JPS6489317A - Photochemical reaction processor - Google Patents

Abstract

PURPOSE:To uniformize the irradiations of lights on substrates between the substrates, to obtain a high speed photochemical reaction by effectively utilizing radiated lights and to process a large quantity of substrates by providing a reflecting mechanism in an opposite direction to the surface to be irradiated of a light source. CONSTITUTION:A substrate support 7 is rotated by a motor 21, the relative positions between a substrate 17 and light sources 5 are periodically varied at a suitable timing, cooling nitrogen is circulated in a quartz tube 17, and aluminum 18 is deposited in vacuum on its outer wall as a reflecting mechanism. Two substrates 15 are attached to each face of the support 7, a chamber 3 is completely hermetically sealed, and reduced under its pressure therein by an evacuation system 13. Then, reaction gas is introduced from an introduction system 11 into the chamber 3. The support 7 is rotated in a state that the substrates 15 are heated by a heater 23 to a predetermined temperature, and ultraviolet rays are irradiated from the light sources 5 to the surfaces of the substrate. Thus, the reaction gas is chemically reacted as predetermined by the heat and the lights in a reaction space, and a product is laminated on the surfaces of the substrates.