-methyl- 6-t-butylphenol), 2,4-bis (n-octylthiomethyl) -6-methylphenol, dilauryl 3,3'-thiodipropionate, dimyristyl 3,3'-thiodiprop Cypionate, distearyl 3,3'- thiodipropionate, pentaerythryl tetrakis (3-laurylthiopropionate), ditridecyl 3,3'- thiodipropionate, etc. are mentioned. Can be.
디술피드계 화합물: Disulfide Compounds:
디술피드계 화합물로서는 비스(4-클로로페닐)디술피드, 비스(2-클로로페닐)디술피드, 비스(2,5-디클로로페닐)디술피드, 비스(2,4,6-트리클로로페닐)디술피드, 비스(2-니트로페닐)디술피드, 2,2'-디티오디벤조산에틸, 비스(4-아세틸페닐)디술피드, 비스(4-카르바모일페닐)디술피드, 1,1'-디나프틸디술피드, 2,2'-디나프틸디술피드, 1,2'-디나프틸디술피드, 2,2'-비스(1-클로로디나프틸)디술피드, 1,1'-비스(2-클로로나프틸)디술피드, 2,2'-비스(1-시아노나프틸)디술피드, 2,2'-비스(1-아세틸나프틸)디술피드, 디라우릴-3,3'-티오디프로피온산에스테르 등을 들 수 있다.As a disulfide type compound, bis (4-chlorophenyl) disulfide, bis (2-chlorophenyl) disulfide, bis (2, 5- dichlorophenyl) disulfide, bis (2, 4, 6- trichlorophenyl) disulfide Feed, bis (2-nitrophenyl) disulfide, ethyl 2,2'-dithiodibenzoate, bis (4-acetylphenyl) disulfide, bis (4-carbamoylphenyl) disulfide, 1,1'-di Naphthyl disulfide, 2,2'- dinaphthyl disulfide, 1,2'- dinaphthyl disulfide, 2,2'-bis (1-chlorodinaphthyl) disulfide, 1,1'-bis (2-chloronaphthyl) disulfide, 2,2'-bis (1-cyanonaphthyl) disulfide, 2,2'-bis (1-acetylnaphthyl) disulfide, dilauryl-3,3 ' -Thiodipropionic acid ester etc. are mentioned.
인계 화합물: Phosphorus-based compound:
인계 화합물로서는 트리스(4-메톡시-3,5-디페닐)포스파이트, 트리스(노닐페닐)포스파이트, 트리스(2,4-디-t-부틸페닐)포스파이트, 비스(2,6-디-t-부틸-4-메틸페닐)펜타에리트리톨디포스파이트, 비스(2,4-디-t-부틸페닐)펜타에리트리톨디포스파이트 등을 들 수 있다. Examples of the phosphorus compound include tris (4-methoxy-3,5-diphenyl) phosphite, tris (nonylphenyl) phosphite, tris (2,4-di-t-butylphenyl) phosphite, bis (2,6- Di-t-butyl-4-methylphenyl) pentaerythritol diphosphite, bis (2,4-di-t-butylphenyl) pentaerythritol diphosphite, etc. are mentioned.
또한, 2,4-디히드록시벤조페논, 2-히드록시-4-메톡시벤조페논 등의 벤조페논계 화합물, N-(벤질옥시카르보닐옥시)벤조트리아졸 등의 벤조트리아졸계 화합물, 또는 2-에틸옥사닐리드, 2-에틸-2'-에톡시옥사닐리드 등의 옥사닐리드계 화합물을, 환상 올레핀계 수지 100 중량부에 대하여 0.01 내지 3 중량부, 바람직하게는 0.05 내지 2 중량부 첨가함으로써, 내광성을 향상시킬 수 있다. Moreover, benzophenazole type compounds, such as 2, 4- dihydroxy benzophenone and 2-hydroxy-4- methoxy benzophenone, benzotriazole type compounds, such as N- (benzyloxycarbonyloxy) benzotriazole, or 0.01 to 3 parts by weight, preferably 0.05 to 2 parts by weight of an oxanilide compound such as 2-ethyloxanide and 2-ethyl-2'-ethoxyoxanide, based on 100 parts by weight of the cyclic olefin resin By addition, light resistance can be improved.
또한, 본 발명에 따른 환상 올레핀계 수지에는 용융 압출에 의해 필름 등으로 성형하는 경우에는 용융 압출시의 열 이력에 의해 이 수지가 열 열화되는 것을 방지하기 위해 산화 방지제를 첨가할 수도 있다.In addition, in the case of molding into a film or the like by melt extrusion, an oxidizing agent may be added to the cyclic olefin resin according to the present invention in order to prevent the resin from thermally deteriorating due to the heat history during melt extrusion.
상기 산화 방지제의 구체예로서는, 예를 들면 1,3,5-트리메틸-2,4,6-트리스(3,5-디-t-부틸-4-히드록시벤질)벤젠, N,N'-헥사메틸렌비스(3,5-디-t-부틸-4-히드록시-히드로신남아미드), 트리스-(3,5-디-t-부틸-4-히드록시벤질)-이소시아네이트, 트리스(2,4-디-t-부틸페닐)포스파이트 등을 들 수 있지만, 본 발명은 이들에 한정되는 것은 아니며, 또한 이들에 있어서도 용융 압출하는 환상 올레핀계 수지의 Tg에 따라서는 부적당한 경우가 있다. 한편, 본 발명의 효과를 손상시키지 않는 한, 이들은 조합하여 사용할 수도 있고, 단독으로 사용할 수도 있다. As a specific example of the said antioxidant, 1,3,5-trimethyl-2,4,6-tris (3,5-di-t- butyl- 4-hydroxybenzyl) benzene, N, N'-hexa Methylenebis (3,5-di-t-butyl-4-hydroxy-hydrocinnaamide), tris- (3,5-di-t-butyl-4-hydroxybenzyl) -isocyanate, tris (2,4 Although -di-t-butylphenyl) phosphite etc. are mentioned, this invention is not limited to these, In addition, also in these, it may be inappropriate depending on Tg of cyclic olefin resin to melt-extrude. In addition, as long as the effect of this invention is not impaired, these may be used in combination or may be used independently.
이들 산화 방지제의 첨가량은 환상 올레핀계 수지 100 중량부에 대하여 통상 0.01 내지 5 중량부, 바람직하게는 0.05 내지 4 중량부, 더욱 바람직하게는 0.1 내지 1.5 중량부이다. 산화 방지제의 첨가량이 0.01 중량부에 미치지 않는 경우에는, 압출 가공시에 수지에 겔이 발생하기 쉬워지고, 이에 기인하여, 얻어진 필름 상에 결함으로서 인식되는 경우가 있어 바람직하지 않다. 한편, 첨가제량이 5 중량부를 초과하면, 가공시에 점액물의 발생 등을 초래할 수 있고, 이 점액물이 다이 라인, 필름 상의 피쉬 아이, 그을음 등의 원인이 되기 때문에 바람직하지 않다. The amount of these antioxidants added is usually 0.01 to 5 parts by weight, preferably 0.05 to 4 parts by weight, and more preferably 0.1 to 1.5 parts by weight with respect to 100 parts by weight of the cyclic olefin resin. When the addition amount of antioxidant is less than 0.01 weight part, a gel will generate | occur | produce easily in resin at the time of extrusion processing, and it may be recognized as a defect on the obtained film by this, and it is unpreferable. On the other hand, when the amount of the additive exceeds 5 parts by weight, it may cause the generation of slime at the time of processing, and this slime is not preferable because it causes a die line, a fish eye on the film, soot and the like.
이러한 산화 방지제는 환상 올레핀계 수지를 제조할 때에 첨가할 수도 있고, 용융 압출할 때에 환상 올레핀계 수지의 펠릿과 함께 배합할 수도 있다.Such antioxidant may be added when producing cyclic olefin resin, and may be mix | blended with the pellet of cyclic olefin resin at the time of melt extrusion.
또한, 본 발명의 환상 올레핀계 수지를 용융 압출에 의해 성형하는 경우에서는 본 발명의 효과를 손상시키지 않는 범위에서 윤활제, 자외선 흡수제, 염료 또는 안료 등의 상기 산화 방지제 이외의 첨가제를 사용할 수 있다. 물론 이 경우라도 융점을 갖는 첨가제의 경우, 그 융점이 본 발명의 필수 산화 방지제의 융점 범위에 있는 것이 바람직하다.Moreover, when shape | molding the cyclic olefin resin of this invention by melt extrusion, additives other than said antioxidant, such as a lubricant, a ultraviolet absorber, dye, or a pigment, can be used in the range which does not impair the effect of this invention. Of course, even in this case, in the case of the additive having a melting point, the melting point is preferably in the melting point range of the essential antioxidant of the present invention.
<필름 성형><Film forming>
본 발명의 광학 필름의 성형 방법은 용융 압출법으로서, 수지 펠릿을, 산소 농도 10 ppm 이하의 불활성 가스를 매체로 하여 압출기에 수송하고, 상기 펠릿을 용융 압출 성형하는 것을 특징으로 한다. 구체적으로는, 콘테이너에 봉입된 수지 펠릿을 건조기에 수송하고, 상기 건조기로부터, 산소 농도 10 ppm 이하, 바람직하게는 8 ppm 이하, 더욱 바람직하게는 6 ppm 이하의 불활성 가스를 매체로 하여 압출기에 수송하는 것이 바람직하다. 구체적으로는, 도 1에 나타낸 바와 같이, 콘테이너에 봉입된 수지 펠릿을, 산소 농도 10 ppm 이하의 불활성 가스를 매체로 하여 건조기에 수송하고, 건조 처리를 행한 후, 선행의 수송에 의해 건조기에 충전된 불활성 가스를 이용하여 상기 펠릿을 압출기에 수송하는 것이 바람직하다. The molding method of the optical film of the present invention is a melt extrusion method, wherein resin pellets are transported to an extruder using an inert gas having an oxygen concentration of 10 ppm or less as a medium, and the pellets are melt-extruded. Specifically, the resin pellets enclosed in the container are transported to a drier, and the drier is transported to the extruder using an inert gas having an oxygen concentration of 10 ppm or less, preferably 8 ppm or less, more preferably 6 ppm or less as a medium. It is desirable to. Specifically, as shown in FIG. 1, the resin pellets enclosed in the container are transported to a drier using an inert gas having an oxygen concentration of 10 ppm or less as a medium, and the drying process is performed, followed by filling in the drier by preceding transportation. It is preferable to transfer the pellets to the extruder using the inert gas.
상기 콘테이너는 펠릿을 봉입하는 탱크와, 펠릿의 추출에 갖는 추출관과 상부 하부에 펠릿 추출용 설비를 갖는 것일 수 있다. 콘테이너 내부는 청정한 상태로 펠릿을 봉입하는 것이 필요하고, 또한, 펠릿 봉입 후에는 외부로부터의 이물질의 침입이 없도록 차폐되어 있는 것이 필요하다.The container may be one having a tank for encapsulating the pellet, an extraction tube for extracting the pellet, and a facility for extracting the pellet in the upper portion thereof. It is necessary to enclose the pellet in a clean state inside the container, and also to shield the pellet so as to prevent intrusion of foreign matter from the outside after the encapsulation.
상기 건조기는 통상, 압출기에 수지 펠릿을 투입하기 전에, 상기 수지에 포 함되어 있는 수분, 기체(산소 등), 잔류 용제 등을 미리 제거하는 것을 목적으로 상기 수지의 Tg 이하의 적절한 온도에서 수지의 건조를 행하기 위해 이용된다. 바람직하게는, 불활성 가스 순환식 건조기, 진공 건조기가 이용된다. The dryer is generally used at a suitable temperature of Tg or less of the resin for the purpose of preliminarily removing moisture, gas (oxygen, etc.), residual solvent, and the like contained in the resin before inserting the resin pellet into the extruder. It is used to perform drying. Preferably, an inert gas circulation type dryer or a vacuum dryer is used.
수지 펠릿은 통상, 콘테이너와 건조기 사이에 설치된 흡인 호퍼(이하, 단순히 "호퍼"라고도 함)를 통해 건조기에 수송된다. 수송시에는 호퍼를 감압으로 하고, 콘테이너에 부착된 밸브로부터 상기 불활성 가스를 보냄으로써, 수지 펠릿을 건조기에 공송(空送)한다. 또한, 호퍼 내에서의 흡습이나 산소의 흡수를 억제하기 위해, 호퍼를 질소나 아르곤 등의 불활성 가스로 밀봉하거나, 감압 상태로 유지할 수 있는 진공 호퍼를 사용하는 것도 바람직한 방법이다. The resin pellets are usually transported to the dryer through a suction hopper (hereinafter simply referred to as a "hopper") provided between the container and the dryer. At the time of transport, the hopper is reduced in pressure, and the resin pellets are conveyed to the dryer by sending the inert gas from the valve attached to the container. Moreover, in order to suppress moisture absorption and oxygen absorption in a hopper, it is also preferable to use the vacuum hopper which can seal a hopper with inert gas, such as nitrogen and argon, or can keep it at reduced pressure.
건조된 수지 펠릿은 압출기의 상부에 설치된 호퍼를 통해 압출기에 수송된다. 건조기로의 수송과 마찬가지로, 수송시에는 호퍼를 감압으로 하고, 건조기 내에 충전된 불활성 가스와 수지 펠릿이 건조기에 수송된다. 또한, 외부로부터 추가로 불활성 가스를 도입하면서 수송을 행할 수도 있다. The dried resin pellets are transported to the extruder through a hopper installed on top of the extruder. As in the transportation to the dryer, at the time of transportation, the hopper is reduced in pressure, and the inert gas and the resin pellets filled in the dryer are transported to the dryer. In addition, transport can also be carried out while introducing an inert gas from the outside.
본 발명에 이용되는 불활성 가스로서는 수지 펠릿과 반응하지 않는 기체이면 특별히 한정되지 않고, 질소, 이산화탄소, 아르곤 등을 들 수 있지만, 바람직하게는 질소가 이용된다. 또한, 수지 펠릿의 수송에 이용할 때의 질소 가스의 유량은 건조기 및 압출기의 크기에도 의존하지만, 통상, 100 내지 800 l/분이고, 바람직하게는, 120 내지 600 l/분이다.As an inert gas used for this invention, if it is a gas which does not react with a resin pellet, it will not specifically limit, Although nitrogen, carbon dioxide, argon, etc. are mentioned, Nitrogen is used preferably. In addition, although the flow rate of nitrogen gas at the time of using for the transportation of resin pellets also depends on the size of a dryer and an extruder, it is 100-800 l / min normally, Preferably it is 120-600 l / min.
용융 압출법에 의해 환상 올레핀계 수지 필름을 얻는 방법으로서는 특별히 한정되는 것은 아니고, 공지된 방법을 적용할 수 있다. 예를 들면, 압출기에 부착 된 다이로부터 용융 상태의 환상 올레핀계 수지를 압출하고, 상기 수지를 경면 롤 표면에 압착하고, 그 후, 냉각하고 박리하여 시트화하는 방법을 들 수 있다.The method for obtaining the cyclic olefin resin film by the melt extrusion method is not particularly limited, and a known method can be applied. For example, a method of extruding a cyclic olefin resin in a molten state from a die attached to an extruder, pressing the resin onto the mirror surface roll surface, and then cooling and peeling to form a sheet may be mentioned.
환상 올레핀계 수지를 용융하는 방법으로서는 압출기에 의해 수지를 용융하는 방법이 바람직하고, 상기 용융 수지를 기어 펌프에 의해 정량 공급하고, 이를 금속 필터 등으로 여과하여 불순물을 제거한 후, 다이로 필름 형상으로 부형하면서 압출하는 방법이 바람직하다.As a method of melting the cyclic olefin resin, a method of melting the resin by an extruder is preferable, and the molten resin is quantitatively supplied by a gear pump, filtered through a metal filter or the like to remove impurities, and then in a film form with a die. The method of extrusion while shaping is preferable.
다이로부터 압출된 필름을 냉각하여 시트화하는 방법으로서는 닙 롤 방식, 정전 인가 방식, 에어나이프 방식, 캘린더 방식, 편면 벨트 방식, 양면 벨트 방식, 3축 롤 방식 등을 들 수 있지만, 광학 변형이 적은 시트를 제조하기 위해서는 편면 벨트식, 그 중에서도 슬리브식이라 불리는 시트 제조 장치, 정전 인가 방식 등이 바람직하게 사용된다. 예를 들면, 다이의 토출구 하측에 경면 롤과 금속 벨트가 배치되고, 상기 경면 롤과 평행하게 배열되도록 박리 롤이 배치되어 있는 필름 제조 장치를 들 수 있다. 상기 금속 벨트는 그의 내면에 접하도록 설치된 2개의 유지 롤에 의해 장력이 작용된 상태로 유지되어 있다. 토출구로부터 토출된 수지는 상기 경면 롤과 금속 벨트 사이를 통과하여 협압(挾壓)되고, 경면 롤에 전사되어 냉각된 후, 박리 롤에 의해 박리되어 필름화된다. 또한, 토출되는 필름의 양쪽 단부의 위치에서, 다이의 토출구 하측의 경면 롤에 서로 대향하도록 배치한 대전 전극으로부터, 필름을 경면 롤측에 부착시킴으로써, 광학 변형을 주지 않고 필름의 표면성을 양호하게 하는 방법 등도 바람직한 방법이다.Examples of a method of cooling and sheeting the film extruded from the die include a nip roll method, an electrostatic application method, an air knife method, a calender method, a single side belt method, a double side belt method, and a triaxial roll method. In order to manufacture a sheet | seat, a single-sided belt type, the sheet manufacturing apparatus called a sleeve type especially, an electrostatic application system, etc. are used preferably. For example, the film manufacturing apparatus in which a mirror surface roll and a metal belt are arrange | positioned under the discharge port of a die | dye, and the peeling roll is arrange | positioned so that it may be arranged in parallel with the said mirror surface roll is mentioned. The metal belt is held in a tensioned state by two retaining rolls provided in contact with the inner surface thereof. The resin discharged from the discharge port is pinched by passing between the mirror surface roll and the metal belt, transferred to the mirror surface roll, cooled, and then peeled by a peeling roll to form a film. Moreover, by attaching a film to the mirror surface roll side from the charging electrode arrange | positioned so that it may oppose each other to the mirror surface roll below the discharge port of die | dye at the position of the both ends of the film discharged, in order to improve the surface property of a film without giving optical deformation. The method and the like are also preferable methods.
압출기로서는 단축, 2축, 유성식, 코-니더 등 어느 하나를 사용할 수 있지 만, 바람직하게는 단축 압출기가 이용된다. 또한, 압출기의 스크류 형상으로서는, 벤트형, 서브 플라이트형, 선단 덜메이지형, 풀 플라이트형 등, 압축비가 큰 것, 작은 것, 압축부의 길이가 긴 완만 압축, 길이가 짧은 급압축 타입 등을 들 수 있지만, 산소의 혼입과 압출기 내부에서의 전단 발열에 의해 수지 중에 겔이 발생하기 쉬워진다. 이 겔이 필름 중의 피쉬 아이라 불리는 점상 결함이나 그을음의 원인이 되기 때문에, 산소의 용해를 억제할 수 있고, 전단 발열을 억제할 수 있는 플라이트 형상·압축 타입의 것이 바람직하고, 바람직한 압축비는 1.5 내지 4.5, 특히 바람직하게는 1.8 내지 3.6이다. 수지의 계량에 사용되는 기어 펌프는 내부 윤활식, 외부 윤활식 모두를 사용할 수 있지만, 그 중에서도 외부 윤활 방식이 바람직하다.As the extruder, any one of single screw, twin screw, planetary type, co-kneader and the like can be used, but preferably, a single screw extruder is used. Examples of the screw shape of the extruder include a vent type, a sub-flight type, a tip less-magnet type, a full flight type, a large compression ratio, a small one, a slow compression of a long compression section, a short compression compression type, and the like. However, gels tend to be generated in the resin due to the mixing of oxygen and the shear heat generation inside the extruder. Since this gel causes a point defect or soot called fish eye in the film, it is preferable that it is of a flight shape / compression type that can suppress dissolution of oxygen and can suppress shear heat generation, and a preferable compression ratio is 1.5 to 4.5. And particularly preferably 1.8 to 3.6. As the gear pump used for the metering of the resin, both an internal lubrication type and an external lubrication type can be used.
이물질의 여과에 사용하는 필터에 관해서는 리프 디스크 타입, 캔들 필터 타입, 리프 타입, 스크린 메쉬 등을 들 수 있다. 그 중에서도 수지의 체류 시간 분포를 작게 할 목적으로는 리프 디스크 타입이 가장 바람직하고, 필터의 메쉬를 의미하는 공칭 메쉬는 20 ㎛ 이하, 바람직하게는 10 ㎛ 이하, 더욱 바람직하게는 5 ㎛ 이하인 것이다. 가장 바람직하게는 3 ㎛ 이하이다. 공칭 메쉬가 20 ㎛보다 큰 경우에는 눈에 보이는 이물질 외에 겔 등을 제거하는 것이 어렵기 때문에, 광학 필름을 만들기 위한 필터로서는 바람직하지 않다.As a filter used for filtration of a foreign material, a leaf disc type, a candle filter type, a leaf type, a screen mesh, etc. are mentioned. Among them, the leaf disc type is most preferred for the purpose of reducing the residence time distribution of the resin, and the nominal mesh that means the filter mesh is 20 µm or less, preferably 10 µm or less, and more preferably 5 µm or less. Most preferably it is 3 micrometers or less. If the nominal mesh is larger than 20 µm, it is difficult to remove the gel or the like in addition to the visible foreign matter, which is not preferable as a filter for making an optical film.
다이로서는 다이 내부의 수지 유동을 균일하게 하는 것이 필수적이고, 필름의 두께 균일성을 유지하기 위해서는 다이 출구 근방에서의 다이 내부의 압력 분포가 폭 방향에서 일정한 것이 필수적이다. 이러한 조건을 만족시키는 것으로서는, 매니폴드 다이, 피쉬 테일 다이, 코트 행거 다이 등을 사용할 수 있고, 이들 중에서는 코트 행거 다이가 바람직하다. 또한, 다이의 유량 조정에는 벤딩 립 타입이 바람직하다. 또한, 히트 볼트 방식에 의한 자동 제어에 의해 두께 조정을 행하는 기능이 있는 다이가 특히 바람직하다. 유량 조정을 위해 초크바를 부착하는 것이나, 두께 조정을 위한 립 블록을 부착하는 것은 부착 부분에 단차를 생기게 하거나, 부착 부분의 간극 등에 공기 등을 끌어들이거나 하여 그을음의 발생 원인이 되거나, 다이 라인의 원인이 될 수 있기 때문에 바람직하지 않다. 다이의 토출구는 텅스텐 카바이드 등의 초경질 코팅 등의 코팅이 제공되어 있는 것이 바람직하다. 또한, 다이의 재질로서는 SCM계 강철, SUS 등의 스테인레스재 등을 들 수 있지만, 이들에 한정되는 것은 아니다. 또한, 표면에 크롬, 니켈, 티탄 등의 도금이 실시된 것, PVD(Physical Vapor Deposition)법 등에 의해 TiN, TiAlN, TiC, CrN, DLC(다이아몬드상 카본) 등의 피막이 형성된 것, 그 밖의 세라믹이 용사된 것, 표면이 질화 처리된 것 등을 이용할 수 있다. 이러한 다이는 표면 경도가 높고 수지와의 마찰이 작기 때문에, 얻어지는 투명 수지 시트에 그을음 찌꺼기 등이 혼입되는 것을 방지할 수 있는 동시에, 다이 라인이 발생하는 것을 방지할 수 있는 점에서 바람직하다.As the die, it is essential to make the resin flow inside the die uniform, and in order to maintain film uniformity in the die, it is essential that the pressure distribution inside the die near the die outlet is constant in the width direction. As satisfying these conditions, a manifold die, a fish tail die, a coat hanger die, etc. can be used, Among these, a coat hanger die is preferable. In addition, a bending lip type is preferable for adjusting the flow rate of the die. Moreover, the die | dye with the function which performs thickness adjustment by the automatic control by a heat bolt system is especially preferable. Attaching the choke bar for adjusting the flow rate or attaching the lip block for adjusting the thickness may cause a step in the attachment part, draw air or the like into the gap between the attachment parts, or cause soot, It is not desirable because it can cause. The discharge port of the die is preferably provided with a coating such as an ultrahard coating such as tungsten carbide. In addition, as a material of a die, stainless materials, such as SCM type steel and SUS, etc. are mentioned, It is not limited to these. In addition, the surface is coated with chromium, nickel, titanium, etc., a film such as TiN, TiAlN, TiC, CrN, DLC (diamond-like carbon) is formed by PVD (Physical Vapor Deposition) method, or other ceramics. The thermal sprayed, the nitrided surface, etc. can be used. Since such a die has high surface hardness and low friction with the resin, it is preferable in that the soot dregs and the like can be prevented from being mixed in the transparent resin sheet obtained, and the die line can be prevented from occurring.
경면 롤은 내부에 가열 수단 및 냉각 수단을 갖는 것이 바람직하고, 그의 표면 조도는 0.5 ㎛ 이하, 특히 0.3 ㎛ 이하인 것이 바람직하다. 경면 롤로서는, 금속 롤에 도금이 실시된 것을 사용하는 것이 바람직하고, 크롬 도금, 무전해 니켈 도금 등이 실시된 것이 특히 바람직하다.It is preferable that a mirror roll has a heating means and a cooling means inside, and its surface roughness is 0.5 micrometer or less, especially 0.3 micrometer or less. It is preferable to use what was plated by the metal roll as a mirror surface roll, and what carried out chromium plating, electroless nickel plating, etc. is especially preferable.
경면 롤의 가열 방법은 쟈켓식 오일 온도 조절 방식이나 유전 가열 방식 등이 바람직한 방법으로서 이용된다. 롤의 가열 방법은 특별히 한정되지 않지만, 롤의 온도가 필름 제막 범위에서, 온도차가 없는 것이 바람직하고, 허용되는 롤의 폭 방향의 온도차는 바람직하게는 2 ℃ 이내, 더욱 바람직하게는 1 ℃ 이내이다.As for the heating method of a mirror surface roll, a jacket type oil temperature control system, a dielectric heating system, etc. are used as a preferable method. Although the heating method of a roll is not specifically limited, It is preferable that the temperature of a roll does not have a temperature difference in the film film forming range, and the temperature difference of the width direction of an acceptable roll is preferably within 2 degreeC, More preferably, it is within 1 degreeC. .
편면 벨트식 장치나 슬리브식 인취 장치에 사용하는 금속 벨트로서는 이음매가 없는 엔드리스 벨트를 이용하는 것이 바람직하다. 금속 벨트를 구성하는 재료로서는 스테인레스, 니켈 등을 이용할 수 있다. 또한, 금속 벨트를 유지하는 유지 롤은 그의 표면이 실리콘 고무, 또한 그 밖의 내열성을 갖는 엘라스토머 등에 의해 피복되어 있는 것이 바람직하다. 금속 벨트의 두께는 0.1 내지 0.4 ㎜가 바람직하고, 0.1 ㎜ 미만이면, 굴곡이 커서 벨트에 금새 흠집이 생길 수 있어 바람직하지 않다. 한편, 0.4 ㎜보다 두꺼우면, 가공시에 필름에 추종하여 변형되지 않기 때문에 바람직하지 않다.It is preferable to use a seamless endless belt as the metal belt used for the single-sided belt type device and the sleeve type take-out device. Stainless, nickel, etc. can be used as a material which comprises a metal belt. Moreover, it is preferable that the holding roll which hold | maintains a metal belt is coat | covered with the silicone rubber, the elastomer which has other heat resistance, etc. on the surface. The thickness of the metal belt is preferably 0.1 to 0.4 mm. If the thickness of the metal belt is less than 0.1 mm, the bending is large, which may cause scratches on the belt, which is not preferable. On the other hand, when it is thicker than 0.4 mm, since it does not follow the film and deform | transforms at the time of processing, it is unpreferable.
상기 장치에 의해 예를 들면 다음과 같이 하여 필름이 제조된다.By the said apparatus, a film is manufactured as follows, for example.
압출기 실린더는 용융 압출 중에 수지가 산화되어 겔 등이 발생하는 것을 방지하기 위해 질소나 아르곤 등의 불활성 가스에 의해 밀봉하는 것이 바람직하다.The extruder cylinder is preferably sealed with an inert gas such as nitrogen or argon in order to prevent the resin from being oxidized during generation of melt extrusion and gel.
압출기에 의해 용융된 환상 올레핀계 수지는 다이 토출구로부터 수직 방향인 하측을 향해 시트상으로 압출된다. 다이 출구의 온도 분포는 수지의 용융 점도차를 적게 하기 위해 바람직하게는 ±1 ℃ 이하로 제어된다.The cyclic olefin resin melted by the extruder is extruded in a sheet form from the die discharge port toward the lower side in the vertical direction. The temperature distribution at the die outlet is preferably controlled to ± 1 ° C. or less in order to reduce the melt viscosity difference of the resin.
그 후, 압출된 수지가 경면 롤과 금속 벨트에 의해 협압되고, 냉각된다. 그리고, 경면 롤 표면에 전사된 수지가 박리용 롤에 의해 경면 롤의 표면으로부터 박 리됨으로써 시트상의 필름이 제조된다.Then, the extruded resin is pinched by the mirror roll and the metal belt, and cooled. And the sheet-like film is manufactured by peeling resin transferred to the mirror surface roll surface from the surface of a mirror surface roll by the peeling roll.
본 발명에서는 수지의 가공 온도, 즉 압출기 및 다이의 설정 온도는 유동성이 균일한 용융 상태의 수지를 다이로부터 토출시킬 수 있고, 수지의 열화를 억제할 수 있는 측면에서, 수지의 Tg+100 ℃ 이상이고 Tg+200 ℃ 이하인 것이 바람직하다.In the present invention, the processing temperature of the resin, that is, the set temperatures of the extruder and the die, is Tg + 100 ° C. or higher of the resin and Tg + 200 in terms of being able to discharge the resin in a molten state having a uniform fluidity from the die and suppressing the deterioration of the resin. It is preferable that it is degrees C or less.
또한, 경면 롤과 금속 벨트에 의해 수지를 협압할 때, 즉 경면 롤에 수지를 전사할 때의 압력은 바람직하게는 면압으로 0.01 내지 0.8 MPa, 특히 바람직하게는 0.1 내지 0.6 MPa이다. 특히 바람직하게는 0.15 내지 0.45 MPa이다. Further, the pressure when the resin is pinched by the mirror surface roll and the metal belt, that is, when the resin is transferred to the mirror surface roll, is preferably 0.01 to 0.8 MPa, particularly preferably 0.1 to 0.6 MPa, in terms of surface pressure. Especially preferably, it is 0.15 to 0.45 MPa.
이 때, 경면 롤과 금속 벨트의 원주 속도를 근접시키는 것이 바람직하다. 바람직한 범위로서는, 경면 롤의 원주 속도를 1.00으로 했을 때에, 금속 벨트의 원주 속도는 0.95 내지 1.05, 특히 바람직하게는 0.99 내지 1.01이다. At this time, it is preferable to make the circumferential speed of a mirror surface roll and a metal belt approach. As a preferable range, when the circumferential speed of a mirror surface roll is set to 1.00, the circumferential speed of a metal belt is 0.95-1.05, Especially preferably, it is 0.99-1.01.
또한, 필름 박리시의 조건으로서, 박리 온도 Tt(℃), 박리 응력 TF(MPa)로 할 때, 각각 Tg-30 ℃≤Tt≤Tg+5 ℃, 0.01 MPa≤TF≤5 MPa의 범위인 것이 바람직하다. Furthermore, as conditions at the time of film peeling, a peeling temperature T t (℃), when a peeling stress T F (MPa), respectively, Tg-30 ℃ ≤T t ≤Tg + 5 ℃, 0.01 MPa≤T F range of ≤5 MPa Is preferably.
여기서, 냉각 롤인 경면 롤의 온도는 통상 Tg-80 내지 Tg+10 ℃, 바람직하게는 Tg-60 내지 Tg-2 ℃이다.Here, the temperature of the mirror surface roll which is a cooling roll is Tg-80-Tg + 10 degreeC normally, Preferably it is Tg-60-Tg-2 degreeC.
본 발명의 다이의 유로의 수평 부분은 다이의 출구의 선단 부분과 부딪히는 데, 이 선단의 수평 부분을 다이랜드라 칭한다. 다이랜드의 길이는 10 내지 50 mm이고, 바람직하게는 11 내지 40 mm이다. The horizontal portion of the flow path of the die of the present invention collides with the tip portion of the outlet of the die, which is called a die land. The length of the die land is 10 to 50 mm, preferably 11 to 40 mm.
<필름 연신 가공><Film stretching processing>
본 발명의 광학 필름은 상기와 같이 하여 얻어지는 광학 필름을 추가로 연신할 수도 있다. 이 경우의 연신 가공 방법으로서는, 구체적으로는 공지된 1축 연신법 또는 2축 연신법을 들 수 있다. 즉, 텐터법에 의한 가로 1축 연신법, 롤간 압축 연신법, 원주가 다른 2쌍의 롤을 이용하는 세로 1축 연신법 등, 또는 가로 1축과 세로 1축을 조합한 2축 연신법, 인플레이션법에 의한 연신법 등을 이용할 수 있다.The optical film of this invention can also extend | stretch the optical film obtained by making it above. As a stretching process method in this case, a well-known uniaxial stretching method or the biaxial stretching method is mentioned specifically ,. In other words, the uniaxial stretching method by the tenter method, the compression stretching method between rolls, the longitudinal monoaxial stretching method using two pairs of rolls with different circumferences, or the biaxial stretching method in which the horizontal single axis and the longitudinal single axis are combined, and the inflation method The stretching method by and the like can be used.
1축 연신법의 경우, 연신 속도는 통상적으로는 1 내지 5,000%/분이고, 바람직하게는 50 내지 1,000%/분이고, 더욱 바람직하게는 100 내지 1,000%/분이고, 특히 바람직하게는 100 내지 500%/분이다.In the case of the uniaxial stretching method, the stretching speed is usually 1 to 5,000% / min, preferably 50 to 1,000% / min, more preferably 100 to 1,000% / min, particularly preferably 100 to 500% / Minutes.
2축 연신법의 경우, 동시 2 방향으로 연신을 행하는 경우나 1축 연신 후에 최초의 연신 방향과 다른 방향으로 연신 처리하는 경우가 있다. 이 때, 연신 후의 필름의 굴절률 타원체의 형상을 제어하기 위한 2개의 연신축의 교차 각도는 원하는 특성에 따라 결정되기 때문에 특별히 한정은 되지 않지만, 통상적으로는 120 내지 60도 범위이다. 또한, 연신 속도는 각 연신 방향에서 동일할 수도 있고, 상이할 수도 있으며, 통상적으로는 1 내지 5,000%/분이고, 바람직하게는 50 내지 1,000%/분이고, 더욱 바람직하게는 100 내지 1,000%/분이며, 특히 바람직하게는 100 내지 500%/분이다.In the biaxial stretching method, stretching may be performed in two directions at the same time, or stretching may be performed in a direction different from the initial stretching direction after uniaxial stretching. At this time, the crossing angle of the two stretching axes for controlling the shape of the refractive index ellipsoid of the film after stretching is not particularly limited because it is determined according to desired characteristics, but is usually in the range of 120 to 60 degrees. In addition, the stretching speed may be the same or different in each stretching direction, and is usually 1 to 5,000% / min, preferably 50 to 1,000% / min, more preferably 100 to 1,000% / min. And particularly preferably 100 to 500% / min.
연신 가공 온도는 특별히 한정되는 것은 아니지만, 본 발명의 수지의 유리 전이 온도 Tg를 기준으로 하여 통상적으로는 Tg±30 ℃, 바람직하게는 Tg±15 ℃, 더욱 바람직하게는 Tg-5 ℃ 내지 Tg+15 ℃ 범위이다. 상기 범위 내로 함으로써, 위상차 불균일의 발생을 억제하는 것이 가능해지고, 또한 굴절률 타원체의 제어가 용이해지는 점에서 바람직하다.Although the stretching processing temperature is not particularly limited, it is usually Tg ± 30 ° C, preferably Tg ± 15 ° C, more preferably Tg-5 ° C to Tg + 15 ° C based on the glass transition temperature Tg of the resin of the present invention. Range. By setting it in the said range, it becomes possible to suppress generation | occurrence | production of phase difference nonuniformity, and it is preferable at the point which becomes easy to control the refractive index ellipsoid.
연신 배율은 원하는 특성에 따라 결정되기 때문에 특별히 한정은 되지 않지만, 통상적으로는 1.01 내지 10배, 바람직하게는 1.03 내지 5배, 더욱 바람직하게는 1.03 내지 3배이다. 연신 배율이 10배 이상이면, 위상차의 제어가 곤란해지는 경우가 있다.The draw ratio is not particularly limited because it is determined according to desired characteristics, but is usually 1.01 to 10 times, preferably 1.03 to 5 times, and more preferably 1.03 to 3 times. If the draw ratio is 10 times or more, the control of the phase difference may be difficult.
연신한 필름은 그대로 냉각할 수 있지만, Tg-20 ℃ 내지 Tg의 온도 분위기 하에 적어도 10초 이상, 바람직하게는 30초 내지 60분간, 더욱 바람직하게는 1분 내지 60분간 유지하여 열 고정하는 것이 바람직하다. 이에 따라, 투과광의 위상차의 경시 변화가 적어 안정된 위상차 필름이 얻어진다.Although the stretched film can be cooled as it is, it is preferable to heat-fix and hold at least 10 seconds or more, preferably 30 seconds to 60 minutes, more preferably 1 minute to 60 minutes under a temperature atmosphere of Tg-20 ° C to Tg. Do. Thereby, the time-dependent change of the phase difference of transmitted light is small, and a stable phase difference film is obtained.
연신 가공을 실시하지 않는 경우의 본 발명의 광학용 필름의 가열에 의한 치수 수축률은 100 ℃에서의 가열을 500 시간 행한 경우에, 통상 5% 이하, 바람직하게는 3% 이하, 더욱 바람직하게는 1% 이하, 특히 바람직하게는 0.5% 이하이다. The dimensional shrinkage rate by heating of the optical film of the present invention when not stretching is usually 5% or less, preferably 3% or less, more preferably 1 when heating at 100 ° C. is performed for 500 hours. % Or less, Especially preferably, it is 0.5% or less.
또한, 본 발명의 위상차 필름의 가열에 의한 치수 수축률은 100 ℃에서의 가열을 500 시간 행한 경우, 통상 10% 이하, 바람직하게는 5% 이하, 더욱 바람직하게는 3% 이하, 특히 바람직하게는 1% 이하이다. Moreover, when the dimensional shrinkage rate by heating of the retardation film of this invention is performed at 100 degreeC for 500 hours, it is 10% or less normally, Preferably it is 5% or less, More preferably, it is 3% or less, Especially preferably, 1 It is% or less.
치수 수축률을 상기 범위 내로 하기 위해서는 본 발명의 수지의 원료인 단량체 A, B의 선택에 더하여, 캐스팅 방법이나 연신 방법에 의해 컨트롤하는 것이 가능하다. In order to make a dimensional shrinkage rate into the said range, in addition to selection of monomers A and B which are raw materials of resin of this invention, it can control by a casting method or an extending method.
상기와 같이 하여 연신한 필름은 연신에 의해 분자가 배향하여 투과광에 위상차를 제공하게 되는데, 이 위상차는 연신 배율, 연신 온도 또는 필름의 두께 등에 의해 제어할 수 있다. 예를 들면, 연신 전의 필름의 두께가 동일한 경우, 연신 배율이 큰 필름일수록 투과광의 위상차의 절대치가 커지는 경향이 있기 때문에, 연신 배율을 변경함으로써 원하는 위상차를 투과광에 제공하는 위상차 필름을 얻을 수 있다. 한편, 연신 배율이 동일한 경우, 연신 전의 필름의 두께가 두꺼울수록 투과광의 위상차의 절대치가 커지는 경향이 있기 때문에, 연신 전의 필름의 두께를 변경함으로써 원하는 위상차를 투과광에 제공하는 위상차 필름을 얻을 수 있다. 또한, 상기 연신 가공 온도 범위에서는 연신 온도가 낮을수록 투과광의 위상차의 절대치가 커지는 경향이 있기 때문에, 연신 온도를 변경함으로써 원하는 위상차를 투과광에 제공하는 위상차 필름을 얻을 수 있다. In the stretched film as described above, molecules are oriented by stretching to provide a phase difference to the transmitted light, and the phase difference can be controlled by the stretching ratio, the stretching temperature or the thickness of the film. For example, when the film thickness before extending | stretching is the same, since the absolute value of the phase difference of transmitted light tends to become large, the film with a big draw ratio is large, and by changing a draw ratio, the retardation film which provides a desired phase difference to transmitted light can be obtained. On the other hand, when the draw ratio is the same, since the absolute value of the phase difference of transmitted light tends to become large as the thickness of the film before extending | stretching is thick, the phase difference film which provides a desired phase difference to transmitted light can be obtained by changing the thickness of the film before extending | stretching. In addition, since the absolute value of the phase difference of transmitted light tends to become large in the above drawing process temperature range, the retardation film which provides a desired phase difference to transmitted light by changing extending | stretching temperature can be obtained.
상기와 같이 연신하여 얻은 위상차 필름의 두께는 통상 100 ㎛ 이하, 바람직하게는 100 내지 20 ㎛, 더욱 바람직하게는 80 내지 20 ㎛이다. 두께를 얇게 함으로써 위상차 필름이 사용되는 분야의 제품에 요구되는 소형화, 박막화에 크게 부응할 수 있다. 여기서, 위상차 필름의 두께를 컨트롤하기 위해서는, 연신 전의 광학 필름의 두께를 컨트롤하거나 연신 배율을 컨트롤함으로써 할 수 있다. 예를 들면, 연신 전의 광학 필름을 얇게 하거나, 연신 배율을 비교적 크게 함으로써 위상차 필름의 두께를 한층 더 얇게 할 수 있다.The thickness of the retardation film obtained by extending | stretching as mentioned above is 100 micrometers or less normally, Preferably it is 100-20 micrometers, More preferably, it is 80-20 micrometers. By making thickness thin, it can respond largely to the miniaturization and thin film required for the product of the field | area where retardation film is used. Here, in order to control the thickness of retardation film, it can control by controlling the thickness of an optical film before extending | stretching, or controlling a draw ratio. For example, the thickness of the retardation film can be further thinned by making the optical film before stretching thin or by increasing the draw ratio relatively.
<필름 특성><Film characteristics>
이상과 같이 하여 얻어지는 본 발명의 광학 필름(용융 압출 필름, 연신 필 름)은 필름 표면에서의 직경 30 ㎛ 이상의 점상 결함이 3개/m2 이하, 바람직하게는 1개/m2 이하인 것을 특징으로 한다. 점상 결함이란, 필름 표면에 존재하는 점상 또는 대략 원형상의 요철을 말하며, 상기 결함의 원인의 하나로서는 수지 중에 존재하는 겔 등의 이물질에 의한 것을 들 수 있다. 상기 점상 결함은 광학 불균일의 큰 원인이 된다.The optical film (melt-extruded film, stretched film) of the present invention obtained as described above has a point defect of 30 µm or more in diameter on the surface of the film of 3 / m 2 or less, preferably 1 / m 2 or less. do. The point defect refers to a point or substantially circular irregularities existing on the surface of the film, and one of the causes of the defects includes a foreign substance such as a gel present in the resin. The said point defect becomes a big cause of optical nonuniformity.
또한, 본 발명의 연신된 광학 필름은 표면 평활성이 우수하기 때문에, ASTM D1003에 준하여 측정한 두께가 3 mm에서의 헤이즈값이 1% 이하, 바람직하게는 0.8% 이하이다. Moreover, since the stretched optical film of this invention is excellent in surface smoothness, the haze value in 3 mm of thickness measured according to ASTMD1003 is 1% or less, Preferably it is 0.8% or less.
또한, 필름의 평균 조도 Ra는 0.2 ㎛ 이하, 바람직하게는 0.15 ㎛ 이하, 더욱 바람직하게는 0.1 ㎛ 이하이다. Moreover, average roughness Ra of a film is 0.2 micrometer or less, Preferably it is 0.15 micrometer or less, More preferably, it is 0.1 micrometer or less.
<<편광판>><< polarizing plate >>
본 발명의 편광판은 PVA계 필름 등을 포함하는 편광자의 적어도 한쪽 면에, 본 발명의 광학 필름을, PVA 수지를 주체로 한 수용액을 포함하는 수계 접착제, 극성기 함유 점접착제, 광 경화성 접착제 등을 사용하여 접합하고, 필요에 따라 이것을 가열 또는 노광하고, 압착하여 편광자와 광학 필름을 접착(적층)시킴으로써 제조할 수 있다.The polarizing plate of this invention uses the water-based adhesive agent, polar group containing adhesive agent, a photocurable adhesive agent, etc. which contain the aqueous solution which mainly uses PVA resin for the optical film of this invention on at least one surface of the polarizer containing a PVA system film etc. It can be manufactured by bonding together, and heating or exposing this as needed, crimping | bonding, and bonding (laminating) a polarizer and an optical film as needed.
<<액정 패널>><< liquid crystal panel >>
본 발명의 액정 패널은 2장의 유리 기판 사이에 액정이 협지되어 이루어지는 액정 표시 소자의 적어도 한쪽 면에 본 발명의 편광판을 접합하고, 액정 표시 소자 와 편광판을 접착(적층)시킴으로써 제조할 수 있다. The liquid crystal panel of this invention can be manufactured by bonding the polarizing plate of this invention to at least one surface of the liquid crystal display element by which a liquid crystal is clamped between two glass substrates, and bonding (laminating) a liquid crystal display element and a polarizing plate.
<실시예><Example>
이하, 본 발명의 구체적인 실시예에 대하여 설명하지만, 본 발명은 이들 실시예에 한정되는 것은 아니다. 한편, 이하에 있어서, "부", "%"는 특별히 언급하지 않는 한 "중량부", "중량%"를 의미한다.Hereinafter, although the specific Example of this invention is described, this invention is not limited to these Examples. In addition, below, "part" and "%" mean "weight part" and "weight%" unless there is particular notice.
또한, 이하의 실시예에 있어서, 각종 평가는 하기 방법에 의해 측정하였다. In addition, in the following example, various evaluation was measured by the following method.
[유리 전이 온도(Tg)][Glass Transition Temperature (Tg)]
세이코 인스투르먼츠사 제조의 시차 주사 열량계(DSC)를 이용하여, 질소 분위기에서 승온 속도가 20 ℃/분인 조건으로 유리 전이 온도를 측정하였다.Using a differential scanning calorimeter (DSC) manufactured by Seiko Instruments Co., Ltd., the glass transition temperature was measured under a condition that the temperature increase rate was 20 ° C / min in a nitrogen atmosphere.
[점상 결함 측정][Point Defect Measurement]
광학 필름을 10 m2 감아내어 검은 종이 위에 두고, 100 w의 형광등 하에서 반사광의 흔들림을 확인하였다. 반사광이 흔들리는 곳을 점상 결함으로 하여, 그 부분을 마킹하였다. 그 후, 50배의 광학 현미경으로 필름 표면을 관찰하고, 직경 30 ㎛ 이상의 점상 결함 개수를 세었다.The optical film was wound up 10 m 2 and placed on black paper, and the shaking of the reflected light was confirmed under a fluorescent lamp of 100 w. The part which marked the place where the reflection light shakes was a point defect. Thereafter, the surface of the film was observed with a 50x optical microscope, and the number of point defects having a diameter of 30 µm or more was counted.
[전체 광선 투과율, 헤이즈][Total light transmittance, haze]
무라카미 시끼사이 기쥬쯔 겡뀨쇼 제조의 헤이즈미터 "HM-150형"을 이용하여 전체 광선 투과율 및 헤이즈를 측정하였다.The total light transmittance and the haze were measured using a haze meter "HM-150" manufactured by Murakami Shikisai Kijutsu Co., Ltd.
[투과광의 면내 위상차(R0)][In-plane Phase Difference (R0) of Transmitted Light]
오지 게이소꾸 기키(주) 제조의 "KOBRA-21ADH"를 이용하여, 필름에 수직으로 광이 입사되었을 때의 면내 위상차(R0)를 파장 550 ㎚에서 측정하였다. Using "KOBRA-21ADH" manufactured by Oji Keisoku Kiki Co., Ltd., the in-plane retardation R0 when light was incident perpendicularly to the film was measured at a wavelength of 550 nm.
[편광판의 투과율 및 편광도][Transmittance and Polarization Degree of Polarizing Plate]
오쓰카 덴시(주) 제조의 "RETS"를 이용하여, 편광판의 투과율 및 편광도를 측정하였다. 측정 파장은 550 ㎚로 하였다.The transmittance and polarization degree of the polarizing plate were measured using "RETS" manufactured by Otsuka Denshi Co., Ltd. The measurement wavelength was 550 nm.
[필름 두께 분포][Film thickness distribution]
필름 두께 분포 측정 장치(MOCON)를 사용하여 필름 길이 방향으로 측정하였다.It measured in the film longitudinal direction using the film thickness distribution measuring apparatus (MOCON).
<제조예 1><Manufacture example 1>
아크릴산부틸 94.8부, 아크릴산 5부, 2-히드록시에틸메타크릴레이트 0.2부를 포함하고, 중량 평균 분자량(Mw) 120만, 중량 평균 분자량과 수 평균 분자량(Mn)의 비(Mw/Mn) 3.9의 아크릴계 중합체의 아세트산에틸 용액에 톨루엔을 가하여 희석하여 상기 아크릴계 중합체의 13%의 톨루엔 용액으로 하고, 이소시아네이트 가교제[콜로네이트 L(닛본 폴리우레탄사 제조)] 2.0부를 첨가하여 교반한 용액을 이형 필름 상에 도포하고, 발포하지 않도록 60 ℃×5분간, 100 ℃×5분간의 2 단계로 건조시킨 후, 추가로 경박리 타입의 이형 필름을 점착제면에 라미네이트 임시 고정하여, 건조 후의 점착제 두께(평균치)가 25 ㎛인 논서포트 필름을 제조하였다. 94.8 parts of butyl acrylate, 5 parts of acrylic acid, and 0.2 parts of 2-hydroxyethyl methacrylate, and the weight average molecular weight (Mw) of 1.2 million, the ratio of the weight average molecular weight and the number average molecular weight (Mn) (Mw / Mn) of 3.9 Toluene was added to the ethyl acetate solution of the acrylic polymer and diluted to obtain a 13% toluene solution of the acrylic polymer, and 2.0 parts of an isocyanate crosslinking agent (Colonate L (manufactured by Nippon Polyurethane Co., Ltd.)) was added thereto, followed by stirring. After apply | coating and drying in two steps of 100 degreeC * 5 minutes, 60 degreeC * 5 minutes, it prevents foaming, and further, the light peeling type release film is temporarily fixed to the adhesive surface, and the adhesive thickness (average value) after drying A non-support film of 25 μm was prepared.
[실시예 1]Example 1
수지로서, 환상 올레핀계 수지(JSR 가부시끼가이샤 제조: 상품명 "ARTON D4531", 유리 전이 온도 130 ℃)를 이용한 800 kg의 콘테이너에 봉입한 수지 펠릿을, 산소 농도 0.1 ppm의 질소 200 l/분을 이용하여 질소 순환식 건조기(닛스이 가 코 가부시끼가이샤 제조: 형번 NS-200)에 수송하고, 질소 분위기하에 건조 온도 100 ℃에서 180분간의 제습 건조를 행하였다. 그 후, 상기 수지를 산소 농도 0.1 ppm의 질소 200 l/분을 이용하여 압출기(지엠 엔지니어링사 제조: GM-90)에 유도하고, 260 ℃에서 용융하고, 기어 펌프를 이용하여 일정량으로 송액하고, 5 ㎛ 리프 디스크 필터를 이용하여 이물질을 제거하고, 250 ℃로 설정한 알루미늄 주물 히터에 의해 가열된 T 다이로부터 압출을 실시하였다. 이 때의 T 다이의 개구는 0.5 mm이고, T 다이 출구와 냉각 롤의 필름의 압착점 간의 거리는 65 mm로 하여, 250 mmφ의 냉각 롤에 압착시켰다. 냉각 롤의 온도는 120 ℃로 하고, 그 하류측에 250 mmφ의 냉각 롤 (2)를, 추가로 하류측에 250 mmφ의 박리 롤을 설치하였다. 각각의 롤의 온도를 115 ℃, 110 ℃로 하고, 필름 표면 온도 108 ℃에서 박리 롤로부터 막 두께 100 ㎛의 필름을 박리시켜 노르보르넨계 수지 필름을 얻었다. As a resin, a resin pellet enclosed in an 800 kg container using cyclic olefin resin (manufactured by JSR Co., Ltd .: trade name "ARTON D4531", glass transition temperature of 130 ° C) was subjected to 200 l / min of nitrogen at an oxygen concentration of 0.1 ppm. It transported to the nitrogen circulation type | mold dryer (made by Nissuga Co., Ltd. model number NS-200), and dehumidified drying for 180 minutes was performed at 100 degreeC of drying temperature in nitrogen atmosphere. Thereafter, the resin was introduced to an extruder (GM-manufactured by GM Engineering: GM-90) using 200 l / min of nitrogen at an oxygen concentration of 0.1 ppm, melted at 260 ° C, and the liquid was fed in a fixed amount using a gear pump, The foreign matter was removed using a 5 μm leaf disc filter, and extrusion was performed from a T die heated by an aluminum casting heater set at 250 ° C. The opening of the T die at this time was 0.5 mm, the distance between the T die exit and the crimping point of the film of the cooling roll was 65 mm, and it crimp | bonded to the 250 mm diameter cooling roll. The temperature of the cooling roll was 120 degreeC, The 250 mm diameter cooling roll 2 was provided in the downstream side, and the 250 mm diameter peeling roll was further provided in the downstream side. The temperature of each roll was 115 degreeC and 110 degreeC, the film of 100 micrometers in thickness was peeled from the peeling roll at the film surface temperature of 108 degreeC, and the norbornene-type resin film was obtained.
얻어진 광학 필름의 점상 결함 개수를 확인한 결과 0.3개/m2였다. 또한, 상기 광학 필름의 전체 광선 투과율은 93%, 헤이즈는 0.2%였다.As a result of confirming the number of point defects of the obtained optical film, it was 0.3 piece / m <2> . Moreover, the total light transmittance of the said optical film was 93%, and haze was 0.2%.
[비교예 1]Comparative Example 1
콘테이너로부터 건조기로의 수송과, 건조기로부터 압출기로의 수송을 모두 공기 분위기하에서 행한 것 이외에는 실시예 1과 동일하게 하여 광학 필름 (b-1)을 얻었다. 광학 필름의 점상 결함 개수를 확인한 결과, 3.2개/m2였다. 또한, 상기 광학 필름 롤 (b-1)의 전체 광선 투과율은 93%, 헤이즈는 0.3%였다. An optical film (b-1) was obtained in the same manner as in Example 1 except that the transport from the container to the dryer and the transport from the dryer to the extruder were all performed in an air atmosphere. It was 3.2 pieces / m <2> as a result of confirming the number of point defects of an optical film. In addition, the total light transmittance of the said optical film roll (b-1) was 93%, and haze was 0.3%.
[실시예 2]Example 2
실시예 1에서 얻은 광학 필름 (a-1)을 이용하고, 130 ℃에서 롤 닙식의 세로 일축 연신기를 이용하여 1.2배로 연신한 후, 130 ℃에서 텐터식의 가로 연신기를 이용하여 1.4배로 연신하여 두께 70 ㎛의 연신된 광학 필름 (a-2)를 얻었다. 상기 광학 필름 (a-2)의 위상차는 필름면내의 위상차(R0)가 60 ㎚였다. 또한, 상기 광학 필름 (a-2)의 전체 광선 투과율은 93%, 헤이즈는 0.1%였다. Using the optical film (a-1) obtained in Example 1, stretching was carried out 1.2 times using a roll nip longitudinal uniaxial stretching machine at 130 ° C., and then stretched 1.4 times using a tenter-type transverse stretching machine at 130 ° C. A stretched optical film (a-2) of 70 mu m was obtained. Retardation (R0) in the film surface of the phase difference of the said optical film (a-2) was 60 nm. In addition, the total light transmittance of the said optical film (a-2) was 93%, and haze was 0.1%.
또한, 상기 광학 필름 (a-2)의 점상 결함수를 확인한 결과, 0.1개/m2였다. Moreover, it was 0.1 piece / m <2> when the number of point defects of the said optical film (a-2) was confirmed.
[비교예 2]Comparative Example 2
광학 필름 (b-1)을 이용한 것 이외에는 실시예 2와 동일하게 하여, 연신된 광학 필름 (b-2)를 얻었다. 본 필름의 위상차는 필름면내의 위상차(R0)가 63 ㎚였다. 또한, 전체 광선 투과율은 93%, 헤이즈는 0.2%였다. Except having used the optical film (b-1), it carried out similarly to Example 2, and obtained the stretched optical film (b-2). Retardation (R0) in the film surface of the phase difference of this film was 63 nm. Moreover, total light transmittance was 93% and haze was 0.2%.
또한, 상기 광학 필름 (b-2)의 점상 결함수를 확인한 결과, 3.5개/m2였다. Moreover, it was 3.5 pieces / m <2> when the number of point defects of the said optical film (b-2) was confirmed.
[실시예 3]Example 3
두께 50 ㎛의 폴리비닐알코올 필름을, 요오드 5 g, 요오드화칼륨 250 g, 붕산 10 g, 물 1000 g을 포함하는 40 ℃의 욕에 침지하면서 약 5분간 4배까지 일축 연신하여 편광막을 얻었다. 이 편광막의 표면에, 제조예 1에서 얻어진 점착제를 이용하여, 실시예 1에서 제조한 광학 필름 (a-1)과 실시예 2에서 제조한 광학 필름 (a-2)를 각각 편광막에 한쪽 면씩 연속하여 접착시켜 편광판 (a)를 얻었다. 이 편광판 (a)의 투과율과 편광도를 측정한 결과, 각각 43%, 99.99%였다. 또한, 상기 편광판 (a)를 2장 크로스 니콜 상태로 하여, 한쪽으로부터 휘도 10000 cd의 백 라 이트로 조사했을 때에, 다른 한쪽에서 관찰하더라도 점상 결함에 기인하는 광 누설은 전혀 확인되지 않았다. The 50-micrometer-thick polyvinyl alcohol film was uniaxially stretched by 4 times for about 5 minutes, immersing in a 40 degreeC bath containing 5 g of iodine, 250 g of potassium iodide, 10 g of boric acid, and 1000 g of water, and obtained the polarizing film. On the surface of this polarizing film, the optical film (a-1) manufactured in Example 1 and the optical film (a-2) manufactured in Example 2 were used for each side of the polarizing film using the adhesive obtained by the manufacture example 1, respectively. It was continuously bonded and obtained the polarizing plate (a). As a result of measuring the transmittance | permeability and polarization degree of this polarizing plate (a), it was 43% and 99.99%, respectively. In addition, when the said polarizing plate (a) was made into two cross nicol states, and it irradiated with the back light of luminance 10,000 cd from one side, even if it observed from the other side, the light leakage resulting from a point defect was not confirmed at all.
[비교예 3]Comparative Example 3
광학 필름 (b-2)와 (c-1)을 사용한 것 이외에는 실시예 3과 동일하게 하여 편광판 (b)를 얻었다. 이 편광판 (b)의 투과율과 편광도를 측정한 결과, 각각 42%, 99.87%였다. 또한, 상기 편광판 (b)를 광학 필름 롤 (b-2)가 내측이 되도록 하여 2장 크로스 니콜 상태로 하고, 한쪽으로부터 휘도 10000 cd의 백 라이트로 조사했을 때에, 다른 한쪽에서 관찰했을 때에 점상 결함에 기인하는 광 누설이 3.0개/m2 확인되었다.A polarizing plate (b) was obtained in the same manner as in Example 3 except that the optical films (b-2) and (c-1) were used. As a result of measuring the transmittance | permeability and polarization degree of this polarizing plate (b), it was 42% and 99.87%, respectively. Moreover, when the said polarizing plate (b) was made into two cross nicol states so that an optical film roll (b-2) may become inward, and it irradiated with the backlight of brightness 10,000 cd, from one side, it is a point defect. The light leakage attributable to was found to be 3.0 / m 2 .
본 발명의 광학 필름은 광학 필름 표면에 점상 결함이 발생하지 않고, 광학 불균일이 생기지 않는다. 따라서, 본 발명의 광학 필름 롤로부터 얻어지는 광학 필름은 예를 들면 휴대 전화, 디지털 정보 단말기, 무선 호출기, 네비게이션, 차량 탑재용 액정 디스플레이, 액정 모니터, 액정 텔레비젼, 조광 패널, OA 기기용 디스플레이, AV 기기용 디스플레이 등의 각종 액정 표시 소자나 전계 발광 표시 소자 또는 터치 패널 등에 사용할 수 있다. 또한, CD, CD-R, MD, MO, DVD 등의 광 디스크의 기록·재생 장치에 사용되는 파장판으로서도 유용하다.The optical film of this invention does not generate a point defect on the surface of an optical film, and does not produce an optical nonuniformity. Therefore, the optical film obtained from the optical film roll of this invention is a mobile phone, a digital information terminal, a wireless pager, navigation, a vehicle-mounted liquid crystal display, a liquid crystal monitor, a liquid crystal television, a light control panel, a display for OA apparatuses, AV equipment, for example. It can be used for various liquid crystal display elements such as a display for display, an electroluminescent display element or a touch panel. It is also useful as a wave plate used for recording / reproducing apparatus of optical discs such as CD, CD-R, MD, MO, DVD.
도 1은 본 발명의 광학 필름의 제조 방법에 있어서 바람직하게 이용되는 수지 펠릿 수송 경로를 나타내는 모식도이다.BRIEF DESCRIPTION OF THE DRAWINGS It is a schematic diagram which shows the resin pellet transport route used preferably in the manufacturing method of the optical film of this invention.
Claims (6)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2006-00274513 | 2006-10-05 | ||
JP2006274513A JP2008093830A (en) | 2006-10-05 | 2006-10-05 | Manufacturing method of optical film |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20080031803A true KR20080031803A (en) | 2008-04-11 |
Family
ID=39377213
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020070099805A KR20080031803A (en) | 2006-10-05 | 2007-10-04 | Process for producing an optical film |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2008093830A (en) |
KR (1) | KR20080031803A (en) |
TW (1) | TW200817166A (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6473173B2 (en) * | 2014-12-25 | 2019-02-20 | 株式会社松井製作所 | Molding material supply system and molding material supply method |
CN112469456B (en) * | 2018-07-31 | 2023-02-28 | 日本瑞翁株式会社 | Prefilled syringe and method for manufacturing prefilled syringe |
CN112469457B (en) * | 2018-07-31 | 2023-02-28 | 日本瑞翁株式会社 | Prefilled syringe and method for manufacturing prefilled syringe |
EP4098238A4 (en) * | 2020-01-28 | 2024-02-28 | Zeon Corporation | Prefilled drug package and production method for prefilled drug package |
-
2006
- 2006-10-05 JP JP2006274513A patent/JP2008093830A/en active Pending
-
2007
- 2007-09-27 TW TW096136033A patent/TW200817166A/en unknown
- 2007-10-04 KR KR1020070099805A patent/KR20080031803A/en not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
TW200817166A (en) | 2008-04-16 |
JP2008093830A (en) | 2008-04-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI391246B (en) | An optical film roll, and a method for manufacturing the same | |
JP2003043252A (en) | Protective film for polarizer | |
KR20080037537A (en) | Optical film, method of making the optical film, retardation film, polarizing plate and liquid crystal panel | |
JP2006255892A (en) | Film processing method | |
KR20080031803A (en) | Process for producing an optical film | |
JP2008101166A (en) | Optical film, method for producing the same, polarizing plate, and liquid crystal panel | |
KR20080023160A (en) | Optical film, method of making the optical film, polarizing plate and liquid crystal panel | |
JP2006224618A (en) | Film working method | |
KR100744290B1 (en) | Process for producing cycloolefin resin film or sheet | |
JP2005144771A (en) | Surface decorative film or sheet and its manufacturing method | |
KR101267672B1 (en) | Optical film, process for producing the same, polarizing plate and liquid crystal panel | |
JP2001350017A (en) | Optical retardation film | |
KR20080023159A (en) | Optical film, method of making the optical film, polarizing plate and liquid crystal panel | |
JP2008137175A (en) | Manufacturing method of optical film | |
KR20080072565A (en) | Process for producing an optical film, optical film, retardation film and polarizing plate | |
JP4691844B2 (en) | Molding material and molded product | |
KR20070121572A (en) | Optical film, method of making the same, polarizing plate and liquid crystal panel | |
JP2006188671A (en) | Film for use in optics and use thereof | |
JP2004322346A (en) | Method for manufacturing melt extrusion film | |
JP5369409B2 (en) | Optical film, manufacturing method thereof, polarizing plate and liquid crystal panel | |
JP2008058491A (en) | Optical film roll | |
JP2008216418A (en) | Method of manufacturing optical film, optical film, polarizing plate and liquid crystal panel | |
JP2008238554A (en) | Manufacturing method of optical film | |
JP2008137328A (en) | Manufacturing method of optical film | |
KR20080020533A (en) | Optical film, polarizing plate, liquid crystal panel and method of making the optical film |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |