KR101176813B1 - 스타 폴리머의 제조 방법 - Google Patents
스타 폴리머의 제조 방법 Download PDFInfo
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- KR101176813B1 KR101176813B1 KR1020107003783A KR20107003783A KR101176813B1 KR 101176813 B1 KR101176813 B1 KR 101176813B1 KR 1020107003783 A KR1020107003783 A KR 1020107003783A KR 20107003783 A KR20107003783 A KR 20107003783A KR 101176813 B1 KR101176813 B1 KR 101176813B1
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- South Korea
- Prior art keywords
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- meth
- acrylic acid
- acid ester
- Prior art date
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- 229920000642 polymer Polymers 0.000 title claims abstract description 89
- 238000004519 manufacturing process Methods 0.000 title claims description 22
- 238000000034 method Methods 0.000 claims abstract description 52
- 238000006243 chemical reaction Methods 0.000 claims abstract description 43
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims abstract description 38
- 125000000962 organic group Chemical group 0.000 claims abstract description 35
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 21
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 20
- 238000010539 anionic addition polymerization reaction Methods 0.000 claims abstract description 16
- 229910052783 alkali metal Inorganic materials 0.000 claims abstract description 11
- 150000001339 alkali metal compounds Chemical class 0.000 claims abstract description 11
- 150000001340 alkali metals Chemical class 0.000 claims abstract description 10
- 150000001875 compounds Chemical class 0.000 claims abstract description 9
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims abstract description 7
- 150000001342 alkaline earth metals Chemical class 0.000 claims abstract description 7
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 5
- 229910017053 inorganic salt Inorganic materials 0.000 claims abstract description 5
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 claims description 14
- 239000002904 solvent Substances 0.000 claims description 14
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims description 10
- 238000006116 polymerization reaction Methods 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims description 10
- 150000001450 anions Chemical class 0.000 claims description 8
- 125000006527 (C1-C5) alkyl group Chemical group 0.000 claims description 5
- 125000005647 linker group Chemical group 0.000 claims description 5
- WGOPGODQLGJZGL-UHFFFAOYSA-N lithium;butane Chemical compound [Li+].CC[CH-]C WGOPGODQLGJZGL-UHFFFAOYSA-N 0.000 claims description 5
- 150000003839 salts Chemical class 0.000 claims description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 2
- ZWNMRZQYWRLGMM-UHFFFAOYSA-N 2,5-dimethylhexane-2,5-diol Chemical compound CC(C)(O)CCC(C)(C)O ZWNMRZQYWRLGMM-UHFFFAOYSA-N 0.000 claims 1
- 230000001588 bifunctional effect Effects 0.000 claims 1
- 239000003960 organic solvent Substances 0.000 abstract description 9
- 239000000463 material Substances 0.000 abstract description 5
- 150000002736 metal compounds Chemical class 0.000 abstract 1
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 36
- -1 acrylic ester Chemical class 0.000 description 33
- 239000000178 monomer Substances 0.000 description 27
- 239000000243 solution Substances 0.000 description 21
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 14
- 125000000217 alkyl group Chemical group 0.000 description 14
- 150000001721 carbon Chemical group 0.000 description 12
- 239000002202 Polyethylene glycol Substances 0.000 description 11
- 229920001223 polyethylene glycol Polymers 0.000 description 11
- 125000002723 alicyclic group Chemical group 0.000 description 10
- SHXWCVYOXRDMCX-UHFFFAOYSA-N 3,4-methylenedioxymethamphetamine Chemical compound CNC(C)CC1=CC=C2OCOC2=C1 SHXWCVYOXRDMCX-UHFFFAOYSA-N 0.000 description 9
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- 238000004132 cross linking Methods 0.000 description 9
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 8
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 7
- 238000005227 gel permeation chromatography Methods 0.000 description 7
- 239000003999 initiator Substances 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N hexane Substances CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 229920002521 macromolecule Polymers 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- 238000001514 detection method Methods 0.000 description 5
- 150000002596 lactones Chemical group 0.000 description 5
- 229920001451 polypropylene glycol Polymers 0.000 description 5
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 5
- 238000010526 radical polymerization reaction Methods 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 238000004088 simulation Methods 0.000 description 5
- 125000001424 substituent group Chemical group 0.000 description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000007822 coupling agent Substances 0.000 description 4
- 125000000753 cycloalkyl group Chemical group 0.000 description 4
- 125000000524 functional group Chemical group 0.000 description 4
- 125000005843 halogen group Chemical group 0.000 description 4
- 229930195733 hydrocarbon Natural products 0.000 description 4
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 150000003254 radicals Chemical class 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 3
- 125000003342 alkenyl group Chemical group 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 229910052744 lithium Inorganic materials 0.000 description 3
- 239000012046 mixed solvent Substances 0.000 description 3
- 238000000569 multi-angle light scattering Methods 0.000 description 3
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 230000007935 neutral effect Effects 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 239000012044 organic layer Substances 0.000 description 3
- 125000004430 oxygen atom Chemical group O* 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 2
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 2
- 101100132433 Arabidopsis thaliana VIII-1 gene Proteins 0.000 description 2
- 239000005046 Chlorosilane Substances 0.000 description 2
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- KCBQMPUZDSXZOQ-UHFFFAOYSA-N [2,5-dimethyl-5-(2-methylprop-2-enoyloxy)hexan-2-yl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)CCC(C)(C)OC(=O)C(C)=C KCBQMPUZDSXZOQ-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229920001400 block copolymer Polymers 0.000 description 2
- 229910052792 caesium Inorganic materials 0.000 description 2
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 239000000412 dendrimer Substances 0.000 description 2
- 229920000736 dendritic polymer Polymers 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 229920001519 homopolymer Polymers 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000010550 living polymerization reaction Methods 0.000 description 2
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 125000004434 sulfur atom Chemical group 0.000 description 2
- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- ABUIKOPEGIZINI-UHFFFAOYSA-N (1-ethylcyclohexyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1(CC)CCCCC1 ABUIKOPEGIZINI-UHFFFAOYSA-N 0.000 description 1
- QSUJHKWXLIQKEY-UHFFFAOYSA-N (2-oxooxolan-3-yl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCOC1=O QSUJHKWXLIQKEY-UHFFFAOYSA-N 0.000 description 1
- PFAUHBKUOMDUFG-FARCUNLSSA-N (E)-2-(oxolan-2-ylmethyl)but-2-enoic acid Chemical class C\C=C(C(O)=O)/CC1CCCO1 PFAUHBKUOMDUFG-FARCUNLSSA-N 0.000 description 1
- GBVSONMCEKNESD-UHFFFAOYSA-N 1,1'-biphenyl;lithium Chemical group [Li].C1=CC=CC=C1C1=CC=CC=C1 GBVSONMCEKNESD-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- 125000001478 1-chloroethyl group Chemical group [H]C([H])([H])C([H])(Cl)* 0.000 description 1
- 125000001340 2-chloroethyl group Chemical group [H]C([H])(Cl)C([H])([H])* 0.000 description 1
- FSVQAZDYQRQQKH-UHFFFAOYSA-N 2-methylbutan-2-yl prop-2-enoate Chemical compound CCC(C)(C)OC(=O)C=C FSVQAZDYQRQQKH-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 1
- 125000004105 2-pyridyl group Chemical group N1=C([*])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000006479 2-pyridyl methyl group Chemical group [H]C1=C([H])C([H])=C([H])C(=N1)C([H])([H])* 0.000 description 1
- IQMGOTOKEZLVSJ-UHFFFAOYSA-N 3-octan-3-yloxycarbonylbut-3-enoic acid Chemical compound CCCCCC(CC)OC(=O)C(=C)CC(O)=O IQMGOTOKEZLVSJ-UHFFFAOYSA-N 0.000 description 1
- NWIVYGKSHSJHEF-UHFFFAOYSA-N 4-[(4-amino-3,5-diethylphenyl)methyl]-2,6-diethylaniline Chemical compound CCC1=C(N)C(CC)=CC(CC=2C=C(CC)C(N)=C(CC)C=2)=C1 NWIVYGKSHSJHEF-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 101001053401 Arabidopsis thaliana Acid beta-fructofuranosidase 3, vacuolar Proteins 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- HQQGMQPWWHAYPN-VMPITWQZSA-N C(C)/C(/C(=O)OOC(C)C)=C\C Chemical compound C(C)/C(/C(=O)OOC(C)C)=C\C HQQGMQPWWHAYPN-VMPITWQZSA-N 0.000 description 1
- UFTLFORNJTWUNV-WAYWQWQTSA-N C/C=C(/C(=O)O)\C(C)(C)OC Chemical compound C/C=C(/C(=O)O)\C(C)(C)OC UFTLFORNJTWUNV-WAYWQWQTSA-N 0.000 description 1
- NTZRDKVFLPLTPU-UHFFFAOYSA-N CC[Na] Chemical compound CC[Na] NTZRDKVFLPLTPU-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- ZFDIRQKJPRINOQ-HWKANZROSA-N Ethyl crotonate Chemical compound CCOC(=O)\C=C\C ZFDIRQKJPRINOQ-HWKANZROSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229910001508 alkali metal halide Inorganic materials 0.000 description 1
- 150000008045 alkali metal halides Chemical class 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- ISQINHMJILFLAQ-UHFFFAOYSA-N argon hydrofluoride Chemical compound F.[Ar] ISQINHMJILFLAQ-UHFFFAOYSA-N 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- HMQGJGGUWFSPDQ-SQQVDAMQSA-N azanium;(e)-but-2-enoate Chemical compound [NH4+].C\C=C\C([O-])=O HMQGJGGUWFSPDQ-SQQVDAMQSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 125000001231 benzoyloxy group Chemical group C(C1=CC=CC=C1)(=O)O* 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000002902 bimodal effect Effects 0.000 description 1
- WRIKNYVEERXWTD-UHFFFAOYSA-N bis(1-ethoxyethyl) 2-methylidenebutanedioate Chemical compound CCOC(C)OC(=O)CC(=C)C(=O)OC(C)OCC WRIKNYVEERXWTD-UHFFFAOYSA-N 0.000 description 1
- WSUBABSGDOABNO-UHFFFAOYSA-N bis(1-methoxyethyl) 2-methylidenebutanedioate Chemical compound COC(C)OC(=O)CC(=C)C(=O)OC(C)OC WSUBABSGDOABNO-UHFFFAOYSA-N 0.000 description 1
- BUYDBWOETXNUSS-UHFFFAOYSA-N bis(1-methoxypropyl) 2-methylidenebutanedioate Chemical compound CCC(OC)OC(=O)CC(=C)C(=O)OC(CC)OC BUYDBWOETXNUSS-UHFFFAOYSA-N 0.000 description 1
- KGISSZJZXPWHMQ-UHFFFAOYSA-N bis(2-chloroethyl) 2-methylidenebutanedioate Chemical compound ClCCOC(=O)CC(=C)C(=O)OCCCl KGISSZJZXPWHMQ-UHFFFAOYSA-N 0.000 description 1
- LHHOPWRJTISXDC-UHFFFAOYSA-N bis(2-ethoxyethyl) 2-methylidenebutanedioate Chemical compound CCOCCOC(=O)CC(=C)C(=O)OCCOCC LHHOPWRJTISXDC-UHFFFAOYSA-N 0.000 description 1
- CGNRQCGWXXLTIA-UHFFFAOYSA-N bis(2-ethylhexyl) 2-methylidenebutanedioate Chemical compound CCCCC(CC)COC(=O)CC(=C)C(=O)OCC(CC)CCCC CGNRQCGWXXLTIA-UHFFFAOYSA-N 0.000 description 1
- STJIXECAZBEITE-UHFFFAOYSA-N bis(2-methoxypropan-2-yl) 2-methylidenebutanedioate Chemical compound COC(C)(C)OC(=O)CC(=C)C(=O)OC(C)(C)OC STJIXECAZBEITE-UHFFFAOYSA-N 0.000 description 1
- WRJMLFYKZCDTCK-UHFFFAOYSA-N bis(3-ethoxy-2,2-dimethylpropyl) 2-methylidenebutanedioate Chemical compound CCOCC(C)(C)COC(=O)CC(=C)C(=O)OCC(C)(C)COCC WRJMLFYKZCDTCK-UHFFFAOYSA-N 0.000 description 1
- XSHDMSWAZPRILY-UHFFFAOYSA-N bis(5-ethoxypentyl) 2-methylidenebutanedioate Chemical compound CCOCCCCCOC(=O)CC(=C)C(=O)OCCCCCOCC XSHDMSWAZPRILY-UHFFFAOYSA-N 0.000 description 1
- ZKUPUFWAPUEPPL-UHFFFAOYSA-N bis(furan-2-ylmethyl) 2-methylidenebutanedioate Chemical compound C=1C=COC=1COC(=O)C(=C)CC(=O)OCC1=CC=CO1 ZKUPUFWAPUEPPL-UHFFFAOYSA-N 0.000 description 1
- PSGIOPVVWCLLHE-UHFFFAOYSA-N bis(oxolan-2-ylmethyl) 2-methylidenebutanedioate Chemical compound C1CCOC1COC(=O)C(=C)CC(=O)OCC1CCCO1 PSGIOPVVWCLLHE-UHFFFAOYSA-N 0.000 description 1
- DGJVCSFICFRERK-UHFFFAOYSA-N bis[methoxy(phenyl)methyl] 2-methylidenebutanedioate Chemical compound C=1C=CC=CC=1C(OC)OC(=O)CC(=C)C(=O)OC(OC)C1=CC=CC=C1 DGJVCSFICFRERK-UHFFFAOYSA-N 0.000 description 1
- 238000012661 block copolymerization Methods 0.000 description 1
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- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
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- 229910052801 chlorine Inorganic materials 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
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- ZUMGBVSYIVKLDH-QHHAFSJGSA-N cyclohexyl (e)-but-2-enoate Chemical compound C\C=C\C(=O)OC1CCCCC1 ZUMGBVSYIVKLDH-QHHAFSJGSA-N 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- WZAPMKYCDNQBOC-UHFFFAOYSA-N dibenzyl 2-methylidenebutanedioate Chemical compound C=1C=CC=CC=1COC(=O)C(=C)CC(=O)OCC1=CC=CC=C1 WZAPMKYCDNQBOC-UHFFFAOYSA-N 0.000 description 1
- GFHMGSFDHKDJSG-UHFFFAOYSA-N dicyclohexyl 2-methylidenebutanedioate Chemical compound C1CCCCC1OC(=O)C(=C)CC(=O)OC1CCCCC1 GFHMGSFDHKDJSG-UHFFFAOYSA-N 0.000 description 1
- ZEFVHSWKYCYFFL-UHFFFAOYSA-N diethyl 2-methylidenebutanedioate Chemical compound CCOC(=O)CC(=C)C(=O)OCC ZEFVHSWKYCYFFL-UHFFFAOYSA-N 0.000 description 1
- ZWWQRMFIZFPUAA-UHFFFAOYSA-N dimethyl 2-methylidenebutanedioate Chemical compound COC(=O)CC(=C)C(=O)OC ZWWQRMFIZFPUAA-UHFFFAOYSA-N 0.000 description 1
- 150000002009 diols Chemical group 0.000 description 1
- NJCKCUVRQPTKTF-UHFFFAOYSA-N dipentyl 2-methylidenebutanedioate Chemical compound CCCCCOC(=O)CC(=C)C(=O)OCCCCC NJCKCUVRQPTKTF-UHFFFAOYSA-N 0.000 description 1
- DFQSWFGKYUFIFW-UHFFFAOYSA-N dipropyl 2-methylidenebutanedioate Chemical compound CCCOC(=O)CC(=C)C(=O)OCCC DFQSWFGKYUFIFW-UHFFFAOYSA-N 0.000 description 1
- UJKWLAZYSLJTKA-UHFFFAOYSA-N edma Chemical compound O1CCOC2=CC(CC(C)NC)=CC=C21 UJKWLAZYSLJTKA-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
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- 229910052731 fluorine Inorganic materials 0.000 description 1
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- RNOSZJQXPVHHLQ-DUXPYHPUSA-N furan-2-ylmethyl (e)-but-2-enoate Chemical compound C\C=C\C(=O)OCC1=CC=CO1 RNOSZJQXPVHHLQ-DUXPYHPUSA-N 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 125000003827 glycol group Chemical group 0.000 description 1
- DMEGYFMYUHOHGS-UHFFFAOYSA-N heptamethylene Natural products C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
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- 229910052740 iodine Inorganic materials 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- URMHJZVLKKDTOJ-UHFFFAOYSA-N lithium;(3-methyl-1-phenylpentyl)benzene Chemical compound [Li+].C=1C=CC=CC=1[C-](CC(C)CC)C1=CC=CC=C1 URMHJZVLKKDTOJ-UHFFFAOYSA-N 0.000 description 1
- UUQLCJCZFWUWHH-UHFFFAOYSA-N lithium;1-phenylhexylbenzene Chemical compound [Li+].C=1C=CC=CC=1[C-](CCCCC)C1=CC=CC=C1 UUQLCJCZFWUWHH-UHFFFAOYSA-N 0.000 description 1
- UBJFKNSINUCEAL-UHFFFAOYSA-N lithium;2-methylpropane Chemical compound [Li+].C[C-](C)C UBJFKNSINUCEAL-UHFFFAOYSA-N 0.000 description 1
- PDZGAEAUKGKKDE-UHFFFAOYSA-N lithium;naphthalene Chemical compound [Li].C1=CC=CC2=CC=CC=C21 PDZGAEAUKGKKDE-UHFFFAOYSA-N 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- MCVVUJPXSBQTRZ-ONEGZZNKSA-N methyl (e)-but-2-enoate Chemical compound COC(=O)\C=C\C MCVVUJPXSBQTRZ-ONEGZZNKSA-N 0.000 description 1
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
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- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- URXNVXOMQQCBHS-UHFFFAOYSA-N naphthalene;sodium Chemical compound [Na].C1=CC=CC2=CC=CC=C21 URXNVXOMQQCBHS-UHFFFAOYSA-N 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- HULBECQFWZPEBI-ONNFQVAWSA-N octyl (e)-but-2-enoate Chemical compound CCCCCCCCOC(=O)\C=C\C HULBECQFWZPEBI-ONNFQVAWSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 1
- KOOHRIRWWIYFRH-UHFFFAOYSA-N oxolan-2-one;prop-2-enoic acid Chemical compound OC(=O)C=C.O=C1CCCO1 KOOHRIRWWIYFRH-UHFFFAOYSA-N 0.000 description 1
- SERHXTVXHNVDKA-UHFFFAOYSA-N pantolactone Chemical compound CC1(C)COC(=O)C1O SERHXTVXHNVDKA-UHFFFAOYSA-N 0.000 description 1
- 229940115458 pantolactone Drugs 0.000 description 1
- SIEVQTNTRMBCHO-UHFFFAOYSA-N pantolactone Natural products CC1(C)OC(=O)CC1O SIEVQTNTRMBCHO-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- ZHDCHCTZRODSEN-HWKANZROSA-N propyl (e)-but-2-enoate Chemical compound CCCOC(=O)\C=C\C ZHDCHCTZRODSEN-HWKANZROSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000012488 sample solution Substances 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- ZFDIRQKJPRINOQ-UHFFFAOYSA-N transbutenic acid ethyl ester Natural products CCOC(=O)C=CC ZFDIRQKJPRINOQ-UHFFFAOYSA-N 0.000 description 1
- FAYMLNNRGCYLSR-UHFFFAOYSA-M triphenylsulfonium triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 FAYMLNNRGCYLSR-UHFFFAOYSA-M 0.000 description 1
- KAKZBPTYRLMSJV-UHFFFAOYSA-N vinyl-ethylene Natural products C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
- C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1808—C8-(meth)acrylate, e.g. isooctyl (meth)acrylate or 2-ethylhexyl (meth)acrylate
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
- C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
- C08F297/026—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
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- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
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- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/10—Esters
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Abstract
(식 중, R 은 수소 원자 등, n 은 2 또는 3, A 는 탄소 원자로 결합하는 유기기를 나타낸다) 로 나타내는 다관능성 (메트)아크릴산에스테르 유도체의 1 종 또는 2 종 이상을, 유기 용매 중, 당해 식 (IV) 의 화합물 1 몰에 대해 유기 알칼리 금속 화합물 0.1 ~ 0.99 몰의 존재하, 및 당해 유기 알칼리 금속 화합물 1 몰에 대해 알칼리 금속 또는 알칼리 토금속의 무기염 0.1 ~ 20 몰의 존재하에서 아니온 중합 반응을 실시함으로써 폴리머를 제조하여 코어부를 형성한 후, 코어부의 아니온 활성 부위로부터 하기 식 (I)
(식 중, R1 은 수소 원자 등을 나타내고, R2 는 유기기를 나타낸다.) 로 나타내는 단관능성 (메트)아크릴산에스테르 유도체의 1 종 또는 2 종 이상을 아니온 중합에 의해 중합시켜 아암부를 형성한다.
Description
Claims (6)
- 식 (IV)
[화학식 1]
(식 중, R 은 수소 원자 또는 C1 ~ C6 알킬기, n 은 2 또는 3, A 는 탄소 원자로 결합하는 유기기를 나타낸다) 로 나타내는 다관능성 (메트)아크릴산에스테르 유도체의 1 종 또는 2 종 이상을, 유기 용매 중, 당해 식 (IV) 의 화합물 1 몰에 대해 유기 알칼리 금속 화합물 0.25 ~ 0.75 몰의 존재하, 및 당해 유기 알칼리 금속 화합물 1 몰에 대해 알칼리 금속 또는 알칼리 토금속의 무기염 0.5 ~ 3 몰의 존재하에서 아니온 중합 반응을 실시함으로써 폴리머를 제조하여 코어부를 형성한 후, 코어부의 아니온 활성 부위로부터 식 (I)
[화학식 2]
(식 중, R1 은 수소 원자 또는 C1 ~ C5 알킬기를 나타내고, R2 는 유기기를 나타낸다.) 로 나타내는 단관능성 (메트)아크릴산에스테르 유도체의 1 종 또는 2 종 이상을 아니온 중합법에 의해 중합시켜 아암부를 형성하는 것을 특징으로 하는 스타 폴리머의 제조 방법. - 제 1 항에 있어서,
알칼리 금속의 무기염이 염화 리튬이고, 유기 알칼리 금속 화합물이 sec-부틸리튬인 것을 특징으로 하는 스타 폴리머의 제조 방법. - 제 4 항에 있어서,
식 (IV) 로 나타내는 다관능성 (메트)아크릴산에스테르 유도체가 2,5-디메틸-2,5-헥산디올디(메트)아크릴레이트인 것을 특징으로 하는 스타 폴리머의 제조 방법. - 제 1 항 또는 제 2 항에 기재된 방법에 의해 제조된 스타 폴리머.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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JP2007226409 | 2007-08-31 | ||
JPJP-P-2007-226409 | 2007-08-31 | ||
PCT/JP2008/002381 WO2009028212A1 (ja) | 2007-08-31 | 2008-08-29 | スターポリマーの製造方法 |
Publications (2)
Publication Number | Publication Date |
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KR20100046020A KR20100046020A (ko) | 2010-05-04 |
KR101176813B1 true KR101176813B1 (ko) | 2012-08-24 |
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Country Status (6)
Country | Link |
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US (1) | US20100210805A1 (ko) |
EP (1) | EP2186838B1 (ko) |
JP (1) | JP5340158B2 (ko) |
KR (1) | KR101176813B1 (ko) |
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KR102088387B1 (ko) * | 2013-03-18 | 2020-03-12 | 주식회사 쿠라레 | (메타)아크릴계 블록 공중합체 및 그 제조 방법 |
JP6329028B2 (ja) * | 2014-08-08 | 2018-05-23 | 株式会社クラレ | 硬化型シーリング剤 |
JP6289306B2 (ja) * | 2014-08-08 | 2018-03-07 | 株式会社クラレ | 硬化型接着剤 |
JP6539517B2 (ja) * | 2015-06-24 | 2019-07-03 | 日本エラストマー株式会社 | 精製重合体の製造方法 |
GB201817836D0 (en) * | 2018-10-31 | 2018-12-19 | Univ Liverpool | Branched polymers |
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WO2006016648A1 (ja) * | 2004-08-13 | 2006-02-16 | Nippon Soda Co., Ltd. | スターポリマー、酸分解性樹脂組成物、レジスト組成物およびジ(メタ)アクリレート化合物 |
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ES2054678T5 (es) | 1986-08-18 | 1997-09-16 | Dow Chemical Co | Conjugados estrella. |
FR2723953B1 (fr) | 1994-08-25 | 1996-09-20 | Atochem Elf Sa | Amorceur multifonctionnel pour l'obtention de polymeres en etoile par voie anionique, son procede de fabrication, et polymeres en etoile correspondants, leur procede de fabrication et leurs applications |
US5552491A (en) * | 1995-01-27 | 1996-09-03 | Ethyl Additives Corporation | Star-branched acrylate and methacrylate polymers |
JP4183293B2 (ja) | 1997-07-09 | 2008-11-19 | 日本曹達株式会社 | (メタ)アクリル酸エステル系重合体及びその製造方法 |
KR100520183B1 (ko) * | 1999-08-23 | 2005-10-10 | 주식회사 하이닉스반도체 | 두 개의 이중결합을 가지는 가교제를 단량체로 포함하는 포토레지스트용 공중합체 |
US6818376B2 (en) * | 1999-08-23 | 2004-11-16 | Hynix Semiconductor Inc. | Cross-linker monomer comprising double bond and photoresist copolymer containing the same |
CN1139609C (zh) * | 2000-05-30 | 2004-02-25 | 上海交通大学 | 聚丙烯酸多臂星状可加工高吸水性树脂 |
CN100572411C (zh) * | 2004-05-31 | 2009-12-23 | 日本曹达株式会社 | 丙烯酸类星形聚合物 |
ES2403156T3 (es) * | 2004-05-31 | 2013-05-14 | Nippon Soda Co., Ltd. | Polímero de estrella acrílico |
JP4767552B2 (ja) | 2005-02-21 | 2011-09-07 | 日本曹達株式会社 | フェノール系スターポリマー |
DE102005041528A1 (de) * | 2005-08-31 | 2007-03-01 | Rohmax Additives Gmbh | Öllösliche Polymere |
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WO2009028212A1 (ja) | 2009-03-05 |
JPWO2009028212A1 (ja) | 2010-11-25 |
CN101784575A (zh) | 2010-07-21 |
CN101784575B (zh) | 2012-06-20 |
US20100210805A1 (en) | 2010-08-19 |
EP2186838B1 (en) | 2014-08-27 |
EP2186838A1 (en) | 2010-05-19 |
KR20100046020A (ko) | 2010-05-04 |
JP5340158B2 (ja) | 2013-11-13 |
EP2186838A4 (en) | 2011-03-02 |
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