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JPS5396679A - Electron-beam drawing equipment - Google Patents

Electron-beam drawing equipment

Info

Publication number
JPS5396679A
JPS5396679A JP1070877A JP1070877A JPS5396679A JP S5396679 A JPS5396679 A JP S5396679A JP 1070877 A JP1070877 A JP 1070877A JP 1070877 A JP1070877 A JP 1070877A JP S5396679 A JPS5396679 A JP S5396679A
Authority
JP
Japan
Prior art keywords
electron
beam drawing
drawing equipment
simplified
equipment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1070877A
Other languages
Japanese (ja)
Inventor
Katsuhiro Kuroda
Tadasuke Munakata
Ichiro Miwa
Shojiro Asai
Akira Yanagisawa
Susumu Ozasa
Genya Matsuoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1070877A priority Critical patent/JPS5396679A/en
Publication of JPS5396679A publication Critical patent/JPS5396679A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To obtain the electron-beam drawing equipment which makes high-speed drawing possible and has its controlling software simplified and its control system also simplified.
COPYRIGHT: (C)1978,JPO&Japio
JP1070877A 1977-02-04 1977-02-04 Electron-beam drawing equipment Pending JPS5396679A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1070877A JPS5396679A (en) 1977-02-04 1977-02-04 Electron-beam drawing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1070877A JPS5396679A (en) 1977-02-04 1977-02-04 Electron-beam drawing equipment

Publications (1)

Publication Number Publication Date
JPS5396679A true JPS5396679A (en) 1978-08-24

Family

ID=11757793

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1070877A Pending JPS5396679A (en) 1977-02-04 1977-02-04 Electron-beam drawing equipment

Country Status (1)

Country Link
JP (1) JPS5396679A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59169131A (en) * 1983-03-16 1984-09-25 Hitachi Ltd Electron beam lithography method and device
JPH02246316A (en) * 1989-03-20 1990-10-02 Fujitsu Ltd Charged particle beam exposure device and its exposure method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59169131A (en) * 1983-03-16 1984-09-25 Hitachi Ltd Electron beam lithography method and device
JPH0554251B2 (en) * 1983-03-16 1993-08-12 Hitachi Ltd
JPH02246316A (en) * 1989-03-20 1990-10-02 Fujitsu Ltd Charged particle beam exposure device and its exposure method

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