JPS60205452A - Exposing method - Google Patents

Abstract

PURPOSE:To form continuously patterns on a substrate having a long size in the moving direction with high patterning accuracy by using an endless mask as a photomask for exposure and carrying out continuous exposure while moving the photomask and the substrate at the same speed. CONSTITUTION:A flexible substrate 1 to be exposed is coated with a photosensitive substance. The preferred material of the substrate 1 is polyimide resin or fluororesin. An endless flexible mask 2 has patterns of prescribed line density formed at a prescribed pitch. The substrate 1 and the mask 2 are moved at the same speed with drive rollers 4-1-6-2, and exposure is carried out with an exposer 3 during movement from a slit 7-1 to a slit 7-2. Slight reverse tension is applied to the drive rollers 4-1, 4-2 so as to prevent the slacking of the film. The exposed substrate 1 is sent to a developing device and developed at a stroke.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention provides a method for applying a photosensitive material to a substrate long in one direction.
The present invention relates to an exposure method using an exposure photomask.

Conventionally, in the method of exposing a substrate coated with a photosensitive material using an exposure photomask, the size of the mask used in the exposure device a is limited, and when the substrate is long in one direction, , unless the exposure is repeated while feeding the substrate multiple times in steps, the mask is a hard mask, so there is no flexibility in contacting the substrate during exposure, and flexible substrates cannot be used with a flexible substrate. There are disadvantages such as the inability to use light, the limitation to flat substrates, and the low patterning accuracy of about 1.00 liters when screen printing resist for Yunching.

The present invention has been made in view of the drawbacks of the conventional art described in Section 2, and is a method of continuously exposing a photosensitive material to t4 Mi L onto a long substrate in one direction using an exposure photomask. It is an object of the present invention to provide an exposure method that enables highly accurate exposure, has high patterning accuracy, and can use an inexpensive substrate.

That is, the present invention exposes a substrate having a photosensitive material using an exposure photomask at an exposure direction θ, a temperature of 7, mJ.
3. ,! M&L 13iJ 3i27t)
The present invention provides an h.tau.1 optical method in which the 9.1 characteristics are 7 and 7 and 9.1.

Hereinafter, the present invention will be explained in a more detailed manner than in the drawings (2).
stomach) .

FIG. 1 shows the apparatus of y) for explaining the exposure method of the present invention.
Fig. 2 is a schematic diagram of A.
FIG. 6 is a schematic diagram of the device viewed from the side; 4th: A+ uses a cylindrical hard mask]
It is a front view of easy fr. .

Figures 11-4 (In 2, 1 is i#j; -A'
, (It is a flexible/pull board that can be used,
The light 171 members are applied. Here (a flexible/pull board is shown as two boards, one for fixed (rigid) length 111, one for 11 (L even if using a board, flexible/pull board)
+')+")l of the pull board 1 is preferably polyimide (rozen fat, fluorine f☆i) 17, mylar, etc. 2 is a flexible pull mask C tomorrow, no 9 [with a constant pitch, ivy 1 constant 0
) Lines ′ form a pattern of altitude λ. The substrate 1 and flexible mask 2 are mounted on drive rollers 4-1 to 62 (
The exposure device 6 is also exposed from the second direction until it moves from the slit 7-1 to the slit 7-2 (two times) at the same speed. In order to prevent U), (double teno/yono is applied slightly).

The rotational speed of the drive rollers 4-1 to 6-2 is determined by the light time (1-7) depending on the characteristics of the photosensitive material used. The fogged substrate 1 is transferred to a developing device 6 (not shown) (
The process is carried out in 7 lines until development.

The endless mask shown in FIGS. 1 and 2 (
You may use a flexible mask so that there are two, or you may use a cylindrical hard mask 2, or you may use a cylindrical hard mask 2.・・・
- When using a mask, base 1 flexible/gluno 1 (
board (two limited but continuous
ii 卜 (There is.

8-1 and 8-2 are Pino J-rollers 1, Example Figures 1 to 6 (See Figure 1 to Figure 6.)

using polyimide film (1[JO/IJ!)]
■-7 Polyimide film (8[
Jμ thickness) was used. Ettress mask 2); f Step exposure was carried out at the pitch of the Arijime foot to create an i5i fixed line raccoon 1 degree Q) pattern. NG Butter 7 and [7
◇ The endless mask 2 was set in the exposure device 117+, and was rolled (1 toe) with the pitch rollers 8-1 and 8-2.Next Set the board 1 on the drive roller 4-1
I held it down at -1. Next, the drive rollers 4-1 and 4-2 (two departures (two departures), t☆ alignment, and disassembly were completed. , t8 degrees, and continuous (two exposures) were carried out using the exposure device 6. The slits 7-1 and 7-2 were adjusted in advance so that the exposure time was 10 seconds.

Although the exposed substrate 1 was continuously etched, it may also be etched and peeled continuously.

As a result of performing the path light and development using the above method, the obtained butter-nigning accuracy was 59 × 6 μm O) 4.14 As explained above, the present invention Q) bond, optical power θ (- 11, an endless mask is used as an exposure photomask, and the light path photomask and the substrate are continuously exposed while moving f2 in the same consecutive summer (2, 1, s, movement) υ
] A long substrate in the force direction (2) The butter 7 is continuously formed, (7 is also formed with high patterning accuracy to achieve 1A or 0

[Brief explanation of the drawing]

1.J is a schematic diagram of an apparatus for explaining the exposure method of the present invention, and FIG. 2 is A1.J. KI neck whole + l', tf
FIG. 6 is a schematic diagram of the device 4+ as seen from (Il
FIG. 4 is a schematic diagram as seen from the front, and FIG. 4 is a front view when a cylindrical bird mask is used. 1 Substrate 2 Endless mask 6 ・Exposure device 4-1.4-2.5-1.5-2.6 1゜6-2 Drive roller 7-1, 7-2 Slit d-1, 8-2 Pinch roller Bureau ♂1 Applicant: Canon Co., Ltd. 1 (embedded name: Hayashi Z) (Figure 1 Figure 2 Figure 3

Claims (1)

[Claims] 1. An exposure method in which a photosensitive material is exposed on an L plate using an exposure photomask, characterized in that the exposure is performed while moving the substrate and the photomask at a constant speed. exposure method. 2. The exposure method according to claim 1, wherein the photomask is an endless mask. 3. The photomask is a hard mask. y1. An exposure method according to claim 1. 4. The exposure method according to claim 1, wherein the +s'J photomask is a flexible mask.