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JPS5372461A - Etching method in manufacture of semiconductor device - Google Patents

Etching method in manufacture of semiconductor device

Info

Publication number
JPS5372461A
JPS5372461A JP14709576A JP14709576A JPS5372461A JP S5372461 A JPS5372461 A JP S5372461A JP 14709576 A JP14709576 A JP 14709576A JP 14709576 A JP14709576 A JP 14709576A JP S5372461 A JPS5372461 A JP S5372461A
Authority
JP
Japan
Prior art keywords
manufacture
semiconductor device
etching method
connections
advance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14709576A
Other languages
Japanese (ja)
Other versions
JPS5645293B2 (en
Inventor
Yoshio Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP14709576A priority Critical patent/JPS5372461A/en
Publication of JPS5372461A publication Critical patent/JPS5372461A/en
Publication of JPS5645293B2 publication Critical patent/JPS5645293B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Weting (AREA)

Abstract

PURPOSE: To prevent the open wire of connections between the conducting layers, by only inserting a simple process that metallic thin film is attached in advance.
COPYRIGHT: (C)1978,JPO&Japio
JP14709576A 1976-12-09 1976-12-09 Etching method in manufacture of semiconductor device Granted JPS5372461A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14709576A JPS5372461A (en) 1976-12-09 1976-12-09 Etching method in manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14709576A JPS5372461A (en) 1976-12-09 1976-12-09 Etching method in manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5372461A true JPS5372461A (en) 1978-06-27
JPS5645293B2 JPS5645293B2 (en) 1981-10-26

Family

ID=15422357

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14709576A Granted JPS5372461A (en) 1976-12-09 1976-12-09 Etching method in manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5372461A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5755588A (en) * 1980-09-20 1982-04-02 Fujitsu Ltd Production of bubble element

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5755588A (en) * 1980-09-20 1982-04-02 Fujitsu Ltd Production of bubble element

Also Published As

Publication number Publication date
JPS5645293B2 (en) 1981-10-26

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