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JPS641972A - Specific resistance measuring apparatus having light cutting mechanism - Google Patents

Specific resistance measuring apparatus having light cutting mechanism

Info

Publication number
JPS641972A
JPS641972A JP62157167A JP15716787A JPS641972A JP S641972 A JPS641972 A JP S641972A JP 62157167 A JP62157167 A JP 62157167A JP 15716787 A JP15716787 A JP 15716787A JP S641972 A JPS641972 A JP S641972A
Authority
JP
Japan
Prior art keywords
stage
shutter
specific resistance
measuring chamber
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62157167A
Other languages
Japanese (ja)
Other versions
JPH011972A (en
JPH0697241B2 (en
Inventor
Susumu Tsutsuyama
Mikio Tanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Electric Corp
Original Assignee
Kokusai Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kokusai Electric Corp filed Critical Kokusai Electric Corp
Priority to JP62157167A priority Critical patent/JPH0697241B2/en
Publication of JPH011972A publication Critical patent/JPH011972A/en
Publication of JPS641972A publication Critical patent/JPS641972A/en
Publication of JPH0697241B2 publication Critical patent/JPH0697241B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Measurement Of Resistance Or Impedance (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE: To reduce scattering of measured values, by a method wherein a shutter is closed to keep the measuring chamber dark after a stage with a wafer set thereon is carried into a measuring chamber to measure a specific resistance and a sheet resistance of the wafer.
CONSTITUTION: A wafer 1 is set on a stage 2 and a shutter 4 is opened with a shutter opening-closing mechanism 5. The stage 2 is carried into a measuring chamber 6 with a stage moving mechanism 3. After the carrying in of the stage, the shutter 4 is closed with a shutter opening-closing mechanism 5 to keep the measuring chamber 6 dark. A specific resistance and a sheet resistance of the wafer 1 are measured with a 4-needle probe. After the measurement, the shutter 4 is opened with the shutter opening-closing mechanism 5 and the stage 2 is carried out of the measuring chamber 6 with the stage moving mechanism 3.
COPYRIGHT: (C)1989,JPO&Japio
JP62157167A 1987-06-23 1987-06-23 Wafer inspection system Expired - Lifetime JPH0697241B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62157167A JPH0697241B2 (en) 1987-06-23 1987-06-23 Wafer inspection system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62157167A JPH0697241B2 (en) 1987-06-23 1987-06-23 Wafer inspection system

Publications (3)

Publication Number Publication Date
JPH011972A JPH011972A (en) 1989-01-06
JPS641972A true JPS641972A (en) 1989-01-06
JPH0697241B2 JPH0697241B2 (en) 1994-11-30

Family

ID=15643653

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62157167A Expired - Lifetime JPH0697241B2 (en) 1987-06-23 1987-06-23 Wafer inspection system

Country Status (1)

Country Link
JP (1) JPH0697241B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013111496A1 (en) * 2012-01-27 2013-08-01 ローム株式会社 Method of manufacturing chip resistor
US20230224568A1 (en) * 2022-01-12 2023-07-13 Nidec Copal Corporation Shutter system and inspection device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101116491B1 (en) 2006-02-06 2012-03-07 미쓰이 가가쿠 가부시키가이샤 Spun-bonded nonwoven fabric

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS468806Y1 (en) * 1966-02-17 1971-03-29
JPS496670Y1 (en) * 1968-04-11 1974-02-16
JPS4990263U (en) * 1972-11-27 1974-08-05

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS468806Y1 (en) * 1966-02-17 1971-03-29
JPS496670Y1 (en) * 1968-04-11 1974-02-16
JPS4990263U (en) * 1972-11-27 1974-08-05

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013111496A1 (en) * 2012-01-27 2013-08-01 ローム株式会社 Method of manufacturing chip resistor
US20230224568A1 (en) * 2022-01-12 2023-07-13 Nidec Copal Corporation Shutter system and inspection device
EP4224148A1 (en) 2022-01-12 2023-08-09 Nidec Copal Corporation Shutter system and inspection device
US12047665B2 (en) * 2022-01-12 2024-07-23 Nidec Copal Corporation Shutter system and inspection device

Also Published As

Publication number Publication date
JPH0697241B2 (en) 1994-11-30

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