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JPS5384468A - Electrode formation method by recoil injection - Google Patents

Electrode formation method by recoil injection

Info

Publication number
JPS5384468A
JPS5384468A JP16026476A JP16026476A JPS5384468A JP S5384468 A JPS5384468 A JP S5384468A JP 16026476 A JP16026476 A JP 16026476A JP 16026476 A JP16026476 A JP 16026476A JP S5384468 A JPS5384468 A JP S5384468A
Authority
JP
Japan
Prior art keywords
formation method
electrode formation
recoil
injection
recoil injection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16026476A
Other languages
Japanese (ja)
Other versions
JPS5942972B2 (en
Inventor
Shigeru Tatsuta
Hidetoshi Nishi
Tsuneo Furuya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16026476A priority Critical patent/JPS5942972B2/en
Publication of JPS5384468A publication Critical patent/JPS5384468A/en
Publication of JPS5942972B2 publication Critical patent/JPS5942972B2/en
Expired legal-status Critical Current

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  • Bipolar Transistors (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

PURPOSE: To reduce the lateral reaction of the electrode metal by utilizing the ion injection technique.
COPYRIGHT: (C)1978,JPO&Japio
JP16026476A 1976-12-29 1976-12-29 Electrode formation method using recoil injection Expired JPS5942972B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16026476A JPS5942972B2 (en) 1976-12-29 1976-12-29 Electrode formation method using recoil injection

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16026476A JPS5942972B2 (en) 1976-12-29 1976-12-29 Electrode formation method using recoil injection

Publications (2)

Publication Number Publication Date
JPS5384468A true JPS5384468A (en) 1978-07-25
JPS5942972B2 JPS5942972B2 (en) 1984-10-18

Family

ID=15711234

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16026476A Expired JPS5942972B2 (en) 1976-12-29 1976-12-29 Electrode formation method using recoil injection

Country Status (1)

Country Link
JP (1) JPS5942972B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5801086A (en) * 1994-10-24 1998-09-01 Lg Semicon Co., Ltd. Process for formation of contact conductive layer in a semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5801086A (en) * 1994-10-24 1998-09-01 Lg Semicon Co., Ltd. Process for formation of contact conductive layer in a semiconductor device

Also Published As

Publication number Publication date
JPS5942972B2 (en) 1984-10-18

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