JPS6430242A - Pre-alignment of semiconductor wafer - Google Patents
Pre-alignment of semiconductor waferInfo
- Publication number
- JPS6430242A JPS6430242A JP62186967A JP18696787A JPS6430242A JP S6430242 A JPS6430242 A JP S6430242A JP 62186967 A JP62186967 A JP 62186967A JP 18696787 A JP18696787 A JP 18696787A JP S6430242 A JPS6430242 A JP S6430242A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- alignment
- mark
- semiconductor wafer
- detected
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
PURPOSE:To place a plurality of semiconductor wafers accurately at their prescribed positions for exposure to light and to reduce difference in errors among exposing devices by a method wherein calibration of mark detecting sections is accomplished on the ground of reference marks on an exposing stage and the data about detected marks is used for the prealignment of the semiconductor wafers. CONSTITUTION:A wafer arm 21 is positioned as prescribed on a exposing stage 28. The position of a reference mark 29 is detected by a mark detecting section 27, and then a semiconductor wafer 25 is coarsely aligned on a pre-alignment stage. The semiconductor wafer 25 is vacuum-sucked to a wafer chuck 24 of the wafer arm 21. The position is optically determined of a pre-alignment mark 33, which is accomplished by using a microscope 27-1, a mirror 27-2, and a detector 27-3. A wafer check driving section 23 then trims the position of the wafer chuck 24. Through these steps, the pre-alignment mark 33 is detected, that is, the semiconductor wafer 25 is pre-aligned.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62186967A JPS6430242A (en) | 1987-07-27 | 1987-07-27 | Pre-alignment of semiconductor wafer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62186967A JPS6430242A (en) | 1987-07-27 | 1987-07-27 | Pre-alignment of semiconductor wafer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6430242A true JPS6430242A (en) | 1989-02-01 |
Family
ID=16197861
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62186967A Pending JPS6430242A (en) | 1987-07-27 | 1987-07-27 | Pre-alignment of semiconductor wafer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6430242A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0747933A1 (en) * | 1995-06-07 | 1996-12-11 | Varian Associates, Inc. | Optical position calibration system |
| WO2000043157A1 (en) * | 1999-01-25 | 2000-07-27 | Intergen, Inc. | Laser alignment system for processing substrates |
| US6175418B1 (en) | 1999-01-25 | 2001-01-16 | Intergen, Inc. | Multiple alignment mechanism in close proximity to a shared processing device |
| WO2003050514A3 (en) * | 2001-12-12 | 2004-01-29 | Therma Wave Inc | Position-dependent optical metrology calibration |
| US6897963B1 (en) * | 1997-12-18 | 2005-05-24 | Nikon Corporation | Stage device and exposure apparatus |
-
1987
- 1987-07-27 JP JP62186967A patent/JPS6430242A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0747933A1 (en) * | 1995-06-07 | 1996-12-11 | Varian Associates, Inc. | Optical position calibration system |
| US5742393A (en) * | 1995-06-07 | 1998-04-21 | Varian Associates, Inc. | Optical position calibration system |
| US6897963B1 (en) * | 1997-12-18 | 2005-05-24 | Nikon Corporation | Stage device and exposure apparatus |
| WO2000043157A1 (en) * | 1999-01-25 | 2000-07-27 | Intergen, Inc. | Laser alignment system for processing substrates |
| US6175418B1 (en) | 1999-01-25 | 2001-01-16 | Intergen, Inc. | Multiple alignment mechanism in close proximity to a shared processing device |
| WO2003050514A3 (en) * | 2001-12-12 | 2004-01-29 | Therma Wave Inc | Position-dependent optical metrology calibration |
| US7095496B2 (en) | 2001-12-12 | 2006-08-22 | Tokyo Electron Limited | Method and apparatus for position-dependent optical metrology calibration |
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