KR101542248B1 - 높은 스크래치 저항성 및 풍화 안정성을 지닌 코팅 조성물 - Google Patents
높은 스크래치 저항성 및 풍화 안정성을 지닌 코팅 조성물 Download PDFInfo
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- KR101542248B1 KR101542248B1 KR1020107016068A KR20107016068A KR101542248B1 KR 101542248 B1 KR101542248 B1 KR 101542248B1 KR 1020107016068 A KR1020107016068 A KR 1020107016068A KR 20107016068 A KR20107016068 A KR 20107016068A KR 101542248 B1 KR101542248 B1 KR 101542248B1
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- 239000008199 coating composition Substances 0.000 title claims abstract description 107
- -1 phosphoric acid compound Chemical class 0.000 claims abstract description 83
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract description 43
- 239000003054 catalyst Substances 0.000 claims abstract description 27
- NBIIXXVUZAFLBC-UHFFFAOYSA-N phosphoric acid Substances OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims abstract description 20
- 238000006243 chemical reaction Methods 0.000 claims abstract description 16
- 239000011230 binding agent Substances 0.000 claims abstract description 15
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims abstract description 14
- 238000004132 cross linking Methods 0.000 claims abstract description 14
- 239000003431 cross linking reagent Substances 0.000 claims abstract description 10
- 238000009835 boiling Methods 0.000 claims abstract description 6
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims abstract description 4
- 150000001875 compounds Chemical class 0.000 claims description 62
- 229920005862 polyol Polymers 0.000 claims description 40
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- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 30
- 239000000203 mixture Substances 0.000 claims description 26
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 24
- 125000000217 alkyl group Chemical group 0.000 claims description 23
- 125000003118 aryl group Chemical group 0.000 claims description 22
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- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 21
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 20
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- 239000000463 material Substances 0.000 claims description 15
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- 125000000524 functional group Chemical group 0.000 claims description 13
- 229910052717 sulfur Inorganic materials 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 12
- 229910003813 NRa Chemical group 0.000 claims description 11
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- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 11
- 229910052760 oxygen Inorganic materials 0.000 claims description 11
- 239000001301 oxygen Substances 0.000 claims description 11
- 239000011593 sulfur Chemical group 0.000 claims description 11
- NFDXQGNDWIPXQL-UHFFFAOYSA-N 1-cyclooctyldiazocane Chemical group C1CCCCCCC1N1NCCCCCC1 NFDXQGNDWIPXQL-UHFFFAOYSA-N 0.000 claims description 9
- 239000012973 diazabicyclooctane Substances 0.000 claims description 9
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 6
- 229910019142 PO4 Inorganic materials 0.000 claims description 5
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- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 claims description 4
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- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
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- KORSJDCBLAPZEQ-UHFFFAOYSA-N dicyclohexylmethane-4,4'-diisocyanate Chemical compound C1CC(N=C=O)CCC1CC1CCC(N=C=O)CC1 KORSJDCBLAPZEQ-UHFFFAOYSA-N 0.000 claims description 3
- 239000000539 dimer Substances 0.000 claims description 3
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 claims description 3
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- 229940008841 1,6-hexamethylene diisocyanate Drugs 0.000 claims 1
- BLTQUMGSCQHJAM-UHFFFAOYSA-N dioctan-3-yl hydrogen phosphate Chemical compound CCCCCC(CC)OP(O)(=O)OC(CC)CCCCC BLTQUMGSCQHJAM-UHFFFAOYSA-N 0.000 claims 1
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- 238000000576 coating method Methods 0.000 description 50
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- 125000001261 isocyanato group Chemical group *N=C=O 0.000 description 15
- TVSBRLGQVHJIKT-UHFFFAOYSA-N propan-2-ylcyclopentane Chemical compound CC(C)C1CCCC1 TVSBRLGQVHJIKT-UHFFFAOYSA-N 0.000 description 14
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- HUHGKBBIOFENOY-UHFFFAOYSA-N 6-isocyanatohexyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCCCN=C=O HUHGKBBIOFENOY-UHFFFAOYSA-N 0.000 description 7
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- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
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- 238000001723 curing Methods 0.000 description 6
- XCOASYLMDUQBHW-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)butan-1-amine Chemical compound CCCCNCCC[Si](OC)(OC)OC XCOASYLMDUQBHW-UHFFFAOYSA-N 0.000 description 6
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- 239000004033 plastic Substances 0.000 description 6
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- 239000000047 product Substances 0.000 description 6
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- 239000007921 spray Substances 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 5
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- 125000005370 alkoxysilyl group Chemical group 0.000 description 5
- 150000005690 diesters Chemical class 0.000 description 5
- 238000010494 dissociation reaction Methods 0.000 description 5
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- 239000004417 polycarbonate Substances 0.000 description 5
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical class [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 5
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
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- 238000007792 addition Methods 0.000 description 4
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- 125000001424 substituent group Chemical group 0.000 description 4
- 238000001029 thermal curing Methods 0.000 description 4
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
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- TZZGHGKTHXIOMN-UHFFFAOYSA-N 3-trimethoxysilyl-n-(3-trimethoxysilylpropyl)propan-1-amine Chemical compound CO[Si](OC)(OC)CCCNCCC[Si](OC)(OC)OC TZZGHGKTHXIOMN-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 3
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000005250 alkyl acrylate group Chemical group 0.000 description 3
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- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 3
- 230000007613 environmental effect Effects 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
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- 125000006850 spacer group Chemical group 0.000 description 3
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- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- ARXKVVRQIIOZGF-UHFFFAOYSA-N 1,2,4-butanetriol Chemical compound OCCC(O)CO ARXKVVRQIIOZGF-UHFFFAOYSA-N 0.000 description 2
- BHWUCEATHBXPOV-UHFFFAOYSA-N 2-triethoxysilylethanamine Chemical compound CCO[Si](CCN)(OCC)OCC BHWUCEATHBXPOV-UHFFFAOYSA-N 0.000 description 2
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- NMUBRRLYMADSGF-UHFFFAOYSA-N 3-triethoxysilylpropan-1-ol Chemical compound CCO[Si](OCC)(OCC)CCCO NMUBRRLYMADSGF-UHFFFAOYSA-N 0.000 description 2
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- SWDDLRSGGCWDPH-UHFFFAOYSA-N 4-triethoxysilylbutan-1-amine Chemical compound CCO[Si](OCC)(OCC)CCCCN SWDDLRSGGCWDPH-UHFFFAOYSA-N 0.000 description 2
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- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical class OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 2
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- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 238000003918 potentiometric titration Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
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- BOQSSGDQNWEFSX-UHFFFAOYSA-N propan-2-yl 2-methylprop-2-enoate Chemical compound CC(C)OC(=O)C(C)=C BOQSSGDQNWEFSX-UHFFFAOYSA-N 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 235000013772 propylene glycol Nutrition 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 230000004224 protection Effects 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
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- 150000003839 salts Chemical class 0.000 description 1
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- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 238000002444 silanisation Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 239000012086 standard solution Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 125000003698 tetramethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- RUELTTOHQODFPA-UHFFFAOYSA-N toluene 2,6-diisocyanate Chemical compound CC1=C(N=C=O)C=CC=C1N=C=O RUELTTOHQODFPA-UHFFFAOYSA-N 0.000 description 1
- 230000002110 toxicologic effect Effects 0.000 description 1
- 231100000027 toxicology Toxicity 0.000 description 1
- 238000005809 transesterification reaction Methods 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- UZIAQVMNAXPCJQ-UHFFFAOYSA-N triethoxysilylmethyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)COC(=O)C(C)=C UZIAQVMNAXPCJQ-UHFFFAOYSA-N 0.000 description 1
- QLNOVKKVHFRGMA-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical group [CH2]CC[Si](OC)(OC)OC QLNOVKKVHFRGMA-UHFFFAOYSA-N 0.000 description 1
- UOKUUKOEIMCYAI-UHFFFAOYSA-N trimethoxysilylmethyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)COC(=O)C(C)=C UOKUUKOEIMCYAI-UHFFFAOYSA-N 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- AVWRKZWQTYIKIY-UHFFFAOYSA-N urea-1-carboxylic acid Chemical group NC(=O)NC(O)=O AVWRKZWQTYIKIY-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
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- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/36—Successively applying liquids or other fluent materials, e.g. without intermediate treatment
- B05D1/38—Successively applying liquids or other fluent materials, e.g. without intermediate treatment with intermediate treatment
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- B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
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- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
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- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/50—Multilayers
- B05D7/52—Two layers
- B05D7/53—Base coat plus clear coat type
- B05D7/534—Base coat plus clear coat type the first layer being let to dry at least partially before applying the second layer
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/2805—Compounds having only one group containing active hydrogen
- C08G18/288—Compounds containing at least one heteroatom other than oxygen or nitrogen
- C08G18/289—Compounds containing at least one heteroatom other than oxygen or nitrogen containing silicon
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- C08G18/40—High-molecular-weight compounds
- C08G18/62—Polymers of compounds having carbon-to-carbon double bonds
- C08G18/6216—Polymers of alpha-beta ethylenically unsaturated carboxylic acids or of derivatives thereof
- C08G18/625—Polymers of alpha-beta ethylenically unsaturated carboxylic acids; hydrolyzed polymers of esters of these acids
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- C08G18/00—Polymeric products of isocyanates or isothiocyanates
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Abstract
(a) 반응성 기를 지닌 하나 이상의 바인더(A),
(b) 바인더(A)의 반응성 기와 가교 반응될 수 있는 하나 이상의 가교제(B), 및
(c) 실란 기, 하나 이상의 성분(A) 및/또는 (B), 및/또는 가수분해성 실란 기를 함유하는 코팅 조성물의 하나 이상의 추가 성분의 가교를 위한 하나 이상의 촉매(C)로서, 여기서 촉매(C)가 인산 화합물, 더욱 특히는 pKb가 3 이상 및 끓는점이 100℃ 초과인 아민으로 블록된 인산 또는 포스폰산인, 촉매(c)를 포함하는, 코팅 조성물.
Description
아이템 | 제품 | NVC m |
제형 m% |
바인더 |
|||
01 | 폴리아크릴레이트 OHN 156mg KOH/g (용매 혼합물 내 52.40±1.00% 강도) |
17.26 | 32.94 |
02 | 용매 나프타 |
12 | |
02 | 촉매 X |
X | X |
경화제 |
|||
04 | 개질된 HDI 이소시아누레이트(실란화된 경화제 제조 예) NCO 함량:5.81±1.00% (63.00±2.00% 용매 내 강도) |
34.69 | 55.06 |
총계 |
51.95 | 100.00 | |
가공 점도 약 50s(ISO 4) |
Claims (37)
- (a) 반응성 기를 지닌 하나 이상의 바인더(A),
(b) 바인더(A)의 반응성 기와 가교 반응될 수 있는 하나 이상의 가교제(B), 및
(c) 가수분해성 실란 기의 가교를 위한 하나 이상의 촉매(C)를 포함하는 코팅 조성물로서,
하나 이상의 바인더(A), 하나 이상의 가교제(B) 및 코팅 조성물의 하나 이상의 추가 성분으로 이루어진 군으로부터 선택된 하나 이상이 가수분해성 실란 기를 포함하고,
상기 촉매(C)가 인산 화합물이고, 인산 화합물은 3 이상의 pKb 및 100℃ 초과의 끓는점을 갖는 바이시클릭 아민으로 블록된 것인, 코팅 조성물. - 제 1항에 있어서, 바인더(A)로서 하나 이상의 히드록실-함유 화합물 및 가교제(B)로서 자유, 블록된, 또는 자유 및 블록된 이소시아네이트 기를 지닌 하나 이상의 화합물을 포함하는, 코팅 조성물.
- 제 2항에 있어서, 촉매(C)가 치환된 인산 모노에스테르 및 인산 디에스테르의 군으로부터 선택되는, 코팅 조성물.
- 제 3항에 있어서, 촉매(C)가 아민-블록된 인산 에틸헥실 부분 에스테르 및 아민-블록된 인산 페닐 부분 에스테르의 군으로부터 선택되는, 코팅 조성물.
- 제 1 내지 제 4항 중 어느 한 항에 있어서, 상기 바이시클릭 아민이 디아자바이시클로옥탄인, 코팅 조성물.
- 제 1항 내지 제 4항 중 어느 한 항에 있어서, 코팅 조성물의 하나 이상의 성분이, 동일 또는 상이한 화학식(I)의 구조 단위를 부분적으로 또는 전체적으로 함유하는, 코팅 조성물:
-X-Si-R''xG3-x (I)
상기 식에서,
G는 동일 또는 상이한 가수분해성 기이고,
X는 유기 라디칼이고,
R''는 알킬, 시클로알킬, 아릴, 또는 아르알킬이고, 여기서 탄소 사슬이 비인접 산소, 황 또는 NRa 기(여기서 Ra = 알킬, 시클로알킬, 아릴 또는 아르알킬)에 의해 개재될 수 있으며,
x는 0 내지 2이다. - 제 1항 내지 제 4항 중 어느 한 항에 있어서, 코팅 조성물의 하나 이상의 성분이, 화학식 (II)의 구조 단위 및 화학식 (III)의 구조 단위 전체를 기준으로 하여, 2.5 내지 97.5mol%의 하나 이상의 화학식 (II)의 구조 단위; 및 2.5 내지 97.5mol%의 하나 이상의 화학식 (III)의 구조 단위를 함유하는, 코팅 조성물:
-N(X-SiR''x(OR')3-x)n(X'-SiR''y(OR')3-y)m (II)
상기 식에서,
R'는 수소, 알킬 또는 시클로알킬이고, 여기서, 탄소 사슬이 비인접 산소, 황 또는 NRa 기(여기서 Ra = 알킬, 시클로알킬, 아릴 또는 아르알킬)에 개재될 수 있으며,
X, X'는 1 내지 20개의 탄소 원자를 지닌 선형 알킬렌 라디칼, 분지형 알킬렌 라디칼 또는 시클로알킬렌 라디칼이고,
R''는 알킬, 시클로알킬, 아릴 또는 아르알킬이고, 여기서 탄소 사슬이 비인접 산소, 황 또는 NRa 기(여기서 Ra = 알킬, 시클로알킬, 아릴 또는 아르알킬)에 의해 개재될 수 있으며,
n은 0 내지 2, m = 0 내지 2, m+n = 2이고,
x,y는 0 내지 2이고;
-Z-(X-SiR''x(OR')3-x) (III),
상기 식에서,
Z는 -NH-, -NR-, -O-이고, 이 때, R은 알킬, 시클로알킬, 아릴 또는 아르알킬이며, 여기서, 탄소 사슬이 비인접 산소, 황 또는 NRa 기(여기서 Ra = 알킬, 시클로알킬, 아릴 또는 아르알킬)에 개재될 수 있으며,
x는 0 내지 2이고,
X, R', R"는 화학식(II)에서 정의된 바와 같다. - 제 7항에 있어서, 코팅 조성물의 하나 이상의 성분이, 각 경우에 화학식 (II)의 구조 단위 및 화학식 (III)의 구조 단위 전체를 기준으로 하여, 5 내지 95 mol%의 하나 이상의 화학식 (II)의 구조 단위; 및 5 내지 95mol%의 하나 이상의 화학식 (III)의 구조 단위를 함유하는, 코팅 조성물.
- 제 7항에 있어서, 화학식 (II)의 구조 단위 및 화학식 (III)의 구조 단위가, 각 경우에 히드록실 및 이소시아네이트 기의 분획으로부터 및 화학식 (II)의 구조 단위 및 화학식 (III)의 구조 단위로부터 형성되는, 코팅 조성물의 가교 가능한 작용기의 합을 기준으로 하여, 2.5 내지 97.5mol%의 분율로 존재하는, 코팅 조성물.
- 제 6항에 있어서, 가교제(B)가 폴리이소시아네이트이고, 폴리이소시아네이트가 화학식 (I)의 구조 단위, 화학식 (II)의 구조 단위, 화학식 (III)의 구조 단위, 이들의 조합을 포함하는, 코팅 조성물:
-N(X-SiR''x(OR')3-x)n(X'-SiR''y(OR')3-y)m (II)
상기 식에서,
R'는 수소, 알킬 또는 시클로알킬이고, 여기서, 탄소 사슬이 비인접 산소, 황 또는 NRa 기(여기서 Ra = 알킬, 시클로알킬, 아릴 또는 아르알킬)에 개재될 수 있으며,
X, X'는 1 내지 20개의 탄소 원자를 지닌 선형 알킬렌 라디칼, 분지형 알킬렌 라디칼 또는 시클로알킬렌 라디칼이고,
R''는 알킬, 시클로알킬, 아릴 또는 아르알킬이고, 여기서 탄소 사슬이 비인접 산소, 황 또는 NRa 기(여기서 Ra = 알킬, 시클로알킬, 아릴 또는 아르알킬)에 의해 개재될 수 있으며,
n은 0 내지 2, m = 0 내지 2, m+n = 2이고,
x,y는 0 내지 2이고;
-Z-(X-SiR''x(OR')3-x) (III),
상기 식에서,
Z는 -NH-, -NR-, -O-이고, 이 때, R은 알킬, 시클로알킬, 아릴 또는 아르알킬이며, 여기서, 탄소 사슬이 비인접 산소, 황 또는 NRa 기(여기서 Ra = 알킬, 시클로알킬, 아릴 또는 아르알킬)에 개재될 수 있으며,
x는 0 내지 2이고,
X, R', R"는 화학식(II)에서 정의된 바와 같다. - 제 10항에 있어서, 폴리이소시아네이트에서,
코어 폴리이소시아네이트 구조 내 이소시아네이트 기의 2.5 내지 90mol%가 화학식 (II)의 구조 단위에 대해 반응하고;
코어 폴리이소시아네이트 구조 내 이소시아네이트 기의 2.5 내지 90mol%가 화학식 (III)의 구조 단위에 대해 반응하며;
화학식 (II)의 구조 단위 및 화학식 (III)의 구조 단위에 대해 반응된 코어 폴리이소시아네이트 구조 내 이소시아네이트 기의 총 분율이 5 내지 95mol%인, 코팅 조성물. - 제 10항에 있어서, 코어 폴리이소시아네이트 구조가 1,6-헥사메틸렌 디이소시아네이트, 이소포론 디이소시아네이트, 및 4,4'-메틸렌디시클로헥실 디이소시아네이트, 상기 언급된 폴리이소시아네이트의 뷰렛 다이머, 상기 언급된 폴리이소시아네이트의 이소시아뉴레이트 트라이머, 또는 상기 언급된 폴리이소시아네이트의 뷰렛 다이머 및 상기 언급된 폴리이소시아네이트의 이오시아뉴레이트 트라이머의 군으로부터 선택되는, 코팅 조성물.
- 제 1항 내지 제 4항 중 어느 한 항에 있어서, 바인더(A)가 폴리올이고, 폴리올이 하나 이상의 폴리(메트)아크릴레이트 폴리올을 포함하는, 코팅 조성물.
- 제 1항 내지 제 4항 중 어느 한 항에 있어서, 촉매(C)가 상기 조성물의 고체 함량을 기준으로 하여, 0.1중량% 내지 10중량%의 양으로 코팅 조성물에 존재하는, 코팅 조성물.
- 코팅되지 않거나 프리코팅(precoating)된 기판에 착색된 베이스코트(basecoat)를 도포하고 그 후에 제 1항 내지 제 4항 중 어느 한 항에 따른 코팅 조성물의 필름을 적용하는 것을 포함하는, 다중단계 코팅 방법.
- 코팅되지 않거나 프리코팅된 기판에 착색된 베이스코트를 도포하고 그 후에 상기 도포된 베이스코트 물질이 우선 실온 내지 80℃의 온도에서 건조되고, 제 1항 내지 제 4항 중 어느 한 항에 따른 코팅 조성물의 도포 후, 상기 시스템이 1분 내지 10시간 동안 30 내지 200℃의 온도에서 경화되는 것을 포함하는, 다중단계 코팅 방법.
- 클리어코트로서 사용, 또는 자동차 OEM 피니싱(finishing) 또는 자동차 리피니시(refinish)에서의 사용을 위한 제 1항 내지 제 4항 중 어느 한 항에 따른 코팅 조성물.
- 제 1항에 있어서, 촉매(C)가 인산 또는 포스폰산이고, 인산 또는 포스폰산은 3 이상의 pKb 및 100℃ 초과의 끓는점을 갖는 바이시클릭 아민으로 블록된, 코팅 조성물.
- 제 3항에 있어서, 촉매(C)가 비시클릭 인산 디에스테르 및 시클릭 인산 디에스테르로 구성된 군으로부터 선택되는, 코팅 조성물.
- 제 4항에 있어서, 촉매(C)가 아민-블록된 인산 비스(에틸헥실) 에스테르인, 코팅 조성물.
- 제 6항에 있어서, G가 알콕시기(OR')인 코팅 조성물.
- 제 6항에 있어서, X가 1 내지 20개의 탄소 원자를 갖는 선형 알킬렌 라디칼, 분지형 알킬렌 라디칼 또는 시클로알킬렌 라디칼인 코팅 조성물.
- 제 22항에 있어서, X가 1 내지 4개의 탄소 원자를 갖는 알킬렌 라디칼인 코팅 조성물.
- 제 6항에 있어서, R"가 알킬 라디칼인 코팅 조성물.
- 제 24항에 있어서, R"가 1 내지 6개의 탄소 원자를 갖는 알킬 라디칼인 코팅 조성물.
- 제 6항에 있어서, x가 0 내지 1인 코팅 조성물.
- 제 26항에 있어서, x가 0인 코팅 조성물.
- 제 7항에 있어서, R'이 각각 독립적으로 에틸 또는 메틸인 코팅 조성물.
- 제 7항에 있어서, X, X'가 1 내지 4개의 탄소 원자를 갖는 알킬렌 라디칼인 코팅 조성물.
- 제 7항에 있어서, R"가 알킬 라디칼인 코팅 조성물.
- 제 30항에 있어서, R"가 1 내지 6개의 탄소 원자를 갖는 알킬 라디칼인 코팅 조성물.
- 제 8항에 있어서, 코팅 조성물의 하나 이상의 성분이, 각 경우에 화학식 (II)의 구조 단위 및 화학식 (III)의 구조 단위 전체를 기준으로 하여, 10 내지 90mol%의 하나 이상의 화학식 (II)의 구조 단위; 및 10 내지 90mol%의 하나 이상의 화학식 (III)의 구조 단위를 함유하는, 코팅 조성물.
- 제 32항에 있어서, 코팅 조성물의 하나 이상의 성분이, 각 경우에 화학식 (II)의 구조 단위 및 화학식 (III)의 구조 단위 전체를 기준으로 하여, 20 내지 80mol%의 하나 이상의 화학식 (II)의 구조 단위; 및 20 내지 80mol%의 하나 이상의 화학식 (III)의 구조 단위를 함유하는, 코팅 조성물.
- 제 33항에 있어서, 코팅 조성물의 하나 이상의 성분이, 각 경우에 화학식 (II)의 구조 단위 및 화학식 (III)의 구조 단위 전체를 기준으로 하여, 30 내지 70mol%의 하나 이상의 화학식 (II)의 구조 단위; 및 30 내지 70mol%의 하나 이상의 화학식 (III)의 구조 단위를 함유하는, 코팅 조성물.
- 제 9항에 있어서, 화학식 (II)의 구조 단위 및 화학식 (III)의 구조 단위가,각 경우에 히드록실 및 이소시아네이트 기의 분획으로부터 및 화학식 (II)의 구조 단위 및 화학식 (III)의 구조 단위로부터 형성되는, 코팅 조성물의 가교 가능한 작용기의 합을 기준으로 하여, 5 내지 95mol%의 분율로 존재하는, 코팅 조성물.
- 제 35항에 있어서, 화학식 (II)의 구조 단위 및 화학식 (III)의 구조 단위가,각 경우에 히드록실 및 이소시아네이트 기의 분획으로부터 및 화학식 (II)의 구조 단위 및 화학식 (III)의 구조 단위로부터 형성되는, 코팅 조성물의 가교 가능한 작용기의 합을 기준으로 하여, 10 내지 90mol%의 분율로 존재하는, 코팅 조성물.
- 제 14항에 있어서, 촉매(C)가 상기 조성물의 고체 함량을 기준으로 0.1 내지 3중량%의 양으로 코팅 조성물에 존재하는, 코팅 조성물.
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2007
- 2007-12-19 DE DE102007061854A patent/DE102007061854A1/de not_active Withdrawn
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2008
- 2008-12-18 RU RU2010129106/05A patent/RU2502769C2/ru not_active IP Right Cessation
- 2008-12-18 PL PL08862756.7T patent/PL2225299T3/pl unknown
- 2008-12-18 KR KR1020107016068A patent/KR101542248B1/ko active IP Right Grant
- 2008-12-18 US US12/808,985 patent/US8808805B2/en active Active
- 2008-12-18 EP EP08862756.7A patent/EP2225299B1/de active Active
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- 2008-12-18 BR BRPI0821745A patent/BRPI0821745A8/pt not_active IP Right Cessation
- 2008-12-18 CN CN200880121760.0A patent/CN101952337B/zh not_active Expired - Fee Related
- 2008-12-18 CA CA2709317A patent/CA2709317C/en not_active Expired - Fee Related
- 2008-12-18 MX MX2010006001A patent/MX2010006001A/es active IP Right Grant
- 2008-12-18 WO PCT/EP2008/010808 patent/WO2009077180A1/de active Application Filing
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WO2000055229A1 (en) | 1999-03-17 | 2000-09-21 | E.I. Du Pont De Nemours And Company | High solids acid etch resistant clear coating composition |
WO2007137632A1 (de) | 2006-05-29 | 2007-12-06 | Basf Coatings Ag | Verwendung von härtbaren gemischen, enthaltend silangruppenhaltige verbindungen sowie phosphonsäurediester oder diphosphonsäurediester, als haftvermittler |
Also Published As
Publication number | Publication date |
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EP2225299B1 (de) | 2016-03-30 |
WO2009077180A1 (de) | 2009-06-25 |
RU2010129106A (ru) | 2012-01-27 |
JP5523336B2 (ja) | 2014-06-18 |
US20110045190A1 (en) | 2011-02-24 |
CA2709317C (en) | 2017-09-05 |
PL2225299T3 (pl) | 2016-09-30 |
MX2010006001A (es) | 2010-11-22 |
CN101952337B (zh) | 2012-11-14 |
BRPI0821745A2 (pt) | 2015-06-16 |
EP2225299A1 (de) | 2010-09-08 |
KR20100105855A (ko) | 2010-09-30 |
DE102007061854A1 (de) | 2009-06-25 |
RU2502769C2 (ru) | 2013-12-27 |
CN101952337A (zh) | 2011-01-19 |
US8808805B2 (en) | 2014-08-19 |
CA2709317A1 (en) | 2009-06-25 |
JP2011509315A (ja) | 2011-03-24 |
BRPI0821745A8 (pt) | 2019-01-29 |
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