JPS63314537A - Photosensitive resin composition - Google Patents
Photosensitive resin compositionInfo
- Publication number
- JPS63314537A JPS63314537A JP788488A JP788488A JPS63314537A JP S63314537 A JPS63314537 A JP S63314537A JP 788488 A JP788488 A JP 788488A JP 788488 A JP788488 A JP 788488A JP S63314537 A JPS63314537 A JP S63314537A
- Authority
- JP
- Japan
- Prior art keywords
- water
- monomer
- copolymer
- mol
- composition according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011342 resin composition Substances 0.000 title claims description 17
- 239000000178 monomer Substances 0.000 claims abstract description 77
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 37
- 229920002451 polyvinyl alcohol Polymers 0.000 claims abstract description 32
- 239000004372 Polyvinyl alcohol Substances 0.000 claims abstract description 31
- 229920001577 copolymer Polymers 0.000 claims abstract description 26
- 239000000203 mixture Substances 0.000 claims abstract description 26
- 229920001567 vinyl ester resin Polymers 0.000 claims abstract description 26
- 125000003396 thiol group Chemical group [H]S* 0.000 claims abstract description 21
- 238000007127 saponification reaction Methods 0.000 claims abstract description 18
- 239000002253 acid Substances 0.000 claims abstract description 13
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 11
- 239000003999 initiator Substances 0.000 claims abstract description 5
- 238000006116 polymerization reaction Methods 0.000 claims description 20
- 150000002148 esters Chemical group 0.000 claims description 13
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 claims description 11
- 239000012943 hotmelt Substances 0.000 claims description 11
- 229920005989 resin Polymers 0.000 claims description 11
- 239000011347 resin Substances 0.000 claims description 11
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical group CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 claims description 8
- DUYAAUVXQSMXQP-UHFFFAOYSA-N ethanethioic S-acid Chemical compound CC(S)=O DUYAAUVXQSMXQP-UHFFFAOYSA-N 0.000 claims description 8
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 6
- 238000007639 printing Methods 0.000 claims description 6
- FWFUWXVFYKCSQA-UHFFFAOYSA-M sodium;2-methyl-2-(prop-2-enoylamino)propane-1-sulfonate Chemical compound [Na+].[O-]S(=O)(=O)CC(C)(C)NC(=O)C=C FWFUWXVFYKCSQA-UHFFFAOYSA-M 0.000 claims description 6
- 230000000977 initiatory effect Effects 0.000 claims description 5
- 238000000465 moulding Methods 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- 125000002947 alkylene group Chemical group 0.000 claims description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 239000004615 ingredient Substances 0.000 claims description 2
- 238000002156 mixing Methods 0.000 claims description 2
- 238000005406 washing Methods 0.000 claims 1
- 229910052740 iodine Inorganic materials 0.000 abstract description 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 53
- 239000000243 solution Substances 0.000 description 15
- -1 ethylene, propylene, 1-butene Chemical class 0.000 description 11
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 10
- 150000003839 salts Chemical class 0.000 description 10
- 150000001875 compounds Chemical class 0.000 description 9
- 238000005481 NMR spectroscopy Methods 0.000 description 7
- 239000002202 Polyethylene glycol Substances 0.000 description 7
- 238000001035 drying Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 229920001223 polyethylene glycol Polymers 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical class CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 6
- NHGXDBSUJJNIRV-UHFFFAOYSA-M tetrabutylammonium chloride Chemical compound [Cl-].CCCC[N+](CCCC)(CCCC)CCCC NHGXDBSUJJNIRV-UHFFFAOYSA-M 0.000 description 6
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 6
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 5
- 239000010408 film Substances 0.000 description 5
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 5
- 229910052753 mercury Inorganic materials 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2,2'-azo-bis-isobutyronitrile Substances N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 230000001588 bifunctional effect Effects 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 230000014759 maintenance of location Effects 0.000 description 3
- HVAMZGADVCBITI-UHFFFAOYSA-M pent-4-enoate Chemical compound [O-]C(=O)CCC=C HVAMZGADVCBITI-UHFFFAOYSA-M 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 2
- MVYVKSBVZFBBPL-UHFFFAOYSA-N 2-(prop-2-enoylamino)propane-1-sulfonic acid Chemical compound OS(=O)(=O)CC(C)NC(=O)C=C MVYVKSBVZFBBPL-UHFFFAOYSA-N 0.000 description 2
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- CTKINSOISVBQLD-UHFFFAOYSA-N Glycidol Chemical compound OCC1CO1 CTKINSOISVBQLD-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- HETCEOQFVDFGSY-UHFFFAOYSA-N Isopropenyl acetate Chemical compound CC(=C)OC(C)=O HETCEOQFVDFGSY-UHFFFAOYSA-N 0.000 description 2
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 2
- 150000008365 aromatic ketones Chemical class 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000003912 environmental pollution Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 229960002050 hydrofluoric acid Drugs 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 2
- 229940088644 n,n-dimethylacrylamide Drugs 0.000 description 2
- YLGYACDQVQQZSW-UHFFFAOYSA-N n,n-dimethylprop-2-enamide Chemical compound CN(C)C(=O)C=C YLGYACDQVQQZSW-UHFFFAOYSA-N 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- UIIIBRHUICCMAI-UHFFFAOYSA-N prop-2-ene-1-sulfonic acid Chemical compound OS(=O)(=O)CC=C UIIIBRHUICCMAI-UHFFFAOYSA-N 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 125000000542 sulfonic acid group Chemical group 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- LGPAKRMZNPYPMG-UHFFFAOYSA-N (3-hydroxy-2-prop-2-enoyloxypropyl) prop-2-enoate Chemical compound C=CC(=O)OC(CO)COC(=O)C=C LGPAKRMZNPYPMG-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- VHVMXWZXFBOANQ-UHFFFAOYSA-N 1-Penten-3-ol Chemical compound CCC(O)C=C VHVMXWZXFBOANQ-UHFFFAOYSA-N 0.000 description 1
- PJEUJVLFQCESRL-UHFFFAOYSA-N 1-phenyl-2-thiophen-2-ylethanone Chemical compound C=1C=CC=CC=1C(=O)CC1=CC=CS1 PJEUJVLFQCESRL-UHFFFAOYSA-N 0.000 description 1
- HBFBFJVRBIGLND-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)butane-1,4-diol Chemical compound OCCC(CO)(CO)CO HBFBFJVRBIGLND-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- SCEICQWBUFWUMP-UHFFFAOYSA-N 2,4,7-trimethylocta-2,6-dienediamide Chemical compound NC(=O)C(C)=CC(C)CC=C(C)C(N)=O SCEICQWBUFWUMP-UHFFFAOYSA-N 0.000 description 1
- HXYORIGKNOKFTR-UHFFFAOYSA-N 2,6-dimethylhepta-2,5-dienediamide Chemical compound NC(=O)C(C)=CCC=C(C)C(N)=O HXYORIGKNOKFTR-UHFFFAOYSA-N 0.000 description 1
- ARKDCHXUGNPHJU-UHFFFAOYSA-N 2,7-dimethylocta-2,6-dienediamide Chemical compound NC(=O)C(C)=CCCC=C(C)C(N)=O ARKDCHXUGNPHJU-UHFFFAOYSA-N 0.000 description 1
- UIBWITKNFSWPFA-UHFFFAOYSA-N 2-(2-methylpropoxy)prop-2-enamide Chemical compound CC(C)COC(=C)C(N)=O UIBWITKNFSWPFA-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- DIVXVZXROTWKIH-UHFFFAOYSA-N 2-hydroxy-1,2-diphenylpropan-1-one Chemical compound C=1C=CC=CC=1C(O)(C)C(=O)C1=CC=CC=C1 DIVXVZXROTWKIH-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- FZHYLXLEEBXHEG-UHFFFAOYSA-N 2-methyl-3-(2-methylpropoxy)prop-2-enamide Chemical compound CC(C)COC=C(C)C(N)=O FZHYLXLEEBXHEG-UHFFFAOYSA-N 0.000 description 1
- MJPVYTKZYZPIQA-UHFFFAOYSA-N 3-thiophen-2-ylpropanoic acid Chemical compound OC(=O)CCC1=CC=CS1 MJPVYTKZYZPIQA-UHFFFAOYSA-N 0.000 description 1
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 1
- OQAOQXNFYZLMNJ-UHFFFAOYSA-N 4-methylocta-2,6-dienediamide Chemical compound NC(=O)C=CC(C)CC=CC(N)=O OQAOQXNFYZLMNJ-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 1
- UPIYXCQZCKSJJX-UHFFFAOYSA-N CCCCOCC=C(C)C(N)=O Chemical compound CCCCOCC=C(C)C(N)=O UPIYXCQZCKSJJX-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 101150112800 PE35 gene Proteins 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- 244000181025 Rosa gallica Species 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- GQPVFBDWIUVLHG-UHFFFAOYSA-N [2,2-bis(hydroxymethyl)-3-(2-methylprop-2-enoyloxy)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)(CO)COC(=O)C(C)=C GQPVFBDWIUVLHG-UHFFFAOYSA-N 0.000 description 1
- CQHKDHVZYZUZMJ-UHFFFAOYSA-N [2,2-bis(hydroxymethyl)-3-prop-2-enoyloxypropyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(CO)COC(=O)C=C CQHKDHVZYZUZMJ-UHFFFAOYSA-N 0.000 description 1
- UKMBKKFLJMFCSA-UHFFFAOYSA-N [3-hydroxy-2-(2-methylprop-2-enoyloxy)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)OC(=O)C(C)=C UKMBKKFLJMFCSA-UHFFFAOYSA-N 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 125000003158 alcohol group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O ammonium group Chemical group [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004581 coalescence Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000013039 cover film Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- GPLRAVKSCUXZTP-UHFFFAOYSA-N diglycerol Chemical compound OCC(O)COCC(O)CO GPLRAVKSCUXZTP-UHFFFAOYSA-N 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- GFJVXXWOPWLRNU-UHFFFAOYSA-N ethenyl formate Chemical compound C=COC=O GFJVXXWOPWLRNU-UHFFFAOYSA-N 0.000 description 1
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 1
- 125000004494 ethyl ester group Chemical group 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Chemical compound CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- YLQWCDOCJODRMT-UHFFFAOYSA-N fluoren-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3C2=C1 YLQWCDOCJODRMT-UHFFFAOYSA-N 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229940107698 malachite green Drugs 0.000 description 1
- FDZZZRQASAIRJF-UHFFFAOYSA-M malachite green Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1 FDZZZRQASAIRJF-UHFFFAOYSA-M 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- CXKWCBBOMKCUKX-UHFFFAOYSA-M methylene blue Chemical compound [Cl-].C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 CXKWCBBOMKCUKX-UHFFFAOYSA-M 0.000 description 1
- 229960000907 methylthioninium chloride Drugs 0.000 description 1
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 1
- UTSYWKJYFPPRAP-UHFFFAOYSA-N n-(butoxymethyl)prop-2-enamide Chemical compound CCCCOCNC(=O)C=C UTSYWKJYFPPRAP-UHFFFAOYSA-N 0.000 description 1
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 1
- QQZXAODFGRZKJT-UHFFFAOYSA-N n-tert-butyl-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NC(C)(C)C QQZXAODFGRZKJT-UHFFFAOYSA-N 0.000 description 1
- XFHJDMUEHUHAJW-UHFFFAOYSA-N n-tert-butylprop-2-enamide Chemical compound CC(C)(C)NC(=O)C=C XFHJDMUEHUHAJW-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- MSYFVTLZGPOXGM-UHFFFAOYSA-N octa-2,6-dienediamide Chemical compound NC(=O)C=CCCC=CC(N)=O MSYFVTLZGPOXGM-UHFFFAOYSA-N 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920005650 polypropylene glycol diacrylate Polymers 0.000 description 1
- 229920005651 polypropylene glycol dimethacrylate Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 229920001290 polyvinyl ester Polymers 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 229940081623 rose bengal Drugs 0.000 description 1
- 229930187593 rose bengal Natural products 0.000 description 1
- AZJPTIGZZTZIDR-UHFFFAOYSA-L rose bengal Chemical compound [K+].[K+].[O-]C(=O)C1=C(Cl)C(Cl)=C(Cl)C(Cl)=C1C1=C2C=C(I)C(=O)C(I)=C2OC2=C(I)C([O-])=C(I)C=C21 AZJPTIGZZTZIDR-UHFFFAOYSA-L 0.000 description 1
- STRXNPAVPKGJQR-UHFFFAOYSA-N rose bengal A Natural products O1C(=O)C(C(=CC=C2Cl)Cl)=C2C21C1=CC(I)=C(O)C(I)=C1OC1=C(I)C(O)=C(I)C=C21 STRXNPAVPKGJQR-UHFFFAOYSA-N 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- ZLHDYZWYTZWPOO-UHFFFAOYSA-M sodium;butane-2-sulfonate Chemical group [Na+].CCC(C)S([O-])(=O)=O ZLHDYZWYTZWPOO-UHFFFAOYSA-M 0.000 description 1
- GRONZTPUWOOUFQ-UHFFFAOYSA-M sodium;methanol;hydroxide Chemical compound [OH-].[Na+].OC GRONZTPUWOOUFQ-UHFFFAOYSA-M 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 229920001897 terpolymer Polymers 0.000 description 1
- 150000007970 thio esters Chemical group 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Laminated Bodies (AREA)
- Polymerisation Methods In General (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は熱溶融成形可能な水現像性感光性樹脂組成物に
関する。DETAILED DESCRIPTION OF THE INVENTION (Industrial Field of Application) The present invention relates to a water-developable photosensitive resin composition that is heat-melt moldable.
(従来技術およびその課題)
印刷版、レリーフ版またはレジストパターンを形成する
ための水で現像可能な感光性樹脂組成物は公知である。BACKGROUND OF THE INVENTION Water-developable photosensitive resin compositions for forming printing plates, relief plates or resist patterns are known.
一般にこれらの感光性樹脂組成物は水溶性または水分散
可能なポリビニルアルコール、重合性モノマーおよび光
重合開始剤の混合物から得られる。Generally, these photosensitive resin compositions are obtained from a mixture of water-soluble or water-dispersible polyvinyl alcohol, a polymerizable monomer, and a photoinitiator.
この組成物は光の照射により、重合して潜像イメージを
形成し、光のあたらなかった部分を水等により洗い流し
て現像レリーフを形成し、使用される。When irradiated with light, this composition polymerizes to form a latent image, and the areas not exposed to light are washed away with water or the like to form a developed relief before use.
この感光性樹脂組成物は、通常ポリビニルアルコールを
水に溶解し、次いでモノマーを添加し、基板上に塗布検
水を蒸発することにより得られる。This photosensitive resin composition is usually obtained by dissolving polyvinyl alcohol in water, then adding monomers, and evaporating the sample water applied onto the substrate.
この方法では水分の蒸発のための乾燥工程を必要とし、
大がかりな装置と場所および時間を必要とする。また、
感光性樹脂組成物に添加するモノマー成分は低分子量、
低沸点のものが多く、乾燥時にもモノマーの飛散がおこ
り、環境汚染の問題がおこる。This method requires a drying step to evaporate water,
It requires large-scale equipment, space, and time. Also,
The monomer component added to the photosensitive resin composition has a low molecular weight,
Many have low boiling points, and monomers scatter during drying, causing environmental pollution problems.
また、ポリビニルアルコールのビニルエステル単位のケ
ン化度が高いものを使用した場合には、現像されたレリ
ーフが硬く、割れる等の欠点を有するので、硬度を低く
する必要がある。低硬度の付与はポリビニルアルコール
のビニルエステル単位のケン化度を下げればよいが、ビ
ニルエステル単位のケン化度を下げると水溶性が劣り水
現像が困難となる。Furthermore, if polyvinyl alcohol with a high degree of saponification of vinyl ester units is used, the developed relief will be hard and have drawbacks such as cracking, so it is necessary to reduce the hardness. Low hardness can be imparted by lowering the degree of saponification of vinyl ester units in polyvinyl alcohol, but if the degree of saponification of vinyl ester units is lowered, water solubility becomes poor and water development becomes difficult.
一方、印刷の見地からは低硬度は優れた印刷性能のため
に必要な性能の一つであり、これもおろそかにできない
。また、レリーフの弾性も優れた印刷性能のために必要
な性能の一つでもある。On the other hand, from the viewpoint of printing, low hardness is one of the properties necessary for excellent printing performance, and this cannot be neglected. Furthermore, the elasticity of the relief is also one of the properties necessary for excellent printing performance.
従って、低硬度とゴム弾性と水溶性の3者を備えること
を必要とする。Therefore, it is necessary to have three properties: low hardness, rubber elasticity, and water solubility.
(発明の目的)
本発明は乾燥工程を必要としない、熱溶融成形可能な感
光性樹脂組成物であって、高い相溶性と水溶性を有し、
しかも硬化時に適度な硬度とゴム弾性を有するものを提
供する。(Objective of the invention) The present invention is a photosensitive resin composition that does not require a drying process, can be molded by hot melting, has high compatibility and water solubility,
Furthermore, the present invention provides a material having appropriate hardness and rubber elasticity upon curing.
(発明の構成)
即ち、本発明は、(イ)チオール酸の存在下にビニルエ
ステル、共重合可能なノニオン性単量体(A)および/
またはイオン性浅水基含有重合性単量体(B)を共重合
して得られる共重合体で、A単量体とB単量体の合計f
f1h<0.1〜20モル%であり、残りが前記ビニル
エステルである(但し、A単量体の量は20モル%を越
えず、B単量体の量は10モル%を越えない。)共重合
体をケン化して得られる共重合体であって、ビニルエス
テル単位のケン化度が50〜70モル%、熱溶融流動開
始温度が60〜130℃でかつ末端にメルカプト基を有
する水溶性または水分散性のポリビニルアルコール系共
重合体、
(ロ)式:
%式%(1)
[式(1)中、
OR。(Structure of the Invention) That is, the present invention provides (a) vinyl ester, copolymerizable nonionic monomer (A) and/or
Or a copolymer obtained by copolymerizing the ionic shallow water group-containing polymerizable monomer (B), the total f of A monomer and B monomer
f1h<0.1 to 20 mol%, and the remainder is the vinyl ester (however, the amount of A monomer does not exceed 20 mol%, and the amount of B monomer does not exceed 10 mol%. ) A copolymer obtained by saponifying a copolymer, which has a degree of saponification of vinyl ester units of 50 to 70 mol%, a hot melt flow initiation temperature of 60 to 130°C, and has a mercapto group at the end. or water-dispersible polyvinyl alcohol copolymer, formula (b): % formula % (1) [In formula (1), OR.
Y: OH,OCC=CHt、
OC(CPtz)pOHまたは−0Rs但し、R1,R
3およびR4は同一または異なって、それぞれ水素原子
またはメチル基、R7は水酸基を有する炭素数1〜5の
アルキレン基、R6は水酸基を有する炭素数1〜5のア
ルキル基、nは4〜23の整数、mは0または11およ
びpは1〜5の整数を示す。]
を有し、かつ少なくとも2個の遊離水酸基を有する重合
性モノマー、および
(ハ)光重合開始剤
を含有する熱溶融成形可能な水現像性感光性樹脂組成物
を提供する。Y: OH, OCC=CHt, OC(CPtz)pOH or -0Rs However, R1, R
3 and R4 are the same or different, and each is a hydrogen atom or a methyl group, R7 is an alkylene group having 1 to 5 carbon atoms having a hydroxyl group, R6 is an alkyl group having 1 to 5 carbon atoms having a hydroxyl group, and n is a 4 to 23 alkyl group having 1 to 5 carbon atoms. An integer, m represents 0 or 11, and p represents an integer of 1 to 5. ] and a polymerizable monomer having at least two free hydroxyl groups, and (iii) a photopolymerization initiator.
成分(イ)
本発明の感光性組成物に用いられるポリビニルアルコー
ル系共重合体(イ)を得るに際し、ビニルエステルとし
てはギ酸ビニル、酢酸ビニル、プロピオン酸ビニル、安
息香酸ビニル等が使用できるが、酢酸ビニルが好んで用
いられる。Component (A) When obtaining the polyvinyl alcohol copolymer (A) used in the photosensitive composition of the present invention, vinyl esters that can be used include vinyl formate, vinyl acetate, vinyl propionate, vinyl benzoate, etc. Vinyl acetate is preferably used.
共重合可能なノニオン性単量体(A)としては特に制限
はないが、炭素数が2〜12個のビニル系単量体が好ま
しい。たとえば、エチレン、プロピレン、1−ブテン、
イソブチン等のα−オレフィン、(メタ)アクリル酸メ
チル、(メタ)アクリル酸エチル、(メタ)アクリル酸
ブチル等の(メタ)アクリル酸エステル、(メタ)アク
リルアミド、N、N−ジメチルアクリルアミド、N−ビ
ニルピロリドン、酢酸アリル、アリルアルコール、2−
メチル−3−ブテン−2−オール、イソプロペニルアセ
テートの如きノニオン性単量体が挙げられる。The copolymerizable nonionic monomer (A) is not particularly limited, but vinyl monomers having 2 to 12 carbon atoms are preferred. For example, ethylene, propylene, 1-butene,
α-olefins such as isobutyne, (meth)acrylic acid esters such as methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, (meth)acrylamide, N,N-dimethylacrylamide, N- Vinylpyrrolidone, allyl acetate, allyl alcohol, 2-
Examples include nonionic monomers such as methyl-3-buten-2-ol and isopropenyl acetate.
イオン性親水基含有重合性単量体(B)はビニル基とイ
オン性親水基、たとえば、カルボキシル基またはその塩
、スルホン酸基またはその塩、リン酸基またはその塩等
のアニオン性基や、アミノ基またはアンモニウム基等の
カチオン性基等を含む単量体をいう。この単量体の例と
しては、たとえば(メタ)アクリル酸またはその塩、イ
タコン酸またはその塩、マレイン酸またはその塩、フマ
ル酸またはその塩、無水マレイン酸、2−アクリルアミ
ドプロパンスルホン酸またはその塩、アリルスルホン酸
またはその塩、(メタ)アクリルアミドプロピルトリメ
チルアンモニウムクロリド等のイオン性親水基含有単量
体が挙げられる。イオン性単量体は少量の導入で水溶性
向上に大きな効果がある。The ionic hydrophilic group-containing polymerizable monomer (B) has a vinyl group and an ionic hydrophilic group, such as an anionic group such as a carboxyl group or a salt thereof, a sulfonic acid group or a salt thereof, a phosphoric acid group or a salt thereof, A monomer containing a cationic group such as an amino group or an ammonium group. Examples of this monomer include (meth)acrylic acid or its salts, itaconic acid or its salts, maleic acid or its salts, fumaric acid or its salts, maleic anhydride, 2-acrylamidopropanesulfonic acid or its salts. , allylsulfonic acid or its salt, and ionic hydrophilic group-containing monomers such as (meth)acrylamidopropyltrimethylammonium chloride. Ionic monomers have a large effect on improving water solubility even when introduced in small amounts.
これらのラジカル重合可能な単量体(AXB)は、ノニ
オン性単量体(A)単独またはイオン性単量体(B)単
独またはノニオン性単量体(A)と少量のイオン性単量
体(B)とを併用してビニルエステルとをチオール酸の
存在下に共重合して使用されろが、これらの共重合性単
量一体はポリビニルアルコール系共重合体(イ)の水溶
性および該重合体と重合性モノマーとの相溶性に大きく
影響する。上記したもののうち、好ましいものの例とし
てはノニオン性単量体では、(メタ)アクリル酸メチル
等の(メタ)アクリル酸エステル、N、N−ジメチルア
クリルアミド、N−ビニルピロリドン、酢酸アリ2し、
アリルアルコール、2−メチル−3−ブテン−2=オー
ル、イソプロペニルアセテートが、イオン性親水基含有
重合性単量体では(メタ)アクリル酸、イタコン酸、無
水マレイン酸、2−アクリルアミドプロパンスルホン酸
、(メタ)アリルスルホン酸が用いられる。チオール酸
は−CO9H基を有する有機チオール酸を包含する。例
えば、チオール酢酸、チオールプロピオン酸、チオール
酪酸、チオール吉草酸等が挙げられる。チオール酸の存
在下に共重合を行なうと、共重合体の末端にチオエステ
ル基を有するポリビニルエステル系共重合体か得られ、
この共重合体をケン化して、末端にメルカプト基を有す
るポリビニルアルコール系重合体が得られる。チオール
酸の使用量はo、o i〜2モル%、好ましくは0.0
5〜1モル%である。These radically polymerizable monomers (AXB) are nonionic monomer (A) alone, ionic monomer (B) alone, or nonionic monomer (A) and a small amount of ionic monomer. (B) may be used by copolymerizing a vinyl ester in the presence of thiol acid, but these copolymerizable monomers will affect the water solubility of the polyvinyl alcohol copolymer (A) and the It greatly affects the compatibility between the polymer and the polymerizable monomer. Among the above, preferred examples of nonionic monomers include (meth)acrylic acid esters such as methyl (meth)acrylate, N,N-dimethylacrylamide, N-vinylpyrrolidone, acetic acid 2,
Allyl alcohol, 2-methyl-3-buten-2=ol, isopropenyl acetate, and ionic hydrophilic group-containing polymerizable monomers include (meth)acrylic acid, itaconic acid, maleic anhydride, and 2-acrylamidopropanesulfonic acid. , (meth)allylsulfonic acid is used. Thiol acids include organic thiol acids having a -CO9H group. Examples include thiol acetic acid, thiol propionic acid, thiol butyric acid, thiol valeric acid, and the like. When copolymerization is carried out in the presence of thiol acid, a polyvinyl ester copolymer having a thioester group at the end of the copolymer is obtained,
This copolymer is saponified to obtain a polyvinyl alcohol polymer having a mercapto group at the end. The amount of thiol acid used is o, o i to 2 mol%, preferably 0.0
It is 5 to 1 mol%.
この末端メルカプト基は感光性組成物の感度を向上する
。This terminal mercapto group improves the sensitivity of the photosensitive composition.
また、これらのうちノニオン性単量体とイオン性単量体
親水基含有単量体の両者を併用した共重合体が最も好ん
で用いられる。Moreover, among these, a copolymer containing both a nonionic monomer and an ionic monomer containing a hydrophilic group is most preferably used.
上記共重合し得る単量体の共重合体中の含有量は溶融性
および水溶性のバランスがらノニオン性単量体を0〜2
0モル%、イオン性親水基含有単量体を0〜lOモル%
で、かつ両車量体の合計を0.1〜20モル%にする必
要がある。より好ましくはノニオン性単量体を5〜15
モル%、イオン性親水基含有単量体を0〜3モル%用い
るのが望ましい。共重合性単量体が0.1モル%より低
い場合は、得られた組成物の溶融性が悪く、20モル%
をこえると組成物の固形保持性が不良となり使用できな
い。The content of the above-mentioned copolymerizable monomers in the copolymer is 0 to 2% of the nonionic monomer, depending on the balance between meltability and water solubility.
0 mol%, ionic hydrophilic group-containing monomer from 0 to 10 mol%
And it is necessary to make the total of both vehicle masses 0.1 to 20 mol%. More preferably 5 to 15 nonionic monomers
It is desirable to use 0 to 3 mol% of the ionic hydrophilic group-containing monomer. If the copolymerizable monomer content is lower than 0.1 mol%, the resulting composition will have poor meltability, and the copolymerizable monomer content will be less than 20 mol%.
If it exceeds this, the solid retention properties of the composition will be poor and it cannot be used.
本発明のポリビニルアルコール系共重合体(イ)は、上
記ビニルエステルおよびビニルエステルとラジカル共重
合可能なノニオン性単量体(A)またはイオン性親水基
含有単争体(B)との共重合体およびビニルエステル、
ビニルエステルとラジカル共重合可能なノニオン性単量
体(A)およびイオン性親水基含有単量体(B)との三
元共重合体を通常の方法によりケン化して得られる。本
発明のポリビニルアルコール系共重合体(イ)に要求さ
れる性能としては、■得られる組成物の溶融粘度が適当
であること、■重合性モノマーとの相溶性が良好なこと
、■水溶性であること、■得られる感光性樹脂板の寸法
安定性(組成物の固形保持性の耐熱クリープ性)が良好
なこと等が挙げられる。これらの要求性能を満足するに
は、該共重合体の熱溶融流動開始温度が60°C〜13
0℃で、ビニルエステル単位のケン化度が50〜70モ
ル%であることが必要である。また、重合度については
、平均重合度が1000以下、好ましくは700以下、
さらに好ましくは500以下で100以上であることが
望ましい。平均重合度が1000を超えるものは溶融粘
度が高すぎるために不適当であり、一方、100未満の
ものは重合性モノマーの保持力に乏しく使用しにくい。The polyvinyl alcohol copolymer (A) of the present invention is a copolymer of the vinyl ester and a nonionic monomer (A) radically copolymerizable with the vinyl ester or a monomer containing an ionic hydrophilic group (B). coalescence and vinyl esters,
It is obtained by saponifying a terpolymer of a vinyl ester, a radically copolymerizable nonionic monomer (A), and an ionic hydrophilic group-containing monomer (B) by a conventional method. The properties required of the polyvinyl alcohol copolymer (a) of the present invention are: (1) appropriate melt viscosity of the resulting composition, (2) good compatibility with the polymerizable monomer, and (2) water solubility. and (2) the resulting photosensitive resin plate has good dimensional stability (solid retention property and heat resistant creep property of the composition). In order to satisfy these required performances, the hot melt flow initiation temperature of the copolymer must be 60°C to 13°C.
It is necessary that the degree of saponification of vinyl ester units is 50 to 70 mol% at 0°C. Regarding the degree of polymerization, the average degree of polymerization is 1000 or less, preferably 700 or less,
More preferably, it is 500 or less and 100 or more. Those with an average degree of polymerization exceeding 1,000 are unsuitable because their melt viscosity is too high, while those with an average degree of polymerization of less than 100 are difficult to use because of poor retention of polymerizable monomers.
また、ビニルエステル単位のケン化度はラジカル共重合
可能な単量体単位の含量にもよるが、50モル%から7
0モル%にあるものが重合性モノマーとの相溶性にもす
ぐれ使いやすく、70モル%を超えると、熱溶融流動開
始温度が高くなりすぎるために不適当であり、50モル
%未満では樹脂板の寸法安定性が悪くなる傾向にあり使
用できない。The degree of saponification of the vinyl ester unit varies from 50 mol% to 7% by mole, depending on the content of monomer units capable of radical copolymerization.
If the content is 0 mol%, it has excellent compatibility with polymerizable monomers and is easy to use; if it exceeds 70 mol%, the hot melt flow initiation temperature becomes too high, making it unsuitable; if it is less than 50 mol%, the resin plate cannot be used because the dimensional stability tends to deteriorate.
なお、本発明でいうところのポリビニルアルコール系共
重合体(イ)の熱溶融流動開始温度は、含水率3重重%
のポリビニルアルコール系共重合体を、直径III、長
さIIIのノズルを付けたフローテスターで、50kg
の荷重下、6℃/分で昇温して溶融吐出させたときの流
動開始温度を示すものである。また、本発明でいうとこ
ろの水溶性とは、25℃で1重量%濃度になるようにポ
リビニルアルコール系共重合体を水に溶解させたときに
完全溶解または分散する状態を示す乙のをいう。また、
平均重合度(β)はポリビニルアルコール系共重合体の
極限粘度[η〕を水中30℃で測定し、粘度式より算出
したものである。In addition, the hot melt flow initiation temperature of the polyvinyl alcohol copolymer (a) as referred to in the present invention is when the water content is 3% by weight.
A flow tester equipped with a nozzle with diameter III and length III was used to test 50 kg of polyvinyl alcohol copolymer.
This figure shows the flow start temperature when melting and discharging was performed under a load of 6° C./min. Furthermore, water solubility as used in the present invention refers to a state in which the polyvinyl alcohol copolymer is completely dissolved or dispersed when dissolved in water at a concentration of 1% by weight at 25°C. . Also,
The average degree of polymerization (β) is calculated from the viscosity formula by measuring the intrinsic viscosity [η] of the polyvinyl alcohol copolymer in water at 30°C.
成分(ロ)
本発明に用いる重合性モノマーは、前記式(1)に示さ
れる化合物であって、少なくとも2個の水酸基を有する
ものである。従って、式(1)を満足しても、水酸基の
数が1または0であれば、本発明に使用できない。この
化合物の例としては以下のものが挙げられる:
CH3
Cl12・C1l −COOCH、CIICH、O−(
CH2CH20) 、C1l 2CHCH20COCH
=C112C113C1i。Component (b) The polymerizable monomer used in the present invention is a compound represented by the above formula (1) and has at least two hydroxyl groups. Therefore, even if formula (1) is satisfied, if the number of hydroxyl groups is 1 or 0, it cannot be used in the present invention. Examples of this compound include: CH3Cl12.C1l -COOCH, CIICH, O-(
CH2CH20), C1l 2CHCH20COCH
=C112C113C1i.
j
lCf12・C−C00CII 、 Cl1−CI+
20− (C1l 、 C)I 20) 、 CH、
CllCl 、0COC=CH。j
lCf12・C-C00CII, Cl1-CI+
20- (C1l, C)I20), CH,
ClClCl , 0COC=CH.
(l:83
また、上記化合物の末端水酸括をアクリル酸またはメタ
クリル酸でエステル化した(メタ)アクリル酸エステル
誘導体であってよい。(l:83) It may also be a (meth)acrylic acid ester derivative obtained by esterifying the terminal hydroxyl group of the above compound with acrylic acid or methacrylic acid.
上記特殊なモノマーに他の一般的なモノマ一種を加えて
らよい。Other common monomers may be added to the above-mentioned special monomers.
分子内に重合性二重結合を有する他のモノマーの具体例
としてはメチルアクリレート、エチルアクリレート、n
−プロピルアクリレート、β−ヒドロキシエチルアクリ
レート、β−ヒドロキシプロピルアクリレート、ポリエ
チレングリコールモノアクリレート、ポリプロピレング
リコールモノアクリレート、ポリエチレングリコールジ
アクリレート、ポリプロピレングリコールジアクリレー
ト、メトキシポリエチレングリコールモノアクリレート
、エトキシポリエチレングリコールモノアクリレート、
グリセロールジアクリレート、ペンタエリスリトールジ
アクリレート、トリメチロールプロパントリアクリレー
ト、テトラメチロールメタンテトラアクリレート、メチ
ルアクリレート、エチルアクリレート、n−プロピルメ
タクリレート、β−ヒドロキシエチルメタクリレート、
β−ヒドロキシプロピルメタクリレート、ポリエチレン
グリコールモノメタクリレート、ポリプロピレングリコ
ールモノメタクリレート、ポリエチレングリコールジメ
タクリレート、ポリプロピレングリコールジメタクリレ
ート、メトキシポリエチレングリコールモノメタクリレ
ート、エトキシポリエチレングリコールモノメタクリレ
ート、グリセロールジメタクリレート、ペンタエリスリ
トールジメタクリレート、トリメチロールプロパントリ
メタクリレート、テトラメチロールメタンテトラメタク
リレート、アクリルアミド、N−メチロールアクリルア
ミド、n−ブトキシメチルアクリルアミド、イソブトキ
シアクリルアミド、n−t−ブチルアクリルアミド、メ
チレンビス(アクリルアミド)、エチレンビス(アクリ
ルアミド)、プロピレンビス(アクリルアミド)、メタ
クリルアミド、N−メチロールメタクリルアミド、n−
ブトキシメチルメタクリルアミド、イソブトキシメタク
リルアミド、n−t−ブチルメタクリルアミド、メチレ
ンビス(メタクリルアミド)、エチレンビス(メタクリ
ルアミド)、プロピレンビス(メタクリルアミド)また
はこれらの混合物などを挙げることができる。Specific examples of other monomers having a polymerizable double bond in the molecule include methyl acrylate, ethyl acrylate, n
-propyl acrylate, β-hydroxyethyl acrylate, β-hydroxypropyl acrylate, polyethylene glycol monoacrylate, polypropylene glycol monoacrylate, polyethylene glycol diacrylate, polypropylene glycol diacrylate, methoxypolyethylene glycol monoacrylate, ethoxypolyethylene glycol monoacrylate,
Glycerol diacrylate, pentaerythritol diacrylate, trimethylolpropane triacrylate, tetramethylolmethanetetraacrylate, methyl acrylate, ethyl acrylate, n-propyl methacrylate, β-hydroxyethyl methacrylate,
β-hydroxypropyl methacrylate, polyethylene glycol monomethacrylate, polypropylene glycol monomethacrylate, polyethylene glycol dimethacrylate, polypropylene glycol dimethacrylate, methoxypolyethylene glycol monomethacrylate, ethoxypolyethylene glycol monomethacrylate, glycerol dimethacrylate, pentaerythritol dimethacrylate, trimethylolpropane trimethacrylate, tetramethylolmethanetetramethacrylate, acrylamide, N-methylol acrylamide, n-butoxymethylacrylamide, isobutoxyacrylamide, n-t-butylacrylamide, methylenebis(acrylamide), ethylenebis(acrylamide), propylenebis(acrylamide), methacrylamide, N-methylolmethacrylamide, n-
Examples include butoxymethylmethacrylamide, isobutoxymethacrylamide, n-t-butylmethacrylamide, methylenebis(methacrylamide), ethylenebis(methacrylamide), propylenebis(methacrylamide), and mixtures thereof.
具体的な重合性モノマーの選択は、使用するポリマーの
種類に応じて相溶性を考慮してこれを行えばよい。必要
に応じ、両者間の相溶性を補助するため、適宜の溶剤、
たとえば水あるいは高沸点アルコール(たとえばエチレ
ングリコール、ジエチレングリコール、プロピレングリ
コール、トリエチレングリコール、ブタンジオール、ト
リメチロールプロパン、テトラメチロールエタン、グリ
セロール、ジグリセロール)が配合されてもよい。A specific polymerizable monomer may be selected by considering compatibility depending on the type of polymer used. If necessary, an appropriate solvent,
For example, water or a high-boiling alcohol (eg, ethylene glycol, diethylene glycol, propylene glycol, triethylene glycol, butanediol, trimethylolpropane, tetramethylolethane, glycerol, diglycerol) may be blended.
成分(ハ)
光重合開始剤(ハ)について格別の制限はないが、通常
は芳香族ケトンが使用されろ。芳香族ケトンとしては分
子中に芳香環およびカルナ9ニル基を有する化合物が使
用され、その具体例としては、ベンゾイン、ベンゾイン
メチルエーテル、ベンゾインエチルエーテル、ベンゾイ
ンイソプロピルエーテル、α−メチルベンゾイン、2−
メチルアントラキノン、9−フルオレノン、ベンジル、
ベンジルメチルケタール、アセトフェノン、2.2−ジ
メトキシ−2−フェニルアセトフェノン、ベンゾフェノ
ン、フェニル−2−チェニルケトン、p−ツメチルアミ
ノベンゾフェノン、p、p’−テトラメチルジアミノベ
ンゾフヱノンなどが挙げられる。Component (c) There are no particular restrictions on the photopolymerization initiator (c), but aromatic ketones are usually used. As the aromatic ketone, compounds having an aromatic ring and a carnanyl group in the molecule are used, and specific examples thereof include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, α-methylbenzoin, 2-
methylanthraquinone, 9-fluorenone, benzyl,
Examples include benzyl methyl ketal, acetophenone, 2,2-dimethoxy-2-phenylacetophenone, benzophenone, phenyl-2-thenyl ketone, p-tsumethylaminobenzophenone, p,p'-tetramethyldiaminobenzophenone, and the like.
これらの化合物には任意にシアノ基、ニトロ基、メトキ
シ基、スルホン酸基、フォスフイン酸またはその塩もし
くはエステルなどの置換基が存在していてもよい。その
ようなものの例としては2゜6−シメトキシベンゾイル
ージフエニルフオスフインオキサイド、2.4.6−ド
リメチルベンゾイルージフエニルフオスフインオキサイ
ド、2.4.6−ドリメチルベンゾイルーフエニルフオ
スフイン酸のエチルエステル、2,4.6−ドリメチル
ベンゾイルーフエニルフオスフイン酸のナトリウム塩等
が挙げられる。These compounds may optionally have a substituent such as a cyano group, nitro group, methoxy group, sulfonic acid group, phosphinic acid or a salt or ester thereof. Examples of such are 2.6-Simethoxybenzoyl-diphenylphosphine oxide, 2.4.6-Dolimethylbenzoyl-diphenylphosphine oxide, 2.4.6-Dolimethylbenzoylphenylphosphine oxide. Ethyl ester of fluoric acid, sodium salt of 2,4.6-dolimethylbenzoylphenyl fluoric acid, and the like.
その他
上記必須成分(イ)、(ロ)および(ハ)の配合割合は
通常、重合性モノマー(ロ)100重量部に対して光重
開始剤(ハ)0.01〜10重量部、ポリマー(イ)5
0〜300重量部であるが、好ましくは(ハ)が0.0
2〜5重量部、(イ)が60〜250重量部が望ましい
。The blending ratio of the other essential components (a), (b) and (c) above is usually 0.01 to 10 parts by weight of the photoinitiator (c) to 100 parts by weight of the polymerizable monomer (b), and the polymer (c). b) 5
0 to 300 parts by weight, but preferably (c) is 0.0 parts by weight.
2 to 5 parts by weight, preferably 60 to 250 parts by weight of (a).
上記必須成分に加え、必要に応じ重合禁止剤(たとえば
2.6−ジーt−ブチル−p−クレゾール、ヒドロキノ
ン、p−メトキシフェノール)、染料(たとえばローズ
ベンガル、エオンン、メチレンブルー、マラカイトグリ
ーン)などが配合されてもよい。In addition to the above essential ingredients, polymerization inhibitors (e.g. 2,6-di-t-butyl-p-cresol, hydroquinone, p-methoxyphenol), dyes (e.g. rose bengal, eonne, methylene blue, malachite green), etc. may be added as necessary. May be blended.
本発明の感光性樹脂組成物は特定のポリビニルアルコー
ル共重合体(イ)を用いているので、熱溶融成形により
加工できる。熱溶融成形は通常押出機で行なわれる。こ
の方法によれば、大がかりな乾燥工程を必要とせず、工
程が短縮され、生産コストが大幅に低下する。熱溶融成
形に際し、可塑剤的に水を少量使用してもよいが、その
使用量は従来の使用量と大幅に相違する。水は本発明の
樹脂組成物中に10重量%を越えない範囲、好ましくは
3〜8重量%存在してもよい。本発明の組成物は熱溶融
成形によらない従来の方法によっても加工できる。Since the photosensitive resin composition of the present invention uses a specific polyvinyl alcohol copolymer (a), it can be processed by hot melt molding. Hot melt molding is usually carried out using an extruder. According to this method, a large-scale drying process is not required, the process is shortened, and production costs are significantly reduced. Although a small amount of water may be used as a plasticizer during hot melt molding, the amount used is significantly different from the amount used conventionally. Water may be present in the resin composition of the present invention in an amount not exceeding 10% by weight, preferably from 3 to 8% by weight. The compositions of the present invention can also be processed by conventional methods that do not involve hot melt molding.
ここに得られた光重合性樹脂組成物を適宜の支持体上に
押出成形することにより、樹脂版材が得られる。支持体
としては通常、金属(たとえばアルミニウム、亜鉛、鉄
)、プラスチック(たとえばポリエチレンテレフタレー
ト、ポリスチレン、ポリメチルメタクリレート、ナイロ
ン、セルロースアセテート、ポリエチレン、ポリプロピ
レン、ポリカーボネート、ポリアクリロニトリル、ポリ
塩化ビニル)、ガラスなどが使用される。必要に応じこ
れら支持体の表面に予めエツチング、電解酸化、コロナ
放電などの前処理を施してもよく、接着剤層、ハレーシ
ぢン防止層などの薄層を設けてもよい。A resin plate material is obtained by extrusion molding the photopolymerizable resin composition obtained here onto a suitable support. Supports typically include metals (e.g. aluminum, zinc, iron), plastics (e.g. polyethylene terephthalate, polystyrene, polymethyl methacrylate, nylon, cellulose acetate, polyethylene, polypropylene, polycarbonate, polyacrylonitrile, polyvinyl chloride), glass, etc. used. If necessary, the surface of these supports may be subjected to pretreatment such as etching, electrolytic oxidation, corona discharge, etc., and a thin layer such as an adhesive layer or an antihalation layer may be provided.
上記の樹脂版材を使用して画像を形成せしめるには、自
体常套の方法を採用すればよい。たとえば該樹脂版材の
表面に必要に応じ適宜のフィルムあるいは被膜層を介し
て画像フィルム(ネガフィルムまたはポジフィルム)を
密着さけ、露光する。In order to form an image using the above-mentioned resin plate material, a conventional method may be adopted. For example, an image film (negative or positive film) is brought into close contact with the surface of the resin plate via an appropriate film or coating layer as required, and exposed.
露光後適宜の現像液、具体的には水により未露光部分を
除去することにより画像を形成することができる。After exposure, an image can be formed by removing the unexposed portions with a suitable developer, specifically water.
露光に際しては、種々の活性光線源を使用することがで
き、中圧水銀灯、高圧水銀灯、超高圧水銀灯、キセノン
灯、メタルハライドランプ、紫外線蛍光灯などを例示さ
れる。その他タングステン灯、白色蛍光灯、可視光レー
ザーなどが使用されてもよい。For exposure, various active light sources can be used, such as medium-pressure mercury lamps, high-pressure mercury lamps, ultra-high-pressure mercury lamps, xenon lamps, metal halide lamps, and ultraviolet fluorescent lamps. In addition, tungsten lamps, white fluorescent lamps, visible light lasers, etc. may be used.
(発明の効果)
本発明によれば、特定の変性ポリビニルアルコールを用
いて熱溶融成形可能な感光性樹脂組成物が得られる。こ
の組成物を用いれば、乾燥工程を必要とせず、乾燥のた
めの大がかりな装置を必要なく、工程数を減少できる。(Effects of the Invention) According to the present invention, a photosensitive resin composition that can be hot-melt molded using a specific modified polyvinyl alcohol can be obtained. By using this composition, there is no need for a drying step, no large-scale drying equipment is required, and the number of steps can be reduced.
また、乾燥工程で発生する低沸点モノマーの蒸発による
環境汚染も防止できる。本発明の組成物はポリビニルア
ルコール鎖の末端にチオール基が存在するので、感度が
大きく向上する。本発明の感光性樹脂組成物は水で現像
できる。Furthermore, environmental pollution caused by evaporation of low-boiling monomers generated during the drying process can be prevented. Since the composition of the present invention has a thiol group at the end of the polyvinyl alcohol chain, the sensitivity is greatly improved. The photosensitive resin composition of the present invention can be developed with water.
また、本発明では特殊な重合性モノマ一種を用い、感光
性樹脂組成物により高い水溶性を付与するとともに、露
光により得られた硬化フィルムに高いゴム弾性を付与す
る。Further, in the present invention, a special polymerizable monomer is used to impart higher water solubility to the photosensitive resin composition and to impart high rubber elasticity to the cured film obtained by exposure.
本発明の組成物は種々の像形成材料、例えばレジスト等
に用いることができる。The composition of the present invention can be used in various imaging materials, such as resists.
(実施例) 以下に実施例を挙げて本発明にさらに詳細に説明する。(Example) The present invention will be explained in more detail by giving examples below.
た1こし、部とあるは重量部を表わす。Parts and parts represent parts by weight.
参考例1
酢酸ビニル2400部、アクリル酸メチル9部、2−ア
クリルアミド−2−メチルプロパンスルホン酸ナトリウ
ム塩1.7部、メタノール250部およびチオール酢酸
0.55部を反応容器にとり、内部を充分に窒素置換し
た後、外温を65℃にあげ、内711が60℃に達した
ところで、2,2°−アゾビスイソブチロニトリル2部
を含むメタノール溶液20部を加えた。次いで、チオー
ル酢酸10゜3部を含むメタノール溶液60部、アクリ
ル酸メチル+32部および2−アクリルアミド−2−メ
チルプロパンスルホン酸ナトリウム塩13部を5時間に
わたって均一に加えた。5時間後の重合率は50.5%
であった。5時間後に容器を冷却し、減圧下に残留する
酢酸ビニルをメタノールとともに系外へ送出す操作をメ
タノールを追加しながら行ない、重合体のメタノール溶
液を得た(濃度65%)。この共重合体はアクリル酸メ
チル単位を10.2モル%、2−アクリルアミド−2−
メチルプロパンスルホン酸ナトリウム塩単位0.4モル
%および酢酸ビニル単位89.4モル%含有することが
核磁気共鳴分析(NMR分析)により確認された。この
メタノール溶液100部を40℃で撹拌しながら、2N
の水酸化ナトリウムのメタノール溶液を4容量部添加し
てよく混合してケン化した。30分後、得られた白色の
ゲルを粉砕し、酢酸メチル/メタノール−7/3(重量
比)で充分洗浄した後、乾燥してポリビニルアルコール
系共重合体aを得た。この共重合体aのビニルエステル
単位のケン化度をNMR分析したところ64モル%であ
った。また、水溶液中の極限粘度測定により求めた重合
度は320であった。さらに、このポリビニルアルコー
ル系共重合体a(含水率3重量%)の熱溶融流動開始温
度(フローポイント)は115℃であった。Reference Example 1 2400 parts of vinyl acetate, 9 parts of methyl acrylate, 1.7 parts of 2-acrylamido-2-methylpropanesulfonic acid sodium salt, 250 parts of methanol and 0.55 parts of thiol acetic acid were placed in a reaction vessel, and the inside was thoroughly drained. After purging with nitrogen, the outside temperature was raised to 65°C, and when the temperature inside 711 reached 60°C, 20 parts of a methanol solution containing 2 parts of 2,2°-azobisisobutyronitrile was added. Then, 60 parts of a methanol solution containing 10.3 parts of thiol acetic acid, 32 parts of methyl acrylate plus 13 parts of 2-acrylamido-2-methylpropanesulfonic acid sodium salt were added uniformly over a period of 5 hours. Polymerization rate after 5 hours is 50.5%
Met. After 5 hours, the container was cooled and the remaining vinyl acetate was sent out of the system together with methanol under reduced pressure while adding methanol to obtain a methanol solution of the polymer (concentration 65%). This copolymer contained 10.2 mol% of methyl acrylate units and 2-acrylamide-2-
It was confirmed by nuclear magnetic resonance analysis (NMR analysis) that it contained 0.4 mol% of methylpropanesulfonic acid sodium salt units and 89.4 mol% of vinyl acetate units. While stirring 100 parts of this methanol solution at 40°C,
4 parts by volume of a methanol solution of sodium hydroxide was added, mixed well, and saponified. After 30 minutes, the obtained white gel was crushed, thoroughly washed with methyl acetate/methanol-7/3 (weight ratio), and then dried to obtain polyvinyl alcohol copolymer a. The degree of saponification of the vinyl ester units of this copolymer a was analyzed by NMR and found to be 64 mol%. Further, the degree of polymerization determined by measuring the intrinsic viscosity in an aqueous solution was 320. Further, the hot melt flow start temperature (flow point) of this polyvinyl alcohol copolymer a (water content 3% by weight) was 115°C.
一方、共重合体a中に含まれるメルカプト基量をヨウ素
酸化による方法で求めたところ、0.85XIO−’当
量/9−共重合体のメルカプト基の存在が確認された。On the other hand, when the amount of mercapto groups contained in copolymer a was determined by a method using iodine oxidation, the presence of mercapto groups in the 0.85XIO-' equivalent/9-copolymer was confirmed.
このメルカプト基は、重合機構から共重合体分子の片末
端に存在すると考えられる。This mercapto group is thought to exist at one end of the copolymer molecule based on the polymerization mechanism.
参4例2
酢酸ビニル1200部、酢酸アリル160部1メタノー
ル100部およびチオール酢酸0,19部を反応容器中
に仕込んだ。次いで、2,2°−アゾビスイソブチロニ
トリル3部を加え重合を開始した。チオール酢酸7部を
含むメタノール溶液30部を5時間にわたって均一に加
えた。5時間後の重合率は45%であった。Reference 4 Example 2 1200 parts of vinyl acetate, 160 parts of allyl acetate, 100 parts of methanol and 0.19 parts of thiol acetic acid were charged into a reaction vessel. Next, 3 parts of 2,2°-azobisisobutyronitrile was added to initiate polymerization. 30 parts of a methanol solution containing 7 parts of thiol acetic acid was added uniformly over 5 hours. The polymerization rate after 5 hours was 45%.
参考例1と同様に処理し、重合体のメタノール溶液(a
度65%)を得た。N M R分析の結果、酢酸アリル
含量は10モル%であった。Treated in the same manner as in Reference Example 1, a methanol solution of the polymer (a
65%). As a result of NMR analysis, the allyl acetate content was 10 mol%.
このメタノール溶液100部に2N水酸化ナトリウムの
メタノール溶液2容量部を添加し、参考例1と同様にケ
ン化後処理し、末端メルカプトポリビニルアルコール系
共重合体すを得た。この共重合体を参考例1と同様に分
析したところ、ビニルエステル単位のケン化度は65.
8モル%、重合度400、フローポイント107℃、末
端メルカプト基量は0.7XlO−’当量/9−共重合
体であった。To 100 parts of this methanol solution, 2 parts by volume of a 2N sodium hydroxide methanol solution was added, followed by saponification and post-treatment in the same manner as in Reference Example 1 to obtain a terminal mercapto polyvinyl alcohol copolymer. When this copolymer was analyzed in the same manner as in Reference Example 1, the degree of saponification of the vinyl ester unit was 65.
8 mol %, degree of polymerization 400, flow point 107°C, and terminal mercapto group weight was 0.7XlO-' equivalent/9-copolymer.
参考例3
酢酸ビニル2400部、メタノール250部、2−アク
リルアミド−2−メチルプロパンスルホン酸ナトリウム
塩1.0部およびチオール酢酸0.56部を反応容器中
に仕込んだ。この系に2゜2′−アゾビスイソブチロニ
トリル1.5部を含むメタノール溶液20部を添加し、
60℃で重合開始した。2−アクリルアミド−2−メチ
ルプロパンスルホン酸ナトリウム塩11部、チオール酢
酸10.2部を含むメタノール溶液60部を5時間にわ
たって均一に加えた。5時間後の重合率は44%であっ
た。参考例1と同様に処理し、重合体のメタノール溶液
(a度65%)を得た。Reference Example 3 2400 parts of vinyl acetate, 250 parts of methanol, 1.0 part of 2-acrylamido-2-methylpropanesulfonic acid sodium salt, and 0.56 part of thiol acetic acid were charged into a reaction vessel. To this system was added 20 parts of a methanol solution containing 1.5 parts of 2°2'-azobisisobutyronitrile,
Polymerization started at 60°C. 60 parts of a methanol solution containing 11 parts of 2-acrylamido-2-methylpropanesulfonic acid sodium salt and 10.2 parts of thiol acetic acid was uniformly added over 5 hours. The polymerization rate after 5 hours was 44%. The same treatment as in Reference Example 1 was carried out to obtain a methanol solution (a degree: 65%) of the polymer.
NMR分析の結果、2−アクリルアミド−2−メチルプ
ロパンスルホン酸ナトリウム塩単位を0.35モル%含
有することがわかった。この重合体のメタノール溶液1
00部に2N−水酸化すトリウムのメタノール溶液1.
1部を加え、参考例1と同様にケン化後処理し、末端の
メルカプトポリビニルアルコール系共重合体Cを得た。As a result of NMR analysis, it was found that it contained 0.35 mol% of 2-acrylamido-2-methylpropanesulfonic acid sodium salt units. Methanol solution of this polymer 1
00 parts of 2N-thorium hydroxide methanol solution 1.
1 part was added and the saponification post-treatment was carried out in the same manner as in Reference Example 1 to obtain terminal mercapto polyvinyl alcohol copolymer C.
この共重合体Cを参考例1と同様に分析したところ、ビ
ニルエステル単位のケン化度は61モル%、重合度34
0、フローポイント101℃、末端メルカプト基量は0
.9X10”4当量/9−共重合体であった。When this copolymer C was analyzed in the same manner as in Reference Example 1, the degree of saponification of the vinyl ester unit was 61 mol%, and the degree of polymerization was 34.
0, flow point 101℃, terminal mercapto group amount 0
.. It was a 9×10” 4 equivalent/9-copolymer.
参考例4
撹拌機とコンデンサーと温度調整器を備えた2Qコルベ
ン中に、キシレン370gと構造式が主成分である2官
能工ポキシ化合物(共栄社油脂化学工業株式会社からエ
ボライト400Eとして市販)5269、メタクリル酸
86g、純水189およびテトラブチルアンモニウムク
ロライド1gを仕込み、撹拌しながら温度を上げ、還流
状態を30分維持した。その後、室温まで温度を冷却し
た。Reference Example 4 In a 2Q Kolben equipped with a stirrer, a condenser, and a temperature regulator, 370 g of xylene, a bifunctional poxy compound whose main component is the structural formula (commercially available as Evolite 400E from Kyoeisha Yushi Kagaku Kogyo Co., Ltd.) 5269, and methacrylic 86 g of acid, 189 g of pure water, and 1 g of tetrabutylammonium chloride were charged, the temperature was raised while stirring, and the reflux state was maintained for 30 minutes. Thereafter, the temperature was cooled to room temperature.
得られた光重合性ビニルモノマーの分析結果は、NMR
,IRとから前記重合性モノマー(tII)であること
が確認された。その酸価は0.56であり、粘度は20
0cpsであった。The analysis results of the photopolymerizable vinyl monomer obtained were determined by NMR.
, IR confirmed that it was the polymerizable monomer (tII). Its acid value is 0.56 and viscosity is 20
It was 0 cps.
参考例5
キシレン4109、参考例4で挙げた2官能工ポキシ化
合物5269、アクリル酸72g、純水189およびテ
トラブチルアンモニウムクロライド1gを仕込む以外は
、参考例4と同様の操作を行ない前記重合性モノマー(
I[)を得た。酸価は0.59、粘度は170cpsで
あった。Reference Example 5 The same operation as in Reference Example 4 was performed except that xylene 4109, bifunctional engineered poxy compound 5269 mentioned in Reference Example 4, 72 g of acrylic acid, pure water 189 and 1 g of tetrabutylammonium chloride were added to prepare the polymerizable monomer. (
I[) was obtained. The acid value was 0.59 and the viscosity was 170 cps.
参考例6
キシレン3309、参考例4で挙げた2官能工ポキシ化
合物5269、アクリル酸1449.テトラブチルアン
モニウムクロライド19を仕込む以外、は参考例4と同
様の操作を行ない前記重合性モノマー(IV)を得た。Reference Example 6 Xylene 3309, bifunctional poxy compound 5269 listed in Reference Example 4, acrylic acid 1449. The polymerizable monomer (IV) was obtained by carrying out the same operation as in Reference Example 4, except that tetrabutylammonium chloride 19 was charged.
参考例7
撹拌機とコンデンサーと温度調整器を備えた2eコルベ
ン中に、構造式
が主成分であるポリエチレングリコールモノメタクリレ
ート化合物(日本油脂株式会社からブレンマーPE35
0として市販)9649、グリシドール(ダイセル化学
工業株式会社製月48gおよびジメチルベンジルアミン
119を仕込み、空気を吹き込みながら撹拌し、120
℃〜140℃まで温度を上げ、1時間維持した。その後
、室温まで温度を冷却した。Reference Example 7 In a 2e Kolben equipped with a stirrer, a condenser, and a temperature regulator, a polyethylene glycol monomethacrylate compound whose main component is a polyethylene glycol monomethacrylate compound (Blenmar PE35 from NOF Corporation)
9649 (commercially available as 0), 48 g of glycidol (manufactured by Daicel Chemical Industries, Ltd.) and dimethylbenzylamine 119, and stirred while blowing air.
The temperature was raised to 140°C and maintained for 1 hour. Thereafter, the temperature was cooled to room temperature.
得られた光重合性ビニルモノマーの分析結果は、NMR
S [Rとから前記重合性モノマー(■)であることが
確認された。その酸価は0.10であり、粘度は150
cpsであった。The analysis results of the photopolymerizable vinyl monomer obtained were determined by NMR.
It was confirmed from S[R that it was the polymerizable monomer (■). Its acid value is 0.10 and viscosity is 150
It was cps.
参考例8
ポリエチレングリコールモノアクリレート化合物936
g、グリシドール148gおよびジメチルベンジルアミ
ンl1gを仕込む以外は、参考例7と同様の操作を行い
前記重合性モノマー(Vl)を得た。酸価は0.12、
粘度は130cpsであった。Reference Example 8 Polyethylene glycol monoacrylate compound 936
The polymerizable monomer (Vl) was obtained by carrying out the same operation as in Reference Example 7, except that 148 g of glycidol and 1 g of dimethylbenzylamine were charged. Acid value is 0.12,
The viscosity was 130 cps.
実施例1
ポリビニルアルコール共重合体a(ビニルエステル単位
のケン化度63モル%、重合度320)100重量部、
エチレングリコール15重量部、純水10重量部をニー
グーに入れ、温度80〜85℃で30分間混合した。Example 1 100 parts by weight of polyvinyl alcohol copolymer a (degree of saponification of vinyl ester units: 63 mol%, degree of polymerization: 320),
15 parts by weight of ethylene glycol and 10 parts by weight of pure water were placed in a Nigu and mixed for 30 minutes at a temperature of 80 to 85°C.
p−メトキシフェノール0.1部、2.6−ジーし一ブ
チルーp−クレゾール0.4部、2.2°−ジメトキシ
−2−フェニルアセトフェノン3部を前記参考例4で合
成した重合性モノマー(III)100部に溶解した。The polymerizable monomer ( III) Dissolved in 100 parts.
得られた溶液を上記の混合物に添加し、80℃で30分
混練し、混合物を2軸押用機を用いて80℃で連続的に
供給、l見合、脱泡し、ハレーション防止剤を塗布した
厚さ0.21の処理鉄板上に0 、5 JIffの厚さ
に吐出した。次いで、カバーフィルムをラミネートした
。The obtained solution was added to the above mixture, kneaded at 80°C for 30 minutes, and the mixture was continuously fed at 80°C using a twin-screw extruder, defoamed, and coated with an antihalation agent. It was discharged onto a treated iron plate with a thickness of 0.21 to a thickness of 0.5 JIff. A cover film was then laminated.
この感光性樹脂版材の感光性表面にテスト用ネガティブ
フィルム(150線3%、5%、10%、20%網点、
直径100μ、200μ、独立点、幅40μ、60μ細
線部あり)を真空密着させ、3Kw高圧水銀灯を70c
mの距離から照射した。A test negative film (150 lines, 3%, 5%, 10%, 20% halftone dots,
(diameter 100μ, 200μ, independent point, width 40μ, 60μ thin line part) are vacuum-adhered, and a 3Kw high-pressure mercury lamp is attached to a 70c
It was irradiated from a distance of m.
照射時間は前露光3秒、主露光15秒であった。The irradiation time was 3 seconds for pre-exposure and 15 seconds for main exposure.
この露光済み版材に対し、40℃の中性水をスプレー現
像装置から圧力4kg/crtt”で1分20秒間吹き
付けて現像を行なった。未露光部分、すなわち、未硬化
部分が水中に溶出してレリーフが得られた。このように
して得られたレリーフ版を100℃で2分間乾燥したと
ころ、3%網点、直径100μ独立点、幅40μ細線の
脱落かみられなかった。 この版材を、パンダークック
校正刷機(パンダークック社製)を用いて印刷したとこ
ろ、ベタ部の濃度が120(マクベス反射濃度計で測定
)で、かつベタ部のツブシの良い紙面が得られた。This exposed plate material was developed by spraying neutral water at 40° C. from a spray developing device at a pressure of 4 kg/crtt for 1 minute and 20 seconds. When the relief plate thus obtained was dried at 100°C for 2 minutes, no dropout of 3% halftone dots, independent points of 100μ in diameter, and fine lines of 40μ in width was observed. When printed using a Pandercook proofing press (manufactured by Pandercook Co., Ltd.), a paper surface with a density of 120 (measured with a Macbeth reflection densitometer) in the solid areas and good sharpness in the solid areas was obtained.
尚、この版材を作製するにあたり用いた2軸押用機吐出
物を、2+u厚のスペーサーを用い、フレキソブレス機
で2屑肩厚の感光性樹脂板を作製した。Incidentally, a photosensitive resin plate having a thickness of 2 mm was produced using a flexo press machine using a spacer having a thickness of 2+U from the discharged product of the twin screw press used to produce this plate material.
この仮を3Kw高圧水銀灯で5分間露光した。20R角
に切り取り、12autの厚みになるように重ね合わせ
て硬度、弾性を測定したところ、硬度が53°(20℃
で測定)、反発弾性値が28%(JISK−6301法
、20℃で測定)を有する柔軟性のある板であった。This sample was exposed to light for 5 minutes using a 3Kw high pressure mercury lamp. The hardness and elasticity of the pieces were measured by cutting them into 20R squares and stacking them to a thickness of 12aut.
It was a flexible board with a rebound resilience value of 28% (measured by JISK-6301 method at 20°C).
1例2〜7および比較例1〜3
表−1に示すポリビニルアルコール共重合体と重合性モ
ノマーの組合せにより、実施例1と同様に感光性樹脂版
材を得、同様の実験を行なった。Examples 2 to 7 and Comparative Examples 1 to 3 Photosensitive resin plate materials were obtained in the same manner as in Example 1 using the combinations of polyvinyl alcohol copolymers and polymerizable monomers shown in Table 1, and the same experiments were conducted.
製版条件および実験結果を表−1に示す。The plate-making conditions and experimental results are shown in Table-1.
比較のために、下記の3種の重合性モノマー80部と前
記参考例で得られたポリビニルアルコール共重合体10
0部との組合せで同様の実験を行なった。結果を表−1
に示す。For comparison, 80 parts of the following three types of polymerizable monomers and 10 parts of the polyvinyl alcohol copolymer obtained in the above reference example were used.
A similar experiment was conducted in combination with 0 parts. Table 1 shows the results.
Shown below.
*1ケン化度60モル%、重合度300のポリビニルア
ルコール。*1 Polyvinyl alcohol with a degree of saponification of 60 mol% and a degree of polymerization of 300.
*、ケン化度70モル%、重合度300のポリビニルア
ルコール。*, polyvinyl alcohol with a degree of saponification of 70 mol% and a degree of polymerization of 300.
*3参考例1よりメルカプト基を除いたケン化度64モ
ル%、重合度320のポリビニルアルコール。*3 Polyvinyl alcohol with a degree of saponification of 64 mol% and a degree of polymerization of 320, excluding mercapto groups from Reference Example 1.
Claims (1)
合可能なノニオン性単量体(A)および/またはイオン
性親水基含有重合性単量体(B)を共重合して得られる
共重合体で、A単量体とB単量体の合計量が0.1〜2
0モル%であり、残りが前記ビニルエステルである(但
し、A単量体の量は20モル%を越えず、B単量体の量
は10モル%を越えない。)共重合体をケン化して得ら
れる共重合体であって、ビニルエステル単位のケン化度
が50〜70モル%、熱溶融流動開始温度が60〜13
0℃でかつ末端にメルカプト基を有する水溶性または水
分散性のポリビニルアルコール系共重合体、 (ロ)式: ▲数式、化学式、表等があります▼( I ) [式( I )中、 X:▲数式、化学式、表等があります▼ Y:−OH、▲数式、化学式、表等があります▼、 ▲数式、化学式、表等があります▼または−OR_5 但し、R_1、R_3およびR_4は同一または異なっ
て、それぞれ水素原子またはメチル基、R_2は水酸基
を有する炭素数1〜5のアルキレン基、R_5は水酸基
を有する炭素数1〜5のアルキル基、nは4〜23の整
数、mは0または1、およびpは1〜5の整数を示す。 ] を有し、かつ少なくとも2個の遊離水酸基を有する重合
性モノマー、および (ハ)光重合開始剤 を含有する溶融成形可能な水現像性感光性樹脂組成物。 2、チオール酸がチオール酢酸である請求項1記載の組
成物。 3、ビニルエステルが酢酸ビニルである請求項1記載の
組成物。 4、ノニオン性単量体(A)がアクリル酸メチルである
請求項1記載の組成物。 5、イオン性親水基含有単量体(B)が2−アクリルア
ミド−2−メチルプロパンスルホン酸ナトリウムである
請求項1記載の組成物。 6、ポリビニルアルコールのビニルエステル単位のケン
化度が55〜68モル%である請求項1記載の組成物。 7、成分(イ)、(ロ)、(ハ)の配合割合が(ロ)1
00重量部に対し、(ハ)が0.01〜10重量部、(
イ)が50〜300重量部である請求項1記載の組成物
。 8、水含量が10重量%以下である請求項1記載の組成
物。 9、基材上に請求項1〜8のいずれかに記載の水現像性
感光性樹脂組成物を設けてなる水現像性感光性樹脂板。 10、請求項9の樹脂板を用いて得られた印刷版。 11、請求項1〜8のいずれかに記載の水現像性感光性
樹脂組成物を溶融成形により基材上に塗布することを特
徴とする水現像性感光性樹脂板の製法。 12、水現像性感光性樹脂組成物が水含量10重量%以
下を有する請求項11記載の製法。 13、請求項9記載の樹脂板を画像を有するネガフィル
ムを介して露光し、次いで未露光部分を水洗することを
特徴とする印刷版の製法。[Claims] 1. (a) A vinyl ester, a copolymerizable nonionic monomer (A), and/or an ionic hydrophilic group-containing polymerizable monomer (B) in the presence of thiol acid. A copolymer obtained by polymerization, in which the total amount of A monomer and B monomer is 0.1 to 2
0 mol% and the remainder is the vinyl ester (however, the amount of A monomer does not exceed 20 mol% and the amount of B monomer does not exceed 10 mol%). A copolymer obtained by converting vinyl ester units into a copolymer having a saponification degree of 50 to 70 mol% and a hot melt flow initiation temperature of 60 to 13%.
A water-soluble or water-dispersible polyvinyl alcohol copolymer having a mercapto group at the end at 0°C, Formula (B): ▲There are mathematical formulas, chemical formulas, tables, etc.▼(I) [In formula (I), X : ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ Y: -OH, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ or -OR_5 However, R_1, R_3 and R_4 are the same or Differently, each is a hydrogen atom or a methyl group, R_2 is an alkylene group having 1 to 5 carbon atoms having a hydroxyl group, R_5 is an alkyl group having 1 to 5 carbon atoms having a hydroxyl group, n is an integer of 4 to 23, m is 0 or 1 and p represent an integer of 1 to 5. ] A melt-moldable water-developable photosensitive resin composition containing a polymerizable monomer having the following and at least two free hydroxyl groups, and (c) a photopolymerization initiator. 2. The composition according to claim 1, wherein the thiol acid is thiol acetic acid. 3. The composition according to claim 1, wherein the vinyl ester is vinyl acetate. 4. The composition according to claim 1, wherein the nonionic monomer (A) is methyl acrylate. 5. The composition according to claim 1, wherein the ionic hydrophilic group-containing monomer (B) is sodium 2-acrylamido-2-methylpropanesulfonate. 6. The composition according to claim 1, wherein the degree of saponification of the vinyl ester unit of polyvinyl alcohol is 55 to 68 mol%. 7. The blending ratio of ingredients (a), (b), and (c) is (b) 1
00 parts by weight, (c) is 0.01 to 10 parts by weight, (
2. The composition according to claim 1, wherein a) is 50 to 300 parts by weight. 8. The composition according to claim 1, having a water content of 10% by weight or less. 9. A water-developable photosensitive resin plate comprising the water-developable photosensitive resin composition according to any one of claims 1 to 8 provided on a substrate. 10. A printing plate obtained using the resin plate according to claim 9. 11. A method for producing a water-developable photosensitive resin plate, which comprises applying the water-developable photosensitive resin composition according to any one of claims 1 to 8 onto a substrate by melt molding. 12. The method according to claim 11, wherein the water-developable photosensitive resin composition has a water content of 10% by weight or less. 13. A method for producing a printing plate, which comprises exposing the resin plate according to claim 9 to light through a negative film having an image, and then washing the unexposed portions with water.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63007884A JP2563955B2 (en) | 1987-01-17 | 1988-01-18 | Photosensitive resin composition |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62-8815 | 1987-01-17 | ||
JP881587 | 1987-01-17 | ||
JP63007884A JP2563955B2 (en) | 1987-01-17 | 1988-01-18 | Photosensitive resin composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63314537A true JPS63314537A (en) | 1988-12-22 |
JP2563955B2 JP2563955B2 (en) | 1996-12-18 |
Family
ID=26342268
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63007884A Expired - Lifetime JP2563955B2 (en) | 1987-01-17 | 1988-01-18 | Photosensitive resin composition |
Country Status (1)
Country | Link |
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JP (1) | JP2563955B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001031709A (en) * | 1999-07-21 | 2001-02-06 | Soken Chem & Eng Co Ltd | Block polymerization of acrylic monomer |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63177128A (en) * | 1987-01-17 | 1988-07-21 | Nippon Paint Co Ltd | Photosensitive resin composition |
-
1988
- 1988-01-18 JP JP63007884A patent/JP2563955B2/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63177128A (en) * | 1987-01-17 | 1988-07-21 | Nippon Paint Co Ltd | Photosensitive resin composition |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001031709A (en) * | 1999-07-21 | 2001-02-06 | Soken Chem & Eng Co Ltd | Block polymerization of acrylic monomer |
Also Published As
Publication number | Publication date |
---|---|
JP2563955B2 (en) | 1996-12-18 |
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