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JPS6095991U - cleaning nozzle - Google Patents

cleaning nozzle

Info

Publication number
JPS6095991U
JPS6095991U JP18681883U JP18681883U JPS6095991U JP S6095991 U JPS6095991 U JP S6095991U JP 18681883 U JP18681883 U JP 18681883U JP 18681883 U JP18681883 U JP 18681883U JP S6095991 U JPS6095991 U JP S6095991U
Authority
JP
Japan
Prior art keywords
cleaning
cleaning nozzle
utility
air injection
nozzle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18681883U
Other languages
Japanese (ja)
Inventor
安男 和田
Original Assignee
株式会社 東京精密
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社 東京精密 filed Critical 株式会社 東京精密
Priority to JP18681883U priority Critical patent/JPS6095991U/en
Publication of JPS6095991U publication Critical patent/JPS6095991U/en
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning In General (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の説明図、第2図は水流と空気噴射層と
の関係を示す説明図、第3図は他の実施例の説明図。 1・・・ウニ六、2・・・噴出ノズル、3・・・空気噴
出一孔、4・・・水の噴出孔、5・・・空気噴出スリッ
ト。
FIG. 1 is an explanatory diagram of the present invention, FIG. 2 is an explanatory diagram showing the relationship between water flow and an air injection layer, and FIG. 3 is an explanatory diagram of another embodiment. 1...Six sea urchins, 2...Blowout nozzle, 3...One air blowout hole, 4...Water blowout hole, 5...Air blowout slit.

Claims (1)

【実用新案登録請求の範囲】 (1)被加工物に対して洗浄水を噴出する洗浄装置にお
いて被加工物表面に向って洗浄水の噴出孔を横に設け、
その下方に加圧空気の噴射孔を横に設けてなる洗浄装置
の洗浄用ノズル―(2)  実用新案登録請求の範囲第
1項の記載において、空気の噴射孔は細孔を横に連続し
て設けて構成される洗浄用ノズル。 (3)実用新案登録請求の範囲第1項の記載において、
空気の噴射孔は横方向に長いスリットを設けて構成され
る洗浄用ノズル。
[Claims for Utility Model Registration] (1) In a cleaning device that sprays cleaning water onto a workpiece, a cleaning water jetting hole is provided horizontally toward the surface of the workpiece,
A cleaning nozzle for a cleaning device having a pressurized air injection hole horizontally provided below the nozzle (2) In the statement of claim 1 of the utility model registration, the air injection hole is horizontally continuous with the pores. A cleaning nozzle configured with (3) In the statement in paragraph 1 of the claims for utility model registration,
The air injection hole is a cleaning nozzle with a long horizontal slit.
JP18681883U 1983-12-02 1983-12-02 cleaning nozzle Pending JPS6095991U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18681883U JPS6095991U (en) 1983-12-02 1983-12-02 cleaning nozzle

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18681883U JPS6095991U (en) 1983-12-02 1983-12-02 cleaning nozzle

Publications (1)

Publication Number Publication Date
JPS6095991U true JPS6095991U (en) 1985-06-29

Family

ID=30403416

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18681883U Pending JPS6095991U (en) 1983-12-02 1983-12-02 cleaning nozzle

Country Status (1)

Country Link
JP (1) JPS6095991U (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001000336A1 (en) * 1999-06-24 2001-01-04 Sumitomo Heavy Industries, Ltd. Method and device for washing by fluid spraying
KR100292064B1 (en) * 1999-05-13 2001-06-01 황인길 A nozzle device for a developing process of a semiconductor wafer
US7267130B2 (en) 2000-09-22 2007-09-11 Dainippon Screen Mfg. Co., Ltd. Substrate processing apparatus
US7479205B2 (en) 2000-09-22 2009-01-20 Dainippon Screen Mfg. Co., Ltd. Substrate processing apparatus
JP2013502307A (en) * 2009-08-19 2013-01-24 ユニリーバー・ナームローゼ・ベンノートシヤープ Equipment for washing dough

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100292064B1 (en) * 1999-05-13 2001-06-01 황인길 A nozzle device for a developing process of a semiconductor wafer
WO2001000336A1 (en) * 1999-06-24 2001-01-04 Sumitomo Heavy Industries, Ltd. Method and device for washing by fluid spraying
US6726777B1 (en) 1999-06-24 2004-04-27 Sumitomo Heavy Industries Ltd. Cleaning method and apparatus using fluid spraying
US7267130B2 (en) 2000-09-22 2007-09-11 Dainippon Screen Mfg. Co., Ltd. Substrate processing apparatus
US7428907B2 (en) 2000-09-22 2008-09-30 Dainippon Screen Mfg. Co., Ltd. Substrate processing apparatus
US7479205B2 (en) 2000-09-22 2009-01-20 Dainippon Screen Mfg. Co., Ltd. Substrate processing apparatus
JP2013502307A (en) * 2009-08-19 2013-01-24 ユニリーバー・ナームローゼ・ベンノートシヤープ Equipment for washing dough

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