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JPS6461746A - Heat-resisting photosensitive polymer composition - Google Patents

Heat-resisting photosensitive polymer composition

Info

Publication number
JPS6461746A
JPS6461746A JP21787987A JP21787987A JPS6461746A JP S6461746 A JPS6461746 A JP S6461746A JP 21787987 A JP21787987 A JP 21787987A JP 21787987 A JP21787987 A JP 21787987A JP S6461746 A JPS6461746 A JP S6461746A
Authority
JP
Japan
Prior art keywords
group
org
polymer
titled composition
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21787987A
Other languages
Japanese (ja)
Inventor
Fumio Kataoka
Fusaji Shoji
Jun Tanaka
Tetsuya Yamazaki
Mitsumasa Kojima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Hitachi Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP21787987A priority Critical patent/JPS6461746A/en
Publication of JPS6461746A publication Critical patent/JPS6461746A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)

Abstract

PURPOSE:To form a thick film pattern having high sensitivity and high definition by incorporating a specified polymer in the titled composition. CONSTITUTION:The titled composition is composed of 100pts.wt. a polymer having a repeating unit shown by the formula as a main component, and 0.1-30 pts.wt. of a photopolymerization initiator or a photocrosslinking agent or a sensitizer. In the formula, R<1> is >=4C a four valent org. group, R<2> is a divalent org. group contg. an aromatic ring, P<1>-P<3> are each a photosensitive group, X is an org. group or -O- group, etc., (n) is 1 or 2. Said polymer is synthesized by a dehydration and polymerization-condensation reaction of a tetracarboxylic acid diester having an ester residual group as a photosensitive group and an aromatic diamine compd. having the photosensitive group. And, the titled composition may contain a michler's ketone, etc., as an additive, and if necessary, an auxiliary sensitizer may be added.
JP21787987A 1987-09-02 1987-09-02 Heat-resisting photosensitive polymer composition Pending JPS6461746A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21787987A JPS6461746A (en) 1987-09-02 1987-09-02 Heat-resisting photosensitive polymer composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21787987A JPS6461746A (en) 1987-09-02 1987-09-02 Heat-resisting photosensitive polymer composition

Publications (1)

Publication Number Publication Date
JPS6461746A true JPS6461746A (en) 1989-03-08

Family

ID=16711199

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21787987A Pending JPS6461746A (en) 1987-09-02 1987-09-02 Heat-resisting photosensitive polymer composition

Country Status (1)

Country Link
JP (1) JPS6461746A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0651512A (en) * 1992-07-30 1994-02-25 Sumitomo Bakelite Co Ltd Photosensitive resin composition
WO2009051187A1 (en) * 2007-10-19 2009-04-23 Nissan Chemical Industries, Ltd. Polyester resin solution for production of thermally cured film

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5545748A (en) * 1978-09-29 1980-03-31 Hitachi Ltd Photosensitive polymer and its production
JPS5638038A (en) * 1979-08-01 1981-04-13 Toray Ind Inc Photosensitive polyimide precursor
JPS5776017A (en) * 1980-09-03 1982-05-12 Du Pont Polymeric heat resistance photopolymerizing composition
JPS60134236A (en) * 1983-12-23 1985-07-17 Hitachi Ltd Formation of fine pattern
JPS60178446A (en) * 1984-02-27 1985-09-12 Ube Ind Ltd Photosensitive material soluble in organic solvent
JPS60198537A (en) * 1984-01-24 1985-10-08 ゼネラル・エレクトリツク・カンパニイ Photopatternable dielectric composition and methods of manufacturing and using the same
JPS60228537A (en) * 1984-03-29 1985-11-13 シーメンス、アクチエンゲゼルシヤフト Manufacture of radiation reactive precursor
JPS61254605A (en) * 1985-05-07 1986-11-12 Asahi Chem Ind Co Ltd Photosensitive composition

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5545748A (en) * 1978-09-29 1980-03-31 Hitachi Ltd Photosensitive polymer and its production
JPS5638038A (en) * 1979-08-01 1981-04-13 Toray Ind Inc Photosensitive polyimide precursor
JPS5776017A (en) * 1980-09-03 1982-05-12 Du Pont Polymeric heat resistance photopolymerizing composition
JPS60134236A (en) * 1983-12-23 1985-07-17 Hitachi Ltd Formation of fine pattern
JPS60198537A (en) * 1984-01-24 1985-10-08 ゼネラル・エレクトリツク・カンパニイ Photopatternable dielectric composition and methods of manufacturing and using the same
JPS60178446A (en) * 1984-02-27 1985-09-12 Ube Ind Ltd Photosensitive material soluble in organic solvent
JPS60228537A (en) * 1984-03-29 1985-11-13 シーメンス、アクチエンゲゼルシヤフト Manufacture of radiation reactive precursor
JPS61254605A (en) * 1985-05-07 1986-11-12 Asahi Chem Ind Co Ltd Photosensitive composition

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0651512A (en) * 1992-07-30 1994-02-25 Sumitomo Bakelite Co Ltd Photosensitive resin composition
WO2009051187A1 (en) * 2007-10-19 2009-04-23 Nissan Chemical Industries, Ltd. Polyester resin solution for production of thermally cured film
JP5459483B2 (en) * 2007-10-19 2014-04-02 日産化学工業株式会社 Polyester resin solution for thermosetting film formation

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