Nothing Special   »   [go: up one dir, main page]

JPS5337120B2 - - Google Patents

Info

Publication number
JPS5337120B2
JPS5337120B2 JP14573274A JP14573274A JPS5337120B2 JP S5337120 B2 JPS5337120 B2 JP S5337120B2 JP 14573274 A JP14573274 A JP 14573274A JP 14573274 A JP14573274 A JP 14573274A JP S5337120 B2 JPS5337120 B2 JP S5337120B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14573274A
Other versions
JPS5173100A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP14573274A priority Critical patent/JPS5337120B2/ja
Priority to GB51440/75A priority patent/GB1507992A/en
Priority to DE2557078A priority patent/DE2557078C3/de
Priority to CH1639975A priority patent/CH602855A5/xx
Priority to FR7539093A priority patent/FR2295456A1/fr
Publication of JPS5173100A publication Critical patent/JPS5173100A/ja
Priority to US05/898,793 priority patent/US4220707A/en
Publication of JPS5337120B2 publication Critical patent/JPS5337120B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0385—Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/128—Radiation-activated cross-linking agent containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
JP14573274A 1974-12-20 1974-12-20 Expired JPS5337120B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP14573274A JPS5337120B2 (ja) 1974-12-20 1974-12-20
GB51440/75A GB1507992A (en) 1974-12-20 1975-12-16 Photosensitive epoxy resin composition for image formatio
DE2557078A DE2557078C3 (de) 1974-12-20 1975-12-18 Lichtempfindliche Masse
CH1639975A CH602855A5 (ja) 1974-12-20 1975-12-18
FR7539093A FR2295456A1 (fr) 1974-12-20 1975-12-19 Composition de resine epoxyde pour la formation d'images
US05/898,793 US4220707A (en) 1974-12-20 1978-04-24 Epoxy resin composition for image formation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14573274A JPS5337120B2 (ja) 1974-12-20 1974-12-20

Publications (2)

Publication Number Publication Date
JPS5173100A JPS5173100A (ja) 1976-06-24
JPS5337120B2 true JPS5337120B2 (ja) 1978-10-06

Family

ID=15391849

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14573274A Expired JPS5337120B2 (ja) 1974-12-20 1974-12-20

Country Status (6)

Country Link
US (1) US4220707A (ja)
JP (1) JPS5337120B2 (ja)
CH (1) CH602855A5 (ja)
DE (1) DE2557078C3 (ja)
FR (1) FR2295456A1 (ja)
GB (1) GB1507992A (ja)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4102686A (en) * 1977-02-25 1978-07-25 Polychrome Corporation Lithographic photosensitive compositions comprising acrylonitrile-butadiene-styrene terpolymer and novolak resin
US4439517A (en) * 1982-01-21 1984-03-27 Ciba-Geigy Corporation Process for the formation of images with epoxide resin
US4564578A (en) * 1982-11-25 1986-01-14 Ciba-Geigy Corporation Novel thioxanthones substituted by alpha-aminoalkyl groups
JPS59191034A (ja) * 1983-04-14 1984-10-30 Fuji Photo Film Co Ltd ハロゲン化銀写真感光材料
JPS61166827A (ja) * 1985-01-17 1986-07-28 Toray Ind Inc 変性エポキシ系微粒子
US6733950B2 (en) * 2001-03-14 2004-05-11 General Electric Company Limited play data storage media and method for limiting access to data thereon
US6645696B1 (en) * 2001-11-30 2003-11-11 Euv Llc. Photoimageable composition
US20030198892A1 (en) * 2002-04-22 2003-10-23 General Electric Company Limited play data storage media and method for limiting access to data thereon
US20030205323A1 (en) * 2002-04-22 2003-11-06 General Electric Company Method for making limited play data storage media
US20040087692A1 (en) * 2002-10-30 2004-05-06 Dixit Arun Nandkishor Method for preparation of an anthraquinone colorant composition
US7087282B2 (en) * 2003-07-15 2006-08-08 General Electric Company Limited play optical storage medium, method for making the same
US7202292B2 (en) * 2003-07-15 2007-04-10 General Electric Company Colored polymeric resin composition with 1,8-diaminoanthraquinone derivative, article made therefrom, and method for making the same
US11906901B2 (en) 2021-06-07 2024-02-20 International Business Machines Corporation Alternating copolymer chain scission photoresists

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4973441A (ja) * 1972-11-14 1974-07-16

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL6503813A (ja) 1964-03-26 1965-09-27
GB1155408A (en) 1965-08-09 1969-06-18 Minnesota Mining & Mfg Epoxy Resin Coating Compositions
US3709861A (en) * 1970-12-14 1973-01-09 Shell Oil Co Process for light-induced curing of epoxy resins in presence of cyclopentadienylmanganese tricarbonyl compounds
US3721617A (en) * 1971-05-18 1973-03-20 American Can Co Photopolymerizable epoxy systems containing cyclic amide gelation inhibitors
US3817850A (en) * 1971-05-18 1974-06-18 American Can Co Photopolymerizable epoxy systems containing substituted acyclic amides or substituted ureas as gelation inhibitors
US3980483A (en) * 1972-04-24 1976-09-14 Nippon Oil Seal Industry Co., Ltd. Photocurable composition
CH576739A5 (ja) * 1972-08-25 1976-06-15 Ciba Geigy Ag
DE2406400B2 (de) * 1973-02-14 1977-04-28 Hitachi Chemical Co., Ltd., Tokio Lichtempfindliche harzzusammensetzungen auf der basis von verbindungen mit epoxy- bzw. photopolymerisierbaren acrylgruppen
US3977878A (en) * 1973-06-11 1976-08-31 American Can Company Epoxy resin photoresist with iodoform and bismuth triphenyl
US3951769A (en) * 1974-03-01 1976-04-20 American Can Company Epoxide photopolymerizable compositions containing cyclic amides as gelation inhibitor and methods of polymerizing

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4973441A (ja) * 1972-11-14 1974-07-16

Also Published As

Publication number Publication date
FR2295456A1 (fr) 1976-07-16
FR2295456B1 (ja) 1978-05-19
DE2557078B2 (de) 1978-01-05
CH602855A5 (ja) 1978-08-15
US4220707A (en) 1980-09-02
DE2557078A1 (de) 1976-06-24
DE2557078C3 (de) 1978-09-07
JPS5173100A (ja) 1976-06-24
GB1507992A (en) 1978-04-19

Similar Documents

Publication Publication Date Title
AU7099174A (ja)
AU8191875A (ja)
CH483974A4 (ja)
AU480981A (ja)
CH606185A5 (ja)
AU482110A (ja)
AU482114A (ja)
AU482309A (ja)
CH532075A4 (ja)
BE827400A (ja)
BE833996A (ja)
BG19668A1 (ja)
BG19713A1 (ja)
BG19766A1 (ja)
BG19773A1 (ja)
BG20028A1 (ja)
BG20432A1 (ja)
BG20468A1 (ja)
BG20509A1 (ja)
BG20519A1 (ja)
BG20663A1 (ja)
BG20744A1 (ja)
BG20866A1 (ja)
BG20895A1 (ja)
BG20899A1 (ja)