KR100502000B1 - Coating system of vacuum plating for plastic parts - Google Patents

Abstract

The present invention provides a low cost high quality coating apparatus capable of vacuum depositing a shield thin film using a cylindrical magnetron sputtering source after activating a surface of a plastic product using a three-phase low temperature plasma electrode, regardless of the product structure. The present invention relates to a vacuum deposition coating apparatus for plastic products, which enables coating with a uniform thickness.

The coating device 100,

A vacuum chamber 33 having a mass flow gauge (MFC) 31 having a pressure gauge 30 and an exhaust port 32 for discharging exhaust gas so as to inject argon (Ar) gas used as a discharge medium; ;

A mobile trolley 36 which is slidably mounted on the rail 34 provided in the vacuum chamber 33 and has a wheel 35;

An outer jig 39 provided above the guide roller 38 held by the supporter 37 on both sides of the moving cart 36;

An inner jig 40 which is maintained on the inner side of the outer jig 39 and is supported by a support 41 which is erected at the center of the moving cart 36 by maintaining a predetermined interval;

A plurality of water-cooled plasma electrodes 50 for generating plasma in the coating space S formed between the outer jig 39 and the inner jig 40;

A plurality of magnetron sputtering sources 60 for coating the plastic product P by sputtering operation;

An exhaust pipe (82) connected to the exhaust port (32) with an adjustment shield (81);

The exhaust pipe (82) includes a diffusion pump (85) connected with the high vacuum valve (83) and the oil cooling trap (84);

A booster pump 88 and a rotary pump 86 connected to the diffusion pump 85;

It characterized in that it comprises a vacuum exhaust system 80 having a boost pump 88 is connected to the high vacuum valve 83 with a low vacuum valve (87).

Description

Coating system of vacuum plating for plastic products

The present invention relates to a vacuum deposition coating apparatus for plastic products, and more particularly, to the provision of an apparatus for easily coating a conductive shield thin film layer on the surface of a plastic product.

Plastic is an organic substance composed of carbon and hydrogen, and its chemical structure is electrically neutral, and has a distinct insulation, but has low heat resistance and poor adhesion to coatings.

Plastic products are frequently used as cases for mobile phones, computers, home appliances and other industrial electrical and electronic products.

Currently, coatings on plastic products are mostly chemical wet copper coating followed by wet coating or spray coating.

Such a coating method is complicated in operation, adds to the nonuniformity of the film thickness and environmental pollution, and problems such as separation of the coating layer over time.

In general, the parts of electrical, electronic, and communication equipment which are widely used are performing precision coating or shield coating to block harmful electromagnetic waves. In the case of spray method, these coatings are mixed with conductive metal powder and sprayed. Since it is not good and the electrical resistance is large, there is a problem in that the coating thickness is not only thick, but also the coating thickness is uneven.

Recently, a vacuum coating apparatus has been developed and used to perform vacuum deposition after a low temperature ion beam treatment or RF plasma treatment of a plastic product in a vacuum chamber.

Such a vacuum coating device has a disadvantage that an ion beam device and an RF (RF) power device are expensive, and the planar magnetron sputtering source used in the conventional vacuum coating device has a limited evaporation angle, so that it is possible to coat a complex structure. In this case, there are various problems in which non-uniform coating or non-coating surface is generated and efficiency and productivity are lowered.

Therefore, the present invention is invented to solve the above problems, and the surface of the plastic product is etched or activated by plasma treatment of the surface of the plastic product in a vacuum state, as well as the physical adhesion is strengthened, the surface molecules are partially In consideration of the fact that it is converted to a peroxide structure and also enables chemical attachment, in the present invention, it is possible to have a clear adhesion by using a three-phase low temperature plasma for an inexpensive and safe plasma treatment, and an evaporation angle in all directions (360 °). It is characterized in that it provides a coating apparatus using a cylindrical magnetron sputtering source having a.

By using the coating apparatus, regardless of the structure of the plastic product to be coated, it is possible to improve the quality of the coated product by enabling uniform coating over the entire area.

Hereinafter, with reference to the accompanying drawings will be described a preferred configuration and operation of the present invention for achieving the above object.

1 is a block diagram showing a vacuum deposition coating apparatus of a plastic product to which the technique of the present invention is applied, FIG. 2 is an electrical diagram of a three-phase low temperature plasma electrode used in the vacuum deposition coating apparatus of the plastic product of the present invention, FIG. 4 is a configuration diagram of a cylindrical magnetron sputtering source applied to a vacuum deposition coating apparatus of a plastic product of the present invention. It demonstrates together with the block diagram which shows the vacuum exhaust relationship applied to the vacuum vapor deposition coating apparatus of the inventors plastic product.

Coated paper 100 to which the technology of the present invention is applied,

One side has a mass flow gauge (MFC) 31 having a pressure gauge 30 to inject argon (Ar) gas or oxygen used as a discharge medium, and the other side has a cylinder having an exhaust port 32 for evacuation A vacuum chamber 33 is provided.

In the vacuum chamber 33, a moving cart 36 having a wheel 35 slidably is installed on a rail 34 provided to maintain a predetermined interval in the axial direction of the vacuum chamber 33.

On the upper side of the guide roller 38 held by the supporter 37 on both sides of the moving bogie 36 is provided with an outer jig 39 of the tubular type, both sides of which are open, and inside the outer jig 39 Maintain a certain interval to install the inner jig 40 to be maintained by the support 41 which is erected in the center of the moving cart 36.

It is natural to mount the plastic product P to be coated on the inner side of the outer jig 39 and the outer surface of the inner jig 40.

The outer jig 39 is rotated by a guide roller 38 connected by a detachable means such as a drive unit 42 and a coupler, which are configured as a motor and a reducer installed outside the vacuum chamber 33.

The inner jig 40 is the intermediate and driven chain gears 44, which are installed on the upper and lower sides of the main chain gear 43 and the support 41 for holding the inner jig 40, which is installed together with the guide roller 38, 45) and chain 46 to drive.

The vacuum chamber 33 positioned in the coating space S formed between the outer jig 39 and the inner jig 40 has a plurality of water-cooled plasma electrodes 50 for plasma generation and a sputtering operation. ) A plurality of magnetron sputtering source (60) to perform the coating, and a vacuum exhaust system (80) is connected to the exhaust port (32).

Of course, in the coating space (S) to preheat the plastic product (P) to install a heater 47 to promote the release of the latent gas to improve the coating quality, the heating temperature and the vacuum chamber of the heater 47 ( 33) Install the temperature sensor 48 at the proper position to detect the internal temperature.

The plasma electrode 50 inputs the required voltage to the waveform changer 53 from the three-phase external power supply 380v through the SRC voltage controller 51 and the boost transformer 52, and inputs the waveform changer 53. To receive power.

The plasma electrode 50 forms a low-temperature plasma by glow discharge ionizing the discharge gas in the vacuum chamber 33 to convert the plastic product P into an etching or activation and a partial peroxide structure to form a hydrophilic surface.

The magnetron sputtering source 60 is provided with a sputtering target 61 of a cathode formed in a columnar shape of a nonmagnetic metal such as copper, aluminum, titanium, or stainless steel, and is provided inside the sputtering target 61. The shaft 62 is arranged by forming a magnet 64 for generating a magnetic field.

The magnetron sputtering source 60 is a sputtering target 61 in the intermediate position of the intermediate magnets assembling each of the magnets 64 on the shaft 62 in the order of NS, SN as shown in FIG. Sputtering 63 is generated in the 360 ° direction from the outer surface of the c) and the magnet reciprocating in the axial direction is configured as a magnet reciprocating type to enable uniform evaporation over the entire outer surface of the sputtering target (61). .

As another example of the magnetron sputtering source 60, as shown in FIG. 4, four or more magnets 64 are assembled on the shaft 62 provided inside the sputtering target 61, and the poles and the poles are adjacent to each other. When arranged in NS or SN, the sputtering 63 evaporates in a straight line with respect to the longitudinal direction of the sputtering target 61 on the outer surface of the sputtering target 61 at the center position of NS or SN, and the magnet 64 is formed. By rotating, it may be configured as a magnet rotation type that enables evaporation uniformly throughout the sputtering target 61.

The magnetron sputtering source 60 as described above may be arranged in a single or in combination, and when the sputtering target 61 is arranged in combination of different materials, it is preferable to place the magnetron sputtering source 60 in a position without mutual interference.

The vacuum exhaust system 80 is connected to an exhaust pipe 82 having an exhaust port 32 and an adjustment shield 81 of the vacuum chamber 33, and the exhaust pipe 82 has a high vacuum valve 83 and an oil cooling trap. A diffusion pump 85 having 84 is connected.

The diffusion pump 85 is connected to the high vacuum valve 93, and then the high vacuum valve 93 → booster pump 88 → rotary pump 86 routes and the high vacuum valve 93 → valve 94 → rotary pump ( 86. The high vacuum valve 83 is connected to the boost pump 88 having the low vacuum valve 87 at an intermediate position.

A high vacuum parallel valve 90 is further provided between the exhaust pipe 82 and the oil cooling trap 84 to prevent oil backflow of the diffusion pump 85 and maintain a normal exhaust speed during vacuum coating. The low vacuum parallel valve 91 and the flow rate control valve 92 are further provided between the 83 and the boost pump 88 to maintain the inside of the vacuum chamber 33 at a constant pressure during the plasma treatment.

The present invention as described above,

After mounting the plastic product P which has undergone the external cleaning process on the inner side of the outer jig 39 and the outer side of the inner jig 40 provided in the moving cart 36, the vacuum chamber 33 is opened to open the vacuum chamber ( 33, so that the wheels 35 of the mobile truck 36 is seated on the rails 34 provided in the rail 34, and then slides.

In such a state, the inside of the vacuum chamber 33 is maintained in a vacuum state using the vacuum exhaust system 80, and then the heater 47 is operated to perform preheating, and is appropriate (preset) by the temperature sensor 48. If the temperature is maintained, the gas remaining in the plastic product (P) is exhausted.

After preheating, the gas remaining in the plastic product (P) is exhausted, and oxygen or external air, which is a discharge medium, is injected to reach a set pressure, and then three-phase electric power is supplied to the plasma electrode 50 to perform plasma treatment. .

At this time, the outer jig 39 is rotated by the guide roller 38 that is rotated by the drive means 42, the inner jig 40 is the drive chain gear 43 and the chain (installed in the guide roller 38) 46 is rotated by the intermediate and driven chain gears (44, 45) connected to, and the rotation direction may proceed regardless of the same direction or the reverse direction.

By rotating the plastic product (P) in the plasma surface treatment process by the plasma electrode 50 is supplied with a three-phase power as described above, regardless of the complex structure of the plastic product (P), the entire part is etched or surface molecules It is partially converted into a peroxide structure, enabling chemical adhesion to be activated and strengthening physical adhesion.

After the plasma treatment of the plastic product P is completed by the above operation, the vacuum chamber 33 is exhausted again in a high vacuum state by using the vacuum exhaust system 80 to remove residual air (oxygen) cleanly, and then to the next step. It is to prevent oxidation and nitriding which may occur in the coating process.

After the exhaust is completed, while argon (Ar) gas is injected into the discharge gas through the pressure gauge 30 or the mass flow gauge (MFC) 31, the sputtering target 61 is used as the cathode, and a magnetic field is applied to the cathode surface. By zooming, ring sputtering 63 occurs at the surface of the sputtering target 61, and atomic molecules are deposited on the surface of the plastic product P which has been evaporated and activated.

In the case where the magnetron sputtering source 60 is a magnet reciprocating type, the magnets 64 assembled to the shaft 62 provided in the sputtering target 61 are reciprocated in the axial direction of the sputtering target 61 so that each magnet ( It is possible to uniformly evaporate over the entire outer surface of the sputtering target 61 without evaporating only the sputtering target 61 where 64 is located.

And, in the case of the magnet rotation type, the evaporation action is performed at the outer surface of the sputtering target 61 corresponding to the intermediate position of the pole and the pole of each magnet 64 provided on the inner shaft 62 of the sputtering target 61. Since the magnet 64 rotates, the sputtering target 61 may be uniformly consumed by allowing the sputtering target 61 to uniformly evaporate over the entire outer surface of the sputtering target 61.

In particular, the sputtering target 61 is evaporated in all directions, and the outer jig 39 and the inner jig 40 in which the plastic part P is mounted are rotating, regardless of the complexity of the part structure. It is possible to deposit evenly in every corner.

In the vacuum exhaust system 80, a high vacuum parallel valve 90 is disposed between the exhaust pipe 82 and the oil cooling trap 84 so as to prevent oil backflow of the diffusion pump 85 and maintain a normal exhaust speed during vacuum coating. And a low vacuum parallel valve 91 and a flow rate control valve 92 which can maintain the inside of the vacuum chamber 33 at a constant pressure during the plasma treatment, between the high vacuum main valve 83 and the booster pump 88. By further installing in the air, it is possible to maintain an efficient exhaust relationship.

The present invention as described above uses a three-phase low-temperature plasma electrode to activate the surface of the plastic product, a low-cost, high-quality coating apparatus that can vacuum-deposit the shield thin film using a magnet reciprocating and a magnet type magnetron type of magnet rotation type By providing a coating with a uniform thickness regardless of the structure of the product to provide a significant contribution to the development of the industry, such as can contribute to the improvement of productivity and the improvement of quality.

1 is a block diagram showing a vacuum deposition coating apparatus of a plastic product to which the technique of the present invention is applied.

Figure 2 is an electrical diagram of a three-phase low temperature plasma electrode used in the vacuum deposition coating apparatus of the present invention plastic products.

Figure 3 is a block diagram of a cylindrical magnetron sputtering source applied to the vacuum deposition coating apparatus of the present invention plastic products.

Figure 4 is another configuration of the columnar magnetron sputtering source applied to the vacuum deposition coating apparatus of the present inventors plastic product.

Figure 5 is a block diagram showing a vacuum exhaust relationship applied to the vacuum deposition coating apparatus of the present invention plastic products.

* Description of the symbols used in the main parts of the drawings *

33; Vacuum chamber

39; External jig

40; Internal jig

50; Plasma electrode

60; Magnetron sputtering source

80; Vacuum Exhaust System

Claims (8)

In constructing a vacuum deposition coating apparatus for plastic products; The coating device 100, A vacuum chamber 33 having a mass flow gauge (MFC) 31 having a pressure gauge 30 for injecting argon (Ar) gas or oxygen used as a discharge medium and an exhaust port 32 for exhaust gas discharge. )Wow; A mobile trolley 36 which is slidably mounted on the rail 34 provided in the vacuum chamber 33 and has a wheel 35; An outer jig 39 provided above the guide roller 38 held by the supporter 37 on both sides of the moving cart 36; An inner jig 40 which is maintained on the inner side of the outer jig 39 and is supported by a support 41 which is erected at the center of the moving cart 36 by maintaining a predetermined interval; A plurality of water-cooled plasma electrodes 50 for generating plasma in the coating space S formed between the outer jig 39 and the inner jig 40; A plurality of magnetron sputtering sources 60 for coating the plastic product P by sputtering operation; An exhaust pipe (82) connected to the exhaust port (32) with an adjustment shield (81); The exhaust pipe (82) includes a diffusion pump (85) connected with the high vacuum valve (83) and the oil cooling trap (84); A booster pump 88 and a rotary pump 86 connected to the diffusion pump 85; And a vacuum exhaust system (80) having a boost pump (88) connected to the high vacuum valve (83) with a low vacuum valve (87). The method of claim 1; The plasma electrode 50 includes a waveform changer 53 for receiving a necessary voltage through an SRC voltage controller 51 and a boost transformer 52 to which a three-phase external power source 380v is applied; Vacuum deposition coating apparatus for a plastic product, characterized in that the power is supplied through the waveform changer (53). The method of claim 1; The magnetron sputtering source (60) includes: a sputtering target (61) formed by molding in a cylindrical shape with a nonmagnetic metal; Vacuum deposition coating apparatus for plastic products, characterized in that consisting of a magnet (64) provided for generating a magnetic field on the shaft (62) inside the sputtering target (61). The method of claim 1; Between the exhaust pipe 82 of the vacuum exhaust system 80 and the oil cooling trap 84, a high vacuum parallel valve 90 for preventing oil backflow of the diffusion pump 85 and maintaining a normal exhaust speed during vacuum coating. Equipped; Between the high vacuum valve 83 and the boost pump 88 is further provided with a low vacuum parallel valve 91 and a flow control valve 92 for maintaining the inside of the vacuum chamber 33 at a constant pressure during plasma processing. Vacuum deposition coating apparatus for plastic products. The method of claim 1; The outer jig (39) is rotated by a guide roller (38) connected to the driving means (42) and detachable means installed on the outside of the vacuum chamber (33); The inner jig 40 is a drive chain gear 43 is installed together with the guide roller 38; It is driven by a chain 46 connecting the intermediate chain gear 44 and the driven chain gears 44 and 45 installed on the upper and lower sides of the support 41 for holding the inner jig 40, Vacuum deposition coating equipment for plastic products. The method of claim 1; In the coating space (S) provided in the vacuum chamber 33 at the position between the outer jig 39 and the inner jig 40 to preheat the plastic product P to promote the release of latent gases to improve the coating quality. A heater 47; Vacuum deposition coating apparatus for a plastic product, characterized in that for installing the temperature sensor 48 for sensing the heating temperature of the heater 47 and the temperature inside the vacuum chamber (33). The method of claim 1 or 3; The magnet 64 constituting the magnetron sputtering source 60 is configured to assemble each magnet 64 on the shaft 62 in the order of NS and SN so as to correspond to the intermediate position of the intermediate magnet in which the power line and the magnetic force line are perpendicular to each other. Sputtering 63 is generated in the circumferential direction on the outer surface of the sputtering target 61 to have an evaporation angle in the 360 ° direction; A vacuum reciprocating coating apparatus for a plastic product, characterized in that the magnet 64 is a magnet reciprocating type to reciprocate in the axial direction so that evaporation occurs uniformly over the entire outer surface of the sputtering target 61. The method of claim 1 or 3; The magnets 64 constituting the magnetron sputtering source 60 may have four or more even numbers of magnets 64 provided on the inner shaft 62 of the sputtering target 61 so as to be different poles from the adjacent poles. Placed radially; The evaporation occurs in the longitudinal direction of the outer surface of the sputtering target (61) between the other pole (N-S or S-N) of the magnet (64); Rotating the magnet (64) is a vacuum deposition coating apparatus for plastic products, characterized in that configured to enable uniform evaporation over the entire outer surface of the sputtering target (61).