JPS5396679A - Electron-beam drawing equipment - Google Patents
Electron-beam drawing equipmentInfo
- Publication number
- JPS5396679A JPS5396679A JP1070877A JP1070877A JPS5396679A JP S5396679 A JPS5396679 A JP S5396679A JP 1070877 A JP1070877 A JP 1070877A JP 1070877 A JP1070877 A JP 1070877A JP S5396679 A JPS5396679 A JP S5396679A
- Authority
- JP
- Japan
- Prior art keywords
- electron
- beam drawing
- drawing equipment
- simplified
- equipment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To obtain the electron-beam drawing equipment which makes high-speed drawing possible and has its controlling software simplified and its control system also simplified.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1070877A JPS5396679A (en) | 1977-02-04 | 1977-02-04 | Electron-beam drawing equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1070877A JPS5396679A (en) | 1977-02-04 | 1977-02-04 | Electron-beam drawing equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5396679A true JPS5396679A (en) | 1978-08-24 |
Family
ID=11757793
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1070877A Pending JPS5396679A (en) | 1977-02-04 | 1977-02-04 | Electron-beam drawing equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5396679A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59169131A (en) * | 1983-03-16 | 1984-09-25 | Hitachi Ltd | Electron beam lithography method and device |
JPH02246316A (en) * | 1989-03-20 | 1990-10-02 | Fujitsu Ltd | Charged particle beam exposure device and its exposure method |
-
1977
- 1977-02-04 JP JP1070877A patent/JPS5396679A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59169131A (en) * | 1983-03-16 | 1984-09-25 | Hitachi Ltd | Electron beam lithography method and device |
JPH0554251B2 (en) * | 1983-03-16 | 1993-08-12 | Hitachi Ltd | |
JPH02246316A (en) * | 1989-03-20 | 1990-10-02 | Fujitsu Ltd | Charged particle beam exposure device and its exposure method |
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