JPS6417864A - Ion implantation equipment - Google Patents

Abstract

PURPOSE:To prevent the contamination of work and a change in quality and also to improve workability, by putting a work holder to which a work is attached into an ion implantation chamber from a load lock chamber and then returning the temp. of the ion-implanted work to ordinary value. CONSTITUTION:A door 14 of a load lock chamber 6 is opened and the end 9a of a work holder conveyance device 9 is bent laterally and allowed to hold a holder 4 to which a work 3 is attached, and a moving device 13 is allowed to hold a cover body 12. Subsequently, the end 9a is returned to the original position and the door 14 is closed, and then the load lock chamber 6 is evacuated by means of an exhaust hole 8. Then, a gate valve 7 is opened to advance the conveyance device 9 into a vacuum ion implantation chamber 1 and also to transfer the holder 4 to a holding frame 5 and move the holder 4 backward, and the gate valve 7 is closed. An ion beam 2 is applied to work 3 in the implantation chamber 1 and, when the ion implantation in the prescribed quantity is finished, the holder 4 is returned again into the load lock chamber 6 by means of the conveyance device 9, in which the temp. of the work 3 is returned to ordinary value by using a radiation heating device 10 or a work-cooling device 11.