JPS61190096A - Electroplating installation - Google Patents
Electroplating installationInfo
- Publication number
- JPS61190096A JPS61190096A JP2848185A JP2848185A JPS61190096A JP S61190096 A JPS61190096 A JP S61190096A JP 2848185 A JP2848185 A JP 2848185A JP 2848185 A JP2848185 A JP 2848185A JP S61190096 A JPS61190096 A JP S61190096A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- strip
- plating solution
- steel strip
- anodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electroplating Methods And Accessories (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
この発明は電気めっき設備、特に垂直方向に走行する金
属ストリップの片側または両側に連続的に電気めっきす
る設備に関する。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to an electroplating installation, in particular an installation for continuous electroplating on one or both sides of a vertically running metal strip.
この発明は、たとえば銅帯の片側または両側に亜鉛、す
す、ニッケルなどを電着する設備に応用される。The invention is applied, for example, to equipment for electrodepositing zinc, soot, nickel, etc. on one or both sides of a copper strip.
(従来の技術)
ストリップの片側または両側に電気めっきする方法とし
て、ストリップを垂直方向に走行させながら連続的に電
気めっきする方法がある。このような電気めっきを行な
う、いわゆる縦型電気めっき設備では、めっき液槽内に
一組の板状の電極(アノード)が電極面が垂直になるよ
うにして向かい合っており、電極の上方および下方にそ
れぞれコンダクタ−ロールを配置している。電極の間に
はめっき液が供給される。電極間にコンダクタ−ロール
に案内されたストリップ(カソード)を通過させながら
めっきする。めっき液供給装置により、あるいは電極を
めっき液中に浸漬して電極間にめっき液を供給する。(Prior Art) As a method of electroplating one or both sides of a strip, there is a method of continuously electroplating while running the strip in a vertical direction. In so-called vertical electroplating equipment that performs this type of electroplating, a pair of plate-shaped electrodes (anodes) are placed in a plating solution tank and face each other with their electrode surfaces perpendicular. A conductor roll is placed in each. A plating solution is supplied between the electrodes. Plating is carried out by passing a strip (cathode) guided by a conductor roll between the electrodes. The plating solution is supplied between the electrodes using a plating solution supply device or by immersing the electrodes in the plating solution.
このような設備の例として、特願昭513−89792
号公報に開示された電気めっき設備がある。As an example of such equipment, Japanese Patent Application No. 513-89792
There is an electroplating equipment disclosed in the publication.
(発明が解決しようとする問題点)
ところで、従来の縦型電気めっき設備では、片面めっき
の場合に非めっき面の側端側にめっきの廻込みが生しる
という問題があった。すなわち、一般にストリップの側
端側は電流密度が他の部分よりも高くなるので、非めっ
き面に向かう電極に電圧を印加しなくてもこの面に僅か
ではあるがめつき金属が電着する。(Problems to be Solved by the Invention) By the way, in conventional vertical electroplating equipment, there is a problem in that when plating one side, the plating runs around the side edge of the non-plated surface. That is, since the current density is generally higher on the side edge side of the strip than on other parts, a small amount of plating metal is electrodeposited on this side even if no voltage is applied to the electrode facing the non-plated side.
(問題点を解決するための手段)
この発明の電気めっき設備はめっき液槽、板面が垂直に
なるようにしてめっき液槽内に配置された相対する対を
なす板状電極、電極の上方および下方にそれぞれ配置さ
れたコンダクタ−ロール。(Means for Solving the Problems) The electroplating equipment of the present invention includes a plating solution tank, a pair of opposing plate electrodes arranged in the plating solution tank with the plate surfaces vertical, and an upper part of the electrodes. and a conductor roll placed below.
およびめっき液供給装置とからなっている。相対する電
極はめっき室を形成している。and a plating solution supply device. Opposing electrodes form a plating chamber.
そして、前記電極の間にあるストリップの側端側を覆う
電気絶縁性エツジマスクがストリップ幅方向に出入自在
に設けられている。An electrically insulating edge mask covering the side edges of the strip between the electrodes is provided so as to be movable in and out in the width direction of the strip.
(作用)
片面めっきを行う場合、めっきする面に相対する電極の
みに電圧を印加される。エツジマスクはストリップの両
側端側を覆うように位置が調整される1両側端側はエツ
ジマスクにより覆われているので、電圧が印加されない
電極に面する側端側にはめっきが形成されるに十分な電
流は流れない、したがって、この部分にめっきの廻込み
は生じない。(Function) When performing single-sided plating, voltage is applied only to the electrode facing the surface to be plated. The edge mask is positioned so as to cover both ends of the strip.Since both ends are covered by the edge mask, sufficient plating is formed on the side facing the electrode to which no voltage is applied. No current flows, so there is no plating in this area.
(実施例)
第1図はこの発明の実施例を示すもので、縦型電気めっ
き設備の縦断面図である。(Example) FIG. 1 shows an example of the present invention, and is a longitudinal sectional view of a vertical electroplating equipment.
図面に示すように、縦型電気めっき設備は主としてめっ
き液槽l、2組の長方形板状電極5.コンダクタ−ロー
ル31.32、めっき液供給装置i22およびエツジマ
スク35とから構成されている。As shown in the drawing, the vertical electroplating equipment mainly consists of a plating solution tank 1, two sets of rectangular plate electrodes 5. It is composed of conductor rolls 31 and 32, a plating solution supply device i22, and an edge mask 35.
めっき液槽lは上方に開口する容器よりなっている。め
っき液槽lは上方のめっき室18から流れ落ちて来ため
っき液Eを底部で回収する。The plating solution tank 1 consists of a container that opens upward. The plating solution tank 1 collects the plating solution E flowing down from the upper plating chamber 18 at the bottom.
各電極5は長方形板状をした不溶性電極で、板面が相対
する一対よりなっている。そして、板面を垂直にし、め
っき室を形成するようにしてめっき液槽1内に支持され
ている。電極5は給電導帯(図示しない)が接続されて
おり、ストリップSに対し正電位に維持される。Each electrode 5 is an insoluble electrode in the shape of a rectangular plate, and consists of a pair of plate surfaces facing each other. The plate is supported in the plating solution tank 1 with its surface vertical and forming a plating chamber. The electrode 5 is connected to a feeding conductive band (not shown) and is maintained at a positive potential with respect to the strip S.
上記電極5の直上には一対のめっき液供給ヘッダー22
が配置されている。各めっき液供給ヘッダー22は上記
めっき室18を指向するノズル23を備えている。Directly above the electrode 5 is a pair of plating solution supply headers 22.
is located. Each plating solution supply header 22 is equipped with a nozzle 23 directed toward the plating chamber 18 .
また、電極5の下端には出入自在の締切り板を備えた液
締切り装置9が取り付けられている。液締切り装置9は
めっき室18の下端の開口を締切り板によりv/4節し
て、めっき室1Bから流出するめっき液Eの量を調節す
る
上記めっき液槽1の底部にはめっき液循環管25が接続
されており、めっき液供給ヘッダー22にめっき液循環
ポンプ26によりめっき液Eが供給される。Further, a liquid shut-off device 9 is attached to the lower end of the electrode 5 and includes a shut-off plate that can be moved in and out. The liquid shut-off device 9 divides the opening at the lower end of the plating chamber 18 by a closing plate to adjust the amount of the plating liquid E flowing out from the plating chamber 1B.A plating liquid circulation pipe is provided at the bottom of the plating liquid tank 1. 25 is connected, and the plating solution E is supplied to the plating solution supply header 22 by a plating solution circulation pump 26.
電極5の上方および下方にそれぞれコンダクp−a−ル
31.32が配置されている。コンダクタ−ロール31
.32は電極5との間に一定の距離を保って走行するよ
うにストリップSを案内する。Conductor bars 31, 32 are arranged above and below the electrode 5, respectively. Conductor roll 31
.. 32 guides the strip S so as to keep a constant distance between it and the electrode 5.
コンダクタ−ロール31.32に接触するストリップS
は、ta5に対し負電位に維持されている。Strip S in contact with conductor roll 31.32
is maintained at a negative potential with respect to ta5.
第2図および第3図に示すように、前記電極5の間には
電気絶縁材料で作られた一対のエツジマスク35が出入
自在に設けられている。エツジマスク35はストリップ
Sの側縁部を覆うようにコ字形の断面形状をしており、
上下にほぼ電極5の長さ一杯に延びている。As shown in FIGS. 2 and 3, a pair of edge masks 35 made of an electrically insulating material are provided between the electrodes 5 so as to be movable in and out. The edge mask 35 has a U-shaped cross section so as to cover the side edge of the strip S.
It extends vertically to almost the full length of the electrode 5.
めっき液槽lの側壁3を貫通する駆動棒37がエツジマ
スク35の背部に連結されている。駆動棒37はこれに
連結された油圧シリンダーなどの駆動装置(図示しない
)によりエツジマスク35を進退する。A drive rod 37 passing through the side wall 3 of the plating solution tank 1 is connected to the back of the edge mask 35. The drive rod 37 advances and retreats from the edge mask 35 by a drive device (not shown) such as a hydraulic cylinder connected thereto.
上記エツジマスク35の背部にはゴム製の遮蔽シート3
9の一端が固着されており、遮蔽シート38の他端はめ
っき液槽lの側壁3内面に・固着されている。エツジマ
スク35の進退に応じて遮蔽シート3Sは伸縮できるよ
うに、エツジマスク35が後退しているときには遮蔽シ
ート39はたるんでいる。遮蔽シート39はエツジマス
ク35の背部において、相対する電極5を電気的に遮断
している。A rubber shielding sheet 3 is attached to the back of the edge mask 35.
One end of the shielding sheet 38 is fixed, and the other end of the shielding sheet 38 is fixed to the inner surface of the side wall 3 of the plating solution tank l. The shielding sheet 39 is slack when the edge mask 35 is retracted so that the shielding sheet 3S can expand and contract as the edge mask 35 moves forward and backward. The shielding sheet 39 electrically blocks the opposing electrodes 5 at the back of the edge mask 35 .
つぎに、以上のように構成された電気めっき設備の作用
について説明する。Next, the operation of the electroplating equipment configured as described above will be explained.
めっき液供給ノズル23からめっき室18にめっき液が
供給される。めっき液Eがめつき室18の上端まで満た
さるように、液締切り装置9によりめっき液の流出量を
調整する。A plating solution is supplied from the plating solution supply nozzle 23 to the plating chamber 18 . The outflow amount of the plating solution is adjusted by the liquid shutoff device 9 so that the plating solution E fills the plating chamber 18 up to the upper end.
片面めっきを行う場合、めっきする面に相対する電極5
のみに電圧が加えられる。エツジマスク35はストリッ
プSの両側端側を覆うように、駆動棒37により位置が
調整される0両側端側はエツジマスク35により覆われ
ているので、零電位の電極5に面する側端側にはめっき
が形成されるに十分な電流は流れない、したがって、こ
の部分にめっきの廻込みは生じない、エツジマスク35
による側端側の遮蔽幅は電流密度、極間距離その他のめ
っき条件によって異なるが、10〜100m■程度であ
る。When performing single-sided plating, the electrode 5 facing the surface to be plated
Voltage is applied only to The position of the edge mask 35 is adjusted by the driving rod 37 so as to cover both ends of the strip S. Since both ends are covered by the edge mask 35, the side end facing the zero potential electrode 5 is The edge mask 35 does not allow sufficient current to form the plating, so the plating does not penetrate into this area.
The shielding width on the side end side varies depending on the current density, interpolar distance, and other plating conditions, but is approximately 10 to 100 m.
また、遮蔽シート39はエツジマスク35の背部におい
て、正電位の電極5と零電位の電極5との間を電気的に
遮断する。したがって、両電極5の間に無駄な電流は流
れない。Further, the shielding sheet 39 electrically isolates the positive potential electrode 5 and the zero potential electrode 5 at the back of the edge mask 35 . Therefore, no unnecessary current flows between both electrodes 5.
ここで、上記設備による電気めっきの具体例について説
明する。Here, a specific example of electroplating using the above equipment will be described.
電解条件
めっき液中(1)ZnSOa 7H2O濃度: 250
gelめっき液温度=60℃
めっき液pH:1.5
めっき液中のフリーH2SO4濠度:21g/立アノー
ド〜カソード間距離:9+am
液量
静圧パッド: 2 m3/sin 片側補助へラダ
ー: 0.5 m3/履in 片側静圧(静圧パッド
の領域) : 425 am H20エツジマスク:
鋼帯側端側遮蔽幅5II11(イ)両面めっき
銅帯寸法:厚さ0.8 mmX幅1500 am目標め
っき付着量:両面とも20 g/m2(rl)片面めっ
き
鋼帯寸法:厚さ0.75鳳薦×幅1500層層目標めっ
き付着量二表面20 g/ls2裏面Q g/ra2
この発明では上記表から明らかなように、非めっき面側
端側へのめっきの廻込みは生じない。Electrolytic conditions in plating solution (1) ZnSOa 7H2O concentration: 250
Gel plating solution temperature = 60°C Plating solution pH: 1.5 Free H2SO4 in plating solution: 21 g/vertical anode-cathode distance: 9+am Liquid volume static pressure pad: 2 m3/sin One side auxiliary ladder: 0. 5 m3/in Unilateral static pressure (static pressure pad area): 425 am H20 edge mask:
Steel strip side end shielding width 5II11 (a) Dimensions of double-sided plated copper strip: Thickness 0.8 mm x width 1500 am Target coating amount: 20 g/m2 (rl) on both sides Dimensions of single-sided plated steel strip: Thickness 0. 75 thickness x width 1500 layers Target amount of plating coating on two surfaces 20 g/ls2 Back surface Q g/ra2 As is clear from the table above, in this invention, the plating does not spread to the end of the non-plated surface.
この発明は上記実施例に限られるものではなく、たとえ
ばめっき液槽内に1組の電極を配置してもよく、またエ
ツジマスクを電動装置により出入させてもよい。The present invention is not limited to the above-described embodiment; for example, a set of electrodes may be disposed within the plating solution tank, and the edge mask may be moved in and out by an electric device.
(発明の効果)
以上述べたように、この発明によれば片面めっきを行う
場合に、非めっき面の側端側へめっきが廻り込むことは
ない、したがって、非めっき面が全くめっきされない良
質の片面めっきが得られる。(Effects of the Invention) As described above, according to the present invention, when performing single-sided plating, the plating does not go around to the side edge side of the non-plated surface. Therefore, the non-plated surface is completely unplated. Single-sided plating is obtained.
第1図はこの発明の一例を示すもので、縦形電気めっき
設備の縦断面図、第2図は上記設備の主要部の側面図、
および第3図は第2図の■−■線に沿う断面図である。
■・・・めっき液槽、5・・・電極、18・・・めっき
室。
22・・・めっき液供給ヘッダー、23・・・ノズル、
26・・・めっき液循環ポンプ、11.32・・・コン
ダクタ−ロール、35・・・エツジマスク、37・・・
駆動棒、38・・・遮蔽シート、S・・・ストリップ、
E・・・めっき液。FIG. 1 shows an example of the present invention, and is a longitudinal sectional view of a vertical electroplating equipment, and FIG. 2 is a side view of the main parts of the equipment.
and FIG. 3 is a sectional view taken along the line ■-■ in FIG. 2. ■... Plating solution tank, 5... Electrode, 18... Plating chamber. 22... Plating solution supply header, 23... Nozzle,
26... Plating solution circulation pump, 11.32... Conductor roll, 35... Edge mask, 37...
Drive rod, 38... Shielding sheet, S... Strip,
E...Plating solution.
Claims (1)
ようにしてめっき液槽内に配置された対をなす板状電極
、電極の上方および下方にそれぞれ配置されたコンダク
ターロール、およびめっき液供給装置とからなる設備に
おいて、前記電極の間にある金属ストリップの側端側を
覆う電気絶縁性エッジマスクが金属ストリップ幅方向に
出入自在に設けられたことを特徴とする電気めっき設備
。A plating solution tank, a pair of plate electrodes arranged in the plating solution tank so that their plate surfaces face each other vertically to form a plating chamber, a conductor roll arranged above and below the electrodes, and a plating chamber. 1. An electroplating equipment comprising a liquid supply device, characterized in that an electrically insulating edge mask covering the side end side of the metal strip between the electrodes is provided so as to be movable in and out in the width direction of the metal strip.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2848185A JPS61190096A (en) | 1985-02-18 | 1985-02-18 | Electroplating installation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2848185A JPS61190096A (en) | 1985-02-18 | 1985-02-18 | Electroplating installation |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61190096A true JPS61190096A (en) | 1986-08-23 |
Family
ID=12249844
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2848185A Pending JPS61190096A (en) | 1985-02-18 | 1985-02-18 | Electroplating installation |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61190096A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0273881A2 (en) * | 1986-12-18 | 1988-07-06 | CENTRO SVILUPPO MATERIALI S.p.A. | Process and device for continuous electrolytic treatment of metals |
EP0733724A1 (en) * | 1995-03-23 | 1996-09-25 | Sms Schloemann-Siemag Aktiengesellschaft | Apparatus for separating metals from metal containing electrolytes |
KR20010018167A (en) * | 1999-08-17 | 2001-03-05 | 신현준 | Electroplating apparatus of metal strip with vertical type electroplating cell |
KR100376477B1 (en) * | 1998-12-21 | 2003-06-12 | 주식회사 포스코 | Corner overplating prevention device in vertical electroplating bath with fusible anode |
JP2015155563A (en) * | 2014-02-20 | 2015-08-27 | 住友金属鉱山株式会社 | Apparatus and method for continuous electrolytic plating, metalized resin film and production method of the film |
-
1985
- 1985-02-18 JP JP2848185A patent/JPS61190096A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0273881A2 (en) * | 1986-12-18 | 1988-07-06 | CENTRO SVILUPPO MATERIALI S.p.A. | Process and device for continuous electrolytic treatment of metals |
EP0733724A1 (en) * | 1995-03-23 | 1996-09-25 | Sms Schloemann-Siemag Aktiengesellschaft | Apparatus for separating metals from metal containing electrolytes |
KR100376477B1 (en) * | 1998-12-21 | 2003-06-12 | 주식회사 포스코 | Corner overplating prevention device in vertical electroplating bath with fusible anode |
KR20010018167A (en) * | 1999-08-17 | 2001-03-05 | 신현준 | Electroplating apparatus of metal strip with vertical type electroplating cell |
JP2015155563A (en) * | 2014-02-20 | 2015-08-27 | 住友金属鉱山株式会社 | Apparatus and method for continuous electrolytic plating, metalized resin film and production method of the film |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4183799A (en) | Apparatus for plating a layer onto a metal strip | |
US3567595A (en) | Electrolytic plating method | |
KR100487646B1 (en) | Process and a device for electrolytic pickling of metallic strip | |
CN113913903B (en) | Electroplating device and electroplating method | |
JPS61190096A (en) | Electroplating installation | |
CA1211404A (en) | Electrolytically treating metal strip between horizontal electrodes with slits for electrolyte feed | |
US4248674A (en) | Anodizing method and apparatus | |
CN215947439U (en) | Electroplating device | |
US4505785A (en) | Method for electroplating steel strip | |
CA1165271A (en) | Apparatus and method for plating one or both sides of metallic strip | |
CA1313508C (en) | Electrolytic plating apparatus with sets of anode orifices for supply and discharge of solution | |
KR960010906A (en) | Devices for continuously electroplating alloys | |
CN218372574U (en) | Arc guiding structure of electroplating bath of integrated circuit lead frame | |
JPS61190093A (en) | Electroplating installation | |
JPS61190094A (en) | Electroplating installation | |
CN218666363U (en) | Conveniently-installed anode conducting plate for barrel plating line | |
JPS61190095A (en) | Electroplating installation | |
JPS59116398A (en) | Horizontal type electroplating cell | |
JPS60149796A (en) | Electroplating method of strip | |
JPS6393892A (en) | Polishing device for conductive roll of electroplating line | |
JPS63303093A (en) | Vertical type electrolytic plating device | |
JPH0126771Y2 (en) | ||
JPS5824934Y2 (en) | Continuous single-sided electroplating equipment for metal strips | |
JP3027118B2 (en) | Vertical electroplating apparatus and electrochrome plating method | |
KR100349153B1 (en) | An electic plating apparatus, and a method for eliminating band mark on strip using it |