JPS6464322A - Method of removing organic material - Google Patents
Method of removing organic materialInfo
- Publication number
- JPS6464322A JPS6464322A JP22015087A JP22015087A JPS6464322A JP S6464322 A JPS6464322 A JP S6464322A JP 22015087 A JP22015087 A JP 22015087A JP 22015087 A JP22015087 A JP 22015087A JP S6464322 A JPS6464322 A JP S6464322A
- Authority
- JP
- Japan
- Prior art keywords
- plate
- cleaned
- matter
- photoresist
- uneven
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Drying Of Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To accelerate the removing rate of an organic material by mounting a flat plate above a matter to be cleaned, forming the surface of the plate uneven, and feeding gas containing ozone between the plate and the matter to be cleaned. CONSTITUTION:A silicon wafer coated with a photoresist is employed as a matter 1 to be cleaned, and mounted on a heater 2. A disclike flat plate 3 is mounted above the wafer, and oxygen gas containing ozone is fed by a nozzle 4 provided at the center of the plate. The surface of the plate 3 is formed to be uneven 5. When the photoresist on the matter to be cleaned is removed by this method, the photoresist is removed at a rate as high as approx. twice as compared with the case that there is no uneven on the plate. The plate is formed of a material for transmitting an ultraviolet ray, such as quartz or the like, and when the ultraviolet ray is irradiated from above, the removing removing rate is further improved.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22015087A JPS6464322A (en) | 1987-09-04 | 1987-09-04 | Method of removing organic material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22015087A JPS6464322A (en) | 1987-09-04 | 1987-09-04 | Method of removing organic material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6464322A true JPS6464322A (en) | 1989-03-10 |
Family
ID=16746677
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22015087A Pending JPS6464322A (en) | 1987-09-04 | 1987-09-04 | Method of removing organic material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6464322A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013534725A (en) * | 2010-06-18 | 2013-09-05 | アプライド マテリアルズ インコーポレイテッド | Method and apparatus for inducing turbulent flow of process chamber cleaning gas |
| JP2014225634A (en) * | 2013-04-16 | 2014-12-04 | パナソニックＩｐマネジメント株式会社 | Non-plasma dry etching apparatus |
| WO2015030035A1 (en) * | 2013-08-28 | 2015-03-05 | 国立大学法人筑波大学 | Cleaning device and cleaning method |
-
1987
- 1987-09-04 JP JP22015087A patent/JPS6464322A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013534725A (en) * | 2010-06-18 | 2013-09-05 | アプライド マテリアルズ インコーポレイテッド | Method and apparatus for inducing turbulent flow of process chamber cleaning gas |
| JP2014225634A (en) * | 2013-04-16 | 2014-12-04 | パナソニックＩｐマネジメント株式会社 | Non-plasma dry etching apparatus |
| WO2015030035A1 (en) * | 2013-08-28 | 2015-03-05 | 国立大学法人筑波大学 | Cleaning device and cleaning method |
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