JPS63256117A - Method for removing water soluble impurity incorporated in gas containing high-concentration sulfur compound - Google Patents
Method for removing water soluble impurity incorporated in gas containing high-concentration sulfur compoundInfo
- Publication number
- JPS63256117A JPS63256117A JP62088946A JP8894687A JPS63256117A JP S63256117 A JPS63256117 A JP S63256117A JP 62088946 A JP62088946 A JP 62088946A JP 8894687 A JP8894687 A JP 8894687A JP S63256117 A JPS63256117 A JP S63256117A
- Authority
- JP
- Japan
- Prior art keywords
- water
- gas
- impurities
- absorption
- hcn
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 45
- 239000012535 impurity Substances 0.000 title claims abstract description 26
- 238000000034 method Methods 0.000 title claims description 32
- 150000003464 sulfur compounds Chemical class 0.000 title claims description 16
- 238000010521 absorption reaction Methods 0.000 claims abstract description 40
- 238000001816 cooling Methods 0.000 claims abstract description 17
- 239000007788 liquid Substances 0.000 claims description 10
- 239000002250 absorbent Substances 0.000 claims description 3
- 230000002745 absorbent Effects 0.000 claims description 3
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 claims 1
- 229910052717 sulfur Inorganic materials 0.000 abstract description 8
- 239000008400 supply water Substances 0.000 abstract description 5
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 abstract 2
- 239000011593 sulfur Substances 0.000 abstract 2
- 239000007789 gas Substances 0.000 description 49
- LELOWRISYMNNSU-UHFFFAOYSA-N hydrogen cyanide Chemical compound N#C LELOWRISYMNNSU-UHFFFAOYSA-N 0.000 description 40
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 10
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 239000000571 coke Substances 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 4
- JMANVNJQNLATNU-UHFFFAOYSA-N oxalonitrile Chemical compound N#CC#N JMANVNJQNLATNU-UHFFFAOYSA-N 0.000 description 4
- 229910052979 sodium sulfide Inorganic materials 0.000 description 4
- GRVFOGOEDUUMBP-UHFFFAOYSA-N sodium sulfide (anhydrous) Chemical compound [Na+].[Na+].[S-2] GRVFOGOEDUUMBP-UHFFFAOYSA-N 0.000 description 4
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000000746 purification Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000008929 regeneration Effects 0.000 description 2
- 238000011069 regeneration method Methods 0.000 description 2
- HYHCSLBZRBJJCH-UHFFFAOYSA-M sodium hydrosulfide Chemical compound [Na+].[SH-] HYHCSLBZRBJJCH-UHFFFAOYSA-M 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000006477 desulfuration reaction Methods 0.000 description 1
- 230000023556 desulfurization Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003546 flue gas Substances 0.000 description 1
- 239000008235 industrial water Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
- Gas Separation By Absorption (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、ガス状の水溶性不純物(以下該不純物という
)、例えばシアン化水素(HCN)を含む高濃度硫黄化
合物含有ガスを水を吸収剤とする吸収塔で処理して該不
純物を除去する方法に関するものであシ、特にコークス
炉ガス精製設備から得られる高濃度H,S含有ガスから
該不純物を除去する方法に関する。以下便宜上載不純物
がHCNである場合につき例示的に説明する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention provides a method for absorbing a gas containing a highly concentrated sulfur compound containing gaseous water-soluble impurities (hereinafter referred to as the impurities), such as hydrogen cyanide (HCN), using water as an absorbent. The present invention relates to a method of removing impurities by treatment with an absorption tower, and particularly relates to a method of removing these impurities from a high concentration H, S-containing gas obtained from a coke oven gas purification facility. For convenience, the case where the impurity to be deposited is HCN will be exemplified below.
コークス炉ガス中の硫化水素(Has)を回収する方法
として、Na1CO1水溶液を吸収液として使用した吸
収塔に、コークス炉ガスを導入して、迅SをN 2J
CO3水溶液に吸収させ、その吸収液を再生塔にて減圧
再生することにより高濃度H!S含有ガスを回収する方
法がある。このアルカリ吸収液を使用した化学吸収方法
では、H,Sの他にコークス炉ガス中のHCN、Cot
等の酸性ガス及びナフタリン等も吸収除去され、減圧再
生によってH,Sに同伴してHCN、Cot、ナフタリ
ン等も回収される。回収された高濃度当8含有ガスは硫
酸、′gIt化水素ナトリウム及び硫化ナトリウム等の
原料として利用される。こうして回収されたガスを硫酸
製造用原料として使用する場合には特に問題はないが、
硫化水素す)9ウムあるいは硫化ナトリウムを製造する
際にはI(CNおよびナフタリン等の混入は品質低下の
原因とまるので予め除去しておく必要がある。As a method for recovering hydrogen sulfide (Has) from coke oven gas, coke oven gas is introduced into an absorption tower using Na1CO1 aqueous solution as an absorption liquid, and the
Highly concentrated H! is absorbed into a CO3 aqueous solution and the absorbed liquid is regenerated under reduced pressure in a regeneration tower. There is a method of recovering S-containing gas. In the chemical absorption method using this alkaline absorption liquid, in addition to H and S, HCN and Cot in coke oven gas are
Acid gases such as Naphthalene, etc. are also absorbed and removed, and HCN, Cot, Naphthalene, etc. are also recovered along with H and S by reduced pressure regeneration. The recovered high-concentration 8-containing gas is used as a raw material for sulfuric acid, sodium hydrogenide, sodium sulfide, and the like. There are no particular problems when using the gas recovered in this way as a raw material for sulfuric acid production, but
When producing hydrogen sulfide (I)9um or sodium sulfide, contamination with I(CN, naphthalene, etc.) must be removed in advance because it causes quality deterioration.
また乾式排煙脱硫工程における吸着剤の再生により回収
される高濃度SOW含有ガスなど各種硫黄化合物の製造
に利用される高濃度SO,含有ガスにもHCNを含むも
のがあシ、使用目的によってはHCNの除去精製を行な
う必要がある。In addition, some of the high-concentration SO and gases used to produce various sulfur compounds, such as high-concentration SOW-containing gas recovered by regenerating the adsorbent in the dry flue gas desulfurization process, also contain HCN, depending on the purpose of use. It is necessary to perform purification to remove HCN.
ガス中のHCNを簡単に吸収除去する方法としてア〃カ
リで吸収させる方法があるが、H2S。One way to easily absorb and remove HCN in gas is to use alkali to absorb it, but H2S.
So、等の硫黄化合物含有ガス中のHCNを除去する場
合には、HCNだけでなく硫黄化合物も吸収除去されて
しまいこの方法は使用できない。When removing HCN from a gas containing sulfur compounds such as So, this method cannot be used because not only HCN but also the sulfur compounds are absorbed and removed.
従来、:−クス炉ガスから回収される高濃度H,S含有
ガスから硫化水素ナトリウム及び硫化ナトリウムを製造
する工程において、HCl1を除去する方法として、具
体的には第2図に示すような吸収塔が使用されている。Conventionally, in the process of producing sodium hydrogen sulfide and sodium sulfide from high-concentration H, S-containing gas recovered from gas furnace gas, the method of removing HCl1 was specifically an absorption method as shown in Figure 2. tower is used.
高濃度%S含有ガスは、供給フィン2から吸収塔1へ導
入されて塔上部からの供給水によってHCNを吸収除去
された後、脱HCNガスとして次工程へ送られ、Nl!
LOH水溶液に吸収、反応させて硫化水素ナトリウムお
よび硫化ナトリウムに変換される。The high concentration % S-containing gas is introduced into the absorption tower 1 from the supply fin 2, and after HCN is absorbed and removed by the water supplied from the top of the tower, it is sent to the next step as a deHCN gas, and the Nl!
It is absorbed and reacted with LOH aqueous solution and converted into sodium hydrogen sulfide and sodium sulfide.
ところが、I(CNの吸収除去水として通常は工業用水
等が使われているため、水温の変動がHC’Hの除去に
大きな影響を与えている。tたコークス炉ガスの精製装
置からの高濃度H,8含有ガスは、通常70〜90℃の
温度で供給される。一方HCNの吸収除去のためには低
温で処理する方が有利であシ、このガスを第1図に示す
ような吸収塔を使用して処理し、HCNを吸収除去する
場合には多量の供給水を用いて液の昇温を抑える必要が
ある。However, since industrial water is usually used as the water for absorption and removal of I(CN), fluctuations in water temperature have a large effect on the removal of HC'H. A gas containing H,8 concentration is normally supplied at a temperature of 70 to 90°C.On the other hand, for the absorption and removal of HCN, it is more advantageous to process at a low temperature, and this gas is supplied at a temperature of 70 to 90°C. When treating using an absorption tower to absorb and remove HCN, it is necessary to suppress the temperature rise of the liquid by using a large amount of feed water.
本発明は前記の問題点を解決し、供給水の量を最少限に
し、効率よく硫黄化合物含有ガス中の水溶性不純物を水
洗除去するための改良された方法を提供するものである
。The present invention solves the above problems and provides an improved method for efficiently washing away water-soluble impurities in a sulfur compound-containing gas while minimizing the amount of water supplied.
本発明はガス状の水溶性不純物を含む高濃度硫黄化合物
含有ガスを水を吸収剤とする吸収塔で処理して該不純物
を除去する方法において、上段を吸収部とし下段を冷却
部とした2段式の吸収塔を用い、該処理ガスを塔下部よ
り導入し、冷却部において多量の循環水と接触させて冷
却すると共に一部の該不純物を吸収させ、次いで吸収部
において少量の水と接触させることにより残存する該不
純物を吸収させて除去するようにした高濃度硫黄化合物
含有ガス中に含まれる該不純物の除去方法である。The present invention provides a method for removing gaseous impurities by treating a gas containing highly concentrated sulfur compounds containing gaseous water-soluble impurities in an absorption tower using water as an absorbent. Using a stage-type absorption tower, the treated gas is introduced from the bottom of the tower, cooled by contacting with a large amount of circulating water in the cooling section and absorbing some of the impurities, and then contacted with a small amount of water in the absorption section. This is a method for removing impurities contained in a gas containing a high concentration of sulfur compounds, by absorbing and removing the remaining impurities.
以下、本発明の方法を図面に基づいて説明する。Hereinafter, the method of the present invention will be explained based on the drawings.
第1図は本発明に係る方法の突流態様例のフローである
。1は吸収塔であシ、上段の吸収部と下段の冷却部の2
つの部分から成シ立っている。硫黄化合物含有ガスは、
供給ガスツイン2によって吸収塔1へ導入され、冷却と
E(CMの吸収除去後、排出ガスフィン3を通って次の
工程へ送られる。FIG. 1 is a flow diagram of an exemplary rush flow embodiment of the method according to the present invention. 1 is an absorption tower, with 2 parts: an upper absorption section and a lower cooling section.
It is made up of two parts. Gases containing sulfur compounds are
It is introduced into the absorption tower 1 by the feed gas twin 2, and after cooling and absorption and removal of E (CM), it is sent to the next step through the exhaust gas fin 3.
吸収塔へ導入された硫黄化合物含有ガスは、吸収塔下段
のガス冷却部において、循環ポンプ4によって循環され
る循環水及び上段のHCN吸収部においてHCNを吸収
した後の供給水と吸収塔1内で直接接触して冷却される
と同時にHCNの大半(50〜80%)が吸収除去され
る。この時の冷却部の循環水の温度は、熱交換器5によ
って20〜30℃、好ましくは20〜25℃の温度に調
温されて吸収塔1に供給される。温度が高すぎるとHC
’Hの吸収が悪くな択また低すぎると冷却のための設備
が過大となυ所要エネルギーも大きくなるので好ましく
ない。The sulfur compound-containing gas introduced into the absorption tower is mixed with the circulating water circulated by the circulation pump 4 in the gas cooling section at the lower stage of the absorption tower, the feed water after HCN has been absorbed in the HCN absorption section at the upper stage, and the inside of the absorption tower 1. Most of the HCN (50-80%) is absorbed and removed at the same time as it is cooled by direct contact. At this time, the temperature of the circulating water in the cooling section is controlled by the heat exchanger 5 to 20 to 30°C, preferably 20 to 25°C, and then supplied to the absorption tower 1. If the temperature is too high, HC
If the absorption of H is too low, the cooling equipment becomes too large and the required energy becomes large, which is not preferable.
この冷却部において硫黄化合物含有ガス中の水分の凝縮
及び上段の供給水により塔内の液面が上昇することを防
ぐため及び循環水中のHCNの濃縮を防ぐために、循環
ポンプ4の吐出側のブロー水フィン8より循環水の一部
を排水する。In this cooling section, in order to prevent the liquid level in the tower from rising due to the condensation of moisture in the sulfur compound-containing gas and the supply water in the upper stage, and to prevent the concentration of HCN in the circulating water, blowing is performed on the discharge side of the circulation pump 4. A portion of the circulating water is drained from the water fins 8.
この時の下段の冷却部での液ガス比(L/()’)は、
15〜25 (17m”) 、好ましくは18〜22
(t/が)とする。At this time, the liquid-gas ratio (L/()') in the lower cooling section is:
15-25 (17m”), preferably 18-22
(t/ is).
下段で20〜30℃、好ましくは20〜25℃の温度に
冷却された硫黄化合物含有ガスは、上段のT(CN吸収
部においてHC’Hの除去に必要な最小流量の水で高度
吸収除去される。この上段での液ガス比(L/G)は、
4〜7(t/ms )とする。第2図に示す従来方法で
はL / aを10以上にする必要があシ、従来の使用
水量の半分程度まで節水できる。また、上段の供給水ラ
イン9にも熱交換器6を設置し、供給水の温度を30℃
以下、好ましく゛は20〜25℃として吸収塔に供給す
るのが望ましい。The sulfur compound-containing gas cooled to a temperature of 20 to 30°C, preferably 20 to 25°C in the lower stage is highly absorbed and removed by water at the minimum flow rate necessary for removing HC'H in the upper stage T (CN absorption section). The liquid-gas ratio (L/G) at this upper stage is
4 to 7 (t/ms). In the conventional method shown in FIG. 2, it is necessary to set L/a to 10 or more, and water can be saved to about half the amount of water used in the conventional method. In addition, a heat exchanger 6 is also installed in the upper supply water line 9, and the temperature of the supply water is kept at 30°C.
Hereinafter, it is preferable to supply the mixture to the absorption tower at a temperature of 20 to 25°C.
本発明の方法によれば従来の方法と比較して約半分程度
の量の吸収用水を補給するだけではy完全にガス状の水
溶性不純物、特にHCNの除去ができ、また、冷却部で
多量の循環水と接触させて直接冷却を行なうのでガス中
にナフタリン等の昇華性物質が含有されていても管の閉
塞等のトラブルを生ずる恐れがない。According to the method of the present invention, gaseous water-soluble impurities, especially HCN, can be completely removed by only replenishing about half the amount of absorption water compared to the conventional method, and a large amount of HCN can be removed in the cooling section. Because the gas is directly cooled by contact with the circulating water, there is no risk of problems such as pipe blockage even if the gas contains sublimable substances such as naphthalene.
以下実施例により本発明の方法を具体的に説明する。The method of the present invention will be specifically explained below using Examples.
第1図の装置を使用し表1に示す組成の高濃度H,S含
有ガスを表2に示す条件に従って水洗処理した。精製ガ
スの組成は表1のとおシで脱シアン率は99%であった
。Using the apparatus shown in FIG. 1, a gas containing high concentrations of H and S having the composition shown in Table 1 was washed with water according to the conditions shown in Table 2. The composition of the purified gas was as shown in Table 1, and the cyanogen removal rate was 99%.
表1
表2
〔比較例〕
実施例と同一のガスを第2図の従来方法に従って処理し
た。すなわち供給ガス量800〜900m3 N、供給
ガス温度70〜80℃で供給水量は1s(t/が一供給
ガス)、液ガス比13(t/mJ、液f!L20℃で処
理した結果本発明の方法である実施例に比較しはy2倍
量の供給水を必要としたにも拘らず脱シアン率は95%
であった。Table 1 Table 2 [Comparative Example] The same gas as in the example was treated according to the conventional method shown in FIG. That is, as a result of processing at a supply gas amount of 800 to 900 m3 N, a supply gas temperature of 70 to 80 °C, a supply water volume of 1 s (t/one supply gas), a liquid gas ratio of 13 (t/mJ, and a liquid f!L of 20 °C), the present invention was obtained. Compared to the method of Example, the cyanogen removal rate was 95% even though y2 times the amount of water was required.
Met.
以上の説明で明らかまように本発明によれば次のような
優れた効果がある。As is clear from the above description, the present invention has the following excellent effects.
■ 供給水量を少なくできるので排水量が少なくなシ、
また回収した水溶性不純物、例えばシアン化合物含有濃
度が高いため、排水の処理設備を小型化かつ高効率化で
き、処理設備のコスF低減ができる。■ Since the amount of water supplied can be reduced, the amount of water discharged can be reduced.
Furthermore, since the concentration of recovered water-soluble impurities, such as cyanide compounds, is high, wastewater treatment equipment can be made smaller and more efficient, and the cost F of the treatment equipment can be reduced.
■ 補給水の温度に変動がないので、常に安定したHC
Nの高度除去ができる。■ There is no fluctuation in the temperature of the make-up water, so HC is always stable.
N altitude removal is possible.
■ 冷却部で多量の循環水でガスの直接冷却を行なうた
め、ガス中にナフタリン等の昇華性物質が含有していて
も閉塞等の)′?プルが極力押えられる。■ Since the gas is directly cooled with a large amount of circulating water in the cooling section, even if the gas contains sublimable substances such as naphthalene, there will be no blockages etc.)'? The pull is suppressed as much as possible.
■ 供給水量を少なくできるので、水資源の厳しい場所
ではさらに有効な方法となる。■ The amount of water supplied can be reduced, making it an even more effective method in areas with limited water resources.
第1図は本発明に係る高濃度硫黄化合物含有ガス中のH
CNを除去するための吸収塔周シの工程図である。
第2図は従来の高濃度硫黄化合物含有ガス中のHCNを
除去するための吸収塔周シの工程図である。
図中、1は吸収塔、2は供給ガスライン、5は排出ガス
ツイン、4は循環ポンプ、5.6は熱交換器、7は循環
水フィン、8はブロー水ライン、9は供給フィンである
。Figure 1 shows H in gas containing high concentration sulfur compounds according to the present invention.
FIG. 3 is a process diagram of an absorption tower circumference for removing CN. FIG. 2 is a process diagram of a conventional process around an absorption tower for removing HCN from a gas containing a high concentration of sulfur compounds. In the figure, 1 is an absorption tower, 2 is a supply gas line, 5 is an exhaust gas twin, 4 is a circulation pump, 5.6 is a heat exchanger, 7 is a circulation water fin, 8 is a blow water line, and 9 is a supply fin. .
Claims (5)
有ガスを水を吸収剤とする吸収塔で処理して該不純物を
除去する方法において、上段を吸収部とし下段を冷却部
とした2段式の吸収塔を用い、該処理ガスを塔下部より
導入し、冷却部において多量の循環水と接触させて冷却
すると共に一部の該不純物を吸収させ、次いで吸収部に
おいて少量の水と接触させることにより残存する該不純
物を吸収させて除去することを特徴とする高濃度硫黄化
合物含有ガス中の該不純物の除去方法。(1) In a method in which a gas containing high concentration sulfur compounds containing gaseous water-soluble impurities is treated in an absorption tower using water as an absorbent to remove the impurities, the upper stage is the absorption section and the lower stage is the cooling section.2 Using a stage-type absorption tower, the treated gas is introduced from the bottom of the tower, cooled by contacting with a large amount of circulating water in the cooling section and absorbing some of the impurities, and then contacted with a small amount of water in the absorption section. A method for removing impurities in a gas containing a high concentration of sulfur compounds, the method comprising absorbing and removing the remaining impurities by absorbing and removing the impurities.
範囲第1項に記載の方法。(2) The method according to claim 1, wherein the gaseous water-soluble impurity is HCN.
して使用し、該循環水の一部を抜出してシアン化合物の
濃縮を防ぐようにした特許請求の範囲第2項に記載の方
法。(3) The method according to claim 2, wherein the liquid that has absorbed HCN in the absorption section is used as circulating water in the cooling section, and a part of the circulating water is extracted to prevent cyanide from concentrating. .
3とし、吸収部における液/ガス比を4〜7l/m^3
とする特許請求の範囲第1項〜第3項のいずれかに記載
の方法。(4) Liquid/gas ratio in the cooling section is 15 to 25 l/m^
3, and the liquid/gas ratio in the absorption section is 4 to 7 l/m^3.
A method according to any one of claims 1 to 3.
20〜30℃に保持する特許請求の範囲第1項〜第4項
のいずれかに記載の方法。(5) The method according to any one of claims 1 to 4, wherein the temperature of the circulating water in the cooling unit and the water supplied to the absorption unit is maintained at 20 to 30°C.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62088946A JPS63256117A (en) | 1987-04-13 | 1987-04-13 | Method for removing water soluble impurity incorporated in gas containing high-concentration sulfur compound |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62088946A JPS63256117A (en) | 1987-04-13 | 1987-04-13 | Method for removing water soluble impurity incorporated in gas containing high-concentration sulfur compound |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63256117A true JPS63256117A (en) | 1988-10-24 |
Family
ID=13957039
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62088946A Pending JPS63256117A (en) | 1987-04-13 | 1987-04-13 | Method for removing water soluble impurity incorporated in gas containing high-concentration sulfur compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63256117A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011523993A (en) * | 2008-06-13 | 2011-08-25 | 斯幹 彭 | Exhaust gas cleaning device and exhaust gas cleaning method for a marine vessel |
US9757686B2 (en) | 2008-06-13 | 2017-09-12 | Sigan Peng | Ship flue gas scrubbing apparatus and method |
-
1987
- 1987-04-13 JP JP62088946A patent/JPS63256117A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011523993A (en) * | 2008-06-13 | 2011-08-25 | 斯幹 彭 | Exhaust gas cleaning device and exhaust gas cleaning method for a marine vessel |
US8500893B2 (en) | 2008-06-13 | 2013-08-06 | Sigan Peng | Ship flue gas scrubbing equipment and method |
US9757686B2 (en) | 2008-06-13 | 2017-09-12 | Sigan Peng | Ship flue gas scrubbing apparatus and method |
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