JPS6411339A - Stress analysis of semiconductor device - Google Patents
Stress analysis of semiconductor deviceInfo
- Publication number
- JPS6411339A JPS6411339A JP16690687A JP16690687A JPS6411339A JP S6411339 A JPS6411339 A JP S6411339A JP 16690687 A JP16690687 A JP 16690687A JP 16690687 A JP16690687 A JP 16690687A JP S6411339 A JPS6411339 A JP S6411339A
- Authority
- JP
- Japan
- Prior art keywords
- internal stress
- data
- processes
- semiconductor device
- initial stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
PURPOSE:To calculate internal stress which remains in the final manufacturing process of a semiconductor device by a stress analysis method which is added in order of the process by expressing respective manufacturing processes of the semiconductor device in terms of flows of three kinds of element process and by calculating internal stress which in newly set up by the concerned element processes on the basis of data prepared with respect to respective element processes. CONSTITUTION:Various manufacturing processes are divided into three kinds of element processes; the process where the latest materials are added to the mainframe of a structure, the process which changes the property of a part of the structure, the process which remove or divide a part of the structure. In the calculation, the data of structures and conditions corresponding to an initial stage as well as the concerned element process are inputted from a data file 11 and also the internal stress data in the initial stage are inputted from the data file 12 and further, a calculation part 13 calculates internal stress which is newly set up according to the prescribed calculation means. Moreover, the addition part 14 adds internal stress set up newly to that of the initial stage and enters the resultant addition as the internal stress data which is obtained in the case of completion of the concerned element process in the 12. The internal stress data in the final structure is obtained by repeating this operation for each element process.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16690687A JPS6411339A (en) | 1987-07-06 | 1987-07-06 | Stress analysis of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16690687A JPS6411339A (en) | 1987-07-06 | 1987-07-06 | Stress analysis of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6411339A true JPS6411339A (en) | 1989-01-13 |
Family
ID=15839830
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16690687A Pending JPS6411339A (en) | 1987-07-06 | 1987-07-06 | Stress analysis of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6411339A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8185578B2 (en) | 1999-09-14 | 2012-05-22 | International Business Machines Corporation | Client server system and method for executing an application utilizing distributed objects |
JP6981521B1 (en) * | 2020-12-08 | 2021-12-15 | Jfeスチール株式会社 | Residual stress calculation method |
-
1987
- 1987-07-06 JP JP16690687A patent/JPS6411339A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8185578B2 (en) | 1999-09-14 | 2012-05-22 | International Business Machines Corporation | Client server system and method for executing an application utilizing distributed objects |
JP6981521B1 (en) * | 2020-12-08 | 2021-12-15 | Jfeスチール株式会社 | Residual stress calculation method |
JP2022090698A (en) * | 2020-12-08 | 2022-06-20 | Jfeスチール株式会社 | Residual stress calculation method |
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