JPS63148257A - Image forming method - Google Patents
Image forming methodInfo
- Publication number
- JPS63148257A JPS63148257A JP29588386A JP29588386A JPS63148257A JP S63148257 A JPS63148257 A JP S63148257A JP 29588386 A JP29588386 A JP 29588386A JP 29588386 A JP29588386 A JP 29588386A JP S63148257 A JPS63148257 A JP S63148257A
- Authority
- JP
- Japan
- Prior art keywords
- group
- silver halide
- developing
- layer
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 43
- -1 silver halide Chemical class 0.000 claims abstract description 93
- 239000000463 material Substances 0.000 claims abstract description 57
- 239000000839 emulsion Substances 0.000 claims abstract description 40
- 229910052709 silver Inorganic materials 0.000 claims abstract description 40
- 239000004332 silver Substances 0.000 claims abstract description 39
- 239000007864 aqueous solution Substances 0.000 claims abstract description 26
- 239000002736 nonionic surfactant Substances 0.000 claims abstract description 17
- 230000003595 spectral effect Effects 0.000 claims description 5
- 239000000243 solution Substances 0.000 abstract description 33
- 238000012545 processing Methods 0.000 abstract description 32
- 238000011161 development Methods 0.000 abstract description 27
- 239000002563 ionic surfactant Substances 0.000 abstract description 15
- 230000001235 sensitizing effect Effects 0.000 abstract description 9
- 238000010521 absorption reaction Methods 0.000 abstract description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 46
- 239000010410 layer Substances 0.000 description 40
- 238000005406 washing Methods 0.000 description 28
- 230000018109 developmental process Effects 0.000 description 26
- 150000001875 compounds Chemical class 0.000 description 25
- 239000000975 dye Substances 0.000 description 25
- 239000004094 surface-active agent Substances 0.000 description 24
- 239000011248 coating agent Substances 0.000 description 21
- 238000000576 coating method Methods 0.000 description 21
- 125000000217 alkyl group Chemical group 0.000 description 17
- 239000003795 chemical substances by application Substances 0.000 description 17
- 239000002245 particle Substances 0.000 description 16
- 125000004432 carbon atom Chemical group C* 0.000 description 14
- 230000015572 biosynthetic process Effects 0.000 description 12
- 230000000087 stabilizing effect Effects 0.000 description 12
- 108010010803 Gelatin Proteins 0.000 description 11
- 239000008273 gelatin Substances 0.000 description 11
- 229920000159 gelatin Polymers 0.000 description 11
- 235000019322 gelatine Nutrition 0.000 description 11
- 235000011852 gelatine desserts Nutrition 0.000 description 11
- 206010070834 Sensitisation Diseases 0.000 description 10
- 238000001035 drying Methods 0.000 description 10
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 10
- 239000007788 liquid Substances 0.000 description 10
- 230000008313 sensitization Effects 0.000 description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- 125000003118 aryl group Chemical group 0.000 description 9
- 150000003839 salts Chemical class 0.000 description 9
- 229910052731 fluorine Inorganic materials 0.000 description 8
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 8
- 230000003068 static effect Effects 0.000 description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 7
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 7
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 7
- 239000002253 acid Substances 0.000 description 7
- 239000011737 fluorine Substances 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- 229910001220 stainless steel Inorganic materials 0.000 description 7
- 239000010935 stainless steel Substances 0.000 description 7
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- 125000003342 alkenyl group Chemical group 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 238000010790 dilution Methods 0.000 description 6
- 239000012895 dilution Substances 0.000 description 6
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 6
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 5
- 239000012141 concentrate Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000011241 protective layer Substances 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 5
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 4
- 239000005977 Ethylene Substances 0.000 description 4
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 4
- 229910019142 PO4 Inorganic materials 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- XYXNTHIYBIDHGM-UHFFFAOYSA-N ammonium thiosulfate Chemical compound [NH4+].[NH4+].[O-]S([O-])(=O)=S XYXNTHIYBIDHGM-UHFFFAOYSA-N 0.000 description 4
- 125000000129 anionic group Chemical group 0.000 description 4
- 125000002091 cationic group Chemical group 0.000 description 4
- 125000005843 halogen group Chemical group 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 239000006224 matting agent Substances 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 235000021317 phosphate Nutrition 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 4
- 239000002562 thickening agent Substances 0.000 description 4
- REFDOIWRJDGBHY-UHFFFAOYSA-N 2-bromobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Br)=C1 REFDOIWRJDGBHY-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- KWIUHFFTVRNATP-UHFFFAOYSA-O N,N,N-trimethylglycinium Chemical group C[N+](C)(C)CC(O)=O KWIUHFFTVRNATP-UHFFFAOYSA-O 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 3
- 125000002252 acyl group Chemical group 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 150000001412 amines Chemical group 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 3
- 150000003863 ammonium salts Chemical class 0.000 description 3
- 239000002216 antistatic agent Substances 0.000 description 3
- 125000003710 aryl alkyl group Chemical group 0.000 description 3
- 239000004327 boric acid Substances 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000002738 chelating agent Substances 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 230000012010 growth Effects 0.000 description 3
- 229910052741 iridium Inorganic materials 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 125000005702 oxyalkylene group Chemical group 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 239000004848 polyfunctional curative Substances 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 3
- 230000002829 reductive effect Effects 0.000 description 3
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 3
- 235000010265 sodium sulphite Nutrition 0.000 description 3
- 230000006641 stabilisation Effects 0.000 description 3
- 238000011105 stabilization Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid Chemical class NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 description 3
- 125000000565 sulfonamide group Chemical group 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 2
- DBCKMJVEAUXWJJ-UHFFFAOYSA-N 2,3-dichlorobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Cl)=C1Cl DBCKMJVEAUXWJJ-UHFFFAOYSA-N 0.000 description 2
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- GUUULVAMQJLDSY-UHFFFAOYSA-N 4,5-dihydro-1,2-thiazole Chemical class C1CC=NS1 GUUULVAMQJLDSY-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical class NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 2
- PQUCIEFHOVEZAU-UHFFFAOYSA-N Diammonium sulfite Chemical compound [NH4+].[NH4+].[O-]S([O-])=O PQUCIEFHOVEZAU-UHFFFAOYSA-N 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 2
- 239000004471 Glycine Substances 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- QPCDCPDFJACHGM-UHFFFAOYSA-N N,N-bis{2-[bis(carboxymethyl)amino]ethyl}glycine Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(=O)O)CCN(CC(O)=O)CC(O)=O QPCDCPDFJACHGM-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 229910021607 Silver chloride Inorganic materials 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 2
- 229920006311 Urethane elastomer Polymers 0.000 description 2
- XCFIVNQHHFZRNR-UHFFFAOYSA-N [Ag].Cl[IH]Br Chemical compound [Ag].Cl[IH]Br XCFIVNQHHFZRNR-UHFFFAOYSA-N 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 125000003368 amide group Chemical group 0.000 description 2
- 150000001413 amino acids Chemical class 0.000 description 2
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 description 2
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 2
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 2
- 235000011130 ammonium sulphate Nutrition 0.000 description 2
- 239000003945 anionic surfactant Substances 0.000 description 2
- 239000003242 anti bacterial agent Substances 0.000 description 2
- 125000004104 aryloxy group Chemical group 0.000 description 2
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical class C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 2
- 150000007942 carboxylates Chemical class 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000013522 chelant Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 235000015165 citric acid Nutrition 0.000 description 2
- 239000008119 colloidal silica Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000001143 conditioned effect Effects 0.000 description 2
- 230000003750 conditioning effect Effects 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000001165 hydrophobic group Chemical group 0.000 description 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 230000006911 nucleation Effects 0.000 description 2
- 238000010899 nucleation Methods 0.000 description 2
- 125000001117 oleyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])/C([H])=C([H])\C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000006353 oxyethylene group Chemical group 0.000 description 2
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 2
- IZUPBVBPLAPZRR-UHFFFAOYSA-N pentachlorophenol Chemical compound OC1=C(Cl)C(Cl)=C(Cl)C(Cl)=C1Cl IZUPBVBPLAPZRR-UHFFFAOYSA-N 0.000 description 2
- 229960003330 pentetic acid Drugs 0.000 description 2
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical class N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 2
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 2
- 150000003014 phosphoric acid esters Chemical group 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 description 2
- 239000003755 preservative agent Substances 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 2
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 150000003460 sulfonic acids Chemical class 0.000 description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 239000011975 tartaric acid Substances 0.000 description 2
- 235000002906 tartaric acid Nutrition 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- DHCDFWKWKRSZHF-UHFFFAOYSA-L thiosulfate(2-) Chemical compound [O-]S([S-])(=O)=O DHCDFWKWKRSZHF-UHFFFAOYSA-L 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 2
- JNYAEWCLZODPBN-JGWLITMVSA-N (2r,3r,4s)-2-[(1r)-1,2-dihydroxyethyl]oxolane-3,4-diol Chemical group OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O JNYAEWCLZODPBN-JGWLITMVSA-N 0.000 description 1
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- ATGAWOHQWWULNK-UHFFFAOYSA-I pentapotassium;[oxido(phosphonatooxy)phosphoryl] phosphate Chemical compound [K+].[K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])(=O)OP([O-])([O-])=O ATGAWOHQWWULNK-UHFFFAOYSA-I 0.000 description 1
- 125000005007 perfluorooctyl group Chemical group FC(C(C(C(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)* 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 150000003016 phosphoric acids Chemical class 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000191 poly(N-vinyl pyrrolidone) Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229940050271 potassium alum Drugs 0.000 description 1
- GRLPQNLYRHEGIJ-UHFFFAOYSA-J potassium aluminium sulfate Chemical compound [Al+3].[K+].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRLPQNLYRHEGIJ-UHFFFAOYSA-J 0.000 description 1
- KYKNRZGSIGMXFH-ZVGUSBNCSA-M potassium bitartrate Chemical compound [K+].OC(=O)[C@H](O)[C@@H](O)C([O-])=O KYKNRZGSIGMXFH-ZVGUSBNCSA-M 0.000 description 1
- 239000001508 potassium citrate Substances 0.000 description 1
- 229960002635 potassium citrate Drugs 0.000 description 1
- QEEAPRPFLLJWCF-UHFFFAOYSA-K potassium citrate (anhydrous) Chemical compound [K+].[K+].[K+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O QEEAPRPFLLJWCF-UHFFFAOYSA-K 0.000 description 1
- 235000011082 potassium citrates Nutrition 0.000 description 1
- RWPGFSMJFRPDDP-UHFFFAOYSA-L potassium metabisulfite Chemical compound [K+].[K+].[O-]S(=O)S([O-])(=O)=O RWPGFSMJFRPDDP-UHFFFAOYSA-L 0.000 description 1
- 229940043349 potassium metabisulfite Drugs 0.000 description 1
- 235000010263 potassium metabisulphite Nutrition 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- LJCNRYVRMXRIQR-OLXYHTOASA-L potassium sodium L-tartrate Chemical compound [Na+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O LJCNRYVRMXRIQR-OLXYHTOASA-L 0.000 description 1
- 229940074439 potassium sodium tartrate Drugs 0.000 description 1
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 1
- 235000019252 potassium sulphite Nutrition 0.000 description 1
- 239000001472 potassium tartrate Substances 0.000 description 1
- 229940111695 potassium tartrate Drugs 0.000 description 1
- 235000011005 potassium tartrates Nutrition 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 235000018102 proteins Nutrition 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 229940083082 pyrimidine derivative acting on arteriolar smooth muscle Drugs 0.000 description 1
- 150000003230 pyrimidines Chemical class 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000001397 quillaja saponaria molina bark Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229930182490 saponin Natural products 0.000 description 1
- 150000007949 saponins Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229940045105 silver iodide Drugs 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- HELHAJAZNSDZJO-OLXYHTOASA-L sodium L-tartrate Chemical compound [Na+].[Na+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O HELHAJAZNSDZJO-OLXYHTOASA-L 0.000 description 1
- 239000000661 sodium alginate Substances 0.000 description 1
- 235000010413 sodium alginate Nutrition 0.000 description 1
- 229940005550 sodium alginate Drugs 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 229960001790 sodium citrate Drugs 0.000 description 1
- 235000011083 sodium citrates Nutrition 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 235000011006 sodium potassium tartrate Nutrition 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000001433 sodium tartrate Substances 0.000 description 1
- 229960002167 sodium tartrate Drugs 0.000 description 1
- 235000011004 sodium tartrates Nutrition 0.000 description 1
- 239000004328 sodium tetraborate Substances 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- QRTFVPMGIOJHJN-UHFFFAOYSA-M sodium;2-(2-phenoxyethoxy)decane-2-sulfonate Chemical compound [Na+].CCCCCCCCC(C)(S([O-])(=O)=O)OCCOC1=CC=CC=C1 QRTFVPMGIOJHJN-UHFFFAOYSA-M 0.000 description 1
- AMZPPWFHMNMIEI-UHFFFAOYSA-M sodium;2-sulfanylidene-1,3-dihydrobenzimidazole-5-sulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=C2NC(=S)NC2=C1 AMZPPWFHMNMIEI-UHFFFAOYSA-M 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- HMNUYYJYMOXWTN-UHFFFAOYSA-J strontium;barium(2+);disulfate Chemical compound [Sr+2].[Ba+2].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O HMNUYYJYMOXWTN-UHFFFAOYSA-J 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- FDDDEECHVMSUSB-UHFFFAOYSA-N sulfanilamide Chemical compound NC1=CC=C(S(N)(=O)=O)C=C1 FDDDEECHVMSUSB-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- 229940117986 sulfobetaine Drugs 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 229960001367 tartaric acid Drugs 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- YWYZEGXAUVWDED-UHFFFAOYSA-N triammonium citrate Chemical compound [NH4+].[NH4+].[NH4+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O YWYZEGXAUVWDED-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 1
- 235000019801 trisodium phosphate Nutrition 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000012224 working solution Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
- G03C5/26—Processes using silver-salt-containing photosensitive materials or agents therefor
- G03C5/29—Development processes or agents therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/85—Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は写真特性を損うことなく帯電防止性とフィルム
の搬送性が良く、赤外域に分光増感されたレーザースキ
ャナー用ハロゲン化銀写真感光材料(以下写真感光材料
と称す)を現像・定着して画像を形成する方法に関する
ものであり、特に短時間(15秒以内)に現像処理され
ても処理ムラを発生することがない画像形成方法に関す
るものである。Detailed Description of the Invention (Industrial Application Field) The present invention provides a silver halide photograph for laser scanners that has good antistatic properties and film transportability without impairing photographic properties, and is spectrally sensitized in the infrared region. It relates to a method of developing and fixing a photosensitive material (hereinafter referred to as a photographic material) to form an image, and in particular, image formation that does not cause processing unevenness even if it is developed in a short time (within 15 seconds). It is about the method.
(従来の技術)
写真感光材料の露光方法の一つに原図を走査し、その画
像信号に基づいてハロゲン化銀写真感光材料上に露光を
行い、原図の画像に対応するネガ画像もしくはポジ画像
を形成する所謂スキャナ一方式による画像形成方法が知
られている。スキャナ一方式による画像形成方法を実用
した記録装置は種々あり、これらのスキャナ一方式記録
装置の記録用光源の1つとして半導体レーザーが使用さ
れる。(Prior art) One of the exposure methods for photographic light-sensitive materials is to scan an original image, and then expose the silver halide photographic light-sensitive material based on the image signal to create a negative or positive image corresponding to the image on the original image. An image forming method using a so-called scanner is known. There are various recording apparatuses that utilize image forming methods using one-scanner type, and a semiconductor laser is used as one of the recording light sources of these one-scanner type recording apparatuses.
半導体レーザーは小型で安価、しかも変調が容易であり
、長寿命である。また赤外域に発光するため、明るいセ
ーフライトが使用できるので、取扱い作業性が良くなる
という利点を有している。Semiconductor lasers are small, inexpensive, easy to modulate, and have a long life. Furthermore, since it emits light in the infrared region, a bright safelight can be used, which has the advantage of improving handling efficiency.
この半導体レーザーに用いられる感材は赤外域に分光増
感された写真感光材料であり、それはある種のシアニン
色素をハロゲン化銀写真乳剤に添加することによって、
その感光波長域を長波長側に拡張させる分光増感技術に
よって得られる。赤外域の分光増感には、赤外光に対し
て吸収を有する増悪色素が用いられる。The sensitive material used in this semiconductor laser is a photographic material that is spectrally sensitized in the infrared region, and it is made by adding a certain type of cyanine dye to a silver halide photographic emulsion.
It is obtained by spectral sensitization technology that extends the sensitive wavelength range to longer wavelengths. For spectral sensitization in the infrared region, an enhancing dye that absorbs infrared light is used.
(発明が解決しようとする問題点)
しかし、この半導体レーザーを用いて画像形成に使用さ
れる赤外増感されたハロゲン化銀写真感光材料の帯電防
止性と搬送性は従来不十分であり問題であった。(Problems to be Solved by the Invention) However, the antistatic properties and transportability of the infrared sensitized silver halide photographic light-sensitive materials used for image formation using this semiconductor laser have been insufficient. Met.
写真感光材料は一般に電気絶縁性を存する支持体および
写真層から成っているので写真感光材料の製造工程中な
らびに使用時に同種または異種物質の表面との間の接触
摩擦または剥離をうけることによって静電電荷が蓄積さ
れることが多い、この蓄積された静電電荷は多くの障害
を引起すが、重大な障害は現像処理前に蓄積された静電
電荷が放電することによって感光性乳剤層が感光し写真
フィルムを現像処理した際に点状スポット又は樹枝状や
羽毛状の線速を生ずることである。またこれらの蓄積さ
れた静電電荷はフィルム表面へ塵埃が付着したり、撮影
やフィルム搬送機で搬送不良を生じたり、塗布が均一に
行なえないなどの第2次的な故障を誘起せしめる原因に
もなる。Photographic materials generally consist of an electrically insulating support and a photographic layer. During the manufacturing process and during use, photographic materials are subject to contact friction or peeling between the surfaces of the same or different materials, resulting in electrostatic charge. This accumulated electrostatic charge often causes a number of problems, but the most important one is the discharging of the accumulated electrostatic charge before processing, which causes the light-sensitive emulsion layer to become photosensitive. When photographic film is processed, dot-like spots or dendritic or feather-like line speeds are produced. In addition, these accumulated electrostatic charges can cause secondary failures such as dust adhering to the film surface, transport failure in photography or film transport equipment, and uneven coating. It will also happen.
半導体レーザーを用いるスキャナ一方式においては、高
速且つ正確なフィルム搬送が必須であり、静電気による
搬送不良を生じると正しい画像を得ることができな(な
り、誤った判断を与えて重大な問題を生じる。In one-type scanners that use semiconductor lasers, high-speed and accurate film transport is essential, and if transport failures occur due to static electricity, it may not be possible to obtain a correct image (or it may lead to incorrect judgments and serious problems). .
同様の問題は迅速処理が行なわれる自動現像機のフィル
ム搬送時(特に、現像浴前)において生じる。A similar problem occurs during film transport in an automatic processor for rapid processing (particularly before a developing bath).
静電気による障害をなくすための一つの方法は感光材料
表面の電気伝導性を上げて蓄積電荷が放電する前に短時
間に逸散せしめるようにすることである。One way to eliminate the interference caused by static electricity is to increase the electrical conductivity of the surface of the photosensitive material so that the accumulated charges can be dissipated in a short period of time before being discharged.
したがって、従来から写真感光材料の支持体や各種塗布
表面層の導電性を向上させる方法が考えられ種々の吸湿
性物質や水溶性無機塩、ある種の界面活性剤、ポリマー
等の利用が試みられてきた。Therefore, methods have been considered to improve the conductivity of supports and various coated surface layers of photographic materials, and attempts have been made to use various hygroscopic substances, water-soluble inorganic salts, certain surfactants, polymers, etc. It's here.
例えば、ノニオン界面活性剤を表面保護層に含有させる
ことで良好な帯電防止性と搬送性を有した写真感光材料
を得ることができる。For example, by incorporating a nonionic surfactant into the surface protective layer, a photographic material having good antistatic properties and transportability can be obtained.
一方最近になり半導体レーザーを用いたスキャナ一方式
においても画像を早く見たいということが望まれそのた
め従来よりも現像時間を短かくすること(従来は20秒
以上)が必要となって来た。On the other hand, in recent years, it has become desirable to see images quickly even in one-type scanners using semiconductor lasers, and therefore it has become necessary to shorten the developing time (previously 20 seconds or more) than before.
例えば、レーザースキャナ一工程と現像処理工程が連続
的に行なわれるシステムにおいては、この点が特に必要
となった。For example, this point has become especially necessary in a system in which a laser scanner process and a development process are performed continuously.
しかし、前述のノニオン界面活性剤を用いた写真感光材
料は現像時間15秒以内で処理された場合に“現像ムラ
゛と称する画像ムラを発生することが判明し重大な問題
となっている。この現像ムラは、前述のノニオン界面活
性剤は現像液中で非常に小さい溶解性を有し、感材表面
で析出するために、窓材が現像浴からスクイズされて定
着浴に移る際に現像液が窓材の表面で不均一に残り、そ
れに対応し現像が不均一に生じるためであると考えられ
た。However, it has been found that when photographic materials using the above-mentioned nonionic surfactants are processed with a developing time of less than 15 seconds, image unevenness called "development unevenness" occurs, which has become a serious problem. The uneven development is caused by the above-mentioned nonionic surfactant having very low solubility in the developer and precipitating on the surface of the photosensitive material. It was thought that this was because the particles remained unevenly on the surface of the window material, and development occurred correspondingly unevenly.
これは現像スクイズ後惑材表面にムラ状に残っている現
像液による現像が、現像時間の短縮化のために写真感光
材料の現像速度を大きくしたため、無視できないものと
なり、それが現像ムラとして残るためである。This is because the development by the developer remaining unevenly on the surface of the photosensitive material after the development squeeze becomes impossible to ignore because the development speed of the photographic light-sensitive material is increased in order to shorten the development time, and this remains as development unevenness. It's for a reason.
従って、本発明の第1の目的は、種々の素材に対して発
電性が小さくなるように帯電防止された赤外域に分光増
感されたレーザースキャナー用写真感光材料を現像・定
着して画像形成する方法を提供することにある。Therefore, the first object of the present invention is to form images by developing and fixing a photosensitive material for laser scanners that is spectrally sensitized in the infrared region and is antistatic so as to reduce power generation with respect to various materials. The goal is to provide a way to do so.
本発明の第2の目的は、現像時間が15秒以内でも現像
ムラを生じない赤外域に分光増感されたレーザースキャ
ナー用写真感光材料を現像・定着して画像形成する方法
を提供することにある。A second object of the present invention is to provide a method for forming an image by developing and fixing a photographic material for a laser scanner that is spectrally sensitized in the infrared region without causing uneven development even when the development time is 15 seconds or less. be.
本発明の第3の目的は、窓材を長期保存しても感材同志
が接着することのないような帯電防止されたレーザース
キャナー用感光材料を現像・定着して画像形成する方法
を提供することにある。A third object of the present invention is to provide a method for developing and fixing a photosensitive material for a laser scanner to form an image, which is antistatic and prevents the photosensitive materials from adhering to each other even if the window material is stored for a long period of time. There is a particular thing.
(問題点を解決するための手段)
本発明のこれらの目的は支持体の一方の側に赤外分光増
感されたハロゲン化銀乳剤層を少なくとも一層有するレ
ーザースキャナー用ハロゲン化銀写真感光材料を現像・
定着して画像形成する方法において、該ハロゲン化銀写
真感光材料の乳剤層のある側の少なくとも1層に、少な
くとも1種のノニオン界面活性剤と現像液に対する溶解
度が0゜005重量%以上(30℃)でかつその表面張
力が45ダイン/c11以下(1,0重量%水溶液中、
30℃)を有するイオン性界面活性剤を少なくとも1種
含有しかつ現像時間が15秒以内で処理されることを特
徴とする画像形成方法によって達成された。(Means for Solving the Problems) These objects of the present invention provide a silver halide photographic light-sensitive material for laser scanners, which has at least one infrared spectral sensitized silver halide emulsion layer on one side of a support. developing·
In the method of fixing and forming an image, at least one layer on the emulsion layer side of the silver halide photographic light-sensitive material contains at least one nonionic surfactant and a solubility in a developer of 0°005% by weight or more (30% by weight or more). °C) and its surface tension is 45 dynes/c11 or less (in a 1.0 wt% aqueous solution,
This was achieved by an image forming method characterized by containing at least one ionic surfactant having a temperature of 30° C.) and developing within 15 seconds.
本発明はノニオン界面活性剤の現像液中での溶解性不良
が原図で生じる写真感光材料の不均一な現像を現像液中
でも溶解して界面張力が小さくなるような界面活性を有
する特定のイオン性界面活性剤を用いて均一に現像させ
るようにしたことによって解決したのものであり、これ
によって帯電防止性と機械搬送性を損うことなくかつ現
像時間15秒以内で処理されても良好な画像を得ること
ができたものである。The present invention uses a specific ionic surfactant that has surface activity that dissolves in the developer and reduces the interfacial tension to prevent uneven development of photographic light-sensitive materials caused by poor solubility of the nonionic surfactant in the developer. This problem was solved by using a surfactant to ensure uniform development, and as a result, a good image could be obtained even if the development time was less than 15 seconds without impairing antistatic properties and mechanical transportability. This is what I was able to obtain.
本発明に用いられる赤外域に分光増感されたハロゲン化
銀写真乳剤は、赤外域に吸収を有する増感色素をハロゲ
ン化銀粒子に添加して得ることができる。The silver halide photographic emulsion spectrally sensitized in the infrared region used in the present invention can be obtained by adding a sensitizing dye having absorption in the infrared region to silver halide grains.
まず、赤外光に対して吸収を有する増感色素について述
べる。First, a sensitizing dye that absorbs infrared light will be described.
これらは例えばMees著 “The Theory
of thePhotographic Proces
s、第3版″ (MacMi自an社1966年発行)
のP、198〜P、201に記載されている。この場合
分光感度即ち、赤外域の光に対する感度は高感度である
ことが望ましく、かつ乳剤の保存中にも感度の変化の小
さいことが望まれる。このために従来数多くの増感色素
が開発されてきた。これらは例えば米国特許第2.09
5.854号、同第2,095,856.号、同第2.
955.939号、同第3.482,978号、同第3
.552,974号、同第3,573.921号、同第
3,582,344号、例えば米国特許第2,875,
058号及び同第3゜695.888号に記載されてい
るトリアジン誘導体、米国特許第3,457,078号
に記載されているメルカプト化合物、米国特許第3,4
58.318号に記載されているチオウレア化合物、米
国特許第3,615,632号に記載されているピリミ
ジン誘導体などがあり、また米国特許第4.011,0
83号にはアザインデン化合物を用いることにより、減
感量の赤外増感色素を使用して赤外増感を行うことが記
載されている。These are, for example, “The Theory” by Mees.
of thePhotographic Processes
s, 3rd edition'' (published by MacMi in 1966)
P, 198-P, 201. In this case, it is desirable that the spectral sensitivity, that is, the sensitivity to light in the infrared region, be high, and that the change in sensitivity be small even during storage of the emulsion. For this purpose, many sensitizing dyes have been developed. These include, for example, U.S. Patent No. 2.09
No. 5.854, No. 2,095,856. No. 2.
No. 955.939, No. 3.482,978, No. 3
.. No. 552,974, No. 3,573.921, No. 3,582,344, e.g., U.S. Pat.
058 and 3°695.888; mercapto compounds described in U.S. Pat. No. 3,457,078; U.S. Pat.
58.318, pyrimidine derivatives described in U.S. Pat. No. 3,615,632, and U.S. Pat.
No. 83 describes the use of an azaindene compound to perform infrared sensitization using a desensitizing amount of an infrared sensitizing dye.
あるいは又、特開昭60−80841号記載のトリカル
ボシアニン色素及び/又は4−キノリン核含有ジカルボ
シアニン色素が好ましく用いられる。以下に代表的な赤
外増感色素を示すが勿論、本発明はこれらに限定される
ものではない。Alternatively, tricarbocyanine dyes and/or 4-quinoline nucleus-containing dicarbocyanine dyes described in JP-A-60-80841 are preferably used. Typical infrared sensitizing dyes are shown below, but of course the present invention is not limited thereto.
CgHs C2H5I−
11UE
C2Hs Cx H
t l −Cz 11.
CH,C0OHI−C2H3CI Hs
llsL;、 Ca11%
C,H,I−
□
CzHs l−
□
CzHs I−
(CI1□)*5Off−
C,H,l−
C,H,l−
これらの増感色素の添加量は、ハロゲン化銀1モル当り
5X10−’モル−5X 10−’モル、好ましくはl
Xl0−6モル〜I X 10”’モル、特に好ましく
は2X10−6モル−5X l O−’モルである。CgHs C2H5I-
11UE C2Hs Cx H
t l -Cz 11.
CH, COOHI-C2H3CI Hs llsL;, Ca11% C,H,I- □ CzHs l- □ CzHs I- (CI1□)*5Off- C,H,l- C,H,l- Of these sensitizing dyes The amount added is 5X10-' mol-5X 10-' mol per mol of silver halide, preferably l
X10-6 mol to IX10'' mol, particularly preferably 2X10-6 mol to 5X1 O-' mol.
次に本発明に用いられるハロゲン化銀粒子は、塩化銀、
臭化銀、沃臭化銀、塩臭化銀、塩沃化銀、塩沃臭化銀な
ど、塩素、臭素、沃素化物から成るハロゲン化銀であれ
ばいずれでもよいが、特に臭化銀、沃臭化銀、塩沃臭化
銀が好ましい。ハロゲン化銀中の沃化銀は0〜20モル
%が好ましく、0〜10%がとくに好ましい。ハロゲン
化眼中の塩化銀は多くとも20モル%以下であることが
好ましく少なくとも10モル%以下であることが更に好
ましく5モル%以下であることがとくに好ましい。Next, the silver halide grains used in the present invention include silver chloride,
Any silver halide consisting of chlorine, bromine, or iodide may be used, such as silver bromide, silver iodobromide, silver chlorobromide, silver chloroiodide, or silver chloroiodobromide, but especially silver bromide, Silver iodobromide and silver chloroiodobromide are preferred. The silver iodide content in the silver halide is preferably 0 to 20% by mole, particularly preferably 0 to 10%. The amount of silver chloride in the halogenated eye is preferably at most 20 mol%, more preferably at least 10 mol%, and particularly preferably 5 mol% or less.
又特に好ましく用いられるハロゲン化銀粒子は(100
)面/ (111)血止が1以上のハロゲン化銀粒子で
あり種々の方法で調製することができる。最も一般的な
方法は粒子形成中のPAg値を8.10以下の一定値に
保ち硝酸銀水溶液とアルカリハライド水溶液とを同時添
加する方法である(いわゆるコントロールダブルジェッ
ト法)、より好ましくはPAg値を7.80以下更に好
ましくはPAg値を7.60以下とするのがよい。Further, particularly preferably used silver halide grains are (100
) surface/(111) The haemostasis is one or more silver halide particles and can be prepared in a variety of ways. The most common method is to simultaneously add a silver nitrate aqueous solution and an alkali halide aqueous solution while keeping the PAg value at a constant value of 8.10 or less during particle formation (so-called controlled double jet method). The PAg value is preferably 7.80 or less, more preferably 7.60 or less.
ハロゲン化銀粒子形成を核形成とその成長という2つの
タイプに分けた時、核形成時のPAg値の制限はなく、
そのp、Agは前述と同様である。When silver halide grain formation is divided into two types: nucleation and growth, there is no restriction on the PAg value at the time of nucleation.
Its p and Ag are the same as described above.
これらの乳剤は粗粒子でも微粒子でも、またはそれらの
混合粒子でもよいが、好ましくは平均粒径が(例えばプ
ロジエクテツドエリア法、数平均法による測定で約0.
04μから1.0μの粒子のものが好ましい。また、サ
イズ分布としては変動係数20%以内好ましくは15%
以内の単分散乳剤を用いることが好ましい。These emulsions may have coarse grains, fine grains, or mixed grains thereof, but preferably have an average grain size of about 0.5 mm as measured by, for example, the projected area method or the number average method.
Preferably, the particles have a particle diameter of 0.4 to 1.0 microns. Also, the coefficient of variation for size distribution is within 20%, preferably 15%.
It is preferable to use a monodisperse emulsion within the following range.
粒子形状は好ましくは立方体がよいが前記好ましい面指
数条件を満すものであれば、じゃがいも状、球状、板状
、粒子径が粒子厚みの5倍以上の平板状など変則的な結
晶形を有するものでもよい。The grain shape is preferably cubic, but as long as it satisfies the above-mentioned preferred surface index conditions, it has an irregular crystal shape such as potato shape, spherical shape, plate shape, and tabular shape with a particle diameter of 5 times or more the particle thickness. It can be anything.
本発明に用いられる感光材料にはハロゲン化銀乳剤層は
一層にかぎらず二層以上としてもよく、また粒子サイズ
、感度等の異なる2種以上の乳剤を混合もしくは別層に
用いてもよい、また乳剤層は支持体の片側に限らず両面
に設けてもよい。The light-sensitive material used in the present invention does not have to have only one silver halide emulsion layer, but may have two or more layers, and two or more types of emulsions with different grain sizes, sensitivities, etc. may be mixed or used in separate layers. Further, the emulsion layer is not limited to one side of the support, but may be provided on both sides.
これら感光性乳剤に実質的に非感光性乳剤(例えば内部
のかぶった微粒子乳剤)を混合して用いてもよい。勿論
、別々の層に塗り分けて用いてもよい。These light-sensitive emulsions may be mixed with a substantially non-light-sensitive emulsion (for example, an internally fogged fine grain emulsion). Of course, it may be used by coating in separate layers.
更にハロゲン化銀粒子の結晶構造は内部迄一様なもので
あっても、また内部と外部が異質の層状構造をしたもの
や、英国特許第635,841号、米国特許第3,62
2,318号に記されているようないわゆるコンバージ
ョン型のものであってもよい、また潜像を主として表面
に形成する型のもの、粒子内部に形成する内部潜像型の
もの何れでもよい。Furthermore, even if the crystal structure of silver halide grains is uniform throughout the interior, there are also those with a layered structure with different interior and exterior structures, British Patent No. 635,841, and U.S. Patent No. 3,62.
The particles may be of the so-called conversion type as described in No. 2,318, or may be of the type in which a latent image is mainly formed on the surface, or of the internal latent image type in which the latent image is formed inside the particles.
本発明の乳剤にはイリジウムイオンが好ましく用いられ
、イリジウムイオンの含有は、乳剤調製時に水溶性イリ
ジウム化合物(たとえばヘキサクロロイリジウム(l[
[)酸塩、ヘキサクロロイリジウム(IV)酸塩)を水
溶液の形で添加することによって達成される。粒子形成
のためのハロゲン化銀と同じ水’4?flの形で添加し
てもよいし、粒子形成前添加、粒子形成途中添加、粒子
形成後から化学増感までの添加のいづれかでもよいが、
特に好ましいのは粒子形成時の添加である。Iridium ions are preferably used in the emulsion of the present invention, and the inclusion of iridium ions is determined by adding a water-soluble iridium compound (for example, hexachloroiridium (l[
This is achieved by adding [acid salt, hexachloroiridate (IV) salt)] in the form of an aqueous solution. Same water as silver halide for grain formation? It may be added in the form of fl, or it may be added before grain formation, during grain formation, or after grain formation until chemical sensitization.
Particularly preferred is addition during particle formation.
このハロゲン化銀粒子の形成時には粒子の成長をコント
ロールするためにハロゲン化!12 ts剤として例え
ば、アンモニア、ロダンカリ、ロダンアンモン、チオエ
ーテル化合物、チオン化合物、アミン化合物などを用い
ることができる。When forming silver halide grains, halogenation is used to control grain growth! 12 As the ts agent, for example, ammonia, rhodanpotash, rhodanammonium, thioether compounds, thione compounds, amine compounds, etc. can be used.
ハロゲン化1ffl ?g剤基以外も粒子表面に吸着し
て晶癖を制御する化合物例えば、シアニン系の増感色素
やテトラザインデン系化合物、メルカプト化合物などを
粒子形成時に用いることが出来る。Halogenated 1ffl? In addition to the g-agent group, compounds that control crystal habit by adsorbing onto the particle surface, such as cyanine-based sensitizing dyes, tetrazaindene-based compounds, and mercapto compounds, can be used during particle formation.
ハロゲン化銀写真乳剤は、通常用いられている化学増悪
法、例えば全増悪、硫黄増感、還元増感、千オニーチル
化合物による増悪などの各種化学増感法が適用される。Various commonly used chemical sensitization methods, such as total sensitization, sulfur sensitization, reduction sensitization, and sensitization using a thousand-onythyl compound, can be applied to silver halide photographic emulsions.
本発明に用いられるノニオン界面活性剤としては親油基
として炭素数4〜30のアルキル基、アルケニル基、ア
リール基、アラルキル基を有し親水基として炭素数2〜
6の置換、無置換のポリオキシアルキレン基を有する化
合物であり、好ましくは下記一般式(1−1)、(1−
2)又は〔I−3〕で表わされる化合物を挙げることが
できる。The nonionic surfactant used in the present invention has an alkyl group, an alkenyl group, an aryl group, or an aralkyl group having 4 to 30 carbon atoms as a lipophilic group, and has 2 to 3 carbon atoms as a hydrophilic group.
It is a compound having a substituted or unsubstituted polyoxyalkylene group of 6, preferably represented by the following general formula (1-1) or (1-
Examples include compounds represented by 2) or [I-3].
一般式(1−1)
%式%
一般式(1−2)
一般式(1−3)
%式%
式中、Rは水素原子、炭素数1〜4のアルキル基(例え
ばメチル、エチル、ヒドロキシエチルなト)、又は炭素
数1〜5のアルキルカルボニル(例えばアセチル、クロ
ルアセチル、カルボキシメチルカルボニルなど)を表わ
す。General formula (1-1) % formula % General formula (1-2) General formula (1-3) % formula % In the formula, R is a hydrogen atom, an alkyl group having 1 to 4 carbon atoms (e.g. methyl, ethyl, hydroxy ethyl), or alkylcarbonyl having 1 to 5 carbon atoms (eg, acetyl, chloroacetyl, carboxymethylcarbonyl, etc.).
又、R1は炭素数1〜30の置換又は無置換のアルキル
基、アルケニル基又はアリール基を表わす。Further, R1 represents a substituted or unsubstituted alkyl group, alkenyl group, or aryl group having 1 to 30 carbon atoms.
Aは一〇−基、−3−基、−COO−基、−N−R,、
基、 Co N Rta基、又は]
1
’−S Oz N −R+。基(ここでR1゜は、水素
原子、置換又は無置換のアルキル基を示す。)を表わす
。A is 10- group, -3- group, -COO- group, -NR,,
group, Co N Rta group, or]
1'-S Oz N -R+. represents a group (here, R1° represents a hydrogen atom or a substituted or unsubstituted alkyl group).
Bは、オキシアルキレン基を表わす。B represents an oxyalkylene group.
R,、R,、R,r 、R9は水素原子、置換もしくは
無置換のアルキル基、アリール基、アルコキシ基、了り
−ルオキシ基、ハロゲン原子、アシル基、アミド基、ス
ルホンアミド基、カルバモイル基或いはスルファモイル
基を表わす。R,, R,, R, r, R9 are hydrogen atoms, substituted or unsubstituted alkyl groups, aryl groups, alkoxy groups, aryoloxy groups, halogen atoms, acyl groups, amide groups, sulfonamide groups, carbamoyl groups Alternatively, it represents a sulfamoyl group.
又式中R6及びR6は、置換もしくは無置換のアルキル
基、アリール基、アルコキシ基、アリールオキシ基、ハ
ロゲン原子、アシル基、アミド基、スルホンアミド基、
カルバモイル基或いはスルファモイル基を表わす。一般
式(1−3)でフェニル環の置換基は左右非対称でもよ
い。In the formula, R6 and R6 are substituted or unsubstituted alkyl groups, aryl groups, alkoxy groups, aryloxy groups, halogen atoms, acyl groups, amide groups, sulfonamide groups,
Represents a carbamoyl group or a sulfamoyl group. In the general formula (1-3), the substituents on the phenyl ring may be asymmetrical.
R4及びR2は、水素原子、置換もしくは無置換のアル
キル基、又は了り−ル基を表わす。R4とR5、R,と
R7及びR8とR1は互いに連結して置換もしくは無置
換の環を形成してもよい。R4 and R2 represent a hydrogen atom, a substituted or unsubstituted alkyl group, or an atomyl group. R4 and R5, R, and R7, and R8 and R1 may be linked to each other to form a substituted or unsubstituted ring.
n、 、n !、R3及びR4はオキシアルキレン基の
平均重合度であって2〜50の数である。n, ,n! , R3 and R4 are average degrees of polymerization of the oxyalkylene groups, and are numbers from 2 to 50.
又mは平均重合度であり、2〜50の数である。Moreover, m is an average degree of polymerization, and is a number from 2 to 50.
本発明の好ましい例を以下に記す。Preferred examples of the present invention are described below.
Bは好ましくは2〜6の炭素を有するオキシアルキレン
基であり、特に好ましくは、オキシエチレン基、オキシ
プロピレン基、オキシ(ヒドロキシ)プロピレン基、オ
キシブチレン基、オキシスチレン基が挙げられる。特に
好ましくはオキシエチレン基である。B is preferably an oxyalkylene group having 2 to 6 carbon atoms, particularly preferably an oxyethylene group, an oxypropylene group, an oxy(hydroxy)propylene group, an oxybutylene group, or an oxystyrene group. Particularly preferred is an oxyethylene group.
R1は好ましくは炭素数4〜24のアルキル基、アルケ
ニル基、アルキルアリール基であり、特に好ましくはヘ
キシル基、ドデシル基、インステアリル基、オレイル基
、t−ブチルフェニル基、2゜4−ジ−t−ブチルフェ
ニル基、2.4−ジ−t−ペンチルフェニル基、p−ド
デシルフェニル基、m−ペンタデカフェニル基、L−オ
クチルフェニル基、2.4−ジノニルフェニル基、オク
チルナフチル基等である。R1 is preferably an alkyl group, alkenyl group, or alkylaryl group having 4 to 24 carbon atoms, particularly preferably a hexyl group, dodecyl group, instearyl group, oleyl group, t-butylphenyl group, or 2゜4-di- t-butylphenyl group, 2.4-di-t-pentylphenyl group, p-dodecylphenyl group, m-pentadecaffenyl group, L-octylphenyl group, 2.4-dinonylphenyl group, octylnaphthyl group, etc. It is.
R2、R3、Rh 、Rt 、’Re及びR9は好まし
くはメチル、エチル、i−プロピル、t−ブチル、t−
アミル、L−ヘキシル、t−オクチル、ノニル、デシル
、ドデシル、トリクロロメチル、トリブロモメチル、1
−フェニルエチル、2−フェニル−2−プロピル等の炭
素数1〜20の置換又は無置換のアルキル基、フェニル
基、p−クロロフェニル基等の置換又は無置換の了り−
ル基、−OR,、(ここでR11は炭素数1〜20の置
換又は無置換のアルキル基又は了り−ル基を表わす。R2, R3, Rh, Rt, 'Re and R9 are preferably methyl, ethyl, i-propyl, t-butyl, t-
amyl, L-hexyl, t-octyl, nonyl, decyl, dodecyl, trichloromethyl, tribromomethyl, 1
- Substituted or unsubstituted alkyl groups having 1 to 20 carbon atoms such as phenylethyl and 2-phenyl-2-propyl, substituted or unsubstituted phenyl groups, p-chlorophenyl groups, etc. -
-OR, (here, R11 represents a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms or an aryl group).
以下同しである)で表わされる置換又は無置換のアルコ
キシ基又はアリールオキシ基、塩素原子、臭素原子等の
ハロゲン原子、 COR+ +で表わされるアシル基、
−NR,□C0Rz(ここにR12は水素原子又は炭素
数1〜20のアルキル基を表わす、以下同じ)で表わさ
れるアミド基、−NR,□S O,z R+ +で表わ
されるスルホンアミド基、R目
R1!
であり、又R2、R3、Rt 、R9は水素原子であっ
てもよい。これらのうちRh、R11は好ましくはアル
キル基又はハロゲン原子であり、特に好ましくはかさ高
いt−ブチル基、t−アミル基、L−オクチル基等の3
級アルキル基である。R1、R1は特に好ましくは水素
原子である。すなわち、2.4−ジ置換フェノールから
合成される一般式(1−3)の化合物が特に好ましい。(hereinafter the same applies), a substituted or unsubstituted alkoxy group or aryloxy group, a halogen atom such as a chlorine atom or a bromine atom, an acyl group represented by COR+ +,
-NR, □C0Rz (here, R12 represents a hydrogen atom or an alkyl group having 1 to 20 carbon atoms, the same applies hereinafter), -NR, □S O, sulfonamide group represented by z R+ +, R eye R1! and R2, R3, Rt, and R9 may be hydrogen atoms. Among these, Rh and R11 are preferably an alkyl group or a halogen atom, and particularly preferably a bulky t-butyl group, t-amyl group, L-octyl group, etc.
It is a class alkyl group. R1 and R1 are particularly preferably hydrogen atoms. That is, the compound of general formula (1-3) synthesized from 2,4-disubstituted phenol is particularly preferred.
R,、R5は、好ましくは水素原子、メチル基、エチル
基、n−プロピル基、i−プロピル基、n−ヘプチル基
、l−エチルアミル基、n−ウンデシル基、トリクロロ
メチル基、トリブロモメチル基等の置換もしくは無置換
のアルキル基、α−フ+J/L4、フェニル基、ナフチ
ル基、p−クロロフェニル基、p−メトキシフェニル基
、m−ニトロフェニル基等の置換もしくは無置換のアリ
ール基である。又はR1とRs 、R4とR7及びR8
とR9は互いに連結して置換もしくは無置換の環を形成
しても良く、例えばシクロヘキシル環である。R,, R5 are preferably hydrogen atom, methyl group, ethyl group, n-propyl group, i-propyl group, n-heptyl group, l-ethylamyl group, n-undecyl group, trichloromethyl group, tribromomethyl group substituted or unsubstituted alkyl groups such as α-F+J/L4, phenyl group, naphthyl group, p-chlorophenyl group, p-methoxyphenyl group, m-nitrophenyl group, etc., substituted or unsubstituted aryl group such as . or R1 and Rs, R4 and R7 and R8
and R9 may be linked to each other to form a substituted or unsubstituted ring, such as a cyclohexyl ring.
これらのうちR4とR1は特に好ましくは、水素原子、
炭素数1〜8のアルキル基、フェニル基、フリル基であ
る* nl 、nt % R3及びR4は特に好ましく
は5〜30の数である。n、とR4は同じでも異なって
も良い。Among these, R4 and R1 are particularly preferably hydrogen atoms,
* nl , nt % R3 and R4, which are alkyl groups having 1 to 8 carbon atoms, phenyl groups, and furyl groups, are particularly preferably numbers of 5 to 30. n and R4 may be the same or different.
これらの化合物は例えば米国特許第2.982゜651
号、同3,428,456号、同3,457.076号
、同3,454,625号、同3゜552.972号、
同3,655,337号、特公昭51−9610号、特
開昭53−29715号、特開昭54−89626号、
特願昭57−85764号、特願昭57−90909号
、堀口博著「新界面活性剤」 (三共出版1975年)
等に記載されている。These compounds are described, for example, in U.S. Pat.
No. 3,428,456, No. 3,457.076, No. 3,454,625, No. 3552.972,
3,655,337, JP 51-9610, JP 53-29715, JP 54-89626,
Japanese Patent Application No. 57-85764, Japanese Patent Application No. 57-90909, “New Surfactant” by Hiroshi Horiguchi (Sankyo Publishing 1975)
It is described in etc.
次に本発明に好ましく用いられるノニオン界面活性剤の
具体例を示す。Next, specific examples of nonionic surfactants preferably used in the present invention will be shown.
化合物例
1−I C++H*5COO’fcHt CHz O
+−* Hl 2 C+sHi+COO+CH*
CHt OF+sH1−3C+J!5COO(CHtC
HtO)r−(CHi−CI−CHz)y(CHzCH
zO)sllH
14CI H1?O(CHt CHi○)tHl 5
C+iH□O(CHI CHI O鼾、。Hl
6 C+hHxsOfcHz CHI O汁tz)(
! 7 C+5HssO(CHiCHCHzO)−
rfClhC)lzOho HN
1 8 C**HasO(CHI CHt O+−x
sH■ −12
υn
■ −15
■ −16
9H。Compound Example 1-I C++H*5COO'fcHt CHz O
+-* Hl 2 C+sHi+COO+CH*
CHt OF+sH1-3C+J! 5COO(CHtC
HtO)r-(CHi-CI-CHz)y(CHzCH
zO)sllH 14CI H1? O(CHt CHi○)tHl 5
C+iH□O(CHI CHI O snore,.Hl
6 C+hHxsOfcHz CHI O juice tz) (
! 7 C+5HssO(CHiCHCHzO)−
rfClhC)lzOho HN 1 8 C**HasO(CHI CHt O+-x
sH■ -12 υn ■ -15 ■ -16 9H.
C+ JxtCON (C1h−Cll*O) 1z
ll!−17
!−18
! −19C1□H!sS 4 Cl2CH*O++J
■ −20
C+zHzsO+ CHCHzO÷z(CHzCHzO
hsl+CHI
■ −21
CH,CHt0 + C11tC)lzOhzH■ −
23
C目H2s
9HI9
C9HI9
O
!−27
■−28
■ −31
■ −32
■ −33
にeH+t−t Uell17−を次に
本発明に用いられる現像液に対する溶解度が0.02重
量% 以上でかつその表面張力が45dyn/1以下(
0,02重量% 、現像液中、30℃)を有するイオン
性界面活性剤について述べる。C+ JxtCON (C1h-Cll*O) 1z
ll! -17! -18! -19C1□H! sS 4 Cl2CH*O++J
■ -20 C+zHzsO+ CHCHzO÷z(CHzCHzO
hsl+CHI ■ -21 CH,CHt0 + C11tC)lzOhzH■ -
23 Cth H2s 9HI9 C9HI9 O! -27 ■-28 ■ -31 ■ -32 ■ -33 Next, add eH+t-t Uell17- to the compound whose solubility in the developer used in the present invention is 0.02% by weight or more and whose surface tension is 45dyn/1 or less (
An ionic surfactant having a concentration of 0.02% by weight (in a developer solution, 30° C.) is described.
本発明のイオン性界面活性剤は、疎水基として炭素数4
以上の置換、無置換のアルキル、アルケニル、アラルキ
ル、アリール基であり、親水基としては、アニオン、カ
チオン、ベタイン、基である。The ionic surfactant of the present invention has 4 carbon atoms as a hydrophobic group.
These are the above-mentioned substituted and unsubstituted alkyl, alkenyl, aralkyl, and aryl groups, and the hydrophilic groups are anions, cations, betaines, and groups.
好ましい疎水基としては、炭素数6〜40の置換、無置
換のアルキル、アルケニル、アラルキル、アリール基で
あり、例えば、ヘキシル、オクチル、ノニル、デシル、
ドデシル、セチル、ステアリル、オレイル、ノニルフェ
ニル、オクチルフェニル、ジ【−アミルフェニル、ジノ
ニルフェニル、ドデシルフェニル、ドデシルビフェニル
、ビス(ジーtブチルフェニル)メチレン、ビス(ジL
−ブチルフェニル)−フェニルメチレン、パーフルオロ
オクチル、バーフルオロデシル、バーフルオロヘキンル
、バーフルオロノニレイル、パーフルオロドデシルなど
が挙げられる。Preferred hydrophobic groups include substituted or unsubstituted alkyl, alkenyl, aralkyl, and aryl groups having 6 to 40 carbon atoms, such as hexyl, octyl, nonyl, decyl,
Dodecyl, cetyl, stearyl, oleyl, nonylphenyl, octylphenyl, di[-amylphenyl, dinonylphenyl, dodecylphenyl, dodecyl biphenyl, bis(di-tbutylphenyl)methylene, bis(di-L
-butylphenyl)-phenylmethylene, perfluorooctyl, perfluorodecyl, perfluorohequinyl, perfluorononyleyl, perfluorododecyl, and the like.
又、親水基(イオン性)として好ましいのは、アニオン
基としてはカルボン酸、塩スルボン酸、塩リン酸、塩硫
酸エステル塩、ホウ酸塩が、カチオン基としては、3級
アミン、4級アミン、ホスホニウム、スルホニウムであ
り、ベタイン基としてはアミノ酸、カルボキシベタイン
、スルホキシベタイン、ホスホベタインであり、親木基
としては特に好ましいのはカルボン酸塩、スルホン酸塩
、リン酸塩、硫酸エステル塩、3級もしくは4級アミン
、カルボキシベタイン、スルホベタイン、なおアニオン
の塩としては水素、アルカリ金属、アルカカリ土類、ア
ンモニウム、低級アミンが好ましい。又イオン性親水基
に更にポリオキシルアルキレン(アルキレンは炭素数1
〜6)を同時に含存しているが好ましい。Preferred hydrophilic groups (ionic) are carboxylic acids, sulfonic acid salts, phosphoric acid salts, sulfuric acid ester salts, and borates as the anionic groups, and tertiary amines and quaternary amines as the cationic groups. , phosphonium, and sulfonium; betaine groups include amino acids, carboxybetaine, sulfoxybetaine, and phosphobetaine; particularly preferred parent groups include carboxylates, sulfonates, phosphates, sulfate ester salts, Tertiary or quaternary amines, carboxybetaine, sulfobetaine, and preferred anion salts include hydrogen, alkali metals, alkaline earth metals, ammonium, and lower amines. In addition, polyoxylalkylene (alkylene has 1 carbon number) is added to the ionic hydrophilic group.
-6) are preferably contained at the same time.
以下にこれらの具体的な化合物を列挙する。These specific compounds are listed below.
化合物例
It−I C5H++0OCCH2CHzCs H+
+ OOCCHz −CHS Os N a”
−C1l−S03Na
It−4
C+5H3s (OCHzCHzh P(ONa)
zIt−7
C1□HzsO(CH2CH20す5clhcOOK■
−10
CI+。Compound Example It-I C5H++0OCCH2CHzCs H+
+ OOCCHz −CHS Os Na”
-C1l-S03Na It-4 C+5H3s (OCHzCHzh P(ONa)
zIt-7 C1□HzsO(CH2CH20su5clhcOOK■
-10 CI+.
■−11
C11゜
■−12
CHzGHzOH
■−13
C311t
Cl1H1?SO2N (C1lzCIIzO+−r(
CIIJ’t 5O4Na■−14
C3H?
本発明のノニオン界面活性剤及びイオン性界面活性剤の
添加量は写真感光材料の1〜2000 ■/dが好ま
しく、更には、3〜500■/dがより好ましく、5〜
300■/dが特に好ましい。■-11 C11゜■-12 CHzGHzOH ■-13 C311t Cl1H1? SO2N (C1lzCIIzO+-r(
CIIJ't 5O4Na■-14 C3H? The amount of the nonionic surfactant and ionic surfactant of the present invention added is preferably 1 to 2000 μ/d, more preferably 3 to 500 μ/d, and more preferably 5 to 500 μ/d.
Particularly preferred is 300 .mu./d.
又、これらの界面活性剤は各々単独でもよいし2種以上
を混合して用いてもよい。Further, these surfactants may be used alone or in combination of two or more.
本発明のノニオン界面活性剤及びイオン性界面活性剤の
添加場所は写真感光材料のハロゲン化銀乳剤側の少なく
とも1層である。The nonionic surfactant and ionic surfactant of the present invention are added to at least one layer on the silver halide emulsion side of the photographic light-sensitive material.
層としては例えば表面保護層、乳剤層、中間層、下塗層
などを挙げることができる。表面保護層が2層以上から
なる場合はそのいづれの層でもよく、又表面保護層の上
にさらにオーバーコートとして用いることができる。Examples of the layer include a surface protective layer, an emulsion layer, an intermediate layer, and an undercoat layer. When the surface protective layer is composed of two or more layers, either layer may be used, or it can be used as an overcoat on the surface protective layer.
本発明のノニオン界面活性剤及びイオン性界面活性剤を
含有する層あるいは他の層に別の帯電防止剤を併用する
こともでき、こうすることによって更に好ましい帯電防
止効果を得ることができる。Another antistatic agent can also be used in combination with the layer containing the nonionic surfactant and ionic surfactant of the present invention or other layers, and by doing so, a more preferable antistatic effect can be obtained.
このような帯電防止剤にはアニオン、カチオン、ベタイ
ン性重合物、含フツ素界面活性剤、金属酸化物、コロイ
ドシリカ等や硫酸バリウムストロンチウム、ポリメタク
リル酸メチル、メタクリル酸メチル−メタクリル酸共重
合体、コロイドシリカ又は粉末シリカ等からなるいわゆ
るマット剤を挙げることができる。Such antistatic agents include anionic, cationic, betaine polymers, fluorine-containing surfactants, metal oxides, colloidal silica, barium strontium sulfate, polymethyl methacrylate, methyl methacrylate-methacrylic acid copolymers, etc. Examples include so-called matting agents made of colloidal silica, powdered silica, and the like.
又、エチレングリコール、プロピレングリコール、1.
1.1−トリメチロールプロパン等特開昭54−8’9
626に示されるようなポリオール化合物を本発明の界
面活性剤を含有する層あるいは他の層に添加することが
出来、こうすることによっても更に好ましい帯電防止効
果を得ることができる。Also, ethylene glycol, propylene glycol, 1.
1.1-trimethylolpropane, etc. JP-A-1983-8'9
A polyol compound such as that shown in No. 626 can be added to the layer containing the surfactant of the present invention or to other layers, and by doing so, a more preferable antistatic effect can also be obtained.
これらの中でも特に含フツ素界面活性剤を使用すること
によって更に良好な帯電防止能を得ることができる。Among these, even better antistatic ability can be obtained by using a fluorine-containing surfactant.
好ましい含弗素界面活性剤としては、炭素数4以上のフ
ルオロ−アルキル基、アルケニル基、又はアリール基を
有し、イ□オン性基としてアニオン基(スルホン酸く塩
)、硫酸(塩)、カルボン酸(塩)、リン酸(塩)、カ
チオン基(アミン塩、アンモニウム塩、芳香族アミン塩
、スルホニウム塩、ホスホニウム塩)、ベタイン基(カ
ルボキシアミン塩、カルボキシアンモニウム塩、スルホ
アミン塩、スルホアンモニウム塩、ホスホアンモニウム
塩)又はノニオン基(置換、無置換のポリオキシアルキ
レン基、ポリグリセリル基またはソルビタン残基)を有
する界面活性剤が挙げられる。Preferred fluorine-containing surfactants include a fluoro-alkyl group, alkenyl group, or aryl group having 4 or more carbon atoms, and anionic groups (sulfonic acid salts), sulfuric acid (salts), and carboxyl groups as ionic groups. Acid (salt), phosphoric acid (salt), cationic group (amine salt, ammonium salt, aromatic amine salt, sulfonium salt, phosphonium salt), betaine group (carboxyamine salt, carboxyammonium salt, sulfoamine salt, sulfoammonium salt, Examples include surfactants having a phosphoammonium salt) or a nonionic group (substituted or unsubstituted polyoxyalkylene group, polyglyceryl group, or sorbitan residue).
これらの含弗素界面活性剤は特開昭49−10722号
、英国特許第1,330,356号、米国特許第4,3
35.201号、同4,347゜308号、英国特許第
1.417,915号、特開昭55−149938号、
同58−196544号、英国特許第1,439,40
2号、などに記載されている。These fluorine-containing surfactants are disclosed in JP-A-49-10722, British Patent No. 1,330,356, and U.S. Patent No. 4,3.
No. 35.201, No. 4,347°308, British Patent No. 1.417,915, Japanese Patent Application Publication No. 149938/1983,
No. 58-196544, British Patent No. 1,439,40
It is written in No. 2, etc.
これらの好ましい具体例を以下に記す。Preferred specific examples of these are described below.
l11− I Ce F+tSOi Km 2
C? F+7COONa
m 3 Cs F+yCHz CHz 03Os
NaCiHり
C,F、、S○、N−CH,C○OK
3H7
CIIP 、 ts02N −f−CHzCHzO□
C)IzhSOJal[1−8
H
1[[−9
■−10
H
■−11
CsF+tCHzCHzOOC−CHzC411900
C−CH5OJa
CH。l11- I Ce F+tSOi Km 2
C? F+7COONa m 3 Cs F+yCHz CHz 03Os
NaCiH C, F,, S○, N-CH, C○OK 3H7 CIIP, ts02N -f-CHzCHzO□
C) IzhSOJal[1-8 H 1[[-9 ■-10 H ■-11 CsF+tCHzCHzOOC-CHzC411900
C-CH5OJa CH.
lll−13
CH2
lll−14
CIl*CToOH
ClIC1目鵞011
−ts
lll−16
Ils
■−17
Hs
■−20
■−21
■−22
CH3
■−23
CJtyCHzCthOf Cl1zCHzOhTコH
■−24
■−25
■−26
υ罷
これらの含フツ素界面活性剤の添加量はO01〜100
0■/dであればよく、好ましくは0゜2〜250mg
/rrl、特に好ましくは0.3〜100■/dである
。lll-13 CH2 lll-14 CIl*CToOH ClIC1目鵞011 -ts lll-16 Ils ■-17 Hs ■-20 ■-21 ■-22 CH3 ■-23 CJtyCHzCthOf Cl1zCHzOhTkoH
■-24 ■-25 ■-26 υThe amount of these fluorine-containing surfactants added is O01~100.
It may be 0■/d, preferably 0゜2~250mg
/rrl, particularly preferably 0.3 to 100 .mu./d.
写真層のバインダーとしてはゼラチン、カゼインなどの
蛋白質、カルボキシメチルセルロース、ヒドロキシエチ
ルセルロースナキストラン等のセルロース化合物、デキ
ストラン、寒天、アルギン酸ソーダ、でんぷん誘導体の
1!誘導体、合成親水性コロイド例えばポリビニルアル
コール、ポリ−N−ビニルピロリドン、ポリアクリル酸
共重合体、ポリアクリルアミドまたはこれらの誘導体お
よび部分加水分解物を併用することもできる。Binders for the photographic layer include proteins such as gelatin and casein, cellulose compounds such as carboxymethyl cellulose and hydroxyethyl cellulose naxtran, dextran, agar, sodium alginate, and starch derivatives. Derivatives, synthetic hydrophilic colloids such as polyvinyl alcohol, poly-N-vinylpyrrolidone, polyacrylic acid copolymers, polyacrylamide or derivatives and partial hydrolysates thereof can also be used in combination.
ここに言うゼラチンはいわゆる石灰処理ゼラチン、酸処
理ゼラチン誘導体ゼラチンおよび酵素処理ゼラチンを指
す。Gelatin referred to herein refers to so-called lime-processed gelatin, acid-processed gelatin derivative gelatin, and enzyme-processed gelatin.
本発明の写真構成層には本発明のノニオン界面活性剤及
びアニオン界面活性剤の他に他の公知の界面活性剤を単
独または混合して添加してもよい。In addition to the nonionic surfactant and anionic surfactant of the invention, other known surfactants may be added to the photographic constituent layer of the invention, either singly or in combination.
それらの塗布助剤として用いられるものであるが、時と
してその他の目的、例えば乳化分散、増悪その他の写真
特性の改良、等のためにも適用される。Although it is used as a coating aid, it is sometimes applied for other purposes, such as emulsification and dispersion, aggravation, and other improvements in photographic properties.
これらの界面活性剤はサポニン等の天然界面活性剤、高
級アルキルアミン類、第4級アンモニウム塩類、ピリジ
ンその他の複素環類、ホスホニウムまたはスルホニウム
類等のカチオン界面活性剤;カルボン酸、スルホン酸、
リン酸、硫酸エステル、リン酸エステル等の酸性基を含
むアニオン界面活性剤、アミノ酸類、アミノスルホン酸
類、アミノアルコールの硫酸またはリン酸エステル類等
の両性界面活性剤にわけられる。These surfactants include natural surfactants such as saponin, higher alkylamines, quaternary ammonium salts, pyridine and other heterocycles, cationic surfactants such as phosphonium or sulfonium; carboxylic acids, sulfonic acids,
They are divided into anionic surfactants containing acidic groups such as phosphoric acid, sulfuric acid esters, and phosphoric acid esters, and amphoteric surfactants such as amino acids, aminosulfonic acids, and sulfuric or phosphoric acid esters of amino alcohols.
又、本発明に於ては、滑性化組成物、例えば米国特許第
3,079.837号、同第3,080゜317号、同
第3,545,970号、同第3゜294.537号及
び日本公開特許昭52−129520号に示されるよう
な変性シリコーン等を写真構成中に含むことができる。Also, in the present invention, lubricating compositions, such as U.S. Pat. No. 3,079.837, U.S. Pat. Modified silicones such as those shown in No. 537 and Japanese Patent Publication No. 52-129520 can be included in the photographic composition.
本発明に於いて用いられるハレーション防止染料及び/
又はイラジェーション防止染料としては、750nm以
上の長波長に実質的な吸収を有する染料が用いられる。Antihalation dyes and/or antihalation dyes used in the present invention
Alternatively, as the anti-irradiation dye, a dye having substantial absorption at long wavelengths of 750 nm or more is used.
ここでハレーション防止染料は、中間層、下塗り層、ハ
レーション防止層、バック層、乳剤層などに、イラジェ
ーション防止染料は、乳剤層の他に中間層などに用いら
れる。またこれらの染料は好ましくは10−’−1g/
cd、より好ましくは10−3〜0.5g/n(の添加
量で用いられる。例えば、米国特許第2,895,95
5号、同3,177.078号、同4,581.325
号、特開昭5(11,001,116号に記載の染料や
、特願昭61−162987号に記載されているような
染料が好ましく用いられる。Here, the antihalation dye is used for the intermediate layer, undercoat layer, antihalation layer, back layer, emulsion layer, etc., and the antiirradiation dye is used for the intermediate layer, etc. in addition to the emulsion layer. These dyes are also preferably used in a concentration of 10-'-1g/
cd, more preferably at an addition amount of 10-3 to 0.5 g/n (for example, U.S. Pat. No. 2,895,95
No. 5, No. 3,177.078, No. 4,581.325
The dyes described in Japanese Patent Application Laid-open No. 11,001,116 and the dyes described in Japanese Patent Application No. 162987/1987 are preferably used.
本発明の写真感光材料は写真構成中に米国特許第3,4
11.911号、同3,411,912号、特公昭45
−5331号等に記載のポリマーラテックスを含むこと
ができる。The photographic light-sensitive material of the present invention has US Pat.
No. 11.911, No. 3,411,912, Special Publication No. 1973
-5331 etc. can be included.
本発明の写真感光材料のハロゲン化銀乳剤層、表面保護
層などに用いられるカブリ防止剤、安定剤、硬膜剤、可
塑剤、潤滑剤、塗布助剤、マット剤、増白剤、染料等に
ついては特に制限はなく、例えばリサーチ・ディスクロ
ージャー琵(Research Disclosure
)176巻22〜31頁(1978年12月)の記載を
参考にすることが出来る。Antifoggants, stabilizers, hardeners, plasticizers, lubricants, coating aids, matting agents, brighteners, dyes, etc. used in the silver halide emulsion layer, surface protective layer, etc. of the photographic material of the present invention. There are no particular restrictions on this, for example, Research Disclosure.
) Vol. 176, pages 22-31 (December 1978) can be referred to.
本発明に用いられる感光材料としては銀画像を与える感
光材料(例えば医療用感光材料、製版用感光材料など)
の他に色素画像を与える感光材料(例えばカラー印画紙
、カラー反転ペーパーなど)を挙げることができる。The photosensitive material used in the present invention is a photosensitive material that gives a silver image (for example, a medical photosensitive material, a photosensitive material for plate making, etc.)
Other examples include photosensitive materials that provide dye images (eg, color photographic paper, color reversal paper, etc.).
次に本発明における現像時間が15秒以内で処理される
現像・定着・水洗・乾燥工程について記す。Next, the development, fixing, water washing, and drying steps in the present invention, which are performed in a development time of 15 seconds or less, will be described.
本発明に使用する黒白現像液に用いる現像主薬には良好
な性能を得やすい点で、ジヒドロキシベンゼン類と1−
フェニル−3−ピラゾリドン類の組合せが最も好ましい
。勿論この他にp−アミノフェノール系現像主薬を含ん
でもよい。The developing agents used in the black and white developer used in the present invention are dihydroxybenzenes and 1-
Most preferred is a combination of phenyl-3-pyrazolidones. Of course, a p-aminophenol type developing agent may also be included.
本発明に用いるジヒドロキシベンゼン現像主薬としては
ハイドロキノン、クロロハイドロキノン、ブロムハイド
ロキノン、イソプロピルハイドロキノン、メチルハイド
ロキノン、2,3−ジクロロハイドロキノン、2,5−
ジクロロハイドロキノン、2.3−ジブロムハイドロキ
ノン、2.5−ジメチルハイドロキノンなどがあるが特
にハイドロキノンが好ましい。The dihydroxybenzene developing agent used in the present invention includes hydroquinone, chlorohydroquinone, bromohydroquinone, isopropylhydroquinone, methylhydroquinone, 2,3-dichlorohydroquinone, 2,5-
Examples include dichlorohydroquinone, 2,3-dibromohydroquinone, and 2,5-dimethylhydroquinone, with hydroquinone being particularly preferred.
本発明に用いる1−フェニル−3−ピラゾリドン又はそ
の誘導体の現像主薬としては1−フェニル−4,4−ツ
メチル−3−ピラゾリドン、1−フェニル−4−メチル
−4−ヒドロキシメチル−3−ピラゾリドン、l−フェ
ニル−4,4−ジヒドロキシメチル−3−ピラゾリドン
、などがある。Developing agents for 1-phenyl-3-pyrazolidone or its derivatives used in the present invention include 1-phenyl-4,4-methyl-3-pyrazolidone, 1-phenyl-4-methyl-4-hydroxymethyl-3-pyrazolidone, l-phenyl-4,4-dihydroxymethyl-3-pyrazolidone, and the like.
本発明に用いるp−アミノフェノール系現像玉薬として
はN−メチル−p−アミノフェノール、p−アミノフェ
ノール、N−(β−ヒドロキシエチル)−p−アミノフ
ェノール、N−(4−ヒドロキシフェニル)グリジン、
2−メチル−p−アミノフェノール、p−ベンジルアミ
ノフェノール等があるが、なかでもN−メチル−p−ア
ミンフェノールが好ましい。Examples of the p-aminophenol developing beads used in the present invention include N-methyl-p-aminophenol, p-aminophenol, N-(β-hydroxyethyl)-p-aminophenol, and N-(4-hydroxyphenyl). glycine,
There are 2-methyl-p-aminophenol, p-benzylaminophenol, etc., among which N-methyl-p-aminephenol is preferred.
現像主薬は通常0.01モル/l〜1.2モル/2の量
で用いられるのが好ましい。The developing agent is preferably used in an amount of usually 0.01 mol/l to 1.2 mol/2.
本発明に用いる亜硫酸塩の保恒剤としては亜硫酸ナトリ
ウム、亜硫酸カリウム、亜硫酸リチウム、亜硫酸アンモ
ニウム、重亜硫酸ナトリウム、メタ重亜硫酸カリウム、
ホルムアルデヒド重亜硫酸ナトリウムなどがある。亜硫
酸塩は0.2モル/2以上特に0.4モル/2以上が好
ましい。また、上限は2.5モル/lまでとするのが好
ましい。Preservatives for sulfite used in the present invention include sodium sulfite, potassium sulfite, lithium sulfite, ammonium sulfite, sodium bisulfite, potassium metabisulfite,
Examples include formaldehyde and sodium bisulfite. The amount of sulfite is preferably 0.2 mol/2 or more, particularly 0.4 mol/2 or more. Further, the upper limit is preferably 2.5 mol/l.
本発明に用いる現像液のpHは9から13までの範囲の
ものが好ましい。更に好ましくはpH10から12まで
の範囲である。The pH of the developer used in the present invention is preferably in the range of 9 to 13. More preferably, the pH range is from 10 to 12.
pHの設定のために用いるアルカリ剤には水酸化ナトリ
ウム、水酸化カリウム、炭酸ナトリウム、炭酸カリウム
、第三リン酸ナトリウム、第三リン酸カリウムの如きp
H調節剤を含む。Alkaline agents used to set pH include sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, trisodium phosphate, and potassium triphosphate.
Contains H regulator.
特願昭61−28708合(ホウ酸塩)、特開昭60−
93433号(例えば、サッカロース、アセトオキシム
、5−スルホサルチル酸)、リン酸塩、炭酸塩などの緩
衛剤を用いてもよい。Patent application 1987-28708 (boric acid salt), 1986-
Delays such as No. 93433 (e.g., sucrose, acetoxime, 5-sulfosalcylic acid), phosphates, carbonates, etc. may also be used.
上記成分以外に用いられる添加剤としては、臭化ナトリ
ウム、臭化カリウム、沃化カリウムの如き現像抑制剤:
エチレングリコール、ジエチレングリコール、トリエチ
レングリコール、ジメチルホルムアミド、メチルセロソ
ルブ、ヘキシレングリコール、エタノール、メタノール
の如き有機溶剤:1−フェニル−5−メルカプトテトラ
ゾール、2−メルカプトベンツイミダゾール−5−スル
ホン酸ナトリウム塩等のメルカプト系化合物、5−ニト
ロインダゾール等のインダゾール系化合物、5−メチル
ベンツトリアゾール等のベンツトリアゾール系化合物な
どのカブリ防止剤を含んでもよく、更に必要に応じて色
調剤、界面活性剤、消泡剤、硬水軟化剤、特開昭56−
106244号記載のアミノ化合物などを含んでもよい
。Additives used in addition to the above components include development inhibitors such as sodium bromide, potassium bromide, and potassium iodide:
Organic solvents such as ethylene glycol, diethylene glycol, triethylene glycol, dimethylformamide, methyl cellosolve, hexylene glycol, ethanol, methanol; 1-phenyl-5-mercaptotetrazole, 2-mercaptobenzimidazole-5-sulfonic acid sodium salt, etc. It may contain antifoggants such as mercapto compounds, indazole compounds such as 5-nitroindazole, and benztriazole compounds such as 5-methylbenztriazole, and may further contain color toning agents, surfactants, and antifoaming agents as necessary. , hard water softener, JP-A-1987-
It may also contain the amino compounds described in No. 106244.
本発明においては現像液に銀汚れ防止剤、例えば特開昭
56−24347号に記載の化合物、を用いることがで
きる。In the present invention, a silver stain preventive agent, such as the compound described in JP-A-56-24347, can be used in the developer.
本発明の現像液には、特開昭56−106244号に記
載のアルカノールアミンなどのアミノ化合物を用いるこ
とができる。In the developer of the present invention, amino compounds such as alkanolamines described in JP-A-56-106244 can be used.
この他り、 F、 A、メソン著「フォトグラフィッ
ク・プロセシン・ケミ入トリー」、フォーカル・プレス
刊(1966年)の226〜229頁、米国特許第2,
193,015号、同2,592゜364号、特開昭4
8−64933号などに記載のものを用いてもよい。In addition, F. A. Messon, "Photographic Processing Chemistry", Focal Press (1966), pp. 226-229, U.S. Patent No. 2,
No. 193,015, No. 2,592゜364, JP-A-4
Those described in No. 8-64933 may also be used.
本発明において「現像時間」、「定着時間」とは各々、
処理する感光材料が自現機の現像タンク液に浸漬してか
ら次の定着液に浸漬するまでの時間、定着タンク液に浸
漬してから次の水洗タンク液(安定液)に浸漬するまで
の時間を言う。In the present invention, "development time" and "fixing time" respectively mean
The time from when the photosensitive material to be processed is immersed in the developing tank solution of the automatic processing machine until it is immersed in the next fixing solution, and the time from when it is immersed in the fixing tank solution until it is immersed in the next washing tank solution (stabilizing solution). say the time
また「水洗時間」とは、水洗タンク液に浸漬している時
間をいう。Further, "washing time" refers to the time during which the product is immersed in the washing tank liquid.
また「乾燥時間」とは通常35℃〜100 ℃5好まし
くは40℃〜80″Cの熱風が吹きつけられる乾燥ゾー
ンが、自現機には設置されているが、その乾燥ゾーンに
入っている時間をいう。In addition, "drying time" is usually a drying zone in which hot air is blown at 35°C to 100°C, preferably 40°C to 80"C. refers to time.
現像温度及び時間は約り5℃〜約50℃で15秒以下で
あるが好ましくは30℃〜40℃で6秒〜15秒である
。The developing temperature and time are about 5° C. to about 50° C. for 15 seconds or less, preferably 30° C. to 40° C. for 6 seconds to 15 seconds.
定着液はヂオ硫酸塩、を含む水溶液であり、pH3,8
以上、好ましくは4.2〜5.5を有する。更に好まし
くはpH4,65〜5.5である。The fixing solution is an aqueous solution containing diosulfate, and has a pH of 3.8.
Above, preferably 4.2 to 5.5. More preferably the pH is 4.65 to 5.5.
定着剤としては千オ硫酸ナトリウム、チオ硫酸アンモニ
ウムがあるが、チオ硫酸イオンとアンモニウムイオンと
を必須成分とするものであり、定着速度の点からチオ硫
酸アンモニウムが特に好ましい。定着剤の使用量は適宜
変えることができ、−船には約0.1〜約6モル/Il
である。Examples of the fixing agent include sodium periosulfate and ammonium thiosulfate, which contain thiosulfate ions and ammonium ions as essential components, and ammonium thiosulfate is particularly preferred from the viewpoint of fixing speed. The amount of adhesion promoter used can be varied accordingly, - from about 0.1 to about 6 mol/Il for ships;
It is.
定着液には硬膜剤として作用する水溶性アルミニウム塩
を含んでもよく、それらには、例えば塩化アルミニウム
、硫酸アンモニウム、カリ明ばんなどがある。The fixer may also contain water-soluble aluminum salts that act as hardeners, such as aluminum chloride, ammonium sulfate, potassium alum, and the like.
定着液には、酒石酸、クエン酸あるいはそれらの導体を
単独で、あるいは2種以上、併用することができる。こ
れらの化合物は定着液l!!、につき0.005モル以
上含むものが有効で、特に0゜O1モル/l〜0.03
モル/lが特に有効である。Tartaric acid, citric acid, or conductors thereof can be used alone or in combination of two or more kinds in the fixer. These compounds are used in fixer l! ! , containing 0.005 mol or more per mol/l is effective, especially 0°O 1 mol/l to 0.03 mol/l
Mol/l is particularly useful.
具体的には、酒石酸、酒石酸カリウム、酒石酸ナトリウ
ム、酒石酸カリウムナトリウム、クエン酸、クエン酸ナ
トリウム、クエン酸カリウム、クエン酸リチウム、クエ
ン酸アンモニウムなどがある。Specific examples include tartaric acid, potassium tartrate, sodium tartrate, potassium sodium tartrate, citric acid, sodium citrate, potassium citrate, lithium citrate, and ammonium citrate.
定着液には所望により保恒剤(例えば、亜硫酸塩、重亜
硫酸塩)、pH緩衝剤(例えば、酢酸、硼酸)、pHg
l整剤(側基ば、硫酸)、硬水軟化能のあるキレート剤
や特願昭60−218562号記載の化合物を含むこと
ができる。The fixer may optionally contain preservatives (e.g. sulfites, bisulfites), pH buffers (e.g. acetic acid, boric acid), pHg
It can contain a conditioning agent (side group: sulfuric acid), a chelating agent with water softening ability, and a compound described in Japanese Patent Application No. 60-218562.
定着温度及び時間は約20℃〜約50℃で6秒〜1分が
好ましいが30℃〜40℃で6秒〜30秒がより好まし
く、更に好ましくは30℃〜40℃で6秒〜15秒であ
る。The fixing temperature and time are preferably about 20°C to about 50°C and 6 seconds to 1 minute, more preferably 30°C to 40°C for 6 seconds to 30 seconds, and even more preferably 30°C to 40°C for 6 seconds to 15 seconds. It is.
定着液濃縮液が本発明の方法で自動現像機に、感光材料
が処理されるに従って、それを希釈する水と共に補充さ
れる場合、定着液濃縮液は1剤で構成されることが最も
好ましいことは現像液の場合と同しである。When the fixer concentrate is replenished into the automatic processor in the method of the invention with water to dilute it as the light-sensitive material is processed, it is most preferred that the fixer concentrate is composed of one part. is the same as for the developer.
1剤として定着液現液が安定に存在しうるのはpH4,
5以上であり、より好ましくはPH4゜65以上である
。PH4,5未満では、特に定着液が実際に使われるま
での期間長年放置された場合にチオ硫酸塩が分解して最
終的には硫化してしまうためである。従ってpH4,5
以上の範囲では亜硫酸ガスの発生も少なく、作業環境上
も良くなる。pHの上限はそれ程厳しくないが余り高p
Hで定着されると、以後水洗されても膜pHが高くなっ
て膜膨潤が大きくなり従って乾燥負荷が大きくなるので
pH7まで位が限度である。アルミニウム塩を使って硬
膜する定着液ではアルミニウム塩の析出沈澱防止pHは
5.5までが限界である。The fixer solution can exist stably as a single agent at pH 4,
5 or more, more preferably PH4.65 or more. This is because if the pH is less than 4.5, the thiosulfate will decompose and eventually become sulfurized, especially if the fixer is left for a long period of time before it is actually used. Therefore pH 4,5
Within the above range, sulfur dioxide gas is generated less and the working environment is also improved. The upper limit of pH is not so strict, but if it is too high
If the film is fixed with H, even if it is washed with water thereafter, the membrane pH will become high and the membrane will swell to a large extent, resulting in a large drying load, so the pH is limited to about 7. In fixing solutions that use aluminum salts to harden films, the pH limit for preventing precipitation of aluminum salts is 5.5.
本発明は現像液または定着液のいずれかが上記のような
希釈水を必要としない(すなわち原液のままで補充する
)いわゆる使用液であっても構わない。In the present invention, either the developing solution or the fixing solution may be a so-called working solution that does not require dilution water as described above (that is, it is replenished as an undiluted solution).
各濃縮液の処理タンク液への供給量及び希釈水との混合
割合はそれぞれ濃縮液の組成に依存して種々変化させる
ことができるが、一般に濃縮液対希釈水はl対O〜8の
割合で、これらの現像液、定着液各々の全量は感光材料
1rrlに対して50m1から1500mlであること
が好ましい。The amount of each concentrate supplied to the processing tank liquid and the mixing ratio with dilution water can be varied depending on the composition of the concentrate, but generally the ratio of concentrate to dilution water is 1 to 8. The total amount of each of the developer and fixer is preferably 50 ml to 1500 ml per 1 rrl of the photosensitive material.
本発明においては感光材料は現像、定着した後、水洗又
は安定化処理に施される。In the present invention, the photosensitive material is subjected to water washing or stabilization treatment after being developed and fixed.
水洗又は安定化処理は本分野で公知のあらゆる方法を適
用することができ、本分野で公知の種々の添加剤を含有
する水を水洗水又は安定化液として用いることもできる
。防黴手段を施した水を水洗水又は安定化液に使用する
ことにより、感光材料1rrr当たり32以下の補充量
という節水処理も可能となるのみならず、自現機設置の
配管が不要となり更にストック槽の削減が可能となる。Any method known in the art can be applied to the washing or stabilization treatment, and water containing various additives known in the art can also be used as the washing water or stabilizing liquid. By using anti-mold water as washing water or stabilizing liquid, not only is it possible to save water by reducing the amount of replenishment to 32 or less per rrr of photosensitive material, but it also eliminates the need for piping for installing an automatic processing machine. It is possible to reduce the number of stock tanks.
即ち現像液及び定着液用の調液希釈水及び水洗水又は安
定化液を共通の一層のストック槽から供給でき、自動現
像機の一層のコンパクト化が可能となる。That is, the solution dilution water and washing water or stabilizing solution for the developer and fixer can be supplied from a common single layer stock tank, making it possible to further downsize the automatic developing machine.
防黴手段を施した水を水洗水又は安定化液に併用すると
、水垢の発生等が有効に防止し得るため、感光材料1M
当たり0〜31、好ましくは0〜11、の節水処理を行
うことができる。When water treated with anti-mildew measures is used in combination with washing water or stabilizing liquid, the formation of limescale can be effectively prevented.
0 to 31, preferably 0 to 11, per water saving treatment can be performed.
ここで、補充量がOの場合とは、水洗槽中の水洗水が自
然蒸発等により減少した分だけ適宜補充する以外は全く
補充を行なわない、即ち実質的に無補充のいわゆる「た
め水」処理方法を行なう場合をいう。Here, when the replenishment amount is O, there is no replenishment at all except for appropriately replenishing the amount of washing water in the washing tank that has decreased due to natural evaporation, etc. In other words, the so-called "reservoir water" is essentially not refilled. Refers to cases in which a processing method is used.
補充量を少な(する方法として、古くより多段向流方式
(例えば2段、3段など)が知られている。この多段向
流方式を本発明に適用すれば定着後の感光材料はだんだ
んと清浄な方向、つまり定着液で汚れていない処理液の
方に順次接触して処理されて行くので、更に効率の良い
水洗がなされる。これによれば、不安定なチオ硫酸塩等
が適度に除去され、変退色の可能性が一層小さくなって
、更に著しい安定化効果が得られる。水洗水も従来に比
べ、非常に少ない量ですむ。As a method for reducing the amount of replenishment, a multi-stage countercurrent system (for example, two stages, three stages, etc.) has been known for a long time.If this multistage countercurrent system is applied to the present invention, the photosensitive material after fixing will gradually increase. Since the processing is carried out in a clean direction, that is, in order to contact the processing solution that is not contaminated with the fixer, more efficient water washing is achieved. According to this, unstable thiosulfate etc. are properly removed. The possibility of discoloration and fading is further reduced, resulting in a more significant stabilizing effect.The amount of washing water is also much smaller than in the past.
少量の水洗水で水洗するときには特願昭60−1729
68号に記載のスクイズローラー洗浄槽を設けることが
より好ましい。When washing with a small amount of water, patent application 1729/1986
It is more preferable to provide a squeeze roller cleaning tank as described in No. 68.
更に水洗又は安定化浴に防黴手段を施した水を処理に応
じて補充することによって生ずる水洗又は安定化浴から
のオーバーフロー液の一部又は全部は特開昭60−23
5133号に記載されているようにその前の処理工程で
ある定着能を有する処理液に利用することもできる。こ
うすることによって上記ストック水の節水ができ、しか
も廃液がより少なくなるためより好ましい。Further, part or all of the overflow liquid from the washing or stabilizing bath, which is generated by replenishing the washing or stabilizing bath with anti-mold water depending on the treatment, is disclosed in Japanese Patent Application Laid-Open No. 60-23
As described in Japanese Patent Application No. 5133, it can also be used in a processing liquid having a fixing ability, which is a processing step before that. This is more preferable because the stock water can be saved and the amount of waste liquid can be reduced.
防黴手段としては、特開昭60−263939号に記さ
れた紫外線照射法、同60−263940号に記された
磁場を用いる方法、同61−131632号に記された
イオン交換樹脂を用いて純水にする方法、特願昭60−
253807号、同60−295894号、同61−6
3030号、同61−51396号に記載の防菌剤を用
いる方法を用いることができる。Anti-mildew methods include the ultraviolet irradiation method described in JP-A No. 60-263939, the method using a magnetic field described in JP-A No. 60-263940, and the use of ion exchange resin described in JP-A No. 61-131632. How to make pure water, patent application 1986-
No. 253807, No. 60-295894, No. 61-6
The method using the antibacterial agent described in No. 3030 and No. 61-51396 can be used.
更には、L、E、West ”Water Qual
ity Cr1teria”Photo Sci &
Eng、 Vol、9Nll 6 (1965) 、M
、W、Be−ach Microbiologica
l Growths in Motion−Pic−t
ure Processing″ SMPTE Jou
rnal Vol、85.(1976)、R,O,De
egan、 ”Photo Processing
Wash Wate−r Biocides″J、Im
aging Tech、Vol 10.に6(1984
)及び特開昭57−8542号、同57−58143号
、同5B−105145号、同57−132146号、
同5B−18631号、同57−97530号、同57
−157244号などに記載されている防菌剤、防パイ
剤、界面活性剤などを併用することもできる。Furthermore, L, E, West “Water Qual
ity Cr1teria” Photo Sci &
Eng, Vol, 9Nll 6 (1965), M
, W. Be-ach Microbiologica
l Growths in Motion-Pic-t
ure Processing” SMPTE Jou
rnal Vol, 85. (1976), R.O., De.
egan, “Photo Processing
Wash Water-r Biocides''J, Im
aging Tech, Vol 10. 6 (1984)
) and JP-A-57-8542, JP-A-57-58143, JP-A-5B-105145, JP-A-57-132146,
No. 5B-18631, No. 57-97530, No. 57
Antibacterial agents, anti-inflammatory agents, surfactants, etc. described in Japanese Patent No. 157244 and the like can also be used in combination.
更に、水洗浴には、R,T、Kreiman著J、Im
age。In addition, for the washing bath, R.T. Kreiman, J.Im.
age.
Tech to、(6) 242 (1984)に記載
されたイソチアゾリン系化合物、RESEARCHDI
SCLOSURE第205巻、Item 20526
(1981年、5月号)に記載されたイソチアゾリン
系化合物、同第228巻、Itan+ 22845
(1983年、4月号)に記載されたイソチアゾリン系
化合物特願昭61−51396号に記載された化合物、
などを防菌剤(Microbiocide)として併用
することもできる。RESEARCHDI, an isothiazoline compound described in Tech to, (6) 242 (1984)
SCLOSURE Volume 205, Item 20526
Isothiazoline compounds described in (May 1981), Volume 228, Itan+ 22845
(April issue, 1983) Isothiazoline compounds described in Japanese Patent Application No. 61-51396,
etc. can also be used together as a microbiocide.
更に防パイ剤の具体例としては、フェノール、4−クロ
ロフェノール、ペンタクロロフェノール、クレゾール、
0−フェニルフェノール、クロロフェン、ジクロロフェ
ン、ホルムアルデヒド、ゲルタールアルデヒド、クロル
アセトアミド、p−ヒドロキシ安息香酸エステル、2−
(4−チアゾリン)−ベンゾイミダゾール、ベンゾイソ
チアゾリン−3−オン、ドデシル−ベンジル−ジメチル
アンモニウム−クロライド、N−(フルオロジクロロメ
チルチオ)−フタルイミド、2,4.4’−トリクロロ
−2′−ハイドロオキシジフェニルエーテルなどがある
。Furthermore, specific examples of anti-piping agents include phenol, 4-chlorophenol, pentachlorophenol, cresol,
0-phenylphenol, chlorophene, dichlorophene, formaldehyde, geltaraldehyde, chloracetamide, p-hydroxybenzoic acid ester, 2-
(4-Thiazoline)-benzimidazole, benzisothiazolin-3-one, dodecyl-benzyl-dimethylammonium-chloride, N-(fluorodichloromethylthio)-phthalimide, 2,4.4'-trichloro-2'-hydroxydiphenyl ether and so on.
防黴手段を施して水ストック槽に保存された水は前記現
像液定着液などの処理液原液の希釈水としても水洗水と
しても共用されるのがスペースが小さくてすむ点で好ま
しい、しかし防黴手段を施した調液希釈水と水洗水(又
は安定化液)とを分けて別槽にそれぞれ保管することも
できるし、どちらか一方だけを水道から直接とってもよ
い。It is preferable that the water treated with anti-mold measures and stored in a water stock tank be used both as dilution water for the undiluted solution of processing solutions such as the developer-fixer and as washing water, since it takes up less space. The dilution water treated with mold treatment and the washing water (or stabilizing solution) can be stored separately in separate tanks, or only one of them can be taken directly from the tap.
別槽に分けて保管したときは、本発明の如き防黴手段を
施した上に、水洗水(又は安定浴)には種々の添加剤を
含有させることができる。When stored in separate tanks, the washing water (or stabilizing bath) can contain various additives in addition to applying anti-mildew measures as in the present invention.
例えば、アルミニウムとのキレート安定度logK値が
、10以上のキレート化合物を含有させてもよい。これ
らは、定着液中に硬膜剤としてアルミニウム化合物を含
む場合水洗水中での自沈を防止するのに有′効である。For example, a chelate compound having a log K value of chelate stability with aluminum of 10 or more may be included. These are effective in preventing scuttling in washing water when the fixing solution contains an aluminum compound as a hardening agent.
キレート剤の具体例としては、エチレンジアミン四酢酸
(logに・ 16.1.以下同じ)、シクロヘキサン
ジアミン四酢酸(17,6L ジアミノプロパノール四
酢酸(13,8)、ジエチレントリアミン五酢酸(18
,4)、トリエチレンテトラミン六酢酸(19,7)等
及びこれらのナトリウム塩、カリウム塩、アンモニウム
塩があり、その添加量は好ましくは0.01−10g#
!、より好ましくは0.1〜5 g/j!である。Specific examples of chelating agents include ethylenediaminetetraacetic acid (log 16.1; the same applies hereinafter), cyclohexanediaminetetraacetic acid (17.6L, diaminopropanoltetraacetic acid (13,8), diethylenetriaminepentaacetic acid (18
, 4), triethylenetetraminehexaacetic acid (19,7), and their sodium salts, potassium salts, and ammonium salts, and the amount added is preferably 0.01-10 g#
! , more preferably 0.1 to 5 g/j! It is.
更に水洗水中には銀画像安定化剤の他に水滴むらを防止
する目的で、各種の界面活性剤を添加することができる
。界面活性剤としては、陽イオン型、陰イオン型、非イ
オン型および両イオン型のいずれを用いてもよい。界面
活性剤の具体例としてはたとえば工学図書(株)発行の
[界面活性剤ハンドブック」に記載されている化合物な
どがある。Furthermore, in addition to the silver image stabilizer, various surfactants can be added to the washing water for the purpose of preventing water droplet unevenness. As the surfactant, any of cationic, anionic, nonionic, and amphoteric types may be used. Specific examples of surfactants include compounds described in "Surfactant Handbook" published by Kogaku Tosho Co., Ltd.
上記安定化浴中には画像を安定化する目的で各種化合物
が添加される0例えば#pHを調整する(例えばpH3
〜8)ための各種の緩衝剤(例えばホウ酸塩、メタホウ
酸塩、ホウ砂、リン酸塩、炭酸塩、水酸化カリ、水酸化
ナトリウム、アンモニア水、モノカルボン酸、ジカルボ
ン酸、ポリカルボン酸などを組み合わせて使用)やホル
マリンなどのアルデヒドを代表例として挙げることがで
きる。その他、キレート剤、殺菌剤(チアゾール系、イ
ソチアゾール系、ハロゲン化フェノール、スルファニル
アミド、ベンゾトリアゾールなど)、界面活性剤、蛍光
増白剤、硬膜剤などの各種添加剤を使用してもよく、同
一もしくは異種の目的の化合物を2種以上併用しても良
い。Various compounds are added to the stabilizing bath for the purpose of stabilizing the image. For example, adjust the pH (for example, pH 3).
~8) various buffering agents (e.g. borate, metaborate, borax, phosphate, carbonate, potassium hydroxide, sodium hydroxide, aqueous ammonia, monocarboxylic acid, dicarboxylic acid, polycarboxylic acid) Typical examples include aldehydes such as (used in combination) and formalin. In addition, various additives such as chelating agents, bactericidal agents (thiazole type, isothiazole type, halogenated phenol, sulfanilamide, benzotriazole, etc.), surfactants, optical brighteners, hardening agents, etc. may be used. , two or more of the same or different desired compounds may be used in combination.
また、処理機の膜pHjIl整剤とし側基化アンモニウ
ム、硝酸アンモニウム、硫酸アンモニウム、リン酸アン
モニウム、亜硫酸アンモニウム、チオ硫酸アンモニウム
等の各種アンモニウム塩を添加するのが画像保存性を良
化するために好ましい。Further, it is preferable to add various ammonium salts such as lateralized ammonium, ammonium nitrate, ammonium sulfate, ammonium phosphate, ammonium sulfite, and ammonium thiosulfate as a membrane pHjIl adjuster for the processing machine in order to improve image storage stability.
上記の方法による水洗または安定浴温度及び時間はO″
C〜50゛Cで6秒〜1分が好ましいが15℃〜40℃
で6秒から30秒がより好ましく、更には15”C〜4
0℃で6秒から15秒が好ましい。The water washing or stabilization bath temperature and time using the above method is O''
6 seconds to 1 minute at C to 50 °C is preferred, but 15 to 40 °C
more preferably 6 to 30 seconds, and more preferably 15"C to 4
Preferably, the temperature is 6 to 15 seconds at 0°C.
本発明の方法によれば、現像、定着及び水洗された写真
材料は水洗水をしぼり切る、すなわちスクイズローラ法
を経て乾燥される。乾燥は約40℃〜約100 ℃で行
なわれ、乾燥時間は周囲の状態によって適宜変えられる
が、通常は約5秒〜1分でよいが、より好ましくは40
℃〜80℃で約5秒〜30秒である。According to the method of the present invention, the developed, fixed and washed photographic material is dried by squeezing out the washing water, that is, by using a squeeze roller method. Drying is carried out at about 40°C to about 100°C, and the drying time can be changed as appropriate depending on the surrounding conditions, but usually it is about 5 seconds to 1 minute, but more preferably about 40°C.
It is about 5 seconds to 30 seconds at a temperature of .degree. C. to 80.degree.
本発明においては、感光材料における膨潤百分率を低減
する程その乾燥時間を短縮できるという更に優れた効果
を発揮する。In the present invention, an even more excellent effect is exhibited in that the lower the swelling percentage of the photosensitive material, the shorter the drying time thereof.
本発明の方法によれば、現像、定着、水洗及び乾燥され
るまでのいわゆる[lry to Dryの処理時間は
3分15秒以内、好ましくは100秒以内、更に最も好
ましくは60秒以内で処理されることである。このよう
な処理時間の短縮化に加えて、現像液、定着液の一パー
ツ構成の補充液により調液作業の簡易化、メンテナンス
の簡易化が同時に達成されるものである。According to the method of the present invention, the so-called dry-to-dry processing time for development, fixing, washing, and drying is within 3 minutes and 15 seconds, preferably within 100 seconds, and most preferably within 60 seconds. Is Rukoto. In addition to such a reduction in processing time, the replenisher, which is a one-part component of the developer and fixer, simultaneously simplifies the liquid preparation work and simplifies maintenance.
ここで“dry to dry ”とは処理される窓材
の先端が自現機のフィルム挿入部分に入った瞬間から、
処理されて、同先端が自現機から出てくる瞬間までの時
間を言う。Here, "dry to dry" means that from the moment the tip of the window material to be processed enters the film insertion part of the processor,
This refers to the time from when the tip is processed to the moment when the tip comes out of the processor.
(実施例)
以下に実施例を挙げて本発明を例証するが本発明はこれ
に限定されるものではない。(Example) The present invention will be illustrated below with reference to Examples, but the present invention is not limited thereto.
実施例1
+11 単分散ハロゲン化銀乳剤の調製ゼラチンと臭
化カリウムと水が入った55℃に加温された容器に適当
量のアンモニアを入れた後、反応容器中のpAg値を7
.60に保ちつつ硝酸根水溶液と銀に対するイリジウム
のモル比で10−7モルとなるようにヘキサクロロイリ
ジウム(III)酸塩を添加した臭化カリウム水溶液と
をダブルジェット法により添加して平均粒子サイズが0
,55μの単分散臭化銀乳剤粒子を調製しな。この乳剤
粒子は、平均粒子サイズの±40%以内に全粒子数の9
8%が存在していた。この乳剤を脱塩処理後、pHを6
.2、pAgを8.6に合わせてからチオ硫酸ナトリウ
ムと塩化金酸とにより金・硫黄増感を行ない所望の写真
性を得た。Example 1 +11 Preparation of monodispersed silver halide emulsion After adding an appropriate amount of ammonia to a container heated to 55°C containing gelatin, potassium bromide, and water, the pAg value in the reaction container was reduced to 7.
.. The average particle size was adjusted by adding a nitrate radical aqueous solution and a potassium bromide aqueous solution to which hexachloroiridate (III) salt was added so that the molar ratio of iridium to silver was 10-7 mol while maintaining the average particle size of 60% by double jet method. 0
, 55μ monodisperse silver bromide emulsion grains. This emulsion grain has 9 of the total grains within ±40% of the average grain size.
8% were present. After desalting this emulsion, the pH was adjusted to 6.
.. 2. After adjusting the pAg to 8.6, gold/sulfur sensitization was performed using sodium thiosulfate and chloroauric acid to obtain desired photographic properties.
この乳剤の(100)面/ (111,)固化率をクベ
ルカムンク法で測定したところ98/2であった。この
乳剤をAと命名した。The (100) plane/(111,) solidification ratio of this emulsion was measured by the Kubelkamunk method and was found to be 98/2. This emulsion was named A.
次にAから粒子形成前に添加するアンモニア量を減らす
だけの変更を行なって平均粒子サイズが0.35μの単
分散乳剤Bを調製した。Next, a monodispersed emulsion B having an average grain size of 0.35 .mu.m was prepared by changing A only by reducing the amount of ammonia added before grain formation.
(2)乳剤塗布液の調製
乳剤A0.5kgと乳剤80.5kgを40℃に加温し
て乳剤を溶解後赤外域増感色素、構造Aのメタノール溶
液(9X 10−’M/ i2 )を70cc、強色増
感剤4.4′−ビス〔4,6−ジ(ナフチル−2−オキ
シ)ピリミジン72−イルアミノコスチルベン−2,2
′−ジスルホン酸ジナトリウム塩(4,4x 10−’
M/jり水溶i(4,4X 10−”M/ 1> 9
0cc、構造式Bのメタノール溶液(2,8X 10−
”M/ 1> 35cc、 、4−ヒドロキシ−6−メ
チル−1,3,3a、?−テトラザインデン水溶液、塗
布助剤ドデシルベンゼンスルフォン酸塩の水溶液、増粘
剤ポリボタシウムーp−ビニルヘンゼンスルフォネート
化合物の水溶液を添加して乳剤塗布液とした。(2) Preparation of emulsion coating solution 0.5 kg of emulsion A and 80.5 kg of emulsion were heated to 40°C to dissolve the emulsion, and then a methanol solution (9X 10-'M/i2) of an infrared sensitizing dye, structure A, was added. 70cc, supersensitizer 4,4'-bis[4,6-di(naphthyl-2-oxy)pyrimidine 72-ylaminocostilbene-2,2
'-Disulfonic acid disodium salt (4,4x 10-'
M/j water soluble i (4,4X 10-”M/ 1>9
0cc, methanol solution of structural formula B (2,8X 10-
"M/ 1> 35cc, 4-hydroxy-6-methyl-1,3,3a,?-tetrazaindene aqueous solution, coating aid dodecylbenzenesulfonate aqueous solution, thickener polybotacium p-vinylhenzenesulfonate An aqueous solution of a nate compound was added to prepare an emulsion coating solution.
(3)感材層の最外層用塗布液の調製
40℃に加温された19wt%ゼラチン水溶液に、増粘
剤ポリエチレンスルフオン酸ソーダ水溶液、マット剤ポ
リメチルメタクリレート微粒子(平均粒子サイズ3.0
μm)、硬膜剤N。(3) Preparation of coating solution for the outermost layer of the photosensitive material layer A 19 wt % gelatin aqueous solution heated to 40°C, a thickener polyethylene sodium sulfonate aqueous solution, and a matting agent polymethyl methacrylate fine particles (average particle size 3.0
μm), hardener N.
N′−エチレンビス−(ビニルスルフォニルアセトアミ
ド)、及び本発明のノニオン界面活性剤水溶液及びイオ
ン性界面活性剤の水溶液と更に場合によっては含フツ素
界面活性剤を表1のごとく添加して塗布液とした。N'-ethylene bis-(vinylsulfonylacetamide), an aqueous solution of the nonionic surfactant of the present invention, an aqueous solution of an ionic surfactant, and optionally a fluorine-containing surfactant as shown in Table 1 are added to prepare a coating solution. And so.
14) バック塗布液の調製
40℃に加温されたl Qwt%ゼラチン水溶液1瞳に
増粘剤ポリエチレンスルフオン酸ソーダ水溶液、構造式
Cの染料水溶液(5X10−”モル/ l 50cc、
硬膜剤N、N’−エチレンビス−(ビニルスルフォニル
アセトアミド)水溶液、塗布助剤【−オクチルフェノキ
シエトキシエタンスルフオン酸ナトリウム水溶液とを加
えて塗布液とした。14) Preparation of back coating solution 1 Qwt% gelatin aqueous solution heated to 40°C 1 pupil, a thickener polyethylene sodium sulfonate aqueous solution, a dye aqueous solution of structural formula C (5 x 10-”mol/l 50cc,
A coating solution was prepared by adding a hardening agent N, an aqueous solution of N'-ethylenebis-(vinylsulfonylacetamide), and an aqueous solution of sodium octylphenoxyethoxyethanesulfonate as a coating aid.
構造式C
(5) バック層の最外層用塗布液の調製40℃に加
温された19wt%ゼラチン水溶液に増粘剤ポリエチレ
ンスルフオン酸ソーダ水溶液、マット剤ポリメチルメタ
クリレート微粒子(平均粒子サイズ4.2μm)、塗布
助剤t−オクチルフェノキシエトキシエトキシエタンス
ルフオン酸ナトリウム水溶液及び帯電防止剤としてポリ
エチレン系界面活性剤水溶液(ポリオキシルエチレンセ
チルエーテル)及び下記構造の含フツ素化合物の水溶液
とを添加して塗布液とした。Structural formula C (5) Preparation of coating liquid for outermost layer of back layer A 19 wt % gelatin aqueous solution heated to 40°C, a thickener polyethylene sodium sulfonate aqueous solution, and a matting agent polymethyl methacrylate fine particles (average particle size 4. 2 μm), an aqueous solution of sodium t-octylphenoxyethoxyethoxyethoxyethanesulfonate as a coating aid, an aqueous solution of a polyethylene surfactant (polyoxyl ethylene cetyl ether) as an antistatic agent, and an aqueous solution of a fluorine-containing compound having the following structure. It was made into a coating solution.
Cs FltSC)+ Kおよび
CsF + tsOJ (CJt) (CllzCHg
O−h〕−1!(6)塗布試料の作成
前述のバック塗布液をバック層の最外層塗布液とともに
ポリエチレンテレフタレート支持体の一方の側にゼラチ
ン塗布14 g/rdとなるように塗布した。これに続
いて支持体の反対の側に(2)で述べた赤外増悪色素入
りの乳剤塗布液とこれ用の最外層塗布液とを塗布銀量が
3.5g/rrrとなるように塗布した。Cs FltSC) + K and CsF + tsOJ (CJt) (CllzCHg
O-h〕-1! (6) Preparation of coating sample The above-mentioned back coating solution and the outermost layer coating solution of the back layer were coated on one side of a polyethylene terephthalate support at a gelatin coating rate of 14 g/rd. Subsequently, on the opposite side of the support, coat the emulsion coating solution containing the infrared-enhancing dye described in (2) and the outermost coating solution for this so that the coated silver amount is 3.5 g/rrr. did.
得られた試料フィルムを後述する方法で、それぞれコン
タクト写真性、レーザースキャナ一部分と自動現像機部
分に使用されるウレタンローラーに対するスタチックマ
ーク、同様にステンレス部分に対する機械搬送性テスト
および現像ムラテストを行なった。The obtained sample films were tested for contact photography, static marks on the urethane rollers used in the laser scanner section and automatic processor section, mechanical conveyance tests on the stainless steel sections, and development unevenness tests using the methods described below. .
現像液及び定着液の組成は次の通りである。The compositions of the developer and fixer are as follows.
〈現像液〉
水酸化カリウム 17g亜硫酸ナト
リウム 60gジエチレントリアミ
ン五酢酸 2g炭酸カリ
5gホウ酸
3gヒドロキノン 25gジエ
チレングリコール 12g4−ヒドロキシ
メチル−4−メチル 1.65g=1−フェニルー3−
ピラゾリドン
5−メチルベンゾトリアゾール 0.6g酢酸
1.8 g
臭化カリウム 2g水でII
lとする(PH10,15に二周整する)。<Developer> Potassium hydroxide 17g Sodium sulfite 60g Diethylenetriaminepentaacetic acid 2g Potassium carbonate
5g boric acid
3g hydroquinone 25g diethylene glycol 12g 4-hydroxymethyl-4-methyl 1.65g = 1-phenyl-3-
Pyrazolidone 5-methylbenzotriazole 0.6g Acetic acid
1.8 g potassium bromide II in 2 g water
1 (adjust the pH twice to 10 and 15).
〈定着液〉
チオ硫酸アンモニウム 140g亜硫酸ナト
リウム 15gエチレンジアミン四
酢酸・ 25■二ナトリウム・三水塩
水酸化ナトリウム 6g水で11
とする(酢酸pH4,95に調整する)。<Fixer> Ammonium thiosulfate 140g Sodium sulfite 15g Ethylenediaminetetraacetic acid 25 ■ Disodium trihydrate Sodium hydroxide 6g Water 11
(adjust to pH 4.95 with acetic acid).
現像工程は以下の通りである。The development process is as follows.
処理温度、時間
現像 35℃X11.5秒
定着 35℃X12.5秒
水洗 20℃×7.5秒
乾燥 60℃
Dry to Dry処理時間 60秒(7
) スタチックマークの評価
未露光の試料を25℃、10χR1+で2時間調湿した
後、同一空調条件の暗室中において、試料を、対素材に
対してそのスタチックマークがどのようになるかを調べ
るべくウレタンゴムローラーで摩擦した後、前述の方法
で現像処理した。Processing temperature and time Development: 35°C x 11.5 seconds Fixing: 35°C x 12.5 seconds Washing: 20°C x 7.5 seconds Drying: 60°C Dry to Dry processing time: 60 seconds (7
) Static mark evaluation After conditioning an unexposed sample at 25°C and 10χR1+ for 2 hours, evaluate the static mark on the sample against the other material in a dark room under the same air conditioning conditions. After rubbing it with a urethane rubber roller for examination, it was developed using the method described above.
そのスタチックマーク発生度の評価は以下の4段階に分
けて行った。The degree of occurrence of static marks was evaluated in the following four stages.
A:スタチックマークの発生が全く認められずB:
〃 少し認められるC: I
かなり認められる
D: 〃 はぼ全面に認められる
(8) コンタクト写真性の評価は以下の方法で行っ
た。A: No static marks were observed at all B:
〃 Somewhat acceptable C: I
Fairly observed D: 〃 Observed on almost the entire surface (8) Contact photographic properties were evaluated by the following method.
試料フィルム4 am X 4 c!mを25℃、70
%相対湿度で3時間調湿し、試料の感光層側とバック層
側の面を重ね合わせて同一条件下で調湿した袋中に入れ
て密封した。このようにして調整した試料の上に1 k
gのrIMを均一にかけ、25℃下、la間経時した後
、試料を現像しその写真性のムラを以下の4段階で評価
した。Sample film 4 am X 4 c! m at 25℃, 70
% relative humidity for 3 hours, the photosensitive layer side and the back layer side of the sample were placed one on top of the other, and the sample was placed in a bag that had been conditioned under the same conditions and sealed. 1k on top of the sample prepared in this way
After g of rIM was uniformly applied and left at 25° C. for la, the sample was developed and its photographic unevenness was evaluated on the following four scales.
A:画像のムラ発生が全く認められないB:
少し認められ。A: No unevenness of image is observed B:
A little recognition.
C: かなり認められる。C: Quite acceptable.
D= はぼ全面に認められる。D = is observed almost entirely.
(9)8Il械搬送性テストの評価は以下の方法で行な
った。(9) The evaluation of the 8Il machine transportability test was carried out in the following manner.
試料フィルム12(JX30dlを25℃、10%相対
湿度で3時間調湿し同温度、湿度下でウレタンゴムロー
ラー(直径3備)の間を通した後、水平面に対し45°
の角度を有したステンレス板の上をバック層側をステン
レス面に向けて自然落下させた。この時の試料フィルム
の平らなステンレス(130cm x 90cm )へ
の付着状態を以下の4段階で評価した。Sample film 12 (JX30dl was conditioned at 25°C and 10% relative humidity for 3 hours, passed between urethane rubber rollers (3 diameters) at the same temperature and humidity, and then rolled at 45° to the horizontal plane.
A stainless steel plate having an angle of . At this time, the state of adhesion of the sample film to the flat stainless steel (130 cm x 90 cm) was evaluated on the following four levels.
Aニステンレスへの付着は全くなくスムースに落下した
。There was no adhesion to the Ani stainless steel and it fell smoothly.
Bニステンレスへの付着が弱く認められ落下するのに少
し時間がかかった。The adhesion to B Ni stainless steel was weak and it took some time for it to fall off.
C;ステンレスへの付着が認められ落下するのにかなり
時間がかかった。C: Adhesion to stainless steel was observed and it took a considerable amount of time to fall off.
D=ニステンレスへ付着し落下しなかった。D = It adhered to stainless steel and did not fall.
0の 現像ムラ評価方法
試料フィルム35cmX25aiを下記現像・定着・水
洗・乾燥工程を通して処理し、次の4段階でその現像ム
ラを評価した。Evaluation method for development unevenness: A sample film of 35 cm x 25 ai was processed through the following development, fixing, water washing, and drying steps, and its development unevenness was evaluated in the following four stages.
A:画像のムラが全く認められない
B: 〃 少し認められる
C: 〃 かなり認められる
D: /F はぼ全面に認められる比較化合物(
a)
CHz COOCs H+ q
NaO3s CHCOOCs Hay(b)
第1表から明らかなように、本発明のノニオン界面活性
剤及びイオン性界面活性剤を併用した試料(1−2〜l
−12)は、相対湿度10%といった湿度条件下におい
てスタチックマークの発生が殆んど認められないすぐれ
た帯電防止効果を有するだけでなくコンタクト写真性、
機械搬送性共に良いものであり、かつ処理ムラの発生は
全く認められない。これに対して、コントロールでは、
帯電防止性、機械搬送性が著しく劣り、又処理ムラも悪
い。一方イオン性界面活性剤を用いない比較試料1−1
3〜1−14では処理ムラが著しく発生し、又比較試料
1−15〜1−16は、イオン性界面活性剤の溶解性が
0.005%以下であるためにやはり処理ムラが悪く本
発明に比べ大きく劣る。A: No unevenness in the image is observed B: Slightly observed C: Considerably observed D: /F Comparative compound observed almost over the entire surface (
a) CHz COOCs H+ q NaO3s CHCOOCs Hay (b) As is clear from Table 1, samples using the nonionic surfactant and ionic surfactant of the present invention in combination (1-2 to l
-12) not only has an excellent antistatic effect with almost no static marks observed under humidity conditions such as 10% relative humidity, but also has good contact photographic properties.
It has good mechanical transportability and no processing unevenness is observed. In contrast, the control
Antistatic properties and mechanical conveyance properties are significantly poor, and processing unevenness is also poor. On the other hand, comparative sample 1-1 without ionic surfactant
In samples 3 to 1-14, processing unevenness occurred significantly, and in comparison samples 1-15 to 1-16, the solubility of the ionic surfactant was 0.005% or less, so the processing unevenness was also poor and compared to the present invention. significantly inferior to.
また、本発明のフィルム試料780nnの波長を有する
半導体レーザーキャナーを用いて先便露光を行って前述
の方法で現像・定着を行い、更に水洗し所定の黒白像を
もつストリップスを得た。Further, a film sample of the present invention was subjected to preliminary exposure using a semiconductor laser scanner having a wavelength of 780 nn, developed and fixed by the method described above, and further washed with water to obtain a strip with a predetermined black and white image.
これらの写真性は良好な感度、階調を示し、カブリも少
なく優れたものであった。The photographic properties of these were excellent, showing good sensitivity and gradation, and little fog.
特許出願人 富士写真フィルム株式会社手続補正書
昭和62年2月ly日
2、発明の名称 tii像形成方法
3、補正をする者
事件との関係 特許出願人任 所 神奈
川県南足柄市中沼210番地4、補正の対象 明細書
の「発明の詳細な説明」の欄
5、補正の内容
明細書の「発明の詳細な説明」の項の記載を下記の通シ
補正する。Patent applicant: Fuji Photo Film Co., Ltd. Procedural amendment dated February 1, 1986, 2, Title of the invention: tii image forming method 3, Relationship with the person making the amendment Case: Patent applicant: 210-4 Nakanuma, Minamiashigara City, Kanagawa Prefecture , Subject of amendment The description in column 5 of "Detailed Description of the Invention" of the specification and the section of "Detailed Description of the Invention" of the description of contents of the amendment will be amended as follows.
1)第2頁2行目の 「処理ムラ」を 「現像ムラ」 と補正する。1) Page 2, 2nd line "Uneven processing" "Uneven development" and correct it.
2) lX7頁73行目の 「原図」を 「原因」 と補正する。2) Page 7, line 73 "Original drawing" "Cause" and correct it.
3)第10頁μつ目の構造式を 「 」 と補正する。3) The μth structural formula on page 10 " ” and correct it.
4)第1!頁10行目の 「エリア法、」を 「エリア法)」 と補正する。4) First! page 10th line "Area method," "Area method)" and correct it.
5)第30頁λ行目の 「0.024乞 「o、oor」 と補正する。5) Page 30, line λ "0.024 beg "o, oor" and correct it.
6)第30頁3行目の 「o、oコ」を r/J と補正する。6) Page 30, line 3 "o, o ko" r/J and correct it.
7)第3/頁3からμ行目の
「カルボン酸、塩スルホン酸、塩リン酸、塩硫酸エステ
ル塩、」を
「カルボン酸塩、スルホン酸塩、リン酸塩、硫酸エステ
ル塩、」
と補正する。7) In the μth line from page 3, change "carboxylic acid, salt sulfonic acid, salt phosphoric acid, salt sulfate ester salt," to "carboxylate, sulfonate, phosphate, sulfate ester salt," to correct.
「アルカリ土類金属」 と補正する。"Alkaline earth metals" and correct it.
9)第3/頁/j行目の 「しているが好ましい。」を 「していることが好ましい。」 と補正する。9) 3rd/page/line j "It's good to do it." “It is preferable to do so.” and correct it.
1o)第33頁の構造式I[−/jを ′r
C3H7
CaF1ySO2N+cH2CH20蓋CH21SO4
Na Jと補正する。1o) Structural formula I[-/j on page 33
C3H7 CaF1ySO2N+cH2CH20 lid CH21SO4
Correct with Na J.
11)第34c頁を別紙と補正する。11) Correct page 34c with a separate sheet.
12)第≠/頁下から1行目の 「ナキストラン」 を削除する。12) No.≠/1st line from the bottom of the page "Nakistran" Delete.
13)第μj頁/1行目の
「ブロムハイドロキノン」ヲ
「ブロムハイドロキノン、コ、3−ジブロムハイドロキ
ノン」
と補正する。13) Correct "bromohydroquinone" on page μj/line 1 to "bromohydroquinone, 3-dibromohydroquinone".
14)第Vを頁7行目の 「グリジン」を 「グリシン」 と補正する。14) Section V on page 7 line "Glysine" "glycine" and correct it.
15)第≠r頁/2行目の 「メソン」を 「メイソン」 と補正する。15) Page ≠ r/2nd line "Meson" "Mason" and correct it.
16)第Vを頁73行目の 「プロセシン」を 「プロセシング」 と補正する。16) Section V on page 73 "Processin" "Processing" and correct it.
17)第弘り頁j行目の 「1oo0czJを 「100 ℃コ と補正する。17) Line j of the first page “1oo0czJ "100℃ and correct it.
18)第jO頁!から6行目の 「あるいはそれらの導体」を 「グルコン酸あるいはそれらの誘導体」と補正する。18) No. jO page! 6th line from "or their conductors" Correct to "gluconic acid or derivatives thereof."
19)第!ダ頁lダ行目の 「こうする」を 「こうする」 と補正する。19) No. 19) page 1, row 1 “Do this” "do this" and correct it.
20)第!を頁3行目の 「化合物」の後K 「、」 を挿入する。20) No. 20! on the 3rd line of the page K after “compound” "," Insert.
21)@t7頁り行目の 「安定度」の後に 「定数」 を挿入する。21) @t7th page line After "stability" "constant" Insert.
22)第!り頁/j行目の 「ローラ」を 「ローラー」 と補正する。22) No. 22) page/jth line "Lola" "roller" and correct it.
23)第to¥(//100 「されるものである。」を 「され得る。」 と補正する。23) No. to ¥ (//100 “It is what is done.” "It can be done." and correct it.
24)第43頁下からr行目の 「エチレン」を 「スチレン」 と補正する。24) Page 43, line r from the bottom "Ethylene" "styrene" and correct it.
25)第tダ頁3行目の 「エチレン」を 「スチレン」 と補正する。25) 3rd line of page t "Ethylene" "styrene" and correct it.
26)第t4c頁!からt行目の
rN、N’−エチレンビス−(ビニルスルフォニルアセ
トアミド)Jt−
「/、3−ビス(ビニルスルフォニル)−プロパトルー
コ」
と補正する。26) Page t4c! rN, N'-ethylenebis-(vinylsulfonylacetamide)Jt- "/, 3-bis(vinylsulfonyl)-propatruco" from the tth line.
27)第6≠頁7行目の 「フェノキシ」の後に 「エトキシ」 を挿入する。27) 6th ≠ page 7th line After "Phenoxy" "Ethoxy" Insert.
28)第6弘頁下から7行目の 「エチレン」を 「スチレン」 と補正する。28) 7th line from the bottom of page 6 "Ethylene" "styrene" and correct it.
29)第z6頁lり行目の [to、lrJを [10,3zJ と補正する。29) Page z6, line 1 [to, lrJ [10,3zJ and correct it.
3o)第70頁/行目の 「下記」を 「前記」 と補正する。3o) Page 70/line "Below" "Said" and correct it.
31)第72頁下から7行目の 「処理」を 「現像」 と補正する。31) Page 72, line 7 from the bottom "Processing" "developing" and correct it.
32)第7−真下から≠行目の 「処理」を 「現像」 と補正する。32) 7th - ≠ line from the bottom "Processing" "developing" and correct it.
33)第72頁下から2行目の 「処理」を 「現像」 と補正する。33) Page 72, second line from the bottom "Processing" "developing" and correct it.
34)第73頁lから一行目の 「処理」を 「現像」 と補正する。34) 1st line from page 73 "Processing" "developing" and correct it.
本発明のノニオン界面活性剤及びイオン性界面活性剤の
添加量は写真感光材料のl〜コ000ダ/m”が好まし
く、更には、3〜!00II+17/?FL2がより好
ましく、!〜J 00 Q / @ 2が特に好ましい
。The amount of the nonionic surfactant and ionic surfactant of the present invention added is preferably 1~000 Da/m'' of the photographic light-sensitive material, more preferably 3~!00II+17/?FL2, !~J 00 Q/@2 is particularly preferred.
又、これらの界面活性剤は各々単独でもよいしコ種以上
を混合して用いてもよい。Further, each of these surfactants may be used alone or a mixture of two or more types may be used.
本発明のノニオン界面活性剤及びイオン性界面活性剤の
添加場所は写真感光材料のハロゲン化銀乳剤側の少なく
とも7層である。The nonionic surfactant and ionic surfactant of the present invention are added to at least seven layers on the silver halide emulsion side of the photographic light-sensitive material.
Claims (1)
剤層を少なくとも一層有するレーザースキャナー用ハロ
ゲン化銀写真感光材料を現像・定着して画像形成する方
法において、該ハロゲン化銀写真感光材料の乳剤層のあ
る側の少なくとも1層に、少なくとも1種のノニオン界
面活性剤と現像液に対する溶解度が0.005重量%以
上(30℃)でかつその表面張力が45ダイン/cm以
下(1重量%、水溶液、30℃)を有するイオン性界面
活性剤を少なくとも1種含有しかつ現像時間が15秒以
内で処理されることを特徴とする画像形成方法。In a method for forming an image by developing and fixing a silver halide photographic material for laser scanners having at least one infrared spectral sensitized silver halide emulsion layer on one side of a support, the silver halide photographic material At least one layer on the emulsion layer side of the material contains at least one nonionic surfactant, which has a solubility in a developer of 0.005% by weight or more (30°C) and a surface tension of 45 dynes/cm or less (1 % by weight, aqueous solution, 30° C.), and the image forming method is characterized in that the image forming method is processed in a developing time of 15 seconds or less.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29588386A JPS63148257A (en) | 1986-12-12 | 1986-12-12 | Image forming method |
US07/338,343 US5028516A (en) | 1986-12-04 | 1989-03-27 | Method of forming an image comprising rapidly developing an infrared sensitized photographic material comprising surfactants |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29588386A JPS63148257A (en) | 1986-12-12 | 1986-12-12 | Image forming method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63148257A true JPS63148257A (en) | 1988-06-21 |
Family
ID=17826406
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP29588386A Pending JPS63148257A (en) | 1986-12-04 | 1986-12-12 | Image forming method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63148257A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0279832A (en) * | 1988-09-16 | 1990-03-20 | Konica Corp | Method for processing silver halide photographic sensitive material with improved prevention against processing stain |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5329715A (en) * | 1976-08-31 | 1978-03-20 | Fuji Photo Film Co Ltd | Photographic light sensitive material |
JPS6076742A (en) * | 1983-10-03 | 1985-05-01 | Fuji Photo Film Co Ltd | Photosensitive silver halide material |
JPS6173146A (en) * | 1984-09-18 | 1986-04-15 | Konishiroku Photo Ind Co Ltd | Silver halide photographic sensitive material |
JPS61174540A (en) * | 1985-01-29 | 1986-08-06 | Fuji Photo Film Co Ltd | Sliver halide photographic sensitive material |
JPS61245152A (en) * | 1985-04-22 | 1986-10-31 | Oriental Shashin Kogyo Kk | Silver halide photographic sensitive material for semiconductor laser beams |
JPH0327099A (en) * | 1989-06-23 | 1991-02-05 | Nec Corp | Voice synchronization system |
-
1986
- 1986-12-12 JP JP29588386A patent/JPS63148257A/en active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5329715A (en) * | 1976-08-31 | 1978-03-20 | Fuji Photo Film Co Ltd | Photographic light sensitive material |
JPS6076742A (en) * | 1983-10-03 | 1985-05-01 | Fuji Photo Film Co Ltd | Photosensitive silver halide material |
JPS6173146A (en) * | 1984-09-18 | 1986-04-15 | Konishiroku Photo Ind Co Ltd | Silver halide photographic sensitive material |
JPS61174540A (en) * | 1985-01-29 | 1986-08-06 | Fuji Photo Film Co Ltd | Sliver halide photographic sensitive material |
JPS61245152A (en) * | 1985-04-22 | 1986-10-31 | Oriental Shashin Kogyo Kk | Silver halide photographic sensitive material for semiconductor laser beams |
JPH0327099A (en) * | 1989-06-23 | 1991-02-05 | Nec Corp | Voice synchronization system |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0279832A (en) * | 1988-09-16 | 1990-03-20 | Konica Corp | Method for processing silver halide photographic sensitive material with improved prevention against processing stain |
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