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JPS63121829A - Harmonic generating device - Google Patents

Harmonic generating device

Info

Publication number
JPS63121829A
JPS63121829A JP26801186A JP26801186A JPS63121829A JP S63121829 A JPS63121829 A JP S63121829A JP 26801186 A JP26801186 A JP 26801186A JP 26801186 A JP26801186 A JP 26801186A JP S63121829 A JPS63121829 A JP S63121829A
Authority
JP
Japan
Prior art keywords
nonlinear optical
harmonic
resonator
laser beam
mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP26801186A
Other languages
Japanese (ja)
Inventor
Nobuo Nakayama
中山 信男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP26801186A priority Critical patent/JPS63121829A/en
Publication of JPS63121829A publication Critical patent/JPS63121829A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35Non-linear optics
    • G02F1/37Non-linear optics for second-harmonic generation
    • G02F1/377Non-linear optics for second-harmonic generation in an optical waveguide structure

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)

Abstract

PURPOSE:To use a small-sized, low-output semiconductor laser, etc., and the exciting light of continuous oscillation and to obtain high conversion efficiency by using a resonator and a nonlinear optical material. CONSTITUTION:Nonlinear optical crystal 1, mirrors 2 and 3 which constitute the resonator, and an optical waveguide 4 are united. The length L of the nonlinear optical crystal 1 is so designed that incident laser beam 5 generates a standing wave in the optical waveguide and nonlinear optical crystal 1. A mirror M12 constituting an optical resonator has a >=99.8% reflection factor to laser beam 5 and a >=99.8% reflection factor at a frequency 6 twice as high as that of the laser beam, but a mirror [M2]3 has >=99% transmissivity to the frequency 6 twice as high as that of the laser beam. Consequently, beam from the semiconductor laser is used as the exciting light to obtain >=30% high conversion efficiency to a 2nd harmonic.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は高調波発生装置に関し、特に半導体レーザーと
共振器および非線形光学物質からなる高調波発生装置に
関する。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a harmonic generator, and more particularly to a harmonic generator comprising a semiconductor laser, a resonator, and a nonlinear optical material.

従来の技術 非線形光学結晶にレーザ光を照射すると非線形光学効果
によって、光周波数が基本波の整数倍の高調波が得られ
る。このうち、基本波の2倍の周波数のものが第2高調
波と呼ばれている。基本波から高調波への変換効率は入
射光強度に比例して大きくなるので通常、パルス波を利
用して光強度を高めて変換効率を向上させる方式が一般
に採用されている。
2. Description of the Related Art When a nonlinear optical crystal is irradiated with laser light, harmonics whose optical frequency is an integral multiple of the fundamental wave are obtained due to the nonlinear optical effect. Among these waves, those with twice the frequency of the fundamental wave are called second harmonics. Since the conversion efficiency from a fundamental wave to a harmonic wave increases in proportion to the intensity of incident light, a method is generally adopted in which a pulse wave is used to increase the light intensity and improve the conversion efficiency.

発明が解決しようとする問題点 しかしながら、励起光として半導体レーザーを用いる場
合には出力10〜30mWと低く、且つ連続発振なので
、半導体レーザー光を励起光として非線形光学物質に照
射する場合には高調波への変換効率は極めて低いという
欠点があった。
Problems to be Solved by the Invention However, when a semiconductor laser is used as excitation light, the output is low at 10 to 30 mW, and it is a continuous wave, so when a nonlinear optical material is irradiated with semiconductor laser light as excitation light, harmonics are generated. The drawback was that the conversion efficiency was extremely low.

本発明は上記のような事情に鑑みなされたもので、その
目的は半導体レーザーの如く小型で低出力、連続発振の
励起光を使用して高変換効率の高調波発生装置を提供す
るものである。
The present invention was made in view of the above-mentioned circumstances, and its purpose is to provide a harmonic generation device with high conversion efficiency using compact, low-output, continuous wave pumping light such as a semiconductor laser. .

問題点を解決するための手段 上記の問題点を解決するためになされた本発明は高調波
の変換効率が入射光強度に比例して大きくなることを利
用して、非線形光学物質を光共振器の中に挿入すること
によって高変換効率を得るものであり、さらに高調波発
生効率を高める目的で、温度、電界、磁界を外部から制
御することによって、より完全な位相整合を行って高効
率高調波発生装置である。
Means for Solving the Problems The present invention, which was made to solve the above problems, utilizes the fact that harmonic conversion efficiency increases in proportion to the intensity of incident light to convert nonlinear optical materials into optical resonators. In order to further increase the harmonic generation efficiency, temperature, electric field, and magnetic field are controlled externally to achieve more complete phase matching and high efficiency harmonic generation. It is a wave generator.

作用 非線形光学係数が大きく、且つ光学的損失の少ない材料
を光共振器の中に挿入し、位相整合をさせながら発振さ
せる条件を満たしてやると入力した基本波が高効率で高
調波に変換される。
By inserting a material with a large operational nonlinear optical coefficient and low optical loss into an optical resonator, and satisfying the conditions for oscillation with phase matching, the input fundamental wave will be converted into harmonics with high efficiency. .

実施例 以下本発明の一実施例の高調波発生装置について、図面
を参照しながら説明する。
Embodiment Hereinafter, a harmonic generator according to an embodiment of the present invention will be described with reference to the drawings.

〔実施例1〕 第1図は本発明における高調波発生装置の構成図を示す
。図中1は非線形光学結晶を示す。図中には示していな
いがこの結晶の両端面には入射レーザー光5に対して反
射防止膜を被服しである。
[Embodiment 1] FIG. 1 shows a configuration diagram of a harmonic generator according to the present invention. In the figure, 1 indicates a nonlinear optical crystal. Although not shown in the figure, both end faces of this crystal are coated with an antireflection film against the incident laser beam 5.

本実施例は非線形光学結晶1と共振器を構成するミラー
2.3ならびに、光導波路4が一体化された高調波発生
装置を示す。図中、Lは非線形光学結晶1の長さを示す
が、この長さしは入射レーザー光5が光導波路および非
線形光学結晶1内で定在波を形成するように設計されて
いる。光共振器を構成している、ミラー(Ml )2は
レーザー光(基本波)に対し99.8%以上の反射率を
有し、レーザー光(基本波)の2倍の周波数(第2高調
波)6に対しても99.8%以上の反射率を有するのに
対して、ミラー(MZ)3はレーザー光(基本波)のと
きは99.8%以上の反射率を有するがレーザー光(基
本波)の2倍の周波数(第2高調波)6に対し、98%
以上の透過率をもっている。
This embodiment shows a harmonic generation device in which a nonlinear optical crystal 1, a mirror 2.3 constituting a resonator, and an optical waveguide 4 are integrated. In the figure, L indicates the length of the nonlinear optical crystal 1, and this length is designed so that the incident laser beam 5 forms a standing wave within the optical waveguide and the nonlinear optical crystal 1. The mirror (Ml) 2 that constitutes the optical resonator has a reflectance of 99.8% or more for laser light (fundamental wave), and has a frequency (second harmonic) twice that of the laser light (fundamental wave). Mirror (MZ) 3 has a reflectance of 99.8% or more for laser light (fundamental wave), but it has a reflectance of 99.8% or more for laser light (fundamental wave). (fundamental wave) twice the frequency (second harmonic) 6, 98%
It has a transmittance of more than

ここでは非線形光学結晶1として、BazNaNbsO
+ s結晶を使用し、非線形係数d3□を利用して結晶
学的a軸に沿って光導波路4が形成されるように設計さ
れている。また、この非線形光学結晶1は位相整合温度
に保つように温度制御されている。
Here, BazNaNbsO is used as the nonlinear optical crystal 1.
+s crystal is used, and the optical waveguide 4 is designed to be formed along the crystallographic a-axis by utilizing the nonlinear coefficient d3□. Further, the temperature of this nonlinear optical crystal 1 is controlled to keep it at a phase matching temperature.

上記の構造の高調波発生装置において、レーザー光5を
光導波路4にもっとも適確に入るように調整しながらレ
ーザー光(基本波)5を光導波路4内に入れる。光導波
路内に入ったレーザー光(基本波)5はミラー(MZ)
3で反射され、光導波路内を逆進して、ミラー(Ml 
)2で反射され、光導波路4内で定在波を形成する。こ
れに対して先導波路4内(一部分は非線形光学結晶1内
)で発生した第2高調波6はミラー(MZ )3を透過
して外部へ第2高調波6として放射される。上記高調波
発生装置のレーザー光(基本波)5から第2高調波6へ
の変換効率(η)は出力20mW、波長0.78μmの
半導体レーザーを用いた場合で30%以上の高変換効率
が得られた。必要に応じて、ブルースタ板を使用するこ
ともある。
In the harmonic generator having the above structure, the laser beam (fundamental wave) 5 is introduced into the optical waveguide 4 while being adjusted so that the laser beam 5 enters the optical waveguide 4 most accurately. The laser light (fundamental wave) 5 that entered the optical waveguide is a mirror (MZ)
3, travels backwards in the optical waveguide, and is reflected by the mirror (Ml
) 2 and forms a standing wave within the optical waveguide 4. On the other hand, the second harmonic 6 generated within the leading waveguide 4 (partly within the nonlinear optical crystal 1) is transmitted through the mirror (MZ) 3 and radiated to the outside as the second harmonic 6. The conversion efficiency (η) of the above harmonic generator from the laser beam (fundamental wave) 5 to the second harmonic 6 is as high as 30% or more when using a semiconductor laser with an output of 20 mW and a wavelength of 0.78 μm. Obtained. Brewster boards may be used if necessary.

〔実施例2〕 第2図は本発明における高調波発生装置の構成図を示す
。図中7は非線形光学薄膜(薄膜を形成している基板は
図示せず)、8は先導波路、9は非線形光学薄膜7に電
界を加えるための電極、10は超音波発生用トランスジ
ューサー、1)は吸音材、12は温度制御用オーブン、
13は半導体レーザー、工4は半導体レーザーの活性層
でレーザー光の導波路にもなっており、ここから放射さ
れた、レーザー光(基本波)17は効率よく光導波路8
に導かれる。16は共振器を構成しているミラー〔M2
〕で、これはレーザー光(基本波)(ν)17に対して
99.8%以上の反射率を有し、レーザー光17が光導
路8や非線形光学薄膜7を通過する際に発生する。高調
波(2ν)18に対しては98%以上の透過率を有して
いる。15はミラー[:MZ ) 16とともに共振器
を構成しているミラー〔M1〕でレーザー光(ν)17
と高調波(2ν)18に対してともに99,8%以上の
反射率を有している。19は必要に応じて採用するフィ
ルターで、高調波(2ν)18のみを選択的に透過する
。上記、電極9、超音波用トランスジューサー10、温
度制御用オーブン等は必要に応じて非線形光学薄膜7や
光導波路8の位相整合(屈折率整合)を行なって基本波
から高調波への変換効率を向上させる目的で使用される
[Embodiment 2] FIG. 2 shows a configuration diagram of a harmonic generator according to the present invention. In the figure, 7 is a nonlinear optical thin film (the substrate forming the thin film is not shown), 8 is a leading waveguide, 9 is an electrode for applying an electric field to the nonlinear optical thin film 7, 10 is a transducer for generating ultrasonic waves, 1 ) is a sound absorbing material, 12 is a temperature control oven,
Reference numeral 13 indicates a semiconductor laser, and reference numeral 4 indicates an active layer of the semiconductor laser, which also serves as a waveguide for laser light.
guided by. 16 is a mirror [M2
], this has a reflectance of 99.8% or more for the laser beam (fundamental wave) (ν) 17, and is generated when the laser beam 17 passes through the optical guide 8 or the nonlinear optical thin film 7. It has a transmittance of 98% or more for harmonics (2ν)18. 15 is a mirror [:MZ) 16 together with a mirror [M1] which forms a resonator, and the laser beam (ν) 17
and harmonic (2ν) 18, both have reflectances of 99.8% or more. Reference numeral 19 denotes a filter adopted as necessary, which selectively transmits only the harmonic (2ν) 18. The electrode 9, ultrasonic transducer 10, temperature control oven, etc. are phase matched (refractive index matched) of the nonlinear optical thin film 7 and the optical waveguide 8 as necessary to improve conversion efficiency from fundamental waves to harmonics. used for the purpose of improving

上記諸条件を最適化することによって、基本波から高調
波への変換効率は15%以上の高効率が達成されている
By optimizing the above conditions, a high conversion efficiency of 15% or more from the fundamental wave to harmonics has been achieved.

〔実施例3〕 第3図は本発明における高調波発生装置の構成図を示す
。図中20は非線形光学結晶、21は先導波路、22は
半導体レーザー、23は半導体レーザーの活性層(導波
路)、24は非線形光学結晶20と半導体レーザー22
との接合面で、この接合面では非線形光学結晶の光導波
路21と半導体レーザーの導波路23が結合効率が最大
になるような位置関係で接合されている。25はミラー
CM+)でこれはレーザー光くν)27と高調波(2ν
)28ともに99.8%以上の反射率を有している。2
6はミラー〔M2〕でこれはレーザー光(ν)27に対
して99.8%以上の反射率を有するが、高調波(2ν
)28に対しては98%以上の透過率を示す。半導体レ
ーザーとして、出力15mW、波長λ−0,78μmを
用いて連続発振で6mWの安定した第2高調波λ−0,
39μmを得た。ここでは非線形光学結晶としてKNb
O3を採用した。導波路内の光をより高効率で利用する
場合には上記共振器のミラー25.26をグレーティン
グにする。
[Embodiment 3] FIG. 3 shows a configuration diagram of a harmonic generator according to the present invention. In the figure, 20 is a nonlinear optical crystal, 21 is a leading waveguide, 22 is a semiconductor laser, 23 is an active layer (waveguide) of the semiconductor laser, and 24 is a nonlinear optical crystal 20 and a semiconductor laser 22
At this junction surface, the optical waveguide 21 of the nonlinear optical crystal and the waveguide 23 of the semiconductor laser are joined in a positional relationship that maximizes the coupling efficiency. 25 is a mirror CM+) which is a laser beam ν) 27 and harmonics (2ν
)28 both have a reflectance of 99.8% or more. 2
6 is a mirror [M2] which has a reflectance of 99.8% or more for laser light (ν) 27, but harmonics (2ν)
)28, it shows a transmittance of 98% or more. As a semiconductor laser, output power 15 mW, wavelength λ-0, using 78 μm, stable second harmonic λ-0, 6 mW in continuous oscillation.
39 μm was obtained. Here, KNb is used as a nonlinear optical crystal.
O3 was adopted. When using the light within the waveguide with higher efficiency, the mirrors 25 and 26 of the resonator are replaced with gratings.

発明の効果 本発明は光共振器と非線形光学物質および半導体レーザ
ーを組合せた構造を基本とし、これに位相整合し易くす
る目的で温度制御、電界制御、超音波が加えられるよう
に構成されている。この結果、従来極めて困難と考えら
れていた、半導体レーザー(λ−0.78μm)を励起
光として第2高調波(λ−0,39μm)への変換効率
30%以上の高効率を得ることが出来た。
Effects of the Invention The present invention is based on a structure that combines an optical resonator, a nonlinear optical material, and a semiconductor laser, and is configured so that temperature control, electric field control, and ultrasonic waves are applied to this for the purpose of facilitating phase matching. . As a result, it has become possible to obtain a high conversion efficiency of 30% or more from a semiconductor laser (λ-0.78 μm) to the second harmonic (λ-0.39 μm) using excitation light, which was previously thought to be extremely difficult. done.

半導体レーザーでは困難と考えられていたλ−0,4μ
mのレーザー光を容易に得ることが出来た。
λ-0.4μ, which was thought to be difficult with semiconductor lasers
It was possible to easily obtain a laser beam of m.

応用としては例えば光記録に応用すれば一挙に4倍の高
密度化が可能となるし、さらには、サブミクロンホトリ
ソ工程への適用など、その応用範囲は広い。
As for applications, for example, if applied to optical recording, it becomes possible to increase the density four times at once, and furthermore, the range of applications is wide, such as application to submicron photolithography processes.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図、第2図、第3図は本発明の高調波発生装置の実
施状態を示す構成図である。 1・・・・・・非線形光学結晶、2・・・・・・ミラー
〔M、〕3・・・・・・ミラー(MZ ) 、4・・・
・・・光導波路、5・・・・・・レーザー光、6・・・
・・・第2高調波。
FIG. 1, FIG. 2, and FIG. 3 are configuration diagrams showing the implementation state of the harmonic generator of the present invention. 1...Nonlinear optical crystal, 2...Mirror [M,] 3...Mirror (MZ), 4...
... Optical waveguide, 5 ... Laser light, 6 ...
...Second harmonic.

Claims (10)

【特許請求の範囲】[Claims] (1)共振器と非線形光学物質とを用いたことを特徴と
する高調波発生装置。
(1) A harmonic generation device characterized by using a resonator and a nonlinear optical material.
(2)共振器と非線形光学物質を一体化したことを特徴
とする特許請求の範囲第(1)項記載の高調波発生装置
(2) The harmonic generation device according to claim (1), characterized in that a resonator and a nonlinear optical material are integrated.
(3)半導体レーザーと共振器と非線形光学物質を組み
合せたことを特徴とする特許請求の範囲第(1)項また
は第(2)項のいずれかに記載の高調波発生装置。
(3) The harmonic generation device according to claim 1 or 2, which is a combination of a semiconductor laser, a resonator, and a nonlinear optical material.
(4)非線形光学物質に光導波路を形成させたことを特
徴とする特許請求の範囲第(1)項、第(2)項または
第(3)項のいずれかに記載の高調波発生装置。
(4) A harmonic generation device according to any one of claims (1), (2), and (3), characterized in that an optical waveguide is formed in a nonlinear optical material.
(5)非線形光学物質に電界を加えることを特徴とする
特許請求の範囲第(1)項、第(2)項または第(3)
項のいずれかに記載の高調波発生装置。
(5) Claims (1), (2), or (3) characterized in that an electric field is applied to a nonlinear optical material.
The harmonic generator according to any one of paragraphs.
(6)非線形光学物質を温度制御することを特徴とする
特許請求の範囲第(1)項、第(2)項または第(3)
項のいずれかに記載の高調波発生装置。
(6) Claims (1), (2), or (3) characterized in that the temperature of the nonlinear optical material is controlled.
The harmonic generator according to any one of paragraphs.
(7)非線形光学物質に磁界を加えることを特徴とする
特許請求の範囲第(1)項、第(2)項または第(3)
項のいずれかに記載の高調波発生装置。
(7) Claims (1), (2), or (3) characterized in that a magnetic field is applied to a nonlinear optical material.
The harmonic generator according to any one of paragraphs.
(8)非線形光学物質として薄膜状のものを用いること
を特徴とする特許請求の範囲第(1)項、第(2)項ま
たは第(3)項のいずれかに記載の高調波発生装置。
(8) The harmonic generation device according to any one of claims (1), (2), and (3), characterized in that a thin film-like material is used as the nonlinear optical material.
(9)非線形光学物質に音波を加えることを特徴とする
特許請求の範囲第(1)項、第(2)項または第(3)
項のいずれかに記載の高調波発生装置。
(9) Claims (1), (2), or (3) characterized in that a sound wave is applied to a nonlinear optical material.
The harmonic generator according to any one of paragraphs.
(10)共振器のミラーをグレーティングにすることを
特徴とする特許請求の範囲第(1)項、第(2)項また
は第(3)項のいずれかに記載の高調波発生装置。
(10) A harmonic generation device according to any one of claims (1), (2), and (3), characterized in that the mirror of the resonator is a grating.
JP26801186A 1986-11-11 1986-11-11 Harmonic generating device Pending JPS63121829A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26801186A JPS63121829A (en) 1986-11-11 1986-11-11 Harmonic generating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26801186A JPS63121829A (en) 1986-11-11 1986-11-11 Harmonic generating device

Publications (1)

Publication Number Publication Date
JPS63121829A true JPS63121829A (en) 1988-05-25

Family

ID=17452665

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26801186A Pending JPS63121829A (en) 1986-11-11 1986-11-11 Harmonic generating device

Country Status (1)

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JP (1) JPS63121829A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0377988A2 (en) * 1989-01-13 1990-07-18 Kabushiki Kaisha Toshiba Wavelength converting optical device
US4959665A (en) * 1988-09-09 1990-09-25 Hitachi Koki Co., Ltd. Laser printer with harmonic wave separation of the beam
JPH03127034A (en) * 1989-10-13 1991-05-30 Fuji Photo Film Co Ltd Light wavelength converting device
US5082340A (en) * 1989-04-28 1992-01-21 Hamamatsu Photonics K. K. Wavelength converting device
JPH04107536A (en) * 1990-08-29 1992-04-09 Oki Electric Ind Co Ltd Second harmonic generation device
WO2005033791A1 (en) 2003-10-01 2005-04-14 Mitsubishi Denki Kabushiki Kaisha Wavelength conversion laser and image display
JP2007333040A (en) * 2006-06-14 2007-12-27 Mitsubishi Electric Corp Brake device for rotating machine
US8284806B2 (en) 2009-11-26 2012-10-09 Mitsubishi Electric Corporation Apparatus and method for manufacturing light source
JP2021034450A (en) * 2019-08-20 2021-03-01 日亜化学工業株式会社 Semiconductor laser device and manufacturing method thereof

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4959665A (en) * 1988-09-09 1990-09-25 Hitachi Koki Co., Ltd. Laser printer with harmonic wave separation of the beam
US5377291A (en) * 1989-01-13 1994-12-27 Kabushiki Kaisha Toshiba Wavelength converting optical device
EP0377988A2 (en) * 1989-01-13 1990-07-18 Kabushiki Kaisha Toshiba Wavelength converting optical device
US5082340A (en) * 1989-04-28 1992-01-21 Hamamatsu Photonics K. K. Wavelength converting device
JPH03127034A (en) * 1989-10-13 1991-05-30 Fuji Photo Film Co Ltd Light wavelength converting device
JP2685969B2 (en) * 1990-08-29 1997-12-08 沖電気工業株式会社 Second harmonic generator
JPH04107536A (en) * 1990-08-29 1992-04-09 Oki Electric Ind Co Ltd Second harmonic generation device
WO2005033791A1 (en) 2003-10-01 2005-04-14 Mitsubishi Denki Kabushiki Kaisha Wavelength conversion laser and image display
JPWO2005033791A1 (en) * 2003-10-01 2006-12-14 三菱電機株式会社 Wavelength conversion laser device and image display device
US7403549B2 (en) 2003-10-01 2008-07-22 Mitsubishi Denki Kabushiki Kaisha Wavelength conversion laser and image display
US7778291B2 (en) 2003-10-01 2010-08-17 Mitsubishi Denki Kabushiki Kaisha Wavelength converting laser device
JP4747841B2 (en) * 2003-10-01 2011-08-17 三菱電機株式会社 Wavelength conversion laser device and image display device
JP2007333040A (en) * 2006-06-14 2007-12-27 Mitsubishi Electric Corp Brake device for rotating machine
US8284806B2 (en) 2009-11-26 2012-10-09 Mitsubishi Electric Corporation Apparatus and method for manufacturing light source
JP2021034450A (en) * 2019-08-20 2021-03-01 日亜化学工業株式会社 Semiconductor laser device and manufacturing method thereof

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