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JPS6477051A - Photosensitive composition and photosensitive planographic printing plate - Google Patents

Photosensitive composition and photosensitive planographic printing plate

Info

Publication number
JPS6477051A
JPS6477051A JP7537288A JP7537288A JPS6477051A JP S6477051 A JPS6477051 A JP S6477051A JP 7537288 A JP7537288 A JP 7537288A JP 7537288 A JP7537288 A JP 7537288A JP S6477051 A JPS6477051 A JP S6477051A
Authority
JP
Japan
Prior art keywords
compd
halomethyl
photosensitive
compsn
printing plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7537288A
Other languages
Japanese (ja)
Inventor
Hideyuki Nakai
Sei Goto
Hiroshi Tomiyasu
Yoshiko Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Kasei Corp
Konica Minolta Inc
Original Assignee
Mitsubishi Kasei Corp
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Kasei Corp, Konica Minolta Inc filed Critical Mitsubishi Kasei Corp
Priority to JP7537288A priority Critical patent/JPS6477051A/en
Publication of JPS6477051A publication Critical patent/JPS6477051A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)

Abstract

PURPOSE:To improve a visible picture property after exposing and inking property by incorporating o-quinone diazide, novolak resin, halomethyl oxadioazole compd., halomethyl s-triazine compd. which is a discoloring agent, and compd. having the specific structural unit in the molecular structure into a titled compsn. CONSTITUTION:This printing plate has the o-quinone diazide, the novolak resin, and the halomethyl oxadiazole compd. and/or halomethyl s-triazine compd. which forms a free halogen group by irradiation of active rays on a base. The photosensitive layer consisting of the photosensitive compsn. contg. the discoloring agent which changes its color tone by interacting with said halomethyl compd. and the compd. which occupies 0.05-10wt.% of the total compsn. and has at least one kind of the structural units expressed by the formulas I, II (n is 2-5,000 integer) in the molecular structure is provided thereon. The inking property and the visible picture property after exposing are thereby improved.
JP7537288A 1987-06-03 1988-03-29 Photosensitive composition and photosensitive planographic printing plate Pending JPS6477051A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7537288A JPS6477051A (en) 1987-06-03 1988-03-29 Photosensitive composition and photosensitive planographic printing plate

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP13913987 1987-06-03
JP7537288A JPS6477051A (en) 1987-06-03 1988-03-29 Photosensitive composition and photosensitive planographic printing plate

Publications (1)

Publication Number Publication Date
JPS6477051A true JPS6477051A (en) 1989-03-23

Family

ID=26416523

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7537288A Pending JPS6477051A (en) 1987-06-03 1988-03-29 Photosensitive composition and photosensitive planographic printing plate

Country Status (1)

Country Link
JP (1) JPS6477051A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6221989B1 (en) * 1998-05-14 2001-04-24 Shin-Etsu Chemical Co., Ltd. Polymers and positive resist compositions
US7022463B2 (en) * 2003-08-22 2006-04-04 Canon Kabushiki Kaisha Near-field exposure photoresist and fine pattern forming method using the same

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57212437A (en) * 1981-06-15 1982-12-27 Polychrome Corp Composition of forming highly visible image before development following exposure to radiation
JPS5887553A (en) * 1981-11-09 1983-05-25 ヘキスト・アクチエンゲゼルシヤフト Photosensitive mixture and photosensitive copying material produced therefrom
JPS603626A (en) * 1983-06-22 1985-01-10 Fuji Photo Film Co Ltd Photosensitive composition
JPS6088942A (en) * 1983-10-21 1985-05-18 Fuji Photo Film Co Ltd Photosensitive composition
JPS6114378A (en) * 1984-06-28 1986-01-22 木村新株式会社 Door pivoting apparatus
JPS62102243A (en) * 1985-10-25 1987-05-12 ヘキスト・セラニ−ズ・コ−ポレイシヨン Making of photoresist
JPS62105137A (en) * 1985-10-28 1987-05-15 ヘキスト・セラニ−ズ・コ−ポレイシヨン Radiophotosensitive positive type photoresist composition, photosensitive material and making of photoresist
JPS62251740A (en) * 1986-04-24 1987-11-02 Fuji Photo Film Co Ltd Positive type photosensitive composition

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57212437A (en) * 1981-06-15 1982-12-27 Polychrome Corp Composition of forming highly visible image before development following exposure to radiation
JPS5887553A (en) * 1981-11-09 1983-05-25 ヘキスト・アクチエンゲゼルシヤフト Photosensitive mixture and photosensitive copying material produced therefrom
JPS603626A (en) * 1983-06-22 1985-01-10 Fuji Photo Film Co Ltd Photosensitive composition
JPS6088942A (en) * 1983-10-21 1985-05-18 Fuji Photo Film Co Ltd Photosensitive composition
JPS6114378A (en) * 1984-06-28 1986-01-22 木村新株式会社 Door pivoting apparatus
JPS62102243A (en) * 1985-10-25 1987-05-12 ヘキスト・セラニ−ズ・コ−ポレイシヨン Making of photoresist
JPS62105137A (en) * 1985-10-28 1987-05-15 ヘキスト・セラニ−ズ・コ−ポレイシヨン Radiophotosensitive positive type photoresist composition, photosensitive material and making of photoresist
JPS62251740A (en) * 1986-04-24 1987-11-02 Fuji Photo Film Co Ltd Positive type photosensitive composition

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6221989B1 (en) * 1998-05-14 2001-04-24 Shin-Etsu Chemical Co., Ltd. Polymers and positive resist compositions
US7022463B2 (en) * 2003-08-22 2006-04-04 Canon Kabushiki Kaisha Near-field exposure photoresist and fine pattern forming method using the same
US7419763B2 (en) 2003-08-22 2008-09-02 Canon Kabushiki Kaisha Near-field exposure photoresist and fine pattern forming method using the same

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