JPS63286337A - Insulating molding with metallic luster - Google Patents

Abstract

PURPOSE:To cause the earth of a molding to be unnecessary, while the risk of electric shock is prevented by making the metal deposited layer of a metal deposited film into an insular structure and providing its insulation. CONSTITUTION:To give metallic luster to a molding body, the metal deposited layer of the metal deposited film used for sticking simultaneously with the molding-forming to the molding body such as vinylchloride sheet or for forming a molding after sticking preliminarily to the resin for forming the molding, is made into an insular-structure, thereby providing its insulation property. The film used for metal deposited film is a polyethylene terephthalate film or a polyvinyl chloride film. The size of the island in the insular structure is about 200Angstrom -1mum, and the interval of the lands is 100Angstrom -5000Angstrom . To obtain the insular structure of the metal deposited layer, the evaporation speed and the thickness of the deposited layer, etc., must be controlled. The control for obtaining the size or interval of the island is relatively easy in the metal of low melting point or a noble metal, and Sn, Pb, Zn, Bi, etc., are preferable.

Description

[Detailed Description of the Invention] (Industrial Application Field) This invention relates to a metallic luster molding, particularly for televisions and VTs.
This invention relates to an insulating molding having a metallic luster that is useful when used as a decorative molding for the outer frame of electronic equipment such as R.

(Prior Art) Conventionally, metallic gloss molding has been used to decorate the outer frame of electronic devices such as televisions and VTRs.
The mold is formed by laminating foil or AI vapor-deposited film with resin for molding molding, or the two are laminated together at the same time as molding. When used in electronic equipment such as televisions and VTRs, the metal deposited layer of the aluminum foil or metal deposited film is charged with electric charge, and when a person comes into contact with it, an electric shock occurs, and conversely, the electric charge charged on the human body Therefore, when using Ad foil, it is usually grounded, and when using AJ vapor deposition film, it is practically difficult to ground. There is always a risk of the electric shock mentioned above occurring.

This invention eliminates these drawbacks, and provides an insulating molding with a metallic luster that is insulating despite having a metallic luster, and thus does not cause electric shock and of course does not require grounding. It provides:

(Means for Solving the Problems) The present invention provides a metallic luster molding consisting of a molding body and a metallized film bonded thereto, in which the metallized layer of the metallized film is formed into an island-like structure. , an insulating molding with metallic luster, characterized by having R properties.

In order to impart metallic luster to the molding body, this invention is applicable to the case where the molding body is laminated to a molding body such as a vinyl chloride sheet at the same time as molding the molding, or when it is laminated with resin for molding molding in advance and then molded. A major feature is that the metal vapor deposited film used, particularly the metal vapor deposited layer of the metal vapor deposited film, is made into an island structure to provide insulation properties.

The molding body and the metallized film may be bonded to each other on either the film side of the metallized film or the metallized layer side on the outside or inside. A colored or uncolored protective layer may of course be present on the metallized layer. Further, the metallized film may be a sheet pasted with another plastic film or the like.

Films used for metallized films include polyethylene terephthalate film, polypropylene film, polyethylene film, polyvinyl chloride film,
Various other plastic films can be used.

The metal vapor deposition layer is provided by a conventionally known thin film forming method such as vacuum deposition, sputtering, or ion blasting. In terms of the thin film production process, the metal vapor deposition layer is provided so as to form an island structure after passing through "nucleation", "bonding", and "initial island structure".

In this invention, the structure of the metal vapor deposited layer is made into an island-like structure, thereby making the layer insulating even though metal is used. The size of the island in the island structure is 200
It should be about 1 μm for humans. If the size of the island is smaller than 200λ, a beautiful metallic luster cannot be obtained. Island size is 1μ
If it exceeds m, the islands will come into contact with each other and become a single piece, resulting in a decrease in insulation properties.

The spacing between islands is 1001 to 5oooX. The spacing between 0 islands is 1.
If it is smaller than 001, tunnel current will flow and the insulation will be poor.

If the spacing between the islands is larger than s o o o x, the amount of metal as a whole will be small and a beautiful metallic luster will not be obtained.

Furthermore, if the distance between the islands exceeds 5oooi, the density of the metal vapor deposited layer in the plane direction becomes coarse and the wear resistance decreases. It is necessary to control the film thickness, etc. Controlling the size and spacing of the islands in this invention is difficult depending on the metal used. Generally speaking, metals with low melting points and precious metals are relatively easy to control, especially Sn, Pbs, Zn,
Bi and the like are particularly preferred for this invention. Also, T1, C
It is not relatively easy to control transition metals such as Co and Ni and conductor metals such as Si and Ge.The generation of the metal vapor deposited layer with the island-like structure of the present invention depends on the cohesive energy and adsorption energy of the metal. In order to control the relationship between is especially large.

In the case of Sn, which is a typical metal used in this invention, S
If the light transmittance of the fourth layer is less than 3 to 113%, the dielectric breakdown voltage will not reach 100OVK, and if the light transmittance exceeds 15%, the dielectric breakdown voltage will be 12ooov or more, but the beautiful metallic luster will be lost. To obtain a beautiful metallic luster an
In the case of a single vapor deposited layer, a gloss level of approximately SSO% or higher is required, but if the light transmittance of the Sn vapor deposited layer is 15% or lower, the gloss level will be 350% or higher. However, Sn
If the light transmittance of the vapor-deposited layer is as low as 5 to 10%, the gloss will be 450% or more, but the dielectric breakdown voltage will be 10%.
(IOV will no longer be reached.

(Example) A button deposition layer was vacuum deposited on one side of a long polyethylene terephthalate film with a thickness of 12 μm using a semi-continuous vacuum deposition machine, and was provided in the following island-like structure under the following deposition conditions. Example 1 and Example 2 were obtained. Furthermore, a vinyl chloride-vinyl acetate copolymer resin was applied to a thickness of 2 μm using a roll coater on the Sn vapor-deposited layer of these Examples, and then heated with a 200 μm thick vinyl chloride film. , pressure laminated.Then, the thus obtained material was slit into 1tll'1 width.
At the same time as molding the mold with vinyl chloride resin, a vinyl chloride film was attached to the inside and a polyethylene terephthalate film was pasted to the outside to obtain an insulating mold with metallic luster.

The light transmittance was controlled by controlling the film winding speed. *The total light transmittance was measured using the method of J Engineering 5K6714. *The size of the islands was determined by measuring the deposited layer using an electron microscope. Regarding the spacing of Kurushima, which was observed and displayed as an average size, the vapor deposited layer was observed with an electron microscope and the average spacing was displayed (comparative example). A
A metallic luster molding was prepared in the same manner as in Example 1, except that the d vapor deposited layer was used, and this was used as a comparative example.

Next, the dielectric breakdown voltage was measured using some of the metal-deposited films in Example 1), Example 2, and the above-mentioned Comparative Example before the vinyl chloride film was attached as samples. The measurement method is to contact the surface of the metal vapor deposited layer of the sample with a sav/cylindrical electrode and a guard ring electrode with a thickness of 5 fins, apply a voltage between these two electrodes, and create holes in the metal vapor deposited layer due to discharge. The voltage when the polyethylene terephthalate film was exposed was measured.

The results of measuring the dielectric breakdown voltage in Example 1, Example 2, and Comparative Example in this manner are as follows. The surface gloss of each sample was also measured.

(Effects of the Invention) This invention makes it possible to easily obtain a dielectric breakdown voltage of 100V or more because the metal vapor deposited layer has an island-like structure and has insulating properties. When used on the outer frame of electronic devices such as televisions and VTRs, it can be used safely without any electricity being applied even if the hand melts, and the same beautiful metallic luster as before can be obtained. It is something.

Claims (1)

[Claims] An insulating mold with metallic luster, which is composed of a molding body and a metallized film laminated thereon, characterized in that the metallized layer of the metallized film has an island-like structure to provide insulation properties. .