KR20070036538A - Plasma display apparatus and making method of plasma display apparatus - Google Patents

Abstract

An object of the present invention is to add an anti-glare function to various filter functions of the plasma display device to prevent glare from external light and to provide a clearer image.

In addition, the present invention uses a spray method or a spin method when forming an anti-reflection layer or an anti-glare layer of the image filter, thereby suppressing bubble formation and improving the overall uniformity of the image filter, thereby providing a more reliable image and providing the image filter. Its purpose is to provide a process for the preparation.

The plasma display apparatus of the present invention includes an image filter and a front substrate including a front layer and an anti-glare layer formed by applying at least one of an antiglare layer for scattering light incident on an upper surface of the front substrate or an antireflection layer for suppressing reflection. It includes a rear substrate coupled with the lower surface of the.

As described above, the present invention forms the anti-glare layer and the anti-reflection layer by the coating method, so that the image of the plasma display device can be more clearly enjoyed.

Description

Plasma Display Apparatus and Making Method of Plasma Display Apparatus

1 is a diagram for explaining the structure of a plasma display device according to a first embodiment of the present invention;

FIG. 2 schematically illustrates only an image filter portion formed on a front substrate of a plasma display device according to a first embodiment of the present invention.

3 is a view for explaining an image filter according to a second embodiment of the present invention.

4 is a diagram illustrating an image filter according to a third embodiment of the present invention.

5 is a view for explaining a method of manufacturing a plasma display device according to a fourth embodiment of the present invention.

6 is a view for explaining a coating method of a manufacturing method of a plasma display device according to a fifth embodiment of the present invention.

7 is a view for explaining a method of manufacturing a plasma display device according to a sixth embodiment of the present invention.

***** Explanation of symbols for the main parts of the drawing *****

400: front substrate 410: anti-glare layer

420: antireflection layer 430: color die layer

440: electromagnetic shielding layer 450: other functional layer

The present invention relates to a plasma display device and a method for manufacturing the same, and more particularly, to a plasma display device including a video filter formed integrally with at least one of the anti-glare layer and the anti-reflection layer on an upper surface of the plasma display panel and a method of manufacturing the same. It is about.

In general, a plasma display device has a partition wall formed between a front substrate and a rear substrate of soda-lime glass and includes one unit cell, and each unit cell includes helium-xenon (He-Xe) and helium. When an inert gas such as He-Ne is discharged by a high frequency voltage, vacuum ultraviolet rays are generated to emit phosphors formed between the partition walls to implement an image.

Such a general plasma display device includes a plasma display panel and a driving device.

In general, a plasma display panel includes a front substrate and a rear substrate, and the panel is formed by adsorbing a surface on which a barrier rib is formed on the rear substrate and a surface on which an electrode and a dielectric layer are formed on the front substrate.

The plasma display apparatus is formed by attaching a plasma display panel driving apparatus to a lower surface of a rear substrate facing the front substrate and an image filter attached to an upper surface of the front substrate.

The plasma display panel and the driving device of the plasma display device generate strong leakage electromagnetic waves or near infrared rays during the operation.

In general, a plasma display device uses a powerful high frequency voltage when driving a plasma display device, and uses various functional filters to shield electromagnetic waves generated by the plasma display device and to remove impurities generated by gas in each cell during light emission.

There are two types of such functional filters. One is a glass filter that has a space on the panel with a tempered glass and several functional filters are attached to the tempered glass, and the other is a filter having various functions on the front substrate of the panel without glass on the panel. It is a film filter attached directly.

However, among the various functions, the filter of the plasma display panel did not have a filter having an anti-glare function. Therefore, when a luminescent object such as sunlight or fluorescent light is incident and reflected on an image implemented by the plasma display device around the plasma display device, the observer cannot observe a clear image and is disturbed by the light of the sunlight or fluorescent light. There were many cases.

Therefore, when an observer sees an image implemented by the plasma display device, if the viewer receives direct reflection light such as sunlight or fluorescent light, the observer may feel glare and may not be able to see the screen properly. there was.

Particularly in the case of the glass filter, on the principle of the anti-glare function, the light does not escape from the predetermined space between the front substrate and the tempered glass to which the functional filter is attached. In this case, when the observer wants to see the plasma display image, the viewer may see light trapped in a predetermined space between the filter and the tempered glass to come in from the outside, so that the image to be originally viewed is not seen properly but is white.

In addition, conventionally, in the method of forming an image filter, it is common to form each layer of the image filter by attaching various functional films to the front substrate of the panel by a laminating method.

The functional film forming the image filter is expensive, and the use of such expensive functional film as the image filter has a problem of increasing the manufacturing cost.

In addition, the filter forming method as described above has the following problems.

When the functional film is attached to the front substrate of the panel by the laminating method, the air bubbles between the functional film and the front substrate do not escape and the air bubbles are trapped between the functional film and the front substrate, thereby not functioning the filter properly. Large and small bubbles formed here and there were one factor that lowered the uniformity of the filter.

The problems caused by bubbles as described above were not only a factor of increasing the defective rate of the panel in the manufacture of the plasma display but also a problem of making the manufacturing cost higher.

In order to solve this problem, an object of the present invention is to add an anti-glare function to various filter functions of a plasma display device to prevent glare from external light and provide a clearer image.

In addition, the present invention uses a spray method or a spin method when forming an anti-reflection layer or an anti-glare layer of the image filter, thereby suppressing bubble formation and improving the overall uniformity of the image filter, thereby providing a more reliable image and providing the image filter. Its purpose is to provide a process for the preparation.

Plasma display device of the present invention for solving the above technical problem is a front substrate; and at least one of the anti-glare layer for scattering light incident on the upper surface of the front substrate or the anti-reflection layer for suppressing reflection is formed in a coating method An image filter including a prevention layer; And a rear substrate coupled with a lower surface of the front substrate.

The coating method is characterized in that the spray method or spin coating method.

The anti-glare layer is characterized by having a surface on which projections are formed.

The anti-glare layer is characterized by consisting of at least one of tin oxide series, silicon dioxide series and titanium dioxide series.

The anti-glare layer is characterized in that silver is added to at least one of the tin oxide series, the silicon dioxide series and titanium dioxide series.

The anti-reflection layer is characterized by consisting of at least one of tin oxide series, silicon dioxide series and titanium dioxide series.

The anti-reflection layer is characterized in that silver is added to at least one of the tin oxide series, the silicon dioxide series and the titanium dioxide series.

The anti-reflection layer is formed by stacking a plurality of layers formed as at least one of the tin oxide series, the silicon dioxide series, and the titanium dioxide series.

The image filter may further include a color die layer for controlling near-infrared shielding and color, and an electromagnetic shielding layer for shielding electromagnetic waves.

The image filter includes the anti-glare layer, and the anti-reflection layer is positioned between the front substrate and the anti-glare layer.

In addition, a method of manufacturing a plasma display device including a front substrate and a rear substrate includes forming an antiglare layer forming material for forming an antiglare layer for scattering light incident on an upper surface of the front substrate or an antireflection layer for suppressing reflection. An image filter applying step to which at least one of the anti-reflection layer forming materials is applied; And an image filter firing step of firing the applied prevention layer forming material.

The applying of the image filter may include attaching a color die layer for controlling near-infrared shielding and color and an electromagnetic shielding layer for shielding electromagnetic waves to an upper surface of the front substrate, and then attaching the color die layer or the upper surface of the electromagnetic shielding layer to the upper surface of the front substrate. At least one of an antiglare layer forming material or an antireflection layer forming material is applied.

The image filter applying step is characterized in that at least one of the anti-glare layer forming material or the anti-reflection layer forming material is applied using a spray method or a spin coating method.

The image filter firing step is characterized in that for firing the coated anti-layer forming material using an ultraviolet firing method.

The baking temperature in the said ultraviolet baking method is 60 degreeC or more and 110 degrees C or less, It is characterized by the above-mentioned.

 Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

<First Embodiment>

1 is a view for explaining the structure of a plasma display device according to a first embodiment of the present invention.

The plasma display device of the present invention according to the first embodiment of the present invention comprises a front substrate (110); At least one of an anti-glare layer (not shown) for scattering light incident on the upper surface of the front substrate 110 or an anti-reflective layer (not shown) for suppressing reflection is applied as an application method. An image filter 130 including a formed prevention layer; And a rear substrate 120 coupled with the lower surface of the front substrate 110.

As shown, the plasma display apparatus includes a plasma display panel 100 in which a front substrate 110 and a rear substrate 120 are bonded to excite phosphors by vacuum ultraviolet rays caused by gas discharge therein, thereby realizing an image; An anti-glare layer (not shown) attached to the rear surface of the rear substrate 120 and scattering light incident on the upper surface of the front substrate 110 and the driving device 140 for driving and controlling the plasma display panel 100. ) Or an image filter 130 including an anti-reflection layer (not shown) in which at least one of an anti-reflection layer (not shown) that suppresses reflection is formed in an application manner.

Until now, the schematic appearance and function of the plasma display device including the image filter 130 including the anti-glare layer or the anti-reflective layer formed by the coating method, which is a feature of the present invention, have been described.

Next, FIG. 2 will be described in detail with respect to the structure and function of the anti-reflection layer and the anti-glare layer.

FIG. 2 schematically illustrates only an image filter portion formed on a front substrate of the plasma display device according to the first embodiment of the present invention.

Therefore, hereinafter, description of other parts of the plasma display apparatus will be omitted, and only the image filter part which is a feature of the present invention will be described.

First, referring to FIG. 2A, the anti-glare layer 131 and the other functional layer 133 are formed on the front substrate 110 and coated on the front substrate 110 to scatter incident light. The film-like image filter 130 is included.

The anti-glare layer 131 functions to prevent glare due to external incident light.

The anti-glare function is based on the following principle.

Referring to FIG. 2A, when a small protrusion is formed on the surface of the anti-glare layer 131, light coming from the outside is scattered in various directions by the small protrusion to diffusely reflect.

In this case, when the observer observes the image displayed by the plasma display device, the light incident on the display screen from the outside is scattered and diffused due to small projections, which causes light to spread in various directions. This uses the phenomenon that light is diffusely reflected from the protruding surface.

Thus, small projections on the filter surface reduce the direct reflected light to the incident of external light and suppress the external light incident to the observer's eye as much as possible.

Therefore, the observer observes an image in which a much smaller amount of light is reflected than the amount of external light is reflected in one direction, thereby making the glare much less noticeable. Thus, the observer can more clearly and easily observe the image implemented by the plasma display device to be originally observed.

Therefore, when an observer observes an image implemented by a plasma display device to which an anti-glare function is applied, the observer observes a clearer image.

The shape of the projection can be a projection of a different shape as long as it is capable of scattering light and reflecting light.

Anti-glare layer 131 is preferably made of at least one of tin oxide (Tin Oxide) series, silicon dioxide (SiO ₂ ) (Silicon Dioxide) series and titanium dioxide series.

In addition, the anti-glare layer 131 is the tin oxide series, the silicon dioxide series and It is preferable that silver (Ag) is added to at least one of the titanium dioxide series. For example, silver may be added in the range of 0.01% to 1% of the total content.

Referring to FIG. 2B, a film type image including a front substrate 110 and an anti-reflection layer 132 and other functional layers 133 formed on the front substrate 110 in a coating manner and suppressing reflections The filter 130 is located.

A detailed description of the anti-reflection layer 132 is as follows.

The function of the anti-reflection layer 132 serves to block ultraviolet rays and reduce external reflected light.

The anti-reflection layer 132 is used because it is difficult to clearly see the screen because of the reflected light when viewing a screen of a plasma display panel, a computer, a monitor, or the like. The anti-reflection layer 132 is formed by alternately stacking silicon dioxide (SiO ₂ ), titanium dioxide (TiO ₂ ) and tin oxide (SnO ₂ ) on a polymer film such as polyethylene terephtalate (PET).

In general, the actual transmittance is less than 92% even for glass which is considered completely transparent. The rest is the loss caused by reflection. As described above, in order to reduce the loss caused by reflection, the reflection prevention layer 132 may be used to reduce the reflection, thereby providing a clearer screen. In the case of the anti-reflection layer 132, the transmittance is almost 100%.

As described above, the anti-reflection layer 132 functions to allow a clearer image to be viewed by reducing ultraviolet rays and reducing external reflected light.

The antireflection layer 132 may be formed of at least one of tin oxide series, silicon dioxide series, and titanium dioxide series.

In addition, the anti-reflection layer 132 may be formed by adding silver to at least one of the tin oxide series, the silicon dioxide series, and the titanium dioxide series.

In addition, the anti-reflection layer 132 may be configured by stacking a plurality of layers formed as at least one of the tin oxide series, the silicon dioxide series, and the titanium dioxide series.

Referring to FIG. 2C, the anti-glare layer 131 and the anti-reflection layer 132 are formed on the front substrate 110 and formed on the front substrate 110 in a coating manner, and the other functional layers 133 are included. The film-like image filter 130 is included.

The anti-glare layer 131 functions to prevent glare due to external incident light.

The function of the anti-reflection layer 132 serves to block ultraviolet rays and reduce external reflected light.

Hereinafter, since the detailed description of the anti-glare layer 131 and the anti-reflection layer 132 has already been described above, a detailed description thereof will be omitted.

The anti-glare layer 131 and the anti-reflection layer 132 are formed by a coating method.

The coating method is preferably a spray method or spin coating method.

A description of the coating method for forming the anti-glare layer 131 and the anti-reflection layer 132 will be described in detail when describing the method of manufacturing the plasma display device according to the present invention.

Up to now, only the anti-glare layer 131 and the anti-reflection layer 132 have been described. In the second and third embodiments, a plasma display device in which the anti-glare layer and the anti-reflection layer are applied together with other functional image filters will be described.

<Example 2>

3 is a diagram for describing an image filter according to a second exemplary embodiment of the present invention.

3 schematically illustrates an image filter portion formed on the front substrate 300 of the plasma display device according to the second embodiment of the present invention.

Therefore, hereinafter, description of other parts of the plasma display apparatus will be omitted, and only the image filter part according to the second embodiment will be described.

Referring to FIG. 3, the film type image filter includes an anti-glare layer 310, and a color die layer 320 and an electromagnetic shielding layer between the front substrate 300 and the anti-glare layer 310. EMI Layer 330) is further included. A rear substrate (not shown) is coupled to the lower surface of the front substrate 300. The other functional layer 340 having other functions is positioned between the front substrate 300 and the electromagnetic shielding layer 330.

The function of the anti-glare layer 310 is to scatter light incident from the outside into small projections on the surface of the filter so that the original image to be viewed can be viewed without interference by external light.

Since the detailed description of the anti-glare layer 310 has been described above, the detailed description of the anti-glare layer 310 is omitted.

The function of the color die layer 320 is as follows.

Since the plasma display device implements an image by applying high voltage and high frequency for plasma discharge, there is a problem that more electromagnetic waves are emitted to the front of the panel glass than the color cathode ray tube (CRT) or the liquid crystal display panel (LCD). In addition, the plasma display device emits Near Infrared Ray having a wavelength of 0.75 μm to 3 μm derived from an inert gas such as Ne or Xe. This near infrared ray is very close to the remote controller wavelength of home appliances, causing malfunction. There is this. In addition, as in the CRT or LCD, there is a problem of glare of the user due to external light, and there are various problems such as lowering of the contrast ratio, which is an image quality characteristic of other display devices. The color die layer 320 may function to adjust near infrared (NIR) shielding and color to overcome this problem.

Looking at the electromagnetic shielding layer 330 in detail as follows.

When the plasma display device is driven, the plasma display device generates an image by applying high voltage and high frequency, so that a large amount of electromagnetic waves are generated through the plasma display panel and the driving device located on the back of the display panel, that is, the rear substrate (not shown). Is released.

The emitted electromagnetic waves are greatly reduced when the conductive metal is grounded adjacent to the plasma display panel. The electromagnetic shielding layer 330 of the plasma display apparatus uses the same principle.

The electromagnetic shielding layer 330 of the plasma display apparatus is classified into two types, namely, a conductive film type (Ag / ITO Sputtering) and a mesh (Cu-mesh) type.

The electromagnetic wave shielding film of the conductive film type is formed by forming a ground portion through which a bus bar grounded using a conductive tape or conductive paste is grounded and sputtering metal oxides such as Ag and ITO. . In the stacking of Ag and ITO, seven or nine layers may be used. In addition, the thicknesses of the two ITO layers formed on both sides of the laminated electromagnetic shielding film and the two (7-layer type) or three (9-layer type) ITO thicknesses formed therein may be different. For example, the thickness of two ITO layers formed on the outside is small, and the thickness of two or three ITOs formed on the inside is large, and the thickness of the ITO formed on the inside is about 1.5 to 2.5 times the thickness of the ITO formed on the outside. Can be larger. In addition, since the Ag film itself has a function of shielding near infrared rays, it is not necessary to form a separate near infrared shielding layer.

The electromagnetic shielding layer 330 formed of a mesh type metal mesh is formed in a mesh form to have a predetermined transmittance and is formed by forming a ground at an end of the conductive mesh. The conductive mesh is composed of a metal such as copper (Cu) or silver (Ag).

Embodiment 2 represents a preferred embodiment, and the color die layer 320 and the electromagnetic shielding layer 330 may be positioned differently from the stacking order of the second embodiment. In addition, the other functional layers 340 may not be stacked.

In Example 2, the functional image filter except the antireflective layer was described. Since the basic principle of the function of the anti-glare layer 310 is due to diffuse reflection due to scattering, the anti-glare layer 310 may be prevented to some extent, so that a separate anti-reflection layer may not be formed.

In Embodiment 2, only the embodiment in which the anti-glare layer 310 is applied together with other functional filters has been described.

In the third embodiment, a functional image filter to which an anti-reflection layer is applied will be described.

<Example 3>

4 is a diagram illustrating an image filter according to a third embodiment of the present invention.

FIG. 4 schematically illustrates an image filter portion formed on the front substrate 400 of the plasma display device according to the third embodiment of the present invention.

Therefore, hereinafter, description of other parts of the plasma display apparatus will be omitted, and only the image filter part according to the third embodiment will be described.

Referring to FIG. 4, the image filter includes an anti-glare layer 410 and an anti-reflection layer 420.

The apparatus further includes a color die layer 430 and an electromagnetic shielding layer 440 formed between the front substrate 400 and the anti-glare layer 410, and between the front substrate 400 and the anti-glare layer 410. The antireflection layer 420 is located. A rear substrate (not shown) is coupled to the lower surface of the front substrate 400. The other layer 450 having other functions is positioned between the front substrate 400 and the electromagnetic shielding layer 440.

The function of the anti-glare layer 410 is to scatter the light incident from the outside into a small projection on the surface of the filter so that the original image to be viewed can be viewed without interference by external light.

Since the detailed description of the anti-glare layer 410 has already been described above, a detailed description of the anti-glare layer 410 will be omitted.

The color die layer 430 functions to adjust near infrared (NIR) shielding and color.

Since the detailed description of the color die layer 430 has already been described above, the detailed description of the color die film ′ is omitted.

The electromagnetic shielding layer 440 serves to shield electromagnetic waves, and is classified into a conductive film type (Ag / ITO Sputtering) and a mesh (Cu-mesh) type.

Since the detailed description of the electromagnetic shielding layer 440 has already been described above, the detailed description of the electromagnetic shielding layer 440 will be omitted.

The function of the anti-reflection layer 420 serves to block ultraviolet rays and reduce external reflected light.

Since the detailed description of the anti-reflection layer 420 has already been described above, the detailed description of the anti-reflection layer 420 will be omitted.

The third embodiment represents the most preferred embodiment, and the positions of the color die layer 430 and the electromagnetic shielding layer 440 may be located in any order unlike the third embodiment.

Until now, only the plasma display device including an image filter including an anti-glare layer or an anti-reflective layer formed by a coating method and an image filter to which other functional layers are applied has been described. Hereinafter, the anti-glare layer or reflection An embodiment will be described with reference to an embodiment of a method of manufacturing a plasma display device including an image filter including a protective layer formed of at least one of the protective layers and other functional layers.

<Example 4>

5 is a view for explaining a method of manufacturing a plasma display device according to a fourth embodiment of the present invention.

5 schematically illustrates a method of manufacturing a plasma display device according to a fourth embodiment of the present invention.

Therefore, hereinafter, a method of manufacturing the plasma display device of the present invention will be described in brief with reference to FIG. 5.

Referring to FIG. 5, a method of manufacturing a plasma display apparatus including a front substrate and a rear substrate may include a bonding step of bonding the front substrate 510 and the back substrate 500 (FIG. 5A); An image filter to which at least one of an anti-glare layer (not shown) for forming an anti-glare layer (not shown) for scattering light incident on the upper surface of the front substrate or an anti-layer forming material (520) for forming an anti-reflection layer (not shown) is applied. An application step (FIG. 5B); And an image filter firing step of firing the coated anti-layer forming material 520 (FIG. 5C).

In the bonding step (a), the front substrate 510 and the rear substrate 500 are bonded. In the bonding step (a), the front substrate 510 and the rear substrate 500 are aligned and sealed with a seal material.

The image filter applying step (b) may include an anti-glare layer (not shown) forming material for scattering light incident on the upper surface of the front substrate and / or an anti-layer forming material 520 for forming an anti-reflection layer (not shown) for suppressing reflection. At least one of is applied. Image filter application step (b) is a spray (Spray) method and spin (Spin) method. In other words, the conventional method of attaching the image filter to the front substrate, sputtering or laminating (Laminating) method was used, but spray or spin method was not used at all. In addition, the conventional image filter did not have a layer to prevent glare. Here, the conventional image filter means a film filter having a thin film.

Figure 5 (b) briefly shows the spray method of the application method.

In the spray method, an injector 530 containing at least one anti-glare layer (not shown) forming material or at least one anti-reflective layer forming material (520) is formed on the front substrate 510 of the panel. It is made by spraying the prevention layer forming material 520. In this case, the front substrate is coated with the barrier layer forming material 520 to thereby apply the coating step (a).

The spraying method as described above has an effect of dramatically increasing the uniformity of the image filter because the most problematic bubbles are not generated when the image filter is formed.

In addition, due to the nature of the spray method, unlike conventional filter formation, manufacturing defect rate can be significantly reduced, so that process yield can be increased, and manufacturing cost can be dramatically reduced. Roughly speaking, the manufacturing cost is reduced to about one hundredth to one fifth of the conventional method. In addition, the coating amount of the prevention layer forming material 520 can be freely controlled due to the nature of the spray method, and thus the thickness of the layer can be adjusted.

Description of the spin method during the application step according to another embodiment of the present invention will be described in Figure 7 of the sixth embodiment will be described later.

(c) is briefly illustrated to describe the image filter firing step.

The image filter firing step (c) is performed by firing the applied barrier layer forming material 520.

Firing methods used in the image filter firing step (c) include thermal firing, ultraviolet firing, laser firing, and the like.

Thermal firing is performed on the entire plasma display panel in a thermal firing furnace. Laser firing is suitable for local firing at the site to be fired. Ultraviolet firing is suitable for firing the surface of the plasma display panel because the ultraviolet rays are fired by radiating heat using a device that emits ultraviolet rays. Therefore, it is preferable to use the ultraviolet firing method in the image filter firing step (c) of the present invention.

(c) is an embodiment of the present invention briefly illustrates the ultraviolet firing.

The firing step (c) is performed by the ultraviolet firing apparatus 540 emitting ultraviolet rays 550 to the anti-layer forming material 520 applied to the upper surface of the front substrate 510 and drying the applied anti-layer forming material 520. .

In step (c), the firing temperature by the ultraviolet firing method is preferably 60 ° C or more and 110 ° C or less. The meaning of the firing temperature means the temperature of the prevention layer forming material 520 subjected to ultraviolet firing.

This is because when the firing temperature is lower than 60 ° C., the drying and firing may not be performed as desired. In addition, in this case, the extent to which the prevention layer forming material 520 couples to a desired coupling site may be lowered.

In addition, when the firing temperature is higher than 110 ° C, since the prevention layer forming material 520 after firing may not be able to perform the desired function by the high firing temperature.

Steps (b) and (c) may repeat steps (b) and (c) for each layer when forming an anti-glare layer or an anti-reflection layer, or apply the anti-glare layer forming material and the anti-reflective layer forming material repeatedly and then (c) Step).

Up to now, only the anti-glare layer and the anti-reflective layer have been described. However, in the fifth embodiment, a method of manufacturing the image filter having the color die function and the electromagnetic shielding function will be described.

Example 5

6 is a view for explaining a coating method of a method of manufacturing a plasma display device according to a fifth embodiment of the present invention.

6 schematically illustrates a method of manufacturing a plasma display device according to a fifth embodiment of the present invention.

Therefore, hereinafter, a method of manufacturing the plasma display device of the present invention will be described schematically as shown in FIG. 6.

Referring to FIG. 6, in the method of manufacturing a plasma display apparatus including a front substrate and a rear substrate, a bonding step (a) of bonding the front substrate 610 and the back substrate 600 to each other, the front substrate 610 is performed. After the color die layer 630 and the electromagnetic shielding layer 620 for shielding electromagnetic waves are attached to the upper surface of the near-infrared shielding and color, the color die layer 630 or the upper portion of the electromagnetic shielding layer 620 is attached. (B) an image filter applying step (b) in which at least one of the anti-glare layer forming material or the anti-reflective layer forming material is applied to the surface (b), and an image filter firing step (c) firing the applied anti-glare layer forming material 640. Include.

In the fifth embodiment, the bonding step and the firing step have already been described in detail in the fourth embodiment, and thus a detailed description thereof will be omitted.

 The coating step in the fifth embodiment further includes a process in which the color die layer and the electromagnetic shielding layer are further attached, unlike in the fourth embodiment.

Since the description of the color die layer and the electromagnetic shielding layer has already been described above, a detailed description thereof will be omitted.

The method of attaching the color die layer and the electromagnetic wave shielding layer is by laminating or the like.

In Example 4 and Example 5, only the manufacturing method of the plasma display apparatus by the spray method was described, but in Example 6, the coating method by the spin method will be described.

<Example 6>

7 is a view for explaining a method of manufacturing a plasma display device according to a sixth embodiment of the present invention.

FIG. 7 is a simplified diagram for explaining a spin method different from the spray coating methods described in Examples 4 and 5. FIG.

Therefore, hereinafter, a spin coating method in the method of manufacturing the plasma display apparatus of the present invention will be described in brief with reference to FIG. 7.

Referring to FIG. 7, the spin coating method is performed by applying the prevention layer forming material 720 to the panel on which the front substrate 710 and the rear substrate 700 are bonded by the coating apparatus 730 and rotating the panel.

The prevention layer forming member 720 is widely and evenly applied on the panel by rotating the panel. The spin speed may vary depending on the viscosity of the barrier layer forming material 720.

According to the spin method, it is possible to naturally improve the uniformity of the image filter. In addition, unlike the conventional image filter in the process it is possible to significantly reduce the defective rate has the effect of making the process yield considerably good.

As such, those skilled in the art will appreciate that the present invention can be implemented in other specific forms without changing the technical spirit or essential features thereof. Therefore, the above-described embodiments are to be understood as illustrative in all respects and not as restrictive.

The scope of the present invention is shown by the following claims rather than the detailed description, and all changes or modifications derived from the meaning and scope of the claims and their equivalents should be construed as being included in the scope of the present invention. do.

As described above, the present invention forms the anti-glare layer and the anti-reflection layer by the coating method, so that the image of the plasma display device can be more clearly enjoyed.

In addition, in the method of manufacturing a plasma display device according to the present invention, by applying a spray or spin coating method, it is possible to remarkably overcome the process yield problem due to bubble generation, which has been the most problematic problem in the past.

In addition, the present invention has the effect of reducing the manufacturing cost significantly lower than the existing manufacturing process.

Claims (11)

Front substrate; An image filter including an anti-glare layer formed by applying at least one of an anti-glare layer for scattering light incident on an upper surface of the front substrate or an anti-reflection layer for suppressing reflection; And Back substrate coupled with the bottom surface of the front substrate Plasma display device comprising a. The method of claim 1, The coating method is a spray method or spin coating method Plasma display device characterized in that. The method of claim 1, The anti-glare layer has a surface on which protrusions are formed Plasma display device characterized in that. The method of claim 3, wherein The anti-glare layer, Consisting of at least one of tin oxide series, silicon dioxide series and titanium dioxide series Plasma display device characterized in that. The method of claim 4, wherein The anti-glare layer Silver is added to at least one of the tin oxide series, the silicon dioxide series and the titanium dioxide series Plasma display device characterized in that. The method of claim 1, The anti-reflection layer, Consisting of at least one of tin oxide series, silicon dioxide series and titanium dioxide series Plasma display device characterized in that. The method of claim 6, The anti-reflection layer Silver is added to at least one of the tin oxide series, the silicon dioxide series and the titanium dioxide series Plasma display device characterized in that. The method of claim 6, The anti-reflection layer It is composed of a plurality of layers formed as at least one of the tin oxide series, the silicon dioxide series and the titanium dioxide series Plasma display device characterized in that. The method of claim 1, The image filter, Further comprising a color die layer for controlling near-infrared shielding and color and an electromagnetic shielding layer for shielding electromagnetic waves Plasma display device characterized in that. The method of claim 9, The image filter includes the anti-glare layer, Further comprising the color die layer and the electromagnetic shielding layer between the front substrate and the antiglare layer. Plasma display device characterized in that. The method of claim 9, The image filter includes an anti-glare layer and an anti-reflection layer, The anti-reflection layer is located between the front substrate and the anti-glare layer Plasma display device characterized in that.

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