JPWO2015080158A1 - Polyimide precursor composition, polyimide production method, polyimide, polyimide film, and substrate - Google Patents
Polyimide precursor composition, polyimide production method, polyimide, polyimide film, and substrate Download PDFInfo
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- JPWO2015080158A1 JPWO2015080158A1 JP2015550965A JP2015550965A JPWO2015080158A1 JP WO2015080158 A1 JPWO2015080158 A1 JP WO2015080158A1 JP 2015550965 A JP2015550965 A JP 2015550965A JP 2015550965 A JP2015550965 A JP 2015550965A JP WO2015080158 A1 JPWO2015080158 A1 JP WO2015080158A1
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- Prior art keywords
- polyimide
- polyimide precursor
- mol
- chemical formula
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- 229920001721 polyimide Polymers 0.000 title claims abstract description 577
- 239000004642 Polyimide Substances 0.000 title claims abstract description 376
- 239000002243 precursor Substances 0.000 title claims abstract description 282
- 239000000203 mixture Substances 0.000 title claims abstract description 109
- 239000000758 substrate Substances 0.000 title claims description 87
- 238000004519 manufacturing process Methods 0.000 title claims description 22
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims abstract description 89
- -1 imidazole compound Chemical class 0.000 claims abstract description 68
- 239000000126 substance Substances 0.000 claims description 226
- GIWQSPITLQVMSG-UHFFFAOYSA-N 1,2-dimethylimidazole Chemical compound CC1=NC=CN1C GIWQSPITLQVMSG-UHFFFAOYSA-N 0.000 claims description 33
- 125000003118 aryl group Chemical group 0.000 claims description 30
- 238000010438 heat treatment Methods 0.000 claims description 30
- 238000000034 method Methods 0.000 claims description 29
- 238000002834 transmittance Methods 0.000 claims description 29
- 125000004432 carbon atom Chemical group C* 0.000 claims description 20
- MCTWTZJPVLRJOU-UHFFFAOYSA-N 1-methyl-1H-imidazole Chemical compound CN1C=CN=C1 MCTWTZJPVLRJOU-UHFFFAOYSA-N 0.000 claims description 18
- 125000005103 alkyl silyl group Chemical group 0.000 claims description 12
- 238000009835 boiling Methods 0.000 claims description 12
- 239000001257 hydrogen Substances 0.000 claims description 10
- 229910052739 hydrogen Inorganic materials 0.000 claims description 10
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 10
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 claims description 8
- 125000002723 alicyclic group Chemical group 0.000 claims description 8
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 claims description 6
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 claims description 6
- 150000002460 imidazoles Chemical class 0.000 claims description 6
- 150000004985 diamines Chemical class 0.000 description 101
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 84
- 239000002966 varnish Substances 0.000 description 75
- 239000005340 laminated glass Substances 0.000 description 70
- 239000010408 film Substances 0.000 description 66
- 230000015572 biosynthetic process Effects 0.000 description 50
- 238000003786 synthesis reaction Methods 0.000 description 46
- 239000011521 glass Substances 0.000 description 45
- 238000006243 chemical reaction Methods 0.000 description 44
- 150000000000 tetracarboxylic acids Chemical class 0.000 description 44
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 37
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 36
- 230000000052 comparative effect Effects 0.000 description 36
- 239000001301 oxygen Substances 0.000 description 36
- 229910052760 oxygen Inorganic materials 0.000 description 36
- 239000012528 membrane Substances 0.000 description 35
- 239000012299 nitrogen atmosphere Substances 0.000 description 35
- 239000004810 polytetrafluoroethylene Substances 0.000 description 35
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 35
- 239000002904 solvent Substances 0.000 description 26
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 19
- XPAQFJJCWGSXGJ-UHFFFAOYSA-N 4-amino-n-(4-aminophenyl)benzamide Chemical compound C1=CC(N)=CC=C1NC(=O)C1=CC=C(N)C=C1 XPAQFJJCWGSXGJ-UHFFFAOYSA-N 0.000 description 14
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 14
- 239000003795 chemical substances by application Substances 0.000 description 14
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 12
- NVKGJHAQGWCWDI-UHFFFAOYSA-N 4-[4-amino-2-(trifluoromethyl)phenyl]-3-(trifluoromethyl)aniline Chemical compound FC(F)(F)C1=CC(N)=CC=C1C1=CC=C(N)C=C1C(F)(F)F NVKGJHAQGWCWDI-UHFFFAOYSA-N 0.000 description 11
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 11
- 239000002253 acid Substances 0.000 description 10
- 229920005575 poly(amic acid) Polymers 0.000 description 10
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 10
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- 239000000178 monomer Substances 0.000 description 9
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- 229910001873 dinitrogen Inorganic materials 0.000 description 8
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 8
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- QUPKCFBHJFNUEW-UHFFFAOYSA-N 2-ethyl-4,5-dihydro-1h-imidazole Chemical compound CCC1=NCCN1 QUPKCFBHJFNUEW-UHFFFAOYSA-N 0.000 description 7
- 125000000217 alkyl group Chemical group 0.000 description 7
- 235000010290 biphenyl Nutrition 0.000 description 7
- 239000004973 liquid crystal related substance Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- OVASAEXSPYGGES-UHFFFAOYSA-N C1C2C(C(OC3=O)=O)C3C1CC2(C1=O)CCC21CC1CC2C2C(=O)OC(=O)C12 Chemical compound C1C2C(C(OC3=O)=O)C3C1CC2(C1=O)CCC21CC1CC2C2C(=O)OC(=O)C12 OVASAEXSPYGGES-UHFFFAOYSA-N 0.000 description 6
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 239000004305 biphenyl Substances 0.000 description 6
- 125000006267 biphenyl group Chemical group 0.000 description 6
- VKIRRGRTJUUZHS-UHFFFAOYSA-N cyclohexane-1,4-diamine Chemical compound NC1CCC(N)CC1 VKIRRGRTJUUZHS-UHFFFAOYSA-N 0.000 description 6
- 238000006116 polymerization reaction Methods 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- 150000003457 sulfones Chemical class 0.000 description 6
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 5
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 5
- 239000012298 atmosphere Substances 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 125000006159 dianhydride group Chemical group 0.000 description 5
- 150000002148 esters Chemical class 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- 238000004817 gas chromatography Methods 0.000 description 5
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 4
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 4
- HYDATEKARGDBKU-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenyl]phenoxy]aniline Chemical group C1=CC(N)=CC=C1OC1=CC=C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)C=C1 HYDATEKARGDBKU-UHFFFAOYSA-N 0.000 description 4
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 4
- 150000005690 diesters Chemical class 0.000 description 4
- JBFHTYHTHYHCDJ-UHFFFAOYSA-N gamma-caprolactone Chemical compound CCC1CCC(=O)O1 JBFHTYHTHYHCDJ-UHFFFAOYSA-N 0.000 description 4
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 4
- 239000009719 polyimide resin Substances 0.000 description 4
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- SIOVKLKJSOKLIF-HJWRWDBZSA-N trimethylsilyl (1z)-n-trimethylsilylethanimidate Chemical compound C[Si](C)(C)OC(/C)=N\[Si](C)(C)C SIOVKLKJSOKLIF-HJWRWDBZSA-N 0.000 description 4
- GWNMOARSGRXJMV-UHFFFAOYSA-N (1-cycloheptylcycloheptyl)oxymethanediamine Chemical compound C1CCCCCC1C1(OC(N)N)CCCCCC1 GWNMOARSGRXJMV-UHFFFAOYSA-N 0.000 description 3
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 3
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 3
- MNKDMOZTFOSBSA-UHFFFAOYSA-N 1-(1-aminocycloheptyl)cycloheptan-1-amine Chemical compound C1CCCCCC1(N)C1(N)CCCCCC1 MNKDMOZTFOSBSA-UHFFFAOYSA-N 0.000 description 3
- SPJXZYLLLWOSLQ-UHFFFAOYSA-N 1-[(1-aminocyclohexyl)methyl]cyclohexan-1-amine Chemical compound C1CCCCC1(N)CC1(N)CCCCC1 SPJXZYLLLWOSLQ-UHFFFAOYSA-N 0.000 description 3
- IAEVEDMYEYMTSE-UHFFFAOYSA-N 2-butan-2-ylcyclohexane-1,4-diamine Chemical compound CCC(C)C1CC(N)CCC1N IAEVEDMYEYMTSE-UHFFFAOYSA-N 0.000 description 3
- FMZFBOHWVULQIY-UHFFFAOYSA-N 2-ethylcyclohexane-1,4-diamine Chemical compound CCC1CC(N)CCC1N FMZFBOHWVULQIY-UHFFFAOYSA-N 0.000 description 3
- SFHLLWPKGUSQIK-UHFFFAOYSA-N 2-methylcyclohexane-1,4-diamine Chemical compound CC1CC(N)CCC1N SFHLLWPKGUSQIK-UHFFFAOYSA-N 0.000 description 3
- ALBWHZWLFAHNRI-UHFFFAOYSA-N 2-propan-2-ylcyclohexane-1,4-diamine Chemical compound CC(C)C1CC(N)CCC1N ALBWHZWLFAHNRI-UHFFFAOYSA-N 0.000 description 3
- WNRDZWNCHXTBTQ-UHFFFAOYSA-N 2-propylcyclohexane-1,4-diamine Chemical compound CCCC1CC(N)CCC1N WNRDZWNCHXTBTQ-UHFFFAOYSA-N 0.000 description 3
- RKBNPLYPKZRNEF-UHFFFAOYSA-N 2-tert-butylcyclohexane-1,4-diamine Chemical compound CC(C)(C)C1CC(N)CCC1N RKBNPLYPKZRNEF-UHFFFAOYSA-N 0.000 description 3
- JRBJSXQPQWSCCF-UHFFFAOYSA-N 3,3'-Dimethoxybenzidine Chemical group C1=C(N)C(OC)=CC(C=2C=C(OC)C(N)=CC=2)=C1 JRBJSXQPQWSCCF-UHFFFAOYSA-N 0.000 description 3
- LXJLFVRAWOOQDR-UHFFFAOYSA-N 3-(3-aminophenoxy)aniline Chemical compound NC1=CC=CC(OC=2C=C(N)C=CC=2)=C1 LXJLFVRAWOOQDR-UHFFFAOYSA-N 0.000 description 3
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 3
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 3
- DKKYOQYISDAQER-UHFFFAOYSA-N 3-[3-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=C(OC=3C=C(N)C=CC=3)C=CC=2)=C1 DKKYOQYISDAQER-UHFFFAOYSA-N 0.000 description 3
- UCQABCHSIIXVOY-UHFFFAOYSA-N 3-[4-[4-(3-aminophenoxy)phenyl]phenoxy]aniline Chemical group NC1=CC=CC(OC=2C=CC(=CC=2)C=2C=CC(OC=3C=C(N)C=CC=3)=CC=2)=C1 UCQABCHSIIXVOY-UHFFFAOYSA-N 0.000 description 3
- FYYYKXFEKMGYLZ-UHFFFAOYSA-N 4-(1,3-dioxo-2-benzofuran-5-yl)-2-benzofuran-1,3-dione Chemical compound C=1C=C2C(=O)OC(=O)C2=CC=1C1=CC=CC2=C1C(=O)OC2=O FYYYKXFEKMGYLZ-UHFFFAOYSA-N 0.000 description 3
- FWOLORXQTIGHFX-UHFFFAOYSA-N 4-(4-amino-2,3,5,6-tetrafluorophenyl)-2,3,5,6-tetrafluoroaniline Chemical compound FC1=C(F)C(N)=C(F)C(F)=C1C1=C(F)C(F)=C(N)C(F)=C1F FWOLORXQTIGHFX-UHFFFAOYSA-N 0.000 description 3
- QYIMZXITLDTULQ-UHFFFAOYSA-N 4-(4-amino-2-methylphenyl)-3-methylaniline Chemical compound CC1=CC(N)=CC=C1C1=CC=C(N)C=C1C QYIMZXITLDTULQ-UHFFFAOYSA-N 0.000 description 3
- BEKFRNOZJSYWKZ-UHFFFAOYSA-N 4-[2-(4-aminophenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]aniline Chemical compound C1=CC(N)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(N)C=C1 BEKFRNOZJSYWKZ-UHFFFAOYSA-N 0.000 description 3
- WUPRYUDHUFLKFL-UHFFFAOYSA-N 4-[3-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(OC=2C=CC(N)=CC=2)=C1 WUPRYUDHUFLKFL-UHFFFAOYSA-N 0.000 description 3
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 description 3
- HHLMWQDRYZAENA-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropan-2-yl]phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=C(C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)(C(F)(F)F)C(F)(F)F)C=C1 HHLMWQDRYZAENA-UHFFFAOYSA-N 0.000 description 3
- PJWQLRKRVISYPL-UHFFFAOYSA-N 4-[4-amino-3-(trifluoromethyl)phenyl]-2-(trifluoromethyl)aniline Chemical compound C1=C(C(F)(F)F)C(N)=CC=C1C1=CC=C(N)C(C(F)(F)F)=C1 PJWQLRKRVISYPL-UHFFFAOYSA-N 0.000 description 3
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 3
- IKGATDHNNVEMQB-UHFFFAOYSA-N O-[1-(1-aminooxycycloheptyl)cycloheptyl]hydroxylamine Chemical compound NOC1(CCCCCC1)C1(CCCCCC1)ON IKGATDHNNVEMQB-UHFFFAOYSA-N 0.000 description 3
- QLBRROYTTDFLDX-UHFFFAOYSA-N [3-(aminomethyl)cyclohexyl]methanamine Chemical compound NCC1CCCC(CN)C1 QLBRROYTTDFLDX-UHFFFAOYSA-N 0.000 description 3
- OXIKYYJDTWKERT-UHFFFAOYSA-N [4-(aminomethyl)cyclohexyl]methanamine Chemical compound NCC1CCC(CN)CC1 OXIKYYJDTWKERT-UHFFFAOYSA-N 0.000 description 3
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 3
- XQBSPQLKNWMPMG-UHFFFAOYSA-N bicyclo[2.2.2]octane-2,3,5,6-tetracarboxylic acid Chemical compound C1CC2C(C(O)=O)C(C(=O)O)C1C(C(O)=O)C2C(O)=O XQBSPQLKNWMPMG-UHFFFAOYSA-N 0.000 description 3
- CFTXGNJIXHFHTH-UHFFFAOYSA-N bis(4-aminophenyl) benzene-1,4-dicarboxylate Chemical compound C1=CC(N)=CC=C1OC(=O)C1=CC=C(C(=O)OC=2C=CC(N)=CC=2)C=C1 CFTXGNJIXHFHTH-UHFFFAOYSA-N 0.000 description 3
- UYLSVYARXBFEKV-UHFFFAOYSA-N cyclobutane-1,3-diamine Chemical compound NC1CC(N)C1 UYLSVYARXBFEKV-UHFFFAOYSA-N 0.000 description 3
- SSJXIUAHEKJCMH-UHFFFAOYSA-N cyclohexane-1,2-diamine Chemical compound NC1CCCCC1N SSJXIUAHEKJCMH-UHFFFAOYSA-N 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 125000001153 fluoro group Chemical group F* 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- MTNDZQHUAFNZQY-UHFFFAOYSA-N imidazoline Chemical compound C1CN=CN1 MTNDZQHUAFNZQY-UHFFFAOYSA-N 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 238000007363 ring formation reaction Methods 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 230000004580 weight loss Effects 0.000 description 3
- UGCMFUQMPWJOON-UHFFFAOYSA-N (1-cycloheptylcycloheptyl)methanediamine Chemical compound C1CCCCCC1C1(C(N)N)CCCCCC1 UGCMFUQMPWJOON-UHFFFAOYSA-N 0.000 description 2
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- SDUIDNRYFMKHGE-UHFFFAOYSA-N 4-[2-(3,4-dicarboxycyclohexyl)-1,1,1,3-tetrafluoropropan-2-yl]cyclohexane-1,2-dicarboxylic acid Chemical compound C1C(C(O)=O)C(C(=O)O)CCC1C(CF)(C(F)(F)F)C1CC(C(O)=O)C(C(O)=O)CC1 SDUIDNRYFMKHGE-UHFFFAOYSA-N 0.000 description 1
- UFFLFXDNZXTURQ-UHFFFAOYSA-N 4-[2-(3,4-dicarboxycyclohexyl)propan-2-yl]cyclohexane-1,2-dicarboxylic acid Chemical compound C1CC(C(O)=O)C(C(O)=O)CC1C(C)(C)C1CCC(C(O)=O)C(C(O)=O)C1 UFFLFXDNZXTURQ-UHFFFAOYSA-N 0.000 description 1
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- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- LHUKBOMRMBTNBM-UHFFFAOYSA-N [4-[4-(4-aminobenzoyl)oxyphenyl]phenyl] 4-aminobenzoate Chemical compound C1=CC(N)=CC=C1C(=O)OC1=CC=C(C=2C=CC(OC(=O)C=3C=CC(N)=CC=3)=CC=2)C=C1 LHUKBOMRMBTNBM-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
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- BKDVBBSUAGJUBA-UHFFFAOYSA-N bicyclo[2.2.2]oct-7-ene-2,3,5,6-tetracarboxylic acid Chemical compound C1=CC2C(C(O)=O)C(C(=O)O)C1C(C(O)=O)C2C(O)=O BKDVBBSUAGJUBA-UHFFFAOYSA-N 0.000 description 1
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- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
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- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000012320 chlorinating reagent Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
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- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- UKJLNMAFNRKWGR-UHFFFAOYSA-N cyclohexatrienamine Chemical group NC1=CC=C=C[CH]1 UKJLNMAFNRKWGR-UHFFFAOYSA-N 0.000 description 1
- GUIAWEJKSYXUFP-UHFFFAOYSA-N decane-2,3,6,7-tetracarboxylic acid Chemical compound CCC(C(CCC(C(CC)C(=O)O)C(=O)O)C(=O)O)C(=O)O GUIAWEJKSYXUFP-UHFFFAOYSA-N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- LHCGBIFHSCCRRG-UHFFFAOYSA-N dichloroborane Chemical compound ClBCl LHCGBIFHSCCRRG-UHFFFAOYSA-N 0.000 description 1
- LTYMSROWYAPPGB-UHFFFAOYSA-N diphenyl sulfide Chemical compound C=1C=CC=CC=1SC1=CC=CC=C1 LTYMSROWYAPPGB-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- DZIPTMXRULMTJR-UHFFFAOYSA-N oct-3-ene-1,2,6,7-tetracarboxylic acid Chemical compound CC(C(CC=CC(CC(=O)O)C(=O)O)C(=O)O)C(=O)O DZIPTMXRULMTJR-UHFFFAOYSA-N 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
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- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002685 polymerization catalyst Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000013615 primer Substances 0.000 description 1
- 239000002987 primer (paints) Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000001846 repelling effect Effects 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- 238000000518 rheometry Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
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- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000006884 silylation reaction Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
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- 238000006467 substitution reaction Methods 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 150000003628 tricarboxylic acids Chemical class 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
Classifications
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/14—Polyamide-imides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1003—Preparatory processes
- C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
- C08G73/1028—Preparatory processes from tetracarboxylic acids or derivatives and diamines characterised by the process itself, e.g. steps, continuous
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1075—Partially aromatic polyimides
- C08G73/1082—Partially aromatic polyimides wholly aromatic in the tetracarboxylic moiety
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3442—Heterocyclic compounds having nitrogen in the ring having two nitrogen atoms in the ring
- C08K5/3445—Five-membered rings
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- C—CHEMISTRY; METALLURGY
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- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
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- C08J2379/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
- C08J2379/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
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Abstract
本発明は、ポリイミド前駆体と、イミダゾール系化合物を含み、イミダゾール系化合物の含有量が、ポリイミド前駆体の繰り返し単位1モルに対して4モル未満であることを特徴とするポリイミド前駆体組成物に関する。
The present invention relates to a polyimide precursor composition comprising a polyimide precursor and an imidazole compound, wherein the content of the imidazole compound is less than 4 mol with respect to 1 mol of the repeating unit of the polyimide precursor. .
Description
本発明は、厚み方向位相差(レタデーション)が小さく、機械的特性にも優れ、さらに透明性にも優れるポリイミドが得られるポリイミド前駆体を含む溶液組成物(ポリイミド前駆体組成物)、及びポリイミドの製造方法に関する。また、本発明は、透明性に優れ、厚み方向位相差が小さく、機械的特性にも優れたポリイミド、ポリイミドフィルム、及び基板にも関する。 The present invention provides a solution composition (polyimide precursor composition) containing a polyimide precursor that provides a polyimide having a small thickness direction retardation (retardation), excellent mechanical properties, and excellent transparency. It relates to a manufacturing method. The present invention also relates to a polyimide, a polyimide film, and a substrate that are excellent in transparency, have a small thickness direction retardation, and are excellent in mechanical properties.
近年、高度情報化社会の到来に伴い、光通信分野の光ファイバーや光導波路等、表示装置分野の液晶配向膜やカラーフィルター用保護膜等の光学材料の開発が進んでいる。特に表示装置分野で、ガラス基板の代替として軽量でフレキシブル性に優れたプラスチック基板の検討や、曲げたり丸めたりすることが可能なディスプレイの開発が盛んに行われている。このため、その様な用途に用いることができる、より高性能の光学材料が求められている。 In recent years, with the arrival of an advanced information society, development of optical materials such as a liquid crystal alignment film and a protective film for a color filter in the display device field, such as an optical fiber and an optical waveguide in the optical communication field, is progressing. In particular, in the field of display devices, a plastic substrate that is lightweight and excellent in flexibility as a substitute for a glass substrate has been studied, and a display that can be bent and rolled has been actively developed. For this reason, there is a demand for higher performance optical materials that can be used for such applications.
芳香族ポリイミドは、分子内共役や電荷移動錯体の形成により、本質的に黄褐色に着色する。このため着色を抑制する手段として、例えば分子内へのフッ素原子の導入、主鎖への屈曲性の付与、側鎖として嵩高い基の導入などによって、分子内共役や電荷移動錯体の形成を阻害して、透明性を発現させる方法が提案されている。 Aromatic polyimide is essentially yellowish brown due to intramolecular conjugation and the formation of charge transfer complexes. For this reason, as a means to suppress coloration, for example, introduction of fluorine atoms into the molecule, imparting flexibility to the main chain, introduction of bulky groups as side chains, etc. inhibits intramolecular conjugation and charge transfer complex formation. Thus, a method for expressing transparency has been proposed.
また、原理的に電荷移動錯体を形成しない半脂環式または全脂環式ポリイミドを用いることにより透明性を発現させる方法も提案されている。 In addition, a method for expressing transparency by using a semi-alicyclic or fully alicyclic polyimide that does not form a charge transfer complex in principle has been proposed.
例えば、特許文献1〜3に、テトラカルボン酸成分として芳香族テトラカルボン酸二無水物、ジアミン成分として脂環式ジアミンを用いた、透明性が高い半脂環式ポリイミドが開示されている。 For example, Patent Documents 1 to 3 disclose semi-alicyclic polyimides having high transparency using an aromatic tetracarboxylic dianhydride as a tetracarboxylic acid component and an alicyclic diamine as a diamine component.
また、例えば、特許文献4〜7には、テトラカルボン酸成分として脂環式テトラカルボン酸二無水物、ジアミン成分として芳香族ジアミンを用いた種々の、透明性が高い半脂環式ポリイミドが開示されている。 Further, for example, Patent Documents 4 to 7 disclose various highly translucent semi-alicyclic polyimides using an alicyclic tetracarboxylic dianhydride as a tetracarboxylic acid component and an aromatic diamine as a diamine component. Has been.
非特許文献1には、テトラカルボン酸成分として、ノルボルナン−2−スピロ−α−シクロペンタノン−α’−スピロ−2’’−ノルボルナン−5,5’’,6,6’’−テトラカルボン酸二無水物を用いたポリイミドが開示されている。さらに、ここで用いているノルボルナン−2−スピロ−α−シクロペンタノン−α’−スピロ−2’’−ノルボルナン−5,5’’,6,6’’−テトラカルボン酸二無水物は6種類の立体異性体を含んでいることが記載されている。特許文献8にも、テトラカルボン酸成分として、ノルボルナン−2−スピロ−α−シクロペンタノン−α’−スピロ−2’’−ノルボルナン−5,5’’,6,6’’−テトラカルボン酸二無水物を用いたポリイミドが開示されている。 Non-Patent Document 1 discloses, as a tetracarboxylic acid component, norbornane-2-spiro-α-cyclopentanone-α′-spiro-2 ″ -norbornane-5,5 ″, 6,6 ″ -tetracarboxylic. Polyimides using acid dianhydrides are disclosed. Further, norbornane-2-spiro-α-cyclopentanone-α′-spiro-2 ″ -norbornane-5,5 ″, 6,6 ″ -tetracarboxylic dianhydride used here is 6 It is described that it contains various stereoisomers. Patent Document 8 also discloses norbornane-2-spiro-α-cyclopentanone-α′-spiro-2 ″ -norbornane-5,5 ″, 6,6 ″ -tetracarboxylic acid as a tetracarboxylic acid component. Polyimides using dianhydrides are disclosed.
しかしながら、用途によっては、特に表示装置などの分野においては、透明性が高いことに加え、厚み方向位相差を低下させることが望まれている。厚み方向位相差が大きいフィルムを透過することで、色が正しく表示されない、色のにじみや視野角が狭くなるといった問題が起こることがある。そのため、特に表示装置などの分野においては、厚み方向位相差が小さいポリイミドフィルムが求められている。 However, depending on applications, particularly in the field of display devices and the like, in addition to high transparency, it is desired to reduce the thickness direction retardation. By passing through a film having a large thickness direction retardation, there are cases in which colors are not displayed correctly, color bleeding and viewing angle are narrowed. Therefore, a polyimide film having a small thickness direction retardation is required particularly in the field of display devices and the like.
一方、特許文献9には、ポリイミド前駆体(ポリアミド酸)にイミダゾリン系化合物および/またはイミダゾール系化合物を配合してなる塗液を加熱することによって形成されてなるポリイミドが開示されている。より具体的には、実施例1では、3,3’,4,4’−ベンゾフェノンテトラカルボン酸二無水物と4,4’−ジアミノビフェニルエーテルから得られるポリアミド酸の溶液に2,4−ジメチルイミダゾリンを加えた溶液を基板上に塗布し、200℃、1時間加熱して、膜厚1000Å(0.1μm)の芳香族ポリイミド皮膜を得ている。実施例2では、ピロメリット酸二無水物と4,4’−ジアミノビフェニルエーテルから得られるポリアミド酸の溶液に2−エチルイミダゾリンおよび1,2−ジメチルイミダゾールを加えた溶液を基板上に塗布し、150℃、1時間加熱して、膜厚800Å(0.08μm)の芳香族ポリイミド皮膜を得ている。特許文献9には、イミダゾリン系化合物および/またはイミダゾール系化合物の添加により茶褐色の著しい着色は免れることになり、光線透過率の高い透明性に優れた液晶表示素子を得ることが可能となった、と記載されている。しかしながら、実施例1のポリイミド皮膜(液晶配向膜)を用いた液晶表示素子の波長400nmの光透過率は82%(ポリイミド膜厚:0.1μm)、実施例2のポリイミド皮膜(液晶配向膜)を用いた液晶表示素子の波長400nmの光透過率は83%(ポリイミド膜厚:0.08μm)であり、このポリイミドは十分な透明性を有するものではない。 On the other hand, Patent Document 9 discloses a polyimide formed by heating a coating solution obtained by blending a polyimide precursor (polyamic acid) with an imidazoline compound and / or an imidazole compound. More specifically, in Example 1, 2,4-dimethyl is added to a polyamic acid solution obtained from 3,3 ′, 4,4′-benzophenonetetracarboxylic dianhydride and 4,4′-diaminobiphenyl ether. A solution to which imidazoline has been added is applied onto a substrate and heated at 200 ° C. for 1 hour to obtain an aromatic polyimide film having a thickness of 1000 mm (0.1 μm). In Example 2, a solution obtained by adding 2-ethylimidazoline and 1,2-dimethylimidazole to a solution of polyamic acid obtained from pyromellitic dianhydride and 4,4′-diaminobiphenyl ether was applied onto a substrate. An aromatic polyimide film having a thickness of 800 mm (0.08 μm) is obtained by heating at 150 ° C. for 1 hour. In Patent Document 9, by adding an imidazoline-based compound and / or an imidazole-based compound, the remarkable brown coloration is avoided, and a liquid crystal display element with high light transmittance and excellent transparency can be obtained. It is described. However, the light transmittance at a wavelength of 400 nm of the liquid crystal display element using the polyimide film (liquid crystal alignment film) of Example 1 is 82% (polyimide film thickness: 0.1 μm), and the polyimide film of Example 2 (liquid crystal alignment film). The light transmittance at a wavelength of 400 nm of the liquid crystal display element using the above is 83% (polyimide film thickness: 0.08 μm), and this polyimide does not have sufficient transparency.
また、透明性が低い芳香族ポリイミドの製造方法として、特許文献10には、ポリイミド前駆体樹脂、及び、イミダゾール、N−メチルイミダゾール等のポリイミド前駆体樹脂の硬化促進剤を有機極性溶媒に溶解したポリイミド前駆体樹脂含有溶液を基材上に塗布し、続く熱処理で乾燥及びイミド化によるポリイミド樹脂層の形成を280〜380℃の範囲内で完結するポリイミド樹脂層の形成方法が開示されており、これらの硬化促進剤を使用することで、熱線膨張係数を低く制御できることが記載されている。特許文献10には、また、硬化促進剤は、その沸点が120℃を越えるものを使用することが好ましく、沸点が、熱処理の上限温度を超えないものを選択することが好ましいことが記載されており、沸点が、例えば400℃以上の硬化促進剤は、イミド化後のポリイミド樹脂層中に残存する割合が高くなり、ポリイミド樹脂層の機能に影響を与える傾向にあることが記載されている。 In addition, as a method for producing an aromatic polyimide having low transparency, Patent Document 10 discloses a polyimide precursor resin and a curing accelerator for a polyimide precursor resin such as imidazole and N-methylimidazole dissolved in an organic polar solvent. A method for forming a polyimide resin layer is disclosed in which a polyimide precursor resin-containing solution is applied onto a substrate, followed by drying and imidization to complete the formation of a polyimide resin layer within a range of 280 to 380 ° C., It is described that the thermal expansion coefficient can be controlled to be low by using these curing accelerators. Patent Document 10 also describes that a curing accelerator having a boiling point exceeding 120 ° C. is preferably used, and that a boiling point not exceeding the upper limit temperature of heat treatment is preferably selected. In addition, it is described that a curing accelerator having a boiling point of, for example, 400 ° C. or higher has a higher ratio of remaining in the polyimide resin layer after imidization and tends to affect the function of the polyimide resin layer.
本発明は、以上のような状況に鑑みてなされたものであり、透明性に優れるポリイミドであって、同一組成でも厚み方向位相差がより小さいポリイミド、または、厚み方向位相差が小さく、機械的特性にも優れ、さらに透明性にも優れたポリイミドが得られるポリイミド前駆体組成物(ポリイミド前駆体を含む溶液組成物)、及びポリイミドの製造方法を提供することを目的とする。 The present invention has been made in view of the situation as described above, and is a polyimide having excellent transparency and having a smaller thickness direction retardation even with the same composition, or a thickness direction retardation being small and mechanical. It aims at providing the manufacturing method of the polyimide precursor composition (solution composition containing a polyimide precursor) from which the polyimide excellent also in the characteristic and also excellent in transparency is obtained, and a polyimide.
本発明は、以下の各項に関する。
1. 下記化学式(1)で表される繰り返し単位、または下記化学式(2)で表される繰り返し単位を含むポリイミド前駆体と、
イミダゾール系化合物を含み、
イミダゾール系化合物の含有量が、ポリイミド前駆体の繰り返し単位1モルに対して4モル未満であることを特徴とするポリイミド前駆体組成物。The present invention relates to the following items.
1. A polyimide precursor containing a repeating unit represented by the following chemical formula (1) or a repeating unit represented by the following chemical formula (2);
Including imidazole compounds,
Content of an imidazole type compound is less than 4 mol with respect to 1 mol of repeating units of a polyimide precursor, The polyimide precursor composition characterized by the above-mentioned.
2. このポリイミド前駆体組成物から得られるポリイミドが、厚さ10μmのフィルムでの波長400nmの光透過率が75%以上であることを特徴とする前記項1に記載のポリイミド前駆体組成物。
3. 前記イミダゾール系化合物の含有量が、ポリイミド前駆体の繰り返し単位1モルに対して0.05モル以上2モル以下であることを特徴とする前記項1又は2に記載のポリイミド前駆体組成物。
4. 前記イミダゾール系化合物の1気圧における沸点が340℃未満であることを特徴とする前記項1〜3のいずれかに記載のポリイミド前駆体組成物。
5. 前記イミダゾール系化合物が、1,2−ジメチルイミダゾール、1−メチルイミダゾール、2−メチルイミダゾール、2−フェニルイミダゾール、イミダゾール、またはベンゾイミダゾールのいずれかであることを特徴とする前記項1〜4のいずれかに記載のポリイミド前駆体組成物。
6. 前記項1〜5のいずれかに記載のポリイミド前駆体組成物を、最高加熱温度350℃超で加熱処理して、ポリイミド前駆体をイミド化することを特徴とするポリイミドの製造方法。
7. 前記項1〜5のいずれかに記載のポリイミド前駆体組成物を基材上に塗布する工程と、
基材上のポリイミド前駆体組成物を、最高加熱温度350℃超で加熱処理して、ポリイミド前駆体をイミド化する工程と
を有することを特徴とする前記項6に記載のポリイミドの製造方法。
8. 前記加熱処理の最高加熱温度が400℃を超えることを特徴とする前記項6又は7に記載のポリイミドの製造方法。
9. 前記項6〜8のいずれかに記載の方法により製造されるポリイミド。
10. 厚さ10μmのフィルムでの波長400nmの光透過率が75%以上であることを特徴とする前記項9に記載のポリイミド。
11. 前記項6〜8のいずれかに記載の方法により製造されるポリイミドフィルム。
12. 前記項9又は10に記載のポリイミド、又は前記項11に記載のポリイミドフィルムを含むことを特徴とするディスプレイ用、タッチパネル用、または太陽電池用の基板。2. Item 2. The polyimide precursor composition according to item 1, wherein the polyimide obtained from the polyimide precursor composition has a light transmittance at a wavelength of 400 nm of a film having a thickness of 10 μm of 75% or more.
3. Item 3. The polyimide precursor composition according to item 1 or 2, wherein the content of the imidazole compound is 0.05 mol to 2 mol with respect to 1 mol of the repeating unit of the polyimide precursor.
4). Item 4. The polyimide precursor composition according to any one of Items 1 to 3, wherein the imidazole compound has a boiling point at 1 atm of less than 340 ° C.
5). Any one of Items 1 to 4, wherein the imidazole compound is any one of 1,2-dimethylimidazole, 1-methylimidazole, 2-methylimidazole, 2-phenylimidazole, imidazole, and benzimidazole. A polyimide precursor composition according to claim 1.
6). 6. A method for producing a polyimide, wherein the polyimide precursor composition according to any one of items 1 to 5 is heat-treated at a maximum heating temperature exceeding 350 ° C. to imidize the polyimide precursor.
7). The process of apply | coating the polyimide precursor composition in any one of said claim | item 1-5 on a base material,
The method for producing polyimide according to Item 6, further comprising a step of heat-treating the polyimide precursor composition on the substrate at a maximum heating temperature of 350 ° C. to imidize the polyimide precursor.
8). Item 8. The method for producing polyimide according to Item 6 or 7, wherein a maximum heating temperature of the heat treatment exceeds 400 ° C.
9. A polyimide produced by the method according to any one of Items 6 to 8.
10. Item 10. The polyimide according to Item 9, wherein the light transmittance at a wavelength of 400 nm in a film having a thickness of 10 μm is 75% or more.
11. A polyimide film produced by the method according to any one of Items 6 to 8.
12 Item 10. A substrate for display, touch panel, or solar cell, comprising the polyimide according to item 9 or 10, or the polyimide film according to item 11.
本発明によって、透明性に優れるポリイミドであって、同一組成でも厚み方向位相差がより小さいポリイミド、または、厚み方向位相差が小さく、機械的特性にも優れ、さらに透明性にも優れたポリイミドが得られるポリイミド前駆体組成物(ポリイミド前駆体を含む溶液組成物)、及びポリイミドの製造方法を提供することができる。 According to the present invention, a polyimide having excellent transparency and having a small thickness direction retardation even in the same composition, or a polyimide having a small thickness direction retardation, excellent mechanical properties, and excellent transparency. The obtained polyimide precursor composition (solution composition containing a polyimide precursor) and a method for producing polyimide can be provided.
本発明のポリイミド前駆体組成物から得られるポリイミド(本発明のポリイミド)は、透明性が高く、且つ厚み方向位相差が小さく、また、低線熱膨張係数であって微細な回路の形成が容易であり、ディスプレイ用途などの基板を形成するために好適に用いることができる。また、本発明のポリイミドは、タッチパネル用、太陽電池用の基板を形成するためにも好適に用いることができる。 The polyimide obtained from the polyimide precursor composition of the present invention (polyimide of the present invention) is highly transparent and has a small thickness direction retardation, and has a low linear thermal expansion coefficient, facilitating the formation of fine circuits. And can be suitably used to form a substrate for display applications and the like. Moreover, the polyimide of this invention can be used suitably also in order to form the board | substrate for touch panels and a solar cell.
本発明のポリイミド前駆体組成物は、前記化学式(1)で表される繰り返し単位、または前記化学式(2)で表される繰り返し単位の少なくとも1種を含むポリイミド前駆体と、イミダゾール系化合物を含み、イミダゾール系化合物の含有量は、ポリイミド前駆体の繰り返し単位1モルに対して4モル未満である。 The polyimide precursor composition of the present invention includes a polyimide precursor containing at least one of the repeating unit represented by the chemical formula (1) or the repeating unit represented by the chemical formula (2), and an imidazole compound. The content of the imidazole compound is less than 4 mol with respect to 1 mol of the repeating unit of the polyimide precursor.
前記化学式(1)で表される繰り返し単位、または前記化学式(2)で表される繰り返し単位の少なくとも1種を含むポリイミド前駆体から得られるポリイミド、すなわち半脂環式ポリイミドは、透明性が高い。このような透明性が高いポリイミドの場合、着色の要因となりえる添加物の使用は好まれない。しかしながら、イミダゾール系化合物を、ポリイミド前駆体の繰り返し単位1モルに対して4モル未満、好ましくは0.05モル以上2モル以下の割合で、ポリイミド前駆体組成物に加えることにより、高い透明性を保ったまま、厚み方向位相差が小さいポリイミドが得られる。すなわち、本発明によれば、同一組成のポリイミド前駆体から、高い透明性を維持しながら、厚み方向位相差がより小さいポリイミドが得られる。また、1気圧における沸点が340℃未満であるイミダゾール系化合物を用いた場合、得られるポリイミドの透明性がさらに向上することがある。 The polyimide obtained from the polyimide precursor containing the repeating unit represented by the chemical formula (1) or the repeating unit represented by the chemical formula (2), that is, a semi-alicyclic polyimide, has high transparency. . In the case of such a highly transparent polyimide, the use of additives that can cause coloring is not preferred. However, by adding the imidazole compound to the polyimide precursor composition at a ratio of less than 4 mol, preferably 0.05 mol or more and 2 mol or less, with respect to 1 mol of the repeating unit of the polyimide precursor, high transparency is achieved. A polyimide having a small thickness direction retardation can be obtained while keeping it. That is, according to the present invention, a polyimide having a smaller thickness direction retardation can be obtained from a polyimide precursor having the same composition while maintaining high transparency. In addition, when an imidazole compound having a boiling point of less than 340 ° C. at 1 atmosphere is used, the transparency of the resulting polyimide may be further improved.
さらに、透明性が高いポリイミドを得るためには、ポリイミド前駆体を比較的低温度で加熱処理してイミド化を完了する方が好ましいと一般に考えられているが、本発明によれば、最高加熱温度が350℃を超える、特に好ましくは400℃を超える加熱処理によってポリイミド前駆体をイミド化しても、透明性が高いポリイミドを製造することができる。その結果、イミド化のための加熱処理の最高加熱温度を、350℃を超える高温、特に好ましくは400℃を超える高温とすることが可能になるので、得られるポリイミドの機械的特性が向上する。すなわち、本発明によれば、透明性が高く、厚み方向位相差が小さく、機械的特性にも優れたポリイミドが得られる。 Furthermore, in order to obtain a highly transparent polyimide, it is generally considered that it is preferable to complete the imidization by heat-treating the polyimide precursor at a relatively low temperature. Even if the polyimide precursor is imidized by heat treatment at a temperature exceeding 350 ° C., particularly preferably exceeding 400 ° C., a highly transparent polyimide can be produced. As a result, the maximum heating temperature of the heat treatment for imidization can be set to a high temperature exceeding 350 ° C., particularly preferably a high temperature exceeding 400 ° C., so that the mechanical properties of the resulting polyimide are improved. That is, according to the present invention, a polyimide having high transparency, small thickness direction retardation, and excellent mechanical properties can be obtained.
前記のとおり、本発明のポリイミド前駆体組成物は、前記化学式(1)で表される繰り返し単位、または前記化学式(2)で表される繰り返し単位の少なくとも1種を含むポリイミド前駆体を含む。 As above-mentioned, the polyimide precursor composition of this invention contains the polyimide precursor containing at least 1 sort (s) of the repeating unit represented by the said Chemical formula (1), or the said Chemical formula (2).
前記化学式(1)中のX1としては、炭素数が4〜40の脂環構造を有する4価の基が好ましく、Y1としては、炭素数が6〜40の芳香族環を有する2価の基が好ましい。X 1 in the chemical formula (1) is preferably a tetravalent group having an alicyclic structure having 4 to 40 carbon atoms, and Y 1 is a divalent having an aromatic ring having 6 to 40 carbon atoms. Are preferred.
前記化学式(1)の繰り返し単位を与えるテトラカルボン酸成分としては、例えば、1,2,3,4−シクロブタンテトラカルボン酸、イソプロピリデンジフェノキシビスフタル酸、シクロヘキサン−1,2,4,5−テトラカルボン酸、[1,1’−ビ(シクロヘキサン)]−3,3’,4,4’−テトラカルボン酸、[1,1’−ビ(シクロヘキサン)]−2,3,3’,4’−テトラカルボン酸、[1,1’−ビ(シクロヘキサン)]−2,2’,3,3’−テトラカルボン酸、4,4’−メチレンビス(シクロヘキサン−1,2−ジカルボン酸)、4,4’−(プロパン−2,2−ジイル)ビス(シクロヘキサン−1,2−ジカルボン酸)、4,4’−オキシビス(シクロヘキサン−1,2−ジカルボン酸)、4,4’−チオビス(シクロヘキサン−1,2−ジカルボン酸)、4,4’−スルホニルビス(シクロヘキサン−1,2−ジカルボン酸)、4,4’−(ジメチルシランジイル)ビス(シクロヘキサン−1,2−ジカルボン酸)、4,4’−(テトラフルオロプロパン−2,2−ジイル)ビス(シクロヘキサン−1,2−ジカルボン酸)、オクタヒドロペンタレン−1,3,4,6−テトラカルボン酸、ビシクロ[2.2.1]ヘプタン−2,3,5,6−テトラカルボン酸、6−(カルボキシメチル)ビシクロ[2.2.1]ヘプタン−2,3,5−トリカルボン酸、ビシクロ[2.2.2]オクタン−2,3,5,6−テトラカルボン酸、ビシクロ[2.2.2]オクタ−5−エン−2,3,7,8−テトラカルボン酸、トリシクロ[4.2.2.02,5]デカン−3,4,7,8−テトラカルボン酸、トリシクロ[4.2.2.02,5]デカ−7−エン−3,4,9,10−テトラカルボン酸、9−オキサトリシクロ[4.2.1.02,5]ノナン−3,4,7,8−テトラカルボン酸、ノルボルナン−2−スピロ−α−シクロペンタノン−α’−スピロ−2’’−ノルボルナン5,5’’,6,6’’−テトラカルボン酸、(4arH,8acH)−デカヒドロ−1t,4t:5c,8c−ジメタノナフタレン−2c,3c,6c,7c−テトラカルボン酸、(4arH,8acH)−デカヒドロ−1t,4t:5c,8c−ジメタノナフタレン−2t,3t,6c,7c−テトラカルボン酸や、これらのテトラカルボン酸二無水物、テトラカルボン酸シリルエステル、テトラカルボン酸エステル、テトラカルボン酸クロライド等の誘導体が挙げられる。テトラカルボン酸成分は、単独で使用してもよく、また複数種を組み合わせて使用することもできる。 Examples of the tetracarboxylic acid component that gives the repeating unit of the chemical formula (1) include 1,2,3,4-cyclobutanetetracarboxylic acid, isopropylidenediphenoxybisphthalic acid, cyclohexane-1,2,4,5- Tetracarboxylic acid, [1,1′-bi (cyclohexane)]-3,3 ′, 4,4′-tetracarboxylic acid, [1,1′-bi (cyclohexane)]-2,3,3 ′, 4 '-Tetracarboxylic acid, [1,1'-bi (cyclohexane)]-2,2', 3,3'-tetracarboxylic acid, 4,4'-methylenebis (cyclohexane-1,2-dicarboxylic acid), 4 , 4 ′-(propane-2,2-diyl) bis (cyclohexane-1,2-dicarboxylic acid), 4,4′-oxybis (cyclohexane-1,2-dicarboxylic acid), 4,4′-thiobis ( Chlorohexane-1,2-dicarboxylic acid), 4,4′-sulfonylbis (cyclohexane-1,2-dicarboxylic acid), 4,4 ′-(dimethylsilanediyl) bis (cyclohexane-1,2-dicarboxylic acid) 4,4 ′-(tetrafluoropropane-2,2-diyl) bis (cyclohexane-1,2-dicarboxylic acid), octahydropentalene-1,3,4,6-tetracarboxylic acid, bicyclo [2. 2.1] heptane-2,3,5,6-tetracarboxylic acid, 6- (carboxymethyl) bicyclo [2.2.1] heptane-2,3,5-tricarboxylic acid, bicyclo [2.2.2 ] Octane-2,3,5,6-tetracarboxylic acid, bicyclo [2.2.2] oct-5-ene-2,3,7,8-tetracarboxylic acid, tricyclo [4.2.2.02] , 5] Can-3,4,7,8-tetracarboxylic acid, tricyclo [4.2.2.02,5] dec-7-ene-3,4,9,10-tetracarboxylic acid, 9-oxatricyclo [ 4.2.1.02,5] nonane-3,4,7,8-tetracarboxylic acid, norbornane-2-spiro-α-cyclopentanone-α′-spiro-2 ″ -norbornane 5,5 ′ ', 6,6' '-tetracarboxylic acid, (4arH, 8acH) -decahydro-1t, 4t: 5c, 8c-dimethananaphthalene-2c, 3c, 6c, 7c-tetracarboxylic acid, (4arH, 8acH)- Decahydro-1t, 4t: 5c, 8c-dimethanonaphthalene-2t, 3t, 6c, 7c-tetracarboxylic acid, tetracarboxylic dianhydrides, tetracarboxylic acid silyl esters, tetracarboxylic acid esters Ether, and derivatives of such tetracarboxylic acid chloride. A tetracarboxylic acid component may be used independently and can also be used in combination of multiple types.
前記化学式(1)の繰り返し単位を与えるジアミン成分としては、例えば、p−フェニレンジアミン、m−フェニレンジアミン、ベンジジン、3,3'−ジアミノ−ビフェニル、2,2’−ビス(トリフルオロメチル)ベンジジン、3,3’−ビス(トリフルオロメチル)ベンジジン、m−トリジン、4,4’−ジアミノベンズアニリド、3,4’−ジアミノベンズアニリド、N,N’−ビス(4−アミノフェニル)テレフタルアミド、N,N’−p−フェニレンビス(p−アミノベンズアミド)、4−アミノフェノキシ−4−ジアミノベンゾエート、ビス(4−アミノフェニル)テレフタレート、ビフェニル−4,4’−ジカルボン酸ビス(4−アミノフェニル)エステル、p−フェニレンビス(p−アミノベンゾエート)、ビス(4−アミノフェニル)-[1,1'-ビフェニル]-4,4'-ジカルボキシレート、[1,1'-ビフェニル]-4,4'-ジイル ビス(4-アミノベンゾエート)、4,4’−オキシジアニリン、3,4’−オキシジアニリン、3,3’−オキシジアニリン、p−メチレンビス(フェニレンジアミン)、1,3−ビス(4−アミノフェノキシ)ベンゼン、1,3−ビス(3−アミノフェノキシ)ベンゼン、1,4−ビス(4−アミノフェノキシ)ベンゼン、4,4’−ビス(4−アミノフェノキシ)ビフェニル、4,4’−ビス(3−アミノフェノキシ)ビフェニル、2,2−ビス(4−(4−アミノフェノキシ)フェニル)ヘキサフルオロプロパン、2,2−ビス(4−アミノフェニル)ヘキサフルオロプロパン、ビス(4−アミノフェニル)スルホン、3,3'−ビス(トリフルオロメチル)ベンジジン、3,3’−ビス((アミノフェノキシ)フェニル)プロパン、2,2’−ビス(3−アミノ−4−ヒドロキシフェニル)ヘキサフルオロプロパン、ビス(4−(4−アミノフェノキシ)ジフェニル)スルホン、ビス(4−(3−アミノフェノキシ)ジフェニル)スルホン、オクタフルオロベンジジン、3,3'−ジメトキシ−4,4'−ジアミノビフェニル、3,3'−ジクロロ−4,4'−ジアミノビフェニル、3,3'−ジフルオロ−4,4'−ジアミノビフェニル、2スルホンスルホン,4−ビス(4−アミノアニリノ)−6−アミノ−1,3,5−トリアジン、2,4−ビス(4−アミノアニリノ)−6−メチルアミノ−1,3,5−トリアジン、2,4−ビス(4−アミノアニリノ)−6−エチルアミノ−1,3,5−トリアジン、2,4−ビス(4−アミノアニリノ)−6−アニリノ−1,3,5−トリアジンが挙げられる。ジアミン成分は、単独で使用してもよく、また複数種を組み合わせて使用することもできる。 Examples of the diamine component that gives the repeating unit of the chemical formula (1) include p-phenylenediamine, m-phenylenediamine, benzidine, 3,3′-diamino-biphenyl, and 2,2′-bis (trifluoromethyl) benzidine. 3,3′-bis (trifluoromethyl) benzidine, m-tolidine, 4,4′-diaminobenzanilide, 3,4′-diaminobenzanilide, N, N′-bis (4-aminophenyl) terephthalamide N, N′-p-phenylenebis (p-aminobenzamide), 4-aminophenoxy-4-diaminobenzoate, bis (4-aminophenyl) terephthalate, bis (4-amino) biphenyl-4,4′-dicarboxylate Phenyl) ester, p-phenylenebis (p-aminobenzoate), bis (4-amino) Nophenyl)-[1,1′-biphenyl] -4,4′-dicarboxylate, [1,1′-biphenyl] -4,4′-diyl bis (4-aminobenzoate), 4,4′-oxy Dianiline, 3,4'-oxydianiline, 3,3'-oxydianiline, p-methylenebis (phenylenediamine), 1,3-bis (4-aminophenoxy) benzene, 1,3-bis (3- Aminophenoxy) benzene, 1,4-bis (4-aminophenoxy) benzene, 4,4′-bis (4-aminophenoxy) biphenyl, 4,4′-bis (3-aminophenoxy) biphenyl, 2,2- Bis (4- (4-aminophenoxy) phenyl) hexafluoropropane, 2,2-bis (4-aminophenyl) hexafluoropropane, bis (4-aminophenyl) sulfone, 3,3′-bis (tri Fluoromethyl) benzidine, 3,3′-bis ((aminophenoxy) phenyl) propane, 2,2′-bis (3-amino-4-hydroxyphenyl) hexafluoropropane, bis (4- (4-aminophenoxy) diphenyl ) Sulfone, bis (4- (3-aminophenoxy) diphenyl) sulfone, octafluorobenzidine, 3,3′-dimethoxy-4,4′-diaminobiphenyl, 3,3′-dichloro-4,4′-diaminobiphenyl 3,3′-difluoro-4,4′-diaminobiphenyl, 2 sulfone sulfone, 4-bis (4-aminoanilino) -6-amino-1,3,5-triazine, 2,4-bis (4-aminoanilino) ) -6-methylamino-1,3,5-triazine, 2,4-bis (4-aminoanilino) -6-ethylamino-1 3,5-triazine, 2,4-bis (4-aminoanilino) -6-anilino-1,3,5-triazine. A diamine component may be used independently and can also be used in combination of multiple types.
この前記化学式(1)で表される繰り返し単位の少なくとも1種を含むポリイミド前駆体は、前記化学式(1)で表される繰り返し単位以外の、他の繰り返し単位を含むことができる。他の繰り返し単位を与えるテトラカルボン酸成分およびジアミン成分としては、特に限定されず、他の公知の芳香族または脂肪族テトラカルボン酸類、公知の芳香族または脂肪族ジアミン類いずれも使用することができる。他のテトラカルボン酸成分も、単独で使用してもよく、また複数種を組み合わせて使用することもできる。他のジアミン成分も、単独で使用してもよく、また複数種を組み合わせて使用することもできる。 The polyimide precursor containing at least one type of repeating unit represented by the chemical formula (1) may contain other repeating units other than the repeating unit represented by the chemical formula (1). The tetracarboxylic acid component and diamine component that give other repeating units are not particularly limited, and any other known aromatic or aliphatic tetracarboxylic acids or known aromatic or aliphatic diamines can be used. . Other tetracarboxylic acid components may be used alone or in combination of two or more. Other diamine components may be used alone or in combination of two or more.
前記化学式(1)で表される繰り返し単位以外の、他の繰り返し単位の含有量は、全繰り返し単位に対して、好ましくは30モル%以下または30モル%未満、より好ましくは20モル%以下、さらに好ましくは10モル%以下であることが好ましい。 The content of other repeating units other than the repeating unit represented by the chemical formula (1) is preferably 30 mol% or less or less than 30 mol%, more preferably 20 mol% or less, based on all repeating units. More preferably, it is 10 mol% or less.
前記化学式(2)中のX2としては、炭素数が6〜40の芳香族環を有する4価の基が好ましく、Y2としては、炭素数が4〜40の脂環構造を有する2価の基が好ましい。X 2 in the chemical formula (2) is preferably a tetravalent group having an aromatic ring having 6 to 40 carbon atoms, and Y 2 is a divalent having an alicyclic structure having 4 to 40 carbon atoms. Are preferred.
前記化学式(2)の繰り返し単位を与えるテトラカルボン酸成分としては、例えば、2,2−ビス(3,4−ジカルボキシフェニル)ヘキサフルオロプロパン、4−(2,5−ジオキソテトラヒドロフラン−3−イル)−1,2,3,4−テトラヒドロナフタレン−1,2−ジカルボン酸、ピロメリット酸、3,3’,4,4’−ベンゾフェノンテトラカルボン酸、3,3’,4,4’−ビフェニルテトラカルボン酸、2,3,3’,4’−ビフェニルテトラカルボン酸、4,4’−オキシジフタル酸、ビス(3,4−ジカルボキシフェニル)スルホン二無水物、m−ターフェニル−3,4,3’,4’−テトラカルボン酸二無水物、p−ターフェニル−3,4,3’,4’−テトラカルボン酸二無水物、ビスカルボキシフェニルジメチルシラン、ビスジカルボキシフェノキシジフェニルスルフィド、スルホニルジフタル酸や、これらのテトラカルボン酸二無水物、テトラカルボン酸シリルエステル、テトラカルボン酸エステル、テトラカルボン酸クロライド等の誘導体が挙げられる。テトラカルボン酸成分は、単独で使用してもよく、また複数種を組み合わせて使用することもできる。 Examples of the tetracarboxylic acid component that gives the repeating unit of the chemical formula (2) include 2,2-bis (3,4-dicarboxyphenyl) hexafluoropropane and 4- (2,5-dioxotetrahydrofuran-3- Yl) -1,2,3,4-tetrahydronaphthalene-1,2-dicarboxylic acid, pyromellitic acid, 3,3 ′, 4,4′-benzophenone tetracarboxylic acid, 3,3 ′, 4,4′- Biphenyltetracarboxylic acid, 2,3,3 ′, 4′-biphenyltetracarboxylic acid, 4,4′-oxydiphthalic acid, bis (3,4-dicarboxyphenyl) sulfone dianhydride, m-terphenyl-3, 4,3 ′, 4′-tetracarboxylic dianhydride, p-terphenyl-3,4,3 ′, 4′-tetracarboxylic dianhydride, biscarboxyphenyldimethylsilane Emissions, bis-dicarboxyphenoxy diphenyl sulfide, or sulfonyl di phthalate, these tetracarboxylic dianhydrides, tetracarboxylic acid silyl ester, tetracarboxylic acid esters, derivatives of such tetracarboxylic acid chloride. A tetracarboxylic acid component may be used independently and can also be used in combination of multiple types.
前記化学式(2)の繰り返し単位を与えるジアミン成分としては、例えば、1,4−ジアミノシクロへキサン、1,4−ジアミノ−2−メチルシクロヘキサン、1,4−ジアミノ−2−エチルシクロヘキサン、1,4−ジアミノ−2−n−プロピルシクロヘキサン、1,4−ジアミノ−2−イソプロピルシクロヘキサン、1,4−ジアミノ−2−n−ブチルシクロヘキサン、1,4−ジアミノ−2−イソブチルシクロヘキサン、1,4−ジアミノ−2―sec―ブチルシクロヘキサン、1,4−ジアミノ−2―tert―ブチルシクロヘキサン、1,2−ジアミノシクロへキサン、1,3−ジアミノシクロブタン、1,4−ビス(アミノメチル)シクロヘキサン、1,3−ビス(アミノメチル)シクロヘキサン、ジアミノビシクロヘプタン、ジアミノメチルビシクロヘプタン、ジアミノオキシビシクロヘプタン、ジアミノメチルオキシビシクロヘプタン、イソホロンジアミン、ジアミノトリシクロデカン、ジアミノメチルトリシクロデカン、ビス(アミノシクロへキシル)メタン、ビス(アミノシクロヘキシル)イソプロピリデン6,6'-ビス(3-アミノフェノキシ)-3,3,3',3'-テトラメチル-1,1'-スピロビインダン、6,6'-ビス(4-アミノフェノキシ)-3,3,3',3'-テトラメチル-1,1'-スピロビインダンが挙げられる。ジアミン成分は、単独で使用してもよく、また複数種を組み合わせて使用することもできる。 Examples of the diamine component that gives the repeating unit of the chemical formula (2) include 1,4-diaminocyclohexane, 1,4-diamino-2-methylcyclohexane, 1,4-diamino-2-ethylcyclohexane, 1, 4-diamino-2-n-propylcyclohexane, 1,4-diamino-2-isopropylcyclohexane, 1,4-diamino-2-n-butylcyclohexane, 1,4-diamino-2-isobutylcyclohexane, 1,4- Diamino-2-sec-butylcyclohexane, 1,4-diamino-2-tert-butylcyclohexane, 1,2-diaminocyclohexane, 1,3-diaminocyclobutane, 1,4-bis (aminomethyl) cyclohexane, 1 , 3-bis (aminomethyl) cyclohexane, diaminobicycloheptane, diamy Nomethylbicycloheptane, diaminooxybicycloheptane, diaminomethyloxybicycloheptane, isophoronediamine, diaminotricyclodecane, diaminomethyltricyclodecane, bis (aminocyclohexyl) methane, bis (aminocyclohexyl) isopropylidene 6,6 ′ -Bis (3-aminophenoxy) -3,3,3 ′, 3′-tetramethyl-1,1′-spirobiindane, 6,6′-bis (4-aminophenoxy) -3,3,3 ′, 3 And '-tetramethyl-1,1'-spirobiindane. A diamine component may be used independently and can also be used in combination of multiple types.
この前記化学式(2)で表される繰り返し単位の少なくとも1種を含むポリイミド前駆体は、前記化学式(2)で表される繰り返し単位以外の、他の繰り返し単位を含むことができる。他の繰り返し単位を与えるテトラカルボン酸成分およびジアミン成分としては、特に限定されず、他の公知の芳香族または脂肪族テトラカルボン酸類、公知の芳香族または脂肪族ジアミン類いずれも使用することができる。他のテトラカルボン酸成分も、単独で使用してもよく、また複数種を組み合わせて使用することもできる。他のジアミン成分も、単独で使用してもよく、また複数種を組み合わせて使用することもできる。 The polyimide precursor containing at least one repeating unit represented by the chemical formula (2) can contain other repeating units other than the repeating unit represented by the chemical formula (2). The tetracarboxylic acid component and diamine component that give other repeating units are not particularly limited, and any other known aromatic or aliphatic tetracarboxylic acids or known aromatic or aliphatic diamines can be used. . Other tetracarboxylic acid components may be used alone or in combination of two or more. Other diamine components may be used alone or in combination of two or more.
前記化学式(2)で表される繰り返し単位以外の、他の繰り返し単位の含有量は、全繰り返し単位に対して、好ましくは30モル%以下または30モル%未満、より好ましくは20モル%以下、さらに好ましくは10モル%以下であることが好ましい。 The content of other repeating units other than the repeating unit represented by the chemical formula (2) is preferably 30 mol% or less or less than 30 mol%, more preferably 20 mol% or less, based on all repeating units. More preferably, it is 10 mol% or less.
ポリイミド前駆体は、前記化学式(1)で表される繰り返し単位の少なくとも1種と前記化学式(2)で表される繰り返し単位の少なくとも1種とを含むものであってもよい。その場合も、前記化学式(1)及び(2)で表される繰り返し単位以外の、他の繰り返し単位の含有量は、全繰り返し単位に対して、好ましくは30モル%以下または30モル%未満、より好ましくは20モル%以下、さらに好ましくは10モル%以下であることが好ましい。 The polyimide precursor may include at least one repeating unit represented by the chemical formula (1) and at least one repeating unit represented by the chemical formula (2). Also in that case, the content of other repeating units other than the repeating units represented by the chemical formulas (1) and (2) is preferably 30 mol% or less or less than 30 mol% with respect to all repeating units. More preferably, it is 20 mol% or less, More preferably, it is 10 mol% or less.
ある実施態様においては、ポリイミド前駆体としては、例えば、下記化学式(1−1)で表される繰り返し単位を含むポリイミド前駆体が好ましく、下記化学式(1−2)及び下記化学式(1−3)で表される繰り返し単位を少なくとも1種含み、化学式(1−2)及び化学式(1−3)で表される繰り返し単位の合計含有量が、全繰り返し単位に対して、80モル%以上であるポリイミド前駆体がより好ましい。 In a certain embodiment, as a polyimide precursor, the polyimide precursor containing the repeating unit represented by the following chemical formula (1-1) is preferable, for example, The following chemical formula (1-2) and the following chemical formula (1-3) The total content of the repeating units represented by the chemical formula (1-2) and the chemical formula (1-3) is 80 mol% or more with respect to all the repeating units. A polyimide precursor is more preferable.
ただし、前記化学式(1−1)、前記化学式(1−2)及び前記化学式(1−3)は、2つのノルボルナン環(ビシクロ[2.2.1]ヘプタン)の5位または6位の一方の酸基がアミノ基と反応してアミド結合(−CONH−)を形成しており、一方がアミド結合を形成していない−COOR1で表される基、または−COOR2で表される基であることを示す。すなわち、前記化学式(1−1)、前記化学式(1−2)及び前記化学式(1−3)には、4つの構造異性体、すなわち(i)5位に−COOR1で表される基を、6位に−CONH−で表される基を有し、5’’位に−COOR2で表される基を、6’’位に−CONH−A−で表される基を有するもの、(ii)6位に−COOR1で表される基を、5位に−CONH−で表される基を有し、5’’位に−COOR2で表される基を、6’’位に−CONH−A−で表される基を有するもの、(iii)5位に−COOR1で表される基を、6位に−CONH−で表される基を有し、6’’位に−COOR2で表される基を、5’’位に−CONH−A−で表される基を有するもの、(iv)6位に−COOR1で表される基を、5位に−CONH−で表される基を有し、6’’位に−COOR2で表される基を、5’’位に−CONH−A−で表される基を有するもの全てが含まれる。However, the chemical formula (1-1), the chemical formula (1-2), and the chemical formula (1-3) are either the 5-position or the 6-position of two norbornane rings (bicyclo [2.2.1] heptane). A group represented by —COOR 1 or a group represented by —COOR 2 in which one of the acid groups is reacted with an amino group to form an amide bond (—CONH—), and one of the acid groups does not form an amide bond. Indicates that That is, the chemical formula (1-1), the chemical formula (1-2), and the chemical formula (1-3) include four structural isomers, that is, (i) a group represented by -COOR 1 at the 5-position. A group represented by -CONH- at the 6-position, a group represented by -COOR 2 at the 5 ''-position, and a group represented by -CONH-A- at the 6 ''-position, (Ii) a group represented by -COOR 1 at the 6-position, a group represented by -CONH- at the 5-position, and a group represented by -COOR 2 at the 5 ''-position, Having a group represented by -CONH-A-, (iii) a group represented by -COOR 1 at the 5-position, a group represented by -CONH- at the 6-position, and the 6 ''-position A group represented by —COOR 2 having a group represented by —CONH—A— at the 5 ″ position, and (iv) a group represented by —COOR 1 at the 6 position— CONH- And a group represented by —COOR 2 at the 6 ″ position and a group represented by —CONH-A— at the 5 ″ position are included.
さらに、ポリイミド前駆体は、Aが下記化学式(1−A)で表される基である化学式(1−1)で表される繰り返し単位、より好ましくはAが下記化学式(1−A)で表される基である化学式(1−2)および/または化学式(1−3)で表される繰り返し単位を少なくとも1種含むことが好ましい。 Further, the polyimide precursor is a repeating unit represented by the chemical formula (1-1) in which A is a group represented by the following chemical formula (1-A), more preferably A is represented by the following chemical formula (1-A). It is preferable that at least one repeating unit represented by the chemical formula (1-2) and / or the chemical formula (1-3) which is a group to be included is included.
換言すれば、ある実施態様においては、ポリイミド前駆体は、ノルボルナン−2−スピロ−α−シクロペンタノン−α’−スピロ−2’’−ノルボルナン−5,5’’,6,6’’−テトラカルボン酸類等、より好ましくはtrans−endo−endo−ノルボルナン−2−スピロ−α−シクロペンタノン−α’−スピロ−2’’−ノルボルナン−5,5’’,6,6’’−テトラカルボン酸類等および/またはcis−endo−endo−ノルボルナン−2−スピロ−α−シクロペンタノン−α’−スピロ−2’’−ノルボルナン−5,5’’,6,6’’−テトラカルボン酸類等(テトラカルボン酸類等とは、テトラカルボン酸と、テトラカルボン酸二無水物、テトラカルボン酸シリルエステル、テトラカルボン酸エステル、テトラカルボン酸クロライド等のテトラカルボン酸誘導体を表す)を含むテトラカルボン酸成分と、芳香族環を有するジアミン成分、より好ましくはAが前記化学式(1−A)で表される基である化学式(1−1)、化学式(1−2)または化学式(1−3)の繰り返し単位を与えるジアミン成分を含むジアミン成分から得られるポリイミド前駆体である。 In other words, in some embodiments, the polyimide precursor is norbornane-2-spiro-α-cyclopentanone-α′-spiro-2 ″ -norbornane-5,5 ″, 6,6 ″- Tetracarboxylic acids and the like, more preferably trans-endo-endo-norbornane-2-spiro-α-cyclopentanone-α′-spiro-2 ″ -norbornane-5,5 ″, 6,6 ″ -tetra Carboxylic acids etc. and / or cis-endo-endo-norbornane-2-spiro-α-cyclopentanone-α′-spiro-2 ″ -norbornane-5,5 ″, 6,6 ″ -tetracarboxylic acids (Tetracarboxylic acids, etc. are tetracarboxylic acids, tetracarboxylic dianhydrides, tetracarboxylic acid silyl esters, tetracarboxylic acid esters, tetracarboxylic acids, etc. A tetracarboxylic acid component containing a tetracarboxylic acid derivative such as a boronic acid chloride) and a diamine component having an aromatic ring, more preferably a chemical formula (1) wherein A is a group represented by the chemical formula (1-A) -1), a polyimide precursor obtained from a diamine component containing a diamine component that gives a repeating unit of chemical formula (1-2) or chemical formula (1-3).
前記化学式(1−1)の繰り返し単位を与えるテトラカルボン酸成分としては、ノルボルナン−2−スピロ−α−シクロペンタノン−α’−スピロ−2’’−ノルボルナン−5,5’’,6,6’’−テトラカルボン酸類等の、1種を単独で使用してもよく、また複数種を組み合わせて使用することもできる。前記化学式(1−2)の繰り返し単位を与えるテトラカルボン酸成分としては、trans−endo−endo−ノルボルナン−2−スピロ−α−シクロペンタノン−α’−スピロ−2’’−ノルボルナン−5,5’’,6,6’’−テトラカルボン酸類等の、1種を単独で使用してもよく、複数種を組み合わせて使用することもできる。前記化学式(1−3)の繰り返し単位を与えるテトラカルボン酸成分としては、cis−endo−endo−ノルボルナン−2−スピロ−α−シクロペンタノン−α’−スピロ−2’’−ノルボルナン−5,5’’,6,6’’−テトラカルボン酸類等の、1種を単独で使用してもよく、複数種を組み合わせて使用することもできる。 Examples of the tetracarboxylic acid component that gives the repeating unit of the chemical formula (1-1) include norbornane-2-spiro-α-cyclopentanone-α′-spiro-2 ″ -norbornane-5,5 ″, 6, One kind such as 6 ″ -tetracarboxylic acids may be used alone, or a plurality of kinds may be used in combination. Examples of the tetracarboxylic acid component that gives the repeating unit of the chemical formula (1-2) include trans-endo-endo-norbornane-2-spiro-α-cyclopentanone-α′-spiro-2 ″ -norbornane-5. One type such as 5 ″, 6,6 ″ -tetracarboxylic acid may be used alone, or a plurality of types may be used in combination. Examples of the tetracarboxylic acid component that gives the repeating unit of the chemical formula (1-3) include cis-endo-endo-norbornane-2-spiro-α-cyclopentanone-α′-spiro-2 ″ -norbornane-5. One type such as 5 ″, 6,6 ″ -tetracarboxylic acid may be used alone, or a plurality of types may be used in combination.
なお、より好ましい形態のポリイミド前駆体においては、前記化学式(1−2)の繰り返し単位を与えるテトラカルボン酸成分(trans−endo−endo−ノルボルナン−2−スピロ−α−シクロペンタノン−α’−スピロ−2’’−ノルボルナン−5,5’’,6,6’’−テトラカルボン酸類等)の1種以上のみを使用してもよく、前記化学式(1−3)の繰り返し単位を与えるテトラカルボン酸成分(cis−endo−endo−ノルボルナン−2−スピロ−α−シクロペンタノン−α’−スピロ−2’’−ノルボルナン−5,5’’,6,6’’−テトラカルボン酸類等)の1種以上のみを使用してもよく、前記化学式(1−2)の繰り返し単位を与えるテトラカルボン酸成分(trans−endo−endo−ノルボルナン−2−スピロ−α−シクロペンタノン−α’−スピロ−2’’−ノルボルナン−5,5’’,6,6’’−テトラカルボン酸類等)の1種以上と、前記化学式(1−3)の繰り返し単位を与えるテトラカルボン酸成分(cis−endo−endo−ノルボルナン−2−スピロ−α−シクロペンタノン−α’−スピロ−2’’−ノルボルナン−5,5’’,6,6’’−テトラカルボン酸類等)の1種以上の両方を使用してもよい。 In a more preferable form of the polyimide precursor, a tetracarboxylic acid component (trans-endo-endo-norbornane-2-spiro-α-cyclopentanone-α′-) that gives the repeating unit of the chemical formula (1-2) is used. One or more of spiro-2 ″ -norbornane-5,5 ″, 6,6 ″ -tetracarboxylic acids, etc.) may be used, and the tetra unit giving the repeating unit of the above chemical formula (1-3) Carboxylic acid component (cis-endo-endo-norbornane-2-spiro-α-cyclopentanone-α′-spiro-2 ″ -norbornane-5,5 ″, 6,6 ″ -tetracarboxylic acids, etc.) Or a tetracarboxylic acid component (trans-endo-endo-norbol) that gives a repeating unit of the chemical formula (1-2). One or more of N-2-spiro-α-cyclopentanone-α′-spiro-2 ″ -norbornane-5,5 ″, 6,6 ″ -tetracarboxylic acid, etc.) and the above chemical formula (1 -3) a tetracarboxylic acid component (cis-endo-endo-norbornane-2-spiro-α-cyclopentanone-α′-spiro-2 ″ -norbornane-5,5 ″, 6 One or more of 6 ″ -tetracarboxylic acids and the like) may be used.
ポリイミド前駆体は、前記化学式(1−2)及び前記化学式(1−3)で表される繰り返し単位の合計含有量が、全繰り返し単位に対して、80モル%以上であることが好ましく、すなわち、前記化学式(1−2)及び前記化学式(1−3)で表される繰り返し単位を少なくとも1種含み、その繰り返し単位を全繰り返し単位中に、合計で、好ましくは80モル%以上、より好ましくは90モル%以上、さらに好ましくは95モル%以上、特に好ましくは99モル%以上含むことが好ましい。前記化学式(1−2)及び前記化学式(1−3)で表される繰り返し単位を少なくとも1種含み、その繰り返し単位を全繰り返し単位中に、合計で、好ましくは80モル%以上含むことで、得られるポリイミドの線熱膨張係数が小さくなる。 The polyimide precursor preferably has a total content of repeating units represented by the chemical formula (1-2) and the chemical formula (1-3) of 80 mol% or more with respect to all repeating units. In addition, at least one type of repeating unit represented by the chemical formula (1-2) and the chemical formula (1-3) is included, and the total number of the repeating units is preferably 80 mol% or more in all repeating units. Is preferably 90 mol% or more, more preferably 95 mol% or more, particularly preferably 99 mol% or more. By including at least one type of repeating unit represented by the chemical formula (1-2) and the chemical formula (1-3), and including the repeating unit in all repeating units in total, preferably 80 mol% or more, The resulting linear thermal expansion coefficient of the polyimide is reduced.
前記化学式(1−1)、または前記化学式(1−2)、前記化学式(1−3)の繰り返し単位を与えるジアミン成分は、Aが前記化学式(1−A)で表される基であるものを与えるジアミンを含むことが好ましい。 The diamine component that gives the repeating unit of the chemical formula (1-1), the chemical formula (1-2), or the chemical formula (1-3) is one in which A is a group represented by the chemical formula (1-A). It is preferred to include a diamine that provides
Aが前記化学式(1−A)の構造である化学式(1−1)、または化学式(1−2)、化学式(1−3)の繰り返し単位を与えるジアミン成分は、芳香環を有し、芳香環を複数有する場合は芳香環同士をそれぞれ独立に、直接結合、アミド結合、またはエステル結合で連結したものである。芳香環同士の連結位置は特に限定されないが、アミノ基もしくは芳香環同士の連結基に対して4位で結合することで直線的な構造となり、得られるポリイミドが低線熱膨張になることがある。また、芳香環にメチル基やトリフルオロメチル基が置換されていてもよい。なお、置換位置は特に限定されない。 The diamine component that gives the repeating unit of the chemical formula (1-1), the chemical formula (1-2), or the chemical formula (1-3) in which A is the structure of the chemical formula (1-A) has an aromatic ring, When there are a plurality of rings, the aromatic rings are each independently linked by a direct bond, an amide bond, or an ester bond. The connection position of the aromatic rings is not particularly limited, but it may form a linear structure by bonding at the 4-position to the amino group or the connection group of the aromatic rings, and the resulting polyimide may have low linear thermal expansion. . In addition, a methyl group or a trifluoromethyl group may be substituted on the aromatic ring. The substitution position is not particularly limited.
Aが前記化学式(1−A)の構造である化学式(1−1)、または化学式(1−2)、化学式(1−3)の繰り返し単位を与えるジアミン成分としては、特に限定するものではないが、例えば、p−フェニレンジアミン、m−フェニレンジアミン、ベンジジン、3,3’−ジアミノ−ビフェニル、2,2’−ビス(トリフルオロメチル)ベンジジン、3,3’−ビス(トリフルオロメチル)ベンジジン、m−トリジン、4,4’−ジアミノベンズアニリド、3,4’−ジアミノベンズアニリド、N,N’−ビス(4−アミノフェニル)テレフタルアミド、N,N’−p−フェニレンビス(p−アミノベンズアミド)、4−アミノフェノキシ−4−ジアミノベンゾエート、ビス(4−アミノフェニル)テレフタレート、ビフェニル−4,4’−ジカルボン酸ビス(4−アミノフェニル)エステル、p−フェニレンビス(p−アミノベンゾエート)、ビス(4−アミノフェニル)−[1,1’−ビフェニル]−4,4’−ジカルボキシレート、[1,1’−ビフェニル]−4,4’−ジイルビス(4−アミノベンゾエート)等が挙げられ、単独で使用してもよく、また複数種を組み合わせて使用することもできる。これらのうち、p−フェニレンジアミン、m−トリジン、4,4’−ジアミノベンズアニリド、4−アミノフェノキシ−4−ジアミノベンゾエート、2,2’−ビス(トリフルオロメチル)ベンジジン、ベンジジン、N,N’−ビス(4−アミノフェニル)テレフタルアミド、ビフェニル−4,4’−ジカルボン酸ビス(4−アミノフェニル)エステルが好ましく、p−フェニレンジアミン、4,4’−ジアミノベンズアニリド、2,2’−ビス(トリフルオロメチル)ベンジジンがより好ましい。ジアミン成分として、p−フェニレンジアミン、4,4’−ジアミノベンズアニリド、2,2’−ビス(トリフルオロメチル)ベンジジンを使用することで、得られるポリイミドが高耐熱性と高透過率を両立する。これらのジアミンは、単独で使用してもよく、また複数種を組み合わせて使用することもできる。なお、o−トリジンは危険性が高いことから好ましくない。 The diamine component that gives the repeating unit of the chemical formula (1-1), the chemical formula (1-2), or the chemical formula (1-3) in which A is the structure of the chemical formula (1-A) is not particularly limited. Are, for example, p-phenylenediamine, m-phenylenediamine, benzidine, 3,3′-diamino-biphenyl, 2,2′-bis (trifluoromethyl) benzidine, 3,3′-bis (trifluoromethyl) benzidine , M-tolidine, 4,4′-diaminobenzanilide, 3,4′-diaminobenzanilide, N, N′-bis (4-aminophenyl) terephthalamide, N, N′-p-phenylenebis (p- Aminobenzamide), 4-aminophenoxy-4-diaminobenzoate, bis (4-aminophenyl) terephthalate, biphenyl-4,4′- Carboxylic acid bis (4-aminophenyl) ester, p-phenylenebis (p-aminobenzoate), bis (4-aminophenyl)-[1,1′-biphenyl] -4,4′-dicarboxylate, [1 , 1′-biphenyl] -4,4′-diylbis (4-aminobenzoate) and the like, and may be used alone or in combination of two or more. Among these, p-phenylenediamine, m-tolidine, 4,4′-diaminobenzanilide, 4-aminophenoxy-4-diaminobenzoate, 2,2′-bis (trifluoromethyl) benzidine, benzidine, N, N '-Bis (4-aminophenyl) terephthalamide, biphenyl-4,4'-dicarboxylic acid bis (4-aminophenyl) ester is preferred, p-phenylenediamine, 4,4'-diaminobenzanilide, 2,2' -Bis (trifluoromethyl) benzidine is more preferred. By using p-phenylenediamine, 4,4′-diaminobenzanilide, and 2,2′-bis (trifluoromethyl) benzidine as the diamine component, the resulting polyimide has both high heat resistance and high transmittance. . These diamines may be used alone or in combination of two or more. Note that o-tolidine is not preferred because of its high risk.
前記化学式(1−1)、または前記化学式(1−2)、前記化学式(1−3)の繰り返し単位を与えるジアミン成分としては、Aが前記化学式(1−A)の構造のものを与えるジアミン成分以外の、他のジアミンを併用することができる。他のジアミン成分としては、他の芳香族または脂肪族ジアミン類を使用することができる。他のジアミン成分として、例えば、4,4’−オキシジアニリン、3,4’−オキシジアニリン、3,3’−オキシジアニリン、ビス(4-アミノフェニル)スルフィド、p−メチレンビス(フェニレンジアミン)、1,3−ビス(4−アミノフェノキシ)ベンゼン、1,3−ビス(3−アミノフェノキシ)ベンゼン、1,4−ビス(4−アミノフェノキシ)ベンゼン、2,2−ビス[4−(4−アミノフェノキシ)フェニル]ヘキサフルオロプロパン、2,2−ビス(4−アミノフェニル)ヘキサフルオロプロパン、ビス(4−アミノフェニル)スルホン、3,3−ビス((アミノフェノキシ)フェニル)プロパン、2,2−ビス(3−アミノ−4−ヒドロキシフェニル)ヘキサフルオロプロパン、ビス(4−(4−アミノフェノキシ)ジフェニル)スルホン、ビス(4−(3−アミノフェノキシ)ジフェニル)スルホン、オクタフルオロベンジジン、3,3’−ジメトキシ−4,4’−ジアミノビフェニル、3,3’−ジクロロ−4,4’−ジアミノビフェニル、3,3’−ジフルオロ−4,4’−ジアミノビフェニル、9,9−ビス(4−アミノフェニル)フルオレン、4,4’−ビス(4−アミノフェノキシ)ビフェニル、4,4’−ビス(3−アミノフェノキシ)ビフェニル、1,4−ジアミノシクロへキサン、1,4−ジアミノ−2−メチルシクロヘキサン、1,4−ジアミノ−2−エチルシクロヘキサン、1,4−ジアミノ−2−n−プロピルシクロヘキサン、1,4−ジアミノ−2−イソプロピルシクロヘキサン、1,4−ジアミノ−2−n−ブチルシクロヘキサン、1,4−ジアミノ−2−イソブチルシクロヘキサン、1,4−ジアミノ−2−sec−ブチルシクロヘキサン、1,4−ジアミノ−2−tert−ブチルシクロヘキサン、1,2−ジアミノシクロへキサン、1,4−ジアミノシクロへキサン、1,3−ジアミノシクロブタン、1,4−ビス(アミノメチル)シクロヘキサン、1,3−ビス(アミノメチル)シクロヘキサン、ジアミノビシクロヘプタン、ジアミノメチルビシクロヘプタン、ジアミノオキシビシクロヘプタン、ジアミノメチルオキシビシクロヘプタン、イソホロンジアミン、ジアミノトリシクロデカン、ジアミノメチルトリシクロデカン、ビス(アミノシクロへキシル)メタン、ビス(アミノシクロヘキシル)イソプロピリデン6,6'-ビス(3-アミノフェノキシ)-3,3,3',3'-テトラメチル-1,1'-スピロビインダン、6,6'-ビス(4-アミノフェノキシ)-3,3,3',3'-テトラメチル-1,1'-スピロビインダン等やこれらの誘導体が挙げられ、単独で使用してもよく、また複数種を組み合わせて使用することもできる。 As the diamine component that gives the repeating unit of the chemical formula (1-1), the chemical formula (1-2), or the chemical formula (1-3), A is a diamine that gives the structure of the chemical formula (1-A). Other diamines other than the components can be used in combination. Other aromatic or aliphatic diamines can be used as other diamine components. Other diamine components include, for example, 4,4′-oxydianiline, 3,4′-oxydianiline, 3,3′-oxydianiline, bis (4-aminophenyl) sulfide, p-methylenebis (phenylenediamine) ), 1,3-bis (4-aminophenoxy) benzene, 1,3-bis (3-aminophenoxy) benzene, 1,4-bis (4-aminophenoxy) benzene, 2,2-bis [4- ( 4-aminophenoxy) phenyl] hexafluoropropane, 2,2-bis (4-aminophenyl) hexafluoropropane, bis (4-aminophenyl) sulfone, 3,3-bis ((aminophenoxy) phenyl) propane, 2 , 2-bis (3-amino-4-hydroxyphenyl) hexafluoropropane, bis (4- (4-aminophenoxy) diph Enyl) sulfone, bis (4- (3-aminophenoxy) diphenyl) sulfone, octafluorobenzidine, 3,3′-dimethoxy-4,4′-diaminobiphenyl, 3,3′-dichloro-4,4′-diamino Biphenyl, 3,3′-difluoro-4,4′-diaminobiphenyl, 9,9-bis (4-aminophenyl) fluorene, 4,4′-bis (4-aminophenoxy) biphenyl, 4,4′-bis (3-aminophenoxy) biphenyl, 1,4-diaminocyclohexane, 1,4-diamino-2-methylcyclohexane, 1,4-diamino-2-ethylcyclohexane, 1,4-diamino-2-n-propyl Cyclohexane, 1,4-diamino-2-isopropylcyclohexane, 1,4-diamino-2-n-butylcyclohexane 1,4-diamino-2-isobutylcyclohexane, 1,4-diamino-2-sec-butylcyclohexane, 1,4-diamino-2-tert-butylcyclohexane, 1,2-diaminocyclohexane, 1,4- Diaminocyclohexane, 1,3-diaminocyclobutane, 1,4-bis (aminomethyl) cyclohexane, 1,3-bis (aminomethyl) cyclohexane, diaminobicycloheptane, diaminomethylbicycloheptane, diaminooxybicycloheptane, diaminomethyl Oxybicycloheptane, isophoronediamine, diaminotricyclodecane, diaminomethyltricyclodecane, bis (aminocyclohexyl) methane, bis (aminocyclohexyl) isopropylidene 6,6′-bis (3-aminophenoxy) -3,3 , 3 ', 3'-te Lamethyl-1,1′-spirobiindane, 6,6′-bis (4-aminophenoxy) -3,3,3 ′, 3′-tetramethyl-1,1′-spirobiindane, and their derivatives, You may use individually and can also be used in combination of multiple types.
本発明のポリイミド前駆体は、Aが前記化学式(1−A)で表されるものである前記化学式(1−1)の繰り返し単位を少なくとも1種、より好ましくは、Aが前記化学式(1−A)で表されるものである前記化学式(1−2)の繰り返し単位を少なくとも1種および/またはAが前記化学式(1−A)で表されるものである前記化学式(1−3)の繰り返し単位を少なくとも1種含むことが好ましい。換言すれば、前記化学式(1−1)の繰り返し単位、より好ましくは前記化学式(1−2)及び前記化学式(1−3)の繰り返し単位を与えるジアミン成分が、Aが前記化学式(1−A)の構造のものを与えるジアミン成分を含むことが好ましい。前記化学式(1−1)の繰り返し単位、より好ましくは前記化学式(1−2)及び前記化学式(1−3)中のAを与えるジアミン成分が前記化学式(1−A)の構造のものを与えるジアミン成分であることで、得られるポリイミドの耐熱性が向上する。 In the polyimide precursor of the present invention, A is at least one repeating unit of the chemical formula (1-1) in which A is represented by the chemical formula (1-A), more preferably, A is the chemical formula (1- At least one repeating unit represented by the chemical formula (1-2) represented by A) and / or A represented by the chemical formula (1-A) is represented by the chemical formula (1-3). It is preferable to include at least one repeating unit. In other words, the diamine component that gives the repeating unit of the chemical formula (1-1), more preferably the repeating unit of the chemical formula (1-2) and the chemical formula (1-3), is represented by A being the chemical formula (1-A). It is preferable to include a diamine component that gives a structure of The repeating unit of the chemical formula (1-1), more preferably the diamine component giving A in the chemical formula (1-2) and the chemical formula (1-3) gives the structure of the chemical formula (1-A). By being a diamine component, the heat resistance of the resulting polyimide is improved.
本発明のポリイミド前駆体は、前記化学式(1−1)、または前記化学式(1−2)及び前記化学式(1−3)中のAを与えるジアミン成分100モル%中、前記化学式(1−A)の構造を与えるジアミン成分の割合が、合計で、好ましくは50モル%以上、より好ましくは70モル%以上、より好ましくは80モル%以上、さらに好ましくは90モル%以上、特に好ましくは100モル%であることが好ましい。換言すれば、Aが前記化学式(1−A)の構造である前記化学式(1−1)、または前記化学式(1−2)及び前記化学式(1−3)の繰り返し単位の1種以上の割合が、合計で、前記化学式(1−1)、または前記化学式(1−2)及び前記化学式(1−3)で表される全繰り返し単位中、好ましくは50モル%以上、より好ましくは70モル%以上、より好ましくは80モル%以上、さらに好ましくは90モル%以上、特に好ましくは100モル%であることが好ましい。前記化学式(1−A)の構造を与えるジアミン成分の割合が、50モル%より小さい場合、得られるポリイミドの線熱膨張係数が大きくなることがある。ある実施態様においては、得られるポリイミドの機械的特性の点から、前記化学式(1−1)、または前記化学式(1−2)及び前記化学式(1−3)中のAを与えるジアミン成分100モル%中、前記化学式(1−A)の構造を与えるジアミン成分の割合が、合計で、好ましくは80モル%以下、より好ましくは90モル%以下または90モル%未満であることが好ましいことがある。例えば、4,4’−オキシジアニリン等の他の芳香族または脂肪族ジアミン類を、前記化学式(1−1)、または前記化学式(1−2)及び前記化学式(1−3)の繰り返し単位を与えるジアミン成分100モル%中、好ましくは20モル%未満、より好ましくは10モル%以下、より好ましくは10モル%未満で使用することができる。 In the polyimide precursor of the present invention, the chemical formula (1-1) or 100 mol% of the diamine component giving A in the chemical formula (1-2) and the chemical formula (1-3) has the chemical formula (1-A). The ratio of the diamine components that give the structure is preferably 50 mol% or more, more preferably 70 mol% or more, more preferably 80 mol% or more, still more preferably 90 mol% or more, and particularly preferably 100 mol%. % Is preferred. In other words, the chemical formula (1-1) in which A is the structure of the chemical formula (1-A), or the ratio of one or more repeating units of the chemical formula (1-2) and the chemical formula (1-3) Are, in total, preferably 50 mol% or more, more preferably 70 mol in all repeating units represented by the chemical formula (1-1) or the chemical formula (1-2) and the chemical formula (1-3). % Or more, more preferably 80 mol% or more, still more preferably 90 mol% or more, particularly preferably 100 mol%. When the ratio of the diamine component giving the structure of the chemical formula (1-A) is smaller than 50 mol%, the linear thermal expansion coefficient of the resulting polyimide may increase. In one embodiment, from the viewpoint of mechanical properties of the obtained polyimide, 100 mol of the diamine component that gives A in the chemical formula (1-1) or the chemical formula (1-2) and the chemical formula (1-3). %, The ratio of the diamine components giving the structure of the chemical formula (1-A) is preferably 80 mol% or less, more preferably 90 mol% or less or less than 90 mol% in total. . For example, other aromatic or aliphatic diamines such as 4,4′-oxydianiline are substituted with the chemical formula (1-1) or the repeating units of the chemical formula (1-2) and the chemical formula (1-3). In 100 mol% of the diamine component that gives the above, preferably less than 20 mol%, more preferably 10 mol% or less, more preferably less than 10 mol%.
ある実施態様においては、本発明の前記化学式(1−1)で表される繰り返し単位を含むポリイミド前駆体は、Aが前記化学式(1−A)で表されるものである化学式(1−1)の繰り返し単位を少なくとも2種含むことが好ましいことがある。ある実施態様においては、本発明の前記化学式(1−2)で表される繰り返し単位および/または前記化学式(1−3)で表される繰り返し単位を含むポリイミド前駆体は、Aが前記化学式(1−A)で表されるものである化学式(1−2)または化学式(1−2)の繰り返し単位を少なくとも2種含むことが好ましいことがある。換言すれば、前記化学式(1−1)の繰り返し単位を与えるジアミン成分、または、前記化学式(1−2)及び前記化学式(1−3)の繰り返し単位を与えるジアミン成分が、Aが前記化学式(1−A)の構造であるものを与えるジアミン成分を少なくとも2種含むことが好ましいことがある。前記化学式(1−1)中のA、または、前記化学式(1−2)及び前記化学式(1−3)中のAを与えるジアミン成分が前記化学式(1−A)の構造のものを与えるジアミン成分の少なくとも2種類を含むことで、得られるポリイミドの高透明性と低線熱膨張性のバランスが取れる(すなわち、透明性が高く、且つ、低線熱膨張係数であるポリイミドが得られる)。 In a certain embodiment, the polyimide precursor containing the repeating unit represented by the chemical formula (1-1) of the present invention has a chemical formula (1-1) in which A is represented by the chemical formula (1-A). It may be preferred to include at least two types of repeating units. In a certain embodiment, the polyimide precursor containing the repeating unit represented by the chemical formula (1-2) and / or the repeating unit represented by the chemical formula (1-3) of the present invention is such that A is represented by the chemical formula ( It may be preferable to include at least two repeating units represented by the chemical formula (1-2) or the chemical formula (1-2) represented by 1-A). In other words, the diamine component that gives the repeating unit of the chemical formula (1-1), or the diamine component that gives the repeating unit of the chemical formula (1-2) and the chemical formula (1-3), the A represents the chemical formula ( It may be preferred to include at least two diamine components that give what is the structure of 1-A). A diamine in which the diamine component giving A in the chemical formula (1-1) or A in the chemical formula (1-2) and the chemical formula (1-3) gives a structure of the chemical formula (1-A) By containing at least two kinds of components, the obtained polyimide can be balanced between high transparency and low linear thermal expansion (that is, a polyimide having high transparency and low linear thermal expansion coefficient can be obtained).
なお、本発明のポリイミド前駆体は、Aが前記化学式(1−A)の構造である前記化学式(1−2)の繰り返し単位を少なくとも2種含むものであってもよく、また、Aが前記化学式(1−A)の構造である前記化学式(1−3)の繰り返し単位を少なくとも2種含むものであってもよく、また、Aが前記化学式(1−A)の構造である前記化学式(1−2)の繰り返し単位を少なくとも1種と、Aが前記化学式(1−A)の構造である前記化学式(1−3)の繰り返し単位を少なくとも1種含むものであってもよい。 The polyimide precursor of the present invention may contain at least two repeating units of the chemical formula (1-2) in which A has the structure of the chemical formula (1-A). It may contain at least two types of repeating units of the chemical formula (1-3) having the structure of the chemical formula (1-A), and the chemical formula (A) is a structure of the chemical formula (1-A). It may include at least one repeating unit of 1-2) and at least one repeating unit of the chemical formula (1-3) in which A has the structure of the chemical formula (1-A).
ある実施態様においては、本発明のポリイミド前駆体は、
(i)Aが、mおよび/またはnが1〜3であり、Zおよび/またはWが、それぞれ独立に、−NHCO−、−CONH−、−COO−、または−OCO−のいずれかである前記化学式(1−A)の構造である前記化学式(1−1)、好ましくは前記化学式(1−2)及び前記化学式(1−3)の繰り返し単位(I)を少なくとも1種含み、
(ii)Aが、mおよびnが0である前記化学式(1−A)の構造であるか、または、mおよび/またはnが1〜3であり、ZおよびWが直接結合である前記化学式(1−A)の構造である前記化学式(1−1)、好ましくは前記化学式(1−2)及び前記化学式(1−3)の繰り返し単位(II)を少なくとも1種含むことがより好ましいことがある。In some embodiments, the polyimide precursor of the present invention comprises:
(I) A is m and / or n is 1 to 3, and Z and / or W are each independently any of —NHCO—, —CONH—, —COO—, or —OCO—. The chemical formula (1-1) having the structure of the chemical formula (1-A), preferably containing at least one repeating unit (I) of the chemical formula (1-2) and the chemical formula (1-3),
(Ii) A is the structure of the chemical formula (1-A) in which m and n are 0, or the chemical formula in which m and / or n is 1 to 3, and Z and W are direct bonds. It is more preferable that the chemical formula (1-1) having the structure of (1-A), preferably including at least one repeating unit (II) of the chemical formula (1-2) and the chemical formula (1-3). There is.
この実施態様において、前記繰り返し単位(I)としては、例えば、Aが下記化学式(D−1)〜(D−3)のいずれかで表されるものである前記化学式(1−1)の繰り返し単位が好ましく、Aが下記化学式(D−1)〜(D−2)のいずれかで表されるものである前記化学式(1−1)の繰り返し単位がより好ましい。なお、Aが下記化学式(D−1)または下記化学式(D−2)で表されるものである前記化学式(1−1)の繰り返し単位を与えるジアミン成分は4,4’−ジアミノベンズアニリドであり、Aが下記化学式(D−3)で表されるものである前記化学式(1−1)の繰り返し単位を与えるジアミン成分はビス(4−アミノフェニル)テレフタレートであり、これらのジアミンは、単独で使用してもよく、また複数種を組み合わせて使用することもできる。 In this embodiment, as the repeating unit (I), for example, the repeating unit represented by the chemical formula (1-1) in which A is represented by any one of the following chemical formulas (D-1) to (D-3) The unit is preferable, and the repeating unit of the chemical formula (1-1), in which A is represented by any one of the following chemical formulas (D-1) to (D-2), is more preferable. In addition, the diamine component which gives the repeating unit of the said Chemical formula (1-1) whose A is represented by the following chemical formula (D-1) or the following chemical formula (D-2) is 4,4'- diaminobenzanilide. Yes, the diamine component that gives the repeating unit of the chemical formula (1-1) in which A is represented by the following chemical formula (D-3) is bis (4-aminophenyl) terephthalate, and these diamines are used alone. It can also be used in combination, or multiple types can be used in combination.
この実施態様において、前記繰り返し単位(II)としては、例えば、Aが下記化学式(D−4)〜(D−6)のいずれかで表されるものである前記化学式(1−1)の繰り返し単位が好ましく、Aが下記化学式(D−4)〜(D−5)のいずれかで表されるものである前記化学式(1−1)の繰り返し単位がより好ましい。なお、Aが下記化学式(D−4)で表されるものである前記化学式(1−1)の繰り返し単位を与えるジアミン成分はp−フェニレンジアミンであり、Aが下記化学式(D−5)で表されるものである前記化学式(1−1)の繰り返し単位を与えるジアミン成分は2,2’−ビス(トリフルオロメチル)ベンジジンであり、Aが下記化学式(D−6)で表されるものである前記化学式(1−1)の繰り返し単位を与えるジアミン成分はm−トリジンであり、これらのジアミンは、単独で使用してもよく、また複数種を組み合わせて使用することもできる。 In this embodiment, as the repeating unit (II), for example, the repeating unit represented by the chemical formula (1-1) in which A is represented by any one of the following chemical formulas (D-4) to (D-6) The unit is preferable, and the repeating unit of the chemical formula (1-1), in which A is represented by any one of the following chemical formulas (D-4) to (D-5), is more preferable. In addition, the diamine component which gives the repeating unit of the said Chemical formula (1-1) whose A is what is represented by following Chemical formula (D-4) is p-phenylenediamine, A is following Chemical formula (D-5). The diamine component that gives the repeating unit of the chemical formula (1-1) is 2,2′-bis (trifluoromethyl) benzidine, and A is represented by the following chemical formula (D-6) The diamine component that gives the repeating unit of the chemical formula (1-1) is m-tolidine, and these diamines may be used alone or in combination of two or more.
この実施態様のポリイミド前駆体において、前記繰り返し単位(I)1種以上の割合が、合計で、前記化学式(1−1)で表される全繰り返し単位中、30モル%以上70モル%以下であり、前記繰り返し単位(II)1種以上の割合が、合計で、前記化学式(1−1)で表される全繰り返し単位中、30モル%以上70モル%以下であることが好ましく、前記繰り返し単位(I)1種以上の割合が、合計で、前記化学式(1−1)で表される全繰り返し単位中、40モル%以上60モル%以下であり、前記繰り返し単位(II)1種以上の割合が、合計で、前記化学式(1−1)で表される全繰り返し単位中、40モル%以上60モル%以下であることが特に好ましい。ある実施態様においては、前記繰り返し単位(I)の割合が、合計で、前記化学式(1−1)で表される全繰り返し単位中、60モル%未満であることがより好ましく、50モル%以下であることがより好ましく、40モル%以下であることが特に好ましい。また、ある実施態様においては、前記繰り返し単位(I)及び前記繰り返し単位(II)以外の、他の前記化学式(1−1)で表される繰り返し単位(例えば、Aが複数の芳香環を有し、芳香環同士がエーテル結合(−O−)で連結されているもの)を、前記化学式(1−1)で表される全繰り返し単位中、好ましくは20モル%未満、より好ましくは10モル%以下、特に好ましくは10モル%未満で含むことが好ましいことがある。さらに、ある実施態様においては、前記繰り返し単位(I)1種以上の割合が、合計で、前記化学式(1−1)で表される全繰り返し単位中、20モル%以上80モル%以下であり、前記繰り返し単位(II)1種以上の割合が、合計で、前記化学式(1−1)で表される全繰り返し単位中、20モル%以上80モル%以下であることが好ましいこともある。 In the polyimide precursor of this embodiment, the ratio of one or more of the repeating units (I) is 30 mol% or more and 70 mol% or less in total in all repeating units represented by the chemical formula (1-1). And the ratio of one or more repeating units (II) is preferably 30 mol% or more and 70 mol% or less in the total repeating units represented by the chemical formula (1-1). The ratio of one or more units (I) is 40 mol% or more and 60 mol% or less in the total repeating units represented by the chemical formula (1-1), and one or more repeating units (II). Is preferably 40 mol% or more and 60 mol% or less in all repeating units represented by the chemical formula (1-1). In a certain embodiment, it is more preferable that the ratio of the said repeating unit (I) is less than 60 mol% in all the repeating units represented by the said Chemical formula (1-1), and is 50 mol% or less in total. It is more preferable that it is 40 mol% or less. In one embodiment, other than the repeating unit (I) and the repeating unit (II), other repeating units represented by the chemical formula (1-1) (for example, A has a plurality of aromatic rings). And those in which aromatic rings are connected by an ether bond (—O—)) in all repeating units represented by the chemical formula (1-1), preferably less than 20 mol%, more preferably 10 mol. %, Particularly preferably less than 10 mol% may be preferred. Furthermore, in a certain embodiment, the ratio of 1 or more types of said repeating unit (I) is 20 mol% or more and 80 mol% or less in all the repeating units represented by the said Chemical formula (1-1) in total. The ratio of one or more of the repeating units (II) may be preferably 20 mol% or more and 80 mol% or less in total in all repeating units represented by the chemical formula (1-1).
ある実施態様においては、本発明の前記化学式(1−1)、または前記化学式(1−2)および/または前記化学式(1−3)の繰り返し単位を含むポリイミド前駆体は、前記化学式(1−1)、または前記化学式(1−2)及び前記化学式(1−3)中のAを与えるジアミン成分(前記化学式(1−1)の繰り返し単位、または前記化学式(1−2)及び前記化学式(1−3)の繰り返し単位を与えるジアミン成分)が前記化学式(1−A)の構造を与えるジアミン成分の少なくとも2種類を含み、そのうちの1種が4,4’−ジアミノベンズアニリドであることが好ましい。前記化学式(1−1)、または前記化学式(1−2)及び前記化学式(1−3)中のAを与えるジアミン成分が前記化学式(1−A)の構造を与えるジアミン成分の少なくとも2種類を含み、そのうちの1種が4,4’−ジアミノベンズアニリドであることで、高透明性と低線熱膨張性に加え、高い耐熱性も兼ね備えたポリイミドが得られる。 In one embodiment, the polyimide precursor containing the chemical formula (1-1) of the present invention, or the repeating unit of the chemical formula (1-2) and / or the chemical formula (1-3) is represented by the chemical formula (1- 1), or a diamine component that gives A in the chemical formula (1-2) and the chemical formula (1-3) (repeating unit of the chemical formula (1-1), or the chemical formula (1-2) and the chemical formula ( The diamine component that gives the repeating unit of 1-3) includes at least two kinds of diamine components that give the structure of the chemical formula (1-A), and one of them is 4,4′-diaminobenzanilide. preferable. In the chemical formula (1-1), or in the chemical formula (1-2) and the chemical formula (1-3), the diamine component that gives A includes at least two kinds of diamine components that give the structure of the chemical formula (1-A). In addition, when one of them is 4,4′-diaminobenzanilide, a polyimide having high heat resistance in addition to high transparency and low linear thermal expansion can be obtained.
ある実施態様においては、本発明の前記化学式(1−1)、または前記化学式(1−2)および/または前記化学式(1−3)の繰り返し単位を含むポリイミド前駆体は、前記化学式(1−1)、または前記化学式(1−2)及び前記化学式(1−3)中のAを与えるジアミン成分(前記化学式(1−1)の繰り返し単位、または前記化学式(1−2)及び前記化学式(1−3)の繰り返し単位を与えるジアミン成分)が2,2’−ビス(トリフルオロメチル)ベンジジン及びp−フェニレンジアミンから選択される少なくとも1種類と、4,4’−ジアミノベンズアニリドを含むことが特に好ましい。これらのジアミン成分を組み合わせることで、高い透明性と低線熱膨張性、耐熱性を兼ね備えたポリイミドが得られる。 In one embodiment, the polyimide precursor containing the chemical formula (1-1) of the present invention, or the repeating unit of the chemical formula (1-2) and / or the chemical formula (1-3) is represented by the chemical formula (1- 1), or a diamine component that gives A in the chemical formula (1-2) and the chemical formula (1-3) (repeating unit of the chemical formula (1-1), or the chemical formula (1-2) and the chemical formula ( 1-3) the diamine component giving the repeating unit) contains at least one selected from 2,2′-bis (trifluoromethyl) benzidine and p-phenylenediamine and 4,4′-diaminobenzanilide. Is particularly preferred. By combining these diamine components, a polyimide having both high transparency, low linear thermal expansion and heat resistance can be obtained.
この実施態様においては、前記化学式(1−1)、または前記化学式(1−2)及び前記化学式(1−3)中のAを与えるジアミン成分(前記化学式(1−1)の繰り返し単位、または前記化学式(1−2)及び前記化学式(1−3)の繰り返し単位を与えるジアミン成分)としては、好ましくは4,4’−ジアミノベンズアニリドを20モル%以上、80モル%以下で含み、且つ、p−フェニレンジアミンと2,2’−ビス(トリフルオロメチル)ベンジジンのどちらか一方、又は両方で20モル%以上、80モル%以下で含むことが好ましく、より好ましくは4,4’−ジアミノベンズアニリドを30モル%以上、70モル%以下で含み、且つ、p−フェニレンジアミンと2,2’−ビス(トリフルオロメチル)ベンジジンのどちらか一方、又は両方で30モル%以上、70モル%以下で含むことが好ましく、特に好ましくは4,4’−ジアミノベンズアニリドを40モル%以上、60モル%以下で含み、且つ、p−フェニレンジアミンと2,2’−ビス(トリフルオロメチル)ベンジジンのどちらか一方、又は両方で40モル%以上、60モル%以下で含むことがより好ましい。前記化学式(1−1)、または前記化学式(1−2)及び前記化学式(1−3)中のAを与えるジアミン成分として、4,4’−ジアミノベンズアニリドを30モル%以上、70モル%以下で含み、且つ、p−フェニレンジアミンと2,2’−ビス(トリフルオロメチル)ベンジジンのどちらか一方、又は両方で30モル%以上、70モル%以下で含むことにより、高い透明性と低線熱膨張性、耐熱性を兼ね備えたポリイミドが得られる。ある実施態様においては、前記化学式(1−1)、または前記化学式(1−2)及び前記化学式(1−3)中のAを与えるジアミン成分(前記化学式(1−1)の繰り返し単位、または前記化学式(1−2)及び前記化学式(1−3)の繰り返し単位を与えるジアミン成分)としては、4,4’−ジアミノベンズアニリドを60モル%未満で含むことがより好ましく、50モル%以下で含むことがより好ましく、40モル%以下で含むことが特に好ましい。 In this embodiment, the chemical formula (1-1), or a diamine component that gives A in the chemical formula (1-2) and the chemical formula (1-3) (the repeating unit of the chemical formula (1-1), or The diamine component that gives the repeating unit of the chemical formula (1-2) and the chemical formula (1-3) preferably contains 4,4′-diaminobenzanilide in an amount of 20 mol% or more and 80 mol% or less, and , P-phenylenediamine and 2,2′-bis (trifluoromethyl) benzidine or both are preferably contained in an amount of 20 mol% to 80 mol%, more preferably 4,4′-diamino. Benzanilide is contained in an amount of 30 mol% or more and 70 mol% or less, and either p-phenylenediamine or 2,2′-bis (trifluoromethyl) benzidine. Or both, and preferably 30 mol% or more and 70 mol% or less, particularly preferably 4,4′-diaminobenzanilide is contained 40 mol% or more and 60 mol% or less, and p-phenylenediamine More preferably, it is contained in 40 mol% or more and 60 mol% or less of either or both of 2,2′-bis (trifluoromethyl) benzidine. As the diamine component that gives A in the chemical formula (1-1) or the chemical formula (1-2) and the chemical formula (1-3), 4,4′-diaminobenzanilide is 30 mol% or more and 70 mol%. High transparency and low by including in 30 mol% or more and 70 mol% or less in one or both of p-phenylenediamine and 2,2′-bis (trifluoromethyl) benzidine. A polyimide having both linear thermal expansion and heat resistance is obtained. In one embodiment, the chemical formula (1-1), or a diamine component that gives A in the chemical formula (1-2) and the chemical formula (1-3) (the repeating unit of the chemical formula (1-1), or As the diamine component that gives the repeating unit of the chemical formula (1-2) and the chemical formula (1-3), it is more preferable to contain 4,4′-diaminobenzanilide in an amount of less than 60 mol%, and 50 mol% or less. It is more preferable that it is contained at 40 mol% or less.
本発明のポリイミド前駆体は、前記化学式(1−1)、または前記化学式(1−2)及び前記化学式(1−3)で表される繰り返し単位以外の、他の繰り返し単位を含むことができる。 The polyimide precursor of this invention can contain other repeating units other than the repeating unit represented by the said Chemical formula (1-1) or the said Chemical formula (1-2) and the said Chemical formula (1-3). .
他の繰り返し単位を与えるテトラカルボン酸成分としては、他の芳香族または脂肪族テトラカルボン酸類を使用することができる。例えば、2,2−ビス(3,4−ジカルボキシフェニル)ヘキサフルオロプロパン、4−(2,5−ジオキソテトラヒドロフラン−3−イル)−1,2,3,4−テトラヒドロナフタレン−1,2−ジカルボン酸、ピロメリット酸、3,3’,4,4’−ベンゾフェノンテトラカルボン酸、3,3’,4,4’−ビフェニルテトラカルボン酸、2,3,3’,4’−ビフェニルテトラカルボン酸、4,4’−オキシジフタル酸、ビス(3,4−ジカルボキシフェニル)スルホン二無水物、m−ターフェニル−3,4,3’,4’−テトラカルボン酸二無水物、p−ターフェニル−3,4,3’,4’−テトラカルボン酸二無水物、ビスカルボキシフェニルジメチルシラン、ビスジカルボキシフェノキシジフェニルスルフィド、スルホニルジフタル酸、1,2,3,4−シクロブタンテトラカルボン酸、イソプロピリデンジフェノキシビスフタル酸、シクロヘキサン−1,2,4,5−テトラカルボン酸、[1,1’−ビ(シクロヘキサン)]−3,3’,4,4’−テトラカルボン酸、[1,1’−ビ(シクロヘキサン)]−2,3,3’,4’−テトラカルボン酸、[1,1’−ビ(シクロヘキサン)]−2,2’,3,3’−テトラカルボン酸、4,4’−メチレンビス(シクロヘキサン−1,2−ジカルボン酸)、4,4’−(プロパン−2,2−ジイル)ビス(シクロヘキサン−1,2−ジカルボン酸)、4,4’−オキシビス(シクロヘキサン−1,2−ジカルボン酸)、4,4’−チオビス(シクロヘキサン−1,2−ジカルボン酸)、4,4’−スルホニルビス(シクロヘキサン−1,2−ジカルボン酸)、4,4’−(ジメチルシランジイル)ビス(シクロヘキサン−1,2−ジカルボン酸)、4,4’−(テトラフルオロプロパン−2,2−ジイル)ビス(シクロヘキサン−1,2−ジカルボン酸)、オクタヒドロペンタレン−1,3,4,6−テトラカルボン酸、ビシクロ[2.2.1]ヘプタン−2,3,5,6−テトラカルボン酸、6−(カルボキシメチル)ビシクロ[2.2.1]ヘプタン−2,3,5−トリカルボン酸、ビシクロ[2.2.2]オクタン−2,3,5,6−テトラカルボン酸、ビシクロ[2.2.2]オクタ−5−エン−2,3,7,8−テトラカルボン酸、トリシクロ[4.2.2.02,5]デカン−3,4,7,8−テトラカルボン酸、トリシクロ[4.2.2.02,5]デカ−7−エン−3,4,9,10−テトラカルボン酸、9−オキサトリシクロ[4.2.1.02,5]ノナン−3,4,7,8−テトラカルボン酸、(4arH,8acH)−デカヒドロ−1t,4t:5c,8c−ジメタノナフタレン−2c,3c,6c,7c−テトラカルボン酸、(4arH,8acH)−デカヒドロ−1t,4t:5c,8c−ジメタノナフタレン−2t,3t,6c,7c−テトラカルボン酸等の誘導体や、これらの酸二無水物が挙げられ、単独で使用してもよく、また複数種を組み合わせて使用することもできる。これらのうちでは、ビシクロ[2.2.1]ヘプタン−2,3,5,6−テトラカルボン酸、ビシクロ[2.2.2]オクタン−2,3,5,6−テトラカルボン酸、(4arH,8acH)−デカヒドロ−1t,4t:5c,8c−ジメタノナフタレン−2c,3c,6c,7c−テトラカルボン酸、(4arH,8acH)−デカヒドロ−1t,4t:5c,8c−ジメタノナフタレン−2t,3t,6c,7c−テトラカルボン酸等の誘導体や、これらの酸二無水物が、ポリイミドの製造が容易であり、得られるポリイミドの耐熱性に優れることからより好ましい。これらの酸二無水物は、単独で使用してもよく、また複数種を組み合わせて使用することもできる。 Other aromatic or aliphatic tetracarboxylic acids can be used as the tetracarboxylic acid component that provides other repeating units. For example, 2,2-bis (3,4-dicarboxyphenyl) hexafluoropropane, 4- (2,5-dioxotetrahydrofuran-3-yl) -1,2,3,4-tetrahydronaphthalene-1,2 -Dicarboxylic acid, pyromellitic acid, 3,3 ', 4,4'-benzophenone tetracarboxylic acid, 3,3', 4,4'-biphenyltetracarboxylic acid, 2,3,3 ', 4'-biphenyltetra Carboxylic acid, 4,4'-oxydiphthalic acid, bis (3,4-dicarboxyphenyl) sulfone dianhydride, m-terphenyl-3,4,3 ', 4'-tetracarboxylic dianhydride, p- Terphenyl-3,4,3 ′, 4′-tetracarboxylic dianhydride, biscarboxyphenyldimethylsilane, bisdicarboxyphenoxydiphenyl sulfide, sulfonyldiph Formic acid, 1,2,3,4-cyclobutanetetracarboxylic acid, isopropylidenediphenoxybisphthalic acid, cyclohexane-1,2,4,5-tetracarboxylic acid, [1,1′-bi (cyclohexane)]- 3,3 ′, 4,4′-tetracarboxylic acid, [1,1′-bi (cyclohexane)]-2,3,3 ′, 4′-tetracarboxylic acid, [1,1′-bi (cyclohexane) ] -2,2 ′, 3,3′-tetracarboxylic acid, 4,4′-methylenebis (cyclohexane-1,2-dicarboxylic acid), 4,4 ′-(propane-2,2-diyl) bis (cyclohexane) -1,2-dicarboxylic acid), 4,4′-oxybis (cyclohexane-1,2-dicarboxylic acid), 4,4′-thiobis (cyclohexane-1,2-dicarboxylic acid), 4,4′-sulfonylbis (Sh (Rohexane-1,2-dicarboxylic acid), 4,4 ′-(dimethylsilanediyl) bis (cyclohexane-1,2-dicarboxylic acid), 4,4 ′-(tetrafluoropropane-2,2-diyl) bis ( Cyclohexane-1,2-dicarboxylic acid), octahydropentalene-1,3,4,6-tetracarboxylic acid, bicyclo [2.2.1] heptane-2,3,5,6-tetracarboxylic acid, 6 -(Carboxymethyl) bicyclo [2.2.1] heptane-2,3,5-tricarboxylic acid, bicyclo [2.2.2] octane-2,3,5,6-tetracarboxylic acid, bicyclo [2. 2.2] oct-5-ene-2,3,7,8-tetracarboxylic acid, tricyclo [4.2.2.02,5] decane-3,4,7,8-tetracarboxylic acid, tricyclo [ 4.2.2.02 , 5] dec-7-ene-3,4,9,10-tetracarboxylic acid, 9-oxatricyclo [4.2.1.02,5] nonane-3,4,7,8-tetracarboxylic acid (4arH, 8acH) -decahydro-1t, 4t: 5c, 8c-dimethananaphthalene-2c, 3c, 6c, 7c-tetracarboxylic acid, (4arH, 8acH) -decahydro-1t, 4t: 5c, 8c-di Derivatives such as methanonaphthalene-2t, 3t, 6c, 7c-tetracarboxylic acid, and acid dianhydrides thereof may be used, and may be used alone or in combination of two or more. Among these, bicyclo [2.2.1] heptane-2,3,5,6-tetracarboxylic acid, bicyclo [2.2.2] octane-2,3,5,6-tetracarboxylic acid, ( 4arH, 8acH) -decahydro-1t, 4t: 5c, 8c-dimethanonaphthalene-2c, 3c, 6c, 7c-tetracarboxylic acid, (4arH, 8acH) -decahydro-1t, 4t: 5c, 8c-dimethanonaphthalene Derivatives such as -2t, 3t, 6c, 7c-tetracarboxylic acid, and these acid dianhydrides are more preferable because polyimide is easy to produce and the resulting polyimide has excellent heat resistance. These acid dianhydrides may be used alone or in combination of two or more.
また、前記化学式(1−2)および/または前記化学式(1−3)の繰り返し単位を含むポリイミド前駆体の場合、他の繰り返し単位を与えるテトラカルボン酸成分として、cis−endo−endo−ノルボルナン−2−スピロ−α−シクロペンタノン−α’−スピロ−2’’−ノルボルナン−5,5’’,6,6’’−テトラカルボン酸類等、及びtrans−endo−endo−ノルボルナン−2−スピロ−α−シクロペンタノン−α’−スピロ−2’’−ノルボルナン−5,5’’,6,6’’−テトラカルボン酸類等以外の、他のノルボルナン−2−スピロ−α−シクロペンタノン−α’−スピロ−2’’−ノルボルナン−5,5’’,6,6’’−テトラカルボン酸類等(例えば、ノルボルナン−2−スピロ−α−シクロペンタノン−α’−スピロ−2’’−ノルボルナン−5,5’’,6,6’’−テトラカルボン酸二無水物)の4種類の立体異性体を使用することもできる。 Moreover, in the case of the polyimide precursor containing the repeating unit of the chemical formula (1-2) and / or the chemical formula (1-3), cis-endo-endo-norbornane- is used as a tetracarboxylic acid component that gives other repeating units. 2-spiro-α-cyclopentanone-α′-spiro-2 ″ -norbornane-5,5 ″, 6,6 ″ -tetracarboxylic acids and the like, and trans-endo-endo-norbornane-2-spiro Other α-cyclopentanone-α′-spiro-2 ″ -norbornane-5,5 ″, 6,6 ″ -tetracarboxylic acids and the like other norbornane-2-spiro-α-cyclopentanone -Α'-spiro-2 "-norbornane-5,5", 6,6 "-tetracarboxylic acids and the like (for example, norbornane-2-spiro-α-cyclopenta Emissions -α'- spiro-2 '' - norbornane-5,5 ', 6,6' '- it is also possible to use four kinds of stereoisomers of tetracarboxylic dianhydride).
他の繰り返し単位を与えるジアミン成分は、前記化学式(1−A)の構造を与えるジアミン成分であってもよい。換言すれば、他の繰り返し単位を与えるジアミン成分として、Aが前記化学式(1−A)の構造である前記化学式(1−1)の繰り返し単位、またはAが前記化学式(1−A)の構造である前記化学式(1−2)及び前記化学式(1−3)の繰り返し単位を与えるジアミン成分として例示したジアミンを使用することができる。これらのジアミンは、単独で使用してもよく、また複数種を組み合わせて使用することもできる。 The diamine component that gives other repeating units may be a diamine component that gives the structure of the chemical formula (1-A). In other words, as a diamine component that gives another repeating unit, A is a repeating unit of the chemical formula (1-1) having the structure of the chemical formula (1-A), or A is a structure of the chemical formula (1-A). The diamine illustrated as a diamine component which gives the repeating unit of the said Chemical formula (1-2) and the said Chemical formula (1-3) which is can be used. These diamines may be used alone or in combination of two or more.
他の繰り返し単位を与えるジアミン成分としては、他の芳香族または脂肪族ジアミン類を使用することができる。例えば、4,4’−オキシジアニリン、3,4’−オキシジアニリン、3,3’−オキシジアニリン、ビス(4-アミノフェニル)スルフィド、p−メチレンビス(フェニレンジアミン)、1,3−ビス(4−アミノフェノキシ)ベンゼン、1,3−ビス(3−アミノフェノキシ)ベンゼン、1,4−ビス(4−アミノフェノキシ)ベンゼン、2,2−ビス[4−(4−アミノフェノキシ)フェニル]ヘキサフルオロプロパン、2,2−ビス(4−アミノフェニル)ヘキサフルオロプロパン、ビス(4−アミノフェニル)スルホン、3,3−ビス((アミノフェノキシ)フェニル)プロパン、2,2−ビス(3−アミノ−4−ヒドロキシフェニル)ヘキサフルオロプロパン、ビス(4−(4−アミノフェノキシ)ジフェニル)スルホン、ビス(4−(3−アミノフェノキシ)ジフェニル)スルホン、オクタフルオロベンジジン、3,3’−ジメトキシ−4,4’−ジアミノビフェニル、3,3’−ジクロロ−4,4’−ジアミノビフェニル、3,3’−ジフルオロ−4,4’−ジアミノビフェニル、9,9−ビス(4−アミノフェニル)フルオレン、4,4’−ビス(4−アミノフェノキシ)ビフェニル、4,4’−ビス(3−アミノフェノキシ)ビフェニル、1,4−ジアミノシクロへキサン、1,4−ジアミノ−2−メチルシクロヘキサン、1,4−ジアミノ−2−エチルシクロヘキサン、1,4−ジアミノ−2−n−プロピルシクロヘキサン、1,4−ジアミノ−2−イソプロピルシクロヘキサン、1,4−ジアミノ−2−n−ブチルシクロヘキサン、1,4−ジアミノ−2−イソブチルシクロヘキサン、1,4−ジアミノ−2−sec−ブチルシクロヘキサン、1,4−ジアミノ−2−tert−ブチルシクロヘキサン、1,2−ジアミノシクロへキサン、1,4−ジアミノシクロへキサン、1,3−ジアミノシクロブタン、1,4−ビス(アミノメチル)シクロヘキサン、1,3−ビス(アミノメチル)シクロヘキサン、ジアミノビシクロヘプタン、ジアミノメチルビシクロヘプタン、ジアミノオキシビシクロヘプタン、ジアミノメチルオキシビシクロヘプタン、イソホロンジアミン、ジアミノトリシクロデカン、ジアミノメチルトリシクロデカン、ビス(アミノシクロへキシル)メタン、ビス(アミノシクロヘキシル)イソプロピリデン6,6'-ビス(3-アミノフェノキシ)-3,3,3',3'-テトラメチル-1,1'-スピロビインダン、6,6'-ビス(4-アミノフェノキシ)-3,3,3',3'-テトラメチル-1,1'-スピロビインダン等やこれらの誘導体が挙げられ、単独で使用してもよく、また複数種を組み合わせて使用することもできる。 Other aromatic or aliphatic diamines can be used as the diamine component giving other repeating units. For example, 4,4′-oxydianiline, 3,4′-oxydianiline, 3,3′-oxydianiline, bis (4-aminophenyl) sulfide, p-methylenebis (phenylenediamine), 1,3- Bis (4-aminophenoxy) benzene, 1,3-bis (3-aminophenoxy) benzene, 1,4-bis (4-aminophenoxy) benzene, 2,2-bis [4- (4-aminophenoxy) phenyl ] Hexafluoropropane, 2,2-bis (4-aminophenyl) hexafluoropropane, bis (4-aminophenyl) sulfone, 3,3-bis ((aminophenoxy) phenyl) propane, 2,2-bis (3 -Amino-4-hydroxyphenyl) hexafluoropropane, bis (4- (4-aminophenoxy) diphenyl) sulfone, bis ( 4- (3-aminophenoxy) diphenyl) sulfone, octafluorobenzidine, 3,3′-dimethoxy-4,4′-diaminobiphenyl, 3,3′-dichloro-4,4′-diaminobiphenyl, 3,3 ′ -Difluoro-4,4'-diaminobiphenyl, 9,9-bis (4-aminophenyl) fluorene, 4,4'-bis (4-aminophenoxy) biphenyl, 4,4'-bis (3-aminophenoxy) Biphenyl, 1,4-diaminocyclohexane, 1,4-diamino-2-methylcyclohexane, 1,4-diamino-2-ethylcyclohexane, 1,4-diamino-2-n-propylcyclohexane, 1,4- Diamino-2-isopropylcyclohexane, 1,4-diamino-2-n-butylcyclohexane, 1,4-diamino-2- Sobutylcyclohexane, 1,4-diamino-2-sec-butylcyclohexane, 1,4-diamino-2-tert-butylcyclohexane, 1,2-diaminocyclohexane, 1,4-diaminocyclohexane, 1, 3-diaminocyclobutane, 1,4-bis (aminomethyl) cyclohexane, 1,3-bis (aminomethyl) cyclohexane, diaminobicycloheptane, diaminomethylbicycloheptane, diaminooxybicycloheptane, diaminomethyloxybicycloheptane, isophoronediamine, Diaminotricyclodecane, diaminomethyltricyclodecane, bis (aminocyclohexyl) methane, bis (aminocyclohexyl) isopropylidene 6,6′-bis (3-aminophenoxy) -3,3,3 ′, 3′- Tetramethyl-1,1'-spirobi And nandane, 6,6′-bis (4-aminophenoxy) -3,3,3 ′, 3′-tetramethyl-1,1′-spirobiindane, etc. and their derivatives may be used alone. Moreover, it can also be used in combination of multiple types.
なお、ノルボルナン−2−スピロ−α−シクロペンタノン−α’−スピロ−2’’−ノルボルナン−5,5’’,6,6’’−テトラカルボン酸類等の合成方法は、特に限定されないが、特許文献8に記載の方法等で合成できる。非特許文献1に記載されているように、合成方法によっては立体異性体を数種類含むこともある。ノルボルナン−2−スピロ−α−シクロペンタノン−α’−スピロ−2’’−ノルボルナン−5,5’’,6,6’’−テトラカルボン酸類等、もしくは、その中間体をカラム等で精製することで、立体異性体をそれぞれ単独で、もしくは、数種の混合物を分取することが出来る。 The method for synthesizing norbornane-2-spiro-α-cyclopentanone-α′-spiro-2 ″ -norbornane-5,5 ″, 6,6 ″ -tetracarboxylic acids and the like is not particularly limited. Can be synthesized by the method described in Patent Document 8. As described in Non-Patent Document 1, some stereoisomers may be included depending on the synthesis method. Norbornane-2-spiro-α-cyclopentanone-α′-spiro-2 ″ -norbornane-5,5 ″, 6,6 ″ -tetracarboxylic acid or the like, or its intermediate is purified with a column etc. By doing so, the stereoisomers can be separated individually or several mixtures can be fractionated.
trans−endo−endo−ノルボルナン−2−スピロ−α−シクロペンタノン−α’−スピロ−2’’−ノルボルナン−5,5’’,6,6’’−テトラカルボン酸類等、及びcis−endo−endo−ノルボルナン−2−スピロ−α−シクロペンタノン−α’−スピロ−2’’−ノルボルナン−5,5’’,6,6’’−テトラカルボン酸類等の単独物、もしくはそれらの混合物についても、ノルボルナン−2−スピロ−α−シクロペンタノン−α’−スピロ−2’’−ノルボルナン−5,5’’,6,6’’−テトラカルボン酸類等、もしくは、その中間体をカラム等で精製することで得られる。 trans-endo-endo-norbornane-2-spiro-α-cyclopentanone-α′-spiro-2 ″ -norbornane-5,5 ″, 6,6 ″ -tetracarboxylic acids and the like, and cis-endo -Endo-norbornane-2-spiro- [alpha] -cyclopentanone- [alpha] '-spiro-2 "-norbornane-5,5", 6,6 "-tetracarboxylic acids or the like alone or a mixture thereof As for norbornane-2-spiro-α-cyclopentanone-α′-spiro-2 ″ -norbornane-5,5 ″, 6,6 ″ -tetracarboxylic acid or the like, or an intermediate thereof as a column It can be obtained by purifying with the above.
テトラカルボン酸成分及びジアミン成分が異性体を含む場合、その異性体を単離して重合等に使用してもよく、また、異性体を混合物のまま重合等に使用してもよい。 When the tetracarboxylic acid component and the diamine component contain isomers, the isomers may be isolated and used for polymerization or the like, or the isomers may be used in polymerization or the like as a mixture.
本発明のポリイミド前駆体において、前記化学式(1)のR1、R2、前記化学式(2)のR3、R4はそれぞれ独立に水素、炭素数1〜6、好ましくは炭素数1〜3のアルキル基、または炭素数3〜9のアルキルシリル基のいずれかである。R1及びR2、R3及びR4は、後述する製造方法によって、その官能基の種類、及び、官能基の導入率を変化させることができる。In the polyimide precursor of the present invention, R 1 and R 2 in the chemical formula (1) and R 3 and R 4 in the chemical formula (2) are each independently hydrogen, 1 to 6 carbon atoms, preferably 1 to 3 carbon atoms. Or an alkylsilyl group having 3 to 9 carbon atoms. R 1 and R 2 , R 3 and R 4 can change the type of functional group and the introduction rate of the functional group by the production method described later.
R1及びR2、R3及びR4が水素である場合、ポリイミドの製造が容易である傾向がある。When R 1 and R 2 , R 3 and R 4 are hydrogen, polyimide tends to be easily produced.
また、R1及びR2、R3及びR4が炭素数1〜6、好ましくは炭素数1〜3のアルキル基である場合、ポリイミド前駆体の保存安定性に優れる傾向がある。この場合、R1及びR2、R3及びR4はメチル基もしくはエチル基であることがより好ましい。Further, R 1 and R 2, R 3 and R 4 having 1 to 6 carbon atoms, preferably when an alkyl group having 1 to 3 carbon atoms, tend to excellent storage stability of the polyimide precursor. In this case, R 1 and R 2 , R 3 and R 4 are more preferably a methyl group or an ethyl group.
更に、R1及びR2、R3及びR4が炭素数3〜9のアルキルシリル基である場合、ポリイミド前駆体の溶解性が優れる傾向がある。この場合、R1及びR2、R3及びR4はトリメチルシリル基もしくはt−ブチルジメチルシリル基であることがより好ましい。Furthermore, when R 1 and R 2 , R 3 and R 4 are an alkylsilyl group having 3 to 9 carbon atoms, the solubility of the polyimide precursor tends to be excellent. In this case, R 1 and R 2 , R 3 and R 4 are more preferably a trimethylsilyl group or a t-butyldimethylsilyl group.
官能基の導入率は、特に限定されないが、アルキル基もしくはアルキルシリル基を導入する場合、R1及びR2、R3及びR4はそれぞれ、25%以上、好ましくは50%以上、より好ましくは75%以上をアルキル基もしくはアルキルシリル基にすることができる。The introduction rate of the functional group is not particularly limited, but when introducing an alkyl group or an alkylsilyl group, R 1 and R 2 , R 3 and R 4 are each 25% or more, preferably 50% or more, more preferably More than 75% can be an alkyl group or an alkylsilyl group.
本発明のポリイミド前駆体は、R1及びR2、R3及びR4が取る化学構造によって、1)ポリアミド酸(R1及びR2、R3及びR4が水素)、2)ポリアミド酸エステル(R1及びR2、R3及びR4の少なくとも一部がアルキル基)、3)4)ポリアミド酸シリルエステル(R1及びR2、R3及びR4の少なくとも一部がアルキルシリル基)に分類することができる。そして、本発明のポリイミド前駆体は、この分類ごとに、以下の製造方法により容易に製造することができる。ただし、本発明のポリイミド前駆体の製造方法は、以下の製造方法に限定されるものではない。Polyimide precursors of the present invention, the chemical structure R 1 and R 2, R 3 and R 4 take, 1) a polyamic acid (R 1 and R 2, R 3 and R 4 is hydrogen), 2) a polyamic acid ester (At least part of R 1 and R 2 , R 3 and R 4 is an alkyl group), 3) 4) Polyamic acid silyl ester (R 1 and R 2 , R 3 and R 4 are at least part of an alkylsilyl group) Can be classified. And the polyimide precursor of this invention can be easily manufactured with the following manufacturing methods for every classification. However, the manufacturing method of the polyimide precursor of this invention is not limited to the following manufacturing methods.
1)ポリアミド酸
本発明のポリイミド前駆体は、溶媒中でテトラカルボン酸成分としてのテトラカルボン酸二無水物とジアミン成分とを略等モル、好ましくはテトラカルボン酸成分に対するジアミン成分のモル比[ジアミン成分のモル数/テトラカルボン酸成分のモル数]が好ましくは0.90〜1.10、より好ましくは0.95〜1.05の割合で、例えば120℃以下の比較的低温度でイミド化を抑制しながら反応することによって、ポリイミド前駆体溶液組成物として好適に得ることができる。1) Polyamic acid The polyimide precursor of the present invention comprises a tetracarboxylic dianhydride as a tetracarboxylic acid component and a diamine component in a solvent in an approximately equimolar amount, preferably a molar ratio of the diamine component to the tetracarboxylic acid component [diamine. The number of moles of component / number of moles of tetracarboxylic acid component] is preferably 0.90 to 1.10, more preferably 0.95 to 1.05, for example, imidization at a relatively low temperature of 120 ° C. or less. It can obtain suitably as a polyimide precursor solution composition by reacting, suppressing.
限定するものではないが、より具体的には、有機溶剤にジアミンを溶解し、この溶液に攪拌しながら、テトラカルボン酸二無水物を徐々に添加し、0〜120℃、好ましくは5〜80℃の範囲で1〜72時間攪拌することで、ポリイミド前駆体が得られる。80℃以上で反応させる場合、分子量が重合時の温度履歴に依存して変動し、また熱によりイミド化が進行することから、ポリイミド前駆体を安定して製造できなくなる可能性がある。上記製造方法でのジアミンとテトラカルボン酸二無水物の添加順序は、ポリイミド前駆体の分子量が上がりやすいため、好ましい。また、上記製造方法のジアミンとテトラカルボン酸二無水物の添加順序を逆にすることも可能であり、析出物が低減することから、好ましい。 Although it does not limit, more specifically, diamine is melt | dissolved in an organic solvent, Tetracarboxylic dianhydride is added gradually, stirring to this solution, 0-120 degreeC, Preferably it is 5-80. A polyimide precursor is obtained by stirring for 1 to 72 hours in the range of ° C. When the reaction is carried out at 80 ° C. or higher, the molecular weight varies depending on the temperature history at the time of polymerization, and imidization proceeds due to heat, so there is a possibility that the polyimide precursor cannot be produced stably. The order of addition of diamine and tetracarboxylic dianhydride in the above production method is preferable because the molecular weight of the polyimide precursor is likely to increase. Moreover, it is also possible to reverse the order of addition of the diamine and tetracarboxylic dianhydride in the above production method, and this is preferable because precipitates are reduced.
また、テトラカルボン酸成分とジアミン成分のモル比がジアミン成分過剰である場合、必要に応じて、ジアミン成分の過剰モル数に略相当する量のカルボン酸誘導体を添加し、テトラカルボン酸成分とジアミン成分のモル比を略当量に近づけることができる。ここでのカルボン酸誘導体としては、実質的にポリイミド前駆体溶液の粘度を増加させない、つまり実質的に分子鎖延長に関与しないテトラカルボン酸、もしくは末端停止剤として機能するトリカルボン酸とその無水物、ジカルボン酸とその無水物などが好適である。 Moreover, when the molar ratio of the tetracarboxylic acid component and the diamine component is an excess of the diamine component, if necessary, an amount of a carboxylic acid derivative substantially corresponding to the excess mole number of the diamine component is added, and the tetracarboxylic acid component and the diamine are added. The molar ratio of the components can be approximated to the equivalent. As the carboxylic acid derivative herein, a tetracarboxylic acid that does not substantially increase the viscosity of the polyimide precursor solution, that is, substantially does not participate in molecular chain extension, or a tricarboxylic acid that functions as a terminal terminator and its anhydride, Dicarboxylic acid and its anhydride are preferred.
2)ポリアミド酸エステル
テトラカルボン酸二無水物を任意のアルコールと反応させ、ジエステルジカルボン酸を得た後、塩素化試薬(チオニルクロライド、オキサリルクロライドなど)と反応させ、ジエステルジカルボン酸クロライドを得る。このジエステルジカルボン酸クロライドとジアミンを−20〜120℃、好ましくは−5〜80℃の範囲で1〜72時間攪拌することで、ポリイミド前駆体が得られる。80℃以上で反応させる場合、分子量が重合時の温度履歴に依存して変動し、また熱によりイミド化が進行することから、ポリイミド前駆体を安定して製造できなくなる可能性がある。また、ジエステルジカルボン酸とジアミンを、リン系縮合剤や、カルボジイミド縮合剤などを用いて脱水縮合することでも、簡便にポリイミド前駆体が得られる。2) Polyamic acid ester After reacting tetracarboxylic dianhydride with an arbitrary alcohol to obtain a diester dicarboxylic acid, it is reacted with a chlorinating reagent (thionyl chloride, oxalyl chloride, etc.) to obtain a diester dicarboxylic acid chloride. The polyimide precursor is obtained by stirring the diester dicarboxylic acid chloride and the diamine in the range of -20 to 120 ° C, preferably -5 to 80 ° C for 1 to 72 hours. When the reaction is carried out at 80 ° C. or higher, the molecular weight varies depending on the temperature history at the time of polymerization, and imidization proceeds due to heat, so there is a possibility that the polyimide precursor cannot be produced stably. Alternatively, a polyimide precursor can be easily obtained by dehydrating and condensing diester dicarboxylic acid and diamine using a phosphorus condensing agent or a carbodiimide condensing agent.
この方法で得られるポリイミド前駆体は、安定なため、水やアルコールなどの溶剤を加えて再沈殿などの精製を行うこともできる。 Since the polyimide precursor obtained by this method is stable, it can be purified by reprecipitation by adding a solvent such as water or alcohol.
3)ポリアミド酸シリルエステル(間接法)
あらかじめ、ジアミンとシリル化剤を反応させ、シリル化されたジアミンを得る。必要に応じて、蒸留等により、シリル化されたジアミンの精製を行う。そして、脱水された溶剤中にシリル化されたジアミンを溶解させておき、攪拌しながら、テトラカルボン酸二無水物を徐々に添加し、0〜120℃、好ましくは5〜80℃の範囲で1〜72時間攪拌することで、ポリイミド前駆体が得られる。80℃以上で反応させる場合、分子量が重合時の温度履歴に依存して変動し、また熱によりイミド化が進行することから、ポリイミド前駆体を安定して製造できなくなる可能性がある。3) Polyamide acid silyl ester (indirect method)
A diamine and a silylating agent are reacted in advance to obtain a silylated diamine. If necessary, the silylated diamine is purified by distillation or the like. Then, the silylated diamine is dissolved in the dehydrated solvent, and tetracarboxylic dianhydride is gradually added while stirring, and the temperature is 0 to 120 ° C., preferably 5 to 80 ° C. A polyimide precursor is obtained by stirring for 72 hours. When the reaction is carried out at 80 ° C. or higher, the molecular weight varies depending on the temperature history at the time of polymerization, and imidization proceeds due to heat, so there is a possibility that the polyimide precursor cannot be produced stably.
ここで用いるシリル化剤として、塩素を含有しないシリル化剤を用いることは、シリル化されたジアミンを精製する必要がないため、好適である。塩素原子を含まないシリル化剤としては、N,O−ビス(トリメチルシリル)トリフルオロアセトアミド、N,O−ビス(トリメチルシリル)アセトアミド、ヘキサメチルジシラザンが挙げられる。フッ素原子を含まず低コストであることから、N,O−ビス(トリメチルシリル)アセトアミド、ヘキサメチルジシラザンが特に好ましい。 As the silylating agent used here, it is preferable to use a silylating agent not containing chlorine because it is not necessary to purify the silylated diamine. Examples of the silylating agent not containing a chlorine atom include N, O-bis (trimethylsilyl) trifluoroacetamide, N, O-bis (trimethylsilyl) acetamide, and hexamethyldisilazane. N, O-bis (trimethylsilyl) acetamide and hexamethyldisilazane are particularly preferred because they do not contain fluorine atoms and are low in cost.
また、ジアミンのシリル化反応には、反応を促進するために、ピリジン、ピペリジン、トリエチルアミンなどのアミン系触媒を用いることができる。この触媒はポリイミド前駆体の重合触媒として、そのまま使用することができる。 In addition, amine-based catalysts such as pyridine, piperidine and triethylamine can be used in the silylation reaction of diamine in order to accelerate the reaction. This catalyst can be used as it is as a polymerization catalyst for the polyimide precursor.
4)ポリアミド酸シリルエステル(直接法)
1)の方法で得られたポリアミド酸溶液とシリル化剤を混合し、0〜120℃、好ましくは5〜80℃の範囲で1〜72時間攪拌することで、ポリイミド前駆体が得られる。80℃以上で反応させる場合、分子量が重合時の温度履歴に依存して変動し、また熱によりイミド化が進行することから、ポリイミド前駆体を安定して製造できなくなる可能性がある。4) Polyamide acid silyl ester (direct method)
The polyimide precursor is obtained by mixing the polyamic acid solution obtained by the method 1) and the silylating agent and stirring for 1 to 72 hours in the range of 0 to 120 ° C, preferably 5 to 80 ° C. When the reaction is carried out at 80 ° C. or higher, the molecular weight varies depending on the temperature history at the time of polymerization, and imidization proceeds due to heat, so there is a possibility that the polyimide precursor cannot be produced stably.
ここで用いるシリル化剤として、塩素を含有しないシリル化剤を用いることは、シリル化されたポリアミド酸、もしくは、得られたポリイミドを精製する必要がないため、好適である。塩素原子を含まないシリル化剤としては、N,O−ビス(トリメチルシリル)トリフルオロアセトアミド、N,O−ビス(トリメチルシリル)アセトアミド、ヘキサメチルジシラザンが挙げられる。フッ素原子を含まず低コストであることから、N,O−ビス(トリメチルシリル)アセトアミド、ヘキサメチルジシラザンが特に好ましい。 As the silylating agent used here, it is preferable to use a silylating agent not containing chlorine because it is not necessary to purify the silylated polyamic acid or the obtained polyimide. Examples of the silylating agent not containing a chlorine atom include N, O-bis (trimethylsilyl) trifluoroacetamide, N, O-bis (trimethylsilyl) acetamide, and hexamethyldisilazane. N, O-bis (trimethylsilyl) acetamide and hexamethyldisilazane are particularly preferred because they do not contain fluorine atoms and are low in cost.
前記製造方法は、いずれも有機溶媒中で好適に行なうことができるので、その結果として、ポリイミド前駆体を含む溶液または溶液組成物を容易に得ることができる。 Any of the above production methods can be suitably carried out in an organic solvent, and as a result, a solution or solution composition containing a polyimide precursor can be easily obtained.
ポリイミド前駆体を調製する際に使用する溶媒は、例えばN,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、N−メチル−2−ピロリドン、1,3−ジメチル−2−イミダゾリジノン、ジメチルスルホキシド等の非プロトン性溶媒が好ましく、特にN,N−ジメチルアセトアミドが好ましいが、原料モノマー成分と生成するポリイミド前駆体が溶解すれば、どんな種類の溶媒であっても問題はなく使用できるので、特にその構造には限定されない。溶媒として、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、N−メチルピロリドン等のアミド溶媒、γ−ブチロラクトン、γ−バレロラクトン、δ−バレロラクトン、γ−カプロラクトン、ε−カプロラクトン、α−メチル−γ−ブチロラクトン等の環状エステル溶媒、エチレンカーボネート、プロピレンカーボネート等のカーボネート溶媒、トリエチレングリコール等のグリコール系溶媒、m−クレゾール、p−クレゾール、3−クロロフェノール、4−クロロフェノール等のフェノール系溶媒、アセトフェノン、1,3−ジメチル−2−イミダゾリジノン、スルホラン、ジメチルスルホキシドなどが好ましく採用される。さらに、その他の一般的な有機溶剤、即ちフェノール、o−クレゾール、酢酸ブチル、酢酸エチル、酢酸イソブチル、プロピレングリコールメチルアセテート、エチルセロソルブ、ブチルセロソルブ、2−メチルセロソルブアセテート、エチルセロソルブアセテート、ブチルセロソルブアセテート、テトラヒドロフラン、ジメトキシエタン、ジエトキシエタン、ジブチルエーテル、ジエチレングリコールジメチルエーテル、メチルイソブチルケトン、ジイソブチルケトン、シクロペンタノン、シクロへキサノン、メチルエチルケトン、アセトン、ブタノール、エタノール、キシレン、トルエン、クロルベンゼン、ターペン、ミネラルスピリット、石油ナフサ系溶媒なども使用できる。なお、溶媒は、複数種を組み合わせて使用することもできる。 Solvents used in preparing the polyimide precursor are, for example, N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidone, 1,3-dimethyl-2-imidazolidinone, dimethyl sulfoxide An aprotic solvent such as N, N-dimethylacetamide is preferred, but any type of solvent can be used without any problem as long as the raw material monomer component and the polyimide precursor to be produced are dissolved. The structure is not limited. As solvents, amide solvents such as N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone, γ-butyrolactone, γ-valerolactone, δ-valerolactone, γ-caprolactone, ε-caprolactone, α- Cyclic ester solvents such as methyl-γ-butyrolactone, carbonate solvents such as ethylene carbonate and propylene carbonate, glycol solvents such as triethylene glycol, phenols such as m-cresol, p-cresol, 3-chlorophenol and 4-chlorophenol A system solvent, acetophenone, 1,3-dimethyl-2-imidazolidinone, sulfolane, dimethyl sulfoxide and the like are preferably employed. Furthermore, other common organic solvents such as phenol, o-cresol, butyl acetate, ethyl acetate, isobutyl acetate, propylene glycol methyl acetate, ethyl cellosolve, butyl cellosolve, 2-methyl cellosolve acetate, ethyl cellosolve acetate, butyl cellosolve acetate, tetrahydrofuran , Dimethoxyethane, diethoxyethane, dibutyl ether, diethylene glycol dimethyl ether, methyl isobutyl ketone, diisobutyl ketone, cyclopentanone, cyclohexanone, methyl ethyl ketone, acetone, butanol, ethanol, xylene, toluene, chlorobenzene, terpenes, mineral spirit, petroleum A naphtha solvent can also be used. In addition, a solvent can also be used in combination of multiple types.
本発明において、ポリイミド前駆体の対数粘度は、特に限定されないが、30℃での濃度0.5g/dLのN,N−ジメチルアセトアミド溶液における対数粘度が0.2dL/g以上、より好ましくは0.3dL/g以上、特に好ましくは0.4dL/g以上であることが好ましい。対数粘度が0.2dL/g以上では、ポリイミド前駆体の分子量が高く、得られるポリイミドの機械強度や耐熱性に優れる。 In the present invention, the logarithmic viscosity of the polyimide precursor is not particularly limited, but the logarithmic viscosity in an N, N-dimethylacetamide solution having a concentration of 0.5 g / dL at 30 ° C. is 0.2 dL / g or more, more preferably 0. .3 dL / g or more, particularly preferably 0.4 dL / g or more. When the logarithmic viscosity is 0.2 dL / g or more, the molecular weight of the polyimide precursor is high, and the mechanical strength and heat resistance of the resulting polyimide are excellent.
本発明のポリイミド前駆体組成物は、ポリイミド前駆体と、イミダゾール系化合物とを含むものであり、前記製造方法により得られるポリイミド前駆体溶液または溶液組成物にイミダゾール系化合物を加えて調製することができる。また、必要に応じて、溶媒を除去または加えてもよく、イミダゾール系化合物以外の所望の成分を添加してもよい。また、溶媒にテトラカルボン酸成分(テトラカルボン酸二無水物等)とジアミン成分とイミダゾール系化合物を加え、イミダゾール系化合物の存在下で、テトラカルボン酸成分とジアミン成分とを反応させて、本発明のポリイミド前駆体組成物(ポリイミド前駆体と、イミダゾール系化合物とを含む溶液組成物)を得ることもできる。 The polyimide precursor composition of the present invention includes a polyimide precursor and an imidazole compound, and may be prepared by adding an imidazole compound to a polyimide precursor solution or solution composition obtained by the above production method. it can. Moreover, a solvent may be removed or added as needed, and desired components other than an imidazole compound may be added. In addition, a tetracarboxylic acid component (tetracarboxylic dianhydride or the like), a diamine component, and an imidazole compound are added to a solvent, and the tetracarboxylic acid component and the diamine component are reacted in the presence of the imidazole compound. The polyimide precursor composition (solution composition containing a polyimide precursor and an imidazole compound) can also be obtained.
本発明において用いるイミダゾール系化合物は、イミダゾール骨格を有する化合物であれば特に限定されない。イミダゾール系化合物を添加することによって、厚み方向位相差が小さいポリイミドが得られる。 The imidazole compound used in the present invention is not particularly limited as long as it is a compound having an imidazole skeleton. By adding an imidazole compound, a polyimide having a small thickness direction retardation can be obtained.
ある実施態様においては、イミダゾール系化合物として、1気圧における沸点が340℃未満、好ましくは330℃以下、より好ましくは300℃以下、特に好ましくは270℃以下の化合物を用いることが好ましい。1気圧における沸点が340℃未満、好ましくは330℃以下、より好ましくは300℃以下、特に好ましくは270℃以下のイミダゾール系化合物を添加することによって、より透明性が高いポリイミドが得られることがある。 In one embodiment, it is preferable to use a compound having a boiling point at 1 atm of less than 340 ° C., preferably 330 ° C. or less, more preferably 300 ° C. or less, particularly preferably 270 ° C. or less as the imidazole compound. By adding an imidazole compound having a boiling point at 1 atm of less than 340 ° C., preferably 330 ° C. or less, more preferably 300 ° C. or less, particularly preferably 270 ° C. or less, a more transparent polyimide may be obtained. .
本発明において用いるイミダゾール系化合物としては、特に限定されないが、1,2−ジメチルイミダゾール、1−メチルイミダゾール、2−メチルイミダゾール、2−フェニルイミダゾール、イミダゾール、ベンゾイミダゾールなどが挙げられる。1,2−ジメチルイミダゾール(1気圧における沸点:205℃)、1−メチルイミダゾール(1気圧における沸点:198℃)、2−メチルイミダゾール(1気圧における沸点:268℃)、イミダゾール(1気圧における沸点:256℃)などが好ましく、1,2−ジメチルイミダゾール、1−メチルイミダゾールが特に好ましい。イミダゾール系化合物は、1種を単独で使用してもよく、複数種を組み合わせて使用することもできる。 The imidazole compound used in the present invention is not particularly limited, and examples thereof include 1,2-dimethylimidazole, 1-methylimidazole, 2-methylimidazole, 2-phenylimidazole, imidazole, and benzimidazole. 1,2-dimethylimidazole (boiling point at 1 atmosphere: 205 ° C.), 1-methylimidazole (boiling point at 1 atmosphere: 198 ° C.), 2-methylimidazole (boiling point at 1 atmosphere: 268 ° C.), imidazole (boiling point at 1 atmosphere) : 256 ° C.) and the like, and 1,2-dimethylimidazole and 1-methylimidazole are particularly preferable. An imidazole compound may be used individually by 1 type, and can also be used in combination of multiple types.
本発明において、ポリイミド前駆体組成物のイミダゾール系化合物の含有量は、ポリイミド前駆体の繰り返し単位1モルに対して4モル未満である。イミダゾール系化合物の含有量がポリイミド前駆体の繰り返し単位1モルに対して4モル以上になると、ポリイミド前駆体組成物の保存安定性が悪くなる。イミダゾール系化合物の含有量は、ポリイミド前駆体の繰り返し単位1モルに対して0.05モル以上であることが好ましく、また、ポリイミド前駆体の繰り返し単位1モルに対して2モル以下であることが好ましい。なお、ここで、ポリイミド前駆体の繰り返し単位1モルは、テトラカルボン酸成分1モルに対応する。 In this invention, content of the imidazole type compound of a polyimide precursor composition is less than 4 mol with respect to 1 mol of repeating units of a polyimide precursor. When the content of the imidazole compound is 4 mol or more with respect to 1 mol of the repeating unit of the polyimide precursor, the storage stability of the polyimide precursor composition is deteriorated. The content of the imidazole compound is preferably 0.05 mol or more with respect to 1 mol of the repeating unit of the polyimide precursor, and is 2 mol or less with respect to 1 mol of the repeating unit of the polyimide precursor. preferable. Here, 1 mol of the repeating unit of the polyimide precursor corresponds to 1 mol of the tetracarboxylic acid component.
本発明のポリイミド前駆体組成物は、通常、溶媒を含む。本発明のポリイミド前駆体組成物に用いる溶媒としては、ポリイミド前駆体が溶解すれば問題はなく、特にその構造は限定されない。溶媒として、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、N−メチル−2−ピロリドン等のアミド溶媒、γ−ブチロラクトン、γ−バレロラクトン、δ−バレロラクトン、γ−カプロラクトン、ε−カプロラクトン、α−メチル−γ−ブチロラクトン等の環状エステル溶媒、エチレンカーボネート、プロピレンカーボネート等のカーボネート溶媒、トリエチレングリコール等のグリコール系溶媒、m−クレゾール、p−クレゾール、3−クロロフェノール、4−クロロフェノール等のフェノール系溶媒、アセトフェノン、1,3−ジメチル−2−イミダゾリジノン、スルホラン、ジメチルスルホキシドなどが好ましく採用される。さらに、その他の一般的な有機溶剤、即ちフェノール、o−クレゾール、酢酸ブチル、酢酸エチル、酢酸イソブチル、プロピレングリコールメチルアセテート、エチルセロソルブ、ブチルセロソルブ、2−メチルセロソルブアセテート、エチルセロソルブアセテート、ブチルセロソルブアセテート、テトラヒドロフラン、ジメトキシエタン、ジエトキシエタン、ジブチルエーテル、ジエチレングリコールジメチルエーテル、メチルイソブチルケトン、ジイソブチルケトン、シクロペンタノン、シクロへキサノン、メチルエチルケトン、アセトン、ブタノール、エタノール、キシレン、トルエン、クロルベンゼン、ターペン、ミネラルスピリット、石油ナフサ系溶媒なども使用できる。また、これらを複数種組み合わせて使用することもできる。なお、ポリイミド前駆体組成物の溶媒は、ポリイミド前駆体を調製する際に使用した溶媒をそのまま使用することができる。 The polyimide precursor composition of the present invention usually contains a solvent. The solvent used for the polyimide precursor composition of the present invention is not a problem as long as the polyimide precursor is dissolved, and the structure is not particularly limited. As solvents, amide solvents such as N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidone, γ-butyrolactone, γ-valerolactone, δ-valerolactone, γ-caprolactone, ε-caprolactone , Cyclic ester solvents such as α-methyl-γ-butyrolactone, carbonate solvents such as ethylene carbonate and propylene carbonate, glycol solvents such as triethylene glycol, m-cresol, p-cresol, 3-chlorophenol, 4-chlorophenol Phenol solvents such as acetophenone, 1,3-dimethyl-2-imidazolidinone, sulfolane, dimethyl sulfoxide and the like are preferably employed. Furthermore, other common organic solvents such as phenol, o-cresol, butyl acetate, ethyl acetate, isobutyl acetate, propylene glycol methyl acetate, ethyl cellosolve, butyl cellosolve, 2-methyl cellosolve acetate, ethyl cellosolve acetate, butyl cellosolve acetate, tetrahydrofuran , Dimethoxyethane, diethoxyethane, dibutyl ether, diethylene glycol dimethyl ether, methyl isobutyl ketone, diisobutyl ketone, cyclopentanone, cyclohexanone, methyl ethyl ketone, acetone, butanol, ethanol, xylene, toluene, chlorobenzene, terpenes, mineral spirit, petroleum A naphtha solvent can also be used. Moreover, these can also be used combining multiple types. In addition, the solvent used when preparing a polyimide precursor can be used for the solvent of a polyimide precursor composition as it is.
本発明において、テトラカルボン酸成分とジアミン成分との合計量は、溶媒とテトラカルボン酸成分とジアミン成分との合計量に対して、5質量%以上、好ましくは10質量%以上、より好ましくは15質量%以上の割合であることが好適である。なお、通常は、テトラカルボン酸成分とジアミン成分との合計量は、溶媒とテトラカルボン酸成分とジアミン成分との合計量に対して、60質量%以下、好ましくは50質量%以下であることが好適である。この濃度は、ポリイミド前駆体に起因する固形分濃度にほぼ近似される濃度であるが、この濃度が低すぎると、例えばポリイミドフィルムを製造する際に得られるポリイミドフィルムの膜厚の制御が難しくなることがある。 In the present invention, the total amount of the tetracarboxylic acid component and the diamine component is 5% by mass or more, preferably 10% by mass or more, more preferably 15%, based on the total amount of the solvent, the tetracarboxylic acid component and the diamine component. A ratio of not less than mass% is preferred. In general, the total amount of the tetracarboxylic acid component and the diamine component is 60% by mass or less, preferably 50% by mass or less, based on the total amount of the solvent, the tetracarboxylic acid component, and the diamine component. Is preferred. This concentration is a concentration approximately approximate to the solid content concentration resulting from the polyimide precursor, but if this concentration is too low, it becomes difficult to control the film thickness of the polyimide film obtained, for example, when producing a polyimide film. Sometimes.
本発明において、ポリイミド前駆体組成物の粘度(回転粘度)は、特に限定されないが、E型回転粘度計を用い、温度25℃、せん断速度20sec−1で測定した回転粘度が、0.01〜1000Pa・secが好ましく、0.1〜100Pa・secがより好ましい。また、必要に応じて、チキソ性を付与することもできる。上記範囲の粘度では、コーティングや製膜を行う際、ハンドリングしやすく、また、はじきが抑制され、レベリング性に優れるため、良好な被膜が得られる。In the present invention, the viscosity (rotational viscosity) of the polyimide precursor composition is not particularly limited, but the rotational viscosity measured at a temperature of 25 ° C. and a shear rate of 20 sec −1 using an E-type rotational viscometer is 0.01 to 1000 Pa · sec is preferable, and 0.1 to 100 Pa · sec is more preferable. Moreover, thixotropy can also be provided as needed. When the viscosity is in the above range, it is easy to handle when coating or forming a film, and the repelling is suppressed and the leveling property is excellent, so that a good film can be obtained.
本発明のポリイミド前駆体組成物は、必要に応じて、化学イミド化剤(無水酢酸などの酸無水物や、ピリジン、イソキノリンなどのアミン化合物)、酸化防止剤、フィラー(シリカ等の無機粒子など)、染料、顔料、シランカップリング剤などのカップリング剤、プライマー、難燃材、消泡剤、レベリング剤、レオロジーコントロール剤(流動補助剤)、剥離剤などを含有することができる。 The polyimide precursor composition of the present invention includes chemical imidizing agents (acid anhydrides such as acetic anhydride, amine compounds such as pyridine and isoquinoline), antioxidants, fillers (inorganic particles such as silica, etc.) as necessary. ), Dyes, pigments, coupling agents such as silane coupling agents, primers, flame retardants, antifoaming agents, leveling agents, rheology control agents (flow aids), release agents and the like.
本発明のポリイミドは、前記のような本発明のポリイミド前駆体組成物をイミド化する(すなわち、ポリイミド前駆体を脱水閉環反応する)ことで得ることができる。イミド化の方法は特に限定されず、公知の熱イミド化、または化学イミド化の方法を好適に適用することができる。得られるポリイミドの形態は、フィルム、ポリイミドフィルムと他の基材との積層体、コーティング膜、粉末、ビーズ、成型体、発泡体などを好適に挙げることができる。 The polyimide of the present invention can be obtained by imidizing the polyimide precursor composition of the present invention as described above (that is, subjecting the polyimide precursor to a dehydration ring-closing reaction). The imidization method is not particularly limited, and a known thermal imidation or chemical imidization method can be suitably applied. The form of the polyimide obtained can mention suitably a film, the laminated body of a polyimide film and another base material, a coating film, powder, a bead, a molded object, a foam.
本発明においては、ポリイミド前駆体組成物を、最高加熱温度350℃超で加熱処理して、ポリイミド前駆体をイミド化することが好ましい。イミド化のための加熱処理の最高加熱温度は、380℃を超えることがより好ましく、400℃を超えることが特に好ましい。イミド化のための加熱処理の最高加熱温度を、350℃を超える温度、より好ましくは380℃を超える温度、特に好ましくは400℃を超える温度とすることにより、得られるポリイミドの機械的特性が向上する。加熱処理の最高加熱温度の上限は特に限定されないが、通常、500℃以下が好ましい。 In the present invention, it is preferable to imidize the polyimide precursor composition by heat-treating the polyimide precursor composition at a maximum heating temperature exceeding 350 ° C. The maximum heating temperature of the heat treatment for imidization is more preferably higher than 380 ° C, and particularly preferably higher than 400 ° C. By setting the maximum heating temperature of the heat treatment for imidization to a temperature exceeding 350 ° C., more preferably a temperature exceeding 380 ° C., particularly preferably a temperature exceeding 400 ° C., the mechanical properties of the resulting polyimide are improved. To do. Although the upper limit of the maximum heating temperature of heat processing is not specifically limited, Usually, 500 degrees C or less is preferable.
例えば、本発明のポリイミド前駆体組成物を基材上に流延・塗布し、この基材上のポリイミド前駆体組成物を最高加熱温度350℃超、より好ましくは380℃超、特に好ましくは400℃を超える温度で加熱処理して、ポリイミド前駆体をイミド化することにより、ポリイミドを好適に製造することができる。なお、加熱プロファイルは特に限定されず、適宜選択することができるが、生産性の点からは、加熱処理する時間は短い方が好ましい。 For example, the polyimide precursor composition of the present invention is cast and applied on a substrate, and the polyimide precursor composition on the substrate is heated to a maximum heating temperature of 350 ° C., more preferably 380 ° C., particularly preferably 400. A polyimide can be suitably manufactured by heat-processing at the temperature exceeding 0 degreeC and imidating a polyimide precursor. The heating profile is not particularly limited and can be selected as appropriate. However, from the viewpoint of productivity, it is preferable that the heat treatment time is short.
また、本発明のポリイミド前駆体組成物を基材上に流延・塗布し、好ましくは180℃以下の温度範囲で乾燥して、基材上にポリイミド前駆体組成物の膜を形成し、得られたポリイミド前駆体組成物の膜を基材上から剥離して、その膜の端部を固定した状態で、最高加熱温度350℃超、より好ましくは380℃超、特に好ましくは400℃を超える温度で加熱処理して、ポリイミド前駆体をイミド化することによっても、ポリイミドを好適に製造することができる。 In addition, the polyimide precursor composition of the present invention is cast and applied on a substrate, and preferably dried in a temperature range of 180 ° C. or less to form a polyimide precursor composition film on the substrate. In the state where the film of the obtained polyimide precursor composition is peeled off from the substrate and the end of the film is fixed, the maximum heating temperature exceeds 350 ° C., more preferably exceeds 380 ° C., and particularly preferably exceeds 400 ° C. A polyimide can be suitably manufactured also by heat-processing at temperature and imidizing a polyimide precursor.
より具体的な本発明のポリイミド(ポリイミドフィルム/基材積層体、もしくはポリイミドフィルム)の製造方法の一例については、後述する。 A more specific example of the method for producing the polyimide (polyimide film / substrate laminate or polyimide film) of the present invention will be described later.
本発明のポリイミド前駆体組成物から得られるポリイミド(本発明のポリイミド)は、特に限定されないが、フィルムにしたときの150℃から250℃までの線熱膨張係数が、好ましくは60ppm/K以下、より好ましくは50ppm/K以下、さらに好ましくは45ppm/K以下、さらに好ましくは40ppm/K以下、特に好ましくは35ppm/K以下であることができる。線熱膨張係数が大きいと、金属などの導体との線熱膨張係数の差が大きく、回路基板を形成する際に反りが増大するなどの不具合が生じることがある。 The polyimide obtained from the polyimide precursor composition of the present invention (polyimide of the present invention) is not particularly limited, but the linear thermal expansion coefficient from 150 ° C. to 250 ° C. when formed into a film is preferably 60 ppm / K or less, More preferably, it is 50 ppm / K or less, More preferably, it is 45 ppm / K or less, More preferably, it is 40 ppm / K or less, Most preferably, it is 35 ppm / K or less. When the linear thermal expansion coefficient is large, the difference in the linear thermal expansion coefficient with a conductor such as metal is large, which may cause problems such as an increase in warpage when a circuit board is formed.
本発明のポリイミド前駆体組成物から得られるポリイミド(本発明のポリイミド)は、特に限定されないが、厚さ10μmのフィルムでの全光透過率(波長380nm〜780nmの平均光透過率)が、好ましくは86%以上、より好ましくは87%以上、特に好ましくは88%以上であることができる。ディスプレイ用途等で使用する場合、全光透過率が低いと光源を強くする必要があり、エネルギーがかかるといった問題等を生じることがある。 The polyimide obtained from the polyimide precursor composition of the present invention (polyimide of the present invention) is not particularly limited, but preferably has a total light transmittance (average light transmittance of a wavelength of 380 nm to 780 nm) in a film having a thickness of 10 μm. May be 86% or more, more preferably 87% or more, and particularly preferably 88% or more. When used for a display application or the like, if the total light transmittance is low, it is necessary to strengthen the light source, which may cause a problem that energy is applied.
特にディスプレイ用途などのポリイミドフィルムを光が透過する用途に使用する場合、ポリイミドフィルムは透明性が高い方が望ましい。本発明のポリイミド前駆体組成物から得られるポリイミド(本発明のポリイミド)は、特に限定されないが、厚さ10μmのフィルムでの波長400nmにおける光透過率が、好ましくは75%以上、好ましくは80%以上、より好ましくは80%超、さらに好ましくは81%以上、特に好ましくは82%以上であることができる。 In particular, when a polyimide film such as a display application is used in an application where light is transmitted, it is desirable that the polyimide film has higher transparency. The polyimide (polyimide of the present invention) obtained from the polyimide precursor composition of the present invention is not particularly limited, but the light transmittance at a wavelength of 400 nm in a 10 μm thick film is preferably 75% or more, preferably 80%. Above, more preferably more than 80%, still more preferably 81% or more, particularly preferably 82% or more.
なお、本発明のポリイミド前駆体組成物から得られるポリイミド(本発明のポリイミド)からなるフィルムは、用途にもよるが、フィルムの厚みとしては、好ましくは0.1μm〜250μm、より好ましくは1μm〜150μm、さらに好ましくは1μm〜50μm、特に好ましくは1μm〜30μmである。ポリイミドフィルムを光が透過する用途に使用する場合、ポリイミドフィルムが厚すぎると光透過率が低くなる恐れがある。 In addition, although the film which consists of a polyimide (polyimide of this invention) obtained from the polyimide precursor composition of this invention also depends on a use, as thickness of a film, Preferably it is 0.1 micrometer-250 micrometers, More preferably, it is 1 micrometer-. It is 150 μm, more preferably 1 μm to 50 μm, and particularly preferably 1 μm to 30 μm. When the polyimide film is used for light transmission, if the polyimide film is too thick, the light transmittance may be lowered.
本発明のポリイミド前駆体組成物から得られるポリイミド(本発明のポリイミド)は、特に限定されないが、ポリイミドフィルムの耐熱性の指標である1%重量減少温度が、好ましくは395℃以上、より好ましくは430℃以上、さらに好ましくは440℃以上、特に好ましくは470℃以上であることができる。ポリイミド上にトランジスタを形成する等で、ポリイミド上にガスバリア膜等を形成する場合、耐熱性が低いと、ポリイミドとバリア膜との間で、ポリイミドの分解に伴うアウトガスにより膨れが生じることがある。 The polyimide obtained from the polyimide precursor composition of the present invention (polyimide of the present invention) is not particularly limited, but the 1% weight loss temperature, which is an index of heat resistance of the polyimide film, is preferably 395 ° C. or more, more preferably It can be 430 ° C. or higher, more preferably 440 ° C. or higher, and particularly preferably 470 ° C. or higher. When a gas barrier film or the like is formed on a polyimide by forming a transistor on the polyimide or the like, if the heat resistance is low, swelling may occur between the polyimide and the barrier film due to outgas accompanying decomposition of the polyimide.
本発明のポリイミド前駆体組成物から得られるポリイミド(本発明のポリイミド)は、特に限定されないが、ポリイミドフィルムの厚み方向位相差が、好ましくは1000nm以下、より好ましくは800nm以下、さらに好ましくは700nm以下、特に好ましくは600nm以下であることができる。厚み方向の位相差が大きいと、透過光の色が正しく表示されない、色のにじみや視野角が狭くなるといった問題が起こることがある。 The polyimide obtained from the polyimide precursor composition of the present invention (polyimide of the present invention) is not particularly limited, but the thickness direction retardation of the polyimide film is preferably 1000 nm or less, more preferably 800 nm or less, and even more preferably 700 nm or less. Particularly preferably, it can be 600 nm or less. When the retardation in the thickness direction is large, there are cases where the color of transmitted light is not displayed correctly, the color is blurred, and the viewing angle is narrowed.
本発明のポリイミド前駆体組成物から得られるポリイミド、すなわち本発明のポリイミドは、膜厚方向の位相差が小さく、高い透明性、折り曲げ耐性、高耐熱性などの優れた特性を有し、さらに極めて低い線熱膨張係数を有することから、ディスプレイ用透明基板、タッチパネル用透明基板、或いは太陽電池用基板の用途において、好適に用いることができる。 The polyimide obtained from the polyimide precursor composition of the present invention, that is, the polyimide of the present invention has a small phase difference in the film thickness direction, and has excellent properties such as high transparency, bending resistance, and high heat resistance. Since it has a low coefficient of linear thermal expansion, it can be suitably used in applications such as a transparent substrate for display, a transparent substrate for touch panel, or a substrate for solar cell.
以下では、本発明のポリイミド前駆体組成物を用いた、ポリイミドフィルム/基材積層体、もしくはポリイミドフィルムの製造方法の一例について述べる。ただし、以下の方法に限定されるものではない。 Below, an example of the manufacturing method of a polyimide film / base material laminated body or a polyimide film using the polyimide precursor composition of this invention is described. However, it is not limited to the following method.
例えばセラミック(ガラス、シリコン、アルミナなど)、金属(銅、アルミニウム、ステンレスなど)、耐熱プラスチックフィルム(ポリイミドフィルムなど)等の基材に、本発明のポリイミド前駆体組成物(ワニス)を流延し、真空中、窒素等の不活性ガス中、或いは空気中で、熱風もしくは赤外線を用いて、20〜180℃、好ましくは20〜150℃の温度範囲で乾燥する。次いで、得られたポリイミド前駆体フィルムを基材上で、もしくはポリイミド前駆体フィルムを基材上から剥離し、そのフィルムの端部を固定した状態で、真空中、窒素等の不活性ガス中、或いは空気中で、熱風もしくは赤外線を用い、例えば200〜500℃、好ましくは最高加熱温度350℃超、より好ましくは380℃超、特に好ましくは400℃を超える温度で加熱イミド化することでポリイミドフィルム/基材積層体、もしくはポリイミドフィルムを製造することができる。なお、得られるポリイミドフィルムが酸化劣化するのを防ぐため、加熱イミド化は、真空中、或いは不活性ガス中で行うことが望ましい。ここでのポリイミドフィルム(ポリイミドフィルム/基材積層体の場合は、ポリイミドフィルム層)の厚さは、以後の工程の搬送性のため、好ましくは1〜250μm、より好ましくは1〜150μmである。 For example, the polyimide precursor composition (varnish) of the present invention is cast on a substrate such as ceramic (glass, silicon, alumina, etc.), metal (copper, aluminum, stainless steel, etc.), heat resistant plastic film (polyimide film, etc.), etc. In a vacuum, in an inert gas such as nitrogen, or in the air, drying is performed in a temperature range of 20 to 180 ° C., preferably 20 to 150 ° C. using hot air or infrared rays. Next, the obtained polyimide precursor film is peeled off from the substrate or the polyimide precursor film from the substrate, and the end of the film is fixed, in vacuum, in an inert gas such as nitrogen, Alternatively, in the air, using hot air or infrared rays, for example, 200 to 500 ° C., preferably a maximum heating temperature of over 350 ° C., more preferably over 380 ° C., and particularly preferably over 400 ° C. / A substrate laminate or a polyimide film can be produced. In order to prevent the resulting polyimide film from being oxidized and deteriorated, it is desirable to carry out the heating imidization in a vacuum or in an inert gas. The thickness of the polyimide film here (in the case of a polyimide film / substrate laminate) is preferably 1 to 250 μm, more preferably 1 to 150 μm, for transportability in the subsequent steps.
また、ポリイミド前駆体のイミド化反応は、前記のような加熱処理による加熱イミド化に代えて、ポリイミド前駆体をピリジンやトリエチルアミン等の3級アミン存在下、無水酢酸等の脱水環化試薬を含有する溶液に浸漬するなどの化学的処理によって行うことも可能である。また、これらの脱水環化試薬をあらかじめ、ポリイミド前駆体組成物(ワニス)中に投入・攪拌し、それを基材上に流延・乾燥することで、部分的にイミド化したポリイミド前駆体を作製することもでき、これを更に前記のような加熱処理することで、ポリイミドフィルム/基材積層体、もしくはポリイミドフィルムを得ることができる。 Also, the imidization reaction of the polyimide precursor, instead of the heat imidation by the heat treatment as described above, contains a dehydration cyclization reagent such as acetic anhydride in the presence of a tertiary amine such as pyridine or triethylamine. It is also possible to carry out by chemical treatment such as immersion in a solution. In addition, these dehydrating cyclization reagents are previously charged and stirred in a polyimide precursor composition (varnish), and cast and dried on a base material to obtain a partially imidized polyimide precursor. A polyimide film / base material laminate or a polyimide film can be obtained by further heat treatment as described above.
この様にして得られたポリイミドフィルム/基材積層体、もしくはポリイミドフィルムは、その片面もしくは両面に導電性層を形成することによって、フレキシブルな導電性基板を得ることができる。 The polyimide film / base laminate or the polyimide film thus obtained can be used to form a flexible conductive substrate by forming a conductive layer on one side or both sides thereof.
フレキシブルな導電性基板は、例えば次の方法によって得ることができる。すなわち、第一の方法としては、ポリイミドフィルム/基材積層体を基材からポリイミドフィルムを剥離せずに、そのポリイミドフィルム表面に、スパッタ、蒸着、印刷などによって、導電性物質(金属もしくは金属酸化物、導電性有機物、導電性炭素など)の導電層を形成させ、導電性層/ポリイミドフィルム/基材の導電性積層体を製造する。その後必要に応じて、基材より導電性層/ポリイミドフィルム積層体を剥離することによって、導電性層/ポリイミドフィルム積層体からなる透明でフレキシブルな導電性基板を得ることができる。 A flexible conductive substrate can be obtained, for example, by the following method. That is, as a first method, the polyimide film / substrate laminate is not peeled off from the substrate, and the surface of the polyimide film is sputtered, vapor-deposited, printed, etc. by a conductive substance (metal or metal oxide). A conductive layer of conductive layer / polyimide film / base material is produced. Then, if necessary, a transparent and flexible conductive substrate comprising the conductive layer / polyimide film laminate can be obtained by peeling the conductive layer / polyimide film laminate from the substrate.
第二の方法としては、ポリイミドフィルム/基材積層体の基材からポリイミドフィルムを剥離して、ポリイミドフィルムを得、そのポリイミドフィルム表面に、導電性物質(金属もしくは金属酸化物、導電性有機物、導電性炭素など)の導電層を、第一の方法と同様にして形成させ、導電性層/ポリイミドフィルム積層体、導電性層/ポリイミドフィルム積層体/導電性層からなる透明でフレキシブルな導電性基板を得ることができる。 As a second method, the polyimide film is peeled off from the substrate of the polyimide film / substrate laminate to obtain a polyimide film, and a conductive substance (metal or metal oxide, conductive organic substance, A conductive layer of conductive carbon, etc.) is formed in the same manner as in the first method, and is a transparent and flexible conductive layer comprising a conductive layer / polyimide film laminate and a conductive layer / polyimide film laminate / conductive layer. A substrate can be obtained.
なお、第一、第二の方法において、必要に応じて、ポリイミドフィルムの表面に導電層を形成する前に、スパッタ、蒸着やゲル−ゾル法などによって、水蒸気、酸素などのガスバリヤ層、光調整層などの無機層を形成しても構わない。 In the first and second methods, if necessary, before forming a conductive layer on the surface of the polyimide film, a gas barrier layer such as water vapor or oxygen, light adjustment, etc. by sputtering, vapor deposition or gel-sol method. An inorganic layer such as a layer may be formed.
また、導電層は、フォトリソグラフィ法や各種印刷法、インクジェット法などの方法によって、回路が好適に形成される。 The conductive layer is preferably formed with a circuit by a photolithography method, various printing methods, an inkjet method, or the like.
このようにして得られる本発明の基板は、本発明のポリイミドによって構成されたポリイミドフィルムの表面に、必要に応じてガスバリヤ層や無機層を介し、導電層の回路を有するものである。この基板は、フレキシブルであり、高い透明性、折り曲げ性、耐熱性が優れ、さらに極めて低い線熱膨張係数や優れた耐溶剤性を併せ有するので微細な回路の形成が容易である。したがって、この基板は、ディスプレイ用、タッチパネル用、または太陽電池用の基板として好適に用いることができる。 The substrate of the present invention thus obtained has a circuit of a conductive layer on the surface of a polyimide film composed of the polyimide of the present invention through a gas barrier layer or an inorganic layer as necessary. This substrate is flexible, has excellent transparency, bendability, and heat resistance, and further has a very low linear thermal expansion coefficient and excellent solvent resistance, so that a fine circuit can be easily formed. Therefore, this board | substrate can be used suitably as a board | substrate for displays, a touch panel, or a solar cell.
すなわち、この基板に、蒸着、各種印刷法、或いはインクジェット法などによって、さらにトランジスタ(無機トランジスタ、有機トランジスタ)が形成されてフレキシブル薄膜トランジスタが製造され、そして、表示デバイス用の液晶素子、EL素子、光電素子として好適に用いられる。 That is, a transistor (inorganic transistor, organic transistor) is further formed on this substrate by vapor deposition, various printing methods, an ink jet method or the like to manufacture a flexible thin film transistor, and a liquid crystal element, an EL element, a photoelectric transistor for a display device are manufactured. It is suitably used as an element.
以下、実施例及び比較例によって本発明を更に説明する。尚、本発明は以下の実施例に限定されるものではない。 Hereinafter, the present invention will be further described with reference to Examples and Comparative Examples. In addition, this invention is not limited to a following example.
以下の各例において評価は次の方法で行った。 In each of the following examples, the evaluation was performed by the following method.
<ポリイミド前駆体溶液(ワニス)の評価>
[保存安定性]
23℃でワニスを保存し、3日後に流動性のある均一な状態であれば○、
3日後に白濁、もしくはゲル化していれば×とする。<Evaluation of polyimide precursor solution (varnish)>
[Storage stability]
If the varnish is stored at 23 ° C. and is in a uniform state with fluidity after 3 days,
If it becomes cloudy or gelled after 3 days, it is marked as x.
<ポリイミドフィルムの評価>
[400nm光透過率、全光透過率]
紫外可視分光光度計/V−650DS(日本分光製)を用いて、膜厚約10μmのポリイミド膜の400nmにおける光透過率と、全光透過率(380nm〜780nmにおける平均透過率)を測定した。測定した400nmにおける光透過率と、全光透過率を反射率を10%としてランベルト・ベール式を用いて、10μm厚の400nmにおける光透過率と、全光透過率を算出した。算出式を下記に示す。<Evaluation of polyimide film>
[400 nm light transmittance, total light transmittance]
Using a UV-visible spectrophotometer / V-650DS (manufactured by JASCO), the light transmittance at 400 nm and the total light transmittance (average transmittance at 380 nm to 780 nm) of a polyimide film having a thickness of about 10 μm were measured. The light transmittance at 400 nm and the total light transmittance were calculated using the Lambert-Beer formula with the total light transmittance being 10% and the light transmittance at 400 nm having a thickness of 10 μm and the total light transmittance were calculated. The calculation formula is shown below.
Log10((T1+10)/100)=10/L×(Log10((T1’+10)/100))
Log10((T2+10)/100)=10/L×(Log10((T2’+10)/100))
T1:反射率を10%としたときの10μm厚のポリイミドフィルムの400nmにおける光透過率(%)
T1’:測定した400nmにおける光透過率(%)
T2:反射率を10%としたときの10μm厚のポリイミドフィルムの全光透過率(%)
T2’:測定した全光透過率(%)
L:測定したポリイミドフィルムの膜厚(μm)Log 10 ((T 1 +10) / 100) = 10 / L × (Log 10 ((T 1 ′ +10) / 100))
Log 10 ((T 2 +10) / 100) = 10 / L × (Log 10 ((T 2 ′ +10) / 100))
T 1 : Light transmittance (%) at 400 nm of a 10 μm-thick polyimide film with a reflectance of 10%
T 1 ′: measured light transmittance at 400 nm (%)
T 2 : Total light transmittance (%) of a 10 μm-thick polyimide film with a reflectance of 10%
T 2 ': Measured total light transmittance (%)
L: Film thickness of the measured polyimide film (μm)
[弾性率、破断点伸度]
膜厚約10μmのポリイミドフィルムをIEC450規格のダンベル形状に打ち抜いて試験片とし、ORIENTEC社製TENSILONを用いて、チャック間長30mm、引張速度2mm/分で、初期の弾性率、破断点伸度を測定した。[Elastic modulus, elongation at break]
A polyimide film having a thickness of about 10 μm is punched into a dumbbell shape conforming to IEC450 standard to make a test piece. Using ENSILON manufactured by ORIENTEC, the initial elastic modulus and elongation at break are 30 mm between chucks and a pulling speed of 2 mm / min. It was measured.
[線熱膨張係数(CTE)]
膜厚約10μmのポリイミドフィルムを幅4mmの短冊状に切り取って試験片とし、TMA/SS6100 (エスアイアイ・ナノテクノロジー株式会社製)を用い、チャック間長15mm、荷重2g、昇温速度20℃/分で500℃まで昇温した。得られたTMA曲線から、150℃から250℃までの線熱膨張係数を求めた。[Linear thermal expansion coefficient (CTE)]
A polyimide film having a thickness of about 10 μm is cut into a strip having a width of 4 mm to form a test piece, and TMA / SS6100 (manufactured by SII Nano Technology Co., Ltd.) is used. The temperature was raised to 500 ° C in minutes. The linear thermal expansion coefficient from 150 ° C. to 250 ° C. was determined from the obtained TMA curve.
[1%重量減少温度]
膜厚約10μmのポリイミドフィルムを試験片とし、TAインスツルメント社製 熱量計測定装置(Q5000IR)を用い、窒素気流中、昇温速度10℃/分で25℃から600℃まで昇温した。得られた重量曲線から、1%重量減少温度を求めた。[1% weight loss temperature]
A polyimide film having a film thickness of about 10 μm was used as a test piece, and the temperature was raised from 25 ° C. to 600 ° C. at a temperature rising rate of 10 ° C./min in a nitrogen stream using a calorimeter measuring device (Q5000IR) manufactured by TA Instruments. From the obtained weight curve, a 1% weight loss temperature was determined.
[フィルムの厚み方向位相差(Rth)]
膜厚10μmのポリイミドフィルムを試験片とし、王子計測器社製 位相差測定装置(KOBRA−WR)を用い、入射角を40°としてフィルムの位相差測定を行った。得られた位相差より、膜厚10μmのフィルムの厚み方向の位相差を求めた。[Thickness direction retardation of film (R th )]
A polyimide film having a thickness of 10 μm was used as a test piece, and a phase difference measurement of the film was performed using a phase difference measuring device (KOBRA-WR) manufactured by Oji Scientific Instruments with an incident angle of 40 °. From the obtained phase difference, the thickness direction retardation of a film having a thickness of 10 μm was determined.
以下の各例で使用した原材料の略称、純度等は、次のとおりである。 Abbreviations, purity, etc. of raw materials used in the following examples are as follows.
[ジアミン成分]
tra−DACH:トランス−1,4−ジアミノシクロヘキサン〔純度:99.1%(GC分析)〕
DABAN: 4,4’−ジアミノベンズアニリド〔純度:99.90%(GC分析)〕
PPD: p−フェニレンジアミン〔純度:99.9%(GC分析)〕
4,4’−ODA: 4,4’−オキシジアニリン〔純度:99.9%(GC分析)〕
BAPB: 4,4’−ビス(4−アミノフェノキシ)ビフェニル〔純度:99.93%(HPLC分析)〕
[テトラカルボン酸成分]
s−BPDA:3,3’,4,4’−ビフェニルテトラカルボン酸二無水物〔純度99.9%(H−NMR分析)〕
a−BPDA:2,3,3’,4’−ビフェニルテトラカルボン酸二無水物〔純度99.6%(H−NMR分析)〕
PMDA−HS: 1R,2S,4S,5R−シクロヘキサンテトラカルボン酸二無水物〔純度:99.9%(GC分析)〕
CpODA−tee:trans−endo−endo−ノルボルナン−2−スピロ−α−シクロペンタノン−α’−スピロ−2’’−ノルボルナン−5,5’’,6,6’’−テトラカルボン酸二無水物
CpODA−cee:cis−endo−endo−ノルボルナン−2−スピロ−α−シクロペンタノン−α’−スピロ−2’’−ノルボルナン−5,5’’,6,6’’−テトラカルボン酸二無水物
CpODA:CpODA−teeとCpODA−ceeの混合物
PACDA:N,N’−(1,4−フェニレン)ビス(1,3−ジオキソオクタヒドロイソベンゾフラン−5−カルボキシアミド)[Diamine component]
tra-DACH: trans-1,4-diaminocyclohexane [Purity: 99.1% (GC analysis)]
DABAN: 4,4′-diaminobenzanilide [Purity: 99.90% (GC analysis)]
PPD: p-phenylenediamine [Purity: 99.9% (GC analysis)]
4,4′-ODA: 4,4′-oxydianiline [Purity: 99.9% (GC analysis)]
BAPB: 4,4′-bis (4-aminophenoxy) biphenyl [Purity: 99.93% (HPLC analysis)]
[Tetracarboxylic acid component]
s-BPDA: 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride [purity 99.9% (H-NMR analysis)]
a-BPDA: 2,3,3 ′, 4′-biphenyltetracarboxylic dianhydride [purity 99.6% (H-NMR analysis)]
PMDA-HS: 1R, 2S, 4S, 5R-cyclohexanetetracarboxylic dianhydride [purity: 99.9% (GC analysis)]
CpODA-tee: trans-endo-endo-norbornane-2-spiro-α-cyclopentanone-α′-spiro-2 ″ -norbornane-5,5 ″, 6,6 ″ -tetracarboxylic dianhydride CpODA-cee: cis-endo-endo-norbornane-2-spiro-α-cyclopentanone-α′-spiro-2 ″ -norbornane-5,5 ″, 6,6 ″ -tetracarboxylic acid Anhydrous CpODA: Mixture of CpODA-tee and CpODA-ce PACDA: N, N ′-(1,4-phenylene) bis (1,3-dioxooctahydroisobenzofuran-5-carboxamide)
[溶媒]
NMP: N−メチル−2−ピロリドン[solvent]
NMP: N-methyl-2-pyrrolidone
表1−1に実施例、比較例で使用したテトラカルボン酸成分、表1−2に実施例、比較例で使用したジアミン成分、表1−3に実施例、比較例で使用したイミダゾール・イミダゾリン化合物の構造式を記す。 Table 1-1 shows tetracarboxylic acid components used in Examples and Comparative Examples, Table 1-2 shows Examples and Comparative Examples, and Diamine Components Used in Comparative Examples, Table 1-3 Examples and Comparative Examples Imidazole and Imidazoline The structural formula of the compound is described.
〔合成例1〕
窒素ガスで置換した反応容器中にDABAN 90.91g(0.4モル)とPPD 64.88g(0.6モル)を入れ、N−メチル−2−ピロリドンを、仕込みモノマー総質量(ジアミン成分とカルボン酸成分の総和)が 16質量%となる量の2835.90gを加え、室温で1時間攪拌した。この溶液にCpODA 384.38g(1.0モル)を徐々に加えた。室温で12時間撹拌し、均一で粘稠なポリイミド前駆体溶液(ワニスA)を得た。[Synthesis Example 1]
In a reaction vessel substituted with nitrogen gas, 90.91 g (0.4 mol) of DABAN and 64.88 g (0.6 mol) of PPD were added, N-methyl-2-pyrrolidone was charged, and the total mass of monomers (diamine component and 2835.90 g of an amount such that the total of the carboxylic acid components was 16% by mass was added and stirred at room temperature for 1 hour. To this solution, 384.38 g (1.0 mol) of CpODA was gradually added. The mixture was stirred at room temperature for 12 hours to obtain a uniform and viscous polyimide precursor solution (varnish A).
〔合成例2〕
窒素ガスで置換した反応容器中にDABAN 90.91g(0.4モル)とPPD 54.07g(0.5モル)とBAPB 36.84g(0.1モル)を入れ、N−メチル−2−ピロリドンを、仕込みモノマー総質量(ジアミン成分とカルボン酸成分の総和)が 16質量%となる量の2972.56gを加え、室温で1時間攪拌した。この溶液にCpODA 384.38g(1.0モル)を徐々に加えた。室温で12時間撹拌し、均一で粘稠なポリイミド前駆体溶液(ワニスB)を得た。[Synthesis Example 2]
DABAN 90.91 g (0.4 mol), PPD 54.07 g (0.5 mol) and BAPB 36.84 g (0.1 mol) were placed in a reaction vessel substituted with nitrogen gas, and N-methyl-2- Pyrrolidone was added in an amount of 2972.56 g so that the total monomer weight (total of diamine component and carboxylic acid component) was 16% by mass and stirred at room temperature for 1 hour. To this solution, 384.38 g (1.0 mol) of CpODA was gradually added. The mixture was stirred at room temperature for 12 hours to obtain a uniform and viscous polyimide precursor solution (varnish B).
〔合成例3〕
窒素ガスで置換した反応容器中にDABAN 22.73g(0.100モル)を入れ、N−メチル−2−ピロリドンを、仕込みモノマー総質量(ジアミン成分とカルボン酸成分の総和)が 16質量%となる量の3211.16gを加え、室温で1時間攪拌した。この溶液にCpODA 38.44g(0.100モル)を徐々に加えた。室温で12時間撹拌し、均一で粘稠なポリイミド前駆体溶液(ワニスC)を得た。[Synthesis Example 3]
In a reaction vessel substituted with nitrogen gas, 22.73 g (0.100 mol) of DABAN was placed, N-methyl-2-pyrrolidone was charged, and the total monomer mass (total of diamine component and carboxylic acid component) was 16% by mass. An amount of 3211.16 g was added and stirred at room temperature for 1 hour. To this solution, 38.44 g (0.100 mol) of CpODA was gradually added. The mixture was stirred at room temperature for 12 hours to obtain a uniform and viscous polyimide precursor solution (varnish C).
〔合成例4〕
窒素ガスで置換した反応容器中にDABAN 15.91g(0.070モル)とPPD 3.24g(0.030モル)を入れ、N−メチル−2−ピロリドンを、仕込みモノマー総質量(ジアミン成分とカルボン酸成分の総和)が 16質量%となる量の302.35gを加え、室温で1時間攪拌した。この溶液にCpODA 38.44g(0.100モル)を徐々に加えた。室温で12時間撹拌し、均一で粘稠なポリイミド前駆体溶液(ワニスD)を得た。[Synthesis Example 4]
In a reaction vessel substituted with nitrogen gas, 15.91 g (0.070 mol) of DABAN and 3.24 g (0.030 mol) of PPD were added, N-methyl-2-pyrrolidone was charged, and the total mass of monomers (diamine component and An amount of 302.35 g in which the total of carboxylic acid components was 16% by mass was added and stirred at room temperature for 1 hour. To this solution, 38.44 g (0.100 mol) of CpODA was gradually added. The mixture was stirred at room temperature for 12 hours to obtain a uniform and viscous polyimide precursor solution (varnish D).
〔合成例5〕
窒素ガスで置換した反応容器中にDABAN 11.36g(0.050モル)とPPD 4.34g(0.040モル)と4,4’−ODA 2.00g(0.010モル)を入れ、N−メチル−2−ピロリドンを、仕込みモノマー総質量(ジアミン成分とカルボン酸成分の総和)が 16質量%となる量の294.74gを加え、室温で1時間攪拌した。この溶液にCpODA 38.44g(0.100モル)を徐々に加えた。室温で12時間撹拌し、均一で粘稠なポリイミド前駆体溶液(ワニスE)を得た。[Synthesis Example 5]
In a reaction vessel substituted with nitrogen gas, 11.36 g (0.050 mol) of DABAN, 4.34 g (0.040 mol) of PPD, and 2.00 g (0.010 mol) of 4,4′-ODA were placed. -294.74g of the quantity from which the preparation monomer total mass (total of a diamine component and a carboxylic acid component) will be 16 mass% was added to methyl-2-pyrrolidone, and it stirred at room temperature for 1 hour. To this solution, 38.44 g (0.100 mol) of CpODA was gradually added. The mixture was stirred at room temperature for 12 hours to obtain a uniform and viscous polyimide precursor solution (varnish E).
〔合成例6〕
窒素ガスで置換した反応容器中に4,4’−ODA 20.02g(0.100モル)を入れ、N−メチル−2−ピロリドンを、仕込みモノマー総質量(ジアミン成分とカルボン酸成分の総和)が 17質量%となる量の207.21gを加え、室温で1時間攪拌した。この溶液にPMDA−HS 22.41g(0.100ミリモル)を徐々に加えた。室温で12時間撹拌し、均一で粘稠なポリイミド前駆体溶液(ワニスF)を得た。[Synthesis Example 6]
Into a reaction vessel substituted with nitrogen gas, 20.02 g (0.100 mol) of 4,4′-ODA was placed, N-methyl-2-pyrrolidone was charged, and the total mass of monomers (total of diamine component and carboxylic acid component) Was added in an amount of 17% by mass and stirred at room temperature for 1 hour. To this solution, 22.41 g (0.100 mmol) of PMDA-HS was gradually added. The mixture was stirred at room temperature for 12 hours to obtain a uniform and viscous polyimide precursor solution (varnish F).
〔合成例7〕
窒素ガスで置換した反応容器中にDABAN 22.73g(0.100モル)を入れ、N−メチル−2−ピロリドンを、仕込みモノマー総質量(ジアミン成分とカルボン酸成分の総和)が 20質量%となる量の296.29gを加え、室温で1時間攪拌した。この溶液にPACDA 51.35g(0.100モル)を徐々に加えた。室温で12時間撹拌し、均一で粘稠なポリイミド前駆体溶液(ワニスG)を得た。[Synthesis Example 7]
In a reaction vessel substituted with nitrogen gas, 22.73 g (0.100 mol) of DABAN was put, N-methyl-2-pyrrolidone was charged, and the total monomer mass (total of diamine component and carboxylic acid component) was 20% by mass. An amount of 296.29 g was added and stirred at room temperature for 1 hour. To this solution, 51.35 g (0.100 mol) of PACDA was gradually added. The mixture was stirred at room temperature for 12 hours to obtain a uniform and viscous polyimide precursor solution (varnish G).
〔合成例8〕
窒素ガスで置換した反応容器中にtra−DACH 10.81g(0.100モル)を入れ、N−メチル−2−ピロリドンを、仕込みモノマー総質量(ジアミン成分とカルボン酸成分の総和)が 12質量%となる量の2950.64gを加え、室温で1時間攪拌した。この溶液にs−BPDA 28.69g(0.0975モル)とa−BPDA 0.74g(0.0025モル)を徐々に加えた。50℃で12時間撹拌し、均一で粘稠なポリイミド前駆体溶液(ワニスH)を得た。[Synthesis Example 8]
In a reaction vessel substituted with nitrogen gas, 10.81 g (0.100 mol) of tra-DACH was charged, N-methyl-2-pyrrolidone was charged, and the total monomer mass (total of diamine component and carboxylic acid component) was 12 mass. % 2950.64 g was added and stirred at room temperature for 1 hour. To this solution, 28.69 g (0.0975 mol) of s-BPDA and 0.74 g (0.0025 mol) of a-BPDA were gradually added. The mixture was stirred at 50 ° C. for 12 hours to obtain a uniform and viscous polyimide precursor solution (varnish H).
〔実施例1〕
1,2−ジメチルイミダゾール 0.05g(0.5ミリモル)とN−メチル−2−ピロリドン 0.05gを反応容器に加え均一な溶液を得た。その溶液に合成例1で得られたワニスA 33.76g(ワニスA中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加え、室温で3時間攪拌し、均一で粘稠なポリイミド前駆体溶液を得た。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対して、1,2−ジメチルイミダゾールは0.05モルである。[Example 1]
0.05 g (0.5 mmol) of 1,2-dimethylimidazole and 0.05 g of N-methyl-2-pyrrolidone were added to the reaction vessel to obtain a uniform solution. 33.76 g of varnish A obtained in Synthesis Example 1 (10 mmol with respect to the molecular weight of the repeating unit of the polyimide precursor in varnish A) was added to the solution, and the mixture was stirred at room temperature for 3 hours to obtain a uniform and viscous polyimide. A precursor solution was obtained. When calculated from the charged amount, 1,2-dimethylimidazole is 0.05 mol with respect to 1 mol of the repeating unit of the polyimide precursor.
PTFE製メンブレンフィルターでろ過したポリイミド前駆体溶液をガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から410℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。 A polyimide precursor solution filtered through a PTFE membrane filter is applied to a glass substrate, heated in a nitrogen atmosphere (oxygen concentration 200 ppm or less) from room temperature to 410 ° C. as it is, and thermally imidized to be colorless. A transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−1に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-1.
〔実施例2〕
1,2−ジメチルイミダゾール 0.15g(1.6ミリモル)とN−メチル−2−ピロリドン 0.15gを反応容器に加え均一な溶液を得た。その溶液に合成例1で得られたワニスA 33.76g(ワニスA中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加え、室温で3時間攪拌し、均一で粘稠なポリイミド前駆体溶液を得た。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対して、1,2−ジメチルイミダゾールは0.16モルである。[Example 2]
1,5-dimethylimidazole (0.15 g, 1.6 mmol) and N-methyl-2-pyrrolidone (0.15 g) were added to the reaction vessel to obtain a uniform solution. 33.76 g of varnish A obtained in Synthesis Example 1 (10 mmol with respect to the molecular weight of the repeating unit of the polyimide precursor in varnish A) was added to the solution, and the mixture was stirred at room temperature for 3 hours to obtain a uniform and viscous polyimide. A precursor solution was obtained. When calculated from the charged amount, 1,2-dimethylimidazole is 0.16 mol per 1 mol of the repeating unit of the polyimide precursor.
PTFE製メンブレンフィルターでろ過したポリイミド前駆体溶液をガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から410℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。 A polyimide precursor solution filtered through a PTFE membrane filter is applied to a glass substrate, heated in a nitrogen atmosphere (oxygen concentration 200 ppm or less) from room temperature to 410 ° C. as it is, and thermally imidized to be colorless. A transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−1に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-1.
〔実施例3〕
1,2−ジメチルイミダゾール 0.19g(2.0ミリモル)とN−メチル−2−ピロリドン 0.19gを反応容器に加え均一な溶液を得た。その溶液に合成例1で得られたワニスA 33.76g(ワニスA中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加え、室温で3時間攪拌し、均一で粘稠なポリイミド前駆体溶液を得た。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対して、1,2−ジメチルイミダゾールは0.2モルである。Example 3
1,9-dimethylimidazole (0.19 g, 2.0 mmol) and N-methyl-2-pyrrolidone (0.19 g) were added to the reaction vessel to obtain a uniform solution. 33.76 g of varnish A obtained in Synthesis Example 1 (10 mmol with respect to the molecular weight of the repeating unit of the polyimide precursor in varnish A) was added to the solution, and the mixture was stirred at room temperature for 3 hours to obtain a uniform and viscous polyimide. A precursor solution was obtained. When calculated from the charged amount, 1,2-dimethylimidazole is 0.2 mol with respect to 1 mol of the repeating unit of the polyimide precursor.
PTFE製メンブレンフィルターでろ過したポリイミド前駆体溶液をガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から410℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。 A polyimide precursor solution filtered through a PTFE membrane filter is applied to a glass substrate, heated in a nitrogen atmosphere (oxygen concentration 200 ppm or less) from room temperature to 410 ° C. as it is, and thermally imidized to be colorless. A transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−1に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-1.
〔実施例4〕
1,2−ジメチルイミダゾール 0.96g(10.0ミリモル)とN−メチル−2−ピロリドン 0.38gを反応容器に加え均一な溶液を得た。その溶液に合成例1で得られたワニスA 33.76g(ワニスA中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加え、室温で3時間攪拌し、均一で粘稠なポリイミド前駆体溶液を得た。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対する1,2−ジメチルイミダゾールは1.0モルである。Example 4
0.96 g (10.0 mmol) of 1,2-dimethylimidazole and 0.38 g of N-methyl-2-pyrrolidone were added to the reaction vessel to obtain a uniform solution. 33.76 g of varnish A obtained in Synthesis Example 1 (10 mmol with respect to the molecular weight of the repeating unit of the polyimide precursor in varnish A) was added to the solution, and the mixture was stirred at room temperature for 3 hours to obtain a uniform and viscous polyimide. A precursor solution was obtained. When calculated from the charged amount, 1,2-dimethylimidazole is 1.0 mol per 1 mol of the repeating unit of the polyimide precursor.
PTFE製メンブレンフィルターでろ過したポリイミド前駆体溶液をガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から410℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。 A polyimide precursor solution filtered through a PTFE membrane filter is applied to a glass substrate, heated in a nitrogen atmosphere (oxygen concentration 200 ppm or less) from room temperature to 410 ° C. as it is, and thermally imidized to be colorless. A transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−1に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-1.
〔実施例5〕
1,2−ジメチルイミダゾール 1.92g(20.0ミリモル)とN−メチル−2−ピロリドン 0.38gを反応容器に加え均一な溶液を得た。その溶液に合成例1で得られたワニスA 33.76g(ワニスA中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加え、室温で3時間攪拌し、均一で粘稠なポリイミド前駆体溶液を得た。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対する1,2−ジメチルイミダゾールは2.0モルである。Example 5
1.92 g (20.0 mmol) of 1,2-dimethylimidazole and 0.38 g of N-methyl-2-pyrrolidone were added to the reaction vessel to obtain a uniform solution. 33.76 g of varnish A obtained in Synthesis Example 1 (10 mmol with respect to the molecular weight of the repeating unit of the polyimide precursor in varnish A) was added to the solution, and the mixture was stirred at room temperature for 3 hours to obtain a uniform and viscous polyimide. A precursor solution was obtained. When calculated from the charged amount, the amount of 1,2-dimethylimidazole relative to 1 mol of the repeating unit of the polyimide precursor is 2.0 mol.
PTFE製メンブレンフィルターでろ過したポリイミド前駆体溶液をガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から410℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。 A polyimide precursor solution filtered through a PTFE membrane filter is applied to a glass substrate, heated in a nitrogen atmosphere (oxygen concentration 200 ppm or less) from room temperature to 410 ° C. as it is, and thermally imidized to be colorless. A transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−1に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-1.
〔実施例6〕
1−メチルイミダゾール 0.04g(0.5ミリモル)とN−メチル−2−ピロリドン 0.04gを反応容器に加え均一な溶液を得た。その溶液に合成例1で得られたワニスA 33.76g(ワニスA中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加え、室温で3時間攪拌し、均一で粘稠なポリイミド前駆体溶液を得た。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対する1−メチルイミダゾールは0.05モルである。Example 6
A uniform solution was obtained by adding 0.04 g (0.5 mmol) of 1-methylimidazole and 0.04 g of N-methyl-2-pyrrolidone to the reaction vessel. 33.76 g of varnish A obtained in Synthesis Example 1 (10 mmol with respect to the molecular weight of the repeating unit of the polyimide precursor in varnish A) was added to the solution, and the mixture was stirred at room temperature for 3 hours to obtain a uniform and viscous polyimide. A precursor solution was obtained. When calculated from the charged amount, 1-methylimidazole is 0.05 mol with respect to 1 mol of the repeating unit of the polyimide precursor.
PTFE製メンブレンフィルターでろ過したポリイミド前駆体溶液をガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から410℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。 A polyimide precursor solution filtered through a PTFE membrane filter is applied to a glass substrate, heated in a nitrogen atmosphere (oxygen concentration 200 ppm or less) from room temperature to 410 ° C. as it is, and thermally imidized to be colorless. A transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−1に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-1.
〔実施例7〕
1−メチルイミダゾール 0.08g(1.0ミリモル)とN−メチル−2−ピロリドン 0.08gを反応容器に加え均一な溶液を得た。その溶液に合成例1で得られたワニスA 33.76g(ワニスA中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加え、室温で3時間攪拌し、均一で粘稠なポリイミド前駆体溶液を得た。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対する1−メチルイミダゾールは0.1モルである。Example 7
0.08 g (1.0 mmol) of 1-methylimidazole and 0.08 g of N-methyl-2-pyrrolidone were added to the reaction vessel to obtain a uniform solution. 33.76 g of varnish A obtained in Synthesis Example 1 (10 mmol with respect to the molecular weight of the repeating unit of the polyimide precursor in varnish A) was added to the solution, and the mixture was stirred at room temperature for 3 hours to obtain a uniform and viscous polyimide. A precursor solution was obtained. When calculated from the charged amount, 1-methylimidazole is 0.1 mol per 1 mol of the repeating unit of the polyimide precursor.
PTFE製メンブレンフィルターでろ過したポリイミド前駆体溶液をガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から410℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。 A polyimide precursor solution filtered through a PTFE membrane filter is applied to a glass substrate, heated in a nitrogen atmosphere (oxygen concentration 200 ppm or less) from room temperature to 410 ° C. as it is, and thermally imidized to be colorless. A transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−1に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-1.
〔実施例8〕
1−メチルイミダゾール 0.16g(2.0ミリモル)とN−メチル−2−ピロリドン 0.16gを反応容器に加え均一な溶液を得た。その溶液に合成例1で得られたワニスA 33.76g(ワニスA中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加え、室温で3時間攪拌し、均一で粘稠なポリイミド前駆体溶液を得た。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対する1−メチルイミダゾールは0.2モルである。Example 8
A uniform solution was obtained by adding 0.16 g (2.0 mmol) of 1-methylimidazole and 0.16 g of N-methyl-2-pyrrolidone to the reaction vessel. 33.76 g of varnish A obtained in Synthesis Example 1 (10 mmol with respect to the molecular weight of the repeating unit of the polyimide precursor in varnish A) was added to the solution, and the mixture was stirred at room temperature for 3 hours to obtain a uniform and viscous polyimide. A precursor solution was obtained. When calculated from the charged amount, 1-methylimidazole is 0.2 mol per 1 mol of the repeating unit of the polyimide precursor.
PTFE製メンブレンフィルターでろ過したポリイミド前駆体溶液をガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から410℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。 A polyimide precursor solution filtered through a PTFE membrane filter is applied to a glass substrate, heated in a nitrogen atmosphere (oxygen concentration 200 ppm or less) from room temperature to 410 ° C. as it is, and thermally imidized to be colorless. A transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−1に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-1.
〔実施例9〕
1−メチルイミダゾール 0.33g(4.0ミリモル)とN−メチル−2−ピロリドン 0.33gを反応容器に加え均一な溶液を得た。その溶液に合成例1で得られたワニスA 33.76g(ワニスA中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加え、室温で3時間攪拌し、均一で粘稠なポリイミド前駆体溶液を得た。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対する1−メチルイミダゾールは0.4モルである。Example 9
A uniform solution was obtained by adding 0.33 g (4.0 mmol) of 1-methylimidazole and 0.33 g of N-methyl-2-pyrrolidone to the reaction vessel. 33.76 g of varnish A obtained in Synthesis Example 1 (10 mmol with respect to the molecular weight of the repeating unit of the polyimide precursor in varnish A) was added to the solution, and the mixture was stirred at room temperature for 3 hours to obtain a uniform and viscous polyimide. A precursor solution was obtained. When calculated from the charged amount, 1-methylimidazole is 0.4 mol per 1 mol of the repeating unit of the polyimide precursor.
PTFE製メンブレンフィルターでろ過したポリイミド前駆体溶液をガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から410℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。 A polyimide precursor solution filtered through a PTFE membrane filter is applied to a glass substrate, heated in a nitrogen atmosphere (oxygen concentration 200 ppm or less) from room temperature to 410 ° C. as it is, and thermally imidized to be colorless. A transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−1に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-1.
〔実施例10〕
2−メチルイミダゾール 0.16g(2.0ミリモル)とN−メチル−2−ピロリドン 0.16gを反応容器に加え均一な溶液を得た。その溶液に合成例1で得られたワニスA 33.76g(ワニスA中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加え、室温で3時間攪拌し、均一で粘稠なポリイミド前駆体溶液を得た。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対する2−メチルイミダゾールは0.2モルである。Example 10
0.16 g (2.0 mmol) of 2-methylimidazole and 0.16 g of N-methyl-2-pyrrolidone were added to the reaction vessel to obtain a uniform solution. 33.76 g of varnish A obtained in Synthesis Example 1 (10 mmol with respect to the molecular weight of the repeating unit of the polyimide precursor in varnish A) was added to the solution, and the mixture was stirred at room temperature for 3 hours to obtain a uniform and viscous polyimide. A precursor solution was obtained. When calculated from the charged amount, the amount of 2-methylimidazole relative to 1 mol of the repeating unit of the polyimide precursor is 0.2 mol.
PTFE製メンブレンフィルターでろ過したポリイミド前駆体溶液をガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から410℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。 A polyimide precursor solution filtered through a PTFE membrane filter is applied to a glass substrate, heated in a nitrogen atmosphere (oxygen concentration 200 ppm or less) from room temperature to 410 ° C. as it is, and thermally imidized to be colorless. A transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−1に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-1.
〔実施例11〕
イミダゾール 0.14g(2.0ミリモル)とN−メチル−2−ピロリドン 0.14gを反応容器に加え均一な溶液を得た。その溶液に合成例1で得られたワニスA 33.76g(ワニスA中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加え、室温で3時間攪拌し、均一で粘稠なポリイミド前駆体溶液を得た。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対する、イミダゾールは0.2モルである。Example 11
0.14 g (2.0 mmol) of imidazole and 0.14 g of N-methyl-2-pyrrolidone were added to the reaction vessel to obtain a uniform solution. 33.76 g of varnish A obtained in Synthesis Example 1 (10 mmol with respect to the molecular weight of the repeating unit of the polyimide precursor in varnish A) was added to the solution, and the mixture was stirred at room temperature for 3 hours to obtain a uniform and viscous polyimide. A precursor solution was obtained. When calculated from the charged amount, imidazole is 0.2 mol with respect to 1 mol of the repeating unit of the polyimide precursor.
PTFE製メンブレンフィルターでろ過したポリイミド前駆体溶液をガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から410℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。 A polyimide precursor solution filtered through a PTFE membrane filter is applied to a glass substrate, heated in a nitrogen atmosphere (oxygen concentration 200 ppm or less) from room temperature to 410 ° C. as it is, and thermally imidized to be colorless. A transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−1に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-1.
〔実施例12〕
2−フェニルイミダゾール 0.29g(2.0ミリモル)とN−メチル−2−ピロリドン 0.29gを反応容器に加え均一な溶液を得た。その溶液に合成例1で得られたワニスA 33.76g(ワニスA中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加え、室温で3時間攪拌し、均一で粘稠なポリイミド前駆体溶液を得た。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対する、2−フェニルイミダゾールは0.2モルである。Example 12
0.29 g (2.0 mmol) of 2-phenylimidazole and 0.29 g of N-methyl-2-pyrrolidone were added to the reaction vessel to obtain a uniform solution. 33.76 g of varnish A obtained in Synthesis Example 1 (10 mmol with respect to the molecular weight of the repeating unit of the polyimide precursor in varnish A) was added to the solution, and the mixture was stirred at room temperature for 3 hours to obtain a uniform and viscous polyimide. A precursor solution was obtained. When calculated from the charged amount, 2-phenylimidazole is 0.2 mol with respect to 1 mol of the repeating unit of the polyimide precursor.
PTFE製メンブレンフィルターでろ過したポリイミド前駆体溶液をガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から410℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。 A polyimide precursor solution filtered through a PTFE membrane filter is applied to a glass substrate, heated in a nitrogen atmosphere (oxygen concentration 200 ppm or less) from room temperature to 410 ° C. as it is, and thermally imidized to be colorless. A transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−1に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-1.
〔実施例13〕
ベンゾイミダゾール 0.24g(2.0ミリモル)とN−メチル−2−ピロリドン 0.24gを反応容器に加え均一な溶液を得た。その溶液に合成例1で得られたワニスA 33.76g(ワニスA中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加え、室温で3時間攪拌し、均一で粘稠なポリイミド前駆体溶液を得た。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対する、ベンゾイミダゾールは0.2モルである。Example 13
A uniform solution was obtained by adding 0.24 g (2.0 mmol) of benzimidazole and 0.24 g of N-methyl-2-pyrrolidone to the reaction vessel. 33.76 g of varnish A obtained in Synthesis Example 1 (10 mmol with respect to the molecular weight of the repeating unit of the polyimide precursor in varnish A) was added to the solution, and the mixture was stirred at room temperature for 3 hours to obtain a uniform and viscous polyimide. A precursor solution was obtained. Calculating from the charged amount, benzimidazole is 0.2 mol per 1 mol of the repeating unit of the polyimide precursor.
PTFE製メンブレンフィルターでろ過したポリイミド前駆体溶液をガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から410℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。 A polyimide precursor solution filtered through a PTFE membrane filter is applied to a glass substrate, heated in a nitrogen atmosphere (oxygen concentration 200 ppm or less) from room temperature to 410 ° C. as it is, and thermally imidized to be colorless. A transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−1に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-1.
〔比較例1〕
PTFE製メンブレンフィルターでろ過した合成例1で得られたワニスAをガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から410℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。[Comparative Example 1]
Varnish A obtained in Synthesis Example 1 filtered through a PTFE membrane filter was applied to a glass substrate, and heated from room temperature to 410 ° C. as it was on a glass substrate in a nitrogen atmosphere (oxygen concentration of 200 ppm or less) to thermally imidize. A colorless transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−1に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-1.
〔比較例2〕
1,2−ジメチルイミダゾール 1.92g(40.0ミリモル)とN−メチル−2−ピロリドン 0.38gを反応容器に加え均一な溶液を得た。その溶液に合成例1で得られたワニスA 33.76g(ワニスA中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加え、室温で3時間攪拌し、均一で粘稠なポリイミド前駆体溶液を得た。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対する、1,2−ジメチルイミダゾールは4.0モルである。得られたポリイミド前駆体溶液を23℃で保管すると、3日目までにポリイミド前駆体溶液がゲル化した。[Comparative Example 2]
1.92 g (40.0 mmol) of 1,2-dimethylimidazole and 0.38 g of N-methyl-2-pyrrolidone were added to the reaction vessel to obtain a uniform solution. 33.76 g of varnish A obtained in Synthesis Example 1 (10 mmol with respect to the molecular weight of the repeating unit of the polyimide precursor in varnish A) was added to the solution, and the mixture was stirred at room temperature for 3 hours to obtain a uniform and viscous polyimide. A precursor solution was obtained. When calculated from the charged amount, 1,2-dimethylimidazole is 4.0 mol per 1 mol of the repeating unit of the polyimide precursor. When the obtained polyimide precursor solution was stored at 23 ° C., the polyimide precursor solution gelled by the third day.
〔参考例1〕
1,2−ジメチルイミダゾール 0.19g(2.0ミリモル)とN−メチル−2−ピロリドン 0.19gを反応容器に加え均一な溶液を得た。その溶液に合成例1で得られたワニスA 33.76g(ワニスA中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加え、室温で3時間攪拌し、均一で粘稠なポリイミド前駆体溶液を得た。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対する、1,2−ジメチルイミダゾールは0.2モルである。[Reference Example 1]
1,9-dimethylimidazole (0.19 g, 2.0 mmol) and N-methyl-2-pyrrolidone (0.19 g) were added to the reaction vessel to obtain a uniform solution. 33.76 g of varnish A obtained in Synthesis Example 1 (10 mmol with respect to the molecular weight of the repeating unit of the polyimide precursor in varnish A) was added to the solution, and the mixture was stirred at room temperature for 3 hours to obtain a uniform and viscous polyimide. A precursor solution was obtained. When calculated from the charged amount, the amount of 1,2-dimethylimidazole is 0.2 mol per 1 mol of the repeating unit of the polyimide precursor.
PTFE製メンブレンフィルターでろ過したポリイミド前駆体溶液をガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から350℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。 A polyimide precursor solution filtered through a PTFE membrane filter is applied to a glass substrate, and heated in a nitrogen atmosphere (oxygen concentration of 200 ppm or less) from room temperature to 350 ° C. as it is, and thermally imidized. A transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−1に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-1.
〔実施例14〕
1,2−ジメチルイミダゾール 0.05g(0.5ミリモル)とN−メチル−2−ピロリドン 0.05gを反応容器に加え均一な溶液を得た。その溶液に合成例2で得られたワニスB 35.39g(ワニスB中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加え、室温で3時間攪拌し、均一で粘稠なポリイミド前駆体溶液を得た。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対する、1,2−ジメチルイミダゾールは0.05モルである。Example 14
0.05 g (0.5 mmol) of 1,2-dimethylimidazole and 0.05 g of N-methyl-2-pyrrolidone were added to the reaction vessel to obtain a uniform solution. 35.39 g of varnish B obtained in Synthesis Example 2 (10 mmol with respect to the molecular weight of the repeating unit of the polyimide precursor in varnish B) was added to the solution, and the mixture was stirred at room temperature for 3 hours to obtain a uniform and viscous polyimide. A precursor solution was obtained. When calculated from the charged amount, 1,2-dimethylimidazole is 0.05 mol per 1 mol of the repeating unit of the polyimide precursor.
PTFE製メンブレンフィルターでろ過したポリイミド前駆体溶液をガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から410℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。 A polyimide precursor solution filtered through a PTFE membrane filter is applied to a glass substrate, heated in a nitrogen atmosphere (oxygen concentration 200 ppm or less) from room temperature to 410 ° C. as it is, and thermally imidized to be colorless. A transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−2に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-2.
〔実施例15〕
1,2−ジメチルイミダゾール 0.10g(1.0ミリモル)とN−メチル−2−ピロリドン 0.10gを反応容器に加え均一な溶液を得た。その溶液に合成例2で得られたワニスB 35.39g(ワニスB中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加え、室温で3時間攪拌し、均一で粘稠なポリイミド前駆体溶液を得た。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対する、1,2−ジメチルイミダゾールは0.1モルである。Example 15
0.10 g (1.0 mmol) of 1,2-dimethylimidazole and 0.10 g of N-methyl-2-pyrrolidone were added to the reaction vessel to obtain a uniform solution. 35.39 g of varnish B obtained in Synthesis Example 2 (10 mmol with respect to the molecular weight of the repeating unit of the polyimide precursor in varnish B) was added to the solution, and the mixture was stirred at room temperature for 3 hours to obtain a uniform and viscous polyimide. A precursor solution was obtained. When calculated from the charged amount, 1,2-dimethylimidazole is 0.1 mol with respect to 1 mol of the repeating unit of the polyimide precursor.
PTFE製メンブレンフィルターでろ過したポリイミド前駆体溶液をガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から410℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。 A polyimide precursor solution filtered through a PTFE membrane filter is applied to a glass substrate, heated in a nitrogen atmosphere (oxygen concentration 200 ppm or less) from room temperature to 410 ° C. as it is, and thermally imidized to be colorless. A transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−2に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-2.
〔実施例16〕
1,2−ジメチルイミダゾール 0.19g(2.0ミリモル)とN−メチル−2−ピロリドン 0.19gを反応容器に加え均一な溶液を得た。その溶液に合成例2で得られたワニスB 35.39g(ワニスB中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加え、室温で3時間攪拌し、均一で粘稠なポリイミド前駆体溶液を得た。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対する、1,2−ジメチルイミダゾールは0.2モルである。Example 16
1,9-dimethylimidazole (0.19 g, 2.0 mmol) and N-methyl-2-pyrrolidone (0.19 g) were added to the reaction vessel to obtain a uniform solution. 35.39 g of varnish B obtained in Synthesis Example 2 (10 mmol with respect to the molecular weight of the repeating unit of the polyimide precursor in varnish B) was added to the solution, and the mixture was stirred at room temperature for 3 hours to obtain a uniform and viscous polyimide. A precursor solution was obtained. When calculated from the charged amount, the amount of 1,2-dimethylimidazole is 0.2 mol per 1 mol of the repeating unit of the polyimide precursor.
PTFE製メンブレンフィルターでろ過したポリイミド前駆体溶液をガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から410℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。 A polyimide precursor solution filtered through a PTFE membrane filter is applied to a glass substrate, heated in a nitrogen atmosphere (oxygen concentration 200 ppm or less) from room temperature to 410 ° C. as it is, and thermally imidized to be colorless. A transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−2に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-2.
〔実施例17〕
1−メチルイミダゾール 0.16g(2.0ミリモル)とN−メチル−2−ピロリドン 0.16gを反応容器に加え均一な溶液を得た。その溶液に合成例2で得られたワニスB 35.39g(ワニスB中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加え、室温で3時間攪拌し、均一で粘稠なポリイミド前駆体溶液を得た。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対する、1−メチルイミダゾールは0.2モルである。Example 17
A uniform solution was obtained by adding 0.16 g (2.0 mmol) of 1-methylimidazole and 0.16 g of N-methyl-2-pyrrolidone to the reaction vessel. 35.39 g of varnish B obtained in Synthesis Example 2 (10 mmol with respect to the molecular weight of the repeating unit of the polyimide precursor in varnish B) was added to the solution, and the mixture was stirred at room temperature for 3 hours to obtain a uniform and viscous polyimide. A precursor solution was obtained. When calculated from the charged amount, 1-methylimidazole is 0.2 mol per 1 mol of the repeating unit of the polyimide precursor.
PTFE製メンブレンフィルターでろ過したポリイミド前駆体溶液をガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から410℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。 A polyimide precursor solution filtered through a PTFE membrane filter is applied to a glass substrate, heated in a nitrogen atmosphere (oxygen concentration 200 ppm or less) from room temperature to 410 ° C. as it is, and thermally imidized to be colorless. A transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−2に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-2.
〔比較例3〕
PTFE製メンブレンフィルターでろ過した合成例2で得られたワニスBをガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から410℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。[Comparative Example 3]
Varnish B obtained in Synthesis Example 2 filtered through a PTFE membrane filter was applied to a glass substrate, and heated from room temperature to 410 ° C. as it was on a glass substrate in a nitrogen atmosphere (oxygen concentration of 200 ppm or less) to thermally imidize. A colorless transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−2に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-2.
〔比較例4〕
2−エチル−2−イミダゾリン 0.10g(1.0ミリモル)とN−メチル−2−ピロリドン 0.20gを反応容器に加え均一な溶液を得た。その溶液に合成例2で得られたワニスB 35.39g(ワニスB中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加え、室温で3時間攪拌し、均一で粘稠なポリイミド前駆体溶液を得た。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対する、2−エチル−2−イミダゾリンは0.1モルである。[Comparative Example 4]
0.10 g (1.0 mmol) of 2-ethyl-2-imidazoline and 0.20 g of N-methyl-2-pyrrolidone were added to the reaction vessel to obtain a uniform solution. 35.39 g of varnish B obtained in Synthesis Example 2 (10 mmol with respect to the molecular weight of the repeating unit of the polyimide precursor in varnish B) was added to the solution, and the mixture was stirred at room temperature for 3 hours to obtain a uniform and viscous polyimide. A precursor solution was obtained. When calculated from the charged amount, 2-ethyl-2-imidazoline is 0.1 mol with respect to 1 mol of the repeating unit of the polyimide precursor.
PTFE製メンブレンフィルターでろ過したポリイミド前駆体溶液をガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から410℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。 A polyimide precursor solution filtered through a PTFE membrane filter is applied to a glass substrate, heated in a nitrogen atmosphere (oxygen concentration 200 ppm or less) from room temperature to 410 ° C. as it is, and thermally imidized to be colorless. A transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−2に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-2.
〔比較例5〕
2−エチル−2−イミダゾリン 0.20g(2.0ミリモル)とN−メチル−2−ピロリドン 0.40gを反応容器に加え均一な溶液を得た。その溶液に合成例2で得られたワニスB 35.39g(ワニスB中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加えるとワニスがゲル化した。そのまま室温で3時間攪拌しても、均一なポリイミド前駆体溶液を得られなかった。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対する、2−エチル−2−イミダゾリンは0.2モルである。[Comparative Example 5]
0.20 g (2.0 mmol) of 2-ethyl-2-imidazoline and 0.40 g of N-methyl-2-pyrrolidone were added to the reaction vessel to obtain a uniform solution. When 35.39 g of varnish B obtained in Synthesis Example 2 (10 mmol relative to the molecular weight of the polyimide precursor repeating unit in varnish B) was added to the solution, the varnish gelled. Even if it was stirred at room temperature for 3 hours, a uniform polyimide precursor solution could not be obtained. When calculated from the charged amount, 2-ethyl-2-imidazoline is 0.2 mol per 1 mol of the repeating unit of the polyimide precursor.
〔比較例6〕
2−エチル−2−イミダゾリン 0.49g(5.0ミリモル)とN−メチル−2−ピロリドン 0.98gを反応容器に加え均一な溶液を得た。その溶液に合成例2で得られたワニスB 35.39g(ワニスB中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加えるとワニスがゲル化した。そのまま室温で3時間攪拌しても、均一なポリイミド前駆体溶液を得られなかった。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対する、2−エチル−2−イミダゾリンは0.5モルである。[Comparative Example 6]
0.49 g (5.0 mmol) of 2-ethyl-2-imidazoline and 0.98 g of N-methyl-2-pyrrolidone were added to the reaction vessel to obtain a uniform solution. When 35.39 g of varnish B obtained in Synthesis Example 2 (10 mmol relative to the molecular weight of the polyimide precursor repeating unit in varnish B) was added to the solution, the varnish gelled. Even if it was stirred at room temperature for 3 hours, a uniform polyimide precursor solution could not be obtained. When calculated from the charged amount, the amount of 2-ethyl-2-imidazoline is 0.5 mol with respect to 1 mol of the repeating unit of the polyimide precursor.
〔比較例7〕
2−メチル−2−イミダゾリン 0.25g(3.0ミリモル)とN−メチル−2−ピロリドン 0.25gを反応容器に加え均一な溶液を得た。その溶液に合成例2で得られたワニスB 35.39g(ワニスB中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加え、室温で3時間攪拌し、均一で粘稠なポリイミド前駆体溶液を得た。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対する、2−メチル−2−イミダゾリンは0.3モルである。[Comparative Example 7]
0.25 g (3.0 mmol) of 2-methyl-2-imidazoline and 0.25 g of N-methyl-2-pyrrolidone were added to the reaction vessel to obtain a uniform solution. 35.39 g of varnish B obtained in Synthesis Example 2 (10 mmol with respect to the molecular weight of the repeating unit of the polyimide precursor in varnish B) was added to the solution, and the mixture was stirred at room temperature for 3 hours to obtain a uniform and viscous polyimide. A precursor solution was obtained. When calculated from the charged amount, the amount of 2-methyl-2-imidazoline is 0.3 mol with respect to 1 mol of the repeating unit of the polyimide precursor.
PTFE製メンブレンフィルターでろ過したポリイミド前駆体溶液をガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から410℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。 A polyimide precursor solution filtered through a PTFE membrane filter is applied to a glass substrate, heated in a nitrogen atmosphere (oxygen concentration 200 ppm or less) from room temperature to 410 ° C. as it is, and thermally imidized to be colorless. A transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−2に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-2.
〔比較例8〕
2−フェニルイミダゾリン 0.44g(3.0ミリモル)とN−メチル−2−ピロリドン 0.44gを反応容器に加え均一な溶液を得た。その溶液に合成例2で得られたワニスB 35.39g(ワニスB中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加え、室温で3時間攪拌し、均一で粘稠なポリイミド前駆体溶液を得た。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対する、2−フェニルイミダゾリンは0.3モルである。[Comparative Example 8]
0.44 g (3.0 mmol) of 2-phenylimidazoline and 0.44 g of N-methyl-2-pyrrolidone were added to the reaction vessel to obtain a uniform solution. 35.39 g of varnish B obtained in Synthesis Example 2 (10 mmol with respect to the molecular weight of the repeating unit of the polyimide precursor in varnish B) was added to the solution, and the mixture was stirred at room temperature for 3 hours to obtain a uniform and viscous polyimide. A precursor solution was obtained. When calculated from the amount charged, 2-phenylimidazoline is 0.3 mol per 1 mol of the repeating unit of the polyimide precursor.
PTFE製メンブレンフィルターでろ過したポリイミド前駆体溶液をガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から410℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。 A polyimide precursor solution filtered through a PTFE membrane filter is applied to a glass substrate, heated in a nitrogen atmosphere (oxygen concentration 200 ppm or less) from room temperature to 410 ° C. as it is, and thermally imidized to be colorless. A transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−2に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-2.
〔実施例18〕
1,2−ジメチルイミダゾール 0.10g(1.0ミリモル)とN−メチル−2−ピロリドン 0.10gを反応容器に加え均一な溶液を得た。その溶液に合成例3で得られたワニスC 38.23g(ワニスC中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加え、室温で3時間攪拌し、均一で粘稠なポリイミド前駆体溶液を得た。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対する、1,2−ジメチルイミダゾールは0.1モルである。Example 18
0.10 g (1.0 mmol) of 1,2-dimethylimidazole and 0.10 g of N-methyl-2-pyrrolidone were added to the reaction vessel to obtain a uniform solution. To the solution, 38.23 g of varnish C obtained in Synthesis Example 3 (10 mmol with respect to the molecular weight of the repeating unit of the polyimide precursor in varnish C) was added and stirred at room temperature for 3 hours to obtain a uniform and viscous polyimide. A precursor solution was obtained. When calculated from the charged amount, 1,2-dimethylimidazole is 0.1 mol with respect to 1 mol of the repeating unit of the polyimide precursor.
PTFE製メンブレンフィルターでろ過したポリイミド前駆体溶液をガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から410℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。 A polyimide precursor solution filtered through a PTFE membrane filter is applied to a glass substrate, heated in a nitrogen atmosphere (oxygen concentration 200 ppm or less) from room temperature to 410 ° C. as it is, and thermally imidized to be colorless. A transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−3に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-3.
〔比較例9〕
PTFE製メンブレンフィルターでろ過した合成例3で得られたワニスCをガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から410℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。[Comparative Example 9]
Varnish C obtained in Synthesis Example 3 filtered through a PTFE membrane filter was applied to a glass substrate, and heated from room temperature to 410 ° C. on a glass substrate in a nitrogen atmosphere (oxygen concentration of 200 ppm or less) to thermally imidize. A colorless transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−3に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-3.
〔実施例19〕
1,2−ジメチルイミダゾール 0.10g(1.0ミリモル)とN−メチル−2−ピロリドン 0.10gを反応容器に加え均一な溶液を得た。その溶液に合成例4で得られたワニスD 35.99g(ワニスD中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加え、室温で3時間攪拌し、均一で粘稠なポリイミド前駆体溶液を得た。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対する、1,2−ジメチルイミダゾールは0.1モルである。Example 19
0.10 g (1.0 mmol) of 1,2-dimethylimidazole and 0.10 g of N-methyl-2-pyrrolidone were added to the reaction vessel to obtain a uniform solution. To the solution, 35.99 g of varnish D obtained in Synthesis Example 4 (10 mmol with respect to the molecular weight of the repeating unit of the polyimide precursor in varnish D) was added and stirred at room temperature for 3 hours to obtain a uniform and viscous polyimide. A precursor solution was obtained. When calculated from the charged amount, 1,2-dimethylimidazole is 0.1 mol with respect to 1 mol of the repeating unit of the polyimide precursor.
PTFE製メンブレンフィルターでろ過したポリイミド前駆体溶液をガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から410℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。 A polyimide precursor solution filtered through a PTFE membrane filter is applied to a glass substrate, heated in a nitrogen atmosphere (oxygen concentration 200 ppm or less) from room temperature to 410 ° C. as it is, and thermally imidized to be colorless. A transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−3に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-3.
〔比較例10〕
PTFE製メンブレンフィルターでろ過した合成例4で得られたワニスDをガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から410℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。[Comparative Example 10]
The varnish D obtained in Synthesis Example 4 filtered through a PTFE membrane filter was applied to a glass substrate, and heated from room temperature to 410 ° C. as it was on a glass substrate in a nitrogen atmosphere (oxygen concentration of 200 ppm or less) to thermally imidize. A colorless transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−3に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-3.
〔実施例20〕
1,2−ジメチルイミダゾール 0.10g(1.0ミリモル)とN−メチル−2−ピロリドン 0.10gを反応容器に加え均一な溶液を得た。その溶液に合成例5で得られたワニスE 35.09g(ワニスE中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加え、室温で3時間攪拌し、均一で粘稠なポリイミド前駆体溶液を得た。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対する、1,2−ジメチルイミダゾールは0.1モルである。Example 20
0.10 g (1.0 mmol) of 1,2-dimethylimidazole and 0.10 g of N-methyl-2-pyrrolidone were added to the reaction vessel to obtain a uniform solution. To the solution was added 35.09 g of varnish E obtained in Synthesis Example 5 (10 mmol with respect to the molecular weight of the repeating unit of the polyimide precursor in varnish E), and the mixture was stirred at room temperature for 3 hours to obtain a uniform and viscous polyimide. A precursor solution was obtained. When calculated from the charged amount, 1,2-dimethylimidazole is 0.1 mol with respect to 1 mol of the repeating unit of the polyimide precursor.
PTFE製メンブレンフィルターでろ過したポリイミド前駆体溶液をガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から410℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。 A polyimide precursor solution filtered through a PTFE membrane filter is applied to a glass substrate, heated in a nitrogen atmosphere (oxygen concentration 200 ppm or less) from room temperature to 410 ° C. as it is, and thermally imidized to be colorless. A transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−3に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-3.
〔比較例11〕
PTFE製メンブレンフィルターでろ過した合成例5で得られたワニスEをガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から410℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。[Comparative Example 11]
Varnish E obtained in Synthesis Example 5 filtered through a PTFE membrane filter was applied to a glass substrate, and heated from room temperature to 410 ° C. as it was on a glass substrate in a nitrogen atmosphere (oxygen concentration of 200 ppm or less) to thermally imidize. A colorless transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−3に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-3.
〔実施例21〕
1,2−ジメチルイミダゾール 0.19g(2.0ミリモル)とN−メチル−2−ピロリドン 0.19gを反応容器に加え均一な溶液を得た。その溶液に合成例6で得られたワニスF 24.97g(ワニスF中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加え、室温で3時間攪拌し、均一で粘稠なポリイミド前駆体溶液を得た。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対する、1,2−ジメチルイミダゾールは0.2モルである。Example 21
1,9-dimethylimidazole (0.19 g, 2.0 mmol) and N-methyl-2-pyrrolidone (0.19 g) were added to the reaction vessel to obtain a uniform solution. 24.97 g of varnish F obtained in Synthesis Example 6 (10 mmol with respect to the molecular weight of the repeating unit of the polyimide precursor in varnish F) was added to the solution, and the mixture was stirred at room temperature for 3 hours to obtain a uniform and viscous polyimide. A precursor solution was obtained. When calculated from the charged amount, the amount of 1,2-dimethylimidazole is 0.2 mol per 1 mol of the repeating unit of the polyimide precursor.
PTFE製メンブレンフィルターでろ過したポリイミド前駆体溶液をガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から400℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。 A polyimide precursor solution filtered through a PTFE membrane filter is applied to a glass substrate, and heated in a nitrogen atmosphere (oxygen concentration of 200 ppm or less) from room temperature to 400 ° C. as it is, and thermally imidized to be colorless. A transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−3に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-3.
〔比較例12〕
PTFE製メンブレンフィルターでろ過した合成例6で得られたワニスFをガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から400℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。[Comparative Example 12]
Varnish F obtained in Synthesis Example 6 filtered through a PTFE membrane filter was applied to a glass substrate, and heated from room temperature to 400 ° C. directly on the glass substrate in a nitrogen atmosphere (oxygen concentration 200 ppm or less) to thermally imidize. A colorless transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−3に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-3.
〔実施例22〕
1,2−ジメチルイミダゾール 0.19g(2.0ミリモル)とN−メチル−2−ピロリドン 0.19gを反応容器に加え均一な溶液を得た。その溶液に合成例7で得られたワニスG 37.04g(ワニスG中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加え、室温で3時間攪拌し、均一で粘稠なポリイミド前駆体溶液を得た。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対する、1,2−ジメチルイミダゾールは0.2モルである。[Example 22]
1,9-dimethylimidazole (0.19 g, 2.0 mmol) and N-methyl-2-pyrrolidone (0.19 g) were added to the reaction vessel to obtain a uniform solution. 37.04 g of varnish G obtained in Synthesis Example 7 (10 mmol with respect to the molecular weight of the polyimide precursor repeating unit in varnish G) was added to the solution, and the mixture was stirred at room temperature for 3 hours to obtain a uniform and viscous polyimide. A precursor solution was obtained. When calculated from the charged amount, the amount of 1,2-dimethylimidazole is 0.2 mol per 1 mol of the repeating unit of the polyimide precursor.
PTFE製メンブレンフィルターでろ過したポリイミド前駆体溶液をガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から350℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。 A polyimide precursor solution filtered through a PTFE membrane filter is applied to a glass substrate, and heated in a nitrogen atmosphere (oxygen concentration of 200 ppm or less) from room temperature to 350 ° C. as it is, and thermally imidized. A transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−3に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-3.
〔比較例13〕
PTFE製メンブレンフィルターでろ過した合成例7で得られたワニスGをガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から350℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。[Comparative Example 13]
Varnish G obtained in Synthesis Example 7 filtered through a PTFE membrane filter was applied to a glass substrate, and heated from room temperature to 350 ° C. as it was on a glass substrate in a nitrogen atmosphere (oxygen concentration of 200 ppm or less) to thermally imidize. A colorless transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−3に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-3.
〔実施例23〕
1,2−ジメチルイミダゾール 0.19g(2.0ミリモル)とN−メチル−2−ピロリドン 0.19gを反応容器に加え均一な溶液を得た。その溶液に合成例8で得られたワニスH 33.53g(ワニスH中のポリイミド前駆体の繰返しユニットの分子量に対して、10ミリモル)加え、室温で3時間攪拌し、均一で粘稠なポリイミド前駆体溶液を得た。仕込み量から計算すると、ポリイミド前駆体の繰り返し単位1モルに対する、1,2−ジメチルイミダゾールは0.2モルである。Example 23
1,9-dimethylimidazole (0.19 g, 2.0 mmol) and N-methyl-2-pyrrolidone (0.19 g) were added to the reaction vessel to obtain a uniform solution. 33.53 g of varnish H obtained in Synthesis Example 8 (10 mmol with respect to the molecular weight of the polyimide precursor repeating unit in varnish H) was added to the solution, and the mixture was stirred at room temperature for 3 hours to obtain a uniform and viscous polyimide. A precursor solution was obtained. When calculated from the charged amount, the amount of 1,2-dimethylimidazole is 0.2 mol per 1 mol of the repeating unit of the polyimide precursor.
PTFE製メンブレンフィルターでろ過したポリイミド前駆体溶液をガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から370℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。 A polyimide precursor solution filtered through a PTFE membrane filter is applied to a glass substrate, and heated in a nitrogen atmosphere (oxygen concentration of 200 ppm or less) from room temperature to 370 ° C. as it is, and thermally imidized to be colorless. A transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−3に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-3.
〔比較例14〕
PTFE製メンブレンフィルターでろ過した合成例8で得られたワニスHをガラス基板に塗布し、窒素雰囲気下(酸素濃度200ppm以下)、そのままガラス基板上で室温から370℃まで加熱して熱的にイミド化を行い、無色透明なポリイミドフィルム/ガラス積層体を得た。次いで、得られたポリイミドフィルム/ガラス積層体を水に浸漬した後剥離し、乾燥して、膜厚が約10μmのポリイミドフィルムを得た。[Comparative Example 14]
Varnish H obtained in Synthesis Example 8 filtered through a PTFE membrane filter was applied to a glass substrate and heated from room temperature to 370 ° C. as it was on a glass substrate in a nitrogen atmosphere (oxygen concentration of 200 ppm or less) to thermally imidize. A colorless transparent polyimide film / glass laminate was obtained. Next, the obtained polyimide film / glass laminate was immersed in water and then peeled off and dried to obtain a polyimide film having a film thickness of about 10 μm.
このポリイミドフィルムの特性を測定した結果を表2−3に示す。 The result of having measured the characteristic of this polyimide film is shown in Table 2-3.
表2−1〜2−3に示した結果から、イミダゾール系化合物(1,2−ジメチルイミダゾール、1−メチルイミダゾール、2−メチルイミダゾール、2−フェニルイミダゾール、ベンゾイミダゾール、またはイミダゾール)を含むポリイミド前駆体組成物から得られたポリイミドは、厚み方向位相差が小さいことが分かる(実施例1〜13と比較例1、実施例14〜17と比較例3、実施例18と比較例9、実施例19と比較例10、実施例20と比較例11、実施例21と比較例12、実施例22と比較例13、実施例23と比較例14)。また、1,2−ジメチルイミダゾール、1−メチルイミダゾール、2−メチルイミダゾール、またはイミダゾールを用いた場合には、透過率も向上していることが分かる(実施例1〜11と比較例1、実施例14〜17と比較例3、実施例18と比較例9、実施例19と比較例10、実施例20と比較例11、実施例21と比較例12、実施例22と比較例13、実施例23と比較例14)。さらに、イミダゾール系化合物の含有量が、ポリイミド前駆体の繰り返し単位1モルに対して4モル未満であると、保存安定性にも優れることが分かる(実施例1〜13と比較例2)。また、機械的特性に関して、イミド化のための加熱処理の最高加熱温度を350℃を超えて410℃とすることで、破断点伸度が大きくなることが分かる(実施例3と参考例1)。 From the results shown in Tables 2-1 to 2-3, a polyimide precursor containing an imidazole compound (1,2-dimethylimidazole, 1-methylimidazole, 2-methylimidazole, 2-phenylimidazole, benzimidazole, or imidazole). It can be seen that the polyimide obtained from the body composition has a small thickness direction retardation (Examples 1 to 13 and Comparative Example 1, Examples 14 to 17 and Comparative Example 3, Example 18 and Comparative Example 9, Example) 19 and Comparative Example 10, Example 20 and Comparative Example 11, Example 21 and Comparative Example 12, Example 22 and Comparative Example 13, Example 23 and Comparative Example 14). Moreover, when 1, 2- dimethylimidazole, 1-methylimidazole, 2-methylimidazole, or imidazole is used, it turns out that the transmittance | permeability is also improved (Examples 1-11 and Comparative Example 1, implementation). Examples 14 to 17 and Comparative Example 3, Example 18 and Comparative Example 9, Example 19 and Comparative Example 10, Example 20 and Comparative Example 11, Example 21 and Comparative Example 12, Example 22 and Comparative Example 13, Example Example 23 and Comparative Example 14). Furthermore, it turns out that it is excellent also in storage stability as content of an imidazole type compound is less than 4 mol with respect to 1 mol of repeating units of a polyimide precursor (Examples 1-13 and Comparative Example 2). Moreover, regarding the mechanical properties, it can be seen that the elongation at break increases by setting the maximum heating temperature of the heat treatment for imidization to 410 ° C. exceeding 350 ° C. (Example 3 and Reference Example 1). .
前記のとおり、本発明のポリイミド前駆体組成物から得られたポリイミドは、厚み方向位相差が小さいことに加え、優れた光透過性、機械的特性、低線熱膨張係数を有しており。本発明のポリイミドフィルムは、ディスプレイ用途などの無色透明で微細な回路形成可能な透明基板として好適に用いることができる。 As described above, the polyimide obtained from the polyimide precursor composition of the present invention has excellent light transmittance, mechanical properties, and low linear thermal expansion coefficient in addition to a small thickness direction retardation. The polyimide film of the present invention can be suitably used as a transparent substrate that is colorless and transparent and capable of forming a fine circuit, such as for display applications.
本発明によって、透明性に優れるポリイミドであって、同一組成でも厚み方向位相差がより小さいポリイミド、または、厚み方向位相差が小さく、透明性に優れ、機械的特性にも優れたポリイミドが得られるポリイミド前駆体組成物(ポリイミド前駆体を含む溶液組成物)、及びポリイミドの製造方法を提供することができる。このポリイミド前駆体組成物から得られるポリイミドは、透明性が高く、且つ厚み方向位相差が小さく、また、低線熱膨張係数であって微細な回路の形成が容易であるので、特にディスプレイ用、タッチパネル用、太陽電池用などの基板を形成するために好適に用いることができる。 According to the present invention, a polyimide having excellent transparency and having a smaller thickness direction retardation even in the same composition, or a polyimide having a small thickness direction retardation, excellent transparency, and excellent mechanical properties can be obtained. A polyimide precursor composition (solution composition containing a polyimide precursor) and a method for producing polyimide can be provided. The polyimide obtained from this polyimide precursor composition is highly transparent and has a small thickness direction retardation, and also has a low linear thermal expansion coefficient and facilitates the formation of fine circuits. It can be suitably used for forming substrates for touch panels, solar cells, and the like.
Claims (12)
イミダゾール系化合物を含み、
イミダゾール系化合物の含有量が、ポリイミド前駆体の繰り返し単位1モルに対して4モル未満であることを特徴とするポリイミド前駆体組成物。
Including imidazole compounds,
Content of an imidazole type compound is less than 4 mol with respect to 1 mol of repeating units of a polyimide precursor, The polyimide precursor composition characterized by the above-mentioned.
基材上のポリイミド前駆体組成物を、最高加熱温度350℃超で加熱処理して、ポリイミド前駆体をイミド化する工程と
を有することを特徴とする請求項6に記載のポリイミドの製造方法。Applying the polyimide precursor composition according to any one of claims 1 to 5 on a substrate;
The method for producing polyimide according to claim 6, further comprising a step of heat-treating the polyimide precursor composition on the substrate at a maximum heating temperature exceeding 350 ° C. to imidize the polyimide precursor.
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