KR101890099B1 - Substrate processing device and device manufacturing method - Google Patents

Abstract

The substrate processing apparatus includes a substrate support member having a curved surface curved at a predetermined radius from a predetermined axis and having a part of the substrate wound on a curved surface to support the substrate, A processing section for performing processing on the substrate on the curved surface of the substrate, and a temperature adjusting device for adjusting the temperature of the substrate before being supplied to the substrate supporting member.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a substrate processing apparatus,

The present invention relates to a substrate processing apparatus and a device manufacturing method for performing processing on a substrate on a curved surface of a substrate supporting member.

BACKGROUND ART An exposure apparatus for exposing a substrate by rotating a cylindrical or cylindrical mask as disclosed in the following patent documents is known as an exposure apparatus used in a lithography process , See Patent Document 1).

In order to expose an image of the pattern of the mask well onto the substrate, not only when a plate-shaped mask is used but also when a substrate is exposed using a cylindrical or cylindrical mask, It is necessary to accurately acquire the position information of the pattern. Therefore, it is required to design a technique capable of accurately acquiring positional information of a cylindrical or cylindrical mask, and accurately adjusting the positional relationship between the mask and the substrate.

Thus, in the exposure apparatus disclosed in Patent Document 1, marks (scales, gratings, etc.) for obtaining positional information are formed in predetermined areas on the pattern formation surface of the mask in a predetermined positional relationship with respect to the patterns, The position information of the pattern in the circumferential direction of the pattern forming surface or the position information of the mask in the rotational axis direction is acquired by detecting the mark.

In recent years, since electronic devices such as large display panels (liquid crystal, organic EL, etc.) are formed into flexible resin films, plastic sheets, and very thin glass sheets and the like, a flexible long- (Hereinafter, also referred to as a "flexible substrate") of a flexible substrate is applied to a flexible substrate, a photosensitive layer is coated on the surface of the flexible substrate, An apparatus for exposing a pattern has been proposed (for example, Patent Document 2).

Patent Document 1: Japanese Patent Application Laid-Open No. 2008-076650 Patent Document 2: JP-A-2010-217877

In the substrate processing apparatus for performing the processing on the flexible substrate as disclosed in the above-mentioned Patent Document 2, it is desired to suppress the expansion and contraction of the substrate and to improve the processing accuracy.

The present invention has been made in view of the above circumstances, and it is an object of the present invention to provide a substrate processing apparatus and a device manufacturing method which can suppress expansion and contraction of a substrate and improve processing accuracy.

According to a first aspect of the present invention, there is provided a substrate processing apparatus comprising: a substrate support member having a curved surface curved at a predetermined radius from a predetermined axis and having a part of the substrate wound on the curved surface to support the substrate; A processing unit arranged around the support member for performing a process on the substrate on the curved surface at a specific position in the circumferential direction and a temperature control device for adjusting the temperature of the substrate before being supplied to the substrate support member, Processing apparatus is provided.

According to a second aspect of the present invention, there is provided a device manufacturing method for forming a pattern on a substrate using a substrate processing apparatus according to the first aspect of the present invention.

According to a third aspect of the present invention, there is provided a method of manufacturing a flexible substrate, comprising the steps of supporting a part of the flexible long substrate in a longitudinal direction along a supporting surface curved in the longitudinal direction of the substrate supporting member, Transferring a pattern constituting the electronic device to the substrate supported on the support surface at a specific position in the longitudinal direction of the support surface of the substrate support member; There is provided a device manufacturing method comprising controlling the temperature of the support member so that the temperature at the upstream side in the transport direction of the substrate with respect to the support surface and the temperature at the support surface of the substrate have a predetermined difference.

According to the aspect of the present invention, in the substrate processing apparatus and the device manufacturing method, the expansion and contraction of the substrate can be suppressed and the processing accuracy can be improved.

1 is a diagram showing a configuration of a device manufacturing system according to the first embodiment.
2 is a schematic diagram showing the entire configuration of a processing apparatus (exposure apparatus) according to the first embodiment.
Fig. 3 is a schematic diagram showing the arrangement of the illumination area and the projection area in Fig. 2. Fig.
Fig. 4 is a schematic diagram showing a configuration of a projection optical system applied to the processing apparatus (exposure apparatus) of Fig. 2; Fig.
Fig. 5 is a perspective view of a rotary drum applied to the processing apparatus (exposure apparatus) of Fig. 2; Fig.
Fig. 6 is a perspective view for explaining the relationship between the detection probe and the reading device applied to the processing apparatus (exposure apparatus) of Fig. 2;
Fig. 7 is an explanatory view for explaining the position of the reading device as viewed in the direction of the rotation center line of the scale original according to the first embodiment; Fig.
8 is an explanatory view for explaining the temperature control device according to the first embodiment.
9 is an explanatory view for explaining an example of alignment marks.
10 is an explanatory diagram schematically illustrating an example of a change in alignment mark caused by elongation and contraction of a substrate.
11 is a flowchart showing an example of a procedure for correcting the processing of the processing apparatus (exposure apparatus) according to the first embodiment.
Fig. 12 is a schematic diagram showing an overall configuration of a processing apparatus (exposure apparatus) according to the second embodiment.
Fig. 13 is a schematic diagram showing an overall configuration of a processing apparatus (exposure apparatus) according to the third embodiment.
14 is a schematic diagram showing the entire configuration of a processing apparatus (exposure apparatus) according to the fourth embodiment.
15 is a schematic diagram showing an overall configuration of a processing apparatus (exposure apparatus) according to the fifth embodiment.
16 is a schematic diagram showing an overall configuration of a processing apparatus (exposure apparatus) according to the sixth embodiment.
17 is a flowchart showing a device manufacturing method using the processing apparatus (exposure apparatus) according to the first embodiment.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A mode (embodiment) for carrying out the present invention will be described in detail with reference to the drawings. The present invention is not limited to the following embodiments. The constituent elements described below include those that can be easily assumed by those skilled in the art, and substantially the same ones. In addition, the constituent elements described below can be suitably combined. In addition, various omissions, substitutions or alterations of the constituent elements can be made without departing from the gist of the present invention. For example, the following embodiments are described as a case of manufacturing a flexible display as a device, but the invention is not limited thereto. As the device, a wiring board, a semiconductor substrate, or the like may be manufactured.

(First Embodiment)

In the first embodiment, a substrate processing apparatus for performing exposure processing on a substrate is an exposure apparatus. The exposure apparatus is assembled in a device manufacturing system that manufactures devices by performing various processes on the exposed substrate. First, a device manufacturing system will be described.

<Device Manufacturing System>

1 is a diagram showing a configuration of a device manufacturing system according to the first embodiment. The device manufacturing system 1 shown in Fig. 1 is a line (flexible display manufacturing line) for manufacturing a flexible display as a device. The flexible display includes, for example, an organic EL display. The device manufacturing system 1 sends out the substrate P from a supply roll FR1 winding a flexible substrate P in the form of a roll and performs various processes on the delivered substrate P continuously Roll-to-roll system in which the processed substrate P is wound as a flexible device on the recovery roll FR2. In the device manufacturing system 1 of the first embodiment, the substrate P, which is a film-like sheet, is fed from the feed roll FR1 and the substrate P fed out from the feed roll FR1 is fed sequentially , until they are wound on the rotating roll FR2 via n processing devices U1, U2, U3, U4, U5, ..., Un. First, the substrate P to be processed by the device manufacturing system 1 will be described.

As the substrate P, for example, a foil (foil) made of a metal or an alloy such as a resin film, stainless steel or the like is used. Examples of the material of the resin film include polyethylene resin, polypropylene resin, polyester resin, ethylene vinyl copolymer resin, polyvinyl chloride resin, cellulose resin, polyamide resin, polyimide resin, polycarbonate resin, polystyrene resin, And one or more of vinyl acetate resin.

It is preferable that the substrate P be selected so as not to have a significantly large thermal expansion coefficient so that the amount of deformation due to heat received in various treatments performed on the substrate P, for example, can be substantially ignored. The thermal expansion coefficient may be set to be smaller than a threshold value according to the process temperature or the like, for example, by mixing an inorganic filler with a resin film. The inorganic filler may be, for example, titanium oxide, zinc oxide, alumina, silicon oxide, or the like. The substrate P may be a very thin glass single layer having a thickness of about 100 占 퐉 manufactured by a float method or the like and may be a laminate obtained by bonding the above resin film or foil to this very thin glass Okay.

The substrate P thus configured is rolled into a roll to become a supply roll FR1 and this supply roll FR1 is mounted on the device manufacturing system 1. [ The device manufacturing system 1 equipped with the supply roll FR1 repeatedly executes various processes for manufacturing one device on the substrate P fed out from the supply roll FR1. Therefore, the substrate P after the processing becomes a state in which a plurality of devices are connected. That is, the substrate P fed out from the supply roll FR1 is a substrate for obtaining multiple faces. The substrate P may be obtained by modifying the surface of the substrate P by a predetermined pretreatment beforehand or by activating the substrate P by forming a fine partition structure (concave-convex structure) for precision patterning on the surface It's okay.

The substrate P after the treatment is recovered as the recovery roll FR2 by being wound in a roll shape. The rotating roll FR2 is mounted on a dicing device (not shown). The dicing apparatus to which the rotation roll FR2 is mounted divides (dices) the processed substrate P for each device to obtain a plurality of devices. The dimension of the substrate P is, for example, about 10 cm to 2 m in the width direction (short direction) and the dimension in the longitudinal direction (elongated direction) is 10 m or more. The dimensions of the substrate P are not limited to the above dimensions.

Next, the device manufacturing system 1 will be described with reference to Fig. In Fig. 1, the coordinate system is an orthogonal coordinate system in which the X direction, the Y direction, and the Z direction are orthogonal. The X direction is a direction connecting the supply roll FR1 and the rotation roll FR2 in the horizontal plane, and is the left-right direction in Fig. The Y direction is a direction orthogonal to the X direction in the horizontal plane, and is the front-back direction in Fig. The Y direction is the axial direction of the supply roll FR1 and the recovery roll FR2. The Z direction is a vertical direction, and is a vertical direction in Fig.

The device manufacturing system 1 includes a substrate supply device 2 for supplying a substrate P and processing devices U1 to Un for performing various processes on the substrate P supplied by the substrate supply device 2, A substrate collecting device 3 for collecting the substrate P processed by the processing devices U1 to Un and an upper control device for controlling each device of the device manufacturing system 1 5).

In the substrate feeder 2, a feed roll FR1 is rotatably mounted. The substrate supply device 2 includes a drive roller DR1 for delivering a substrate P from a mounted supply roll FR1 and an edge position Controller EPC1. The drive roller DR1 rotates while sandwiching the both sides of the front and back sides of the substrate P and sends out the substrate P in the transport direction from the supply roll FR1 to the rotation roll FR2, (P) to the processing units U1 to Un. At this time, the edge position controller EPC1 controls the edge position controller EPC1 so that the position at the edge in the width direction of the substrate P falls within a range of about +/- 10 mu m to about 10 mu m with respect to the target position, (P) is moved in the width direction to correct the position in the width direction of the substrate (P).

In the substrate collection apparatus 3, a rotation roll FR2 is rotatably mounted. The substrate recovery apparatus 3 includes a drive roller DR2 for pulling the processed substrate P toward the recovery roller FR2 and a drive roller DR2 for pulling the edge of the substrate P in the width direction Controller EPC2. The substrate recovery apparatus 3 rotates while sandwiching the both sides of the front and back sides of the substrate P by the drive roller DR2 to pull the substrate P in the transport direction, The substrate P is wound up. At this time, the edge position controller EPC2 is constructed in the same manner as the edge position controller EPC1, and the edge position controller EPC2 is arranged in the width direction of the substrate P so as not to be disturbed in the width direction And corrects the position in the area.

The processing apparatus U1 is a coating apparatus for applying the photosensitive functional liquid to the surface of the substrate P supplied from the substrate supply apparatus 2. [ As the photosensitive functional liquid, for example, a photoresist, a photosensitive silane coupling agent, a UV curable resin liquid, or the like is used. The processing apparatus U1 is provided with a dispensing mechanism Gp1 and a drying mechanism Gp2 in this order from the upstream side in the carrying direction of the substrate P. [ The application mechanism Gp1 has a cylinder roller R1 on which the substrate P is wound and an application roller R2 opposed to the cylinder roller R1. The application mechanism Gp1 supports the substrate P sandwiched by the cylinder roller R1 and the application roller R2 while the supplied substrate P is wound around the cylinder roller R1. The coating mechanism Gp1 applies the photosensitive functional liquid by the application roller R2 while rotating the cylinder roller R1 and the application roller R2 to move the substrate P in the transport direction. The drying mechanism Gp2 blows air for drying such as hot air or dry air to remove the solute (solvent or water) contained in the photosensitive functional liquid, and dries the substrate P coated with the photosensitive functional liquid, A photosensitive functional layer is formed on the photosensitive layer (P).

The processing apparatus U2 is a processing apparatus for transferring the substrate P conveyed from the processing apparatus U1 to a predetermined temperature (for example, several tens to 120 degrees centigrade) to stabilize the photosensitive functional layer formed on the surface of the substrate P. [ ). The processing apparatus U2 is provided with a heating chamber HA1 and a cooling chamber HA2 in this order from the upstream side in the carrying direction of the substrate P. [ In the heating chamber HA1, a plurality of rollers and a plurality of air-turn bars are provided, and a plurality of rollers and a plurality of air-turn bars constitute a conveying path of the substrate P. The plurality of rollers are provided in a rolling contact with the back surface of the substrate P, and the plurality of air-turn bars are provided in a non-contact state on the surface side of the substrate P. The plurality of rollers and the plurality of air-turn bars are arranged to be a conveying path of a meandering (meandering) shape in order to lengthen the conveying path of the substrate P. The substrate P passing through the heating chamber HA1 is heated to a predetermined temperature while being conveyed along a serpentine conveying path. The cooling chamber HA2 is configured to cool the substrate P to the ambient temperature in order to make the temperature of the substrate P heated in the heating chamber HA1 coincide with the environmental temperature of the post-process (the processing device U3) do. The cooling chamber HA2 is provided with a plurality of rollers therein and the plurality of rollers are arranged in a row in the form of a serpentine conveying path in order to lengthen the conveying path of the substrate P, . The substrate P passing through the inside of the cooling chamber HA2 is cooled while being conveyed along a serpentine conveyance path. A drive roller DR3 is provided on the downstream side of the cooling chamber HA2 in the transport direction and the drive roller DR3 rotates while sandwiching the substrate P passing through the cooling chamber HA2, And the substrate P is supplied toward the processing unit U3.

The processing apparatus (substrate processing apparatus) U3 projects a pattern such as a circuit for display or wiring on a substrate (photosensitive substrate) P provided with a photosensitive functional layer on its surface supplied from the processing apparatus U2 And is an exposure apparatus for performing exposure (transfer). The processing apparatus U3 illuminates an illumination luminous flux (luminous flux) onto a cylindrical (mask) DM of a transmissive or reflective type and illuminates the luminous flux with a cylindrical mask (mask) Or projected onto the substrate P by the projection light flux obtained by being reflected. The processing apparatus U3 includes a driving roller DR4 for feeding the substrate P supplied from the processing apparatus U2 to the downstream side in the carrying direction and a driving roller DR4 for adjusting the position in the width direction And an edge position controller (EPC). The driving roller DR4 rotates while sandwiching both the front and back surfaces of the substrate P and feeds the substrate P toward the exposure position by feeding the substrate P to the downstream side in the carrying direction. The edge position controller EPC is constructed in the same manner as the edge position controller EPC1 and corrects the position in the width direction of the substrate P so that the width direction of the substrate P at the exposure position becomes the target position . The processing unit U3 adjusts the temperature of the substrate P supplied by the edge position controller EPC by the temperature regulating unit 60 and then transfers the substrate P to the driving roller DR5.

The processing unit U3 is provided with a buffer unit having two sets of driving rollers DR6 and DR7 for feeding the substrate P downstream in the carrying direction in a state in which the substrate P after being exposed is stretched, (DL). The two sets of driving rollers DR6 and DR7 are arranged at a predetermined interval in the conveying direction of the substrate P. [ The drive roller DR6 rotates while sandwiching the upstream side of the substrate P to be transported and the drive roller DR7 rotates while sandwiching the downstream side of the substrate P to be transported, And supplies the substrate P toward the processing unit U4. At this time, since the substrate P is given slack, the fluctuation of the conveying speed occurring on the downstream side in the conveying direction can be absorbed more than the driving roller DR7, and the substrate P can be conveyed to the substrate P It is possible to insulate the influence of the exposure process. In order to relatively align (align) an image of a part of the mask pattern of the cylindrical mask (mask) DM with the substrate P, the processing apparatus U3 is provided with a pre- And alignment microscopes AMG1 and AMG2 for detecting alignment marks or the like formed thereon.

The processing apparatus U4 is a wet processing apparatus for carrying out a development processing (current image processing) by wet processing, electroless plating processing, and the like on the post-exposure substrate P carried from the processing apparatus U3. The processing apparatus U4 has three processing tanks BT1, BT2, and BT3 layered in the vertical direction (Z direction) and a plurality of rollers for transporting the substrate P, within the processing apparatus U4. The plurality of rollers are disposed so as to be the conveying paths through which the substrates P pass through the inside of the three treatment tanks BT1, BT2, and BT3 in order. A drive roller DR8 is provided on the downstream side of the treatment tank BT3 in the transport direction and the drive roller DR8 rotates while holding the substrate P having passed through the treatment tank BT3 therebetween, And the substrate P is supplied toward the processing unit U5.

Although not shown, the processing apparatus U5 is a drying apparatus for drying the substrate P carried from the processing apparatus U4. The processing apparatus U5 adjusts the water content adhering to the substrate P subjected to the wet processing in the processing apparatus U4 to a predetermined water content. The substrate P dried by the processing unit U5 is conveyed to the processing unit Un via several processing units. After being processed in the processing unit Un, the substrate P is wound up on the rotating roll FR2 of the substrate collecting unit 3. [

The upper control device 5 collectively controls the substrate feeding device 2, the substrate collecting device 3 and the plurality of processing devices U1 to Un. The upper control device 5 controls the substrate supply device 2 and the substrate collection device 3 to transport the substrate P from the substrate supply device 2 to the substrate collection device 3. [ The upper control device 5 controls the plurality of processing devices U1 to Un while synchronizing with the conveyance of the substrate P to execute various processes on the substrate P. [

&Lt; Exposure Apparatus (Substrate Processing Apparatus) &gt;

Next, a configuration of an exposure apparatus (substrate processing apparatus) as the processing apparatus U3 of the first embodiment will be described with reference to Figs. 2 to 4. Fig. 2 is a diagram showing the entire configuration of an exposure apparatus (substrate processing apparatus) according to the first embodiment. 3 is a diagram showing the arrangement of an illumination area and a projection area of the exposure apparatus shown in Fig. Fig. 4 is a diagram showing a configuration of a projection optical system of the exposure apparatus shown in Fig. 2. Fig.

As shown in FIG. 2, the processing apparatus U3 includes an exposure apparatus (processing apparatus) EX, a transfer apparatus 9, and a temperature regulating apparatus 60. As shown in FIG. The substrate P (sheet, film, or the like) is supplied to the exposure apparatus EX by the transfer device 9. [ The exposure apparatus EX is a so-called scanning exposure apparatus and performs exposure of the pattern formed on the cylindrical mask DM while synchronously driving the rotation of the cylindrical mask DM and the transfer of the flexible substrate P. [ Is projected onto the substrate P via the projection optical systems PL (PL1 to PL6) whose projection magnifications are equal to (x1). The exposure apparatus EX shown in Fig. 2 sets the Y axis of the XYZ orthogonal coordinate system to be parallel to the rotational center line AX1 of the first drum member 21. Likewise, the exposure apparatus EX sets the Y axis of the XYZ orthogonal coordinate system to be parallel to the rotational center line AX2 of the second drum member 22 which is the rotary drum.

2, the exposure apparatus EX includes a mask holding device 12, a lighting device IU, a projection optical system PL, and a control device 14. [ The exposure apparatus EX rotationally moves the cylindrical mask DM held by the mask holding apparatus 12 and conveys the substrate P by the transfer apparatus 9. [ The illumination device IU illuminates a part of the cylindrical mask DM (the illumination area IR) held by the mask holding device 12 with uniform brightness by the illumination luminous flux EL1. The projection optical system PL is configured to project an image of a pattern in the illumination area IR on the cylindrical mask DM onto a part of the substrate P (the projection area PA) ). The portion on the cylindrical mask DM disposed in the illumination area IR changes as the cylindrical mask DM moves and as the substrate P moves, the substrate P ) Changes. As a result, an image of a predetermined pattern (mask pattern) on the cylindrical mask DM is projected onto the substrate P. The control device 14 controls each section of the exposure apparatus EX and causes each section to execute processing. In the present embodiment, the control device 14 controls the transport device 9.

The control device 14 may be part or all of the upper level control device 5 that collectively controls the plurality of processing devices of the device manufacturing system 1 described above. The control device 14 is controlled by the host control device 5 and may be a device different from the host control device 5. [ The control device 14 includes, for example, a computer system. The computer system includes hardware such as, for example, a CPU and various memories, OS, and peripheral devices. The processes of the respective units of the processing apparatus U3 are stored in a storage unit of a computer-readable recording medium in the form of a program, and the computer system reads and executes the programs to perform various processes. The computer system also includes a home page providing environment (or display environment) when it is connectable to the Internet or an intranet system. The computer-readable recording medium includes a storage medium such as a flexible disk, a magneto-optical disk, a portable medium such as a ROM and a CD-ROM, and a hard disk built in a computer system. A computer-readable recording medium is a program for dynamically maintaining a program for a short period of time, such as a communication line for transmitting a program via a communication line such as a network such as the Internet or a telephone line, Such as a volatile memory in a computer system which is a computer system for storing a program for a predetermined period of time. The program may be one for realizing part of the functions of the processing apparatus U3 or may be realized by combining the functions of the processing apparatus U3 with programs already recorded in the computer system. The upper control device 5, like the control device 14, can be implemented using a computer system.

2, the mask holding apparatus 12 includes a first drum member 21 for holding a cylindrical mask DM, a guide roller 23 for supporting the first drum member 21, The first driving unit 26 includes a driving roller 24 for driving the first drum member 21 and a first detector 25 for detecting the position of the first drum member 21 do.

The first drum member 21 is a cylindrical member having a curved surface curved at a predetermined radius from a rotation center line AX1 (hereinafter also referred to as a first central axis AX1) as a predetermined axis, Rotate the perimeter. The first drum member 21 forms the first surface P1 on which the illumination region IR on the cylindrical mask DM is disposed. In the present embodiment, the first surface P1 is a plane (hereinafter referred to as a "cylindrical surface") on which a line segment (a bus line) is rotated about an axis parallel to the line segment (the first central axis AX1) ). The cylindrical surface is, for example, an outer peripheral surface of a cylinder, an outer peripheral surface of a cylinder, and the like. The first drum member 21 is made of, for example, glass or quartz, and has a cylindrical shape with a constant thickness, and the outer peripheral surface (cylindrical surface) forms the first surface P1. That is, in the present embodiment, the illumination area IR on the cylindrical mask DM curves from the rotation center line AX1 into a cylindrical surface having a constant radius r1. Thus, the first drum member 21 has a curved surface curved to a predetermined radius from the rotation center line AX1, which is a predetermined axis. The first drum member 21 is driven by the driving roller 24 and can rotate around the rotation center line AX1 which is a predetermined axis.

The cylindrical mask DM is a transmissive flat sheet having a pattern formed by a light-shielding layer such as chromium on one side of a very thin flat glass plate (for example, a thickness of 100 mu m to 500 mu m) Is created as a mask. The mask holding device 12 is used in a state in which the cylindrical mask DM is curved along the curved surface of the outer peripheral surface of the first drum member 21 and wound (contacted) with the curved surface. The cylindrical mask DM has a pattern non-forming area where no pattern is formed, and is mounted on the first drum member 21 in the pattern non-forming area. The cylindrical mask DM is releasable with respect to the first drum member 21.

Instead of winding the cylindrical mask DM on the first drum member 21 made of a transparent cylindrical mother material, the cylindrical mask DM is made of a very thin glass plate, The mask pattern of the light shielding layer such as chrome may be formed directly on the outer circumferential surface of the drum member 21 so as to be integrally formed. In this case also, the first drum member 21 functions as a supporting member of the pattern of the cylindrical mask DM.

The first detector 25 optically detects the rotational position of the first drum member 21 and is constituted by, for example, a rotary encoder. The first detector 25 outputs to the control device 14 information indicating the detected rotational position of the first drum member 21, for example, a two-phase signal from an encoder head to be described later . The first driving section 26 including an actuator such as an electric motor adjusts a torque and a rotation speed for rotating the driving roller 24 in accordance with a control signal input from the control device 14. [ The control device 14 controls the first driving member 26 based on the detection result of the first detector 25 to control the rotational position of the first drum member 21. [ The control device 14 controls one or both of the rotational position and rotational speed of the cylindrical mask DM held by the first drum member 21. [

The second drum member 22 is a cylindrical member having a curved surface (first curved surface) curved at a predetermined radius from a rotation center line AX2 (hereinafter also referred to as a second central axis AX2) And is a rotary drum that rotates around a predetermined axis. The second drum member 22 has a second surface (a supporting surface) for supporting a part including the projection area PA on the substrate P onto which the imaging light flux from the projection optical system PL is projected, Plane) P2 is formed. The second drum member 22 is a driving roller DR5 which is rotated by a torque supplied from a second driving unit 36 including an actuator such as an electric motor.

Thus, the second drum member 22 serves as a driving roller DR5 and also serves as a substrate supporting member (substrate stage) for supporting the substrate P to be exposed (processed). That is, the second drum member 22 may be part of the exposure apparatus EX. The second drum member 22 is rotatable about the rotation center line AX2 (second central axis AX2) of the second drum member 22 and the substrate P is rotatable about the second center axis AX2 (Cylindrical surface) on the projection optical system 22, and the projection area PA is disposed on a part of the curved part.

In the present embodiment, the principal ray passing through each center point of the projection area PA out of the image forming luminous flux EL2 reaching the projection area PA is reflected by the second From the central axis AX2 to the first specified position PX1 and the second specified position PX2, respectively, at the position of the angle? In the circumferential direction with the center plane P3 interposed therebetween. The specific position PX between the first specific position PX1 and the second specific position PX2 as seen from the rotational center line AX2 is a position on the curved surface of the second drum member 22, Is the center of the average exposed area of the photoresist (P).

The transport apparatus 9 includes a drive roller DR4, a second drum member 22 (drive roller DR5), and a drive roller DR6. The transfer device 9 transfers the substrate P in the transfer direction in which the substrate P is transferred so that the substrate P passes through the first specific position PX1, the specified position PX and the second specified position PX2, P). The second driving section 36 adjusts the torque for rotating the second drum member 22 in accordance with the control signal output from the control device 14. [

In the present embodiment, the substrate P conveyed from the upstream of the conveying path to the driving roller DR4 is conveyed to the temperature regulating device 60 via the driving roller DR4. The temperature regulating device 60 regulates the temperature of the substrate P before it is supplied to the second drum member 22 in accordance with the control signal output from the controller 14. [ The temperature-controlled substrate P is guided by the first guide member 31 and the second guide member 32 via the temperature regulating device 60 and is conveyed to the second drum member 22. The substrate P is supported on the surface of the second drum member 22 and conveyed to the third guide member 33. The substrate P passed through the third guide member 33 is conveyed downstream of the conveyance path. The rotational center line AX2 of the second drum member 22 (drive roller DR5) and the rotational center lines of the drive rollers DR4 and DR6 are all set to be parallel to the Y axis.

The first guide member 31, the second guide member 32, and the third guide member 32, which guide the substrate P and restrict the transport direction in which the substrate P is transported, are provided around the second drum member 22, A guide member 33 is disposed. The second drum member 22 is moved from the entry position IA in the carrying direction in which a part of the substrate P is wound and the substrate P starts to contact the curved surface of the second surface P2, And supports the substrate P from the curved surface of the second surface P2 to the releasing position OA in the carrying direction starting to fall away from the curved surface of the second surface P2. The second guide member 32 and the third guide member 33 adjust the tension or the like acting on the substrate P in the conveying path by moving in the conveying direction of the substrate P, for example. The second guide member 32 and the third guide member 33 can be wound around the outer periphery of the second drum member 22 by moving in the conveying direction of the substrate P, An entry position IA and a departure position OA can be adjusted. The transfer device 9, the first guide member 31, the second guide member 32 and the third guide member 33 are arranged on the substrate P along the projection area PA of the projection optical system PL, And the configurations of the transfer device 9, the first guide member 31, the second guide member 32, and the third guide member 33 can be appropriately changed.

The second detector 35 is constituted by, for example, a rotary encoder or the like, and optically detects the rotational position of the second drum member 22. The second detector 35 detects information indicating the rotational position of the detected second drum member 22 (for example, two-phase information from the encoder heads EN1, EN2, EN3, EN4, Signal, etc.) to the control device 14. [ The control device 14 controls the rotation position of the second drum member 22 by controlling the second drive part 36 on the basis of the detection result of the second detector 35, (Synchronous rotation) between the second drum member 21 (cylindrical mask DM) and the second drum member 22. The detailed configuration of the second detector 35 will be described later.

The exposure apparatus EX of the present embodiment is an exposure apparatus that assumes a so-called multi-lens type projection optical system PL. The projection optical system PL has a plurality of projection modules for projecting a part of an image in a pattern of the cylindrical mask DM. For example, in Fig. 2, three projection modules (projection optical systems) PL1, PL3 and PL5 are arranged at regular intervals in the Y direction on the left side of the center plane P3, (Projection optical systems) PL2, PL4, and PL6 are arranged at regular intervals in the Y direction.

In the multi-lens type exposure apparatus EX, the Y-direction end portions of the regions (projection regions PA1 to PA6) exposed by the plurality of projection modules PL1 to PL6 are overlapped with each other by scanning, The entire image of the desired pattern is projected. Such an exposure apparatus EX is effective in reducing the size of the pattern on the cylindrical mask DM in the Y direction and increasing the size of the pattern on the cylindrical mask DM even when the necessity arises to handle the substrate P having a large width in the Y direction, And the module on the side of the lighting device IU corresponding to the projection module PL is sufficient in the Y direction so that it is possible to easily cope with the enlargement of the panel size (the width of the substrate P) have.

The exposure apparatus EX may not be a multi-lens system. For example, even when the dimension of the substrate P in the width direction is small to some extent, the exposure apparatus EX can project an image of the entire width of the pattern onto the substrate P by one projection module Okay. The plurality of projection modules PL1 to PL6 may project a pattern corresponding to one device, respectively. That is, the exposure apparatus EX may project the patterns for a plurality of devices in parallel by a plurality of projection modules.

The lighting device IU of the present embodiment includes a light source device 13 and an illumination optical system. The illumination optical system has a plurality of (for example, six) illumination modules IL aligned in the Y-axis direction corresponding to each of the plurality of projection modules PL1 to PL6. The light source device 13 includes, for example, a lamp light source such as a mercury lamp or a solid light source such as a laser diode or a light emitting diode (LED). The illumination light emitted by the light source device 13 may be, for example, a bright line (g line, h line or i line) emitted from a lamp light source, external light (DUV light) such as KrF excimer laser light (wavelength 248 nm) And laser light (wavelength: 193 nm). The illuminating light emitted from the light source device 13 is uniformly distributed in the illuminance distribution and is distributed to a plurality of illumination modules IL via a light guiding member such as an optical fiber.

Each of the plurality of illumination modules IL includes a plurality of optical members such as a lens. In the present embodiment, light emitted from the light source device 13 and passing through any one of the plurality of illumination modules IL is referred to as an illumination luminous flux EL1. Each of the plurality of illumination modules IL includes, for example, an integrator optical system, a rod lens, a fly eye lens, and the like. The illumination luminous flux EL1 of uniform illumination distribution, (IR). In the present embodiment, the plurality of illumination modules IL are arranged inside the cylindrical mask DM. Each of the plurality of illumination modules IL illuminates each illumination area IR of the mask pattern formed on the outer peripheral surface of the cylindrical mask DM from the inside of the cylindrical mask DM.

Fig. 3 is a diagram showing the arrangement of the illumination area IR and the projection area PA in the present embodiment. 3 shows a plan view (left side view in Fig. 3) of the illumination area IR on the cylindrical mask DM arranged on the first drum member 21 viewed from the -Z side, (The right side view in Fig. 3) of the projection area PA on the substrate P arranged on the + Z side. Symbol Xs in Fig. 3 indicates the rotational direction (moving direction) of the first drum member 21 or the second drum member 22. [

The plurality of illumination modules IL illuminate the first to sixth illumination regions IR1 to IR6 on the cylindrical mask DM, respectively. For example, the first illumination module IL illuminates the first illumination area IR1, and the second illumination module IL illuminates the second illumination area IR2.

Although the first illumination region IR1 is described as an elongated trapezoidal region in the Y direction, in the case of a projection optical system having a configuration for forming an intermediate upper surface (intermediate image surface), such as a projection optical system (projection module) PL It is possible to arrange a field cooking cavity having a trapezoidal opening at the position of the intermediate phase, so that it may be a rectangular region including the trapezoidal opening. The third illumination region IR3 and the fifth illumination region IR5 are regions having the same shape as the first illumination region IR1 and are arranged at regular intervals in the Y axis direction. The second illumination area IR2 is a trapezoidal (or rectangular) area symmetrical to the first illumination area IR1 with respect to the center plane P3. The fourth illumination region IR4 and the sixth illumination region IR6 are regions having the same shape as the second illumination region IR2 and are arranged at regular intervals in the Y axis direction.

As shown in Fig. 3, each of the first to sixth illumination regions IR1 to IR6 includes a trapezoidal illumination region adjacent to the first surface P1, (I.e., oblique portions) overlap each other (overlap each other). The first area A1 on the cylindrical mask DM passing through the first illumination area IR1 by the rotation of the first drum member 21 is located on the side of the first drum member 21, Partially overlaps with the second area A2 on the cylindrical mask DM passing through the second illumination area IR2 by rotation.

In the present embodiment, the cylindrical mask DM includes a pattern formation region A3 in which a pattern is formed and a pattern non-formation region A4 in which no pattern is formed. The pattern non-formation area A4 is arranged so as to surround the pattern formation area A3 in a frame shape, and has a characteristic of shielding the illumination luminous flux EL1. The pattern forming area A3 of the cylindrical mask DM moves in the moving direction Xs along with the rotation of the first drum member 21 and each partial area of the pattern forming area A3 in the Y- And passes through any one of the first to sixth illumination regions IR1 to IR6. In other words, the first to sixth illumination regions IR1 to IR6 are arranged so as to cover the entire width of the pattern formation region A3 in the Y-axis direction.

As shown in Fig. 2, each of the plurality of projection modules PL1 to PL6 arranged in the Y-axis direction corresponds to each of the first to sixth illumination modules IL one to one, Projects an image of a partial pattern of the cylindrical mask DM appearing in the illumination area IR illuminated by the module onto each projection area PA on the substrate P. [

For example, the first projection module PL1 corresponds to the first illumination module IL and includes a first illumination module IR1 (see FIG. 3) illuminated by the first illumination module IL The image of the pattern of the mask DM is projected onto the first projection area PA1 on the substrate P. [ The third projection module PL3 and the fifth projection module PL5 correspond to the third and fifth illumination modules IL, respectively. The third projection module PL3 and the fifth projection module PL5 are disposed at positions overlapping with the first projection module PL1 when viewed from the Y-axis direction.

The second projection module PL2 corresponds to the second illumination module IL and is a cylindrical mask in the second illumination area IR2 (see Fig. 3) illuminated by the second illumination module IL DM onto the second projection area PA2 on the substrate P. The second projection area PA2 on the substrate P is projected onto the second projection area PA2. The second projection module PL2 is disposed at a symmetrical position with respect to the first projection module PL1 with respect to the Y-axis direction, with the central plane P3 therebetween.

The fourth projection module PL4 and the sixth projection module PL6 are arranged corresponding to the fourth and sixth illumination modules IL respectively and the fourth projection module PL4 and the sixth projection module PL6, Is disposed at a position overlapping with the second projection module PL2 when viewed from the Y-axis direction.

In the present embodiment, the light from the respective illumination modules IL of the lighting device IU to the respective illumination areas IR1 to IR6 on the cylindrical mask DM is taken as the illumination luminous flux EL1. It is also possible to correct the intensity distribution modulated in accordance with the partial pattern of the cylindrical mask DM appearing in each of the illumination areas IR1 to IR6 and to enter the respective projection modules PL1 to PL6 to reach the respective projection areas PA1 to PA6 , And an imaging light flux EL2. As shown in Fig. 2, principal rays passing through the center points of the projection areas PA1 to PA6 out of the imaging light fluxes EL2 reaching the respective projection areas PA1 to PA6, (Specific position) of the angle? In the circumferential direction with the center plane P3 therebetween as viewed from the second central axis AX2.

The image of the pattern in the first illumination area IR1 is projected onto the first projection area PA1 and the image of the pattern in the third illumination area IR3 is projected onto the first projection area PA1 as shown in Fig. And the third projection area PA3, and the image of the pattern in the fifth illumination area IR5 is projected onto the fifth projection area PA5. In the present embodiment, the first projection area PA1, the third projection area PA3, and the fifth projection area PA5 are arranged in a line in the Y-axis direction.

The image of the pattern in the second illumination area IR2 is projected onto the second projection area PA2. In the present embodiment, the second projection area PA2 is disposed symmetrically with respect to the first projection area PA1 with respect to the center plane P3 as viewed from the Y-axis direction. The image of the pattern in the fourth illumination area IR4 is projected to the fourth projection area PA4 and the image of the pattern in the sixth illumination area IR6 is projected onto the fourth projection area PA4, And is projected onto the area PA6. In the present embodiment, the second projection area PA2, the fourth projection area PA4, and the sixth projection area PA6 are arranged in a line in the Y-axis direction.

Each of the first to sixth projection areas PA1 to PA6 is a projection area adjacent to each other in the direction parallel to the second central axis AX2 when viewed along the circumferential direction of the second surface P2 (The triangular part of the trapezoid) of the first and second electrodes are overlapped with each other. The third area A5 on the substrate P passing through the first projection area PA1 due to the rotation of the second drum member 22 is rotated by the rotation of the second drum member 22, Partially overlaps with the fourth region A6 on the substrate P passing through the second projection area PA2. The first projection area PA1 and the second projection area PA2 are arranged so that the exposure amount in the region where the third region A5 and the fourth region A6 overlap is substantially equal to the exposure amount in the non- So that respective shapes and the like are set. The first to sixth projection areas PA1 to PA6 are arranged so as to cover the entire width of the exposure area A7 exposed on the substrate P in the Y direction.

Next, the detailed configuration of the projection optical system PL of the present embodiment will be described with reference to Fig. In the present embodiment, each of the second projection module PL2 to the fifth projection module PL5 has the same configuration as the first projection module PL1. Therefore, the configuration of the first projection module PL1 will be described on behalf of the projection optical system PL, and the description of the second to fifth projection modules PL2 to PL5 will be omitted.

The first projection module PL1 shown in Fig. 4 includes a first optical system 41 that forms an image of a pattern of a cylindrical mask DM arranged in the first illumination area IR1 on the intermediate image plane P7, And a second optical system 42 for re-coupling at least part of the intermediate image formed by the first optical system 41 to the first projection area PA1 of the substrate P and an intermediate image plane P7 for forming the intermediate image And a first visual field stop (43).

The first projection module PL1 is provided with a focus correction optical member 44, an image shift correction optical member 45, a rotation correction mechanism 46 and a magnification correction optical member 47. [ The focus correction optical member 44 is a focus adjustment device for finely adjusting the focus state of a pattern image of a mask formed on the substrate P (hereinafter, referred to as 'projection image'). The image-shift correcting optical member 45 is a shift adjusting device for slightly shifting the projected image in the image plane. The magnification-correcting optical member 47 is a magnification-adjusting device for microscopically correcting the magnification of the projected image. The rotation correction mechanism 46 is a shift adjustment device for slightly rotating the projected image within the image plane.

The imaging light flux EL2 from the pattern of the cylindrical mask DM is emitted from the first illumination area IR1 in the normal direction D1 and passes through the focus correction optical member 44, Is incident on the member (45). The image forming beam EL2 transmitted through the image shift correcting optical member 45 is incident on the first reflecting surface (flat mirror) p4 of the first deflecting member 50, which is an element of the first optical system 41 Passes through the first lens group 51 and is reflected by the first concave mirror 52 and again passes through the first lens group 51 to reach the second reflecting surface of the first reflecting member 50 Mirror) p5, and is incident on the first field stop 43. The image forming light beam EL2 having passed through the first field stop 43 is reflected by the third reflecting surface (flat mirror) p8 of the second deflecting member 57, which is an element of the second optical system 42, (Plane mirror) p9 of the second biasing member 57 through the second lens group 58. The second mirror group 58 passes through the second lens group 58 and is reflected by the second concave mirror 59, And enters the optical element 47 for magnification correction. The imaging light flux EL2 emitted from the optical element 47 for magnification correction is incident on the first projection area PA1 on the substrate P so that the image of the pattern appearing in the first illumination area IR1 1 projection area PA1.

The radius r1 of the cylindrical mask DM shown in Fig. 2 and the radius r2 of the cylindrical surface of the substrate P wrapped around the second drum member 22 are equal to each other and the radii r1 and r2 are the same The principal ray of the imaging light flux EL2 on the mask side of each of the projection modules PL1 to PL6 is inclined so as to pass through the rotation center line AX1 of the cylindrical mask DM, Becomes equal to the inclination angle &amp;thetas; (theta [theta] with respect to the center plane P3) of the principal ray of the imaging light flux EL2.

The angle? 3 formed by the third reflecting surface p8 of the second deflecting member 57 with the second optical axis AX4 is set such that the second reflecting surface p5 of the first deflecting member 50 is parallel to the first optical axis AX3, Is substantially equal to the angle &amp;thetas; The angle? 4 formed by the fourth reflecting surface p9 of the second biasing member 57 with the second optical axis AX4 is set such that the first reflecting surface p4 of the first biasing member 50 is parallel to the first optical axis AX3). The angle? 1 of the first reflecting surface p4 of the first deflecting member 50 shown in FIG. 4 with respect to the first optical axis AX3 is made smaller than 45 degrees by ?? 1 in order to impart the above-described inclination angle? The angle? 4 of the fourth reflecting surface p9 of the biasing member 57 with respect to the second optical axis AX4 is made smaller than 45 degrees by? 4. ?? 1 and ?? 4 are set to a relationship of ?? 1 = ?? 4 = ?? / 2 with respect to the angle? Shown in FIG.

Fig. 5 is a perspective view of a rotary drum applied to the processing apparatus (exposure apparatus) of Fig. 2; Fig. Fig. 6 is a perspective view for explaining the relationship between the detection probe and the reading device applied to the processing apparatus (exposure apparatus) of Fig. 2; Fig. 7 is an explanatory view for explaining the position of the reading apparatus, as viewed in the direction of the rotation center line AX2, of the scale original SD according to the first embodiment. 5, only the second to fourth projection areas PA2 to PA4 are shown for convenience, and the first, fifth, and sixth projection areas PA1, PA5, and PA6 are omitted.

The second detector 35 shown in Fig. 2 optically detects the rotational position of the second drum member 22 and includes a scale original SD having a high degree of circularity (scale member) SD, (EN1, EN2, EN3, EN4, EN5) which is a recording / reproducing apparatus.

The scale original SD is fixed to the end of the second drum member 22 orthogonal to the rotation axis ST of the second drum member 22. [ For this reason, the original scale SD is integrally rotated together with the rotation axis ST around the rotation center line AX2. On the outer circumferential surface of the scale original disk SD, for example, a scale (grid) is engraved as a scale part GP. The scale part GP is arranged in an annular shape along the circumferential direction in which the second drum member 22 rotates and the rotation axis ST (the second central axis AX2) As shown in FIG. The encoder heads EN1, EN2, EN3, EN4 and EN5 are arranged around the scale portion GP as viewed from the rotation axis ST (second central axis AX2). The encoder heads (EN1, EN2, EN3, EN4, EN5) are arranged opposite to the schedule part (GP) and can read the schedule part (GP) in a noncontact manner. The encoder heads EN1, EN2, EN3, EN4 and EN5 are arranged at different positions in the circumferential direction of the second drum member 22. [

The encoder heads EN1, EN2, EN3, EN4 and EN5 are reading apparatuses having measurement sensitivity (detection sensitivity) for variations in the displacement of the tangential direction (XZ plane) of the scale part GP. Le 2, Le 3, Le 4, and Le 5) of the encoder heads EN 1, EN 2, EN 3, EN 4, and EN 5 are set as the mounting orientation lines Le 1, Le 2, Le 3, Le 4 and Le 5), the encoder heads EN 1 and EN 2 are arranged such that the mounting diagonal lines Le 1 and Le 2 are at an angle of ± θ ° with respect to the center plane P 3, as shown in FIG. In this embodiment, for example, the angle [theta] is 15 [deg.].

The projection modules PL1 to PL6 shown in Fig. 4 are the processing sections of the exposure apparatus EX that perform the irradiation processing for irradiating the substrate P with the substrate P as an object to be processed. In the exposure apparatus EX, principal rays of two imaging light beams EL2 are incident on the substrate P with respect to the substrate P. The projection modules PL2, PL4 and PL6 are subjected to the second processing section and the principal rays of the two imaging light beams EL2 are incident on the substrate P P is a specific position for performing irradiation processing for irradiating the substrate P with light. The specific position is a position in the circumferential direction of the substrate P on the curved surface on the second drum member 22 as seen from the second central axis AX2 of the second drum member 22, As shown in Fig. The installation diagonal line Le1 of the encoder head EN1 is the center plane of the principal ray passing through the center point of each projection area (projection visual field) PA1, PA3, PA5 of the odd-numbered projection modules PL1, PL3, PA3 and PA6 of the even-numbered projection modules PL2, PL4, and PL6, and the inclination angle? Of the encoder head EN2 with respect to the projected areas PA2, PA4, and PA6 of the even- Of the principal ray passing through the center point of the main ray P3. Therefore, the encoder head EN1 becomes a readout device that reads out the schedule part GP located in the direction connecting the first specific position PX1 and the second central axis AX2. The encoder head EN2 is a reading device that reads a part of the schedule GP located in a direction connecting the second specific position PX2 and the second central axis AX2.

The encoder head EN4 is disposed at the rear side in the conveying direction of the substrate P, that is, in front of the exposure position (projection area), and guides the encoder head EN1 toward the rear side in the conveying direction of the substrate P Is set on the mounting diagonal line Le4 that is the rotation of the mounting diagonal line Le1 around the axis of the rotation center line AX2. The encoder head EN5 is mounted on an installation diagonal line Le5 that is rotated about the axis of the rotation center line AX2 toward the rear side in the conveying direction of the substrate P .

The encoder head EN3 is disposed on the opposite side with respect to the encoder head EN1 and EN2 with the rotation center line AX2 interposed therebetween and the mounting diagonal line Le3 is set on the center plane P3 .

The scale master SD, which is a scale member, is made to have a diameter as large as possible (for example, 20 cm or more in diameter) in order to increase measurement resolution using metal, glass, ceramics or the like having low thermal expansion as a base material. 5 shows the diameter of the scale disk SD to be smaller than the diameter of the second drum member 22. The diameter of the outer circumferential surface of the second drum member 22 on which the substrate P is wound , The diameter of the scale part GP of the scale original SD is made to coincide with (almost coincides with) the diameter, so that the so-called Abbe error can be made smaller.

The minimum pitch of the gratings (gratings) engraved in the circumferential direction of the grating portion GP is limited by the performance of the grating marking device for machining the scale master SD. Therefore, if the diameter of the original scale SD is increased, the angular measurement resolution corresponding to the minimum pitch can be increased accordingly.

The direction of the mounting diagonal lines Le1 and Le2 in which the encoder heads EN1 and EN2 for reading the scale part GP are disposed is determined from the rotation center line AX2 when the angle of the imaging light beam EL2 with respect to the substrate P By making the principal ray be in the same direction as the direction in which the principal ray of light enters the substrate P, by the slight rattling (about 2 mu m to 3 mu m) of the bearing (bearing) supporting the rotation axis ST, Even if the member 22 is shifted in the X direction, the positional errors with respect to the conveying direction Xs of the substrate P that may occur in the projection areas PA1 to PA6 due to this shift are detected by the encoder heads EN1 and EN2, It is possible to measure with high precision.

An image of a part of the mask pattern projected by the projection optical system PL shown in Fig. 2 and an image of a part of the mask pattern projected by the projection optical system PL are superimposed on a part of the substrate P supported on the curved surface of the second drum member 22, Alignment microscopes AMG1 and AMG2 for detecting alignment marks or the like formed in advance on the substrate P are provided in order to relatively align (align) the substrate P. [ The alignment microscopes AMG1 and AMG2 include a detection probe for detecting a specific pattern formed on the substrate P in discrete or continuous form and a detection region for detecting a detection region formed by the detection probe on the substrate P The second drum member 22 is disposed on the rear side in the conveying direction of the second drum member 22. [

As shown in Fig. 6, the alignment microscopes AMG1 and AMG2 have a plurality of (for example, four) detection probes arranged in a line in the Y-axis direction (the width direction of the substrate P). The alignment microscopes AMG1 and AMG2 are capable of constantly observing or detecting alignment marks formed near both ends of the substrate P by the detection probes at both side ends of the second drum member 22 in the Y axis direction. The alignment microscopes AMG1 and AMG2 are detection probes other than both ends in the Y-axis direction (width direction of the substrate P) of the second drum member 22, for example, on the substrate P It is possible to observe or detect an alignment mark formed on a blank portion or the like between a plurality of pattern formation regions of a display panel formed along a long direction.

6 and 7, the observation direction AM1 (toward the second central axis AX2) of the substrate P by the alignment microscope AMG1, when viewed from the rotation center line AX2 in the XZ plane, The encoder head EN4 is disposed on the mounting diagonal line Le4 which is set in the radial direction of the scale part GP so as to be in the same direction as the detection center of the scale part GP. It is also preferable that the direction of the detection axis AM2 of the substrate P by the alignment microscope AMG2 (facing the rotation center line AX2) (when viewed from the rotation center line AX2) An encoder head EN5 is arranged on an installation diagonal line Le5 set in the radial direction of the part GP. As described above, the detection probes of the alignment microscopes AMG1 and AMG2 are arranged around the second drum member 22 as viewed from the second central axis AX2, and the position where the encoder heads EN4 and EN5 are disposed, And the direction in which the center axis AX2 is connected (the mounting diagonal lines Le4 and Le5) are arranged so as to coincide with the direction connecting the second central axis AX2 with the detection areas of the alignment microscopes AMG1 and AMG2. The position in the circumferential direction of the rotation center line AX2 where the alignment microscopes AMG1 and AMG2 and the encoder heads EN4 and EN5 are disposed is set at a position at which the substrate P starts to contact the second drum member 22 Between the second drum member 22 and the releasing position OA where the substrate P is separated from the second drum member 22. [

The observation direction AM2 of the above-described alignment microscope AMG2 is disposed on the front side in the carrying direction of the substrate P, that is, behind the exposure position (projection area) (Formed in an area within several tens of micrometers to several hundreds of micrometers) of alignment mark formed on the substrate P in a state in which the substrate P is being fed at a predetermined speed, The image of the mark is sampled at a high speed. The mark position of the alignment mark on the substrate P and the mark position of the second drum member 22 on the substrate P are stored by storing the rotation angle position of the scale master SD sequentially measured by the encoder head EN5, And the rotation angle position of the rotation angle .alpha.

On the other hand, the observation direction AM1 of the alignment microscope AMG1 described above is arranged on the rear side in the carrying direction of the substrate P, that is, in front of the exposure position (projection area) An image of an alignment mark (formed in an area within a range of several tens of mu m to several hundreds of micrometers) formed near the edge is sampled at a high speed by an imaging device or the like in the same manner as the alignment microscope AMG2, The relationship between the mark position of the alignment mark on the substrate P and the rotational angle position of the second drum member 22 is obtained by storing the rotation angle position of the original scale SD sequentially measured by the encoder EN4 Is obtained.

When the mark detected by the alignment microscope AMG1 is detected by the alignment microscope AMG2 and the angular position measured and stored by the encoder head EN4 and the angular position measured and stored by the encoder head EN5 The difference is compared with the opening angles of the mounting alignment lines Le4 and Le5 of the two alignment microscopes AMG1 and AMG2 which are precisely calibrated in advance. If the opening angle has an error, there is a possibility that the substrate P is slightly slipped on the second drum member 22 between the entering position IA and the leaving position OA, (Circumferential direction) or in a direction parallel to the second central axis AX2 (Y-axis direction).

In general, the positional error at the time of patterning is determined according to the degree of fine patterning of the device pattern formed on the substrate P and the degree of overlapping with each other. For example, In order to overlap and expose, only a position error of about +/- 2 mu m in terms of an error of a few minutes or less, that is, a size on the substrate P is allowed.

In order to realize such high-precision measurement, the measurement direction of the mark image (the tangential direction of the outer circumference of the second drum member 22 in the XZ plane) by each of the alignment microscopes AMG1 and AMG2, It is necessary to match the measurement directions of the encoder heads EN4 and EN5 (the outer circumferential tangential direction of the schedules GP in the XZ plane) within an allowable angle error.

As described above, the encoder heads EN4 and EN5 are arranged so as to coincide with the alignment direction of the alignment mark on the substrate P by the alignment microscopes AMG1 and AMG2 (the tangential direction of the circumferential surface of the second drum member 22) . For this reason, the second drum member 22 (scale original disk SD) is moved in the XZ plane in the XZ plane at the time of detecting the position of the substrate P (mark) by the alignment microscopes AMG1 and AMG2 It is possible to perform highly precise position measurement with a shift of the second drum member 22 even when shifted in the circumferential direction (tangential direction) orthogonal to the mounting diagonal line Le4 or Le5.

Since the encoder heads EN1 to EN5 are arranged at five locations around the scaled portion GP of the scale original SD as viewed from the second central axis AX2, the appropriate two or three encoder heads It is possible to obtain the roundness (shape distortion) and eccentricity error of the scale part GP of the scale original SD by combining the output of the measured values by the calculation process.

<Temperature control device>

The substrate P is moved in the transport direction (circumferential direction) or in the direction parallel to the second central axis AX2 (Y axis direction) by the temperature environment inside the processing apparatus U3, as described above, In some cases. The expansion and contraction is determined by the material properties of the substrate P and includes a material that elongates in accordance with an increase in the temperature of the substrate P and a material that shrinks in accordance with an increase in temperature of the substrate P. [ 8 is an explanatory view for explaining the temperature control device according to the first embodiment. 2, the temperature regulating device 60 is configured such that the upstream side in the carrying direction of the substrate P passing through the first specified position PX1, the specified position PX and the second specified position PX2 is set to a temperature . The processing apparatus U3 is operated to change the temperature of the second drum member 22 from the end of the temperature adjustment of the temperature regulating device 60 of the substrate P on which the first guide member 31 and the second guide member 32 are guided, It is preferable that the length of the conveyance to the entry position IA is as short as possible. However, the length may be determined depending on the difference between the temperature set by the temperature regulating device 60 and the temperature of the second drum member 22. [ For example, since the second drum member 22 generally has a large heat capacity and takes a long time to change the set temperature, the second drum member 22 is maintained at a constant temperature, The temperature control is always continued by the regulating device 73. The temperature set in the temperature regulating device 60 is determined based on the conveyance distance from the temperature regulating device 60 to the entry position IA, the temperature of the conveying space therebetween, and the speed of the substrate P do. As an example, when the surface temperature of the second drum member 22 is 25 占 폚, the temperature set in the temperature regulating device 60 is set to a time (several seconds) during which the substrate P is moved by the conveying distance (minute) After that, it is set to be completely lowered to 25 캜. However, since the substrate P is generally thin, it is quickly accustomed to the ambient temperature. Therefore, the conveying distance from the temperature regulating device 60 to the entry position IA is made as short as possible, .

The temperature regulating device 60 includes a guide member 61, a medium air blowing member 62, a blowing pressure equalizing member 63, a medium regulating device 71, a heating unit HU, CU). The medium air blowing member 62 blows the medium to the substrate P via a blowing pressure equalizing member 63 of a medium formed of a porous material. The transfer device 9 allows the substrate P to pass through the space 67 between the guide member 61 and the medium air blowing member 62. The medium blowing member 62 blows the supplied medium from the medium regulating device 71 via the medium supply pipe AP to the guide member 61 side. The heating unit HU is a first medium supply unit for supplying a high-temperature medium to the medium regulating device 71 via the medium supply line HH. The cooling unit CU is a second medium supply unit for supplying a low temperature medium having a lower temperature than the high temperature medium of the heating unit HU to the medium regulating device 71 via the medium supply pipe CC. The medium regulating device 71 includes a flow rate regulating valve 72H for regulating the flow rate of the high temperature medium supplied from the medium supply line HH to the medium supply line AP, And a flow rate regulating valve 72C for regulating the flow rate of the low temperature medium supplied to the AP. The flow regulating valve 72H and the flow regulating valve 72C are constituted by, for example, a solenoid valve. The medium regulating device 71 regulates the amount of the high temperature medium passing through the flow rate regulating valve 72H and the amount of the low temperature medium passing through the flow rate regulating valve 72C in accordance with the output of the control signal of the controller 14 , It is possible to change the ratio between the high temperature medium supplied to the medium air blowing member 62 and the low temperature medium. Therefore, the medium regulating device 71 can mix and distribute the high-temperature medium and the low-temperature medium as the medium to be supplied to the medium air blowing member 62. The temperature regulating device 60 can regulate the temperature of the substrate P by circulating the medium of arbitrary temperature around the guide member 61. [ 8 may be provided on the opposite side of the substrate P and the temperature-controlled medium may be provided on the opposite side of the substrate P via the same member as the medium supply pipe AP, Or may be blown to the opposite side.

The substrate holding member temperature regulating device 73 is a device for regulating the temperature of the second drum member 22 which is the substrate supporting member. The substrate support member temperature regulating device 73 includes a flow rate regulating valve 74H for regulating the flow rate of the high temperature medium supplied from the medium supply line HH to the medium supply line AD, And a flow rate regulating valve 74C for regulating the flow rate of the low temperature medium supplied to the medium supply pipe AD. The flow regulating valve 74H and the flow regulating valve 74C are constituted by, for example, a solenoid. The substrate support member temperature regulator 73 regulates the amount of the high temperature medium passing through the flow rate regulating valve 74H and the amount of the low temperature medium passing through the flow rate regulating valve 74C in accordance with the output of the control signal of the controller 14 The ratio between the high temperature medium supplied to the second drum member 22 and the low temperature medium can be changed. Therefore, the substrate supporting member temperature adjusting device 73 mixes the high-temperature medium and the low-temperature medium as the medium to be fed into the second drum member 22, 2 drum member 22, as shown in Fig. The substrate holding member temperature regulating device 73 is preferably controlled by the control device 14 so as to keep the temperature of the second drum member 22 constant. The thermal capacity to be transferred to the substrate P in contact with the curved surface of the second drum member 22 is kept substantially constant and the state of expansion and contraction of the substrate P in the curved surface of the second drum member 22 is maintained Can be stabilized.

The temperature regulating device 60 and the substrate supporting member temperature regulating device 73 are devices for supplying the temperature adjusted medium to the substrate P or the second drum member 22, And the temperature of the substrate P or the second drum member 22 may be adjusted by radiating heat. The medium regulating device 71 and the substrate supporting member temperature regulating device 73 may be constituted by, for example, a combination of a heater and a radiating fin.

The temperature measuring device T1 for detecting the temperature of the substrate P before being conveyed to the guide member 61 is capable of outputting the detection result to the control device 14. [ The control device 14 can feed-forward control the temperature regulating device 60 based on the detection result of the temperature measuring device T1. The temperature measuring device T2 for detecting the temperature of the substrate P after passing through the temperature adjusting device 60 (guide member 61) is capable of outputting the detection result to the control device 14 have. The temperature control device 60 can be feedback-controlled based on the detection result of the temperature measurement device T2. The control device 14 controls the temperature of the medium blown from the medium blowing member 62 by controlling at least one of the feedforward control and the feedback control of the temperature control device 60, It is possible to increase the precision of the temperature applied to the substrate. For example, the temperature measuring apparatuses T1 and T2 can use a non-contact type infrared thermometer for measuring the amount of infrared rays radiated by the substrate P, or the like.

8, when the substrate P is passed through the space 67 between the guide member 61 and the medium air blowing member 62, the guide member 61 is provided with a support mechanism It is preferable to provide the above- The medium blowing member 62 sends the medium from the medium supply pipe AP to the blowing pressure equalizing member 63 via the through hole AH which is opened to the position in the blowing pressure equalizing member 63 . Since the airflow pressure equalizing member 63 is, for example, a porous material, the medium is ejected on the opposing face 63S on the substrate P side so that the medium pressure per unit area becomes uniform. The guide member 61 is provided with a regulating member 64 that presses the end of the substrate P in the Y direction (width direction) and a regulating member 65. The regulating member 64, In the width direction of the substrate P when the substrate P is transported. The regulating member 65 is fixed to the inner surface of the guide member 61 via a bearing BE. The regulating member 64 is connected to the magnet VCMm of the voice coil motor 66 via a spring SS. The position of the magnet VCMm in the Y direction changes in accordance with the current flowing in the coil VCMc of the voice coil motor 66 and the voice coil motor 66 can change the position of the substrate P in the Y direction have.

As shown in Fig. 2, an alignment microscope PMG1 for detecting an alignment mark or the like formed in advance on the substrate P is provided in the inside of the temperature regulating device 60 or on the exit side in the carrying direction. (For example, four) detection probes aligned in a line in the Y direction (width direction of the substrate P) of the alignment microscope PMG1. 9 is an explanatory view for explaining an example of alignment marks. The alignment microscope PMG1 shown in Fig. 2 is a detection probe at both side ends in the Y direction of the guide member 61, and an alignment mark ma formed near both ends of the substrate P shown in Fig. Can be constantly observed or detected.

10 is an explanatory diagram schematically illustrating an example of a change in alignment mark caused by elongation and contraction of a substrate. 11 is a flowchart showing an example of a procedure for correcting the processing of the processing apparatus (exposure apparatus) according to the first embodiment. As shown in Fig. 10, the alignment microscope AMG1 is a first detection probe, and the alignment mark ma is set within the range of the microscopic field of view (imaging range) mam in the observation direction (detection direction) AM1 . Similarly, the alignment microscope PMG1 detects the alignment mark ma within the range of the microscopic field of view (imaging range) map in the detection direction PM1 as the second detection probe. Thus, the alignment microscope AMG1 and the alignment microscope PMG1 detect the alignment mark ma, which is a specific pattern on the substrate P shown in Fig. 10 (step S11). The alignment microscope AMG1 outputs the image of the alignment mark ma to the control device 14 and the control device 14 and the alignment microscope AMG1 output the alignment mark ma as the first pattern detection device. And stored in the storage unit of the control device 14 as the image pickup data. The alignment microscope PMG1 outputs the image of the alignment mark ma to the control device 14 and the control device 14 and the alignment microscope PMG1 output the alignment mark ma as the second pattern detection device. And stored in the storage unit of the control device 14 as the image pickup data.

Next, by comparing the imaging data of the alignment mark ma of the microscope field of view (map) stored in the memory unit with the imaging data of the alignment mark ma of the microscope field of view (imaging range) mam, If there is no change in the image pickup data of the alignment mark ma due to elongation and contraction of the substrate P (step S12, No), the control device 14 executes the processing of step S11. As shown in Fig. 10, the image pickup data of the alignment mark ma of the microscope field of view (image pickup range) map and the image pickup data of the alignment mark ma of the microscopic field of view (image pickup range) (Step S12, Yes), the control device 14 advances the processing to step S13. In step S13, the control device 14 determines whether or not there is a change in the image pickup data of the alignment mark ma due to elongation and contraction of the substrate P. For example, when there is a change in the image pickup data of the alignment mark ma due to elongation and contraction of the substrate P, the change? M of the image pickup data of the alignment mark ma shown in Fig. Image shift correcting optical member 45 allows the projected image to be slightly laterally shifted within the image plane. Or when there is a change in the image pickup data of the alignment mark ma caused by elongation and contraction of the substrate P, the change? M of the image pickup data of the alignment mark ma is permitted by the magnification- A magnification that allows the magnification of the projected image to be slightly corrected, or the like.

Next, the controller 14 controls the temperature of the substrate P in accordance with the material of the substrate P so that the target width PP in the width direction of the substrate P, for example, 60 to control the temperature of the substrate P (step S13). On the basis of the detection results of the temperature measuring devices T1 and T2, the control device 14 continues the temperature adjustment of the substrate P when the temperature of the substrate P does not reach the specific substrate temperature (step S14, No) (step S13 ). Based on the detection results of the temperature measuring devices T1 and T2, the control device 14 proceeds to step S15 when the temperature of the substrate reaches a specific substrate temperature (step S14, Yes).

Next, in the exposure apparatus EX, the above-described image shift adjustment apparatus adjusts the alignment marks ma (specific patterns) obtained by the outputs of the first pattern detection apparatus and the second pattern detection apparatus, The position of the projected image is shifted in accordance with the change? M of the projected image (step S15). Alternatively, the exposure apparatus EX may be configured such that the above-described magnification adjusting apparatus adjusts, according to the change DELTA m of the alignment mark ma (specific pattern) obtained by the outputs of the first pattern detecting apparatus and the second pattern detecting apparatus, , It is also possible to perform correction of the projected image to correct the magnification of the projected image. Alternatively, the exposure apparatus EX may be configured such that the above-described magnification adjusting apparatus and the image shift adjusting apparatus are provided with the alignment marks ma (a) obtained by the outputs of the first pattern detecting apparatus and the second pattern detecting apparatus It is also possible to perform correction of the projected image in which the shift and magnification of the projected image are corrected in accordance with the change? M of the specific pattern.

As described above, the processing apparatus U3 adjusts the temperature of a part of the substrate P before the temperature regulating device 60 is wound on the second drum member 22, ), The expansion and contraction state of the substrate P in the specific position PX or the second specific position PX2 can be stabilized. Therefore, the exposure apparatus EX can precisely perform the process of irradiating the exposure light at the first specific position PX1, the specified position PX, or the second specified position PX2.

By adjusting the temperature of a part of the substrate P before the temperature regulating device 60 is wound on the second drum member 22, the expansion and contraction of the substrate P is controlled by the magnification adjusting device and the image shift adjusting device The image can be suppressed to a range that can be corrected. Therefore, the exposure apparatus EX can precisely perform the process of irradiating the exposure light at the first specific position PX1, the specified position PX, or the second specified position PX2.

In the present embodiment, a substrate holding member temperature regulating device 73 for controlling the temperature of the outer circumferential surface (supporting surface) of the second drum member 22, a temperature regulating device 73 provided on the upstream side of the second drum member 22, It is possible to control the temperature so that a constant temperature difference is given to the substrate P at the specified position of the alignment position and the exposure position and the position on the upstream side with respect to the carrying direction of the substrate P. [ Thus, the amount of expansion and contraction of the substrate P at the time when the substrate P is supported on the second drum member 22 can be adjusted. In this case, the temperature of the substrate P set by the temperature controller 60 is Tu, and the temperature of the substrate P set by the substrate holder temperature controller 73 via the second drum member 22 P is set to Td, Tu> Td, or Tu <Td, and the temperature is controlled so that the difference is almost constant.

(Second Embodiment)

Next, a second embodiment of the processing apparatus according to the present invention will be described with reference to Fig. Fig. 12 is a schematic diagram showing an overall configuration of a processing apparatus (exposure apparatus) according to the second embodiment. In this figure, the same elements as those of the first embodiment are denoted by the same reference numerals, and a description thereof will be omitted.

12, the temperature regulating device 60A has a curved surface (second curved surface) 61S curved at a constant radius r3 from a parallel reference axis BX1 parallel to the second central axis AX2, A guide member 32A in which a part of the substrate P is in contact with the curved surface 61S and a medium regulating device 71 in which a temperature-controlled medium is passed through the space 67 around the guide member 32A . The transport apparatus 9 allows the substrate P to pass through the space 67 between the guide member 32A and the medium air blowing member 62A. The medium blowing member 62A blows the supplied medium from the medium regulating device 71 via the medium supply pipe AP to the guide member 32A side. Since the guide member 32A is curved along the curved surface 61S as viewed from the parallel reference axis BX1, turbulence in the space 67 can be suppressed.

The temperature control device 60A allows the temperature of the medium to be transferred to the substrate P by allowing the temperature controlled medium to flow into the space 67 around the guide member 32A. The guide member 32A has a curved surface 61S in contact with a part of the substrate P so that the substrate P is directly fed from the guide member 32A to the second drum member 22, The distance from the first drum member 32A to the second drum member 22 can be shortened. Therefore, the processing apparatus U3 is configured such that the expansion and contraction state of the substrate P, which is adjusted by the temperature adjustment of the temperature regulating apparatus 60A, is between the temperature regulating apparatus 60A and the second drum member 22 Can be suppressed from being changed.

It is more preferable that the radius r3 of the curved surface 61S of the guide member 32A is equal to the radius r2 of the second drum member 22. [ With this structure, it is possible to make the tension applied to the substrate P wound around the second drum member 22 equal to the tension applied to the substrate P wound around the guide member 32A. As a result, it is possible to suppress the error due to the difference in tension from the change in the alignment mark, and to detect the change in the alignment mark caused by the temperature.

(Third Embodiment)

Next, a third embodiment of the processing apparatus according to the present invention will be described with reference to Fig. Fig. 13 is a schematic diagram showing an overall configuration of a processing apparatus (exposure apparatus) according to the third embodiment. In this figure, the same elements as those of the first embodiment and the second embodiment are denoted by the same reference numerals, and a description thereof will be omitted.

As shown in Fig. 13, in the processing apparatus U3 according to the third embodiment, the medium regulating device 71 is a guide member temperature regulating device for regulating the guide member 32A. The medium regulating device 71 can mix and distribute the high temperature medium and the low temperature medium as the medium to be fed into the guide member 32A. The media control device 71 controls the temperature of the guide member 32A controlled by the control device 14 and transmits the temperature of the guide member 32A to the substrate P in contact with the guide member 32A . Thereby, the heat capacity to be transmitted to the substrate P in contact with the curved surface 61S of the guide member 32A is kept substantially constant.

It is more preferable that the radius r3 of the curved surface 61S of the guide member 32A is equal to the radius r2 of the second drum member 22. [ With this structure, it is possible to make the tension applied to the substrate P wound around the second drum member 22 equal to the tension applied to the substrate P wound around the guide member 32A. The heat capacity to be transferred to the substrate P in contact with the curved surface 61S of the guide member 32A applied by the medium regulating device 71 and the heat capacity to be transferred to the substrate P in contact with the curved surface of the second drum member 22 The accuracy of prediction of the change of the alignment mark in the alignment microscope AMG1 from the alignment mark detected by the alignment microscope PMG1 can be improved by matching the delivered heat capacity.

(Fourth Embodiment)

Next, a fourth embodiment of the processing apparatus according to the present invention will be described with reference to Fig. 14 is a schematic diagram showing the entire configuration of a processing apparatus (exposure apparatus) according to the fourth embodiment. In this figure, the same elements as those of the first to third embodiments are denoted by the same reference numerals, and a description thereof will be omitted. The exposure apparatus EX2 emits an illumination luminous flux EL1 illuminated to the cylindrical mask DM from the light source.

The illumination luminous flux EL1 emitted from the light source is guided to the illumination module IL and when a plurality of illumination optical systems are provided, the illumination luminous flux EL1 from the light source is divided into a plurality of luminous fluxes EL1, And guided to the plurality of lighting modules IL.

Here, the illumination luminous flux EL1 emitted from the light source is incident on the polarizing beam splitters SP1 and SP2. It is preferable that the polarization beam splitter SP1 or SP2 be a light flux in which the incident illumination luminous flux EL1 is all reflected so as to suppress energy loss due to separation of the illumination luminous flux EL1. Here, the polarization beam splitters SP1 and SP2 reflect the light flux that becomes linearly polarized light of S polarized light and transmit the light flux that becomes linearly polarized light of P polarized light. For this reason, the light source emits the illumination light flux EL1, which is the illumination light flux EL1 incident on the polarization beam splitters SP1 and SP2 to be the light flux of linearly polarized light (S polarized light), to the first drum member 21. [ Thus, the light source emits the illumination luminous flux EL1 whose wavelengths and phases coincide with each other.

The polarization beam splitters SP1 and SP2 reflect the illumination luminous flux EL1 from the light source while transmitting the imaging luminous flux (projected luminous flux) EL2 reflected by the cylindrical mask DM. In other words, the illumination luminous flux EL1 from the illumination optical module enters the polarization beam splitter SP1 or SP2 as a reflected luminous flux, and the imaging luminous flux EL2 from the cylindrical mask DM passes through the polarizing beam splitters SP1, SP2 as a transmitted light flux.

Thus, the illumination module IL as the processing unit performs processing for reflecting the illumination luminous flux EL1 with a predetermined pattern (mask pattern) on the cylindrical mask DM as the object to be treated. Thereby, the projection optical system PL allows the projection optical system PL to project an image of the pattern in the illumination area IR on the cylindrical mask DM onto a part of the substrate P Area PA). The exposure apparatus EX2 performs processing for irradiating exposure light to the substrate P at the first specific position PX1 and the second specific position PX2 by the projected light flux reflected by the cylindrical mask DM .

(Fifth Embodiment)

Next, a fifth embodiment of the processing apparatus according to the present invention will be described with reference to Fig. 15 is a schematic diagram showing an overall configuration of a processing apparatus (exposure apparatus) according to the fifth embodiment. In this figure, the same elements as those of the first to fourth embodiments are denoted by the same reference numerals, and a description thereof will be omitted. The exposure apparatus EX3 is provided with a plurality of polygon scanning units PO1 and PO2 and each polygon scanning unit PO is configured to irradiate a beam spot from the ultraviolet laser light source onto the substrate P The beam is modulated (On) based on pattern drawing data (CAD data) by an AOM (Acousto-Optic Modulator) or the like (not shown) while scanning at a high speed in a direction parallel to the rotation center AX2. / Off), the pattern is drawn on the substrate P.

The exposure apparatus EX3 irradiates the substrate P with the exposure light (laser spot) at the first specific position PX1 and the second specific position PX2 without using the cylindrical mask DM, Or may be a method of drawing a pattern using DMD (Digital Micro mirror Device) or SLM (Spatial Light Modulator) instead of spot scanning.

(Sixth Embodiment)

Next, a sixth embodiment of the processing apparatus according to the present invention will be described with reference to Fig. 16 is a schematic diagram showing an overall configuration of a processing apparatus (exposure apparatus) according to the sixth embodiment. In this figure, the same elements as those of the first embodiment are denoted by the same reference numerals, and a description thereof will be omitted.

The exposure apparatus EX4 is a processing apparatus that performs a so-called proximity exposure on the substrate P. [ The exposure apparatus EX4 sets the clearance between the cylindrical mask DM and the second drum member 22 to be small and the illuminator IU directly irradiates the substrate P with the illumination luminous flux EL, Noncontact exposure. In the present embodiment, the second drum member 22 rotates by the torque supplied from the second driving section 36 including an actuator such as an electric motor. A driving roller MGG connected by, for example, a magnetic gear drives the first drum member 21 so as to be opposite to the rotating direction of the second driving portion 36. [ The second driving unit 36 rotates the second drum member 22 and rotates along the driving roller MGG and the first drum member 21 to rotate the first drum member 21 DM) and the second drum member 22 synchronously (synchronously rotate).

The exposure apparatus EX4 also has an encoder head for detecting a position PX6 of a part of the schedule part GP at a specific position where the main light ray of the illumination light flux (image forming light flux) EL is incident on the substrate P, (EN6). Here, since the diameter of the outer circumferential surface on which the substrate P is wound in the outer peripheral surface of the second drum member 22 coincides with the diameter of the scaled portion GP of the scale disc SD, the position PX6, (AX2). &Lt; / RTI &gt; The encoder head EN7 moves the mounting diagonal line Le6 of the encoder head EN6 toward the rear side in the feeding direction of the substrate P about the axis of the rotating center line AX2, (Le7).

The exposure apparatus EX4 of the present embodiment has the encoder head EN7 as the first reading unit and the encoder head EN6 as the second reading unit, , A process of connecting the position of the axis of the second drum member 22 to the specific position and correcting the component of the displacement in the direction orthogonal to the axis by the reading output of the first reading device can be performed.

In the first to sixth embodiments described above, the exposure apparatus is exemplified as the processing apparatus. The processing apparatus is not limited to the exposure apparatus, and the processing section may be an apparatus for printing a pattern on the substrate P as an object to be processed by an inkjet ink dropping apparatus. Alternatively, the processing unit may be an inspection apparatus.

<Device Manufacturing Method>

Next, a device manufacturing method will be described with reference to Fig. 17 is a flowchart showing a device manufacturing method using the processing apparatus (exposure apparatus) according to the first embodiment.

In the device manufacturing method shown in Fig. 17, first, functional and performance design of a display panel by self-luminous elements such as organic EL is performed, and a necessary circuit pattern or wiring pattern is designed by CAD or the like Step S201). Next, on the basis of the pattern for each of various layers designed by CAD or the like, a cylindrical mask DM of the required number of layers is produced (step S202). A supply roll FR1 on which a flexible substrate P (a resin film, a metal thin film, a plastic or the like) to be a base material of the display panel is wound is prepared (step S203). The roll-shaped substrate P prepared in this step S203 may be obtained by modifying the surface of the substrate P if necessary, or by preforming a base layer (for example, fine irregularities by an imprint method) Or a transparent film (insulating material) may be laminated in advance.

Next, a backplane layer constituted by an electrode or wiring, an insulating film, a TFT (thin film semiconductor) or the like constituting the display panel device is formed on the substrate P, and an organic EL Emitting layer (display pixel portion) by the self-luminous element of the light-emitting element is formed (step S204). This step S204 includes a conventional lithography process for exposing the photoresist layer using the exposure apparatuses EX, EX2, EX3, and EX4 described in the above embodiments. However, in place of the photoresist, a photosensitive silane coupling material An exposure process for pattern-exposing the applied substrate P to form a pattern of hydrophilic and hydrophilic properties on the surface, a pattern exposure of a photosensitive catalyst layer and a pattern (wiring, electrode, etc.) of a metal film according to an electroless plating method, Or a printing process for drawing a pattern by a conductive ink containing silver nanoparticles or the like.

Next, for each of the display panel devices which are continuously produced on the substrate P in the roll form, the substrate P is diced or the protective film (the environmental barrier layer ) Or a color filter sheet or the like are bonded to each other to assemble the device (step S205). Next, an inspection process is performed to determine whether the display panel device functions normally or satisfies the desired performance or characteristics (step S206). In this way, a display panel (flexible display) can be manufactured.

1: Device manufacturing system 2: Substrate supply device
3: Substrate collection device 5: Higher control device
9: transfer device 12: mask holding device
13: light source device 14: control device
22: second drum members DR1 to DR8:
31: first guide member 32: second guide member
33: third guide member 35: second detector
44: Focus correction optical member 45: Image shift correction optical member
46: rotation correction mechanism 47: optical member for magnification correction
60, 60A: Temperature control device 61, 32A: Guide member
61S: curved surface 62, 62A: medium air blowing member
63: blowing pressure equalizing member 64, 65: regulating member
66: voice coil motor 67: space
71: medium control device
72H, 72C, 74H, 74C: Flow regulating valve
73: Substrate support member temperature controller
CC: Medium supply piping CU: Cooling unit
HH: Medium supply piping HU: Heating unit
AMG1, AMG2, PMG1: Alignment microscope
DM: Cylindrical mask
EN1, EN2, EN3, EN4, EN5: Encoder head
EX, EX2, EX3, EX4: Exposure apparatus (substrate processing apparatus)
PO1, PO2: polygonal scanning unit

Claims (9)

1. A substrate processing apparatus for forming a pattern for constituting an electronic device on a flexible long substrate,
A substrate support member having a support surface for supporting a part of the substrate in a longitudinal direction and continuously transporting the substrate at a predetermined speed in the longitudinal direction,
A processing device for forming the pattern on the substrate supported by the supporting surface of the substrate supporting member,
Wherein a difference between a temperature of the substrate on the support surface and a temperature of the substrate on the upstream side is set by the processing device on the substrate And a first temperature regulating device for regulating the amount of expansion and contraction of the substrate in accordance with an amount of expansion and contraction of the substrate required for forming the pattern. The method according to claim 1,
Wherein the substrate support member comprises:
The substrate having a cylindrical outer circumferential surface curved in a predetermined radius from the center axis and supporting a part of the substrate in the longitudinal direction along the outer circumferential surface in the form of a cylindrical surface, A substrate processing apparatus which is a rotary drum. The method of claim 2,
In a range of a circumferential direction between an entry position where the substrate starts to contact the outer circumferential surface of the rotary drum and an outward position where the substrate starts to fall away from the outer circumferential surface, A first pattern detecting device for detecting the first pattern,
A second pattern detecting device disposed on an upstream side of the entry position of the rotary drum and detecting the specific pattern formed on the substrate after the temperature is adjusted by the first temperature adjusting device,
And a control device for controlling the first temperature control device based on detection results of the first pattern detection device and the second pattern detection device. The method of claim 3,
And a second temperature regulating device for regulating the temperature of the rotary drum,
Wherein the control device controls the second temperature regulating device so as to keep the temperature of the rotary drum constant. The method of claim 4,
The control device includes:
The temperature of the substrate adjusted by the first temperature adjusting device and the temperature of the substrate adjusted by the second temperature adjusting device are adjusted so that the expansion and contraction amount of the substrate required for forming the pattern on the substrate by the processing device can be obtained. And the temperature of the rotary drum is constant. The method of claim 5,
The processing apparatus has a magnification correction function for microscopically correcting the magnification of the pattern formed on the substrate or a shift correction function for slightly shifting the position of the pattern,
Wherein the control device controls the second temperature regulating device such that the expansion and contraction amount of the substrate required for forming the pattern by the processing device is within an allowable range that can be corrected by the magnification correction function or the shift correcting function, And adjusts the temperature of the rotary drum. The method of claim 6,
Wherein the processing apparatus is a projection exposure apparatus that transfers the pattern formed on a mask to the substrate via a projection optical system including a magnification correction mechanism and an image shift mechanism. The method according to any one of claims 1 to 5,
Wherein the processing apparatus is an exposure apparatus that transfers the pattern formed on a mask to the substrate, or a maskless exposure apparatus that draws a pattern on the substrate based on CAD data of the pattern. The method according to any one of claims 1 to 5,
Wherein the processing apparatus is an apparatus for printing a pattern on the substrate by ink drop (dropping) of the ink jet.

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