JPS6324294B2 - - Google Patents
Info
- Publication number
- JPS6324294B2 JPS6324294B2 JP6172281A JP6172281A JPS6324294B2 JP S6324294 B2 JPS6324294 B2 JP S6324294B2 JP 6172281 A JP6172281 A JP 6172281A JP 6172281 A JP6172281 A JP 6172281A JP S6324294 B2 JPS6324294 B2 JP S6324294B2
- Authority
- JP
- Japan
- Prior art keywords
- grid
- electrode
- circular holes
- line
- electron gun
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 201000009310 astigmatism Diseases 0.000 description 6
- 230000004075 alteration Effects 0.000 description 5
- 238000010894 electron beam technology Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/48—Electron guns
- H01J29/50—Electron guns two or more guns in a single vacuum space, e.g. for plural-ray tube
- H01J29/503—Three or more guns, the axes of which lay in a common plane
Description
【発明の詳細な説明】
この発明は、インライン形3ビーム電子銃を装
置したカラー受像管の改良に関するものであり、
フオーカス特性を改良してカラー受像管の画質の
向上を図ることを目的とする。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement of a color picture tube equipped with an in-line three-beam electron gun.
The purpose is to improve the image quality of color picture tubes by improving the focus characteristics.
第1図Aおよび第1図B図は、従来のインライ
ン形3ビーム電子銃の一例を示し、同図におい
て、1は同一平面上に配置された第1グリツド、
2は第2グリツド、3は第3グリツド、4は第4
グリツドで、第3グリツド3は主レンズ側第3グ
リツド5とフオーカス側第3グリツド6とで構成
されている。 1A and 1B show an example of a conventional in-line three-beam electron gun, in which 1 is a first grid arranged on the same plane;
2 is the second grid, 3 is the third grid, 4 is the fourth grid
The third grid 3 is composed of a third grid 5 on the main lens side and a third grid 6 on the focus side.
上記第3グリツド3を構成している主レンズ側
第3グリツド5と第4グリツド4には、第2図に
示すように、ブリツジ部wを存している3個の円
孔aが一列に設けられている。したがつて、上記
主レンズ側第3グリツド5と第4グリツド4は底
面bに3個の円孔aを備えた箱状体に構成されて
いる。 As shown in FIG. 2, the third grid 5 and the fourth grid 4 on the main lens side, which constitute the third grid 3, have three circular holes a in a line, each having a bridge portion w. It is provided. Therefore, the third grid 5 and the fourth grid 4 on the main lens side are formed into a box-like body with three circular holes a in the bottom surface b.
以上のように構成した電子銃において、ダイナ
ミツクコンバージエンスの不要化を実現するため
には、偏向中心面での電子ビーム間隔を、ある程
度小さくする必要があり、そのために、各グリツ
ドの円孔aのピツチを大きく設定することができ
ない。 In the electron gun configured as described above, in order to eliminate the need for dynamic convergence, it is necessary to reduce the electron beam spacing at the center plane of deflection to a certain extent. It is not possible to set the pitch to a large value.
一方、各円孔aは、主レンズの球面収差を減少
させるために、大きく形成することが好ましいの
で、各円孔aの間に存在するブリツジ部wを機械
的強度と部品加工の面から許容される限界まで小
さくして、上記各円孔aを大きくするのが通例で
ある。 On the other hand, each circular hole a is preferably formed large in order to reduce the spherical aberration of the main lens, so the bridge portion w existing between each circular hole a is allowed from the viewpoint of mechanical strength and parts processing. It is customary to make each circular hole a large by making it as small as possible.
しかしながら、円孔aを大きくし過ぎると、第
3図Aおよび第3図Bのように各円孔aがつなが
り、等電位線が各円孔aで独立したものから連続
したものになる。 However, if the circular holes a are made too large, the circular holes a become connected as shown in FIGS. 3A and 3B, and the equipotential lines change from being independent at each circular hole a to being continuous.
その結果、各円孔の中心軸線を通る電子ビーム
8は、球面収差が減少する以上に非点収差を受
け、電子ビームの集束度が悪く、画面上での解像
度が悪くなる。 As a result, the electron beam 8 passing through the central axis of each circular hole is subjected to astigmatism more than the spherical aberration is reduced, resulting in poor focusing of the electron beam and poor resolution on the screen.
その改善策として第4図Aおよび第4図Bに示
す様に円孔a間に補助電極板9を設置する手段が
提案されているが、この場合も等電位面の形成は
中心軸に対して回転対称性が悪く、非点収差は十
分に緩和されない問題がある。 As an improvement measure, it has been proposed to install an auxiliary electrode plate 9 between the circular holes a as shown in Figures 4A and 4B, but in this case as well, the formation of the equipotential surface is relative to the central axis. There is a problem that rotational symmetry is poor and astigmatism is not sufficiently alleviated.
この発明は、上記従来の点に鑑みなされたもの
で、電子レンズを構成する対向した2個の箱状体
電極にインライン配列される3個のビーム通過孔
を3連円形孔に設けると共に該3連円孔と対向し
てインライン配列された独立した3つの円孔を有
する電極を前記箱状体電極内に設置する事により
等電位面の回転対称性を改善し、かつ非点収差を
緩和したインライン形3ビーム電子銃を提供する
事を目的とする。 The present invention has been made in view of the above-mentioned conventional points, and includes three beam passing holes arranged in-line in two opposing box-shaped electrodes constituting an electron lens. The rotational symmetry of the equipotential surface was improved and astigmatism was alleviated by installing an electrode with three independent circular holes arranged in-line facing the continuous circular holes in the box-shaped electrode. The purpose is to provide an in-line three-beam electron gun.
以下、この発明の実施例を図面にしたがつて説
明する。 Embodiments of the present invention will be described below with reference to the drawings.
第5図Aは3本の電子ビームを通過させるため
のビーム通過孔が夫々一直線上に配列され且つそ
の円孔に筒部を有するシリンダー電極10であ
る。第5図Bは第5図Aの開口端を拡大した例で
ある。 FIG. 5A shows a cylindrical electrode 10 in which beam passing holes for passing three electron beams are arranged in a straight line, and each hole has a cylindrical portion. FIG. 5B is an enlarged example of the opening end of FIG. 5A.
第6図Aおよび第6図Bにおいて、電子レンズ
を構成するために対向する主レンズ側第3グリツ
ド5と第4グリツド4の対向面に設けられる3個
の円孔aは、その直径を孔間隔と同等以上にし
て、各円孔aをつながつた様に構成しそれに対向
して独立した3個の円孔aを設けたシリンダー電
極10を設定している。 In FIGS. 6A and 6B, three circular holes a provided in the opposing surfaces of the third grid 5 and fourth grid 4 on the main lens side, which are opposite to each other to configure the electron lens, have a diameter equal to that of the hole. A cylindrical electrode 10 is set in which the circular holes a are arranged so as to be connected with each other, and three independent circular holes a are provided facing the circular holes a.
上記シリンダー電極10の3個の円孔a1は、上
記互いにつながつている3個の円孔aとほぼ同心
状に設けられている。 The three circular holes a1 of the cylinder electrode 10 are provided substantially concentrically with the three circular holes a that are connected to each other.
このように構成することで、主レンズの口径は
対向面の円孔aの径に近くなり、また等電位面は
シリンダー電極10により回転対称性が比較的良
好に確保され、非点収差と球面収差の両方がバラ
ンスのとれた静電レンズの構成となる。 With this configuration, the aperture of the main lens is close to the diameter of the circular hole a on the opposing surface, and the equipotential surface has relatively good rotational symmetry due to the cylindrical electrode 10, which reduces astigmatism and spherical aberration. This results in an electrostatic lens configuration in which both aberrations are well-balanced.
なお、上記実施例においては、レンズが1個の
場合について説明しているが、この発明は上記実
施例に限定されるものではく、多段レンズに適用
することができる。 In addition, although the case where there is one lens is explained in the said Example, this invention is not limited to the said Example, but can be applied to a multistage lens.
以上説明したように、この発明によれば、球面
収差と非点収差の両者の小さい電子レンズを構成
することができ、電子ビームの集束度を向上して
画面上での解像度を良くすることができる利点が
ある。 As explained above, according to the present invention, it is possible to construct an electron lens with small both spherical aberration and astigmatism, and it is possible to improve the focusing degree of the electron beam and improve the resolution on the screen. There are advantages that can be achieved.
第1図Aは従来のインライン形3ビーム電子銃
の一例を示す平面図、第1図Bは同縦断正面図、
第2図は同主レンズ側第3グリツドおよび第4グ
リツドの一例を示す斜視図、第3図Aは円孔の孔
径を大きくした場合の平面図、第3図Bは同縦断
正面図、第4図Aおよび第4図Bは非点収差を緩
和させる構成とした従来例の説明図、第5図A及
び第5図Bは、この発明に使用するシリンダー電
極の同縦断正面図、第6図Aはこの発明を適用し
た主レンズ側第3グリツドと第4グリツドの平面
図、第6図Bは同縦断正面図である。
3……第3グリツド、4……第4グリツド、5
……主レンズ側第3グリツド、10……シリンダ
ー電極、a……円孔、a1……シリンダー電極の円
孔。
FIG. 1A is a plan view showing an example of a conventional in-line three-beam electron gun, FIG. 1B is a longitudinal sectional front view of the same,
Fig. 2 is a perspective view showing an example of the third and fourth grids on the main lens side, Fig. 3A is a plan view when the diameter of the circular hole is increased, Fig. 3B is a longitudinal sectional front view, 4A and 4B are explanatory diagrams of a conventional example having a configuration to alleviate astigmatism, FIGS. 5A and 5B are longitudinal sectional front views of the cylinder electrode used in the present invention, and FIGS. Figure A is a plan view of the third and fourth grids on the main lens side to which the present invention is applied, and Figure 6B is a longitudinal sectional front view of the same. 3...3rd grid, 4...4th grid, 5
...Third grid on main lens side, 10... Cylinder electrode, a... Circular hole, a 1 ... Circular hole of cylinder electrode.
Claims (1)
一部つなげて形成し、上記対向面の背後に独立し
た3個の円筒を有するシリンダー電極を設け、上
記箱状体電極の円孔と上記シリンダー電極の円筒
とが同心円状であることを特徴とするインライン
形3ビーム電子銃。 2 シリンダー電極の開口部の直径を拡大化した
事を特徴とする特許請求の範囲第1項記載のイン
ライン形3ビーム電子銃。[Claims] 1. Three circular holes are formed by partially connecting the opposing surfaces of the opposing box-shaped electrodes, and a cylindrical electrode having three independent cylinders is provided behind the opposing surface, An in-line three-beam electron gun characterized in that the circular hole of the box-shaped electrode and the cylinder of the cylinder electrode are concentric circles. 2. The in-line three-beam electron gun according to claim 1, characterized in that the diameter of the opening of the cylinder electrode is enlarged.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6172281A JPS57176647A (en) | 1981-04-22 | 1981-04-22 | In-line-type three-beam electron gun |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6172281A JPS57176647A (en) | 1981-04-22 | 1981-04-22 | In-line-type three-beam electron gun |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57176647A JPS57176647A (en) | 1982-10-30 |
JPS6324294B2 true JPS6324294B2 (en) | 1988-05-20 |
Family
ID=13179390
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6172281A Granted JPS57176647A (en) | 1981-04-22 | 1981-04-22 | In-line-type three-beam electron gun |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57176647A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0247354A (en) * | 1988-08-09 | 1990-02-16 | Hideki Nakamura | Method for detaching cheese from carrier and plate for detaching |
JPH0512316Y2 (en) * | 1989-08-21 | 1993-03-29 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5864740A (en) * | 1981-10-12 | 1983-04-18 | Nec Corp | Electron-gun electrode structure |
-
1981
- 1981-04-22 JP JP6172281A patent/JPS57176647A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0247354A (en) * | 1988-08-09 | 1990-02-16 | Hideki Nakamura | Method for detaching cheese from carrier and plate for detaching |
JPH0512316Y2 (en) * | 1989-08-21 | 1993-03-29 |
Also Published As
Publication number | Publication date |
---|---|
JPS57176647A (en) | 1982-10-30 |
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