JPS62294238A - Photosensitive composition - Google Patents
Photosensitive compositionInfo
- Publication number
- JPS62294238A JPS62294238A JP13774686A JP13774686A JPS62294238A JP S62294238 A JPS62294238 A JP S62294238A JP 13774686 A JP13774686 A JP 13774686A JP 13774686 A JP13774686 A JP 13774686A JP S62294238 A JPS62294238 A JP S62294238A
- Authority
- JP
- Japan
- Prior art keywords
- group
- present
- photosensitive composition
- photosensitive
- sensitizer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000203 mixture Substances 0.000 title claims description 27
- 229920000642 polymer Polymers 0.000 claims abstract description 18
- 125000005439 maleimidyl group Chemical group C1(C=CC(N1*)=O)=O 0.000 claims abstract description 11
- 150000001875 compounds Chemical class 0.000 claims description 13
- 125000000623 heterocyclic group Chemical group 0.000 claims description 9
- 125000003118 aryl group Chemical group 0.000 claims description 7
- 125000003107 substituted aryl group Chemical group 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims 1
- 230000035945 sensitivity Effects 0.000 abstract description 13
- 125000004432 carbon atom Chemical group C* 0.000 description 16
- 125000000217 alkyl group Chemical group 0.000 description 11
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- -1 benzothiazole Chemical class 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 9
- 239000000178 monomer Substances 0.000 description 8
- 125000001424 substituent group Chemical group 0.000 description 7
- 229920001577 copolymer Polymers 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- 125000003277 amino group Chemical group 0.000 description 5
- 229910052801 chlorine Inorganic materials 0.000 description 5
- 125000005843 halogen group Chemical group 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 229920002554 vinyl polymer Polymers 0.000 description 5
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 4
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 239000000049 pigment Substances 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 3
- 239000012965 benzophenone Substances 0.000 description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 3
- 229910052794 bromium Inorganic materials 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- RVABTWZCMKSODQ-UHFFFAOYSA-N 2,3-dimethylthioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=C(C)C(C)=C2 RVABTWZCMKSODQ-UHFFFAOYSA-N 0.000 description 2
- DVZCOQQFPCMIPO-UHFFFAOYSA-N 2-Methoxyxanthone Chemical compound C1=CC=C2C(=O)C3=CC(OC)=CC=C3OC2=C1 DVZCOQQFPCMIPO-UHFFFAOYSA-N 0.000 description 2
- 229910002012 Aerosil® Inorganic materials 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- WDECIBYCCFPHNR-UHFFFAOYSA-N chrysene Chemical compound C1=CC=CC2=CC=C3C4=CC=CC=C4C=CC3=C21 WDECIBYCCFPHNR-UHFFFAOYSA-N 0.000 description 2
- 238000006352 cycloaddition reaction Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 125000002950 monocyclic group Chemical group 0.000 description 2
- 150000002916 oxazoles Chemical class 0.000 description 2
- RDOWQLZANAYVLL-UHFFFAOYSA-N phenanthridine Chemical compound C1=CC=C2C3=CC=CC=C3C=NC2=C1 RDOWQLZANAYVLL-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 230000036211 photosensitivity Effects 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- XSCHRSMBECNVNS-UHFFFAOYSA-N quinoxaline Chemical compound N1=CC=NC2=CC=CC=C21 XSCHRSMBECNVNS-UHFFFAOYSA-N 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 150000003557 thiazoles Chemical class 0.000 description 2
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 2
- 150000003852 triazoles Chemical class 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- JNELGWHKGNBSMD-UHFFFAOYSA-N xanthone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3OC2=C1 JNELGWHKGNBSMD-UHFFFAOYSA-N 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- UYEDESPZQLZMCL-UHFFFAOYSA-N 1,2-dimethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=C(C)C(C)=CC=C3SC2=C1 UYEDESPZQLZMCL-UHFFFAOYSA-N 0.000 description 1
- FKASFBLJDCHBNZ-UHFFFAOYSA-N 1,3,4-oxadiazole Chemical compound C1=NN=CO1 FKASFBLJDCHBNZ-UHFFFAOYSA-N 0.000 description 1
- AIGNCQCMONAWOL-UHFFFAOYSA-N 1,3-benzoselenazole Chemical compound C1=CC=C2[se]C=NC2=C1 AIGNCQCMONAWOL-UHFFFAOYSA-N 0.000 description 1
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical compound C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 1
- FYFDQJRXFWGIBS-UHFFFAOYSA-N 1,4-dinitrobenzene Chemical compound [O-][N+](=O)C1=CC=C([N+]([O-])=O)C=C1 FYFDQJRXFWGIBS-UHFFFAOYSA-N 0.000 description 1
- CRGSUAQLKYRWDA-UHFFFAOYSA-N 1-[4-(dimethylamino)phenyl]-3-(4-methylphenyl)prop-2-en-1-one Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C=CC1=CC=C(C)C=C1 CRGSUAQLKYRWDA-UHFFFAOYSA-N 0.000 description 1
- LHENQXAPVKABON-UHFFFAOYSA-N 1-methoxypropan-1-ol Chemical compound CCC(O)OC LHENQXAPVKABON-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- SNTWKPAKVQFCCF-UHFFFAOYSA-N 2,3-dihydro-1h-triazole Chemical compound N1NC=CN1 SNTWKPAKVQFCCF-UHFFFAOYSA-N 0.000 description 1
- QWQNFXDYOCUEER-UHFFFAOYSA-N 2,3-ditert-butyl-4-methylphenol Chemical compound CC1=CC=C(O)C(C(C)(C)C)=C1C(C)(C)C QWQNFXDYOCUEER-UHFFFAOYSA-N 0.000 description 1
- KJGPMAHVCDFRBN-UHFFFAOYSA-N 2,6-dichloroanthracene-9,10-dione Chemical compound ClC1=CC=C2C(=O)C3=CC(Cl)=CC=C3C(=O)C2=C1 KJGPMAHVCDFRBN-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- MTFZCGPANOZASK-UHFFFAOYSA-N 2-(3,4-dimethyl-2,5-dioxopyrrol-1-yl)ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCN1C(=O)C(C)=C(C)C1=O MTFZCGPANOZASK-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- PTVAPTQIJMLNKJ-UHFFFAOYSA-N 2-bromo-10h-anthracen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Br)=CC=C3CC2=C1 PTVAPTQIJMLNKJ-UHFFFAOYSA-N 0.000 description 1
- RBPGISZOPGTNMV-UHFFFAOYSA-N 2-chlorofluoren-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3C2=C1 RBPGISZOPGTNMV-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- JHTIRPSWNPNDDC-UHFFFAOYSA-N 2-ethyl-10h-anthracen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3CC2=C1 JHTIRPSWNPNDDC-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- KXXOMIPLRDTZCC-UHFFFAOYSA-N 2-methylfluoren-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C2=C1 KXXOMIPLRDTZCC-UHFFFAOYSA-N 0.000 description 1
- UWHSVIYYROIHDN-UHFFFAOYSA-N 2-methylxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3OC2=C1 UWHSVIYYROIHDN-UHFFFAOYSA-N 0.000 description 1
- AJEAHBZZHSLIQP-UHFFFAOYSA-N 2-nitrofluoren-9-one Chemical compound C1=CC=C2C(=O)C3=CC([N+](=O)[O-])=CC=C3C2=C1 AJEAHBZZHSLIQP-UHFFFAOYSA-N 0.000 description 1
- ZTFYJIXFKGPCHV-UHFFFAOYSA-N 2-propan-2-ylnaphthalene-1-sulfonic acid Chemical compound C1=CC=CC2=C(S(O)(=O)=O)C(C(C)C)=CC=C21 ZTFYJIXFKGPCHV-UHFFFAOYSA-N 0.000 description 1
- KTALPKYXQZGAEG-UHFFFAOYSA-N 2-propan-2-ylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC=C3SC2=C1 KTALPKYXQZGAEG-UHFFFAOYSA-N 0.000 description 1
- IKEHOXWJQXIQAG-UHFFFAOYSA-N 2-tert-butyl-4-methylphenol Chemical compound CC1=CC=C(O)C(C(C)(C)C)=C1 IKEHOXWJQXIQAG-UHFFFAOYSA-N 0.000 description 1
- XOUQAVYLRNOXDO-UHFFFAOYSA-N 2-tert-butyl-5-methylphenol Chemical compound CC1=CC=C(C(C)(C)C)C(O)=C1 XOUQAVYLRNOXDO-UHFFFAOYSA-N 0.000 description 1
- YTPSFXZMJKMUJE-UHFFFAOYSA-N 2-tert-butylanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(C(C)(C)C)=CC=C3C(=O)C2=C1 YTPSFXZMJKMUJE-UHFFFAOYSA-N 0.000 description 1
- RBTBFTRPCNLSDE-UHFFFAOYSA-N 3,7-bis(dimethylamino)phenothiazin-5-ium Chemical compound C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 RBTBFTRPCNLSDE-UHFFFAOYSA-N 0.000 description 1
- CCTFMNIEFHGTDU-UHFFFAOYSA-N 3-methoxypropyl acetate Chemical compound COCCCOC(C)=O CCTFMNIEFHGTDU-UHFFFAOYSA-N 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- JIGUICYYOYEXFS-UHFFFAOYSA-N 3-tert-butylbenzene-1,2-diol Chemical compound CC(C)(C)C1=CC=CC(O)=C1O JIGUICYYOYEXFS-UHFFFAOYSA-N 0.000 description 1
- AXDJCCTWPBKUKL-UHFFFAOYSA-N 4-[(4-aminophenyl)-(4-imino-3-methylcyclohexa-2,5-dien-1-ylidene)methyl]aniline;hydron;chloride Chemical compound Cl.C1=CC(=N)C(C)=CC1=C(C=1C=CC(N)=CC=1)C1=CC=C(N)C=C1 AXDJCCTWPBKUKL-UHFFFAOYSA-N 0.000 description 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- HUKPVYBUJRAUAG-UHFFFAOYSA-N 7-benzo[a]phenalenone Chemical compound C1=CC(C(=O)C=2C3=CC=CC=2)=C2C3=CC=CC2=C1 HUKPVYBUJRAUAG-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- RZVHIXYEVGDQDX-UHFFFAOYSA-N 9,10-anthraquinone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3C(=O)C2=C1 RZVHIXYEVGDQDX-UHFFFAOYSA-N 0.000 description 1
- 229940076442 9,10-anthraquinone Drugs 0.000 description 1
- 229920002126 Acrylic acid copolymer Polymers 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 239000004709 Chlorinated polyethylene Substances 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical class C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- IDLJKTNBZKSHIY-UHFFFAOYSA-N [4-(diethylamino)phenyl]-phenylmethanone Chemical compound C1=CC(N(CC)CC)=CC=C1C(=O)C1=CC=CC=C1 IDLJKTNBZKSHIY-UHFFFAOYSA-N 0.000 description 1
- BEUGBYXJXMVRFO-UHFFFAOYSA-N [4-(dimethylamino)phenyl]-phenylmethanone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=CC=C1 BEUGBYXJXMVRFO-UHFFFAOYSA-N 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 239000001000 anthraquinone dye Substances 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- RJGDLRCDCYRQOQ-UHFFFAOYSA-N anthrone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3CC2=C1 RJGDLRCDCYRQOQ-UHFFFAOYSA-N 0.000 description 1
- 229940111121 antirheumatic drug quinolines Drugs 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- JPIYZTWMUGTEHX-UHFFFAOYSA-N auramine O free base Chemical compound C1=CC(N(C)C)=CC=C1C(=N)C1=CC=C(N(C)C)C=C1 JPIYZTWMUGTEHX-UHFFFAOYSA-N 0.000 description 1
- 239000000987 azo dye Substances 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- 235000019445 benzyl alcohol Nutrition 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
- 239000011243 crosslinked material Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- WMKGGPCROCCUDY-PHEQNACWSA-N dibenzylideneacetone Chemical compound C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1 WMKGGPCROCCUDY-PHEQNACWSA-N 0.000 description 1
- 125000001664 diethylamino group Chemical group [H]C([H])([H])C([H])([H])N(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- YLQWCDOCJODRMT-UHFFFAOYSA-N fluoren-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3C2=C1 YLQWCDOCJODRMT-UHFFFAOYSA-N 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 1
- 150000002390 heteroarenes Chemical class 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 125000000904 isoindolyl group Chemical class C=1(NC=C2C=CC=CC12)* 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229920003145 methacrylic acid copolymer Polymers 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 229960000907 methylthioninium chloride Drugs 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 150000004866 oxadiazoles Chemical class 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 150000003248 quinolines Chemical class 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- VLLMWSRANPNYQX-UHFFFAOYSA-N thiadiazole Chemical compound C1=CSN=N1.C1=CSN=N1 VLLMWSRANPNYQX-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は環化付加反応によって架橋する光架橋性組成物
に関するものであり、さらに詳しくは、マレイミド基を
側鎖に有する光網状化可能な重合体と新規な増感剤とか
らなる感光性組成物に関し、特に感光性印刷版の感光層
、フォトレジスト等に有用な感光性組成物に関するもの
である。Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a photocrosslinkable composition that is crosslinked by a cycloaddition reaction, and more particularly relates to a photocrosslinkable composition having a maleimide group in its side chain. The present invention relates to a photosensitive composition comprising a polymer and a novel sensitizer, and particularly to a photosensitive composition useful for photosensitive layers of photosensitive printing plates, photoresists, etc.
環化付加反応によって架橋する光架橋性材料は良く知ら
れており、これらは、感光性平版印刷版、フォトレジス
ト等の製造に用いる感光性組成物の主要成分として用い
られている。これらの架橋材料のうちマレイミド基を側
鎖に有する光架橋性ポリマーは光網状化可能な重合体の
みでは充分な感光性がなく、感光性を高めるために、増
感剤として、チオキサントン類、ベンゾフェノン、ミヒ
ラーケトン、アンスラキノン類、アンスラセン、クリセ
ン、p−ジニトロベンゼン、2−ニトロフルオレノン等
が用いられてきた。これらの増感剤を用いた場合、感度
は高くなるが、未だ充分とはいえず、画像形成における
像露光に長時間を要するため、作業性が悪く、細密な画
像の場合には操作にわずかな振動があると良好な画質の
画像が再現されない等の問題点があった。Photocrosslinkable materials that crosslink through cycloaddition reactions are well known, and these are used as main components of photosensitive compositions used in the production of photosensitive lithographic printing plates, photoresists, and the like. Among these crosslinked materials, photocrosslinkable polymers having maleimide groups in their side chains do not have sufficient photosensitivity with only photoreticular polymers, and in order to increase photosensitivity, thioxanthone and benzophenone are used as sensitizers. , Michler's ketone, anthraquinones, anthracene, chrysene, p-dinitrobenzene, 2-nitrofluorenone, and the like have been used. When these sensitizers are used, the sensitivity increases, but it is still not sufficient, and the image exposure during image formation requires a long time, resulting in poor workability. There were problems such as an image of good quality not being reproduced if there was vibration.
したがって、本発明の目的は高感度な光架橋型の感光性
組成物を提供することである。更に詳しくはマレイミド
基を側鎖に有する光調状化可能な重合体を含む光架橋型
感光性組成物の光架橋速度を増大させる増感剤を含んだ
感光性組成物を提供することである。Therefore, an object of the present invention is to provide a highly sensitive photocrosslinkable photosensitive composition. More specifically, it is an object of the present invention to provide a photosensitive composition containing a sensitizer that increases the photocrosslinking rate of a photocrosslinkable photosensitive composition containing a phototunable polymer having a maleimide group in a side chain. .
本発明者は、上記目的を達成すべく鋭意研究を重ねてい
たが、ある特定の増感剤がマレイミド基を側鎖に有する
光調状化可能な重合体を含む光架橋型感光性組成物の光
架橋速度を増大させることを見出し、本発明に到達した
ものである。The present inventor has conducted extensive research to achieve the above object, and found that a photocrosslinkable photosensitive composition in which a certain sensitizer includes a light modulating polymer having a maleimide group in its side chain. The present invention was achieved based on the discovery that the photocrosslinking rate of the compound can be increased.
本発明は(a)マレイミド基を側鎖に有する光調状化可
能な重合体と、(b)一般式(I)(式中、Zは窒素を
含むヘテロ環核を形成するのに必要な非金属原子群を表
わし、Rはアリール基、置換アリール基、ヘテロ環基、
置換へテロ環基を表わす。)で表わされる化合物とを含
有することを特徴とする感光性組成物である。The present invention provides (a) a phototunable polymer having a maleimide group in its side chain; Represents a nonmetallic atomic group, R is an aryl group, a substituted aryl group, a heterocyclic group,
Represents a substituted heterocyclic group. ) is a photosensitive composition characterized by containing a compound represented by:
本発明の組成物におけるマレイミド基を側鎖に有する光
調状化可能な重合体としては、一般式(’A)で示され
るマレイミド基:
○
(式中、R1及びR2はそれぞれ水素原子、)10ゲン
原子、アルキル基を示し、R1とR2とが−緒になって
5員環又は6員環を形成していてもよい。尚、R1及び
R2のアルキル基としては、炭素数1〜4のものが好ま
しく、特に好ましいのはメチル基である。又、ハロゲン
原子としては、塩素原子、臭素原子、沃素原子が好まし
い。)
を側鎖に有する重合体が例示される。このような重合体
は、例えば、特開昭52−988号(対応米国特許第4
.079.041号)明細書、西独特許2、626.7
69号明細書、ヨーロッパ特許21,019号明細書、
ヨーロッパ特許3.552号明細書やジ アンケハンテ
マクロモレクラエ ケミ(QieAngewandt
e Mackromolekulare Chemi
) 115(1983)の163〜181ページ、特
開昭49−128991号〜同49−128993号、
同50−5376号〜同50−5380号、同53−5
298号〜同53−5300号、同50−50107号
、同51−47940号、同52−13907号、同5
0−45076号、同52−121700号、同50−
10884号、同50−45087号、西独特許第2.
349.948号、同2.616.276号各号明細書
に記載されている。本発明では、これらのうち、成分(
a)の重合体として、1分子当り平均2個以上のマレイ
ミド基を側鎖に有し、かつ平均分子量が1000以上の
ものを用いるのが好ましい。このような重合体は、例え
ば一般式(B)〜(D):
○
(式中、R1及びR2は上記と同じ意味を有し、nは整
数を示し、好ましくは1から6である。)で表わされる
モノマーと、分子中にアルカリ可溶性基を有するモノマ
ーとを、例えば9515〜30/70、好ましくは90
/10〜70/30(モル比)の割合で共重合させるこ
とによって容易に調製される。つまり、酸基を有する重
合体は、現像時にアルカリ水を用いることが出来るので
好ましく、又公害上有利であるからである。酸基を有す
るマレイミド重合体の酸価は20〜250の範囲が好ま
しく、更に好ましくは50〜150の範囲である。尚、
上記共重合しうるモノマーとしては、アクリル酸、メタ
クリル酸等のカルボキシル基を有するビニルモノマー、
マレイン酸無水物、イタコン酸無水物等が例示される。The light modulating polymer having a maleimide group in its side chain in the composition of the present invention includes a maleimide group represented by the general formula ('A): ○ (wherein R1 and R2 are each a hydrogen atom) It represents a 10-gen atom or an alkyl group, and R1 and R2 may be taken together to form a 5-membered ring or a 6-membered ring. The alkyl groups for R1 and R2 preferably have 1 to 4 carbon atoms, and a methyl group is particularly preferred. Further, as the halogen atom, a chlorine atom, a bromine atom, and an iodine atom are preferable. ) in the side chain is exemplified. Such polymers are disclosed, for example, in JP-A-52-988 (corresponding U.S. Pat.
.. No. 079.041) Specification, West German Patent 2, 626.7
Specification No. 69, European Patent No. 21,019,
European Patent No. 3.552 and QieAngewandt
e Macromolekulare Chemi
) 115 (1983), pages 163 to 181, JP-A-49-128991 to JP-A-49-128993,
No. 50-5376 to No. 50-5380, No. 53-5
No. 298 to No. 53-5300, No. 50-50107, No. 51-47940, No. 52-13907, No. 5
No. 0-45076, No. 52-121700, No. 50-
No. 10884, No. 50-45087, West German Patent No. 2.
It is described in the specifications of No. 349.948 and No. 2.616.276. In the present invention, among these, the component (
As the polymer a), it is preferable to use one having an average of two or more maleimide groups per molecule in its side chain and an average molecular weight of 1000 or more. Such polymers, for example, have general formulas (B) to (D): (wherein, R1 and R2 have the same meanings as above, and n represents an integer, preferably from 1 to 6.) and a monomer having an alkali-soluble group in the molecule in a ratio of, for example, 9515 to 30/70, preferably 90/70.
It is easily prepared by copolymerizing at a ratio of /10 to 70/30 (mole ratio). In other words, polymers having acid groups are preferable because alkaline water can be used during development, and they are also advantageous in terms of pollution. The acid value of the maleimide polymer having acid groups is preferably in the range of 20 to 250, more preferably in the range of 50 to 150. still,
The copolymerizable monomers include vinyl monomers having carboxyl groups such as acrylic acid and methacrylic acid;
Examples include maleic anhydride and itaconic anhydride.
成分(a)のポリマーとしては、上記のうちでも、ジ
アンゲバンテ マクロモレクラエ ケミ(Die^ng
ewandte Makromolekulare C
hemie) 128(1984)の71〜91ペー
ジに記載されている様なN−(2−(メタクリロイルオ
キシ)エチルツー2.3−ジメチルマレイミドとメタク
リル酸あるいはアクリル酸の共重合体、つまりアルカリ
可溶性基をもつモノマーとの共重合体が好ましい。さら
に上記ビニルモノマーとは異なるビニルモノマーを共存
させて重合させた多元共重合体も好ましい。Among the above-mentioned polymers as component (a), di-
Angebante Macromoleklae Chemi (Die^ng
ewandte Makromolekulare C
A copolymer of N-(2-(methacryloyloxy)ethyl-2,3-dimethylmaleimide and methacrylic acid or acrylic acid) as described on pages 71 to 91 of 128 (1984), that is, an alkali-soluble group. A copolymer with a monomer having the above-mentioned vinyl monomer is preferable. A multi-component copolymer polymerized in the coexistence of a vinyl monomer different from the above-mentioned vinyl monomer is also preferable.
尚、本発明で用いる成分(a)のポリマーとしては、分
子量1000以上、好ましくは1万〜50万、特に好ま
しくは2万〜30万のものを用いるのが望ましい。The polymer used as component (a) in the present invention preferably has a molecular weight of 1,000 or more, preferably 10,000 to 500,000, particularly preferably 20,000 to 300,000.
上記成分(a)の重合体の全組成物に対する添加量は1
0〜99重量%(以下%と略称する)、好ましくは50
〜99%である。The amount of the polymer of component (a) added to the total composition is 1
0 to 99% by weight (hereinafter abbreviated as %), preferably 50%
~99%.
次に本発明の光架橋性組成物において著しい特徴をなす
増感剤(b)について説明する。Next, the sensitizer (b), which is a significant feature in the photocrosslinkable composition of the present invention, will be explained.
本発明で用いられる一般式(I)
で表わされる化合物において、Zは窒素を含むヘテロ環
核を形成するのに必要な非金属原子群である。Zと共に
形成する窒素を含むヘテロ環核とは例えば、ベンゾチア
ゾール、α−ナフトチアゾール、β−ナフトチアゾール
等のチアゾール類、ベンゾオキサゾール、β−ナフトオ
キサゾール等のオキサゾール類、ベンゾセレナゾール等
のセレナジール類、イミダゾール、ベンゾイミダゾール
等のイミダゾール類、3,3−ジメチルインドレニン等
のイソインドール類、キノリン、インキノリン等のキノ
リン類、1,3.4−オキサジアゾール、1,3.4−
チアジアゾール、1.3.4−セレナジアゾール等のジ
アゾール類、1.2.4−トリアゾール等のトリアゾー
ル類などの他、ピラジン、キノキサリン、S−)リアジ
ン、フエナントリジン等を挙げることができる。これら
のZと共に形成する窒素を含むヘテロ環核は置換基を有
していても良く、置換基としては、メチル基、エチル基
等の炭素数1〜6個のアルキル基、メトキシ基、エトキ
シ基等の炭素数1〜6個のアルコキシ基、塩素、臭素等
のハロゲン原子、シアノ基、アミノ基、ジメチルアミノ
基等の炭素数1〜4個のアルキル基で置換されたアミノ
基、カルボメトキシ基等の炭素数1〜4個のアルキル基
を有するカルボアルコキシ基、フェニル基、p−メトキ
シフェニル基、p−クロロフェニル基等の炭素数6〜1
0個の置換もしくは非置換のアリール基等が挙げられる
。In the compound represented by the general formula (I) used in the present invention, Z is a group of nonmetallic atoms necessary to form a nitrogen-containing heterocyclic nucleus. Examples of the nitrogen-containing heterocyclic nucleus formed with Z include thiazoles such as benzothiazole, α-naphthothiazole, and β-naphthothiazole, oxazoles such as benzoxazole and β-naphthoxazole, and selenazils such as benzoselenazole. , imidazoles such as imidazole and benzimidazole, isoindoles such as 3,3-dimethylindolenine, quinolines such as quinoline and inquinoline, 1,3.4-oxadiazole, 1,3.4-
In addition to diazoles such as thiadiazole and 1.3.4-selenadiazole, and triazoles such as 1.2.4-triazole, pyrazine, quinoxaline, S-)riazine, and phenanthridine can be mentioned. The nitrogen-containing heterocyclic nucleus formed together with Z may have a substituent, and examples of the substituent include an alkyl group having 1 to 6 carbon atoms such as a methyl group and an ethyl group, a methoxy group, and an ethoxy group. an alkoxy group having 1 to 6 carbon atoms, such as a halogen atom such as chlorine or bromine, an amino group substituted with an alkyl group having 1 to 4 carbon atoms such as a cyano group, an amino group, or a dimethylamino group, or a carbomethoxy group. A carbalkoxy group having an alkyl group having 1 to 4 carbon atoms such as a phenyl group, a p-methoxyphenyl group, a p-chlorophenyl group having 6 to 1 carbon atoms, etc.
Examples include 0 substituted or unsubstituted aryl groups.
Rがアリール基の場合、フェニル、ナフチルのような炭
素数6から14個までの単環および多環化合物を表わす
。また置換アリール基の場合、置換基としては炭素数1
〜6個のアルキル基、炭素数1〜6個のアルコキシ基、
炭素数6〜10個までのアリール基、アミノ基、炭素数
1〜6個のアルキル基で置換されたアミン基、フッ素、
塩素、臭素などのハロゲン原子等がある。また上述の置
換基として用いたアルキル基は、更にメトキシ、エトキ
シ等の炭素数1〜2個のアルコキシ基、塩素等のハロゲ
ン原子を置換基として有していても良い。When R is an aryl group, it represents a monocyclic or polycyclic compound having 6 to 14 carbon atoms such as phenyl and naphthyl. In addition, in the case of a substituted aryl group, the substituent has 1 carbon number
~6 alkyl groups, alkoxy groups having 1 to 6 carbon atoms,
Aryl group having 6 to 10 carbon atoms, amino group, amine group substituted with alkyl group having 1 to 6 carbon atoms, fluorine,
Examples include halogen atoms such as chlorine and bromine. Further, the alkyl group used as the above-mentioned substituent may further have an alkoxy group having 1 to 2 carbon atoms such as methoxy or ethoxy, or a halogen atom such as chlorine as a substituent.
これらの置換アリール基の置換基として好ましいものと
してはメチル基、エチル基等の炭素数1〜4個のアルキ
ル基、メトキシ基、エトキシ基等の炭素数1〜4個のア
ルコキシ基、ジメチルアミノ基、ジエチルアミノ基等の
炭素数1〜4個のアルキル基で置換されたアミノ基、フ
ッ素、塩素、臭素等のハロゲン原子をあげることができ
る。Preferred substituents for these substituted aryl groups include alkyl groups having 1 to 4 carbon atoms such as methyl group and ethyl group, alkoxy groups having 1 to 4 carbon atoms such as methoxy group and ethoxy group, and dimethylamino group. , an amino group substituted with an alkyl group having 1 to 4 carbon atoms such as diethylamino group, and halogen atoms such as fluorine, chlorine, and bromine.
Rが置換もしくは非置換のへテロ環基の場合、ヘテロ環
としては窒素、酸素、硫黄の少なくともいづれか一つの
原子を含む単環または多環化合物であり好ましくはフラ
ン、ピロール、ピリジン等の5又は6員環ヘテロ芳香族
化合物である。When R is a substituted or unsubstituted heterocyclic group, the heterocycle is a monocyclic or polycyclic compound containing at least one of nitrogen, oxygen, and sulfur, preferably a 5- or polycyclic compound such as furan, pyrrole, or pyridine. It is a 6-membered ring heteroaromatic compound.
置換へテロ環基の場合置換基としては上記の置換アリー
ル基で用いたものと同様のものを挙げることができる。In the case of a substituted heterocyclic group, the same substituents as those used for the above-mentioned substituted aryl group can be mentioned.
本発明で用いられる一般式(I)で表わされる化合物の
うち、より好ましい化合物は下記一般式(II)で示さ
れる化合物である。Among the compounds represented by the general formula (I) used in the present invention, a more preferable compound is a compound represented by the following general formula (II).
上記(If)式においてZ′はXとともに窒素を含むヘ
テロ環核を形成するのに必要な非金属原子群を表わす。In the above formula (If), Z' represents a group of nonmetallic atoms necessary to form a nitrogen-containing heterocyclic nucleus together with X.
XはOlS、およびN−R’ を表わし、ここでR′
は水素、炭素数1〜4個のアルキル基、置換アルキル基
、炭素数6〜10個のアリール基、置換アリール基、を
表わす。Rは、一般式(I)で示されたRと同じく、ア
リール基、置換アリール基、ヘテロ環基、置換へテロ環
基を表わす。X represents OlS and N-R', where R'
represents hydrogen, an alkyl group having 1 to 4 carbon atoms, a substituted alkyl group, an aryl group having 6 to 10 carbon atoms, or a substituted aryl group. Like R shown in general formula (I), R represents an aryl group, a substituted aryl group, a heterocyclic group, or a substituted heterocyclic group.
一般式(II)で示される化合物の代表例としてはチア
ゾール類、オキサゾール類、イミダゾール類、オキサジ
アゾール類、トリアゾール類、等を挙げることができる
。Typical examples of the compound represented by the general formula (II) include thiazoles, oxazoles, imidazoles, oxadiazoles, triazoles, and the like.
本発明で用いられる前記一般式(I)で表わされる化合
物は特開昭60−162248号及び米国特許第4.5
55.474号明細書等に記載されているように、公知
の方法を用いて合成することができる。The compound represented by the general formula (I) used in the present invention is disclosed in JP-A No. 60-162248 and U.S. Patent No. 4.5.
It can be synthesized using a known method, as described in No. 55.474.
これら成分(b)の増感剤の添加量は全組成物の1〜3
0%が好ましく、より好ましくは3〜15%である。The amount of the sensitizer (component (b)) added is 1 to 3 of the total composition.
It is preferably 0%, more preferably 3 to 15%.
本発明に用いられる一般式(1)で表わされる増感剤の
具体例を下記に示す。Specific examples of the sensitizer represented by the general formula (1) used in the present invention are shown below.
Nα1
o2
Nα3
lα4
Nα5
社6
n
魔9
Nα10
魔11
Nα12
Nα13
α
Nα15
Nα16
Nα17
本発明の光架橋型感光性組成物には、一般式(I)で表
わされる増感剤に加えて、他の増感剤を更に含有させて
もよい。この場合には、一般式(I)で表わされる増感
剤化合物との併用により光架橋速度をさらに増大させる
増感剤が選択される。このような増感剤の具体例として
は、ベンゾイン、ベンゾインメチルエーテル、ベンゾイ
ンエチルエーテル、2,2−ジメトキシ−2−フェニル
アセトフェノン、9−フルオレノン、2−クロロ−9−
フルオレノン、2−メチル−9−フルオレノン、9−ア
ントロン、2−ブロモ−9−アントロン、2−エチル−
9−アントロン、9,1〇−アントラキノン、2−エチ
ル−9,10−アントラキノン、2−t−ブチル−9,
10−アントラキノン、2.6−ジクロロ−9,10−
アントラキノン、キサントン、2−メチルキサントン、
2−メトキシキサントン、ジベンザルアセトン、p−(
ジメチルアミノ)フェニルスチリルケトン、p−(ジメ
チルアミノ)フェニルp−メチルスチリルケトン、ベン
ゾフェノン、p−(ジメチルアミノ)ベンゾフェノン(
またはミヒラーケトン)、p−(ジエチルアミノ)ベン
ゾフェノン、ベンズアントロンなどをあげることができ
る。Nα1 o2 Nα3 lα4 Nα5 Company 6 n 9 Nα10 11 Nα12 Nα13 α Nα15 Nα16 Nα17 The photocrosslinkable photosensitive composition of the present invention contains other sensitizers in addition to the sensitizer represented by the general formula (I). A sensitizer may also be included. In this case, a sensitizer is selected that further increases the photocrosslinking rate when used in combination with the sensitizer compound represented by general formula (I). Specific examples of such sensitizers include benzoin, benzoin methyl ether, benzoin ethyl ether, 2,2-dimethoxy-2-phenylacetophenone, 9-fluorenone, 2-chloro-9-
Fluorenone, 2-methyl-9-fluorenone, 9-anthrone, 2-bromo-9-anthrone, 2-ethyl-
9-anthrone, 9,10-anthraquinone, 2-ethyl-9,10-anthraquinone, 2-t-butyl-9,
10-anthraquinone, 2,6-dichloro-9,10-
anthraquinone, xanthone, 2-methylxanthone,
2-methoxyxanthone, dibenzalacetone, p-(
dimethylamino) phenylstyryl ketone, p-(dimethylamino)phenyl p-methylstyryl ketone, benzophenone, p-(dimethylamino)benzophenone (
or Michler's ketone), p-(diethylamino)benzophenone, and benzanthrone.
更にチオキサントン誘導体、例えば2−クロルチオキサ
ントン、2−イソプロピルチオキサントン、ジメチルチ
オキサントン等や、ドイツ特許第3018891号及び
同3117568号、並びにヨーロッパ特許第3372
0号、英国特許第2075506号公報に記載されてい
るような置換されたチオキサントン類を用いるのがよい
。一般式(I)の化合物と併用する増感剤の添加量は全
組成物の0,5〜20%が好ましく、より好ましくは3
〜10%である。Furthermore, thioxanthone derivatives such as 2-chlorothioxanthone, 2-isopropylthioxanthone, dimethylthioxanthone, etc., German Patent No. 3018891 and German Patent No. 3117568, and European Patent No. 3372
Substituted thioxanthones such as those described in No. 0, GB 2,075,506 are preferably used. The amount of the sensitizer used in combination with the compound of general formula (I) is preferably 0.5 to 20% of the total composition, more preferably 3%.
~10%.
本発明の感光性組成物には必要により結合剤を含有させ
ることができるが、通常線状有機高分子重合体より適宜
選択される。結合剤の具体例としては、塩素化ポリエチ
レン、塩素化ポリプロピレン、ポリアクリル酸アルキル
エステル、アクリル酸アルキルエステルとアクリロニト
リル、塩化ビニノペスチレン、ブタジェンなどのモノマ
ーの少くとも一種との共重合体、ポリアミド、メチルセ
ルロース、ポリビニルホルマール、ポリビニールブチラ
ール、メタクリル酸共重合体、アクリル酸共重合体、イ
タコン酸共重合体、ジアゾ樹脂などがある。The photosensitive composition of the present invention may contain a binder if necessary, but it is usually appropriately selected from linear organic polymers. Specific examples of the binder include chlorinated polyethylene, chlorinated polypropylene, polyacrylic acid alkyl ester, copolymer of acrylic acid alkyl ester and at least one monomer such as acrylonitrile, vinylopestylene chloride, butadiene, polyamide, methyl cellulose, Examples include polyvinyl formal, polyvinyl butyral, methacrylic acid copolymers, acrylic acid copolymers, itaconic acid copolymers, and diazo resins.
以上の他に感光性組成物には更に熱重合防止剤を加えて
おくことが好ましく、例えばハイドロキノン、p−メト
キシフェノール、ジ−t−ブチル−p−クレゾール、ピ
ロガロール、t−ブチルカテコール、ベンゾキノン、4
.4’ −チtビス(3−メチル−6−t−ブチルフ
ェノール)、2゜2′−メチレンビス(4−メチル−6
−t−ブチルフェノール)、2−メルカプトベンゾイミ
ダゾール等が有用である。In addition to the above, it is preferable to further add a thermal polymerization inhibitor to the photosensitive composition, such as hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4
.. 4'-t-bis(3-methyl-6-t-butylphenol), 2゜2'-methylenebis(4-methyl-6
-t-butylphenol), 2-mercaptobenzimidazole, and the like are useful.
また場合によっては着色を目的として染料もしくは顔料
、例えばメチレンブルー、クリスタルバイオレット、ロ
ーダミンB1フクシン、オーラミン、アゾ系染料、アン
トラキノン系染料、酸化チタン、カーボンブラック、酸
化鉄、フタロシアニン系顔料、アゾ系顔料などを加えて
もよい。In some cases, dyes or pigments such as methylene blue, crystal violet, rhodamine B1 fuchsin, auramine, azo dyes, anthraquinone dyes, titanium oxide, carbon black, iron oxide, phthalocyanine pigments, azo pigments, etc. are used for coloring purposes. May be added.
本発明の感光性組成物は前述の各種構成成分を溶媒中に
溶解せしめ、適当な支持体上に公知の方法により塗布し
て用いられる。The photosensitive composition of the present invention is used by dissolving the above-mentioned various components in a solvent and coating the solution on a suitable support by a known method.
本発明の感光性組成物を塗布するときに用いられる溶媒
としては、エチレンジクロリド、シクロヘキサノン、メ
チルエチルケトン、メチルセロソルブ、エチルセロソル
ブ、酢酸メチルセロソルブ、モノクロルベンゼン、トル
エン、キシレン、プロピレンクリコールモノメチルエー
テル、3−メトキシプロパツール、3−メトキシプロピ
ルアセテート、酢酸エチル、酢酸ブチルなとが挙げられ
る。Solvents used when applying the photosensitive composition of the present invention include ethylene dichloride, cyclohexanone, methyl ethyl ketone, methyl cellosolve, ethyl cellosolve, methyl cellosolve acetate, monochlorobenzene, toluene, xylene, propylene glycol monomethyl ether, 3- Examples include methoxypropanol, 3-methoxypropyl acetate, ethyl acetate, and butyl acetate.
これらの溶媒は単独又は混合して使用される。These solvents may be used alone or in combination.
本発明の感光性組成物は感光性平版印刷版の感光層とし
て好適である。感光性平版印刷版に適した支持体として
は、親水化処理したアルミニウム板、たとえばシリケー
ト処理アルミニウム板、陽極酸化アルミニウム板、シリ
ケート電着したアルミニウム板があり、その他面鉛板、
ステンレス板、クローム処理銅板、親水化処理したプラ
スチックフィルムや紙を挙げることができる。The photosensitive composition of the present invention is suitable as a photosensitive layer of a photosensitive lithographic printing plate. Suitable supports for photosensitive lithographic printing plates include hydrophilized aluminum plates, such as silicate-treated aluminum plates, anodized aluminum plates, and electrodeposited silicate aluminum plates;
Stainless steel plates, chromium-treated copper plates, and hydrophilized plastic films and paper can be cited.
感光性平版印刷版を製造する場合の塗布量は、一般に固
形分として0.1〜10.0 g / m’が適当であ
り、特に好ましくは0.5〜5.0 g / rn”で
ある。The coating amount when producing a photosensitive lithographic printing plate is generally 0.1 to 10.0 g/m' as a solid content, and particularly preferably 0.5 to 5.0 g/rn'. .
また本発明の組成物をフォトレジストとして使用する場
合には銅板または銅メツキ板、ステンレス板、ガラス板
等の種々のものを支持体として用いることができる。Furthermore, when the composition of the present invention is used as a photoresist, various materials such as a copper plate, a copper plated plate, a stainless steel plate, a glass plate, etc. can be used as a support.
以下実施例に基いて本発明を更に詳細に説明する。 The present invention will be explained in more detail below based on Examples.
実施例1〜4、比較例1〜3
ナイロンブラシで砂目立て後シリケート処理したアルミ
ニウム板に回転塗布機を用いて回転速度20 Or、p
、m、にて第1表に示す増感剤を用いた下記感光液を塗
布して100℃2分間乾燥し、乾燥膜厚約1.5μの感
光層を形成させ感光板を作成した。Examples 1 to 4, Comparative Examples 1 to 3 After graining with a nylon brush, a silicate-treated aluminum plate was coated with a rotary coater at a rotation speed of 20 Or, p.
The following photosensitive solution using the sensitizer shown in Table 1 was applied at .
メチルメタクリレ−)/N−(2−
(メタクリロイルオキシ)エチル〕
−2,3−ジメチルマレイミド/メタ
グリル酸=15/65/20 (重量比)共重合体のメ
チルエチルケトン/
2−メトキシエタノール=1/1
重量比混合物の20%溶液
(特開昭59−206425号明細書中の樹脂V)
25 g第1表に示
す増感剤 0.5gF−177(大
日本インキ■製:フッ
素系ノニオン界面活性剤) 0.02g銅
フタロシアニン顔料(CI PigmentBlue
15)の可塑剤10%分散液 1.0gエアロ
ジルR972(日本エアロジル■製:表面樹脂加工ケイ
酸粉末)
のエチレングリコールモノメチル
エーテル10%分散液 1.0gメチル
エチルケトン 20 gメタノール
2gエチレングリコー
ルモノメチル
エーテルアセテート 28 g露光
は真空焼枠装置を用いて、作製した感光板上にステップ
・ウェッジ(濃度段差0,15、濃度段数15段)に置
き、2KWの超高圧水銀灯を16秒間照射し、露光後下
記処方の現像液を用いて現像した。Methyl methacrylate)/N-(2-(methacryloyloxy)ethyl) -2,3-dimethylmaleimide/methacrylic acid = 15/65/20 (weight ratio) copolymer methyl ethyl ketone/2-methoxyethanol = 1/ 1 20% solution by weight ratio mixture (Resin V in JP-A-59-206425)
25 g Sensitizer shown in Table 1 0.5 g F-177 (manufactured by Dainippon Ink ■: fluorine-based nonionic surfactant) 0.02 g Copper phthalocyanine pigment (CI Pigment Blue
15) 10% dispersion of plasticizer 1.0g Aerosil R972 (manufactured by Nippon Aerosil ■: surface resin-treated silicic acid powder) 10% dispersion in ethylene glycol monomethyl ether 1.0g Methyl ethyl ketone 20 g Methanol 2g Ethylene glycol monomethyl ether acetate 28 For exposure, use a vacuum printing frame device, place a step wedge (density step difference 0, 15, number of density steps 15) on the prepared photosensitive plate, irradiate it with a 2KW ultra-high pressure mercury lamp for 16 seconds, and after exposure, use the following prescription. It was developed using a developer solution.
現像液
ベンジルアルコール 4.5gイソ
プロピルナフタレンスルホン酸
のナトリウム塩の38%水溶液 4.5gトリエ
タノールアミン 1.5gモノエタノ
ールアミン 0.1g亜硫酸ナトリウ
ム 0.3g純 水
100g現
出した画像の対応するステップ・ウェッジの最高段数を
試料の感度として第1表に示した。段数が高いほど感度
も高いことを意味する。Developer Benzyl alcohol 4.5g 38% aqueous solution of sodium salt of isopropylnaphthalene sulfonic acid 4.5g Triethanolamine 1.5g Monoethanolamine 0.1g Sodium sulfite 0.3g Pure water
The highest number of step wedges corresponding to the 100g image is shown in Table 1 as the sensitivity of the sample. The higher the number of stages, the higher the sensitivity.
また比較のために増感剤として本発明の化合物に替えて
2.3−ジメチルチオキサントン、ミヒラーケトンを添
加したものをそれぞれ比較例(1)、(2)とし、また
無添加のものを比較例(3)とし、これらの感度もあわ
せて第1表に示した。For comparison, 2,3-dimethylthioxanthone and Michler's ketone were added as sensitizers instead of the compound of the present invention as Comparative Examples (1) and (2), respectively, and Comparative Examples (2) were used without the addition of 2,3-dimethylthioxanthone and Michler's ketone. 3) and their sensitivities are also shown in Table 1.
第 1 表
第1表に示したように、本発明の一般式(I)で示され
る増感剤を用いた場合、比較例1〜3に比較してより高
い感度を示し、本発明の所期の効果が十分に認められた
。Table 1 As shown in Table 1, when the sensitizer represented by the general formula (I) of the present invention was used, higher sensitivity was shown compared to Comparative Examples 1 to 3, and the present invention was achieved. The effects of the period were fully recognized.
実施例5〜10、比較例4〜6
本発明の一般式(I)で表わされる増感剤として下記第
2表に示す化合物を用い、また本発明以外の増感剤とし
て7−メチルチオキサントン−3−カルボン酸エチル0
.3gを各々に添加した以外、実施例1〜4と同様の処
方で塗布液を調液し、同じ方法を用いて感光板を作製し
、露光、現像を行なった。現出した画像の対応するステ
ップウェッジの最高段数を試料の感度として第2表に示
した。Examples 5 to 10, Comparative Examples 4 to 6 The compounds shown in Table 2 below were used as the sensitizers represented by the general formula (I) of the present invention, and 7-methylthioxanthone- Ethyl 3-carboxylate 0
.. A coating solution was prepared using the same formulation as in Examples 1 to 4, except that 3 g was added to each, and a photosensitive plate was prepared using the same method, followed by exposure and development. The highest number of steps of the step wedge corresponding to the developed image is shown in Table 2 as the sensitivity of the sample.
また本発明の増感剤に替えてミヒラーケトン、ベンゾフ
ェノンを用いたものをそれぞれ比較例(4)、(5)と
し、また7−メチルチオキサントン−3−カルボン酸エ
チル単独使用のものを比較例(6)とし、これらの感度
もあわせて第2表に示した。In addition, Comparative Examples (4) and (5) used Michler's ketone and benzophenone instead of the sensitizer of the present invention, and Comparative Example (6) used ethyl 7-methylthioxanthone-3-carboxylate alone. ) and their sensitivities are also shown in Table 2.
第2表に示したように、従来の増感剤である7−メチル
チオキサントン−3−カルボン酸エチル単独使用の比較
例(6)の感度あるいはこれと、従来の他の増感剤とを
併用した場合の比較例(4)、(5〕の感度に比較し、
本発明の一般式(I’)に示される増感剤と従来の増感
剤とを併用した場合の感度は、著しく高い。As shown in Table 2, the sensitivity of Comparative Example (6) using the conventional sensitizer, ethyl 7-methylthioxanthone-3-carboxylate alone, or the combination of this and other conventional sensitizers. Compared to the sensitivity of comparative examples (4) and (5) when
When the sensitizer represented by the general formula (I') of the present invention is used in combination with a conventional sensitizer, the sensitivity is extremely high.
本発明の感光性組成物は高感度であり、したがって短時
間露光で画像形成が可能であり、製版等の作業性にすぐ
れている。The photosensitive composition of the present invention has high sensitivity, and therefore can form an image with short exposure, and has excellent workability in plate making and the like.
Claims (1)
体と、 (b)一般式( I )で表わされる化合物とを含有する
ことを特徴とする感光性組成物。 ▲数式、化学式、表等があります▼( I ) (式中、Zは窒素を含むヘテロ環核を形成するのに必要
な非金属原子群を表わし、Rはアリール基、置換アリー
ル基、ヘテロ環基、置換ヘテロ環基を表わす。)[Scope of Claims] A photosensitive composition comprising (a) a photoreticulable polymer having a maleimide group in its side chain; and (b) a compound represented by general formula (I). . ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (I) (In the formula, Z represents a group of nonmetallic atoms necessary to form a nitrogen-containing heterocyclic nucleus, and R represents an aryl group, a substituted aryl group, a heterocyclic ring. (represents a substituted heterocyclic group)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13774686A JPS62294238A (en) | 1986-06-13 | 1986-06-13 | Photosensitive composition |
DE19873719355 DE3719355C2 (en) | 1986-06-13 | 1987-06-10 | Photosensitive composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13774686A JPS62294238A (en) | 1986-06-13 | 1986-06-13 | Photosensitive composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62294238A true JPS62294238A (en) | 1987-12-21 |
Family
ID=15205860
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13774686A Pending JPS62294238A (en) | 1986-06-13 | 1986-06-13 | Photosensitive composition |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS62294238A (en) |
DE (1) | DE3719355C2 (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02123361A (en) * | 1988-11-01 | 1990-05-10 | Fuji Photo Film Co Ltd | Photosensitive planographic printing plate |
JPH02131236A (en) * | 1988-11-11 | 1990-05-21 | Fuji Photo Film Co Ltd | Photosensitive composition |
JPH02157762A (en) * | 1988-12-09 | 1990-06-18 | Fuji Photo Film Co Ltd | Photosensitive composition |
JPH02173646A (en) * | 1988-12-26 | 1990-07-05 | Fuji Photo Film Co Ltd | Photosensitive composition |
JPH02189547A (en) * | 1989-01-18 | 1990-07-25 | Fuji Photo Film Co Ltd | Photosensitive composition |
JPH02236552A (en) * | 1988-11-14 | 1990-09-19 | Fuji Photo Film Co Ltd | Photosensitive composition |
JPH0364755A (en) * | 1989-08-03 | 1991-03-20 | Fuji Photo Film Co Ltd | Photosensitive composition |
JPH03129352A (en) * | 1989-10-16 | 1991-06-03 | Fuji Photo Film Co Ltd | Photosensitive composition |
US5202221A (en) * | 1988-11-11 | 1993-04-13 | Fuji Photo Film Co., Ltd. | Light-sensitive composition |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1063443C (en) * | 1995-03-28 | 2001-03-21 | 日本脏器制药株式会社 | Novel benzothiazole derivatives |
US6468711B1 (en) | 1998-09-09 | 2002-10-22 | Fuji Photo Film Co., Ltd. | Photosensitive composition and method for manufacturing lithographic printing plate |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52988A (en) * | 1975-06-18 | 1977-01-06 | Ciba Geigy Ag | Crosslinkable polymee* process for preparing the same* method of crosslinking* and material for preparing photographic image |
JPS55160010A (en) * | 1979-05-18 | 1980-12-12 | Ciba Geigy Ag | Photocurable copolymer* polymer image forming photosensitive recording material and method of forming colored photograph polymer image |
JPS60162248A (en) * | 1984-02-02 | 1985-08-24 | Fuji Photo Film Co Ltd | Photopolymerizable composition |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6278544A (en) * | 1985-10-01 | 1987-04-10 | Fuji Photo Film Co Ltd | Photosensitive composition |
-
1986
- 1986-06-13 JP JP13774686A patent/JPS62294238A/en active Pending
-
1987
- 1987-06-10 DE DE19873719355 patent/DE3719355C2/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52988A (en) * | 1975-06-18 | 1977-01-06 | Ciba Geigy Ag | Crosslinkable polymee* process for preparing the same* method of crosslinking* and material for preparing photographic image |
JPS55160010A (en) * | 1979-05-18 | 1980-12-12 | Ciba Geigy Ag | Photocurable copolymer* polymer image forming photosensitive recording material and method of forming colored photograph polymer image |
JPS60162248A (en) * | 1984-02-02 | 1985-08-24 | Fuji Photo Film Co Ltd | Photopolymerizable composition |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02123361A (en) * | 1988-11-01 | 1990-05-10 | Fuji Photo Film Co Ltd | Photosensitive planographic printing plate |
JPH02131236A (en) * | 1988-11-11 | 1990-05-21 | Fuji Photo Film Co Ltd | Photosensitive composition |
US5202221A (en) * | 1988-11-11 | 1993-04-13 | Fuji Photo Film Co., Ltd. | Light-sensitive composition |
JPH02236552A (en) * | 1988-11-14 | 1990-09-19 | Fuji Photo Film Co Ltd | Photosensitive composition |
JPH02157762A (en) * | 1988-12-09 | 1990-06-18 | Fuji Photo Film Co Ltd | Photosensitive composition |
JPH02173646A (en) * | 1988-12-26 | 1990-07-05 | Fuji Photo Film Co Ltd | Photosensitive composition |
JPH02189547A (en) * | 1989-01-18 | 1990-07-25 | Fuji Photo Film Co Ltd | Photosensitive composition |
JPH0364755A (en) * | 1989-08-03 | 1991-03-20 | Fuji Photo Film Co Ltd | Photosensitive composition |
JPH03129352A (en) * | 1989-10-16 | 1991-06-03 | Fuji Photo Film Co Ltd | Photosensitive composition |
Also Published As
Publication number | Publication date |
---|---|
DE3719355A1 (en) | 1987-12-17 |
DE3719355C2 (en) | 2000-11-16 |
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