KR101827952B1 - Millimeter wave compact radar system - Google Patents

Abstract

Suggested is a millimeter wave subminiature radar system capable of tracking a target by transmitting a signal reflected from the target to a signal processing part through a signal transmission structure. According to the present invention, the system includes: a signal receiving part receiving a signal reflected from a target; a target information generating part generating information about the target based on the reflected signal; a target tracking control part tracking the target based on the information about the target; and a signal transmission structure transmitting the reflected signal to the target information generating part, and including a first part formed between a transmission line and a first wave guide and including a first conductor formed in a part of an edge surface and a first dielectric stacked in the entire internal space surrounded by the first conductor, a second part formed between the first wave guide and second wave guide and including a second conductor formed in a part of an edge surface and a second dielectric stacked in the entire internal space surrounded by the second conductor, and a third part formed between the second wave guide and third wave guide and including a third conductor formed on the entire edge surface.

Description

[0001] The present invention relates to a millimeter wave compact radar system,

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a structure for signal transmission used for transmitting a signal from a microstrip-based transmission line to a waveguide in a millimeter wave system. The present invention also relates to a millimeter-wave ultra small radar system equipped with such a signal transmission structure.

Millimeter wave systems use waveguides for high power transmission and small insertion losses. On the other hand, microstrip-based transmission lines such as microstrip lines and co-planar waveguides (CPW) are widely used in circuit configurations of millimeter wave systems such as MMIC-based circuits and filter designs.

The propagation of the electromagnetic wave in the waveguide mainly proceeds to the TE ₁₀ mode, and the microstrip line or the CPW proceeds to the TEM (Transverse Electro Magnetic wave) mode. Since the characteristics of the waveguide and the transmission line in the PCB substrate are different from each other, a transition structure connecting the two structures is essential.

However, in the conventional invention and research, a structure using mainly an E-probe method or an antenna feeding method of a fin line or a slot line taper has been widely adopted.

However, this method has drawbacks in the ease of design, which is a tuning-oriented design, depending on the use EM simulation, and the bandwidth also has a limited range that can be adjusted according to the user's convenience.

Korean Registered Patent No. 907,271 (Notification Date: July 13, 2009)

SUMMARY OF THE INVENTION The present invention has been made in order to solve the problems described above, and it is an object of the present invention to provide a waveguide structure in which a plurality of parts are divided in consideration of other waveguides located between a transmission line and a waveguide, And to propose a structure for signal transmission in a millimeter wave system in which each part is separately formed.

It is another object of the present invention to provide a millimeter-wave miniature radar system for tracking a target by transmitting a signal reflected from a target to a signal processing unit using the signal transmission structure.

However, the objects of the present invention are not limited to those mentioned above, and other objects not mentioned can be clearly understood by those skilled in the art from the following description.

In order to achieve the above object, the present invention provides a structure for transmitting a signal in a millimeter-wave system, the structure being formed between a transmission line and a first waveguide, A first part including a first conductor and a first dielectric layer laminated on the entire inner space formed by the first conductor; A second part formed between the first waveguide and the second waveguide, the second part including a second conductor formed on the entire circumference of the first waveguide and a second dielectric layer formed on a part of the inner space surrounded by the second conductor; And a third part formed between the second waveguide and the third waveguide, the third part including a third conductor formed on the entire circumference of the third waveguide.

Preferably, the second dielectric is formed to have a smaller width as the second waveguide moves in the first waveguide.

Preferably, the second dielectric is formed so as to have a narrow width at both sides or narrow at one side.

Preferably, the second dielectric is formed with a first width from the first waveguide to a point A between the first waveguide and the second waveguide, and from the point A to the point A, The first waveguide and the second waveguide being formed to have a second width smaller than the first width to a point B located between the first waveguide and the second waveguide, And is formed with a small third width.

Preferably, the second dielectric is formed at a fourth width from the first waveguide to the Dth point located between the first waveguide and the second waveguide, and from the Dth point to the Dth point and the second waveguide, 2 waveguide, the width value is formed to decrease arithmetically or exponentially.

Preferably, the second dielectric is formed to have a fifth width from the first waveguide to an Fth point located between the first waveguide and the second waveguide, and the second dielectric from the Fth point to the Fth point, And a second waveguide located on the opposite side from the first waveguide to the second waveguide, the second waveguide being located between the first waveguide and the second waveguide, Are formed on both sides to a seventh width smaller than the sixth width.

Preferably, the second dielectric is formed at an eighth width from the first waveguide to an I-th point located between the first waveguide and the second waveguide, and the second dielectric from the I- And the width value is formed to decrease arithmetically or exponentially on both sides up to the Jth point located between the two waveguides.

Preferably, the gap between the upper end surface and the lower end surface of the third conductor extends as the third waveguide moves in the direction of the third waveguide.

Preferably, the lower end surface of the third conductor is formed to be lowered in a stepped shape or a ramped shape as the third waveguide moves in the second waveguide.

Preferably, the first conductor includes: a fourth conductor formed on a portion of an upper side of the first part; And a fifth conductor formed on the entire bottom surface of the first part.

Advantageously, the width of the fourth conductor extends on both sides as it approaches the first waveguide at the transmission line.

Preferably, at least one via hole is formed at both ends of the fourth conductor.

Preferably, the first waveguide is formed of a waveguide whose inside is filled with a dielectric, and the second waveguide and the third waveguide are formed of a hollow waveguide.

The present invention also provides a signal processing apparatus comprising: a signal receiving unit for receiving a signal reflected on a target; A target information generating unit for generating information on a target based on the signal reflected on the target; A target tracking controller for tracking a target based on information about the target; And a second conductor formed between the transmission line and the first waveguide, the first conductor being formed on a part of a rim surface and the first conductor being formed to be surrounded by the first conductor, A first part comprising a first dielectric stacked over an inner space; A second part formed between the first waveguide and the second waveguide, the second part including a second conductor formed on the entire circumference of the first waveguide and a second dielectric layer formed on a part of the inner space surrounded by the second conductor; And a third part formed between the second waveguide and the third waveguide, the third part including a third conductor formed on the entire circumference of the third waveguide, and a signal transmission structure including the third part. I suggest.

The present invention can achieve the following effects through the configurations for achieving the above object.

First, the dielectric can be formed in a stepped shape, a tapered shape, or the like, and impedance matching can be effectively performed.

Second, the bandwidth can be efficiently controlled through impedance matching, and design simplification can be provided.

1 is a perspective view of a transition structure interconnecting a microstrip line and a waveguide according to a first embodiment of the present invention.
2 is a plan view of a transition structure interconnecting a microstrip line and a waveguide according to a first embodiment of the present invention.
3 is a cross-sectional view of a transition structure interconnecting a microstrip line and a waveguide according to a first embodiment of the present invention.
4 is a perspective view of a transition structure interconnecting a microstrip line and a waveguide according to a second embodiment of the present invention.
5 is a plan view of a transition structure interconnecting a microstrip line and a waveguide according to a second embodiment of the present invention.
6 is a cross-sectional view of a transition structure interconnecting a microstrip line and a waveguide according to a second embodiment of the present invention.
7 is a conceptual diagram showing the structure of a second dielectric constituting the second part in the transition structure according to the first embodiment of the present invention.
8 is a reference diagram for explaining impedance matching of a transition structure according to the first embodiment of the present invention.
FIG. 9 is a conceptual diagram showing the structure of a second dielectric constituting the fifth part in the transition structure according to the second embodiment of the present invention.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. In the drawings, the same reference numerals are used to designate the same or similar components throughout the drawings. In the following description of the present invention, a detailed description of known functions and configurations incorporated herein will be omitted when it may make the subject matter of the present invention rather unclear. In addition, the preferred embodiments of the present invention will be described below, but it is needless to say that the technical idea of the present invention is not limited thereto and can be variously modified by those skilled in the art.

The present invention relates to the design of transition structures between waveguides and PCB transmission lines for millimeter-wave ultra small radar systems. More specifically, the present invention relates to the design of a transition structure that is connected to a waveguide in a microstrip line, CPW, and the like.

In the present invention, a PCB transmission line such as a microstrip line, a CPW, or the like is transferred to a SIW (dielectric integrated waveguide) or a dielectric waveguide. In the present invention, a dielectric waveguide (or SIW), which is stacked as a dielectric for impedance matching, has a dielectric tapering or stepped shape. According to the present invention, it is possible to adjust the bandwidth by such impedance matching, and it is possible to provide design simplicity.

Hereinafter, the present invention will be described in detail with reference to the drawings.

1 is a perspective view of a transition structure interconnecting a microstrip line and a waveguide according to a first embodiment of the present invention. And FIG. 2 is a plan view of a transition structure interconnecting the microstrip line and the waveguide according to the first embodiment of the present invention.

3 is a cross-sectional view of a transition structure interconnecting a microstrip line and a waveguide according to a first embodiment of the present invention. 3 (a) is a cross-sectional view taken along the line A in Fig. 2, and Fig. 3 (b) is a cross-sectional view taken along line B in Fig. FIG. 3C is a cross-sectional view taken along line C of FIG. 2, and FIG. 3D is a cross-sectional view taken along line D of FIG. Fig. 3 (e) is a cross-sectional view taken along the line E in Fig.

1 and 2, the transition structure 100 of the first embodiment is a structure that is transferred from the microstrip line 140 to the waveguide 170, and includes a first part (Part A) 110, a second part Part B 120) and a third part (Part C 130).

The first part 110 is formed between the microstrip line 140 and the substrate integrated waveguide (SIW) 150 and includes a first dielectric 111 and a first conductor 112.

The first dielectric 111 is filled in the inner space formed by being surrounded by the upper surface, the opposite surface, the lower surface, and the like of the first part 110. The permittivity of the first dielectric 111 can be determined using the following equation.

ε = ε ₀ × ε _r

In the above equation,? Denotes the dielectric constant of the first dielectric 111. ε ₀ denotes the dielectric constant ^{(8.85 × 10 -12 F / m} ) in vacuum or in a free space and, ε _r means a relative dielectric constant of the first dielectric material (111) at room temperature.

The first conductor 112 is made of a metal and is formed on the upper end surface and the lower end surface of the first part 110, respectively. The first conductor 112 formed on the upper end face of the first part 110 and the first conductor 112 formed on the lower end face of the first part 110 are referred to as an a conductor 112a and a b conductor 112b, the b-conductor 112b is formed over the entire surface, whereas the a-conductor 112a is formed on only a part of the surface (see Fig. 3 (a)).

The a conductor 112a is formed in the longitudinal direction from the point where the microstrip line 140 is located to the point where the substrate integrated waveguide 150 is located. In the center of the microstrip line 140, the substrate integrated waveguide 150 One in the direction in which they are located.

And the width of the conductor a 112a becomes wider as it approaches the substrate integrated waveguide 150. The a conductor 112a has a constant width from the microstrip line 140 to the first point 113 located between the microstrip line 140 and the substrate integrated waveguide 150, Integrated waveguide 150 to the substrate-integrated waveguide 150. In this case, At this time, the conductor a 112a may be formed in a structure having increased width on both sides.

On the other hand, the a-conductor 112a gradually increases in width from the first point 113 to the second point 114 located between the first point 113 and the substrate integrated waveguide 150, Integrated waveguide 150 from the second point 114 to the substrate integrated waveguide 150 in the same manner as the first point 112a.

On the other hand, via holes may be formed on both sides of the a-conductor 112a in the direction of the substrate integrated waveguide 150 in the microstrip line 140. The present invention can contribute to achieving better performance by blocking leaked signals in accordance with the presence of such via holes.

It is also possible to form a PCB transmission line instead of the microstrip line 140 in the transition structure 100 of the first embodiment. In this case, the PCB transmission line can be implemented as either a co-planar waveguide (coplanar waveguide) or a substrate integrated waveguide (SIW).

It is also possible to use a substrate-height waveguide in place of the substrate integrated waveguide 150 in the transition structure 100 of the first embodiment. Here, the substrate-height waveguide refers to a substrate waveguide having a thickness of the substrate in which a dielectric is stacked.

The second part 120 is formed between the substrate integrated waveguide 150 and the reduced height waveguide 160 and includes a second dielectric 121 and a second conductor 122. The substrate reduction waveguide 160 refers to a substrate waveguide having a high substrate thickness.

The second dielectric layer 121 is filled in a portion of the internal space formed by the substrate dielectric waveguide (substrate-height waveguide) surrounded by the upper surface, both sides, and the lower surface of the second part 120.

The second dielectric layer 121 is longitudinally formed at a position where the substrate integrated waveguide 150 is located and a substrate reduction waveguide 160 is located. Direction.

And the second dielectric layer 121 is narrowed toward the substrate reducing waveguide 160. A more detailed description of this structural feature of the second dielectric 121 will be described later with reference to FIGS. 7 and 8. FIG.

The second conductor 122 is formed on the upper surface, both sides, and the lower surface of the second part 120, respectively. Unlike the first conductor 112, the second conductor 122 is formed over the entire upper surface, both sides, and the bottom surface of the second part 120 (see FIGS. 3B and 3C).

On the other hand, a part of the inner space of the second part 120 surrounded by the second conductor 122 is filled with the second dielectric 121, and the other space is formed by the vacuum 123 ) Reference).

The third part 130 is formed between the substrate reduction waveguide 160 and the waveguide 170 and includes a third conductor 131. The waveguide 170 may be implemented with either a substrate integrated waveguide (SIW) or a dielectric.

The third conductor 131 may be formed over the entire upper surface, both sides, and the lower surface of the third part 130, like the second conductor 122.

The lower end face of the third part 130 is lowered stepwise when the waveguide 170 moves in a position where the substrate reduction waveguide 160 is located. Accordingly, the inner space of the third part 130 surrounded by the third conductor 131 is gradually widened as the lower end surface of the third part 130 is lowered (FIG. 3 (d) And (e)). The stepwise descent of the lower end surface of the third part 130 means that the lower end surface of the third part 130 descends in a stepped structure.

For example, the height formed by the top and bottom surfaces of the third part 130 may range from the substrate reduction waveguide 160 to the third point 132 located between the substrate reduction waveguide 160 and the waveguide 170 1 and has a second value greater than the first value from the third point 132 to the fourth point 133 located between the third point 132 and the waveguide 170, 133) to the waveguide (170) with a third value larger than the second value.

Meanwhile, the lower end surface of the third part 130 may be gradually lowered when the waveguide 170 moves in a position where the substrate reduction waveguide 160 is located. The lowering of the lower end surface of the third part 130 means that the lower end surface of the third part 130 is lowered in a tapered structure.

Meanwhile, the inner space of the third part 130 surrounded by the third conductor 131 is formed in a vacuum.

4 is a perspective view of a transition structure interconnecting a microstrip line and a waveguide according to a second embodiment of the present invention. And FIG. 5 is a plan view of a transition structure interconnecting the microstrip line and the waveguide according to the second embodiment of the present invention.

6 is a cross-sectional view of a transition structure interconnecting a microstrip line and a waveguide according to a second embodiment of the present invention. Specifically, FIG. 6A is a cross-sectional view taken along the line A in FIG. 5, and FIG. 6B is a cross-sectional view taken along line B of FIG. FIG. 6C is a cross-sectional view taken along line C of FIG. 5, and FIG. 6D is a cross-sectional view taken along line D of FIG. 6 (e) is a sectional view taken along the line E in Fig.

4 and 5, the transition structure 200 of the second embodiment has a structure that is transferred from the microstrip line 140 to the waveguide 170 like the transition structure 100 of the first embodiment, A part 210, a fifth part 220 and a sixth part 230.

The fourth part 210 is formed between the microstrip line 140 and the substrate integrated waveguide 150 and includes a first dielectric 111 and a first conductor 112 like the first part 110 do.

The first part 110 has been described above with reference to FIGS. 1 to 3, and a detailed description thereof will be omitted here.

The fifth part 220 is formed between the substrate integrated waveguide 150 and the substrate reduction waveguide 160 and includes a fifth dielectric 221 and a fifth conductor 222.

The fifth dielectric 221 is filled in a part of the inner space formed by being surrounded by the upper face, both sides, and the lower face of the fifth part 220.

The fifth dielectric 221 is formed in the longitudinal direction to a position where the substrate reduction waveguide 160 is located at a position where the substrate integrated waveguide 150 is located. The substrate dielectric waveguide 150 is formed on both sides (or both ends) 160 are positioned.

Further, the fifth dielectric 221 is characterized in that the width becomes narrower toward the substrate reduction waveguide 160. A more detailed description of this structural feature of the fifth dielectric 221 will be described later with reference to Fig.

The fifth conductor 222 is formed on the upper surface, both sides, and the lower surface of the fifth part 220, respectively. The fifth conductor 222 is formed over the entire upper surface, both side surfaces, and the bottom surface of the fifth part 220, as in the case of the second conductor 122 (see FIGS. 6B and 6C).

Meanwhile, a part of the internal space of the fifth part 220 surrounded by the fifth conductor 222 is filled with the fifth dielectric 221, and the external space is formed of the vacuum 223 ) Reference).

The sixth part 230 is formed between the substrate reduction waveguide 160 and the waveguide 170 and includes the third conductor 131 in the same manner as the third part 130.

The third part 130 has been described above with reference to Figs. 1 to 3, and a detailed description thereof will be omitted here.

Next, the structure of the second dielectric 121 constituting the second part 120 in the transition structure 100 according to the first embodiment of the present invention will be described in detail.

7 is a conceptual diagram showing the structure of a second dielectric constituting the second part in the transition structure according to the first embodiment of the present invention.

The second dielectric layer 121 is formed in the longitudinal direction toward the substrate reduction waveguide 160 in the substrate integrated waveguide 150 as described above. This second dielectric layer 121 is characterized in that its width becomes narrower toward the substrate reduction waveguide 160.

The second dielectric layer 121 may be formed to have a stepwise narrowed width as shown in FIG. 7 (a), and may have a structure having a gradually narrowed width as shown in FIG. 7 (b) .

The second dielectric layer 121 may be formed in a stepped structure in which only the center portion of the second dielectric layer 121 is left as it goes from the substrate integrated waveguide 150 to the substrate reduction waveguide 160.

The second dielectric layer 121 is formed to have a first width from the substrate integrated waveguide 150 to the fifth point 311 located between the substrate integrated waveguide 150 and the substrate reduction waveguide 160, Is formed with a second width smaller than the first width from the fifth point 311 to the sixth point 312 located between the fifth point 311 and the substrate reduction waveguide 160, To a seventh point (313) located between the sixth point (312) and the substrate reduction waveguide (160). At this time, the second dielectric layer 121 may have a reduced width at both sides.

The second dielectric layer 121 may be formed in a tapered structure in which only the center portion of the second dielectric layer 121 is left as it goes from the substrate integrated waveguide 150 to the substrate reduction waveguide 160.

The second dielectric layer 121 is formed to have a constant width from the substrate integrated waveguide 150 to the eighth point 321 located between the substrate integrated waveguide 150 and the substrate reduction waveguide 160, The width may be gradually narrowed from the eighth point 321 to the ninth point 322 located between the eighth point 321 and the substrate reduction waveguide 160. In this case, the second dielectric layer 121 may be formed to have a geometric width narrowing from the eighth point 321 to the ninth point 322 exponentially. In this embodiment, .

8 is a reference diagram for explaining impedance matching of a transition structure according to the first embodiment of the present invention. 8 is a sectional view taken along the line A-A 'in FIG.

In the case of a waveguide stacked with a dielectric, the impedance is generally low and the impedance is high as the dielectric disappears. In the present invention, different impedances of two different parts, such as the relationship between the substrate integrated waveguide 150 in which the dielectric is filled in with the dielectric and the substrate reduction waveguide 160 in which the cavity is empty, are divided into two stepped impedance transformers Impedance matching can be performed using a higher number of stages.

Also, in the present invention, impedance matching can be realized by using various kinds of tapers such as a Klopfenstein taper and a linear taper.

The impedance at the portion A-A ', which is one point of the second part 120, can be obtained using the following equation (1).

Where Z represents the impedance at the A-A 'portion of the second part 120. η is the intrinsic impedance of free space and has a value of 120π. κ ₀ means the intrinsic wave number of free space and is determined by the wavelength in air based on the following equation.

_{κ 0 = 2π / λ = 2πf} / (3 × 10 8)

β means a propagation constant and can be obtained using the following equation (2).

Y ₁ , Y _3, and Y ₁₃ can be obtained using the following equations (3) and (4).

In the case of a waveguide structure in which a dielectric is inserted, various higher-order modes are generated, so that a higher-order mode impedance must be considered. The propagation admittance proceeding at TE _m0 can be represented by Y _m and can be obtained using Equation (3).

On the other hand, if the left and right are symmetric structures, even modes such as TE ₂₀ and TE ₄₀ can not proceed. All modes must be considered for very accurate calculations, but accurate values within 5% error can be obtained even when considering only the two modes that most affect the overall impedance. Therefore, in the present invention, propagation constants are calculated in consideration of only TE ₁₀ and TE ₃₀ modes.

The TE ₃₀ mode is strongly coupled to the TE ₁₀ mode, and the admittance due to the coupling-induced mode can be represented by Y ₁₃ , which can be obtained using the following equation (4).

In the above, a represents the width (width) of the second part 120. And d is the width (width) of the portion where the vacuum is formed when the second dielectric layer 121 is formed at the center of the transition structure 100 according to the first embodiment of the present invention and a vacuum is formed on both sides thereof. That is, d means the shortest distance from one end of the second part 120 to one side of the second dielectric 121.

The impedance matching process is performed by the substrate reduction waveguide 150 in which the width c of the second dielectric layer 121 of the second part 120 is completely filled by the width w of the waveguide a to the substrate reduction waveguide 160, And the impedance is adjusted by adjusting the width c of the dielectric.

For example, if the impedance of the substrate integrated waveguide 150 is 573? And the impedance of the substrate reduction waveguide 160 is 295 ?, using the impedance information according to the dielectric width c calculated by Equations 1 to 4, the Chebyshev impedance matching, impedance matching such as binomial impedance matching, and claw fence taper.

If the quarter-wave transformer is used most simply, the width of the dielectric material c of the second part 120 is determined so as to have an impedance of 411 ?, and the length of the dielectric material may be set to be 1/4?.

An example of the shape of Fig. 7A may be a shape of a two-stage Chebyshev or a binomial impedance matching structure. An example of the shape of Fig. 8B is impedance matching through a taper, Or the like.

In this impedance matching process, it is possible to arbitrarily adjust the size, required band and ripple characteristics required in the system.

Next, the structure of the fifth dielectric 221 constituting the fifth part 220 in the transition structure 200 according to the second embodiment of the present invention will be described in detail.

FIG. 9 is a conceptual diagram showing the structure of a second dielectric constituting the fifth part in the transition structure according to the second embodiment of the present invention.

The fifth dielectric 221 is formed in the longitudinal direction toward the substrate reduction waveguide 160 in the substrate integrated waveguide 150 as described above. The fifth dielectric 221 is divided into two sides closer to the substrate reduction waveguide 160 so that the width of each of the fifth dielectric 221 and the fifth dielectric 221 is narrowed. That is, the fifth dielectric 221 is formed to be limited to both sides as it approaches the substrate reduction waveguide 160.

The fifth dielectric 221 may be formed in a structure in which the widths of the first and second dielectric bodies 221 and 221b are narrowed step by step as shown in FIG. 9 (a). As shown in FIG. 9 (b) 221b may be formed to have a narrow width.

The fifth dielectric 221 may have a stepped structure in which only both portions of the fifth dielectric 221 are left from the substrate integrated waveguide 150 toward the substrate reduction waveguide 160. In this case, .

The fifth dielectric 221 is integrally formed in a fourth width from the substrate integrated waveguide 150 to the tenth point 331 located between the substrate integrated waveguide 150 and the substrate reduction waveguide 160 Then, from the tenth point (331), the a dielectric body (221a) and the b-th dielectric body (221b) are separated on both sides. The a dielectric body 221a and the b dielectric body 221b are formed on the both sides of the fourth point 332 on both sides from the tenth point 331 to the eleventh point 332 located between the tenth point 331 and the substrate reduction waveguide 160, And a fourth width 333 extending from the eleventh point 332 to the twelfth point 333 located between the eleventh point 332 and the substrate reduction waveguide 160, May be formed to have a smaller sixth width. At this time, the a-dielectric 221a and the b-dielectric 221b may be formed to have a reduced width at only one side.

The fifth dielectric 221 may have a tapered structure in which only both portions of the fifth dielectric 221 are left from the substrate integrated waveguide 150 toward the substrate reduction waveguide 160. In this case, As shown in FIG.

The fifth dielectric 221 is formed to have a constant width from the substrate integrated waveguide 150 to the thirteenth point 341 located between the substrate integrated waveguide 150 and the substrate reduction waveguide 160, And is divided into a first dielectric 221a and a second dielectric 221b on both sides from the 13th point 341. The a dielectric body 221a and the b dielectric body 221b are formed on both sides from the thirteenth point 341 to the fourteenth point 342 located between the thirteenth point 341 and the substrate reduction waveguide 160, Can be formed in a structure in which the width is narrowed. At this time, the a-shaped dielectric 221a and the b-th bipolar 221b may be formed in such a structure that the width is exponentially narrowed from the thirteenth point 341 to the fourteenth point 342. In this embodiment, It may be formed in a structure in which the width is narrowed. In this case, it is needless to say that the a-dielectric 221a and the b-dielectric 221b may be formed to have a reduced width at only one side.

As in the first embodiment, the shape of the second embodiment is formed by the impedance matching structure, and the equations (3) and (4) can be modified as shown in the following equations (5) and (6), respectively.

The present invention described above can be applied to a millimeter-wave ultraminiature radar transceiver for guided weapons. The present invention can also be applied to a millimeter wave system.

DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention has been described with reference to Figs. Best Mode for Carrying Out the Invention Hereinafter, preferred forms of the present invention that can be inferred from the above embodiment will be described.

The structure for signal transmission proposed in the present invention is a structure for transmitting signals in a millimeter wave system and includes a first part, a second part and a third part.

The first part is formed between the transmission line and the first waveguide, and includes a first conductor and a first dielectric. The first conductor is formed on a part of the rim of the first part, and the first dielectric is laminated on the entire inner space formed by the first conductor. The transmission line is a concept corresponding to the microstrip line 140 of FIG. 1, and the first waveguide corresponds to the substrate integrated waveguide 150 of FIG.

The first conductor may include a fourth conductor formed on a part of the upper side of the first part and a fifth conductor formed on the entire lower surface of the first part. At this time, the width of the fourth conductor can be expanded on both sides as the first waveguide approaches the transmission line. It is also possible that at least one via hole is formed at both ends of the fourth conductor.

The second part is formed between the first waveguide and the second waveguide, and includes a second conductor and a second dielectric. The second conductor is formed on the entire circumference of the second part and the second dielectric is laminated on a part of the inner space surrounded by the second conductor. The second waveguide corresponds to the substrate reduction waveguide 160 of FIG.

The second dielectric may be formed to have a narrower width as the second waveguide moves in the first waveguide. These second dielectrics may be formed to have a narrow width on both sides or to have a narrow width on one side. The second dielectric is located at the center of the second part and the second dielectric is located at both ends of the second part when the width is narrowed at one side.

The second dielectric may be formed so as to have a narrower stepped structure on both sides as shown in FIG. 7 (a). In detail, the second dielectric is formed from the first waveguide to a point A, which is located between the first waveguide and the second waveguide, and the second dielectric is formed from the point A to the point A between the point A and the second waveguide. A second width smaller than the first width to the point B and a third width smaller than the second width from the point B to the point C located between the point B and the second waveguide.

The second dielectric may be formed to have a narrow width on both sides of the slope as shown in FIG. 7 (b). In detail, the second dielectric is formed at a fourth width from the first waveguide to the Dth point located between the first waveguide and the second waveguide, and the second dielectric is disposed between the Dth point and the second waveguide. The width value up to the point E may be formed to decrease arithmetically or exponentially.

The second dielectric may be formed to have a narrow width from one side to a stepped structure as shown in FIG. 9 (a). In detail, the second dielectric is formed in a fifth width from the first waveguide to the Fth point located between the first waveguide and the second waveguide, and the second dielectric is formed between the Fth point and the second waveguide, And a sixth width smaller than the fifth width on both sides up to the G point and extending from the G point to the H point located between the G point and the second waveguide, As shown in FIG.

The second dielectric may be formed to have a narrow width from one side to an inclined plane structure as shown in FIG. 9 (b). In detail, the second dielectric is formed to have an eighth width from the first waveguide to an I-th point located between the first waveguide and the second waveguide, and the second dielectric is disposed between the first waveguide and the second waveguide, The width values at both sides up to point J can be formed to decrease arithmetically or exponentially.

The third part is formed between the second waveguide and the third waveguide, and includes a third conductor. And the third conductor is formed on the entire circumference of the third part. The third waveguide corresponds to the waveguide 170 of FIG.

The gap between the upper end surface and the lower end surface of the third conductor can be expanded as the third waveguide moves in the direction in which the third waveguide is located. At this time, the lower end surface of the third conductor may be formed to be lowered in a stepped shape or a ramped shape as the third waveguide moves in the direction in which the third waveguide is located.

Meanwhile, the first waveguide may be formed as a waveguide filled with a dielectric, and the second waveguide and the third waveguide may be formed as a hollow waveguide.

The signal transmission structure proposed by the present invention can be mounted on a millimeter-wave ultra-small radar system. A millimeter-wave ultra-small radar system equipped with a signal transmission structure includes a signal receiving unit for receiving signals reflected on a target, a target information generating unit for generating target information such as a target position and a target direction based on a signal reflected from the target A target tracking controller for tracking the target based on information about the target, and a structure for signal transmission. The structure for signal transmission at this time may be a structure for transmitting the signal reflected on the target to the target information generation unit.

It is to be understood that the present invention is not limited to these embodiments, and all elements constituting the embodiment of the present invention described above are described as being combined or operated in one operation. That is, within the scope of the present invention, all of the components may be selectively coupled to one or more of them. In addition, although all of the components may be implemented as one independent hardware, some or all of the components may be selectively combined to perform a part or all of the functions in one or a plurality of hardware. As shown in FIG. In addition, such a computer program may be stored in a computer readable medium such as a USB memory, a CD disk, a flash memory, etc., and read and executed by a computer to implement an embodiment of the present invention. As the recording medium of the computer program, a magnetic recording medium, an optical recording medium, or the like can be included.

Furthermore, all terms including technical or scientific terms have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs, unless otherwise defined in the Detailed Description. Commonly used terms, such as predefined terms, should be interpreted to be consistent with the contextual meanings of the related art, and are not to be construed as ideal or overly formal, unless expressly defined to the contrary.

It will be apparent to those skilled in the art that various modifications, changes, and substitutions are possible, without departing from the essential characteristics and spirit of the invention as disclosed in the accompanying claims. will be. Therefore, the embodiments disclosed in the present invention and the accompanying drawings are intended to illustrate and not to limit the technical spirit of the present invention, and the scope of the technical idea of the present invention is not limited by these embodiments and the accompanying drawings . The scope of protection of the present invention should be construed according to the following claims, and all technical ideas within the scope of equivalents should be construed as falling within the scope of the present invention.

Claims (13)

A signal receiving unit for receiving a signal reflected on a target;
A target information generating unit for generating information on a target based on the signal reflected on the target;
A target tracking controller for tracking a target based on information about the target; And
A first conductor formed between a transmission line and a first waveguide, the first conductor being formed in a part of a rim surface, and the first conductor formed in a portion surrounded by the first conductor, A first part comprising a first dielectric material deposited over the entire space; A second part formed between the first waveguide and the second waveguide, the second part including a second conductor formed on the entire circumference of the first waveguide and a second dielectric layer formed on a part of the inner space surrounded by the second conductor; And a third part formed between the second waveguide and the third waveguide, the third part including a third conductor formed on the entire edge surface,
The radar system comprising: The method according to claim 1,
Wherein the second dielectric is formed to have a smaller width as the first waveguide moves in a direction in which the second waveguide is located. 3. The method of claim 2,
Wherein the second dielectric is formed to have a narrow width at both sides or to have a narrow width at one side. 3. The method of claim 2,
The second dielectric is formed to have a first width from the first waveguide to a point A that is located between the first waveguide and the second waveguide and a second dielectric is formed between the point A and the second waveguide And a third width smaller than the second width from a point B to a point C located between the point B and the second waveguide, The radar system comprising: 3. The method of claim 2,
The second dielectric is formed at a fourth width from the first waveguide to the Dth point located between the first waveguide and the second waveguide and between the Dth point and the second waveguide, And the width value is formed to decrease arithmetically or exponentially in a range from the E point to the E point. 3. The method of claim 2,
Wherein the second dielectric is formed to have a fifth width from the first waveguide to an Fth point located between the first waveguide and the second waveguide and between the Fth point and the second waveguide And a second waveguide extending from the second waveguide to the second waveguide, the second waveguide being formed on the both sides with a sixth width smaller than 1/2 of the fifth width, And a seventh width smaller than the sixth width. 3. The method of claim 2,
Wherein the second dielectric is formed to have an eighth width from the first waveguide to an I point located between the first waveguide and the second waveguide and the second dielectric is disposed between the I point and the second waveguide And the width value is formed to decrease arithmetically or exponentially in both sides up to a point J where the radial direction is located. The method according to claim 1,
Wherein a distance between an upper end surface and a lower end surface of the third conductor extends as the third waveguide moves from the second waveguide toward the third waveguide. 9. The method of claim 8,
And the lower end surface of the third conductor is formed to be lowered in a stepped shape or a ramped shape as the third waveguide moves in a direction in which the third waveguide is located. The method according to claim 1,
Wherein the first conductor comprises:
A fourth conductor formed on a part of an upper surface of the first part; And
A fifth conductor formed on the entire lower surface of the first part,
The radar system comprising: 11. The method of claim 10,
Wherein the width of the fourth conductor extends on both sides of the transmission line as it approaches the first waveguide. 11. The method of claim 10,
And at least one via hole is formed at both ends of the fourth conductor. The method according to claim 1,
Wherein the first waveguide is formed as a waveguide whose inside is filled with a dielectric,
Wherein the second waveguide and the third waveguide are formed as hollow waveguides.

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