KR100724157B1 - Manufacturing method of OLED by insulator layer photo patterning - Google Patents
Manufacturing method of OLED by insulator layer photo patterning Download PDFInfo
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- KR100724157B1 KR100724157B1 KR1020040072257A KR20040072257A KR100724157B1 KR 100724157 B1 KR100724157 B1 KR 100724157B1 KR 1020040072257 A KR1020040072257 A KR 1020040072257A KR 20040072257 A KR20040072257 A KR 20040072257A KR 100724157 B1 KR100724157 B1 KR 100724157B1
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- 238000000059 patterning Methods 0.000 title claims abstract description 11
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 8
- 239000012212 insulator Substances 0.000 title description 2
- 239000000758 substrate Substances 0.000 claims abstract description 14
- UMIVXZPTRXBADB-UHFFFAOYSA-N benzocyclobutene Chemical compound C1=CC=C2CCC2=C1 UMIVXZPTRXBADB-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000002184 metal Substances 0.000 claims abstract description 10
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 8
- 238000002207 thermal evaporation Methods 0.000 claims abstract description 8
- 239000011368 organic material Substances 0.000 claims abstract description 7
- 229910004205 SiNX Inorganic materials 0.000 claims abstract description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052814 silicon oxide Inorganic materials 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 16
- 238000000151 deposition Methods 0.000 claims description 6
- 238000010030 laminating Methods 0.000 claims description 6
- 239000011521 glass Substances 0.000 claims description 5
- 238000007650 screen-printing Methods 0.000 claims description 4
- 238000004528 spin coating Methods 0.000 claims description 4
- 238000010292 electrical insulation Methods 0.000 abstract description 3
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical group [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 abstract description 3
- 239000010408 film Substances 0.000 description 32
- 239000010410 layer Substances 0.000 description 16
- 238000004544 sputter deposition Methods 0.000 description 6
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000001312 dry etching Methods 0.000 description 3
- 238000001039 wet etching Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000005525 hole transport Effects 0.000 description 2
- UHXOHPVVEHBKKT-UHFFFAOYSA-N 1-(2,2-diphenylethenyl)-4-[4-(2,2-diphenylethenyl)phenyl]benzene Chemical compound C=1C=C(C=2C=CC(C=C(C=3C=CC=CC=3)C=3C=CC=CC=3)=CC=2)C=CC=1C=C(C=1C=CC=CC=1)C1=CC=CC=C1 UHXOHPVVEHBKKT-UHFFFAOYSA-N 0.000 description 1
- 206010027146 Melanoderma Diseases 0.000 description 1
- 230000002457 bidirectional effect Effects 0.000 description 1
- UFVXQDWNSAGPHN-UHFFFAOYSA-K bis[(2-methylquinolin-8-yl)oxy]-(4-phenylphenoxy)alumane Chemical compound [Al+3].C1=CC=C([O-])C2=NC(C)=CC=C21.C1=CC=C([O-])C2=NC(C)=CC=C21.C1=CC([O-])=CC=C1C1=CC=CC=C1 UFVXQDWNSAGPHN-UHFFFAOYSA-K 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
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- 239000012044 organic layer Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- TVIVIEFSHFOWTE-UHFFFAOYSA-K tri(quinolin-8-yloxy)alumane Chemical compound [Al+3].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 TVIVIEFSHFOWTE-UHFFFAOYSA-K 0.000 description 1
- 239000011345 viscous material Substances 0.000 description 1
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
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- H—ELECTRICITY
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/124—Insulating layers formed between TFT elements and OLED elements
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- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
- H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
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- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
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- H—ELECTRICITY
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- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
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- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
- H10K71/231—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers
- H10K71/233—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers by photolithographic etching
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- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
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- H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
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Abstract
본 발명은 절연막 패터닝에 의한 유기 전계 발광 소자의 제작 방법에 관한 것으로, 더욱 상세하게는 양전극(ITO) 위에 절연막을 적층하고 그 절연막을 패터닝한 유기 전계 발광 소자의 제작 방법에 관한 것이다.The present invention relates to a method of manufacturing an organic electroluminescent device by patterning an insulating film, and more particularly, to a method of manufacturing an organic electroluminescent device in which an insulating film is laminated on a positive electrode (ITO) and the insulating film is patterned.
통상적으로, 면광원으로 사용되는 유기 전계 발광 소자는 투명 기판 위에 양전극인 ITO(Indium-tin-oxide), 발광유기물질, 메탈 음전극을 진공 열증착하여 제작할 경우 휘도의 감소, 휘도의 균일성 저하, 수명의 감소 등이 일어난다.Generally, when an organic electroluminescent device used as a surface light source is manufactured by vacuum thermal deposition of indium-tin-oxide (ITO), a luminescent organic material, and a metal negative electrode on a transparent substrate, reduction in luminance, And a reduction in life span.
상기와 같은 문제점을 해결하기 위하여 양전극 상면에 전기적 절연성이 우수한 PR(Photoresist), BCB(Benzocyclobutene), SiOx, SiNx 등과 같은 절연막을 적층한다. 또한 적층된 절연막을 패터닝하므로써 고휘도, 휘도의 균일성 확보, 수명 향상을 이룰 수 있다.In order to solve the above problems, an insulating film such as photoresist (PR), benzocyclobutene (BCB), SiOx, SiNx or the like having excellent electrical insulation is laminated on the upper surface of the positive electrode. Further, by patterning the laminated insulating film, it is possible to achieve high luminance, uniformity of luminance, and life.
유기 전계 발광 소자(OLED), 유기EL, 면광원, 절연막, 패터닝Organic electroluminescent device (OLED), organic EL, planar light source, insulating film, patterning
Description
도 1은 기존의 유기 전계 발광 소자의 단면도1 is a cross-sectional view of a conventional organic electroluminescent device
도 2는 ITO 상면에 균일하게 도포된 절연막을 고정세 파인 메탈마스크를 사용하여 노광하는 단면도FIG. 2 is a cross-sectional view of an insulating film uniformly applied on the ITO surface exposed using a metal mask
도 3a는 ITO 상면에 절연막이 일정한 패턴으로 되어 있는 단면도3A is a cross-sectional view in which an insulating film is patterned on a top surface of ITO
도 3b는 ITO 상면에 모서리(edge)부분만 패턴되어 있는 도면과 일정한 패턴이 있는 도.FIG. 3B is a view in which only an edge portion is patterned on the upper surface of the ITO, and FIG.
도 4는 일정한 패턴이 있는 절연막 상면에 유기물층 및 금속 전극층을 증착한 단면도.4 is a cross-sectional view of an organic layer and a metal electrode layer deposited on an upper surface of an insulating film having a predetermined pattern.
도 5는 종래의 유기 전계 발광 소자와 본 발명의 일 예에 따른 절연막 패턴이 있는 유기 전계 발광 소자의 발광 현상 비교도.5 is a diagram illustrating a comparison of a light emitting phenomenon of a conventional organic electroluminescent device and an organic electroluminescent device having an insulating film pattern according to an example of the present invention.
<도면의 주요 부분에 대한 부호의 설명>Description of the Related Art
400 - 일정한 절연막 패턴에 의한 유기 전계 발광 소자400 - Organic electroluminescent device with constant insulating film pattern
401 - 유리 또는 가요성 필름 기판 등과 같은 투명기판401 - transparent substrate such as glass or flexible film substrate
410 - ITO(Indium-tin-oxide)와 같은 투명 양전극410 - Transparent positive electrode such as indium-tin-oxide (ITO)
420 - 절연막420 - Insulating film
431 - 정공 주입층431 - Hole injection layer
432 - 정공 수송층432 - hole transport layer
433 - 발광층433 - luminescent layer
434 - 정공 제한층434 - hole confinement layer
435 - 전자 수송층435 - electron transport layer
436 - 전자 주입층436 - electron injection layer
440 - 금속 음전극층440 - Metal negative electrode layer
본 발명은 양전극(ITO:induim-tin-oxide) 상면에 절연막을 적층한 후 패터닝함으로써 고휘도, 휘도의 균일성 향상, 효율의 증대, 수명을 향상시키는 유기 전계 발광 소자의 제작 방법에 관한 것이다.The present invention relates to a method of fabricating an organic electroluminescent device that enhances uniformity, increases efficiency, and improves lifetime by laminating an insulating film on a top surface of an ITO (Indium-Tin-Oxide) and then patterning the same.
통상적으로, 유기 전계 발광 소자는 도 1에서와 같이 유리와 같은 투명한 기판 위에 양전극인 ITO를 스퍼터(sputter) 방식으로 증착하고, 그 상면에 발광 유기 물질을 열증착하고, 그 상면에 음전극으로 알루미늄(Al)과 같은 메탈 음전극을 열증착하여 제작한다. 유기 전계 발광 소자의 발광 면적이 수 ㎠까지는 휘도 및 효율 의 차이가 크게 일어나지 않으나, 발광 면적이 커질수록 최대 휘도가 감소하고, 휘도의 균일성도 현저하게 떨어진다. 또한, 유기 전계 발광 소자에 흑점(dark spot)이 생기면 그 흑점이 성장하여 소자 전체로 퍼져서 면광원 유기 전계 발광 소자의 수명에 아주 큰 영향을 미치게 된다.Typically, an organic electroluminescent device is formed by depositing ITO, which is a positive electrode, on a transparent substrate such as glass as shown in FIG. 1 by sputtering, depositing a light emitting organic material on the top surface thereof, ) Are formed by thermal evaporation. Until the light emitting area of the organic electroluminescent device is several cm < 2 >, the difference in brightness and efficiency does not occur largely. However, as the light emitting area becomes larger, the maximum luminance decreases and the uniformity of brightness remarkably decreases. In addition, when a dark spot is formed in the organic electroluminescent device, the black spot grows and spreads to the entire device, which greatly affects the lifetime of the surface light source organic electroluminescent device.
본 발명에서는 상기와 같은 문제점을 해결하기 위하여 유기 전계 발광 소자의 양전극(ITO) 상면에 절연막을 적층한 후 그 절연막을 패터닝하여 유기 전계 발광 소자를 제작하는 것을 특징으로 한다.In order to solve the above problems, the present invention is characterized in that an organic EL device is fabricated by laminating an insulating film on the upper surface of an ITO of an organic electroluminescent device, and then patterning the insulating film.
본 발명은 상기와 같은 문제점을 해결하기 위한 것으로서, 유기 전계 발광 소자의 양전극(ITO) 상면에 절연막을 적층하는 것을 목적으로 하고 있다.SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and it is an object of the present invention to laminate an insulating film on the upper surface of a positive electrode (ITO) of an organic electroluminescent device.
본 발명의 다른 목적은 적층된 절연막을 일정한 모양으로 패터닝하여 그 상면에 발광 유기 물질 및 메탈 음전극을 열증착하여 유기 전계 발광 소자의 고휘도, 휘도의 균일성 확보, 효율증대, 수명 향상 등을 목적으로 하고 있다.Another object of the present invention is to provide a method of patterning a stacked insulating film in a predetermined shape and thermally vapor-depositing a light emitting organic material and a metal cathode on the top surface thereof, thereby achieving high brightness, uniformity of brightness, .
상기와 같은 목적을 달성하기 위한 본 발명의 특징에 따르면, 유리, 가요성 필름 등과 같은 투명한 기판 상면에 양전극(ITO)을 스퍼터 방식으로 증착하고 그 상면에 절연특성이 우수한 포토레지스트(Photoresist) 또는 BCB(Benzocyclobutene)는 스핀코팅 또는 스크린 프린팅과 같은 방법을 사용하여 균일하게 도포한다. 또한, 절연 특성이 좋은 무기물질 예를 들어 SiOx, SiNx 등과 같은 물질은 진공열증착 또는 스퍼터방식으로 균일하게 증착 한다. 그 후에 wet etching, 또는 dry etching 방법을 이용하여 일정한 패턴을 형성하여 이루어지는 유기 전계 발광 소자의 제작 방법를 제공한다.According to an aspect of the present invention for achieving the above object, there is provided a method of manufacturing a thin film transistor in which a positive electrode (ITO) is deposited by sputtering on a transparent substrate such as a glass or a flexible film and a photoresist or BCB (Benzocyclobutene) is uniformly applied using a method such as spin coating or screen printing. In addition, materials such as SiOx, SiNx and the like having good insulating properties are uniformly deposited by vacuum thermal deposition or sputtering. And thereafter forming a predetermined pattern using a wet etching method or a dry etching method.
상기와 같은 목적을 달성하기 위한 본 발명에 따르면, 유리, 가요성 필름 등과 같은 투명 기판과, 투명기판 상면에 스퍼터 방식으로 증착한 양전극(ITO)와, 양전극(IT0) 상면에 절연특성이 우수한 포토레지스트(Photoresist), BCB(Benzocyclobutene) 등이 스핀코팅, 스크린 프린팅과 같은 방법으로 균일하게 도포되거나 무기물질(예를 들어 SiOx, SiNx)이 진공열증착, 스퍼터 방식으로 균일하게 증착되며 도포된 절연막과, 그 절연막을 wet etching, 또는 dry etching 방법을 이용하여 일정한 패턴을 형성하며, 일정한 패턴으로 형성된 절연막 상면에 발광유기물질이 적층된 유기 전계 발광 소자를 제공한다. 여기서, 절연막은 아세톤 등과 같은 유기 용매들에 변하지 않는 특징이 있다.
이하, 본 발명에 의한 절연막 패터닝에 의한 유기 전계 발광 소자의 제작 방법을 바람직한 실시예가 첨부된 도면을 참조하여 구체적으로 설명한다.According to an aspect of the present invention, there is provided a plasma display panel comprising: a transparent substrate such as a glass or a flexible film; a positive electrode (ITO) deposited on the top surface of the transparent substrate by a sputtering method; A photoresist, a BCB (Benzocyclobutene) or the like is uniformly applied by a method such as spin coating or screen printing, or an inorganic material (for example, SiOx, SiNx) is uniformly deposited by a vacuum thermal deposition method or a sputtering method, The organic electroluminescent device has a pattern formed by wet etching or dry etching of the insulating film, and a light emitting organic material is laminated on the insulating film formed in a predetermined pattern. Here, the insulating film is characterized in that it does not change into organic solvents such as acetone and the like.
Hereinafter, a method of manufacturing an organic electroluminescent device by patterning an insulating film according to the present invention will be described in detail with reference to the accompanying drawings.
실시예 1Example 1
전기적 절연성이 우수하고 포토레지스트(Photoresist) 또는 BCB(Benzocyclobutene)와 같이 감광성(photosensitive)있고 점성이 있는 물질의 경우 일정한 모양으로 패턴된 앙전극(ITO) 상면에 스핀 코팅이나 스크린 프린팅 방법을 이용하여 균일하게 도포한 후 일정한 패턴의 절연막으로 적층할 수 있다. 물론, 절연막을 일정한 패턴으로 형성하는 방법은 잉크젯 프린팅 방법을 이용하여 형성하는 방법, 고정세 파인 메탈 마스크를 이용한 진공 열증착, RF sputter, Grid RF sputter, DC sputter, DC pulst sputter, ALD(atomic layer deposition), REALD(Plasma enhanced layer deposition) 방법 들 중에 어느 하나일 수 있다.
이와 같이 형성된 절연막의 일정한 패턴은 절연막이 적층된 양전극(ITO)의 모양이 원형, 사각형 또는 육각형 중 어느 하나인 것일 수 있다.
또한, 일정한 패턴으로 형성된 절연막인 경우, 절연막의 높이(두께)는 100 nm ~ 0.1 mm로 형성되며, 절연막에 형성된 패턴간의 간격은 10 nm ~ 0.1 mm로 형성되며, 한 유기 전계 발광 소자상의 절연막 사이의 간격이 100 nm ~ 1 cm 인 것을 특징으로 한다.
도 2와 도시된 유기 전계 발광 소자는 고정세 파인 메탈 마스크를 이용하여 일정 시간 노광을 한다. 그 후에 일정 시간 동안 현상하면 도 3a 또는 도 3b와 같이 일정한 모양의 절연막 패턴이 있는 기판을 제작할 수 있다.In the case of a photosensitive and viscous material such as photoresist or BCB (Benzocyclobutene), which is excellent in electrical insulation property, the upper surface of the ITO electrode patterned in a uniform shape is uniformly formed by spin coating or screen printing, And then laminated with an insulating film having a uniform pattern. Of course, the insulating film may be formed in a predetermined pattern by using an inkjet printing method, a vacuum thermal deposition using a fixed three-dimensional metal mask, an RF sputter, a Grid RF sputter, a DC sputter, a DC pulst sputter, deposition, and REALD (Plasma Enhanced Layer Deposition) methods.
A certain pattern of the insulating film formed as described above may be any one of a round shape, a square shape, and a hexagonal shape of a positive electrode (ITO) in which an insulating film is stacked.
In the case of an insulating film formed in a predetermined pattern, the height (thickness) of the insulating film is formed to be 100 nm to 0.1 mm, the spacing between the patterns formed on the insulating film is 10 nm to 0.1 mm, Is 100 nm to 1 cm.
The organic electroluminescent device shown in FIG. 2 is exposed for a predetermined time using a metal mask having a fine three-dimensional structure. After that, when the substrate is developed for a predetermined time, a substrate having an insulating film pattern of a predetermined shape as shown in FIG. 3A or FIG. 3B can be manufactured.
실시예 2Example 2
전기적 절연성이 우수한 SiOx나 SiNx의 경우 진공열증착 방법이나 스퍼터링 방법을 이용하여 일정한 모양으로 패턴된 양전극(ITO) 상면에 균일하게 증착한다. 그 후에 실시예 1과 같이 포토레지스트를 사용하여 일정하게 패턴을 형성한 후에 BOE(Bufferd Oxide Etch) 등과 같은 에천트를 사용하여 wet etching 을 하거나 플라즈마를 이용하여 dry etching을 하면 도 3a와 같이 일정한 모양의 절연막 패턴이 있는 기판을 제작할 수 있다.In the case of SiOx or SiNx, which is excellent in electrical insulation, it is uniformly deposited on the top surface of a positive electrode (ITO) patterned in a uniform pattern by using a vacuum thermal deposition method or a sputtering method. Thereafter, a pattern is uniformly formed using a photoresist as in Example 1, and then wet etching is performed using an etchant such as BOE (Bufferd Oxide Etch) or the like, or when dry etching is performed using plasma, The substrate having the insulating film pattern of FIG.
실시예 3Example 3
상기 실시예 1과 실시예 2에서 일정한 절연막(420)이 있는 투명한 양전극(ITO)(410) 기판 위에 도 4와 같이 CuPC와 같은 정공주입층(431), NPB와 같은 정공수송층(432), DPVBi와 같은 발광층(433), BAlq와 같은 정공제한층(434), Alq3와 같은 전자수송층(435), LiF와 같은 전자주입층(436), Al과 같은 금속 음전극층(440)을 차례로 진공 열증착하여 유기 전계 발광 소자를 제작한다.
이 경우, 일정한 패턴으로 형성된 절연막의 상면에 적층되는 물질을 통칭하여 발광유기물질이라 한다. 이 때, 발광유기물질은 저분자 또는 고분자일 수 있다.As shown in FIG. 4, a
In this case, the material to be laminated on the upper surface of the insulating film formed in a certain pattern is collectively referred to as a light emitting organic material. At this time, the light-emitting organic material may be a low molecular weight or a high molecular weight material.
통상적으로 일정한 패턴을 가진 절연막(420)이 없는 경우 유기 전계 발광 소자는 도 5의 왼쪽 그림과 같이 휘도 불균일이 발생한다. 즉, 유기 전계 발광 소자의 면광원에서 상대적으로 어느 한쪽이 심하게 휘도가 불균일 일어나면 발광 유기물질이 스트레스를 받아 수명이 단축된다. 또한, 전압(전류)를 계속 인가할 경우 특정부위만 밝게 빛나기 때문에 고휘도를 얻을 수 없다. 그러나 도 5의 오른쪽 그림과 같이 휘도가 상대적으로 균일할 경우 전압(전류)를 계속 인가할 경우 전압(전류)에 따른 고휘도를 낼 수 있으며 또한 상대적으로 수명이 증가한다.
물론, 도면에는 도시되어 있지 않으나, 상기 투명기판의 전면 뿐 아니라 후면에도 양전극(ITO)을 증착하고 양전극(ITO) 위에 절연막을 적층하며 일정한 모양으로 패터닝한 후 상기 전면 및 후면 방향으로 발광유기물질을 각각 적층하여 양면으로 발광되도록 유기 전계 발광 소자를 구성할 수도 있다.
본 발명의 또 다른 실시예로, 투명기판의 일면을 이용하여 제작된 유기 전계 발광 소자를 서로 결합하여 양방향 광원으로 제작할 수도 있다.
이 경우, 핸드폰 내외부창 화면을 포함한 양방향 백라이트 응용제품에 사용되는 것을 특징으로 하는 유기 전계 발광 소자를 형성할 수도 있다.In the absence of the
Of course, although not shown in the drawing, a positive electrode (ITO) is deposited on the front surface as well as the rear surface of the transparent substrate, an insulating film is laminated on the positive electrode (ITO), patterned in a predetermined shape, The organic electroluminescent device may be configured to be stacked and emit light on both sides.
In another embodiment of the present invention, the organic electroluminescent devices fabricated using one side of the transparent substrate may be combined with each other to form a bi-directional light source.
In this case, the organic electroluminescent device may be formed, which is used for a bidirectional backlight application including a window screen inside and outside a mobile phone.
이상에서 상술한 바와 같이 본 발명의 절연막 패터닝에 의한 유기 전계 발광 소자 면광원 제작방법에 대하여 다음과 같은 효과를 얻을 수 있다.As described above, the following effects can be obtained with respect to the manufacturing method of the surface light source of the organic EL device by the insulating film patterning of the present invention.
첫째, 양전극(ITO) 상면에 절연체를 적층한 후 패터닝함으로써 유기 전계 발광 소자의 휘도가 증가 된다.First, the brightness of the organic electroluminescent device is increased by laminating the insulator on the top surface of the positive electrode (ITO) and then patterning.
둘째, 휘도의 균일성을 향상시켜준다.Second, it improves the uniformity of luminance.
셋째, 흑점이 생기면 패턴된 곳까지만 성장하기 때문에 소자의 수명을 향상시킬 수 있다.Third, when the black spots are formed, they grow only to the patterned area, so that the lifetime of the device can be improved.
본 발명은 도면에 도시된 실시예를 참고로 설명되었으나 이는 예시적인 것에 불과하며, 본 기술 분야의 통상의 지식을 가진 자라면 이로부터 다양한 변형 및 균등한 타 실시예가 가능하다는 점을 이해할 것이다. 따라서, 본 발명의 진정한 기술적 보호 범위는 첨부된 등록청구범위의 기술적 사상에 의해 정해져야 할 것이다. While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is evident that many alternatives, modifications and variations will be apparent to those skilled in the art. Accordingly, the true scope of the present invention should be determined by the technical idea of the appended claims.
Claims (11)
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| KR101250879B1 (en) * | 2011-11-14 | 2013-04-04 | 엘지디스플레이 주식회사 | Organic light emitting diode device with perforated inorganic layer |
| CN109671873B (en) * | 2018-12-26 | 2020-12-01 | 上海晶合光电科技有限公司 | Bottom electrode patterned organic electroluminescent device capable of being controlled separately and preparation method thereof |
| KR102122710B1 (en) * | 2019-01-02 | 2020-06-15 | 고려대학교 산학협력단 | Nanopixel organic light emitting diode and method of fabricating the same |
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