JPS6142251B2 - - Google Patents
Info
- Publication number
- JPS6142251B2 JPS6142251B2 JP53000588A JP58878A JPS6142251B2 JP S6142251 B2 JPS6142251 B2 JP S6142251B2 JP 53000588 A JP53000588 A JP 53000588A JP 58878 A JP58878 A JP 58878A JP S6142251 B2 JPS6142251 B2 JP S6142251B2
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive
- water
- lithographic printing
- soluble
- copolymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007639 printing Methods 0.000 claims description 62
- 229920005989 resin Polymers 0.000 claims description 42
- 239000011347 resin Substances 0.000 claims description 42
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 claims description 25
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 18
- -1 Lewis acid salt Chemical class 0.000 claims description 14
- 239000003960 organic solvent Substances 0.000 claims description 12
- 150000003839 salts Chemical class 0.000 claims description 11
- 229920001577 copolymer Polymers 0.000 claims description 9
- 229920003145 methacrylic acid copolymer Polymers 0.000 claims description 4
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 3
- 229940117841 methacrylic acid copolymer Drugs 0.000 claims description 3
- 229920003002 synthetic resin Polymers 0.000 claims description 3
- 239000000057 synthetic resin Substances 0.000 claims description 3
- 239000002841 Lewis acid Substances 0.000 claims description 2
- 239000007795 chemical reaction product Substances 0.000 claims description 2
- 150000008049 diazo compounds Chemical class 0.000 claims description 2
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 claims 1
- PNQFAMLTIFXYGJ-UHFFFAOYSA-N butyl prop-2-enoate;2-hydroxyethyl 2-methylprop-2-enoate;methyl 2-methylprop-2-enoate;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.COC(=O)C(C)=C.CCCCOC(=O)C=C.CC(=C)C(=O)OCCO PNQFAMLTIFXYGJ-UHFFFAOYSA-N 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 238000006482 condensation reaction Methods 0.000 claims 1
- LTEROQWTRVZIGG-UHFFFAOYSA-N methyl 2-methylprop-2-enoate 2-methylprop-2-enoic acid prop-2-enenitrile Chemical compound C=CC#N.CC(=C)C(O)=O.COC(=O)C(C)=C LTEROQWTRVZIGG-UHFFFAOYSA-N 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 description 23
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 23
- 239000000203 mixture Substances 0.000 description 23
- 239000007864 aqueous solution Substances 0.000 description 13
- 238000000034 method Methods 0.000 description 13
- 239000000126 substance Substances 0.000 description 12
- 239000007788 liquid Substances 0.000 description 10
- 238000003860 storage Methods 0.000 description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 238000005498 polishing Methods 0.000 description 7
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 6
- 239000004115 Sodium Silicate Substances 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 6
- 229910052911 sodium silicate Inorganic materials 0.000 description 6
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 6
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 5
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 4
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 235000019795 sodium metasilicate Nutrition 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 238000007743 anodising Methods 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000012954 diazonium Substances 0.000 description 3
- 239000000975 dye Substances 0.000 description 3
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 3
- 238000007645 offset printing Methods 0.000 description 3
- 239000011592 zinc chloride Substances 0.000 description 3
- 235000005074 zinc chloride Nutrition 0.000 description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- VVXLFFIFNVKFBD-UHFFFAOYSA-N 4,4,4-trifluoro-1-phenylbutane-1,3-dione Chemical compound FC(F)(F)C(=O)CC(=O)C1=CC=CC=C1 VVXLFFIFNVKFBD-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- 206010012442 Dermatitis contact Diseases 0.000 description 2
- KCXZNSGUUQJJTR-UHFFFAOYSA-N Di-n-hexyl phthalate Chemical compound CCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCC KCXZNSGUUQJJTR-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 235000019445 benzyl alcohol Nutrition 0.000 description 2
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 2
- 239000007859 condensation product Substances 0.000 description 2
- 150000001989 diazonium salts Chemical class 0.000 description 2
- 229940061607 dibasic sodium phosphate Drugs 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- MNZGWEVNYBSBHA-UHFFFAOYSA-N 1-ethyl-2-phenylhydrazine Chemical compound CCNNC1=CC=CC=C1 MNZGWEVNYBSBHA-UHFFFAOYSA-N 0.000 description 1
- IXPNQXFRVYWDDI-UHFFFAOYSA-N 1-methyl-2,4-dioxo-1,3-diazinane-5-carboximidamide Chemical compound CN1CC(C(N)=N)C(=O)NC1=O IXPNQXFRVYWDDI-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- YEVQZPWSVWZAOB-UHFFFAOYSA-N 2-(bromomethyl)-1-iodo-4-(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=C(I)C(CBr)=C1 YEVQZPWSVWZAOB-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- YEQRRKVEOBHSJV-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate;methyl 2-methylprop-2-enoate;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.COC(=O)C(C)=C.CCCCC(CC)COC(=O)C(C)=C YEQRRKVEOBHSJV-UHFFFAOYSA-N 0.000 description 1
- GDDNTTHUKVNJRA-UHFFFAOYSA-N 3-bromo-3,3-difluoroprop-1-ene Chemical compound FC(F)(Br)C=C GDDNTTHUKVNJRA-UHFFFAOYSA-N 0.000 description 1
- KGYXYKHTHJPEBX-UHFFFAOYSA-N 5-ethoxy-3-ethoxycarbonyl-3-hydroxy-5-oxopentanoic acid Chemical compound CCOC(=O)CC(O)(CC(O)=O)C(=O)OCC KGYXYKHTHJPEBX-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- KAGWOJYZBFEQQD-UHFFFAOYSA-N C(C(=C)C)(=O)O.C(C(=C)C)(=O)OC.C(C=C)#N.C(C(=C)C)(=O)OCCO Chemical compound C(C(=C)C)(=O)O.C(C(=C)C)(=O)OC.C(C=C)#N.C(C(=C)C)(=O)OCCO KAGWOJYZBFEQQD-UHFFFAOYSA-N 0.000 description 1
- CUTKVJUFVWFBQP-UHFFFAOYSA-N C(C(=C)C)(=O)O.C(C=C)#N.C(C=C)(=O)OC Chemical compound C(C(=C)C)(=O)O.C(C=C)#N.C(C=C)(=O)OC CUTKVJUFVWFBQP-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 241000238557 Decapoda Species 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Natural products CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 240000007320 Pinus strobus Species 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229910018286 SbF 6 Inorganic materials 0.000 description 1
- YSMRWXYRXBRSND-UHFFFAOYSA-N TOTP Chemical compound CC1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C YSMRWXYRXBRSND-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000000999 acridine dye Substances 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- NDXQAHKCTLWEKI-UHFFFAOYSA-N butyl 2-methylprop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C(C)=C NDXQAHKCTLWEKI-UHFFFAOYSA-N 0.000 description 1
- FIBKPZAQWNJRSA-UHFFFAOYSA-N butyl 2-methylprop-2-enoate;methyl prop-2-enoate Chemical compound COC(=O)C=C.CCCCOC(=O)C(C)=C FIBKPZAQWNJRSA-UHFFFAOYSA-N 0.000 description 1
- KXTHFVGHODTOOH-UHFFFAOYSA-N butyl prop-2-enoate;ethyl 2-methylprop-2-enoate;methyl 2-methylprop-2-enoate Chemical compound COC(=O)C(C)=C.CCOC(=O)C(C)=C.CCCCOC(=O)C=C KXTHFVGHODTOOH-UHFFFAOYSA-N 0.000 description 1
- LSLFPBUBBQGPCH-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;2-methylprop-2-enoic acid;styrene Chemical compound CC(=C)C(O)=O.COC(=O)C(C)=C.C=CC1=CC=CC=C1.CCCCOC(=O)C=C LSLFPBUBBQGPCH-UHFFFAOYSA-N 0.000 description 1
- QMRMTRCBDHFTIV-UHFFFAOYSA-N butyl prop-2-enoate;prop-2-enenitrile;prop-2-enoic acid Chemical compound C=CC#N.OC(=O)C=C.CCCCOC(=O)C=C QMRMTRCBDHFTIV-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-O diazynium Chemical group [NH+]#N IJGRMHOSHXDMSA-UHFFFAOYSA-O 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- MOTZDAYCYVMXPC-UHFFFAOYSA-N dodecyl hydrogen sulfate Chemical compound CCCCCCCCCCCCOS(O)(=O)=O MOTZDAYCYVMXPC-UHFFFAOYSA-N 0.000 description 1
- 229940043264 dodecyl sulfate Drugs 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000000866 electrolytic etching Methods 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- IYZWGEYASHCXLQ-UHFFFAOYSA-N ethyl prop-2-enoate;2-methylprop-2-enoic acid;styrene Chemical compound CC(=C)C(O)=O.CCOC(=O)C=C.C=CC1=CC=CC=C1 IYZWGEYASHCXLQ-UHFFFAOYSA-N 0.000 description 1
- WRQSVSBTUKVOMY-UHFFFAOYSA-N ethyl prop-2-enoate;methyl 2-methylprop-2-enoate;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.CCOC(=O)C=C.COC(=O)C(C)=C WRQSVSBTUKVOMY-UHFFFAOYSA-N 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 229910017053 inorganic salt Inorganic materials 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 229940035429 isobutyl alcohol Drugs 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229940100630 metacresol Drugs 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- GIPDEPRRXIBGNF-KTKRTIGZSA-N oxolan-2-ylmethyl (z)-octadec-9-enoate Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OCC1CCCO1 GIPDEPRRXIBGNF-KTKRTIGZSA-N 0.000 description 1
- ATGUVEKSASEFFO-UHFFFAOYSA-N p-aminodiphenylamine Chemical compound C1=CC(N)=CC=C1NC1=CC=CC=C1 ATGUVEKSASEFFO-UHFFFAOYSA-N 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Inorganic materials [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 150000003009 phosphonic acids Chemical class 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000642 polymer Chemical class 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000661 sodium alginate Substances 0.000 description 1
- 235000010413 sodium alginate Nutrition 0.000 description 1
- 229940005550 sodium alginate Drugs 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 229940072958 tetrahydrofurfuryl oleate Drugs 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
Description
〔産業上の利用分野〕
本発明は新規な感光性組成物を支持体に塗布し
た平版印刷版に関する。
感光性物質を支持体上に薄膜塗布して得られた
感光板に透明原画を通して露光し、露光部分と未
露光部分とに溶解性の差異を生ぜしめ、適当な溶
剤により現像し、感光板上にレリーフ像を形成さ
せる技術は種々提案されている。得られたレリー
フ像はオフセツト版、凸版、グラビア版などの印
刷版、プリント配線基板、金属加工などの製造に
利用されている。
〔従来技術〕
従来、これらの製造に使用されている感光性物
質としては、
(1) ポリビニルアルコールと重クロム酸塩との混
合物、
(2) オルソキノンジアジド誘導体とフエノールノ
ポラツクまたはメタクレゾールとの混合物、
(3) α,β不飽和ケトン類、
(4) 芳香族ジアジド化合物と種々の高分子化合物
を組合せたものなどがある。
これらの感光性物質は、支持体との接着性、保
存安定性、耐薬品性、耐刷性などのいずれかの点
においてそれぞれ問題点を有している。
また、平版印刷版用の感光性物質においては、
ジアゾニウム化合物が知られている。特に、分子
中に数個のジアゾニウム基を有する高分子ジアゾ
ニウム塩(以下ジアゾ樹脂と言う)は、光の作用
により不溶化、親油性化するため、多く使用され
てきた。即ち、ジアゾ樹脂を親水化した紙、プラ
スチツクまたはアルミニウム板などの支持体面に
塗布し、これを透明原画を通して活性光線を露光
した場合、露光された部分は不溶性となり、未露
光部を適当な溶剤で除去することにより、親水性
の支持体が露出する。これをオフセツト印刷機に
かけて印刷すると、未露光部は水を受けつけてイ
ンキを反撥し、一方露光部は水を反撥してインキ
を受けつけ、これにより印刷ができる。
このジアゾ樹脂としては、例えば、p−アミノ
ジフエニルアミン、p−フエニレンジアミン、p
−エチルアミノアニリン等をジアゾ化して得られ
る。芳香族ジアゾニウム塩と、活性カルボニル含
有化合物、殊にアルデヒド類例えば、ホルムアル
デヒドとを酸性媒体中で縮合した水溶性ジアゾ樹
脂が使用されていた。該樹脂の製造法は米国特許
第2679498号、同第3050502号、同第3311605号お
よび同第3277074号の明細書に記載されている。
該樹脂を平版印刷版に用いるとき、該樹脂を単
独で使用する場合(米国特許第2667415号明細
書、特公昭39−17602号公報参照)と、該樹脂と
親水性コロイドとの混合物を使用する場合(米国
特許第2100063号、同第2687958号および同第
2900281号の明細書参照)とが知られている。
しかし、前者の場合は、得られたレリーフ像の
耐摩耗性が低く、耐刷性が悪い欠点がある。ま
た、後者の場合は、水溶性ジアゾ樹脂と水溶性樹
脂との混合物であるため、本質的に感脂性とイン
キ受容性が低く、また、暗反応のため、保存安定
性が悪い欠点を有している。
また、水溶性ジアゾ樹脂と水不溶性、親油性樹
脂との混合物を使用することも知られている。
(米国特許第2826501号、同第3295974号明細書参
照)
しかし、この場合は塗布する際の溶媒の選択が
難しく、また、保存安定性、耐刷性等に難点があ
る。
以上のような保存安定性の悪いのは、該ジアゾ
樹脂が塩化亜鉛との複塩、燐酸塩またはその他の
酸塩の形で使用されているため、水溶性で湿気に
対して不安定であることにより起因するものと考
えられる。
更にまた、保存安定性を改善するために、水溶
性のジアゾ樹脂と若干のフエノール性カツプリン
グ成分とを反応させて、殆んど水に不溶性で、且
つ有機溶媒可溶性の付加生成物を得、これを単独
または親油性フイルム形成性樹脂と共に使用する
ことも提案された。(特公昭47−1167号公報、米
国特許第3300309号明細書参照)
しかし、該付加生成物は塩または錯塩の性質を
持つた比較的弱い結合を含むので、例えば、有機
溶媒中で容易に再分解され易く安定性が満足すべ
き程度のものでない問題点がある。
本発明はこれらの問題点を解決すべくなされた
ものである。本発明の目的は、耐薬品性、耐刷
性、インキ受容性に優れた感光性樹脂組成物を提
供することである。
〔発明の構成〕
ジアゾ樹脂として、ジアゾ化合物とカルボニル
含有有機化合物との縮合生成物と、ハロゲン化ル
イス酸または過ハロゲン酸塩との水不溶性有機溶
媒可溶の反応生成物を使用し、該ジアゾ樹脂と有
機溶媒可溶で、殆んど水に不溶の後述する特定の
親油性フイルム形成樹脂とを含んだ感光性組成物
を使用することによつて、前記目的を達成され
る。ここで有機溶媒可溶とは、ジアゾ樹脂および
親油性フイルム形成樹脂の両者について、普通の
有機溶媒例えば、メタノール、アセトン、エチル
セロソルブ等に常温で溶解することをいう。
本発明において使用する前記ジアゾ樹脂(以下
本発明のジアゾ樹脂と言う)は、例えば芳香族ジ
アゾニウム塩とホルムアルデヒド、アセトアルデ
ヒドなどの縮合生成物の、BF4 -,PF6 -,
SiF6 --,SbF6 --または、BeF4 --なるアニオン成
分を有するハロゲン化ルイス酸塩、IO4 -等のア
ニオン成分を持つ過ハロゲン酸塩である。特に好
ましい本発明のジアゾ樹脂は、p−ジアゾジフエ
ニルアミンとホルムアルデヒドとの縮合物の
PF6 -,BF4 -のアニオン成分を持つ塩である。本
発明のジアゾ樹脂は水に殆んど不溶性且つ有機溶
媒可溶性であり、強固な塩の結合を有しているた
め、安定性が優れている。
本発明に用いられる感光性組成物に使用する有
機溶媒可溶で、殆んど水に不溶性の親油性フイル
ム形成性樹脂としては、2−ヒドロキシエチルメ
タクリレート−メチルメタクリレート共重合体、
2−ヒドロキシエチルメタクリレート−メチルメ
タクリレート−ブチルアクリレート共重合体、2
−ヒドロキシエチルメタクリレート−メチルメタ
クリレート−ブチルアクリレート−メタクリル酸
共重合体および2−ヒドロキシエチルメタクリレ
ート−メチルメタクリレート−アクリロニトリル
−メタクリル酸共重合体から選ばれた1種以上の
樹脂である。ここで殆んど水に不溶性とは、ジア
ゾ樹脂および親油性フイルム形成合成樹脂の両者
について、水に対する常温における溶解度が約1
%以下であることをいう。これらの樹脂は、本発
明のジアゾ樹脂と相溶性がよいこと、支持体への
塗布が容易で且つ均一な皮膜形成能を有するこ
と、親油性がよく且つインキ受容性が良好である
こと、印刷版の製造時に使用される薬品に対して
耐性があること、柔軟性耐摩耗性を有することお
よび保存安定性が良好であるという特性を有し、
耐刷性が優れている。
本発明に用いられる感光性組成物における本発
明のジアゾ樹脂の含有量は1〜30重量%、好まし
くは3〜15重量%である。
本発明に用いられる感光性組成物には、種々の
添加剤を加えることができる。例えば、塗布性を
改良するためのアルキルエーテル類(例えば、エ
チルセルロース、メチルセルロース)、塗膜の柔
軟性、耐摩耗性を賦与するための可塑剤、(例え
ばブチルフタリル、ポリエチレングリコール、ク
エン酸トリブチルフタル酸ジエチル、フタル酸ジ
ブチル、フタル酸ジヘキシル、フタル酸ジオクチ
ル、リン酸トリクレジル、リン酸トリブチル、リ
ン酸トリオクチル、オレイン酸テトラヒドロフル
フリール、アクリル酸またはメタクリル酸のオリ
ゴマー、)、画像を可視画化するための着色物質と
して、アクリジン染料、シアニン染料、スチリル
染料、トリフエニルメタン染料やフタロシアニン
などの顔料、又露光による可視画化を目的とする
光発色性物質(アジド化合物、スピロピラン系化
合物)を添加することができる。これらの添加剤
の添加量はその使用対象目的によつて異なるが、
一般に全固形分に対して0.5〜30重量%である。
塗布する際の感光性組成物の濃度は1〜50重量
%の範囲とすることが望ましく、使用される塗布
溶媒としては、メチルセロソルブ、エチルセロソ
ルブ、メチルセロソルブアセテート、アセトン、
メチルエチルケトン、メタノール、ジメチルフオ
ルムアミド、ジメチルスルフオキサイドまたはこ
れらの混合溶媒が適当である。しかし、場合によ
つては、前記溶媒と他の有機溶媒との混合溶媒も
使用することができる。
本発明の感光性平版印刷板は、従来の常法によ
つて使用される。即ち、線画像、網点画像等を有
する透明原画を通して露光し、次いで、水性現像
液で現像することにより、原画に対してネガのレ
リーフ像が得られる。露光に好適な光源として
は、カーボンアーク灯、水銀灯、キセノンラン
プ、メタルハライドランプ、ストロボなどがあげ
られる。現像に使用される水溶液としては、水酸
化ナトリウム、水酸化カリウム、炭酸ナトリウ
ム、メタケイ酸ナトリウム、第2リン酸ナトリウ
ム、第3リン酸ナトリウム等の水溶液、少量の界
面活性剤、有機溶媒を含む中性水溶液、塩酸、リ
ン酸、酒石酸、クエン酸、酢酸等の酸性水溶液が
使用される。また、アルカリ性または酸性水溶液
においては、現像の促進および現像むらをなくす
目的で、少量の界面活性剤、水と混合可能な有機
溶媒を添加することができる。
このようにして得られたレリーフ像は耐薬品性
が大きく、硝酸や塩化第2鉄溶液などの腐食液に
対して耐え、平版印刷板として好適である。ま
た、レリーフ像の感脂性、機械的強度および支持
体への接着性が強く、平版用として優れ、しか
も、耐刷性が大きく、多数枚の印刷に堪えること
ができる優れた効果を有している。
本発明の感光性平版印刷版に用いられる支持体
としては、前記したように、種々なものが使用さ
れるが、特にアルミニウム板が好ましい。しか
し、アルミニウム板を無処理のまま使用すると、
感光性組成物の接着が悪く、また、感光性組成物
が分解する欠点がある。この欠点をなくするた
め、従来種々の提案がなされている。
例えば、アルミニウム板の表面を砂目立てした
後、珪酸塩で処理する方法。(米国特許第2714066
号)有機酸塩で処理する方法。(米国特許第
2714066)ホスホン酸およびそれらの誘導体で処
理する方法。(米国特許第3220832号)ヘキサフル
オロジルコン酸カリウムで処理する方法。(米国
特許第2946683号)、陽極酸化する方法および陽極
酸化後、アルカリ金属珪酸塩の水溶液で処理する
方法(米国特許第3181461号)等がある。
本発明の感光性平版印刷版の支持体として用い
られるアルミニウム板としては、表面を砂目立て
処理を施し、陽極酸化した後、封孔処理したもの
が好ましい。砂目立で処理する方法としては、ア
ルミニウム板表面を脱脂した後、ブラシ研磨法、
ボール研磨法、化学研磨法、電解エツチング法等
がある。陽極酸化は例えば、燐酸、クロム酸、ホ
ウ酸、硫酸等の無機塩もしくはシユウ酸、スルフ
アミン酸等の有機酸の単独又はこれらの酸2種以
上を混合した水溶液又は非水溶液中アルミニウム
板を陽極として電流を通じることによつて行なわ
れる。更に封孔処理は、珪酸ソーダ水溶液、熱水
及び若干の無機塩又は有機塩の熱水溶液に浸漬す
るか水蒸気浴によつて行なわれる。このように処
理されたアルミニウム支持体に本発明にかかわる
感光性組成物を塗布して得られる感光性平版印刷
版は、感光層の保存安定性及び支持体との接着性
が良好で、且つ露光現像後鮮明なレリーフ像を与
え、極めて長い印刷工程において鮮明な画像を有
する印刷物を与えることができる。
〔実施例〕
実施例 1
2−ヒドロキシエチルメタクリレート30g、メ
チルメタクリレート65g、ブチルアクリレート5
g、アゾビスイソブチロニトリル0.4gをジオキ
サン300mlに溶解し、窒素ガス置換した封管中で
65℃で30時間反応させた。反応終了後、反応液を
水5中に撹拌下注ぎ、生じた白色沈澱物を過
乾燥して、共重合体−1(97.5g)を得た。
室温で、5%のジアゾ樹脂(特公昭39−17602
号の明細書に記載されるパラジアゾジフエニルア
ミンとホルムアルデヒドとの縮合物の塩化亜鉛・
硫酸複塩)水溶液200mlと、10%ヘキサフルオロ
リン酸アンモニウム水溶液50mlとを混合し、直ち
に生じた沈澱物を吸収過し、30〜40℃で減圧乾
燥した。水に殆んど不溶でメチルセロソルブ、エ
チルセロソルブ等の有機溶剤に可溶のジアゾ樹脂
−1(ヘキサフルオロリン酸塩)10gを得た。
アルミニウム板を20%リン酸ソーダ水溶液に浸
漬して脱脂し、電解研磨を行なつた後、硫酸中で
陽極酸化し、更にメタケイ酸ソーダ水溶液にて処
理し、平版印刷版の支持体に用いるアルミニウム
板−1を作製した。このアルミニウム板−1に次
の感光液Aを回転塗布機を用いて塗布し、感光性
平版印刷版(A)を得た。
[Industrial Field of Application] The present invention relates to a lithographic printing plate having a support coated with a novel photosensitive composition. A photosensitive plate obtained by coating a thin film of a photosensitive substance on a support is exposed to light through a transparent original image to create a difference in solubility between exposed and unexposed areas, and developed with an appropriate solvent to form a layer on the photosensitive plate. Various techniques for forming relief images have been proposed. The relief images obtained are used in the production of printing plates such as offset plates, letterpress plates, and gravure plates, printed wiring boards, and metal processing. [Prior Art] Photosensitive substances conventionally used in the production of these materials include (1) mixtures of polyvinyl alcohol and dichromate, (2) mixtures of orthoquinone diazide derivatives and phenol nopolac or metacresol. , (3) α,β unsaturated ketones, and (4) combinations of aromatic diazide compounds and various polymer compounds. Each of these photosensitive materials has problems in terms of adhesion to a support, storage stability, chemical resistance, printing durability, and the like. In addition, in photosensitive materials for planographic printing plates,
Diazonium compounds are known. In particular, polymeric diazonium salts (hereinafter referred to as diazo resins) having several diazonium groups in their molecules have been widely used because they become insolubilized and lipophilic by the action of light. That is, when diazo resin is applied to a support such as hydrophilic paper, plastic, or aluminum plate, and this is exposed to active light through a transparent original, the exposed areas become insoluble, and the unexposed areas are treated with an appropriate solvent. Removal exposes the hydrophilic support. When this is printed using an offset printing machine, the unexposed areas receive water and repel ink, while the exposed areas repel water and receive ink, thereby allowing printing. Examples of the diazo resin include p-aminodiphenylamine, p-phenylenediamine, p-
- Obtained by diazotizing ethylaminoaniline etc. Water-soluble diazo resins have been used in which aromatic diazonium salts are condensed with active carbonyl-containing compounds, especially aldehydes such as formaldehyde, in an acidic medium. Methods for producing the resin are described in U.S. Pat. When the resin is used in a lithographic printing plate, the resin is used alone (see U.S. Pat. No. 2,667,415, Japanese Patent Publication No. 17602/1983), and a mixture of the resin and a hydrophilic colloid is used. (U.S. Patent No. 2100063, U.S. Patent No. 2687958 and U.S. Pat. No. 2687958)
2900281) is known. However, in the former case, the abrasion resistance of the obtained relief image is low and printing durability is poor. In addition, in the latter case, since it is a mixture of water-soluble diazo resin and water-soluble resin, it inherently has low oil sensitivity and ink receptivity, and also has the disadvantage of poor storage stability due to dark reaction. ing. It is also known to use mixtures of water-soluble diazo resins and water-insoluble, lipophilic resins.
(See US Pat. No. 2,826,501 and US Pat. No. 3,295,974.) However, in this case, it is difficult to select a solvent during coating, and there are also problems with storage stability, printing durability, etc. The reason for the poor storage stability as described above is that the diazo resin is used in the form of a double salt with zinc chloride, a phosphate, or other acid salts, which are water-soluble and unstable against moisture. This is thought to be caused by this. Furthermore, in order to improve storage stability, a water-soluble diazo resin is reacted with some phenolic coupling component to obtain an addition product that is almost insoluble in water and soluble in organic solvents. It has also been proposed to use oleophilic film-forming resins alone or in conjunction with lipophilic film-forming resins. (See Japanese Patent Publication No. 47-1167 and U.S. Patent No. 3,300,309.) However, since the addition products contain relatively weak bonds due to the properties of salts or complex salts, they are easily reproducible in, for example, organic solvents. There are problems in that it is easily decomposed and its stability is not satisfactory. The present invention has been made to solve these problems. An object of the present invention is to provide a photosensitive resin composition that has excellent chemical resistance, printing durability, and ink receptivity. [Structure of the Invention] A water-insoluble organic solvent-soluble reaction product of a condensation product of a diazo compound and a carbonyl-containing organic compound and a halogenated Lewis acid or a perhalogen salt is used as the diazo resin, and the diazo The above object is achieved by using a photosensitive composition comprising a resin and a specific lipophilic film-forming resin described below which is soluble in organic solvents and substantially insoluble in water. Here, soluble in organic solvent means that both the diazo resin and the lipophilic film-forming resin are soluble in common organic solvents such as methanol, acetone, ethyl cellosolve, etc. at room temperature. The diazo resin used in the present invention (hereinafter referred to as the diazo resin of the present invention) is a condensation product of an aromatic diazonium salt and formaldehyde, acetaldehyde, etc., such as BF 4 - , PF 6 - ,
These are Lewis halide salts having an anion component such as SiF 6 -- , SbF 6 -- or BeF 4 -- , and perhalogen salts having an anion component such as IO 4 -- . A particularly preferred diazo resin of the present invention is a condensate of p-diazodiphenylamine and formaldehyde.
It is a salt with anionic components of PF 6 - and BF 4 - . The diazo resin of the present invention is almost insoluble in water and soluble in organic solvents, and has strong salt bonds, so it has excellent stability. The organic solvent-soluble, almost water-insoluble lipophilic film-forming resin used in the photosensitive composition used in the present invention includes 2-hydroxyethyl methacrylate-methyl methacrylate copolymer;
2-hydroxyethyl methacrylate-methyl methacrylate-butyl acrylate copolymer, 2
- One or more resins selected from -hydroxyethyl methacrylate-methyl methacrylate-butyl acrylate-methacrylic acid copolymer and 2-hydroxyethyl methacrylate-methyl methacrylate-acrylonitrile-methacrylic acid copolymer. Here, "almost insoluble in water" means that both the diazo resin and the lipophilic film-forming synthetic resin have a solubility in water of about 1 at room temperature.
% or less. These resins have good compatibility with the diazo resin of the present invention, can be easily applied to a support and have the ability to form a uniform film, have good lipophilicity and good ink receptivity, and are suitable for printing. It has the characteristics of being resistant to chemicals used in plate manufacturing, having flexibility and abrasion resistance, and good storage stability.
Excellent printing durability. The content of the diazo resin of the present invention in the photosensitive composition used in the present invention is 1 to 30% by weight, preferably 3 to 15% by weight. Various additives can be added to the photosensitive composition used in the present invention. For example, alkyl ethers (e.g., ethyl cellulose, methyl cellulose) to improve coating properties, plasticizers to impart flexibility and abrasion resistance to the coating film (e.g., butylphthalyl, polyethylene glycol, diethyl citrate, tributyl phthalate), etc. , dibutyl phthalate, dihexyl phthalate, dioctyl phthalate, tricresyl phosphate, tributyl phosphate, trioctyl phosphate, tetrahydrofurfuryl oleate, oligomers of acrylic or methacrylic acid,) for visualizing images. As coloring substances, pigments such as acridine dyes, cyanine dyes, styryl dyes, triphenylmethane dyes and phthalocyanines, and photochromic substances (azide compounds, spiropyran compounds) for the purpose of visualizing images by exposure to light may be added. can. The amount of these additives added varies depending on the purpose for which they are used, but
Generally from 0.5 to 30% by weight based on total solids. The concentration of the photosensitive composition during coating is preferably in the range of 1 to 50% by weight, and the coating solvents used include methyl cellosolve, ethyl cellosolve, methyl cellosolve acetate, acetone,
Methyl ethyl ketone, methanol, dimethyl formamide, dimethyl sulfoxide or a mixed solvent thereof is suitable. However, in some cases, a mixed solvent of the above-mentioned solvent and another organic solvent may also be used. The photosensitive lithographic printing plate of the present invention is used in a conventional manner. That is, by exposing to light through a transparent original having line images, halftone dot images, etc., and then developing with an aqueous developer, a negative relief image is obtained with respect to the original. Light sources suitable for exposure include carbon arc lamps, mercury lamps, xenon lamps, metal halide lamps, strobes, and the like. Aqueous solutions used for development include aqueous solutions of sodium hydroxide, potassium hydroxide, sodium carbonate, sodium metasilicate, dibasic sodium phosphate, dibasic sodium phosphate, etc., and medium containing small amounts of surfactants and organic solvents. Acidic aqueous solutions such as hydrochloric acid, phosphoric acid, tartaric acid, citric acid, and acetic acid are used. Further, in an alkaline or acidic aqueous solution, a small amount of a surfactant or an organic solvent miscible with water may be added for the purpose of accelerating development and eliminating uneven development. The relief image thus obtained has high chemical resistance, withstands corrosive liquids such as nitric acid and ferric chloride solution, and is suitable as a lithographic printing plate. In addition, the relief image has strong oil sensitivity, mechanical strength, and adhesion to the support, making it excellent for use in planographic printing.Moreover, it has a long printing durability and has the excellent effect of being able to withstand printing on a large number of sheets. There is. As the support used in the photosensitive lithographic printing plate of the present invention, various supports can be used, as described above, but aluminum plates are particularly preferred. However, if the aluminum plate is used without treatment,
There are disadvantages in that the adhesion of the photosensitive composition is poor and the photosensitive composition decomposes. In order to eliminate this drawback, various proposals have been made in the past. For example, the surface of an aluminum plate is grained and then treated with silicate. (U.S. Patent No. 2714066
No.) Method of treatment with organic acid salts. (U.S. Patent No.
2714066) Method of treatment with phosphonic acids and their derivatives. (US Pat. No. 3,220,832) Method of treatment with potassium hexafluorozirconate. (US Pat. No. 2,946,683), a method of anodizing, and a method of treating with an aqueous solution of an alkali metal silicate after anodizing (US Pat. No. 3,181,461). The aluminum plate used as the support for the photosensitive lithographic printing plate of the present invention is preferably one whose surface has been grained, anodized, and then sealed. Methods for graining include degreasing the surface of the aluminum plate, then brush polishing,
There are ball polishing methods, chemical polishing methods, electrolytic etching methods, etc. For example, anodizing is performed by using an aluminum plate as an anode in an aqueous or non-aqueous solution of an inorganic salt such as phosphoric acid, chromic acid, boric acid, or sulfuric acid, or an organic acid such as oxalic acid or sulfamic acid, or a mixture of two or more of these acids. This is done by passing an electric current. Furthermore, the sealing treatment is carried out by immersion in a hot aqueous solution of a sodium silicate solution, hot water, and some inorganic or organic salts, or by using a steam bath. The photosensitive lithographic printing plate obtained by coating the photosensitive composition according to the present invention on the aluminum support treated in this way has good storage stability of the photosensitive layer and good adhesion to the support, and is easily exposed to light. It gives a clear relief image after development and can give printed matter with a clear image even in a very long printing process. [Example] Example 1 30 g of 2-hydroxyethyl methacrylate, 65 g of methyl methacrylate, 5 g of butyl acrylate
g, 0.4 g of azobisisobutyronitrile was dissolved in 300 ml of dioxane in a sealed tube purged with nitrogen gas.
The reaction was carried out at 65°C for 30 hours. After the reaction was completed, the reaction solution was poured into water 5 with stirring, and the resulting white precipitate was overdried to obtain Copolymer-1 (97.5 g). At room temperature, 5% diazo resin (Special Publication No. 39-17602)
Zinc chloride, a condensate of paradiazodiphenylamine and formaldehyde, described in the specification of No.
200 ml of an aqueous solution (sulfuric acid double salt) and 50 ml of a 10% ammonium hexafluorophosphate aqueous solution were mixed, and the resulting precipitate was immediately absorbed and filtered, followed by drying under reduced pressure at 30 to 40°C. 10 g of diazo resin-1 (hexafluorophosphate) which is almost insoluble in water and soluble in organic solvents such as methyl cellosolve and ethyl cellosolve was obtained. An aluminum plate is immersed in a 20% sodium phosphate aqueous solution to degrease it, electrolytically polished, anodized in sulfuric acid, and further treated with a sodium metasilicate aqueous solution to produce aluminum used as a support for lithographic printing plates. Plate-1 was produced. The following photosensitive liquid A was applied to this aluminum plate-1 using a rotary coater to obtain a photosensitive lithographic printing plate (A).
【表】
ここに得られた感光性平版印刷版(A)をメタルハ
ライドランプアイドルフイン2000(岩崎電機(株)社
製)で80cmの距離から30秒間画像露光し、次に示
した現像液−1で現像し、平版印刷版(A)を得た。
ベンジルアルコール 30g
アルカノールXC
(デユポン社製界面活性剤) 5g
水 1000ml
同様にして、次に示す比較感光板B,C,Dか
ら感光性平版印刷版(B),(C),(D)を得、露光現像し
て、それぞれ平版印刷版(B),(C),(D)を得た。[Table] The photosensitive lithographic printing plate (A) obtained here was imagewise exposed for 30 seconds from a distance of 80 cm using a metal halide lamp Idolfin 2000 (manufactured by Iwasaki Electric Co., Ltd.), and then the following developer solution-1 was used. This was developed to obtain a lithographic printing plate (A). Benzyl alcohol 30g Alkanol , exposure and development to obtain lithographic printing plates (B), (C), and (D), respectively.
【表】
〓メチルセロソルブ
但し、感光性平版印刷版(B),(C)は水、(D)は現像
液−1にて現像を行なつた。かくして得られた感
光性平版印刷版(A),(B),(C),(D)の保存安定性及び
平版印刷版(A),(B),(C),(D)の耐刷性を検討したと
ころ表1に示す結果が得られた。[Table] Methyl cellosolve However, photosensitive lithographic printing plates (B) and (C) were developed with water, and (D) was developed with developer-1. Storage stability of the thus obtained photosensitive lithographic printing plates (A), (B), (C), and (D) and printing durability of the lithographic printing plates (A), (B), (C), and (D) When examining the properties, the results shown in Table 1 were obtained.
【表】
但し、表中保存性は40℃、湿度80%の雰囲気中
に保存し、感光性平版印刷版製造直後のものと比
較して感度、解像力等の性能が変化する日数を表
わし、耐刷性は、枚葉オフセツト印刷機ハマダス
ターCDX900(浜田製作所製)にかけて上質紙に
印刷した。
この結果、本発明に係わる感光性平版印刷版は
保存安定性が優れ、高耐刷性を有することが確認
された。
実施例 2
実施例1と同様な方法で共重合体−2を合成し
た。共重合体−2の組成は2−ヒドロキシエチル
メタクリレート:メチルメタクリレート:ブチル
アクリレート:メタクリル酸=25:65:5:5
(モル比)であつた。実施例1で作成した感光液
Aにおいて、共重合体−1の代りに共重合体−2
に置き変えた感光液Bを実施例1で用いたアルミ
ニウム板−1、機械的研磨を行なつた後、メタ珪
酸ソーダ水溶液を用いて処理したアルミニウム板
−2、機械的研磨を行なつた後、ポリビニルホス
ホン酸水溶液で処理したアルミニウム板−3、機
械的研磨を行なつた後、ヘキサフルオロジルコン
酸カリウム溶液で処理したアルミニウム板−4お
よび機械的研磨を行なつた後、陽極酸化したアル
ミニウム板−5に回転塗布機を用いて塗布した。
かくして得られた感光性印刷版実施例1と同様に
して、露光し、次に示す現像液にて現像した。
メタケイ酸ソーダ 50g
アルカノールXC 10g
水 1000ml
得られた平版印刷版を実施例1に示す如く、印
刷機にかけて上質紙に印刷したところ、アルミニ
ウム板−1を使用した平版印刷版が最も高い耐刷
性を示した。
又、実施例1で使用した感光液Dをアルミニウ
ム板−1,2,3,4,5に塗布し、上記と同様
に処理し印刷したところ、アルミニウム板−1を
使用した平版印刷版は、他のアルミニウム板より
は高耐刷性を示したが、その差は僅かであつた。
したがつて、本発明に係わる感光性組成物を砂目
立て処理を施し陽極酸化した後、珪酸ソーダ水溶
液で封孔処理したアルミニウム板に塗布して得ら
れる感光性平版印刷版は、極めて高い耐刷力を有
する平版印刷版を与え、耐刷性を向上させる効果
は最大であることが確認された。
実施例 3
実施例1と同様にして共重合体3(組成モル
比:2−ヒドロキシエチルメタクリレート:メチ
ルメタクリレート:アクリロニトリル:メタクリ
ル酸=30:20:40:10)を合成した。実施例1で
作成した感光液Aにおいて共重合体−1の代りに
共重合体−3、オランダ国特許公開第7410806号
明細書に記載されているような樹脂エビコート
1031(シエル社製)、エピコート−1001(シエル
社製)、ポリビニルホルマール、又西独国特許公
開第2624074号明細中に記載されているような樹
脂エピコート−1006(シエル社製)及びLumitol
AM80(BASF社製)の1:1(重量比)混合
物、エピコート1002、エピコート1004及び
acryloid AT−70(Rohm and Hass社製)の
1:1:1(重量比)混合物に置き換えた感光液
を実施例1で用いたアルミニウム板−1に回転塗
布機を用いて塗布し、6種の感光性平版印刷版を
得た。これらの印刷版を下記に示した組成の現像
液を用いた以外は実施例2と同様に処理し、平版
印刷版(それぞれ比較18、20、21、22)を得た。
得られた各平版印刷版を印刷機にかけて、上質
紙に印刷した。この結果を表2に示す。
この結果、本発明において使用される樹脂は他
の樹脂に比で、より高い耐刷性を示すことが確認
された。
現像液組成
ドデシルサルフエート 20g
メタノール 90g
ベンジルアルコール 60g
アルギン酸ナトリウム 5g
イソブチルアルコール 20g
モノエタノールアミン 1g
水 800g[Table] However, the storage stability in the table indicates the number of days that performance such as sensitivity and resolution changes when stored in an atmosphere of 40°C and 80% humidity compared to the one immediately after production of the photosensitive lithographic printing plate. Printability was determined by printing on high-quality paper using a sheet-fed offset printing machine Hamadastar CDX900 (manufactured by Hamada Seisakusho). As a result, it was confirmed that the photosensitive lithographic printing plate according to the present invention has excellent storage stability and high printing durability. Example 2 Copolymer-2 was synthesized in the same manner as in Example 1. The composition of copolymer-2 is 2-hydroxyethyl methacrylate: methyl methacrylate: butyl acrylate: methacrylic acid = 25:65:5:5
(molar ratio). In the photosensitive liquid A prepared in Example 1, copolymer-2 was used instead of copolymer-1.
Aluminum plate-1, which was used in Example 1 with photosensitive liquid B replaced with , was subjected to mechanical polishing, and aluminum plate-2, which was treated with an aqueous sodium metasilicate solution, was subjected to mechanical polishing. , Aluminum plate-3 treated with polyvinylphosphonic acid aqueous solution, Aluminum plate-4 treated with potassium hexafluorozirconate solution after mechanical polishing, and Aluminum plate anodized after mechanical polishing. -5 was coated using a spin coater.
The photosensitive printing plate thus obtained was exposed to light in the same manner as in Example 1, and developed with the following developer. Sodium metasilicate 50g Alkanol Indicated. In addition, when the photosensitive liquid D used in Example 1 was applied to aluminum plates-1, 2, 3, 4, and 5 and processed and printed in the same manner as above, the lithographic printing plate using aluminum plate-1 was obtained. Although it showed higher printing durability than other aluminum plates, the difference was slight.
Therefore, a photosensitive lithographic printing plate obtained by applying the photosensitive composition according to the present invention to an aluminum plate that has been grained and anodized and then sealed with an aqueous sodium silicate solution has an extremely high printing durability. It was confirmed that the effect of providing a lithographic printing plate with high strength and improving printing durability was maximum. Example 3 Copolymer 3 (composition molar ratio: 2-hydroxyethyl methacrylate: methyl methacrylate: acrylonitrile: methacrylic acid = 30:20:40:10) was synthesized in the same manner as in Example 1. In the photosensitive liquid A prepared in Example 1, copolymer-3 was substituted for copolymer-1, and resin shrimp coat as described in Dutch Patent Publication No. 7410806 was used.
1031 (manufactured by Schiel), Epicote-1001 (manufactured by Schiel), polyvinyl formal, and the resins Epicote-1006 (manufactured by Schiel) and Lumitol as described in German Patent Publication No. 2624074.
1:1 (weight ratio) mixture of AM80 (manufactured by BASF), Epicote 1002, Epicote 1004 and
A photosensitive liquid substituted with a 1:1:1 (weight ratio) mixture of acryloid AT-70 (manufactured by Rohm and Hass) was applied to the aluminum plate-1 used in Example 1 using a spin coater, and six types of A photosensitive lithographic printing plate was obtained. These printing plates were treated in the same manner as in Example 2 except that a developer having the composition shown below was used to obtain lithographic printing plates (Comparisons 18, 20, 21, and 22, respectively). Each of the obtained lithographic printing plates was applied to a printing machine and printed on high-quality paper. The results are shown in Table 2. As a result, it was confirmed that the resin used in the present invention exhibits higher printing durability compared to other resins. Developer composition Dodecyl sulfate 20g Methanol 90g Benzyl alcohol 60g Sodium alginate 5g Isobutyl alcohol 20g Monoethanolamine 1g Water 800g
【表】
実施例 4
2−ヒドロキシエチルメタクリレート39g、メ
チルメタクリレート70g、過酸化ベンゾイル0.5
gを蒸溜精製したジオキサン200mlに溶解し、窒
素気流中、110℃で6時間反応させた。反応終了
後、反応溶液をアセトンにて希釈し、水中に注い
で生じた白色沈澱物を取乾燥して共重合体−4
103gを得た。
室温にて5%の実施例1で用いたと同じジアゾ
樹脂(塩化亜鉛・硫酸複塩)水溶液200mlと10%
のアンモニウムパークロレート水溶液50mlを混合
し、生じた沈澱を吸引過し、30〜40℃で減圧乾
燥した。水に殆んど不溶性でメチルセロソルブ、
エチルセロソルブ、ジメチルホルムアミド等の有
機溶媒に可溶性のジアゾ樹脂−2(パークロレー
ト塩)10gを得た。
実施例1で使用したアルミニウム板−1に、次
の感光液を回転塗布機を用いて塗布し、感光性平
版印刷版を得た。
共重合体−4 5.0g
ジアゾ樹脂−2 0.5g
セレローズエチルエーテル 0.2g
トリクレジフオスヘート 0.5g
ビクトリアブルーベースF4R(バデイツ
シユアニリンソーダフアブリーク社製) 0.1g
メチルセロソルブ 95ml
ジメチルフオルムアミド 5ml
この感光性平版印刷版を実施例2と同様な方法
で露光現象し、得られた平版印刷版をオフセツト
印刷機にかけ印刷したところ、画像良好な印刷物
が多数枚得られた。
実施例 5
実施例1と同様にして、共重合体−5〜14を合
成した。その組成(モル比)は、それぞれ次のと
おりである。
共重合体5:エチルメタクリレート−メチルメタ
クリレート−ブチルアクリレート=30:65:
5
〃 6:スチレン−メチルメタクリレート−
ブチルアクリレート−メタクリル酸=30:
50:15:5
〃 7:プロピルメタクリレート−ブチルア
クリレート−メタクリル酸=50:45:5
〃 8:メチルアクリレート−アクリロニト
リル−メタクリル酸=55:40:5
〃 9:メチルメタクリレート−ブチルメタ
クリレート−アクリル酸=60:35:5
〃 10:スチレン−エチルアクリレート−メ
タクリル酸=35:59:6
〃 11:ブチルアクリレート−アクリロニト
リル−アクリル酸=50:40:10
〃 12:メチルアクリレート−ブチルメタク
リレート=60:40
〃 13:メチルメタクリレート−エチルアク
リレート−メタクリル酸=40:50:10
〃 14:メチルメタクリレート−2−エチル
ヘキシルメタクリレート−メタクリル酸=
40:50:10。
次に、実施例1で作成した感光液A、およびA
において共重合体1の代りに共重合体2,3,
4、エピコート−1031(シエル社製)、共重合体
5〜14に置換えた感光液を実施例1で用いたアル
ミニウム板−1に回転塗布機を用いて塗布し、合
計5種類の感光性平版印刷版を得た。
これらの印刷版を実施例1と同様にして露光、
現像(現像液−1を使用)し、平版印刷版を得
た。
得られた各平版印刷版を実施例1と同じ印刷機
にかけて印刷しながら、薬品を使用したときの耐
刷性のテストを行なつた。
印刷方法は500放の上質紙に印刷する毎に、印
刷機を止め、印刷版画をプリントクリーナーで洗
つたのち、ウルトラプレートクリーナー(版面洗
浄薬品、A,B,C chemicd Co. Ltd製)で処
理し、4分間放置し、水で洗つたのち、印刷を再
開するという操作を繰り返した。この結果を表5
に示す。
この結果、本発明において使用される2−ヒド
ロキシエチルメタクリレートを組成分として含有
する樹脂を用いた平版印刷版は他の樹脂を用いた
平版印刷版に比べ、薬品による樹脂層の破壊がお
こりにくく、耐刷性が優れていることが確認され
た。[Table] Example 4 39g of 2-hydroxyethyl methacrylate, 70g of methyl methacrylate, 0.5g of benzoyl peroxide
g was dissolved in 200 ml of dioxane purified by distillation, and reacted at 110° C. for 6 hours in a nitrogen stream. After the reaction was completed, the reaction solution was diluted with acetone, poured into water, and the resulting white precipitate was taken and dried to obtain copolymer-4.
Obtained 103g. 200 ml of the same diazo resin (zinc chloride/sulfuric acid double salt) aqueous solution used in Example 1 at 5% and 10% at room temperature
50 ml of an aqueous ammonium perchlorate solution was mixed therein, and the resulting precipitate was filtered under suction and dried under reduced pressure at 30 to 40°C. Methyl cellosolve, almost insoluble in water,
10 g of diazo resin-2 (perchlorate salt) soluble in organic solvents such as ethyl cellosolve and dimethylformamide was obtained. The following photosensitive liquid was applied to the aluminum plate-1 used in Example 1 using a spin coater to obtain a photosensitive lithographic printing plate. Copolymer-4 5.0g Diazo resin-2 0.5g Cererose ethyl ether 0.2g Tricle difluoride 0.5g Victoria Blue Base F4R (manufactured by Vadeitsch Aniline Sodafabrik) 0.1g Methyl cellosolve 95ml Dimethyl formamide 5ml This photosensitive material The lithographic printing plate was exposed to light in the same manner as in Example 2, and the obtained lithographic printing plate was printed on an offset printing machine, and many printed matter with good images were obtained. Example 5 Copolymers-5 to 14 were synthesized in the same manner as in Example 1. Their compositions (molar ratios) are as follows. Copolymer 5: Ethyl methacrylate-methyl methacrylate-butyl acrylate = 30:65:
5 〃 6: Styrene-methyl methacrylate-
Butyl acrylate - methacrylic acid = 30:
50:15:5 〃 7: Propyl methacrylate - butyl acrylate - methacrylic acid = 50:45:5 〃 8: Methyl acrylate - acrylonitrile - methacrylic acid = 55:40:5 〃 9: Methyl methacrylate - butyl methacrylate - acrylic acid = 60:35:5 〃 10: Styrene - ethyl acrylate - methacrylic acid = 35:59:6 〃 11: Butyl acrylate - acrylonitrile - acrylic acid = 50:40:10 〃 12: Methyl acrylate - butyl methacrylate = 60:40 〃 13: Methyl methacrylate - ethyl acrylate - methacrylic acid = 40:50:10 〃 14: Methyl methacrylate - 2-ethylhexyl methacrylate - methacrylic acid =
40:50:10. Next, photosensitive liquids A and A prepared in Example 1 were prepared.
In place of copolymer 1, copolymer 2, 3,
4. A photosensitive liquid substituted with Epicoat-1031 (manufactured by Ciel Co., Ltd.) and copolymers 5 to 14 was applied to the aluminum plate-1 used in Example 1 using a rotary coater, and a total of 5 types of photosensitive planographic plates were prepared. Got the print version. These printing plates were exposed in the same manner as in Example 1,
It was developed (using developer-1) to obtain a lithographic printing plate. Each of the obtained lithographic printing plates was printed using the same printing machine as in Example 1, and a printing durability test using chemicals was conducted. The printing method is that after every 500 prints on high-quality paper, the printing press is stopped, the print is washed with print cleaner, and then treated with Ultra Plate Cleaner (plate cleaning chemicals, manufactured by A, B, C chemicd Co. Ltd.) The printer was left to stand for 4 minutes, rinsed with water, and then resumed printing. This operation was repeated. This result is shown in Table 5.
Shown below. As a result, in the lithographic printing plate using a resin containing 2-hydroxyethyl methacrylate as a component used in the present invention, the resin layer is less likely to be destroyed by chemicals than in the lithographic printing plate using other resins. It was confirmed that the printing durability was excellent.
【表】【table】
Claims (1)
を縮合反応させて得られる水溶性感光性ジアゾ樹
脂と、ハロゲン化ルイス酸塩または過ハロゲン酸
塩とを反応させて得られる、感光性かつ有機溶媒
に可溶で殆んど水に不溶性の反応生成物(イ)、
および有機溶媒可溶で殆んど水に不溶性の親油性
フイルム形成性合成樹脂(ロ)、を含む感光性組
成物を、表面を砂目立て処理を施し陽極酸化した
後、封孔処理したアルミニウム板に塗設してなる
感光性平版印刷版であつて、前記親油性フイルム
形成性合成樹脂が2−ヒドロキシエチルメタクリ
レート−メチルメタクリレート共重合体、2−ヒ
ドロキシエチルメタクリレート−メチルメタクリ
レート−ブチルアクリレート共重合体、2−ヒド
ロキシエチルメタクリレート−メチルメタクリレ
ート−ブチルアクリレート−メタクリル酸共重合
体および2−ヒドロキシエチルメタクリレート−
メチルメタクリレート−アクリロニトリル−メタ
クリル酸共重合体から選ばれた1種以上のもので
あることを特徴とする感光性平版印刷版。1 A photosensitive and organic solvent-friendly diazo resin obtained by reacting a water-soluble photosensitive diazo resin obtained by a condensation reaction of a diazo compound and a carbonyl-containing organic condensing agent with a halogenated Lewis acid salt or a perhalogenated salt. A reaction product (a) that is soluble and almost insoluble in water;
and a lipophilic film-forming synthetic resin that is soluble in an organic solvent and almost insoluble in water (b), the surface of which is grained, anodized, and then sealed. 2-hydroxyethyl methacrylate-methyl methacrylate copolymer, 2-hydroxyethyl methacrylate-methyl methacrylate-butyl acrylate copolymer, and a photosensitive lithographic printing plate coated with oleophilic film-forming synthetic resin. , 2-hydroxyethyl methacrylate-methyl methacrylate-butyl acrylate-methacrylic acid copolymer and 2-hydroxyethyl methacrylate-
1. A photosensitive lithographic printing plate comprising one or more selected from methyl methacrylate-acrylonitrile-methacrylic acid copolymers.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58878A JPS5498613A (en) | 1978-01-09 | 1978-01-09 | Photosensitive composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58878A JPS5498613A (en) | 1978-01-09 | 1978-01-09 | Photosensitive composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5498613A JPS5498613A (en) | 1979-08-03 |
JPS6142251B2 true JPS6142251B2 (en) | 1986-09-19 |
Family
ID=11477876
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58878A Granted JPS5498613A (en) | 1978-01-09 | 1978-01-09 | Photosensitive composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5498613A (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5938747A (en) * | 1982-08-27 | 1984-03-02 | Okamoto Kagaku Kogyo Kk | Photosensitive lithographic plate |
JPS5997136A (en) * | 1982-11-26 | 1984-06-04 | Fuji Photo Film Co Ltd | Photosensitive composition |
JP2571354B2 (en) * | 1983-06-01 | 1997-01-16 | 富士写真フイルム株式会社 | Photosensitive composition |
JPS59222842A (en) * | 1983-06-01 | 1984-12-14 | Fuji Photo Film Co Ltd | Photosensitive composition for lithographic plate |
JPH0782236B2 (en) * | 1984-10-12 | 1995-09-06 | 三菱化学株式会社 | Photosensitive composition |
JPS61144643A (en) * | 1984-12-18 | 1986-07-02 | Konishiroku Photo Ind Co Ltd | Photosensitive composition |
EP0441638B1 (en) | 1990-02-08 | 1999-10-13 | Konica Corporation | Light sensitive litho printing plate |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5030604A (en) * | 1973-07-23 | 1975-03-26 | ||
JPS50118802A (en) * | 1974-02-28 | 1975-09-17 | ||
JPS52110103A (en) * | 1976-03-11 | 1977-09-16 | Toray Industries | Photoosensitive resin composition |
JPS52110102A (en) * | 1976-03-11 | 1977-09-16 | Toray Industries | Photoosensitive resin composition |
GB1488864A (en) * | 1974-01-25 | 1977-10-12 | Coates Brothers & Co | Photosensitive composition |
-
1978
- 1978-01-09 JP JP58878A patent/JPS5498613A/en active Granted
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5030604A (en) * | 1973-07-23 | 1975-03-26 | ||
GB1488864A (en) * | 1974-01-25 | 1977-10-12 | Coates Brothers & Co | Photosensitive composition |
JPS50118802A (en) * | 1974-02-28 | 1975-09-17 | ||
JPS52110103A (en) * | 1976-03-11 | 1977-09-16 | Toray Industries | Photoosensitive resin composition |
JPS52110102A (en) * | 1976-03-11 | 1977-09-16 | Toray Industries | Photoosensitive resin composition |
Also Published As
Publication number | Publication date |
---|---|
JPS5498613A (en) | 1979-08-03 |
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