JPWO2020159666A5 - - Google Patents
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- JPWO2020159666A5 JPWO2020159666A5 JP2021542372A JP2021542372A JPWO2020159666A5 JP WO2020159666 A5 JPWO2020159666 A5 JP WO2020159666A5 JP 2021542372 A JP2021542372 A JP 2021542372A JP 2021542372 A JP2021542372 A JP 2021542372A JP WO2020159666 A5 JPWO2020159666 A5 JP WO2020159666A5
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- 238000001228 spectrum Methods 0.000 claims description 4
- 230000003287 optical effect Effects 0.000 claims description 3
- 239000000463 material Substances 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 230000010287 polarization Effects 0.000 description 3
- 239000000428 dust Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
Description
図2及び図3に関して上記で述べた実施形態のいずれかにおいては、第1のポジショナ106は、単軸AODシステム又は多軸AODシステムとして提供され得る。(例えば上述したような)AODシステム内でのAODの構成に応じて、AODは、縦モードAOD又は剪断モードAODとして特徴付けることができ、直線偏光又は円偏光されたレーザエネルギービームを回折できるようになっていてもよい。このように、レーザエネルギービームの波長に応じて、またAODシステム中のAODのAOセルを形成する材料に応じて、AOD内のAOセルの回折軸がこれに入射するレーザエネルギービームの偏光面に平行又は垂直(あるいは少なくとも実質的に平行又は垂直)となるように内部のAODを方向付けることができる。例えば、レーザエネルギービームの波長は、電磁波スペクトルの紫外線域又は可視緑光域にあり、AODのAOセルは、石英のような材料から形成され、AOセルの回折軸が入射したレーザエネルギービームの偏光面に垂直(又は少なくとも実質的に垂直)になるようにAODを方向付けることができる。他の例においては、レーザエネルギービームの波長がいわゆる電磁波スペクトルの中波長赤外域又は長波長赤外域(すなわち、3μm(又はその前後)から15μm(又はその前後)の範囲にわたる波長)にあり、AODのAOセルが結晶ゲルマニウムのような材料から形成される場合には、AOセルの回折軸が入射したレーザエネルギービームの偏光面に平行(又は少なくとも実質的に平行)になるようにAODを方向付けることができる。 In any of the embodiments described above with respect to Figures 2 and 3, the first positioner 106 may be provided as a single-axis AOD system or a multi-axis AOD system. Depending on the configuration of the AOD within the AOD system (eg, as described above), the AOD can be characterized as a longitudinal mode AOD or a shear mode AOD, such that it can diffract linearly or circularly polarized laser energy beams. It may be. Thus, depending on the wavelength of the laser energy beam and on the material forming the AO cell of the AOD in the AOD system, the diffraction axis of the AO cell within the AOD will align with the plane of polarization of the laser energy beam incident on it. The internal AODs can be oriented to be parallel or vertical (or at least substantially parallel or vertical). For example, the wavelength of the laser energy beam is in the ultraviolet or visible green region of the electromagnetic spectrum, the AO cell of the AOD is made of a material such as quartz, and the diffraction axis of the AO cell is the plane of polarization of the incident laser energy beam. The AOD can be oriented so that it is perpendicular (or at least substantially perpendicular) to the . In another example, the wavelength of the laser energy beam is in the so-called mid-wave or long-wave infrared region of the electromagnetic spectrum (i.e., wavelengths ranging from (or about) 3 μm to (or about) 15 μm), and the AOD is If the AO cell is formed from a material such as crystalline germanium, orient the AOD so that the diffraction axis of the AO cell is parallel (or at least substantially parallel ) to the plane of polarization of the incident laser energy beam. be able to.
一般的に、第2のAOD404は、第2の回転軸が第1の回転軸と異なったものとなるように第1のAOD402に対して方向付けられる。例えば、第2の回転軸は、第1の回転軸に直交していてもよく、あるいは第1の回転軸に対して斜めになっていてもよい。しかしながら、他の実施形態においては、第2のAOD404は、第2の回転軸が第1の回転軸に平行(又は少なくとも実質的に平行)となるように第1のAOD402に対して方向付けられる。この場合において、第2のAOD404上に投影した場合に第1のAOD402の偏向平面が第2のAOD404の偏向平面の方向に対して(例えば、90度又はその前後)回転するように第1のAOD402の偏向平面を(例えば、90度又はその前後だけ)回転させるように1以上の光学的構成要素をビーム経路114’に配置することができる。例えば、上述したように偏向平面を回転させ得る方法の例に関して、国際公開第WO2019/060590A1を参照されたい。 Generally, the second AOD 404 is oriented with respect to the first AOD 402 such that the second axis of rotation is different than the first axis of rotation. For example, the second axis of rotation may be orthogonal to the first axis of rotation or may be oblique with respect to the first axis of rotation. However, in other embodiments, the second AOD 404 is oriented with respect to the first AOD 402 such that the second axis of rotation is parallel (or at least substantially parallel ) to the first axis of rotation. . In this case, the plane of deflection of the first AOD 402 is rotated (eg, 90 degrees or so) relative to the direction of the plane of deflection of the second AOD 404 when projected onto the second AOD 404 . One or more optical components can be placed in the beam path 114' to rotate the deflection plane of the AOD 402 (eg, by 90 degrees or so). See, for example, International Publication No. WO2019/060590A1 for an example of how the plane of deflection may be rotated as described above.
一般的に、第1のAOD402内のAOセルは、第2のAOD404内のAOセルと同一か、あるいはこれと異なり得る材料から形成されている。さらに、第1のAOD402が入射レーザエネルギービームを偏光するために使用する音波の種類(すなわち、剪断モード又は縦モード)は、第2のAOD404が入射レーザエネルギービームを偏光するために使用する音波の種類と同じであってもよいし、あるいはこれと異なっていてもよい。 Generally, the AO cells within the first AOD 402 are formed from the same or different materials as the AO cells within the second AOD 404 . Further, the type of acoustic wave (i.e., shear mode or longitudinal mode) used by the first AOD 402 to polarize the incident laser energy beam is determined by the type of acoustic wave used by the second AOD 404 to polarize the incident laser energy beam. It may be the same as the type, or it may be different.
一体化ビームダンプシステム700及び1000に関する上記説明からすれば、フレーム702及び1002によって提供される上記面は、レーザエネルギーがそれぞれのビームトラップに向かって伝搬し得る内部領域を規定することは理解できるであろう。例えば、フレーム702によって提供される上記面は内部領域726を規定し、フレーム1002によって提供される上記面は内部領域1028を規定する。好ましくない塵や他の粒子又は物体がこれらの内部領域に進入することを防止し、あるいはこれを最小限にするために、一体化ビームダンプシステム700又は1000のいずれかは、必要に応じて、内部領域に及ぶ1以上のプレートを含んでいてもよい。例えば、一体化ビームダンプシステム700は、(例えば、その第1の側方で)フレーム702に連結される第1のプレート728、(例えば、その第1の側方とは反対側の第2の側方で)フレーム702に(例えば、ネジ、接着材、クランプなど、あるいはこれらを任意に組み合わせたものにより)連結される第2のプレート730(図7においては点線で示されている)、又はこれらを組み合わせたものを含んでいてもよい。同様に、一体化ビームダンプシステム1000は、(例えば、その第1の側方で)フレーム1002に連結される第1のプレート1030、(例えば、その第1の側方とは反対側の第2の側方で)フレーム1002に(例えば、ネジ、接着材、クランプなど、あるいはこれらを任意に組み合わせたものにより)連結される第2のプレート1032(図10においては点線で示されている)、又はこれらを組み合わせたものを含んでいてもよい。一体化ビームダンプシステム1000に関しては、上記ではフレーム1002が面1008を提供するものとして説明されているが、面1008は、(例えば、ネジ、接着材、クランプなど、あるいはこれらを任意に組み合わせたものにより)第1のプレート1030に連結されるブロック(例えばブロック1034)により提供されていてもよい。 From the above description of integrated beam dump systems 700 and 1000, it can be appreciated that the surfaces provided by frames 702 and 1002 define interior regions within which laser energy can propagate toward the respective beam traps. be. For example, the surface provided by frame 702 defines interior region 726 and the surface provided by frame 1002 defines interior region 1028 . In order to prevent or minimize the ingress of unwanted dust or other particles or objects into these interior regions, either integrated beam dump system 700 or 1000 may: It may include one or more plates spanning the interior region. For example, the integrated beam dump system 700 includes a first plate 728 coupled to the frame 702 (eg, on a first side thereof) and a second plate 728 (eg, opposite the first side thereof). laterally) to the frame 702 (e.g., by screws, adhesives, clamps, etc., or any combination thereof), or A combination of these may also be included. Similarly, the integrated beam dump system 1000 includes a first plate 1030 coupled to the frame 1002 (eg, on a first side thereof) and a second plate 1030 (eg, on a side opposite the first side thereof). a second plate 1032 (shown in dashed lines in FIG. 10) that is coupled (e.g., by screws, adhesives, clamps, etc., or any combination thereof) to the frame 1002); Or it may contain a combination of these. With respect to the integrated beam dump system 1000, although the frame 1002 is described above as providing the surface 1008, the surface 1008 may be (eg, screws, adhesives, clamps, etc., or any combination thereof). by a block (eg, block 1034) coupled to the first plate 1030.
Claims (18)
前記ビーム経路内に配置され、前記ビーム経路を偏向可能な第1の偏向器と、
前記第1の偏向器の出力と光学的に連結され、前記ビーム経路を偏向可能な第2の偏向器と、
前記第1の偏向器に連結されるコントローラと
を備え、
前記コントローラは、前記ビーム経路を複数のスキャンフィールド内で偏向するように前記第1の偏向器及び前記第2の偏向器の動作を制御するように構成され、前記複数のスキャンフィールドのうち少なくとも2つは互いに重なっておらず、互いに接していない、
レーザ加工装置。 a laser source capable of producing a laser energy beam propagable along a beam path;
a first deflector disposed in the beam path and capable of deflecting the beam path;
a second deflector optically coupled to the output of the first deflector and capable of deflecting the beam path;
a controller coupled to the first deflector ;
The controller is configured to control operation of the first deflector and the second deflector to deflect the beam path within a plurality of scan fields , wherein at least two of the plurality of scan fields are controlled. are not overlapping each other and do not touch each other ,
Laser processing equipment.
スキャンレンズを含む第2のスキャンヘッドと、
前記複数のスキャンフィールドのうち第1のスキャンフィールド内で偏向された前記ビーム経路を前記第1のスキャンヘッドに導くように配置される少なくとも1つの光学的構成要素と、
前記複数のスキャンフィールドのうち第2のスキャンフィールド内で偏向された前記ビーム経路を前記第2のスキャンヘッドに導くように配置される少なくとも1つの光学的構成要素と
をさらに備える、請求項1の装置。 a first scan head including a scan lens;
a second scan head including a scan lens;
at least one optical component arranged to direct the beam path deflected within a first of the plurality of scan fields to the first scan head;
and at least one optical component positioned to direct said beam path deflected within a second of said plurality of scan fields to said second scanhead. Device.
プロセッサと、 a processor;
前記プロセッサによりアクセス可能なメモリであって、前記プロセッサにより実行された際に、前記コントローラに複数のスキャンフィールド内で前記ビーム経路を偏向するように前記第1の偏向器及び前記第2の偏向器の動作を制御させる命令を格納したメモリと A memory accessible by the processor that, when executed by the processor, causes the controller to direct the first deflector and the second deflector to deflect the beam path within a plurality of scan fields. A memory that stores instructions to control the operation of
を備え、with
前記複数のスキャンフィールドのうち少なくとも2つは、互いに重なっておらず、互いに接していない第1のスキャンフィールド及び第2のスキャンフィールドである、 at least two of the plurality of scan fields are a first scan field and a second scan field that are non-overlapping and non-tangent to each other;
コントローラ。controller.
複数のスキャンフィールド内で前記ビーム経路を偏向させるように前記第1の偏向器及び前記第2の偏向器の動作を制御させる controlling operation of the first deflector and the second deflector to deflect the beam path within a plurality of scan fields;
命令を格納し、store the instructions,
前記複数のスキャンフィールドのうち少なくとも2つは、互いに重なっておらず、互いに接していない第1のスキャンフィールド及び第2のスキャンフィールドである、 at least two of the plurality of scan fields are a first scan field and a second scan field that are non-overlapping and non-tangent to each other;
非一過性コンピュータ読取可能媒体。A non-transitory computer-readable medium.
Applications Claiming Priority (7)
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US201962799218P | 2019-01-31 | 2019-01-31 | |
US62/799,218 | 2019-01-31 | ||
US201962832064P | 2019-04-10 | 2019-04-10 | |
US62/832,064 | 2019-04-10 | ||
US201962854579P | 2019-05-30 | 2019-05-30 | |
US62/854,579 | 2019-05-30 | ||
PCT/US2020/012219 WO2020159666A1 (en) | 2019-01-31 | 2020-01-03 | Laser-processing apparatus, methods of operating the same, and methods of processing workpieces using the same |
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JP2022518898A JP2022518898A (en) | 2022-03-17 |
JPWO2020159666A5 true JPWO2020159666A5 (en) | 2022-12-01 |
JP7573535B2 JP7573535B2 (en) | 2024-10-25 |
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JP2021542372A Active JP7573535B2 (en) | 2019-01-31 | 2020-01-03 | Laser processing apparatus, method of operating same, and method of using same to process a workpiece - Patents.com |
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US (1) | US20220048135A1 (en) |
EP (1) | EP3917717A4 (en) |
JP (1) | JP7573535B2 (en) |
KR (1) | KR20210111246A (en) |
CN (1) | CN112867578A (en) |
SG (1) | SG11202103563XA (en) |
TW (1) | TWI843784B (en) |
WO (1) | WO2020159666A1 (en) |
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2019
- 2019-12-25 TW TW108147621A patent/TWI843784B/en active
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2020
- 2020-01-03 SG SG11202103563XA patent/SG11202103563XA/en unknown
- 2020-01-03 JP JP2021542372A patent/JP7573535B2/en active Active
- 2020-01-03 WO PCT/US2020/012219 patent/WO2020159666A1/en unknown
- 2020-01-03 CN CN202080005766.2A patent/CN112867578A/en active Pending
- 2020-01-03 KR KR1020217016628A patent/KR20210111246A/en not_active Application Discontinuation
- 2020-01-03 EP EP20748524.4A patent/EP3917717A4/en active Pending
- 2020-01-03 US US17/276,736 patent/US20220048135A1/en active Pending
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