JPS6477051A - Photosensitive composition and photosensitive planographic printing plate - Google Patents
Photosensitive composition and photosensitive planographic printing plateInfo
- Publication number
- JPS6477051A JPS6477051A JP7537288A JP7537288A JPS6477051A JP S6477051 A JPS6477051 A JP S6477051A JP 7537288 A JP7537288 A JP 7537288A JP 7537288 A JP7537288 A JP 7537288A JP S6477051 A JPS6477051 A JP S6477051A
- Authority
- JP
- Japan
- Prior art keywords
- compd
- halomethyl
- photosensitive
- compsn
- printing plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
Abstract
PURPOSE:To improve a visible picture property after exposing and inking property by incorporating o-quinone diazide, novolak resin, halomethyl oxadioazole compd., halomethyl s-triazine compd. which is a discoloring agent, and compd. having the specific structural unit in the molecular structure into a titled compsn. CONSTITUTION:This printing plate has the o-quinone diazide, the novolak resin, and the halomethyl oxadiazole compd. and/or halomethyl s-triazine compd. which forms a free halogen group by irradiation of active rays on a base. The photosensitive layer consisting of the photosensitive compsn. contg. the discoloring agent which changes its color tone by interacting with said halomethyl compd. and the compd. which occupies 0.05-10wt.% of the total compsn. and has at least one kind of the structural units expressed by the formulas I, II (n is 2-5,000 integer) in the molecular structure is provided thereon. The inking property and the visible picture property after exposing are thereby improved.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7537288A JPS6477051A (en) | 1987-06-03 | 1988-03-29 | Photosensitive composition and photosensitive planographic printing plate |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13913987 | 1987-06-03 | ||
JP7537288A JPS6477051A (en) | 1987-06-03 | 1988-03-29 | Photosensitive composition and photosensitive planographic printing plate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6477051A true JPS6477051A (en) | 1989-03-23 |
Family
ID=26416523
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7537288A Pending JPS6477051A (en) | 1987-06-03 | 1988-03-29 | Photosensitive composition and photosensitive planographic printing plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6477051A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6221989B1 (en) * | 1998-05-14 | 2001-04-24 | Shin-Etsu Chemical Co., Ltd. | Polymers and positive resist compositions |
US7022463B2 (en) * | 2003-08-22 | 2006-04-04 | Canon Kabushiki Kaisha | Near-field exposure photoresist and fine pattern forming method using the same |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57212437A (en) * | 1981-06-15 | 1982-12-27 | Polychrome Corp | Composition of forming highly visible image before development following exposure to radiation |
JPS5887553A (en) * | 1981-11-09 | 1983-05-25 | ヘキスト・アクチエンゲゼルシヤフト | Photosensitive mixture and photosensitive copying material produced therefrom |
JPS603626A (en) * | 1983-06-22 | 1985-01-10 | Fuji Photo Film Co Ltd | Photosensitive composition |
JPS6088942A (en) * | 1983-10-21 | 1985-05-18 | Fuji Photo Film Co Ltd | Photosensitive composition |
JPS6114378A (en) * | 1984-06-28 | 1986-01-22 | 木村新株式会社 | Door pivoting apparatus |
JPS62102243A (en) * | 1985-10-25 | 1987-05-12 | ヘキスト・セラニ−ズ・コ−ポレイシヨン | Making of photoresist |
JPS62105137A (en) * | 1985-10-28 | 1987-05-15 | ヘキスト・セラニ−ズ・コ−ポレイシヨン | Radiophotosensitive positive type photoresist composition, photosensitive material and making of photoresist |
JPS62251740A (en) * | 1986-04-24 | 1987-11-02 | Fuji Photo Film Co Ltd | Positive type photosensitive composition |
-
1988
- 1988-03-29 JP JP7537288A patent/JPS6477051A/en active Pending
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57212437A (en) * | 1981-06-15 | 1982-12-27 | Polychrome Corp | Composition of forming highly visible image before development following exposure to radiation |
JPS5887553A (en) * | 1981-11-09 | 1983-05-25 | ヘキスト・アクチエンゲゼルシヤフト | Photosensitive mixture and photosensitive copying material produced therefrom |
JPS603626A (en) * | 1983-06-22 | 1985-01-10 | Fuji Photo Film Co Ltd | Photosensitive composition |
JPS6088942A (en) * | 1983-10-21 | 1985-05-18 | Fuji Photo Film Co Ltd | Photosensitive composition |
JPS6114378A (en) * | 1984-06-28 | 1986-01-22 | 木村新株式会社 | Door pivoting apparatus |
JPS62102243A (en) * | 1985-10-25 | 1987-05-12 | ヘキスト・セラニ−ズ・コ−ポレイシヨン | Making of photoresist |
JPS62105137A (en) * | 1985-10-28 | 1987-05-15 | ヘキスト・セラニ−ズ・コ−ポレイシヨン | Radiophotosensitive positive type photoresist composition, photosensitive material and making of photoresist |
JPS62251740A (en) * | 1986-04-24 | 1987-11-02 | Fuji Photo Film Co Ltd | Positive type photosensitive composition |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6221989B1 (en) * | 1998-05-14 | 2001-04-24 | Shin-Etsu Chemical Co., Ltd. | Polymers and positive resist compositions |
US7022463B2 (en) * | 2003-08-22 | 2006-04-04 | Canon Kabushiki Kaisha | Near-field exposure photoresist and fine pattern forming method using the same |
US7419763B2 (en) | 2003-08-22 | 2008-09-02 | Canon Kabushiki Kaisha | Near-field exposure photoresist and fine pattern forming method using the same |
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